TWI560516B - - Google Patents

Info

Publication number
TWI560516B
TWI560516B TW101110442A TW101110442A TWI560516B TW I560516 B TWI560516 B TW I560516B TW 101110442 A TW101110442 A TW 101110442A TW 101110442 A TW101110442 A TW 101110442A TW I560516 B TWI560516 B TW I560516B
Authority
TW
Taiwan
Application number
TW101110442A
Other languages
Chinese (zh)
Other versions
TW201303489A (en
Inventor
Hiroyuki Miura
Yoshiko Miya
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW201303489A publication Critical patent/TW201303489A/en
Application granted granted Critical
Publication of TWI560516B publication Critical patent/TWI560516B/zh

Links

TW101110442A 2011-04-19 2012-03-26 Photosensitive resin composition TW201303489A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011092729 2011-04-19

Publications (2)

Publication Number Publication Date
TW201303489A TW201303489A (en) 2013-01-16
TWI560516B true TWI560516B (en) 2016-12-01

Family

ID=47030111

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101110442A TW201303489A (en) 2011-04-19 2012-03-26 Photosensitive resin composition

Country Status (3)

Country Link
JP (1) JP2012234154A (en)
CN (1) CN102749807A (en)
TW (1) TW201303489A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102981367A (en) * 2012-12-05 2013-03-20 北京化工大学常州先进材料研究院 Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator
US20160131974A1 (en) * 2013-06-04 2016-05-12 Hitachi Chemical Company, Ltd. Method of manufacturing transparent substrate provided with cured film, photosensitive resin composition, photosensitive element, and electrical component
JP6630088B2 (en) * 2015-08-26 2020-01-15 旭化成株式会社 Photosensitive resin composition
JP7043977B2 (en) * 2018-05-31 2022-03-30 東洋インキＳｃホールディングス株式会社 Red coloring composition for color filters, and color filters

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101685255A (en) * 2008-09-22 2010-03-31 富士胶片株式会社 Coloring photosensitive composition, color filter and liquid crystal display
TW201035683A (en) * 2009-02-18 2010-10-01 Jsr Corp Colored radiation-sensitive composition, color filter and color liquid crystal display element
TW201105753A (en) * 2009-06-04 2011-02-16 Fujifilm Corp Ink set, color filter and process for preparing color filter, and liquid crystal display and image display device using color filter
TW201129868A (en) * 2009-12-18 2011-09-01 Fujifilm Corp Light-shielding curable composition, wafer level lens and light-shielding color filter

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3719844A1 (en) * 1987-06-13 1988-12-29 Basf Ag CROSSLINKABLE MIXTURE BY PHOTOPOLYMERSISATION
CN101416112B (en) * 2006-03-30 2013-09-04 西巴控股有限公司 Photosenstive resist composition for color filters for use in electronic paper display devices
US8187770B2 (en) * 2007-10-19 2012-05-29 The Regents Of The University Of California High performance, crosslinked polymeric material for holographic data storage
JP5284833B2 (en) * 2008-03-31 2013-09-11 富士フイルム株式会社 Photospacer manufacturing method
CN101872114B (en) * 2009-04-24 2012-03-28 中芯国际集成电路制造(上海)有限公司 Mask plate layout for manufacturing metal interconnecting wires

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101685255A (en) * 2008-09-22 2010-03-31 富士胶片株式会社 Coloring photosensitive composition, color filter and liquid crystal display
TW201035683A (en) * 2009-02-18 2010-10-01 Jsr Corp Colored radiation-sensitive composition, color filter and color liquid crystal display element
TW201105753A (en) * 2009-06-04 2011-02-16 Fujifilm Corp Ink set, color filter and process for preparing color filter, and liquid crystal display and image display device using color filter
TW201129868A (en) * 2009-12-18 2011-09-01 Fujifilm Corp Light-shielding curable composition, wafer level lens and light-shielding color filter

Also Published As

Publication number Publication date
CN102749807A (en) 2012-10-24
TW201303489A (en) 2013-01-16
JP2012234154A (en) 2012-11-29

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees