TWI519671B - Apparatus and Method for Delivering Gas - Google Patents

Description

Gas transmission device and method

This invention relates to gas delivery devices and methods, and more particularly to devices and methods for transporting gases between different gas containers at different voltages.

Semiconductor manufacturing technology has been widely used in recent years to manufacture many components of many modern products. In addition to the conventional integrated circuit fabrication, it is also applied to the manufacture of such as solar cells, liquid crystal panels, light emitting diodes and the like.

Semiconductor manufacturing technology often needs to form certain materials directly on the surface of the substrate or into the surface layer of the substrate. It is also necessary to first react some materials to each other and then form new materials formed by the reaction on a substrate. The surface is either penetrated to the surface of a substrate. For example, the ion cloth value process first dissociates certain materials and then drives the specific ions required into the surface layer of the substrate, where the dissociation and the substrate can be in the same or different chambers. For example, a chemical vapor deposition process involves first feeding a plurality of materials into a reaction chamber in which the substrate is located, and then depositing new materials on the surface of the substrate after chemical reaction of the materials to produce new materials.

Existing semiconductor technologies transfer various materials into the reaction chamber in a manner that is generally pre-built and externally input. The former is mostly applied to solid materials or liquid materials. The materials are first placed in a container inside the reaction chamber. When the materials are needed, the container is heated to sublimate or vaporize the material into the reaction chamber. Of course, a few applications may also be to directly place the gaseous material in a container in the reaction chamber, and open the container directly to allow the gaseous material to enter the reaction chamber when necessary. The latter, mostly applied to gaseous materials, first places the gaseous material in a container located outside the reaction chamber, and when the reaction chamber needs to use materials, the material is immediately input into the reaction chamber through a pipeline connecting the reaction chamber and the container. Of course, a few applications may also be to place a liquid material or a solid material in a container located outside the reaction chamber, and when the reaction indicates that the material is needed, the container is heated to sublimate or vaporize the material, and then through the pipeline connecting the reaction chamber to the container. Sublimated or vaporized materials are instantly input into the reaction chamber.

In general, the pre-built method requires opening the reaction chamber when replacing or replenishing materials, increasing the complexity of the operation while also reducing the overall throughput, and the material container inside the reaction chamber also increases the contamination of the reaction chamber. The danger of failure. Therefore, unless an external input method cannot be used to effectively provide the required material, a general semiconductor process uses an external supply to provide various materials required for the reaction chamber.

In practice, in order to improve the efficiency of the process in the reaction chamber, many materials are supplied to the reaction chamber in the form of gaseous materials. Whether they are stored in the form of a gaseous state at the beginning, they are first stored in solid or liquid form. Heat or sublime into a gaseous form as needed. Conventionally, as shown in Figure A, these gaseous materials are placed in a gas container 12 located in the same process apparatus 10 as the reaction chamber 14, and the gas container 12 is connected to the reaction chamber through a line 16. By controlling the degree of switching of the valve 18 on the line 16, it is possible to control the time and flow rate at which the gaseous material is delivered to the reaction chamber 14. Of course, if a plurality of gaseous materials are required, the process apparatus 10 has a plurality of gas containers 12 connected to the reaction chamber 14 by a plurality of lines 16 respectively. That is, different gaseous materials are stored in different gas containers, and appropriate gas containers are placed in the process equipment and connected to the pipelines, depending on the needs of different processes in the process equipment. Recently, with the advancement of automation equipment and system integration technology, the method shown in Figure B is not uncommon. Multiple process equipment in an entire plant area or in at least one production area, the same gaseous material system is used. The central gas container 120 is uniformly supplied through the central line 160 and the central valve 180 to control the time and flow rate of the gaseous material supplied to the respective process devices 101-109. Each of the process devices 101-109 has its own reaction chambers 141-149, and has its own pipelines 161-169 and respective valves 181-189, thereby controlling the gaseous state entering the reaction chambers 141-149 from the central pipeline 160, respectively. Material time and flow rate, etc. Of course, the nine process devices 101-109 drawn in the first B diagram are only for the actual number, depending on the actual needs, and different gaseous materials are often composed of different central pipelines 160 and internal machines 101-109. A different pipeline 161~169 is transmitted to reduce the occurrence of pollution.

There are still some problems to be overcome in the existing gaseous material transmission technology. For example, since the voltage of the reaction chamber 14 varies with the process being performed, a reaction chamber such as an ion implanter as an ion source tends to be inside a ion implanter at a maneuverably adjusted high voltage. The gas container 12 is often located at a fixed low voltage, so that not only the gaseous material may be dissociated into a plasma by the voltage difference across the pipeline 16 to damage the pipeline 16, and the voltage difference across the pipeline 16 may directly damage the pipeline 16 and thereby cause The leakage of gaseous materials. Further, in a situation such as that shown in FIG. B, the voltages of the respective process devices 101-109 and the central gas container 120 may also be different, so that the central line 160 and each of the lines 161-169 may be subjected to a voltage difference. Damage, which in turn leads to the leakage of gaseous materials. In addition, the central pipeline 160 and the various pipelines 161~169 are inevitable due to the vibrations that will be inevitable during the operation of the various process equipments, as well as the vibrations and collisions caused by earthquakes or the movement of large objects that the entire factory occasionally encounters. There may be damage such as looseness or even cracks, and even the leakage of gaseous materials may occur. Since many materials used in semiconductor manufacturing processes are toxic, corrosive or highly chemically active, the leakage of gaseous materials not only causes material waste and inaccurate process in the reaction chamber, but also may cause surrounding hardware. Damage to the equipment and casualties of the operator.

In view of the above, the present invention provides a gas transmission apparatus and method for improving the above-mentioned problems common to conventional gas transmission apparatuses.

The present invention provides a gas delivery device and a gas delivery method for transporting gas between a first gas container at a first voltage and a second gas container at a second voltage.

In some embodiments, the gas delivery device comprises at least an electrically insulated line and a bellows mechanically coupled in series. The electrically insulated pipeline is a tubular structure made of an electrically insulating material in which the gas system flows, and the electrically insulating material can isolate the voltage difference between the two sides. Generally, the electrical insulating material focuses on the electrical properties such as high insulation coefficient and not on mechanical properties such as elasticity and ductility. Therefore, the vibration and distortion of the entire gas transmission device are absorbed and resolved by the wave tube. Of course, some embodiments do not have a wave tube if the effects of vibration and distortion are small or even negligible.

