TWI522239B - Cover film - Google Patents

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TWI522239B
TWI522239B TW100114207A TW100114207A TWI522239B TW I522239 B TWI522239 B TW I522239B TW 100114207 A TW100114207 A TW 100114207A TW 100114207 A TW100114207 A TW 100114207A TW I522239 B TWI522239 B TW I522239B
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layer
cover film
styrene
resin
heat seal
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TW100114207A
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TW201242769A (en
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佐佐木彰
德永久次
藤村徹夫
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電化股份有限公司
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Description

覆蓋膜Cover film

本發明係關於一種覆蓋膜,其使用於電子零件之包裝體。The present invention relates to a cover film for use in a package of electronic parts.

伴隨電子設備(electronic equipment)之小型化,就所使用之電子零件亦進行小型高性能化,同時在電子設備之組裝步驟中,係在印刷基板上進行零件的自動組裝。表面組裝用電子零件係收納於載體帶,該載體帶係配合電子零件之形狀,以熱成形連續地形成有袋部(pocket)。在收納電子零件後,在載體帶上面重疊作為蓋材之覆蓋膜,以加熱的密封棒(seal bar)在長度方向將覆蓋膜兩端連續地進行熱封,製成包裝體。在覆蓋膜材方面,係使用在二軸延伸的聚酯薄膜基材,使熱塑性樹脂之熱封層積層之物等。該載體帶方面,主要係使用熱塑性樹脂之聚苯乙烯或聚碳酸酯製之物。With the miniaturization of electronic equipment, the electronic components used are also compact and high-performance, and in the assembly process of electronic devices, the components are automatically assembled on the printed circuit board. The surface mount electronic component is housed in a carrier tape which is formed in a shape of an electronic component and continuously formed with a pocket by thermoforming. After the electronic component is housed, a cover film as a cover material is superposed on the carrier tape, and both ends of the cover film are continuously heat-sealed in a longitudinal direction by a heated seal bar to obtain a package. In the case of the cover film, a polyester film base material which is biaxially stretched, a heat seal layer of a thermoplastic resin or the like is used. In terms of the carrier tape, mainly a polystyrene or a polycarbonate made of a thermoplastic resin is used.

近年來,電容器或電阻器、IC、LED、連接器、開關元件等各式各樣電子零件進行顯著的微小化、輕量化、薄型化,為了從該包裝體將收納的電子零件取出,在剝離覆蓋膜時之要求性能,已逐漸比習知還要嚴格。尤其是自載體帶剝離覆蓋膜時之剝離強度,係連續地以預定值之範圍成為一定,收納之電子零件若越微小化、越輕量化,則因剝離時之震動,而使該電子零件跳開,而容易一直產生組裝步驟之問題。In recent years, various types of electronic components such as capacitors, resistors, ICs, LEDs, connectors, and switching elements have been significantly miniaturized, reduced in weight, and thinned, and in order to take out the stored electronic components from the package, they are stripped. The required performance when covering the film has gradually become stricter than conventional. In particular, the peel strength at the time of peeling off the cover film from the carrier tape is continuously constant within a predetermined value range, and the electronic component to be housed becomes smaller and lighter in weight, and the electronic component jumps due to vibration during peeling. It is easy to always have problems with the assembly steps.

亦即,在電子設備等製造步驟之零件組裝時,覆蓋膜藉由來自載體帶之自動剝離裝置而剝離,不過若剝離強度過強時,會有覆蓋膜斷裂之情形,相反地過弱時,則在搬送體移送時,覆蓋膜自載體帶剝離,會有內容物的電子零件脫落之可能性。尤其是,伴隨組裝速度之急遽高速化,覆蓋膜之剝離速度亦為0.1秒以下/生產節拍之極高速化,在剝離時,對覆蓋膜加諸極大的衝擊應力。結果,覆蓋膜被切斷,產生稱為「薄膜斷裂」之問題。That is, when the components of the manufacturing steps of the electronic device are assembled, the cover film is peeled off by the automatic peeling device from the carrier tape, but if the peel strength is too strong, the cover film may be broken, and when it is too weak, When the conveyance body is transferred, the cover film is peeled off from the carrier tape, and the electronic component of the contents may fall off. In particular, with the rapid increase in assembly speed, the peeling speed of the cover film is also 0.1 second or less/the speed of production is extremely high, and when the peeling is performed, a great impact stress is applied to the cover film. As a result, the cover film is cut, causing a problem called "film breakage".

此種薄膜斷裂之對策方面,有提案一種方法,其係在經二軸延伸的聚酯薄膜等之基材與封膠層之間,設置聚丙烯或耐綸或聚胺基甲酸酯等抗衝擊性或抗撕裂傳播性(tear propagation resistance)優異的層之方法(參照專利文獻1至3)。又,有提案一種方法,其中中間層係使用特定比重之金屬茂直鏈狀低密度聚乙烯(LLDPE),藉由將該中間層與基材層間之接著層設成低楊氏模數,而防止對基材層之應力傳播(stress propagation)之方法(參照專利文獻4)。但是,即使藉由該等方法,以每分鐘100m般之高速剝離下,要抑制薄膜斷裂則有困難。In the countermeasure against such film breakage, there is proposed a method in which a polypropylene or a nylon or a polyurethane is provided between a substrate such as a biaxially stretched polyester film and a sealant layer. A method of a layer excellent in impact or tear propagation resistance (see Patent Documents 1 to 3). Further, there is proposed a method in which the intermediate layer is a metallocene linear low density polyethylene (LLDPE) having a specific specific gravity, and the interlayer between the intermediate layer and the substrate layer is set to a low Young's modulus. A method of preventing stress propagation to a base material layer (refer to Patent Document 4). However, even if it is peeled off at a high speed of 100 m per minute by these methods, it is difficult to suppress film breakage.

又,在收納電子零件之包裝體,為了除去含於封閉樹脂的水分,有必要進行烘焙處理。為了提高此種電子零件之量產性,則有必要提高烘焙溫度,並縮短烘焙之時間,在最近使覆蓋膜熱封於載體帶狀態下,例如有開始進行在60℃環境下72小時,或在80℃環境下24小時左右之烘焙處理。在此種情形,在覆蓋膜之熱封面造成電子零件附著,在基板上組裝零件時,會發生組裝不良。但是,先前技術就此種零件附著之問題,並無充分地考慮。Further, in the package in which the electronic component is housed, it is necessary to perform a baking treatment in order to remove moisture contained in the sealing resin. In order to improve the mass production of such electronic parts, it is necessary to increase the baking temperature and shorten the baking time. Recently, the cover film is heat-sealed in a carrier tape state, for example, starting at 60 ° C for 72 hours, or Baking treatment in an environment of 80 ° C for about 24 hours. In this case, the electronic component is attached to the thermal cover of the cover film, and assembly failure occurs when the component is assembled on the substrate. However, prior art problems with the attachment of such parts have not been adequately considered.

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1 日本特開平8-119373號公報Patent Document 1 Japanese Patent Laid-Open No. Hei 8-119373

專利文獻2 日本特開平10-250020號公報Patent Document 2 Japanese Patent Laid-Open No. Hei 10-250020

專利文獻3 日本特開2000-327024號公報Patent Document 3 Japanese Patent Laid-Open Publication No. 2000-327024

專利文獻4 日本特開2006-327624號公報Patent Document 4 Japanese Patent Laid-Open Publication No. 2006-327624

本發明係鑑於該情事而完成者,其主要課題在於提供一種覆蓋膜,其可至少部分地消除伴隨先前覆蓋膜之不良影響。The present invention has been made in view of the circumstances, and its main object is to provide a cover film which at least partially eliminates the adverse effects associated with the prior cover film.

更具體言之,本發明之課題係提供一種覆蓋膜,其係在聚苯乙烯及聚碳酸酯等之載體帶用之覆蓋膜,例如為了取出電子零件,在剝離覆蓋膜時之剝離強度予以連續並在預定範圍內,且即使在高速剝離時,剝離強度之上升少,在例如受到剝離時之振動,而使微小的電子零件跳開,或高速剝離時覆蓋膜之斷裂,因烘焙處理所致零件附著之類的,在組裝步驟之問題不致發生者。More specifically, the subject of the present invention is to provide a cover film which is used for a cover film for a carrier tape such as polystyrene or polycarbonate. For example, in order to take out electronic parts, the peel strength is continuously continuous when the cover film is peeled off. And within a predetermined range, and even at high-speed peeling, the rise in peel strength is small, for example, when the vibration is peeled off, the minute electronic parts are tripped, or the film is broken at the time of high-speed peeling, which is caused by baking treatment. If the parts are attached, the problem in the assembly step will not occur.

