TWI511140B - Devices and methods of non-volatile memory writing - Google Patents

Devices and methods of non-volatile memory writing Download PDF

Info

Publication number
TWI511140B
TWI511140B TW103105594A TW103105594A TWI511140B TW I511140 B TWI511140 B TW I511140B TW 103105594 A TW103105594 A TW 103105594A TW 103105594 A TW103105594 A TW 103105594A TW I511140 B TWI511140 B TW I511140B
Authority
TW
Taiwan
Prior art keywords
write
bit line
module
voltage
high voltage
Prior art date
Application number
TW103105594A
Other languages
Chinese (zh)
Other versions
TW201533741A (en
Inventor
Hung Hsueh Lin
Original Assignee
Winbond Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Winbond Electronics Corp filed Critical Winbond Electronics Corp
Priority to TW103105594A priority Critical patent/TWI511140B/en
Publication of TW201533741A publication Critical patent/TW201533741A/en
Application granted granted Critical
Publication of TWI511140B publication Critical patent/TWI511140B/en

Links

Landscapes

  • Read Only Memory (AREA)

Description

非揮發性記憶體寫入裝置以及方法Non-volatile memory writing device and method

本發明係有關於一種非揮發性記憶體寫入裝置以及方法,特別係有關於具有分離位元線之記憶體陣列之一種減輕寫入干擾之快閃式記憶體寫入裝置以及方法。The present invention relates to a non-volatile memory writing device and method, and more particularly to a flash memory writing device and method for mitigating write interference with a memory array having separate bit lines.

快閃式記憶體係為非揮發性記憶體中一種特殊的型式,其邏輯資料儲存於記憶體單元中。通常快閃式記憶體將記憶體單元以行列放置,其中每一行代表資料的位元線(bit line)。快閃式記憶體利用施加電壓至記憶體單元以設定臨限電壓,而臨限電壓之位準代表記憶體單元中所儲存之資料。快閃記憶體的操作通常分為抹除(erase)以及寫入(program)。抹除係以區塊(sector or block)為單位,對記憶體單元之基體施加高電壓且對閘極施加負壓,以減少浮動閘極儲存之電子並降低記憶體單元之臨界電壓,一般以資料「1」代表之;寫入則針對位元組或字元組進行,對所選定的記憶體單元經由字元線施加閘極寫入電壓且對選定的位元線施加源極電壓以將電子送入浮動閘極,而提高記憶體單元之臨界電壓。The flash memory system is a special type of non-volatile memory, and its logic data is stored in the memory unit. Flash memory typically places memory cells in rows and columns, with each row representing the bit line of the data. The flash memory uses a voltage applied to the memory unit to set the threshold voltage, and the threshold voltage level represents the data stored in the memory unit. The operation of flash memory is usually divided into erase and program. The eraser applies a high voltage to the base of the memory cell and applies a negative voltage to the gate in units of blocks or blocks to reduce the electrons stored in the floating gate and lower the threshold voltage of the memory cell. Data "1" stands for; writing is for a byte or a group of words, applying a gate write voltage to the selected memory cell via the word line and applying a source voltage to the selected bit line to The electrons are fed into the floating gate to increase the threshold voltage of the memory cell.

在對快閃記憶體進行寫入操作時,未被選取之記憶體單元會受到選取之記憶體單元的寫入干擾。對於寫入干擾的情況,一般可分為未被選取之記憶體單元之閘極因寫入字元 線之高壓而造成輕微寫入,或是未被選取之記憶體單元因位元線上之源極電壓而成輕微寫入等狀況。特別對於具有分離位元線架構的快閃記憶體而言,由於未被選取的記憶體單元的源極會受到耦合效應而產生感應電荷累積,所受的寫入干擾尤甚。When a write operation is performed on the flash memory, the unselected memory cells are disturbed by the write of the selected memory cells. For the case of write interference, it can generally be divided into the gate of the unselected memory unit due to the write character The high voltage of the line causes a slight write, or the unselected memory unit is slightly written due to the source voltage on the bit line. Especially for flash memory with a separate bit line architecture, since the source of the unselected memory cell is subject to the coupling effect and the induced charge is accumulated, the write interference is particularly affected.

有鑑於此,本發明提出一種非揮發性記憶體寫入裝置及寫入方法,可有效降低非揮發性記憶體的寫入干擾。In view of this, the present invention provides a non-volatile memory writing device and a writing method, which can effectively reduce write interference of non-volatile memory.

本發明的非揮發性記憶體寫入裝置,包括:一快閃式記憶體,包括一選取陣列,上述選取陣列包括一基體、複數位元線以及複數字元線;一升壓模組,產生一行高電壓、一列電壓以及一負電壓;一選取模組,耦接至上述字元線及上述升壓模組,上述選取模組自上述升壓模組接收上述列高電壓及上述負電壓,且上述選取模組根據一位址信號選取上述位元線之一者為寫入位元線以及選取上述字元線之一者為寫入字元線,其中上述寫入位元線之鄰近位元線係為浮接;一寫入模組,耦接至上述位元線及上述升壓模組,上述寫入模組自上述升壓模組接收上述行高電壓及上述負電壓;其中,當上述升壓模組於升壓過程中,上述寫入模組將上述負電壓施加至上述位元線,當上述升壓模組完成產生上述行高電壓以、上述列高電壓以及上述負電壓時,上述選取模組將上述列高電壓施加於上述寫入字元線,上述寫入模組將上述行高電壓施加於上述寫入位元線,用以將資料寫入上述寫入字元線以及上述寫入位元線所對應之記憶體單元。The non-volatile memory writing device of the present invention comprises: a flash memory, comprising a selection array, the selection array comprising a substrate, a plurality of bit lines and a complex digital element line; and a boosting module generating a row of high voltage, a column of voltages and a negative voltage; a selection module coupled to the word line and the boosting module, the selection module receiving the column high voltage and the negative voltage from the boosting module, And the selecting module selects one of the bit lines as the write bit line according to the address signal and selects one of the word lines as the write word line, wherein the adjacent bit of the write bit line is The input line is coupled to the bit line and the boost module, and the write module receives the line high voltage and the negative voltage from the boost module; When the boosting module is in the boosting process, the writing module applies the negative voltage to the bit line, and when the boosting module finishes generating the row high voltage, the column high voltage and the negative voltage When the above selection module will The high voltage is applied to the write word line, and the write module applies the row high voltage to the write bit line for writing data to the write word line and the write bit The memory unit corresponding to the line.

