TWI524815B - Saturated color organic light emitting devices - Google Patents

Saturated color organic light emitting devices Download PDF

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TWI524815B
TWI524815B TW097143251A TW97143251A TWI524815B TW I524815 B TWI524815 B TW I524815B TW 097143251 A TW097143251 A TW 097143251A TW 97143251 A TW97143251 A TW 97143251A TW I524815 B TWI524815 B TW I524815B
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color saturation
electrode
saturation enhancement
enhancement layer
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TW200930138A (en
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德安拉迪 布萊恩
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環球展覽公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/805Electrodes
    • H10K50/81Anodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/805Electrodes
    • H10K50/81Anodes
    • H10K50/816Multilayers, e.g. transparent multilayers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices
    • H10K50/856Arrangements for extracting light from the devices comprising reflective means
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30Coordination compounds
    • H10K85/341Transition metal complexes, e.g. Ru(II)polypyridine complexes
    • H10K85/342Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising iridium

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)

Description

飽和彩色有機發光裝置Saturated color organic light emitting device

本發明係關於有機發光裝置(OLED)。更具體而言,本發明係關於一具有一增強層之OLED。The present invention relates to an organic light-emitting device (OLED). More specifically, the present invention relates to an OLED having a reinforcing layer.

此申請案係關於2007年11月9日申請之題為「Stable Blue Phosphorescent Organic Light Emitting Devices」(代理人檔案號第027166-000200US號)之美國專利申請案第60/986,711號,該申請案藉此以引用方式併入本文中。This application is related to U.S. Patent Application Serial No. 60/986,711, filed on Nov. 9, 2007, which is incorporated herein by reference in its entirety, the entire entire entire entire entire entire entire entire entire disclosure This is incorporated herein by reference.

所主張之發明係由、代表及/或結合一聯合大學協作研究協定的以下各方中之一方或多方所發明:密歇根大學校董會、普林斯頓大學、南加州大學及Universal Display公司。該協定在做出所主張之發明之日期時及其之前有效,且所主張之發明係作為在該協定之範疇內所採取之活動之結果而做出。The claimed invention was invented by, on behalf of, and/or in conjunction with one or more of the following parties to a joint university collaborative research agreement: the University of Michigan Board of Trustees, Princeton University, the University of Southern California, and Universal Display. The agreement is effective at the time of the date on which the claimed invention is made and the claimed invention is made as a result of the activities taken within the scope of the agreement.

出於許多原因,正變得日益期望使用有機材料之光電子裝置。許多用於製造此等裝置之材料相對便宜,因此有機光電子裝置具有優於無機裝置之成本優勢之潛力。另外,有機材料之固有性質(例如,其撓性)使其極其適於特定應用,例如一撓性基板上之製作。有機光電子裝置之實例包含有機發光裝置(OLED)、有機光電電晶體、有機光伏打電池及有機光電檢測器。對於OLED而言,有機材料可具有優於習用材料之效能優勢。舉例而言,一有機發射層所發射光之波長一般而言易於藉助適當之摻雜物來進行調諧。Optoelectronic devices using organic materials are becoming increasingly desirable for a number of reasons. Many of the materials used to make such devices are relatively inexpensive, and thus organic optoelectronic devices have the potential to outperform the cost advantages of inorganic devices. In addition, the inherent properties of organic materials (eg, their flexibility) make them extremely suitable for specific applications, such as fabrication on a flexible substrate. Examples of organic optoelectronic devices include organic light-emitting devices (OLEDs), organic photovoltaic cells, organic photovoltaic cells, and organic photodetectors. For OLEDs, organic materials can have superior performance advantages over conventional materials. For example, the wavelength of light emitted by an organic emissive layer is generally readily tunable with appropriate dopants.

OLED使用在跨越該裝置施加電壓時發射光之薄有機膜。OLED正變成一供用於諸如平板顯示器、照明及背光照明等應用中之日益令人感興趣之技術。美國專利第5,844,363號、第6,303,238號及第5,707,745號中描述數個OLED材料及組態,該等專利皆以其全文以引用方式併入本文中。OLEDs use a thin organic film that emits light when a voltage is applied across the device. OLEDs are becoming an increasingly interesting technology for applications such as flat panel displays, lighting and backlighting. Several OLED materials and configurations are described in U.S. Patent Nos. 5,844,363, 6, 303, 238, and 5, 707, 745, the entireties of each of

磷光發射分子的一種應用係全色彩顯示器。此顯示器之產業標準要求像素適於發射特定色彩(稱為「飽和」色彩)。特定而言,該等標準要求飽和紅色、綠色及藍色像素。色彩可使用CIE座標來量測,其為該技術所衆所周知。One application of phosphorescent emissive molecules is a full color display. The industry standard for this display requires that the pixels be adapted to emit a particular color (referred to as a "saturated" color). In particular, these standards require saturated red, green, and blue pixels. Color can be measured using CIE coordinates, which are well known in the art.

一綠色發射分子之一項實例係三(2-苯基吡啶)銥(表示為Ir(ppy)3 ),其具有式I之結構:An example of a green emitting molecule is tris(2-phenylpyridinium)anthracene (denoted as Ir(ppy) 3 ) having the structure of formula I:

在本文中之此圖及隨後圖中,我們將自氮至金屬(此處為Ir)之配位鍵描繪成一直線。In this and subsequent figures herein, we describe the coordination bonds from nitrogen to metal (here Ir) as a straight line.

如本文中所使用,術語「有機」包含可用於製作有機光電子裝置之聚合材料及小分子有機材料。「小分子」係指任一非係一聚合物之有機材料,且「小分子」實際上可相當大。在某些情形下,小分子可包含重複單元。舉例而言,使用一長鏈烷基作為一取代基不能將分子排除在「小分子」類別外。小分子亦可併入至聚合物中,例如作為一聚合物骨架上之一懸掛基團或作為骨架之一部分。小分子亦可充當一樹枝狀聚合物之核心部分,該樹枝狀聚合物係由一系列構築於該核心部分上之化學殼層組成。一樹枝狀聚合物之核心部分可係一螢光或磷光小分子發射體。一樹枝狀聚合物可係一「小分子」,且據信當前用於OLED領域之所有樹枝狀聚合物皆係小分子。As used herein, the term "organic" encompasses polymeric materials and small molecule organic materials that can be used in the fabrication of organic optoelectronic devices. "Small molecule" means any organic material that is not a polymer, and the "small molecule" can actually be quite large. In some cases, small molecules can contain repeating units. For example, the use of a long chain alkyl group as a substituent does not exclude molecules from the "small molecule" category. Small molecules can also be incorporated into the polymer, for example as a pendant group on a polymer backbone or as part of a backbone. The small molecule can also serve as a core portion of a dendrimer composed of a series of chemical shells constructed on the core portion. The core portion of a dendrimer can be a fluorescent or phosphorescent small molecule emitter. A dendrimer can be a "small molecule" and it is believed that all dendrimers currently used in the field of OLEDs are small molecules.

如本文中所使用,「頂部」意指離基板最遠,而「底部」意指靠基板最近。在將一第一層描述為「安置於」一第二層「上方」之情形下,將該第一層安置成進一步遠離基板。除非指明該第一層與該第二層「接觸」,否則在該第一層與第二層之間亦可存在其他層。舉例而言,可將一陰極描述為「安置於」一陽極「上方」,即使在之間存在各種有機層。As used herein, "top" means the farthest from the substrate, and "bottom" means the closest to the substrate. In the case where a first layer is described as being "positioned" above a second layer, the first layer is placed further away from the substrate. Other layers may be present between the first layer and the second layer unless it is indicated that the first layer is "in contact" with the second layer. For example, a cathode can be described as being "placed" above an anode, even if various organic layers are present between them.

如本文中所使用,「可處理之溶液」意指能夠於一液體媒介中溶解、分散或傳送及/或自一液體媒介沈積,該液體媒介呈溶液或懸浮液形式。As used herein, "processable solution" means capable of being dissolved, dispersed or delivered in a liquid medium and/or deposited from a liquid medium in the form of a solution or suspension.

在相信配位體有助於發射材料之光活性性質時,稱一配位體具有「光活性」。A ligand is said to have "photoactivity" when it is believed that the ligand contributes to the photoactive nature of the emissive material.

可在美國專利第7,279,704號中找到關於OLED及上述定義之更多細節,該專利以其全文以引用方式併入本文中。Further details regarding OLEDs and the above definitions can be found in U.S. Patent No. 7,279,704, which is incorporated herein in its entirety by reference.

提供一種有機發光裝置。該裝置具有一第一電極、一第二電極及一安置於該第一電極與該第二電極之間的發射層。該發射層包含一具有一固有發射光譜之發射材料,該固有發射光譜在可見光譜中具有一小於500奈米之峰發射波長。該裝置包含一與該第一電極直接接觸之色彩飽和增強層。該色彩飽和增強層實質上由一或多種金屬或導電摻雜無機半導體組成,且具有一與該等有機層之折射率相差至少0.2之折射率。該色彩飽和增強層具有一為1奈米至10奈米之厚度。針對該發射材料之該固有發射光譜之峰波長,該色彩飽和增強層之反射率處在5%至30%之範圍內。較佳地,該色彩飽和增強層安置於該第一電極與該第二電極之間。An organic light emitting device is provided. The device has a first electrode, a second electrode and an emissive layer disposed between the first electrode and the second electrode. The emissive layer comprises an emissive material having an intrinsic emission spectrum having a peak emission wavelength of less than 500 nm in the visible spectrum. The device includes a color saturation enhancement layer in direct contact with the first electrode. The color saturation enhancement layer consists essentially of one or more metals or conductively doped inorganic semiconductors and has a refractive index that differs from the refractive indices of the organic layers by at least 0.2. The color saturation enhancement layer has a thickness of from 1 nm to 10 nm. The reflectance of the color saturation enhancement layer is in the range of 5% to 30% with respect to the peak wavelength of the intrinsic emission spectrum of the emissive material. Preferably, the color saturation enhancement layer is disposed between the first electrode and the second electrode.

一般而言,一OLED包括至少一個安置於一陽極與一陰極之間並電連接至其之有機層。在施加一電流時,陽極將電洞注入至有機層中,且陰極將電子注入至有機層中。所注入之電洞及電子各自朝向帶相反電荷之電極遷移。在一電子及電洞侷限於相同分子上時,形成一「激發子」,其係一具有一受激能態之局部電子-電洞對。在該激發子經由一光電發射機制弛豫時發射光。在某些情形下,該激發子可侷限於一準分子或一激態錯合物上。亦可出現非輻射機制(例如,熱弛豫),但其一般而言視為不期望。In general, an OLED includes at least one organic layer disposed between an anode and a cathode and electrically connected thereto. When a current is applied, the anode injects a hole into the organic layer, and the cathode injects electrons into the organic layer. The injected holes and electrons each migrate toward the oppositely charged electrode. When an electron and a hole are confined to the same molecule, an "exciter" is formed which is a local electron-hole pair having an excited state. Light is emitted when the exciter relaxes via a photoemission mechanism. In some cases, the exciton can be limited to a quasi molecule or an exciplex. Non-radiative mechanisms (eg, thermal relaxation) may also occur, but are generally considered undesirable.

如例如在美國專利第4,769,292號中所揭示,初始OLED使用自其單態發射光(「螢光」)之發射分子,該專利以其全文以引用方式併入。螢光發射一般而言出現在一小於10奈秒之時間訊框中。The initial OLED uses an emissive molecule that emits light from its singlet ("fluorescent") as disclosed in, for example, U.S. Patent No. 4,769,292, the disclosure of which is incorporated herein in its entirety by reference. Fluorescent emissions generally occur in a time frame of less than 10 nanoseconds.