In various embodiments, the number of electrically insulated pipelines and the number of corrugated tubes possessed by the gas transmission device are not limited but are determined according to actual needs. For example, when the gas transmission device is used to transfer gas between a central gas container at the factory end and a reaction chamber in a process equipment in the plant, the compartment design, pipeline configuration and different machines of the entire plant area are used. The individual gas transmission devices may undergo multiple turns and may pass through multiple sources of vibration. At this point, one or more corrugated tubes can be placed at each turn and at each source of vibration to absorb possible vibrations and distortions. Correspondingly, an electrically insulated pipeline can be arranged between adjacent corrugated tubes, so that the voltage difference between the adjacent corrugated tubes is electrically isolated. However, it is also possible to install a discharge insulated line only in direct contact with the central gas container and the reaction chamber in the process equipment. In other places, an electrically insulated line or a general gas line may be used elastically as needed.

In some embodiments, the length of the electrically insulated pipeline is not shorter than a critical length to ensure that the gas passing through the electrical conduit is not dissociated into plasma in the electrically insulated pipeline. This critical length depends on the upper limit of the voltage difference between the two gas containers on both sides of the electrically insulated pipeline and the lower pressure limit of the gas in the electrically insulated pipeline. Of course, when the gas transmission device has a plurality of electrically insulated pipelines, the critical length of any of the electrically insulated pipelines depends on the voltage difference directly connected to the two sides of the electrically insulated pipeline, and the gas in the electrically insulated pipeline. The lower pressure limit.

In some embodiments, in order to deal with the problem of gas leakage when the electrically insulated pipeline is leaked, the enclosed space in which the electrically insulated pipeline is located is connected to an air extracting device (such as a pump/pump), or even a pumping gas. The air inlet of the device is placed directly adjacent to the electrically insulated pipeline to carry the exhaust gas away to reduce the side effects of other nearby hardware devices or even operators. Further, in some embodiments, the electrically insulated pipeline is a two-layer structure composed of an internal electrically insulated pipeline and an external electrically insulated pipeline, and the internal electrically insulated pipeline is a pipeline formed of an electrically insulating material, and An external electrically insulated pipeline surrounds the internal electrically insulated pipeline and may also be formed of an electrically insulating material. Thereby, under normal conditions, the gas system flows through the internal electrically insulated pipeline and is transported by the first gas container at the first voltage to the second gas container at the second voltage. However, if the internal electrically insulated pipeline has a problem of gas leakage, the presence of the external electrically insulated pipeline can prevent the leakage gas from further diffusing to reduce the side effect of the gas leakage, especially if the internal electrically insulated pipeline is When the space between the external electrically insulated pipelines is connected to an air suction device, the leakage gas can be directly pumped away.

In some embodiments, the gas delivery device also has a resistor divider circuit. This is because the voltage of the corrugated tube may be affected by the voltage difference between the two gas containers at the two ends of the gas transmission device. In particular, the voltage of the corrugated tube directly connected to a gas container may vary with the voltage of the gas container. Change and have a high voltage. However, a wave tube which is usually made of a metal material may have problems such as discharge or metal electrolysis at a high voltage. Therefore, a resistor divider circuit is applied to regulate the upper limit of the mode tube voltage. In some embodiments, the two ends of the resistor divider circuit are electrically connected to two gas containers at both ends of the gas transmission device, and the middle portion of the resistor divider circuit is electrically connected to a certain wave tube to thereby limit The voltage of the corrugated tube is intermediate between the voltages of the two gas containers. In some embodiments, one end of the resistor divider circuit is electrically connected to one of the two gas containers at both ends of the gas transmission device and the other end is grounded, and the middle of the resistor divider circuit is electrically connected to A corrugated tube to reduce the voltage of the corrugated tube adjacent to the high voltage gas container. In some embodiments, the resistor used in the resistor divider circuit is a variable resistor to more flexibly adjust the voltage of the waveguide.

The invention will be described in detail as some examples below. However, the invention may be applied to other embodiments in addition to the disclosed embodiments. The scope of the present invention is not limited by the embodiments, and the scope of the appended claims shall prevail. In order to provide a clearer description and to enable those skilled in the art to understand the present invention, the various parts of the drawings are not drawn according to their relative sizes, and the ratio of certain dimensions to other related dimensions will be highlighted. Exaggerated, and irrelevant details are not completely drawn, in order to simplify the illustration.

Some embodiments of the invention are a gas delivery device. As shown in the second A diagram and the second B diagram, the gas transmission device is for transmitting a gas between the first gas container 201 at the first voltage and the second gas container 202 at the second voltage, and the gas The transmission device includes at least an electrically insulated pipeline 203 and a bellows 204 that are mechanically connected in series. Here, the electrically insulated pipeline 203 is made of an electrically insulating material to isolate the two sides of the electrically insulating pipeline 203. Here, the bellows 204 can be flexibly stretched to absorb the shock and distortion experienced by the entire gas transmission device. Here, the gas flows between the first gas container 201 and the second gas container 202 through both the electrically insulating line 203 and the bellows 204.

Between the first gas container 201 and the second gas container 202, the number of the electrically insulated pipeline 203 and the bellows 204 may be one or more, and the arrangement of the electrically insulated pipeline 203 and the bellows 204 The order is not limited, or the electrically insulating line 203 may be directly connected to the gas containers 201/202 as shown in FIG. 2A, or the wave tube 204 may be directly connected to the gas containers as shown in FIG. 201/201, or one or more electrically insulating lines 203 and one or more of the bellows 204 may be arranged in various orders as in other embodiments not shown. Of course, the geometric properties of the length, width, and form of the electrically insulated pipeline 203 are not limited. Here, any of the wave tube 204 may be directly connected to one of the adjacent electrically insulated pipelines 203. For example, when the corrugated tube 204 is a metal corrugated tube, it may be connected to the electrically insulating material by heterogeneous welding. Electrically insulated pipeline 213.

The electrically insulated pipeline 203 is a major feature of the present invention. By using electrical bonding materials, such as ceramics, glass, borosilicate glass, aluminosilicate glass, engineering plastics, quartz or rubber and plastic materials, the electrical insulation pipeline 203 can be made without voltage difference. , or only a slight voltage difference. Therefore, it is not affected by the voltage difference between the two sides, such as the pipeline 16 for transmitting gas, which is affected by the voltage difference between the two sides, and the pipe wall is broken, the pipe wall is thinned, the pipe wall is deformed, and the pipe wall material is lost by electrolysis. Such problems, even the problem of gas leakage.

Since the emphasis is on isolating the voltage difference between the two gas containers 201 and 202, the influence of the voltage difference between the two gas containers 201/201 on the line through which the gas is transferred is reduced. In the present invention, the electrically insulating line 203 may be fabricated using an electrically insulating material having a high insulation coefficient, or the length of the electrically insulating line 203 may be increased. In the former, the length of the electrically insulated pipeline 203 can be shortened, and is suitable when there is not much space between the two gas containers 201 and 202. In the latter, the electrically insulating line 203 can be manufactured using an electrically insulating material having a lower insulation coefficient, that is, the material cost in the use of the present invention can be reduced, and the elasticity of the kind of the electrically usable material can be increased.

