TWI505512B - System and method for fabricating light emitting diode (led) dice with wavelength conversion layers - Google Patents

System and method for fabricating light emitting diode (led) dice with wavelength conversion layers Download PDF

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TWI505512B
TWI505512B TW102117340A TW102117340A TWI505512B TW I505512 B TWI505512 B TW I505512B TW 102117340 A TW102117340 A TW 102117340A TW 102117340 A TW102117340 A TW 102117340A TW I505512 B TWI505512 B TW I505512B
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emitting diode
wavelength conversion
layer
substrate
diode die
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TW201349589A (en
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Jui Kang Yen
De Shuo Chen
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Semileds Optoelectronics Co
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製造具有波長轉換層之發光二極體晶粒的系統及方法System and method for fabricating light emitting diode dies having a wavelength conversion layer

本發明係為美國發明專利申請序號13/229,824之延續案,其申請日為2011年09月12日,係可與其合併參考。The present invention is a continuation of U.S. Patent Application Serial No. 13/229,824, filed on Sep. 12, 2011, which is incorporated herein by reference.

本發明係關於發光二極體晶粒,特別是關於具有波長轉換層的發光二極體晶粒,以及用於製造具有波長轉換層之發光二極體晶粒的一系統與其方法。The present invention relates to light-emitting diode dies, and more particularly to luminescent diode dies having a wavelength converting layer, and a system for fabricating light emitting diode dies having a wavelength converting layer and methods therefor.

發光二極體(light emitting diode,LED)晶粒(dice)係以發展來產生白光。為了產生白光,一藍光發光二極體晶粒係可使用來與一波長轉換層進行組合,例如形成在晶粒(die(之表面上的一螢光層(phosphor layer)。由藍光二極體晶粒所發射出的電磁輻射係激發波長轉換層的原子(atoms),其係將在藍色波長光譜範圍(blue wavelength spectral region)的某些電磁輻射轉換到黃色波長光譜範圍(yellow wavelength spectral region)。藍色對黃色的比率係由波長轉換層的構成(composition)以及幾何(geometry)所操控,以使發光二極體的輸出出現白光。Light emitting diode (LED) dice are developed to produce white light. In order to produce white light, a blue light emitting diode die can be used in combination with a wavelength converting layer, such as a phosphor layer formed on a die (by a blue LED). The electromagnetic radiation emitted by the crystal grains excites atoms of the wavelength conversion layer, which converts some electromagnetic radiation in the blue wavelength spectral region to the yellow wavelength spectral region (yellow wavelength spectral region). The ratio of blue to yellow is controlled by the composition and geometry of the wavelength conversion layer so that the output of the light emitting diode appears white light.

用以在一發光二極體晶粒中形成波長轉換層的一方法,係為將波長轉換層製造成一分離元件(separate member),其係之後附著到晶粒。舉例來說,波長轉換層係可為一片帶子(a piece of tape)型態,其上係具有一螢光混合物,而這一片帶子係位在一黏著層上,此黏著層係沉積在發光二極體晶粒上。典型地,波長轉換層最初係被製造在一基板上,並從此基板被移除,再使用固定在抽真空裝置(vacuum supply)之毛細裝置(capillary device)附著到晶粒。A method for forming a wavelength converting layer in a light emitting diode die is to fabricate the wavelength converting layer into a separate member which is then attached to the die. For example, the wavelength conversion layer can be a piece of tape type having a fluorescent mixture thereon, and the tape is tied to an adhesive layer, and the adhesive layer is deposited on the light emitting layer. On the polar body. Typically, the wavelength converting layer is initially fabricated on a substrate and removed from the substrate and attached to the die using a capillary device that is attached to a vacuum supply.

請參考第1圖,用以處理波長轉換層的一習知系統,係包括 複數個波長轉換層10,此複數個波長轉換層10係包含在一基板12上,此基板12係具有一黏著帶(adhesive tape)14,此黏著帶14係將波長轉換層10附著到基板12。對於將波長轉換層10從基板12移除而言,係使用一毛細裝置(capillary device)16並與一頂銷(ejection pin)18結合使用。然而,由於黏著帶14的黏著性(adhesiveness),波長轉換層10從基板12的移除係需要一大的力量(large force)。如第2圖所示,其係可造成波長轉換層10的破裂(cracks)20或者是其他損壞,而此波長轉換層係可改變由一發光二極體晶粒所產生之混合白光的顏色。Please refer to FIG. 1 for a conventional system for processing a wavelength conversion layer, including A plurality of wavelength conversion layers 10, the plurality of wavelength conversion layers 10 being included on a substrate 12 having an adhesive tape 14 for attaching the wavelength conversion layer 10 to the substrate 12. . For removing the wavelength conversion layer 10 from the substrate 12, a capillary device 16 is used and used in conjunction with an ejection pin 18. However, due to the adhesiveness of the adhesive tape 14, the removal of the wavelength conversion layer 10 from the substrate 12 requires a large force. As shown in Fig. 2, it may cause cracks 20 or other damage of the wavelength conversion layer 10, and the wavelength conversion layer may change the color of the mixed white light generated by a light-emitting diode die.

因為在製造期間對於波長轉換層的任何損壞係可改變晶粒的輸出,因此難以製造出具有始終如一之色彩平衡(color balance)的一白光發光二極體晶粒。本發明係針對用於製造發光二極體晶粒的一系統及其方法,其係將對波長轉換層的損壞最小化。Since any damage to the wavelength converting layer during fabrication can alter the output of the die, it is difficult to produce a white light emitting diode die having a consistent color balance. The present invention is directed to a system for fabricating light emitting diode dies and methods thereof that minimize damage to the wavelength converting layer.

