TWI556053B - Optical module for an optical projection apparatus - Google Patents

Optical module for an optical projection apparatus Download PDF

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TWI556053B
TWI556053B TW104101195A TW104101195A TWI556053B TW I556053 B TWI556053 B TW I556053B TW 104101195 A TW104101195 A TW 104101195A TW 104101195 A TW104101195 A TW 104101195A TW I556053 B TWI556053 B TW I556053B
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optical
layer
light source
disposed
module
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TW104101195A
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TW201626094A (en
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王志峰
張永朋
黃國胤
陳信安
鄭韋治
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台灣彩光科技股份有限公司
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Description

用於投影裝置上的光學模組 Optical module for use on a projection device

本發明係有關於一種光學模組,尤指一種用於投影裝置上的光學模組。 The invention relates to an optical module, in particular to an optical module for use on a projection device.

投影機的特點之一乃是由於不需要固定的螢幕,因此不會被螢幕大小所限制,只要有一可用來投射影像的平面,即可輕易地投射出大尺寸的畫面。因此,已被廣泛的應用到各個領域,例如應用於大型會議演講上以投影機放大欲投影的畫面,或是應用於家庭劇院組。 One of the features of the projector is that it does not require a fixed screen, so it is not limited by the size of the screen. As long as there is a plane for projecting images, a large size image can be easily projected. Therefore, it has been widely applied to various fields, such as a large-scale conference presentation with a projector to enlarge a picture to be projected, or applied to a home theater group.

一般來說,常見的投影系統係於光源前設置有一濾光片,將非必要的不可見光濾除後,再經由色輪之濾光結構分色,接著送至其他光學元件,以投影出來。然而,現今的光源亮度越來越高,光源經由濾光片濾除非必要的不可見光並投射出來後,所投影出來的影像常會有閃爍的情形發生。 In general, a common projection system is provided with a filter in front of the light source, which filters out the unnecessary invisible light, then separates the color through the filter structure of the color wheel, and then sends it to other optical components for projection. However, today's light sources are getting brighter and brighter, and the light source is filtered through the filter unless the necessary invisible light is projected and projected, and the projected image often flickers.

因此如何提出一種避免具有高亮度光源的投影機所投影出來的影像所產生的閃爍問題,已然成為該項所屬技術領域人士所欲解決的重要課題。 Therefore, how to propose a flicker problem caused by avoiding an image projected by a projector having a high-intensity light source has become an important subject to be solved by those skilled in the art.

鑒於以上之問題,本發明提供一種能夠形成一具有預定角度的擴散光源的光學濾片,藉此,當投影機的光源模組所產生的光源照射在光學濾片上時,能夠將光源擴散開來,以克服投影機所投影出來的畫面有閃爍之問題。 In view of the above problems, the present invention provides an optical filter capable of forming a diffused light source having a predetermined angle, whereby the light source generated by the light source module of the projector can be diffused when it is irradiated on the optical filter. To overcome the problem of flickering on the screen projected by the projector.

為了達到上述之目的,本發明之其中一實施例係提供一種用於投影裝置上的光學模組,其包括一光學濾片及一光源模組。所述光學濾片設置於一預定位置上,所述光學濾片包括一透光基材及一光學單元,所述透光基材上具有一光學微結構層。所述光源模組包括一發光單元,其中所述發光單元用於產生一直接照射在所述預定位置上的投影光源。其中,所述投影光源通過所述光學濾片,以形成一具有預定角度的擴散光源。 In order to achieve the above object, an embodiment of the present invention provides an optical module for a projection device, which includes an optical filter and a light source module. The optical filter is disposed at a predetermined position, and the optical filter comprises a light transmissive substrate and an optical unit having an optical microstructure layer thereon. The light source module includes a light emitting unit, wherein the light emitting unit is configured to generate a projection light source directly irradiated on the predetermined position. Wherein the projection light source passes through the optical filter to form a diffusion light source having a predetermined angle.

本發明的有益效果可以在於,本發明實施例所提供的用於投影裝置上的光學模組,能藉由光學濾片上的光學微結構層將投影機所產生的投影光源擴散開來,以防止投影系統所投影出來的畫面所造成的閃爍問題。同時通過光學濾片上的光學單元所包括的紫外線濾除膜及紅外線濾除膜,以將會破壞投影系統光閥中液晶分子及脆化塑膠光學元件的紫外線光,及使投影系統內部產生高熱而導致降低光學元件效率及壽命的紅外線光濾除。 The beneficial effects of the present invention may be that the optical module for the projection device provided by the embodiment of the present invention can diffuse the projection light source generated by the projector by the optical microstructure layer on the optical filter to prevent The flicker problem caused by the projected image of the projection system. At the same time, the ultraviolet filter film and the infrared filter film included in the optical unit on the optical filter will destroy the ultraviolet light of the liquid crystal molecules in the light valve of the projection system and the embrittlement plastic optical component, and generate high heat inside the projection system. Infrared light filtering that results in reduced optical component efficiency and lifetime.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本發明加以限制者。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.