In addition, in order to prevent the gas in the electrically insulated pipeline 203 from being dissociated into plasma or the like due to the voltage difference between the two gas containers 201/202, the length of the electrically insulated pipeline 203 is at least not Less than a critical length, the critical length depends on at least the following factors: an upper limit of the voltage difference between the first gas container 210 and the second gas container 202, and a lower pressure limit of the gas in the electrically insulated line 203. That is, the length of the gas insulated line 203 depends on the range of expected operating temperatures and expected voltage differences between the two gas containers 201/202, as well as the range of pressures that are expected to pass through the gas within the electrically insulated line 203. For example, when the two gas containers 201/202 are the ion source chamber of the ion value machine and the gas storage bottle located in the ion implanter, respectively, since the gas storage bottles are basically Grounded, so the actual length of the electrically insulated pipeline 203 must take into account the magnitude of the voltage/current of the ion beam that the ion implanter is expected to provide, that is, the upper limit of the operating voltage to which the ion source reaction chamber needs to operate. Further, it is necessary to consider the number and rate of gases that need to be transmitted to the ion source reaction chamber via the electrically insulated pipeline 203 when the ion source reaction chamber generates and maintains the plasma to continuously output the ion beam, thereby determining the interior of the electrically insulated pipeline 203. Upper and lower limits of gas pressure. For example, when the two gas containers 201/202 are the gas storage tanks of the gas supply center of the entire semiconductor factory and a certain process working area (such as the room where multiple lithography machines are placed in the lithography process) When the gas storage tank is used, since the gas storage tank and the gas storage tank are grounded to prevent the risk of potential floating or even sparking, the length of the electrically insulated pipeline 203 needs to consider the grounding point of the gas supply center of the factory side. The voltage difference between the grounding points of the segment process working area. Further, it is necessary to consider the gas supply rate of the gas storage tank, the capacity of the gas storage tank, and the gas consumption rate of the working section of the process, thereby determining the upper and lower limits of the gas pressure inside the electrically insulated pipeline 203.

Of course, when the gas transmission device has a plurality of electrically insulated pipelines, the critical length of any of the electrically insulated pipelines depends on the voltage difference directly connected to the two sides of the electrically insulated pipeline, and the gas in the electrically insulated pipeline. The lower pressure limit.

Since the electrical insulating material focuses on the electrical properties of high insulation coefficient, not the mechanical properties such as elasticity and ductility, and the electrical insulation of most commercial products is less elastic and ductile than metal. Therefore, the vibration, distortion, and the like which are received by the entire gas transmission device are absorbed and resolved by the wave tube 204, particularly through the wave tube 204 made of a metal material. Of course, if the effects of vibrations, distortions, etc. are not significant or even negligible, in some embodiments there may be no presence of the bellows 204.

For example, when the gas transmission device is used to transfer gas between a central gas container at the factory end and a reaction chamber in a process equipment in the plant, the compartment design, pipeline configuration and different machines of the entire plant area are used. Individual specifications of the station, the entire gas transmission device may go through multiple turns, or may pass through multiple sources of vibration (such as motors, elevators, or even sudden earthquakes or heavy objects landing). At this point, one or more bellows 204 can be placed at each turn and at each source of vibration to absorb possible vibrations and distortions. Thereby, the probability of damage to the electrically insulated pipeline 203 and the severity of the damage can be reduced.

On the other hand, between the adjacent wave tubes 204, an electrically insulating line 203 can also be disposed, so that the voltage difference is electrically isolated between the adjacent wave tubes 204. This voltage difference is derived from the voltage difference between the two gas containers 201/202 or the voltage difference caused by the surrounding environment of the bellows 204 such as an adjacent metal line and a metal machine. Of course, it is also possible to install the discharge insulating line 203 only in direct contact with the two gas containers 201/202, and in other places, the electrically insulating line 203 or the general gas line 16 may be used elastically as needed.

Further, the electrically insulated pipeline 203 may be damaged or cracked due to accidental collision or material deterioration or other factors, and the gas transmitted in the electrically insulated pipeline 203 will be leaked to the electrical property. Insulated outside the pipeline.

In some embodiments, as shown in FIG. 3A and FIG. 3B, the enclosed space 205 (such as the reaction chamber or the common pipeline) where the electrically insulated pipeline 203 is located may be connected to the air extracting device 206 (eg, Pump/pump), or the air inlet 2065 of the air extracting device 206 can be directly placed in the vicinity of the electrically insulated pipeline 203. Thereby, the gas leaked from the electrically insulated pipeline 203 can be quickly taken away, thereby reducing the influence of these external gases on other hardware devices or even operators in the vicinity of the electrically insulated pipeline 203.

Here, the electrically insulated pipeline 203 is a single-layer structure, the interior is a space and the material of the outer casing is an electrically insulating material. Thereby, when the gas flows through the space, the outer casing can both isolate the voltage difference on both sides of the electrically insulated pipeline 203 and can also isolate the voltage difference between the gas and the outer boundary of the electrically insulated pipeline 23.

In some embodiments, as shown in FIG. 3C, the electrically insulated pipeline 203 is comprised of an internally electrically insulated pipeline 2033 (which is typically a single layer structure) and an external electrically insulated pipeline 2036 (which is typically a single layer structure). The two-layer structure is composed of an internal electrically insulating pipeline formed by an electrically insulating material, and an external electrically insulating pipeline surrounding the internal electrically insulating pipeline or may be formed of an electrically insulating material. The external electrically insulated pipeline may be an external electrically insulated pipeline formed of other materials. Under normal conditions, the gas system only flows through the internal electrically insulated pipeline and is transported by the first gas container 201 at the first voltage to the second gas container 202 at the second voltage, that is, the internal electrically insulated pipeline 2033 and the outside. The space between the electrically insulated lines 2036 does not have gas flowing through the first gas container 201 to the second gas container 202 under normal conditions. However, when gas leakage occurs in the internal electrically insulated pipeline 203, the presence of the external electrically insulating pipeline 206 can prevent the gas leaked from the internal electrically insulating pipeline 203 from further diffusing around the entire electrically insulated pipeline 203 to reduce The effect of gas leakage on other hardware devices or even operators in the vicinity of the electrically insulated pipeline 203.

In some embodiments, as shown in FIG. 4D, the space between the internal electrically insulated pipeline 2033 and the external electrically insulated pipeline 2036 can also be connected to the air extracting device 206, thereby directly charging the internal electricity. The gas leaking from the insulated pipeline 2033 is evacuated by the air extracting device 206 via the air inlet 2065 located in this space.

In addition to using the evacuation device 206 to evacuate the blow-off gas, or using an external electrically insulated line 2036 to block gas leakage, other embodiments of the present invention may also use an inert gas to dilute the effect of the escape gas. .

