TWI527650B - Laser processing apparatus - Google Patents

Laser processing apparatus Download PDF

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Publication number
TWI527650B
TWI527650B TW101132132A TW101132132A TWI527650B TW I527650 B TWI527650 B TW I527650B TW 101132132 A TW101132132 A TW 101132132A TW 101132132 A TW101132132 A TW 101132132A TW I527650 B TWI527650 B TW I527650B
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lens
laser beam
intensity distribution
laser
processing apparatus
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TW101132132A
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Chinese (zh)
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TW201315556A (en
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林尚久
清水政二
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三星鑽石工業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/083Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0853Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/14Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
    • B23K26/1462Nozzles; Features related to nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70Auxiliary operations or equipment
    • B23K26/702Auxiliary equipment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K37/00Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
    • B23K37/04Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
    • B23K37/0408Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work for planar work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Laser Beam Processing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Description

雷射加工裝置 Laser processing device

本發明係有關於一種雷射加工裝置,尤以有關於一種沿著切割(scribe)預定線照射雷射射束(laser beam),在脆性材料基板的表面形成切割溝的雷射加工裝置。 BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a laser processing apparatus, and more particularly to a laser processing apparatus for irradiating a laser beam along a predetermined line to form a cutting groove on a surface of a brittle material substrate.

就用以分割玻璃基板等之脆性材料基板的技術而言,提出有一種利用龜裂進展之分割方法。在該方法中,首先,藉由切刀滾輪(Cutter wheel)等在玻璃基板的表面形成初部龜裂。之後,雷射射束沿著切割預定線進行掃描而加熱基板,進而在雷射射束之照射瞬後即冷卻被加熱的區域。藉此,龜裂會沿著切割預定線進展,而形成切割溝。 As a technique for dividing a brittle material substrate such as a glass substrate, a segmentation method using crack progress has been proposed. In this method, first, a primary crack is formed on the surface of the glass substrate by a cutter wheel or the like. Thereafter, the laser beam is scanned along the line to be cut to heat the substrate, thereby cooling the heated area immediately after the irradiation of the laser beam. Thereby, the crack progresses along the planned cutting line to form a cutting groove.

沿著切割預定線進行掃描之雷射射束,係沿著掃描方向具有預定之長度。為了形成如前述之雷射射束,係採用包括球面透鏡及圓柱型透鏡(cylindrical lens)之光學系統,或者包括使母線延伸之方向互相正交而配置之2片圓柱型透鏡之光學系統。 The laser beam scanned along the line to be cut has a predetermined length along the scanning direction. In order to form a laser beam as described above, an optical system including a spherical lens and a cylindrical lens, or an optical system including two cylindrical lenses in which the directions in which the bus bars extend are orthogonal to each other is used.

藉由如前述之習知的光學系統所形成之雷射射束,其沿著射束掃描方向的強度分佈係為高斯(gauss)型。亦即,雷射射束的強度係射束之長度方向的中央部最強,而隨著朝兩端前進而變弱。根據如前述習知的光學系統之雷射射束,在形成切割溝上稱不上 是最適當之強度分佈的雷射射束。 The intensity distribution of the laser beam formed by the optical system as described above in the beam scanning direction is a gauss type. That is, the intensity of the laser beam is the strongest in the central portion in the longitudinal direction of the beam, and becomes weaker as it proceeds toward both ends. According to the laser beam of the optical system as described above, it is not possible to form a cutting groove. Is the most appropriate intensity distribution of the laser beam.

因此,在專利文獻1中,提出有一種加工系統,其係能夠以沿著切割預定線之方向使雷射射束之強度分佈均勻。該加工系統係具備有:雷射振盪器、反射鏡、以及多邊形鏡(polygon mirror),該反射鏡係用以反射由雷射振盪器所射出之雷射射束,該多邊形鏡係用以在基板上掃描以反射鏡所反射之雷射射束。 Therefore, in Patent Document 1, there is proposed a processing system capable of making the intensity distribution of the laser beam uniform in the direction along the line to be cut. The processing system is provided with: a laser oscillator, a mirror, and a polygon mirror for reflecting a laser beam emitted by the laser oscillator, the polygon mirror being used for A laser beam reflected by the mirror is scanned on the substrate.

(先前技術文獻) (previous technical literature) (專利文獻) (Patent Literature)

專利文獻1:日本特開2005-212364號公報。 Patent Document 1: Japanese Laid-Open Patent Publication No. 2005-212364.

在專利文獻1所記載之系統中,從雷射振盪器所射出之雷射射束係通過反射鏡在多邊形鏡進行反射,並沿著基板上之切割預定線且遍及預定的長度而反覆進行掃描。藉由該反覆掃描,預定長度的雷射射束之沿著切割預定線之方向的強度分佈均勻。 In the system described in Patent Document 1, the laser beam emitted from the laser oscillator is reflected by the mirror through the mirror, and is repeatedly scanned along a predetermined line on the substrate and over a predetermined length. . By this reverse scanning, the intensity distribution of the predetermined length of the laser beam in the direction along the line to be cut is uniform.

然而,在專利文獻1所記載的系統中,因照射角度相對於在多邊形鏡反射之雷射射束的基板表面會有變化,因此實際上雷射射束的強度分佈並不均勻,導致愈靠近藉由反覆掃描所形成之雷射射束照射範圍之端部強度變得愈低。此外,只能將在基板上的雷射射束之強度設為相同的強度分佈,而難以適當地對應多樣的基板規格、加工條件等。 However, in the system described in Patent Document 1, since the irradiation angle changes with respect to the surface of the substrate of the laser beam reflected by the polygon mirror, the intensity distribution of the laser beam is not uniform, resulting in closer proximity. The intensity of the end portion of the laser beam irradiation range formed by the repeated scanning becomes lower. Further, it is only possible to set the intensity of the laser beam on the substrate to the same intensity distribution, and it is difficult to appropriately respond to various substrate specifications, processing conditions, and the like.

