TWI533526B - Electroplated metallic ceramic layer for electrical connector terminal - Google Patents

Electroplated metallic ceramic layer for electrical connector terminal

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TWI533526B
TWI533526B TW102144805A TW102144805A TWI533526B TW I533526 B TWI533526 B TW I533526B TW 102144805 A TW102144805 A TW 102144805A TW 102144805 A TW102144805 A TW 102144805A TW I533526 B TWI533526 B TW I533526B
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plating layer
metallized ceramic
electrical connector
ceramic plating
chromium
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TW102144805A
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TW201524015A (en
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葛明德
呂承恩
侯光煦
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張益誠
胡文華
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Description

披覆金屬化陶瓷電鍍層之電性連接器 Electrical connector coated with metallized ceramic plating

本發明為有關於一種披覆金屬化陶瓷電鍍層之電性連接器,係利用電鍍方法將金屬化陶瓷披覆在電性連接器之電連接件的表面,使該電連接件具有高耐磨性、高度耐腐蝕性、低接觸電阻值等特性,以提高電連接件之表面性能。 The invention relates to an electrical connector for coating a metallized ceramic plating layer, which is coated with a metallized ceramic on the surface of the electrical connector of the electrical connector by using an electroplating method, so that the electrical connector has high wear resistance. Characteristics such as properties, high corrosion resistance, and low contact resistance to improve the surface properties of electrical connectors.

金屬化陶瓷(metallic ceramic)係為非金屬元素参雜有金屬元素共同形成的一種類似陶瓷結構的共構物,其具有一般陶瓷的硬度與耐腐蝕性、也具有金屬的光澤性與導電性,經常應用的方法為在一基材表面將非金屬元素與金屬元素共同堆積形成;可用於電子元件上的金屬化陶瓷如氮化鈦(TiN)、石墨、碳化鎢、碳化鋯、碳化鉻、碳化矽等。其中碳化鉻(Chromium Carbide,CrC)是屬於陶瓷的一種化合物,具有優良的機械強度與化學穩定性,其有高硬度、高熔點、耐腐蝕性佳、耐磨耗(wear resistance)之特性;碳化鉻披覆層在1990年代已有許多工業上運用的機會被揭露,如日本專利JP2010248595揭露在底材上披覆一層45-55 wt.%碳化鉻與30-40 wt.%鈷(Co)可在1000℃的使用條件下仍能有良好的耐磨性(wear resistance);美國專利US6068568揭露使用碳化鉻披覆在車鍊上,可增加車鍊的耐磨性;EPO專利EP1878943則揭露使用擴散鉻化法使鋼材上滲入形成內層含有Cr7C3、外層含有Cr23C6披覆在鍊條上,也可增加鍊條的機械性能。 A metallic ceramic is a ceramic-like co-structure formed by a non-metallic element mixed with a metal element, which has hardness and corrosion resistance of a general ceramic, and also has metallic luster and electrical conductivity. A frequently used method is to form a non-metal element and a metal element together on a substrate surface; metallized ceramics such as titanium nitride (TiN), graphite, tungsten carbide, zirconium carbide, chromium carbide, carbonization, which can be used for electronic components. Hey. Among them, Chromium Carbide (CrC) is a kind of compound which belongs to ceramics and has excellent mechanical strength and chemical stability. It has high hardness, high melting point, good corrosion resistance and wear resistance. Carbonization The chrome coating has been exposed in many industrial applications in the 1990s. For example, Japanese Patent JP2010248595 discloses that a layer of 45-55 wt.% chromium carbide and 30-40 wt.% cobalt (Co) may be coated on the substrate. Good wear resistance can still be obtained under the conditions of use at 1000 ° C; US Pat. No. 6,068,568 discloses that the use of chromium carbide on the chain of the car can increase the wear resistance of the chain; EPO patent EP1878943 discloses the use of diffusion The chromizing method causes the steel to penetrate into the inner layer to contain Cr 7 C 3 and the outer layer to contain Cr 23 C 6 on the chain, which can also increase the mechanical properties of the chain.

在導電的應用上,如美國專利US4925394揭露使用濺鍍(spattering)、氣相沉積法(CVD)或電漿CVD法將碳化鎢、碳化鉻或碳化鋯 等導電陶瓷層噴塗在導電基材上,以增加連接器端子(terminal)的機械特性,但由於碳化鎢、碳化鉻或碳化鋯等陶瓷的導電性不佳,直接使用於導電要求的電氣元件有其限制,因此美國專利US5516995揭露使用銀與碳化鉻的混合物以增加碳化鉻陶瓷的導電度,但因為加入的銀粒子數量不能過低(如50~60%),除價格高外,銀與碳化鉻的混合物也不易形成;在基材上形成金屬化陶瓷的方法主要分成乾式法及濕式法,乾式法如電漿輔助化學沉積法、氣相沉積法(CVD)、高能量微弧技術、高溫碳化、低溫碳化、物理氣相沉積(PVD)、粉浴等方法;如前述之美國專利US4925394之濺鍍法或氣相沉積法,EP1878943之擴散鉻化法;台灣專利公開號TW201101565揭露使用粉浴法、台灣專利TW I297365揭露利用碳化鉻粉末材料對工具以濺鍍方式產生含碳化鉻基合金材料;中國專利申請號CN201110064876.9揭露使用熔射法等;然而這些乾式法製作成本昂貴且難以大量生產,而熔射法、粉浴法雖然相對便宜,但需要加高溫,可能會使基材的機械性能改變,也難以應用在精密且具有高機械性能的零組件(如連接器的端子)。在濕式法上,中國專利申請號CN200810142997.9揭露使用三價鉻電鍍方法,製成高硬度、抗磨性能和抗腐蝕性能的鉻-碳納米管複合鍍層,但其鍍層的導電性差,不能用於電子元件;中國專利申請號CN201220185401.5與CN201210114284.8揭露使用六價鉻電鍍方法在活塞環形成非晶態的碳化鉻合金鍍層,但因含碳量太低導電性差,也不能用於電子元件;台灣專利公開號TW201339373揭露使用三價鉻電鍍的方法,可在導電的底材上電鍍形成碳化鉻電鍍層,且可藉由較高的碳含量提高使碳化鉻電鍍層之導電度達到比電阻為120mΩ以下,適合於電性元件使用,又因使用電鍍的方法,可使用低於100℃的溫度使底材不會改變其機械強度,可在便宜的成本下大量生產。 In conductive applications, such as the use of spattering, vapor deposition (CVD) or plasma CVD, tungsten carbide, chromium carbide or zirconium carbide is disclosed in U.S. Patent No. 4,925,394. The conductive ceramic layer is sprayed on the conductive substrate to increase the mechanical properties of the connector terminal. However, since the conductivity of the ceramic such as tungsten carbide, chromium carbide or zirconium carbide is not good, the electrical component directly used for the conductive requirement has There is a limitation, and therefore, US Pat. No. 5,516,995 discloses the use of a mixture of silver and chromium carbide to increase the conductivity of the chromium carbide ceramic, but because the amount of silver particles added cannot be too low (eg, 50 to 60%), in addition to the high price, silver and carbonization. The mixture of chromium is also difficult to form; the method of forming metallized ceramics on the substrate is mainly divided into a dry method and a wet method, such as a plasma-assisted chemical deposition method, a vapor deposition method (CVD), a high-energy micro-arc technique, High temperature carbonization, low temperature carbonization, physical vapor deposition (PVD), powder bath, etc.; such as the sputtering method or vapor deposition method of the aforementioned US Pat. No. 4,925,394, the diffusion chromization method of EP 1878943; Taiwan Patent Publication No. TW201101565 discloses the use of powder Bath method, Taiwan patent TW I297365 discloses the use of chromium carbide powder material to produce chromium carbide-based alloy material by sputtering method; Chinese patent application number CN201110064876.9 The use of the spray method, etc.; however, these dry methods are expensive to manufacture and difficult to mass produce, while the spray method and the powder bath method are relatively inexpensive, but need to be heated, which may change the mechanical properties of the substrate and is difficult to apply. Precision and high mechanical performance components (such as the terminals of the connector). In the wet method, Chinese Patent Application No. CN200810142997.9 discloses the use of a trivalent chromium plating method to produce a chromium-carbon nanotube composite coating having high hardness, abrasion resistance and corrosion resistance, but the conductivity of the coating is poor and cannot be For electronic components; Chinese Patent Application No. CN201220185401.5 and CN201210114284.8 disclose the use of hexavalent chromium plating method to form an amorphous chromium carbide alloy coating on the piston ring, but because the carbon content is too low, the conductivity is poor, and can not be used. Electronic component; Taiwan Patent Publication No. TW201339373 discloses a method of electroplating using trivalent chromium to form a chromium carbide plating layer on a conductive substrate, and the conductivity of the chromium carbide plating layer can be improved by a higher carbon content. The specific resistance is 120 mΩ or less, which is suitable for use in electrical components, and because of the method of electroplating, the temperature of less than 100 ° C can be used so that the substrate does not change its mechanical strength, and can be mass-produced at a low cost.

連接器(connector)的應用範圍十分廣泛,尤其是在3C產品、家電產品或汽車電源連接使用的電性連接器上,更為常見。電性連接器可提供可分離的界面透過機械方法產生的電性連接,用以連接兩個次電子系統。通常,但不限制地,連接器可為公連接器(male connector)與母連接器(female connector),如使用機械式彈簧的端子,因彈力使端子偏向而在接 觸的觸點(touch)上產生一個力量,使得觸點的接合面之間產生金屬性接觸而產生電性連接。通常端子是由銅、銅合金、鋼材等材料為基材,為防腐蝕或增加導電性之目的,以使觸點維持良好的電性導通,常在基材上電鍍一層電鍍層,如錫、鎳、貴金屬、金、銀、金鎳合金、鈀合金(鈀與鎳比例為80/20%或60/40%)、鈀磷、鈀硼、硒(selenium,Se)或鉈(thallium,Tl)等,或先在基材上先鍍一層中介層,再鍍一層電鍍層,而中介層則以錫、鎳或其合金為主,中介層目的在於減少孔隙腐蝕、提供轉移腐蝕對象的覆蓋層、限制銅基材的向表面擴散以及提高鍍層的耐久性。 Connectors are used in a wide range of applications, especially on 3C products, home appliances or electrical connectors used in automotive power connections. The electrical connector provides a mechanical connection between the detachable interface and the electrical connection to connect the two secondary electronic systems. Typically, but not by way of limitation, the connector may be a male connector and a female connector, such as a terminal using a mechanical spring, which is biased by the spring force to bias the terminal A force is generated on the touch of the contact such that a metallic contact is made between the joint faces of the contacts to create an electrical connection. Usually, the terminal is made of copper, copper alloy, steel or the like as a substrate for the purpose of preventing corrosion or increasing conductivity, so that the contacts maintain good electrical conduction, and a plating layer such as tin is often plated on the substrate. Nickel, precious metal, gold, silver, gold-nickel alloy, palladium alloy (palladium to nickel ratio of 80/20% or 60/40%), palladium phosphorus, palladium boron, selenium (Se) or thallium (Tal) Etc., or first plating an interposer on the substrate, and then plating a layer of plating, while the interposer is mainly tin, nickel or its alloy. The interposer is intended to reduce pore corrosion, provide a coating for transferring corrosion objects, Limiting the diffusion of the copper substrate to the surface and improving the durability of the coating.

由於連接器應用範圍廣泛,但主要有電力傳輸及訊號傳輸兩類,電力傳輸主要為電導通之用,而訊號傳輸則又分成低頻率的模擬訊號與高頻的數位訊號,而數位訊號的傳遞速度比模擬訊號要快得多,有些數位訊號在連接器中的傳遞速度已接近千億分之一秒的範圍,因此連接器的導電性與特徵阻抗是相當重要的。為使連接器端子有良好的導電性與避免氧化物產生降低觸點的接合之導通(氧化物造成接觸電阻的提高),披覆一層電鍍層是必要的選擇,如前所述,貴金屬鍍層(金、金鎳合金、鈀合金等)具有相當優良的導電性能和導熱性能,而且幾乎在任何環境中,都有良好的抗腐蝕性,常用於高導通與耐腐蝕要求的連接器上;在不同的要求上,又分為軟金、硬金(金鈷比例為99.9/0.1%)、鈀、金鈀合金(如,金鈀比例為80/20%)及鈀鎳合金(如,鈀鎳比例為80/20%)等。 Due to the wide range of applications, there are two main types of power transmission and signal transmission. The power transmission is mainly for electrical conduction, while the signal transmission is divided into low frequency analog signals and high frequency digital signals, and digital signals are transmitted. The speed is much faster than the analog signal. Some digital signals are transmitted in the connector at a speed close to one hundredth of a second, so the conductivity and characteristic impedance of the connector are quite important. In order to make the connector terminals have good electrical conductivity and to avoid the occurrence of oxides and reduce the conduction of the contacts (the oxide causes the contact resistance to increase), it is necessary to coat a layer of plating, as described above, the precious metal plating ( Gold, gold-nickel alloy, palladium alloy, etc.) have excellent electrical and thermal conductivity, and have good corrosion resistance in almost any environment. They are commonly used in connectors with high conductivity and corrosion resistance; The requirements are divided into soft gold, hard gold (gold and cobalt ratio of 99.9/0.1%), palladium, gold-palladium alloy (for example, gold/palladium ratio of 80/20%) and palladium-nickel alloy (eg, palladium-nickel ratio). For 80/20%) and so on.

