TWI552869B - Transparent resin-laminated plate - Google Patents

Transparent resin-laminated plate Download PDF

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TWI552869B
TWI552869B TW101113224A TW101113224A TWI552869B TW I552869 B TWI552869 B TW I552869B TW 101113224 A TW101113224 A TW 101113224A TW 101113224 A TW101113224 A TW 101113224A TW I552869 B TWI552869 B TW I552869B
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refractive index
layer
hard coat
mass
transparent resin
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TW201341183A (en
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齊藤昌宏
橋口秀人
板本哲平
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福美化學工業股份有限公司
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透明樹脂疊層板 Transparent resin laminate

本發明係關於抗反射能力高,而且,耐擦傷性,特別是表面硬度優異的透明樹脂疊層板。 The present invention relates to a transparent resin laminated board which has high antireflection ability and is excellent in scratch resistance, particularly surface hardness.

從以往,CRT、LCD、電漿顯示器等的顯示裝置前面的面板上,為了防止表面的反射而容易觀看到畫面,廣泛使用抗反射膜。 Conventionally, on the front panel of a display device such as a CRT, an LCD, or a plasma display, an antireflection film is widely used in order to prevent reflection of a surface and to easily view a screen.

在塑膠基板上,形成有多層膜之具有抗反射能力的透明樹脂疊層板亦為公知,例如,已知在具有透光性的塑膠基板上,依序疊層高折射率層、抗反射層、塗層之為耐磨損性、耐擦傷性、密合性以及透光性優異的透明樹脂疊層板(專利文獻1)。 On the plastic substrate, a transparent resin laminated plate having an antireflection ability in which a multilayer film is formed is also known. For example, it is known to sequentially laminate a high refractive index layer and an antireflection layer on a light transmissive plastic substrate. The coating layer is a transparent resin laminated plate excellent in abrasion resistance, scratch resistance, adhesion, and light transmittance (Patent Document 1).

近來,行動電話、數位相機等的電子機器的進步顯著,做為其顯示裝置,裝備了小型的液晶或有機EL等的顯示器。該顯示器上,由於保護的目的,通常安裝了透明樹脂疊層板,該透明樹脂疊層板,有以下所示之各種的特性的需求。例如,為了確保視讀性,透明性、以及抗反射能力高為有必要。從機械強度的觀點,耐衝撃性、耐擦傷性、高硬度為有必要。並且,為了防止由於塵埃的附著或帶電對機器的不良影響,抗帶電能力也為必要。 Recently, electronic devices such as mobile phones and digital cameras have made remarkable progress as display devices, and are equipped with displays such as small liquid crystals or organic ELs. On the display, a transparent resin laminated board is usually mounted for the purpose of protection, and the transparent resin laminated board has various characteristics as shown below. For example, it is necessary to ensure high visibility, transparency, and anti-reflection ability. From the viewpoint of mechanical strength, it is necessary to have impact resistance, scratch resistance, and high hardness. Further, in order to prevent adverse effects on the machine due to adhesion of dust or electrification, anti-charge capability is also necessary.

上述各種特性之中,與機械強度相關之耐衝撃性、耐擦傷性、高硬度的各特性,不一定能並存,例如,耐衝撃性高不易破損的物品,有表面硬度或耐擦傷性不足而容易有傷痕的問題。在如此的狀況下,具高硬度、耐擦傷性優異的耐衝撃性之透明樹脂疊層板的開發已在進行(專利文獻2、3)。但是,該等既存的技術,在鉛筆硬度試驗中,現狀為只達成滿足「4H沒有傷痕」的程度的表面硬度。另一方面,行動電話、智慧型(功能型)手機、平板型電腦等的行動終端機,有在掉落、踐踏、摩擦等嚴苛的使用環境的可能性,擁有更高的表面硬度,並且,抗反射能力優異的透明樹脂 疊層板有其必要。 Among the above various characteristics, the characteristics of the punching resistance, the scratch resistance, and the high hardness relating to the mechanical strength may not necessarily coexist. For example, an article having high punching resistance and being easily broken may have insufficient surface hardness or scratch resistance. It is easy to have problems with scars. Under such circumstances, development of a transparent resin laminated plate having high hardness and scratch resistance which is excellent in impact resistance has been carried out (Patent Documents 2 and 3). However, in the existing hardness technique, in the pencil hardness test, the surface hardness of only "4H without scratches" is achieved. On the other hand, mobile terminal devices such as mobile phones, smart (functional) mobile phones, and tablet computers have the possibility of being subjected to harsh environments such as dropping, trampling, and friction, and have higher surface hardness, and , transparent resin with excellent anti-reflection ability Laminates are necessary.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

專利文獻1:日本特開平9-288202號公報 Patent Document 1: Japanese Patent Laid-Open No. Hei 9-288202

專利文獻2:日本特開2006-35778 Patent Document 2: Japanese Special Open 2006-35778

專利文獻3:日本特開2007-216525 Patent Document 3: Japanese Special Opening 2007-216525

本發明為解決上述課題,目的在於提供高耐衝撃性及抗反射能力而且耐擦傷性以及表面硬度優異的透明樹脂疊層板。 In order to solve the above problems, an object of the present invention is to provide a transparent resin laminated board which is excellent in impact resistance and antireflection ability and excellent in scratch resistance and surface hardness.

本案發明人等,在做了維持高抗反射能力並改良上述各物性的種種探討後的結果,發現:樹脂基板與抗反射層之間,設置多層的硬塗層,並且,藉由使位於基板側的硬塗單層中含有特定的二氧化矽溶膠,在鉛筆硬度試驗中會展現「7H也沒有傷痕」以上的表面硬度,而且,其他的特性也可滿足,乃完成本申請發明。 The inventors of the present invention have found that a plurality of hard coat layers are provided between the resin substrate and the antireflection layer, and the substrate is placed on the substrate by performing various investigations on maintaining high antireflection ability and improving the above physical properties. The hard coat layer on the side contains a specific cerium oxide sol, and the surface hardness of "7H without scratches" is exhibited in the pencil hardness test, and other characteristics are also satisfied, and the invention of the present application is completed.

亦即,根據本發明,提供一種透明樹脂疊層板,係於透明樹脂基板(A)上疊層硬塗層(B),且在該硬塗層(B)上疊層抗反射層(C)而成之透明樹脂疊層板;硬塗層(B)係由位於透明樹脂基板側的硬塗層I(B1)與位於抗反射層側的硬塗層II(B2)構成;硬塗層I(B1)的層厚為5~20μm,由含有(a)1分子中具有6個以上的(甲基)丙烯醯基之多官能性胺甲酸酯丙烯酸酯(urethane acrylate),以及相對於該多官能性胺甲酸酯丙烯酸酯100質量份含有(b)表面處理二氧化矽溶膠40~200質量份而成之硬化性組成物的硬化體構成; 硬塗層II(B2)的層厚為1~10μm,由含有(a)1分子中具有6個以上的(甲基)丙烯醯基之多官能性胺甲酸酯丙烯酸酯,以及相對於該多官能性胺甲酸酯丙烯酸酯100質量份,含有(c)平均粒徑為5~30nm且折射率為1.44~1.50的二氧化矽溶膠1~50質量份、(d)矽烷偶合化合物或是其水解物1~30質量份,以及(e)金屬螯合化合物0.1~3.0質量份而成之硬化性組成物的硬化體構成;抗反射層(C)由折射率未達1.50且厚度為50~200nm之低折射率層(C1)構成;該低折射率層(C1)由含有(f)平均粒徑為5~150nm、折射率為1.44以下的二氧化矽溶膠、(d)矽烷偶合化合物或是其水解物,以及(e)金屬螯合化合物而成之硬化性組成物的硬化體構成,且摻合有10~50質量%的(f)二氧化矽溶膠,(d)矽烷偶合化合物或是其水解物與(e)金屬螯合化合物的摻合比為60~99質量%:40~1質量%。 That is, according to the present invention, there is provided a transparent resin laminated board in which a hard coat layer (B) is laminated on a transparent resin substrate (A), and an antireflection layer (C) is laminated on the hard coat layer (B). a transparent resin laminated plate; the hard coat layer (B) is composed of a hard coat layer I (B1) on the side of the transparent resin substrate and a hard coat layer II (B2) on the side of the antireflection layer; I(B1) has a layer thickness of 5 to 20 μm and is composed of a polyfunctional urethane acrylate having 6 or more (meth) acrylonitrile groups in (a) one molecule, and 100 parts by mass of the polyfunctional urethane acrylate, which comprises a hardened composition of (b) a surface-treated cerium oxide sol of 40 to 200 parts by mass; The hard coat layer II (B2) has a layer thickness of 1 to 10 μm and is composed of a polyfunctional urethane acrylate having 6 or more (meth) acrylonitrile groups in (a) one molecule, and 100 parts by mass of a polyfunctional urethane acrylate containing (c) 1 to 50 parts by mass of a cerium oxide sol having an average particle diameter of 5 to 30 nm and a refractive index of 1.44 to 1.50, (d) a decane coupling compound or 1 to 30 parts by mass of the hydrolyzate, and (e) 0.1 to 3.0 parts by mass of the metal chelate compound, which is composed of a hardened body; the antireflection layer (C) has a refractive index of less than 1.50 and a thickness of 50 a low refractive index layer (C1) of ~200 nm; the low refractive index layer (C1) comprising (f) a cerium oxide sol having an average particle diameter of 5 to 150 nm and a refractive index of 1.44 or less, and (d) a decane coupling compound Or a hydrolyzate thereof, and (e) a hardened composition of a metal chelate compound, and blended with 10 to 50% by mass of (f) cerium oxide sol, (d) decane coupling compound Or the blend ratio of the hydrolyzate to the (e) metal chelate compound is 60 to 99% by mass: 40 to 1% by mass.

