TWI556962B - Polyimide substrate and display substrate module including the same - Google Patents

Polyimide substrate and display substrate module including the same Download PDF

Info

Publication number
TWI556962B
TWI556962B TW104144514A TW104144514A TWI556962B TW I556962 B TWI556962 B TW I556962B TW 104144514 A TW104144514 A TW 104144514A TW 104144514 A TW104144514 A TW 104144514A TW I556962 B TWI556962 B TW I556962B
Authority
TW
Taiwan
Prior art keywords
group
polyimide
layer
substrate according
substrate
Prior art date
Application number
TW104144514A
Other languages
Chinese (zh)
Other versions
TW201627163A (en
Inventor
禹學龍
安祥鉉
鄭鶴基
Original Assignee
可隆股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 可隆股份有限公司 filed Critical 可隆股份有限公司
Publication of TW201627163A publication Critical patent/TW201627163A/en
Application granted granted Critical
Publication of TWI556962B publication Critical patent/TWI556962B/en

Links

Description

聚醯亞胺基板及包含該聚醯亞胺基板的顯示基板模組 Polyimide substrate and display substrate module comprising the same

本發明係關於一種聚醯亞胺基板及包含該聚醯亞胺基板的顯示基板模組,更具體地,係關於一種彎曲性及耐衝擊性優異而能夠有效用作可撓性電子儀器的覆蓋基板的聚醯亞胺基板及包含該聚醯亞胺基板的顯示基板模組。 The present invention relates to a polyimide substrate and a display substrate module including the polyimide substrate, and more particularly to an excellent flexibility and impact resistance, which can be effectively used as a cover for flexible electronic equipment. A polyimide substrate of a substrate and a display substrate module including the polyimide substrate.

近來,作為新一代顯示器中的一種能夠折彎的電子儀器正受到青睞,包括以可撓性(Flexible)有機發光二極體為代表的可撓性光電元件、輕量型顯示器、可撓性封裝材料、彩色電子紙顯示幕(Color EPD)、塑膠顯示幕(Plastic LCD)、TSP及OPV等可撓性電子儀器。這種能夠彎折的可撓性類型顯示裝置不僅需要能夠顯示,而且為了保護底部元件,還需要一種能夠替代現有玻璃覆蓋基板的新型可撓性覆蓋基板。與此同時,為了保護包含在顯示器裝置中的元件,此種基板需要維持低的透濕性、耐化學性及透光率。 Recently, electronic devices that can be bent in a new generation of displays are favored, including flexible photovoltaic elements represented by flexible organic light-emitting diodes, lightweight displays, and flexible packages. Flexible electronic instruments such as materials, color EPD, plastic LCD, TSP and OPV. Such a bendable flexible type display device requires not only display, but also a novel flexible cover substrate that can replace the existing glass cover substrate in order to protect the bottom member. At the same time, in order to protect the components included in the display device, such a substrate needs to maintain low moisture permeability, chemical resistance, and light transmittance.

作為這種撓性顯示器覆蓋基板的材料,已有多種高硬度的塑膠基板被作為候選材料進行研究,其中,以能夠實現高硬度的透明聚醯亞胺薄膜作為主要的候選材料。但是,透明塑膠基板與玻璃相比具有低的表面硬度,因此,在確保耐磨性方面受到限制。為此,用於提高高分子薄膜表面硬度的高硬度塗層,即,硬塗層技術成為重要的問題。 As a material for such a flexible display covering substrate, a variety of high-hardness plastic substrates have been studied as candidate materials, and a transparent polyimide film capable of achieving high hardness has been mainly used as a candidate material. However, the transparent plastic substrate has a low surface hardness as compared with glass, and therefore, it is limited in securing wear resistance. For this reason, a high hardness coating for improving the surface hardness of a polymer film, that is, a hard coat technique becomes an important problem.

以提高塑膠基板的表面硬度作為目的,韓國專利第 2010-0041992號揭露一種包含紫外線固化性聚氨酯丙烯酸酯類低聚物的高硬度塗層的薄膜組合物。國際專利公開公報第WO2013-187699號揭露一種脂環族環氧基的高硬度矽氧烷樹脂組合物及其製備方法和包含所述固化物的光學薄膜。 In order to improve the surface hardness of plastic substrates, Korean Patent No. A film composition comprising a high-hardness coating of an ultraviolet curable urethane acrylate oligomer is disclosed in 2010-0041992. International Patent Publication No. WO2013-187699 discloses an alicyclic epoxy group high hardness decane resin composition, a process for producing the same, and an optical film comprising the cured product.

如上所述,一直以來,大部分所採用的製造方法為,直接在透明薄膜的表面上形成丙烯酸類或環氧基類有機固化膜以提高其硬度。但是,在塑膠基板上直接形成與塑膠基板相較強度差異大的丙烯酸類或環氧基類有機固化膜的情況下,不僅會限制塑膠基板的柔韌性,而且塗層不能夠彎曲,因此,在對彎曲性或耐衝擊性等進行評價時,會引起表面裂開的問題。 As described above, most of the conventionally employed production methods are to form an acrylic or epoxy-based organic cured film directly on the surface of a transparent film to increase its hardness. However, when an acrylic or epoxy-based organic cured film having a large difference in strength from a plastic substrate is directly formed on a plastic substrate, not only the flexibility of the plastic substrate but also the coating cannot be bent, therefore, When the bending property, the impact resistance, and the like are evaluated, there is a problem that the surface is cracked.

為此,本發明在於提供一種能直接在聚醯亞胺薄膜上形成硬塗層的基板,同時可維持彎曲性、表面硬度及耐化學性外,還能夠提高光學特性及水分阻斷性的聚醯亞胺基板。 Accordingly, the present invention provides a substrate capable of forming a hard coat layer directly on a polyimide film while maintaining flexibility, surface hardness and chemical resistance, and also capable of improving optical properties and moisture barrier properties. Yttrium imide substrate.

為了解決上述技術問題,本發明較佳的第1具體實施例提供一種聚醯亞胺基板。該聚醯亞胺基板包含聚醯亞胺層;以及在該聚醯亞胺層的至少一面上包含下述化學式1所示的矽氮烷-矽氧烷化合物的光學底漆層。 In order to solve the above technical problems, a preferred first embodiment of the present invention provides a polyimide substrate. The polyimide substrate comprises a polyimide layer; and an optical primer layer comprising a ceria azide-oxane compound represented by the following Chemical Formula 1 on at least one side of the polyimide layer.

<化學式1>-{R-(Si-NH)-R}m-{R`-(Si-O)-R`}n- <Chemical Formula 1>-{R-(Si-NH)-R} m -{R`-(Si-O)-R'} n -

在所述化學式1中,R為包含選自羥基(Hydroxyl)、乙烯基(Vinyl)、丙烯醯基(Acryl)、環氧基(Epoxy)及胺基(Amino)所組成群組中至少一種的氨基甲酸乙酯基(Urethane),R`為包含羥基(Hydroxyl)、乙烯基 (Vinyl)、丙烯醯基(Acryl)、環氧基(Epoxy)及胺基(Amino)所組成群組中至少一種的氰酸酯基(cyanate),m及n為1至10的整數。 In the chemical formula 1, R is at least one selected from the group consisting of a hydroxyl group, a vinyl group, a hydroxy group (Acryl group), an epoxy group (Epoxy group), and an amino group (Amino group). Urethane, R` is a hydroxyl group (Hydroxyl), vinyl A cyanate of at least one of the group consisting of (Vinyl), Acryl, Epoxy, and Amino, and m and n are integers of 1 to 10.

根據上述第1具體實施例的聚醯亞胺基板可以進一步包含一硬塗層。 The polyimide substrate according to the above first embodiment may further comprise a hard coat layer.