請參閱第1圖,第1圖為十年來的國際金價走勢圖;近十年來,貴金屬價格愈來愈高,例如金價由2000年每盎司270美元一路飆漲至2011年的每盎司1850美元為最高,而至2013年雖有下跌至每盎司1300美元,其均價可計算為每盎司1470美元,造成連接器的價格愈來愈貴。由於連接器的貴金屬鍍層(尤其是金鍍層)可保持低接觸阻抗、耐蝕、耐磨、導電性佳、耐高溫,習知的用於高導通與耐腐蝕要求的連接器電連接件常以電鍍一層金鍍層,或如在電路板的接腳(pin connector)上電鍍一層金鍍層,俗稱金手指(Gold Finger)。然而因電鍍金的鍍金浴主要的成份為氰化氰鉀與氰化鈉等,氰化物有劇毒性屬於毒物管制,目前在世界幾個主要國家已漸漸被禁用;且鍍金成本原本就高,再加上近年來黃金價格飆漲,減少金鍍層 的厚度或尋找替代品已是相當重要的趨勢。 Please refer to Figure 1. Figure 1 shows the international gold price chart for ten years. In the past ten years, the price of precious metals has become higher and higher. For example, the price of gold has soared from $270 per ounce in 2000 to $1,850 per ounce in 2011. The highest, and by 2013, it fell to $1,300 per ounce, and its average price could be calculated at $1,470 per ounce, making the connector more expensive. Since the noble metal plating of the connector (especially the gold plating) can maintain low contact resistance, corrosion resistance, wear resistance, good electrical conductivity, and high temperature resistance, conventional connector electrical connectors for high conduction and corrosion resistance are often plated. A layer of gold plating, or a layer of gold plating on the pin connector of the board, commonly known as the Gold Finger. However, the main components of gold-plated baths for electroplating gold are potassium cyanide and sodium cyanide. Cyanide is highly toxic and is currently banned in several major countries; and the cost of gold plating is originally high. Plus gold prices soared in recent years, reducing gold plating The thickness or finding alternatives has been a fairly important trend.

又,前述之台灣專利公開號TW201339373雖已揭露使用三價鉻電鍍的方法,可在底材上電鍍形成碳化鉻金屬陶瓷層,以應用於需要高精密、硬度高、耐磨且導電性良好的工件等;然而,該先前技術雖揭露碳化鉻金屬陶瓷層的線性極化腐蝕電流可達到在1×10-5安培以下之耐腐蝕特性,仍欠缺如何達到工業化的耐腐蝕且耐磨的解決方案,及利用此技術進行轉化為工業上應用;因此基於該方法應可繼續開發出能通過環境腐蝕要求的高度耐腐蝕性、具有低接觸電阻值、高度耐磨的連接器電連接件,可以取代貴金屬鍍層的連接器電連接件,則為急迫需要解決的課題。 Moreover, the aforementioned Taiwan Patent Publication No. TW201339373 discloses a method of electroplating using trivalent chromium, which can be plated on a substrate to form a chromium carbide cermet layer for use in applications requiring high precision, high hardness, wear resistance, and good electrical conductivity. Workpieces and the like; however, the prior art discloses that the linearly polarized corrosion current of the chromium carbide cermet layer can reach a corrosion resistance of 1×10 -5 ampere or less, and there is still a lack of an industrial corrosion-resistant and wear-resistant solution. And use this technology to convert into industrial applications; therefore, based on this method, it is possible to continue to develop connector electrical connectors that can meet the high corrosion resistance required by environmental corrosion, have low contact resistance values, and are highly wear-resistant, and can replace The connector electrical connector of the precious metal plating is an urgent problem to be solved.

有鑑於上述習知技藝之問題,本發明主要目的之一為提出一種披覆金屬化陶瓷電鍍層之電性連接器,該電性連接器係由一連接器本體(connector housing)及一個或複數個電連接件所組成,或簡化稱為連接器本體與N個電連接件所組成,N為大於等於1。 In view of the above problems of the prior art, one of the main objects of the present invention is to provide an electrical connector covering a metallized ceramic plating layer, the electrical connector being composed of a connector housing and one or more The electrical connector is composed of, or simplified, a connector body and N electrical connectors, and N is greater than or equal to 1.

電連接件(contact或terminal)係在一基材披覆一層金屬化陶瓷電鍍層;電連接件之基材之材料可為導電材質或不導電材質以電鍍或無電鍍披覆一導電層:(1)導電材質:可選用導電陶瓷、鐵、不鏽鋼、銅、鉻、錫、鎳、銀、金或其合金之一或其組合;(2)不導電材質:可選用塑膠、陶瓷、玻璃之一或其組合,並以電鍍或無電鍍披覆一導電層,該導電層為選自於鐵、銅、鉻、錫、鎳、銀、金或其合金。 The electrical contact (contact or terminal) is coated on a substrate with a metallized ceramic plating layer; the material of the substrate of the electrical connector may be a conductive material or a non-conductive material to be coated with a conductive layer by electroplating or electroless plating: 1) Conductive material: one or a combination of conductive ceramics, iron, stainless steel, copper, chromium, tin, nickel, silver, gold or alloys thereof; (2) non-conductive material: one of plastic, ceramic and glass Or a combination thereof, and coating a conductive layer by electroplating or electroless plating, the conductive layer being selected from the group consisting of iron, copper, chromium, tin, nickel, silver, gold or alloys thereof.

該金屬化陶瓷電鍍層係以濕式法(如電鍍方法),在電連接件的基材披覆一層金屬化陶瓷所形成的,雖可選用不同的金屬化陶瓷,但在本發明較佳的實施例,為達到高度耐腐蝕與良好導電性,該金屬化陶瓷電鍍層為以碳化鉻基(Chromium Carbide base,CrC base)為成份的金屬化陶瓷,係經由電鍍形成一非晶相的碳化鉻結構(amorphous type microstructure of CrC)附著在該基材表面之全部或一部分;其成份包含鉻元素、碳元素及氧元素等,主要係為鉻元素與碳元素所組成,該非晶相結構至少包括六碳化二十三鉻(Cr23C6)、二碳化三鉻(Cr3C2)或三碳化七鉻(Cr7C3)之一或其組 合,其中為達到高度耐腐蝕、耐磨性與良好導電性,較佳者碳元素含量為大於25At%,其中At%為原子數比例(atomic percent)。 The metallized ceramic plating layer is formed by a wet method (such as electroplating method), and a metallized ceramic is coated on the substrate of the electrical connector. Although different metallized ceramics may be used, it is preferred in the present invention. In an embodiment, in order to achieve high corrosion resistance and good electrical conductivity, the metallized ceramic plating layer is a metallized ceramic composed of a Chromium Carbide base (CrC base), and an amorphous phase of chromium carbide is formed by electroplating. An amorphous type microstructure of CrC adheres to all or a part of the surface of the substrate; the composition thereof comprises chromium, carbon and oxygen, and is mainly composed of chromium and carbon, and the amorphous phase structure includes at least six One or a combination of carbon trioxide (Cr 23 C 6 ), chromium trichrome (Cr 3 C 2 ) or triple carbon trioxide (Cr 7 C 3 ), in order to achieve high corrosion resistance, wear resistance and Good conductivity, preferably carbon content is greater than 25 At%, where At% is atomic percent.

在導電特性上,當該碳化鉻基成份的金屬化陶瓷電鍍層之平均厚度範圍在0.5μm至35μm時,其接觸電阻值(contact resistance)為60 mΩ以下,其中,接觸電阻值為在重量10 g的負重下的電阻值。 In terms of electrical conductivity, when the average thickness of the metallized ceramic plating layer of the chromium carbide-based component ranges from 0.5 μm to 35 μm, the contact resistance is 60 mΩ or less, wherein the contact resistance value is 10 The resistance value under g load.

在耐腐蝕特性上,當該金屬化陶瓷電鍍層的平均厚度為0.5~3μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐環境腐蝕為曝露於鹽霧中連續300小時以上無腐蝕現象,或耐硫腐蝕為曝露於二氧化硫霧中連續72小時以上無腐蝕現象;或耐酸氣腐蝕為曝露於亞硫酸霧中連續36小時以上無腐蝕現象;當該金屬化陶瓷電鍍層的平均厚度為3~8μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐環境腐蝕為曝露於鹽霧中連續500小時以上無腐蝕現象,或耐硫腐蝕為曝露於二氧化硫霧中連續128小時以上無腐蝕現象,或耐酸氣腐蝕為曝露於亞硫酸霧中連續72小時以上無腐蝕現象;當該金屬化陶瓷電鍍層的平均厚度大於8μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐環境腐蝕為曝露於鹽霧中連續1000小時以上無腐蝕現象,或耐硫腐蝕為曝露於二氧化硫霧中連續300小時以上無腐蝕現象,或耐酸氣腐蝕為曝露於亞硫酸霧中連續128小時以上無腐蝕現象;其中,曝露於鹽霧中係依據ASTM B117試驗規範試驗、曝露於二氧化硫霧中係依據ASTM B799試驗規範試驗、曝露於亞硫酸霧中係依據ASTM B799試驗規範試驗。 In the corrosion resistance, when the average thickness of the metallized ceramic plating layer is 0.5~3μm, the electrical connection member is covered with the metallized ceramic plating layer, and the environmental corrosion resistance is exposed to the salt spray for more than 300 hours without Corrosion phenomenon, or sulfur corrosion resistance, is not corrosive for more than 72 hours in exposure to sulfur dioxide mist; or acid gas corrosion is corrosion-free for exposure to sulfurous acid mist for more than 36 hours; when the average thickness of the metallized ceramic plating layer is 3 ~8μm, the electrical connector is covered with the metallized ceramic plating part of the environmental corrosion resistance for exposure to salt spray for more than 500 hours without corrosion, or sulfur corrosion resistance for exposure to sulfur dioxide mist for more than 128 hours without corrosion Phenomenon, or acid and acid corrosion is no corrosion caused by exposure to sulfurous acid mist for more than 72 hours; when the average thickness of the metallized ceramic plating layer is greater than 8 μm, the electrical connector is covered with the metallized ceramic plating portion Environmental corrosion is no corrosion caused by exposure to salt spray for more than 1000 hours, or sulfur corrosion resistance is exposed to sulfur dioxide for 300 hours. No corrosion phenomenon, or acid and gas corrosion resistance for exposure to sulfurous acid mist for more than 128 hours without corrosion; wherein exposure to salt spray is tested according to ASTM B117 test specification, exposure to sulfur dioxide mist is tested according to ASTM B799 test specification, exposure It is tested in the sulfurous acid mist according to the ASTM B799 test specification.

在表面硬度特性上,該金屬化陶瓷電鍍層表面硬度為800Hv以上,對於較佳的實施例為1285Hv,其中,表面硬度係依ASTM 578以加載壓力100gf試驗。 The surface hardness of the metallized ceramic plating layer is 800 Hv or more, and for the preferred embodiment, it is 1285 Hv, wherein the surface hardness is tested according to ASTM 578 at a loading pressure of 100 gf.

在耐磨特性上,該金屬化陶瓷電鍍層平均磨擦係數(coefficient of friction)小於0.9,對於較佳的實施例為0.3~0.6;或磨耗損失約為0.1~1mg。其中,磨擦係數係依據ASTM D 3702-94以300牛頓荷重試 驗,磨耗損失係依ASTM D 3702-94試驗。 The metallized ceramic plating layer has an average coefficient of friction of less than 0.9, preferably 0.3 to 0.6 for a preferred embodiment, or a wear loss of about 0.1 to 1 mg. Among them, the friction coefficient is tested according to ASTM D 3702-94 with a load of 300 Newtons. The wear loss was tested in accordance with ASTM D 3702-94.

在附著力特性上,該金屬化陶瓷電鍍層之附著力為1%以內,附著力係依ASTM D3359試驗。 The adhesion of the metallized ceramic plating layer is within 1% in terms of adhesion characteristics, and the adhesion is tested in accordance with ASTM D3359.

在高頻損耗特性上,披覆金屬化陶瓷電鍍層之電性連接器,其中在傳輸頻率高達約10GHz時,該電連接件之接觸損耗小於1dB。 In the high frequency loss characteristic, an electrical connector is coated with a metallized ceramic plating layer, wherein the electrical connection has a contact loss of less than 1 dB at a transmission frequency of up to about 10 GHz.