As shown in the third E diagram, an air suction device 206, a gas pressure monitoring device 207, and a gas supply line 208 may be disposed around the electrically insulated pipeline 203. The gas pressure monitoring device 207 is for detecting the pressure of the adjacent periphery of the electrically insulated pipeline 203, and the gas supply line 208 is for supplying an inert gas to the adjacent periphery of the electrically insulated pipeline 203, and the air extracting device 206 is used. The inert gas adjacent to the periphery of the electrically insulated pipeline is evacuated. Thereby, there is always an inert gas existing in the adjacent periphery of the electrically insulated pipeline 203. Therefore, if the gas is leaked from the electrically insulated pipeline, the leaked gas will be diluted by the inert gas, and will not be affected. The hard body outside the electrically insulated pipeline 203 and the operator, etc., especially when the air extracting device 206 can evacuate the gas outside the electrically insulated pipeline 203. In particular, when the gas leaks from the electrically insulated pipeline 203, the gas pressure monitoring device 207 can detect a pressure change in the vicinity of the electrically insulated pipeline 203 caused by the gas leakage, and at this time, the gas supply pipeline 208 and the pumping The operation of the gas device 206 can be adjusted accordingly to maintain the net pressure of the inert gas and the additional gas outside the electrically insulated line 203 in an appropriate range. Here, the pressure around the outside of the electrically insulated pipeline can be maintained between 1 Torr and 760 Torr, or above 760 Torr, or under 1 Torr. The specific gas pressure depends on the environment surrounding the electrically insulated pipeline 203. For example, when the electrically insulated pipeline 203 is connected to a gas storage bottle and a reaction chamber inside a semiconductor machine, the gas pressure around the electrically insulated pipeline 203 can be maintained to prevent gas from leaking out to the semiconductor machine. At less than 760 Torr (usually an atmosphere of atmospheric pressure outside the semiconductor machine) and greater than 1 Torr (simplifies the hardware requirements of the venting device 206 and reduces the probability of gas dissociation into electrical plasma around the electrically insulating line 203 ). Further, in order to prevent the inert gas from affecting the hard body around the outside of the electrically insulating line 203, the inert gas is usually nitrogen gas, an inert gas, and a combination thereof.

Thereby, there is always an inert gas existing in the adjacent periphery of the electrically insulated pipeline 203. Therefore, if the gas is leaked from the electrically insulated pipeline, the leaked gas will be diluted by the inert gas, and will not be affected. The hard body outside the electrically insulated pipeline 203 and the operator, etc., especially when the air extracting device 206 can evacuate the gas outside the electrically insulated pipeline 203. In particular, when the gas leaks from the electrically insulated pipeline 203, the gas pressure monitoring device 207 can detect a pressure change in the vicinity of the electrically insulated pipeline 203 caused by the gas leakage, and at this time, the gas supply pipeline 208 and the pumping The operation of the gas device 206 can be adjusted accordingly to maintain the net pressure of the inert gas and the additional gas outside the electrically insulated line 203 in an appropriate range.

In addition, as shown in the third F diagram, the air suction device 206, the gas pressure monitoring device 207, and the gas may be disposed around the electrically insulated pipeline 203 composed of the internal electrically insulated pipeline 2033 and the external electrically insulated pipeline 2036. Supply line 208. The gas pressure monitoring device 207 is configured to detect the pressure between the external electrically insulated pipeline 2036 and the internal electrically insulated pipeline 2033, and the gas supply pipeline 208 is used to supply the inert gas to the external electrically insulated pipeline 2036 and external electrical properties. The insulating device 206 is used to evacuate the inert gas between the external electrically insulated pipeline 2036 and the internal electrically insulated pipeline 2033, and even the internal electrically insulated pipeline 2033 can be drained. The gas is pumped away. Thereby, as shown in the third E diagram and related discussion, the presence of the inert gas can dilute the effect of mitigating the gas leakage, and the air extracting device 206, the gas pressure monitoring device 207, and the gas supply line 208 can be flexibly adjusted to operate outside. The bleed air is carried away and maintains the pressure between the external electrically insulated pipeline 2036 and the internal electrically insulated pipeline 2033 in an appropriate range.

Incidentally, in order to highlight the present invention, it is also possible to use no corrugated tube 204 without any vibration or some distortion to be treated to protect the electrically insulated pipeline 203, the third A diagram, the third C diagram and the third E diagram. The illustrated embodiment has a bellows 204, but the embodiment shown in the third B, third D, and third F views does not have a bellows 204. Of course, the use of the bellows 204 depends on whether there is vibration or distortion that needs to be handled, regardless of the hardware design of how to handle the gas leakage problem. Here, only the different embodiments of the different embodiments have a wave tube 204 or no wave tube 204, thereby emphasizing that the wave tube 204 can be selected as desired in the present invention.

Incidentally, in some embodiments not shown, an additional gas pressure monitoring device may be further included in the space surrounded by the internal electrically insulated pipeline 2033 and the bellows 204 to monitor the space. The internal gas pressure and thus the operation of transferring gas from the first gas container 201 to the second gas container 202.

In some embodiments, the gas delivery device also has a voltage divider circuit, such as a resistor divider circuit. This is due to the fact that the corrugated tube 204, in particular the corrugated tube 204 of metallic material, may be affected by the voltage difference between the two gas containers 201/202 at both ends of the gas delivery device, in particular directly electrically connected to a gas. The bellows 204 of the container 201/202 may vary with the voltage of the gas container 201/202, or be affected by the voltage of the surrounding hardware, or be flowed between the two gas containers 201/202. The effect of the charge carried by the gas, or because of other factors, has a high voltage or has a floating voltage. However, high voltages or floating voltages appearing on the corrugated tube may cause problems with discharge or damage and loss (such as metal electrolysis). Thus, in some embodiments, a voltage divider circuit is applied to regulate the upper limit of the mode tube voltage.

As shown in FIG. 4A, in some embodiments, the voltage dividing circuit used is a resistor divider circuit. The resistor includes a resistor formed by a first resistor 401 and a second resistor 402 connected in series. One end of the resistor combination is electrically connected to the first gas container 201, and the other end of the resistor combination is electrically grounded, and the waveguide is electrically connected. The 204 series is electrically connected to a point between the first resistor 401 and the second resistor 402. Thereby, the voltage of the wave tube 204 can be lowered or adjusted to half the voltage of the first gas container 201. Of course, in order to fully exert the function of the voltage dividing circuit, the voltage of the first gas container 201 to which the first resistor 401 is connected is higher than the voltage of the second gas container 202. In other words, when the voltage of the first gas container 201 is greater than the voltage of the second gas container 202, it is preferable to connect the voltage dividing circuit to the first gas container 201.

