TWI564691B - Method and circuit for minimizing body effect - Google Patents
Method and circuit for minimizing body effect Download PDFInfo
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- TWI564691B TWI564691B TW102111502A TW102111502A TWI564691B TW I564691 B TWI564691 B TW I564691B TW 102111502 A TW102111502 A TW 102111502A TW 102111502 A TW102111502 A TW 102111502A TW I564691 B TWI564691 B TW I564691B
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Description
本發明是關於減少體效應(body effect)的技術,尤指一種針對電路中不同的金氧半導體電晶體(例如P型金氧半導體電晶體)給予不同基底(bulk)電壓以減少體效應的方法與電路。 The present invention relates to techniques for reducing body effects, and more particularly to a method for imparting different bulk voltages to different MOS transistors (eg, P-type MOS transistors) in a circuit to reduce body effects. With the circuit.
當使用金氧半導體電晶體來作為開關時,源極(source)與汲極(drain)的電壓(也就是導通電壓)會相同,然而,源極端與基底端的壓差會使體效應產生,而體效應會讓所需的導通電壓變大,造成源極與汲極間的導通能力變差。 When a MOS transistor is used as the switch, the voltage of the source and the drain (that is, the turn-on voltage) will be the same, however, the voltage difference between the source terminal and the substrate terminal will cause a body effect, and The body effect causes the required turn-on voltage to become large, resulting in poor conduction between the source and the drain.
因此,要消除體效應,需要給予基底與源極電壓相同的電壓,讓所需的導通電壓不再變大,進而增進金氧半導體電晶體的導通能力,也就是說,習知作法會針對每一金氧半導體電晶體之個別的源極到汲極之電壓來給予一個適當的電壓予基底,以減少體效應。然而,對於電路佈局來說,由於每一金氧半導體電晶體需要個別處理,因而需要複雜的分壓電路(例如大量的分壓電阻)來提供個別所需的最佳基底電壓,因而造成電路面積的增加。所以需要一個能使用適量面積並減少體效應之電路設計。 Therefore, in order to eliminate the body effect, it is necessary to give the same voltage as the source voltage of the substrate, so that the required turn-on voltage does not become larger, thereby improving the conduction capability of the MOS transistor, that is, the conventional method will be for each The individual source-to-drain voltage of a MOS transistor is applied to the substrate to reduce the bulk effect. However, for circuit layout, since each MOS transistor needs to be processed individually, a complicated voltage dividing circuit (for example, a large number of voltage dividing resistors) is required to provide an optimum required substrate voltage, thereby causing a circuit. The increase in area. So you need a circuit design that uses the right amount of area and reduces body effects.
因此,本發明的目的是提供一種能有效減少體效應並不會耗費面積之方法與電路。 Accordingly, it is an object of the present invention to provide a method and circuit that can effectively reduce body effects without consuming area.
本發明之一實施例揭露了一種減少體效應的方法,其包含:針對電路中至少一第一金氧半導體電晶體給予第一基底電壓;以及針對該電路中至少一第二金氧半導體電晶體給予第二基底電壓,其中第一金氧半導體電晶體所要導通之導通電壓係不同於第二金氧半導體電晶體所要導通之導通電壓,以及第一基底電壓係不同於第二基底電壓。 One embodiment of the present invention discloses a method of reducing body effects, comprising: imparting a first substrate voltage to at least one first MOS transistor in a circuit; and at least one second MOS transistor in the circuit A second substrate voltage is applied, wherein a turn-on voltage to be turned on by the first MOS transistor is different from a turn-on voltage to be turned on by the second MOS transistor, and the first substrate voltage is different from the second substrate voltage.