N‧‧‧光學模組 N‧‧‧ optical module

1‧‧‧光學濾片 1‧‧‧Optical filter

11‧‧‧透光基材 11‧‧‧Light transmissive substrate

111‧‧‧第一表面 111‧‧‧ first surface

112‧‧‧第二表面 112‧‧‧ second surface

12‧‧‧光學微結構層 12‧‧‧Optical microstructure layer

13‧‧‧光學單元 13‧‧‧ Optical unit

131‧‧‧第一光學層 131‧‧‧First optical layer

132‧‧‧第二光學層 132‧‧‧Second optical layer

133‧‧‧第三光學層 133‧‧‧ Third optical layer

2‧‧‧光源模組 2‧‧‧Light source module

21‧‧‧發光單元 21‧‧‧Lighting unit

22‧‧‧基座 22‧‧‧ pedestal

P‧‧‧投影光源 P‧‧‧projection light source

D‧‧‧擴散光源 D‧‧‧Diffuse light source

θ‧‧‧預定角度 Θ‧‧‧predetermined angle

A‧‧‧預定位置 A‧‧‧predetermined location

圖1A為本發明光學模組第一實施例的光源投影示意圖。 1A is a schematic view showing the projection of a light source according to a first embodiment of the optical module of the present invention.

圖1B為本發明光學模組第一實施例的光源模組示意圖。 FIG. 1B is a schematic diagram of a light source module according to a first embodiment of an optical module of the present invention.

圖2A為本發明光學模組第一實施例的其中一立體示意圖。 2A is a perspective view of one of the first embodiments of the optical module of the present invention.

圖2B為本發明光學模組第一實施例的其中一前視示意圖。 2B is a front elevational view of the first embodiment of the optical module of the present invention.

圖2C為本發明光學模組第一實施例的另外一前視示意圖。 2C is another front perspective view of the first embodiment of the optical module of the present invention.

圖3為本發明光學模組第二實施例的前視示意圖。 3 is a front elevational view of a second embodiment of the optical module of the present invention.

圖4為本發明光學模組第三實施例的前視示意圖。 4 is a front elevational view of a third embodiment of an optical module of the present invention.

圖5為本發明光學模組第四實施例的前視示意圖。 Figure 5 is a front elevational view of a fourth embodiment of the optical module of the present invention.

以下係藉由特定的具體實例說明本發明所揭露「用於投影裝 置上的光學濾片」的實施方式,熟悉此技藝之人士可由本說明書所揭示的內容輕易瞭解本發明的其他優點與功效。本發明亦可藉由其他不同的具體實施例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本發明的精神下進行各種修飾與變更。又本發明的圖式僅為簡單說明,並非依實際尺寸描繪,亦即未反應出相關構成的實際尺寸,先予敘明。以下的實施方式係進一步詳細說明本發明的相關技術內容,但並非用以限制本發明的技術範疇。 The following is a description of the present invention by way of a specific example. Other embodiments of the present invention will be readily appreciated by those skilled in the art from this disclosure. The present invention may be embodied or applied in various other specific embodiments, and various modifications and changes can be made without departing from the spirit and scope of the invention. Further, the drawings of the present invention are merely illustrative, and are not depicted in actual dimensions, that is, the actual dimensions of the related structures are not reflected, which will be described first. The following embodiments are intended to further explain the related art of the present invention, but are not intended to limit the technical scope of the present invention.