As shown in FIG. 4B, in some embodiments, the voltage dividing circuit used is a resistor divider circuit. The resistor includes a resistor formed by a first resistor 401 and a second resistor 402 connected in series. One end of the resistor combination is electrically connected to the first gas container 201, and the other end of the resistor combination is electrically connected to the second gas container. 202, and the wave tube 204 located between the electrically insulated pipeline 203 and the first gas container 201 is electrically connected to a point between the first resistor 401 and the second resistor 402, so that the voltage of the wave tube 204 is introduced. Between the first voltage and the second voltage.

As shown in the fourth C diagram, in some embodiments, the voltage dividing circuit used is a resistor divider circuit. The resistor includes a resistor formed by a first resistor 401 and a second resistor 402 connected in series. One end of the resistor combination is electrically connected to the first gas container 201, and the other end of the resistor combination is electrically connected to the second gas. Container 202. When the first voltage of the first gas container 201 is higher than the second voltage of the second gas container 402, one of the wave tubes 204 directly connected to the first gas container 201 is electrically connected to the first resistor 401 and the second A point between the resistors 402 is such that the voltage of the mode tube 204 is between the first voltage and the second voltage.

As shown in the fourth D diagram, in some embodiments, the voltage dividing circuit used is a resistor divider circuit. The resistor comprises a resistor formed by a first resistor 401, a second resistor 402 and a third resistor 403 connected in series. One end of the resistor combination is electrically connected to the first gas container 201 and the other end of the resistor combination is electrically connected. Optionally connected to the second gas container 202. Here, the first wave tube 2043 is electrically connected to the first point between the first resistor 201 and the second resistor 402, and the second wave tube 2046 is electrically connected to the second resistor 402 and the third resistor. The second point of 403 is used to reduce the voltage of the first wave tube 2043 and the second wave tube 2046, respectively. It must be emphasized that the concept of the fourth D diagram can be extended to other unillustrated embodiments having more than three resistors and more than two wave tubes 204.

In the various embodiments in which the resistor divider circuit is used, the resistance values of the respective resistors used are not subject to any particular limitation, but depending on the possible voltage values of the respective waveform tubes 204 in the respective embodiments, depending on the respective waveforms. The material and dimensions of the tube 204 depend on the possible voltage differences across each of the wave tubes, and the like. Moreover, in all of the embodiments, the resistance values of the respective resistors used in the resistor divider circuit can be adjusted as needed, and even variable resistors can be used. Further, the focus of the present invention is on the use of a voltage dividing circuit, and the resistor voltage dividing circuit is a common practice, but the present invention can also be applied to other voltage dividing circuits as long as the voltage of the wave tube 204 is adjusted. The adjustment method of each of the above embodiments may be used.

In addition to this, in other embodiments not shown in the present invention, a radial spherical plain bearing may be included. It is usually a hollow structure and is located between the electrically insulated pipeline 203 and the bellows 204 and mechanically connected in series to absorb the offset and torque of the lateral movement. Since radial spherical plain bearings and corrugated tubes are commercial products that have been commonly used, the details of both radial spherical plain bearings and corrugated tubes will not be described here. In particular, since both the radial spherical plain bearing and the corrugated tube are usually made of metal, both the radial spherical plain bearing and the corrugated tube may have a high voltage or voltage floating phenomenon. That is to say, the embodiments and related embodiments discussed in the fourth to fourth figures D can be applied not only to the wave tube but also to the radial spherical plain bearing or the hybrid application in the radial direction. Both spherical plain bearings and corrugated tubes.

Incidentally, since both the radial spherical sliding bearing and the corrugated tube are used to process and absorb various mechanical changes of distortion, deformation and offset, etc., the electrical insulating line 203 is compensated for by external force. Disadvantages such as loss of cracks, etc., therefore different numbers of electrically insulated wires 203, bellows 204 and radial spherical plain bearings can be used in different embodiments, and can be used in the first gas container 201 and the second in different orders. The gas containers 202 are arranged in an array to form a desired gas transfer line.

Incidentally, in actual design, there may be parts such as an O-ring, a valve, a frame, a bracket, a metal pipe, and the like. Here, it will not be detailed one by one. If necessary, these parts can also be connected to the voltage divider circuit to improve the possible high voltage or voltage floating problem. They can also be connected to the air pump and so on to pump out the leaked gas. An outer casing can be added to prevent the leakage of gas in the event of a leak.

In summary, it can be seen that the present invention does not limit the details of the first gas container 201 and the second gas container 202, but only requires that both have a voltage and that gas can be transported therebetween. Therefore, the application of the present invention is very flexible.

For example, the first gas container 201 can be part of a factory gas delivery system and the second gas container 202 can be a gas storage bottle located in a process unit where the gas storage bottle is connected to the reaction chamber of the process equipment. That is, similar to the situation shown in Figure B, the present invention can improve the gas transfer device that directly transfers gas from the factory side to a gas storage bottle located in a process equipment.

For example, the first gas container 201 can be part of a factory gas delivery system and the second gas container 202 can be a reaction chamber located within a process unit. That is, the present invention can improve the gas transfer device that directly transfers gas from the factory side to a reaction chamber located in a process equipment.

For example, the first gas container 201 can be a gas storage bottle located in a process device and the second gas container 202 can be a reaction chamber located in the process device. That is, similar to the condition shown in Figure A, the present invention can improve the gas delivery means for transporting gas from a gas storage bottle within a process equipment to a reaction chamber within the process equipment.

Obviously, the invention does not need to limit the type of gas being transported, and different application embodiments each have a respective suitable gas. For example, since the present invention can omit the gas storage bottle located in the process equipment and directly transfer the gas from the factory end to the reaction chamber in the process equipment, the present invention is more likely to occur for some gas storage bottles. Gases with disadvantages such as corrosion or toxicity are particularly advantageous. For example, when the first gas container 201 is part of a factory gas delivery system and the second gas container 202 is located in an ion implanter, the gas delivery device is adapted to transport BF3 (boron trifluoride), AsH3 ( arsenic hydride ), PH3 ( phosphine ) and the like are more active or more toxic gases.

Some embodiments of the invention are a method of gas transport for transporting a gas between a first gas container at a first voltage and a second gas container at a second voltage. As shown in the fifth figure, first in step 501, a valve is opened to allow gas to flow from the first gas container to the second gas container via the electrically insulated line. Next, in step 502, a monitoring device connected to the outside of the electrically insulated pipeline is activated to monitor the pressure of the electrically insulated pipeline adjacent to the surrounding.

Obviously, opening the valve is a necessary condition for the gas transmission device to adjust the transmission gas flow and flow rate. Otherwise, the gas transmission device cannot transmit the gas at all, that is, the gas transmission device can only transmit the gas through the fixed opening size. After the monitoring device is activated, it can be adjusted as needed, as shown in the third D to the third F, in particular, depending on the condition of the presence or absence of gas leakage and gas leakage, and the operation state of the gas transmission device.