於上述透明樹脂疊層板的發明中, In the invention of the above transparent resin laminated board,

(1)抗反射層(C),由該低折射率層(C1)與位於透明樹脂基板側之中折射率層(C2)之二層所構成,該中折射率層(C2),其折射率在1.50以上未達1.75,厚度為50~200nm。 (1) The antireflection layer (C) is composed of the low refractive index layer (C1) and two layers of the refractive index layer (C2) located on the transparent resin substrate side, and the medium refractive index layer (C2) is refracted The rate is less than 1.50 and not 1.75, and the thickness is 50 to 200 nm.

(2)抗反射層(C),由該低折射率層(C1)、該中折射率層(C2)、以及設置在該低折射率層與該中折射率層之間之高折射率層(C3)三層所構成,該高折射率層(C3)其折射率在1.60以上未達2.00,厚度為50~200nm,高折射率層(C3)的折射率較中折射率層(C2)的折射率大。 (2) an antireflection layer (C), the low refractive index layer (C1), the medium refractive index layer (C2), and a high refractive index layer disposed between the low refractive index layer and the medium refractive index layer (C3) consisting of three layers, the high refractive index layer (C3) having a refractive index of 1.60 or more and less than 2.00, a thickness of 50 to 200 nm, and a high refractive index layer (C3) having a refractive index higher than that of the medium refractive index layer (C2) The refractive index is large.

(3)表面處理二氧化矽溶膠,為(甲基)丙烯醯基修飾二氧化矽溶膠或是乙烯基修飾二氧化矽溶膠為合適。 (3) The surface treatment of the cerium oxide sol is preferably a (meth) acrylonitrile-modified cerium oxide sol or a vinyl-modified cerium oxide sol.

本發明之透明樹脂疊層板,為抗反射能力高而且耐擦傷性或硬度等機械強度優異,特別是表面硬度能達到「7H也沒有傷痕」。 因此,不僅僅是一般的顯示裝置,可適合做為行動電話、智慧型(功能型)手機、平板型電腦等的有高硬度需求的裝置之前面面板使用。 The transparent resin laminated plate of the present invention has high antireflection ability and excellent mechanical strength such as scratch resistance or hardness, and in particular, the surface hardness can reach "7H without scars". Therefore, it is not only a general display device, but also can be suitably used as a front panel of a device having a high hardness requirement such as a mobile phone, a smart (functional) mobile phone, or a tablet computer.

[實施發明之形態] [Formation of the Invention]

本發明之透明樹脂疊層板,具有依序疊層透明樹脂基板(A)、硬塗層(B)、以及抗反射層(C)的基本結構。而且,該等之層(B及C),特徵為由前述特定之結構、物性、成分構成。 The transparent resin laminated plate of the present invention has a basic structure in which a transparent resin substrate (A), a hard coat layer (B), and an antireflection layer (C) are laminated in this order. Further, the layers (B and C) are characterized by the specific structure, physical properties, and composition described above.

[透明樹脂基板] [Transparent resin substrate]

做為透明樹脂基板,只要是耐衝撃強度優異且不造成視野性的障礙之透明樹脂即可,無任何限制。從透明性以及耐衝撃強度的觀點而言,由芳香族聚碳酸酯樹脂或是聚甲基丙烯酸甲酯樹脂構成之基板為理想。芳香族聚碳酸酯樹脂與聚甲基丙烯酸甲酯樹脂的疊層基板亦可。該基板的厚度,係從需求的透明度或耐衝撃強度適當地選擇並設計,通常,從0.2~2.0mm的範圍內選擇。 The transparent resin substrate is not particularly limited as long as it is a transparent resin which is excellent in punching strength and does not cause an obstacle to visibility. From the viewpoint of transparency and impact strength, a substrate composed of an aromatic polycarbonate resin or a polymethyl methacrylate resin is preferable. A laminated substrate of an aromatic polycarbonate resin and a polymethyl methacrylate resin may also be used. The thickness of the substrate is appropriately selected and designed from the required transparency or impact strength, and is usually selected from the range of 0.2 to 2.0 mm.

[硬塗層(B)] [hard coating (B)]

於透明樹脂基板上疊層硬塗層(B),該層(B),由硬塗層I(B1)與硬塗層II(B2)組成。硬塗層I(B1)與硬塗層II(B2),係使硬塗層I(B1)位於基板側並在硬塗層II(BB2)之上疊層後述抗反射層(C)。 A hard coat layer (B) is laminated on the transparent resin substrate, and the layer (B) is composed of a hard coat layer I (B1) and a hard coat layer II (B2). The hard coat layer I (B1) and the hard coat layer II (B2) are such that the hard coat layer I (B1) is on the substrate side and the antireflection layer (C) described later is laminated on the hard coat layer II (BB2).

[硬塗層I(B1)] [hard coating I (B1)]

硬塗層I(B1)為主要貢獻硬度之層,其膜厚為5~20μm,理想為10~20μm。未達5μm時硬度會不足,超過20μm時外觀不佳或後加工性有困難。 The hard coat layer I (B1) is a layer mainly contributing hardness, and has a film thickness of 5 to 20 μm, preferably 10 to 20 μm. When the thickness is less than 5 μm, the hardness is insufficient, and when it exceeds 20 μm, the appearance is poor or the workability is difficult.

該層,為由含有(a)1分子中具有6個以上的(甲基)丙烯醯基之多官能性胺甲酸酯丙烯酸酯(以下,也稱為多官能性胺甲酸酯丙烯酸酯),以及相對於該多官能性胺甲酸酯丙烯酸酯100質量份含有 (b)表面處理二氧化矽溶膠40~200質量份而成之硬化性組成物(以下,稱為B1組成物)硬化而得之層。 This layer is a polyfunctional urethane acrylate (hereinafter, also referred to as polyfunctional urethane acrylate) having 6 or more (meth) acrylonitrile groups in one molecule (a). And containing 100 parts by mass relative to the polyfunctional urethane acrylate (b) A layer obtained by curing a curable composition (hereinafter referred to as a B1 composition) in which 40 to 200 parts by mass of the cerium oxide sol is surface-treated.

<(a)多官能性胺甲酸酯丙烯酸酯> <(a) Polyfunctional urethane acrylate>

多官能性胺甲酸酯丙烯酸酯,為藉由二異氰酸酯化合物與具有多數羥基之(甲基)丙烯酸酯化合物之加成聚合反應而得之聚合性化合物,特別是,必須含有6個以上的(甲基)丙烯醯基。藉由使用該多官能性胺甲酸酯丙烯酸酯,可形成表面硬度高而緻密的層。(甲基)丙烯醯基少於6個的化合物,表面硬度不足而缺乏耐擦傷性。 The polyfunctional urethane acrylate is a polymerizable compound obtained by addition polymerization of a diisocyanate compound and a (meth) acrylate compound having a plurality of hydroxyl groups, and in particular, it is necessary to contain 6 or more ( Methyl) acrylonitrile. By using the polyfunctional urethane acrylate, a layer having a high surface hardness and a dense layer can be formed. A compound having less than 6 (meth)acrylonitrile groups has insufficient surface hardness and lacks scratch resistance.

做為成為加成聚合反應的原料之二異氰酸酯化合物,可舉例為:伸甲苯基二異氰酸酯或二苯基甲烷二異氰酸酯等的芳香族二異氰酸酯;1,6-六亞甲基二異氰酸酯或1,3-雙(異氰酸甲酯)環己烷等的脂肪族二異氰酸酯。做為成為另一方的原料之(甲基)丙烯酸酯化合物,可舉例為:三羥甲基丙烷(甲基)丙烯酸酯或季戊四醇(甲基)丙烯酸酯。 The diisocyanate compound which is a raw material for the addition polymerization reaction may, for example, be an aromatic diisocyanate such as tolyl diisocyanate or diphenylmethane diisocyanate; 1,6-hexamethylene diisocyanate or 1, An aliphatic diisocyanate such as 3-bis(methyl isocyanate)cyclohexane. The (meth) acrylate compound which is the raw material of the other side may, for example, be trimethylolpropane (meth) acrylate or pentaerythritol (meth) acrylate.

將該等兩原料,以(甲基)丙烯醯基為成為6倍莫耳以上的量比使用,接著以本身公知的方法予以反應,可成為前述多官能性胺甲酸酯丙烯酸酯。 These two raw materials are used in an amount of 6 times by mole or more based on the (meth) acrylonitrile group, and then reacted in a manner known per se to obtain the above-mentioned polyfunctional urethane acrylate.

<(b)表面處理二氧化矽溶膠> <(b) Surface treatment of cerium oxide sol>

表面處理二氧化矽溶膠,為藉由與多官能性胺甲酸酯丙烯酸酯組合,而對本發明之透明樹脂基板賦予極高硬度的成分。相對於前述該多官能性胺甲酸酯丙烯酸酯100質量份,以40~200質量份的比例摻合為重要。 The surface-treated cerium oxide sol is a component which imparts extremely high hardness to the transparent resin substrate of the present invention by being combined with a polyfunctional urethane acrylate. It is important to blend in an amount of 40 to 200 parts by mass based on 100 parts by mass of the above polyfunctional urethane acrylate.