本發明的課題係在於藉由簡單的構成及處理,將在基板上之雷射射束的強度,設為在射束的長度方向或射束的寬度方向相同。 An object of the present invention is to make the intensity of a laser beam on a substrate the same in the longitudinal direction of the beam or the width direction of the beam by a simple configuration and processing.

本發明之另外的課題係在於容易地獲致最適於各種加工條件 之強度分佈的雷射射束。 A further object of the present invention is to easily achieve optimum processing conditions. The intensity distribution of the laser beam.

第1發明之雷射加工裝置,係沿著切割預定線照射雷射射束,使切割溝形成在脆性材料基板的表面之裝置,該雷射加工裝置係包含有:雷射射束射出裝置,用以射出具有高斯型之強度分佈的雷射射束;承載台,載置要加工之脆性材料基板;第1透鏡,用以控制與切割預定線正交之方向的射束寬度;第2透鏡,用以控制沿著切割預定線之方向的射束長度;冷卻裝置,用以冷卻在脆性材料基板之藉由雷射射束所加熱之區域;以及掃描機構,用以將雷射射束及冷卻裝置,對於載置在承載台之脆性材料基板進行相對性之掃描。並且,第1透鏡及第2透鏡之至少一方為非球面圓柱型透鏡,其係為將射入之具有高斯型之強度分佈的雷射射束之強度分佈,設為在脆性材料基板上在射束寬度方向或射束長度方向相同。 A laser processing apparatus according to a first aspect of the invention is directed to irradiating a laser beam along a planned cutting line to form a cutting groove on a surface of a brittle material substrate, the laser processing apparatus including: a laser beam emitting device; a laser beam for emitting a Gaussian-type intensity distribution; a carrier for placing a substrate of a brittle material to be processed; a first lens for controlling a beam width in a direction orthogonal to a planned cutting line; and a second lens a beam length for controlling the direction along the line to be cut; a cooling device for cooling the region heated by the laser beam on the substrate of the brittle material; and a scanning mechanism for the laser beam and The cooling device performs relative scanning on the substrate of the brittle material placed on the stage. Further, at least one of the first lens and the second lens is an aspherical cylindrical lens, and the intensity distribution of the laser beam having the Gaussian-type intensity distribution incident thereon is set on the brittle material substrate. The beam width direction or the beam length direction is the same.

在該加工裝置中,從雷射射束射出裝置所射出之雷射射束,係通過第1透鏡及第2透鏡而照射在脆性材料基板上。此外,雷射射束係藉由掃描機構沿著脆性材料基板之切割預定線進行掃描。藉由雷射射束所加熱之基板,係藉由與雷射射束一同進行掃描之冷卻裝置進行冷卻,且沿著基板之切割預定線形成切割溝。在此,因第1透鏡及第2透鏡之至少一方為非球面透鏡,故使雷射射束之寬度方向及/或長度方向的強度分佈為相同。 In the processing apparatus, the laser beam emitted from the laser beam emitting device is irradiated onto the brittle material substrate by the first lens and the second lens. In addition, the laser beam is scanned by a scanning mechanism along a line of cut of the brittle material substrate. The substrate heated by the laser beam is cooled by a cooling device that scans together with the laser beam, and a cutting groove is formed along a predetermined line of cutting of the substrate. Here, since at least one of the first lens and the second lens is an aspherical lens, the intensity distribution in the width direction and/or the longitudinal direction of the laser beam is made the same.

在此,相較於採用習知之多邊形鏡之系統,能夠容易地獲致具有大致矩形之強度分佈的雷射射束。並且,特別是在將雷射射束之長度方向的強度分佈設為相同時,容易使切割溝形成時之處 理(process)最佳化。 Here, a laser beam having a substantially rectangular intensity distribution can be easily obtained compared to a system using a conventional polygonal mirror. Further, particularly when the intensity distribution in the longitudinal direction of the laser beam is made the same, it is easy to form the dicing groove. Process optimization.

第2發明之雷射加工裝置係在第1發明之裝置中,第2透鏡係為用以轉換射束之強度分佈的非球面圓柱型透鏡。 A laser processing apparatus according to a second aspect of the invention is the apparatus of the first aspect of the invention, wherein the second lens is an aspherical cylindrical lens for converting an intensity distribution of the beam.

在此,能夠將照射在脆性材料基板上之雷射射束之沿著切割預定線之雷射射束的長度方向的強度分佈設為相同。因此,能夠至藉由冷卻裝置進行冷卻之瞬前為止不使基板的溫度上昇。因此,能夠增大冷卻時的拉伸應力,且能夠更擴大切割溝的可加工條件。亦即,使切割裕度增大。 Here, the intensity distribution in the longitudinal direction of the laser beam along the planned cutting line of the laser beam irradiated on the brittle material substrate can be made the same. Therefore, it is possible to prevent the temperature of the substrate from rising until the cooling is performed by the cooling device. Therefore, the tensile stress at the time of cooling can be increased, and the processable conditions of the dicing groove can be further enlarged. That is, the cutting margin is increased.

第3發明之雷射加工裝置係在第1發明之裝置中,第1透鏡及第第2透鏡均為用以轉換射束之強度分佈的非球面透鏡。 In the laser processing apparatus according to the third aspect of the invention, the first lens and the second lens are both aspherical lenses for converting the intensity distribution of the beam.