For example, after step 502, as shown in step 503, the gas supply line may be activated to supply the inert gas to the vicinity of the electrically insulated pipeline, and the aspirating device is activated to evacuate the reactive gas. The insulated pipeline is close to it. The pressure of the electrically insulated pipeline adjacent to the surrounding is maintained between 1 Torr and 760 Torr, where the inert gas may be nitrogen, an inert gas or a combination thereof.

For example, after step 502, as shown in step 504, the gas supply line and the operation of the air extraction device are adjusted when gas leakage occurs in the electrically insulated pipeline, thereby electrically connecting the electrically insulated pipeline to the surrounding gas. The net pressure with the inert gas is maintained between 1 Torr and 760 Torr.

For example, after step 502, as shown in step 505, when gas leakage occurs in the electrically insulated pipeline, or the valve is closed to stop the flow of gas through the electrically insulated pipeline, or the valve is adjusted. The flow rate of the gas through the electrically insulated pipeline is varied.

Here, due to the details and changes of the hardware such as the gas transmission line, the monitoring device, the gas supply line, and the air suction device, the previous embodiments or the related embodiments have not been repeated, and are not repeated here. .

In brief conclusion, the present invention provides a gas delivery apparatus and method for transporting gas between a first gas container having a first voltage and a second gas container having a second voltage. The present invention uses an electrically insulated pipeline to transport gas, thereby improving the loss of the gas pipeline in the prior art due to the voltage or voltage difference appearing thereon or the occurrence of cracking or the like. The invention can also use the wave tube or the radial spherical sliding bearing which is mechanically connected in series with the electrically insulating pipeline and can be bent and expanded to absorb the vibration and distortion of the gas transmission device, thereby protecting the electrically insulated pipeline. . In addition, the present invention can also reduce the damage in the event of gas leakage by placing an air suction device outside the electrically insulated pipeline.

The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the present invention; all other equivalent changes or modifications made in the spirit of the present invention should be included in the following. The scope of the patent application.

10 Process equipment 101 ~ 109 Process equipment 12 Gas container 120 Central gas container 14 Reaction chamber 141~149 Reaction chamber 16 Line 160 Central line 161~169 Line 18 Valve 180 Central valve 181~189 Valve 201 First gas container 202 Second gas Container 203 electrically insulated pipeline 2033 Internal electrically insulating line 2036 is electrically insulated from the external line 204 wave tube 205 enclosed space 206 suction means 2065 intake port 207 gas pressure monitoring means 208 gas supply line 401 to step 405

1A and 1B are schematic views of a prior art related to a gas transmission device; FIGS. 2A and 2B are schematic views of some preferred embodiments of the present invention; FIGS. 3A to 3F BRIEF DESCRIPTION OF THE DRAWINGS FIG. 4 is a schematic view showing still another preferred embodiment of the present invention; and FIG. 5 is a flow chart of still another preferred embodiment of the present invention; .

201 first gas container 202 second gas container 203 electrically insulated pipeline 204 corrugated tube

Claims (53)