表面處理二氧化矽溶膠,為將該本身公知的二氧化矽粒子的表面,以3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷等的末端具有烷氧矽基的矽烷偶合劑處理後之(甲基)丙烯醯基修飾二氧化矽溶膠、或是乙烯基三乙氧基矽烷、乙烯基甲基二甲氧基矽烷等的具有乙烯基的矽烷偶合劑處理後之乙烯 基修飾二氧化矽溶膠。 The surface-treated cerium oxide sol is a surface of the cerium oxide particles known per se, and is 3-methylpropenyloxypropyltriethoxydecane, 3-propenyloxypropyltrimethoxydecane, or the like. a (meth) propylene fluorenyl modified cerium oxide sol treated with a decane coupling agent having an alkoxy fluorenyl group at the end, or a vinyl triethoxy decane, vinyl methyl dimethoxy decane or the like having ethylene Ethylene treated with a decane coupling agent The base is modified with a cerium oxide sol.

表面處理的方法無特別限定,可採用習知公知的方法。例如:將上述矽烷偶合劑,溶解於含水之甲醇、甲苯、甲基異丁基酮、甲基異丁基丁基酮等的有機溶劑中成為溶液,並於該溶液中投入二氧化矽溶膠,於50~150℃左右加溫並攪拌5~30小時左右,予以反應。 The method of the surface treatment is not particularly limited, and a conventionally known method can be employed. For example, the decane coupling agent is dissolved in an organic solvent such as methanol, toluene, methyl isobutyl ketone or methyl isobutyl butyl ketone to form a solution, and a cerium oxide sol is introduced into the solution. Heat at about 50~150 °C and stir for about 5~30 hours to react.

<B1組成物> <B1 composition>

B1組成物為藉由硬化成為硬塗層I之組成物,相對於前述多官能性胺甲酸酯丙烯酸酯100質量份,表面處理二氧化矽溶膠含量為40~200質量份的比例。B1組成物中,可將以黏度調整或易塗佈性為目的之任意的添加劑,在無損其目的之範圍內添加。特別是,為了將該組成物於透明樹脂基板上硬化成為硬塗層I(B1),通常,將熱聚合起始劑或是光聚合起始劑以觸媒添加,通常以組成物中的固體成分總量做為標準,添加0.01~20質量%。此聚合起始劑,對於將B1組成物硬化而得之硬塗層I之各種特性並不會造成本質的影響。 The B1 composition is a composition of the hard coat layer I by hardening, and the surface-treated cerium oxide sol content is 40 to 200 parts by mass based on 100 parts by mass of the polyfunctional urethane acrylate. In the composition of B1, any additive for the purpose of viscosity adjustment or easy coating property can be added within the range which does not impair the purpose. In particular, in order to harden the composition on the transparent resin substrate to form the hard coat layer I (B1), usually, a thermal polymerization initiator or a photopolymerization initiator is added as a catalyst, usually as a solid in the composition. The total amount of the ingredients is used as a standard, and 0.01 to 20% by mass is added. This polymerization initiator does not have an essential influence on various characteristics of the hard coat layer I obtained by hardening the B1 composition.

做為該聚合起始劑,從防止透明樹脂基板由於熱造成變形的觀點而言,以紫外線或電子束等作用之2,2’-二甲氧基-1,2-二苯基乙-1-酮、1-羥基-環己基-苯基-酮、樟腦醌(Camphorquinone)、二苯乙二酮(Benzil)等的光聚合起始劑為較合適。 As the polymerization initiator, 2,2'-dimethoxy-1,2-diphenylethyl-1 which acts by ultraviolet rays or electron beams from the viewpoint of preventing deformation of the transparent resin substrate due to heat A photopolymerization initiator such as a ketone, 1-hydroxy-cyclohexyl-phenyl-ketone, camphorquinone, Benzil or the like is suitable.

<硬塗層I的形成> <Formation of Hard Coating I>

將上述(a)以及(b)的各必要成分,及任意成分,溶解於下述溶劑製成B1組成物的溶液,並將此溶液塗佈於前述透明樹脂基板後,以50℃以上將溶劑乾燥,接著藉由紫外線照射而硬化,形成硬塗層I。該層的厚度為5~20μm,理想為設定在10~20μm的範圍內。 The respective components (a) and (b) and the optional components are dissolved in the following solvent to prepare a solution of the B1 composition, and after applying the solution to the transparent resin substrate, the solvent is applied at 50 ° C or higher. It is dried and then hardened by ultraviolet irradiation to form a hard coat layer I. The thickness of this layer is 5 to 20 μm, and is preferably set in the range of 10 to 20 μm.

所使用之溶劑:乙醇、(異)丙醇等的醇系溶劑;甲苯、二甲苯等的芳香族系溶劑;乙酸(異)丁酯等的乙酸酯系溶劑;甲基乙基酮 (MEK)、甲基異丁基酮(MlBK)等的酮系溶劑等為適合。該等溶劑,在硬塗層I形成時,蒸發去除。 Solvent to be used: an alcohol solvent such as ethanol or (iso)propanol; an aromatic solvent such as toluene or xylene; an acetate solvent such as (iso)butyl acetate; and methyl ethyl ketone; A ketone solvent such as (MEK) or methyl isobutyl ketone (MlBK) is suitable. These solvents are removed by evaporation when the hard coat layer I is formed.

構成B1組成物之上述各成分,通常,在室溫附近,與溶劑以任意的順序混合,攪拌而成溶液。 Each of the above components constituting the composition of B1 is usually mixed with a solvent in an arbitrary order at room temperature, and stirred to form a solution.

該溶液塗佈在透明樹脂基板上的方法沒有特別限制,可採用浸塗法、輥塗法、模具塗佈法、淋塗法、噴塗法等的方法,但從外觀品質或控制膜厚的觀點而言浸塗法為適合。 The method of applying the solution to the transparent resin substrate is not particularly limited, and a dip coating method, a roll coating method, a die coating method, a shower coating method, a spray coating method, or the like may be employed, but from the viewpoint of appearance quality or film thickness control. The dip coating method is suitable.

[硬塗層II(B2)] [hard coating II (B2)]

硬塗層II(B2)為主要賦予與疊層於其上之抗反射層的密合性之層,其膜厚為1~10μm。未達1μm則密合性不足,超過10μm則維持外觀變得困難。 The hard coat layer II (B2) is a layer mainly imparting adhesion to the antireflection layer laminated thereon, and has a film thickness of 1 to 10 μm. When the thickness is less than 1 μm, the adhesion is insufficient, and when it exceeds 10 μm, it is difficult to maintain the appearance.

該層,為由含有(a)多官能性胺甲酸酯丙烯酸酯,以及相對於該多官能性胺甲酸酯丙烯酸酯100質量份,含有(c)平均粒徑為5~30nm且折射率為1.44~1.50的二氧化矽溶膠1~50質量份、(d)矽烷偶合化合物或是其水解物1~30質量份,以及(e)金屬螯合化合物0.1~3.0質量份而成之硬化性組成物(以下,也稱為B2組成物)的硬化體構成之層。 The layer contains (a) a polyfunctional urethane acrylate, and (c) an average particle diameter of 5 to 30 nm and a refractive index relative to 100 parts by mass of the polyfunctional urethane acrylate. It is 1 to 50 parts by mass of 1.44 to 1.50 of cerium oxide sol, (d) a decane coupling compound or a hydrolyzate of 1 to 30 parts by mass, and (e) a metal chelating compound of 0.1 to 3.0 parts by mass. A layer composed of a cured body of a composition (hereinafter, also referred to as a B2 composition).

做為(a)多官能性胺甲酸酯丙烯酸酯,可使用與在硬塗層I項所列舉者相同者。 As the (a) polyfunctional urethane acrylate, the same as those enumerated in the hard coat layer I can be used.

<(c)二氧化矽溶膠> <(c) cerium oxide sol>

硬塗層II(B2)中含有之二氧化矽溶膠,為有助於耐擦傷性的提升之粒子,平均粒徑為5~30nm且折射率為1.44~1.50。若平均粒徑在上述範圍之外,耐龜裂性會惡化。 The cerium oxide sol contained in the hard coat layer II (B2) is a particle which contributes to the improvement of scratch resistance, and has an average particle diameter of 5 to 30 nm and a refractive index of 1.44 to 1.50. When the average particle diameter is outside the above range, the crack resistance is deteriorated.

上述二氧化矽溶膠為由單粒子組成,內部緊密,為內部沒有空間的非中空之粒子,密度通常為1.9g/cm3以上。由於該二氧化矽溶膠本身為公知且在市面販售,選擇使用滿足上述平均粒徑與折射率之市售品即可。該二氧化矽溶膠,由於通常以在溶劑中分 散的狀態提供,此溶劑,必然會混入硬塗層II形成用的硬化性組成物溶液中,與其他溶劑行為相同。 The cerium oxide sol is composed of a single particle and has a tight interior and a non-hollow particle having no space inside, and has a density of usually 1.9 g/cm 3 or more. Since the cerium oxide sol itself is known and sold commercially, it is preferable to use a commercially available product satisfying the above average particle diameter and refractive index. The cerium oxide sol is usually supplied in a state of being dispersed in a solvent, and this solvent is inevitably mixed into the hardenable composition solution for forming the hard coat layer II, and behaves in the same manner as other solvents.

<(d)矽烷偶合化合物或是其水解物> <(d) decane coupling compound or its hydrolyzate>

矽烷偶合化合物或是其水解物,其本身水解形成緻密的矽酸質之被覆膜。 The decane coupling compound or a hydrolyzate thereof is hydrolyzed by itself to form a dense coating film of phthalic acid.