新近,已證實具有可自三重態發射光(「磷光」)之發射材料之OLED。Baldo等人之「Highly Efficient Phosphorescent Emission from Organic Electroluminescent Devices」(Nature,第395卷,151-154,1998;("Baldo-I"))及Baldo等人之「Very high-efficiency green organic light-emitting devices based on electrophosphorescence」(Appl. Phys. Lett.,第75卷,第3期,4-6(1999)("Baldo-II")),該等文獻以其全文以引用方式併入。在US專利第7,279,704號中於第5-6行處更詳細地描述磷光,其以引用方式併入。More recently, OLEDs having an emissive material that emits light from a triplet ("phosphor") have been demonstrated. Baldo et al., "Highly Efficient Phosphorescent Emission from Organic Electroluminescent Devices" (Nature, Vol. 395, 151-154, 1998; ("Baldo-I")) and Baldo et al. "Very high-efficiency green organic light-emitting" Devices based on electrophosphorescence" (Appl. Phys. Lett., Vol. 75, No. 3, 4-6 (1999) ("Baldo-II")), which is incorporated by reference in its entirety. Phosphorescence is described in more detail at lines 5-6 in US Patent No. 7,279,704, which is incorporated herein by reference.

圖1顯示一有機發光裝置100。該等圖未必按比例繪製。裝置100可包含一基板110、一陽極115、一電洞注入層120、一電洞傳送層125、一電子阻擋層130、一發射層135、一電洞阻擋層140、一電子傳送層145、一電子注入層150、一保護層155及一陰極160。陰極160係一具有一第一導電層162及一第二導電層164之複合陰極。裝置100可藉由按次序沈積所描述之該等層來加以製作。在美國7,279,704中於第6-10行處更詳細地描述該等各種層之性質及功能以及實例性材料,其以引用方式併入。FIG. 1 shows an organic light emitting device 100. The figures are not necessarily to scale. The device 100 can include a substrate 110, an anode 115, a hole injection layer 120, a hole transport layer 125, an electron blocking layer 130, an emission layer 135, a hole blocking layer 140, and an electron transport layer 145. An electron injection layer 150, a protective layer 155 and a cathode 160. The cathode 160 is a composite cathode having a first conductive layer 162 and a second conductive layer 164. Device 100 can be fabricated by depositing the described layers in sequence. The nature and function of the various layers, as well as example materials, are described in more detail in U.S. Patent No. 7,279,704, the disclosure of which is incorporated herein by reference.

可得到該等層中之每一者之更多實例。舉例而言,美國專利第5,844,363號中揭示一撓性及透明基板-陽極組合,該專利以其全文以引用方式併入。一p摻雜型電洞傳送層之一實例係以一50:1之莫耳比摻雜有F.sub.4-TCNQ之m-MTDATA,如美國專利申請公開案第2003/0230980號中所揭示,該專利申請案以其全文以引用方式併入。頒予Thompson等人之美國專利第6,303,238號中揭示發射及主體材料之實例,該案以其全文以引用方式併入。一n摻雜型電子傳送層之一實例係以一1:1之莫耳比摻雜有Li之Bphen,如美國專利申請公開案第2003/0230980號中所揭示,該專利申請案以其全文以引用方式併入。美國專利第5,703,436號及第5,707,745號(其以其全文以引用方式併入)揭示陰極之實例,其包含具有一帶有一覆蓋透明、導電、經濺鍍沈積之ITO層之薄金屬層(例如,Mg:Ag)之複合陰極。在美國專利第6,097,147號及美國專利申請公開案第2003/0230980號中更詳細地描述阻擋層之理論及用途,該等申請案以其全文以引用方式併入。美國專利申請公開案第2004/0174116號中提供注入層之實例,該案以其全文以引用方式併入。可在美國專利申請公開案第2004/0174116號中找到對保護層之描述,該案以其全文以引用方式併入。More examples of each of these layers are available. A flexible and transparent substrate-anode combination is disclosed, for example, in U.S. Patent No. 5,844,363, the disclosure of which is incorporated herein by reference. An example of a p-doped hole transport layer is m-MTDATA doped with F.sub.4-TCNQ at a 50:1 molar ratio, as described in U.S. Patent Application Publication No. 2003/0230980 The disclosure is hereby incorporated by reference in its entirety. An example of an emissive and host material is disclosed in U.S. Patent No. 6,303,238, the entire disclosure of which is incorporated herein by reference. An example of an n-doped electron transport layer is a Bphen doped with Li at a molar ratio of 1:1, as disclosed in U.S. Patent Application Publication No. 2003/0230980, the entire disclosure of which is hereby Incorporated by reference. An example of a cathode comprising a thin metal layer with a transparent, electrically conductive, sputter-deposited ITO layer (eg, Mg) is disclosed in U.S. Patent Nos. 5,703,436 and 5,707,745 each incorporated by reference inco : Ag) composite cathode. The theory and use of barrier layers are described in more detail in U.S. Patent No. 6,097,147, and U.S. Patent Application Publication No. 2003/0230980, the disclosure of which is incorporated herein in its entirety. An example of an injection layer is provided in U.S. Patent Application Publication No. 2004/0174116, which is incorporated herein in its entirety by reference. A description of the protective layer can be found in U.S. Patent Application Publication No. 2004/0174116, which is incorporated herein in its entirety by reference.

圖2顯示一倒置OLED 200。該裝置包含一基板210、一陰極215、一發射層220、一電洞傳送層225及一陽極230。裝置200可藉由按次序沈積所描述之該等層來加以製作。由於最常用的OLED組態在陽極上方安置有一陰極,且裝置200在陽極230下方安置有陰極215,因此裝置200可稱為一「倒置」OLED。類似於彼等關於裝置100所描述之材料亦可用於裝置200之對應層中。圖2提供怎樣自裝置100之結構省略某些層之一項實例。FIG. 2 shows an inverted OLED 200. The device comprises a substrate 210, a cathode 215, an emissive layer 220, a hole transport layer 225 and an anode 230. Device 200 can be fabricated by depositing the described layers in sequence. Since the most common OLED configuration has a cathode disposed above the anode and the device 200 has a cathode 215 disposed below the anode 230, the device 200 can be referred to as an "inverted" OLED. Materials similar to those described with respect to device 100 can also be used in corresponding layers of device 200. Figure 2 provides an example of how certain layers may be omitted from the structure of device 100.

以非限制性實例的形式提供圖1及2中所圖解說明之簡單分層結構,且應理解,本發明之實施例亦可結合多種其他結構使用。所描述之特定材料及結構實際上具有例示性,且亦可使用其他材料及結構。基於設計、效能及成本因素,可藉由以不同方式組合所描述之各種層來達成功能OLED,或可完全省略多個層。亦可包含未具體描述之其他層。可使用除彼等具體描述之材料之外之材料。雖然本文中所提供之許多實例將各種層描述為包括一單種材料,但應理解,亦可使用材料組合(例如,主體材料與摻雜物之一混合物)或更一般而言一混合物。同樣,該等層可具有各種子層。本文中給予各種層之名稱並不意欲具有嚴格限制性。舉例而言,在裝置200中,電洞傳送層225傳送電洞並將電洞注入至發射層220中,且可將其描述為一電洞傳送層或一電洞注入層。在一項實施例中,可將一OLED描述為具有一安置於一陰極與一陽極之間的「有機層」。此有機層可包括一單個層,或可進一步包括(例如)參照圖1及2所描述之多個不同有機材料層。The simple layered structure illustrated in Figures 1 and 2 is provided in a non-limiting example, and it should be understood that embodiments of the invention may be utilized in connection with a variety of other structures. The particular materials and structures described are actually illustrative and other materials and structures may be used. Functional OLEDs may be achieved by combining the various layers described in different ways based on design, performance, and cost factors, or multiple layers may be omitted altogether. Other layers not specifically described may also be included. Materials other than those specifically described may be used. While many of the examples provided herein describe various layers as including a single material, it should be understood that a combination of materials (e.g., a mixture of host material and dopant) or, more generally, a mixture may also be used. Also, the layers can have various sub-layers. The names given to the various layers herein are not intended to be strictly limiting. For example, in device 200, hole transport layer 225 transports holes and injects holes into emissive layer 220, and may be described as a hole transport layer or a hole injection layer. In one embodiment, an OLED can be described as having an "organic layer" disposed between a cathode and an anode. The organic layer may comprise a single layer or may further comprise, for example, a plurality of different organic material layers as described with reference to Figures 1 and 2.

亦可使用未具體描述之結構及材料,例如由例如在頒予Friend等人之美國專利第5,247,190號中所揭示之聚合材料構成之OLED(PLED),該案以其全文以引用方式併入。經由進一步實例,可使用具有一單個有機層之OLED。OLED可例如如在頒予Forrest等人之美國專利第5,707,745號中所描述經堆疊,該案以其全文以引用方式併入。OLED結構可與圖1及2中所圖解說明之簡單分層結構有偏差。舉例而言,基板可包含一成角度之反射表面以改良輸出耦合,例如如在頒予Forrest等人之美國專利第6,091,195號中所描述之一臺面結構及/或如在頒予Bulovic等人之美國專利第5,834,893號中所描述之一凹坑結構,該等專利以其全文以引用方式併入。OLEDs (PLEDs) of polymeric materials such as those disclosed in U.S. Patent No. 5,247,190, issued to s. By way of further example, an OLED having a single organic layer can be used. The OLEDs can be stacked, for example, as described in U.S. Patent No. 5,707,745, the entire disclosure of which is incorporated herein by reference. The OLED structure can be deviated from the simple layered structure illustrated in Figures 1 and 2. For example, the substrate can include an angled reflective surface to improve the output coupling, such as one of the mesa structures described in U.S. Patent No. 6,091,195 to the name of the disclosure of U.S. Pat. One of the pit structures described in U.S. Patent No. 5,834,893, the entireties of each of which is incorporated herein by reference.

除非另有說明,否則可藉由任一適宜之方法來沈積各種實施例之該等層中之任一者。對於有機層而言,較佳方法包含熱蒸發、噴墨(例如,在美國專利第6,013,982號及第6,087,196號中所描述,該等專利以其全文以引用方式併入)、有機氣相沈積(OVPD)(例如,在頒予Forrest等人之美國專利第6,337,102號中所描述,該案以其全文以引用方式併入)及藉由有機物蒸氣噴射印刷(OVJP)來沈積(例如,在美國專利申請案第10/233,470號中所描述,該案以其全文以引用方式併入)。其他適宜之沈積方法包含旋轉塗佈及其他基於溶液之製程。基於溶液之製程較佳在氮氣或惰性氣氛中實施。對於其他層而言,較佳方法包含熱蒸發。較佳圖案化方法包含透過一掩模沈積、冷銲(例如,在美國專利第6,294,398號及第6,468,819號中所描述,該等專利以其全文以引用方式併入)及與某些沈積方法(例如,噴墨及OVJD)相關聯之圖案化。亦可使用其他方法。欲沈積之材料可經修改以使其與一特定沈積方法相容。舉例而言,諸如具支鏈或無支鏈且較佳含有至少3個碳之烷基及芳基等取代基可用於小分子中以增強其經受溶液處理之能力。可使用具有20個碳或更多個碳之取代基,且3-20個碳係一較佳範圍。具有不對稱結構之材料可較彼等具有對稱結構之材料具有更好的溶液處理能力,此乃因不對稱材料可具有一較低重結晶傾向。樹枝狀聚合物取代基可用於增強小分子經受溶液處理之能力。Any of the various embodiments may be deposited by any suitable method unless otherwise stated. The preferred method for the organic layer comprises thermal evaporation, ink jet (for example, as described in U.S. Patent Nos. 6,013,982 and 6,087,196, the entireties of each of OVPD) (for example, as described in US Pat. This application is hereby incorporated by reference in its entirety in its entirety by reference in its entirety in its entirety in its entirety. Other suitable deposition methods include spin coating and other solution based processes. The solution based process is preferably carried out in nitrogen or an inert atmosphere. For other layers, the preferred method involves thermal evaporation. The preferred method of patterning comprises depositing through a mask, cold soldering (for example, as described in U.S. Patent Nos. 6,294,398 and 6,468,819, the entireties of each of For example, inkjet and OVJD) are associated with patterning. Other methods can also be used. The material to be deposited can be modified to be compatible with a particular deposition method. For example, substituents such as alkyl or aryl groups having a branched or unbranched group and preferably containing at least 3 carbons can be used in small molecules to enhance their ability to undergo solution processing. Substituents having 20 carbons or more may be used, and 3-20 carbons may be used in a preferred range. Materials having an asymmetric structure may have better solution handling capabilities than materials having symmetric structures, as asymmetric materials may have a lower tendency to recrystallize. Dendrimer substituents can be used to enhance the ability of small molecules to undergo solution processing.