〔第一實施例〕 [First Embodiment]

首先,請參閱圖1A至圖1B所示,圖1A為本發明光學模組第一實施例的光源投影示意圖,圖1B為本發明光學模組第一實施例的光源模組示意圖。本發明第一實施例提供一種用於投影裝置上的光學模組N,其包括一光學濾片1及一光源模組2。光學濾片1可設置於一預定位置A上,舉例來說,預定位置A可位於光源模組2的基座22上,然本發明不以此為限。接著,光學濾片1可包括一透光基材11及一光學單元13,透光基材11上具有一光學微結構層12,具體來說,透光基材11可以是玻璃材質,玻璃材質可以選自如矽酸鹽、磷酸鹽、硼酸鹽及碲酸鹽等系統者,然本發明不以此為限。接著,光源模組2可包括一發光單元21,發光單元21乃用於產生一直接照射在預定位置A上的投影光源P,以本發明而言,發光單元21所產生的投影光源P可以由一雷射投影機的發光光源所產生。藉此,投影光源P通過光學濾片1,以形成一具有預定角度θ的擴散光源D。 1A to FIG. 1B, FIG. 1A is a schematic diagram of a light source projection of a first embodiment of an optical module according to the present invention, and FIG. 1B is a schematic diagram of a light source module according to a first embodiment of the optical module of the present invention. The first embodiment of the present invention provides an optical module N for a projection device, which includes an optical filter 1 and a light source module 2. The optical filter 1 can be disposed at a predetermined position A. For example, the predetermined position A can be located on the base 22 of the light source module 2, but the invention is not limited thereto. The optical filter 1 can include a transparent substrate 11 and an optical unit 13 . The transparent substrate 11 has an optical microstructure layer 12 . Specifically, the transparent substrate 11 can be made of glass or glass. It may be selected from systems such as citrate, phosphate, borate and citrate, but the invention is not limited thereto. Next, the light source module 2 can include a light emitting unit 21 for generating a projection light source P directly irradiated on the predetermined position A. In the present invention, the projection light source P generated by the light emitting unit 21 can be An illuminating light source of a laser projector is produced. Thereby, the projection light source P passes through the optical filter 1 to form a diffusion light source D having a predetermined angle θ.

接著,請參閱圖2A至圖2B所示,圖2A為本發明光學模組第一實施例的立體示意圖,圖2B為本發明光學模組第一實施例的前視示意圖。舉例來說,以本發明第一實施例而言,設置於透光基材11上的光學微結構層12可通過研磨、灌鑄、印刷、蝕刻、噴砂、霧化及模具壓合等方式以呈現凸起狀、凹凸狀、凹陷狀、 顆粒狀或霧化表面等各種形狀的光學微結構層12,然本發明不以此為限。 2A to 2B, FIG. 2A is a perspective view of a first embodiment of an optical module according to the present invention, and FIG. 2B is a front view of the first embodiment of the optical module of the present invention. For example, in the first embodiment of the present invention, the optical microstructure layer 12 disposed on the transparent substrate 11 can be polished, cast, printed, etched, sandblasted, atomized, and molded. Protruding, concave, concave, The optical microstructure layer 12 of various shapes, such as a granular or atomized surface, is not limited thereto.

承上述,透光基材11上可具有一第一表面111及一第二表面112,詳言之,第一表面111及第二表面112可以分別為透光基材11的下表面及上表面,第一表面111面向光源模組2的方向設置。進一步來說,光學單元13也可以包括一第一光學層131及一第二光學層132,並通過設置在透光基材11上第一光學層131及第二光學層132來改變光源模組所照射在透光基材11上的投影光源P的光源特性。進一步來說,以本發明第一實施例而言,第一光學層131可為一紅外線濾除膜(Infrared filter,IR filter),第二光學層132可為一紫外線濾除膜(Ultraviolet filter,UV filter)。舉例來說,此紫外光反射膜之材質例如為二氧化鈦(TiO2)及二氧化矽(SiO2)之混合材料。 In the above, the transparent substrate 11 can have a first surface 111 and a second surface 112. In detail, the first surface 111 and the second surface 112 can respectively be the lower surface and the upper surface of the transparent substrate 11. The first surface 111 is disposed in a direction facing the light source module 2. Further, the optical unit 13 may further include a first optical layer 131 and a second optical layer 132, and the light source module is changed by the first optical layer 131 and the second optical layer 132 disposed on the transparent substrate 11. The light source characteristics of the projection light source P irradiated on the light-transmitting substrate 11. Further, in the first embodiment of the present invention, the first optical layer 131 may be an infrared filter (IR filter), and the second optical layer 132 may be an ultraviolet filter (Ultraviolet filter, UV filter). For example, the material of the ultraviolet light reflecting film is, for example, a mixed material of titanium oxide (TiO 2 ) and cerium oxide (SiO 2 ).