此外,本發明較佳的第2具體實施例為一種顯示基板模組,包含透明黏附層、黑色遮光層及上述第1具體實施例的聚醯亞胺基板。 Further, a preferred second embodiment of the present invention is a display substrate module comprising a transparent adhesive layer, a black light shielding layer, and the polyimide substrate of the first embodiment.

本發明能夠提供一種具有優異的彎曲性及耐衝擊性的同時,還具有耐溶劑性、光學特性、水分阻斷特性及耐擦傷性的透明聚醯亞胺基板。根據本發明的透明聚醯亞胺基板可以有效地用作可撓性電子儀器的覆蓋基板,由此,並能夠提供一種彎曲性及耐衝擊性優異的可撓性顯示基板模組。 The present invention can provide a transparent polyimide substrate having excellent flexibility and impact resistance as well as solvent resistance, optical properties, moisture barrier properties, and scratch resistance. The transparent polyimide substrate according to the present invention can be effectively used as a cover substrate for a flexible electronic device, and thus can provide a flexible display substrate module excellent in flexibility and impact resistance.

10‧‧‧聚醯亞胺層 10‧‧‧ Polyimine layer

20‧‧‧光學底漆層 20‧‧‧Optical primer layer

30‧‧‧硬塗層 30‧‧‧hard coating

40‧‧‧透明黏附層 40‧‧‧Transparent adhesive layer

50‧‧‧黑色遮光層 50‧‧‧Black shading

第1圖為本發明實施例中包含聚醯亞胺基板的顯示基板模組的結構示意圖。 FIG. 1 is a schematic structural view of a display substrate module including a polyimide substrate according to an embodiment of the present invention.

根據本發明的一個具體實施方式,提供一種聚醯亞胺基板。該聚醯亞胺基板包含聚醯亞胺層;以及在該聚醯亞胺層的至少一面上包含矽氮烷-矽氧烷化合物的光學底漆層。 According to a specific embodiment of the present invention, a polyimide substrate is provided. The polyimide substrate comprises a polyimide layer; and an optical primer layer comprising a ceria azide-oxirane compound on at least one side of the polyimide layer.

在本發明中,該聚醯亞胺層是由聚醯亞胺薄膜形成的,可以經由二胺和二酐酸聚合後進行醯亞胺化來獲得通常所使用的聚醯亞胺薄膜。本發明的聚醯亞胺層,在具有聚醯亞胺樹脂所固有的耐熱特性的同時,係不帶黃色的無色透明聚醯亞胺薄膜,其可以不受限制地使用。以薄膜厚度10至100μm為基準,用UV分光光度計在350至700nm下測定的平均透光 率為85%以上,黃度指數為5以下;根據熱變機械分析法(TMA-Method),在50至205℃下測定的平均熱膨脹係數(CTE)為50.0ppm/℃以下的聚醯亞胺薄膜為更佳。 In the present invention, the polyimine layer is formed of a polyimide film, and can be obtained by polymerization of a diamine and a dianhydride acid to obtain a polyimide film which is generally used. The polyimine layer of the present invention is a colorless transparent polyimide film having no yellow color, and has a heat-resistant property inherent to the polyimide resin, and can be used without limitation. Average light transmission measured with a UV spectrophotometer at 350 to 700 nm based on a film thickness of 10 to 100 μm The rate is 85% or more, and the yellowness index is 5 or less; according to the thermal mechanical analysis method (TMA-Method), the polythenimine having a coefficient of thermal expansion (CTE) of 50.0 ppm/° C. or less measured at 50 to 205 ° C is obtained. The film is better.

如果,聚醯亞胺層的厚度基於10至100μm,平均透光率不足85%或黃度指數超過5的情況下,會產生因透明度下降而無法用於顯示或光學元件等的問題。如果平均熱膨脹係數(CTE)超過50.0ppm/℃的情況下,則與可撓性基板間的熱膨脹係數也會變大,因而存在元件過熱或在高溫時產生短路的疑慮。 If the thickness of the polyimide layer is 10 to 100 μm, the average light transmittance is less than 85%, or the yellowness index exceeds 5, there is a problem that the transparency may be lowered and it may not be used for display or optical elements. When the average coefficient of thermal expansion (CTE) exceeds 50.0 ppm/° C., the coefficient of thermal expansion with the flexible substrate also increases, and thus there is a fear that the element is overheated or short-circuited at a high temperature.

在本發明中,所述矽氮烷-矽氧烷化合物可以如下述化學式1所示。採用凝膠滲透層析儀(gel permeation chromatography,GPC)所測定的重量平均分子量較佳為500至500,000g/mol。 In the present invention, the indole azide-anthracene compound may be represented by the following Chemical Formula 1. The weight average molecular weight measured by gel permeation chromatography (GPC) is preferably from 500 to 500,000 g/mol.

<化學式1>-{R-(Si-NH)-R}m-{R`-(Si-O)-R`}n- <Chemical Formula 1>-{R-(Si-NH)-R} m -{R`-(Si-O)-R'} n -

在所述化學式1中,R為包含選自羥基、乙烯基、丙烯醯基、環氧基及胺基所組成群組中至少一種的氨基甲酸乙酯基,R`為包含羥基、乙烯基、丙烯醯基、環氧基及胺基所組成群組中至少一種的氰酸酯基,m及n為1至10的整數。 In the chemical formula 1, R is a urethane group containing at least one selected from the group consisting of a hydroxyl group, a vinyl group, a propylene group, an epoxy group, and an amine group, and R' is a hydroxyl group, a vinyl group, or the like. A cyanate group of at least one of the group consisting of an acryl group, an epoxy group, and an amine group, and m and n are integers of 1 to 10.

如果所述化學式1所示的矽氮烷-矽氧烷化合物的重量平均分子量不足500g/mol時,其耐溶劑性、耐熱性及水分阻斷性的提升效果甚微,如果超過50,000g/mol時,因疏水特性提高而會使與其他化合物的黏附性不足。由於這種矽氮烷-矽氧烷化合物具有高密度的結構,能夠提高基板的耐化學性,並且與基板相比顯示出較低的折射率,並且因其與基板之間的相長干涉而能夠進一步提高聚醯亞胺薄膜的光學特性。 If the weight average molecular weight of the decazane-hydroxane compound represented by Chemical Formula 1 is less than 500 g/mol, the solvent resistance, heat resistance, and moisture barrier property are less enhanced, if it exceeds 50,000 g/mol. When the hydrophobic property is improved, the adhesion to other compounds is insufficient. Since the decazane-nonane compound has a high density structure, the chemical resistance of the substrate can be improved, and a lower refractive index is exhibited as compared with the substrate, and due to the constructive interference with the substrate. The optical properties of the polyimide film can be further improved.

在本發明中,將矽氮烷-矽氧烷化合物溶於有機溶劑後進行塗佈,此時,適合使用的有機溶劑有異丙醇(IPA)、丙二醇甲醚(Propylene glycol monomethyl ether,PGME)、丙二醇甲醚醋酸酯(Propylene Glycol Methyl Ether Acetate,PGMEA)、N-丁醇、戊醇、甲基乙基酮(MEK)、丙酮、甲醇、乙醇等。此時,可以根據欲塗佈的厚度來選擇有機溶劑量,較佳以溶液總重量計,可以為0.5至90重量%,更佳可以為1至50重量%,最佳可以為1至20重量%。如果有機溶劑的量不足0.5重量%時,因塗佈時不會均勻地形成而會在基材表面引起厚度偏差,如果超過90重量%時,會因高的黏度而難以進行塗佈。 In the present invention, the indole azide-decane compound is dissolved in an organic solvent and then coated. At this time, an organic solvent suitable for use is isopropyl alcohol (IPA) or propylene glycol monomethyl ether (PGME). Propylene glycol methyl ether acetate (Propylene Glycol) Methyl Ether Acetate, PGMEA), N-butanol, pentanol, methyl ethyl ketone (MEK), acetone, methanol, ethanol, and the like. At this time, the amount of the organic solvent may be selected depending on the thickness to be applied, preferably from 0.5 to 90% by weight, more preferably from 1 to 50% by weight, most preferably from 1 to 20% by weight based on the total weight of the solution. %. When the amount of the organic solvent is less than 0.5% by weight, thickness unevenness may occur on the surface of the substrate due to uneven formation during coating, and if it exceeds 90% by weight, coating may be difficult due to high viscosity.