在此,能夠將雷射射束之強度分佈設為在雷射射束之寬度方向及沿著切割預定線之長度方向相同。因此,能夠更擴大切割裕度。 Here, the intensity distribution of the laser beam can be set to be the same in the width direction of the laser beam and in the longitudinal direction along the line to be cut. Therefore, the cutting margin can be further enlarged.

第4發明之雷射加工裝置,在第1至第3發明中之任一裝置中,復具備移動機構,其係用以使第1透鏡及第2透鏡之各者獨立地朝沿著光軸之方向移動。 A laser processing apparatus according to a fourth aspect of the present invention, characterized in that the apparatus of any one of the first to third aspect, further comprising: a moving mechanism for causing each of the first lens and the second lens to independently follow the optical axis Move in the direction.

藉由使各透鏡以沿著光軸之方向移動,即能夠改變射束之寬度方向及長度方向的長度,且能夠謀求處理的最佳化。 By moving each lens in the direction along the optical axis, the length in the width direction and the longitudinal direction of the beam can be changed, and the processing can be optimized.

第5發明之雷射加工裝置係在第1至第4發明中之任一裝置中,復具備偏移機構,其係用以將非球面圓柱型透鏡朝與光軸正交之方向移動。 In the laser processing apparatus according to a fifth aspect of the invention, the apparatus of any one of the first to fourth invention is characterized in that the offset mechanism is provided to move the aspherical cylindrical lens in a direction orthogonal to the optical axis.

藉由使非球面圓柱型透鏡偏置(Offset),即能夠改變雷射射束的強度分佈之形狀。藉此,即能夠改變基板之溫度上昇的形態,且能夠謀求處理的最佳化。 By offsetting the aspherical cylindrical lens, the shape of the intensity distribution of the laser beam can be changed. Thereby, it is possible to change the form in which the temperature of the substrate rises, and it is possible to optimize the processing.

第6發明之雷射加工裝置係在第1至第5發明中任一裝置中,復具備射束直徑控制機構,其係用以控制射入至非球面圓柱型透鏡之雷射射束的直徑。 A laser processing apparatus according to a sixth aspect of the present invention, characterized in that, in any one of the first to fifth inventions, a beam diameter control mechanism for controlling a diameter of a laser beam incident on the aspherical cylindrical lens is provided .

藉由改變射入至非球面圓柱型透鏡之雷射射束的直徑,即能夠改變雷射射束之強度分佈的形狀。因此,能夠與第5發明同樣地謀求處理的最佳化。 The shape of the intensity distribution of the laser beam can be changed by changing the diameter of the laser beam incident on the aspherical cylindrical lens. Therefore, the optimization of the processing can be achieved in the same manner as in the fifth invention.

在如前述之本發明中,藉由將構成光學系統的透鏡做成為非球面圓柱型透鏡,即能夠簡單地將在基板上之雷射射束的強度,設為在射束之長度方向或射束之寬度方向相同。 In the present invention as described above, by making the lens constituting the optical system an aspherical cylindrical lens, it is possible to simply set the intensity of the laser beam on the substrate to be in the longitudinal direction of the beam or to shoot. The width of the bundle is the same.

1‧‧‧承載台 1‧‧‧bearing station

2‧‧‧加熱機構 2‧‧‧heating mechanism

3‧‧‧冷卻噴嘴 3‧‧‧Cooling nozzle

4‧‧‧承載台驅動機構 4‧‧‧Loading platform drive mechanism

11‧‧‧雷射振盪器 11‧‧‧Laser oscillator

12‧‧‧擴束器 12‧‧‧ Beam expander

13‧‧‧反射鏡 13‧‧‧Mirror

14、15‧‧‧非球面圓柱型透鏡 14, 15‧‧‧ aspherical cylindrical lens

18‧‧‧射束直徑控制機構 18‧‧‧Ball diameter control mechanism

21、22‧‧‧第1,第2移動機構 21, 22‧‧‧1st, 2nd mobile agency

23、24‧‧‧第1,第2偏移機構 23, 24‧‧‧1st, 2nd offset mechanism

G‧‧‧玻璃基板 G‧‧‧glass substrate

第1圖(a)及(b)係為本發明之一實施形態之雷射加工裝置的概略構成圖。 Fig. 1 (a) and (b) are schematic configuration diagrams of a laser processing apparatus according to an embodiment of the present invention.

第2圖係為顯示矩形射束與高斯射束的表面溫度分佈之圖。 Figure 2 is a graph showing the surface temperature distribution of a rectangular beam and a Gaussian beam.

第3圖係為顯示矩形射束與高斯射束的表面應力分佈之圖 Figure 3 is a graph showing the surface stress distribution of a rectangular beam and a Gaussian beam.

第4圖係為顯示矩形射束的切割裕度之圖。 Figure 4 is a graph showing the cutting margin of a rectangular beam.

第5圖係為顯示高斯射束的切割裕度之圖。 Figure 5 is a graph showing the cutting margin of a Gaussian beam.

第6圖係為顯示使非球面圓柱型透鏡在Z軸方向移動時的強度分佈之圖。 Fig. 6 is a view showing the intensity distribution when the aspherical cylindrical lens is moved in the Z-axis direction.

第7圖係為顯示改變射入至非球面圓柱型透鏡之雷射射束的射束直徑時的強度分佈之圖。 Figure 7 is a graph showing the intensity distribution when changing the beam diameter of a laser beam incident on an aspherical cylindrical lens.

第8圖係為顯示使非球面圓柱型透鏡從光軸偏移時的強度分佈之圖。 Fig. 8 is a view showing the intensity distribution when the aspherical cylindrical lens is shifted from the optical axis.