本發明人等,就前述課題,經戮力研討,結果首先發現一種覆蓋膜,其藉由設置由具有特定質量平均分子量的特定熱塑性樹脂所組成之熱封層,而可獲得克服本發明之課題的覆蓋膜,而完成本發明。The inventors of the present invention have conducted research on the above-mentioned problems, and as a result, first discovered a cover film which is provided with a heat seal layer composed of a specific thermoplastic resin having a specific mass average molecular weight, thereby achieving the object of overcoming the present invention. The cover film is completed while the present invention is completed.

亦即,本發明之一態樣,係提供一種覆蓋膜,其至少含有基材層(A)、中間層(B)、剝離層(C)及可熱封於載體帶之熱封層(D)而成,熱封層(D)係含有具有5000~20000之質量平均分子量的苯乙烯-丙烯酸系共聚物作為主成分而成。That is, in one aspect of the present invention, there is provided a cover film comprising at least a substrate layer (A), an intermediate layer (B), a release layer (C), and a heat seal layer heat sealable on the carrier tape (D) The heat seal layer (D) is a styrene-acrylic copolymer having a mass average molecular weight of 5,000 to 20,000 as a main component.

在前述中,於一實施態樣中,熱封層(D)之苯乙烯-丙烯酸系共聚物係具有70至100℃玻璃轉移溫度之樹脂。In the foregoing, in one embodiment, the styrene-acrylic copolymer of the heat seal layer (D) is a resin having a glass transition temperature of 70 to 100 °C.

在其他實施態樣中,剝離層(C)係含有芳香族乙烯基含量為15~35質量%之芳香族乙烯-共軛二烯共聚物之氫化樹脂作為主成分而成。又,剝離層(C)及/或熱封層(D)含有導電材。此種導電材在一實施態樣中為導電性微粒,形狀係由針狀、球狀之微粒中任一種或該等之組合所組成。例如導電材為碳奈米材料。In another embodiment, the release layer (C) is a hydrogenated resin containing an aromatic vinyl-conjugated diene copolymer having an aromatic vinyl group content of 15 to 35% by mass as a main component. Further, the release layer (C) and/or the heat seal layer (D) contain a conductive material. In one embodiment, the conductive material is conductive particles, and the shape is composed of any one of needle-like or spherical particles or a combination thereof. For example, the conductive material is a carbon nanomaterial.

再者,本發明亦包含一種電子零件包裝體,其係將前述覆蓋膜作為以熱塑性樹脂作為主成分而成之載體帶之蓋材使用。Furthermore, the present invention also includes an electronic component package in which the cover film is used as a cover material of a carrier tape having a thermoplastic resin as a main component.

根據本發明,可獲得一種覆蓋膜,其係使用具有特定質量平均分子量之特定熱塑性樹脂作為熱封層,並形成聚苯乙烯及聚碳酸酯等之載體帶用之覆蓋膜,故例如為了取出電子零件,在剝離覆蓋膜時之剝離強度予以連續在預定範圍內,且即使在高速剝離時,剝離強度之上升少,剝離時振動所致微小的電子零件之跳開,或高速剝離時覆蓋膜之斷裂,又烘焙處理所致零件附著之組裝步驟之問題不會產生。According to the present invention, it is possible to obtain a cover film which uses a specific thermoplastic resin having a specific mass average molecular weight as a heat seal layer and forms a cover film for a carrier tape such as polystyrene or polycarbonate, so that, for example, in order to take out electrons The peel strength of the part when the cover film is peeled off is continuously within a predetermined range, and even at the time of high-speed peeling, the rise of the peel strength is small, the micro-electronic parts are broken by the vibration at the time of peeling, or the film is covered by the high-speed peeling. The problem of the assembly steps of the fracture and the attachment of the parts caused by the baking treatment does not occur.

本發明之覆蓋膜係含有至少依照基材層(A)、中間層(B)、剝離層(C)、及熱封層(D)之順序而成。本發明覆蓋膜之構成之一例係如第1圖所示。The cover film of the present invention is formed in at least the order of the base material layer (A), the intermediate layer (B), the release layer (C), and the heat seal layer (D). An example of the constitution of the cover film of the present invention is shown in Fig. 1.

基材層(A)係含二軸延伸聚酯、或者二軸延伸耐綸之層,特佳可使用二軸延伸聚對酞酸乙二酯(PET)及二軸延伸聚萘二甲酸乙二酯(PEN)、經二軸延伸的6,6-耐綸、6-耐綸、經二軸延伸的聚丙烯。在二軸延伸PET、二軸延伸PEN、二軸延伸6,6-耐綸、6-耐綸、二軸延伸聚丙烯方面,除了通常所使用之物以外,亦可使用抗靜電處理用之抗靜電劑塗布或揉合之物,或者使用已實施電暈處理或易接著處理等之物。基材層若過薄時,因覆蓋膜本身之拉伸強度變低,故剝離覆蓋膜時時易於發生「薄膜之斷裂」。一方面,過厚時,不僅招致對載體帶之熱封性降低,而且招致成本上升,故通常可適當使用12至25μm厚度之物。The substrate layer (A) is a layer containing a biaxially stretched polyester or a biaxially stretched nylon, and particularly preferably a biaxially oriented polyethylene terephthalate (PET) and a biaxially extended polyethylene naphthalate. Ester (PEN), biaxially stretched 6,6-nylon, 6-nylon, biaxially oriented polypropylene. In the case of two-axis extension PET, two-axis extension PEN, two-axis extension 6,6-nylon, 6-nylon, and biaxially oriented polypropylene, in addition to the commonly used materials, antistatic treatment may also be used. The electrostatic agent is coated or kneaded, or a material which has been subjected to corona treatment or easy subsequent treatment. When the base material layer is too thin, the tensile strength of the cover film itself is lowered, so that the "film breakage" tends to occur when the cover film is peeled off. On the one hand, when it is too thick, not only the heat sealability of the carrier tape is lowered, but also the cost is increased, so that a thickness of 12 to 25 μm can usually be suitably used.

本發明中,在基材層(A)之單面可依照需要經由接著劑層,使中間層(B)積層並設置。構成中間層(B)之樹脂方面,係具有柔軟性,且有適度之剛性,在常溫下之撕裂強度(tear strength)優異之直鏈狀低密度聚乙烯(以下簡稱LLDPE)可適當使用,尤其是藉由使用密度0.900至0.925(×103kg/m3)範圍之樹脂,則因熱封時熱或壓力所致,自覆蓋膜端部之中間層樹脂之擠出難以產生,故不僅熱封時之鏝(trowel)之污染不易產生,而且藉由使覆蓋膜在熱封時,使中間層軟化,因可緩和熱封鏝之接觸不均,則易於獲得剝離覆蓋膜時穩定的剝離強度。In the present invention, the intermediate layer (B) may be laminated and provided on one surface of the base material layer (A) via an adhesive layer as needed. The resin constituting the intermediate layer (B) is soft and has moderate rigidity, and a linear low-density polyethylene (hereinafter abbreviated as LLDPE) excellent in tear strength at normal temperature can be suitably used. In particular, by using a resin having a density in the range of 0.900 to 0.925 (×10 3 kg/m 3 ), extrusion of the intermediate layer resin from the end portion of the cover film is difficult to occur due to heat or pressure during heat sealing, so that it is not only The contamination of the trowel during heat sealing is less likely to occur, and the intermediate layer is softened by heat-sealing the cover film, and since the uneven contact of the heat seal can be alleviated, the peeling of the cover film is easy to obtain. strength.

在LLDPE,有以齊格勒(ziegler)型觸媒所聚合之物,與以金屬茂系觸媒所聚合之物(以下簡稱m-LLDPE)。在m-LLDPE由於控制分子量分布於狹窄範圍,尤其是具有高撕裂強度,故可適當的作為本發明之中間層(B)使用。In the LLDPE, there is a substance polymerized by a ziegler type catalyst and a substance polymerized by a metallocene type catalyst (hereinafter referred to as m-LLDPE). Since the m-LLDPE has a controlled molecular weight distribution in a narrow range, especially a high tear strength, it can be suitably used as the intermediate layer (B) of the present invention.

