TWI503842B - Resistive memory apparatus and memory cell thereof - Google Patents

Resistive memory apparatus and memory cell thereof Download PDF

Info

Publication number
TWI503842B
TWI503842B TW102143476A TW102143476A TWI503842B TW I503842 B TWI503842 B TW I503842B TW 102143476 A TW102143476 A TW 102143476A TW 102143476 A TW102143476 A TW 102143476A TW I503842 B TWI503842 B TW I503842B
Authority
TW
Taiwan
Prior art keywords
resistive memory
resistor
transistor
memory cell
line
Prior art date
Application number
TW102143476A
Other languages
Chinese (zh)
Other versions
TW201521039A (en
Inventor
Ming-Huei Shieh
Yuan Mou Su
Hua-Yu Su
Young-Tae Kim
Douk-Hyoun Ryu
Original Assignee
Winbond Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Winbond Electronics Corp filed Critical Winbond Electronics Corp
Priority to TW102143476A priority Critical patent/TWI503842B/en
Publication of TW201521039A publication Critical patent/TW201521039A/en
Application granted granted Critical
Publication of TWI503842B publication Critical patent/TWI503842B/en

Links

Landscapes

  • Semiconductor Memories (AREA)

Description

電阻式記憶體裝置及其記憶胞Resistive memory device and its memory cell

本發明是有關於一種電阻式記憶體及其記憶胞。The invention relates to a resistive memory and a memory cell thereof.

隨著資訊需求的增加,在電子裝置中配置大容量的記憶體以成為一個重要趨勢。在提供足夠容量的長效性記憶空間的需求下,在現今的技術領域中,電阻式記憶體成為一種新寵。As the demand for information increases, it is an important trend to allocate large-capacity memory in electronic devices. In the current technical field, resistive memory has become a new favorite in the need to provide a long-lasting memory space with sufficient capacity.

利用電阻式記憶體來做為非揮發性記憶體是一種廣受歡迎的趨勢。其主要原因在於,電阻式記憶體所具有的相對高的寫入速度、相對低的操作功耗,以及電阻式記憶體的製造完全相容於現今的積體電路的製造技術。The use of resistive memory as a non-volatile memory is a popular trend. The main reason is that the relatively high writing speed of the resistive memory, the relatively low operating power consumption, and the fabrication of the resistive memory are completely compatible with the manufacturing technology of today's integrated circuits.

然而,在現今的技術領域中,電阻式記憶胞尚有其阻抗值在被設定(set)以及重置(reset)間的差距無法保持穩定的問題。而其主要的原因在於電阻式記憶胞被重置時的電阻值的控制較不穩定而產生的。這個現象可能導致對電阻式記憶胞進行資料讀取時發生錯誤,影響到電阻式記憶體的可靠度。However, in the current technical field, the resistive memory cell has a problem that the impedance value cannot be kept stable between the set and the reset. The main reason is that the control of the resistance value when the resistive memory cell is reset is relatively unstable. This phenomenon may cause errors in the reading of resistive memory cells, which affects the reliability of resistive memory.

本發明提供一種電阻式記憶體及其記憶胞,可有效提高其感測邊界(sensing margin),以及提升其可靠度。The invention provides a resistive memory and a memory cell thereof, which can effectively improve the sensing margin and improve the reliability thereof.

本發明的電阻式記憶胞包括第一電晶體、第二電晶體、第一電阻以及第二電阻。第一電晶體具有第一端、第二端以及控制端。第一電晶體的第一端及第二端分別耦接至第一位元線及參考電壓,第一電晶體的控制端接收字元線信號。第二電晶體具有第一端、第二端以及控制端,第二電晶體的第一端及第二端分別耦接至第二位元線及參考電壓,第二電晶體的控制端接收字元線信號。第一電阻串接在第一電晶體的第一端及第一位元線的耦接路徑間或串接在第一電晶體的第二端及參考電壓的耦接路徑間。第二電阻串接在第二電晶體的第一端及第二位元線的耦接路徑間或串接在第二電晶體的第二端及參考電壓的耦接路徑間。The resistive memory cell of the present invention includes a first transistor, a second transistor, a first resistor, and a second resistor. The first transistor has a first end, a second end, and a control end. The first end and the second end of the first transistor are respectively coupled to the first bit line and the reference voltage, and the control end of the first transistor receives the word line signal. The second transistor has a first end, a second end, and a control end. The first end and the second end of the second transistor are respectively coupled to the second bit line and the reference voltage, and the control end of the second transistor receives the word. Meta-line signal. The first resistor is connected in series between the first end of the first transistor and the coupling path of the first bit line or in series between the second end of the first transistor and the coupling path of the reference voltage. The second resistor is connected in series between the coupling path of the first end and the second bit line of the second transistor or in series between the second end of the second transistor and the coupling path of the reference voltage.