根據本發明之實施例製作之裝置可併入至多種消費者產品中,包含平板顯示器、電腦監控器、電視、廣告牌、內部或外部照明燈及/或信號燈、擡頭顯示器、全透明顯示器、撓性顯示器、雷射列印機、電話、蜂巢式電話、個人數位助理(PDA)、膝上型電腦、數位相機、便攜式攝錄影機、取景器、微顯示器、車輛、大面積牆壁、影院或露天大型運動場螢幕或招牌。各種控制機制可用於控制根據本發明製作之裝置,其包含被動矩陣及主動矩陣。許多裝置意欲供用於使人感覺舒適之溫度範圍內,例如攝氏18度至攝氏30度,且更佳於室溫下(攝氏20-25度)。Devices made in accordance with embodiments of the present invention can be incorporated into a variety of consumer products, including flat panel displays, computer monitors, televisions, billboards, interior or exterior lights and/or signal lights, heads up displays, fully transparent displays, scratch Display, laser printer, telephone, cellular phone, personal digital assistant (PDA), laptop, digital camera, camcorder, viewfinder, microdisplay, vehicle, large wall, theater or Open-air large stadium screen or signboard. Various control mechanisms can be used to control the device made in accordance with the present invention, including a passive matrix and an active matrix. Many devices are intended to be used in a temperature range that is comfortable for people, such as 18 degrees Celsius to 30 degrees Celsius, and more preferably at room temperature (20-25 degrees Celsius).

本文中所描述之材料及結構可應用於在除OLED之外之裝置中。舉例而言,其他光電子裝置(例如,有機太陽能電池及有機光電檢測器)可採用該等材料及結構。更一般而言,有機裝置(例如,有機電晶體)可採用該等材料及結構。The materials and structures described herein can be applied to devices other than OLEDs. For example, other optoelectronic devices (eg, organic solar cells and organic photodetectors) may employ such materials and structures. More generally, organic materials (eg, organic transistors) can employ such materials and structures.

術語鹵基、鹵素、烷基、環烷基、烯基、炔基、芳烷基、雜環基團、芳基、芳族基團及雜芳基係為該技術所已知,且在美國專利第7,279,704號中於第31-32行處對其進行界定,該專利以引用方式併入本文中。The terms halo, halo, alkyl, cycloalkyl, alkenyl, alkynyl, aralkyl, heterocyclic, aryl, aromatic, and heteroaryl are known to the art and are This is defined in U.S. Patent No. 7,279,704, the disclosure of which is incorporated herein by reference.

圖3顯示一包含一色彩飽和增強層330之有機發光裝置300。裝置300包含一基板310、一第一電極320、一色彩飽和增強層330、一發射層340及一第二電極350。裝置300可係一頂部發射裝置,其自發射層340透過基板310、陽極320及色彩飽和增強層330向一檢視器發射光。一色彩飽和增強層可與包含層除裝置300中所示之彼等層之外之層之裝置一起使用,在前述段落中已描述許多該等層。雖然圖3顯示該色彩飽和增強層處於該第一電極與該第二電極之間並與該第一電極直接接觸,但其亦可處於該裝置中之其他定位處只要其毗鄰於一光可通過其之電極即可。透明金屬氧化物通常用於OLED裝置中作為光可通過其之電極。該色彩飽和層可與該第一電極直接接觸(如圖3中所圖解說明之「底部發射」裝置)或與該第二電極直接接觸(如圖3中所圖解說明之「頂部發射」裝置),且該色彩飽和增強層可處於該等電極之間或不處於該等電極之間。關於此段落中所描述的「第一」及「第二」電極在該裝置中之位置之特殊性並不意欲限制如申請專利範圍中所使用之彼等術語,除非具體寫出。FIG. 3 shows an organic light emitting device 300 including a color saturation enhancement layer 330. The device 300 includes a substrate 310, a first electrode 320, a color saturation enhancement layer 330, an emission layer 340, and a second electrode 350. The device 300 can be a top emitting device that emits light from the emissive layer 340 through the substrate 310, the anode 320, and the color saturation enhancement layer 330 to a viewer. A color saturation enhancement layer can be used with devices comprising layers other than the layers shown in device 300, many of which have been described in the preceding paragraphs. Although FIG. 3 shows that the color saturation enhancement layer is between the first electrode and the second electrode and is in direct contact with the first electrode, it may also be at other locations in the device as long as it is adjacent to a light. Its electrode can be. Transparent metal oxides are commonly used in OLED devices as electrodes through which light can pass. The color saturation layer can be in direct contact with the first electrode (such as the "bottom emission" device illustrated in Figure 3) or in direct contact with the second electrode (such as the "top emission" device illustrated in Figure 3) And the color saturation enhancement layer can be between the electrodes or not between the electrodes. The particularity of the position of the "first" and "second" electrodes in the device as described in this paragraph is not intended to limit the terms used in the claims, unless specifically recited.

圖4圖解說明一較佳組態。裝置400包含一基板410、一第一電極420、一色彩飽和增強層430、一電洞注入層440、一發射層450、一電洞阻擋層460、一電子轉移層470及一第二電極480。第一電極420係一陽極且第二電極480係一陰極。Figure 4 illustrates a preferred configuration. The device 400 includes a substrate 410, a first electrode 420, a color saturation enhancement layer 430, a hole injection layer 440, an emission layer 450, a hole barrier layer 460, an electron transfer layer 470, and a second electrode 480. . The first electrode 420 is an anode and the second electrode 480 is a cathode.

圖4顯示一添加至一普通OLED組態(亦即,一其中陽極比陰極更接近於基板且通常透過該基板發射光之裝置)之色彩飽和增強層。然而,使用一色彩飽和增強層可施用至各種OLED組態,其可透過陽極或陰極及/或透過底部電極(亦即,安置於該基板上之電極)或頂部電極發射光。Figure 4 shows a color saturation enhancement layer added to a conventional OLED configuration (i.e., a device in which the anode is closer to the substrate than the cathode and typically emits light through the substrate). However, the use of a color saturation enhancement layer can be applied to various OLED configurations that can emit light through the anode or cathode and/or through the bottom electrode (i.e., the electrode disposed on the substrate) or the top electrode.

另一選擇為,圖3及4之色彩飽和增強層可充分導電以充當一電極。在此情形下,可能不需要一與該色彩飽和增強層分開之第一電極,但其仍可存在。圖解說明為圖3中之第一電極320或圖4中之第一電極420之該層可係一透明金屬氧化物,其可導電或不導電。氧化鉭及氧化鎢係適宜之透明不導電金屬氧化物之實例。銦錫氧化物係一適宜之導電金屬氧化物之一實例。Alternatively, the color saturation enhancement layers of Figures 3 and 4 can be sufficiently conductive to act as an electrode. In this case, a first electrode that is separate from the color saturation enhancement layer may not be needed, but it may still be present. The layer illustrated as the first electrode 320 in FIG. 3 or the first electrode 420 in FIG. 4 may be a transparent metal oxide that may or may not be electrically conductive. Examples of suitable transparent non-conductive metal oxides of cerium oxide and tungsten oxide. Indium tin oxide is an example of a suitable conductive metal oxide.

圖5顯示一CIE圖。此係來自1931之特定圖式。陰影區域含有描述可見光之所有CIE座標。來自一「單」波長光源之發射具有位於馬蹄形軌迎上之CIE座標。顯示特定波長處之CIE之數項實例。可以說具有接近於該馬蹄形軌迹之CIE座標之發射比具有遠離該馬蹄形軌迹之CIE之發射更飽和。可藉由減小光譜之寬度來使一特定發射光譜更飽和。一種色彩飽和量度係發射光譜之半高全寬(FWHM)。存在為各種產業標準所要求之特定色彩,例如,用於一全色彩顯示器之紅色、綠色及藍色。紅色、綠色及藍色在該圖式中存在為三角形的頂點,其中藍色在左邊,紅色在右邊且綠色在頂部。一使用能夠在該三角形的頂點處發射特定紅色、綠色及藍色之材料之全色彩顯示器可藉由組合紅色、綠色及藍色發射而在該三角形內部顯示任一色彩。不同的產業標準要求不同的特定紅色、綠色、藍色或其他色彩。一個問題係在於許多材料具有不比一全色彩顯示器所期望之紅色、綠色及藍色飽和之發射光譜。藍色尤其成為問題。藉由使用一色彩飽和增強層,來自一裝置之發射可相對於用於該裝置中之發射材料之固有發射移位以變得更飽和並朝向由產業所期望之藍色移動。Figure 5 shows a CIE diagram. This is from a specific pattern of 1931. The shaded area contains all CIE coordinates that describe the visible light. The emission from a "single" wavelength source has a CIE coordinate on the horseshoe track. An example of the number of CIEs at a particular wavelength is displayed. It can be said that the emission having a CIE coordinate close to the horseshoe-shaped trajectory is more saturated than the emission having a CIE away from the horseshoe-shaped trajectory. A particular emission spectrum can be made more saturated by reducing the width of the spectrum. A color saturation metric is the full width at half maximum (FWHM) of the emission spectrum. There are specific colors required for various industry standards, such as red, green, and blue for a full color display. Red, green, and blue are the vertices of the triangle in this pattern, with blue on the left, red on the right, and green on the top. A full color display using materials capable of emitting specific red, green, and blue colors at the vertices of the triangle can display any color within the triangle by combining red, green, and blue emissions. Different industry standards require different specific red, green, blue or other colors. One problem is that many materials have an emission spectrum that is not saturated with the red, green, and blue colors desired for a full color display. Blue is especially a problem. By using a color saturation enhancement layer, the emission from a device can be made more saturated with respect to the inherent emission shift of the emissive material used in the device and moved toward the blue desired by the industry.

該色彩飽和增強層安置於該第一電極與該第二電極之間並與該第一電極直接接觸。該色彩飽和增強層該材料及厚度經選擇以提供由該發射層之發射材料所發射之光之一「弱」反射。據信,一實質上由一或多種金屬或高度導電半導體(例如,p或n型矽,亦即,一導電摻雜無機半導體)組成且具有一為1奈米至10奈米之厚度之色彩飽和增強層一般而言將提供該所期望之弱反射。熟悉此項技術者可易於確定由一裝置中之一特定層所提供之反射率之量。亦存在可用於計算裝置之光學性質之套裝軟體,例如,瑞士、Fluxim AG. Dorfstrasse 7 8835 Feusisberg之ETFOS。The color saturation enhancement layer is disposed between the first electrode and the second electrode and is in direct contact with the first electrode. The color saturation enhancement layer is selected to provide a "weak" reflection of light emitted by the emissive material of the emissive layer. It is believed that substantially consists of one or more metals or highly conductive semiconductors (e.g., p or n-type germanium, i.e., a conductively doped inorganic semiconductor) and has a color thickness of from 1 nm to 10 nm. The saturation enhancement layer will generally provide the desired weak reflection. Those skilled in the art can readily determine the amount of reflectance provided by a particular layer in a device. There are also kits that can be used to calculate the optical properties of the device, for example, ETFOS from Switzerland, Fluxim AG. Dorfstrasse 7 8835 Feusisberg.

藉由一「弱」反射,此意味著色彩飽和增強層針對該發射材料之固有發射光譜之峰波長具有一小於30%之反射率。該色彩飽和增強層應具有一為至少5%反射率之反射率以影響所發射之光之CIE座標。By a "weak" reflection, this means that the color saturation enhancement layer has a reflectance of less than 30% for the peak wavelength of the intrinsic emission spectrum of the emissive material. The color saturation enhancement layer should have a reflectivity of at least 5% reflectivity to affect the CIE coordinates of the emitted light.