上述之m-LLDPE,作為共單體係碳數3以上之烯烴、較佳為碳數3至18之直鏈狀、分支狀、被芳香核所取代之α-烯烴與乙烯之共聚物。直鏈狀單烯烴方面,可例舉例如丙烯、1-丁烯、1-戊烯、1-己烯、1-辛烯、1-壬烯、1-癸烯、1-十二烯、1-十四烯、1-十六烯、1-十八烯等。又,分支狀單烯烴方面,可例舉例如3-甲基-1-丁烯、3-甲基-1-戊烯、4-甲基-1-戊烯、2-乙基-1-己烯等。又,以芳香核所取代之單烯烴方面可例舉苯乙烯等。該等共單體可單獨或組合2種以上,並與乙烯共聚。在該共聚中,亦可使丁二烯、異戊二烯、1,3-己二烯、二環戊二烯、5-亞乙基-2-降莰烯等之聚烯類予以共聚。其中,以使用作為共單體之1-己烯、1-辛烯,由於拉伸強度強,又,在成本面亦優異,故可適當使用。The above-mentioned m-LLDPE is a copolymer of an α-olefin having a carbon number of 3 or more, preferably a linear or branched, carbon-substituted chain of 3 to 18, and an α-olefin substituted with an aromatic nucleus. The linear monoolefin may, for example, be propylene, 1-butene, 1-pentene, 1-hexene, 1-octene, 1-decene, 1-decene, 1-dodecene, 1 -tetradecene, 1-hexadecene, 1-octadecene, and the like. Further, as the branched monoolefin, for example, 3-methyl-1-butene, 3-methyl-1-pentene, 4-methyl-1-pentene, 2-ethyl-1-hexyl group can be exemplified. Alkene and the like. Further, examples of the monoolefin substituted with an aromatic nucleus include styrene and the like. These comonomers may be used alone or in combination of two or more and copolymerized with ethylene. In the copolymerization, a polyolefin such as butadiene, isoprene, 1,3-hexadiene, dicyclopentadiene or 5-ethylidene-2-northene may be copolymerized. Among them, 1-hexene and 1-octene which are used as a comonomer are excellent in tensile strength and excellent in cost, and can be suitably used.

該中間層(B)之厚度一般為5至50μm,較佳為10至40μm。中間層(B)之厚度小於5μm時,基材層(A)與中間層(B)間之接著強度恐會不充分,又,將覆蓋膜熱封於載體帶時則難以獲得緩和熱鏝之接觸不均之效果。一方面,超過50μm時,為使覆蓋膜之總厚度較厚,則在熱封覆蓋膜於載體帶時,要獲得充分的剝離強度會有困難之情形。The intermediate layer (B) has a thickness of usually 5 to 50 μm, preferably 10 to 40 μm. When the thickness of the intermediate layer (B) is less than 5 μm, the adhesion strength between the base layer (A) and the intermediate layer (B) may be insufficient, and when the cover film is heat-sealed to the carrier tape, it is difficult to obtain a tempering heat. The effect of uneven exposure. On the other hand, when it exceeds 50 μm, in order to make the total thickness of the cover film thick, it is difficult to obtain sufficient peel strength when heat-sealing the cover film on the carrier tape.

本發明之覆蓋膜,係在該中間層(B)與熱封層(D)之間,設置以熱塑性樹脂作為主成分之剝離層(C)。使用於該剝離層(C)之熱塑性樹脂,可例舉丙烯酸系樹脂、聚酯系樹脂、乙烯-乙酸乙烯酯共聚樹脂(以下簡稱EVA);乙烯-丙烯酸共聚樹脂、乙烯-甲基丙烯酸共聚樹脂、苯乙烯-異戊二烯二嵌段共聚樹脂、苯乙烯-異戊二烯二嵌段共聚物之氫化樹脂;苯乙烯-丁二烯二嵌段共聚樹脂、苯乙烯-丁二烯二嵌段共聚物之氫化樹脂;苯乙烯-異戊二烯-苯乙烯三嵌段共聚物之氫化樹脂(以下簡稱SEPS);苯乙烯-丁二烯-苯乙烯三嵌段共聚物之氫化樹脂(以下簡稱SEBS);苯乙烯-丁二烯無規共聚物之氫化樹脂;苯乙烯-異戊二烯無規共聚物之氫化樹脂等。其中,由苯乙烯比率為15至35質量%所組成之SEPS、SEBS,在剝離覆蓋膜時剝離強度之偏差小可適當使用。The cover film of the present invention is provided with a release layer (C) having a thermoplastic resin as a main component between the intermediate layer (B) and the heat seal layer (D). The thermoplastic resin to be used for the release layer (C) may, for example, be an acrylic resin, a polyester resin or an ethylene-vinyl acetate copolymer resin (hereinafter abbreviated as EVA); an ethylene-acrylic copolymer resin or an ethylene-methacrylic copolymer resin. , styrene-isoprene diblock copolymer resin, hydrogenated resin of styrene-isoprene diblock copolymer; styrene-butadiene diblock copolymer resin, styrene-butadiene di-embedded Hydrogenated resin of segment copolymer; hydrogenated resin of styrene-isoprene-styrene triblock copolymer (hereinafter referred to as SEPS); hydrogenated resin of styrene-butadiene-styrene triblock copolymer (below) SEBS); hydrogenated resin of styrene-butadiene random copolymer; hydrogenated resin of styrene-isoprene random copolymer. Among them, SEPS and SEBS composed of a styrene ratio of 15 to 35 mass% can be suitably used because the deviation of the peel strength is small when the cover film is peeled off.

剝離層(C)之厚度通常為0.1至3μm,較佳為0.1至1.5μm之範圍。剝離層(C)之厚度小於0.1μm時,在將載體帶熱封於覆蓋膜時會有無法顯示充分剝離強度之情形。一方面,剝離層(C)之厚度超過3μm之情形,會有剝離覆蓋膜時產生剝離強度之偏差之虞。此外,如後述,該剝離層(C)及熱封層(D),通常係由塗膜而形成,在以塗膜法形成之情形,在此所謂厚度係乾燥後之厚度。The thickness of the release layer (C) is usually from 0.1 to 3 μm, preferably from 0.1 to 1.5 μm. When the thickness of the release layer (C) is less than 0.1 μm, sufficient peel strength may not be exhibited when the carrier tape is heat-sealed to the cover film. On the other hand, when the thickness of the release layer (C) exceeds 3 μm, there is a possibility that the peel strength is deviated when the cover film is peeled off. Further, as will be described later, the release layer (C) and the heat seal layer (D) are usually formed by a coating film, and in the case of being formed by a coating film method, the thickness after drying is referred to herein as a thickness.

在剝離層(C)可依照需要含有導電材,較佳為含有導電性微粒,其表面電阻率較佳為構成為1×104至1×1012Ω。導電性微粒方面,可例舉導電性氧化錫粒子、導電性氧化鋅粒子、導電性氧化鈦粒子等。其中,摻雜有銻或磷、鎵的氧化錫,顯示高導電性,又因透明性降低少,故可更適當使用。導電性氧化錫粒子、導電性氧化鋅粒子、導電性氧化鈦粒子可使用球狀、或針狀之物,或者該等之混合物。尤其是使用摻雜了銻之針狀氧化錫之情形,可獲得特別具有良好的抗靜電性能之覆蓋膜。相對於構成剝離層(C)之熱塑性樹脂100質量份,導電性微粒之添加量,通常為100至1000質量份,較佳為200至800質量份。導電性微粒之添加量小於100質量份之情形,恐有無法獲得覆蓋膜之熱封層(D)側之表面電阻率為1012Ω以下之物,超過1000質量份時,因相對的熱塑性樹脂之量減少,故恐有難以獲得熱封所致充分剝離強度之虞。The peeling layer (C) may contain a conductive material as needed, preferably contains conductive fine particles, and its surface resistivity is preferably from 1 × 10 4 to 1 × 10 12 Ω. Examples of the conductive fine particles include conductive tin oxide particles, conductive zinc oxide particles, and conductive titanium oxide particles. Among them, tin oxide doped with antimony or phosphorus or gallium exhibits high conductivity and is less suitable for transparency reduction, so that it can be more suitably used. As the conductive tin oxide particles, the conductive zinc oxide particles, and the conductive titanium oxide particles, a spherical shape, a needle-like object, or a mixture of these may be used. In particular, in the case of using acicular tin oxide doped with antimony, a cover film having particularly excellent antistatic properties can be obtained. The amount of the conductive fine particles added is usually from 100 to 1,000 parts by mass, preferably from 200 to 800 parts by mass, per 100 parts by mass of the thermoplastic resin constituting the release layer (C). When the amount of the conductive fine particles added is less than 100 parts by mass, the surface resistivity of the heat seal layer (D) side of the cover film may not be 10 12 Ω or less, and when it exceeds 1000 parts by mass, the relative thermoplastic resin The amount is reduced, so that it is difficult to obtain sufficient peel strength due to heat sealing.

在剝離層(C),導電材亦可含有碳奈米管、碳奈米纖維之至少一種碳奈米材料。其中,較佳是縱橫比10至10000之碳奈米管。相對於構成層之熱塑性樹脂100質量份,對剝離層(C)之碳奈米材料之添加量為0.5至15質量份,較佳為3至10質量份。添加量小於0.5質量份之情形中,無法充分獲得碳奈米材料之添加所致導電性提供之效果,一方面,超過15質量份時,不僅招致成本之上升,而且招致覆蓋膜透明性降低,故隔著覆蓋膜檢查收納零件則有困難。In the release layer (C), the electrically conductive material may also contain at least one carbon nanomaterial of carbon nanotubes or carbon nanofibers. Among them, a carbon nanotube having an aspect ratio of 10 to 10,000 is preferred. The carbon nanomaterial to the release layer (C) is added in an amount of 0.5 to 15 parts by mass, preferably 3 to 10 parts by mass, based on 100 parts by mass of the thermoplastic resin constituting the layer. In the case where the amount of addition is less than 0.5 parts by mass, the effect of providing conductivity by the addition of the carbon nanomaterial cannot be sufficiently obtained. On the other hand, when it exceeds 15 parts by mass, not only an increase in cost but also a decrease in transparency of the cover film is caused. Therefore, it is difficult to inspect the storage parts through the cover film.