一種用於製造發光二極體晶粒的系統,係包括一發光二極體晶粒以及一波長轉換層,該波長轉換層係架構來附著到一能量感應黏著層(energy sensitive adhesive layer),該黏著層係架構依據曝光於如一電磁輻射或熱能之一物理能量來降低黏著性。該系統亦包括一固化設備(curing apparatus)以及一附著設備(attachment apparatus),該固化設備係架構來降低該黏著層的黏著性,以幫助該波長轉換層從該基板上移除,該附著設備係架構來將該波長轉換層從該基板移除並將該波長轉換層附著到該發光二極體晶粒。A system for fabricating a light-emitting diode die includes a light-emitting diode die and a wavelength conversion layer, the wavelength conversion layer structure being attached to an energy sensitive adhesive layer, The adhesive layer architecture reduces adhesion by exposure to physical energy such as electromagnetic radiation or thermal energy. The system also includes a curing apparatus and an attachment apparatus that reduces the adhesion of the adhesive layer to assist in removing the wavelength conversion layer from the substrate, the attachment apparatus The architecture is configured to remove the wavelength conversion layer from the substrate and attach the wavelength conversion layer to the light emitting diode die.

一種用於製造發光二極體晶粒的方法,係包括下列步驟:提供具有一所欲架構(desired configuration)的一發光二極體晶粒;以及提供包含在一基板上之一波長轉換層,該基板係在一能量感應黏著層上,該黏著層係架構來依據曝光在一物理能量以降低黏著性。該方法亦包括下列步驟:將在該基板上的該黏著層曝光在該物理能量,以降低該黏著層的黏著性,並幫助該波長轉換層從該基板移除;將該波長轉換層從該基板上移除;以及將該波長轉換層附著到該發光二極體晶粒。A method for fabricating a light emitting diode die, comprising the steps of: providing a light emitting diode die having a desired configuration; and providing a wavelength conversion layer comprising a substrate; The substrate is attached to an energy-sensitive adhesive layer that is exposed to a physical energy to reduce adhesion. The method also includes the steps of exposing the adhesive layer on the substrate to the physical energy to reduce adhesion of the adhesive layer and to assist in removing the wavelength conversion layer from the substrate; Removing the substrate; and attaching the wavelength conversion layer to the light emitting diode die.

10‧‧‧波長轉換層10‧‧‧wavelength conversion layer

12‧‧‧基板12‧‧‧Substrate

14‧‧‧黏著帶14‧‧‧Adhesive tape

16‧‧‧毛細裝置16‧‧‧Capillary device

30‧‧‧發光二極體晶粒30‧‧‧Light-emitting diode grains

32‧‧‧導電基板32‧‧‧Electrical substrate

34‧‧‧n型侷限層34‧‧‧n type limited layer

36‧‧‧多量子井層36‧‧‧Multi-quantum wells

38‧‧‧p型侷限層38‧‧‧p type limited layer

40‧‧‧磊晶堆疊40‧‧‧ epitaxial stacking

42‧‧‧波長轉換層42‧‧‧wavelength conversion layer

44‧‧‧n電極44‧‧‧n electrode

46‧‧‧p電極46‧‧‧p electrode

48‧‧‧特徵48‧‧‧Characteristics

54‧‧‧開孔54‧‧‧Opening

60‧‧‧平面式發光二極體晶粒60‧‧‧Flat-type light-emitting diode crystal grains

62‧‧‧透明基板62‧‧‧Transparent substrate

64‧‧‧磊晶堆疊64‧‧‧ epitaxial stacking

66‧‧‧n型侷限層66‧‧‧n type limited layer

68‧‧‧多量子井層68‧‧‧Multi-quantum wells

70‧‧‧p型侷限層70‧‧‧p type limited layer

72‧‧‧透明導電層72‧‧‧Transparent conductive layer

74‧‧‧p電極74‧‧‧p electrode

76‧‧‧n電極76‧‧‧n electrode

78‧‧‧波長轉換層78‧‧‧wavelength conversion layer

80‧‧‧第一開孔80‧‧‧First opening

82‧‧‧第二開孔82‧‧‧Second opening

90‧‧‧系統90‧‧‧ system

92‧‧‧基板92‧‧‧Substrate

94‧‧‧能量感應黏著層94‧‧‧Energy-sensitive adhesive layer

96‧‧‧固化設備96‧‧‧Curing equipment

98‧‧‧附著設備98‧‧‧ Attached equipment

90A‧‧‧系統90A‧‧‧ system

94A‧‧‧黏著層94A‧‧‧Adhesive layer

96A‧‧‧固化設備96A‧‧‧Curing equipment

90B‧‧‧系統90B‧‧‧ system

94B‧‧‧能量感應黏著層94B‧‧‧Energy-sensitive adhesive layer

96B‧‧‧熱壓固化設備96B‧‧‧Hot curing equipment

100‧‧‧毛細管100‧‧‧ capillary

102‧‧‧真空裝置102‧‧‧Vacuum device

106A‧‧‧選定區域106A‧‧‧Selected area

104B‧‧‧熱能104B‧‧‧ Thermal Energy

106B‧‧‧選定區域106B‧‧‧Selected area

第1圖係表示用於處理波長轉換層之一習知系統的截面示意圖。Figure 1 is a schematic cross-sectional view showing a conventional system for processing a wavelength conversion layer.

第2圖係表示在由習知波長轉換層處理期間之一波長轉換層的的截面示意圖。Figure 2 is a schematic cross-sectional view showing one of the wavelength conversion layers during processing by a conventional wavelength conversion layer.

