TWI524350B - Method and apparatus for programming an anti-fuse element in a high-voltage integrated circuit - Google Patents
Method and apparatus for programming an anti-fuse element in a high-voltage integrated circuit Download PDFInfo
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- G—PHYSICS
- G11—INFORMATION STORAGE
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- G11C17/00—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards
- G11C17/14—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM
- G11C17/16—Read-only memories programmable only once; Semi-permanent stores, e.g. manually-replaceable information cards in which contents are determined by selectively establishing, breaking or modifying connecting links by permanently altering the state of coupling elements, e.g. PROM using electrically-fusible links
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- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
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- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
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Description
本揭示內容一般地係有關於用於在高壓積體電路中編程反熔絲元件的一電路。The present disclosure is generally directed to a circuit for programming an anti-fuse element in a high voltage integrated circuit.
一通用型式之積體電路(IC)裝置係為一金屬氧化半導體場效電晶體(MOSFET),其包含一源極區域、一汲極區域、一通道區域。於高電壓的應用中,可使用如為所熟知的高電壓場效電晶體(HVFET)的一高電壓MOSFET。複數HVFETs使用一裝置構造其包含一延伸的汲極區域,當該裝置係處於“關閉”或是實質上非傳導狀態時,其維持或“阻斷”該高電壓(例如,150伏特或更高)。傳統的HVFET通常係構成為橫向或是垂直裝置構造。於一橫向HVFET中,電流流動,當HVFET係處於一“開啟”狀態下時,係為水平的或實質上與該半導體基板的一表面平行。於一垂直HVFET中,電流垂直地流經該半導體材料,例如,由在該處配置該源極區域的該基板之一頂部表面,向下地至在該處配置該汲極區域的該基板之底部。A general-purpose integrated circuit (IC) device is a metal oxide semiconductor field effect transistor (MOSFET) comprising a source region, a drain region, and a channel region. For high voltage applications, a high voltage MOSFET such as the well known high voltage field effect transistor (HVFET) can be used. The complex HVFETs are constructed using a device that includes an extended drain region that maintains or "blocks" the high voltage (eg, 150 volts or higher when the device is in a "off" or substantially non-conducting state). ). Conventional HVFETs are typically constructed in a lateral or vertical configuration. In a lateral HVFET, current flows, when the HVFET is in an "on" state, is horizontal or substantially parallel to a surface of the semiconductor substrate. In a vertical HVFET, current flows vertically through the semiconductor material, for example, from a top surface of one of the substrates at which the source region is disposed, down to the bottom of the substrate where the drain region is disposed .
傳統的高電壓IC通常於一構形中使用一大型垂直或橫向HVFET,其中該輸出電晶體之該汲極係直接地耦接至一外部引腳其可位在一高電壓下。該高電壓IC裝置典型地包含在低電壓(0V-12V)作動的一控制器電路,其係與該HVFET分開的,但仍能夠包含在該相同的高電壓IC中。為提供起動電流供該高電壓IC之該控制器電路所用,一高外部電壓可施用至該外部引腳。該裝置之內部電路典型地藉由一接面場效應電晶體(JFET)“分接頭”構造限制性地受保護不受該高外部施加的電壓影響。例如,當該高電壓輸出電晶體之該汲極採用到,例如550V時,該分接頭電晶體(tap transistor)限制與一內節點耦接的最大電壓至大約50V,並亦提供一小(2-3 mA)電流供該控制器之起動所用。經由進一步的背景資料,美國專利第7,002,398號揭示以此方式作動的一種三端JFET電晶體。Conventional high voltage ICs typically use a large vertical or lateral HVFET in a configuration in which the drain of the output transistor is directly coupled to an external pin that can be placed at a high voltage. The high voltage IC device typically includes a controller circuit that operates at a low voltage (0V-12V) that is separate from the HVFET but can still be included in the same high voltage IC. To provide a starting current for the controller circuit of the high voltage IC, a high external voltage can be applied to the external pin. The internal circuitry of the device is typically limitedly protected from the high externally applied voltage by a Junction Field Effect Transistor (JFET) "tap" configuration. For example, when the drain of the high voltage output transistor is used, for example, 550V, the tap transistor limits the maximum voltage coupled to an internal node to about 50V, and also provides a small (2) -3 mA) current is used for starting the controller. A three-terminal JFET transistor actuated in this manner is disclosed in U.S. Patent No. 7,002,398.
高電壓IC之操作特性典型地係由所熟知的修整(trimming)的一方法加以設定。更特定言之,高電壓IC之修整典型地在一有用的電路中應用之前進行,用以調整某些參數。更特定言之,該修整之製程可包含選擇性地閉合(或開啟)一或更多電元件,其指示該控制器用以調整高電壓IC之某些操作特性。於一實例中,用於修整的該等電元件可為齊納二極體。於該修整之製程期間,一或更多齊納二極體可為關閉的(非導電的電元件)。為改變一齊納元件的該導電狀態,典型地施以一電壓(>10V)用以擊穿該齊納元件。在擊穿該齊納元件後,一電流(150-200 mA)係在陽極終端與陰極終端之間通過,永久地使該齊納元件縮短。流動通過該一或更多齊納元件的該累計電流可用以將一或更多類比參數編程。例如,一齊納二極體可用以修整或將一類比參數編程,諸如在一切換模式電源供應中所使用的一高電壓IC中的切換頻率。例如,於該功率IC之該控制器部分中,藉由將一或更多齊納二極體短路,諸如切換頻率的一類比參數可經設定位在一具體的容限內。The operational characteristics of high voltage ICs are typically set by a well known method of trimming. More specifically, trimming of high voltage ICs is typically performed prior to application in a useful circuit to adjust certain parameters. More specifically, the trimming process can include selectively closing (or turning on) one or more electrical components that instruct the controller to adjust certain operational characteristics of the high voltage IC. In one example, the electrical components for trimming can be Zener diodes. One or more Zener diodes may be closed (non-conductive electrical components) during the trimming process. To change the conductive state of a Zener element, a voltage (>10 V) is typically applied to break the Zener element. After breaking through the Zener element, a current (150-200 mA) is passed between the anode termination and the cathode termination, permanently shortening the Zener component. The accumulated current flowing through the one or more Zener elements can be used to program one or more analog parameters. For example, a Zener diode can be used to trim or program an analog parameter, such as the switching frequency in a high voltage IC used in a switched mode power supply. For example, in the controller portion of the power IC, by shorting one or more Zener diodes, an analog parameter such as a switching frequency can be set within a particular tolerance.