根據本發明之一實施例,其中在上述選取模組切 換至下一字元線位址之前,同樣對上述位元線施加上述負電壓。According to an embodiment of the present invention, wherein the selection module is cut The above negative voltage is also applied to the above bit line before switching to the next word line address.

根據本發明之一實施例,其中當上述負電壓至上 述基體之一跨壓大於上述基體之接面電壓時,則上述寫入模組將上述基體浮接。According to an embodiment of the present invention, wherein the negative voltage is above When one of the substrates has a voltage greater than the junction voltage of the substrate, the writing module floats the substrate.

根據本發明之一實施例,其中上述寫入模組施加 上述行高電壓於上述寫入位元線之前,上述寫入模組施加上述負電壓於上述位元線。According to an embodiment of the invention, wherein the writing module is applied The write module applies the negative voltage to the bit line before the row high voltage is written to the bit line.

本發明的非揮發性記憶體的寫入方法,適用於一 快閃式記憶體,其中上述快閃式記憶體具有一選取陣列,上述選取陣列包括一基體、複數位元線以及複數字元線,包括:提供一行高電壓、一列高電壓以及一負電壓,其中將上述負電壓施加於上述位元線;選取上述字元線之一者為寫入字元線以及上述位元線之一者為寫入位元線,並將上述列高電壓施加於上述寫入字元線;施加上述行高電壓於上述寫入位元線以寫入資料至上述寫入字元線以及上述寫入位元線所對應之一記憶體單元;以及停止產生上述行高電壓、上述列高電壓以及上述負電壓。根據本發明之一實施例,其中上述寫入位元線之鄰近位元線為浮接。The method for writing non-volatile memory of the present invention is applicable to one The flash memory, wherein the flash memory has a selected array, the selected array includes a substrate, a plurality of bit lines, and a complex digital line, comprising: providing a row of high voltage, a column of high voltage, and a negative voltage, The negative voltage is applied to the bit line; one of the word lines is selected as a write word line and one of the bit lines is a write bit line, and the column high voltage is applied to the above Writing a word line; applying the row high voltage to the write bit line to write data to the write word line and one of the memory cells corresponding to the write bit line; and stopping generating the line height Voltage, the above column high voltage, and the above negative voltage. According to an embodiment of the invention, adjacent bit lines of the write bit line are floating.

根據本發明之一實施例,其中在切換至下一字元 線位址之前,同樣對上述位元線施加上述負電壓。According to an embodiment of the invention, wherein switching to the next character The above negative voltage is also applied to the above bit line before the line address.

根據本發明之一實施例,其中當上述負電壓至上 述基體之一跨壓大於上述基體之接面電壓時,則將上述基體浮接。According to an embodiment of the present invention, wherein the negative voltage is above When one of the substrates has a voltage greater than the junction voltage of the substrate, the substrate is floated.

根據本發明之一實施例,其中在施加上述行高電壓於上述寫入位元線之前,施加上述負電壓於上述位元線。According to an embodiment of the invention, the negative voltage is applied to the bit line before applying the row high voltage to the write bit line.

基於上述,本發明提出一種非揮發性記憶體寫入裝置及寫入方法,在非揮發性記憶體的寫入操作時,在對寫入位元線提供行高電壓前,先行對所有本地位元線提供負電壓,可有效降低因鄰近寫入位元線之本地位元線因耦合效應所造成的寫入干擾。Based on the above, the present invention provides a non-volatile memory writing device and a writing method. In the non-volatile memory writing operation, before the writing of the bit line line is provided with a high voltage, all the status is performed first. The negative line provides a negative voltage, which can effectively reduce the write interference caused by the coupling effect of the local element line of the adjacent write bit line.

為使本發明之上述目的、特徵和優點能更明顯易懂,下文特例舉一較佳實施例,並配合所附圖式,來作詳細說明如下:The above described objects, features and advantages of the present invention will become more apparent and understood.