做為該矽烷偶合化合物,可無限制地使用公知者。例如,可舉出:γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、2-(3,4環氧環己基)乙基三甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、γ-胺丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、N-2(胺乙基)3-胺丙基甲基二甲氧基矽烷、N-2(胺乙基)3-胺丙基三乙氧基矽烷、N-2(胺乙基)3-胺丙基三乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-巰基丙基三甲氧基矽烷、3-異氰酸酯丙基三乙氧基矽烷等。 As the decane coupling compound, a known one can be used without limitation. For example, γ-methacryloxypropyltrimethoxydecane, γ-methylpropenyloxypropylmethyldimethoxydecane, 3-propenyloxypropyltrimethoxy group Decane, vinyltrimethoxydecane, vinyltriethoxydecane, p-styryltrimethoxydecane, γ-glycidoxypropyltrimethoxydecane, 2-(3,4 epoxycyclohexyl Ethyltrimethoxydecane, γ-glycidoxypropylmethyldimethoxydecane, 3-glycidoxypropylmethyldiethoxydecane, γ-aminopropyltrimethoxy Decane, 3-aminopropyltriethoxydecane, N-2 (aminoethyl) 3-aminopropylmethyldimethoxydecane, N-2 (aminoethyl) 3-aminopropyltriethoxy Baseline, N-2 (aminoethyl) 3-aminopropyltriethoxydecane, 3-mercaptopropylmethyldimethoxydecane, 3-mercaptopropyltrimethoxydecane, 3-isocyanatepropyl Triethoxy decane and the like.

該矽烷偶合化合物,依據其種類,為了提升對水或溶劑的溶解性之目的,用稀薄的酸等預先水解成分解物為適宜。預先水解之方法無特別限制,一般為使用乙酸等的酸觸媒將其一部分水解之方法。 The decane coupling compound is suitably hydrolyzed to a decomposition product by a thin acid or the like for the purpose of improving the solubility in water or a solvent depending on the type thereof. The method of pre-hydrolysis is not particularly limited, and is generally a method of hydrolyzing a part thereof using an acid catalyst such as acetic acid.

<(e)金屬螯合化合物> <(e) Metal Chelate Compound>

金屬螯合化合物,係以為了提高層的緻密性或強度,甚至是使硬度更高而含有。該金屬螯合化合物,係將以雙牙配位子做為代表例之螯合劑配位於鈦、鋯、鋁等金屬之化合物。 The metal chelate compound is contained in order to increase the compactness or strength of the layer or even to make the hardness higher. The metal chelating compound is a compound in which a chelating agent represented by a bidentate ligand is a metal such as titanium, zirconium or aluminum.

具體而言,可列舉為:三乙氧基.單(乙醯丙酮酸)鈦、二乙氧基.雙(乙醯丙酮酸)鈦、單乙氧基.參(乙醯丙酮酸)鈦、肆(乙醯丙酮酸)鈦、三乙氧基.單(乙基乙醯乙酸)鈦、二乙氧基.雙(乙基乙醯乙酸)鈦、單乙氧基.參(乙基乙醯乙酸)鈦、單(乙醯丙酮酸) 參(乙基乙醯乙酸)鈦、雙(乙醯丙酮酸)雙(乙基乙醯乙酸)鈦、參(乙醯丙酮酸)單(乙基乙醯乙酸)鈦等的鈦螯合化合物;三乙氧基.單(乙醯丙酮酸)鋯、二乙氧基.雙(乙醯丙酮酸)鋯、單乙氧基.參(乙醯丙酮酸)鋯、肆(乙醯丙酮酸)鋯、三乙氧基.單(乙基乙醯乙酸)鋯、二乙氧基.雙(乙基乙醯乙酸)鋯、單乙氧基.參(乙基乙醯乙酸)鋯、肆(乙基乙醯乙酸)鋯、單(乙醯丙酮酸)參(乙基乙醯乙酸)鋯、雙(乙醯丙酮酸)雙(乙基乙醯乙酸)鋯、參(乙醯丙酮酸)單(乙基乙醯乙酸)鋯等的鋯螯合化合物;二乙氧基.單(乙醯丙酮酸)鋁、單乙氧基,雙(乙醯丙酮酸)鋁、二異丙氧基.單(乙醯丙酮酸)鋁、單乙氧基.雙(乙基乙醯乙酸)鋁、二乙氧基.單(乙基乙醯乙酸)鋁等的鋁螯合化合物。 Specifically, it can be cited as: triethoxy. Single (acetylpyruvate) titanium, diethoxy. Bis(acetylpyruvate) titanium, monoethoxy. Reference (acetyl acetonate) titanium, bismuth (acetyl acetonate) titanium, triethoxy. Single (ethyl acetonitrile) titanium, diethoxy. Bis(ethylacetamidineacetic acid) titanium, monoethoxy. Reference (ethyl ethyl acetonitrile) titanium, single (acetyl acetonate) a titanium chelate compound such as titanium (ethyl acetoacetate), bis(ethyl acetonate) bis(ethyl acetonitrile) titanium, ginseng (acetyl acetonate) mono(ethyl acetonitrile) titanium; Triethoxy. Single (acetyl acetonate) zirconium, diethoxy. Bis(acetylpyruvyl)zirconium, monoethoxy. Zirconium (acetyl acetonate) zirconium, cerium (acetyl acetonate) zirconium, triethoxy. Mono(ethylacetamidineacetic acid) zirconium, diethoxy. Bis(ethylacetamidineacetic acid) zirconium, monoethoxy. Zirconium (ethyl acetoacetate) zirconium, cerium (ethyl acetoacetate) zirconium, mono (acetyl acetonate) ginseng (ethyl acetoacetate) zirconium, bis (acetyl acetonate) bis (ethyl acetamidine) Zirconium chelate compound such as zirconium acetate, zirconium (acetylacetonate) mono(ethylacetonitrile acetate) zirconium; diethoxy. Single (acetyl acetonate) aluminum, monoethoxy, bis(acetyl acetonate) aluminum, diisopropoxy. Single (acetylpyruvate) aluminum, monoethoxy. Bis(ethylacetamidineacetic acid) aluminum, diethoxy. An aluminum chelate compound such as mono(ethylacetonitrile)aluminum.

<B2組成物> <B2 composition>

B2組成物,為以(a)、(c)、(d)以及(e)成分做為必要成分的硬化性之組成物,以下述特定比率摻合。 The B2 composition is a curable composition containing the components (a), (c), (d), and (e) as essential components, and is blended at a specific ratio described below.

(c)二氧化矽溶膠,相對於多官能性胺甲酸酯丙烯酸酯100質量份以1~50質量份摻合。未達1質量份則無法展現耐擦傷性,若超過50質量份則膜密合性會惡化。 (c) The cerium oxide sol is blended in an amount of 1 to 50 parts by mass based on 100 parts by mass of the polyfunctional urethane acrylate. When the amount is less than 1 part by mass, the scratch resistance is not exhibited, and if it exceeds 50 parts by mass, the film adhesion is deteriorated.

(d)矽烷偶合化合物或是其水解物,相對於多官能性胺甲酸酯丙烯酸酯100質量份以1~30質量份摻合。未達1質量份則膜密合性會惡化,若超過50質量份則耐擦傷性會惡化。 (d) The decane coupling compound or the hydrolyzate thereof is blended in an amount of 1 to 30 parts by mass based on 100 parts by mass of the polyfunctional urethane acrylate. When the amount is less than 1 part by mass, the film adhesion is deteriorated, and if it exceeds 50 parts by mass, the scratch resistance is deteriorated.

(e)金屬螯合化合物,相對於多官能性胺甲酸酯丙烯酸酯100質量份以0.1~3.0質量份摻合。若在此範圍之外,與此硬塗膜II上形成之抗反射層C之間的密合性會惡化。 (e) The metal chelate compound is blended in an amount of 0.1 to 3.0 parts by mass based on 100 parts by mass of the polyfunctional urethane acrylate. If it is outside this range, the adhesion with the antireflection layer C formed on the hard coat film II may deteriorate.

B2組成物,與B1組成物相同,可添加任意的添加成分。通常,為了促進硬化的目的添加聚合起始劑,為了塗佈的目的使用溶劑。B2組成物的製備方法,亦依照B1組成物的進行。 The B2 composition is the same as the B1 composition, and any optional component may be added. Usually, a polymerization initiator is added for the purpose of promoting hardening, and a solvent is used for the purpose of coating. The preparation method of the B2 composition is also carried out in accordance with the composition of B1.

<硬塗層II之形成> <Formation of Hard Coating II>

硬塗層II,直接疊層在透明樹脂基板上所疊層之硬塗層I之 上,形成由二層構成的硬塗層。該硬塗層II的形成,依照硬塗層I的形成,同樣進行塗佈法、硬化方法等。形成之層的厚度設定在1~10μm的範圍。 Hard coat layer II, directly laminated on a transparent resin substrate, laminated with a hard coat layer I On top, a hard coat layer composed of two layers is formed. The formation of the hard coat layer II is carried out in the same manner as in the formation of the hard coat layer I, and the like. The thickness of the formed layer is set in the range of 1 to 10 μm.

[抗反射層(C)] [Anti-reflection layer (C)]

本發明之透明樹脂疊層板,係在前述透明樹脂基板上疊層之硬塗層之上,直接疊層抗反射層(C)。該抗反射層(C),由折射率為未達1.50,厚度為50~200nm之低折射率層(C1)所構成。且,如後述,抗反射層(C),在由多數的抗反射層構成的情況,該低折射率層,係成為最外層(視野側)之抗反射層。 The transparent resin laminated plate of the present invention is obtained by directly laminating an antireflection layer (C) on a hard coat layer laminated on the transparent resin substrate. The antireflection layer (C) is composed of a low refractive index layer (C1) having a refractive index of less than 1.50 and a thickness of 50 to 200 nm. Further, as will be described later, when the antireflection layer (C) is composed of a plurality of antireflection layers, the low refractive index layer is an antireflection layer of the outermost layer (viewing side).