本發明揭示一種用以編程功率積體電路(IC)之一可編程區塊的方法,該方法包含選擇該可編程區塊的一反熔絲元件加以編程。該反熔絲元件包含藉由一介電層隔開的第一及第二電容板。接著施以一電壓脈衝至該功率IC裝置之一引腳。該引腳係連接至一高電壓輸出場效電晶體(HVFET)的一汲極,在該功率IC裝置之一正常作業模式期間經由該引腳驅動一外部負載。該電壓脈衝,其係耦接至該反熔絲元件之該第一電容板,具有一電位足夠高用以致使一電流流經該反熔絲元件,破壞該介電層之至少一部分,從而在電氣上將該第一及第二電容板短路。A method for programming a programmable block of a power integrated circuit (IC) includes programming an anti-fuse element of the programmable block for programming. The anti-fuse element includes first and second capacitive plates separated by a dielectric layer. A voltage pulse is then applied to one of the pins of the power IC device. The pin is connected to a drain of a high voltage output field effect transistor (HVFET) through which an external load is driven during one of the normal operating modes of the power IC device. The voltage pulse is coupled to the first capacitor plate of the anti-fuse element, and has a potential high enough to cause a current to flow through the anti-fuse element to destroy at least a portion of the dielectric layer, thereby The first and second capacitive plates are electrically shorted.
本發明揭示一種用以編程功率積體電路(IC)裝置之一反熔絲記憶體區塊的方法,該方法包含:施以一外部施加電壓至該功率IC之一第一引腳,該第一引腳係連接至一高電壓輸出場效電晶體(HVFET)的一汲極,並亦連接至一分接頭電晶體裝置的一第一終端,當施加至該第一引腳的一外部電壓超過該分接頭電晶體裝置的一夾止電壓時,在第二終端處提供一實質上不變的分接頭電壓,該第一電壓實質上小於該夾止電壓;導通一隔離電晶體元件以將該外部施加高電壓耦接至該反熔絲記憶體區塊的一選擇反熔絲元件,該選擇反熔絲包含藉由一介電層隔開的第一及第二電容板,該第一電容板係與該反熔絲記憶體區塊之一共同節點耦接;導通與該選擇反熔絲元件耦接的一讀取/寫入元件,從而連接該選擇反熔絲元件之該第二板至接地;將該分接頭電晶體裝置之該第二終端耦接至該共同接點;施加實質上高於該第一電壓的一脈衝電壓至該第一引腳,使得一編程電壓係被施加至該選擇反熔絲之該第一電容板,該編程電壓係夠高而致使一電流流經該選擇反熔絲而足以破壞該介電層之至少一部分,從而在電氣上將該第一及第二電容板短路。A method for programming an anti-fuse memory block of a power integrated circuit (IC) device, the method comprising: applying an externally applied voltage to a first pin of the power IC, the a pin is connected to a drain of a high voltage output field effect transistor (HVFET) and is also connected to a first terminal of a tap transistor device when an external voltage is applied to the first pin When a clamping voltage of the tap transistor device is exceeded, a substantially constant tap voltage is provided at the second terminal, the first voltage being substantially less than the pinch voltage; and an isolating transistor component is turned on to turn on The externally applied high voltage is coupled to a selected anti-fuse element of the anti-fuse memory block, the select anti-fuse comprising first and second capacitive plates separated by a dielectric layer, the first The capacitive plate is coupled to one of the anti-fuse memory blocks; a read/write element coupled to the selected anti-fuse element is coupled to the second of the selected anti-fuse element Board to ground; the second end of the tap transistor device Coupling to the common contact; applying a pulse voltage substantially higher than the first voltage to the first pin, such that a programming voltage is applied to the first capacitor plate of the selected anti-fuse, the programming The voltage is high enough to cause a current to flow through the selected antifuse sufficient to break at least a portion of the dielectric layer to electrically short the first and second capacitive plates.
本發明揭示一種用以編程功率積體電路(IC)裝置之一反熔絲記憶體區塊的方法,該方法包含:啟動與該反熔絲記憶體區塊之一選擇反熔絲元件耦接的一開關元件,該選擇反熔絲元件包含藉由一介電層隔開的第一及第二電容板,該第一電容板係與該功率IC裝置的一內部節點耦接,該開關元件係耦接至該選擇反熔絲元件之該第二板;由施加至該功率IC的一引腳的一外部電壓在該內部節點處產生一編程電壓,該引腳係連接至一高電壓輸出場效電晶體(HVFET)之一汲極,該編程電壓係夠高而致使一電流流經該選擇反熔絲元件而足以破壞該介電層之至少一部分,從而在電氣上將該第一及第二電容板短路。The present invention discloses a method for programming an anti-fuse memory block of a power integrated circuit (IC) device, the method comprising: initiating coupling with one of the anti-fuse memory blocks to select an anti-fuse element a switching element comprising: first and second capacitor plates separated by a dielectric layer, the first capacitor plate being coupled to an internal node of the power IC device, the switching element Is coupled to the second board of the selected anti-fuse element; generating an programming voltage at the internal node by an external voltage applied to a pin of the power IC, the pin being connected to a high voltage output a gate of a field effect transistor (HVFET), the programming voltage being high enough to cause a current to flow through the selected antifuse element sufficient to destroy at least a portion of the dielectric layer, thereby electrically electrically The second capacitor plate is shorted.
本發明揭示一種用以編程功率積體電路(IC)裝置之一可編程區塊的方法,該方法包含:選擇該可編程區塊的一反熔絲元件,該反熔絲元件包含藉由一介電層隔開的第一及第二電容板;施以一電壓脈衝至該功率IC裝置之一引腳,該引腳係連接至一高電壓輸出場效電晶體(HVFET)的一汲極,在該功率IC裝置之一正常作業模式期間經由該引腳驅動一外部負載,該電壓脈衝係耦接至該反熔絲元件之該第一電容板,其具有一高電位足以致使一電流流經該反熔絲元件而破壞該介電層之至少一部分,從而在電氣上將該第一及第二電容板短路。A method for programming a programmable block of a power integrated circuit (IC) device, the method comprising: selecting an anti-fuse element of the programmable block, the anti-fuse element comprising a first and a second capacitor plate separated by a dielectric layer; applying a voltage pulse to one of the pins of the power IC device, the pin being connected to a drain of a high voltage output field effect transistor (HVFET) Driving an external load through the pin during a normal operation mode of the power IC device, the voltage pulse being coupled to the first capacitor plate of the anti-fuse element, having a high potential sufficient to cause a current flow At least a portion of the dielectric layer is destroyed by the anti-fuse element to electrically short the first and second capacitive plates.