在本發明之覆蓋膜,係在剝離層(C)之表面上形成以熱塑性樹脂作為主成分之熱封層(D),該熱塑性樹脂方面,係使用苯乙烯-丙烯酸系共聚物。苯乙烯-丙烯酸系共聚物,係將苯乙烯系單體與(甲基)丙烯酸系單體作為必須成分之共聚物,在苯乙烯系單體方面,可例舉苯乙烯、α-甲基苯乙烯、鄰甲基苯乙烯、間甲基苯乙烯、對甲基苯乙烯、對苯基苯乙烯等,特佳為苯乙烯。該等苯乙烯系單體,可單獨使用或組合2種以上使用。(甲基)丙烯酸系單體方面,可例舉丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸丁酯等之丙烯酸酯;甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯、甲基丙烯酸丁酯、甲基丙烯酸環己酯等之甲基丙烯酸酯等。該等之(甲基)丙烯酸系單體,可單獨使用或組合2種以上使用。又,除了苯乙烯系單體與(甲基)丙烯酸系單體之外,亦可將與該等單體可共聚之其他單體予以少量共聚之物。In the cover film of the present invention, a heat seal layer (D) having a thermoplastic resin as a main component is formed on the surface of the release layer (C), and a styrene-acrylic copolymer is used as the thermoplastic resin. The styrene-acrylic copolymer is a copolymer containing a styrene monomer and a (meth)acrylic monomer as essential components, and examples of the styrene monomer include styrene and α-methylbenzene. Ethylene, o-methyl styrene, m-methyl styrene, p-methyl styrene, p-phenyl styrene, etc., particularly preferably styrene. These styrene monomers may be used singly or in combination of two or more. The (meth)acrylic monomer may, for example, be an acrylate such as methyl acrylate, ethyl acrylate, propyl acrylate or butyl acrylate; methyl methacrylate, ethyl methacrylate or propyl methacrylate; A methacrylate such as butyl methacrylate or cyclohexyl methacrylate. These (meth)acrylic monomers may be used singly or in combination of two or more. Further, in addition to the styrene monomer and the (meth)acrylic monomer, a small amount of another monomer copolymerizable with the monomers may be copolymerized.

以該苯乙烯-丙烯酸系共聚物作為主成分之樹脂,對於構成載體帶之材料的聚苯乙烯或聚碳酸酯等之熱封性極其優異,尤其是可使用以質量平均分子量為5000至20000,較佳為以10000至20000之苯乙烯-丙烯酸系共聚物作為主成分之樹脂。質量平均分子量小於5000,因產生黏性,故收納零件附著於熱封層(D),成為組裝問題之要因。一方面,質量平均分子量超過20000時,在提升剝離速度時,剝離強度上升顯著,成為引起斷裂之原因。又,苯乙烯-丙烯酸系共聚物之玻璃轉移溫度較佳為70℃至100℃。小於70℃,在海運寄送等之輸送環境下,恐有收納零件附著於覆蓋膜之熱封面之虞。The resin containing the styrene-acrylic copolymer as a main component is extremely excellent in heat sealability with respect to polystyrene or polycarbonate which is a material constituting the carrier tape, and particularly, a mass average molecular weight of 5,000 to 20,000 can be used. A resin having a styrene-acrylic copolymer as a main component of 10,000 to 20,000 is preferable. Since the mass average molecular weight is less than 5,000, the viscous property is generated, so that the storage member adheres to the heat seal layer (D), which is a cause of assembly problems. On the other hand, when the mass average molecular weight exceeds 20,000, when the peeling speed is increased, the peel strength is remarkably increased, which causes a fracture. Further, the glass transition temperature of the styrene-acrylic copolymer is preferably from 70 ° C to 100 ° C. When it is less than 70 ° C, in a conveyance environment such as shipping, there is a fear that the storage part adheres to the hot cover of the cover film.

熱封層(D)之厚度為0.1至5μm,較佳為0.1至3μm,更佳為0.1至0.5μm之範圍。熱封層(D)之厚度小於0.1μm之情形,會有熱封層(D)無法顯示充分剝離強度之情形。一方面,熱封層(D)之厚度超過5μm之情形,不僅招致成本之上升,又,剝離覆蓋膜時易於產生剝離強度之偏差。The heat seal layer (D) has a thickness of 0.1 to 5 μm, preferably 0.1 to 3 μm, more preferably 0.1 to 0.5 μm. When the thickness of the heat seal layer (D) is less than 0.1 μm, there is a case where the heat seal layer (D) does not exhibit sufficient peel strength. On the other hand, when the thickness of the heat seal layer (D) exceeds 5 μm, not only the cost is increased, but also the deviation of the peel strength is liable to occur when the cover film is peeled off.

再者,在本發明之適當實施態樣之覆蓋膜中,係在熱封層(D)中添加無機填料。本發明之覆蓋膜,係如前述在熱封於裝有電子零件的載體帶之表面之狀態下,為了除去含於封閉樹脂中之水分,在60℃之環境下72小時、或80℃之環境下24小時左右之條件下,進行烘焙處理,在此種情形屬內容物之電子零件接著於覆蓋膜時,則在剝離覆蓋膜而組裝電子零件之步驟成為問題。在本發明之覆蓋膜,由於剝離覆蓋膜時剝離強度之偏差小,且在60至80℃般之高溫下亦可進行內容物對電子零件之熱封層(D)黏著性之控制,故可相當的消除此種電子零件之附著之問題,不過若添加無機填料於熱封層(D)時,可更確實達成該抗附著。在此,所添加的無機填料,只要有意達成上述抗附著,則任意之物均可,可例舉例如球狀或粉碎形狀之滑石粒子、二氧化矽粒子、氧化鋁粒子、雲母粒子、碳酸鈣、碳酸鎂等。又,為了維持覆蓋膜之透明性,無機填料被製成中值徑(D50)小於200nm之物,使其含有例如10至50質量份。Further, in the cover film of a suitable embodiment of the present invention, an inorganic filler is added to the heat seal layer (D). The cover film of the present invention is in the environment of being heat-sealed on the surface of the carrier tape on which the electronic component is mounted, in order to remove moisture contained in the sealing resin, in an environment of 60 ° C for 72 hours or 80 ° C. The baking treatment is carried out under the conditions of about 24 hours, and in this case, when the electronic component of the content is attached to the cover film, the step of disassembling the cover film to assemble the electronic component becomes a problem. In the cover film of the present invention, since the deviation of the peel strength is small when the cover film is peeled off, and the adhesion of the contents to the heat seal layer (D) of the electronic component can be controlled at a high temperature of 60 to 80 ° C, The problem of adhesion of such an electronic component is considerably eliminated, but if an inorganic filler is added to the heat seal layer (D), the adhesion can be more reliably achieved. Here, the inorganic filler to be added may be any one as long as it is intended to achieve the above-mentioned anti-adhesion, and examples thereof include talc particles in a spherical or pulverized shape, cerium oxide particles, alumina particles, mica particles, and calcium carbonate. , magnesium carbonate and the like. Further, in order to maintain the transparency of the cover film, the inorganic filler is formed to have a median diameter (D50) of less than 200 nm, and is contained, for example, in an amount of 10 to 50 parts by mass.

再者,在本發明之覆蓋膜,雖在剝離層(C)含有導電材,不過在一實施態樣中,在熱封層(D)亦使之含有導電材,其表面電阻率亦可構成為較佳為1×104至1×1012Ω。或者,在其他實施態樣中,在剝離層(C)不使之含有導電材,亦可僅在熱封層(D)含有導電材。在此,使之含有之導電材之種類或其量,就含於剝離層(C)之情形亦與前述相同。Further, in the cover film of the present invention, the conductive layer is contained in the release layer (C), but in an embodiment, the heat seal layer (D) is also made to contain a conductive material, and the surface resistivity thereof may also be formed. It is preferably 1 × 10 4 to 1 × 10 12 Ω. Alternatively, in other embodiments, the peeling layer (C) may not contain a conductive material, and the conductive material may be contained only in the heat seal layer (D). Here, the case where the type of the conductive material contained therein or the amount thereof is contained in the peeling layer (C) is also the same as described above.