第9圖係為顯示使非球面圓柱型透鏡從光軸偏移時的強度分 佈之圖。 Figure 9 is a graph showing the intensity of the aspherical cylindrical lens when it is offset from the optical axis. The map of cloth.

第10圖係為顯示使非球面圓柱型透鏡從光軸偏移時的強度分佈之圖。 Fig. 10 is a view showing the intensity distribution when the aspherical cylindrical lens is shifted from the optical axis.

[雷射加工裝置] [Laser processing device]

第1圖顯示本發明之一實施形態的雷射加工裝置。該雷射加工裝置係包含有承載台1、加熱機構2、冷卻裝置(在第1圖中,僅顯示構成冷卻裝置的冷卻噴嘴(Nozzle)3)、以及承載台驅動機構(掃描機構)4;該承載台1係用以載置作為加工對象的玻璃基板G;該加熱機構2係用以加熱承載台1上的玻璃基板G;該冷卻裝置係用以冷卻藉由加熱機構2所加熱之玻璃基板G;該承載台驅動機構4係用以使承載台1在X、Y平面內移動。另外,第1圖(b)係為由不同90°方向觀看第1圖(a)之圖。 Fig. 1 shows a laser processing apparatus according to an embodiment of the present invention. The laser processing apparatus includes a stage 1, a heating mechanism 2, a cooling device (in the first figure, only the cooling nozzle (Nozzle) 3 constituting the cooling device), and a stage driving mechanism (scanning mechanism) 4; The stage 1 is for mounting a glass substrate G to be processed; the heating mechanism 2 is for heating the glass substrate G on the stage 1; the cooling device is for cooling the glass heated by the heating mechanism 2. The substrate G; the stage driving mechanism 4 is for moving the stage 1 in the X and Y planes. In addition, Fig. 1(b) is a view of Fig. 1(a) viewed from different 90° directions.

加熱機構2係包含有作為雷射射出裝置的雷射振盪器11、擴束器(Beam expander)12、反射鏡13、第1非球面圓柱型透鏡14、以及第2非球面圓柱型透鏡15。此外,加熱機構2係具備有射束直徑控制機構18、第1及第2移動機構21、22、以及第1及第2偏移機構23、24。 The heating mechanism 2 includes a laser oscillator 11 as a laser emitting device, a beam expander 12, a mirror 13, a first aspherical cylindrical lens 14, and a second aspherical cylindrical lens 15. Further, the heating mechanism 2 includes a beam diameter control mechanism 18, first and second moving mechanisms 21 and 22, and first and second offset mechanisms 23 and 24.

雷射振盪器11係例如為用以射出CO2雷射的裝置。從該雷射振盪器11所射出之雷射射束的強度係顯示高斯分佈。擴束器12係為由3片透鏡(lens)所構成,且能夠變更各透鏡之光軸方向的間隙。反射鏡13係配置成朝承載台1反射來自擴束器12的雷射射束。 Laser oscillator 11 based e.g. CO 2 laser device is used to exit. The intensity of the laser beam emitted from the laser oscillator 11 shows a Gaussian distribution. The beam expander 12 is composed of three lenses, and can change the gap in the optical axis direction of each lens. The mirror 13 is configured to reflect the laser beam from the beam expander 12 towards the stage 1 .

第1非球面圓柱型透鏡14,係為用以將射入之雷射射束聚光 在玻璃基板G上,並且在玻璃基板G上將雷射射束的寬度方向(與切割預定線正交之方向)之強度轉換成矩形形狀之分佈的透鏡。此外,第2非球面圓柱型透鏡15,係為用以將射入之雷射射束聚光在玻璃基板G上,並且在玻璃基板G上將雷射射束之沿著切割預定線之方向的強度轉換成矩形形狀之分佈的透鏡。 The first aspherical cylindrical lens 14 is for collecting the incident laser beam On the glass substrate G, the intensity of the width direction of the laser beam (the direction orthogonal to the planned cutting line) is converted into a lens of a rectangular shape distribution on the glass substrate G. Further, the second aspherical cylindrical lens 15 is for concentrating the incident laser beam on the glass substrate G, and directing the laser beam along the line to be cut on the glass substrate G. The intensity of the lens is converted into a rectangular shape.

射束直徑控制機構18,係為用以改變構成擴束器12之3片透鏡中的2片透鏡間的距離,而控制雷射射束之射束直徑的機構。 The beam diameter control mechanism 18 is a mechanism for controlling the beam diameter of the laser beam by changing the distance between the two lenses of the three lenses constituting the beam expander 12.

第1移動機構21,係為用以使第1非球面圓柱型透鏡14朝Z軸方向(高度方向)移動,以改變在玻璃基板G上之射束寬度的機構。此外,第2移動機構22,係為用以使第2非球面圓柱型透鏡15朝Z軸方向移動,以改變在玻璃基板G上之射束長度(沿著切割預定線之方向的長度)的機構。 The first moving mechanism 21 is a mechanism for moving the first aspherical cylindrical lens 14 in the Z-axis direction (height direction) to change the beam width on the glass substrate G. Further, the second moving mechanism 22 is configured to move the second aspherical cylindrical lens 15 in the Z-axis direction to change the beam length (length along the direction of the planned cutting line) on the glass substrate G. mechanism.