本發明揭示用於編程功率IC之反熔絲元件的方法及裝置。於以下的說明中提出具體的細節,電壓、構造特性、製造步驟等,為了於此提供對該揭示內容之完整的瞭解。然而,於相關業界中熟知此技藝之人士將察知的是,該等具體細節並非為實踐所說明之具體實施例所必需。在此整個說明中參考“一(one)具體實施例”、“一(an)具體實施例”、“一(one)實例”或“一(an)實例”意指相關於該具體實施例或實例說明的特別特徵、構造或是特性係包含在至少一具體實施例中。在此整個說明中於不同的位置處,該等措辭“於一(one)具體實施例中”、“於一(an)具體實施例中”、“一(one)實例”或“一(an)實例”並不必然地皆係參考相同的具體實施例或實例。再者,於一或更多具體實施例或實例中該特別特徵、構造或是特性可以任何適合的結合及/或次結合方式結合。Methods and apparatus for programming an anti-fuse element of a power IC are disclosed. Specific details, voltages, construction features, manufacturing steps, and the like, are set forth in the description which follows. However, it will be apparent to those skilled in the art that the specific details are not required to practice the specific embodiments. References throughout the specification to "one embodiment", "an embodiment", "one" or "an" or "an" Particular features, configurations, or characteristics of the examples are included in at least one embodiment. In the entire description, the words "in one embodiment", "in one embodiment", "one instance" or "one" The examples are not necessarily referring to the same specific embodiments or examples. Furthermore, the particular features, configurations, or characteristics may be combined in any suitable combination and/or sub-combination in one or more embodiments or examples.
應瞭解的是該等圖式中的元件係為代表性的,並且為了清晰性而未按比例繪製。亦應察知的是儘管揭示大部分使用N-通道電晶體裝置(高電壓及低電壓)的一IC,但亦可針對所有合適的摻雜區域藉由使用相對傳導類型構成P-通道電晶體。It is understood that the elements in the drawings are representative and are not drawn to scale. It should also be appreciated that while an IC that uses most of the N-channel transistor devices (high voltage and low voltage) is disclosed, a P-channel transistor can also be constructed for all suitable doped regions by using opposite conductivity types.
對於本申請案,一高電壓或功率電晶體係為任何半導體電晶體構造,其能夠在一“關閉”狀態或是狀況下支承150伏特或更高。於一具體實施例中,一功率開關係為一高電壓場效電晶體(HVFET)其圖示為一N-通道金屬氧化物半導體場效電晶體(MOSFET),於源極與汲極區域之間支承高電壓。於其他具體實施例中,一功率開關可包含一雙極接面電晶體(BJT)、一絕緣閘極場效電晶體(IGFET)或是提供電晶體功能的其他裝置構造。For the purposes of this application, a high voltage or power electro-optic system is any semiconductor transistor construction that can support 150 volts or more in a "off" state or condition. In one embodiment, a power-on relationship is a high voltage field effect transistor (HVFET) which is illustrated as an N-channel metal oxide semiconductor field effect transistor (MOSFET) in the source and drain regions. Support high voltage. In other embodiments, a power switch can include a bipolar junction transistor (BJT), an insulated gate field effect transistor (IGFET), or other device configuration that provides transistor functionality.
針對本揭示內容,“接地”或是“接地電位”係有關於一參考電壓或電位,界定或是測量一電路或是IC與之對比的所有其他電壓或電位。一“接腳”提供外部電連接至一IC裝置或封裝的一點,從而容許外部組件、電路、信號、功率、負載等,與一高電壓IC之內部組件及電路耦接。For the purposes of this disclosure, "ground" or "ground potential" is a reference voltage or potential that defines or measures all other voltages or potentials to which a circuit or IC is compared. A "pin" provides external electrical connection to a point of an IC device or package to allow external components, circuits, signals, power, loads, etc. to be coupled to internal components and circuitry of a high voltage IC.
進一步察知的是在此揭示內容之內文中,一“高”電壓係定義為一電壓其實質上為150 V或更大,一“中間”電壓係定義為介於150 V與50 V之間,以及一“低”電壓係定義為小於12 V。It is further observed that in the context of this disclosure, a "high" voltage is defined as a voltage that is substantially 150 V or greater, and an "intermediate" voltage is defined as between 150 V and 50 V. And a "low" voltage system is defined as less than 12 V.
如圖所示,圖1係為一方塊圖圖示一示範的高電壓IC 100其包含一高電壓(HV)開關102,其可為一高電壓場效電晶體(HVFET)、一高電壓(HV)汲極終端104、一源極終端106、一分接頭元件108、一低電壓(LV)控制器112、一隔離塊114、一修整電路塊116、一供電終端118以及一回饋終端120的代表。如圖所示,高電壓開關102係於HV汲極終端104與源極終端106之間耦接。於一實例中,高電壓開關102可於一電源中使用用以控制通過一能源傳輸元件之該一次繞組的電流,諸如一耦接的感應體。於作業中,HV汲極終端104典型地係經耦接用以自一外部電路(未顯示)接收輸入。如進一步顯示,一源極終端106係經耦接至高電壓開關102之另一端部。一分接頭元件108係耦接至HV汲極終端104。於作業中,分接頭元件108提供高電壓IC 100中電路與HV汲極終端104之間的緩衝。於一實例中,分接頭元件108包含一三終端(亦即,電極)電晶體裝置構造,其中當該施加的電壓係小於該電晶體裝置之一夾止電壓時,位在一第一或分接頭終端的一電壓實質上係與橫越該第二及第三終端的一施加電壓成比例。當橫越該第二及第三終端的施加電壓超過該夾止電壓時,在該分接頭終端提供的電壓實質上係為不變的或是無法隨著施加電壓增加而改變。於一具體實施例中,分接頭元件108包含一接面場效電晶體(JFET)。於作業中,分接頭元件108提供HV汲極終端104與高電壓IC中內部電路之間的緩衝,其係列為針對更低電壓。例如,於正常作業期間,HV汲極終端104可暴露至超過550 V的電壓,而該夾止電壓(暴露至高電壓IC 100之內部電路的最大電壓)係不超過50 V。如此,分接頭元件108提供一緩衝並防止高電壓IC中其他內部元件在顯著的高電壓下達到額定,其轉化成一較小的高電壓IC 100。As shown, FIG. 1 is a block diagram showing an exemplary high voltage IC 100 including a high voltage (HV) switch 102, which can be a high voltage field effect transistor (HVFET), a high voltage ( HV) bungee terminal 104, a source terminal 106, a tap element 108, a low voltage (LV) controller 112, an isolation block 114, a trim circuit block 116, a power supply terminal 118, and a feedback terminal 120 representative. As shown, the high voltage switch 102 is coupled between the HV drain terminal 104 and the source terminal 106. In one example, the high voltage switch 102 can be used in a power source to control current through the primary winding of an energy transfer component, such as a coupled inductor. In operation, HV drain terminal 104 is typically coupled to receive input from an external circuit (not shown). As further shown, a source terminal 106 is coupled to the other end of the high voltage switch 102. A tap element 108 is coupled to the HV drain terminal 104. In operation, the tap element 108 provides a buffer between the circuit in the high voltage IC 100 and the HV drain terminal 104. In one example, the tap element 108 includes a three terminal (ie, electrode) transistor device configuration, wherein when the applied voltage is less than one of the clamping devices of the transistor device, the first or minute is A voltage at the terminal of the connector is substantially proportional to an applied voltage across the second and third terminals. When the applied voltage across the second and third terminals exceeds the pinch-off voltage, the voltage provided at the tap terminal is substantially constant or cannot change as the applied voltage increases. In one embodiment, the tap element 108 includes a junction field effect transistor (JFET). In operation, tap element 108 provides a buffer between the HV drain terminal 104 and the internal circuitry in the high voltage IC, the series of which is for lower voltages. For example, during normal operation, the HV drain terminal 104 can be exposed to a voltage exceeding 550 V, and the pinch-off voltage (the maximum voltage of the internal circuit exposed to the high voltage IC 100) does not exceed 50 V. As such, the tap element 108 provides a buffer and prevents other internal components in the high voltage IC from reaching a nominal high voltage, which translates into a smaller high voltage IC 100.