第3圖係表示本發明具有一波長轉換層之一發光二極體晶粒的截面示意圖。Figure 3 is a schematic cross-sectional view showing a crystal of a light-emitting diode of the present invention having a wavelength conversion layer.

第4圖係表示本發明具有一波長轉換層之一第二發光二極體晶粒的截面示意圖。Figure 4 is a schematic cross-sectional view showing a second light-emitting diode of one of the wavelength conversion layers of the present invention.

第5圖係分別表示本發明用於製造具有若干波長轉換層之發光二極體晶粒之一系統的示意圖。Figure 5 is a schematic diagram showing a system for fabricating a light-emitting diode die having a plurality of wavelength converting layers, respectively, of the present invention.

第5A圖係表示從第5圖中沿著線段5A-5A所看到的一平面示意圖,其係繪示該系統之一波長轉換層的一圓周形狀。Fig. 5A is a plan view, as seen from line 5, along line 5A-5A, showing a circumferential shape of one of the wavelength conversion layers of the system.

第5B圖係為第5A圖的側視圖。Figure 5B is a side view of Figure 5A.

第6A圖及第6B圖係表示本發明該系統之一取放機制(pick and place mechanism)以及一紫外線固化設備的截面示意圖。6A and 6B are schematic cross-sectional views showing a pick and place mechanism of the system of the present invention and an ultraviolet curing apparatus.

第7A圖及第7B圖係表示本發明該系統之一取放機制(pick and place mechanism)以及一熱固化設備的截面示意圖。7A and 7B are schematic cross-sectional views showing a pick and place mechanism of the system of the present invention and a heat curing apparatus.

要瞭解的是,當一元件說明為在另一元件「之上(on)」時,其係可直接在另一元件之上或者是係可存在插入元件(intervening elements)。然而,術語為「直接地(directly)」係意謂沒有插入元件。再者,雖然術語為「第一(first)」、「第二(second)」、「第三(third)」係使用來描述不同元件,但是這些元件不應被這些術語所限制。而且,除非不同樣地定義,否則所有術語係傾向於具有如孰悉此技術領域者所瞭解的相同意思。It is understood that when an element is referred to as "on" another element, it can be directly on the other element or the intervening elements can be present. However, the term "directly" means that no component is inserted. Furthermore, although the terms "first", "second", and "third" are used to describe different elements, these elements should not be limited by these terms. Moreover, unless otherwise defined, all terms are intended to have the same meaning as understood by those skilled in the art.

請參考第3圖,係繪示一發光二極體晶粒30。發光二極體晶粒30係為一直下式發光二極體(vertical light emitting diode)型態。為了簡化,係不會繪示出發光二極體晶粒30的不同元件。然而,發光二極體晶粒30的此型態係在美國專利號US7,615,789有進一步的描述,其係可在文中合併參考。雖然發光二極體晶粒30係描述成一直下式發光二極體,但其係客被瞭解的是,文中所描述的概念係亦可應用在其他型態的發光二極體晶 粒,例如具有平面電極架構(planar electrode configurations)的發光二極體晶粒。Referring to FIG. 3, a light emitting diode die 30 is illustrated. The light-emitting diode die 30 is in the form of a vertical light emitting diode. For the sake of simplicity, the different elements of the light-emitting diode die 30 will not be depicted. However, this type of luminescent diode die 30 is further described in U.S. Patent No. 7,615,789 which is incorporated herein by reference. Although the light-emitting diode crystal 30 is described as a direct-emitting diode, it is understood that the concept described herein can also be applied to other types of light-emitting diode crystals. Granules, such as luminescent diode dies having planar electrode configurations.

發光二極體晶粒30係包括一導電基板32以及在導電基板32上的一磊晶堆疊(epitaxial stack)40。磊晶堆疊40係包括一n型侷限層(confinement layer)34、一多量子井(multiple quantum well,MQW)層36以及一p型侷限層38,n型侷限層34係架構來發射出電磁輻射,多量子井層36係與n型侷限層34相接觸,p型侷限層38係與多量子井層36相接觸。The light emitting diode die 30 includes a conductive substrate 32 and an epitaxial stack 40 on the conductive substrate 32. The epitaxial stack 40 includes an n-type confinement layer 34, a multiple quantum well (MQW) layer 36, and a p-type confinement layer 38, and the n-type confinement layer 34 is configured to emit electromagnetic radiation. The multi-quantum well layer 36 is in contact with the n-type confinement layer 34, and the p-type confinement layer 38 is in contact with the multi-quantum well layer 36.

較佳地,n型侷限層34係包括n-GaN。對於n型侷限層34而言,其他適合的材料包括n-AlGaN、n-InGaN、n-AlInGaN、以及n-AlN。較佳地,多量子井層36係包括一或更多個量子井,各量子井係包括一或更多層InGaN/GaN、AlGaInN、AlGaN、AlInN以及AlN。多量子井層36係係可架構來從可見光頻譜範圍(即400~770nm)、紫藍光頻譜範圍(即400~450nm)、藍光頻譜範圍(即450~490nm)、綠光頻譜範圍(即490~560nm)、黃光頻譜範圍(即560~590nm)、橙光頻譜範圍(即590~635nm)、或者是紅光頻譜範圍(即635~700nm)發射電磁輻射。較佳地,p型侷限層38係包括p-GaN。。對於p型侷限層38而言,其他適合的材料包括p-AlGaN、p-InGaN、p-AlInGaN、p-AlInN、以及n-AlN。Preferably, the n-type confinement layer 34 comprises n-GaN. Other suitable materials for the n-type confinement layer 34 include n-AlGaN, n-InGaN, n-AlInGaN, and n-AlN. Preferably, the multi-quantum well layer 36 comprises one or more quantum wells, each quantum well system comprising one or more layers of InGaN/GaN, AlGaInN, AlGaN, AlInN, and AlN. The multi-quantum well 36 system can be constructed from the visible spectrum range (ie 400~770nm), the violet blue spectrum range (ie 400~450nm), the blue spectrum range (ie 450~490nm), the green spectrum range (ie 490~). 560 nm), the yellow spectrum range (ie 560~590 nm), the orange spectrum range (ie 590~635 nm), or the red spectrum range (ie 635~700 nm) emits electromagnetic radiation. Preferably, the p-type confinement layer 38 comprises p-GaN. . Other suitable materials for the p-type confinement layer 38 include p-AlGaN, p-InGaN, p-AlInGaN, p-AlInN, and n-AlN.