第1偏移機構23,係為用以使第1非球面圓柱型透鏡14朝與光軸正交之Y軸方向(與切割預定線正交之射束寬度方向)偏移,以改變在玻璃基板G上之射束寬度方向之強度分佈的機構。此外,第2偏移機構24,係為用以使第2非球面圓柱型透鏡15朝在水平面內與Y軸正交之X軸方向(沿著切割預定線之方向)偏移,以改變在玻璃基板G上之射束長度方向之強度分佈的機構。 The first offset mechanism 23 is configured to shift the first aspherical cylindrical lens 14 in the Y-axis direction (the beam width direction orthogonal to the planned cutting line) orthogonal to the optical axis to change the glass. A mechanism for the intensity distribution in the beam width direction on the substrate G. Further, the second offset mechanism 24 is configured to shift the second aspherical cylindrical lens 15 in the X-axis direction (direction along the line to cut) orthogonal to the Y-axis in the horizontal plane to change A mechanism for the intensity distribution in the longitudinal direction of the beam on the glass substrate G.

冷卻裝置係經介冷卻噴嘴3而噴射由未圖示之冷媒源所供給的冷媒,以形成冷卻點(spot)。該冷卻點係形成在照射在玻璃基板G上之雷射射束之掃描方向的後端部。 The cooling device injects the refrigerant supplied from a refrigerant source (not shown) through the cooling nozzle 3 to form a cooling spot. This cooling point is formed at the rear end portion of the laser beam irradiated on the glass substrate G in the scanning direction.

[切割方法] [Cutting method]

採用以上之加工裝置在玻璃基板G形成切割溝時,首先,採用切刀滾輪等,在玻璃基板G的端部形成作為切割之起點的初部 龜裂。另外,該初部龜裂亦可藉由雷射所形成。 When the dicing groove is formed in the glass substrate G by the above-described processing apparatus, first, a cutter roller or the like is used to form a preliminary portion as a starting point of the cutting at the end portion of the glass substrate G. Cracked. In addition, the initial crack can also be formed by a laser.

接著,從雷射振盪器11射出雷射射束,該雷射射束係經介擴束器12、反射鏡13、第1及第2非球面圓柱型透鏡14、15而照射在玻璃基板G上。此時,雷射射束的強度分佈係藉由第1及第2非球面圓柱型透鏡14、15,在射束寬度方向及射束長度方向的兩方,從高斯分佈轉換成矩形形狀的分佈。該雷射射束係根據藉由承載台驅動機構4移動承載台1,而沿著切割預定線對玻璃基板G上進行掃描。玻璃基板G係藉由雷射射束加熱成比玻璃基板G之軟化點更低之溫度。此外,使冷卻點追隨在雷射射束之掃描方向後端。 Next, a laser beam is emitted from the laser oscillator 11, and the laser beam is irradiated onto the glass substrate G via the divergence beam expander 12, the mirror 13, and the first and second aspherical cylindrical lenses 14, 15. on. At this time, the intensity distribution of the laser beam is converted from a Gaussian distribution to a rectangular shape by the first and second aspherical cylindrical lenses 14 and 15 in both the beam width direction and the beam length direction. . The laser beam scans the glass substrate G along the line to cut according to the movement of the stage 1 by the stage driving mechanism 4. The glass substrate G is heated by a laser beam to a temperature lower than the softening point of the glass substrate G. In addition, the cooling point follows the trailing end of the scanning beam in the scanning direction.

根據前述之方式,在藉由雷射射束之照射而加熱之區域附近雖產生壓縮應力,惟由於之後立刻藉由冷媒的噴射而形成冷卻點,故對於垂直裂縫之形成會產生有效的拉伸應力。藉由該拉伸應力,沿著切割預定線形成垂直裂縫,並形成所希望之切割溝。 According to the above manner, although compressive stress is generated in the vicinity of the region heated by the irradiation of the laser beam, since the cooling point is formed immediately after the injection of the refrigerant, effective stretching is formed for the formation of the vertical crack. stress. By the tensile stress, a vertical crack is formed along the line to be cut, and a desired cutting groove is formed.

[雷射射束之強度分怖] [The intensity of the laser beam is divided]

在此,針對強度分佈屬於高斯分佈的雷射射束(以下稱為「高斯射束」)、與屬於本實施形態之矩形形狀之分佈的雷射射束(以下稱為「矩形射束」)的差異加以說明。 Here, a laser beam having a Gaussian distribution of intensity distribution (hereinafter referred to as "Gaussian beam") and a laser beam having a distribution of a rectangular shape according to the present embodiment (hereinafter referred to as "rectangular beam") The difference is explained.

第2圖係顯示在玻璃基板上掃描矩形射束與高斯射束時之在基板某位置之表面溫度的經時變化。在第2圖中,實線係為採用矩形射束時之表面溫度的經時變化,一點鏈線係為採用高斯分佈時之表面溫度的經時變化。此外,第2圖的橫軸係為時間[秒],縱軸係為溫度[℃]。另外,雷射射束係為長度60mm、寬度1.5mm、掃描速度120mm/s。此外,冷卻係為在雷射射束之掃描方向後端 進行。 Fig. 2 is a graph showing the temporal change of the surface temperature at a certain position on the substrate when the rectangular beam and the Gaussian beam are scanned on the glass substrate. In Fig. 2, the solid line is the temporal change of the surface temperature when a rectangular beam is used, and the one-point chain line is a temporal change of the surface temperature when a Gaussian distribution is used. In addition, the horizontal axis of Fig. 2 is time [sec], and the vertical axis is temperature [°C]. Further, the laser beam has a length of 60 mm, a width of 1.5 mm, and a scanning speed of 120 mm/s. In addition, the cooling system is at the rear end of the scanning direction of the laser beam. get on.