如圖所示,修整電路塊116係經由隔離塊114耦接至HV汲極終端104。於作業中,修整電路塊116考量到高電壓IC 100的一修整製程。更特定言之,修整可包含選擇性地閉合(或開啟)一或更多電氣元件,指示該控制器用以調整該高電壓IC之某些操作特性。於一實例中,在高電壓IC 100上完成修整製程用以確保性能符合規格。根據本發明,修整係為在感應設定高電壓IC 100之某些操作特性後,寫入或是編程一反熔絲的製程。如圖所示,修整電路塊116包含一可編程的反熔絲塊122,以及反熔絲編程塊124。於一實例中,可編程的反熔絲塊122係由一系列之反熔絲構造元件或是反熔絲元件之陣列所組成。為了更為具體,根據本揭示內容,一反熔絲係為一電路元件其在一裝置構造中,如同一電容器,提供一正常開啟的電連接,具有二或更多層之金屬、多晶矽或摻雜半導體材料藉由一介電層(例如,氧化物,氮化物等)隔開。介於該二層之間的電連接可藉由施以一大電壓橫越二導體,其作用用以擊穿或破壞該介電層,而永久地閉合,從而讓該二金屬層電氣短路。於作業中,可編程的反熔絲塊122可經由該HV汲極終端104而加以編程。As shown, trim circuit block 116 is coupled to HV drain terminal 104 via isolation block 114. In operation, the trim circuit block 116 takes into account a trimming process of the high voltage IC 100. More specifically, trimming can include selectively closing (or turning on) one or more electrical components, instructing the controller to adjust certain operational characteristics of the high voltage IC. In one example, a trim process is performed on the high voltage IC 100 to ensure performance meets specifications. In accordance with the present invention, trimming is the process of writing or programming an antifuse after sensing certain operating characteristics of the high voltage IC 100. As shown, the trim circuit block 116 includes a programmable anti-fuse block 122 and an anti-fuse programming block 124. In one example, the programmable anti-fuse block 122 is comprised of a series of anti-fuse construction elements or an array of anti-fuse elements. To be more specific, in accordance with the present disclosure, an antifuse is a circuit component that provides a normally open electrical connection in a device configuration, such as the same capacitor, having two or more layers of metal, polysilicon or doped. The hetero semiconductor material is separated by a dielectric layer (eg, oxide, nitride, etc.). The electrical connection between the two layers can be permanently closed by applying a large voltage across the two conductors to break or break the dielectric layer, thereby electrically shorting the two metal layers. Programmable anti-fuse block 122 can be programmed via the HV drain terminal 104 during operation.
如圖所示,反熔絲編程塊124係耦接至LV控制器112及可編程的反熔絲塊122。於一實例中,反熔絲編程塊124包含一系列之選擇器開關,其係與包含在可編程的反熔絲塊122中一個別地相對應的反熔絲串聯電耦接。一選擇器開關可為任一型式之電晶體或開關,其容許電流通過其之對應的反熔絲。於一修整作業期間,反熔絲編程塊124之某些選擇器開關可經啟動(一次一個)用以容許一中電壓(大約V)經施加橫越一反熔絲,該反熔絲之介電質擊穿並容許電流通過。如此,該等選擇器開關耦接至其之對應的反熔絲,當啟動(導通)時,容許反熔絲短路。易言之,當該反熔絲擊穿並容許電流通過時,該反熔絲係經編程的或是寫入。於該修整製程期間,易言之,該等反熔絲、低電壓(LV)控制器112之寫入可輸出一位址信號UADD,啟動位在反熔絲編程塊124中的選擇器開關,因此其之對應的反熔絲係可經編程。如圖所示,一讀取塊126係耦接至可編程反熔絲塊,用以確定可編程的反熔絲塊122中哪個反熔絲已經編程或是短路。如此,LV控制器112可調整高電壓IC 100之操作特性。As shown, the anti-fuse programming block 124 is coupled to the LV controller 112 and the programmable anti-fuse block 122. In one example, the anti-fuse programming block 124 includes a series of selector switches that are electrically coupled in series with an anti-fuse included in the programmable anti-fuse block 122. A selector switch can be any type of transistor or switch that allows current to pass through its corresponding antifuse. During a trimming operation, certain selector switches of the anti-fuse programming block 124 can be activated (one at a time) to allow a medium voltage (about V) to be applied across an anti-fuse. Electrical breakdown and allow current to pass. As such, the selector switches are coupled to their corresponding antifuse, allowing the antifuse to be shorted when activated (on). In other words, when the antifuse breaks down and allows current to pass, the antifuse is programmed or written. During the trimming process, it is easy to say that the writes of the anti-fuse, low voltage (LV) controller 112 can output the address signal U ADD and enable the selector switch in the anti-fuse programming block 124. Therefore, its corresponding anti-fuse system can be programmed. As shown, a read block 126 is coupled to the programmable anti-fuse block to determine which anti-fuse in the programmable anti-fuse block 122 has been programmed or shorted. As such, the LV controller 112 can adjust the operational characteristics of the high voltage IC 100.
於編程作業期間,隔離塊114係“導通”用以將一外部施加中電壓與反熔絲塊122耦接。同時,導通與一待短路的目標反熔絲耦接之反熔絲編程塊124的其中之一選擇器開關。Isolation block 114 is "on" during a programming operation to couple an external applied voltage to anti-fuse block 122. At the same time, one of the selector switches of the anti-fuse programming block 124 coupled to a target anti-fuse to be shorted is turned on.