製作上述覆蓋膜之方法並無特別限定,可使用一般的方法。例如,事先將聚胺基甲酸酯、聚酯、聚烯烴、聚伸乙亞胺等接著劑塗布於基材層(A)之例如二軸延伸聚酯之薄膜表面,藉由將成為中間層(B)之例如以m-LLDPE作為主成分之樹脂組成物,自T模予以擠壓,在增黏劑(anchor coat agent)之塗布面予以塗膜,則製成由基材層(A)與中間層(B)所成之二層薄膜。再者,在中間層(B)之表面,將剝離層(C)藉由例如凹版塗布機、逆塗布機、吻合塗布機、氣刀塗布機、麥耶棒塗布機、浸漬式塗布機等進行塗膜。在此情形,在塗膜前,較佳為事先進行中間層(B)表面的電暈處理或臭氧處理,特佳為進行電暈處理。再者在塗布於中間層(B)之剝離層(C)之上,將構成熱封層(D)之樹脂組成物,例如藉由凹版塗布機、逆塗布機、吻合塗布機、氣刀塗布機、麥耶棒塗布機、浸漬式塗布機等而塗膜,則可獲得作為目的之覆蓋膜。The method for producing the above-mentioned cover film is not particularly limited, and a general method can be used. For example, an adhesive such as a polyurethane, a polyester, a polyolefin, or a polyethyleneimide is applied to the surface of the substrate layer (A) such as a biaxially stretched polyester film in advance, thereby being an intermediate layer. (B) A resin composition containing, for example, m-LLDPE as a main component, which is extruded from a T-die and coated on a coated surface of an anchor coat agent to form a substrate layer (A) A two-layer film formed with the intermediate layer (B). Further, on the surface of the intermediate layer (B), the release layer (C) is applied by, for example, a gravure coater, a reverse coater, an applicator coater, an air knife coater, a Meyer bar coater, a dipping coater, or the like. Coating film. In this case, it is preferred to perform corona treatment or ozone treatment on the surface of the intermediate layer (B) before the coating, and it is particularly preferable to carry out corona treatment. Further, on the release layer (C) applied to the intermediate layer (B), the resin composition constituting the heat seal layer (D) is coated, for example, by a gravure coater, a reverse coater, an applicator coater, or an air knife. A coating film can be obtained by coating a film with a machine, a Meyer bar coater, a dipping coater, or the like.

其他方法,係將中間層(B)預先以T模鑄製法、或者膨脹(inflation)法等予以製膜,將其與基材層(A),以經由聚胺基甲酸酯、聚酯、聚烯烴等之接著劑而接著之乾貼合法,而可獲得由基材層(A)與中間層(B)所組成之薄膜,藉由在該中間層(B)之表面塗布剝離層(C)與熱封層(D),而可獲得作為目的之覆蓋膜。In another method, the intermediate layer (B) is formed into a film by a T-die casting method or an inflation method in advance, and is bonded to the base material layer (A) via a polyurethane, a polyester, or the like. A film composed of a base material layer (A) and an intermediate layer (B) can be obtained by applying a release agent to the surface of the intermediate layer (B) by using an adhesive of a polyolefin or the like and then dry-bonding the film. With the heat seal layer (D), a cover film for the purpose can be obtained.

再者其他方法,即使藉由砂積層法,亦可獲得作為目的之覆蓋膜。亦即將構成第一中間層之薄膜以T模鑄製法、或者膨脹法等製膜。接著,在該第一中間層之薄膜與基材層(A)薄膜之間,供給以已熔融的m-LLDPE作為主成分之樹脂組成物,形成第二中間層,予以積層,獲得作為目的之覆蓋膜之基材層(A)、與由第一中間層及第二中間層所組成之中間層(B)所構成之薄膜後,進一步在中間層(B)側之表面塗布剝離層(C)與熱封層(D),可獲得作為目的之薄膜。在該方法之情形,亦與前述方法相同,一般是使用將接著劑塗膜於使基材層(A)之薄膜積層之側之面之物。Further, in other methods, a desired cover film can be obtained by the sand layer method. The film constituting the first intermediate layer is also formed into a film by a T-die casting method or an expansion method. Next, a resin composition containing molten m-LLDPE as a main component is supplied between the film of the first intermediate layer and the film of the base layer (A) to form a second intermediate layer, which is laminated to obtain a purpose. After the film of the base layer (A) of the cover film and the intermediate layer (B) composed of the first intermediate layer and the second intermediate layer, a release layer (C) is further applied to the surface of the intermediate layer (B) side. With the heat seal layer (D), a film for the purpose can be obtained. In the case of this method, as in the case of the above method, generally, an adhesive is applied to the surface of the side of the film layer of the base material layer (A).

除了前述步驟,亦可依照需要,在覆蓋膜之至少單面進行抗靜電處理。可藉由使用凹版輥之輥塗布機或擋邊塗布機(lip coater)、噴灑等而塗布作為抗靜電劑的例如陰離子系、陽離子系、非離子系、甜菜鹼(betaine)系等界面活性劑型抗靜電劑、或分散於高分子型抗靜電劑及黏合劑的導電材等。又,為了均勻地塗布該等抗靜電劑,在進行抗靜電處理之前,較佳係在薄膜表面進行電暈放電處理或臭氧處理,特佳為電暈放電處理。In addition to the foregoing steps, antistatic treatment may be performed on at least one side of the cover film as needed. The surfactant type such as an anionic, cationic, nonionic or betaine can be applied as an antistatic agent by a roll coater, a lip coater, a spray or the like using a gravure roll. An antistatic agent or a conductive material dispersed in a polymer type antistatic agent and a binder. Further, in order to uniformly apply the antistatic agents, it is preferred to perform corona discharge treatment or ozone treatment on the surface of the film before the antistatic treatment, and particularly preferably corona discharge treatment.

覆蓋膜係作為屬電子零件之收納容器的載體帶之蓋材使用。載體帶係指具有用以收納電子零件之袋部的寬8mm至100mm左右之帶狀物。在將覆蓋膜作為蓋材進行熱封之情形,構成載體帶之材質並無特別限定,亦可使用市售之物,例如可使用聚苯乙烯、聚酯、聚碳酸酯、聚二氯乙烯等。在熱封層使用丙烯酸系樹脂之情形,聚苯乙烯及聚碳酸酯之載體帶之組合可適當使用。載體帶係藉由將碳黑或碳奈米管在樹脂中揉合而提供導電性之物;使抗靜電劑或導電材揉合之物,或者藉由在表面塗布將界面活性劑型之抗靜電劑或聚吡咯、聚噻吩等之導電物分散於丙烯酸等之有機黏合劑的塗膜液,而提供抗靜電性之物。The cover film is used as a cover material for a carrier tape belonging to a storage container of an electronic component. The carrier tape refers to a belt having a width of about 8 mm to 100 mm for accommodating the pocket portion of the electronic component. In the case where the cover film is heat-sealed as a cover material, the material constituting the carrier tape is not particularly limited, and a commercially available product may be used. For example, polystyrene, polyester, polycarbonate, polyvinyl chloride, or the like may be used. . In the case where an acrylic resin is used for the heat seal layer, a combination of a carrier tape of polystyrene and polycarbonate can be suitably used. The carrier tape provides electrical conductivity by kneading carbon black or carbon nanotubes in the resin; compounding the antistatic agent or the conductive material, or antistatic of the surfactant type by coating on the surface The conductive agent such as polypyrrole or polythiophene is dispersed in a coating liquid of an organic binder such as acrylic acid to provide an antistatic property.

收納了電子零件之包裝體,例如在載體帶之電子零件收納部收納電子零件等後,使覆蓋膜作為蓋材,使覆蓋膜長度方向之兩緣部連續地熱封進行包裝,藉由捲繞於捲軸(reel)而可獲得。藉由包裝成該形態,則電子零件等可保管、搬送。收納於電子零件等之包裝體,係使用設置於載體帶長度方向之緣部的載體帶搬送用之稱為鏈齒孔(sprocket hole)之孔,一面搬送,一面斷續地剝離覆蓋膜,以零件組裝裝置而在確認電子零件等之存在、方向、位置之同時予以取出,進行對基板之組裝。In the package in which the electronic component is housed, for example, after the electronic component is housed in the electronic component storage portion of the carrier tape, the cover film is used as a cover material, and both edges of the cover film in the longitudinal direction are continuously heat-sealed and packaged, and wound by Available from reel. By packaging in this form, electronic parts and the like can be stored and transported. The package that is stored in an electronic component or the like is used as a sprocket hole for transporting a carrier tape provided on the edge of the carrier tape in the longitudinal direction, and is conveyed while intermittently peeling off the cover film. The component assembly device removes the presence, direction, and position of the electronic component and the like, and assembles the substrate.

再者,在撕去覆蓋膜時,若剝離強度太小時,則自載體帶造成剝離,恐有收納零件脫落之虞,太大時,則與載體帶之剝離變得困難,同時剝離覆蓋膜時,恐有使之斷裂之虞,故在120至220℃予以熱封之情形,較佳是具有0.05至1.0N之剝離強度之物,且就剝離強度之偏差,較佳是低於0.4N。Further, when the cover film is torn off, if the peel strength is too small, peeling occurs from the carrier tape, and the storage member may be peeled off. If it is too large, peeling from the carrier tape may become difficult, and at the same time, the cover film may be peeled off. There is a fear that the crucible is broken, so that it is preferably heat-sealed at 120 to 220 ° C, preferably having a peel strength of 0.05 to 1.0 N, and preferably less than 0.4 N in terms of deviation in peel strength.