此外,在本發明中,為了確保耐溶劑性及光學特性且提高水分阻斷特性,包含所述矽氮烷-矽氧烷化合物的光學底漆層的厚度較佳為0.1μm以上,而為了防止聚醯亞胺覆蓋基板光學特性的降低及捲曲(curl)的發生,較佳將厚度設為3μm以下。所述光學底漆層可以形成在聚醯亞胺薄膜的下面或上面,也可以形成在兩面上。根據本發明之包含光學底漆層的聚醯亞胺基板以CM-3700D測定標準的黃度指數為2.5以下,並且,在350至700nm下可以顯示出透光率為85至93%的優異光學特性。 Further, in the present invention, in order to secure solvent resistance and optical properties and to improve moisture blocking characteristics, the thickness of the optical primer layer containing the ceria azide-decane compound is preferably 0.1 μm or more, and to prevent The polyimine coated substrate has a reduced optical property and a curl, and preferably has a thickness of 3 μm or less. The optical primer layer may be formed under or on the polyimide film, or may be formed on both sides. The polyimide substrate comprising the optical primer layer according to the present invention has a yellowness index of 2.5 or less as measured by the CM-3700D standard, and excellent optical transmittance of 85 to 93% at 350 to 700 nm. characteristic.

在本發明中,可以噴塗法、棒塗法、旋塗法、浸塗法等多種方法中選擇適合的方法來塗佈所述光學底漆層,對於塗佈方式來說,只要是通常所採用的方式皆可使用,並未有特別的限制。對於所述光學底漆層來說,在200至300℃下進行熱處理以進行固化時,有利於分子內形成具有網狀的結構,並且能夠使膜的性質變得更強,進而使耐化學性及耐熱性變得優異。 In the present invention, the optical primer layer may be applied by a suitable method such as a spray coating method, a bar coating method, a spin coating method, or a dip coating method, and the coating method is generally used. The methods are all available and there are no special restrictions. For the optical primer layer, when heat treatment is performed at 200 to 300 ° C for curing, it is advantageous to form a network having a structure in the molecule, and to make the properties of the film stronger, thereby making chemical resistance. And heat resistance becomes excellent.

根據本發明的一個較佳實施方式,該聚醯亞胺基板藉由進一步包含硬塗層,能夠確保耐化學性及耐衝擊性,並且,基於JIS K56000測定標準,可以顯示出5H至10H的表面硬度。但是,應使硬塗層形成於基板的表面,並如上所述在聚醯亞胺層上同時形成光學底漆層和硬塗層,其與只形成了硬塗層的聚醯亞胺基板相比,能夠在維持透光率及黃度指數等光學特性的同時,還能夠使於ASTM E96BW測定標準下使所測定的水氣穿透率降至0.001至10g/m2*day。由於本發明的聚醯亞胺基板能夠顯示出上述範圍的低水氣穿透率,對保護TFT及OLED元件免受外部濕氣環境的損傷方面更為有利。 According to a preferred embodiment of the present invention, the polyimide substrate can ensure chemical resistance and impact resistance by further including a hard coat layer, and can exhibit a surface of 5H to 10H based on the JIS K56000 measurement standard. hardness. However, a hard coat layer should be formed on the surface of the substrate, and an optical primer layer and a hard coat layer are simultaneously formed on the polyimide layer as described above, which is combined with a polyimide substrate having only a hard coat layer formed thereon. In comparison with the optical characteristics such as the light transmittance and the yellowness index, the measured water vapor permeability can be reduced to 0.001 to 10 g/m 2 *day under the ASTM E96BW measurement standard. Since the polyimide substrate of the present invention can exhibit a low water vapor permeability in the above range, it is more advantageous in protecting the TFT and the OLED element from damage from an external moisture environment.

此時,本發明的硬塗層可以是由包含下述化學式2所示的烷氧基矽烷及下述化學式3所示的烷氧基金屬的混合物或化學反應物的矽氧烷樹脂形成的。 In this case, the hard coat layer of the present invention may be formed of a rhodium oxide resin containing a mixture or a chemical reactant of an alkoxysilane represented by the following Chemical Formula 2 and an alkoxide metal represented by the following Chemical Formula 3.

在所述化學式2至3中,R1為包含環氧基、丙烯醯基及異氰酸酯基的直鏈型、支鏈型、脂環族及芳香族的有機化合物,R2及R3為包含氧或氮等雜化合物(heterocompound)的直鏈型、支鏈型、脂環族C1至C8的烷基,n為1至3的整數,此外,M為包括過渡金屬的金屬元素,m為1至10的整數。 In the chemical formulas 2 to 3, R1 is a linear, branched, alicyclic, and aromatic organic compound containing an epoxy group, an acryloyl group, and an isocyanate group, and R2 and R3 are oxygen or nitrogen. a linear, branched, alicyclic C1 to C8 alkyl group of a heterocompound, n is an integer of 1 to 3, and further, M is a metal element including a transition metal, and m is an integer of 1 to 10. .

在本發明中,可單獨以所述化學式2的烷氧基矽烷進行聚合反應來製備所述矽氧烷樹脂。在聚合反應時,也可以加入上述化學式2所示的烷氧基金屬來製備成具有金屬元素化學鍵的矽氧烷樹脂。這種矽氧烷樹脂的形成反應可以在常溫下進行,但是為了促進反應,也可以在50℃至120℃下攪拌反應1小時至120小時。 In the present invention, the decyl alkane resin can be produced by carrying out a polymerization reaction using the alkoxy decane of the above Chemical Formula 2 alone. At the time of the polymerization reaction, a metal alkoxide represented by the above Chemical Formula 2 may be added to prepare a decane resin having a chemical bond of a metal element. The formation reaction of the decane resin can be carried out at normal temperature, but in order to promote the reaction, the reaction can be stirred at 50 ° C to 120 ° C for 1 hour to 120 hours.

此外,在進行上述反應時,作為用於促進水解和縮合反應的催化劑,可以使用鹽酸、乙酸、氟化氫、磷酸、硫酸、碘酸等酸催化劑,氨、氫氧化鉀、氫氧化鈉、氫氧化鋇及咪唑等鹼催化劑,以及灰黃琥珀(Amberite)等離子交換樹脂。這些催化劑可以單獨使用也可以組合使用。催化劑的量不受特別的限制,但以矽氧烷樹脂為100重量份計,可以添加0.0001至約10重量份。 Further, in the above reaction, as a catalyst for promoting hydrolysis and condensation reaction, an acid catalyst such as hydrochloric acid, acetic acid, hydrogen fluoride, phosphoric acid, sulfuric acid or iodic acid may be used, ammonia, potassium hydroxide, sodium hydroxide or barium hydroxide. And a base catalyst such as imidazole, and an amberite plasma exchange resin. These catalysts may be used singly or in combination. The amount of the catalyst is not particularly limited, but 0.0001 to about 10 parts by weight may be added in terms of 100 parts by weight of the decane resin.