如此考量到待施加的該外部施加中電壓一次僅橫越一反熔絲,以致一次一電容器短路。“關閉”於反熔絲編程塊124中的所有其他選擇器開關。應察知的是在高電壓IC 100之正常作業期間,隔離塊在分接頭元件108之一節點129處修整電路塊116無法在中電壓(50 V)作業。The external applied voltage to be applied is considered to traverse only one anti-fuse at a time, so that one capacitor is short-circuited at a time. "Close" all other selector switches in the anti-fuse programming block 124. It will be appreciated that during normal operation of the high voltage IC 100, the isolation block trims the circuit block 116 at one of the nodes 129 of the tap element 108 to operate at a medium voltage (50 V).
如圖所示,圖2進一步圖示一示範的高電壓IC 200。如圖所示,高電壓IC 200包含一HV開關202、一HV終端204、源極終端206、分接頭元件208、一LV控制器212、一計算器/解碼器266、一隔離塊214、一修整塊216、一供給終端218、一回饋終端220、一可編程反熔絲塊(222)、一開關塊224、以及一讀取塊226。於一實例中,HV開關202、分接頭元件208、LV控制器212、隔離塊214、修整塊216、開關塊224以及讀取塊226可分別為HV開關102、分接頭元件108、LV控制器112、隔離塊114、修整塊116、反熔絲編程塊124以及讀取塊226的實例。 As shown, FIG. 2 further illustrates an exemplary high voltage IC 200. As shown, the high voltage IC 200 includes a HV switch 202, an HV terminal 204, a source terminal 206, a tap element 208, an LV controller 212, a calculator/decoder 266, an isolation block 214, and a A trim block 216, a supply terminal 218, a feedback terminal 220, a programmable anti-fuse block (222), a switch block 224, and a read block 226. In one example, HV switch 202, tap element 208, LV controller 212, isolation block 214, trim block 216, switch block 224, and read block 226 can be HV switch 102, tap element 108, LV controller, respectively. 112, an example of isolation block 114, trim block 116, anti-fuse programming block 124, and read block 226.
如圖所示,於該實例中,HV IC 200、分接頭元件208可包含一分接頭電晶體構造,保護在高電壓IC中的電路不受大於約80V的電壓影響。例如,當在高電壓(HV)終端204處該電壓係取,比如說550V時,該分接頭電晶體限定在節點236處的最大電壓至大約80V,並亦提供一小(2-3mA)電流。在正常作業狀況下,隔離塊214將修整電路塊216與在一節點236出現的電壓隔離。修整電路塊216之一節點238係顯示經由隔離塊214耦接至節點236。如進一步所示,節點236亦包含分接頭元件208的一第一或“分接頭”終端。分接頭元件208的一第二終端係耦接至HV汲極終端204,其亦可與高電壓開關202之汲極耦接。一第三終端,其係耦接至該JFET分接頭電晶體構造之該閘極,正常地係接地至接地電位。 As shown, in this example, HV IC 200, tap element 208 can include a tap transistor configuration that protects the circuit in the high voltage IC from voltages greater than about 80V. For example, when the voltage is drawn at a high voltage (HV) terminal 204, say 550V, the tap transistor defines a maximum voltage at node 236 to about 80V and also provides a small (2-3 mA) current. . Isolation block 214 isolates trim circuit block 216 from the voltage present at a node 236 under normal operating conditions. Node 238 of one of trim circuit blocks 216 is shown coupled to node 236 via isolation block 214. As further shown, node 236 also includes a first or "tap" terminal of tap element 208. A second terminal of the tap element 208 is coupled to the HV drain terminal 204, which may also be coupled to the drain of the high voltage switch 202. A third terminal coupled to the gate of the JFET tap transistor structure is normally grounded to a ground potential.
熟知半導體技藝之人士將察知的是分接頭元件208及高電壓開關202可經一體成型成一單一裝置構造。應進一 步察知的是節點236可由高電壓IC 200中一外部或是內部電壓源接收一足夠大的電壓,用以修整可編程反熔絲塊222中反熔絲,或是節點236可直接地由一外部電壓源接收電壓。同時察知的是修整塊216及LV控制器212通常係構成在相同的矽材料件上。 Those skilled in the art of semiconductor technology will recognize that tap element 208 and high voltage switch 202 can be integrally formed into a single device configuration. Should enter one It is known that node 236 can receive a sufficiently large voltage from an external or internal voltage source in high voltage IC 200 to trim the antifuse in programmable antifuse block 222, or node 236 can be directly The external voltage source receives the voltage. It will also be appreciated that trim 216 and LV controller 212 are typically constructed of the same 矽 material.
如圖所示,隔離塊214包含一PMOS電晶體230以及一NMOS位準移動電晶體232,以及一位準移動電阻器234。如進一步所示,節點236係耦接至電晶體230之該源極以及耦接至隔離塊214之電阻器234的一端部。於一實例中,PMOS電晶體230可額定上至50V。電阻器234的另一端部係顯示耦接至電晶體230之閘極,並亦耦接至位準移動電晶體232之汲極。電晶體232之源極係接地。實踐者應察知的是隔離塊214之電阻器230其之功能在於在正常的作業情況下,於節點236處將修整塊216與由分接頭元件208所產生的中電壓隔離。 As shown, the isolation block 214 includes a PMOS transistor 230 and an NMOS level shift transistor 232, and a quasi-shift resistor 234. As further shown, the node 236 is coupled to the source of the transistor 230 and to the end of the resistor 234 of the isolation block 214. In one example, PMOS transistor 230 can be rated up to 50V. The other end of the resistor 234 is shown as being coupled to the gate of the transistor 230 and also coupled to the drain of the level shifting transistor 232. The source of the transistor 232 is grounded. It will be appreciated by the practitioner that the resistor 230 of the isolation block 214 functions to isolate the trim block 216 from the medium voltage generated by the tap element 208 at node 236 under normal operating conditions.
於作業中,位準移動電晶體232及電阻器234位準移動控制信號UCON至電阻器230之該閘極控制信號。更特定言之,在位準移動電晶體232之閘極處接收一連接信號UCON,用以“導通”電晶體232,因此,“導通”電晶體230,從而耦接節點236至238。於作業中,連接信號UCON可在一修整作業期間將節點236連接至節點238,並在正常作業期間將節點236自節點238斷開。於一應用中,通過位準移動電晶體232及電阻器234的電流可經設計以致當導通該電晶體232時,電晶體230之閘極-源極電壓係限制在約10 V。於某些具體實施例中,位準移動電晶體232之閘極可經箝制。In operation, the level shifting transistor 232 and the resistor 234 move the control signal U CON to the gate control signal of the resistor 230. More specifically, a connection signal U CON is received at the gate of the level shifting transistor 232 to "turn on" the transistor 232, thereby "turning on" the transistor 230, thereby coupling the nodes 236 through 238. In operation, the connection signal UCON can connect node 236 to node 238 during a trimming operation and disconnect node 236 from node 238 during normal operation. In one application, the current through the level shifting transistor 232 and resistor 234 can be designed such that when the transistor 232 is turned on, the gate-source voltage of the transistor 230 is limited to about 10 volts. In some embodiments, the gate of the level shifting transistor 232 can be clamped.