[實施例][Examples]

茲以實施例進一步詳細說明本發明,不過本發明並非限定於該等。The present invention will be described in further detail by way of examples, but the invention is not limited thereto.

[使用的原料][Materials used]

在實施例及比較例中,在基材層(A)、中間層(B)、剝離層(C)及熱封層(D)使用以下之原料。In the examples and comparative examples, the following raw materials were used for the base material layer (A), the intermediate layer (B), the release layer (C), and the heat seal layer (D).

(基材層(A))(Substrate layer (A))

二軸延伸聚對酞酸乙二酯薄膜(東洋紡公司製),厚度12μmBiaxially extended polyethylene terephthalate film (manufactured by Toyobo Co., Ltd.), thickness 12μm

(中間層(B))(middle layer (B))

m-LLDPE:LL-UL(Futamura化學公司製薄膜),厚度40μmm-LLDPE: LL-UL (film manufactured by Futamura Chemical Co., Ltd.), thickness 40 μm

(剝離層(C)之樹脂)(Resin of layer (C))

(c-1)樹脂:Tuftec H1041(旭化成化學品公司製),苯乙烯-丁二烯-苯乙烯三嵌段共聚物之氫化樹脂(SEBS),苯乙烯比率30質量%(c-1) Resin: Tuftec H1041 (manufactured by Asahi Kasei Chemicals Co., Ltd.), hydrogenated resin (SEBS) of styrene-butadiene-styrene triblock copolymer, styrene ratio 30% by mass

(c-2)樹脂:Septon 2007(Kuraray公司製),苯乙烯-異戊二烯-苯乙烯三嵌段共聚物之氫化樹脂(SEPS),苯乙烯比率30質量%(c-2) Resin: Septon 2007 (manufactured by Kuraray Co., Ltd.), hydrogenated resin (SEPS) of styrene-isoprene-styrene triblock copolymer, styrene ratio of 30% by mass

(c-3)樹脂:Tuftec H1051(旭化成化學品公司製),苯乙烯-丁二烯-苯乙烯三嵌段共聚物之氫化樹脂(SEBS),苯乙烯比率42質量%(c-3) Resin: Tuftec H1051 (manufactured by Asahi Kasei Chemicals Co., Ltd.), hydrogenated resin (SEBS) of styrene-butadiene-styrene triblock copolymer, styrene ratio 42% by mass

(在剝離層(C)中調配之導電材)(conductive material formulated in the peeling layer (C))

(c-4)導電材:FSS-10T(石原產業公司製),針狀銻摻雜氧化錫,數量平均長徑2μm,甲苯分散型(c-4) Conductive material: FSS-10T (manufactured by Ishihara Sangyo Co., Ltd.), erbium-doped tin oxide, number average long diameter 2 μm, toluene dispersion type

(c-5)導電材:SNS-10T(石原產業公司製),球狀銻摻雜氧化錫,中值徑(D50)100nm,甲苯分散型(c-5) Conductive material: SNS-10T (manufactured by Ishihara Sangyo Co., Ltd.), spherical yttrium-doped tin oxide, median diameter (D50) 100 nm, toluene dispersion type

(c-6)導電材:DCNT-263D-1(大同塗料公司製),碳奈米管,直徑10至20nm,數量平均長徑0.1至10μm(c-6) Conductive material: DCNT-263D-1 (manufactured by Datong Coating Co., Ltd.), carbon nanotubes, 10 to 20 nm in diameter, and an average number of long diameters of 0.1 to 10 μm

(熱封層(D)之樹脂)(resin of heat seal layer (D))

(d-1)樹脂:Daikalac S-7069A(大同化成工業公司製),苯乙烯-丙烯酸共聚物樹脂,質量平均分子量9000,玻璃轉移溫度80℃(d-1) Resin: Daikalac S-7069A (manufactured by Datong Chemical Industry Co., Ltd.), styrene-acrylic copolymer resin, mass average molecular weight 9000, glass transition temperature 80 °C

(d-2)樹脂:Daikalac S-7069B(大同化成工業公司製),苯乙烯-丙烯酸共聚物樹脂,質量平均分子量12000,玻璃轉移溫度80℃(d-2) Resin: Daikalac S-7069B (manufactured by Datong Chemical Industry Co., Ltd.), styrene-acrylic copolymer resin, mass average molecular weight 12000, glass transition temperature 80 °C

(d-3)樹脂:Daikalac S-7069C(大同化成工業公司製),苯乙烯-丙烯酸共聚物樹脂,質量平均分子量16000、玻璃轉移溫度80℃(d-3) Resin: Daikalac S-7069C (manufactured by Datong Chemical Industry Co., Ltd.), styrene-acrylic copolymer resin, mass average molecular weight 16000, glass transition temperature 80 °C

(d-4)樹脂:Daikalac 8020(大同化成工業公司製),苯乙烯-丙烯酸共聚物樹脂,質量平均分子量8000、玻璃轉移溫度90℃(d-4) Resin: Daikalac 8020 (manufactured by Datong Chemical Industry Co., Ltd.), styrene-acrylic copolymer resin, mass average molecular weight 8000, glass transition temperature 90 °C

(d-5)樹脂:Daikalac 8000(大同化成工業公司製),苯乙烯-丙烯酸共聚物樹脂,質量平均分子量9000,玻璃轉移溫度66℃(d-5) Resin: Daikalac 8000 (manufactured by Datong Chemical Industry Co., Ltd.), styrene-acrylic copolymer resin, mass average molecular weight 9000, glass transition temperature 66 ° C

(d-6)樹脂:Daikalac S-7069D(大同化成工業公司製),苯乙烯-丙烯酸共聚物樹脂,質量平均分子量22000,玻璃轉移溫度80℃(d-6) Resin: Daikalac S-7069D (manufactured by Datong Chemical Industry Co., Ltd.), styrene-acrylic copolymer resin, mass average molecular weight 22000, glass transition temperature 80 °C

(d-7)樹脂:Daikalac 8085(大同化成工業公司製),丙烯酸樹脂,質量平均分子量4000,玻璃轉移溫度90℃(d-7) Resin: Daikalac 8085 (manufactured by Datong Chemical Industry Co., Ltd.), acrylic resin, mass average molecular weight 4000, glass transition temperature 90 °C

(d-8)樹脂:Dianal BR-113(三菱Rayon公司製),丙烯酸樹脂,質量平均分子量30000,玻璃轉移溫度75℃(d-8) Resin: Dianal BR-113 (manufactured by Mitsubishi Rayon Co., Ltd.), acrylic resin, mass average molecular weight 30000, glass transition temperature 75 ° C

(添加於熱封層(D)之無機填料)(Inorganic filler added to heat seal layer (D))

(d-9)無機填料:MEK-ST-ZL(日產化學公司製),二氧化矽填料,中值徑(D50)100nm(d-9) Inorganic filler: MEK-ST-ZL (manufactured by Nissan Chemical Co., Ltd.), cerium oxide filler, median diameter (D50) 100 nm

(添加於熱封層(D)之導電材)(Electrically conductive material added to the heat seal layer (D))

(d-10)導電材:FSS-10T(石原產業公司製),針狀銻摻雜氧化錫,數量平均長徑2μm,甲苯分散型(d-10) Conductive material: FSS-10T (manufactured by Ishihara Sangyo Co., Ltd.), acicular yttrium doped tin oxide, number average long diameter 2 μm, toluene dispersion type

[實施例1][Example 1]

在厚度12μm之二軸延伸聚酯薄膜之表面,藉由凹版法塗膜聚酯系之增黏劑後,以乾層合法將利用金屬茂觸媒聚合的由[m-LLDPE]所成之厚度40μm之薄膜予以積層,獲得由二軸延伸聚酯層(基材層)及m-LLDPE層(中間層)所成之積層薄膜。接著,在該薄膜之m-LLDPE面實施電暈處理後,混合利用環己烷溶解之[(c-1)樹脂]與銻摻雜氧化錫分散液[(c-4)導電材],以使固體成分比成為(c-1):(c-4)=100:300質量份,在實施該電暈處理之面上,以凹版法塗膜成為乾燥厚度0.4μm厚度,並製成剝離層。再者,藉由在剝離層之塗膜面上,作為熱封層係混合苯乙烯樹脂及甲基丙烯酸樹脂之無規共聚物[(d-1)樹脂]、與[(d-9)無機填充劑],以使固體成分質量比成為(d-1):(d-9)=100:50;以凹版法將溶解於MEK之溶液塗膜,以使乾燥後厚度成為0.6μm,而獲得具有抗靜電性能之載體帶用覆蓋膜。On the surface of a biaxially stretched polyester film having a thickness of 12 μm, a polyester-based tackifier is applied by a gravure method, and the thickness of [m-LLDPE] polymerized by the metallocene catalyst is dry-processed. A 40 μm film was laminated to obtain a laminated film composed of a biaxially stretched polyester layer (base material layer) and an m-LLDPE layer (intermediate layer). Next, after performing corona treatment on the m-LLDPE side of the film, mixing [(c-1) resin] dissolved in cyclohexane and yttrium-doped tin oxide dispersion [(c-4) conductive material] The solid content ratio was changed to (c-1):(c-4)=100:300 parts by mass, and on the surface subjected to the corona treatment, the film was coated by a gravure method to have a dry thickness of 0.4 μm, and a release layer was formed. Further, a random copolymer [(d-1) resin] and [(d-9) inorganic compound of a styrene resin and a methacrylic resin are mixed as a heat seal layer on the coating film surface of the release layer. a filler] so that the mass ratio of the solid component is (d-1): (d-9) = 100:50; a solution of the solution dissolved in MEK is applied by a gravure method so that the thickness after drying becomes 0.6 μm. A cover film for a carrier tape having antistatic properties.