從第2圖得知,藉由高斯射束加熱之情形時,基板表面溫度係為緩緩上昇,雷射射束係在通過大約2/3之時間點成為最大,之後下降。另一方面,藉由矩形射束加熱之情形時,溫度急遽地上昇,且溫度上昇持續至冷卻之瞬前為止。在該例中,矩形射束時比高斯射束時大150℃左右。 As is apparent from Fig. 2, when the Gaussian beam is heated, the substrate surface temperature is gradually increased, and the laser beam becomes maximum at a time point of passing about 2/3, and then falls. On the other hand, in the case of heating by a rectangular beam, the temperature rises sharply and the temperature rise continues until the moment of cooling. In this example, the rectangular beam is about 150 ° C larger than the Gaussian beam.

第3圖係顯示在玻璃基板上掃描矩形射束與高斯射束時之在基板某位置之表面應力的經時變化。在第3圖中,實線係為採用矩形射束時之表面應力的經時變化,一點鏈線係為採用高斯射束時之表面應力的經時變化。此外,第3圖之橫軸係為時間[秒],縱軸係為應力[Mpa]。另外,雷射射束之尺寸、掃描速度係與第2圖相同。 Fig. 3 is a graph showing temporal changes in surface stress at a certain position on a substrate when scanning a rectangular beam and a Gaussian beam on a glass substrate. In Fig. 3, the solid line is the temporal change of the surface stress when a rectangular beam is used, and the one-point chain line is a temporal change of the surface stress when the Gaussian beam is used. In addition, the horizontal axis of Fig. 3 is time [sec], and the vertical axis is stress [Mpa]. In addition, the size and scanning speed of the laser beam are the same as in the second drawing.

從第3圖得知,藉由高斯射束加熱之情形時,壓縮應力係在射束中心為最大,在該例中為-83Mpa。之後,壓縮應力會下降,在冷卻之瞬前為-17Mpa。另一方面,藉由矩形射束加熱之情形時,壓縮應力在射束前端急遽地增大至-60Mpa左右為止後,壓縮應力係朝向射束後端緩緩地增大。在冷卻之瞬前的壓縮應力係為-74Mpa。此外,冷卻時之拉伸應力係在高斯射束之情形時為150Mpa,在矩形射束之情形時為177Mpa,矩形射束者係大18%左右。 It is known from Fig. 3 that the compressive stress is maximum at the center of the beam when heated by a Gaussian beam, which is -83 MPa in this example. After that, the compressive stress will drop and it will be -17Mpa before the cooling moment. On the other hand, in the case of heating by a rectangular beam, the compressive stress gradually increases toward the rear end of the beam after the front end of the beam is sharply increased to about -60 MPa. The compressive stress before the moment of cooling is -74 MPa. Further, the tensile stress at the time of cooling is 150 MPa in the case of a Gaussian beam, 177 MPa in the case of a rectangular beam, and about 18% in the case of a rectangular beam.

根據以上所述得知下述者。 According to the above, the following are known.

在矩形射束之加熱中,由於冷卻時之拉伸應力會變大,因此能夠預測因藉由高斯射束之加熱,而使能夠形成切割溝之條件範圍變廣,亦即使切割裕度(margin)擴大。因此,能夠提升切割溝形 成時之處理的穩定性。此外,能夠使可加工條件容易地找出。 In the heating of the rectangular beam, since the tensile stress at the time of cooling becomes large, it can be predicted that the condition range in which the cutting groove can be formed is widened by the heating by the Gaussian beam, and even the cutting margin (margin) )expand. Therefore, the cutting groove shape can be improved The stability of the processing of the time. In addition, the processable conditions can be easily found.

在第4圖及第5圖顯示根據以上之預測所進行之實驗結果。第4圖係顯示藉由矩形射束進行加熱而進行切割溝加工時之切割可否的結果。此外,第5圖係顯示藉由高斯射束加熱而進行切割溝加工時之切割可否的結果。 The results of the experiments based on the above predictions are shown in Figs. 4 and 5. Fig. 4 is a view showing the result of cutting whether the cutting groove processing is performed by heating by a rectangular beam. Further, Fig. 5 shows the result of cutting whether the cutting groove is processed by Gaussian beam heating.

從該等圖得知,藉由矩形射束進行加熱,而進行切割溝加工者,相較於藉由高斯射束進行加熱之情形,更使可切割範圍擴大。 It is known from the figures that the dicing groove processor is heated by the rectangular beam to enlarge the cleavable range compared to the case of heating by the Gaussian beam.

[矩形射束之控制] [Control of Rectangular Beam]

在此,藉由改變非球面圓柱型透鏡14、15之位置,而能夠控制矩形射束之強度分佈的形狀。以下,針對具體之控制加以說明。 Here, the shape of the intensity distribution of the rectangular beam can be controlled by changing the positions of the aspherical cylindrical lenses 14, 15. Hereinafter, specific control will be described.

<Z軸方向位置> <Z axis direction position>

藉由第1移動機構或第2移動機構,而改變各非球面圓柱型透鏡14、15之距離玻璃基板G的位置、亦即Z軸方向的位置,即能夠改變射束寬度的長度、沿著切割預定線之方向的射束長度。在第6圖顯示該狀況。另外,第6圖係為顯示射束長度方向之強度分佈者。 By changing the position of the aspherical cylindrical lenses 14 and 15 to the position of the glass substrate G, that is, the position in the Z-axis direction by the first moving mechanism or the second moving mechanism, the length of the beam width can be changed and along The length of the beam that cuts the direction of the predetermined line. This situation is shown in Figure 6. In addition, Fig. 6 is a graph showing the intensity distribution in the longitudinal direction of the beam.

從第6圖得知,若非球面圓柱型透鏡與基板表面之間的距離增大,則射束長度會增長。惟射束長度會改變,且強度分佈的形狀亦會改變。 It is known from Fig. 6 that if the distance between the aspherical cylindrical lens and the surface of the substrate is increased, the beam length is increased. Only the beam length will change and the shape of the intensity distribution will change.