本發明的另一主要目的係提出一種披覆金屬化陶瓷電鍍層之電性連接器,該電性連接器係由一連接器本體及N個電連接件所組成;電連接件係在一基材先披覆一層中介層,於中介層上再披覆金屬化陶瓷電鍍層,即,該電連接件在該基材與該金屬化陶瓷電鍍層之間進一步包含一中介層。 Another main object of the present invention is to provide an electrical connector coated with a metallized ceramic plating layer, the electrical connector being composed of a connector body and N electrical connectors; the electrical connector is a base The material is first coated with an interposer, and the metallization ceramic plating layer is further coated on the interposer, that is, the electrical connector further comprises an interposer between the substrate and the metallized ceramic plating layer.

其中,電連接件之基材之材料可為導電材質或不導電材質,如前所述。該中介層係披覆在該基材表面,係由濕式法之無電電鍍或電鍍、乾式法之氣相沉積(CVD)或物理氣相沉積(PVD)等其他不限制的沉積方法或包覆的方法所形成,該中介層之材質係選自於鐵、銅、鎳、鎳磷、錫、銀、金、鈀、鈷、貴金屬或其合金;或者可選用不導電材質,於不導電材質上披覆鐵、銅、鎳、鎳磷、錫、銀、金、鈀、鈷、貴金屬或其合金;再於該中介層上披覆金屬化陶瓷電鍍層,該金屬化陶瓷電鍍層係披覆於該中介層之全部或一部份。 Wherein, the material of the substrate of the electrical connector may be a conductive material or a non-conductive material, as described above. The interposer is coated on the surface of the substrate by electroless plating or electroplating, dry vapor deposition (CVD) or physical vapor deposition (PVD), and other non-limiting deposition methods or coatings. Formed by the method, the material of the interposer is selected from the group consisting of iron, copper, nickel, nickel phosphorus, tin, silver, gold, palladium, cobalt, precious metals or alloys thereof; or non-conductive materials may be selected on the non-conductive material. Coating iron, copper, nickel, nickel phosphorus, tin, silver, gold, palladium, cobalt, noble metal or alloy thereof; and then coating the metallized ceramic plating layer on the interposer, the metallized ceramic plating layer is coated on All or part of the intermediation layer.

對於不同的應用,該中介層為二層或二層以上。 For different applications, the interposer is two or more layers.

藉此,具有中介層之電連接件具有前述之導電特性、耐環境腐蝕、耐硫腐蝕、耐酸腐蝕、耐磨性、附著力及該披覆金屬化陶瓷電鍍層之電性連接器之高頻損耗特性相同於前所述,在此不再重複。 Thereby, the electrical connector having the interposer has the aforementioned electrical conductivity, environmental corrosion resistance, sulfur corrosion resistance, acid corrosion resistance, abrasion resistance, adhesion, and high frequency of the electrical connector of the metallized ceramic plating layer. The loss characteristics are the same as described above and will not be repeated here.

承上所述,依本發明之一種披覆金屬化陶瓷電鍍層之電性連接器,其可具有一或多個下述優點: In view of the above, an electrical connector coated with a metallized ceramic plating layer according to the present invention may have one or more of the following advantages:

(1)本發明使用台灣專利公開號TW201339373揭露的電鍍方法,成功的可在底材上電鍍形成碳化鉻基成份的金屬化陶瓷電鍍層,改善了習知技術以高溫滲透法、氣相沉積法(CVD)或物理氣相沉積法(PVD)等其他乾式法在電性連接器的電連接件上披覆金屬化陶瓷的技術,除了可大幅降低成本外,更可免於使用高溫的披覆環境使電連接件退火而喪失機械性 能的缺點。 (1) The present invention uses the electroplating method disclosed in Taiwan Patent Publication No. TW201339373 to successfully form a metallized ceramic plating layer on a substrate by forming a chromium carbide-based component, and improves the conventional technique by high temperature permeation method, vapor deposition method. Other dry methods such as (CVD) or physical vapor deposition (PVD) can be used to coat metallized ceramics on the electrical connectors of electrical connectors. In addition to greatly reducing the cost, high-temperature coatings are also avoided. Environment causes electrical connectors to anneal and lose mechanical properties The shortcomings of ability.

(2)本發明提升台灣專利公開號TW201339373揭露的電鍍方法,調整其製程與配方,使在底材上電鍍形成的金屬陶瓷電鍍層改善了導電性、耐腐蝕性、高頻損耗與附著力,使其符合電性連接器之功能特性需求,可以取代習知鍍金(貴金屬)的電性連接器,除了大幅降低成本外,也免於環境遭受氰化物的毒害。 (2) The present invention improves the electroplating method disclosed in Taiwan Patent Publication No. TW201339373, and adjusts the process and formulation thereof so that the cermet plating layer formed by electroplating on the substrate improves conductivity, corrosion resistance, high frequency loss and adhesion, In order to meet the functional characteristics of the electrical connector, it can replace the conventional gold-plated (precious metal) electrical connector, in addition to greatly reducing the cost, and also avoid the environment from cyanide poisoning.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本發明加以限制者。 For a better understanding of the features and technical aspects of the present invention, reference should be made to the accompanying drawings.

1‧‧‧電性連接器 1‧‧‧Electrical connector

2、21、22‧‧‧連接器本體 2, 21, 22‧‧‧ connector body

3、3A、3B、3N‧‧‧電連接件 3, 3A, 3B, 3N‧‧‧ electrical connectors

301‧‧‧電連接件插件 301‧‧‧Electrical connector plug-in

302‧‧‧電連接件插座 302‧‧‧Electrical connector socket

31‧‧‧基材 31‧‧‧Substrate

32‧‧‧中介層 32‧‧‧Intermediary

33‧‧‧金屬化陶瓷電鍍層 33‧‧‧Metalized ceramic plating

331‧‧‧碳元素 331‧‧‧carbon elements

332‧‧‧鉻元素 332‧‧‧Chromium

4‧‧‧PCB板 4‧‧‧PCB board

41‧‧‧金手指 41‧‧‧Gold Fingers

5‧‧‧銲接腳 5‧‧‧welding feet

S1~S5‧‧‧方法步驟 S1~S5‧‧‧ method steps

第1圖為十年來的國際金價走勢圖的示意圖;第2圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器製作方法步驟圖;第3圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第一實施例示意圖;第4A圖為本發明第一實施例之披覆金屬化陶瓷電鍍層之電性連接器之金屬化陶瓷電鍍層表面形貌照片;第4B圖為本發明第一實施例之披覆金屬化陶瓷電鍍層之電性連接器之金屬化陶瓷電鍍層成份分析圖譜;第4C圖為本發明第一實施例之披覆金屬化陶瓷電鍍層之電性連接器之金屬化陶瓷電鍍層截面照片;第4D圖為本發明第一實施例之披覆金屬化陶瓷電鍍層磨耗試驗之磨耗距離與平均磨擦係數(coefficient of friction)之關係圖;第4E圖為本發明第一實施例之披覆金屬化陶瓷電鍍層磨耗試驗後的表面照片;第5圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第二實施例示意圖;第6圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第三實施例示 意圖;第7圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第四實施例示意圖;第8圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第五實施例示意圖;第9圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第六實施例示意圖;第10圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第七實施例示意圖;第11A圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第八實施例之電連接件插件示意圖;第11B圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第八實施例之電連接件插座示意圖;以及第12A圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第九實施例之電連接件插件示意圖;第12B圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器第九實施例之電連接件插座示意圖。 1 is a schematic diagram of an international gold price chart for ten years; FIG. 2 is a step view of a method for fabricating an electrical connector of a metallized ceramic plating layer of the present invention; and FIG. 3 is a cladding metallized ceramic of the present invention; A schematic view of a first embodiment of an electrical connector of a plating layer; and FIG. 4A is a photograph of a surface topography of a metallized ceramic plating layer of an electrical connector coated with a metallized ceramic plating layer according to a first embodiment of the present invention; The compositional analysis map of the metallized ceramic plating layer of the electrical connector of the metallized ceramic plating layer according to the first embodiment of the present invention; FIG. 4C is the electricity of the metallized ceramic plating layer of the first embodiment of the present invention; Photograph of the cross-section of the metallized ceramic plating layer of the connector; FIG. 4D is a graph showing the relationship between the wear distance and the coefficient of friction of the wear test of the coated metallized ceramic layer according to the first embodiment of the present invention; The figure is a surface photograph of the coated metallized ceramic plating layer after the abrasion test of the first embodiment of the present invention; and FIG. 5 is a schematic view showing the second embodiment of the electrical connector of the coated metallized ceramic plating layer of the present invention; The picture shows the drape of the present invention 6 metallized ceramic plating layer is electrically connected to a third embodiment of the embodiment shown 7 is a schematic view of a fourth embodiment of an electrical connector for coating a metallized ceramic plating layer of the present invention; FIG. 8 is a fifth embodiment of an electrical connector for coating a metallized ceramic plating layer of the present invention; FIG. 9 is a schematic view showing a sixth embodiment of an electrical connector for coating a metallized ceramic plating layer according to the present invention; and FIG. 10 is a seventh embodiment of an electrical connector for coating a metallized ceramic plating layer according to the present invention; 1A is a schematic view of an electrical connector insert of an eighth embodiment of an electrical connector of a metallized ceramic plating layer of the present invention; and FIG. 11B is an electrical connection of the coated metallized ceramic plating layer of the present invention; FIG. 12A is a schematic diagram of an electrical connector insert of a ninth embodiment of an electrical connector of a metallized ceramic plating layer according to the present invention; FIG. 12B is a schematic view of the electrical connector of the ninth embodiment of the present invention; A schematic diagram of an electrical connector socket of a ninth embodiment of an electrical connector overlying a metallized ceramic plating.

有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式及實施例的詳細說明中,將可清楚的呈現。 The above and other technical contents, features and advantages of the present invention will be apparent from the following description of the drawings and the appended claims.

請參見第2圖,第2圖為本發明之披覆金屬化陶瓷電鍍層之電性連接器製作方法步驟圖,說明如下: Please refer to FIG. 2, which is a step diagram of a method for fabricating an electrical connector for a metallized ceramic plating layer according to the present invention, which is illustrated as follows:

步驟S1:提供電連接器待使用的電連接件,電連接件係由基材所製成,此電連接件係依其需要的目的而設計製作的,通常為了大量生產係採用沖製所製作,或進一步先經熱處理以增加其機械性能;在實際工業上應用,常製成電連接件之料帶,係在一相當長的金屬板(對應於電連接件的基材)上連續沖製而製成連續的很多個電連接件; Step S1: providing an electrical connector to be used for the electrical connector, the electrical connector is made of a substrate, and the electrical connector is designed and manufactured according to the purpose of the need, and is usually manufactured by a large number of production systems. Or further heat-treated to increase its mechanical properties; in practical industrial applications, the tape of the electrical connector is often made, and is continuously punched on a relatively long metal plate (corresponding to the substrate of the electrical connector). And making a continuous plurality of electrical connectors;

步驟S21:判斷連接件的基材是那一種材料,判斷是否為導 電材質;對於不同基材的材料,在步驟S31及S32應調整不同的操作條件;若連接件的基材為不導電材質,則進行步驟S22; Step S21: determining which material is the material of the connecting member, and determining whether it is a guide Electrical material; for different substrate materials, in steps S31 and S32 should be adjusted different operating conditions; if the substrate of the connector is non-conductive material, proceed to step S22;

步驟S22:若連接件的基材為不導電材質則先以電鍍或無電鍍披覆一層導電層,使連接件的基材為導電,披覆在不導電材質可採用鐵、銅、鉻、錫、鎳、銀、金或其合金;雖然乾式法也可以披覆導電層,但實際應用上,因乾式法通常採用高溫,會使連接件因熱而損壞,故仍以使用濕式法的電鍍或無電鍍為主; Step S22: if the substrate of the connecting member is a non-conductive material, first coating a conductive layer by electroplating or electroless plating, so that the substrate of the connecting member is electrically conductive, and the conductive material may be coated with iron, copper, chromium or tin. Nickel, silver, gold or alloys thereof; although the dry method can also coat the conductive layer, in practical applications, the dry method usually uses high temperature, which causes the joint to be damaged by heat, so the wet method is still used. Or electroless plating;

步驟S23:對於不同的應用,於步驟S1後可直接先披覆一層或多層的中介層,該中介層之材質可為:鐵、銅、鎳、鎳磷、錫、銀、金、鈀、鈷、貴金屬或其合金;或者是不導電材質披覆鐵、銅、鎳、鎳磷、錫、銀、金、鈀、鈷、貴金屬或其合金;披覆中介層的主要目的為增加電連接件的耐腐蝕性、電性或使最外層的電鍍層有更佳的附著力。 Step S23: For different applications, after step S1, one or more interposer layers may be directly coated, and the material of the interposer may be: iron, copper, nickel, nickel phosphorus, tin, silver, gold, palladium, cobalt. , precious metal or alloy thereof; or non-conductive material coated with iron, copper, nickel, nickel phosphorus, tin, silver, gold, palladium, cobalt, precious metals or alloys thereof; the main purpose of covering the interposer is to increase the electrical connection Corrosion resistance, electrical properties or better adhesion of the outermost plating layer.