[實施例2至10、比較例4至6][Examples 2 to 10, Comparative Examples 4 to 6]

除了使用表1及表2記載之樹脂等之原料,形成剝離層及熱封層以外,其他則與實施例1同樣地製作覆蓋膜。A cover film was produced in the same manner as in Example 1 except that the raw materials such as the resins described in Tables 1 and 2 were used, and the release layer and the heat seal layer were formed.

[比較例1][Comparative Example 1]

除了不設置中間層,而在厚度50μm之基材層上依順序形成剝離層及熱封層以外,其他則與實施例1同樣地製作覆蓋膜。A cover film was produced in the same manner as in Example 1 except that the peeling layer and the heat seal layer were sequentially formed on the base material layer having a thickness of 50 μm without providing the intermediate layer.

[比較例2][Comparative Example 2]

除了不設置剝離層,使用表2記載的樹脂等之原料形成中間層及熱封層以外,其他則與實施例1同樣地,製作覆蓋膜。A cover film was produced in the same manner as in Example 1 except that the intermediate layer and the heat seal layer were formed using the raw materials such as the resin described in Table 2, except that the release layer was not provided.

[比較例3][Comparative Example 3]

除了不設置熱封層,使用表2記載的樹脂等之原料,形成中間層及剝離層以外,其他則與實施例1同樣地製作覆蓋膜。A cover film was produced in the same manner as in Example 1 except that the heat seal layer was not provided, and the raw material such as the resin described in Table 2 was used to form the intermediate layer and the release layer.

[評價方法][Evaluation method]

關於各實施例及各比較例所製作的電子零件之載體帶用覆蓋膜,進行下述所示評價。該等結果各自在表1及表2表示。The coating film for a carrier tape of an electronic component produced in each of the examples and the comparative examples was evaluated as described below. These results are shown in Tables 1 and 2, respectively.

(1)霧值(1) Fog value

依照JIS K 7105:1998之測定法A,使用積分球式測定裝置,測定霧值。結果如表1及表2之霧值之欄所示。The haze value was measured in accordance with the measurement method A of JIS K 7105:1998 using an integrating sphere type measuring device. The results are shown in the columns of the haze values in Tables 1 and 2.

(2)密封性(2) Sealing

使用捆紮(taping)機(澀谷工業公司,ETM-480),以密封頭寬0.5mmx2、密封頭長32mm、密封壓力0.1MPa、饋送長4mm、密封時間0.1秒×8次,在密封鏝溫度140℃至190℃,以10℃間隔,將5.5mm寬之覆蓋膜熱封於8mm寬之聚碳酸酯製載體帶(電化學工業公司製)、及聚苯乙烯製載體帶(電化學工業公司製)。在溫度23℃、相對濕度50%之環境下放置24小時後,以相同溫度23℃、相對濕度50%之環境下,以每分300mm之速度、剝離角度170至180°剝離覆蓋膜,在密封鏝溫度140℃至190℃,以10℃間隔進行熱封時之平均剝離強度在0.3至0.9N之範圍之物以「優」表示,雖有平均剝離強度成為0.3至0.9N之區域之密封鏝溫度範圍,不過密封鏝溫度140℃至190℃為止,以10℃間隔進行熱封時的平均剝離強度超出0.3至0.9N範圍之密封鏝溫度範圍之物以「良」表示,即使在任意密封鏝溫度中平均剝離強度也不在0.3至0.9N之區域內之物以「不良」表示。結果如表1及表2之密封性之欄所示。Use taping machine (Shibuya Industrial Co., Ltd., ETM-480) to seal head width 0.5mmx2, seal head length 32mm, sealing pressure 0.1MPa, feed length 4mm, sealing time 0.1 second × 8 times, at sealing 镘 temperature 140 ° C to 190 ° C, at a 10 ° C interval, a 5.5 mm wide cover film is heat-sealed to a polyethylene carrier tape of 8 mm width (manufactured by Electrochemical Industries, Inc.), and a carrier tape made of polystyrene (Electrochemical Industry Co., Ltd.) system). After being allowed to stand in an environment of a temperature of 23 ° C and a relative humidity of 50% for 24 hours, the cover film was peeled off at a speed of 300 mm per minute and a peeling angle of 170 to 180° in an environment of the same temperature of 23 ° C and a relative humidity of 50%.镘 The temperature is 140 ° C to 190 ° C, and the average peel strength at the time of heat sealing at intervals of 10 ° C is in the range of 0.3 to 0.9 N, which is represented by "excellent", although there is a seal having an average peel strength of 0.3 to 0.9 N. Temperature range, except that the sealing enthalpy temperature is 140 ° C to 190 ° C, and the average peel strength at the time of heat sealing at 10 ° C intervals exceeds the sealing 镘 temperature range of 0.3 to 0.9 N, which is expressed as "good", even in any seal 镘The matter in which the average peel strength in the temperature is not in the range of 0.3 to 0.9 N is represented by "poor". The results are shown in the columns of the seals of Tables 1 and 2.

(3)剝離強度之偏差(3) Deviation of peel strength

進行熱封,以使相對於聚苯乙烯製載體帶(電氣化學工業公司製)之剝離強度為0.4N。覆蓋膜係與前述(2)密封性相同條件下剝離。在剝離方向以100mm分剝離覆蓋膜時,自所得之圖表導出剝離強度之偏差。剝離強度之偏差為0.2N以下之物標記為「優」,為0.2至0.4N之物標記為「良」,大於0.4N之物標記為「不良」,關於剝離強度不足0.4N之物則標記為「未評價」。結果如表1及表2之剝離之偏差欄所示。The heat-sealing was performed so that the peeling strength with respect to the polystyrene carrier tape (manufactured by Denki Kagaku Kogyo Co., Ltd.) was 0.4 N. The cover film was peeled off under the same conditions as the above (2). When the cover film was peeled off at a peeling direction of 100 mm, the deviation of the peel strength was derived from the obtained chart. The deviation of the peeling strength of 0.2N or less is marked as "excellent", the thing of 0.2 to 0.4N is marked as "good", the substance of more than 0.4N is marked as "poor", and the article having a peeling strength of less than 0.4N is marked. It is "not evaluated". The results are shown in the deviation column of the peeling of Tables 1 and 2.

(4)覆蓋膜之剝離速度仰賴性(4) peeling speed dependence of the cover film

進行熱封,以使相對於聚苯乙烯製載體帶(電氣化學工業公司製)之剝離強度成為0.4N。將覆蓋膜與該(2)密封性在相同條件下剝離。剝離速度變更為每分2000mm,剝離強度之平均值從0.4至0.5N之物為「優」,由0.5至0.6N之物為「良」,大於0.6N之物為「不良」。結果如表1及表2之剝離之偏差欄所示。The heat-sealing was performed so that the peeling strength with respect to the polystyrene carrier tape (manufactured by Electric Chemical Industry Co., Ltd.) was 0.4 N. The cover film was peeled off under the same conditions as the (2) sealing property. The peeling speed was changed to 2000 mm per minute, and the average peeling strength was from 0.4 to 0.5 N, which was "excellent", from 0.5 to 0.6 N, "good", and those larger than 0.6 N were "poor". The results are shown in the deviation column of the peeling of Tables 1 and 2.