一層之「反射率」係由彼層與毗鄰層之折射率差而引起。大多數光反射出現在層之間的界面處,且一特定界面處所發射之光之量相依於折射率之差。為提供充分的反射率,該色彩飽和增強層之折射率應與毗鄰有機層之折射率相差至少0.2。在如本文中所述加以製作及模型化之特定裝置中,將該色彩飽和增強層之折射率模型化為小於該等有機層之折射率。然而,亦期望一具有一高於該等毗鄰有機層之折射率之折射率之色彩飽和增強層引起某些反射性,且亦可使用其。該等材料折射率之差可相當大,多達4.0。然而,該層之折射率與厚度之組合應使得該色彩飽和增強層提供一弱反射。OLED中當前所使用之大多數有機材料具有一處在1.5至2.3之範圍內之折射率。色彩飽和增強層與下伏金屬氧化物層之間的界面亦引起應加以考量之反射率。在一色彩飽和增強層不處於該等電極之間的情形下,亦即,該色彩飽和增強層不與該等有機層接觸,該色彩飽和增強層之折射率應與該毗鄰電極之折射率相差至少0.2。The "reflectance" of a layer is caused by the difference in refractive index between the other layer and the adjacent layer. Most of the light reflection occurs at the interface between the layers, and the amount of light emitted at a particular interface depends on the difference in refractive index. In order to provide sufficient reflectivity, the refractive index of the color saturation enhancement layer should differ from the refractive index of the adjacent organic layer by at least 0.2. In a particular device fabricated and modeled as described herein, the refractive index of the color saturation enhancement layer is modeled to be less than the refractive index of the organic layers. However, it is also desirable that a color saturation enhancement layer having a refractive index higher than the refractive index of the adjacent organic layers causes some reflectivity and may also be used. The difference in refractive index of these materials can be quite large, up to 4.0. However, the combination of the refractive index and thickness of the layer should be such that the color saturation enhancement layer provides a weak reflection. Most organic materials currently used in OLEDs have a refractive index in the range of 1.5 to 2.3. The interface between the color saturation enhancement layer and the underlying metal oxide layer also causes reflectance that should be considered. In the case where a color saturation enhancement layer is not between the electrodes, that is, the color saturation enhancement layer is not in contact with the organic layers, the refractive index of the color saturation enhancement layer should be different from the refractive index of the adjacent electrode. At least 0.2.

由於反射出現在界面處,因此一個相關比較係比較出現在一在一有機層與一金屬氧化物層之間具有一單個界面之裝置處之反射與出現在一具有一額外色彩飽和增強層之另外不同裝置(在有機層與該色彩飽和增強層之間具有一界面且在該色彩飽和增強層與金屬氧化物層之間具有另一界面)之反射。由該色彩飽和增強層所提供之「弱」反射意指該色彩飽和增強層負責不大於30%之光反射。因此,一具有一色彩飽和增強層之裝置中之額外光反射相對於將在一不具有一色彩飽和增強層之另外不同裝置中出現之反射不大於30%。在一具有直接安置於一ITO陽極上方之有機層之習用裝置結構中,期望在ITO有機界面處存在約5-10%反射。該色彩飽和增強層藉由添加一額外5-30%反射率來補充此反射率。Since reflection occurs at the interface, a correlation comparison occurs in comparison to a device having a single interface between an organic layer and a metal oxide layer and appearing in an additional layer having an additional color saturation enhancement layer. The reflection of different devices (having an interface between the organic layer and the color saturation enhancement layer and having another interface between the color saturation enhancement layer and the metal oxide layer). The "weak" reflection provided by the color saturation enhancement layer means that the color saturation enhancement layer is responsible for no more than 30% light reflection. Thus, the additional light reflection in a device having a color saturation enhancement layer is no more than 30% relative to the reflection that would occur in a different device that does not have a color saturation enhancement layer. In a conventional device structure having an organic layer disposed directly over an ITO anode, it is desirable to have about 5-10% reflection at the ITO organic interface. The color saturation enhancement layer complements this reflectivity by adding an additional 5-30% reflectivity.

一層之反射率可係波長相依。針對該色彩飽和增強層之反射率之相關波長係該發射材料之固有發射光譜之峰波長。該「固有」發射光譜係材料在其不經受任一光學限制(例如,存在一微腔)時之發射光譜。觀察一材料之固有發射光譜之一種方式係在一適當之溶劑中光致激發該材料。自一裝置所觀察之發射光譜可顯著不同於該固有發射光譜,此乃因存在光學微腔、不同波長之不同吸收或其他光學考量。色彩飽和增強層之一個目的係修改發射光譜以自該裝置得到比發射材料之固有光譜更飽和之發射,而無不期望之一般而言與微腔相關聯之高的角度相依性。The reflectivity of one layer can be wavelength dependent. The relevant wavelength for the reflectance of the color saturation enhancement layer is the peak wavelength of the intrinsic emission spectrum of the emissive material. The "inherent" emission spectroscopy is an emission spectrum of a material that does not undergo any optical confinement (eg, the presence of a microcavity). One way to observe the intrinsic emission spectrum of a material is to photoexcite the material in a suitable solvent. The emission spectrum observed from a device can be significantly different from the intrinsic emission spectrum due to the presence of optical microcavities, different absorptions at different wavelengths, or other optical considerations. One purpose of the color saturation enhancement layer is to modify the emission spectrum to obtain a more saturated emission from the device than the intrinsic spectrum of the emissive material, without the undesirably high angular dependence associated with the microcavity.

量測一色彩飽和增強層之有益效應之一種方式係比較一具有一色彩飽和增強層之裝置之發射光譜與一不具有一色彩飽和增強層之另外不同裝置。藉由提供額外反射率,該色彩飽和增強層能夠使得由該裝置所發射之光之發射光譜變窄。該發射光譜之半高全寬(FWHM)係一相關參數。較佳地,一具有一色彩飽和增強層之裝置之發射光譜比一不具有一色彩飽和增強層之另外不同裝置之發射光譜至少窄5奈米,更佳比其至少窄10奈米,且最佳比其至少窄12奈米。參看圖11,舉例而言,圖例中之第二裝置及第七裝置係另外不同裝置,其中該該第二裝置具有一5奈米厚Ag色彩飽和增強層,而該第七裝置不具有一5奈米厚Ag色彩飽和增強層。該第二裝置之發射光譜之FWHM係44奈米,而該第七裝置之FWHM係57奈米。兩個發射光譜皆繪製於圖11中,且該第七裝置之發射光譜顯然比該第二裝置之發射光譜寬(亦即,較不「飽和」)。One way to measure the beneficial effects of a color saturation enhancement layer is to compare the emission spectrum of a device having a color saturation enhancement layer with a different device that does not have a color saturation enhancement layer. By providing additional reflectivity, the color saturation enhancement layer is capable of narrowing the emission spectrum of the light emitted by the device. The full width at half maximum (FWHM) of the emission spectrum is a related parameter. Preferably, the emission spectrum of a device having a color saturation enhancement layer is at least 5 nm narrower than the emission spectrum of a different device having no color saturation enhancement layer, more preferably at least 10 nm narrower than Jiabi is at least 12 nanometers narrow. Referring to FIG. 11, for example, the second device and the seventh device in the illustrated embodiment are different devices, wherein the second device has a 5 nm thick Ag color saturation enhancement layer, and the seventh device does not have a 5 Nano thick Ag color saturation enhancement layer. The FWHM of the emission spectrum of the second device is 44 nm, and the FWHM of the seventh device is 57 nm. Both emission spectra are plotted in Figure 11, and the emission spectrum of the seventh device is clearly wider (i.e., less "saturated") than the emission spectrum of the second device.

據信,一般而言,認為不期望將某些金屬(例如,鋁及鉻)用於置於有機發光裝置中於陽極與有機層之間。見Peng等人之「Efficient organic light-emitting diode using semitransparent silver as anode」(Applied Physics Letters 87,173505,第1頁(2005)),其教示期望高功函數金屬來降低電洞注入之勢壘;相反地,不期望低功函數金屬。令人驚訝地,已發現,該等金屬可用作一有機發光裝置之陽極與有機層之間的薄層作為色彩飽和增強層。一由例如摻雜有F4TCNQ之LG101或NPD等材料製成之電洞注入層可用於減輕由該等金屬之較低功函數所引起之問題。據信,在該電洞注入層高度導電時可實現該電洞注入層中之頻帶偏移,從而導致可克服與金屬(例如,鋁及鉻)之低功函數相關聯之問題之良好電洞注入。銀亦係一供用作一色彩飽和增強層之較佳材料。更一般而言,該色彩飽和增強層可係一具有一為1奈米至10奈米之厚度之金屬。It is believed that, in general, it is considered undesirable to use certain metals (e.g., aluminum and chromium) in an organic light-emitting device between the anode and the organic layer. See "Efficient organic light-emitting diode using semitransparent silver as anode" by Peng et al. (Applied Physics Letters 87, 173505, p. 1 (2005)), which teaches that a high work function metal is desired to reduce the barrier of hole injection; Conversely, low work function metals are not desired. Surprisingly, it has been found that these metals can be used as a thin layer between the anode and the organic layer of an organic light-emitting device as a color saturation enhancing layer. A hole injection layer made of a material such as LG101 or NPD doped with F4TCNQ can be used to alleviate the problems caused by the lower work function of the metals. It is believed that the band offset in the hole injection layer can be achieved when the hole injection layer is highly conductive, resulting in a good hole that overcomes the problems associated with low work functions of metals such as aluminum and chromium. injection. Silver is also a preferred material for use as a color saturation enhancement layer. More generally, the color saturation enhancing layer can be a metal having a thickness of from 1 nanometer to 10 nanometers.

微腔可用於調整一OLED之發射光譜。然而,使用微腔在偏心視角處具有不期望之效應。一般而言,在視角自零(亦即,法線方向於基板)增加至六十度時,一具有一微腔之裝置中之光強度比在一不具有一微腔之裝置中更顯著地減小。另外,在非零視角處所觀察之光之CIE座標可相對於在一零視角處之CIE座標顯著移位。The microcavity can be used to adjust the emission spectrum of an OLED. However, the use of microcavities has an undesirable effect at eccentric viewing angles. In general, when the viewing angle is increased from zero (i.e., the normal direction to the substrate) to sixty degrees, the light intensity in a device having a microcavity is more significant than in a device having no microcavity. Reduced. Additionally, the CIE coordinates of the light observed at a non-zero viewing angle can be significantly shifted relative to the CIE coordinates at a zero viewing angle.

令人驚訝地,使用一弱微腔(亦即,一來自檢視器與發射層之間的層之反射小於通常用於微腔之反射之微腔)提供一微腔之許多色彩移位益處,同時維持通常與微腔相關聯之強度及CIE座標之不期望之角度相依性。Surprisingly, the use of a weak microcavity (i.e., a reflection from a layer between the viewer and the emissive layer that is less than the microcavity typically used for reflection of the microcavity) provides a number of color shifting benefits of a microcavity, At the same time, the intensity associated with the microcavity and the undesired angular dependence of the CIE coordinates are maintained.