接著,第一光學層131可設置於透光基材11的第一表面111上,第二光學層132可設置於第一光學層131上,光學微結構層12可設置於透光基材11的第二表面112上,藉此,投影光源P依序通過第二光學層132、第一光學層131、透光基材11及光學微結構層12,以形成一擴散光源D,然本發明不以此為限。具體來說,紫外線濾除膜及紅外線濾除膜能夠在導至光源溫度升高的光源射入該投影裝置以前就被濾除掉,藉以能夠提高光源模組2的壽命。 The first optical layer 131 can be disposed on the first surface 111 of the transparent substrate 11 , the second optical layer 132 can be disposed on the first optical layer 131 , and the optical microstructure layer 12 can be disposed on the transparent substrate 11 . The second surface 112, whereby the projection light source P sequentially passes through the second optical layer 132, the first optical layer 131, the transparent substrate 11 and the optical microstructure layer 12 to form a diffusion light source D. Not limited to this. Specifically, the ultraviolet filter film and the infrared filter film can be filtered out before the light source that leads to an increase in temperature of the light source is injected into the projection device, thereby improving the life of the light source module 2.

另外,投影光源P通過光學濾片1,所形成的一具有預定角度θ的擴散光源D,其預定角度θ可以介於0至75度之間。藉此,通過調整研磨、灌鑄、印刷、蝕刻、噴砂、霧化及模具壓合等方式所形成的光學微結構層12,以控制擴散光源D的預定角度θ,可防止投影系統所投影出來的畫面所造成的閃爍問題。舉例來說,當投影光源P所通過的預定角度θ的角度越大時,就可以降低所形成的擴散光源D的亮度,藉以避免所投影出來的畫面所造 成的閃爍問題。值得一提的是,由於光學微結構層12乃是以研磨、灌鑄、印刷、蝕刻、噴砂、霧化及模具壓合等方式直接形成於透光基材11上,藉此,光學微結構層12的材質會與透光基材11相同,因此可以具有極佳之耐熱性質,進而可以應用於高能(40-50瓦,或更高瓦數)的光源,例如雷射投影機、包含雷射二極體光源之裝置或此類之高能光源的裝置。另外,須說明的是,投影光源P通過光學濾片1,所形成的一具有預定角度θ的擴散光源D,其預定角度θ可以藉由控制光學微結構12的粗糙度來控制。 Further, the projection light source P passes through the optical filter 1, and a diffusion light source D having a predetermined angle θ is formed, and the predetermined angle θ may be between 0 and 75 degrees. Thereby, the optical microstructure layer 12 formed by adjusting grinding, casting, printing, etching, sand blasting, atomization and mold pressing to control the predetermined angle θ of the diffusion light source D can prevent the projection system from being projected. The flicker problem caused by the picture. For example, when the angle of the predetermined angle θ through which the projection light source P passes is larger, the brightness of the formed diffusion light source D can be lowered to avoid the projection of the projected image. The problem of flickering. It is worth mentioning that since the optical microstructure layer 12 is directly formed on the light-transmitting substrate 11 by means of grinding, casting, printing, etching, sand blasting, atomization and mold pressing, thereby, the optical microstructure The material of the layer 12 is the same as that of the light-transmitting substrate 11, so that it can have excellent heat resistance properties, and thus can be applied to high-energy (40-50 watts, or higher wattage) light sources, such as laser projectors, including mines. A device that emits a diode source or such a high-energy source. In addition, it should be noted that the projection light source P passes through the optical filter 1, and a diffusion light source D having a predetermined angle θ is formed, and the predetermined angle θ can be controlled by controlling the roughness of the optical microstructure 12.

進一步來說,請參閱圖2C所示,圖2C為本發明光學模組第一實施例的另外一前視示意圖。可進一步在光學單元13上設置一第三光學層133,具體來說,第三光學層133可以是一抗反射膜(Anti-reflecting,AR),舉例來說,此抗反射膜之材質可例如包括氟化鎂(MgF2)或冰晶石(Na3AlF6)。因此,光源模組2所產生的投影光源P會依序通過第三光學層133、第二光學層132、第一光學層131、透光基材11及光學微結構層12,以形成一具有預定角度θ的擴散光源D。即,光源模組2所產生的光源會依序通過抗反射膜、紫外線濾除膜、紅外線濾除膜、透光基材11及光學微結構層12。 Further, referring to FIG. 2C, FIG. 2C is another front view of the first embodiment of the optical module of the present invention. A third optical layer 133 may be further disposed on the optical unit 13. Specifically, the third optical layer 133 may be an anti-reflective film (AR). For example, the material of the anti-reflective film may be, for example, Includes magnesium fluoride (MgF 2 ) or cryolite (Na 3 AlF 6 ). Therefore, the projection light source P generated by the light source module 2 sequentially passes through the third optical layer 133, the second optical layer 132, the first optical layer 131, the transparent substrate 11 and the optical microstructure layer 12 to form a A diffused light source D of a predetermined angle θ. That is, the light source generated by the light source module 2 sequentially passes through the anti-reflection film, the ultraviolet filter film, the infrared filter film, the light-transmitting substrate 11 and the optical microstructure layer 12.