步驟S31:跟據不同電連接件的基材(或中介層),配製步驟S32電鍍製程之脫脂溶液、酸洗溶液、三價鉻電鍍浴;脫脂溶液的目的為去除電連接件表面上的油脂,可採用有機溶劑、中性脫脂劑、鹼性脫脂劑或酸性脫脂劑;酸洗溶液的目的為去除電連接件表面上的氧化物並使電連接件的表面活化,可採用稀硫酸、稀鹽酸、稀硝酸、稀磷酸或其混合之酸液;三價鉻電鍍浴則另說明如後; Step S31: according to the substrate (or the interposer) of the different electrical connectors, the degreasing solution, the pickling solution, and the trivalent chromium plating bath of the electroplating process of step S32 are prepared; the purpose of the degreasing solution is to remove the grease on the surface of the electrical connector. An organic solvent, a neutral degreaser, an alkaline degreaser or an acidic degreaser may be used; the purpose of the pickling solution is to remove oxides on the surface of the electrical connector and activate the surface of the electrical connector, and dilute sulfuric acid or thinner may be used. Hydrochloric acid, dilute nitric acid, dilute phosphoric acid or a mixed acid solution thereof; the trivalent chromium electroplating bath is further described as follows;

步驟S32:以電鍍的方法在電連接件(或電連接件之料帶)上形成金屬化陶瓷電鍍層,由於係採用前述的三價鉻電鍍浴,在適當操作條件下,可形成碳化鉻基之金屬化陶瓷;在電鍍之前,對於不電鍍金屬化陶瓷的部份,如為了組裝或焊錫的部份,則可使用防鍍漆、防鍍蓋、防鍍塞等工具,將不電鍍金屬化陶瓷的部份先行遮蔽。在後續的實施例中,經分析後,所形成的金屬化陶瓷電鍍層為非晶相的碳化鉻結構附著,金屬化陶瓷電鍍層成份係由主者由鉻元素、碳元素、氧元素等所組成,而非晶相的碳化鉻結構則由鉻元素與碳元素所組成,至少包括六碳化二十三鉻(Cr23C6)、二碳化三鉻(Cr3C2)或三碳化七鉻(Cr7C3)之一或其組合,為了電連接器的耐腐蝕、導電等特性要求,金屬化陶瓷電鍍層之碳元素含量為大於25At%為較佳。 Step S32: forming a metallized ceramic plating layer on the electrical connector (or the material of the electrical connector) by electroplating. Since the above-mentioned trivalent chromium plating bath is used, a chromium carbide group can be formed under appropriate operating conditions. Metallized ceramics; before electroplating, for parts that are not plated with metallized ceramics, such as parts for assembly or soldering, tools such as anti-painting, anti-plating, anti-plating, etc. The part of the ceramic is shaded first. In the subsequent embodiments, after the analysis, the formed metallized ceramic plating layer is adhered to the amorphous phase of the chromium carbide structure, and the metallized ceramic plating layer component is composed of the chromium element, the carbon element, the oxygen element, etc. Composition, and the chromium carbide structure of the amorphous phase is composed of chromium and carbon, and at least includes chromium trichloride (Cr 23 C 6 ), chromium trichrome (Cr 3 C 2 ) or three carbonized seven chromium. One or a combination of (Cr 7 C 3 ), in order to meet the characteristics of corrosion resistance and electrical conductivity of the electrical connector, it is preferred that the metallized ceramic plating layer has a carbon element content of more than 25 At%.

步驟S41:準備連接器本體,連接器本體通常為工程塑膠、金屬、陶瓷或其組合所製成,依其結構可容納N個電連接件; Step S41: preparing a connector body, the connector body is usually made of engineering plastic, metal, ceramic or a combination thereof, and can accommodate N electrical connectors according to the structure;

步驟S42:將N個披覆有金屬化陶瓷電鍍層之電連接件組裝於連接器本體,或更進一步將導線與電連接件進行連接或錫焊; Step S42: assembling N electrical connectors coated with a metallized ceramic plating layer to the connector body, or further connecting or soldering the wires to the electrical connectors;

步驟S5:如此可製成披覆金屬化陶瓷電鍍層之電性連接器。 Step S5: Thus, an electrical connector covering the metallized ceramic plating layer can be formed.

本發明之披覆金屬化陶瓷電鍍層之電性連接器,在前述步驟S32的電鍍使用之三價鉻電鍍浴(於步驟S31配製的)主要由三價鉻鹽、碳源錯合劑及pH調節劑所形成之水溶液;三價鉻鹽的來源可為硫酸系三價鉻鹽、氯酸系三價鉻鹽或其他酸系三價鉻鹽等之水溶性鹽;硫酸系三價鉻鹽如硫酸鉻、硫酸鉻銨、硫酸鉻鉀等之一或其組合,氯酸系三價鉻鹽如氯化鉻、過氯酸鉻等之一或其組合;碳源錯合劑為甲酸、甲酸銨、甲酸鈉、乙酸、乙酸銨、乙酸鈉之一或其組合以提供碳源及增加螯合作用;pH調節劑的目的為使溶液具有緩衝(buffer)的功能,常用的pH調節劑7為有機的鹽類、鹵素鹽類,如硼酸、硫酸銨、氯化銨、溴化銨硼酸、硼酸鹽、氯鹽、溴鹽、銨鹽等。 The electrical connector for coating the metallized ceramic plating layer of the present invention, the trivalent chromium plating bath (prepared in step S31) used for electroplating in the foregoing step S32 is mainly composed of a trivalent chromium salt, a carbon source complexing agent and pH adjustment. The aqueous solution formed by the agent; the source of the trivalent chromium salt may be a water-soluble salt such as a sulfuric acid trivalent chromium salt, a chloric acid trivalent chromium salt or another acid trivalent chromium salt; a sulfuric acid trivalent chromium salt such as sulfuric acid. One or a combination of chromium, ammonium sulphate, potassium sulphate, or the like, chloric acid is a trivalent chromium salt such as chromium chloride, chromium perchlorate or the like; the carbon source complexing agent is formic acid, ammonium formate, sodium formate , one of acetic acid, ammonium acetate, sodium acetate or a combination thereof to provide a carbon source and increase chelation; the purpose of the pH adjuster is to make the solution have a buffer function, and the commonly used pH adjuster 7 is an organic salt. Halogen salts such as boric acid, ammonium sulfate, ammonium chloride, ammonium bromide, borate, chloride, bromide, ammonium and the like.

一般含有鉻離子的電鍍浴通常使用鉻酸(六價鉻、Cr6+),但鉻酸之六價鉻的毒性很大(大約是三價鉻的100倍以上),是一種很嚴重的致癌物,以六價鉻鍍鉻後所產生的廢水、生成物在自然界中不能自然降解與排除,在空氣中鉻濃度為0.15~0.3 mg/m3時,會造成鼻中隔膜穿孔,飲用水中含六價鉻濃度在0.1 mg/l以上時,就會使人嘔吐,侵害腸道和腎臟,且在生物體內會聚積,具有很長的危害潛伏期。世界各國政府均對六價鉻電鍍制定了相關的法律法規,逐步限制六價鉻的使用並降低其排放量。本發明排除使用六價鉻電鍍(如先前技術之中國專利申請號CN201220185401.5與CN201210114284.8揭露使用六價鉻電鍍方法在活塞環形成非晶態的碳化鉻合金鍍層),而使用無毒性、綠環保的三價鉻電鍍技術(如台灣專利公開號TW201339373揭露的三價鉻電鍍的方法),藉由前述的方法步驟,有效提高碳含量及增加耐磨性與耐蝕性,以適用於工業用的連接器。 Generally, chromic acid (hexavalent chromium, Cr 6+ ) is used in electroplating baths containing chromium ions, but hexavalent chromium of chromic acid is very toxic (about 100 times more than trivalent chromium), which is a serious carcinogenicity. The waste water and products produced by hexavalent chromium chrome plating cannot be naturally degraded and eliminated in nature. When the chromium concentration in the air is 0.15~0.3 mg/m 3 , the diaphragm in the nose is perforated, and the drinking water contains six. When the valence chromium concentration is above 0.1 mg/l, it will cause vomiting, invade the intestines and kidneys, and accumulate in the living body, which has a long incubation period. Governments around the world have enacted relevant laws and regulations on hexavalent chromium plating to gradually limit the use of hexavalent chromium and reduce its emissions. The present invention excludes the use of hexavalent chromium plating (as disclosed in the prior art, Chinese Patent Application No. CN201220185401.5 and CN201210114284.8, which disclose the use of a hexavalent chromium plating method to form an amorphous chromium carbide alloy coating on a piston ring), while using non-toxic, Green environmentally-friendly trivalent chromium plating technology (such as the method of trivalent chromium plating disclosed in Taiwan Patent Publication No. TW201339373), which effectively increases carbon content and increases wear resistance and corrosion resistance by the above-mentioned method steps, and is suitable for industrial use. Connector.

本發明之各個實施例使用的配方如表一,此僅為實施例之說 明,但不以此為限。在後續的實施例,均採用表一的硫酸根電鍍浴與氯硫酸根電鍍浴分別製成性能驗證的樣品,彼此為對照驗證,各實施例中的性能測試結果係取各樣品之平均值或最低值,於實施例中則不再一一說明。 The formulations used in the various embodiments of the present invention are shown in Table 1, which is only the embodiment. Ming, but not limited to this. In the subsequent examples, the performance verification samples were prepared by using the sulfate electroplating bath and the chlorosulfate electroplating bath of Table 1, respectively, and verified by comparison with each other. The performance test results in each example were taken as the average value of each sample or The lowest value will not be explained one by one in the embodiment.

電連接器的電連接件的電鍍層,主要的要求的7個項目為純度(Deposit Purity)、硬度(Hardness)、外觀(Appearance)、厚度(Thickness)、附著力(Adhesion)、鍍層完整性(Plating Integrity)及延展性(Ductility);若其電鍍層為金鍍層,則其品質與檢驗方法為依據ASTM-B488-01規範,但電連接件主要的特性為膜厚、表面硬度、導電性、耐環境腐蝕、耐硫腐蝕、耐酸腐蝕、耐磨性、附著力等,在下列實施例則分別對樣品進行驗證並列出特性的數值。在下列實施例係為本發明之披覆金屬化陶瓷電鍍層之電性連接器之各種實施例,但實際上的態樣不以此為限。 The electroplated layer of the electrical connector of the electrical connector, the main requirements of the seven items are Depth Purity, Hardness, Appearance, Thickness, Adhesion, Plating Integrity ( Plating Integrity) and Ductility; if the plating layer is gold-plated, the quality and inspection method are based on ASTM-B488-01, but the main characteristics of the electrical connector are film thickness, surface hardness, electrical conductivity, Resistance to environmental corrosion, sulfur corrosion, acid corrosion, abrasion resistance, adhesion, etc., in the following examples, the samples were verified and the values of the properties were listed. The following examples are various embodiments of the electrical connector of the coated metallized ceramic plating layer of the present invention, but the actual aspect is not limited thereto.

<實施例1> <Example 1>

如第3圖,係本發明之披覆金屬化陶瓷電鍍層之電性連接器1之示意圖,連接器本體2(未於圖上繪示)係為AMP連接器,連接器本體2內裝設有N支電連接件3;在本實施例係在電連接件3之基材31表面先以電鍍方法形成一層中介層32,於中介層32上再以電鍍方法形成一層金屬化 陶瓷電鍍層33,使電連接件3具有導電性、良好的表面硬度與耐蝕性,用以取代習知技術的金鍍層。 3 is a schematic view of the electrical connector 1 of the coated metallized ceramic plating layer of the present invention. The connector body 2 (not shown) is an AMP connector, and the connector body 2 is mounted. There are N electrical connectors 3; in this embodiment, an interposer 32 is formed on the surface of the substrate 31 of the electrical connector 3 by electroplating, and a metallization is formed on the interposer 32 by electroplating. The ceramic plating layer 33 allows the electrical connector 3 to have electrical conductivity, good surface hardness and corrosion resistance to replace the gold plating of the prior art.