本發明之另一實施例揭露了一種可減少體效應的電路,其包含:至少一第一金氧半導體電晶體,至少一第二金氧半導體電晶體,以及一電壓產生器;其中電壓產生器是耦接至第一金氧半導體電晶體與第一金氧半導體電晶體,以提供第一基底電壓予第一金氧半導體電晶體,並提供第二基底電壓予第二金氧半導體電晶體,其中第一金氧半導體電晶體所要導通之導通電壓係不同於第二金氧半導體電晶體所要導通之導通電壓,以及第一基底電壓係不同於第二基底電壓。 Another embodiment of the present invention discloses a circuit capable of reducing body effects, comprising: at least a first MOS transistor, at least a second MOS transistor, and a voltage generator; wherein the voltage generator Is coupled to the first MOS transistor and the first MOS transistor to provide a first substrate voltage to the first MOS transistor and provide a second substrate voltage to the second MOS transistor, The turn-on voltage to be turned on by the first MOS transistor is different from the turn-on voltage to be turned on by the second MOS transistor, and the first substrate voltage is different from the second substrate voltage.
基於上述的實施例,本發明提供了一個能針對電路中不同的金氧半導體電晶體給予不同基底電壓以減少體效應的方法與電路,並能避免使用過量面積。 Based on the above-described embodiments, the present invention provides a method and circuit for imparting different substrate voltages to different MOS transistors in a circuit to reduce body effects, and to avoid the use of excess area.
200‧‧‧電路 200‧‧‧ circuit
202_1~202_4、204_1~204_4‧‧‧第一金氧半導體電晶體 202_1~202_4, 204_1~204_4‧‧‧first MOS transistor
206_1~206_4、208_1~208_4‧‧‧第二金氧半導體電晶體 206_1~206_4, 208_1~208_4‧‧‧Second MOS transistor
210‧‧‧電壓產生器 210‧‧‧Voltage generator
212‧‧‧分壓電路 212‧‧‧voltage circuit
第1圖係繪示依據本發明之實施例之金氧半導體電晶體的分壓示意圖。 1 is a schematic view showing the partial pressure of a MOS transistor according to an embodiment of the present invention.
第2圖係繪示依據本發明之實施例之可減少體效應的電路的示意圖。 2 is a schematic diagram of a circuit that can reduce body effects in accordance with an embodiment of the present invention.
在說明書及後續的申請專利範圍當中使用了某些詞彙來指稱特定的元件。所屬領域中具有通常知識者應可理解,製造商可能會用不同的名詞來稱呼同一個元件。本說明書及後續的申請專利範圍並不以名稱的差異來作 為區分元件的方式,而是以元件在特徵上的差異來作為區分的準則。在通篇說明書及後續的請求項當中所提及的「包含」係為一開放式的用語,故應解釋成「包含但不限定於」。以外,「耦接」一詞在此係包含任何直接及間接的電氣連接手段。因此,若文中描述一第一裝置耦接於一第二裝置,則代表該第一裝置可直接電氣連接於該第二裝置,或通過其他裝置或連接手段間接地電氣連接至該第二裝置。 Certain terms are used throughout the description and following claims to refer to particular elements. Those of ordinary skill in the art should understand that a manufacturer may refer to the same component by a different noun. The scope of this specification and subsequent patent applications are not based on differences in names. In order to distinguish the components, the difference in characteristics of the components is used as a criterion for differentiation. The term "including" as used throughout the specification and subsequent claims is an open term and should be interpreted as "including but not limited to". In addition, the term "coupled" is used herein to include any direct and indirect electrical connection. Therefore, if a first device is described as being coupled to a second device, it is meant that the first device can be directly electrically connected to the second device or indirectly electrically connected to the second device by other means or connection means.