本發明第一實施例所提供的一種用於投影裝置上的光學模組N,可通過設置在透光基材11上的光學微結構層12,以將光源模組2所產生的投影光源P,形成一具有預定角度θ的擴散光源D,進一步來說,擴散光源D也可以通過光學微結構層12的設置使的擴散光源D能夠更為均勻。此外,可通過直接將傳統的光學濾片替換成本發明所提供的光學濾片1,而不必更動其他系統,即可以避免所投影出來的畫面所造成的閃爍問題。詳言之,由於各家廠商的投影裝置系統不同,可通過調整擴散光源D的預定角度θ,以配合各家廠商的投影裝置系統,使其具有避免閃爍之問題。 The optical module N for the projection device provided by the first embodiment of the present invention can pass the optical microstructure layer 12 disposed on the transparent substrate 11 to project the projection light source P generated by the light source module 2. A diffusion light source D having a predetermined angle θ is formed. Further, the diffusion light source D can also be made more uniform by the arrangement of the optical microstructure layer 12. In addition, the problem of flicker caused by the projected picture can be avoided by directly replacing the conventional optical filter with the optical filter 1 provided by the invention without having to change other systems. In detail, since the projection device systems of the respective manufacturers are different, the predetermined angle θ of the diffusion light source D can be adjusted to match the projection device systems of various manufacturers, so as to avoid the problem of flicker.

〔第二實施例〕 [Second embodiment]

首先,請參閱圖3所示,圖3為本發明光學模組第二實施例的前視示意圖。由圖3與圖2B的比較可以得知,本發明第二實施例與第一實施例最大的差別在於:第一光學層131與第二光學層132的位置可以互換。具體來說,本發明第二實施例提供一種用於投影裝置上的光學模組N,其包括一光學濾片1及一光源模組2。接著,光學濾片1可包括一透光基材11及一光學單元13,光學單元13也可以包括一第一光學層131及一第二光學層132。透光基材11上可具有一第一表面111及一第二表面112。藉此,第二光學層132可設置於透光基材11的第一表面111上,第一光學層131可設置於第二光學層132上,光學微結構層12可設置於透光基材11的第二表面112上,其中第一光學層131可為一紅外線濾除膜,第二光學層132可為一紫外線濾除膜,投影光源依序通過第一光學層131、第二光學層132、透光基材11及光學微結構層12,以形成擴散光源D。進一步來說,第二實施例所提供的透光基材11及一光學單元13的材質與前述第一實施例相同,在此容不再贅述。值得一提的是,第二實施例所提供的一種用於投影裝置上的光學模組N,也可以進一步的設置有一第三光學層133,即可進一步設置有一抗反射膜,第三光學層133可設置於第一光學層131的表面上,藉此,投影光源P會先通過第三光學層133,然本發明不以此為限。 First, please refer to FIG. 3, which is a front view of a second embodiment of the optical module of the present invention. As can be seen from a comparison between FIG. 3 and FIG. 2B, the greatest difference between the second embodiment of the present invention and the first embodiment is that the positions of the first optical layer 131 and the second optical layer 132 can be interchanged. Specifically, the second embodiment of the present invention provides an optical module N for a projection device, which includes an optical filter 1 and a light source module 2. The optical filter 1 can include a transparent substrate 11 and an optical unit 13. The optical unit 13 can also include a first optical layer 131 and a second optical layer 132. The light transmissive substrate 11 can have a first surface 111 and a second surface 112. Thereby, the second optical layer 132 can be disposed on the first surface 111 of the transparent substrate 11, the first optical layer 131 can be disposed on the second optical layer 132, and the optical microstructure layer 12 can be disposed on the transparent substrate On the second surface 112 of the first optical layer 131, the first optical layer 131 can be an infrared filter film, and the second optical layer 132 can be an ultraviolet filter film. The projection light source sequentially passes through the first optical layer 131 and the second optical layer. 132. The light-transmitting substrate 11 and the optical microstructure layer 12 are formed to form a diffusion light source D. Further, the materials of the light-transmitting substrate 11 and the optical unit 13 provided in the second embodiment are the same as those in the first embodiment, and are not described herein again. It is to be noted that the optical module N for the projection device provided by the second embodiment may further be provided with a third optical layer 133, which may further be provided with an anti-reflection film and a third optical layer. The 133 may be disposed on the surface of the first optical layer 131, whereby the projection light source P passes through the third optical layer 133 first, but the invention is not limited thereto.