低折射率層(C1),若其折射率為1.50以上則無法展現充分的抗反射機能。又,厚度若在50~200nm的範圍之外,無法展現抗反射機能。 The low refractive index layer (C1) does not exhibit sufficient antireflection function if its refractive index is 1.50 or more. Moreover, if the thickness is outside the range of 50 to 200 nm, the antireflection function cannot be exhibited.

該低折射率層(C1),係由含有(f)平均粒徑為5~150nm、折射率為1.44以下的二氧化矽溶膠、(d)矽烷偶合化合物或是其水解物,以及(e)金屬螯合化合物之硬化性組成物(C1組成物)而成的硬化體構成之層,且摻合有10~50質量%的(f)二氧化矽溶膠,(d)矽烷偶合化合物或是其水解物與(e)金屬螯合化合物的摻合比為60~99質量%:40~1質量%。 The low refractive index layer (C1) is composed of (f) a cerium oxide sol having an average particle diameter of 5 to 150 nm, a refractive index of 1.44 or less, (d) a decane coupling compound or a hydrolyzate thereof, and (e) a layer composed of a hardened body of a curable composition (C1 composition) of a metal chelate compound, and blended with 10 to 50% by mass of (f) cerium oxide sol, (d) a decane coupling compound or The blending ratio of the hydrolyzate to the (e) metal chelate compound is 60 to 99% by mass: 40 to 1% by mass.

<(f)二氧化矽溶膠> <(f) cerium oxide sol>

低折射率層(C1)中含有的二氧化矽溶膠,為控制該層的折射率之粒子,平均粒徑為5~150nm、折射率為1.44以下。若平均粒徑在上述範圍之外,反射性能低落、混濁率上昇。若折射率超過1.44,反射性能低落。 The cerium oxide sol contained in the low refractive index layer (C1) is a particle which controls the refractive index of the layer, and has an average particle diameter of 5 to 150 nm and a refractive index of 1.44 or less. When the average particle diameter is outside the above range, the reflection performance is lowered and the turbidity is increased. If the refractive index exceeds 1.44, the reflection performance is low.

上述二氧化矽溶膠,從市售品之中,選擇使用滿足上述平均粒徑與折射率者即可。特別是,從抗反射效果的觀點而言,內部為中空的二氧化矽溶膠粒子為合適。該二氧化矽溶膠,也由於通常以在溶劑中分散的狀態提供,此溶劑,與前述(c)二氧化矽溶膠的情況行為相同。 The cerium oxide sol may be selected from commercially available products to satisfy the above average particle diameter and refractive index. In particular, hollow cerium oxide sol particles are suitable from the viewpoint of antireflection effect. The cerium oxide sol is also provided in a state of being generally dispersed in a solvent, and this solvent behaves in the same manner as in the case of the above (c) cerium oxide sol.

(d)矽烷偶合化合物或其水解物以及(e)金屬螯合化合物,可使用與前揭相同者。 (d) a decane coupling compound or a hydrolyzate thereof and (e) a metal chelate compound can be used in the same manner as described above.

<C1組成物> <C1 composition>

C1組成物,為以(f)、(d)以及(e)成分做為必要成分之硬化性的組成物,以下述特定比率摻合。 The composition of C1 is a curable composition containing the components (f), (d), and (e) as essential components, and is blended at a specific ratio described below.

(f)二氧化矽溶膠,必須在層中含有10~50質量%。未達10質量%則無法期待充分的抗反射效果。若超過50質量%則耐擦傷性、密合性低落。 (f) The cerium oxide sol must be contained in the layer in an amount of 10 to 50% by mass. If it is less than 10% by mass, a sufficient antireflection effect cannot be expected. When it exceeds 50% by mass, the scratch resistance and the adhesion are low.

(d)矽烷偶合化合物或其水解物與(e)金屬螯合化合物的摻合比,為60~99質量%:40~1質量%。(e)金屬螯合化合物的摻合比為超過40質量%的情況,由於膜變脆,或螯合化合物會析出,並不理想。未達1質量%則無法展現其效果。 (d) The blend ratio of the decane coupling compound or the hydrolyzate thereof and the (e) metal chelate compound is 60 to 99% by mass: 40 to 1% by mass. (e) When the blending ratio of the metal chelate compound is more than 40% by mass, it is not preferable because the film becomes brittle or the chelate compound precipitates. If it is less than 1% by mass, the effect cannot be exhibited.

C2組成物,與B1或B2組成物相同,可添加任意的添加成分。通常,由於塗佈的目的使用溶劑。C2組成物的製備方法,亦依照B1或B2組成物的進行。 The C2 composition is the same as the B1 or B2 composition, and any optional component may be added. Usually, a solvent is used for the purpose of coating. The preparation method of the C2 composition is also carried out in accordance with the composition of B1 or B2.

<低折射率層(C1)之形成> <Formation of Low Refractive Index Layer (C1)>

低折射率層,為透明樹脂基板上疊層之硬塗層,詳細而言,係疊層在硬塗II層之上。該低折射率層的形成,依照硬塗層的形成,將C1組成物的溶液,塗佈於為硬化體之硬塗II層上後乾燥,接著於70~120℃加熱,進行硬化。該層的厚度,從抗反射性能的觀點而言,設定於50~200nm的範圍。 The low refractive index layer is a hard coat layer laminated on a transparent resin substrate, and in detail, is laminated on the hard coat layer II. In the formation of the low refractive index layer, a solution of the C1 composition is applied onto the hard coat layer 2 which is a hardened body in accordance with the formation of the hard coat layer, and then dried, and then heated at 70 to 120 ° C to be cured. The thickness of this layer is set in the range of 50 to 200 nm from the viewpoint of antireflection performance.

且,抗反射層由後揭的中折射率層與低折射率層的二層構成的情況,在硬塗II層上,首先形成中折射率層,接著在該層之上形成低折射率層。並且,抗反射層由後揭的中折射率層、高折射率層、以及低折射率層的三層構成的情況,在硬塗II層上,首先形成中折射率層,接著在該層之上形成高折射率層,更進一步在其上形成低折射率層。 Further, in the case where the antireflection layer is composed of two layers of a medium refractive index layer and a low refractive index layer which are later described, on the hard coat layer II, a medium refractive index layer is first formed, and then a low refractive index layer is formed on the layer. . Further, in the case where the antireflection layer is composed of three layers of a medium refractive index layer, a high refractive index layer, and a low refractive index layer, the medium refractive index layer is first formed on the hard coating layer II, and then the layer is formed. A high refractive index layer is formed thereon, and a low refractive index layer is further formed thereon.

[中折射率層(C2)] [Medium refractive index layer (C2)]

本發明的透明樹脂疊層板,為了更提高其抗反射效果,成為在低折射率層的基板面側疊層有中折射率層的二層結構為理想。 In order to further improve the antireflection effect, the transparent resin laminated plate of the present invention is preferably a two-layer structure in which a medium refractive index layer is laminated on the substrate surface side of the low refractive index layer.

該中折射率層,其折射率為1.50以上未達1.75,厚度為50~200nm之層為合適。 The medium refractive index layer has a refractive index of 1.50 or more and less than 1.75, and a layer having a thickness of 50 to 200 nm is suitable.

此中折射率層,做為代表,為使含有前揭的(d)矽烷偶合化合物或其水解物20~80質量份以及(e)金屬螯合化合物0.1~2質量份,再加上(g)折射率為1.70以上2.80以下的金屬氧化物粒子20~80質量份{以(d)、(e)以及(g)的總量做為100質量份}之硬化性組成物硬化而形成。 The medium refractive index layer is represented by, in order to contain 20 to 80 parts by mass of the (d) decane coupling compound or its hydrolyzate, and (e) 0.1 to 2 parts by mass of the metal chelate compound, plus (g) The curable composition of 20 to 80 parts by mass of the metal oxide particles having a refractive index of 1.70 or more and 2.80 or less (100 parts by mass of the total amount of (d), (e), and (g)) is cured.

又,在中折射率層,做為黏結劑可含有熱硬化性樹脂。做為熱硬化性樹脂,例如可列舉為:酚-甲醛樹脂、矽烷改性酚樹脂、呋喃-甲醛樹脂、二甲苯-甲醛樹脂、酮-甲醛樹脂、尿素甲醛樹脂、三聚氰胺-甲醛樹脂、醇酸樹脂、不飽和聚酯樹脂、(矽烷改性)環氧樹脂、雙馬來亞醯胺樹脂、三聚氰酸三烯丙酯樹脂、丙烯酸樹脂、(矽烷改性)丙烯酸樹脂、矽氧樹脂、胺甲酸酯樹脂等。該等樹脂可單獨使用或將2種以上組合而使用。做為黏結劑使用之上述熱硬化性樹脂,具有對由於光活性導致之氧化有耐受性之優點。 Further, the medium refractive index layer may contain a thermosetting resin as a binder. Examples of the thermosetting resin include phenol-formaldehyde resin, decane-modified phenol resin, furan-formaldehyde resin, xylene-formaldehyde resin, ketone-formaldehyde resin, urea-formaldehyde resin, melamine-formaldehyde resin, and alkyd. Resin, unsaturated polyester resin, (decane-modified) epoxy resin, bismaleimide resin, triallyl cyanurate resin, acrylic resin, (decane-modified) acrylic resin, epoxy resin, A urethane resin or the like. These resins may be used singly or in combination of two or more. The above thermosetting resin used as a binder has an advantage of being resistant to oxidation due to photoactivity.