電連接件3之基材31為銅合金所製成,在基材31上披覆的中介層32為採用無電電鍍所形成的鎳鍍層,其厚度為1.25~5μm,對於不同的製作方式也可使用電鍍形成的鎳鍍層,或者改用錫鍍層等不為所限。 The substrate 31 of the electrical connector 3 is made of a copper alloy, and the interposer 32 coated on the substrate 31 is a nickel plating layer formed by electroless plating, and has a thickness of 1.25 to 5 μm, which can be used for different manufacturing methods. It is not limited to use a nickel plating layer formed by electroplating or a tin plating layer.

本實施例之披覆金屬化陶瓷電鍍層之電性連接器1,係經由電鍍形成碳化鉻結構附著在電連接件3的中介層32上形成的金屬化陶瓷電鍍層33,請參見第4A圖,為本實施例之碳化鉻基成份的金屬化陶瓷電鍍層33表面形貌照片,由照片可見形成的金屬化陶瓷電鍍層33為非晶相結構,均勻緻密的披覆在中介層32上;請參見第4B圖,為本實施例之金屬化陶瓷電鍍層33成份分析圖譜,由圖可見金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332與碳元素331所組成,包括有六碳化二十三鉻(Cr23C6)、二碳化三鉻(Cr3C2)或三碳化七鉻(Cr7C3)等。 The electrical connector 1 of the metallized ceramic plating layer of this embodiment is formed by electroplating to form a metallized ceramic plating layer 33 formed by depositing a chromium carbide structure on the interposer 32 of the electrical connector 3, see FIG. 4A. For the surface topography of the metallized ceramic plating layer 33 of the chromium carbide-based composition of the present embodiment, the metallized ceramic plating layer 33 formed by the photo is an amorphous phase structure, uniformly and densely coated on the interposer 32; Please refer to FIG. 4B , which is a composition analysis diagram of the metallized ceramic plating layer 33 of the present embodiment. It can be seen that the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure, and the composition thereof is mainly chrome element 332 and carbon element 331 . The composition includes carbon trioxide (Cr 23 C 6 ), chromium trichrome (Cr 3 C 2 ) or heptachrome (Cr 7 C 3 ).

在本實施例採用的三價鉻電鍍液為氯酸根電鍍浴,其成份與操作條件如表一,於金屬化陶瓷電鍍層33電鍍時以電流密度10A/dm2操作溫度為25℃,操作時間為10分鐘,電鍍後以EPMA量測電鍍層中之碳含量為35At%,所得之碳化鉻基成份的金屬化陶瓷電鍍層33平整,其電鍍層厚鍍約1.5μm(請參見第4C圖,本實施例之金屬化陶瓷電鍍層截面照片)、磨擦係數(coefficient of friction,C.O.F)在磨耗距離55公尺內最大為0.5、平均為0.414(請參見第4D、4E圖,分別為本實施例之金屬化陶瓷電鍍層33磨耗試驗紀錄圖與磨耗試驗後的表面照片);再經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電連接件3之特性檢驗結果如表二,證明本發明之披覆金屬化陶瓷電鍍層33之電連接件3具有高度耐腐蝕、耐磨性與良好導電性,可組裝於電性連接器1使用。 The trivalent chromium plating solution used in this embodiment is a chlorate plating bath, and its composition and operating conditions are as shown in Table 1. When the metallized ceramic plating layer 33 is plated, the current density is 10 A/dm 2 and the operating temperature is 25 ° C, and the operation time is For 10 minutes, after electroplating, the carbon content in the plating layer was measured by EPMA to be 35 At%, and the obtained chromium carbide-based metallized ceramic plating layer 33 was flat, and the plating layer was plated to a thickness of about 1.5 μm (see FIG. 4C, The cross-section of the metallized ceramic plating layer of the present embodiment), the coefficient of friction (COF) is 0.5 at the wear distance of 55 meters, and the average is 0.414 (see FIGS. 4D and 4E, respectively. The metallized ceramic plating layer 33 wear test record map and the surface photograph after the abrasion test); and according to the relevant specifications, the characteristics of the electrical connection member 3 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are as follows. Table 2 shows that the electrical connector 3 of the coated metallized ceramic plating layer 33 of the present invention has high corrosion resistance, wear resistance and good electrical conductivity, and can be assembled for use in the electrical connector 1.

其中,磨擦係數的平均值係在磨耗試驗(wear test distance)0~60m,取樣頻率10點/m之平均值;鍍層的硬度判斷標準為鍍層的Knoop Hardness,硬度的量測方法根據ASTM B578(Standard Test Method for Microhardness of Electroplated Coatings),以加載壓力100gf(0.981N)試驗。以下各實施例相同,不再重覆贅述。 The average value of the friction coefficient is in the wear test distance of 0~60m, and the sampling frequency is 10 points/m. The hardness of the coating is judged as the Knoop Hardness of the coating, and the hardness is measured according to ASTM B578. Standard Test Method for Microhardness of Electroplated Coatings), tested at a loading pressure of 100 gf (0.981 N). The following embodiments are the same and will not be repeated.

<實施例2> <Example 2>

如第5圖,係本發明之披覆金屬化陶瓷電鍍層之電性連接器1之USB連接器(Universal Serial Bus,萬用串列匯流排)示意圖,本實施例之連接器本體2(未於圖上繪示)為USB Type-A連接器,USB連接器係廣泛運用在個人電腦及其週邊裝置介面上,已成為目前PC I/O介面之主流,USB 2.0的傳輸速度可達480Mbps,現今更提升至USB 3.0版。 FIG. 5 is a schematic diagram of a USB connector (Universal Serial Bus) of the electrical connector 1 of the metallized ceramic plating layer of the present invention, and the connector body 2 of the embodiment (not As shown in the figure, it is a USB Type-A connector. The USB connector is widely used in the interface of personal computers and peripheral devices. It has become the mainstream of the current PC I/O interface. The transmission speed of USB 2.0 can reach 480Mbps. Now it is upgraded to USB 3.0.

在第5圖只繪示USB Type-A連接器的遮蔽電連接件3,電連接件3的基材31為中碳鋼所製成,經以電鍍鎳形成中介層32,鎳鍍層的厚度為15~25μm;本實施例係經由電鍍形成碳化鉻結構附著在電連接件3的中介層32上形成的金屬化陶瓷電鍍層33,金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332與碳元素331所組成,相同於第1實施例,在此不再贅述。由於USB Type-A連接器的遮蔽電連接件3對 於表面硬度與耐蝕性較高,為使增加表面硬度,於金屬化陶瓷電鍍層33電鍍時採用較慢速度的電鍍,且電鍍完成的金屬化陶瓷電鍍層33更經過烘箱80℃烘烤4小時,以增加硬度;又為增加耐蝕性,金屬化陶瓷電鍍層33的厚度也提高至15~25μm。 In Fig. 5, only the shielded electrical connector 3 of the USB Type-A connector is shown. The base material 31 of the electrical connector 3 is made of medium carbon steel, and the intermediate layer 32 is formed by electroplating nickel. The thickness of the nickel plating layer is 15~25μm; in this embodiment, a metallized ceramic plating layer 33 formed by plating a chromium carbide structure on the interposer 32 of the electrical connector 3 is formed by electroplating, and the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure. The composition is mainly composed of the chrome element 332 and the carbon element 331, which is the same as that of the first embodiment, and will not be described herein. 3 pairs of shielded electrical connectors of the USB Type-A connector In order to increase the surface hardness, the metallized ceramic plating layer 33 is plated with slower speed plating, and the plated metallized ceramic plating layer 33 is baked in an oven at 80 ° C for 4 hours. In order to increase the hardness; and to increase the corrosion resistance, the thickness of the metallized ceramic plating layer 33 is also increased to 15 to 25 μm.

再經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電連接件3之特性檢驗結果如表三,證明本實施例之披覆金屬化陶瓷電鍍層之電連接件3具有高度耐腐蝕、耐磨性與良好導電性,可組裝於USB Type-A連接器的電性連接器1使用。 According to the relevant specifications, the characteristic test results of the electrical connecting member 3 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are as shown in Table 3, and the electrical connecting member 3 of the coated metallized ceramic plating layer of the present embodiment is proved. It has high corrosion resistance, wear resistance and good electrical conductivity and can be assembled into the electrical connector 1 of the USB Type-A connector.

<實施例3> <Example 3>

如第6圖,係本發明之披覆金屬化陶瓷電鍍層之電性連接器1之示意圖,係為應用於通訊及行動電話的SIM智慧卡連接器,SIM智慧卡之電性連接器1由連接器本體2與6個電連接件3(圖中僅標示三個,分別為3A、3B與3C)所構成,連接器本體2為ABS塑膠材料所製成、電連接件3的基材31為銅合金所製成;本實施例係經由電鍍形成碳化鉻結構附 著在電連接件3的基材31上形成的金屬化陶瓷電鍍層33,金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332與碳元素331所組成,相同於第1實施例,在此不再贅述。 Figure 6 is a schematic view of the electrical connector 1 of the coated metallized ceramic plating layer of the present invention, which is applied to a SIM smart card connector for communication and mobile phones, and the electrical connector 1 of the SIM smart card is The connector body 2 and the six electrical connectors 3 (only three are shown in the figure, respectively 3A, 3B and 3C), the connector body 2 is made of ABS plastic material, and the substrate 31 of the electrical connector 3 Made of a copper alloy; this embodiment forms a chromium carbide structure via electroplating A metallized ceramic plating layer 33 formed on the substrate 31 of the electrical connector 3, the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure, the composition of which is mainly composed of the chromium element 332 and the carbon element 331, In the first embodiment, details are not described herein again.

由於SIM智慧卡之電性連接器1需要經常插拔且要求較高的導電性,因此提高金屬化陶瓷電鍍層33之碳元素331以增加導電性,並於電鍍完成的金屬化陶瓷電鍍層33更經過烘箱80℃烘烤4小時,以增加硬度。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電連接件3之特性檢驗結果如表四,證明本實施例之披覆金屬化陶瓷電鍍層33之電連接件3具有良好導電性與耐磨性,可組裝於SIM智慧卡之電性連接器1使用。 Since the electrical connector 1 of the SIM smart card needs to be frequently inserted and removed and requires high conductivity, the carbon element 331 of the metallized ceramic plating layer 33 is increased to increase conductivity, and the metallized ceramic plating layer 33 is completed after plating. It was further baked in an oven at 80 ° C for 4 hours to increase the hardness. According to the relevant specifications, the characteristic test results of the electrical connecting member 3 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are as shown in Table 4, and the electrical connecting member 3 of the coated metallized ceramic plating layer 33 of the present embodiment is proved. It has good electrical conductivity and wear resistance and can be assembled into the electrical connector 1 of the SIM smart card.

<實施例4> <Example 4>

如第7圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之示意圖,係由電連接件插件301(俗稱香蕉插頭連接器Banana Plug Connector)與電連接件插座302(俗稱香蕉插座Banana socket connector),用於音響線、高頻傳輸線、音視用連接器、耳機、喇叭線、喇叭接線柱等。 7 is a schematic view of the electrical connector 1 of the metallized ceramic plating layer of the embodiment, which is an electrical connector plug-in 301 (commonly known as a banana plug connector Banana Plug) Connector) and electrical connector socket 302 (commonly known as banana socket connector), used for audio lines, high-frequency transmission lines, audio-visual connectors, earphones, speaker cables, speaker terminals and so on.

電連接件插件301與電連接件插座302為一對,使用時係將電連接件插件301插入電連接件插座302內,藉由電連接件插件301與電連接件插座302的接觸而產生電性連接;本實施例之電連接件插件301與電連接件插座302之基材31(未標示於圖中)均為ABS塑膠材料所製成。對電連接件插件301而言,可因電連接件插件301外部的彈性片於插入電連接件插座302內產生ABS塑膠材料的形變而增加接觸面積與產生接觸壓力,對電連接件插座302而言,由於電連接件插件301插入而使ABS塑膠材料產生些微的擴張,亦增加了增加接觸面積與產生接觸壓力。因基材31為不導電材料,則先於基材31以無電鍍披覆1~3μm的銅與再無電鍍披覆約10μm的鎳以形成導電層,金屬化陶瓷電鍍層33則以電鍍形成在電連接件插件301與電連接件插座302的導電層的表面,金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332(未標示於圖中)與碳元素331(未標示於圖中)所組成,相同於第1實施例,在此不再贅述。 The electrical connector insert 301 and the electrical connector receptacle 302 are paired. In use, the electrical connector insert 301 is inserted into the electrical connector receptacle 302 to generate electricity by contact of the electrical connector insert 301 with the electrical connector receptacle 302. The electrical connection member 301 of the embodiment and the substrate 31 (not shown) of the electrical connector socket 302 are made of ABS plastic material. For the electrical connector insert 301, the contact area and the contact pressure can be increased due to the deformation of the ABS plastic material inserted into the electrical connector socket 302 by the elastic piece outside the electrical connector insert 301, and the contact pressure is generated for the electrical connector socket 302. In other words, the ABS plastic material is slightly expanded due to the insertion of the electrical connector insert 301, which also increases the contact area and the contact pressure. Since the substrate 31 is a non-conductive material, the substrate 31 is coated with 1-3 μm of copper and electrolessly coated with about 10 μm of nickel to form a conductive layer, and the metallized ceramic plating layer 33 is formed by electroplating. On the surface of the conductive layer of the electrical connector insert 301 and the electrical connector receptacle 302, the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure, the composition of which is mainly chromium element 332 (not shown in the figure) and carbon element. The composition of 331 (not shown in the figure) is the same as that of the first embodiment, and details are not described herein again.