在進行水解和縮合反應時會產生醇的副產物,去除其可以降低逆反應而使正反應更快地進行,因此藉由其可以調節反應速度。此外, 在反應結束後,可以減壓並加熱的方式去除所述副產物。 When the hydrolysis and condensation reactions are carried out, by-products of the alcohol are produced, which can reduce the reverse reaction and allow the positive reaction to proceed more quickly, so that the reaction rate can be adjusted by this. In addition, After the reaction is completed, the by-products can be removed under reduced pressure and heating.

如上所述,對於通過縮合反應合成的所述矽氧烷樹脂,可以通過在反應時所添加的單體來調節其黏度和固化速度。藉此可以提供符合用途的最佳樹脂組合物。此外,通過上述反應獲得的矽氧烷樹脂能夠確保在交聯時分子間的空間,因此,可以防止因固化收縮所引起的捲曲現象,並且可以通過交聯金屬元素實現高的表面硬度。 As described above, for the naphthenic resin synthesized by the condensation reaction, the viscosity and the curing speed can be adjusted by the monomer added at the time of the reaction. Thereby, an optimum resin composition suitable for the purpose can be provided. Further, the decane resin obtained by the above reaction can ensure a space between molecules at the time of crosslinking, and therefore, curling due to curing shrinkage can be prevented, and high surface hardness can be achieved by crosslinking a metal element.

此外,根據本發明較佳的實施方式,為了所述矽氧烷樹脂的聚合,所述硬塗層用的樹脂組合物中可以進一步包含引發劑,例如,可以使用有機金屬鹽等光聚合引發劑和胺、咪唑等熱聚合引發劑。此時,引發劑的添加量不受特別的限制,但是以矽氧烷樹脂為100重量份計,可以添加約0.01至10重量份。 Further, according to a preferred embodiment of the present invention, for the polymerization of the decane resin, the resin composition for a hard coat layer may further contain an initiator, and for example, a photopolymerization initiator such as an organic metal salt may be used. And a thermal polymerization initiator such as an amine or an imidazole. At this time, the amount of the initiator to be added is not particularly limited, but may be added in an amount of about 0.01 to 10 parts by weight based on 100 parts by weight of the decyl alkane resin.

此外,為了控制所述矽氧烷樹脂的黏度以更加容易進行加工的同時,為了調節塗佈層的厚度,本發明的所述硬塗層用樹脂組合物可以進一步添加有機溶劑。有機溶劑的添加量不受特別的限制,可以使用丙酮、甲基乙基酮、甲基丁基酮、環己酮等酮類,或乙二醇甲醚、乙二醇丁醚等溶纖劑類,或乙醚和二惡烷等醚類,異丁醇、異丙醇、丁醇、甲醇等醇類,或二氯甲烷、氯仿、三氯乙烯等鹵化烴類,或正己烷、苯及甲苯等烴類中的一種以上。 Further, in order to control the viscosity of the decane resin to facilitate processing, the resin composition for a hard coat layer of the present invention may further contain an organic solvent in order to adjust the thickness of the coating layer. The amount of the organic solvent to be added is not particularly limited, and ketones such as acetone, methyl ethyl ketone, methyl butyl ketone, and cyclohexanone, or cellosolve such as ethylene glycol methyl ether or ethylene glycol butyl ether can be used. An ether such as diethyl ether or dioxane, an alcohol such as isobutanol, isopropanol, butanol or methanol, or a halogenated hydrocarbon such as dichloromethane, chloroform or trichloroethylene, or n-hexane, benzene or toluene. More than one of the hydrocarbons.

為了抑制由聚合反應引起的氧化反應,本發明的所述矽氧烷樹脂可以進一步包括抗氧化劑,還可以進一步包含均化劑或塗佈助劑,但並不限定於此。 In order to suppress the oxidation reaction caused by the polymerization reaction, the decane resin of the present invention may further include an antioxidant, and may further contain a leveling agent or a coating aid, but is not limited thereto.

本發明的所述硬塗層用樹脂組合物,在經過塗佈、鑄造、模塑等成型後,可以光聚合及熱聚合方式來製備為高硬度的塗佈固化物。在光聚合的情況下,光照射前先實施熱處理,可以獲得均勻的表面,所述熱處理可以在40℃以上約300℃以下的溫度下實施,照射的光量可以為50mJ/cm2以上20000mJ/cm2以下的條件下實施,但並不限定於此。此外,在熱聚合的情況下,可以在40℃以上約300℃以下的溫度下實施,但並不限於此。 The resin composition for a hard coat layer of the present invention can be prepared into a high-hardness coating cured product by photopolymerization and thermal polymerization after being subjected to coating, casting, molding, or the like. In the case of photopolymerization, heat treatment may be performed before light irradiation to obtain a uniform surface, and the heat treatment may be carried out at a temperature of 40 ° C or more and about 300 ° C or less, and the amount of light irradiated may be 50 mJ/cm 2 or more and 20000 mJ/cm. 2 is implemented under the following conditions, but is not limited thereto. Further, in the case of thermal polymerization, it may be carried out at a temperature of from 40 ° C to not more than 300 ° C, but is not limited thereto.

在本發明中,上述方式形成的硬塗層厚度較佳為10μm以 上,以確保優異的表面硬度、耐衝擊性及耐化學性。另外較佳為50μm以下,以防止折曲的產生及過度的硬直性。 In the present invention, the thickness of the hard coat layer formed by the above method is preferably 10 μm. Top to ensure excellent surface hardness, impact resistance and chemical resistance. Further, it is preferably 50 μm or less to prevent occurrence of buckling and excessive hardness.

進一步地,本發明可以提供一種包含透明黏附層、黑色遮光層及具有前述特性的聚醯亞胺基板的顯示基板模組,但並不限定於此。作為本發明的顯示基板模組的一例,可以按照如第1圖所示的那樣進行製備。即,將光學底漆層20、聚醯亞胺層10及硬塗層30依次層壓成聚醯亞胺基板,並將透明黏附層40及黑色遮光層50形成在光學底漆層的下面。 Furthermore, the present invention can provide a display substrate module including a transparent adhesive layer, a black light-shielding layer, and a polyimide substrate having the above characteristics, but is not limited thereto. As an example of the display substrate module of the present invention, it can be prepared as shown in Fig. 1. That is, the optical primer layer 20, the polyimide layer 10, and the hard coat layer 30 are sequentially laminated to form a polyimide substrate, and the transparent adhesive layer 40 and the black light shielding layer 50 are formed under the optical primer layer.

實施例Example

以下,通過實施例來對本發明更加詳細地進行說明。這些實施例僅是為了幫助更加具體地說明本發明,本發明並不僅限於這些實施例。 Hereinafter, the present invention will be described in more detail by way of examples. These examples are only intended to help the present invention more specifically, and the present invention is not limited to these examples.