本發明另提出一種電阻式記憶體裝置,包括多個電阻式記憶胞、多數條位元線對以及多數條源極線。電阻式記憶胞排列成記憶胞陣列,且記憶胞陣列具有多數個記憶胞行以及多數個記憶胞列。字元線分別耦接記憶胞列並分別傳送多個字元線信號。位元線對分別耦接記憶胞行。源極線分別耦接至電阻式記憶胞。此外,電阻式記憶胞包括第一電晶體、第二電晶體、第一電阻以及第二電阻。第一電晶體具有第一端、第二端以及控制端。第一電晶體的第一端及第二端分別耦接至第一位元線及參考電壓,第一電晶體的控制端接收字元線信號。第二電晶體具有第一端、第 二端以及控制端,第二電晶體的第一端及第二端分別耦接至第二位元線及參考電壓,第二電晶體的控制端接收字元線信號。第一電阻串接在第一電晶體的第一端及第一位元線的耦接路徑間或串接在第一電晶體的第二端及參考電壓的耦接路徑間。第二電阻串接在第二電晶體的第一端及第二位元線的耦接路徑間或串接在第二電晶體的第二端及參考電壓的耦接路徑間。The invention further provides a resistive memory device comprising a plurality of resistive memory cells, a plurality of bit line pairs, and a plurality of source lines. The resistive memory cells are arranged in a memory cell array, and the memory cell array has a plurality of memory cell rows and a plurality of memory cell columns. The word lines are respectively coupled to the memory cell columns and respectively transmit a plurality of word line signals. The bit line pairs are respectively coupled to the memory cell row. The source lines are respectively coupled to the resistive memory cells. Further, the resistive memory cell includes a first transistor, a second transistor, a first resistor, and a second resistor. The first transistor has a first end, a second end, and a control end. The first end and the second end of the first transistor are respectively coupled to the first bit line and the reference voltage, and the control end of the first transistor receives the word line signal. The second transistor has a first end, a The second end and the second end of the second transistor are respectively coupled to the second bit line and the reference voltage, and the control end of the second transistor receives the word line signal. The first resistor is connected in series between the first end of the first transistor and the coupling path of the first bit line or in series between the second end of the first transistor and the coupling path of the reference voltage. The second resistor is connected in series between the coupling path of the first end and the second bit line of the second transistor or in series between the second end of the second transistor and the coupling path of the reference voltage.

基於上述,本發明透過電阻式記憶胞中的第一位元線以及第二位元線所分別傳送的第一電阻與第二電阻的阻抗狀態來判讀出電阻式記憶胞中的儲存資料。如此一來,藉由第一電阻與第二電阻是被設定(set)或被重置(reset)的不同狀態的組合來進行判讀,可以更準確的獲知電阻式記憶胞中的儲存資料。並且,在當被重置的電阻的阻抗值無法有效被重置到理想值時可以透過改變被設定的電阻的阻抗值來控制電阻式記憶胞的感測邊界,維持其效能。Based on the above, the present invention determines the stored data in the resistive memory cell through the impedance states of the first resistor and the second resistor respectively transmitted by the first bit line and the second bit line in the resistive memory cell. In this way, by the combination of the first resistor and the second resistor being set or reset, the stored data in the resistive memory cell can be more accurately known. Moreover, when the impedance value of the reset resistor cannot be effectively reset to the ideal value, the sensing boundary of the resistive memory cell can be controlled by changing the impedance value of the set resistor to maintain its performance.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

100、211~242‧‧‧電阻式記憶胞100,211~242‧‧‧Resistive memory cells

200、300、400‧‧‧電阻式記憶體裝置200, 300, 400‧‧‧Resistive memory device

M1、M2‧‧‧電晶體M1, M2‧‧‧ transistor

R0_L、R0_R、R1、R2‧‧‧電阻R0_L, R0_R, R1, R2‧‧‧ resistance

VG_Sel1、VG_Sel2‧‧‧字元線信號VG_Sel1, VG_Sel2‧‧‧ character line signal

VS‧‧‧參考電壓VS‧‧‧reference voltage

WL0~WL3‧‧‧字元線WL0~WL3‧‧‧ character line

SL0~SL1、SL0_U、SL0_D‧‧‧源極線SL0~SL1, SL0_U, SL0_D‧‧‧ source line

BL_L、BL_R、BL0_L~BL1_L、BL0_R~BL1_R、BL1_U~BL3_U、BL1_D~BL3_D‧‧‧位元線BL_L, BL_R, BL0_L~BL1_L, BL0_R~BL1_R, BL1_U~BL3_U, BL1_D~BL3_D‧‧‧ bit line

311_1、311_2、321_1、321_2‧‧‧部分電阻式記憶胞311_1, 311_2, 321_1, 321_2‧‧‧partial resistive memory cells