<(g)金屬氧化物粒子> <(g) Metal oxide particles>

(g)金屬氧化物粒子,係為了滿足中折射率層的折射率為1.50以上未達1.75之目的而含有,以代表性而言,係平均粒徑為10~100nm、折射率為1.70以上2.80以下的金屬氧化物粒子。 (g) The metal oxide particles are contained for the purpose of satisfying the refractive index of the medium refractive index layer of 1.50 or more and not up to 1.75. Typically, the average particle diameter is 10 to 100 nm, and the refractive index is 1.70 or more and 2.80. The following metal oxide particles.

做為金屬氧化物粒子,可使用氧化鋯粒子(折射率=2.40);將氧化鋯與氧化矽等其他的氧化物以分子層級複合化調整折射率後之複合鋯金屬氧化粒子;氧化鈦粒子(折射率=2.71);氧化鈦與氧化矽或氧化鋯等其他的氧化物以分子層級複合化調整折射率後之複合鈦金屬氧化粒子;二氧化矽粒子(折射率=1.55)等。從該等金屬氧化物粒子中選擇,或是適當地組合,調整成為如上述期望的折射率之層。如此的粒子本身為公知並有販售。 As the metal oxide particles, zirconium oxide particles (refractive index = 2.40); composite zirconium metal oxide particles obtained by oxidizing zirconium oxide and other oxides such as cerium oxide at a molecular level to adjust the refractive index; Refractive index = 2.71); composite titanium oxide particles in which titanium oxide and other oxides such as cerium oxide or zirconium oxide are combined in a molecular layer to adjust the refractive index; cerium oxide particles (refractive index = 1.55). The metal oxide particles are selected from these metal oxide particles or appropriately combined to adjust the layer having the desired refractive index as described above. Such particles are known per se and are sold.

<中折射率層(C2)之形成> <Formation of medium refractive index layer (C2)>

中折射率層,為在透明樹脂基板上疊層之硬塗層,具體而言係疊層在硬塗II層之上。該中折射率層的形成,與前述低折射率層的形成同樣地實施,該層的厚度,從抗反射性能的觀點而言,設定在50~200nm的範圍。 The medium refractive index layer is a hard coat layer laminated on a transparent resin substrate, specifically, laminated on the hard coat layer II. The formation of the medium refractive index layer is carried out in the same manner as the formation of the low refractive index layer, and the thickness of the layer is set in the range of 50 to 200 nm from the viewpoint of antireflection performance.

[高折射率層(C3)] [High refractive index layer (C3)]

本發明之透明樹脂疊層板,為了展現極高的抗反射效果,成為在低折射率層(C1)與中折射率層(C2)之間疊層有高折射率層(C3)之三層結構特別理想。 The transparent resin laminated plate of the present invention has three layers of a high refractive index layer (C3) laminated between the low refractive index layer (C1) and the medium refractive index layer (C2) in order to exhibit an extremely high antireflection effect. The structure is particularly ideal.

該高折射率層,其折射率為1.60以上未達2.00、厚度為50~200nm之層為合適。且,該高折射率層的折射率,必須要較中折射率層的折射率高。 The high refractive index layer is preferably a layer having a refractive index of 1.60 or more and less than 2.00 and a thickness of 50 to 200 nm. Moreover, the refractive index of the high refractive index layer must be higher than the refractive index of the medium refractive index layer.

此高折射率層,做為代表,為使含有前揭的(d)矽烷偶合化合物或其水解物10~50質量份,以及(g)金屬氧化物粒子50~90質量份{(d)以及(g)的總量做為100質量份}之硬化性組成物硬化而形成。(g)金屬氧化物粒子,係從前揭之金屬氧化物粒子中選擇,或是將該等組合使用,使得高折射率層的折射率成為1.60以上未達2.00。 The high refractive index layer is represented by, for example, 10 to 50 parts by mass of the (d) decane coupling compound or the hydrolyzate thereof, and (g) 50 to 90 parts by mass of the metal oxide particles {(d) and The total amount of (g) is formed by hardening a hardening composition of 100 parts by mass}. (g) The metal oxide particles are selected from the metal oxide particles disclosed above, or are used in combination such that the refractive index of the high refractive index layer is 1.60 or more and less than 2.00.

又,與中折射率層相同地,可含有熱硬化性樹脂當作黏結劑。 Further, similarly to the medium refractive index layer, a thermosetting resin may be contained as a binder.

<高折射率層(C3)之形成> <Formation of High Refractive Index Layer (C3)>

高折射率層,係疊層在硬塗層上所疊層之前述中折射率層之上,接著在該高折射率層之上疊層低折射率層,成為三層結構。該高折射率層的形成,與前述低折射率層的形成同樣地實施,該層的厚度,從抗反射性能的觀點而言,設定在50~200nm的範圍。 The high refractive index layer is laminated on the intermediate refractive index layer laminated on the hard coat layer, and then the low refractive index layer is laminated on the high refractive index layer to have a three-layer structure. The formation of the high refractive index layer is carried out in the same manner as the formation of the low refractive index layer, and the thickness of the layer is set in the range of 50 to 200 nm from the viewpoint of antireflection performance.

本發明的透明樹脂疊層板,並未限定於前述層構成者。例如:可以抗反射層的保護之目的,設置保護膜層。做為如此的保護膜 層,可列舉為賦予耐磨損性、耐擦傷性之有機聚矽氧烷系材料或氟樹脂系的塗層。 The transparent resin laminated plate of the present invention is not limited to the above-described layer constitution. For example, a protective film layer may be provided for the purpose of protection of the antireflection layer. As such a protective film The layer may be an organic polyoxyalkylene-based material or a fluororesin-based coating which imparts abrasion resistance and scratch resistance.

並且,透明樹脂疊層板的背側,可設置由丙烯酸系、橡膠系、聚矽氧系的黏著劑構成的黏著劑層。再者,本發明的透明樹脂疊層板,也可在透明樹脂基板的表面及背側的兩面疊層硬塗層(B)以及抗反射層(C)。 Further, on the back side of the transparent resin laminated plate, an adhesive layer made of an acrylic, rubber or polyoxygen-based adhesive may be provided. Further, in the transparent resin laminate of the present invention, the hard coat layer (B) and the antireflection layer (C) may be laminated on both the front surface and the back surface of the transparent resin substrate.

實施例 Example

以下,列舉實施例以具體說明本發明,但本發明並非限制於該等實施例。又,在實施例之中說明之特徵的組合並非全部為本發明的解決手段中必須者。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to the examples. Further, not all of the features described in the embodiments are essential to the means for solving the invention.

使用於以下的實施例以及比較例的各種成分與簡稱,和試驗方法,如下所述。 The various components and abbreviations used in the following examples and comparative examples, and test methods, are as follows.

(a)多官能胺甲酸酯丙烯酸酯 (a) Polyfunctional urethane acrylate

a-1;脂肪族有機異氰酸酯系6官能丙烯酸酯 A-1; aliphatic organic isocyanate 6-functional acrylate

a-2;芳香族有機異氰酸酯系6官能丙烯酸酯 A-2; aromatic organic isocyanate 6-functional acrylate

(b)表面處理二氧化矽溶膠 (b) Surface treatment of cerium oxide sol

b-1;丙烯酸酯基修飾二氧化矽溶膠(經3-丙烯醯氧基丙基三甲氧基矽烷處理)平均粒徑:20nm、MIBK分散、固體成份:30wt% B-1; acrylate-modified cerium oxide sol (treated with 3-propenyloxypropyltrimethoxydecane) average particle diameter: 20 nm, MIBK dispersion, solid content: 30% by weight

b-2;乙烯基修飾二氧化矽溶膠(經乙烯基三甲氧基矽烷處理)平均粒徑:20nm、MEK分散、固體成份:30wt% B-2; vinyl modified cerium oxide sol (treated with vinyl trimethoxy decane) average particle size: 20 nm, MEK dispersion, solid content: 30% by weight

(c)二氧化矽溶膠 (c) cerium oxide sol

c-1;平均粒徑:10nm、折射率:1.46、IPA分散、固體成份:20wt% C-1; average particle diameter: 10 nm, refractive index: 1.46, IPA dispersion, solid content: 20% by weight

c-2;平均粒徑:80nm、折射率:1.46、IPA分散、固體成份:30wt% C-2; average particle diameter: 80 nm, refractive index: 1.46, IPA dispersion, solid content: 30% by weight

(d)矽烷偶合劑化合物或其水解物 (d) a decane coupling compound or a hydrolyzate thereof

d-1;γ-環氧丙氧基丙基三甲氧基矽烷 D-1; γ-glycidoxypropyltrimethoxydecane

d-2;3-丙烯醯氧基丙基三甲氧基矽烷 D-2; 3-propenyloxypropyltrimethoxydecane

d-3;2-(3,4-環氧環己基)乙基三甲氧基矽烷 D-3; 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane

(e)金屬螯合化合物 (e) Metal chelate compound

e-1;二丁氧基雙(乙基乙醯乙酸)鋯 E-1; dibutoxy bis(ethylacetamidineacetic acid) zirconium

e-2;烷基乙醯乙酸二異丙酸鋁 E-2; alkyl acetamidine acetate diisopropylate

e-3;參乙醯丙酮酸鋁 E-3; acetylacetate aluminum pyruvate

e-4;四乙醯丙酮酸鋯 E-4; tetraethylguanidinium pyruvate

(f)二氧化矽溶膠 (f) cerium oxide sol

f-1;平均粒徑:50nm、中空二氧化矽溶膠、折射率:1.30、IPA分散、固體成份:20wt% F-1; average particle diameter: 50 nm, hollow cerium oxide sol, refractive index: 1.30, IPA dispersion, solid content: 20% by weight

f-2;平均粒徑:80nm、二氧化矽溶膠、折射率:1.46、IPA分散、固體成份:20wt% F-2; average particle diameter: 80 nm, cerium oxide sol, refractive index: 1.46, IPA dispersion, solid content: 20% by weight

f-3;平均粒徑:10nm、二氧化矽溶膠、折射率:1.46、IPA分散、固體成份:20wt% F-3; average particle diameter: 10 nm, cerium oxide sol, refractive index: 1.46, IPA dispersion, solid content: 20% by weight