出乎意料地,一色彩飽和增強層亦不對通常與使用一微腔相關聯之CIE座標及峰波長產生強的角度相依性。舉例而言,可使用一色彩飽和增強層來減小一裝置之發射光譜之FWHM以使其不同於一不具有一色彩飽和增強層之另外不同裝置之FWHM,由該裝置以零度與六十度之間的所有角度所發射之光之峰波長與以一為零度之角度所發射之峰波長的偏差不大於1.5%,較佳不多於1.0%,且更佳不多於0.5%。例如,在圖14及27中圖解說明該等結果。在圖14中,一具有一色彩飽和增強層之裝置之峰波長係462奈米且在視角自零改變為60度時並不可量測地移位(亦即,任一移位皆小於2奈米,此係用於量測波長之設備之解析度)。在圖27中,在視角自零度改變為60度時,一具有一微腔之裝置之峰波長自464奈米移位至456奈米,亦即一為1.75%之移位。Unexpectedly, a color saturation enhancement layer does not produce a strong angular dependence on the CIE coordinates and peak wavelengths typically associated with the use of a microcavity. For example, a color saturation enhancement layer can be used to reduce the FWHM of the emission spectrum of a device to be different from the FWHM of a different device that does not have a color saturation enhancement layer, with zero and sixty degrees by the device. The peak wavelength of the light emitted at all angles is not more than 1.5%, preferably not more than 1.0%, and more preferably not more than 0.5%, with respect to the peak wavelength emitted at an angle of zero. For example, the results are illustrated in Figures 14 and 27. In Fig. 14, a device having a color saturation enhancement layer has a peak wavelength of 462 nm and is not measurably shifted when the viewing angle changes from zero to 60 degrees (i.e., any shift is less than 2 nm). Meter, this is the resolution of the device used to measure the wavelength). In Fig. 27, when the viewing angle is changed from zero to 60 degrees, the peak wavelength of a device having a microcavity is shifted from 464 nm to 456 nm, that is, a displacement of 1.75%.

對於一具有一色彩飽和增強層之裝置而言,如圖14中所圖解說明,在法線方向於基板與離法線方向於基板六十度之視角之間,CIE之x座標可變化小於0.01且CIE之y座標可變化小於0.03。期望在圖14之視角情形下之CIE移位之量測值將一般可應用於色彩飽和增強層。For a device having a color saturation enhancement layer, as illustrated in FIG. 14, the x coordinate of the CIE may vary less than 0.01 between the normal direction of the substrate and the viewing angle of the substrate at sixty degrees from the normal direction. And the y coordinate of CIE can vary less than 0.03. It is expected that the magnitude of the CIE shift in the case of the viewing angle of Figure 14 will generally be applicable to the color saturation enhancement layer.

類似地,在使用一弱微腔之情形下,在各種視角處之光強度不像其在使用一強微腔時那樣急劇地減少。圖16A及16B對此點進行圖解說明。圖16B顯示,對於對應於圖15A之裝置之弱腔而言,對於60度或更小的視角,與Lambertian之強度偏差不超過13%。因此,藉此本揭示內容之益處,熟悉此項技術者可製作出具有弱微腔之裝置,其不將在各種視角處之光強度改變比Lambertian多於20%,且更佳不過於15%。就保持接近於各種視角處之Lambertian發射而言,具有一弱微腔之裝置具有可與一標準裝置(亦即,圖15B之裝置)相比較之效能。因此,可達成弱微腔之色彩移位屬性,而不顯著有害地影響各種視角處之光強度。Similarly, in the case of using a weak microcavity, the light intensity at various viewing angles is not drastically reduced as it would be when using a strong microcavity. Figures 16A and 16B illustrate this point. Fig. 16B shows that for a weak cavity corresponding to the device of Fig. 15A, the intensity deviation from Lambertian does not exceed 13% for a viewing angle of 60 degrees or less. Thus, by virtue of the benefit of this disclosure, those skilled in the art can make devices having weak microcavities that do not change the light intensity at various viewing angles by more than 20%, and more preferably less than 15%. . For a Lambertian launch that remains close to various viewing angles, a device having a weak microcavity has performance comparable to a standard device (i.e., the device of Figure 15B). Thus, the color shifting properties of the weak microcavities can be achieved without significantly detrimentally affecting the light intensity at various viewing angles.

雖然一色彩飽和增強層可與各種色彩OLED中之有益效應一起使用,但尤其期望在一發藍色光裝置中使用一色彩飽和增強層。藉由「發藍色光」,此意味著發射材料之固有發射光譜具有一小於500奈米之峰波長。獲得一發射飽和藍色光之OLED裝置(雖然具有許多其他期望性質,例如高效率及長的裝置使用期限)已引起相當大的挑戰。使用一色彩飽和增強層允許調整其他參數(例如,發射材料之化學組成),並可補償由該裝置所發射之光之CIE座標之任一所得移位。端視所使用之特定發射材料,期望使用一導致一特定量之額外飽和色彩飽和增強層。舉例而言,對於一已發射接近於飽和藍色之裝置而言,或許將期望使用一色彩飽和增強層來使該裝置之發射光譜之FWHM僅變窄5奈米。對於一稍微進一步遠離飽和藍色發射但或許作為一導致較高裝置穩定性或使用期限之取捨之一部分之裝置而言,期望使用一色彩飽和增強層來使該裝置之發射光譜之FWHM變窄一較大量,例如10或12奈米。While a color saturation enhancement layer can be used with beneficial effects in various color OLEDs, it is particularly desirable to use a color saturation enhancement layer in a blue light device. By "blue light", this means that the intrinsic emission spectrum of the emissive material has a peak wavelength of less than 500 nm. Obtaining an OLED device that emits saturated blue light (although having many other desirable properties, such as high efficiency and long device life) has caused considerable challenges. The use of a color saturation enhancement layer allows adjustment of other parameters (eg, the chemical composition of the emissive material) and can compensate for any resulting shift in the CIE coordinates of the light emitted by the device. Looking at the particular emissive material used, it is desirable to use an additional saturated color saturation enhancement layer that results in a particular amount. For example, for a device that has emitted near saturated blue, it may be desirable to use a color saturation enhancement layer to narrow the FWHM of the emission spectrum of the device by only 5 nanometers. For a device that is slightly further away from the saturated blue emission but perhaps as part of a trade-off that results in higher device stability or lifetime, it is desirable to use a color saturation enhancement layer to narrow the FWHM of the emission spectrum of the device. Larger amounts, such as 10 or 12 nm.

一色彩飽和增強層亦可具有一顯著大於一般用作一OLED中之透明電極之透明半導體之導電率之導電率。因此,使用一色彩飽和增強層可增加該裝置中之橫向導電率並導致較高亮度均勻度。A color saturation enhancement layer can also have a conductivity that is significantly greater than the conductivity of a transparent semiconductor that is typically used as a transparent electrode in an OLED. Thus, the use of a color saturation enhancement layer can increase the lateral conductivity in the device and result in higher brightness uniformity.

圖6、8、12、15、17、21及26顯示OLED之橫截面示意圖。實際上並不製作圖17之裝置。而是,使用該裝置之參數來計算圖18及19所示之資料。6, 8, 12, 15, 17, 21 and 26 show schematic cross-sectional views of an OLED. The device of Figure 17 is not actually made. Instead, the parameters of the device are used to calculate the data shown in Figures 18 and 19.

製作並量測圖6、8、12、15、21及26中所圖解說明之裝置。除非另外指出,否則每一裝置皆如下製作:自日本、神奈川縣的Nippon Sheet Glass有限公司購買塗覆有ITO之基板。在該ITO之後之所有層皆藉由真空熱蒸發沈積(VTE)。The apparatus illustrated in Figures 6, 8, 12, 15, 21 and 26 was fabricated and measured. Unless otherwise indicated, each device was fabricated as follows: A substrate coated with ITO was purchased from Nippon Sheet Glass Co., Ltd., Kanagawa Prefecture, Japan. All layers after the ITO were deposited by vacuum thermal evaporation (VTE).

在該等圖中,複合物A或「A」指代如下複合物:In these figures, Complex A or "A" refers to the following complex:

複合物B或「B」指代如下複合物:Complex B or "B" refers to the following complex:

複合物C或「C」指代如下複合物:Complex C or "C" refers to the following complex:

LG101TM 係自韓國LG購買的產品。LG101 TM is a product purchased from LG Korea.

其他複合物係使用在此技術中所衆所周知之術語來描述。Other compounds are described using terms well known in the art.

圖6顯示一不包含一色彩飽和增強層之裝置之一橫截面示意圖。圖6之裝置包含一80奈米厚ITO陽極、一10奈米厚Ir(ppy)3 電洞注入層、一70奈米厚摻雜有15%的複合物B之mCBP發射層、一10奈米厚mCBP電洞阻擋層、一20奈米厚Alq電子轉移層及一LiF/Al陰極。圖6之裝置亦係圖11之圖例中之第七裝置,亦即,其係圖8之不具有色彩飽和增強層、X=20奈米且Y=10奈米之裝置。Figure 6 shows a schematic cross-sectional view of a device that does not include a color saturation enhancement layer. The device of Figure 6 comprises a 80 nm thick ITO anode, a 10 nm thick Ir(ppy) 3 hole injection layer, a 70 nm thick mCBP emissive layer doped with 15% of composite B, and a 10 nm. The mCBP hole barrier layer, a 20 nm thick Alq electron transfer layer and a LiF/Al cathode. The device of Fig. 6 is also the seventh device in the legend of Fig. 11, that is, the device of Fig. 8 which does not have a color saturation enhancement layer, X = 20 nm and Y = 10 nm.

圖7顯示圖6之裝置在一為10mA/cm2 之電流通過該裝置時在各種視角處所量測之光致發光光譜。如圖7中可見,所發射之光之CIE座標在視角自零增加至60度時移位。Figure 7 shows the photoluminescence spectrum measured by the apparatus of Figure 6 at various viewing angles as it passes through the apparatus at a current of 10 mA/cm 2 . As can be seen in Figure 7, the CIE coordinates of the emitted light shift as the viewing angle increases from zero to 60 degrees.

圖8顯示一包含一5奈米厚Ag色彩飽和增強層及可變電子轉移及阻擋層厚度之裝置之一橫截面示意圖。圖8之裝置包含一80奈米厚ITO陽極、一5奈米厚Ag色彩飽和增強層、一10奈米厚Ir(ppy)3 電洞注入層、一70奈米厚摻雜有15%的複合物B之mCBP發射層、一如圖11中所示具有一自5至15奈米之可變厚度Y之mCBP電洞阻擋層、一如圖11中所示具有一可變厚度X之Alq電子轉移層及一LiF/Al陰極。「可變厚度」意指如圖11中所示製作多個電洞阻擋及電子轉移層具有特定厚度X及Y之裝置。該等裝置中之一者不具有一色彩飽和增強層,再次如圖11中所指示。 Figure 8 shows a cross-sectional view of a device comprising a 5 nm thick Ag color saturation enhancement layer and variable electron transfer and barrier thickness. The device of Figure 8 comprises a 80 nm thick ITO anode, a 5 nm thick Ag color saturation enhancement layer, a 10 nm thick Ir(ppy) 3 hole injection layer, and a 70 nm thick doping 15%. The mCBP emissive layer of composite B, an mCBP hole blocking layer having a variable thickness Y of from 5 to 15 nm as shown in FIG. 11, an Alq having a variable thickness X as shown in FIG. Electron transfer layer and a LiF/Al cathode. "Variable thickness" means a device having a plurality of hole blocking and electron transfer layers having specific thicknesses X and Y as shown in FIG. One of the devices does not have a color saturation enhancement layer, again as indicated in FIG.

圖9顯示所量測之外部量子效率對圖8之裝置之亮度之圖表。圖例在圖11中。圖9顯示,在一為10cd/m2之亮度處,不具有一色彩飽和增強層之裝置具有最高效率。然而,在較高亮度處,具有一色彩飽和增強層之裝置之效率相對於不具有此層之裝置得以改良。 Figure 9 shows a graph of the measured external quantum efficiency versus the brightness of the device of Figure 8. The legend is in Figure 11. Figure 9 shows that at a brightness of 10 cd/m 2 , the device without a color saturation enhancement layer has the highest efficiency. However, at higher brightness, the efficiency of a device having a color saturation enhancement layer is improved relative to devices without this layer.

圖10顯示所量測之亮度對電壓圖8之裝置之圖表。圖例在圖11中。圖10顯示具有一色彩飽和增強層之裝置具有比不具有此層之裝置低的作業電壓。據信,較低作業電壓係自Ag色彩飽和增強層之更有效電洞注入及再組合位置朝向陰極之所得移位之結果。 Figure 10 shows a graph of the measured brightness vs. voltage device of Figure 8. The legend is in Figure 11. Figure 10 shows that a device having a color saturation enhancement layer has a lower operating voltage than a device without this layer. It is believed that the lower operating voltage is the result of the more efficient hole injection and recombination of the Ag color saturation enhancement layer towards the cathode.