請仍參考第3圖,發光二極體晶粒30係亦包括一n電極44以及一p電極46,其中,n電極44係在n型侷限層34之上,p電極46係在導電基板32的背側(backside)之上。n電極44及p電極46係可包括一導電材料,例如一金屬、一金屬合金或者是一金屬堆疊的一單一層,所述的金屬例如':W、Ti、Mo、Al、Cu、Ni、Ag、Au或者是Co,所述的金屬合金例如:Cu-Co或者是Cu-Mo,所述的金屬堆疊例如Ni/Cu或者是Ni/Cu-Mo。Still referring to FIG. 3, the LED die 30 includes an n-electrode 44 and a p-electrode 46, wherein the n-electrode 44 is on the n-type confinement layer 34, and the p-electrode 46 is on the conductive substrate 32. Above the backside. The n-electrode 44 and the p-electrode 46 may comprise a conductive material, such as a metal, a metal alloy or a single layer of a metal stack such as ':W, Ti, Mo, Al, Cu, Ni, Ag, Au or Co, the metal alloy is, for example, Cu-Co or Cu-Mo, and the metal stack is, for example, Ni/Cu or Ni/Cu-Mo.

發光二極體晶粒30係亦包括一波長轉換層42,波長轉換層42係形成在磊晶堆疊40之上並與m型侷限層34相接觸。波長轉換層42係亦包括一開孔(opening)54,開孔54係與n電極44相校準,以提供進入到n電極44。波長轉換層42係架構來將至少某些由多量子井層36所發射的電磁輻射轉換到具有一不同波長範圍的電磁輻射,例如一較高波長範圍。舉裡來說,假若多量子井層36發射在一藍光頻譜範圍的電磁輻射的話,則波長轉換層42係可架構來將至少某些此輻射轉換到一黃光頻譜範圍,以使發 光二極體晶粒30的輸出出現白光。The light-emitting diode die 30 also includes a wavelength conversion layer 42 formed over the epitaxial stack 40 and in contact with the m-type confinement layer 34. The wavelength conversion layer 42 also includes an opening 54 that is aligned with the n-electrode 44 to provide access to the n-electrode 44. The wavelength conversion layer 42 is configured to convert at least some of the electromagnetic radiation emitted by the multi-quantum well layer 36 to electromagnetic radiation having a different wavelength range, such as a higher wavelength range. Incidentally, if the multi-quantum well layer 36 emits electromagnetic radiation in a range of the blue light spectrum, the wavelength conversion layer 42 can be configured to convert at least some of the radiation into a yellow spectral range to enable White light is emitted from the output of the photodiode die 30.

請參考第4圖,係繪示一平面式發光二極體晶粒60。發光二極體晶粒60係包括一透明基板62以及在透明基板62之上的一磊晶堆疊64。磊晶堆疊64係包括一n型侷限層66、一多量子井層68以及一p型侷限層70,其中,多量子井層68係與n型侷限層66電性相接觸,而n型侷限層66係架構來發射電磁輻射,而p型侷限層70係與多量子井層68電性相接觸。平面式發光二極體晶粒60係亦包括一透明導電層72以及在p型侷限層70之上的p電極74。平面式發光二極體晶粒60係亦包括在n型侷限層66之上的一n電極76。平面式發光二極體晶粒60係亦包括一波長轉換層78,波長轉換層78係具有一第一開孔80以及一第二開孔82,第一開孔80係與n電極76相校準,第二開孔82係與p電極74相校準。波長轉換層78係大致地可架構如上所述的波長轉換層42(如第2圖所示)。Referring to FIG. 4, a planar light-emitting diode die 60 is illustrated. The light emitting diode die 60 includes a transparent substrate 62 and an epitaxial stack 64 over the transparent substrate 62. The epitaxial stack 64 includes an n-type confinement layer 66, a multi-quantum well layer 68, and a p-type confinement layer 70, wherein the multi-quantum well layer 68 is electrically in contact with the n-type confinement layer 66, and the n-type is limited. The layer 66 is structured to emit electromagnetic radiation, and the p-type confinement layer 70 is in electrical contact with the multi-quantum well layer 68. The planar light-emitting diode die 60 also includes a transparent conductive layer 72 and a p-electrode 74 over the p-type confinement layer 70. The planar light-emitting diode die 60 is also included with an n-electrode 76 over the n-type confinement layer 66. The planar light-emitting diode die 60 also includes a wavelength conversion layer 78 having a first opening 80 and a second opening 82. The first opening 80 is aligned with the n-electrode 76. The second opening 82 is aligned with the p-electrode 74. The wavelength conversion layer 78 is substantially configurable as described above for the wavelength conversion layer 42 (as shown in FIG. 2).