〔第三實施例〕 [Third embodiment]

首先,請參閱圖4所示,圖4為本發明光學模組第三實施例的前視示意圖。由圖4與圖2B的比較可以得知,本發明第三實施例與第一實施例最大的差別在於:光學單元13可設置於光學微結構層12上。具體來說,本發明第三實施例所提供的一種用於投影裝置上的光學模組N,其中光學微結構層12設置於透光基材11的第二表面112上,第二光學層132設置於光學微結構層12上,第一光學層131設置於第二光學層132上,其中第一光學層131 為一紅外線濾除膜,第二光學層132為一紫外線濾除膜,投影光源P依序通過透光基材11、光學微結構層12、第二光學層132及第一光學層131,以形成擴散光源D。進一步來說,第三實施例所提供的透光基材11及一光學單元13的材質與前述第一實施例相同,在此容不再贅述。值得一提的是,第三實施例所提供的一種用於投影裝置上的光學模組N,也可以進一步的設置有一第三光學層133,即,可進一步設置有一抗反射膜,第三光學層133可設置於透光基材11的第一表面111上,藉此,投影光源P會先通過第三光學層133,然本發明不以此為限。 First, please refer to FIG. 4. FIG. 4 is a front view of a third embodiment of the optical module of the present invention. As can be seen from a comparison between FIG. 4 and FIG. 2B, the greatest difference between the third embodiment of the present invention and the first embodiment is that the optical unit 13 can be disposed on the optical microstructure layer 12. Specifically, a third embodiment of the present invention provides an optical module N for a projection device, wherein the optical microstructure layer 12 is disposed on the second surface 112 of the transparent substrate 11, and the second optical layer 132 The first optical layer 131 is disposed on the second optical layer 132, wherein the first optical layer 131 is disposed on the optical microstructure layer 12. The second optical layer 132 is an ultraviolet filter film, and the projection light source P sequentially passes through the transparent substrate 11, the optical microstructure layer 12, the second optical layer 132, and the first optical layer 131. A diffusion light source D is formed. Further, the materials of the transparent substrate 11 and the optical unit 13 provided in the third embodiment are the same as those in the first embodiment, and are not described herein again. It is to be noted that the optical module N for the projection device provided by the third embodiment may further be provided with a third optical layer 133, that is, an anti-reflection film may be further disposed, the third optical The layer 133 can be disposed on the first surface 111 of the light-transmitting substrate 11, whereby the projection light source P passes through the third optical layer 133 first, but the invention is not limited thereto.

〔第四實施例〕 [Fourth embodiment]

首先,請參閱圖5所示,圖5為本發明光學模組第四實施例的前視示意圖。由圖5與圖4的比較可以得知,本發明第四實施例與第三實施例最大的差別在於:第一光學層131與第二光學層132的位置可以互換。具體而言,本發明第四實施例所提供的一種用於投影裝置上的光學模組N,其中光學微結構層12可設置於透光基材11的第二表面112上,第一光學層131可設置於光學微結構層12上,第二光學層132可設置於第一光學層131上,其中第一光學層131為一紅外線濾除膜,第二光學層132為一紫外線濾除膜,投影光源P依序通過透光基材11、光學微結構層12、第一光學層131及第二光學層132,以形成擴散光源D。值得一提的是,第四實施例所提供的一種用於投影裝置上的光學模組N,也可以進一步的設置有一第三光學層133,即,可進一步設置有一抗反射膜,第三光學層133可設置於透光基材11的第一表面111上,藉此,投影光源P會先通過第三光學層133,然本發明不以此為限。 First, please refer to FIG. 5. FIG. 5 is a front view of a fourth embodiment of the optical module of the present invention. As can be seen from a comparison between FIG. 5 and FIG. 4, the greatest difference between the fourth embodiment of the present invention and the third embodiment is that the positions of the first optical layer 131 and the second optical layer 132 can be interchanged. Specifically, an optical module N for a projection device according to a fourth embodiment of the present invention, wherein the optical microstructure layer 12 is disposed on the second surface 112 of the transparent substrate 11, the first optical layer The second optical layer 132 can be disposed on the first optical layer 131, wherein the first optical layer 131 is an infrared filter film, and the second optical layer 132 is an ultraviolet filter film. The projection light source P sequentially passes through the transparent substrate 11, the optical microstructure layer 12, the first optical layer 131, and the second optical layer 132 to form the diffusion light source D. It is to be noted that the optical module N for the projection device provided by the fourth embodiment may further be provided with a third optical layer 133, that is, an anti-reflection film may be further disposed, the third optical The layer 133 can be disposed on the first surface 111 of the light-transmitting substrate 11, whereby the projection light source P passes through the third optical layer 133 first, but the invention is not limited thereto.