(g)金屬氧化物粒子 (g) metal oxide particles

g-1;平均粒徑:50nm、二氧化鋯溶膠、折射率:2.40、PGM分散、固體成份:55wt% G-1; average particle diameter: 50 nm, zirconia sol, refractive index: 2.40, PGM dispersion, solid content: 55 wt%

g-2;平均粒徑:20nm、二氧化鈦溶膠、折射率:2.71、MIBK分散、固體成份:20wt% G-2; average particle diameter: 20 nm, titania sol, refractive index: 2.71, MIBK dispersion, solid content: 20% by weight

(h)其他 (h) other

h-1;IPA(異丙醇) H-1; IPA (isopropyl alcohol)

h-2;MIBK(甲基異丁基酮) H-2; MIBK (methyl isobutyl ketone)

h-3;甲苯 H-3; toluene

h-4;光聚合起始劑(1-羥基-環己基-苯基-酮) H-4; photopolymerization initiator (1-hydroxy-cyclohexyl-phenyl-one)

h-5;0.05N乙酸 H-5; 0.05N acetic acid

h-6;含有烷氧基之矽烷改性環氧樹脂 H-6; alkoxy-modified decane modified epoxy resin

[反射性試驗] [Reflective test]

使用日本分光公司製「V-550」試驗機,以掃描速度1000nm/min的速度,波長在380~780nm的範圍,測定於最低點(透明樹脂疊層板表面)的反射率。數值越小表示抗反射能力越優異。 The reflectance at the lowest point (surface of the transparent resin laminate) was measured at a scanning speed of 1000 nm/min and a wavelength of 380 to 780 nm using a "V-550" tester manufactured by JASCO Corporation. The smaller the value, the more excellent the antireflection ability.

[耐擦傷性試驗] [Scratch resistance test]

於摩擦試驗器安置試驗片,在SteelWool#0000(日本SteelWool 公司「BONSTER」)上面以2kg/cm2的負荷在40mm之間往返100次,測定傷痕的產生方式與其條數,並評價。評價標準係依照以下所示,透過光的意思為透過透明樹脂疊層板之光,反射光的意思為在該疊層板表面反射之光。 A test piece was placed in a friction tester, and a steel ball was reciprocated 100 times between 40 mm under a load of 2 kg/cm 2 on SteelWool #0000 ("BONSTER" of Japan SteelWool Co., Ltd.), and the manner of occurrence of the flaw and the number of the flaws were measured and evaluated. The evaluation criteria are as follows. Light transmission means light transmitted through a transparent resin laminated plate, and reflected light means light reflected on the surface of the laminated plate.

「◎」:不論觀察透過光、反射光任一個,都沒確認到有傷痕。 "◎": No flaws were observed regardless of whether the transmitted light or the reflected light was observed.

「○」:觀察透過光時確認到數條傷痕,而在反射光則沒確認到。 "○": Several flaws were observed when observing the transmitted light, but not reflected by the reflected light.

「△」:不論觀察透過光、反射光任一個,都確認到有數條傷痕。 "△": It is confirmed that there are several flaws regardless of whether the transmitted light or the reflected light is observed.

「×」:不論觀察透過光、反射光任一個,都確認到有十條以上的傷痕。 "X": It is confirmed that there are more than ten flaws regardless of whether the transmitted light or the reflected light is observed.

[硬度試驗] [Hardness test]

使用吉光精密公司製硬度計「C-2210」,以鉛筆(三菱鉛筆公司製「Uni」)測定硬度。硬度,以鉛筆硬度表示,此硬度越高表示耐擦傷性越優異。且,鉛筆硬度7H係指,用7H的鉛筆不會造成傷痕,但用8H的鉛筆可確認到傷痕之情況的硬度。 The hardness was measured with a pencil ("Uni" manufactured by Mitsubishi Pencil Co., Ltd.) using a hardness tester "C-2210" manufactured by Jiguang Precision Co., Ltd. The hardness is expressed by pencil hardness, and the higher the hardness, the more excellent the scratch resistance. Further, the pencil hardness of 7H means that the pencil of 7H does not cause scratches, but the hardness of the case of the flaw can be confirmed by the pencil of 8H.

實施例1 Example 1

在厚度1mm的芳香族聚碳酸酯樹脂(PC)與聚甲基丙烯酸甲酯樹脂(PMMA)之疊層樹脂基板(PC層的厚度0.93mm、PMMA層的厚度0.07mm)的PMMA側,以下列的方法形成硬塗層,並在其上形成抗反射層。 On the PMMA side of a laminated resin substrate (having a thickness of a PC layer of 0.93 mm and a thickness of a PMMA layer of 0.07 mm) of an aromatic polycarbonate resin (PC) having a thickness of 1 mm and a polymethyl methacrylate resin (PMMA), the following The method forms a hard coat layer and forms an antireflection layer thereon.

[硬塗層I形成用溶液組成] [Composition of a solution for forming a hard coat layer I]

.a-1;300g . A-1;300g

.b-1;450g . B-1; 450g

.h-1;235g . H-1;235g

.h-4;15g . H-4; 15g

[硬塗層II形成用溶液組成] [Composition of solution for forming hard coat II]

.a-1;175g . A-1;175g

.c-1;300g . C-1; 300g

.d-1;20g . D-1; 20g

.e-3;1.5g . E-3; 1.5g

.h-1;198.1g . H-1; 198.1g

.h-2;274.6g . H-2;274.6g

.h-3;17.5g . H-3; 17.5g

.h-4;8.8g . H-4; 8.8g

.h-5;4.5g . H-5; 4.5g

[抗反射層形成用溶液組成] [Composition of solution for forming anti-reflective layer]

.f-1;45g . F-1; 45g

.d-1;13g . D-1; 13g

.e-3;3g . E-3;3g

.h-1;935g . H-1; 935g

.h-5;4g . H-5;4g

首先,使用上述組成的硬塗層I形成用溶液浸塗疊層樹脂基板,於60℃、乾燥5分鐘,UV硬化後形成厚度12μm的硬塗層I。接著,以前述組成的硬塗層II形成用溶液,浸塗具有上述硬塗層I之基板,於60℃、乾燥5分鐘,UV硬化後形成厚度3μm的硬塗層II。並且,將具有該硬塗層之基板,以抗反射層形成用溶液浸塗,於80℃、加熱處理20分鐘,形成厚度100nm的抗反射層(低折射率層)。之後以浸塗法將氟系抗污劑進行表覆塗佈,於100℃、進行加熱處理120分鐘將膜硬化。 First, the laminated resin substrate was dip-coated with a solution for forming a hard coat layer I having the above composition, dried at 60 ° C for 5 minutes, and cured by UV to form a hard coat layer I having a thickness of 12 μm. Next, the solution for forming a hard coat layer II having the above composition was dip-coated with the substrate having the hard coat layer I, dried at 60 ° C for 5 minutes, and cured by UV to form a hard coat layer II having a thickness of 3 μm. Further, the substrate having the hard coat layer was dip-coated with a solution for forming an antireflection layer, and heat-treated at 80 ° C for 20 minutes to form an antireflection layer (low refractive index layer) having a thickness of 100 nm. Thereafter, the fluorine-based antifouling agent was subjected to surface coating by dip coating, and the film was cured by heat treatment at 100 ° C for 120 minutes.

將得到之透明樹脂疊層板的反射率、硬度、以及耐擦傷性,依照前述試驗方法測定並評價。結果於表1表示。 The reflectance, hardness, and scratch resistance of the obtained transparent resin laminated plate were measured and evaluated in accordance with the above test methods. The results are shown in Table 1.

實施例2~6 Example 2~6

使用表1中所示之硬塗層I形成用溶液、硬塗層II形成用溶液、以及抗反射層形成用溶液,除此以外與實施例1同樣進行,製作透明樹脂疊層板,並同樣的進行測定。結果於表1、2表示。 A transparent resin laminated plate was produced in the same manner as in Example 1 except that the hard coat layer I forming solution, the hard coat layer II forming solution, and the antireflection layer forming solution shown in Table 1 were used. The measurement was carried out. The results are shown in Tables 1 and 2.

[表1] [Table 1]

比較例1~5 Comparative example 1~5

使用表2中所示之硬塗層I形成用溶液、硬塗層II形成用溶液、以及抗反射層形成用溶液,除此以外,與實施例1同樣進行,製作透明樹脂疊層板,同樣進行測定。結果於表3表示。 A transparent resin laminated plate was produced in the same manner as in Example 1 except that the hard coat layer I forming solution, the hard coat layer II forming solution, and the antireflection layer forming solution shown in Table 2 were used. The measurement was carried out. The results are shown in Table 3.

根據實施例1與比較例1的比較,可理解:硬塗層I中相對於多官能性胺甲酸酯丙烯酸酯100質量份,若(A)表面處理二氧化矽溶膠的含量未達50質量份則硬度性能會惡化。又,依據比較例2,硬塗層I的膜厚並非5μm以上的情況,硬度性能惡化,且耐擦傷性極為惡化。並且,依據比較例3,硬塗層II中不含有矽烷偶合劑的情況,硬度性能、耐擦傷性都不足夠。依據比較例4,硬塗層II中不含有二氧化矽溶膠的情況,耐擦傷性不足夠。依據比較例5,硬塗層II不存在的情況,硬度性能不足夠且耐擦傷性極為惡化。 According to the comparison between Example 1 and Comparative Example 1, it can be understood that if the content of the (A) surface-treated cerium oxide sol is less than 50 mass relative to 100 parts by mass of the polyfunctional urethane acrylate in the hard coat layer I The hardness performance will deteriorate. Further, according to Comparative Example 2, when the film thickness of the hard coat layer I was not 5 μm or more, the hardness performance was deteriorated and the scratch resistance was extremely deteriorated. Further, according to Comparative Example 3, in the case where the hard coat layer II does not contain a decane coupling agent, hardness properties and scratch resistance are not sufficient. According to Comparative Example 4, in the case where the hard coat layer II did not contain the cerium oxide sol, the scratch resistance was insufficient. According to Comparative Example 5, in the case where the hard coat layer II was not present, the hardness performance was insufficient and the scratch resistance was extremely deteriorated.

實施例7~9 Examples 7-9

使用表3中所示組成的低折射率層形成用溶液、中折射率層形成用溶液、及依視需要之高折射率層形成用溶液,以下列方法,製作由二層或是三層構成之具有抗反射膜的透明樹脂疊層板並評價。結果於表4表示。 The solution for forming a low refractive index layer, the solution for forming a medium refractive index layer, and the solution for forming a high refractive index layer as required in the following Table 3 were used to form a layer of two or three layers in the following manner. A transparent resin laminated plate having an antireflection film was evaluated. The results are shown in Table 4.

與實施例1相同,一樣進行於疊層樹脂基板形成硬塗層後,將具有上述硬塗層之基板浸塗在中折射率層形成用溶液中,於90℃、加熱處理30分鐘,形成厚度85nm的中折射率層。接著,將該基板浸塗在低折射率層形成用溶液中,於80℃、加熱處理20分鐘,形成厚度100nm的低折射率層。不過,於實施例7,8中,在低折射率層形成前,亦即,在中折射率層形成後,將基板浸塗在高折射率層形成用溶液,於80℃、加熱處理20分鐘,形成80nm的高折射率層。 After the hard coat layer was formed on the laminated resin substrate in the same manner as in Example 1, the substrate having the hard coat layer was dip-coated in the medium refractive index layer forming solution, and heat-treated at 90 ° C for 30 minutes to form a thickness. A medium refractive index layer of 85 nm. Next, the substrate was dip-coated in a solution for forming a low refractive index layer, and heat-treated at 80 ° C for 20 minutes to form a low refractive index layer having a thickness of 100 nm. However, in Examples 7 and 8, before the formation of the low refractive index layer, that is, after the formation of the medium refractive index layer, the substrate was dip coated on the solution for forming a high refractive index layer, and heat treated at 80 ° C for 20 minutes. A high refractive index layer of 80 nm was formed.

圖1顯示本發明之代表性抗反射板之剖面結構的示意圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the cross-sectional structure of a representative antireflection sheet of the present invention.

Claims (4)

一種透明樹脂疊層板,係於透明樹脂基板(A)上疊層硬塗層(B),且在該硬塗層(B)上疊層抗反射層(C)而成之透明樹脂疊層板;硬塗層(B)係由位於透明樹脂基板側的硬塗層I(B1)與位於抗反射層側的硬塗層II(B2)構成;硬塗層I(B1)的層厚為5~20μm,由含有(a)1分子中具有6個以上的(甲基)丙烯醯基之多官能性胺甲酸酯丙烯酸酯(urethane acrylate),以及相對於該多官能性胺甲酸酯丙烯酸酯100質量份含有(b)表面處理二氧化矽溶膠40~200質量份而成之硬化性組成物的硬化體構成;硬塗層II(B2)的層厚為1~10μm,由含有(a)1分子中具有6個以上的(甲基)丙烯醯基之多官能性胺甲酸酯丙烯酸酯,以及相對於該多官能性胺甲酸酯丙烯酸酯100質量份,含有(c)平均粒徑為5~30nm且折射率為1.44~1.50的二氧化矽溶膠1~50質量份、(d)矽烷偶合化合物或是其水解物1~30質量份,以及(e)金屬螯合化合物0.1~3.0質量份而成之硬化性組成物的硬化體構成;抗反射層(C)由折射率未達1.50、厚度為50~200nm之低折射率層(C1)構成;該低折射率層(C1)由含有(f)平均粒徑為5~150nm、折射率為1.44以下的二氧化矽溶膠、(d)矽烷偶合化合物或是其水解物,以及(e)金屬螯合化合物之硬化性組成物而成的硬化體構成,且摻合有10~50質量%的(f)二氧化矽溶膠,(d)矽烷偶合化合物或是其水解物與(e)金屬螯合化合物的摻合比為60~99質量%:40~1質量%。 A transparent resin laminated plate obtained by laminating a hard coat layer (B) on a transparent resin substrate (A) and laminating an antireflection layer (C) on the hard coat layer (B) The hard coat layer (B) is composed of a hard coat layer I (B1) on the side of the transparent resin substrate and a hard coat layer II (B2) on the side of the antireflection layer; the layer thickness of the hard coat layer I (B1) is 5 to 20 μm, comprising a polyfunctional urethane acrylate having 6 or more (meth) acrylonitrile groups in (a) one molecule, and relative to the polyfunctional urethane ester 100 parts by mass of the acrylate comprises a hardened composition of (b) a surface-treated cerium oxide sol of 40 to 200 parts by mass; and the hard coat layer II (B2) has a layer thickness of 1 to 10 μm and is contained ( a) a polyfunctional urethane acrylate having 6 or more (meth) acrylonitrile groups in one molecule, and (c) average with respect to 100 parts by mass of the polyfunctional urethane acrylate 1 to 50 parts by mass of a cerium oxide sol having a particle diameter of 5 to 30 nm and a refractive index of 1.44 to 1.50, (d) a decane coupling compound or a hydrolyzate thereof of 1 to 30 parts by mass, and (e) a metal chelate compound 0.1 ~3.0 quality A hardened composition of the cured composition; the antireflection layer (C) is composed of a low refractive index layer (C1) having a refractive index of less than 1.50 and a thickness of 50 to 200 nm; the low refractive index layer (C1) is contained (f) a cerium oxide sol having an average particle diameter of 5 to 150 nm, a refractive index of 1.44 or less, (d) a decane coupling compound or a hydrolyzate thereof, and (e) a hardening composition of a metal chelate compound a hardened body composed of 10 to 50% by mass of (f) cerium oxide sol, (d) a decane coupling compound or a mixture ratio of the hydrolyzate thereof and the (e) metal chelating compound is 60 to 99 mass %: 40 to 1% by mass. 如專利申請範圍第1項之透明樹脂疊層板,其中,抗反射層(C)由該低折射率層(C1)與位於透明樹脂基板側之中折射率層(C2)的二層所構成,該中折射率層(C2)其折射率在1.50以上未達1.75,厚度為50~200nm。 The transparent resin laminate according to the first aspect of the invention, wherein the antireflection layer (C) is composed of the low refractive index layer (C1) and the second layer of the refractive index layer (C2) located on the side of the transparent resin substrate. The medium refractive index layer (C2) has a refractive index of 1.50 or more and less than 1.75, and a thickness of 50 to 200 nm. 如專利申請範圍第2項之透明樹脂疊層板,其中,抗反射層 (C)由該低折射率層(C1)、該中折射率層(C2)、以及設置在該低折射率層與該中折射率層之間之高折射率層(C3)三層所構成,該高折射率層(C3)其折射率在1.60以上未達2.00,厚度為50~200nm,高折射率層(C3)的折射率較中折射率層(C2)的折射率大。 A transparent resin laminated board according to the second aspect of the patent application, wherein the antireflection layer (C) consisting of the low refractive index layer (C1), the medium refractive index layer (C2), and the high refractive index layer (C3) disposed between the low refractive index layer and the medium refractive index layer The high refractive index layer (C3) has a refractive index of 1.60 or more and less than 2.00 and a thickness of 50 to 200 nm, and the refractive index of the high refractive index layer (C3) is larger than that of the intermediate refractive index layer (C2). 如專利申請範圍第1或2項之透明樹脂疊層板,其中,表面處理二氧化矽溶膠,為(甲基)丙烯醯基修飾二氧化矽溶膠或是乙烯基修飾二氧化矽溶膠。 A transparent resin laminated plate according to claim 1 or 2, wherein the surface-treated cerium oxide sol is a (meth)acryl fluorenyl modified cerium oxide sol or a vinyl modified cerium oxide sol.
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US20080316772A1 (en) * 2007-06-22 2008-12-25 Minebea Co., Ltd. Spread illuminating apparatus, transparent resin plate for use in spread illuminating apparatus, and method of injection-molding transparent resin plate
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TW201026764A (en) * 2008-11-28 2010-07-16 Nitto Denko Corp Composition for forming hard-coat layer, hard-coat film, optical element, and image display

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US20080316772A1 (en) * 2007-06-22 2008-12-25 Minebea Co., Ltd. Spread illuminating apparatus, transparent resin plate for use in spread illuminating apparatus, and method of injection-molding transparent resin plate
TW200922782A (en) * 2007-09-27 2009-06-01 Fujifilm Corp Optical film, polarizing plate, and liquid-crystal display device
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