第1圖係繪示依據本發明之實施例之金氧半導體電晶體的分壓示意圖。如第1圖所示,高基底電壓VDDA(例如18V的供應電壓)會被分壓而產生(3/4)*VDDA、(1/2)*VDDA、(1/4)*VDDA等不同分壓,因此於高基底電壓VDDA與低基底電壓VSSA之間可透過(3/4)*VDDA、(1/2)*VDDA、(1/4)*VDDA來劃分出不同的分壓區域Area_1~Area_4。一般而言,具有相同導通電壓之金氧半導體電晶體所需之最佳基底電壓會相同,而具有不同導通電壓之金氧半導體電晶體所需之最佳基底電壓則會不同,本發明則會根據每一金氧半導體電晶體原本減少體效應所需之最佳基底電壓落於哪一分壓區域,來決定實際上給予該金氧半導體電晶體之基底電壓,舉例來說,若複數個第一金氧半導體電晶體原本減少體效應所需之個別的最佳基底電壓均落於分壓區域Area_1(換言之,該複數個第一金氧半導體電晶體的導通電壓會落於一第一導通電壓範圍),則本發明會給予同一基底電壓(例如VDDA)予該些第一金氧半導體電晶體;若複數個第二金氧半導體電晶體原本減少體效應所需之個別的最佳基底電壓均落於分壓區域Area_2(換言之,該複數個第二金氧半導體電晶體的導通電壓會落於不同於該第一導通電壓範圍之一第二導通電壓範圍),則本發明會給予同一基底電壓(例如(3/4)*VDDA)予該些第二金氧半導體電晶體。相較於習知作法針對每一金氧半導體電晶體之個別的源極到汲極之電壓來給予一個最佳的電壓予基底,本發明會根據分壓區域來將金氧半導體電晶體進行分類,而對於最佳基底電壓落於同一分壓區域的複數個金氧半 導體電晶體來說,本發明會施加同一基底電壓(而非個別所需的最佳基底電壓)予該些金氧半導體電晶體的基底,因此,僅需簡單的分壓電路(例如少量的分壓電阻)來提供所要的基底電壓,故可降低電路面積。以下以一電路為例來進一步說明本發明的技術特徵。 1 is a schematic view showing the partial pressure of a MOS transistor according to an embodiment of the present invention. As shown in Figure 1, the high base voltage VDDA (for example, the supply voltage of 18V) is divided to produce (3/4)*VDDA, (1/2)*VDDA, (1/4)*VDDA, etc. Voltage, therefore, between the high substrate voltage VDDA and the low substrate voltage VSSA, different voltage division areas Area_1~ can be divided by (3/4)*VDDA, (1/2)*VDDA, (1/4)*VDDA. Area_4. In general, the optimum substrate voltage required for a MOS transistor having the same turn-on voltage will be the same, and the optimum substrate voltage required for a MOS transistor having a different turn-on voltage will be different. Determining the substrate voltage actually applied to the MOS transistor according to which voltage dividing region the optimum substrate voltage required for each MOS transistor to reduce the bulk effect is determined, for example, if plural The individual optimum substrate voltage required for a MOS transistor to reduce the bulk effect falls within the voltage dividing region Area_1 (in other words, the turn-on voltage of the plurality of first MOS transistors falls at a first turn-on voltage) Scope), the present invention will give the same substrate voltage (such as VDDA) to the first MOS transistors; if the plurality of second MOS transistors originally reduce the body effect, the individual optimum substrate voltage is required Falling in the voltage dividing area Area_2 (in other words, the turn-on voltage of the plurality of second MOS transistors may fall in a second conduction different from the first one of the first conducting voltage ranges Pressure range), the substrate of the present invention will be given the same voltage (e.g., (3/4) * VDDA) to the plurality of second metal-oxide-semiconductor transistor. In accordance with conventional practice, an optimum voltage is applied to the substrate for the individual source-to-drain voltage of each MOS transistor, and the present invention classifies the MOS transistor according to the voltage division region. And for a plurality of golden oxygen half of the same substrate voltage falling in the same partial pressure region In the case of a conductor transistor, the present invention applies the same substrate voltage (rather than the individual desired optimum substrate voltage) to the substrate of the MOS transistors, thus requiring only a simple voltage divider circuit (eg, a small amount The voltage divider resistor) provides the desired substrate voltage, thereby reducing the circuit area. The technical features of the present invention will be further described below by taking a circuit as an example.