如圖所示,修整電路塊216進一步包含可編程反熔絲塊222及開關塊224。如圖所示,可編程反熔絲塊222包含複數AF1、AF2...AFn,其中n係為一整數。每一可編程反熔絲元件AF係於節點238與包含在開關塊224中的一對應選擇器開關(SW)之間耦接。在編程之前(亦即,修整),該反熔絲AF並未有任何電流通過;亦即,其顯現為一開路為一正常的直流操作電壓(例如,VDD=5-6 V)。As shown, the trim circuit block 216 further includes a programmable anti-fuse block 222 and a switch block 224. As shown, the programmable anti-fuse block 222 includes a plurality of AF 1 , AF 2 ... AF n , where n is an integer. Each programmable anti-fuse element AF is coupled between node 238 and a corresponding selector switch (SW) included in switch block 224. Prior to programming (ie, trimming), the antifuse AF does not have any current flowing through; that is, it appears as an open circuit to a normal DC operating voltage (eg, VDD = 5-6 V).
於塊216中的一選定反熔絲(例如,AF1)可藉由導通塊224中該對應的選擇器開關(亦即,SW1)而加以編程,並接著在節點238處施加一電壓脈衝(例如,30-35 V,0.5-1.0 mA持續2-5 ms)。對該反熔絲吹氣所需的電壓係視閘極氧化物厚度(例如,針對25奈米氧化物為~30 V)而定。施加該一高電壓脈衝可致使該反熔絲之閘極氧化物構造破裂,導致該反熔絲AF1之頂板與底板之間的一永久性短路,典型地具有一電阻大小為數千歐姆。反熔絲AF1之狀態之後可由讀取塊226藉感應其之電阻而讀取。如此整個揭示內容所說明,可經由該HV汲極終端204外部地提供用以修整該反熔絲編程元件所使用的修整脈衝。A selected anti-fuse (e.g., AF 1 ) in block 216 can be programmed by the corresponding selector switch (i.e., SW 1 ) in turn-on block 224, and then a voltage pulse is applied at node 238. (For example, 30-35 V, 0.5-1.0 mA for 2-5 ms). The voltage required to blow the antifuse is dependent on the gate oxide thickness (eg, ~30 V for 25 nm oxide). Applying the high voltage pulse can cause the anti-fuse gate oxide structure to rupture, resulting in a permanent short between the top plate and the bottom plate of the anti-fuse AF 1 , typically having a resistance of several thousand ohms. The state of the anti-fuse AF 1 can be read by the read block 226 by sensing its resistance. As explained throughout this disclosure, the trimming pulses used to trim the anti-fuse programming component can be externally provided via the HV drain terminal 204.
業界中的實踐者應察知的是與現存齊納二極體比較,修整反熔絲構造AF所需的電流總量係顯著地較小,通常需要>150 mA。此外,熟知此技藝之人士將瞭解的是與先前技藝設計相較,於此所揭示的該可編程反熔絲塊可減小高電壓IC 200之該修整電路塊216的整體尺寸約5或更多倍。於一具體實施例中,可編程反熔絲塊222之每一反熔絲AF包含一極小的閘極氧化物面積,~10 μm2。Practitioners in the industry should be aware that the total amount of current required to trim an antifuse configuration AF is significantly smaller than that of an existing Zener diode, typically requiring >150 mA. Moreover, those skilled in the art will appreciate that the programmable anti-fuse block disclosed herein can reduce the overall size of the trim circuit block 216 of the high voltage IC 200 by about 5 or more as compared to prior art designs. Multiple times. In one embodiment, each of the anti-fuse AFs of the programmable anti-fuse block 222 includes a very small gate oxide area, ~10 μm 2 .
於作業中,可對高電壓IC 200之HV汲極終端204施加一編程或修整HV脈衝,並經由分接頭元件208及隔離塊214轉移至修整塊216。如圖所示,修整電路塊216亦包含開關塊224,其包含複數選擇器開關SW1、SW2...SWn,每一者分別地與一對應的AF1、AF2...AFn耦接。於一具體實施例中,選擇器開關SW係為MOSFETS其可禁得起上至50 V的電壓。為編程一選擇性反熔絲AF,該對應的選擇器開關SW之閘極係藉由將該閘極升高至一高電位而“導通”,同時源極係經由一低阻抗開關而耦接接地。關閉所有其他的選擇器開關SW(與未選擇的反熔絲有關)(例如,利用其之源極經由一高阻抗而耦接接地的閘極接地)。更特定言之,一位址信號UADD經輸送至開關塊224中的一相對應選擇器開關,其與已經選擇而為短路或修整的該反熔絲AF相一致。如此,LV控制器212及解碼器266可輸出位址信號UADD用以隔離並修整針對修整作業所挑選的該反熔絲。In operation, a programmed or trimmed HV pulse can be applied to the HV drain terminal 204 of the high voltage IC 200 and transferred to the trim block 216 via the tap element 208 and the isolation block 214. As shown, the trim circuit block 216 also includes a switch block 224 that includes a plurality of selector switches SW 1 , SW 2 ... SW n , each of which is associated with a corresponding AF 1 , AF 2 ... AF n coupled. In one embodiment, the selector switch SW is a MOSFET S that can withstand voltages up to 50 volts. To program a selective anti-fuse AF, the gate of the corresponding selector switch SW is "turned on" by raising the gate to a high potential, while the source is coupled via a low impedance switch Ground. Turn off all other selector switches SW (related to unselected anti-fuse) (eg, using their source grounded via a high impedance grounded gate). More specifically, the address signal U ADD is delivered to a corresponding selector switch in the switch block 224 that coincides with the anti-fuse AF that has been selected to be shorted or trimmed. As such, LV controller 212 and decoder 266 can output address signal U ADD to isolate and trim the antifuse selected for the trimming operation.
根據一具體實施例中,每次修整一反熔絲AF。複數反熔絲AF可經修整(短路),並連續地執行每一反熔絲AF之修整作業。於修整作業期間,導通隔離塊214中電晶體230,將可編程反熔絲塊連接至節點236。接著將一脈衝電壓施加至HV汲極終端204,致使在節點236處產生一較低的內部電壓。應注意的是施加至HV終端204的脈衝電壓可為數百伏特(例如,600-700 V),但分接頭元件208將在節點236處出現的電壓限制在一更低的電壓電位(例如,約50 V)。According to a specific embodiment, an antifuse AF is trimmed each time. The complex anti-fuse AF can be trimmed (short-circuited) and the trimming operation of each anti-fuse AF is continuously performed. During the trimming operation, the transistor 230 in the isolation block 214 is turned on to connect the programmable anti-fuse block to the node 236. A pulse voltage is then applied to the HV drain terminal 204 causing a lower internal voltage to be generated at node 236. It should be noted that the pulse voltage applied to HV terminal 204 can be hundreds of volts (e.g., 600-700 V), but tap element 208 limits the voltage appearing at node 236 to a lower voltage potential (eg, About 50 V).