請參考第5圖,用於製造發光二極體晶粒的一系統90係包括具有一所欲架構的一發光二極體晶粒30(或60),以及架構來附著到發光二極體晶粒30(或60)的複數個波長轉換層42。波長轉換層42係包含在一基板92上,基板92係在一能量感應黏著層94之上,能量感應黏著層94係架構來依據曝光到一物理能量以降低黏著性,此物理能量係例如電磁輻射、紫外線、紅外線、放射性或是熱能。系統90係亦包括一固化設備96,係架構來降低黏著層94的黏著性,以幫助波長轉換層42從基板92移除。系統90係亦包括一附著設備98,係架構來將波長轉換層42一次一個(one by one)從基板92上移除,並將波長轉換層42個別地附著到發光二極體晶粒30(或60)。Referring to FIG. 5, a system 90 for fabricating light-emitting diode dies includes a light-emitting diode die 30 (or 60) having a desired structure, and a structure for attaching to the light-emitting diode crystal. A plurality of wavelength conversion layers 42 of particles 30 (or 60). The wavelength conversion layer 42 is included on a substrate 92 which is attached to an energy-sensitive adhesive layer 94. The energy-sensitive adhesive layer 94 is structured to reduce adhesion according to exposure to a physical energy such as electromagnetic. Radiation, ultraviolet, infrared, radioactive or thermal energy. System 90 also includes a curing device 96 that is configured to reduce the adhesion of adhesive layer 94 to aid in the removal of wavelength conversion layer 42 from substrate 92. The system 90 also includes an attachment device 98 that is configured to remove the wavelength conversion layer 42 one by one from the substrate 92 and individually attach the wavelength conversion layer 42 to the light emitting diode die 30 ( Or 60).

基板92係可為具有一所欲尺寸吉祥狀的一晶圓(wafer)型態或一平板(panel)型態。用於基板92之適合材料係包括塑膠、金屬、陶瓷以及半導體材料。黏著層94係可直接地形成在基板92的表面上。舉例來說,黏著層94(如第5圖所示)係可包括一帶體(tape)或一沉積層(deposited layer),當曝光到如紫外線、紅外線、輻射性或熱能之物理能量時,在黏著層94上的至少一黏著表面係具有一降低的黏著性。所例示的帶體係包括高分子膜(polymer films),例如聚乙烯(polyethylene)、聚丙烯(polypropylene)、聚酯 (polyester)或者是聚碳酸脂(polycarbonate),且在帶體的一或兩側上具有如一丙烯酸聚合物(acrylic polymer)的黏膠(adhesive)。一適合的帶體係由日本Nitto Denko所製造的REVALPHA熱解膠帶(thermal release tape),並在美國經由Semiconductor Equipment Corporation of Moorpark,CA 93020所得到。不是一帶體時,黏著層94係可包括具有附著性(adhesive qualities)的一沉積高分子(deposited polymer),例如在固化或非固化狀態時的聚醯亞胺(polyimide)或環氧樹脂(epoxy)。The substrate 92 can be a wafer type or a panel type having a desired size. Suitable materials for the substrate 92 include plastic, metal, ceramic, and semiconductor materials. The adhesive layer 94 can be formed directly on the surface of the substrate 92. For example, the adhesive layer 94 (as shown in FIG. 5) may include a tape or a deposited layer that is exposed to physical energy such as ultraviolet, infrared, radiant or thermal energy. At least one of the adhesive surfaces on the adhesive layer 94 has a reduced adhesion. The illustrated belt system includes polymer films such as polyethylene, polypropylene, polyester. (polyester) or polycarbonate, and has an adhesive such as an acrylic polymer on one or both sides of the belt. A suitable belt system is REVALPHA thermal release tape manufactured by Nitto Denko, Japan, and is available in the United States via Semiconductor Equipment Corporation of Moorpark, CA 93020. When not a strip, the adhesive layer 94 may include a deposited polymer having adhesive qualities, such as polyimide or epoxy in a cured or uncured state. ).

波長轉換層42(如第5圖所示)係可直接地形成在黏著層94上,黏著層94係具有所需圓周形狀及厚度,並使用一適當的製程,例如沉積及圖刻(patterning)。舉例來說,如第5A圖所示,波長轉換層42係具有一多邊形圓周形狀,其大致上係與在發光二極體晶粒30(如第3圖所示)或60(如第4圖所示)磊晶堆疊40(如第3圖所示)或64(如第4圖所示)的圓周形狀相匹配。如第5A圖及第5B圖所示,波長轉換層42係亦可包括一或更多特徵(features)48,例如挖空(cut outs)、開孔(openings)以及狹縫(slots),其係與在發光二極體晶粒30(如第3圖所示)或60(如第4圖所示)之上的特徵相對應。舉例來說,特徵48係可與在發光二極體晶粒30(如第3圖所示)之上的n電極44(如第3圖所示)相校準。The wavelength converting layer 42 (shown in Figure 5) can be formed directly on the adhesive layer 94 having the desired circumferential shape and thickness and using a suitable process such as deposition and patterning. . For example, as shown in FIG. 5A, the wavelength conversion layer 42 has a polygonal circumferential shape that is substantially associated with the light-emitting diode die 30 (as shown in FIG. 3) or 60 (as shown in FIG. 4). The circumferential shape of the epitaxial stack 40 (shown in Figure 3) or 64 (as shown in Figure 4) matches. As shown in Figures 5A and 5B, the wavelength conversion layer 42 can also include one or more features 48, such as cut outs, openings, and slots. Corresponds to features above the LED die 30 (as shown in Figure 3) or 60 (as shown in Figure 4). For example, feature 48 can be aligned with n-electrode 44 (shown in Figure 3) over light-emitting diode die 30 (shown in Figure 3).