100‧‧‧非揮發性記憶體寫入裝置100‧‧‧Non-volatile memory writing device

101‧‧‧快閃式記憶體101‧‧‧Flash memory

102‧‧‧選取模組102‧‧‧Select module

103‧‧‧寫入模組103‧‧‧Write module

104‧‧‧升壓模組104‧‧‧Boost Module

110‧‧‧選取陣列110‧‧‧Select array

111‧‧‧本地位元線111‧‧‧The status line

111A‧‧‧全局位元線111A‧‧‧Global Bit Line

112‧‧‧字元線112‧‧‧ character line

113‧‧‧傳輸閘113‧‧‧Transmission gate

114‧‧‧列解碼器114‧‧‧ column decoder

115‧‧‧行解碼器115‧‧‧ line decoder

201、301‧‧‧升壓階段201, 301‧‧‧ boost phase

202、204、302、304、306‧‧‧寫入階段202, 204, 302, 304, 306‧‧‧ write phase

203、205、303、305‧‧‧切換位址203, 205, 303, 305‧‧‧ Switching addresses

501‧‧‧反相器501‧‧‧Inverter

502‧‧‧反及閘502‧‧‧Anti-gate

503‧‧‧高壓位準移位電路503‧‧‧High-voltage level shifting circuit

504‧‧‧P型電晶體504‧‧‧P type transistor

505、507‧‧‧N型電晶體505, 507‧‧‧N type transistor

506‧‧‧負壓位準移位電路506‧‧‧Negative pressure level shift circuit

Address‧‧‧選取位址Address‧‧‧Select address

Data‧‧‧寫入資料Data‧‧‧Write information

L0‧‧‧第一邏輯信號L0‧‧‧First logic signal

L1‧‧‧第二邏輯信號L1‧‧‧ second logic signal

S41~S48‧‧‧步驟S41~S48‧‧‧Steps

SD ‧‧‧寫入資料信號S D ‧‧‧Write data signal

SN ‧‧‧負壓致能信號S N ‧‧‧Negative pressure enable signal

SR ‧‧‧寫入致能信號S R ‧‧‧ write enable signal

VD ‧‧‧行高電壓V D ‧‧‧ high voltage

VG ‧‧‧列高電壓V G ‧‧‧ high voltage

VN ‧‧‧負電壓V N ‧‧‧negative voltage

第1圖係顯示根據本發明之一實施例所述之非揮發性記憶體寫入裝置之方塊圖;第2圖係顯示根據本發明之一實施例所述之非揮發性記憶體寫入裝置之操作波形圖;第3圖係顯示根據本發明之另一實施例所述之非揮發性記憶體寫入裝置之操作波形圖;第4圖係顯示根據本發明之一實施例所述之非揮發性記憶體寫入方法之流程圖;以及第5圖係顯示根據本發明之一實施例所述之寫入模組之電路圖。1 is a block diagram showing a non-volatile memory writing device according to an embodiment of the present invention; and FIG. 2 is a view showing a non-volatile memory writing device according to an embodiment of the present invention. FIG. 3 is an operation waveform diagram of a non-volatile memory writing device according to another embodiment of the present invention; and FIG. 4 is a view showing a non-volatile memory writing device according to an embodiment of the present invention; A flowchart of a method of writing a volatile memory; and a fifth diagram showing a circuit diagram of a write module according to an embodiment of the present invention.

以下將介紹係根據本發明所述之較佳實施例。必 須要說明的是,本發明提供了許多可應用之發明概念,在此所揭露之特定實施例,僅是用於說明達成與運用本發明之特定方式,而不可用以侷限本發明之範圍。Preferred embodiments in accordance with the present invention are described below. must It is to be understood that the invention is not limited to the scope of the invention.

第1圖係顯示根據本發明之一實施例所述之非揮 發性記憶體寫入裝置之方塊圖。如第1圖所示,非揮發性記憶體寫入裝置100包括快閃式記憶體101、選取模組102、寫入模組103以及升壓模組104。快閃式記憶體101包括許多記憶體陣列之一者的選取陣列110、全局位元線111A、傳輸閘113、列解碼器114以及行解碼器115,選取陣列110包括許多本地位元線111以及許多字元線112。選取模組102根據選取位址Address,經由行解碼器115選擇全局位元線111A,並經由傳輸閘113而選取選取陣列110上許多本地位元線111之一者作為寫入位元線,選取模組102透過列解碼器114而選取許多字元線112之一者作為寫入字元線。Figure 1 shows a non-swing according to an embodiment of the present invention. A block diagram of a memory write device. As shown in FIG. 1, the non-volatile memory writing device 100 includes a flash memory 101, a selection module 102, a write module 103, and a boost module 104. The flash memory 101 includes a selection array 110 of one of a plurality of memory arrays, a global bit line 111A, a transfer gate 113, a column decoder 114, and a row decoder 115. The selection array 110 includes a plurality of local bit lines 111 and Many word lines 112. The selection module 102 selects the global bit line 111A via the row decoder 115 according to the selected address Address, and selects one of the plurality of local element lines 111 on the array 110 as the write bit line via the transmission gate 113. The module 102 selects one of the plurality of word lines 112 as a write word line through the column decoder 114.