請參閱第2圖,第2圖係繪示依據本發明之實施例之可減少體效應的電路的示意圖。電路200包含有複數個第一金氧半導體電晶體202_1~202_4、204_1~204_4以及複數個第二金氧半導體電晶體206_1~206_4、208_1~208~4,其中每一第一金氧半導體電晶體與每一第二金氧半導體電晶體均為同一通道類型之金氧半導體電晶體,如第2圖所示,於本實施例中,第一金氧半導體電晶體202_1~202_4、204_1~204_4以及第二金氧半導體電晶體206_1~206_4、208_1~208~4均為P型金氧半導體電晶體(然而,此僅作為範例說明,本發明實際上並不以此為限)。 Please refer to FIG. 2, which is a schematic diagram of a circuit capable of reducing body effects according to an embodiment of the present invention. The circuit 200 includes a plurality of first MOS transistors 202_1~202_4, 204_1~204_4, and a plurality of second MOS transistors 206_1~206_4, 208_1~208~4, wherein each of the first MOS transistors A gold-oxide semiconductor transistor of the same channel type as each of the second MOS transistors, as shown in FIG. 2, in the present embodiment, the first MOS transistors 202_1~202_4, 204_1~204_4 and The second MOS transistors 206_1~206_4, 208_1~208~4 are all P-type MOS transistors (however, this is only an example, and the invention is not limited thereto).
第一金氧半導體電晶體202_1~202_4中每一金氧半導體電晶體所要導通之一導通電壓VC1均相同(亦即原本減少體效應所需之最佳基底電壓Vbulk_1均相同),以及第一金氧半導體電晶體204_1~204_4中每一金氧半導體電晶體所要導通之一導通電壓VC2均相同(亦即原本減少體效應所需之最佳基底電壓Vbulk_2均相同),其中VC1不同於VC2,Vbulk_1不同於Vbulk_2,(3/4)*VDDA<Vbulk_1≦VDDA,以及(3/4)*VDDA<Vbulk_2≦VDDA,因此,第一金氧半導體電晶體202_1~202_4、204_1~204_4係歸類為對應至分壓區域Area_1,且VC1與VC2均會落於第一導通電壓範圍VR1。 Each of the first oxynitride transistors 202_1~202_4 has a same on-voltage VC1 for each of the MOS transistors (that is, the optimum substrate voltage Vbulk_1 required to reduce the body effect is the same), and the first gold Each of the oxynitride transistors 204_1~204_4 has a same on-voltage VC2 for each of the MOS transistors (that is, the optimum substrate voltage Vbulk_2 required to reduce the body effect is the same), wherein VC1 is different from VC2, Vbulk_1 Unlike Vbulk_2, (3/4)*VDDA<Vbulk_1≦VDDA, and (3/4)*VDDA<Vbulk_2≦VDDA, therefore, the first MOS transistors 202_1~202_4, 204_1~204_4 are classified as corresponding To the voltage division area Area_1, and both VC1 and VC2 will fall in the first conduction voltage range VR1.
第二金氧半導體電晶體206_1~206_4中每一金氧半導體電晶體所要導通之一導通電壓VC3均相同(亦即原本減少體效應所需之最佳基底電壓Vbulk_3均相同),以及第二金氧半導體電晶體208_1~208_4中每一金氧 半導體電晶體所要導通之一導通電壓VC4均相同(亦即原本減少體效應所需之最佳基底電壓Vbulk_4均相同),其中VC3不同於VC4,Vbulk_3不同於Vbulk_3,(1/2)*VDDA<Vbulk_3≦(3/4)*VDDA,以及(1/2)*VDDA<Vbulk_4≦(3/4)*VDDA,因此,第二金氧半導體電晶體206_1~206_4、208_1~208_4係歸類為對應至分壓區域Area_2,且VC3與VC4均會落於不同於第一導通電壓範圍VR1之第二導通電壓範圍VR2。 Each of the second oxynitride transistors 206_1~206_4 has a same on-voltage VC3 for each of the MOS transistors (ie, the optimum substrate voltage Vbulk_3 required to reduce the body effect is the same), and the second gold Each of the oxygen semiconductor transistors 208_1~208_4 The turn-on voltage VC4 of the semiconductor transistor to be turned on is the same (that is, the optimum substrate voltage Vbulk_4 required to reduce the body effect is the same), wherein VC3 is different from VC4, Vbulk_3 is different from Vbulk_3, (1/2)*VDDA< Vbulk_3≦(3/4)*VDDA, and (1/2)*VDDA<Vbulk_4≦(3/4)*VDDA, therefore, the second MOS transistors 206_1~206_4, 208_1~208_4 are classified as corresponding To the voltage division area Area_2, and both VC3 and VC4 will fall in the second conduction voltage range VR2 different from the first conduction voltage range VR1.