圖11顯示所量測之電致發光強度對圖8之裝置之波長之圖表。每一裝置之CIE座標亦顯示於圖例中。比較裝置2與裝置7,兩者皆具有X=20及Y=10且不同在於裝置2具有一Ag色彩飽和增強層而裝置7不具有,可見存在一色彩飽和增強層對發射光譜具有顯著影響。具體而言,裝置2相對於裝置7顯著藍色移位。 Figure 11 shows a graph of the measured electroluminescence intensity versus the wavelength of the device of Figure 8. The CIE coordinates of each device are also shown in the legend. Comparison device 2 and device 7, both having X = 20 and Y = 10, and differing in that device 2 has an Ag color saturation enhancement layer and device 7 does not have it. It can be seen that the presence of a color saturation enhancement layer has a significant effect on the emission spectrum. In particular, the device 2 is significantly blue shifted relative to the device 7.

自圖11之圖例,第二裝置幾乎與第七裝置相同,除了該第二裝置具有一5奈米厚Ag色彩飽和增強層而該第七裝置不具有之外。兩個裝置皆具有圖8中所示之結構,其中X=20奈米及Y=10奈米。具有色彩飽和增強層之裝置在1000cd/m2 處具有如下特性:CIE(0.1402,0.1790)、作業電壓10.9V及效率=6%。不具有一色彩飽和增強層之另外不同裝置在1000cd/m2 處具有如下特性:CIE(0.1613,0.2671)、作業電壓13.7V及效率=6.5%。基於圖14之稍微不同裝置之量測值,期望在法線方向於該基板與離法線方向於圖11之第二裝置之基板六十度之視角之間,CIE之x座標變化小於0.01且CIE之y座標變化小於0.03。對於圖11之第七裝置而言,不具有一色彩飽和增強層,在法線方向於該基板與離法線方向於該基板六十度之視角之間,CIE之x座標變化約0.0045且CIE之y座標變化約0.0059,如圖7中所圖解說明一圖6之裝置係圖8之裝置,其中X=20、Y=10且無Ag層。在一具有一色彩飽和增強層之裝置中之視角相對於一不具有此層之裝置層不顯著之情形下,此增加CIE座標之改變。From the legend of Figure 11, the second device is almost identical to the seventh device except that the second device has a 5 nm thick Ag color saturation enhancement layer and the seventh device does not. Both devices have the structure shown in Figure 8, where X = 20 nm and Y = 10 nm. The device having the color saturation enhancement layer has the following characteristics at 1000 cd/m 2 : CIE (0.1402, 0.1790), operating voltage 10.9 V, and efficiency = 6%. A different device without a color saturation enhancement layer has the following characteristics at 1000 cd/m 2 : CIE (0.1613, 0.2671), operating voltage 13.7 V, and efficiency = 6.5%. Based on the measured values of the slightly different devices of FIG. 14, it is desirable that the x coordinate change of the CIE is less than 0.01 between the substrate and the viewing angle of the substrate at a distance of sixty degrees from the substrate of the second device of FIG. 11 in the normal direction. The y coordinate change of CIE is less than 0.03. For the seventh device of FIG. 11, there is no color saturation enhancement layer, and the x coordinate of the CIE varies by about 0.0045 and CIE in the normal direction between the substrate and the viewing angle of the substrate at sixty degrees from the normal direction. The y coordinate changes by about 0.0059. As illustrated in Figure 7, the apparatus of Figure 6 is the apparatus of Figure 8, where X = 20, Y = 10 and no Ag layer. This increases the CIE coordinate change in the case where the viewing angle in a device having a color saturation enhancement layer is not significant relative to a device layer that does not have this layer.

圖12顯示一包含一5奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。圖12之裝置包含一80奈米厚ITO陽極、一5奈米厚Ag色彩飽和增強層、一10奈米厚Ir(ppy)3 電洞注入層、一70奈米厚摻雜有15%的複合物B之mCBP發射層、一5奈米厚mCBP電洞阻擋層、一10奈米厚Alq電子轉移層及一LiF/Al陰極。Figure 12 shows a schematic cross-sectional view of a device comprising a 5 nm thick Ag color saturation enhancement layer. The device of Figure 12 comprises a 80 nm thick ITO anode, a 5 nm thick Ag color saturation enhancement layer, a 10 nm thick Ir(ppy) 3 hole injection layer, and a 70 nm thick doping with 15%. The mCBP emissive layer of the composite B, a 5 nm thick mCBP hole blocking layer, a 10 nm thick Alq electron transfer layer and a LiF/Al cathode.

圖13顯示所量測之正規化之光致發光強度對圖12之裝置在各種作業電流處之波長之圖表。在較高作業電流處觀察到一紅色移位,如由圖13之圖例中之CIE座標所示。圖17-19中所示之光學模型顯示再組合定位移離陰極時之紅色移位。因此,據信,在施加高電流時,圖12之裝置中之再組合定位遠離陰極移位,如圖13中所圖解說明。 Figure 13 is a graph showing the measured normalized photoluminescence intensity versus the wavelength of the device of Figure 12 at various operating currents. A red shift was observed at the higher operating current as indicated by the CIE coordinate in the legend of Figure 13. The optical model shown in Figures 17-19 shows the red shift when the recombination is positioned away from the cathode. Thus, it is believed that the recombined positioning in the apparatus of Figure 12 is shifted away from the cathode when a high current is applied, as illustrated in Figure 13.

圖14顯示所量測之光致發光強度對圖12之裝置之波長之圖表。峰波長隨增加之視角保持恆定。零與六十度之間的峰波長差低於所使用之量測設備之解析度,其係2奈米。其小於0.5%。此導致與一具有一微腔之裝置之典型結果驚人不同的結果,其中峰波長一般而言隨視角顯著移位,如圖26中可見。CIE座標一般而言亦在視角增加時在一具有一微腔之裝置中改變。 Figure 14 is a graph showing the measured photoluminescence intensity versus the wavelength of the device of Figure 12. The peak wavelength remains constant with increasing viewing angle. The peak wavelength difference between zero and sixty degrees is lower than the resolution of the measuring device used, which is 2 nm. It is less than 0.5%. This results in surprisingly different results from the typical results of a device having a microcavity, where the peak wavelength is generally shifted significantly with viewing angle, as seen in Figure 26. The CIE coordinates are also generally changed in a device having a microcavity as the viewing angle increases.

圖15顯示在陽極上方具有各種厚度的銀之其他類似裝置之橫截面示意圖。圖15A顯示一不具有一5奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。圖15A之裝置包含一80奈米厚ITO陽極、一10奈米厚Ir(ppy)3電洞注入層、一70奈米厚摻雜有15%的複合物B之mCBP發射層、一10奈米厚mCBP電洞阻擋層、一20奈米厚Alq電子轉移層及一LiF/Al陰極。圖15B之裝置類似於圖15A之裝置,但具有一額外層(介於陽極與電洞注入層之間的一5奈米厚Ag色彩飽和增強層)。圖15C之裝置類似於圖15B之裝置,但Ag層為25奈米厚而非5奈米厚;對於一色彩飽和增強層而言太厚。圖15C之裝置亦將LG101而非Ir(ppy)3用於電洞注入層,且複合物C作為發射分子。雖然使用不同的電洞注入層可影響某些裝置性質,但此處做出之特定替代並不期望影響由該裝置所發射之光強度在角度上的正規化之變化,此係使用圖15之裝置進行量測之內容,此乃因LG101及Ir(ppy)3在該等圖中之感興趣波長處具有類似折射率。Figure 15 shows a cross-sectional schematic view of other similar devices having various thicknesses of silver over the anode. Figure 15A shows a cross-sectional view of one of the devices without a 5 nm thick Ag color saturation enhancement layer. The device of Fig. 15A comprises a 80 nm thick ITO anode, a 10 nm thick Ir(ppy) 3 hole injection layer, a 70 nm thick mCBP emissive layer doped with 15% of composite B, and a 10 nm. The mCBP hole barrier layer, a 20 nm thick Alq electron transfer layer and a LiF/Al cathode. The device of Figure 15B is similar to the device of Figure 15A but with an additional layer (a 5 nm thick Ag color saturation enhancement layer between the anode and the hole injection layer). The device of Figure 15C is similar to the device of Figure 15B, but the Ag layer is 25 nanometers thick rather than 5 nanometers thick; too thick for a color saturation enhancement layer. The device of Fig. 15C also uses LG101 instead of Ir(ppy) 3 for the hole injection layer, and composite C as the emission molecule. Although the use of different hole injection layers can affect certain device properties, the particular substitutions made herein are not expected to affect the angular normalization of the light emitted by the device. The device performs the measurement because LG101 and Ir(ppy) 3 have similar refractive indices at the wavelengths of interest in the figures.

圖16顯示所量測之發射強度曲線及與Lambertian發射之偏差對圖15之裝置之視角之所量測之圖表。圖16A顯示所量測之發射強度曲線。圖16B顯示與Lambertian發射之偏差對視角之所量測之圖表。圖16A中之Lambertian發射之圖表經計算,且對應於圖16B中之X軸(與Lambertian零偏差)。圖15A之裝置在圖16A及16B之圖表中描述為「標準」。圖15B之具有一色彩飽和增強層之裝置在圖16A及16B中描述為「弱腔」。圖15C具有一厚Ag層之裝置在圖16A中描述為「微腔」。Figure 16 shows a graph of the measured emission intensity curve and the deviation from the Lambertian emission versus the viewing angle of the device of Figure 15. Figure 16A shows the measured emission intensity curve. Figure 16B shows a plot of the deviation from the Lambertian emission versus the viewing angle. The graph of the Lambertian emission in Figure 16A is calculated and corresponds to the X-axis in Figure 16B (zero deviation from Lambertian). The apparatus of Fig. 15A is described as "standard" in the graphs of Figs. 16A and 16B. The device of Fig. 15B having a color saturation enhancement layer is described as "weak cavity" in Figs. 16A and 16B. Figure 15C shows a device having a thick Ag layer as "microcavity" in Figure 16A.

圖17顯示一包含一10奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。圖12之裝置包含一80奈米厚ITO陽極、一10奈米厚Ag色彩飽和增強層、一10奈米厚Ir(ppy)3 電洞注入層、一75奈米厚mCBP發射層、一10奈米厚Alq電子轉移層及一Al陰極。實際上並不製作圖17之裝置。而是,使用各種材料之光學性質及該等層之厚度來模型化圖18至20中所示之結果。使用EFTOS程式來進行光學模型化。使用複合物A之發射光譜來進行模型化。Figure 17 shows a schematic cross-sectional view of a device comprising a 10 nm thick Ag color saturation enhancement layer. The device of Figure 12 comprises a 80 nm thick ITO anode, a 10 nm thick Ag color saturation enhancement layer, a 10 nm thick Ir(ppy) 3 hole injection layer, a 75 nm thick mCBP emission layer, and a 10 Nano thick Alq electron transfer layer and an Al cathode. The device of Figure 17 is not actually made. Rather, the results shown in Figures 18 through 20 are modeled using the optical properties of the various materials and the thickness of the layers. Optical modeling using the EFTOS program. Modeling was performed using the emission spectrum of Complex A.

圖18顯示所量測之CIE X座標對圖17之裝置之離Alq/mCBP界面之偶極距離(奈米)之一圖表。Figure 18 shows a graph of the measured CIE X coordinates versus the dipole distance (nano) of the device of Figure 17 from the Alq/mCBP interface.

圖19顯示所量測之CIE Y座標對圖17之裝置之離Alq/mCBP界面(奈米)之偶極距離之一圖表。圖18及19顯示自該裝置所發射之光之CIE座標在輻射偶極(亦即,再組合位置)移離Al陰極時增加。圖18及19顯示在再組合朝向陰極移動時之一藍色移位。因此,一增強電洞注入之色彩飽和增強層可用於現朝向陰極及該裝置之發射光譜之藍色移位來移位再組合。Figure 19 is a graph showing the measured dipole moment of the CIE Y coordinate versus the Alq/mCBP interface (nano) of the device of Figure 17. Figures 18 and 19 show that the CIE coordinates of the light emitted from the device increase as the radiation dipole (i.e., recombination position) moves away from the Al cathode. Figures 18 and 19 show one of the blue shifts when recombining toward the cathode. Thus, an enhanced hole injection color saturation enhancement layer can be used to shift and recombine the blue shift of the emission spectrum towards the cathode and the device.