升壓模組104用以產生列高電壓VG 、行高電壓VD 以及負電壓VN ,並將行高電壓VD 以及負電壓VN 提供至寫入模組103,將列高電壓VG 以及負電壓VN 提供至選取模組102。寫入模組103根據寫入資料Data輸出寫入資料信號SD 。當升壓模組104於升壓過程中,寫入模組103經由行解碼器115、全局位元線111A以及傳輸閘113,將負電壓VN 施加至所有本地位元線111,當升壓模組104完成產生行高電壓VD 時,寫入模組103將行高電壓VD 施加於選取模組102所選擇之寫入位元線,而選取模組102施加列高電壓vG 於寫入字元線,用以將資料寫入至寫入字元線以及寫入位元線所對應之記憶體單元。根據本發明之 一實施例,當選取模組102切換至下一字元線位址之前,寫入模組103同樣對所有本地位元線111施加負電壓VNThe boosting module 104 is configured to generate a column high voltage V G , a row high voltage V D , and a negative voltage V N , and provide the row high voltage V D and the negative voltage V N to the write module 103 to set the column high voltage V G and a negative voltage V N are provided to the selection module 102. The write module 103 outputs a write data signal S D according to the write data Data. When the boost module 104 is in the boosting process, the write module 103 applies a negative voltage V N to all of the local bit lines 111 via the row decoder 115, the global bit line 111A, and the transfer gate 113, when boosting When the module 104 finishes generating the row high voltage V D , the write module 103 applies the row high voltage V D to the write bit line selected by the selection module 102 , and the selection module 102 applies the column high voltage v G to The word line is written to write data to the write word line and to the memory unit corresponding to the write bit line. According to an embodiment of the invention, the write module 103 also applies a negative voltage V N to all of the local element lines 111 before the selection module 102 switches to the next word line address.

由於行解碼器115經由全局位元線110A而耦接至 傳輸閘113,其中傳輸閘113中只有一個開關會耦接至對應的寫入位元線,使得寫入位元線之鄰近本地位元線皆處於浮接(floating)的狀態,當寫入模組103施加行高電壓VD 至寫入位元線時,因為本地位元線間之電容耦合效應,造成浮接之本地位元線儲存感應電荷而產生汲極電壓。此外,浮接之本地位元線上之感應電荷會累積,累積之感應電荷將對未選取的字元線造成錯誤的寫入動作。Since the row decoder 115 is coupled to the transfer gate 113 via the global bit line 110A, wherein only one of the transfer gates 113 is coupled to the corresponding write bit line, so that the adjacent bit element of the write bit line is written. The lines are all in a floating state. When the write module 103 applies the row high voltage V D to the write bit line, the floating position is caused by the capacitive coupling effect between the local elements. The induced charge is stored to generate a drain voltage. In addition, the induced charge on the floating element's local line will accumulate, and the accumulated induced charge will cause an erroneous write action on the unselected word line.

根據本發明之一實施例,當負電壓VN 至選取陣列 110之基體(第1圖中未顯示)之跨壓大於基體至位元線之接面電壓時,則寫入模組103將基體浮接。根據本發明之一較佳實施例,負電壓VN 係為-1V,若是記憶體單元之基體至位元線之接面電壓大於1V時,則寫入模組103不需將基體浮接。According to an embodiment of the present invention, when the voltage across the negative voltage V N to the substrate of the array 110 (not shown in FIG. 1 ) is greater than the junction voltage of the substrate to the bit line, the write module 103 will be the substrate. Floating. According to a preferred embodiment of the present invention, the negative voltage V N is -1 V. If the junction voltage of the base-to-bit line of the memory cell is greater than 1 V, the write module 103 does not need to float the substrate.

第2圖係顯示根據本發明之一實施例所述之非揮 發性記憶體寫入裝置之操作波形圖。以下針對第2圖之說明將搭配第1圖,以利詳細說明。如第2圖所示,升壓階段201時,升壓模組104首先將列高電壓VG 以及負電壓VN 充電,並且在充電的同時選取模組102選取所有本地位元線,並由寫入模組103將負電壓VN 經由全局位元線111A以及傳輸閘113,提供至所有本地位元線111。當進入寫入階段202時,選取模組102以及寫入模組103根據選取模組102之選擇而將列高電壓VG 以及行高電壓VD 分別施加至第一字元線以及第一位元線。然而,由於先 前第二位元線已充電至負電壓VN ,因此當鄰近的第一位元線上發生電壓變化時,第二位元線所受到之電荷耦合效應所產生的寫入干擾將大幅減低。Figure 2 is a diagram showing the operation waveforms of a non-volatile memory writing device according to an embodiment of the present invention. The following description of Fig. 2 will be accompanied by Fig. 1 for detailed explanation. As shown in FIG. 2, in the boosting phase 201, the boosting module 104 first charges the column high voltage V G and the negative voltage V N , and selects the module 102 to select all the local element lines while charging, and The write module 103 supplies the negative voltage V N to all of the local element lines 111 via the global bit line 111A and the transfer gate 113. When entering the writing phase 202, the selection module 102 and the writing module 103 apply the column high voltage V G and the row high voltage V D to the first word line and the first bit respectively according to the selection of the selection module 102. Yuan line. However, since the previous second bit line has been charged to the negative voltage V N , when a voltage change occurs on the adjacent first bit line, the write disturbance caused by the charge coupling effect of the second bit line will be greatly increased. reduce.

切換位址階段203時,寫入模組103停止將行高電 壓VD 施加至第一位元線,且於寫入階段204時,寫入模組103根據選取模組102而將行高電壓VD 施加至第二位元線。由於第一位元線於切換位址階段203時電壓漸漸放電至0V,當寫入模組103將行高電壓VD 施加至第二位元線時,第一位元線才會受到電荷耦合效應之干擾。When the address stage 203 is switched, the write module 103 stops applying the row high voltage V D to the first bit line, and in the writing stage 204, the write module 103 sets the row high voltage according to the selection module 102. V D is applied to the second bit line. Since the voltage is gradually discharged to 0V when the first bit line is switched at the address stage 203, when the write module 103 applies the row high voltage V D to the second bit line, the first bit line is subjected to charge coupling. Interference with effects.