〔實施例的可能功效〕 [Possible effects of the examples]

綜上所述,本發明的有益效果可以在於,藉由本發明所提供一種用於投影裝置上的光學模組N,可通過設置在透光基材11上的光學微結構層12,以將光源模組2所產生的投影光源P,形成 一具有預定角度θ的擴散光源D,進一步來說,擴散光源D也可以通過光學微結構層12的設置使的擴散光源D能夠更為均勻。此外,也可以通過設置在透光基材11上的第二光學層132及第一光學層131所提供的紫外線濾除膜及紅外線濾除膜,以將會破壞投影系統光閥中液晶分子及脆化塑膠光學元件的紫外線光,及使投影系統內部產生高熱而導致降低光學元件效率及壽命的紅外線光濾除。 In summary, the beneficial effects of the present invention may be that the optical module N for the projection device provided by the present invention can pass the optical microstructure layer 12 disposed on the light-transmitting substrate 11 to The projection light source P generated by the module 2 is formed A diffused light source D having a predetermined angle θ, further, the diffused light source D can also be made more uniform by the arrangement of the optical microstructure layer 12. In addition, the ultraviolet filter film and the infrared filter film provided by the second optical layer 132 and the first optical layer 131 disposed on the transparent substrate 11 may also damage the liquid crystal molecules in the light valve of the projection system. The ultraviolet light of the embrittled plastic optical element and the infrared light filtering which causes the heat inside the projection system to reduce the efficiency and life of the optical element.

以上所述僅為本發明的較佳可行實施例,非因此侷限本發明的專利範圍,故舉凡運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的保護範圍內。 The above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Therefore, equivalent technical changes made by using the present specification and the contents of the drawings are included in the protection scope of the present invention. .

1‧‧‧光學濾片 1‧‧‧Optical filter

11‧‧‧透光基材 11‧‧‧Light transmissive substrate

111‧‧‧第一表面 111‧‧‧ first surface

112‧‧‧第二表面 112‧‧‧ second surface

12‧‧‧光學微結構層 12‧‧‧Optical microstructure layer

13‧‧‧光學單元 13‧‧‧ Optical unit

Claims (9)