<製備例1. 聚醯亞胺薄膜的製備> <Preparation Example 1. Preparation of Polyimine Film>

1-1:聚醯亞胺粉末的製備 1-1: Preparation of polyimine powder

將帶有攪拌器、氮注入裝置、滴液漏斗、溫度調節器及冷卻器的1L的反應器作為反應器,使氮氣通過該反應器的同時,加入832g的N,N-二甲基乙醯胺(DMAc)後,將反應器的溫度設置為25℃,然後,在其中溶解64.046g(0.2mol)的三氟甲基二氨基聯苯(TFDB),並使該溶液維持在25℃。在其中,加入31.09g(0.07mol)的2,2-雙(3,4-二羧基苯基)六氟丙烷二酐(6FDA)和8.83g(0.03mol)的聯苯四甲酸二酐,攪拌一定時間而進行溶解及反應。此時,溶液的溫度維持在25℃。然後,加入20.302g(0.1mol)對苯二甲醯氯(TPC),最終獲得固體成分濃度為13重量%的聚醯胺酸溶液。 A 1 L reactor equipped with a stirrer, a nitrogen injection device, a dropping funnel, a temperature regulator, and a cooler was used as a reactor, and while nitrogen gas was passed through the reactor, 832 g of N,N-dimethylacetonitrile was added. After the amine (DMAc), the temperature of the reactor was set to 25 ° C, and then 64.046 g (0.2 mol) of trifluoromethyldiaminobiphenyl (TFDB) was dissolved therein, and the solution was maintained at 25 °C. Thereto, 31.09 g (0.07 mol) of 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (6FDA) and 8.83 g (0.03 mol) of biphenyltetracarboxylic dianhydride were added and stirred. The dissolution and reaction are carried out for a certain period of time. At this time, the temperature of the solution was maintained at 25 °C. Then, 20.302 g (0.1 mol) of p-xylylene chloride (TPC) was added to finally obtain a polyglycine solution having a solid concentration of 13% by weight.

在上述聚醯胺酸溶液中加入25.6g的吡啶、33.1g的乙酸酐攪拌30分鐘後,再次在70℃下攪拌1小時,然後在常溫下進行冷卻,並將其用20L的甲醇進行沉澱,將沉澱的固體成分進行過濾並進行粉碎後,在100℃下,進行6小時真空乾燥,最終獲得111g固體成分粉末的聚醯亞胺。 25.6 g of pyridine and 33.1 g of acetic anhydride were added to the above polyamic acid solution for 30 minutes, and then stirred again at 70 ° C for 1 hour, and then cooled at normal temperature, and precipitated with 20 L of methanol. The precipitated solid component was filtered and pulverized, and then vacuum-dried at 100 ° C for 6 hours to finally obtain 111 g of a solid component powder of polyimine.

1-2:聚醯亞胺薄膜的製備 1-2: Preparation of polyimine film

在N,N-二甲基乙醯胺(DMAc)中,以0.1%的分散濃度來加入0.03g(0.03wt%)表面結合有OH基團的無定形二氧化矽顆粒,進行超音波處 理至溶液透明為止,然後,取100g上述獲得的固體成分粉末的聚醯亞胺,將其溶解於670g的N,N-二甲基乙醯胺(DMAc)中,最終獲得13wt%的溶液。將這樣獲得溶液塗佈在不銹鋼板上後,以340μm進行澆鑄(casting),並以130℃的熱風乾燥30分鐘後,將薄膜從不銹鋼板上剝離下來,並用針(pin)固定在架子上。 In N,N-dimethylacetamide (DMAc), 0.03 g (0.03 wt%) of amorphous cerium oxide particles having surface-bound OH groups were added at a dispersion concentration of 0.1% for ultrasonication. After the solution was allowed to be transparent, 100 g of the solid component powder of the above obtained polyimine was taken and dissolved in 670 g of N,N-dimethylacetamide (DMAc) to finally obtain a 13 wt% solution. The thus obtained solution was coated on a stainless steel plate, cast at 340 μm, and dried by hot air at 130 ° C for 30 minutes, and then the film was peeled off from the stainless steel plate and fixed to the shelf with a pin.

將固定有薄膜的架子放入真空烘箱中,從100℃至300℃緩慢加熱2小時,並緩慢地進行冷卻後從架子上分離下來,從而獲得聚醯亞胺薄膜。之後,通過最終的熱處理工序在300℃下再次進行30分鐘熱處理。此時,製得的聚醯亞胺薄膜的厚度為80μm,平均透光率為87%,黃度指數為4.5,根據TMA-Method在50至250℃下測定的平均熱膨脹係數(CTE)為20ppm/℃。 The film-attached shelf was placed in a vacuum oven, slowly heated from 100 ° C to 300 ° C for 2 hours, and slowly cooled and separated from the shelf to obtain a polyimide film. Thereafter, heat treatment was again performed at 300 ° C for 30 minutes in the final heat treatment step. At this time, the obtained polyimide film has a thickness of 80 μm, an average light transmittance of 87%, a yellowness index of 4.5, and an average coefficient of thermal expansion (CTE) of 20 ppm measured at 50 to 250 ° C according to TMA-Method. /°C.

<製備例2. 硬塗層樹脂的製備> <Preparation Example 2. Preparation of Hard Coating Resin>

將KBM-303(Shinetsu公司)、異丙氧基鈦(Titanium isopropoxide)(Sigma-Aldrich公司)、水以227.96mL:1.94mL:21.61mL的比例進行混合而裝入到500mL的燒瓶中,然後,添加0.2g的氫氧化鈉作為催化劑,並在60℃下攪拌24小時。之後,使用0.45μm的鐵氟龍濾紙進行過濾,最終獲得數量平均分子量為7245,重量平均分子量為20146及多分散指數(PDI、Mw/Mn)為2.78的矽氧烷樹脂(所述分子量是利用GPC測定)。在此,所述樹脂以100重量份計,加入3重量份的IRGACURE 250(BASF公司)作為光引發劑,從而最終獲得硬塗層用樹脂。 KBM-303 (Shinetsu), Titanium isopropoxide (Sigma-Aldrich), and water were mixed at a ratio of 227.96 mL: 1.94 mL: 21.61 mL, and charged into a 500 mL flask, and then, 0.2 g of sodium hydroxide was added as a catalyst, and stirred at 60 ° C for 24 hours. Thereafter, filtration was carried out using a 0.45 μm Teflon filter paper to finally obtain a decane resin having a number average molecular weight of 7,245, a weight average molecular weight of 20146, and a polydispersity index (PDI, M w /M n ) of 2.78 (the molecular weight It is measured by GPC). Here, the resin was added to 3 parts by weight of IRGACURE 250 (BASF Corporation) as a photoinitiator in 100 parts by weight, thereby finally obtaining a resin for a hard coat layer.

實施例1 Example 1

將大正化金公司(PGME)之溶有3wt%、重量平均分子量為2,000g/mole的聚矽氮烷-矽氧烷化合物(DCT公司)的溶液用金屬絲(wire)塗佈於以上述方法製備的無色透明聚醯亞胺薄膜的一面上,然後以80℃進行乾燥而形成厚度為0.1μm的聚矽氮烷矽氧烷化合物膜。之後,在常溫下約放置5分鐘後,在約250℃的溫度下使其熱固化,從而獲得形成有0.1μm厚度光學底漆層的聚醯亞胺基板。 A solution of a polydecazane-anthracene compound (DCT Corporation) in which 3 wt% of a polypothetical gold company (PGME) was dissolved and a weight average molecular weight of 2,000 g/mole was applied to the wire by the above method. On one side of the prepared colorless transparent polyimide film, it was then dried at 80 ° C to form a film of a polyaziroxane compound having a thickness of 0.1 μm. Thereafter, after leaving it at room temperature for about 5 minutes, it was thermally cured at a temperature of about 250 ° C to obtain a polyimide substrate having an optical primer layer having a thickness of 0.1 μm.

