TWI563354B - - Google Patents
Info
- Publication number
- TWI563354B TWI563354B TW104140695A TW104140695A TWI563354B TW I563354 B TWI563354 B TW I563354B TW 104140695 A TW104140695 A TW 104140695A TW 104140695 A TW104140695 A TW 104140695A TW I563354 B TWI563354 B TW I563354B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014247240A JP5885043B1 (en) | 2014-12-05 | 2014-12-05 | Resist stripper and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201629645A TW201629645A (en) | 2016-08-16 |
| TWI563354B true TWI563354B (en) | 2016-12-21 |
Family
ID=55457029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW104140695A TW201629645A (en) | 2014-12-05 | 2015-12-04 | Photoresist stripping solution |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP5885043B1 (en) |
| TW (1) | TW201629645A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020194419A1 (en) * | 2019-03-25 | 2020-10-01 | パナソニックＩｐマネジメント株式会社 | Resist stripping solution |
| CN116179286A (en) * | 2022-12-05 | 2023-05-30 | 湖北兴福电子材料股份有限公司 | Hydroxylamine-free water-based cleaning agent |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000284506A (en) * | 1999-03-31 | 2000-10-13 | Sharp Corp | Photoresist stripper composition and stripping method |
| JP2004252369A (en) * | 2003-02-21 | 2004-09-09 | Mitsubishi Gas Chem Co Inc | Surface treating agent containing starch sirup |
| KR20080051250A (en) * | 2006-12-05 | 2008-06-11 | 동우 화인켐 주식회사 | Photoresist stripper composition and exfoliation method of a photoresist using it |
| KR20080054714A (en) * | 2006-12-13 | 2008-06-19 | 동우 화인켐 주식회사 | Alkali compositions for stripping of resist |
| KR20080076016A (en) * | 2007-02-14 | 2008-08-20 | 동우 화인켐 주식회사 | Photoresist stripper composition and exfoliation method of a photoresist using it |
| JP2009217267A (en) * | 2008-03-07 | 2009-09-24 | Air Products & Chemicals Inc | Stripper for dry film removal |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5575318B1 (en) * | 2013-09-02 | 2014-08-20 | パナソニック株式会社 | Resist stripper |
-
2014
- 2014-12-05 JP JP2014247240A patent/JP5885043B1/en active Active
-
2015
- 2015-12-04 TW TW104140695A patent/TW201629645A/en unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000284506A (en) * | 1999-03-31 | 2000-10-13 | Sharp Corp | Photoresist stripper composition and stripping method |
| JP2004252369A (en) * | 2003-02-21 | 2004-09-09 | Mitsubishi Gas Chem Co Inc | Surface treating agent containing starch sirup |
| KR20080051250A (en) * | 2006-12-05 | 2008-06-11 | 동우 화인켐 주식회사 | Photoresist stripper composition and exfoliation method of a photoresist using it |
| KR20080054714A (en) * | 2006-12-13 | 2008-06-19 | 동우 화인켐 주식회사 | Alkali compositions for stripping of resist |
| KR20080076016A (en) * | 2007-02-14 | 2008-08-20 | 동우 화인켐 주식회사 | Photoresist stripper composition and exfoliation method of a photoresist using it |
| JP2009217267A (en) * | 2008-03-07 | 2009-09-24 | Air Products & Chemicals Inc | Stripper for dry film removal |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016109870A (en) | 2016-06-20 |
| TW201629645A (en) | 2016-08-16 |
| JP5885043B1 (en) | 2016-03-15 |