WL0_U~WL1_U、WL0_D~WL1_D‧‧‧子字元線WL0_U~WL1_U, WL0_D~WL1_D‧‧‧ sub-word line

410‧‧‧記憶胞陣列410‧‧‧ memory cell array

420‧‧‧差動放大器420‧‧‧Differential Amplifier

431、432‧‧‧前級放大器431, 432‧‧‧ preamplifier

SW1~SW4‧‧‧開關SW1~SW4‧‧‧ switch

SEL1~SEL4‧‧‧選擇信號SEL1~SEL4‧‧‧Selection signal

ST‧‧‧感測端ST‧‧‧ Sense end

RT‧‧‧參考端RT‧‧‧ reference end

REF‧‧‧參考信號線REF‧‧‧ reference signal line

圖1A繪示本發明實施例的電阻式記憶胞的示意圖。FIG. 1A is a schematic diagram of a resistive memory cell according to an embodiment of the invention.

圖1B繪示本發明實施例的電阻式記憶胞的示意圖。FIG. 1B is a schematic diagram of a resistive memory cell in accordance with an embodiment of the present invention.

圖2A繪示本發明一實施例的電阻式記憶體裝置的示意圖。2A is a schematic diagram of a resistive memory device in accordance with an embodiment of the present invention.

圖2B繪示圖2A實施例的另一實施方式的電阻式記憶體裝置的示意圖。2B is a schematic diagram of a resistive memory device of another embodiment of the embodiment of FIG. 2A.

圖2C繪示圖2A實施例的再一實施方式的電阻式記憶體裝置的示意圖。2C is a schematic diagram of a resistive memory device according to still another embodiment of the embodiment of FIG. 2A.

圖3A繪示本發明另一實施例的電阻式記憶體裝置的示意圖。FIG. 3A is a schematic diagram of a resistive memory device according to another embodiment of the present invention.

圖3B繪示本發明圖3A實施例的電阻式記憶體裝置的另一實施方式的示意圖。FIG. 3B is a schematic diagram of another embodiment of the resistive memory device of the embodiment of FIG. 3A of the present invention. FIG.

圖4繪示本發明再一實施例的電阻式記憶體裝置的示意圖。4 is a schematic diagram of a resistive memory device according to still another embodiment of the present invention.

請參照圖1A,圖1A繪示本發明實施例的電阻式記憶胞的示意圖。電阻式記憶胞110包括電晶體M1、M2以及電阻R0_L以及R0_R。電晶體M1具有第一端、第二端以及控制端,電晶體M1可以是金氧半導場效電晶體(MOSFET)。電晶體M1的第二端(例如其源極)耦接至參考電壓VS,電晶體M1的控制端(例如其閘極)接收字元線信號VG_Sel1,電晶體M1的第一端(例如其汲極)則耦接至電阻R0_L,參考電壓VS可以是源極電壓(source voltage)。電晶體M2具有第一端、第二端以及控制端,電晶體M2也可以是金氧半導場效電晶體(MOSFET)。電晶體M2的第二端(例如其源極)耦接至參考電壓VS,電晶體M2的控制端(例如其閘極)接收字元線信號VG_Sel2,電晶體M2的第一端(例如其汲極)則耦接至電阻R0_R。Please refer to FIG. 1A. FIG. 1A is a schematic diagram of a resistive memory cell according to an embodiment of the present invention. The resistive memory cell 110 includes transistors M1, M2 and resistors R0_L and R0_R. The transistor M1 has a first end, a second end, and a control end, and the transistor M1 may be a gold-oxygen semiconductor field effect transistor (MOSFET). The second end of the transistor M1 (eg, its source) is coupled to the reference voltage VS, and the control terminal (eg, its gate) of the transistor M1 receives the word line signal VG_Sel1, the first end of the transistor M1 (eg, The pole is coupled to the resistor R0_L, and the reference voltage VS may be a source voltage. The transistor M2 has a first end, a second end, and a control end, and the transistor M2 may also be a gold-oxygen semiconductor field effect transistor (MOSFET). The second end of the transistor M2 (eg, its source) is coupled to the reference voltage VS, and the control terminal (eg, its gate) of the transistor M2 receives the word line signal VG_Sel2, the first end of the transistor M2 (eg, The pole is coupled to the resistor R0_R.

在上述的實施例中,電晶體M1及M2可以是N型的也可以是P型的金氧半導場效電晶體。當然,在本發明其他實施例中,電晶體M1及M2也可以是任意型態的雙極性接面電晶體(Bipolar Junction Transistor,BJT)。In the above embodiments, the transistors M1 and M2 may be N-type or P-type MOS field-effect transistors. Of course, in other embodiments of the present invention, the transistors M1 and M2 may also be any type of Bipolar Junction Transistor (BJT).