實施例2 Example 2

將大正化金公司(PGME)之溶有10wt%、重量平均分子量為2,000g/mol的聚矽氮烷-矽氧烷化合物(DCT公司)的溶液用金屬絲(wire)塗佈於以上述方法製備的無色透明聚醯亞胺薄膜的一面上,然後以80℃進行乾燥而形成厚度為0.5μm的聚矽氮烷矽氧烷化合物膜。之後,在常溫下約放置5分鐘後,在約250℃的溫度下使其熱固化,從而獲得形成有0.5μm厚度光學底漆層的聚醯亞胺基板。 A solution of Datong Chemical Co., Ltd. (PGME) in which 10 wt% of a polyazinane-hydroxane compound (DCT Corporation) having a weight average molecular weight of 2,000 g/mol is coated with a wire by the above method On one side of the prepared colorless transparent polyimide film, it was then dried at 80 ° C to form a film of a polyaziroxane compound having a thickness of 0.5 μm. Thereafter, after leaving it at room temperature for about 5 minutes, it was thermally cured at a temperature of about 250 ° C to obtain a polyimide film having an optical primer layer having a thickness of 0.5 μm.

實施例3 Example 3

將大正化金公司(PGME)之溶有20wt%、重量平均分子量為2,000g/mol的聚矽氮烷-矽氧烷化合物(DCT公司)的溶液用金屬絲(wire)塗佈於以上述方法製備的無色透明聚醯亞胺薄膜的一面上,然後以80℃進行乾燥而形成厚度為1.0μm的聚矽氮烷矽氧烷化合物膜。之後,在常溫下約放置5分鐘後,在約250℃的溫度下使其熱固化,從而獲得形成有1.0μm厚度光學底漆層的聚醯亞胺基板。 A solution of 20% by weight of polyphosphorus azide-oxane compound (DCT Corporation) in which Dagang Chemical Co., Ltd. (PGME) was dissolved and having a weight average molecular weight of 2,000 g/mol was applied to the wire by the above method. On one side of the prepared colorless transparent polyimide film, it was then dried at 80 ° C to form a film of a polyaziroxane compound having a thickness of 1.0 μm. Thereafter, after leaving it at room temperature for about 5 minutes, it was thermally cured at a temperature of about 250 ° C to obtain a polyimide film having an optical primer layer having a thickness of 1.0 μm.

實施例4 Example 4

將大正化金公司(PGME)之溶有20wt%、重量平均分子量為2,000g/mol的聚矽氮烷-矽氧烷化合物(DCT公司)的溶液用金屬絲(wire)塗佈於以上述方法製備的無色透明聚醯亞胺薄膜的一面上,然後以80℃進行乾燥而形成厚度為3.0μm的聚矽氮烷矽氧烷化合物膜。之後,在常溫下約放置5分鐘後,在約250℃的溫度下使其熱固化,從而獲得形成有3.0μm厚度光學底漆層的聚醯亞胺基板。 A solution of 20% by weight of polyphosphorus azide-oxane compound (DCT Corporation) in which Dagang Chemical Co., Ltd. (PGME) was dissolved and having a weight average molecular weight of 2,000 g/mol was applied to the wire by the above method. One side of the prepared colorless transparent polyimide film was dried at 80 ° C to form a polyazironadecane compound film having a thickness of 3.0 μm. Thereafter, after leaving it at room temperature for about 5 minutes, it was thermally cured at a temperature of about 250 ° C to obtain a polyimide film having an optical primer layer having a thickness of 3.0 μm.

實施例5 Example 5

採用與上述實施例1相同的方法來形成光學底漆層,並且在聚醯亞胺基板的兩面上形成光學底漆層。 An optical primer layer was formed in the same manner as in the above Example 1, and an optical primer layer was formed on both sides of the polyimide substrate.

實施例6 Example 6

採用與上述實施例1相同的方法來製備形成有光學底漆層的聚醯亞胺基板,在與形成有光學底漆層的面相反的聚醯亞胺層的一面上塗佈40μm的上述製備例2的硬塗層用樹脂,然後,在315nm波長的紫外線燈 下暴露30秒,以進一步形成硬塗層。 The polyimide substrate having the optical primer layer formed thereon was prepared in the same manner as in the above Example 1, and 40 μm of the above preparation was applied on one side of the polyimide layer opposite to the surface on which the optical primer layer was formed. Example 2 for hard coating with resin, then, at 315 nm wavelength UV lamp The next exposure was for 30 seconds to further form a hard coat layer.

實施例7 Example 7

在上述實施例5中,只在以兩側形成的光學底漆層中的一面光學底漆層上,採用與實施例6相同的方法,進一步形成硬塗層。 In the above Example 5, a hard coat layer was further formed in the same manner as in Example 6 only on one of the optical primer layers formed on both sides.

實施例8 Example 8

除了使用重量平均分子量為1,000,000g/mol的聚矽氮烷-矽氧烷化合物(DCT公司)以外,採用與上述實施例1相同的方法來製備聚醯亞胺基板。 A polyimide substrate was prepared in the same manner as in the above Example 1 except that a polyazinane-hydroxane compound (DCT Corporation) having a weight average molecular weight of 1,000,000 g/mol was used.

比較例1 Comparative example 1

直接準備製備例1中所製得的聚醯亞胺薄膜作為比較例1。 The polyimide film prepared in Preparation Example 1 was directly prepared as Comparative Example 1.

比較例2 Comparative example 2

在上述製備例1的聚醯亞胺薄膜上,省略光學底漆層,並與實施例6相同的方法只形成硬塗層來製備聚醯亞胺基板。 On the polyimide film of the above Preparation Example 1, the optical primer layer was omitted, and only a hard coat layer was formed in the same manner as in Example 6 to prepare a polyimide substrate.

比較例3 Comparative example 3

使用丙烯酸類樹脂來代替上述製備例2中的硬塗層用樹脂,並按照實施例6的方式形成硬塗層,但是因收縮率不匹配,從而在固化時引起了嚴重的捲曲,可以用肉眼確認到表面裂縫。 An acrylic resin was used instead of the resin for hard coat layer in the above Preparation Example 2, and a hard coat layer was formed in the same manner as in Example 6, but the shrinkage ratio was mismatched, thereby causing severe curling upon curing, and it was possible to use the naked eye. Confirm the surface crack.

比較例4 Comparative example 4

除了將光學底漆層的厚度形成為3.5μm之外,採用與實施例1相同的方法來製備聚醯亞胺基板,但是在固化時產生了裂縫,從而被確認為難以產品化。 A polyimide film was prepared in the same manner as in Example 1 except that the thickness of the optical primer layer was 3.5 μm, but cracks were generated at the time of curing, and it was confirmed that it was difficult to commercialize.

<測定例> <Measurement Example>

接著,除了用肉眼觀察到裂縫而不能進行分析的比較例3和比較例4之外,採用以下的方法來測定上述實施例及比較例的物理性質,並將其結果顯示於表1及表2中。 Next, the physical properties of the above examples and comparative examples were measured by the following methods, except for Comparative Example 3 and Comparative Example 4, in which cracks were observed by the naked eye, and the results are shown in Tables 1 and 2. in.

(1)平均透光率(%):以ASTM E313標準,利用分光光度計(Spectrophotometer)(CM-3700D、KONICA MINOLTA)在350~700nm下測定透光率。 (1) Average light transmittance (%): The light transmittance was measured at 350 to 700 nm by a spectrophotometer (CM-3700D, KONICA MINOLTA) according to the ASTM E313 standard.

(2)黃度指數,以ASTM E313標準,利用分光光度計(CM-3700D、KONICA MINOLTA)來測定黃度指數。 (2) Yellowness index, the yellowness index was measured by a spectrophotometer (CM-3700D, KONICA MINOLTA) according to the ASTM E313 standard.

(3)水氣穿透率(g/m2*day):以ASTM E69BW標準,並利用水氣穿透率測試儀(MOCON/US/Aquatran-model-1)來測定水氣穿透率(WVTR)。 (3) Water vapor transmission rate (g/m 2 *day): The water vapor permeability is measured by the water vapor permeability tester (MOCON/US/Aquatran-model-1) according to the ASTM E69BW standard ( WVTR).