雖然在本實施例在電連接件插座302僅有外表及端面披覆金屬化陶瓷電鍍層33,但對於不同的應用,亦可於電連接件插座302的內部披覆金屬化陶瓷電鍍層33;或者僅有電連接件插件301或電連接件插座302兩者之一有披覆金屬化陶瓷電鍍層33;這些不同的實施方式不為所限。 Although in the present embodiment, the electrical connector socket 302 only has the outer surface and the end surface of the metallized ceramic plating layer 33, but for different applications, the metal connector ceramic layer 33 may be coated inside the electrical connector socket 302; Alternatively, only one of the electrical connector insert 301 or the electrical connector receptacle 302 may be coated with a metallized ceramic plating layer 33; these various embodiments are not limited.

由於電連接件插件301與電連接件插座302需要經常插拔且要求較高的耐磨性與附著力,因此金屬化陶瓷電鍍層33採用較低的碳元素331含量。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電連接件3之特性檢驗結果如表五,證明本實施例之披覆金屬化陶瓷電鍍層33之電連接件3具有良好耐磨性與附著力,可使用於不導電基材的電連接件插件301與電連接件插座302。 Since the electrical connector insert 301 and the electrical connector receptacle 302 need to be frequently inserted and removed and require high wear resistance and adhesion, the metallized ceramic plating layer 33 has a lower carbon element 331 content. According to the relevant specifications, the characteristic test results of the electrical connecting member 3 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are as shown in Table 5. The electrical connecting member 3 of the coated metallized ceramic plating layer 33 of the present embodiment is proved. With good wear resistance and adhesion, the electrical connector insert 301 and the electrical connector receptacle 302 can be used for non-conductive substrates.

<實施例5> <Example 5>

如第8圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之示意圖,係為HDMI電纜連接器(HDMI cable connector),HDMI是因應資訊家電及數位化內容的趨勢,由Hitachi、Panasonic、Philips、Silicon Image、Sony、Thomson以及Toshiba等歐美日資訊家電及IC設計、數位內容領域的領導廠商於2002年成立的整合式數位影音多媒體介面規格。HDMI將視訊、聲音及控制訊號藉由封包的技術,在同一個匯流排上進行訊號的傳輸,介面可以做得輕薄短小,傳輸頻寬也可到5Gbps,DVD/STB/DTV/HDTV/LCD TV/Plasma TV等為其主要應用產品。 As shown in FIG. 8, a schematic diagram of the electrical connector 1 of the metallized ceramic plating layer of the present embodiment is an HDMI cable connector, and HDMI is a trend in response to information appliances and digital content. The integrated digital audio and video multimedia interface was established in 2002 by Hitachi, Panasonic, Philips, Silicon Image, Sony, Thomson and Toshiba, and other leading companies in the field of home appliances and IC design and digital content. HDMI transmits video, voice and control signals through the same technology on the same bus. The interface can be made light and short, and the transmission bandwidth can be up to 5Gbps. DVD/STB/DTV/HDTV/LCD TV /Plasma TV is its main application.

在本實施例僅繪示HDMI的公座(電連接件插件301,未標示於圖中),而HDMI的母座(電連接件插座302,未標示於圖中)也可應用本發明的披覆金屬化陶瓷電鍍層之電性連接器,在此不再詳細說明,使用時係將HDMI的公座(電連接件插件301)插入HDMI的母座(電連接件插座302)內,藉由電連接件插件301與電連接件插座302的接觸而產生電性連接;本實施例之電連接件插件301係包含遮蔽線連接的電連接件3與匯流排的電連接件3A、3B、…、3N,電連接件3之基材31(未標示於圖中)為銅合金,電連接件3A、3B、…、3N之基材31(未標示於圖中)也為銅合金;在習用的產品之一,遮蔽線連接的電連接件3與匯流排的電連接件3A、 3B、…、3N係在銅合金基材上先電鍍一層鎳磷合金為中介層32(未標示於圖中)、再於中介層32上電鍍一層硬度(Knoop)為250的硬金(金鈀合金);在本實施例則在遮蔽線連接的電連接件3與匯流排的電連接件3A、3B、…、3N係在銅合金基材31的鎳磷合金之中介層32表面以電鍍形成金屬化陶瓷電鍍層33(未標示於圖中),金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332(未標示於圖中)與碳元素331(未標示於圖中),在此不再贅述。 In this embodiment, only the HDMI male seat (electrical connector plug-in 301, not shown in the figure) is shown, and the HDMI female socket (electrical connector socket 302, not shown in the figure) can also be applied to the present invention. The electrical connector of the metallized ceramic plating layer is not described in detail here. In use, the HDMI male seat (electric connector plug 301) is inserted into the HDMI female socket (electrical connector socket 302). The electrical connector insert 301 is electrically connected to the electrical connector receptacle 302. The electrical connector insert 301 of the present embodiment includes the electrical connector 3 and the busbar electrical connector 3A, 3B, ... 3N, the substrate 31 of the electrical connector 3 (not shown) is a copper alloy, and the substrate 31 of the electrical connectors 3A, 3B, ..., 3N (not shown) is also a copper alloy; One of the products, the electrical connection 3 of the shielded wire and the electrical connection 3A of the busbar, 3B, ..., 3N is first plated with a nickel-phosphorus alloy as a carrier layer 32 (not shown in the figure) on the copper alloy substrate, and then a hard gold (gold palladium) having a hardness (Knoop) of 250 is applied to the interposer 32. In the present embodiment, the electrical connectors 3 and the busbar electrical connectors 3A, 3B, ..., 3N are connected to the surface of the interposer 32 of the nickel-phosphorus alloy of the copper alloy substrate 31 by electroplating. Metallized ceramic plating layer 33 (not shown in the figure), metallized ceramic plating layer 33 is an amorphous phase of chromium carbide structure, the composition of which is mainly chromium element 332 (not shown in the figure) and carbon element 331 (not labeled In the figure), it will not be described here.

由於HDMI的公座(電連接件插件301)與HDMI的母座(電連接件插座302)需要經常插拔且要求較高的耐磨性與附著力,又因傳輸頻寬的考量則要求較高的導電度及更低的接觸電阻,因此金屬化陶瓷電鍍層33採用較高的碳元素331含量。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電性連接器1之特性檢驗結果如表六,證明本實施例之披覆金屬化陶瓷電鍍層33之電性連接器1具有良好耐腐蝕、耐磨性、附著力、導電性,可使用於HDMI連接器,在鍍層上可以取代習用產品的鍍金層、鍍鈀鎳合金層或其他金屬層等。 Since the HDMI public seat (electrical connector plug-in 301) and the HDMI female socket (electrical connector socket 302) need to be frequently plugged and unplugged and require high wear resistance and adhesion, the transmission bandwidth requirement is required. The high conductivity and lower contact resistance result in a higher carbon element 331 content for the metallized ceramic plating layer 33. According to the relevant specifications, the characteristic test results of the electrical connector 1 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are shown in Table 6. The electrical connection of the coated metallized ceramic plating layer 33 of the present embodiment is demonstrated. The device 1 has good corrosion resistance, wear resistance, adhesion, and electrical conductivity, and can be used for an HDMI connector, and can replace a gold plating layer, a palladium-plated nickel alloy layer or other metal layer of a conventional product on a plating layer.

<實施例6> <Example 6>

如第9圖,係本發明之披覆金屬化陶瓷電鍍層之電性連接器1之示意圖,係為SMK高頻率同軸連接器(SMK coax connector)屬於小型且具有RF/微波傳輸的連接器,可使用到40GHz,其特性阻抗低於50Ω。同軸連接器的電性連接方式為採用公座之針(pin-male)與母座之接觸彈簧(contact spring-female)接合,因此耐磨、耐腐蝕的針與接觸彈簧為最基本的要求。 9 is a schematic view of the electrical connector 1 of the coated metallized ceramic plating layer of the present invention, which is a SMK high frequency coaxial connector (SMK coax connector) which is a small connector with RF/microwave transmission. It can be used up to 40 GHz with a characteristic impedance of less than 50 Ω. The coaxial connector is electrically connected by a pin-male to a contact spring-female. Therefore, the wear-resistant and corrosion-resistant needle and contact spring are the most basic requirements.

在本實施例僅繪示SMK高頻率同軸連接器的公座(電性連接器1),而SMK高頻率同軸連接器的母座(未標示於圖中)也可應用本發明的披覆金屬化陶瓷電鍍層之電性連接器,在此不再詳細說明。電連接件包含遮蔽線連接的電連接件3A與針的電連接件3B,電連接件3A與3B之基材31(未標示於圖中)均為銅合金,在本實施例則在遮蔽線連接的電連接件3A與針的電連接件3B係在銅合金基材31上先電鍍上鎳磷合金之中介層32,於中介層32的表面再以電鍍形成金屬化陶瓷電鍍層33(未標示於圖中),金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332(未標示於圖中)與碳元素331(未標示於圖中),在此不再贅述。 In this embodiment, only the male seat (electrical connector 1) of the SMK high frequency coaxial connector is shown, and the female seat of the SMK high frequency coaxial connector (not shown) can also be applied to the coated metal of the present invention. The electrical connector of the ceramic plating layer will not be described in detail herein. The electrical connector comprises an electrical connector 3A connected by a shield wire and an electrical connector 3B of the needle, and the substrate 31 (not shown) of the electrical connectors 3A and 3B are both copper alloys, in the present embodiment, the shielding wire The electrical connection member 3A of the connection and the electrical connection member 3B of the needle are first plated on the copper alloy substrate 31 with the interposer 32 of the nickel-phosphorus alloy, and the surface of the interposer 32 is further plated to form the metallized ceramic plating layer 33 (not As shown in the figure), the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure, and its composition is mainly chromium element 332 (not shown in the figure) and carbon element 331 (not shown in the figure), not here. Let me repeat.

由於SMK高頻率同軸連接器的公座與SMK高頻率同軸連接器的母座需要經常插拔且要求較高的耐磨性與附著力,因此金屬化陶瓷電鍍層33採用較高硬度的組成。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電性連接器1之特性檢驗結果如表七,證明本實施例之披覆金屬化陶瓷電鍍層33之電性連接器1具有良好耐腐蝕、耐磨性,可使用於SMK高頻率同軸連接器。 Since the busbar of the SMK high frequency coaxial connector and the socket of the SMK high frequency coaxial connector need to be frequently inserted and removed and require high wear resistance and adhesion, the metallized ceramic plating layer 33 has a higher hardness composition. According to the relevant specifications, the characteristic test results of the electrical connector 1 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are shown in Table 7. The electrical connection of the coated metallized ceramic plating layer 33 of the present embodiment is demonstrated. The device 1 has good corrosion resistance and wear resistance and can be used for SMK high frequency coaxial connectors.

<實施例7> <Example 7>

如第10圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之示意圖,係為電路板的邊接頭(PCB edge connector),俗稱金手指(Golden finger),金手指上包含了許多裸露的銅墊,這些銅墊事實上也是PCB佈線的一部份,常用於電腦的顯示卡、音效卡或是其他類似的界面卡,都是藉著金手指來與主機板連接的,利用金手指與槽板連接器(Slot connector)的彈片進行連接,經由彈片受壓迫接觸金手指而產生電性連接。習用的金手指常使用鍍金,係因鍍金層不易生鏽且導電性佳;金手指上的鍍金層的硬度通常在140 Knoop以上、厚度平均為在3~8μm的硬金。由於近年黃金價格持續高漲,PCB的鍍金成本愈來愈貴,目前尚無可替代的材料出現。 10 is a schematic diagram of an electrical connector 1 of a metallized ceramic plating layer of the present embodiment, which is a PCB edge connector, commonly known as a golden finger, on a gold finger. It contains a lot of bare copper pads. These copper pads are actually part of the PCB layout. They are often used in computer graphics cards, sound cards or other similar interface cards. They are connected to the motherboard by gold fingers. The gold finger is connected to the elastic piece of the slot connector, and the elastic piece is pressed by the elastic piece to make an electrical connection. The gold finger used in practice is often plated with gold, because the gold plating layer is not easy to rust and has good electrical conductivity; the gold plating layer on the gold finger usually has a hardness of 140 Knoop or more and an average thickness of 3 to 8 μm. Due to the continuous rise in gold prices in recent years, the cost of gold plating on PCBs has become more and more expensive, and there is no alternative material available.