圖20顯示所量測之光場強度對圖17之裝置針對不同波長在裝置中之定位之圖表。在該裝置中對應於發射層之定位處(亦即,在100奈米至175奈米處),一為460奈米(藍色)之波長之光電場強度大於某些較高波長(例如,550奈米)之光電場強度,從而增強藍色光子之輻射躍遷。典型藍色發射器具有帶有延伸至550奈米之尾部之光譜,因此處在460奈米至550奈米之範圍內之廣場強度頗為顯著。Figure 20 shows a graph of the measured light field intensity versus the positioning of the device of Figure 17 for different wavelengths in the device. In the device corresponding to the location of the emissive layer (ie, at 100 nm to 175 nm), the intensity of the optical field at a wavelength of 460 nm (blue) is greater than some higher wavelengths (eg, The optical field strength of 550 nm) enhances the radiation transition of blue photons. A typical blue emitter has a spectrum with a tail that extends to 550 nm, so the intensity of the square in the range of 460 nm to 550 nm is quite significant.

圖21顯示一包含一6奈米厚Al色彩飽和增強層之裝置之一橫截面示意圖。圖21之裝置包含一80奈米厚ITO陽極、一6奈米厚Al色彩飽和增強層、一具有一可變厚度X之LG101電洞注入層、一具有一可變厚度Y之摻雜有15%的複合物B之mCBP發射層、一25奈米厚mCBP電洞阻擋層、一20奈米厚Alq電子轉移層及一LiF/Al陰極。圖21中所示之裝置之可變厚度提供於圖25之圖例中。製作三個裝置,其具有恆定總厚度。第一裝置具有X=30奈米及Y=30奈米,第二裝置具有X=20奈米及Y=40奈米,且第三裝置具有X=10奈米及Y=50奈米。Figure 21 shows a schematic cross-sectional view of a device comprising a 6 nm thick Al color saturation enhancement layer. The device of Figure 21 comprises a 80 nm thick ITO anode, a 6 nm thick Al color saturation enhancement layer, a LG101 hole injection layer having a variable thickness X, and a doping having a variable thickness Y. % of the composite B's mCBP emissive layer, a 25 nm thick mCBP hole blocking layer, a 20 nm thick Alq electron transfer layer, and a LiF/Al cathode. The variable thickness of the device shown in Figure 21 is provided in the legend of Figure 25. Three devices were made which had a constant total thickness. The first device has X = 30 nm and Y = 30 nm, the second device has X = 20 nm and Y = 40 nm, and the third device has X = 10 nm and Y = 50 nm.

圖22顯示所量測之外部量子效率對圖21之裝置(該裝置中之某些層具有各種厚度)之亮度之圖表。圖22顯示具有一較厚電洞注入層及一較薄發射層之裝置對於一既定亮度具有較高外部量子效率。Figure 22 shows a graph of the measured external quantum efficiency versus the brightness of the device of Figure 21 (having various thicknesses for certain layers in the device). Figure 22 shows that a device having a thicker hole injection layer and a thinner emissive layer has a higher external quantum efficiency for a given brightness.

圖23顯示所量測之電力功效對圖21之裝置(該裝置中之某些層具有各種厚度)之亮度之圖表。圖23顯示具有一較厚電洞注入層及一較薄發射層之裝置對於一既定亮度具有較高電力功效亮度。Figure 23 shows a graph of the measured power efficacy versus the brightness of the device of Figure 21 (having various thicknesses for certain layers in the device). Figure 23 shows a device having a thicker hole injection layer and a thinner emissive layer having a higher power efficiency brightness for a given brightness.

圖24顯示所量測之亮度對圖21之裝置(該裝置中之某些層具有各種厚度)之電壓之圖表。圖24顯示具有一較厚電洞注入層及一較薄發射層之裝置對於一既定電壓具有較高亮度。Figure 24 shows a graph of the measured brightness versus the voltage of the device of Figure 21 (having various thicknesses for certain layers in the device). Figure 24 shows that a device having a thicker hole injection layer and a thinner emissive layer has a higher brightness for a given voltage.

圖25顯示所量測之光致發光強度對圖21之裝置(該裝置中之某些層具有各種厚度)之波長(發射光譜)之圖表。該三個裝置之CIE座標亦提供於該圖例中。圖25中之光致發光光譜顯示CIE y座標在再組合區之位置在具有相同總厚度之裝置結構內移位時改變。在陰極離再組合區之距離減小時獲得更好的藍色CIE。在其中色彩飽和增強層安置於一陽極上之組態中,該色彩飽和增強層可增強電洞注入並致使再組合區朝向陰極移位。除色彩飽和增強層之反射率可引起藍色移位之外,此亦可使該裝置所發射之光產生一藍色移位。Figure 25 shows a graph of the measured photoluminescence intensity versus the wavelength (emission spectrum) of the device of Figure 21 (having various thicknesses for certain layers in the device). The CIE coordinates of the three devices are also provided in the legend. The photoluminescence spectrum in Figure 25 shows that the CIE y coordinate changes at the position of the recombination zone as it shifts within the device structure having the same total thickness. A better blue CIE is obtained as the distance of the cathode from the recombination zone is reduced. In a configuration in which the color saturation enhancement layer is disposed on an anode, the color saturation enhancement layer enhances hole injection and causes the recombination zone to shift toward the cathode. In addition to the blue shift of the reflectance of the color saturation enhancement layer, this also causes a blue shift in the light emitted by the device.

圖26顯示一包含一25奈米厚Ag層之裝置(其因此具有一微腔)之一橫截面示意圖。圖26之裝置包含一25奈米厚Ag陽極、一10奈米厚LG101電洞注入層、一25奈米厚NPD電洞轉移層、一摻雜有12%的複合物C之mCBP發射層、一37.5奈米厚Alq電子轉移層及一LiF/Al陰極。Figure 26 shows a schematic cross-sectional view of a device comprising a 25 nm thick layer of Ag (which therefore has a microcavity). The device of Figure 26 comprises a 25 nm thick Ag anode, a 10 nm thick LG101 hole injection layer, a 25 nm thick NPD hole transfer layer, and a mCBP emission layer doped with 12% of composite C. A 37.5 nm thick Alq electron transfer layer and a LiF/Al cathode.

圖26顯示所量測之光致發光強度對圖26之裝置在各種視角處所量測之波長之圖表。圖26顯示峰波長自一為零度之視角處之464奈米移位至一為50度之視角處之456奈米。Figure 26 is a graph showing the measured photoluminescence intensity versus the wavelength measured by the device of Figure 26 at various viewing angles. Figure 26 shows that the peak wavelength shifts from 464 nm at a viewing angle of zero to 456 nm at a viewing angle of 50 degrees.

應理解,本文所描述之各種實施例僅係實例,且並不意欲限制本發明之範疇。舉例而言,本文所描述之許多材料及結構可由其他材料及結構替代,此並不背離本發明之精神。因此,如熟悉此項技術者將顯而易見,所主張之本發明可包含本文中所描述之特定實例及較佳實施例之變型。應理解,關於本發明為何可行之各種理論並不意欲具有限制性。It is to be understood that the various embodiments described herein are merely illustrative and are not intended to limit the scope of the invention. For example, many of the materials and structures described herein may be substituted by other materials and structures without departing from the spirit of the invention. Thus, it will be apparent to those skilled in the <RTIgt;the</RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; It should be understood that the various theories as to why the invention may be practiced are not intended to be limiting.

100...裝置100. . . Device

110...基板110. . . Substrate

115...陽極115. . . anode

120...電洞注入層120. . . Hole injection layer

125...電洞傳送層125. . . Hole transport layer

130...電子阻擋層130. . . Electronic barrier

135...發射層135. . . Emissive layer

140...電洞阻擋層140. . . Hole barrier

145...電子傳送層145. . . Electronic transport layer

150...電子注入層150. . . Electron injection layer

155...保護層155. . . The protective layer

160...陰極160. . . cathode

162...第一導電層162. . . First conductive layer

164...第二導電層164. . . Second conductive layer

200...倒置OLED200. . . Inverted OLED

210...基板210. . . Substrate

215...陰極215. . . cathode

220...發射層220. . . Emissive layer

225...電洞傳送層225. . . Hole transport layer

230...陽極230. . . anode

300...裝置300. . . Device

310...基板310. . . Substrate

320...第一電極320. . . First electrode

330...色彩飽和增強層330. . . Color saturation enhancement layer

340...發射層340. . . Emissive layer

350...第二電極350. . . Second electrode

400...裝置400. . . Device

410...基板410. . . Substrate

420...第一電極420. . . First electrode

430...色彩飽和增強層430. . . Color saturation enhancement layer

440...電洞注入層440. . . Hole injection layer

450...發射層450. . . Emissive layer

460...電洞阻擋層460. . . Hole barrier

470...電子轉移層470. . . Electron transfer layer

480...第二電極480. . . Second electrode

圖1顯示一有機發光裝置。Figure 1 shows an organic light emitting device.

圖2顯示一不具有一單獨電子傳送層之倒置有機發光裝置。Figure 2 shows an inverted organic light-emitting device that does not have a separate electron transport layer.

圖3顯示一具有一色彩飽和增強層之有機發光裝置。Figure 3 shows an organic light-emitting device having a color saturation enhancement layer.

圖4顯示一具有一色彩飽和增強層之有機發光裝置。Figure 4 shows an organic light-emitting device having a color saturation enhancement layer.

圖5顯示一CIE圖。Figure 5 shows a CIE diagram.

圖6顯示一不包含一色彩飽和增強層之裝置之一橫截面示意圖。Figure 6 shows a schematic cross-sectional view of a device that does not include a color saturation enhancement layer.

圖7顯示圖6之裝置在各種視角處所量測之光致發光光譜。Figure 7 shows the photoluminescence spectrum measured by the apparatus of Figure 6 at various viewing angles.

圖8顯示一包含一5奈米厚Ag色彩飽和增強層及可變電子轉移及阻擋層厚度之裝置之一橫截面示意圖。Figure 8 shows a cross-sectional view of a device comprising a 5 nm thick Ag color saturation enhancement layer and variable electron transfer and barrier thickness.

圖9顯示所量測之外部量子效率對圖8之裝置之亮度之圖表。圖例在圖11中。Figure 9 shows a graph of the measured external quantum efficiency versus the brightness of the device of Figure 8. The legend is in Figure 11.

圖10顯示所量測之亮度對圖8之裝置之電壓之圖表。圖例在圖11中。Figure 10 shows a graph of the measured brightness versus the voltage of the device of Figure 8. The legend is in Figure 11.

圖11顯示所量測之電致發光強度對圖8之裝置之波長之圖表。Figure 11 shows a graph of the measured electroluminescence intensity versus the wavelength of the device of Figure 8.

圖12顯示一包含一5奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。Figure 12 shows a schematic cross-sectional view of a device comprising a 5 nm thick Ag color saturation enhancement layer.

圖13顯示所量測之正規化之光致發光強度對圖12之裝置在各種作業電流處之波長之圖表。Figure 13 is a graph showing the measured normalized photoluminescence intensity versus the wavelength of the device of Figure 12 at various operating currents.

圖14顯示所量測之光致發光強度對圖12之裝置之波長之圖表。Figure 14 is a graph showing the measured photoluminescence intensity versus the wavelength of the device of Figure 12.

