TWI560267B - - Google Patents

Info

Publication number
TWI560267B
TWI560267B TW100107551A TW100107551A TWI560267B TW I560267 B TWI560267 B TW I560267B TW 100107551 A TW100107551 A TW 100107551A TW 100107551 A TW100107551 A TW 100107551A TW I560267 B TWI560267 B TW I560267B
Authority
TW
Taiwan
Application number
TW100107551A
Other languages
Chinese (zh)
Other versions
TW201237159A (en
Inventor
Fu-Hua Liu
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW100107551A priority Critical patent/TW201237159A/zh
Publication of TW201237159A publication Critical patent/TW201237159A/zh
Application granted granted Critical
Publication of TWI560267B publication Critical patent/TWI560267B/zh

Links

TW100107551A 2011-03-07 2011-03-07 Automatic water-based solution washing method applicable to surface mount solder paste printing device TW201237159A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100107551A TW201237159A (en) 2011-03-07 2011-03-07 Automatic water-based solution washing method applicable to surface mount solder paste printing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100107551A TW201237159A (en) 2011-03-07 2011-03-07 Automatic water-based solution washing method applicable to surface mount solder paste printing device

Publications (2)

Publication Number Publication Date
TW201237159A TW201237159A (en) 2012-09-16
TWI560267B true TWI560267B (https=) 2016-12-01

Family

ID=47223045

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100107551A TW201237159A (en) 2011-03-07 2011-03-07 Automatic water-based solution washing method applicable to surface mount solder paste printing device

Country Status (1)

Country Link
TW (1) TW201237159A (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200306348A (en) * 2002-03-25 2003-11-16 Advanced Tech Materials PH buffered compositions useful for cleaning residue from semiconductor substrates
TWI287138B (en) * 2005-10-17 2007-09-21 Chi Mei Optoelectronics Corp Cleaning apparatus for roller of PI equipment
CN101824142A (zh) * 2010-04-14 2010-09-08 合肥工业大学 一种生物可降解聚乙二醇酯及其制备方法和用途
TW201102124A (en) * 2009-06-01 2011-01-16 Kao Corp Method for cleansing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200306348A (en) * 2002-03-25 2003-11-16 Advanced Tech Materials PH buffered compositions useful for cleaning residue from semiconductor substrates
TWI287138B (en) * 2005-10-17 2007-09-21 Chi Mei Optoelectronics Corp Cleaning apparatus for roller of PI equipment
TW201102124A (en) * 2009-06-01 2011-01-16 Kao Corp Method for cleansing
CN101824142A (zh) * 2010-04-14 2010-09-08 合肥工业大学 一种生物可降解聚乙二醇酯及其制备方法和用途

Also Published As

Publication number Publication date
TW201237159A (en) 2012-09-16

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees