TWI539310B - Method and apparatus for conducting voltage drop analysis - Google Patents

Method and apparatus for conducting voltage drop analysis Download PDF

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TWI539310B
TWI539310B TW098146057A TW98146057A TWI539310B TW I539310 B TWI539310 B TW I539310B TW 098146057 A TW098146057 A TW 098146057A TW 98146057 A TW98146057 A TW 98146057A TW I539310 B TWI539310 B TW I539310B
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component
power
circuit block
circuit
power supply
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TW201122879A (en
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陳明奇
陳洋明
劉振偉
魏偉明
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新思科技股份有限公司
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Description

電源分析之方法及裝置Method and device for power analysis

本發明係關於電源分析之方法及裝置,特別係關於整個晶片壓降(IR drop)分析之方法及裝置。The present invention relates to a method and apparatus for power supply analysis, and more particularly to a method and apparatus for overall wafer drop (IR drop) analysis.

隨著研發技術演進,製程技術日新月異,晶片(chip)因面積成本的考量,而將元件(device)尺寸越做越小,來降低整個電路的設計尺寸。參考電壓也要求降低以減少電源的功率消耗,晶片的電壓由早先的3.3伏特、2.5伏、1.8伏特降到0.13μm製程的1.2伏特,到現在低於1伏特以下的操作電壓也已是非常普遍之規格。因此,於晶片尺寸越來越小前提下,以降低電壓源的電壓來減少功率消耗,使晶片所能承受雜訊(noise margin)的能力也相對降低。因此,在設計整個晶片電路的電壓源分佈時,就必需考慮壓降(IR-drop)所造成的影響。因為電壓源的穩定與否,直接影響了整個電路的效能。換言之,電壓源的設計分析上,需要更加的周密,以達到更符合實際狀況的結果。With the evolution of R&D technology, process technology is changing with each passing day. Due to the cost of area, chips reduce the size of devices to reduce the design size of the entire circuit. The reference voltage is also required to be reduced to reduce the power consumption of the power supply. The voltage of the wafer is reduced from the previous 3.3 volts, 2.5 volts, and 1.8 volts to 1.2 volts in the 0.13 μm process. It is now very common to operate voltages below 1 volt. Specifications. Therefore, under the premise that the size of the wafer is getting smaller and smaller, the voltage of the voltage source is reduced to reduce the power consumption, so that the ability of the wafer to withstand the noise margin is relatively reduced. Therefore, when designing the voltage source distribution of the entire wafer circuit, it is necessary to consider the effect of the voltage drop (IR-drop). Because the voltage source is stable or not, it directly affects the performance of the entire circuit. In other words, the design analysis of the voltage source needs to be more thorough to achieve a more realistic result.

執行晶片電源分析(Chip Power Analysis)能找出晶片上壓降之發生處,並得到各種功率消耗之資訊。作此分析需要先輸入積體電路設計的相關設計參考資料,利用電腦輔助設計軟體獲得積體電路設計之電源網路模型(power grid models),再據此積體電路設計之電源網路模型進一步分析,就可獲得壓降之大小及分佈。Perform Chip Power Analysis to find out where the voltage drop on the wafer occurs and get information on various power consumption. For this analysis, it is necessary to input the relevant design reference materials of the integrated circuit design, and use the computer-aided design software to obtain the power grid models of the integrated circuit design, and then further develop the power network model of the integrated circuit design. Analysis, the magnitude and distribution of the pressure drop can be obtained.

壓降是指出現在積體電路中電源和地網路上之電壓下降或升高的一種現象。隨著半導體製程的演進,金屬互連線的寬度越來越窄,導致它的電阻值上升,所以在整個晶片範圍內將存在一定的壓降。另外,電源管理單元(power management cell)、電源閘開關(power gating switch)及邏輯閘單元(logic gate cell)於開啟電流通過時,都可視為具有一等效電阻而產生壓降之單元。The voltage drop is a phenomenon that indicates that the voltage on the power supply and the ground network is falling or rising in the integrated circuit. As the semiconductor process progresses, the width of the metal interconnect line becomes narrower and narrower, causing its resistance value to rise, so there will be a certain voltage drop across the entire wafer. In addition, a power management cell, a power gating switch, and a logic gate cell can be regarded as a unit having an equivalent resistance and generating a voltage drop when the turn-on current is passed.

圖1係一習知晶片之示意圖。假設一頂層設計(top level design)之晶片10包含三個具有不同功能之電路方塊11、12、13及其他電路單元(cell),且分別連接至一電源訊號VDD及一地訊號VSS。目前積體電路設計業者多會自矽智財供應者(IP vendor;例如:ARM)直接取得特定功能之電路方塊或電路模組之設計,然矽智財供應者大都僅提供電路方塊之後繞線佈局之GDSII格式資料,因此無從得到電路方塊之內部各電路元件之資訊。亦即,若對晶片10進行電源分析時,電路方塊之內部電源網路分析就需要略過,因此無法獲得整個晶片之壓降大小及分佈。Figure 1 is a schematic illustration of a conventional wafer. It is assumed that a top level design of the wafer 10 includes three circuit blocks 11, 12, 13 and other circuit cells having different functions, and is respectively connected to a power signal VDD and a ground signal VSS. At present, the integrated circuit design industry will directly obtain the design of the circuit block or circuit module of the specific function from the IP vendor (for example, ARM), and most of the intellectual property suppliers only provide the circuit block and then the winding. The layout of the GDSII format data, so there is no information on the internal circuit components of the circuit block. That is, if the power analysis of the wafer 10 is performed, the internal power network analysis of the circuit block needs to be skipped, so that the voltage drop size and distribution of the entire wafer cannot be obtained.

圖2係一習知晶片之壓降分佈圖。圖中右下角有一黑色之矩形區21,該區域即為前述無從得到內部電源管理單元之資訊之電路方塊,例如:包含有多重臨界電壓互補金屬氧化物導體(MTCMOS)單元之電路方塊,因此無法以顏色標示壓降在該區域內之分佈狀況。Figure 2 is a pressure drop profile of a conventional wafer. In the lower right corner of the figure, there is a black rectangular area 21, which is a circuit block that does not have the information of the internal power management unit, for example, a circuit block containing a multi-threshold voltage complementary metal oxide conductor (MTCMOS) unit, so The distribution of the pressure drop in this area is indicated by color.

鑒此,電子設計自動化(Electronic Design Automation)業界需要一種能得到完整晶片之壓降分析結果的方法,為能解決目前電路設計所遭遇之問題。In view of this, the Electronic Design Automation industry needs a way to obtain the results of the voltage drop analysis of a complete wafer in order to solve the problems encountered in current circuit design.

本發明之目的為由電路佈局中萃取出電路方塊內之電源分佈,以便在進行電源分析後獲得整個晶片之壓降大小及分佈。It is an object of the present invention to extract the power distribution within a circuit block from a circuit layout to obtain a voltage drop magnitude and distribution throughout the wafer after power analysis.

根據本發明之一實施例之電源分析之方法包含步驟如下:接收一晶片之設計資料,其中該晶片包含一個內部電源管理單元不明的電路方塊,該設計資料為該電路方塊之後繞線佈局;根據佈局對應於構圖之內容自該後繞線佈局中萃取出該電路方塊之內部電源元件之資訊;及根據該內部電源元件之資訊,執行該電路方塊之電源分析。The method for power supply analysis according to an embodiment of the present invention comprises the steps of: receiving design data of a chip, wherein the chip comprises a circuit block of unknown internal power management unit, and the design data is a winding layout after the circuit block; The layout corresponds to the content of the composition, and the information of the internal power component of the circuit block is extracted from the rear winding layout; and the power analysis of the circuit block is performed according to the information of the internal power component.

根據本發明之另一實施例之電源分析之裝置,包含一電路元件萃取單元、一電路元件構圖單元及一電源分析單元。該電路元件萃取單元根據佈局對應於構圖之內容自內部結構不明的一電路方塊之後繞線佈局中萃取出該電路方塊之內部各電源元件之資訊。該電路元件構圖單元根據該內部各電源元件之資訊建立該電路方塊之完整設計資料。該電源分析單元執行該電路方塊之電源分析。A device for power analysis according to another embodiment of the present invention includes a circuit component extraction unit, a circuit component patterning unit, and a power analysis unit. The circuit component extracting unit extracts information of the internal power components of the circuit block from the winding layout of a circuit block whose internal structure is unknown according to the layout corresponding to the content of the composition. The circuit component patterning unit establishes complete design information of the circuit block according to the information of the internal power component. The power analysis unit performs power analysis of the circuit block.

本發明的方法首先根據佈局與線路對比檢查(LVS)之內容自電路方塊的後繞線佈局中萃取出該電路方塊之內部各電路元件之資訊,之後執行該電路方塊之電源分析。藉此,即便該電路方塊是經由矽智財供應者直接取得,且只有電路方塊之後繞線佈局之GDSII格式資料,本發明仍然可對晶片進行電源分析,而獲得整個晶片之壓降大小及分佈,並作為電路設計工程師改良電路設計的依據。The method of the present invention first extracts the information of the internal circuit components of the circuit block from the rear winding layout of the circuit block according to the content of the layout and line comparison check (LVS), and then performs power analysis of the circuit block. Therefore, even if the circuit block is directly obtained by the Wisdom provider, and only the GDSII format data of the winding layout of the circuit block is obtained, the present invention can still perform power analysis on the chip, and obtain the voltage drop size and distribution of the entire chip. And as the basis for circuit design engineers to improve circuit design.

本發明在此所探討的方向為一種電源分析之方法及其裝置。為了能徹底地瞭解本發明,將在下列的描述中提出詳盡的步驟及組成。顯然地,本發明的施行並未限定於電路設計之技藝者所熟習的特殊細節。另一方面,眾所周知的組成或步驟並未描述於細節中,以避免造成本發明不必要之限制。本發明的較佳實施例會詳細描述如下,然而除了這些詳細描述之外,本發明還可以廣泛地施行在其他的實施例中,且本發明的範圍不受限定,其以之後的專利範圍為準。The invention discussed herein is a method of power analysis and apparatus therefor. In order to thoroughly understand the present invention, detailed steps and compositions will be set forth in the following description. Obviously, the implementation of the present invention is not limited to the specific details familiar to those skilled in the circuit design. On the other hand, well-known components or steps are not described in detail to avoid unnecessarily limiting the invention. The preferred embodiments of the present invention are described in detail below, but the present invention may be widely practiced in other embodiments, and the scope of the present invention is not limited by the scope of the following patents. .

圖3係根據本發明之一實施例中電路方塊之示意圖。電路方塊30連接至晶片之電源訊號VDD,再藉由複數個多重臨界電壓互補金屬氧化物導體(MTCMOS)電源閘開關31將電源訊號VDD連接至內部之虛(virtual)電源訊號32。電路方塊30內之電路元件係直接由虛電源訊號32構成之網路供應所需之電力,例如:邏輯元件及記憶單元(memory cell)等。於低功率(low power)之積體電路設計技術,MTCMOS電源閘開關31可以用來降低電路方塊30中漏電流之問題。然而當MTCMOS電源閘開關31處於開啟之狀態時,電流會通過MTCMOS,該開關可視為具有一等效電阻而產生壓降之功耗元件。3 is a schematic diagram of circuit blocks in accordance with an embodiment of the present invention. The circuit block 30 is connected to the power signal VDD of the chip, and the power signal VDD is connected to the internal virtual power signal 32 by a plurality of multiple threshold voltage complementary metal oxide conductor (MTCMOS) power gate switches 31. The circuit components in circuit block 30 are directly supplied with power required by the network composed of virtual power signals 32, such as logic elements and memory cells. The MTCMOS power gate switch 31 can be used to reduce the leakage current in the circuit block 30 for low power integrated circuit design techniques. However, when the MTCMOS power gate switch 31 is in the on state, the current will pass through the MTCMOS, and the switch can be regarded as a power consuming component having an equivalent resistance to generate a voltage drop.

如前所述,目前積體電路設計業者多會自矽智財供應者直接取得特定功能之電路方塊或電路模組之設計資料,然矽智財供應者大都僅提供電路方塊之後繞線佈局之GDSII格式資料,因此使用者無從得到電路方塊之內部MTCMOS電源閘開關之資訊。As mentioned above, the current integrated circuit design industry will directly obtain the design data of the circuit block or circuit module of the specific function from the supplier of the intellectual property, and most of the suppliers of the smart money only provide the layout of the circuit after the circuit. GDSII format data, so users do not have access to the information of the internal MTCMOS power gate switch of the circuit block.

為能改善習知技術無從分析內部未知之電路方塊電源之問題。圖4顯示本發明之一實施例的電源分析方法之流程圖。如步驟41所示,本方法要先接收一晶片之設計資料,其中該晶片包含具有不同功能之複數個電路方塊及複數個電路單元,其中假設第一電路方塊為矽智財供應者所提供,第二電路方塊為使用者所自行設計,而該第一電路方塊之設計資料為後繞線佈局,且該第一電路方塊及第二電路方塊係屬於頂層設計(top level design)架構下之各模組。由於從該電路方塊之後繞線佈局中圖案實無法直接得知第一電路方塊之內部何者為電源管理單元、電源閘開關及邏輯閘單元,因此需要根據佈局對應於構圖之內容(LVS)自該後繞線佈局中萃取出該第一電路方塊之內部各電路元件之資訊,如步驟S42所示。亦即將該後繞線佈局中圖案藉由佈局對應於構圖找出相應之電路元件,尤其是電源管理單元及電源閘開關等重要功耗元件。In order to improve the conventional technology, it is impossible to analyze the problem of the power supply of the circuit block which is unknown inside. 4 is a flow chart showing a power analysis method according to an embodiment of the present invention. As shown in step 41, the method first receives design data of a chip, wherein the chip includes a plurality of circuit blocks and a plurality of circuit units having different functions, wherein it is assumed that the first circuit block is provided by the provider of the intellectual property, The second circuit block is designed by the user, and the design data of the first circuit block is a rear winding layout, and the first circuit block and the second circuit block belong to each of the top level design structures. Module. Since the pattern in the winding layout after the circuit block cannot directly know which of the first circuit block is the power management unit, the power gate switch, and the logic gate unit, it is necessary to correspond to the composition content (LVS) according to the layout. The information of the internal circuit components of the first circuit block is extracted from the rear winding layout, as shown in step S42. It is also to find out the corresponding circuit components, especially the power management unit and the power gate switch, by the layout corresponding to the pattern in the layout of the rear winding.

如步驟S43所示,將步驟S42中所得之該第一電路方塊之內部各電路元件之資訊與該第二電路方塊之設計資料整合為一,整合的目的為方便進行整個晶片的電路模擬。As shown in step S43, the information of the internal circuit components of the first circuit block obtained in step S42 is integrated with the design data of the second circuit block, and the purpose of integration is to facilitate circuit simulation of the entire chip.

如步驟S44所示,接著執行該第一電路方塊及該第二電路方塊之電源分析,此分析工作可以使用synopsys銷售之軟體PrimeRail來完成,藉此可有效分析完整晶片上靜態與動態電壓降和電子飄移(electromigration,EM)等各種狀況。最後,如步驟S45所示,藉此得到整個晶片之壓降及功率消耗之資訊。此資訊可供積體電路設計業者比較並評估是否符合設計規格,或者進一步更正電路之設計以降低功率消耗。As shown in step S44, the power analysis of the first circuit block and the second circuit block is performed, and the analysis work can be performed using synopsys. The software's software PrimeRail is completed to effectively analyze static and dynamic voltage drops and electron migration (EM) on the complete wafer. Finally, as shown in step S45, information on the voltage drop and power consumption of the entire wafer is obtained. This information can be used by integrated circuit designers to compare and evaluate compliance with design specifications or to further correct circuit design to reduce power consumption.

圖5係根據本發明之一實施例電源分析所得之壓降分佈圖。相較於圖2,圖5可以顯示整個晶片之壓降分佈,並無任何略過電路方塊之區域。此外,可藉由顏色標示壓降在整個晶片內之分佈狀況,而可以清楚看到壓降最大之發生處,因此可以更正該處電路設計以解決壓降太大的問題。Figure 5 is a pressure drop profile obtained from power analysis in accordance with an embodiment of the present invention. Compared to Figure 2, Figure 5 can show the voltage drop distribution across the wafer without any areas that bypass the circuit blocks. In addition, the distribution of the voltage drop across the wafer can be indicated by color, and the occurrence of the maximum voltage drop can be clearly seen, so the circuit design can be corrected to solve the problem of too large a voltage drop.

相較於習知技術,由於習知技術無法完整分析整個晶片之壓降分佈及功耗資訊,故積體電路設計業者顯然無法即時得知晶片之真正設計結果。然,本發明可以改善此習知技術所遭遇之此種問題,俾能於放置及繞線階段就發現熱點之存在處,並於設計流程中提前更正設計。Compared with the prior art, since the conventional technology cannot completely analyze the voltage drop distribution and power consumption information of the entire wafer, it is obvious that the integrated circuit design manufacturer cannot immediately know the true design result of the chip. However, the present invention can improve such problems encountered in the prior art, and can find the presence of hot spots during the placement and winding stages, and correct the design in advance in the design flow.

圖6係根據本發明之一實施例之電源分析裝置之功能方塊圖。電源分析裝置60包含一電路元件萃取單元61、一電路元件構圖單元62及一電源分析單元63,該電源分析裝置60係用於分析包含至少一第一電路方塊及至少一第二電路方之晶片之電源。該電路元件萃取單元61根據佈局對應於構圖(LVS)之內容,自該第一電路方塊之後繞線佈局中萃取出該第一電路方塊之內部各電路元件之資訊,例如:由佈局中圖型辨識出電源管理單元、電源閘開關及邏輯閘單元等元件及相關規格。該電路元件構圖單元62再根據該內部各電路元件之資訊建立該第一電路方塊之完整設計資料。例如:若該第一電路方塊是一記憶體方塊(memory block),則電路元件構圖單元62會根據電路元件萃取單元61之輸出以建立該記憶體方塊模型之構圖。該電源分析單元63再整合該第一電路方塊之完整設計資料及該第二電路方塊之完整設計資料,並執行該第一電路方塊及該第二電路方塊之電源分析,故能得到整個晶片之壓降及功率消耗之等資訊。Figure 6 is a functional block diagram of a power analysis device in accordance with an embodiment of the present invention. The power analysis device 60 includes a circuit component extraction unit 61, a circuit component patterning unit 62, and a power analysis unit 63 for analyzing a wafer including at least a first circuit block and at least a second circuit. The power supply. The circuit component extraction unit 61 extracts information about the internal circuit components of the first circuit block from the wire layout of the first circuit block according to the layout corresponding to the content of the composition (LVS), for example, the layout pattern Identify components such as power management unit, power gate switch and logic gate unit and related specifications. The circuit component patterning unit 62 then establishes complete design information of the first circuit block based on the information of the internal circuit components. For example, if the first circuit block is a memory block, the circuit component patterning unit 62 generates a composition of the memory block model according to the output of the circuit component extraction unit 61. The power analysis unit 63 further integrates the complete design data of the first circuit block and the complete design data of the second circuit block, and performs power analysis of the first circuit block and the second circuit block, so that the entire chip can be obtained. Information on voltage drop and power consumption.

本發明的方法首先根據佈局對應於構圖(LVS)之內容自電路方塊的後繞線佈局中萃取出該電路方塊之內部各電路元件之資訊,之後執行該電路方塊之電源分析。藉此,即便該電路方塊是經由矽智財供應者直接取得,且只有電路方塊之後繞線佈局之GDSII格式資料,本發明仍然可對晶片進行電源分析,而獲得整個晶片之壓降大小及分佈,並作為電路設計工程師改良電路設計的依據。The method of the present invention first extracts the information of the internal circuit components of the circuit block from the rear winding layout of the circuit block according to the layout corresponding to the content of the composition (LVS), and then performs power analysis of the circuit block. Therefore, even if the circuit block is directly obtained by the Wisdom provider, and only the GDSII format data of the winding layout of the circuit block is obtained, the present invention can still perform power analysis on the chip, and obtain the voltage drop size and distribution of the entire chip. And as the basis for circuit design engineers to improve circuit design.

本發明之技術內容及技術特點已揭示如上,然而熟悉本項技術之人士仍可能基於本發明之教示及揭示而作種種不背離本發明精神之替換及修飾。因此,本發明之保護範圍應不限於實施例所揭示者,而應包括各種不背離本發明之替換及修飾,並為以下之申請專利範圍所涵蓋。The technical and technical features of the present invention have been disclosed as above, and those skilled in the art can still make various substitutions and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the present invention should be construed as being limited by the scope of the appended claims

10...晶片10. . . Wafer

11...電路方塊11. . . Circuit block

12...電路方塊12. . . Circuit block

13...電路方塊13. . . Circuit block

21...矩形區twenty one. . . Rectangular area

30...電路方塊30. . . Circuit block

31...電源閘開關31. . . Power switch

32...虛電源訊號VDD32. . . Virtual power signal VDD

33...短路臨界面積33. . . Short circuit critical area

60...電源分析裝置60. . . Power analysis device

61...電路元件萃取單元61. . . Circuit component extraction unit

62...電路元件構圖單元62. . . Circuit component composition unit

63...電源分析單元63. . . Power analysis unit

VDD...電源訊號VDD. . . Power signal

VSS...地訊號VSS. . . Ground signal

圖1係一習知晶片之示意圖;Figure 1 is a schematic view of a conventional wafer;

圖2係一習知晶片之壓降分佈圖;Figure 2 is a pressure drop distribution diagram of a conventional wafer;

圖3係根據本發明概念之示意圖;Figure 3 is a schematic illustration of the concept in accordance with the present invention;

圖4係根據本發明之一實施例的提出電源分析方法之流程圖;4 is a flow chart of a method for analyzing a power supply according to an embodiment of the present invention;

圖5係根據本發明之一實施例的電源分析所得之壓降分佈圖;以及5 is a pressure drop distribution diagram obtained by power supply analysis according to an embodiment of the present invention;

圖6係根據本發明之一實施例之電源分析裝置之功能方塊圖。Figure 6 is a functional block diagram of a power analysis device in accordance with an embodiment of the present invention.

S41~S45...步驟S41~S45. . . step

Claims (12)

一種用於晶片設計之電源分析之方法,該晶片設計包括一內部電源單元的一電路方塊,該電路方塊係以一後繞線佈局來呈現,該方法包含:使用佈局對應於構圖之資料從該晶片設計之該電路方塊之後繞線佈局萃取出該電路方塊內部之多個元件並分別對應每一元件至一已知的元件模型,其中該等元件包含一第一元件,無法對應至一已知的元件模型;以及根據該所萃取出之該多個元件之該等已知的元件模型,執行該電路方塊之電源分析以得知該第一元件的元件模型。 A method for power analysis of a chip design, the chip design including a circuit block of an internal power supply unit, the circuit block being presented in a post-wrap layout, the method comprising: using a layout corresponding to the composition of the material from the The circuit block of the chip design then extracts a plurality of components inside the circuit block and respectively corresponds to each component to a known component model, wherein the components include a first component and cannot correspond to a known component. a component model; and performing a power analysis of the circuit block to obtain a component model of the first component based on the known component models of the extracted plurality of components. 根據請求項1之方法,其中該電源分析包含:得到該電路方塊之內部電源壓降及功率消耗。 The method of claim 1, wherein the power analysis comprises: obtaining an internal power supply voltage drop and power consumption of the circuit block. 根據請求項1之方法,其另包含:整合整個晶片之內部結構,以計算出整個晶片之內部電源壓降資訊及功率消耗資訊。 According to the method of claim 1, the method further comprises: integrating the internal structure of the entire chip to calculate internal power supply voltage drop information and power consumption information of the entire chip. 根據請求項1之方法,其中該內部電源單元係一電源管理單元、一電源閘開關或一邏輯閘單元之一者。 The method of claim 1, wherein the internal power supply unit is one of a power management unit, a power gate switch, or a logic gate unit. 根據請求項1之方法,其中該第一元件係一多重臨界電壓互補金屬氧化物導體(MTCMOS)電源閘開關,其中該多重臨界電壓互補金屬氧化物導體電源閘開關無法對應至一已知的元件模型。 The method of claim 1, wherein the first component is a multiple threshold voltage complementary metal oxide conductor (MTCMOS) power gate switch, wherein the multiple threshold voltage complementary metal oxide conductor power gate switch cannot correspond to a known Component model. 根據請求項3之方法,其中該內部電源壓降資訊係該晶 片之完整壓降分佈圖。 According to the method of claim 3, wherein the internal power supply voltage drop information is the crystal The complete pressure drop distribution of the film. 根據請求項3之方法,其另包含:比較該內部電源壓降及功率消耗之資訊與該晶片之設計規格;以及根據比較之結果而更正該晶片設計。 According to the method of claim 3, the method further comprises: comparing the information of the internal power supply voltage drop and power consumption with the design specifications of the chip; and correcting the chip design according to the comparison result. 一種電源分析之裝置,包含:一電路元件萃取單元,根據佈局對應於構圖之資料自一晶片之一內部電源單元之一電路方塊之一後繞線佈局中萃取出該電路方塊內部之多個元件並分別對應每一元件至一已知的元件模型,其中該等元件包含一第一元件,無法對應至一已知的元件模型;一電路元件構圖單元,根據該些元件模型及該第一元件建立該電路方塊之元件構圖;以及一電源分析單元,執行該電路方塊之電源分析以得知該第一元件的元件模型。 A device for power supply analysis, comprising: a circuit component extraction unit, extracting a plurality of components inside the circuit block from a rear winding layout of one of the circuit blocks of one of the internal power supply units of one of the wafers according to the layout corresponding to the composition data And corresponding to each component to a known component model, wherein the components comprise a first component and cannot correspond to a known component model; a circuit component patterning unit, according to the component model and the first component Establishing a component composition of the circuit block; and a power analysis unit performing power analysis of the circuit block to learn the component model of the first component. 根據請求項8之裝置,其中該電源分析單元輸出整個晶片之內部電源壓降及功率消耗之資訊。 The device of claim 8, wherein the power analysis unit outputs information on internal power supply voltage drop and power consumption of the entire chip. 根據請求項8之裝置,其中該內部電源單元係一電源管理單元、一電源閘開關或一邏輯閘單元之一者。 The device of claim 8, wherein the internal power supply unit is one of a power management unit, a power gate switch, or a logic gate unit. 根據請求項8之裝置,其中該第一元件係一多重臨界電壓互補金屬氧化物半導體(MTCMOS)電源閘開關,其中該多重臨界電壓互補金屬氧化物導體電源閘開關無法對應至一已知的元件模型。 The device of claim 8, wherein the first component is a multiple threshold voltage complementary metal oxide semiconductor (MTCMOS) power gate switch, wherein the multiple threshold voltage complementary metal oxide conductor power gate switch cannot correspond to a known Component model. 根據請求項9之裝置,其中該壓降係該晶片之完整壓降分佈圖。 The device of claim 9, wherein the pressure drop is a complete pressure drop profile of the wafer.
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