圖15顯示在陽極上方具有各種厚度的銀之其他類似裝置之橫截面示意圖。圖15A顯示一不具有一5奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。圖15B顯示一具有一5奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。圖15C顯示一具有一25奈米厚Ag層從而產生微腔之裝置之一橫截面示意圖。Figure 15 shows a cross-sectional schematic view of other similar devices having various thicknesses of silver over the anode. Figure 15A shows a cross-sectional view of one of the devices without a 5 nm thick Ag color saturation enhancement layer. Figure 15B shows a cross-sectional view of one of the devices having a 5 nm thick Ag color saturation enhancement layer. Figure 15C shows a schematic cross-sectional view of a device having a 25 nm thick layer of Ag to create a microcavity.

圖16顯示所量測之發射強度曲線及與Lambertian發射之偏差對圖15之裝置之視角之所量測之圖表。圖16A顯示所量測之發射強度曲線。圖16B顯示與Lambertian發射之偏差對視角之所量測之圖表。圖16A中之Lambertian發射之圖表經計算,且對應於圖16B中之X軸(與Lambertian零偏差)。Figure 16 shows a graph of the measured emission intensity curve and the deviation from the Lambertian emission versus the viewing angle of the device of Figure 15. Figure 16A shows the measured emission intensity curve. Figure 16B shows a plot of the deviation from the Lambertian emission versus the viewing angle. The graph of the Lambertian emission in Figure 16A is calculated and corresponds to the X-axis in Figure 16B (zero deviation from Lambertian).

圖17顯示一包含一10奈米厚Ag色彩飽和增強層之裝置之一橫截面示意圖。Figure 17 shows a schematic cross-sectional view of a device comprising a 10 nm thick Ag color saturation enhancement layer.

圖18顯示所量測之CIE X座標對圖17之裝置之離Alq/mCBP界面(奈米)之偶極距離之一圖表。Figure 18 is a graph showing the measured dipole distance of the CIE X coordinate versus the Alq/mCBP interface (nano) of the device of Figure 17.

圖19顯示所量測之CIE Y座標對圖17之裝置之離Alq/mCBP界面(奈米)之偶極距離之一圖表。Figure 19 is a graph showing the measured dipole moment of the CIE Y coordinate versus the Alq/mCBP interface (nano) of the device of Figure 17.

圖20顯示所量測之光場強度對圖17之裝置針對不同波長在裝置中之定位之圖表。Figure 20 shows a graph of the measured light field intensity versus the positioning of the device of Figure 17 for different wavelengths in the device.

圖21顯示一包含一6奈米厚Al色彩飽和增強層之裝置之一橫截面示意圖。Figure 21 shows a schematic cross-sectional view of a device comprising a 6 nm thick Al color saturation enhancement layer.

圖22顯示所量測之外部量子效率對圖21之裝置(該裝置中之某些層具有各種厚度)之亮度之圖表。Figure 22 shows a graph of the measured external quantum efficiency versus the brightness of the device of Figure 21 (having various thicknesses for certain layers in the device).

圖23顯示所量測之電力功效對圖21之裝置(該裝置中之某些層具有各種厚度)之亮度之圖表。Figure 23 shows a graph of the measured power efficacy versus the brightness of the device of Figure 21 (having various thicknesses for certain layers in the device).

圖24顯示所量測之亮度對圖21之裝置(該裝置中之某些層具有各種厚度)之電壓之圖表。Figure 24 shows a graph of the measured brightness versus the voltage of the device of Figure 21 (having various thicknesses for certain layers in the device).

圖25顯示所量測之光致發光強度對圖21之裝置(該裝置中之某些層具有各種厚度)之波長(發射光譜)之圖表。Figure 25 shows a graph of the measured photoluminescence intensity versus the wavelength (emission spectrum) of the device of Figure 21 (having various thicknesses for certain layers in the device).

圖26顯示一包含一25奈米厚Ag層之裝置(其因此具有一微腔)之一橫截面示意圖。Figure 26 shows a schematic cross-sectional view of a device comprising a 25 nm thick layer of Ag (which therefore has a microcavity).

圖27顯示所量測之光致發光強度對圖26之裝置在各種視角處所量測之波長之圖表。Figure 27 is a graph showing the measured photoluminescence intensity versus the wavelength measured by the device of Figure 26 at various viewing angles.

300...裝置300. . . Device

310...基板310. . . Substrate

320...第一電極320. . . First electrode

330...色彩飽和增強層330. . . Color saturation enhancement layer

340...發射層340. . . Emissive layer

350...第二電極350. . . Second electrode

Claims (15)

一種有機發光裝置,其包括:一第一電極,其包括一透明金屬氧化物;一第二電極;至少一有機層,其安置於該第一電極與該第二電極之間,該至少一有機層包含一發射層,其中該發射層包含一具有一固有發射光譜之發射材料,該固有發射光譜在可見光譜中具有一小於500奈米之峰發射波長;及一色彩飽和增強層,其安置於該第一電極與該第二電極之間並與該第一電極直接接觸,其中該色彩飽和增強層實質上由一或多種金屬或導電摻雜無機半導體組成;其中該色彩飽和增強層具有一與該至少一有機層之折射率相差至少0.2之折射率並與該至少一有機層直接接觸;其中該色彩飽和增強層具有一1奈米至10奈米之厚度;其中針對該發射材料之該固有發射光譜之該峰波長,該色彩飽和增強層之反射率處在5%至30%之範圍內;其中該色彩飽和增強層實質上由銀、鉻、鋁和鈷之其中一者組成。 An organic light-emitting device comprising: a first electrode comprising a transparent metal oxide; a second electrode; at least one organic layer disposed between the first electrode and the second electrode, the at least one organic The layer includes an emissive layer, wherein the emissive layer comprises an emissive material having an intrinsic emission spectrum having a peak emission wavelength of less than 500 nm in the visible spectrum; and a color saturation enhancement layer disposed on Between the first electrode and the second electrode and in direct contact with the first electrode, wherein the color saturation enhancement layer is substantially composed of one or more metals or conductive doped inorganic semiconductors; wherein the color saturation enhancement layer has a The refractive index of the at least one organic layer differs by at least 0.2 and is in direct contact with the at least one organic layer; wherein the color saturation enhancing layer has a thickness of from 1 nm to 10 nm; wherein the intrinsic The peak wavelength of the emission spectrum, the reflectance of the color saturation enhancement layer is in the range of 5% to 30%; wherein the color saturation enhancement layer is substantially composed of silver and chromium Aluminum and cobalt, wherein one composition. 如請求項1之裝置,其中該第一電極係一陽極且該第二電極係一陰極。 The device of claim 1, wherein the first electrode is an anode and the second electrode is a cathode. 如請求項1之裝置,其中該第二電極包括一透明導電氧化物。 The device of claim 1, wherein the second electrode comprises a transparent conductive oxide. 如請求項3之裝置,其中該第二電極包括一銦錫氧化物。 The device of claim 3, wherein the second electrode comprises an indium tin oxide. 如請求項1之裝置,其中該裝置具有一發射光譜,該發射光譜具有比不具有一色彩飽和增強層之一另外不同裝置之半高全寬小至少5奈米之一半高全寬。 The device of claim 1, wherein the device has an emission spectrum having a full width at least one-half of a height of at least 5 nanometers less than a full width at half maximum of the device having one of the different color saturation enhancement layers. 如請求項1之裝置,其中該裝置具有一發射光譜,該發射光譜具有比不具有一色彩飽和增強層之一另外不同裝置之半高全寬小至少10奈米之一半高全寬。 The device of claim 1, wherein the device has an emission spectrum having a full width at least one-half of a height of at least 10 nm less than a full width at half maximum of the device having one of the different color saturation enhancement layers. 如請求項1之裝置,其中該裝置具有一發射光譜,該發射光譜具有比不具有一色彩飽和增強層之一另外不同裝置之半高全寬小至少12奈米之一半高全寬。 The device of claim 1, wherein the device has an emission spectrum having a full width at least half of a height of at least 12 nm that is less than a full width at half maximum of the device having one of the different color saturation enhancement layers. 如請求項1之裝置,其中該裝置以零度與六十度之間的所有角度所發射之光之峰波長與以一零度之角度所發射之峰波長的偏差不大於1.5%。 A device as claimed in claim 1, wherein the device has a peak wavelength of light emitted at all angles between zero and sixty degrees and a deviation from a peak wavelength emitted at an angle of zero degrees of no more than 1.5%. 如請求項1之裝置,其中該裝置以零度與六十度之間的所有角度所發射之光之峰波長與以一零度之角度所發射之峰波長的偏差不大於1.0%。 The apparatus of claim 1, wherein the peak wavelength of the light emitted by the apparatus at all angles between zero and sixty degrees is not more than 1.0% of the peak wavelength emitted at an angle of one degree. 如請求項1之裝置,其中該裝置以零度與六十度之間的所有角度所發射之光之峰波長與以一零度之角度所發射之峰波長的偏差不大於0.5%。 A device according to claim 1, wherein the device has a peak wavelength of light emitted at all angles between zero and sixty degrees and a deviation from a peak wavelength emitted at an angle of zero degrees of not more than 0.5%. 如請求項5之裝置,其中該裝置以零度與六十度之間的所有角度所發射之光之峰波長與以一零度之角度所發射之峰波長的偏差不大於1.5%。 A device according to claim 5, wherein the device has a peak wavelength of light emitted at all angles between zero and sixty degrees and a deviation from a peak wavelength emitted at an angle of zero degrees of not more than 1.5%. 如請求項1之裝置,其中以一零角度觀察的該發射層所 發射之光之CIE座標與以一60度角度所發射之光之CIE座標相差不大於0.01、0.03。 The device of claim 1, wherein the emission layer is observed at a zero angle The CIE coordinates of the emitted light differ from the CIE coordinates of the light emitted at an angle of 60 degrees by no more than 0.01 and 0.03. 如請求項1之裝置,其中該裝置所發射之光之強度在自零至六十度之所有角度下與朗伯特光源(Lambertian)發射相差小於20%。 A device as claimed in claim 1, wherein the intensity of the light emitted by the device differs from the Lambertian emission by less than 20% at all angles from zero to sixty degrees. 如請求項1之裝置,其中該裝置所發射之光之強度在自零至六十度之所有角度下與Lambertian發射相差小於15%。 A device as claimed in claim 1, wherein the intensity of the light emitted by the device differs from the Lambertian emission by less than 15% at all angles from zero to sixty degrees. 一種有機發光裝置,其包括:一第一電極,其包括一透明金屬氧化物;一第二電極;一發射層,其安置於該第一電極與該第二電極之間,其中該發射層包含一具有一固有發射光譜之發射材料,該固有發射光譜在可見光譜中具有一小於500奈米之峰發射波長;及一色彩飽和增強層,其與該第一電極直接接觸,其中該色彩飽和增強層實質上由一或多種金屬或導電摻雜無機半導體組成;其中該色彩飽和增強層具有一與該第一電極之折射率相差至少0.2之折射率且安置於該第一電極與該第二電極之間並與該發射層直接接觸;其中該色彩飽和增強層具有一1奈米至10奈米之厚度;其中針對該發射材料之該固有發射光譜之該峰波長, 該色彩飽和增強層之反射率處在5%至30%之範圍內;其中該色彩飽和增強層實質上由銀、鉻、鋁和鈷之其中一者組成。 An organic light-emitting device comprising: a first electrode comprising a transparent metal oxide; a second electrode; an emissive layer disposed between the first electrode and the second electrode, wherein the emissive layer comprises An emissive material having an intrinsic emission spectrum having a peak emission wavelength of less than 500 nm in the visible spectrum; and a color saturation enhancement layer in direct contact with the first electrode, wherein the color saturation is enhanced The layer consists essentially of one or more metal or conductive doped inorganic semiconductors; wherein the color saturation enhancement layer has a refractive index that differs from the first electrode by a refractive index of at least 0.2 and is disposed at the first electrode and the second electrode Directly in contact with the emissive layer; wherein the color saturation enhancing layer has a thickness of from 1 nm to 10 nm; wherein the peak wavelength of the intrinsic emission spectrum of the emissive material, The color saturation enhancement layer has a reflectance in the range of 5% to 30%; wherein the color saturation enhancement layer consists essentially of one of silver, chromium, aluminum, and cobalt.
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