在本實施例僅繪示PCB板4的一部份,PCB板4中的金手指41係有許多的電連接件3A、3B、…、3N所構成,其中圖示只未繪示電連接件3A、3B為代表;電連接件3A與3B之基材31(未標示於圖中)均為電路板蝕刻後經由無電鍍製成所形成銅,在本實施例則在銅的基材31表面以電鍍形成金屬化陶瓷電鍍層33(未標示於圖中),金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332(未標示於圖中)與碳元素331(未標示於圖中),在此不再贅述。 In this embodiment, only a part of the PCB board 4 is shown. The gold finger 41 in the PCB board 4 is composed of a plurality of electrical connectors 3A, 3B, ..., 3N, wherein only the electrical connectors are not shown. 3A, 3B are representative; the substrate 31 of the electrical connectors 3A and 3B (not shown in the figure) are formed by electroless plating after the circuit board is etched, and in the present embodiment, on the surface of the copper substrate 31. The metallized ceramic plating layer 33 (not shown in the figure) is formed by electroplating, and the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure, and the composition thereof is mainly chromium element 332 (not shown in the figure) and carbon element 331 (Not shown in the figure), will not repeat them here.

由於PCB板4中的金手指41需要經常插拔且要求較高的耐磨性與附著力,因此金屬化陶瓷電鍍層33也採用較高硬度的組成。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電性連接器1之 特性檢驗結果如表八,證明本實施例之披覆金屬化陶瓷電鍍層33之電性連接器1具有良好耐腐蝕、耐磨性,可使用於PCB板4中的金手指41。 Since the gold fingers 41 in the PCB board 4 need to be frequently inserted and removed and require high wear resistance and adhesion, the metallized ceramic plating layer 33 also adopts a composition of higher hardness. An electrical connector 1 of a metallized ceramic plating layer 33 coated with a chromium carbide-based component according to relevant specifications The results of the characteristic inspection are shown in Table 8. It is proved that the electrical connector 1 of the coated metallized ceramic plating layer 33 of the present embodiment has good corrosion resistance and wear resistance and can be used for the gold fingers 41 in the PCB board 4.

<實施例8> <Example 8>

如第11A圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之電連接件插件301示意圖及第11B圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之電連接件插座302示意圖,本實施例為壓著式電纜連接器(crimp connector),於圖中繪示應用於壓著式電纜連接器之公座(電連接件插件301)的電連接件的料帶與電纜連接器之母座(電連接件插座302)的電連接件的料帶,電連接件於機械加工時,以沖床與模具沖製成一串連接在一起的電連接件形成很長的料帶,經過電鍍形成電鍍層後,再以沖壓或其他機械加工方式將料帶切斷並將每一個電連接件與連接器本體(未於圖上繪示)組裝後,形成壓著式電纜連接器,這類連接器經常用於電池電纜的電性連接。 FIG. 11A is a schematic view of the electrical connector insert 301 of the electrical connector 1 of the metallized ceramic plating layer of the present embodiment and FIG. 11B, which is the electrical property of the coated metallized ceramic plating layer of the embodiment. Schematic diagram of the electrical connector socket 302 of the connector 1. This embodiment is a crimp cable connector, and the figure shows a male seat (electric connector plug 301) applied to the crimping cable connector. The electrical tape of the electrical connector and the electrical connector of the female connector (electrical connector socket 302) of the cable connector. When the electrical connector is mechanically processed, the punch and the die are punched into a series of wires. The connecting member forms a long strip, after electroplating to form a plating layer, and then cutting the strip by stamping or other mechanical processing and assembling each of the electrical connectors with the connector body (not shown) A crimped cable connector is formed, which is often used for electrical connection of battery cables.

在習用的產品之一,電連接件的料帶材質為銅合金,在銅合 金基材上先電鍍一層錫再電鍍一層鎳為中介層32(未標示於圖中),即中介層32為二層,為了防腐蝕與導電目的,再於中介層32上電鍍一層厚度約為20~30μm金;在本實施例則在銅合金基材31上也相同習用的產品,先電鍍一層錫再電鍍一層鎳為中介層32,表面再以電鍍形成金屬化陶瓷電鍍層33(未標示於圖中),其中,金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332(未標示於圖中)與碳元素331(未標示於圖中),在此不再贅述。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電性連接器1之特性檢驗結果如表九,證明本實施例之披覆金屬化陶瓷電鍍層33之電性連接器1具有良好耐腐蝕、耐磨性、附著力、導電性,可使用於壓著式電纜連接器,在鍍層上可以取代習用產品的鍍金層、鍍鈀鎳合金層或其他金屬層等。 In one of the conventional products, the material of the electrical connector is made of copper alloy in copper. The gold substrate is first plated with a layer of tin and then plated with a layer of nickel as an interposer 32 (not shown), that is, the interposer 32 is a second layer. For corrosion prevention and conduction purposes, a thickness of about 20 is applied to the interposer 32. 30μm gold; in this embodiment, the same product is also used on the copper alloy substrate 31, first plating a layer of tin and then plating a layer of nickel as the interposer 32, and then forming a metallized ceramic plating layer 33 by electroplating (not shown in the figure). Medium), wherein the metallized ceramic plating layer 33 is an amorphous phase chromium carbide structure, the composition of which is mainly chromium element 332 (not shown in the figure) and carbon element 331 (not shown in the figure), no longer Narration. According to the relevant specifications, the characteristic test results of the electrical connector 1 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are as shown in Table IX, demonstrating the electrical connection of the coated metallized ceramic plating layer 33 of the present embodiment. The device 1 has good corrosion resistance, wear resistance, adhesion, and electrical conductivity, and can be used for a crimped cable connector, and can replace a gold plating layer, a palladium nickel alloy layer or other metal layer of a conventional product on a plating layer.

<實施例9> <Example 9>

如第12A圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之電連接件插件301示意圖,第12B圖,係本實施例之披覆金屬化陶瓷電鍍層之電性連接器1之電連接件插座302示意圖;於圖中繪示應 用於電腦IC或接線的連接器之公座(Pin Connector)與連接器之母座(SIP Socket Connector)。公座之連接器1係由連接器本體21及電連接件插件301所構成,每個電連接件插件301對應一電連接件3A、3B、…、3N;母座之連接器1係由連接器本體21及電連接件插座302所構成,每個電連接件插座302對應一電連接件3A、3B、…、3N;若為纜線對纜線連接(cable to cable connection)則由公座之連接器1之電連接件3A、3B、…、3N對應插入母座之連接器1之電連接件3A、3B、…、3N;若為板對纜線接(board to cable connection)則以母座之連接器1之電連接件3A、3B、…、3N接受IC接腳或PCB的金手指插入後連接;在本實施例為容意說明,僅繪示1x10的電連接件陣列(1.27mm single row),類似的結構如Double Row或Triple Row、SOJ socket、PLCC socket、SMT socket等均為本實施例的態樣,不再重複說明。 12A is a schematic view of the electrical connector insert 301 of the electrical connector 1 of the metallized ceramic plating layer of the embodiment, and FIG. 12B is the electrical property of the coated metallized ceramic plating layer of the embodiment. Schematic diagram of the electrical connector socket 302 of the connector 1; Pin connector for connectors for computer ICs or wiring and SIP Socket Connector. The male connector 1 is composed of a connector body 21 and an electrical connector insert 301, each electrical connector insert 301 corresponding to an electrical connector 3A, 3B, ..., 3N; the connector 1 of the female connector is connected The main body 21 and the electrical connector socket 302 are formed. Each electrical connector socket 302 corresponds to an electrical connector 3A, 3B, ..., 3N; if it is a cable to cable connection, it is a public seat. The electrical connectors 3A, 3B, ..., 3N of the connector 1 correspond to the electrical connectors 3A, 3B, ..., 3N of the connector 1 of the female socket; if it is a board to cable connection, The electrical connectors 3A, 3B, ..., 3N of the connector 1 of the female connector are connected by the gold finger of the IC pin or the PCB; in the present embodiment, only the 1x10 electrical connector array (1.27) is shown. Mm single row), similar structures such as Double Row or Triple Row, SOJ socket, PLCC socket, SMT socket, etc. are all aspects of this embodiment, and will not be repeatedly described.

在習用的產品之一,連接器本體21為nylon 46/66/6T/LCP塑膠材料所製成、電連接件3A、3B、…、3N的基材31(未標示於圖上)為銅合金所製成,在銅合金基材上先電鍍一層10μm的鎳,再於鎳鍍層上電鍍一層錫為中介層32(未標示於圖中),即中介層32為二層,為了防腐蝕與導電目的,再於中介層32上電鍍一層厚度約為5μm金;在本實施例則在銅合金基材31上也相同習用的產品,先電鍍一層10μm的鎳,再於鎳鍍層上電鍍一層錫為中介層32,表面再以電鍍形成金屬化陶瓷電鍍層33(未標示於圖中)以取代習用產品的鍍金層、鍍鈀鎳合金層或其他金屬層等,其中,金屬化陶瓷電鍍層33為非晶相的碳化鉻結構,其成份主要為鉻元素332(未標示於圖中)與碳元素331(未標示於圖中),在此不再贅述。為利於電連接件插件301與電連接件插座302與纜線焊接,電連接件插件301與電連接件插座30的焊接腳則採用遮蔽不電鍍金屬化陶瓷電鍍層33,使錫電鍍層可裸露,以便於焊接。經依據相關規範,披覆有碳化鉻基成份的金屬化陶瓷電鍍層33之電性連接器1之特性檢驗結果如表十,證明本實施例之披覆金屬化陶瓷電鍍層33之電性連接器1具有良好耐腐蝕、耐磨性、附著力、導電性,可使用於IC或接線的連接器,取代習用產品的鍍金層、鍍鈀鎳合金層或其他金屬層等。 In one of the conventional products, the connector body 21 is made of nylon 46/66/6T/LCP plastic material, and the substrate 31 of the electrical connectors 3A, 3B, ..., 3N (not shown) is a copper alloy. It is prepared by first plating a layer of 10 μm nickel on a copper alloy substrate, and then plating a layer of tin on the nickel plating layer as an interposer 32 (not shown in the figure), that is, the interposer 32 is a two layer for corrosion prevention and conduction. The purpose is to electroplate a layer of gold having a thickness of about 5 μm on the interposer 32. In the present embodiment, the same product is used on the copper alloy substrate 31, first plating a layer of 10 μm of nickel, and then plating a layer of tin on the nickel plating layer. The surface of the interposer 32 is further electroplated to form a metallized ceramic plating layer 33 (not shown) to replace the gold plating layer, the palladium-plated nickel alloy layer or other metal layer of the conventional product, wherein the metallized ceramic plating layer 33 is The chromium carbide structure of the amorphous phase is mainly composed of chromium element 332 (not shown in the figure) and carbon element 331 (not shown in the figure), and will not be described herein. In order to facilitate the soldering of the electrical connector insert 301 and the electrical connector socket 302, the solder joints of the electrical connector insert 301 and the electrical connector receptacle 30 are shielded by a non-plated metallized ceramic plating layer 33 to make the tin plating layer bare. To facilitate welding. According to the relevant specifications, the characteristic test results of the electrical connector 1 of the metallized ceramic plating layer 33 coated with the chromium carbide-based component are as shown in Table 10, and the electrical connection of the coated metallized ceramic plating layer 33 of the present embodiment is demonstrated. The device 1 has good corrosion resistance, wear resistance, adhesion, and electrical conductivity, and can be used for a connector for an IC or a wiring, replacing a gold plating layer, a palladium-plated nickel alloy layer, or other metal layer of a conventional product.

雖然在本實施例在電連接件插座302之電連接件3A、 3B、…、3N承接電連接件插件301之電連接件插入的端面及內孔的一部份披覆金屬化陶瓷電鍍層33,而於電連接件3A、3B、…、3N的另一端為焊接或其他目的而未披覆金屬化陶瓷電鍍層33,又在電連接件插件301之電連接件3A、3B、…、3N可插入電連接件插座302之部份披覆金屬化陶瓷電鍍層33,而於電連接件3A、3B、…、3N的另一端為焊接或其他目的而未披覆金屬化陶瓷電鍍層33;但對於不同的應用,亦可於電連接件插座302與電連接件插件301之電連接件全部披覆金屬化陶瓷電鍍層33;這些不同的實施方式不為所限。 Although in the present embodiment, the electrical connector 3A of the electrical connector socket 302, The end faces of the electrical connectors of the electrical connector inserts 301 and the portions of the inner holes of the 3B, ..., 3N are covered with a metallized ceramic plating layer 33, and the other ends of the electrical connectors 3A, 3B, ..., 3N are The metallized ceramic plating layer 33 is soldered or otherwise not covered, and the electrical connection members 3A, 3B, ..., 3N of the electrical connector insert 301 are inserted into the electrical connector socket 302 to cover the metallized ceramic plating layer. 33, and the other end of the electrical connectors 3A, 3B, ..., 3N is not covered with a metallized ceramic plating layer 33 for soldering or other purposes; but for different applications, the electrical connector socket 302 can also be electrically connected. The electrical connectors of the component insert 301 are all covered with a metallized ceramic plating 33; these various embodiments are not limited.