(4)鉛筆硬度:以ASTM D3363標準,用三菱(Mitsubishi)評價用鉛筆(UNI),並利用電動式鉛筆硬度測定器(在形成底漆層或硬塗層的方向上)以1kg的負載及180mm/min的速度劃5次50mm後,測定表面完全未產生裂縫的鉛筆硬度。 (4) Pencil hardness: using a pencil (UNI) for evaluation by Mitsubishi according to the ASTM D3363 standard, and using an electric pencil hardness tester (in the direction in which the primer layer or the hard coat layer is formed) with a load of 1 kg and After the speed of 180 mm/min was 5 times 50 mm, the pencil hardness at which the surface was completely free of cracks was measured.

(5)黏附性(進行劃格法(Cross Cut),使膠帶黏著後撕離):以ASTM D3359標準,在劃格後以膠帶撕離而測定。 (5) Adhesion (Cross Cut, tearing off the tape after adhesion): Determined by tape peeling after the cross-cut according to ASTM D3359 standard.

(6)彎曲性:放置於直徑為2mm的圓形工具的中央,使基板捲繞並展開200,000次,用肉眼及顯微鏡判斷膜有沒有裂開,只要有一點裂開就表示為「失敗」,如果沒有裂開,則表示為「成功」。 (6) Bending property: placed in the center of a circular tool with a diameter of 2 mm, the substrate was wound up and unfolded 200,000 times, and the film was visually and microscopically judged whether the film was cracked or not, as long as there was a slight crack, it was expressed as "failure". If it does not split, it means "success".

(7)耐化學性測定:在2.38%的氫氧化四甲銨(tetramethylammonium hydroxide,TMAH)、二甲基乙醯胺(dimethylacetamide,DMAc)、N-甲基-2-吡咯烷酮(N-methyl-2-pyrrolidone,NMP)、1%氫氧化鈉(NaOH),丙酮(acetone)、異丙醇(isopropyl alcohol,IPA)、甲基乙基酮(methylethylketone,MEK)及硫酸鈉(sodium sulfate,Na2SO4)中浸漬(Dipping)1小時後,用肉眼進行觀察,如果觀察到白濁現象或產生異常則表示為「X」,乾燥後的重量變化率為0.01%以內,則表示為「○」。 (7) Chemical resistance measurement: 2.38% tetramethylammonium hydroxide (TMAH), dimethylacetamide (DMAc), N-methyl-2-pyrrolidone (N-methyl-2) -pyrrolidone, NMP), 1% sodium hydroxide (NaOH), acetone (acetone), isopropyl alcohol (IPA), methylethylketone (MEK) and sodium sulfate (Na 2 SO) 4 ) After immersion (Dipping) for 1 hour, it was observed with the naked eye, and if it was observed to be cloudy or abnormal, it was expressed as "X", and when the weight change rate after drying was 0.01% or less, it was indicated as "○".

通過上述表1及表2的結果可知,在聚醯亞胺薄膜的表面形成有包含矽氮烷矽氧烷的光學底漆層的實施例1至5的情況下,與表面未進行任何處理的比較例1相比,不僅是透光率及黃度指數等光學特性得到了提高,而且耐化學性也得到了提高。但是,使用的矽氮烷矽氧烷的重量平均分子量比實施例1至5高的實施例8的情況下,表面硬度及黏附性多少有些降低,並顯示出了輕微的彎曲性。 From the results of the above Tables 1 and 2, it is understood that in the case of Examples 1 to 5 in which an optical primer layer containing a ceria azide was formed on the surface of the polyimide film, no treatment was performed on the surface. In Comparative Example 1, not only the optical properties such as the light transmittance and the yellowness index were improved, but also the chemical resistance was improved. However, in the case of Example 8 having a weight average molecular weight higher than that of Examples 1 to 5, the surface hardness and adhesion were somewhat lowered, and slight bending property was exhibited.

此外,同時形成有光學底漆層及硬塗層的實施例6及實施例7與省略了光學底漆層且僅形成硬塗層的比較例2相比,雖然在耐化學性或鉛 筆硬度等物理性質的變化不大,但是黃度指數和透光率得到了改善,並且光學特性和水氣穿透率與比較例2相比顯著提高。 Further, Examples 6 and 7 in which the optical primer layer and the hard coat layer were simultaneously formed were compared with Comparative Example 2 in which the optical primer layer was omitted and only the hard coat layer was formed, although chemical resistance or lead was observed. The physical properties such as pen hardness did not change much, but the yellowness index and light transmittance were improved, and the optical characteristics and water vapor permeability were significantly improved as compared with Comparative Example 2.

通過上述結果可知,根據本發明的聚醯亞胺基板不僅是光學特性優異,而且表面硬度、耐化學性及彎曲性優異,從而適合用作可撓性電子儀器的顯示基板模組,尤其因為水氣穿透率低,對保護TFT及OLED元件免受外部濕氣環境的損傷方面更為有利。 As a result of the above, the polyimide substrate of the present invention is excellent not only in optical properties but also excellent in surface hardness, chemical resistance, and flexibility, and is suitable as a display substrate module for flexible electronic equipment, particularly because of water. Low gas permeability is more advantageous for protecting TFTs and OLED components from external moisture.

10‧‧‧聚醯亞胺層 10‧‧‧ Polyimine layer

20‧‧‧光學底漆層 20‧‧‧Optical primer layer

30‧‧‧硬塗層 30‧‧‧hard coating

40‧‧‧透明黏附層 40‧‧‧Transparent adhesive layer

50‧‧‧黑色遮光層 50‧‧‧Black shading

Claims (10)