(5)覆蓋膜之抗斷裂性(5) Fracture resistance of the cover film

進行熱封以使相對於聚苯乙烯製載體帶(電氣化學工業公司製)之剝離強度為1.0N。將覆蓋膜與前述(2)密封性在相同條件下剝離。切取550mm之長度的密封有覆蓋膜的載體帶,在貼有兩面黏著帶之垂直的壁上黏貼載體帶之袋部底部。自為黏貼之載體帶上部剝離50mm之覆蓋膜,以夾具夾持覆蓋膜,在該夾具安裝質量1000g之秤砝碼。其後,在使秤砝碼自然落下時,在50試樣中連1試樣之覆蓋膜也無斷裂之物以「優」表示,在50試樣中有1至5試樣之覆蓋膜斷裂之物以「良」表示,有5試樣以上斷裂之物以「不良」表示。結果如表1及表2之抗薄膜斷裂性之欄所示。The heat-sealing was performed so that the peeling strength with respect to the polystyrene carrier tape (manufactured by Denki Kagaku Kogyo Co., Ltd.) was 1.0 N. The cover film was peeled off under the same conditions as the above (2) sealing property. A carrier tape sealed with a cover film of a length of 550 mm was cut, and the bottom of the bag portion of the carrier tape was adhered to the vertical wall to which the adhesive tape on both sides was attached. A cover film of 50 mm was peeled off from the upper side of the carrier tape for adhering, and the cover film was clamped by a jig, and a weight of 1000 g was attached to the jig. Thereafter, when the weight of the scale is naturally dropped, the film which is not broken in the sample of 50 samples in 50 samples is represented by "excellent", and the film of 1 to 5 samples is broken in 50 samples. The object is indicated by "good", and the object with 5 or more fractures is indicated by "bad". The results are shown in the columns of the film breakage resistance of Tables 1 and 2.

(6)剝離強度之經時間穩定性(6) Time stability of peel strength

在與前述(3)密封性相同條件中,進行熱封,以使剝離強度成為0.4N。在溫度60℃、相對濕度10%、及溫度60℃、相對濕度95%之環境下,投入7天,取出後在溫度23℃、相對濕度50%之環境下,放置24小時後,在相同溫度23℃、相對濕度50%之環境下,進行剝離強度之測定。剝離強度之測定係與前述(3)密封性相同條件下實施。將平均剝離強度0.4±0.1N範圍之物以「優」,將在0.4±0.2N範圍之物表述「良」,上述以外之平均剝離強度之物表述為「不良」。結果如表1及表2之密封性之欄所示。In the same conditions as the above (3) sealing property, heat sealing was performed so that the peeling strength became 0.4N. It was put into the environment at a temperature of 60 ° C, a relative humidity of 10%, a temperature of 60 ° C, and a relative humidity of 95% for 7 days, and after taking out, it was placed in an environment of a temperature of 23 ° C and a relative humidity of 50% for 24 hours, at the same temperature. The peel strength was measured in an environment of 23 ° C and a relative humidity of 50%. The measurement of the peel strength was carried out under the same conditions as the above (3) sealing property. The product having an average peel strength of 0.4 ± 0.1 N is expressed as "excellent", and the product having a range of 0.4 ± 0.2 N is expressed as "good", and the product having an average peel strength other than the above is expressed as "poor". The results are shown in the columns of the seals of Tables 1 and 2.

(7)抗烘焙性(7) Baking resistance

在水平伸展的覆蓋膜之熱封層面上,載置電子零件(Stanley公司製LED:1.6mm×0.8mm)50個,在80℃環境下投入24小時。自80℃環境取出後,在溫度23℃、相對濕度50%之環境下,放置1小時,在相同溫度23℃、相對濕度50%之環境下,將覆蓋膜顛倒,計數電子零件附著於覆蓋膜之個數。附著於覆蓋膜之零件之數目在0至5個範圍之物以「優」表示,在6至10個範圍之物以「良」表示,超過10個之物以「不良」表示。結果如表1及表2之抗烘焙性之欄所示。On the heat seal layer of the horizontally stretched cover film, 50 electronic components (LED: 1.6 mm × 0.8 mm manufactured by Stanley Co., Ltd.) were placed, and the mixture was placed in an environment of 80 ° C for 24 hours. After being taken out from the environment at 80 ° C, it was allowed to stand for 1 hour in an environment of a temperature of 23 ° C and a relative humidity of 50%, and the cover film was reversed under the same temperature of 23 ° C and a relative humidity of 50%, and the electronic parts were counted and attached to the cover film. The number. The number of parts attached to the cover film is represented by "excellent" in the range of 0 to 5, "good" in the range of 6 to 10, and "bad" in more than 10 items. The results are shown in the column of baking resistance of Tables 1 and 2.

(8)表面電阻率(8) Surface resistivity

使用三菱化學公司之Hiresta UP MCP-HT450,以JIS K 6911之方法,在環境溫度23℃、環境濕度50%RH、外加電壓10V下測定熱封層表面之表面電阻率。結果如表1及表2之表面電阻率之欄所示。The surface resistivity of the surface of the heat seal layer was measured by a method of JIS K 6911 using a Hiresta UP MCP-HT450 of Mitsubishi Chemical Corporation at an ambient temperature of 23 ° C, an ambient humidity of 50% RH, and an applied voltage of 10 V. The results are shown in the column of surface resistivity of Tables 1 and 2.

1...覆蓋膜1. . . Cover film

2...基材層(A)2. . . Substrate layer (A)

3...打底膠層3. . . Priming layer

4...中間層(B)4. . . Middle layer (B)

5...剝離層(C)5. . . Peeling layer (C)

6...熱封層(D)6. . . Heat seal layer (D)

第1圖表示本發明覆蓋膜之層構成之一例之剖面圖。Fig. 1 is a cross-sectional view showing an example of a layer structure of a cover film of the present invention.

1...覆蓋膜1. . . Cover film

2...基材層(A)2. . . Substrate layer (A)

3...打底膠層3. . . Priming layer

4...中間層(B)4. . . Middle layer (B)

5...剝離層(C)5. . . Peeling layer (C)

6...熱封層(D)6. . . Heat seal layer (D)

Claims (6)

一種覆蓋膜,其特徵為至少含有基材層(A)、中間層(B)、剝離層(C)及可熱封於載體帶的熱封層(D)而成,基材層(A)包含二軸延伸聚酯,中間層(B)包含直鏈狀低密度聚乙烯,剝離層(C)包含苯乙烯比率為15至35質量%之苯乙烯-異戊二烯-苯乙烯三嵌段共聚物之氫化樹脂、或苯乙烯比率為15至35質量%之苯乙烯-丁二烯-苯乙烯三嵌段共聚物之氫化樹脂,熱封層(D)係含有具有5000~20000之質量平均分子量之苯乙烯-丙烯酸系共聚物作為主成分而成,基材層(A)之厚度為12至25μm,中間層(B)之厚度為10至40μm,剝離層(C)之厚度為0.1至1.5μm,熱封層(D)之厚度為0.1至5μm。 A cover film comprising at least a base material layer (A), an intermediate layer (B), a release layer (C) and a heat seal layer (D) heat sealable on a carrier tape, the base material layer (A) Containing a biaxially stretched polyester, the intermediate layer (B) comprises a linear low density polyethylene, and the release layer (C) comprises a styrene-isoprene-styrene triblock having a styrene ratio of 15 to 35 mass% a hydrogenated resin of a copolymer or a hydrogenated resin of a styrene-butadiene-styrene triblock copolymer having a styrene ratio of 15 to 35 mass%, and a heat seal layer (D) containing a mass average of 5,000 to 20,000 The molecular weight styrene-acrylic copolymer is used as a main component, the base layer (A) has a thickness of 12 to 25 μm, the intermediate layer (B) has a thickness of 10 to 40 μm, and the release layer (C) has a thickness of 0.1 to 0.1. The thickness of the heat seal layer (D) is 1.5 to 5 μm. 如申請專利範圍第1項之覆蓋膜,其中熱封層(D)之苯乙烯-丙烯酸系共聚物係具有70~100℃之玻璃轉移溫度的樹脂。 The cover film of claim 1, wherein the styrene-acrylic copolymer of the heat seal layer (D) is a resin having a glass transition temperature of 70 to 100 °C. 如申請專利範圍第1項之覆蓋膜,其中剝離層(C)及/或熱封層(D)係含有導電材。 The cover film of claim 1, wherein the release layer (C) and/or the heat seal layer (D) contain a conductive material. 如申請專利範圍第3項之覆蓋膜,其中導電材係導電性微粒,形狀係由針狀、球狀微粒中任一種或該等組合所成。 The cover film of claim 3, wherein the conductive material is conductive fine particles, and the shape is formed by any one of needle-like or spherical particles or a combination thereof. 如申請專利範圍第3或4項之覆蓋膜,其中導電材為碳奈米材料。 The cover film of claim 3 or 4, wherein the conductive material is a carbon nanomaterial. 一種電子零件包裝體,其係將如申請專利範圍第1至5項中任一項之覆蓋膜作為以熱塑性樹脂作為主成分而成之載體帶之蓋材使用。An electronic component package using the cover film according to any one of claims 1 to 5 as a cover material of a carrier tape obtained by using a thermoplastic resin as a main component.
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