當進入切換列位址階段205時,寫入模組103重新 將負電壓經由全局位元線111A以及傳述閘113提供至所有本地位元線111,此時第一位元線以及第二位元線充電至負電壓VN ,原先第一位元線以及第二位元線上因電荷耦合效應所造成之電荷累積將一併清除。When entering the switch column address stage 205, the write module 103 re-sends the negative voltage to all of the local element lines 111 via the global bit line 111A and the traversing gate 113, at which time the first bit line and the second bit line The line is charged to a negative voltage V N , and the charge accumulation caused by the charge coupling effect on the first bit line and the second bit line will be removed together.

第3圖係顯示根據本發明之另一實施例所述之非 揮發性記憶體寫入裝置之操作波形圖。第3圖大致上與第2圖相同,差別在於第3圖中寫入模組103不會施加負電壓VN 至位元線,並僅針對於同一字元線上,相鄰浮接位元線所受之耦合線應所造成之寫入干擾作敘述。Figure 3 is a diagram showing the operation waveforms of a non-volatile memory writing device according to another embodiment of the present invention. Figure 3 is substantially the same as Figure 2, except that the write module 103 in Figure 3 does not apply a negative voltage V N to the bit line, and is only for the same word line, adjacent floating bit lines. The write interference caused by the coupled line is described.

如第3圖所示,於寫入階段302時,寫入模組103將 行高電壓VD 施加至第一位元線,此時,浮接之第二位元線以及第三位元線因位元線間電容耦合效應而儲存電荷,因而源極電壓對同一字元線同樣施加列高電壓VG 的相鄰記憶胞造成之寫入干擾。當寫入階段304時,寫入模組103將行高電壓VD 施加至 第二位元線,同時也對浮接之第一位元線以及第三位元線增加更多耦合電荷,產生更高的源極耦合電壓。由於在寫入階段302時,第三位元線已受到電容耦合而儲存電荷,在寫入階段304時又再次受到電容耦合影響,使得第三位元線上之電壓接近行高電壓VD ,使得第三位元線在寫入階段304時呈現被輕微寫入之狀態。此外,由於浮接之位元線上因耦合電容所感應儲存之電荷並未清除,當進入寫入階段306時,寫入模組103將行高電壓VD 施加至第三位元線,相鄰且浮接之第一位元線以及第二位元線持續累積感應電荷,並持續地在隨後的寫入過程中受到寫入干擾。As shown in FIG. 3, at the writing stage 302, the write module 103 applies the row high voltage V D to the first bit line, and at this time, the second bit line and the third bit line of the floating line The charge is stored due to the capacitive coupling effect between the bit lines, so that the source voltage also applies write interference caused by adjacent memory cells of the high voltage V G to the same word line. When writing to stage 304, the write module 103 applies the row high voltage V D to the second bit line, and also adds more coupling charges to the floating first bit line and the third bit line, resulting in Higher source coupling voltage. Since the third bit line has been capacitively coupled to store charge during the write phase 302, it is again affected by capacitive coupling during the write phase 304, such that the voltage on the third bit line is close to the row high voltage V D , such that The third bit line exhibits a state of being slightly written when writing to stage 304. In addition, since the charge stored on the floating bit line due to the coupling capacitance is not cleared, when entering the writing phase 306, the writing module 103 applies the row high voltage V D to the third bit line, adjacent And the floating first bit line and the second bit line continue to accumulate induced charges and are continuously subjected to write disturb during subsequent writing.

因此,本發明所提出之將位元線充電至負電壓之 方法,有助於解決因架構上無法將本地位元線接地所衍生之干擾問題,並且累積於本地位元線上之電荷將於切換字元線之位址時,經由再次將位元線充電至負電壓而清除與歸零。Therefore, the present invention proposes charging the bit line to a negative voltage. The method helps to solve the interference problem caused by the failure of the architecture to ground the status line, and the charge accumulated on the status line will switch the address of the word line, and then charge the bit line again to Negative voltage is cleared and reset to zero.

第4圖係顯示根據本發明之一實施例所述之非揮 發性記憶體寫入方法之流程圖。如第4圖所示,以下針對第4圖之說明將搭配第1圖,以利詳細說明。一開始,在升壓期間,升壓模組104提供列高電壓VG 、行高電壓VD 以及負電壓VN ,並將負電壓VN 施加於本地位元線111(步驟S41)。在寫入期間,選取模組102根據輸入位址Address選取寫入字元線以及寫入位元線,並將列高電壓VG 施加於寫入字元線(步驟S42);並且,寫入模組103根據寫入資料Data將行高電壓VD 施加於相對於資料「0」之寫入位元線以寫入資料至寫入字元線以及寫入位元線所對應之記憶體單元(步驟S43),並確認是否所有資料皆寫 入完成(步驟S44)。Figure 4 is a flow chart showing a non-volatile memory writing method according to an embodiment of the present invention. As shown in Fig. 4, the following description of Fig. 4 will be accompanied by Fig. 1 for detailed explanation. Initially, during boosting, the boost module 104 provides the column high voltage V G , the row high voltage V D , and the negative voltage V N , and applies the negative voltage V N to the local bit line 111 (step S41). During the writing period, the selection module 102 selects the write word line and the write bit line according to the input address Address, and applies the column high voltage V G to the write word line (step S42); The module 103 applies the row high voltage V D to the write bit line relative to the data “0” according to the write data Data to write the data to the write word line and the memory unit corresponding to the write bit line. (Step S43), and it is confirmed whether or not all the materials are written (step S44).