一種聚醯亞胺基板,其中,該聚醯亞胺基板包含聚醯亞胺層;以及在該聚醯亞胺層的至少一面上包含下述化學式1所示的矽氮烷-矽氧烷化合物的光學底漆層;<化學式1>-{R-(Si-NH)-R}m-{R`-(Si-O)-R`}n-在該化學式1中,R為包含選自羥基、乙烯基、丙烯醯基、環氧基及胺基所組成群組中至少一種的氨基甲酸乙酯基,R`為包含羥基、乙烯基、丙烯醯基、環氧基及胺基所組成群組中至少一種的氰酸酯基,m及n為1至10的整數。 A polyimine substrate, wherein the polyimide substrate comprises a polyimide layer; and a ceria azide-oxane compound represented by the following Chemical Formula 1 is contained on at least one side of the polyimide layer Optical primer layer; <Chemical Formula 1>-{R-(Si-NH)-R} m -{R`-(Si-O)-R'} n - In the chemical formula 1, R is selected from the group consisting of a urethane group of at least one of the group consisting of a hydroxyl group, a vinyl group, a propylene group, an epoxy group, and an amine group, and R' is composed of a hydroxyl group, a vinyl group, a propylene group, an epoxy group, and an amine group. The cyanate group of at least one of the groups, m and n are an integer of from 1 to 10. 根據申請專利範圍第1項所述的聚醯亞胺基板,其中,該矽氮烷-矽氧烷化合物的重量平均分子量為500至500,000g/mol。 The polyimine substrate according to the above aspect of the invention, wherein the ceria azide-oxane compound has a weight average molecular weight of 500 to 500,000 g/mol. 根據申請專利範圍第1項所述的聚醯亞胺基板,其中,該光學底漆層的厚度為0.1至3μm。 The polyimide substrate according to the above aspect of the invention, wherein the optical primer layer has a thickness of 0.1 to 3 μm. 根據申請專利範圍第1項所述的聚醯亞胺基板,其中,該聚醯亞胺基板基於KONICA MINOLTA公司CM-3700D測定標準的黃度指數為2.5以下,且在350至700nm下的透光率為85至93%。 The polyimide substrate according to claim 1, wherein the polyimide substrate has a yellowness index of 2.5 or less and a light transmittance of 350 to 700 nm based on a KONICA MINOLTA CM-3700D measurement standard. The rate is 85 to 93%. 根據申請專利範圍第1項所述的聚醯亞胺基板,其進一步包括一硬塗層。 The polyimide substrate according to claim 1, further comprising a hard coat layer. 根據申請專利範圍第5項所述的聚醯亞胺基板,其中,該硬塗層是由包含下述化學式2所示的烷氧基矽烷及下述化學式3所示的烷氧基金屬的混合物或化學反應物的矽氧烷樹脂所形成; 在該化學式2至3中,R1為包含環氧基、丙烯醯基及異氰酸酯基的直鏈型、支鏈型、脂環族及芳香族的有機化合物,R2及R3為包含氧或氮等雜化合物的直鏈型、支鏈型、脂環族C1至C8的烷基,n為1至3的整數,M為包括過渡金屬的金屬元素,m為1至10的整數。 The polyimine substrate according to claim 5, wherein the hard coat layer is a mixture comprising an alkoxydecane represented by the following Chemical Formula 2 and an alkoxy metal represented by the following Chemical Formula 3; Or a chemical reactant of a rhodium oxide resin; In the chemical formulas 2 to 3, R1 is a linear, branched, alicyclic, and aromatic organic compound containing an epoxy group, an acryloyl group, and an isocyanate group, and R2 and R3 are impurities containing oxygen or nitrogen. A linear, branched, alicyclic C1 to C8 alkyl group of the compound, n is an integer of 1 to 3, M is a metal element including a transition metal, and m is an integer of 1 to 10. 根據申請專利範圍第5項所述的聚醯亞胺基板,其中,該硬塗層的厚度為10至50μm。 The polyimide substrate according to claim 5, wherein the hard coat layer has a thickness of 10 to 50 μm. 根據申請專利範圍第5項所述的聚醯亞胺基板,其中,該聚醯亞胺基板基於JIS K56000測定標準,將該硬塗層形成的方向作為上面來測定的表面硬度為5H至9H。 The polyimide substrate according to claim 5, wherein the polyimide substrate has a surface hardness of 5H to 9H as measured by the direction in which the hard coat layer is formed based on the JIS K56000 measurement standard. 根據申請專利範圍第5項所述的聚醯亞胺基板,其中,該聚醯亞胺基板基於ASTM E96BW測定標準的水氣穿透率為0.001至10g/m2*day。 The polyimine substrate according to claim 5, wherein the polyimide film has a water vapor permeability of 0.001 to 10 g/m 2 *day based on the ASTM E96BW measurement standard. 一種顯示基板模組,其中,該顯示基板模組包含一透明黏附層、一黑色遮光層以及如申請專利範圍第1項至第9項中任一項所述的聚醯亞胺基板。 A display substrate module, wherein the display substrate module comprises a transparent adhesive layer, a black light-shielding layer, and the polyimide substrate according to any one of claims 1 to 9.
TW104144514A 2014-12-31 2015-12-30 Polyimide substrate and display substrate module including the same TWI556962B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20140196057 2014-12-31
KR1020150189009A KR20160082478A (en) 2014-12-31 2015-12-29 Polyimide Substrate And Display Substrate Module Including The Same

Publications (2)

Publication Number Publication Date
TW201627163A TW201627163A (en) 2016-08-01
TWI556962B true TWI556962B (en) 2016-11-11

Family

ID=56504386

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104144514A TWI556962B (en) 2014-12-31 2015-12-30 Polyimide substrate and display substrate module including the same

Country Status (2)

Country Link
KR (1) KR20160082478A (en)
TW (1) TWI556962B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102638825B1 (en) * 2018-01-24 2024-02-21 주식회사 동진쎄미켐 Polyimide film and method for producing the same
KR20230081158A (en) * 2021-11-30 2023-06-07 삼성전자주식회사 Protection film and electronic device comprising the same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201241094A (en) * 2011-03-01 2012-10-16 Az Electronic Mat Ip Japan Kk Composition for manufacturing low refractive index film, method for manufacturing low refractive index film and low refractive index film and anti-reflection film using manufacturing method thereof
KR20130129740A (en) * 2012-05-21 2013-11-29 제일모직주식회사 Gas barrier film, method for preparing thereof and display display member comprising the same
TW201422680A (en) * 2012-12-12 2014-06-16 Kolon Inc Transparent polyimide substrate and method for producing the same
KR20140128638A (en) * 2013-04-29 2014-11-06 이근수 Modified polysilazane-based polymer, coating composition comprising the same, coated plastic substrate obtainable using the same and its preparing method, and method of preparing the modified polysilazane-based polymer

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201241094A (en) * 2011-03-01 2012-10-16 Az Electronic Mat Ip Japan Kk Composition for manufacturing low refractive index film, method for manufacturing low refractive index film and low refractive index film and anti-reflection film using manufacturing method thereof
KR20130129740A (en) * 2012-05-21 2013-11-29 제일모직주식회사 Gas barrier film, method for preparing thereof and display display member comprising the same
TW201422680A (en) * 2012-12-12 2014-06-16 Kolon Inc Transparent polyimide substrate and method for producing the same
KR20140128638A (en) * 2013-04-29 2014-11-06 이근수 Modified polysilazane-based polymer, coating composition comprising the same, coated plastic substrate obtainable using the same and its preparing method, and method of preparing the modified polysilazane-based polymer

Also Published As

Publication number Publication date
KR20160082478A (en) 2016-07-08
TW201627163A (en) 2016-08-01

Similar Documents

Publication Publication Date Title
TWI507448B (en) Transparent polyimide substrate and method for producing the same
JP6276839B2 (en) Polyimide cover substrate
US11654665B2 (en) Window cover film and flexible display panel including the same
JP2018066002A (en) Plastic substrate and display device including the same
TW201727274A (en) Polyimide substrate and display substrate module including the same
US11518921B2 (en) Antistatic polyimide-based film and flexible display panel using same
KR20180001175A (en) Polyimide Substrate having antistatic property And Display Substrate Module Including The Same
KR20180072268A (en) Composition For Hard Coating and Polyimide Substrate Including Cured Product Of The Same As A Hard Coating Layer
KR102260731B1 (en) Polyimide-based composite film and display device comprising same
CN112574454A (en) Window covering film and flexible display panel comprising same
TWI556962B (en) Polyimide substrate and display substrate module including the same
CN113534305A (en) Optical laminate and flexible display panel including the same
CN111378194B (en) Hard coating film and method for producing same
KR20160063073A (en) Composition for making hard coating layer
KR20180072265A (en) Composition For Hard Coating and Hard Coating film Including Cured Product Of The Same As The Coating Layer
US20210002440A1 (en) Polyimide-Based Film, Film for Cover Window, and Display Device Including the Same
KR102147265B1 (en) Polyimide film and flexible display panel including the same
CN114085405A (en) Window covering film and flexible display panel comprising same
JP2022044003A (en) Polyamide-based composite film and display device comprising the same
KR20160081848A (en) Composition For Hard Coating and Hard Coating Film Including Cured Product Of The Same As The Coating Layer
US20230324585A1 (en) Optical multilayer structure, method of manufacturing the same, and window cover film including the same
US20230082265A1 (en) Articles having inorganic substrates and polymer film layers
US20230323058A1 (en) Optical multilayer structure, method of manufacturing the same and window cover film comprising the same
US11731410B2 (en) Polyamide-based composite film and display device comprising the same
US20220041821A1 (en) Polyimide Film and Flexible Display Panel Including the Same