A gas transmission device for transmitting a gas between a first gas container at a first voltage and a second gas container at a second voltage, wherein the first voltage is not equal to the second voltage, and at least comprises: an electrical An insulated pipeline, the material of which is an electrical insulating material, thereby isolating the two sides of the electrically insulated pipeline; and a corrugated tube which can be bent and expanded to absorb the vibration of the gas transmission device And the twisted; the electrically insulated pipeline is mechanically connected in series with the corrugated pipe system, and is disposed between the first gas container and the second gas container, wherein the first gas container and the second gas are The gas from any of the gas containers will pass through the electrically insulated pipeline and the corrugated tube before being transferred to the first gas container and the other gas container in the second gas container. The gas transmission device according to claim 1, wherein at least two of the wave tubes are located on two sides of the electrically insulated pipeline. The gas transmission device according to claim 1, wherein the wave tube is a metal wave tube. The gas transmission device of claim 1, wherein the wave tube is directly connected to the electrically insulated pipeline. The gas transmission device of claim 4, wherein the corrugated tube is a metal wave tube and is connected to the electrically insulated pipeline by a heterogeneous welding method. The gas transmission device of claim 1, further comprising a resistor formed by a first resistor and a second resistor connected in series with each other, one end of the resistor combination being electrically connected to the at least one gas The other end of the resistor combination is electrically grounded, and the corrugated tube is electrically connected to a point between the first resistor and the second resistor, thereby reducing the voltage of the corrugated tube. The gas transmission device of claim 1, further comprising a resistor formed by a first resistor and a second resistor connected in series with each other, one end of the resistor combination being electrically connected to the first gas The other end of the resistor combination is electrically connected to the second gas container, and the wave tube is electrically connected to a point between the first resistor and the second resistor, thereby reducing the voltage of the waveform tube . The gas transmission device of claim 2, further comprising a resistor formed by a first resistor and a second resistor connected in series with each other, one end of the resistor combination being electrically connected to the first gas a container and the other end of the resistor combination is electrically connected to the second gas container, and when the first voltage is higher than the second voltage, directly connected to one of the first gas containers, the corrugated tube is electrically connected to Located at a point between the first resistor and the second resistor, such that the voltage of the mode tube is between the first voltage and the second voltage. The gas transmission device of claim 2, further comprising a resistor formed by a first resistor connected in series with each other, a second resistor and a third resistor, wherein one end of the resistor combination is electrically connected The other end of the resistor assembly is electrically connected to the second gas container, and the corrugated tube is electrically connected to the first point of the first resistor and the second resistor, and The other type of tube is electrically connected to the second point of the second resistor and the third resistor, thereby reducing the voltage of the first wave tube and the second wave tube, respectively. The gas transmission device according to claim 1, wherein the electrically insulated pipeline is a single-layer structure, the interior is a space and the material of the outer casing is an electrically insulating material, whereby the gas flows through the space. The outer casing can isolate the voltage difference between the two sides of the electrically insulated pipeline and the voltage difference between the gas and the outer boundary of the electrically insulated pipeline. The gas transmission device of claim 10, further comprising a gas pressure monitoring device, a gas supply line and an air suction device, wherein the gas pressure monitoring device is configured to detect the adjacent periphery of the electrical insulation pipeline Pressure, the gas supply line is used to supply an inert gas Adjacent to the periphery of the electrically insulated pipeline, the aspirating device is configured to evacuate the inert gas adjacent to the periphery of the electrically insulated pipeline, wherein the external pressure of the electrically insulated pipeline is maintained at 1 The bracket is between 760 Torr and the inert gas system is selected from one of the following: nitrogen, inert gas, and combinations thereof. The gas transmission device of claim 11, wherein when the gas is leaked from the electrically insulated pipeline, the gas pressure monitoring device can detect the proximity of the electrically insulated pipeline caused by the leakage of the gas. The peripheral pressure changes, and the gas supply line and the air extracting device can maintain the net pressure system of the inert gas and the gas in the periphery of the electrically insulated pipeline between 1 Torr and 760 Torr. The gas transmission device according to claim 1, wherein the electrically insulated pipeline is formed by an internal electrically insulated pipeline and an external electrically insulated pipeline, and the internal electrically insulated pipeline is a single layer structure. And the external electrically insulated pipeline is a single layer structure surrounding the internal electrically insulated pipeline, wherein the gas system flows through the internal electrically insulated pipeline, and the gas leaks from the internal electrically insulated pipeline Can be blocked by the external electrically insulated pipeline. The gas transmission device of claim 13, further comprising a gas pressure monitoring device, a gas supply line and an air extraction device, wherein the gas pressure monitoring device is configured to detect the external electrically insulated pipeline and the interior a pressure between the electrically insulated pipelines for supplying an inert gas between the external electrically insulated pipeline and the external electrically insulated pipeline, and the aspirating device is for electrically externally The inert gas between the insulated pipeline and the internal electrically insulated pipeline is withdrawn from the gas leaked from the internal electrically insulated pipeline, where the external electrically insulated pipeline and the internal electrically insulated pipeline are between The pressure system is maintained between 1 Torr and 760 Torr, and the inert gas system is selected from one of the following: nitrogen, inert gas, and combinations thereof. The gas transmission device of claim 13, further comprising an additional gas pressure monitoring device, the additional gas pressure monitoring device being located in the internal electrically insulated pipeline and the wave pattern Within the space surrounded by the tube, the pressure of the gas in the space is monitored and the operation of transferring the gas from the first gas container to the second gas container is adjusted. The gas transmission device of claim 1, wherein the material of the electrically insulated pipeline is selected from the group consisting of ceramic, glass, borosilicate glass, aluminosilicate glass, engineering plastics, quartz, and combinations thereof. The gas transmission device of claim 1, wherein the length of the electrically insulated pipeline is at least not less than a critical length, the critical length being dependent on at least the following factors: the first gas container and the second gas container The upper limit of the voltage difference between the two, and the lower pressure limit of the gas in the electrically insulated pipeline. The gas transmission device according to claim 1, further comprising a radial spherical sliding bearing located between the electrically insulated pipeline and the corrugated tube and mechanically connected in series with the two to absorb the side Offset and torque to move. The gas transfer device of claim 1, wherein the combination of the first gas container and the second gas container comprises at least one of: the first gas container is part of a factory gas transmission system and the first The second gas container is a gas storage bottle located in a process equipment, the gas storage bottle is connected to a reaction chamber of the process equipment; the first gas container is part of a factory gas transmission system and the second gas container is located a reaction chamber of a process device; and the first gas container is a gas storage bottle located in a process device and the second gas container is a reaction chamber located in the process device, the gas storage bottle is connected to the A reaction chamber of the process equipment. The gas delivery device of claim 1, wherein the first gas container is part of a factory gas delivery system and the second gas container is located in an ion implanter, and the gas system is selected from the group consisting of One: BF3, AsH3, PH3 and combinations thereof. a gas transmission device for use in a first gas container located at a first voltage a gas is transmitted between the second gas containers of the two voltages, wherein the first voltage is not equal to the second voltage, and at least comprises: an electrically insulated pipeline, the electrically insulated pipeline is located in an enclosed space: a gas supply pipeline, a closed space for supplying an inert gas to the outside of the electrically insulated pipeline; an air extracting device for extracting the inert gas from the closed space; and a gas pressure monitoring device for monitoring the closed space pressure. The gas transmission device according to claim 21, wherein the gas supply line and the air suction device maintain the pressure of the inert gas in the closed space between 1 Torr and 760 Torr, and the inert gas It is selected from one of the following: nitrogen, an inert gas, and combinations thereof. The gas transmission device of claim 21, wherein the electrically insulated pipeline is a single-layer structure, the interior is a space and the outer casing is an electrically insulating material, whereby the gas flows through the space. The outer casing can isolate the voltage difference between the two sides of the electrically insulated pipeline and the voltage difference between the gas and the enclosed space. The gas pressure monitoring device according to claim 21, wherein the gas pressure monitoring device can adjust the operation of the gas supply line and the air suction device when detecting the gas leakage of the electrical insulation pipeline, The leaked gas is pumped away and maintains a net pressure of the gas and the inert gas in the enclosed space between 1 Torr and 760 Torr. The gas transmission device of claim 21, wherein the length of the electrically insulated pipeline is at least not less than a critical length, the critical length being dependent on at least the following factors: the first gas container and the second gas container The upper limit of the voltage difference between the two, and the lower pressure limit of the gas in the electrically insulated pipeline. The gas transmission device according to claim 21, wherein the material of the electrically insulated pipeline is selected from the group consisting of ceramics, glass, borosilicate glass, aluminosilicate glass, engineering plastics, quartz. And their combinations. The gas delivery device of claim 21, wherein the combination of the first gas container and the second gas container comprises at least one of: the first gas