<射入射束直徑> <shot incident beam diameter>

藉由控制擴束器12之各透鏡的位置,即能夠改變射入至非球面圓柱型透鏡之雷射射束的射束直徑。並且,如第7圖所示,藉由改變射束直徑,即能夠改變矩形射束之強度分佈。另外,第7圖係為顯示射束長度方向之強度分佈者。 By controlling the position of each lens of the beam expander 12, the beam diameter of the laser beam incident on the aspherical cylindrical lens can be varied. Also, as shown in Fig. 7, the intensity distribution of the rectangular beam can be changed by changing the beam diameter. In addition, Fig. 7 is a graph showing the intensity distribution in the longitudinal direction of the beam.

具體而言,若縮小射束直徑,如第7圖之下段左側所示,強度分佈的矩形會被破壞,使射束中央部之強度相較於兩端部強,近似於高斯分佈。接著若增大射束直徑,如第7圖之下段中央所示,獲致大致矩形形狀的強度分佈。接著,若進一步增大射束直徑,如下段右側所示,使中央部相較於兩端部弱。 Specifically, if the beam diameter is reduced, as shown on the left side of the lower part of Fig. 7, the rectangle of the intensity distribution is broken, so that the intensity of the central portion of the beam is stronger than the both ends, which approximates a Gaussian distribution. Then, if the beam diameter is increased, as shown in the center of the lower portion of Fig. 7, an intensity distribution of a substantially rectangular shape is obtained. Next, if the beam diameter is further increased, as shown on the right side of the following paragraph, the center portion is made weaker than the both end portions.

<偏移> <offset>

藉由第1偏移機構23或第2偏移機構24,使各非球面圓柱型透鏡14、15朝與光軸正交之方向偏移,即能夠改變射束寬度方向的強度分佈、射束長度方向的強度分佈。 By the first offset mechanism 23 or the second offset mechanism 24, the aspherical cylindrical lenses 14 and 15 are shifted in the direction orthogonal to the optical axis, that is, the intensity distribution and the beam in the beam width direction can be changed. The intensity distribution in the length direction.

在第8圖至第10圖顯示具體例。第8圖至第10圖係顯示分別將第7圖之下段中央之狀態、下段左側之狀態、下段右側之狀態的第2非球面圓柱型透鏡15,朝與光軸正交之方向偏移達-0.3至+0.3mm之狀況。 Specific examples are shown in Figs. 8 to 10 . Figs. 8 to 10 show the second aspherical cylindrical lens 15 in the state of the center of the lower stage of the seventh drawing, the state of the left side of the lower stage, and the state of the right side of the lower stage, respectively, which are offset in the direction orthogonal to the optical axis. -0.3 to +0.3mm condition.

從該等圖得知,藉由將非球面圓柱型透鏡朝與光軸正交之方向偏移,即能夠使射束之兩端的一方之強度比另一方增強。此外,根據偏移的程度,即能夠控制兩端之強度的差異之程度。 As can be seen from the figures, by shifting the aspherical cylindrical lens in a direction orthogonal to the optical axis, it is possible to enhance the strength of one of the two ends of the beam from the other. Further, depending on the degree of the offset, it is possible to control the degree of the difference in the strength between the both ends.

如前所述,藉由改變矩形射束之強度分佈的形狀,即能夠以最適合於各種加工條件的溫度分佈來進行加熱,且能夠使處理最佳化。 As described above, by changing the shape of the intensity distribution of the rectangular beam, it is possible to perform heating with a temperature distribution most suitable for various processing conditions, and it is possible to optimize the processing.

[其他實施形態] [Other Embodiments]

本發明並不限定於如以上所述之實施形態,在不脫離本發明的範圍能夠進行各種的變更或修正。 The present invention is not limited to the embodiments described above, and various changes and modifications can be made without departing from the scope of the invention.

(a)在前述實施形態中,係以採用非球面圓柱型透鏡14、15,而將雷射射束之寬度方向及長度方向的強度分佈轉換成矩形形狀 之方式,惟亦可以僅將任一方設為非球面圓柱型透鏡,且僅將一方側的強度分佈設為矩形形狀。 (a) In the above embodiment, the aspherical cylindrical lenses 14 and 15 are used to convert the intensity distribution in the width direction and the longitudinal direction of the laser beam into a rectangular shape. Alternatively, only one of the sides may be an aspherical cylindrical lens, and only one side of the intensity distribution may be a rectangular shape.

(b)在前述實施形態中,雖藉由1個擴束器改變雷射射束之射束直徑,惟亦可獨立地設置用以改變各個射束寬度方向及射束長度方向之射束直徑的擴束器。 (b) In the foregoing embodiment, although the beam diameter of the laser beam is changed by one beam expander, the beam diameter for changing the beam width direction and the beam length direction may be independently set. Beam expander.

1‧‧‧承載台 1‧‧‧bearing station

2‧‧‧加熱機構 2‧‧‧heating mechanism

3‧‧‧冷卻噴嘴 3‧‧‧Cooling nozzle

4‧‧‧承載台驅動機構 4‧‧‧Loading platform drive mechanism

11‧‧‧雷射振盪器 11‧‧‧Laser oscillator

12‧‧‧擴束器 12‧‧‧ Beam expander

13‧‧‧反射鏡 13‧‧‧Mirror

14、15‧‧‧非球面圓柱型透鏡 14, 15‧‧‧ aspherical cylindrical lens

18‧‧‧射束直徑控制機構 18‧‧‧Ball diameter control mechanism

21、22‧‧‧第1,第2移動機構 21, 22‧‧‧1st, 2nd mobile agency

23、24‧‧‧第1,第2偏移機構 23, 24‧‧‧1st, 2nd offset mechanism

G‧‧‧玻璃基板 G‧‧‧glass substrate

Claims (5)