波長轉換層42係可包括含有一波長轉換材料的一透明基底材料,透明基底材料係例如塑膠、玻璃、陶瓷或是一黏著性高分子(adhesive polymer),波長轉換材料係例如一螢光混合物(phosphor compound)。在本例中,波長轉換材料係可結合到基底材料中,使用混合製程(mixing process)以形成不同混合物(mixture),之後其係可沉積在黏著層94上而具有一所欲圓周形狀及厚度,並固化成固狀(solid form)。所例示用於波長轉換層42的基底材料係包括液狀(liquid form)或是黏滯狀(viscous form)的矽樹脂(silicone)及環氧樹脂(epoxy),其矽可與以一特殊比率(specific ratio)之波長轉換材料相混合。所例示的波長轉換材料係包括YAG:Ce、TAG:Ce、摻雜Eu的鹼土矽氮化合物(alkaline earth silicon nitride)、摻雜Eu的鹼土矽酸鹽(alkaline earth silicate)或者是摻雜Ce的銃化鈣(calcium scandate)。不是結合到基底材料時,波長轉換材料係可沉積在基底材料上。在本例中,基底材料係可沉積在黏 著層94之上,且波長轉換材料係可使用一適當的製程以所欲的圖案沉積在基底材料之上形成一所欲厚度,製程係例如噴塗(spraying)、插件(dipping)、旋鍍(spin coating)、滾壓(rolling)、電解沉積(electro deposition)或者是氣相沉積(vapor deposition)。The wavelength conversion layer 42 may comprise a transparent substrate material comprising a wavelength conversion material such as plastic, glass, ceramic or an adhesive polymer, such as a fluorescent mixture (for example, a fluorescent mixture) Phosphor compound). In this example, the wavelength converting material can be incorporated into the substrate material, using a mixing process to form a different mixture, which can then be deposited on the adhesive layer 94 to have a desired circumferential shape and thickness. And solidified into a solid form. The base material exemplified for the wavelength conversion layer 42 includes a liquid form or a viscous form of silicone and epoxy, which can be combined with a special ratio. The wavelength conversion materials of the (specific ratio) are mixed. The wavelength conversion materials exemplified include YAG:Ce, TAG:Ce, Eu-doped alkaline earth silicon nitride, Eu-doped alkaline earth silicate or Ce-doped Calcium scandate. When not bonded to the substrate material, the wavelength converting material can be deposited on the substrate material. In this case, the base material can be deposited on the stick. Above the layer 94, and the wavelength converting material can be deposited on the substrate material in a desired pattern using a suitable process to form a desired thickness, such as spraying, dipping, spin plating ( Spin coating), rolling, electro deposition or vapor deposition.

固化設備96(如第5圖所示)係可包括一紫外線、紅外線、熱或是輻射性輻射來源,係架構來將一所需能量提供到黏著層94的一選定區域(selected area)。舉例來說,固化設備96係可被建造,以使黏著層94係可局部地(locally)固化在選定區域,以便係可個別地移除每一波長轉換層。再者,固化設備96係可架構來固化在一中的黏著層94,此區域係與一個別黏著層94的外觀(outline)相對應。Curing device 96 (shown in Figure 5) may include a source of ultraviolet, infrared, thermal or radiative radiation that is configured to provide a desired energy to a selected area of adhesive layer 94. For example, curing device 96 can be constructed such that adhesive layer 94 can be locally cured in selected regions so that each wavelength conversion layer can be individually removed. Further, curing device 96 is an adhesive layer 94 that can be constructed to cure in a region that corresponds to the exterior of an additional adhesive layer 94.

附著設備98(如第5圖所示)係可包括一毛細設備(capillary device),其係架構來從基板92提取波長轉換層42,並將波長轉換層42置放到發光二極體晶粒30(或60)之上。附著設備98係亦可包括一步進機制(stepper mechanism),例如一x-y滑台(table),其係架構來使基板92與毛細設備校準。The attachment device 98 (as shown in FIG. 5) can include a capillary device that is configured to extract the wavelength conversion layer 42 from the substrate 92 and place the wavelength conversion layer 42 on the light emitting diode die. Above 30 (or 60). Attachment device 98 can also include a stepper mechanism, such as an x-y table, that is configured to align substrate 92 with the capillary device.

請參考第6A圖及第6B圖,一系統90A係包括一黏著層94A,係架構來依據曝光到紫外線輻射以降低黏著性。系統90A係包括一固化設備96A,係架構來將紫外線輻射集中在一選定區域上。如第6B圖所示,降低黏著性的選定區域106A係具有一圓周形狀,此圓周形狀係與波長轉換層42的圓周形狀相對應。系統90A係亦包括一毛細管(capillary)100,其係與一真空裝置(vacuum)102相連通,真空裝置102係架構來從基板92提取波長轉換層42,並將波長轉換層42置放到晶粒30(或60)之上。Referring to Figures 6A and 6B, a system 90A includes an adhesive layer 94A that is structured to reduce adhesion by exposure to ultraviolet radiation. System 90A includes a curing device 96A that is configured to concentrate ultraviolet radiation onto a selected area. As shown in Fig. 6B, the selected region 106A for lowering the adhesion has a circumferential shape corresponding to the circumferential shape of the wavelength conversion layer 42. System 90A also includes a capillary 100 in communication with a vacuum 102 that is configured to extract wavelength converting layer 42 from substrate 92 and to place wavelength converting layer 42 on the crystal. Above the pellet 30 (or 60).