熟知此技藝之人士應察知的是高電壓開關202,其於一具體實施例中,可為一MOSFET,係經設計並構成用以在正常作業期間禁得起一高脈衝電壓上至約700 V。於另一實例中,選擇器開關之閘極可經脈衝化,同時在汲極終端204處保持一固定的高電壓。當施加約30 V或更大的一電壓脈衝橫越該選擇的反熔絲AF時,將二終端或電容板隔開的該閘極氧化物破裂,從而將該反熔絲構造編程(短路)。就該等未選擇反熔絲AF而言-亦即,該等未預期加以吹氣或短路者-該對應選擇器開關SW之閘極係經接地以致關閉選擇器開關SW。因此,在底部電路板處出現的電壓(耦接至選擇器開關SW之汲極)潛在地上升,實質上追蹤該頂部板(耦接至節點238)之電壓。因此,該等未選擇的反熔絲AF之該閘極氧化物並未破裂並且該等裝置構造維持斷路。It will be appreciated by those skilled in the art that high voltage switch 202, which in one embodiment, can be a MOSFET, is designed and constructed to withstand a high pulse voltage up to about 700 volts during normal operation. In another example, the gate of the selector switch can be pulsed while maintaining a fixed high voltage at the drain terminal 204. When a voltage pulse of about 30 V or more is applied across the selected anti-fuse AF, the gate oxide separated by the two terminals or the capacitor plates is broken, thereby programming (short-circuiting) the anti-fuse structure. . In the case of such unselected anti-fuse AF - that is, those who are not expected to be blown or shorted - the gate of the corresponding selector switch SW is grounded to close the selector switch SW. Thus, the voltage appearing at the bottom circuit board (coupled to the drain of the selector switch SW) potentially rises, essentially tracking the voltage of the top board (coupled to node 238). Thus, the gate oxides of the unselected antifuse AF are not broken and the device configurations maintain an open circuit.
於作業中,供給引腳218提供電力至高電壓IC 200中的內部電路。於一實例中,供給引腳218可經耦接至一供給電容器,其係藉HV汲極終端204經由分接頭元件208充電。於作業中,回饋終端220提供資訊至LV控制器112,以致其可驅動高電壓開關102。於一實例中,高電壓IC 200係在一開關模式電源中使用,以及高電壓開關102藉由限制一電流通過一耦接感應器或是一變壓器之初級繞組而調整能量的轉移。In operation, supply pin 218 provides power to internal circuitry in high voltage IC 200. In one example, supply pin 218 can be coupled to a supply capacitor that is charged by HV drain terminal 204 via tap element 208. In operation, the feedback terminal 220 provides information to the LV controller 112 such that it can drive the high voltage switch 102. In one example, the high voltage IC 200 is used in a switched mode power supply, and the high voltage switch 102 adjusts the transfer of energy by limiting a current through a coupled inductor or a primary winding of a transformer.
圖3係為用於編程圖2之該具體實施例中所顯示的一反熔絲之一連續步驟的一示範流程圖。該順序係在流程塊310開始,施加5 V電壓至該HV汲極終端202。此係為一安全措施用以確認電流並未流出該HV汲極終端202。於流程塊320中,可使用計算器/解碼器266(例如,計時)用以選擇並導通恰當的選擇器開關SW。亦即,對選擇器開關SW之該閘極施以一電壓,與經選擇用以編程的該反熔絲AF相配合,該閘極電壓係足夠高俾以導通該選擇器開關SW。與該等未選擇的反熔絲有關的其他選擇器開關SW其之閘極耦接接地,確保其維持關閉。Figure 3 is an exemplary flow diagram for programming one of the successive steps of an antifuse shown in the particular embodiment of Figure 2. The sequence begins at block 310 by applying a voltage of 5 V to the HV drain terminal 202. This is a safety measure to confirm that current does not flow out of the HV drain terminal 202. In block 320, a calculator/decoder 266 (eg, timing) can be used to select and turn on the appropriate selector switch SW. That is, a voltage is applied to the gate of the selector switch SW in conjunction with the anti-fuse AF selected for programming, the gate voltage being sufficiently high to turn on the selector switch SW. The other selector switches SW associated with the unselected anti-fuse are coupled to ground to ensure that they remain closed.
接著,如於流程塊330中所示,“導通”位準移動電晶體232,致使電晶體230(P1)導通。實際上,如此容許節點238與節點236耦接,並係為在相同的電壓電位。HV終端204接著以一高電壓脈衝化;亦即,節點236係經升高至~50 V並接著往回向下降低至5 V。於一具體實施例中,可施加一2 ms脈衝持續時間,其具有~100 μs的一上升時間/下降時間。在決定區塊350,假若已針對所有反熔絲完成修整,則完成該製程。假若需要進一步的修整作業,則該流程圖往回進行流程塊320,其中該計算器/解碼器係經計時用以選擇並導通與用於修整作業的該目標反熔絲相對應的下一選擇器開關。Next, as shown in block 330, the "on" level moves the transistor 232 causing the transistor 230 (P1) to conduct. In effect, node 238 is thus coupled to node 236 and is at the same voltage potential. HV terminal 204 is then pulsed with a high voltage; that is, node 236 is boosted to ~50 V and then back down to 5 V. In one embodiment, a 2 ms pulse duration can be applied with a rise/fall time of ~100 μs. At decision block 350, if the trim has been completed for all of the antifuse, the process is completed. If further trimming operations are required, the flow chart proceeds back to block 320 where the calculator/decoder is timed to select and conduct the next selection corresponding to the target antifuse for the trimming operation. Switch.