若步驟S44之結果為否,則確認是否變更列位址(步 驟S45);當步驟S45之結果為是時,則選取模組102切換至下一寫入字元線並將負電壓施加於所有本地位元線111(步驟S46)。 隨後,選取模組102切換至下一寫入位元線(步驟S47)並且重複步驟S43~S47,直到完成所有資料寫入動作。當完成資料寫入動作時,步驟S44之判斷結果為是,則停止產生列高電壓VG 、行高電壓VD 以及負電壓VN (步驟S48)。If the result of the step S44 is no, it is confirmed whether the column address is changed (step S45); when the result of the step S45 is YES, the selection module 102 switches to the next write word line and applies a negative voltage to all. The status element line 111 (step S46). Subsequently, the selection module 102 switches to the next write bit line (step S47) and repeats steps S43-S47 until all data writing actions are completed. When the data writing operation is completed, if the result of the determination in step S44 is YES, the generation of the column high voltage V G , the row high voltage V D , and the negative voltage V N is stopped (step S48).

第5圖係顯示根據本發明之一實施例所述之寫入 模組之電路圖。寫入模組103包括反相器501、反及閘502、高壓位準移位電路503、P型電晶體504、N型電晶體505、負壓位準移位電路506以及N型電晶體507。當操作於寫入動作時寫入致能信號SR 為高邏輯位準,若此時寫入資料Data為資料「0」時,反及閘502輸出之第一邏輯信號L0則為低邏輯位準,進而導通P型電晶體504且將N型電晶體505斷路,則P型電晶體504將寫入資料信號SD 拉升至行高電壓VD 並經過行解碼器115以及傳輸閘113而提供至所選擇之寫入位元線。Figure 5 is a circuit diagram showing a write module in accordance with an embodiment of the present invention. The write module 103 includes an inverter 501, an inverse gate 502, a high voltage level shift circuit 503, a P-type transistor 504, an N-type transistor 505, a negative voltage level shift circuit 506, and an N-type transistor 507. . When the write enable signal S R is a high logic level when the write operation is performed, if the write data Data is data "0" at this time, the first logic signal L0 outputted by the inverse gate 502 is a low logic bit. When the P-type transistor 504 is turned on and the N-type transistor 505 is turned off, the P-type transistor 504 pulls the write data signal S D to the row high voltage V D and passes through the row decoder 115 and the transfer gate 113. Provide to the selected write bit line.

由於P型電晶體504之源極係耦接至行高電壓VD 而 較反相器501以及反及閘502之高邏輯位準為高,當第一邏輯信號L0為高邏輯位準時,高壓位準移位電路503將第一邏輯信號L0之高邏輯位準轉換成行高電壓VD 以便將P型電晶體504完全斷路。當寫入資料Data為資料「1」時,反及閘502輸出之第一邏輯信號L0則為高邏輯位準,進而導通N型電晶體505且將P型電晶體504斷路,並藉由N型半導體505將寫入資料信號SD 拉至 低邏輯位準。Since the source of the P-type transistor 504 is coupled to the row high voltage V D and is higher than the high logic level of the inverter 501 and the inverse gate 502, when the first logic signal L0 is at a high logic level, the high voltage The level shift circuit 503 converts the high logic level of the first logic signal L0 to the row high voltage V D to completely disconnect the P-type transistor 504. When the data to be written Data is "1", the first logic signal L0 outputted by the gate 502 is a high logic level, thereby turning on the N-type transistor 505 and disconnecting the P-type transistor 504, and by N. The type semiconductor 505 pulls the write data signal S D to a low logic level.

在進行寫入動作之前,負壓致能信號SN 為高邏輯 位準而導通N型半導體507,N型電晶體507將寫入資料信號SD 下拉至負電壓VN 並經過行解碼器115而提供至所有本地位元線。當進行寫入動作時,負壓致能信號SN 會回到低邏輯位準,並且經由負壓位準移位電路506將負壓致能信號SN 轉換成為低邏輯位準為負電壓VN 之第二邏輯信號L1而將N型電晶體507斷路。Before the write operation, the negative voltage enable signal S N is at a high logic level to turn on the N-type semiconductor 507, and the N-type transistor 507 pulls the write data signal S D to the negative voltage V N and passes through the row decoder 115. And provide all the status lines. When the write operation is performed, the negative voltage enable signal S N returns to the low logic level, and the negative voltage enable signal S N is converted to the low logic level by the negative voltage level shift circuit 506 to a negative voltage V. N logic signals L1 and the second N-type transistor 507 open circuit.

以上敘述許多實施例的特徵,使所屬技術領域中 具有通常知識者能夠清楚理解本說明書的形態。所屬技術領域中具有通常知識者能夠理解其可利用本發明揭示內容為基礎以設計或更動其他製程及結構而完成相同於上述實施例的目的及/或達到相同於上述實施例的優點。所屬技術領域中具有通常知識者亦能夠理解不脫離本發明之精神和範圍的等效構造可在不脫離本發明之精神和範圍內作任意之更動、替代與潤飾。The features of many embodiments are described above in the art. Those having ordinary knowledge can clearly understand the form of the present specification. Those having ordinary skill in the art will appreciate that the objectives of the above-described embodiments and/or advantages consistent with the above-described embodiments can be accomplished by designing or modifying other processes and structures based on the present disclosure. It is also to be understood by those skilled in the art that <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt;