請參考第7A圖及第7B圖,一系統90B係包括一能量感應黏著層94B,其係架構來依據曝光於熱能以降低黏著層。系統90B係包括一熱壓(hot bar)固化設備96B,其係架構來將熱能104B導向用於加熱黏著層94B的一選定區域106B。如第6B圖所示,降低黏著性的選定區域106B係具有一圓周形狀,此圓周形狀係與波長轉換層42的圓周形狀相對應。系統90B係亦包括一毛細管100,其係與一真空裝置102相連通,真空裝置102係架構來從基板92提取波長轉換層42,並將波長轉換層42置放在晶粒30(或 60)之上。Referring to FIGS. 7A and 7B, a system 90B includes an energy-sensitive adhesive layer 94B that is structured to reduce the adhesive layer by exposure to thermal energy. System 90B includes a hot bar curing device 96B that is configured to direct thermal energy 104B to a selected region 106B for heating adhesive layer 94B. As shown in Fig. 6B, the selected region 106B for lowering the adhesion has a circumferential shape corresponding to the circumferential shape of the wavelength conversion layer 42. System 90B also includes a capillary tube 100 in communication with a vacuum device 102 that is configured to extract wavelength conversion layer 42 from substrate 92 and place wavelength conversion layer 42 on die 30 (or 60) above.

當前述係針對本發明之各實施例時,本發明之其他或進一步的實施例係可被設計出而無須違反其基本範圍,且其基本範圍係由下列的申請專利範圍所界定。雖然本發明以相關的較佳實施例進行解釋,但是這並不構成對本發明的限制。應說明的是,本領域的技術人員根據本發明的思想能夠構造出很多其他類似實施例,這些均在本發明的保護範圍之中。While the foregoing is directed to the various embodiments of the present invention, further or further embodiments of the present invention may be devised without departing from the basic scope thereof, and the basic scope thereof is defined by the following claims. Although the present invention has been explained in connection with the preferred embodiments, it is not intended to limit the invention. It should be noted that many other similar embodiments can be constructed in accordance with the teachings of the present invention, which are within the scope of the present invention.

30‧‧‧發光二極體晶粒30‧‧‧Light-emitting diode grains

32‧‧‧導電基板32‧‧‧Electrical substrate

34‧‧‧n型侷限層34‧‧‧n type limited layer

36‧‧‧多量子井層36‧‧‧Multi-quantum wells

38‧‧‧p型侷限層38‧‧‧p type limited layer

40‧‧‧磊晶堆疊40‧‧‧ epitaxial stacking

42‧‧‧波長轉換層42‧‧‧wavelength conversion layer

44‧‧‧n電極44‧‧‧n electrode

46‧‧‧p電極46‧‧‧p electrode

54‧‧‧開孔54‧‧‧Opening

Claims (20)