儘管已結合特定具體實施例說明本發明,但熟知此技藝之人士將察知的是複數的修改及變化係完全地涵蓋於本發明之範疇內。因此,本說明書及圖式係視為一說明性而非一限制的意義。Although the present invention has been described in connection with the specific embodiments thereof, it is to be understood that Accordingly, the specification and drawings are to be regarded as a
AF1..AFn...可編程反熔絲元件AF 1 ..AF n . . . Programmable anti-fuse element
SW...選擇器開關SW. . . Selector switch
UADD...位址信號U ADD . . . Address signal
UCON...連接信號U CON . . . Connection signal
USENSE...感應信號U SENSE . . . Inductive signal
UREAD...讀取信號U READ . . . Read signal
100...高電壓IC100. . . High voltage IC
102...高電壓開關102. . . High voltage switch
104...高電壓汲極終端104. . . High voltage bungee terminal
106...源極終端106. . . Source terminal
108...分接頭元件108. . . Tap component
112...低電壓控制器112. . . Low voltage controller
114...隔離塊114. . . Isolation block
116...修整電路塊116. . . Trimming circuit block
118...供電終端118. . . Power supply terminal
120...回饋終端120. . . Feedback terminal
122...可編程的反熔絲塊122. . . Programmable antifuse block
124...反熔絲編程塊124. . . Anti-fuse programming block
126...讀取塊126. . . Read block
129...節點129. . . node
200...高電壓IC200. . . High voltage IC
202...HV開關202. . . HV switch
204...HV終端204. . . HV terminal
206...源極終端206. . . Source terminal
208...分接頭元件208. . . Tap component
212...LV控制器212. . . LV controller
214...隔離塊214. . . Isolation block
216...修整塊216. . . Trimming block
218...供給終端/供給引腳218. . . Supply terminal / supply pin
220...回饋終端220. . . Feedback terminal
222‧‧‧可編程反熔絲塊 222‧‧‧Programmable anti-fuse block
224‧‧‧開關塊 224‧‧‧Switch block
226‧‧‧讀取塊 226‧‧‧Read block
230‧‧‧PMOS電晶體 230‧‧‧ PMOS transistor
232‧‧‧接地電位/NMOS位準移動電晶體 232‧‧‧ Ground potential / NMOS level moving transistor
234‧‧‧位準移動電阻器 234‧‧‧bit moving resistor
236‧‧‧節點 236‧‧‧ nodes
238‧‧‧節點 238‧‧‧ nodes
266‧‧‧計算器/解碼器 266‧‧‧Calculator/Decoder
310‧‧‧流程塊 310‧‧‧Process block
320‧‧‧流程塊 320‧‧‧Process block
330‧‧‧流程塊 330‧‧‧Process block
340‧‧‧流程塊 340‧‧‧Process block
350‧‧‧流程塊 350‧‧‧Process Block
本揭示內容將由接續的詳細說明並由該等伴隨圖式而更為詳細地瞭解,然而,不應用以限定本發明在所顯示的該等特定具體實施例,而係僅用於解釋與理解。The present disclosure is to be understood by the following detailed description of the accompanying drawings.
圖1圖示一示範的高電壓IC裝置方塊圖。Figure 1 illustrates a block diagram of an exemplary high voltage IC device.
圖2圖示圖1之修整區塊的一示範電路示意圖。2 is a schematic diagram showing an exemplary circuit of the trimming block of FIG. 1.
圖3係為用於修整一高電壓IC之一連續步驟的一示範流程圖。3 is an exemplary flow chart for successive steps of trimming a high voltage IC.
100...高電壓IC100. . . High voltage IC
102...高電壓開關102. . . High voltage switch
104...高電壓汲極終端104. . . High voltage bungee terminal
106...源極終端106. . . Source terminal
108...分接頭元件108. . . Tap component
112...低電壓控制器112. . . Low voltage controller
114...隔離塊114. . . Isolation block
116...修整電路塊116. . . Trimming circuit block
118...供電終端118. . . Power supply terminal
120...回饋終端120. . . Feedback terminal
122...可編程的反熔絲塊122. . . Programmable antifuse block
124...反熔絲編程塊124. . . Anti-fuse programming block
126...讀取塊126. . . Read block
129...節點129. . . node
UADD...位址信號U ADD . . . Address signal
UCON...連接信號U CON . . . Connection signal
USENSE...感應信號U SENSE . . . Inductive signal
UREAD...讀取信號U READ . . . Read signal
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US12/800,095 US8305826B2 (en) | 2010-05-07 | 2010-05-07 | Method and apparatus for programming an anti-fuse element in a high-voltage integrated circuit |
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US10135357B1 (en) | 2017-09-07 | 2018-11-20 | Power Integrations, Inc. | Threshold detection with tap |
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US597776A (en) * | 1898-01-25 | Keyboard for type-writing machines | ||
US5282107A (en) | 1992-09-01 | 1994-01-25 | Power Integrations, Inc. | Power MOSFET safe operating area current limiting device |
US5285369A (en) | 1992-09-01 | 1994-02-08 | Power Integrations, Inc. | Switched mode power supply integrated circuit with start-up self-biasing |
US5977763A (en) | 1996-02-27 | 1999-11-02 | Micron Technology, Inc. | Circuit and method for measuring and forcing an internal voltage of an integrated circuit |
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US6266291B1 (en) | 1999-02-23 | 2001-07-24 | Micron Technology, Inc. | Voltage independent fuse circuit and method |
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US6630724B1 (en) * | 2000-08-31 | 2003-10-07 | Micron Technology, Inc. | Gate dielectric antifuse circuits and methods for operating same |
US6640435B2 (en) | 2001-02-20 | 2003-11-04 | Power Integrations, Inc. | Methods for trimming electrical parameters in an electrical circuit |
US6635544B2 (en) | 2001-09-07 | 2003-10-21 | Power Intergrations, Inc. | Method of fabricating a high-voltage transistor with a multi-layered extended drain structure |
US7221011B2 (en) | 2001-09-07 | 2007-05-22 | Power Integrations, Inc. | High-voltage vertical transistor with a multi-gradient drain doping profile |
US6555873B2 (en) | 2001-09-07 | 2003-04-29 | Power Integrations, Inc. | High-voltage lateral transistor with a multi-layered extended drain structure |
FR2838233A1 (en) * | 2002-04-04 | 2003-10-10 | St Microelectronics Sa | Method for programming memory cells by breaking down antifuse elements |
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US7002398B2 (en) | 2004-07-08 | 2006-02-21 | Power Integrations, Inc. | Method and apparatus for controlling a circuit with a high voltage sense device |
US7102951B2 (en) | 2004-11-01 | 2006-09-05 | Intel Corporation | OTP antifuse cell and cell array |
US7268577B2 (en) | 2004-12-17 | 2007-09-11 | International Business Machines Corporation | Changing chip function based on fuse states |
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US8207580B2 (en) | 2009-05-29 | 2012-06-26 | Power Integrations, Inc. | Power integrated circuit device with incorporated sense FET |
US7932738B1 (en) * | 2010-05-07 | 2011-04-26 | Power Integrations, Inc. | Method and apparatus for reading a programmable anti-fuse element in a high-voltage integrated circuit |
US8164125B2 (en) | 2010-05-07 | 2012-04-24 | Power Integrations, Inc. | Integrated transistor and anti-fuse as programming element for a high-voltage integrated circuit |
US8854065B2 (en) * | 2012-01-13 | 2014-10-07 | Infineon Technologies Austria Ag | Current measurement in a power transistor |
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