一種用於投影裝置上的光學模組,其包括:一光學濾片,所述光學濾片設置於一預定位置上,所述光學濾片包括一透光基材及一光學單元,所述透光基材上具有一光學微結構層;以及一光源模組,所述光源模組包括一發光單元,其中所述發光單元用於產生一直接照射在所述預定位置上的投影光源;其中,所述投影光源通過所述光學濾片,以形成一具有預定角度的擴散光源;其中,所述預定角度介於0至75度之間。 An optical module for a projection device, comprising: an optical filter, the optical filter is disposed at a predetermined position, the optical filter comprises a transparent substrate and an optical unit, The light substrate has an optical microstructure layer; and a light source module, the light source module includes a light emitting unit, wherein the light emitting unit is configured to generate a projection light source directly irradiated at the predetermined position; The projection light source passes through the optical filter to form a diffused light source having a predetermined angle; wherein the predetermined angle is between 0 and 75 degrees. 如請求項1所述之用於投影裝置上的光學模組,其中所述光學單元設置於所述透光基材上,所述光學單元包括一紅外線濾除膜及一紫外線濾除膜。 The optical module for use in a projection device according to claim 1, wherein the optical unit is disposed on the light transmissive substrate, and the optical unit comprises an infrared filter film and an ultraviolet filter film. 如請求項1所述之用於投影裝置上的光學模組,其中所述光學微結構層通過研磨、灌鑄、印刷、蝕刻、噴砂、霧化或模具壓合方式形成。 An optical module for use in a projection device according to claim 1, wherein the optical microstructure layer is formed by grinding, casting, printing, etching, sandblasting, atomizing or mold pressing. 如請求項1所述之用於投影裝置上的光學模組,其中所述透光基材具有一呈現顆粒狀的所述光學微結構層。 An optical module for use in a projection apparatus according to claim 1, wherein said light transmissive substrate has said optical microstructure layer in the form of particles. 如請求項1所述之用於投影裝置上的光學模組,其中所述光學單元包括一第一光學層及一第二光學層,所述透光基材具有一第一表面及一第二表面。 The optical module for use in a projection device of claim 1, wherein the optical unit comprises a first optical layer and a second optical layer, the transparent substrate having a first surface and a second surface. 如請求項5所述之用於投影裝置上的光學模組,其中所述第一光學層設置於所述第一表面上,所述第二光學層設置於所述第一光學層上,所述光學微結構層設置於所述第二表面上,其中所述第一光學層為一紅外線濾除膜,所述第二光學層為一紫外線濾除膜,所述投影光源依序通過所述第二光學層、所述第一光學層、所述透光基材及所述光學微結構層,以形成所述擴散 光源。 The optical module for use in a projection device according to claim 5, wherein the first optical layer is disposed on the first surface, and the second optical layer is disposed on the first optical layer. The optical microstructure layer is disposed on the second surface, wherein the first optical layer is an infrared filter film, the second optical layer is an ultraviolet filter film, and the projection light source sequentially passes through the a second optical layer, the first optical layer, the light transmissive substrate, and the optical microstructure layer to form the diffusion light source. 如請求項5所述之用於投影裝置上的光學模組,其中所述第二光學層設置於所述第一表面上,所述第一光學層設置於所述第二光學層上,所述光學微結構層設置於所述第二表面上,其中所述第一光學層為一紅外線濾除膜,所述第二光學層為一紫外線濾除膜,所述投影光源依序通過所述第一光學層、所述第二光學層、所述透光基材及所述光學微結構層,以形成所述擴散光源。 The optical module for use in a projection device according to claim 5, wherein the second optical layer is disposed on the first surface, and the first optical layer is disposed on the second optical layer. The optical microstructure layer is disposed on the second surface, wherein the first optical layer is an infrared filter film, the second optical layer is an ultraviolet filter film, and the projection light source sequentially passes through the a first optical layer, the second optical layer, the light transmissive substrate, and the optical microstructure layer to form the diffusion light source. 如請求項5所述之用於投影裝置上的光學模組,其中所述光學微結構層設置於所述第二表面上,所述第二光學層設置於所述光學微結構層上,所述第一光學層設置於所述第二光學層上,其中所述第一光學層為一紅外線濾除膜,所述第二光學層為一紫外線濾除膜,所述投影光源依序通過所述透光基材、所述光學微結構層、所述第二光學層及所述第一光學層,以形成所述擴散光源。 The optical module for use in a projection device according to claim 5, wherein the optical microstructure layer is disposed on the second surface, and the second optical layer is disposed on the optical microstructure layer. The first optical layer is disposed on the second optical layer, wherein the first optical layer is an infrared filter film, and the second optical layer is an ultraviolet filter film, and the projection light source sequentially passes through The light transmissive substrate, the optical microstructure layer, the second optical layer, and the first optical layer are formed to form the diffusion light source. 如請求項5所述之用於投影裝置上的光學模組,其中所述光學微結構層設置於所述第二表面上,所述第一光學層設置於所述光學微結構層上,所述第二光學層設置於所述第一光學層上,其中所述第一光學層為一紅外線濾除膜,所述第二光學層為一紫外線濾除膜,所述投影光源依序通過所述透光基材、所述光學微結構層、所述第一光學層及所述第二光學層,以形成所述擴散光源。 The optical module for use in a projection device according to claim 5, wherein the optical microstructure layer is disposed on the second surface, and the first optical layer is disposed on the optical microstructure layer. The second optical layer is disposed on the first optical layer, wherein the first optical layer is an infrared filter film, and the second optical layer is an ultraviolet filter film, and the projection light source sequentially passes through The light transmissive substrate, the optical microstructure layer, the first optical layer, and the second optical layer are formed to form the diffusion light source.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200941048A (en) * 2008-03-31 2009-10-01 Toray Industries Filter for display
US20110116024A1 (en) * 2008-07-17 2011-05-19 Toray Advanced Film Co., Ltd Filter for display
JP2013538433A (en) * 2010-03-24 2013-10-10 エーエスエムエル ネザーランズ ビー.ブイ. Lithographic apparatus and spectral purity filter

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200941048A (en) * 2008-03-31 2009-10-01 Toray Industries Filter for display
US20110116024A1 (en) * 2008-07-17 2011-05-19 Toray Advanced Film Co., Ltd Filter for display
JP2013538433A (en) * 2010-03-24 2013-10-10 エーエスエムエル ネザーランズ ビー.ブイ. Lithographic apparatus and spectral purity filter

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