一種製造發光二極體晶粒的系統,係包括:一發光二極體晶粒;一波長轉換層,係架構來附著到該發光二極體晶粒,該發光二極體晶粒係包含在一基板上,該基板係在一黏附層(adhesive layer)上,該黏附層係架構來依據曝光於一物理能量(physical energy)以降低黏著性(adhesiveness);一固化設備(curing apparatus),係架構來降低該黏著層的黏著性,以幫助該波長轉換層從該基板上移除;以及一附著設備(attachment apparatus),係架構來將該波長轉換層從該基板移除並將該波長轉換層附著到該發光二極體晶粒。A system for fabricating a light-emitting diode die includes: a light-emitting diode die; a wavelength conversion layer attached to the light-emitting diode die, the light-emitting diode die is included in On a substrate, the substrate is attached to an adhesive layer structure that is exposed to a physical energy to reduce adhesiveness; a curing apparatus, An architecture to reduce adhesion of the adhesive layer to assist removal of the wavelength conversion layer from the substrate; and an attachment apparatus to remove the wavelength conversion layer from the substrate and convert the wavelength A layer is attached to the light emitting diode die. 根據申請專利範圍第1項之系統,其中,該波長轉換層係具有一第一圓周形狀(first peripheral shape),其係大致上與在該發光二極體晶粒上之一區域(area)的一第二圓周形狀相符合。The system of claim 1, wherein the wavelength conversion layer has a first peripheral shape substantially corresponding to an area on the light emitting diode die A second circumferential shape conforms. 根據申請專利範圍第1項之系統,其中,該波長轉換層係包括一或一以上個特徵,該一或一以上個特徵係與在發光二極體晶粒上之一或一以上個相對應特徵校準(align)。The system of claim 1, wherein the wavelength conversion layer comprises one or more features corresponding to one or more of the luminescent diode dies Feature calibration (align). 根據申請專利範圍第1項之系統,其中,該物理能量係包括紫外線輻射,且該固化設備係包括一紫外線輻射固化裝置(ultraviolet radiation curing apparatus)。The system of claim 1, wherein the physical energy comprises ultraviolet radiation, and the curing apparatus comprises an ultraviolet radiation curing apparatus. 根據申請專利範圍第1項之系統,其中,該物理能量係包括熱能,且該固化設備係包括一熱壓(hot bar)固化設備。The system of claim 1, wherein the physical energy system comprises thermal energy, and the curing device comprises a hot bar curing device. 一種製造發光二極體晶粒的系統,係包括:一發光二極體晶粒;複數個波長轉換層,係在一基板上,該基板係在一黏附層(adhesive layer)上,該黏附層係架構來依據曝光於一電磁輻射(electromagnetic radiation)以降低黏著性(adhesiveness),每一波長轉換層係架構來附著在該發光二極體晶粒上並具有一第一圓周形狀;一固化設備,係架構來將一物理能量提供在該固化設備之一選定區域(selected area)的該黏著層上,以降低該黏著層的黏著性,該選定區域 係具有一第二圓周形狀,該第二圓周形狀係相對應該第一圓周形狀;以及一附著設備,係架構來將該等波長轉換層一次一個從該基板上移除,並將該等波長轉換層附著到該發光二極體晶粒。A system for fabricating a light-emitting diode die includes: a light-emitting diode die; a plurality of wavelength conversion layers on a substrate, the substrate being attached to an adhesive layer, the adhesion layer The structure is based on exposure to an electromagnetic radiation to reduce adhesiveness, each wavelength conversion layer structure is attached to the light emitting diode die and has a first circumferential shape; a curing device a structure for providing a physical energy on the adhesive layer of a selected area of the curing device to reduce the adhesion of the adhesive layer, the selected area Having a second circumferential shape corresponding to the first circumferential shape; and an attachment device for removing the wavelength conversion layers from the substrate one at a time and converting the wavelengths A layer is attached to the light emitting diode die. 根據申請專利範圍第6項之系統,其中,該物理能量係為選自下列群組的一輻射:紫外線(ultraviolet)、紅外線(infrared)、放射性(radioactive)以及熱(heat)。The system of claim 6, wherein the physical energy is a radiation selected from the group consisting of ultraviolet, infrared, radioactive, and heat. 根據申請專利範圍第6項之系統,其中,每一波長轉換層係包括一特徵(feature),其係選自以下群組:挖空(cut outs)、開孔(openings)以及狹縫(slots)。The system of claim 6 wherein each wavelength conversion layer comprises a feature selected from the group consisting of: cut outs, openings, and slots (slots) ). 根據申請專利範圍第6項之系統,其中,該物理能量係包括紫外線輻射,且該固化設備係包括一紫外線輻射固化裝置(ultraviolet radiation curing apparatus)。The system of claim 6 wherein the physical energy comprises ultraviolet radiation and the curing apparatus comprises an ultraviolet radiation curing apparatus. 根據申請專利範圍第6項之系統,其中,該物理能量係包括熱能,且該固化設備係包括一熱壓(hot bar)固化設備。A system according to claim 6 wherein the physical energy system comprises thermal energy and the curing device comprises a hot bar curing device. 根據申請專利範圍第6項之系統,其中,該等波長轉換層係包括一基底材料(base material)以及混合到該基材料中的一螢光混合物(phosphor compound)。The system of claim 6 wherein the wavelength converting layer comprises a base material and a phosphor compound mixed into the base material. 根據申請專利範圍第6項之系統,其中,該等波長轉換層係包括一基底材料以及沉積在該基底材料上的一螢光混合物。The system of claim 6 wherein the wavelength converting layer comprises a substrate material and a fluorescent mixture deposited on the substrate material. 根據申請專利範圍第6項之系統,其中,該發光二極體晶粒係包括一直下式發光二極體晶粒(vertical LED die)。The system of claim 6 wherein the light emitting diode die comprises a vertical LED die. 根據申請專利範圍第6項之系統,其中,該發光二極體晶粒係包括一平面式發光二極體晶粒(planar LED die)。The system of claim 6 wherein the light emitting diode die comprises a planar LED die. 一種製造發光二極體晶粒的方法,係包括:提供具有一所欲架構(desired configuration)的一發光二極體晶粒;提供包含在一基板上之一波長轉換層,該基板係在一黏著層上,該黏著層係架構來依據曝光在一物理能量以降低黏著性;將在該基板上的該黏著層曝光在該物理能量,以降低該黏著層的黏著性,並幫助該波長轉換層從該基板移除; 將該波長轉換層從該基板上移除;以及將該波長轉換層附著到該發光二極體晶粒。A method of fabricating a light emitting diode die, comprising: providing a light emitting diode die having a desired configuration; providing a wavelength conversion layer on a substrate, the substrate being attached On the adhesive layer, the adhesive layer is structured to expose a physical energy to reduce adhesion; the adhesive layer on the substrate is exposed to the physical energy to reduce the adhesion of the adhesive layer and to assist in the wavelength conversion. The layer is removed from the substrate; Removing the wavelength conversion layer from the substrate; and attaching the wavelength conversion layer to the light emitting diode die. 根據申請專利範圍第14項之方法,其中,提供發光二極體晶粒之該步驟係包括在該黏著層上之一基板上提供複數個波長轉換層,且曝光的該步驟係包括將該黏著層的一選定區域曝光,而該黏著層的該選定區域係具有一圓周形狀,該圓周形狀係相對應該發光二極體晶粒的一圓周形狀。The method of claim 14, wherein the step of providing a light-emitting diode die comprises providing a plurality of wavelength conversion layers on a substrate on the adhesive layer, and the step of exposing comprises bonding the bond A selected area of the layer is exposed, and the selected area of the adhesive layer has a circumferential shape that corresponds to a circumferential shape of the light-emitting diode die. 根據申請專利範圍第14項之方法,其中,該物理能量係包括紫外線輻射,且曝光之該步驟係使用一紫外線輻射固化裝置來實現。The method of claim 14, wherein the physical energy system comprises ultraviolet radiation, and the step of exposing is performed using an ultraviolet radiation curing device. 根據申請專利範圍第14項之方法,其中,該物理能量係包括熱能,且曝光之該步驟係使用一熱壓固化裝置來實現。The method of claim 14, wherein the physical energy system comprises thermal energy, and the step of exposing is performed using a hot press curing device. 根據申請專利範圍第14項之方法,其中,該波長轉換層係包括選自下列群組的一特徵:挖空(cut outs)、開孔(openings)以及狹縫(slots)。The method of claim 14, wherein the wavelength conversion layer comprises a feature selected from the group consisting of: cut outs, openings, and slots. 根據申請專利範圍第14項之方法,其中,該發光二極體晶粒係包括一直下式發光二極體晶粒或一平面式發光二極體晶粒。The method of claim 14, wherein the light emitting diode crystal grain comprises a direct light emitting diode crystal grain or a planar light emitting diode crystal grain.
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