100‧‧‧非揮發性記憶體寫入裝置100‧‧‧Non-volatile memory writing device

101‧‧‧快閃式記憶體101‧‧‧Flash memory

102‧‧‧選取模組102‧‧‧Select module

103‧‧‧寫入模組103‧‧‧Write module

104‧‧‧升壓模組104‧‧‧Boost Module

110‧‧‧選取陣列110‧‧‧Select array

111‧‧‧本地位元線111‧‧‧The status line

111A‧‧‧全局位元線111A‧‧‧Global Bit Line

112‧‧‧字元線112‧‧‧ character line

113‧‧‧傳輸閘113‧‧‧Transmission gate

114‧‧‧列解碼器114‧‧‧ column decoder

115‧‧‧行解碼器115‧‧‧ line decoder

Address‧‧‧選取位址Address‧‧‧Select address

Data‧‧‧寫入資料Data‧‧‧Write information

SD ‧‧‧寫入資料信號S D ‧‧‧Write data signal

VD ‧‧‧行高電壓V D ‧‧‧ high voltage

VG ‧‧‧列高電壓V G ‧‧‧ high voltage

VN ‧‧‧負電壓V N ‧‧‧negative voltage

Claims (9)

一種非揮發性記憶體寫入裝置,包括:一快閃式記憶體,包括一選取陣列,上述選取陣列包括一基體、複數位元線以及複數字元線;一升壓模組,產生一行高電壓、一列高電壓以及一負電壓;一選取模組,耦接至上述字元線及上述升壓模組,上述選取模組自上述升壓模組接收上述列高電壓及上述負電壓,且上述選取模組根據一位址信號選取上述位元線之一者為寫入位元線以及選取上述字元線之一者為寫入字元線,其中上述寫入位元線之鄰近位元線係為浮接;一寫入模組,耦接至上述位元線及上述升壓模組,上述寫入模組自上述升壓模組接收上述行高電壓及上述負電壓;其中當上述升壓模組於升壓過程中,上述寫入模組將上述負電壓施加至上述位元線,當上述升壓模組完成產生上述行高電壓、上述列高電壓以及上述負電壓時,上述選取模組將上述列高電壓施加於上述寫入字元線,上述寫入模組將上述行高電壓施加於上述寫入位元線,用以將資料寫入上述寫入字元線以及上述寫入位元線所對應之記憶體單元。A non-volatile memory writing device comprises: a flash memory, comprising a selection array, wherein the selection array comprises a base, a plurality of bit lines and a complex digital element line; and a boosting module generates a line height a voltage, a high voltage and a negative voltage; a selection module coupled to the word line and the boost module, the selection module receiving the column high voltage and the negative voltage from the boost module, and The selection module selects one of the bit lines as a write bit line according to the address signal and selects one of the word lines as a write word line, wherein the adjacent bit of the write bit line is The line is floating; a write module is coupled to the bit line and the boost module, and the write module receives the line high voltage and the negative voltage from the boost module; The boosting module is configured to apply the negative voltage to the bit line during the boosting process, and when the boosting module completes generating the row high voltage, the column high voltage, and the negative voltage, Select the module to the above column Applying a voltage to the write word line, the write module applying the row high voltage to the write bit line for writing data to the write word line and the write bit line Memory unit. 如申請專利範圍第1項所述之非揮發性記憶體寫入裝置,其中在上述選取模組切換至下一字元線位址之前,同樣對上述位元線施加上述負電壓。The non-volatile memory writing device of claim 1, wherein the negative voltage is applied to the bit line before the selection module switches to the next word line address. 如申請專利範圍第1項所述之非揮發性記憶體寫入裝置,其中當上述負電壓至上述基體之一跨壓大於上述基體之接 面電壓時,則上述寫入模組將上述基體浮接。The non-volatile memory writing device of claim 1, wherein the negative voltage to the one of the substrates is greater than the substrate When the surface voltage is applied, the writing module floats the substrate. 如申請專利範圍第1項所述之記憶體寫入裝置,其中上述寫入模組施加上述行高電壓於上述寫入位元線之前,上述寫入模組施加上述負電壓於上述位元線。The memory writing device of claim 1, wherein the writing module applies the negative voltage to the bit line before applying the row high voltage to the writing bit line. . 一種非揮發性記憶體寫入方法,適用於一快閃式記憶體,其中上述快閃式記憶體具有一選取陣列,上述選取陣列包括一基體、複數位元線以及複數字元線,包括:提供一行高電壓、一列高電壓以及一負電壓,其中將上述負電壓施加於上述位元線;選取上述字元線之一者為寫入字元線以及上述位元線之一者為寫入位元線,並將上述列高電壓施加於上述寫入字元線;施加上述行高電壓於上述寫入位元線以寫入資料至上述寫入字元線以及上述寫入位元線所對應之一記憶體單元;以及停止產生上述行高電壓、上述列高電壓以及上述負電壓。A non-volatile memory writing method is applicable to a flash memory, wherein the flash memory has a selection array, and the selection array comprises a substrate, a plurality of bit lines, and a complex digital line, including: Providing a row of high voltage, a column of high voltage, and a negative voltage, wherein the negative voltage is applied to the bit line; and one of the word lines is selected as a write word line and one of the bit lines is written a bit line, and applying the column high voltage to the write word line; applying the row high voltage to the write bit line to write data to the write word line and the write bit line Corresponding to one of the memory cells; and stopping generating the row high voltage, the column high voltage, and the negative voltage. 如申請專利範圍第5項所述之非揮發性記憶體寫入方法,其中上述寫入位元線之鄰近位元線為浮接。The non-volatile memory writing method of claim 5, wherein the adjacent bit line of the write bit line is floating. 如申請專利範圍第5項所述之非揮發性記憶體寫入方法,其中在切換至下一字元線位址之前,同樣對上述位元線施加上述負電壓。The non-volatile memory writing method of claim 5, wherein the negative voltage is applied to the bit line before switching to the next word line address. 如申請專利範圍第5項所述之非揮發性記憶體寫入方法,其中當上述負電壓至上述基體之一跨壓大於上述基體之接面電壓時,則將上述基體浮接。The non-volatile memory writing method according to claim 5, wherein the substrate is floated when the negative voltage reaches a junction voltage of the substrate greater than a junction voltage of the substrate. 如申請專利範圍第5項所述之非揮發性記憶體寫入方法, 其中在施加上述行高電壓於上述寫入位元線之前,施加上述負電壓於上述位元線。The non-volatile memory writing method as described in claim 5, The negative voltage is applied to the bit line before the row high voltage is applied to the write bit line.
TW103105594A 2014-02-20 2014-02-20 Devices and methods of non-volatile memory writing TWI511140B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW103105594A TWI511140B (en) 2014-02-20 2014-02-20 Devices and methods of non-volatile memory writing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103105594A TWI511140B (en) 2014-02-20 2014-02-20 Devices and methods of non-volatile memory writing