container is part of a factory gas transmission system and the first The second gas container is a gas storage bottle located in a process equipment, the gas storage bottle is connected to a reaction chamber of the process equipment; the first gas container is part of a factory gas transmission system and the second gas container is located a reaction chamber of a process device; and the first gas container is a gas storage bottle located in a process device and the second gas container is a reaction chamber located in the process device, the gas storage bottle is connected to the A reaction chamber of the process equipment. The gas delivery device of claim 21, wherein the first gas container is part of a factory gas delivery system and the second gas container is located in an ion implanter, and the gas system is selected from the group consisting of One: BF3, AsH3, PH3 and combinations thereof. The gas transmission device of claim 21, further comprising a radial spherical plain bearing mechanically connected in series with the electrically insulating pipeline to absorb the offset and torque of the lateral movement. A gas transmission device for transmitting a gas between a first gas container at a first voltage and a second gas container at a second voltage, wherein the first voltage is not equal to the second voltage, and at least comprises: a first An electrically insulated pipeline, the first electrically insulated pipeline is a single layer structure; a second electrically insulated pipeline is a single layer structure and surrounds the first electrically insulated pipeline; a gas supply line for supplying an inert gas to an enclosed space between the second electrically insulated pipeline and the first electrically insulated pipeline: and an air extracting device connected to the Closed space. The gas transmission device of claim 30, wherein the material of the first electrically insulating pipeline and the second electrically insulating pipeline are electrically insulating materials, whereby the gas flows through the first electricity When the pipeline is insulated, the voltage difference between the two sides of the electrically insulated pipeline can be isolated or the voltage difference between the gas and the outer boundary of the second electrically insulated pipeline can be isolated. The gas transmission device of claim 30, wherein the gas supply line and the air suction device are such that a net pressure of the gas and the inert gas in the closed space is between 1 and 760 torr. Whether or not the gas is leaked from the first electrically insulated pipeline to the enclosed space. The gas transmission device of claim 30, wherein the length of the first electrically insulated pipeline and the second electrically insulated pipeline are at least not less than a critical length, the critical length being dependent on at least the following factors: An upper limit of the voltage difference between the first gas container and the second gas container, and a lower pressure limit of the gas in the electrically insulated lines. The gas transmission device of claim 30, wherein the material of the electrically insulated pipeline is selected from the group consisting of ceramic, glass, borosilicate glass, aluminosilicate glass, engineering plastics, quartz, and combinations thereof. . The gas transfer device of claim 30, wherein the combination of the first gas container and the second gas container comprises at least one of: the first gas container is part of a factory gas transmission system and the first The second gas container is a gas storage bottle located in a process equipment, the gas storage bottle is connected to a reaction chamber of the process equipment; the first gas container is part of a factory gas transmission system and the second gas container is located a reaction chamber of a process device; and the first gas container is a gas storage bottle located in a process device and the second gas container is a reaction chamber located in the process device, the gas storage bottle is connected to the A reaction chamber of the process equipment. The gas transmission device of claim 30, wherein the first gas container is part of a factory gas transmission system and the second gas container is located in an ion implanter, and the The gas system is selected from one of the following: BF3, AsH3, PH3, and combinations thereof. The gas transmission device of claim 30, further comprising a radial spherical plain bearing mechanically connected in series with the electrically insulating pipelines to absorb the offset and torque of the lateral movement. A gas transmission method for transferring a gas between a first gas container at a first voltage and a second gas container at a second voltage, wherein the first voltage is not equal to the second voltage, at least comprising: opening a valve The gas flows out of the first gas container, passes through the valve and an electrically insulated pipeline, and flows into the second gas container, wherein the electrically insulated pipeline is disposed in the first gas container and the second gas container And a monitoring device is connected to the outside of the electrically insulated pipeline to monitor the pressure of the electrically insulated pipeline adjacent to the surrounding. The gas transmission method of claim 38, further comprising starting a gas supply line to supply an inert gas to the vicinity of the electrically insulated pipeline, and initiating an aspirating device to evacuate the inert gas. The electrically insulated pipeline is adjacent to the periphery, thereby maintaining the pressure of the electrically insulated pipeline adjacent to the surrounding between 1 Torr and 760 Torr, wherein the inert gas system is selected from one of the following: nitrogen, inert gas, and combinations thereof. . The gas transmission method according to claim 38, further comprising adjusting the operation of the gas supply line and the air suction device when the gas leakage of the electrical insulation pipeline occurs, thereby bringing the electrical insulation pipeline to the surrounding area The net pressure of the gas and the inert gas is maintained between 1 Torr and 760 Torr. The gas transmission method of claim 38, further comprising performing at least one of the following actions when the gas leakage of the electrically insulated pipeline occurs: closing the valve to stop the gas from passing through the electrically insulated pipeline Flow; The valve is adjusted to vary the flow rate of gas through the electrically insulated line. The gas transfer method of claim 38, further comprising adjusting at least one of the following so that the gas is not dissociated into a plasma in the electrically insulated pipeline: the gas in the electrically insulated pipeline Pressure, a voltage difference between the first gas container and the second gas container, and a length of the electrically insulated line. The gas transmission method according to claim 38, wherein the interior of the electrically insulated pipeline is a space and the material of the outer casing is an electrically insulating material, whereby the casing can be insulated when the gas flows through the space. The voltage difference between the two sides of the electrically insulated pipeline can also isolate the voltage difference between the gas and the enclosed space. The gas transmission method of claim 38, further comprising an additional electrically insulated pipeline surrounding the electrically insulated pipeline to prevent further diffusion of the gas from the portion of the electrically insulated pipeline. The gas transmission method according to claim 38, further comprising mechanically connecting the electrically insulated pipeline to at least one wave tube, any of which can be bent and expanded to absorb the gas transmission device. The vibration and distortion. The gas transmission method according to claim 45, further comprising adjusting a voltage of the wave tube by using a combination of a resistance formed by one of a first resistor and a second resistor connected in series, the resistor combination One end is electrically connected to at least one gas container and the other end of the resistor combination is electrically grounded, and the wave tube is electrically connected to a point between the first resistor and the second resistor, thereby reducing the The voltage of the wave tube. The gas transmission method according to claim 45, further comprising adjusting a voltage of the wave tube by using a combination of a resistance formed by one of a first resistor and a second resistor connected in series, the resistor combination One end is electrically connected to the first gas container and the other end of the resistor combination is electrically connected to the second gas container, and the corrugated tube is electrically connected to the first resistor and the first A point between the two resistors to lower the voltage of the wave tube. The gas transmission method according to claim 45, further comprising adjusting a voltage of the wave tube by using a combination of a resistance formed by one of a first resistor and a second resistor connected in series, one end of the resistor combination Electrically connected to the first gas container and the other end of the resistor combination is electrically connected to the second gas container, and when the first voltage is higher than the second voltage, and when the electrical insulating pipeline is located at two Between the waveguides, the corrugated tube is electrically connected to a point between the first resistor and the second resistor, so that the voltage of the corrugated tube is And between the first voltage and the second voltage. The gas transmission method according to claim 45, further comprising adjusting a voltage of the wave tube by using a combination of a resistance formed by one of a first resistor, a second resistor and a third resistor connected in series, One end of the resistor is electrically connected to the first gas container, and the other end of the resistor combination is electrically connected to the second gas container. When the electrically insulated pipeline is located between the two waveguides, One of the corrugated tubes is electrically connected to the first point of the first resistor and the second resistor, and the other of the corrugated tubes is electrically connected to the second resistor and the second resistor a point for reducing the voltage of the first wave tube and the second wave tube, respectively. The gas transmission method of claim 45, further comprising mechanically connecting a radial spherical plain bearing to the electrically insulated pipeline to absorb the offset and torque of the lateral movement. The gas transmission method according to claim 38, wherein the material of the electrically insulated pipeline is selected from the group consisting of ceramic, glass, borosilicate glass, aluminosilicate glass, engineering plastics, quartz, and combinations thereof. The gas transfer method of claim 38, wherein the combination of the first gas container and the second gas container comprises at least one of: the first gas container is part of a factory gas transmission system and the first The second gas container is a gas storage bottle located in a process equipment, and the gas storage bottle is connected to a reaction chamber of the process equipment; The first gas container is part of a factory gas delivery system and the second gas container is a reaction chamber located in a process device; and the first gas container is a gas storage bottle located in a process device and the second The gas container is a reaction chamber located in the process equipment, the gas storage bottle being connected to a reaction chamber of the process equipment. The gas transfer method of claim 38, wherein the first gas container is part of a factory gas transmission system and the second gas container is located in an ion implanter, and the gas system is selected from the following One: BF3, AsH3, PH3 and combinations thereof.