電路200另包含有一電壓產生器210,用以產生第一基底電壓(例如VDDA)以及第二基底電壓(例如(3/4)*VDDA),本實施例中,電壓產生器210可利用一分壓電路212來對第一基底電壓進行分壓,以產生第二基底電壓。對應同一分壓區域Area_1之所有的金氧半導體電晶體(例如第一金氧半導體電晶體202_1~202_4、204_1~204_4)會被給予相同的第一基底電壓,而對應同一分壓區域Area_2之所有的金氧半導體電晶體(例如第二金氧半導體電晶體206_1~206_4、208_1~208_4)則會被給予相同的第二基底電壓(3/4)*VDDA。 The circuit 200 further includes a voltage generator 210 for generating a first substrate voltage (for example, VDDA) and a second substrate voltage (for example, (3/4)*VDDA). In this embodiment, the voltage generator 210 can utilize one point. The voltage circuit 212 divides the first substrate voltage to generate a second substrate voltage. All the MOS transistors (for example, the first MOS transistors 202_1~202_4, 204_1~204_4) corresponding to the same voltage dividing area Area_1 are given the same first substrate voltage, and corresponding to the same voltage dividing area Area_2. The MOS transistors (eg, the second MOS transistors 206_1~206_4, 208_1~208_4) are given the same second substrate voltage (3/4)*VDDA.
基於上述實施例,本發明的電路200可適用於數位類比轉換器或多工器,利用分壓方式將基底電壓分配給不同分壓區域之金氧半導體電晶體來降低體效應,由於對應同一分壓區域之金氧半導體電晶體會共用同一基底電壓,因此可減少分壓電路(例如分壓電阻)的使用,故不會造成面積使用過多的問題。 Based on the above embodiments, the circuit 200 of the present invention can be applied to a digital analog converter or a multiplexer, and the substrate voltage is distributed to the MOS transistors of different voltage division regions by a voltage division method to reduce the body effect, since the same point is The MOS transistors in the nip region share the same substrate voltage, so that the use of a voltage dividing circuit (for example, a voltage dividing resistor) can be reduced, so that the problem of excessive use of the area is not caused.
以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。 The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.
200‧‧‧電路 200‧‧‧ circuit
202_1~202_4、204_1~204_4‧‧‧第一金氧半導體電晶體 202_1~202_4, 204_1~204_4‧‧‧first MOS transistor
206_1~206_4、208_1~208_4‧‧‧第二金氧半導體電晶體 206_1~206_4, 208_1~208_4‧‧‧Second MOS transistor
210‧‧‧電壓產生器 210‧‧‧Voltage generator
212‧‧‧分壓電路 212‧‧‧voltage circuit
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW469627B (en) * | 2001-01-19 | 2001-12-21 | Taiwan Semiconductor Mfg | Voltage regulator with low sensitivity to body effect |
TW564434B (en) * | 2002-02-22 | 2003-12-01 | Ememory Technology Inc | Charge pump circuit without body effects |
CN101888239A (en) * | 2009-05-13 | 2010-11-17 | 奇景光电股份有限公司 | Output buffer, source electrode driver and electronic system |
CN102696242A (en) * | 2010-02-26 | 2012-09-26 | 唯听助听器公司 | Hearing aid with adaptive bulk biasing power management |
-
2013
- 2013-03-29 TW TW102111502A patent/TWI564691B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW469627B (en) * | 2001-01-19 | 2001-12-21 | Taiwan Semiconductor Mfg | Voltage regulator with low sensitivity to body effect |
TW564434B (en) * | 2002-02-22 | 2003-12-01 | Ememory Technology Inc | Charge pump circuit without body effects |
CN101888239A (en) * | 2009-05-13 | 2010-11-17 | 奇景光电股份有限公司 | Output buffer, source electrode driver and electronic system |
CN102696242A (en) * | 2010-02-26 | 2012-09-26 | 唯听助听器公司 | Hearing aid with adaptive bulk biasing power management |
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