Publications (2)

Publication Number Publication Date
TW201533741A TW201533741A (en) 2015-09-01
TWI511140B true TWI511140B (en) 2015-12-01

Family

ID=54694850

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103105594A TWI511140B (en) 2014-02-20 2014-02-20 Devices and methods of non-volatile memory writing

Country Status (1)

Country Link
TW (1) TWI511140B (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100265765A1 (en) * 2009-04-20 2010-10-21 Bo-Young Seo Non-volatile semiconductor memory device in which program disturb is reduced and method of programming the same
US20110182117A1 (en) * 2010-01-22 2011-07-28 Seung-Jin Yang Method of programming nonvolatile semiconductor memory device
US7995400B2 (en) * 2007-10-05 2011-08-09 Micron Technology, Inc. Reducing effects of program disturb in a memory device
US20130107634A1 (en) * 2007-12-25 2013-05-02 Genusion, Inc. Nonvolatile semiconductor memory device
US20130163345A1 (en) * 2011-12-21 2013-06-27 Sang Tae Ahn Semiconductor memory device and method of operating the same
US20130242672A1 (en) * 2012-03-13 2013-09-19 Silicon Storage Technology, Inc. Non-volatile Memory Device And A Method Of Operating Same
US20130250690A1 (en) * 2012-03-26 2013-09-26 Chun-Hung Lai Selected word line dependent select gate voltage during program

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7995400B2 (en) * 2007-10-05 2011-08-09 Micron Technology, Inc. Reducing effects of program disturb in a memory device
US20130107634A1 (en) * 2007-12-25 2013-05-02 Genusion, Inc. Nonvolatile semiconductor memory device
US20100265765A1 (en) * 2009-04-20 2010-10-21 Bo-Young Seo Non-volatile semiconductor memory device in which program disturb is reduced and method of programming the same
US20110182117A1 (en) * 2010-01-22 2011-07-28 Seung-Jin Yang Method of programming nonvolatile semiconductor memory device
US20130163345A1 (en) * 2011-12-21 2013-06-27 Sang Tae Ahn Semiconductor memory device and method of operating the same
US20130242672A1 (en) * 2012-03-13 2013-09-19 Silicon Storage Technology, Inc. Non-volatile Memory Device And A Method Of Operating Same
US20130250690A1 (en) * 2012-03-26 2013-09-26 Chun-Hung Lai Selected word line dependent select gate voltage during program

Also Published As

Publication number Publication date
TW201533741A (en) 2015-09-01

Similar Documents

Publication Publication Date Title
TWI451416B (en) Programming method for nand flash memory device technical field
US8711634B2 (en) Nonvolatile semiconductor memory device and method for controlling the same
KR100749673B1 (en) Nonvolatile semiconductor memory
CN102349112B (en) Memory device having improved programming operation
JP5946483B2 (en) Current sensing
US9007833B2 (en) 2-transistor flash memory and programming method of 2-transistor flash memory
US20150255162A1 (en) Semiconductor memory device and method for detecting leak current
JP5640848B2 (en) Nonvolatile semiconductor memory
TWI511140B (en) Devices and methods of non-volatile memory writing
CN113284535A (en) Semiconductor memory device and reading method thereof
JP2015153438A (en) Semiconductor storage device and control method thereof
JP2011171582A (en) Nonvolatile semiconductor memory device
TW201511015A (en) Semiconductor device, data programming device, and method for improving the recovery of bit lines of unselected memory cells for programming operation
JP2004310971A (en) Data read method, data write method, and semiconductor memory device
JP2009252293A (en) Nonvolatile semiconductor memory device
JP5183677B2 (en) Semiconductor memory device
JP5814961B2 (en) Nonvolatile semiconductor memory device
JP5619038B2 (en) Nonvolatile semiconductor memory device
JP2009266351A (en) Semiconductor memory device and method of controlling the same
CN103971736A (en) Programming a split gate bit cell
CN104934059B (en) Nonvolatile memory writing station and method
JP2013164888A (en) Semiconductor storage device
JP4511627B1 (en) WRITE METHOD IN NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND NONVOLATILE SEMICONDUCTOR MEMORY DEVICE
JP4615297B2 (en) Semiconductor memory device
TWI574268B (en) Non-volatile semiconductor memory device