在習知產品上,錫電鍍層經過一段時間之後,在常溫下錫電鍍層就會長出樹枝狀的突出物,稱之為錫鬚(晶鬚、Whisker),如果錫鬚的長度太長,會造成導體或零組件之間的短路,此問題在高密度封裝的電子產品裡面(手機、PDA、MP3、汽車電子..等),將造成嚴重的問題。在前述的習知產品上,採用銅合金基材上先電鍍一層10μm的鎳,再於鎳鍍層上電鍍一層錫為中介層32,鎳鍍層與銅合金基材間以鎳鍍層為間隔,又由於鍍金層係電鍍在錫電鍍層上,鍍金層可具有良好的覆蓋效果,避免錫電鍍層經過一段時間後產生錫鬚的問題,一般的檢驗方法為在常溫下靜置1000小時後,若錫鬚長度達到或超過25μm時為不合格。在本實施例中,亦於鎳鍍層與銅合金基材間以鎳鍍層為間隔,並在錫電鍍層上電鍍形成相當緻密的金屬化陶瓷電鍍層33,金屬化陶瓷電鍍層33也具有良好的覆蓋效果,經在恆溫21℃與恆濕65%的環境下試驗,經過1200小時後以顯微鏡觀察,在金屬化陶瓷電鍍層33覆蓋的區域內,沒有發現有錫鬚,符合使用需求。 In the conventional products, after a period of time, the tin plating layer will grow a dendritic protrusion at a normal temperature, which is called tin whisker (whisker, Whisker). If the tin whisker is too long, it will This creates a short circuit between conductors or components. This problem can be a serious problem in high-density packaged electronics (mobile phones, PDAs, MP3s, automotive electronics, etc.). In the above-mentioned conventional products, a copper alloy substrate is first plated with a layer of 10 μm nickel, and then a nickel plating layer is plated with a layer of tin as an interposer 32. The nickel plating layer and the copper alloy substrate are separated by a nickel plating layer, and The gold plating layer is electroplated on the tin plating layer, and the gold plating layer can have a good covering effect to avoid the problem that the tin plating layer generates tin whisker after a period of time. The general inspection method is that after standing for 1000 hours at normal temperature, if tin whisker Failed when the length reached or exceeded 25 μm . In this embodiment, a nickel plating layer is also spaced between the nickel plating layer and the copper alloy substrate, and a relatively dense metallized ceramic plating layer 33 is formed on the tin plating layer, and the metallized ceramic plating layer 33 also has a good The covering effect was tested under a constant temperature of 21 ° C and a constant humidity of 65%. After 1200 hours, it was observed under a microscope, and no tin whiskers were found in the area covered by the metallized ceramic plating layer 33, which was in accordance with the use requirements.

以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。 The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the spirit and scope of the invention are intended to be included in the scope of the appended claims.

3‧‧‧電連接件 3‧‧‧Electrical connectors

31‧‧‧基材 31‧‧‧Substrate

32‧‧‧中介層 32‧‧‧Intermediary

33‧‧‧金屬化陶瓷電鍍層 33‧‧‧Metalized ceramic plating

331‧‧‧碳元素 331‧‧‧carbon elements

332‧‧‧鉻元素 332‧‧‧Chromium

Claims (7)

一種披覆金屬化陶瓷電鍍層之電性連接器,包含一連接器本體、N個電連接件,其中,N為大於等於1;其中,該電連接件包含一基材及一金屬化陶瓷電鍍層;該基材之材料選自於下列群組之一或其組合:(1)導電材質:導電陶瓷、鐵、不鏽鋼、銅、鉻、錫、鎳、銀、金或其合金之一或其組合;(2)不導電材質:塑膠、陶瓷、玻璃之一或其組合,並以電鍍或無電鍍披覆一導電層,該導電層為選自於鐵、銅、鉻、錫、鎳、銀、金或其合金;其中,該金屬化陶瓷電鍍層係為以碳化鉻基成份之金屬化陶瓷,係經由電鍍形成一非晶相的碳化鉻結構附著在該基材表面之全部或一部分,其成份係包含鉻元素與碳元素所組成,該非晶相結構至少包括六碳化二十三鉻(Cr23C6)、二碳化三鉻(Cr3C2)或三碳化七鉻(Cr7C3)之一或其組合;該金屬化陶瓷電鍍層之碳元素含量為大於25At%;當該金屬化陶瓷電鍍層之平均厚度範圍在0.5μm至35μm時,其接觸電阻值(contact resistance)在重量10 g時之值為60 mΩ以下;其中At%為原子數比例(atomic percent)。 An electrical connector covering a metallized ceramic plating layer, comprising a connector body and N electrical connectors, wherein N is greater than or equal to 1; wherein the electrical connector comprises a substrate and a metallized ceramic plating a material; the material of the substrate is selected from one or a combination of the following groups: (1) conductive material: conductive ceramic, iron, stainless steel, copper, chromium, tin, nickel, silver, gold or one of its alloys or (2) non-conductive material: one of plastic, ceramic, glass or a combination thereof, and coated with a conductive layer by electroplating or electroless plating, the conductive layer is selected from the group consisting of iron, copper, chromium, tin, nickel, silver And a metal or a metal thereof; wherein the metallized ceramic plating layer is a metallized ceramic having a chromium carbide-based composition, and a chromium carbide structure formed by electroplating to form an amorphous phase adheres to all or a part of the surface of the substrate, The composition comprises a chromium element and a carbon element, and the amorphous phase structure comprises at least a chromium trichloride (Cr 23 C 6 ), a chromium trichrome (Cr 3 C 2 ) or a three carbonized seven chromium (Cr 7 C 3 ). Or one or a combination thereof; the metallized ceramic plating layer has a carbon content greater than 25At%; when the average thickness of the metallized ceramic plating layer ranges from 0.5 μm to 35 μm, the contact resistance value is less than 60 mΩ at a weight of 10 g; wherein At% is an atomic ratio (atomic) Percent). 如申請專利範圍第1項所述之披覆金屬化陶瓷電鍍層之電性連接器,該電連接件在該基材與該金屬化陶瓷電鍍層之間進一步包含一中介層;其中,該中介層係披覆在該基材表面,該中介層之材質係選自於下列群組之一或其組合:(1)鐵、銅、鎳、鎳磷、錫、銀、金、鈀、鈷、貴金屬或其合金;(2)不導電材質披覆鐵、銅、鎳、鎳磷、錫、銀、金、鈀、鈷、貴金屬或其合金;該金屬化陶瓷電鍍層係披覆於該中介層表面之全部或一部份。 An electrical connector for coating a metallized ceramic plating layer according to claim 1, wherein the electrical connector further comprises an interposer between the substrate and the metallized ceramic plating layer; wherein the intermediary The layer is coated on the surface of the substrate, and the material of the interposer is selected from one of the following groups or a combination thereof: (1) iron, copper, nickel, nickel phosphorus, tin, silver, gold, palladium, cobalt, a noble metal or an alloy thereof; (2) a non-conductive material coated with iron, copper, nickel, nickel phosphorus, tin, silver, gold, palladium, cobalt, a noble metal or an alloy thereof; the metallized ceramic plating layer is coated on the interposer All or part of the surface. 如申請專利範圍第1項或第2項所述之披覆金屬化陶瓷電鍍層之電性連接器,其中,當該金屬化陶瓷電鍍層的平均厚度為0.5~3μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐環境腐蝕為曝露於鹽霧中連續300小時以上無腐蝕現象;當該金屬化陶瓷電鍍層的平均厚度為3~8μm,該電連接件披覆有金屬化陶瓷電鍍層部份之耐環境腐蝕為曝露於鹽霧中連續500小時以上無腐蝕現象;當該金屬化陶瓷電鍍層的平均厚度大於8μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐環境腐蝕為曝露於鹽霧中連續1000小時以上無腐蝕現象;其中,曝露於鹽霧中係依據ASTM B117試驗規範試驗。 The electrical connector of the metallized ceramic plating layer according to the first or the second aspect of the invention, wherein the metallized ceramic plating layer has an average thickness of 0.5 to 3 μm, and the electrical connector is covered. The environmental corrosion resistance of the portion of the metallized ceramic plating layer is non-corrosive for exposure to salt spray for more than 300 hours; when the average thickness of the metallized ceramic plating layer is 3-8 μm, the electrical connector is covered with metallization The environmental corrosion resistance of the ceramic plating layer is non-corrosive for exposure to salt spray for more than 500 hours; when the average thickness of the metallized ceramic plating layer is greater than 8 μm, the electrical connector is covered with the metallized ceramic plating portion. The environmental corrosion resistance is non-corrosive for exposure to salt spray for more than 1000 hours; wherein exposure to salt spray is tested according to ASTM B117 test specification. 如申請專利範圍第1項或第2項所述之披覆金屬化陶瓷電鍍層之電性連接器,其中,當該金屬化陶瓷電鍍層的平均厚度為0.5~3μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐硫腐蝕為曝露於二氧化硫霧中連續72小時以上無腐蝕現象;當該金屬化陶瓷電鍍層的平均厚度為至少3~8μm,該電連接件披覆有金屬化陶瓷電鍍層部份之耐硫腐蝕為曝露於二氧化硫霧中連續128小時以上無腐蝕現象;當該金屬化陶瓷電鍍層的平均厚度為大於8μm,該電連接件披覆有該金屬化陶瓷電鍍層部份之耐硫腐蝕為曝露於二氧化硫霧中連續300小時以上無腐蝕現象;其中,曝露於二氧化硫霧中係依據ASTM B799試驗規範試驗。 The electrical connector of the metallized ceramic plating layer according to the first or the second aspect of the invention, wherein the metallized ceramic plating layer has an average thickness of 0.5 to 3 μm, and the electrical connector is covered. The sulfur-resistant corrosion of the portion of the metallized ceramic plating layer is non-corrosive for exposure to sulfur dioxide mist for more than 72 hours; when the average thickness of the metallized ceramic plating layer is at least 3-8 μm, the electrical connector is covered with metal The sulfur-resistant corrosion of the portion of the ceramic plating layer is non-corrosive for exposure to sulfur dioxide mist for more than 128 hours; when the average thickness of the metallized ceramic plating layer is greater than 8 μm, the electrical connector is coated with the metallized ceramic plating layer Some of the sulfur-resistant corrosion is non-corrosive for more than 300 hours in exposure to sulfur dioxide mist; among them, exposure to sulfur dioxide mist is tested according to ASTM B799 test specification. 如申請專利範圍第1項或第2項所述之披覆金屬化陶瓷電鍍層之電性連接器,其中該金屬化陶瓷電鍍層平均磨擦係數(coefficient of friction)小於0.9;其中,磨擦係數係依據ASTM D 3702-94以300牛頓荷重試驗。 An electrical connector for coating a metallized ceramic plating layer according to claim 1 or 2, wherein the metallized ceramic plating layer has an average coefficient of friction of less than 0.9; wherein the coefficient of friction is Tested at 300 Newtons weight according to ASTM D 3702-94. 如申請專利範圍第1項或第2項所述之披覆金屬化陶瓷電鍍層之電性連接器,其中該金屬化陶瓷電鍍層之表面硬度為800(Hv)以上,其 中,表面硬度係依ASTM 578以加載壓力100gf試驗。 The electrical connector of the metallized ceramic plating layer according to claim 1 or 2, wherein the metallized ceramic plating layer has a surface hardness of 800 (Hv) or more, The surface hardness was tested according to ASTM 578 at a loading pressure of 100 gf. 如申請專利範圍第2項所述之披覆金屬化陶瓷電鍍層之電性連接器,其中該中介層為二層或二層以上。 An electrical connector for coating a metallized ceramic plating layer according to claim 2, wherein the interposer is two or more layers.
TW102144805A 2013-12-06 2013-12-06 Electroplated metallic ceramic layer for electrical connector terminal TWI533526B (en)

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CN106757250A (en) * 2016-10-18 2017-05-31 苏州超立光机电科技有限公司 Weaving yarn guide assembly coated with composite electroplated layer and manufacturing method thereof

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CN107658618B (en) * 2017-08-10 2021-10-26 富士康(昆山)电脑接插件有限公司 Electrical connector
TWI774150B (en) * 2020-12-08 2022-08-11 財團法人金屬工業研究發展中心 Electrical test probe

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106757250A (en) * 2016-10-18 2017-05-31 苏州超立光机电科技有限公司 Weaving yarn guide assembly coated with composite electroplated layer and manufacturing method thereof

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