一種雷射加工裝置,係沿著切割預定線而照射雷射射束,使切割溝形成在脆性材料基板的表面,該雷射加工裝係包含有:承載台,載置要加工之脆性材料基板;雷射射束射出裝置,用以射出具有高斯型強度分佈的雷射射束;第1透鏡,用以控制與前述切割預定線正交之方向的射束寬度;第2透鏡,用以控制沿著前述切割預定線之方向的射束長度;冷卻裝置,用以冷卻在脆性材料基板之藉由前述雷射射束所加熱之區域;以及掃描機構,用以將雷射射束及前述冷卻裝置,對於載置在前述承載台之脆性材料基板進行相對性之掃描;且前述第1透鏡及前述第2透鏡之至少一方係非球面圓柱型透鏡,其係當離前述脆性材料基板之位置及與光軸正交之方向之位置設為預定之位置時,會將射入之具有高斯型強度分佈的雷射射束之強度分佈,設為在脆性材料基板上在射束寬度方向或射束長度方向相同,且前述第1透鏡及前述第2透鏡之該至少一方係具備移動機構及偏移機構至少一方,該移動機構用以使該非球面圓柱型透鏡朝沿著光軸之方向移動,而該偏移機構用以使該非球面圓柱型透鏡朝與光軸正交之方向移動。 A laser processing apparatus irradiates a laser beam along a cutting line to form a cutting groove on a surface of a brittle material substrate, the laser processing apparatus comprising: a carrying platform for placing a substrate of a brittle material to be processed a laser beam emitting device for emitting a laser beam having a Gaussian intensity distribution; a first lens for controlling a beam width in a direction orthogonal to the predetermined cutting line; and a second lens for controlling a beam length along a direction of the aforementioned cutting line; a cooling device for cooling a region of the brittle material substrate heated by the laser beam; and a scanning mechanism for the laser beam and the cooling The device performs relative scanning on the brittle material substrate placed on the carrier; and at least one of the first lens and the second lens is an aspherical cylindrical lens, which is located at a position away from the brittle material substrate. When the position in the direction orthogonal to the optical axis is set to a predetermined position, the intensity distribution of the incident laser beam having a Gaussian-type intensity distribution is set as the beam on the brittle material substrate. The width direction or the beam length direction is the same, and at least one of the first lens and the second lens includes at least one of a moving mechanism and an offset mechanism for moving the aspherical cylindrical lens toward the optical axis. The direction is moved, and the offset mechanism is configured to move the aspherical cylindrical lens in a direction orthogonal to the optical axis. 如申請專利範圍第1項所述之雷射加工裝置,其中,前述第2透鏡係為用以轉換射束之強度分佈的前述非球面圓柱型透鏡。 The laser processing apparatus according to claim 1, wherein the second lens is the aspherical cylindrical lens for converting an intensity distribution of a beam. 如申請專利範圍第1項所述之雷射加工裝置,其中,前述第1透鏡及第前述第2透鏡均為用以轉換射束之強度分佈的前述非球面圓柱型透鏡。 The laser processing apparatus according to claim 1, wherein the first lens and the second lens are both aspherical cylindrical lenses for converting an intensity distribution of a beam. 如申請專利範圍第1項所述之雷射加工裝置,其中,前述移動機構,用以使前述第1透鏡及前述第2透鏡之各者獨立地朝沿著光軸之方向移動。 The laser processing apparatus according to claim 1, wherein the moving mechanism is configured to independently move each of the first lens and the second lens in a direction along an optical axis. 如申請專利範圍第1項所述之雷射加工裝置,復具備射束直徑控制機構,其係用以控制射入至前述非球面圓柱型透鏡之雷射射束的直徑。 The laser processing apparatus according to claim 1, further comprising a beam diameter control mechanism for controlling a diameter of a laser beam incident on the aspherical cylindrical lens.
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Families Citing this family (5)

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KR101443110B1 (en) * 2013-06-11 2014-09-29 두레 주식회사 Glass plate cutting method and cutting device utilizing a laser beam
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CN111108072B (en) * 2017-09-27 2022-06-17 三星钻石工业股份有限公司 Glass substrate cutting device, glass substrate cutting method, and storage medium
WO2019171726A1 (en) * 2018-03-08 2019-09-12 パナソニックIpマネジメント株式会社 Laser radar
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Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59146455A (en) * 1983-03-31 1984-08-22 Pioneer Electronic Corp Optical pickup device
JPS63144889A (en) * 1986-12-05 1988-06-17 Nikon Corp Laser beam processing device
KR100300421B1 (en) * 1999-02-02 2001-09-13 김순택 Method and apparatus of splitting glass
JP2001068829A (en) * 1999-06-21 2001-03-16 Fine Device:Kk Cutting method and equipment of short-circuited part of printed wiring board
KR20040046421A (en) * 2002-11-27 2004-06-05 주식회사 이오테크닉스 Apparatus and method for cutting brittle material using laser
JP5495574B2 (en) * 2009-01-16 2014-05-21 パナソニック株式会社 Laser soldering method
TWI490176B (en) * 2009-03-20 2015-07-01 Corning Inc Process and apparatus for splitting glass sheet
JP2011057494A (en) * 2009-09-09 2011-03-24 Lemi Ltd Cleavage method and device for brittle material
JP5464952B2 (en) * 2009-09-28 2014-04-09 株式会社ナガセインテグレックス Laser processing method
JP2011118116A (en) * 2009-12-02 2011-06-16 Sharp Corp Laser beam irradiation device and laser beam irradiation method

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