請注意,電晶體M1以及M2的控制端所分別接收的字元線信號VG_Sel1以及VG_Sel2可以是來自於同一條字元線(word line)所傳送的相同的信號,也可以是一條字元線中的兩條子字元線所傳送的不相同的信號。Please note that the word line signals VG_Sel1 and VG_Sel2 received by the control terminals of the transistors M1 and M2, respectively, may be the same signal transmitted from the same word line, or may be in a word line. The two sub-word lines transmit different signals.

電阻R0_L的第一端耦接至電晶體M1的第一端,而電阻R0_L的第二端則耦接至位元線BL0_L。此外,電阻R0_R的第一端耦接至電晶體M2的第一端,而電阻R0_R的第二端則耦接至位元線BL0_R。The first end of the resistor R0_L is coupled to the first end of the transistor M1, and the second end of the resistor R0_L is coupled to the bit line BL0_L. In addition, the first end of the resistor R0_R is coupled to the first end of the transistor M2, and the second end of the resistor R0_R is coupled to the bit line BL0_R.

值得注意的是,本實施例的電阻式記憶胞110可以提供單一個位元的儲存資料或也可以提供兩個位元的讀取資料。以電阻式記憶胞110提供單一個位元的儲存資料為範例,使用者可以透過位元線BL0_L以及位元線BL0_R來獲知電阻R0_L以及R0_R所分別提供的阻抗狀態。並透過這個阻抗狀態來得知電阻式記憶胞110所儲存的儲存資料。舉例來說明,例如當電阻R0_L所提供的阻抗為高阻抗,而電阻R0_R所提供的阻抗為低阻抗(低於電阻R0_L所提供的阻抗值)時,可以判讀電阻式記憶胞110所儲存的儲存資料為位元“0”(或為位元“1”),而當電阻R0_L所提供的阻抗為低阻抗,電阻R0_R所提供的阻抗為高阻抗時,則判讀電 阻式記憶胞110所儲存的儲存資料為位元“0”(或為位元“1”)。It should be noted that the resistive memory cell 110 of the present embodiment can provide a single bit of stored data or can also provide two bits of read data. For example, the resistive memory cell 110 provides a single bit of stored data. The user can obtain the impedance states provided by the resistors R0_L and R0_R through the bit line BL0_L and the bit line BL0_R. The stored data stored in the resistive memory cell 110 is known through the impedance state. For example, when the impedance provided by the resistor R0_L is high impedance and the impedance provided by the resistor R0_R is low impedance (below the impedance value provided by the resistor R0_L), the stored storage of the resistive memory cell 110 can be interpreted. The data is bit "0" (or bit "1"), and when the impedance provided by resistor R0_L is low impedance and the impedance provided by resistor R0_R is high impedance, then the power is read. The stored data stored by the resistive memory cell 110 is bit "0" (or bit "1").

當然,本發明實施例或也可以在當電阻R0_L以及R0_R所提供的阻抗皆為高阻抗(例如大於第一臨界電阻值)時,判讀電阻式記憶胞110所儲存的儲存資料為位元“0”(或為位元“1”),並在當電阻R0_L以及R0_R所提供的阻抗皆為低阻抗(例如小於第二臨界電阻值)時,判讀電阻式記憶胞110所儲存的儲存資料為位元“0”(或為位元“1”)。其中,用以判斷電阻R0_L以及R0_R所提供的阻抗皆為高阻抗或低阻抗的第一及第二臨界電阻值可以相同也可以不相同。第一及第二臨界電阻值是預先設定好的數值,且第一臨界電阻值大於第二臨界電阻值。Certainly, the embodiment of the present invention may also determine that the stored data stored in the resistive memory cell 110 is a bit “0” when the impedances provided by the resistors R0_L and R0_R are both high impedances (eg, greater than the first critical resistance value). (or bit "1"), and when the impedances provided by the resistors R0_L and R0_R are both low impedance (for example, less than the second critical resistance value), the stored data stored in the resistive memory cell 110 is interpreted as a bit. Yuan "0" (or bit "1"). The first and second threshold resistance values for determining that the impedances provided by the resistors R0_L and R0_R are both high impedance or low impedance may be the same or different. The first and second critical resistance values are predetermined values, and the first critical resistance value is greater than the second critical resistance value.

上述關於電阻R0_L以及R0_R所提供的高低阻抗的判斷動作,可以藉由字元線VG_Sel0以及VG_Sel1使電晶體M1以及M2導通,並透過位元線BL0_L以及位元線BL0_R所讀取的電流(或電壓)值大小來與一預設臨界值進行比較來加以判斷。這個預設臨界值可以依據電阻式記憶胞110的製程參數的變化來進行調整,如此一來,電阻式記憶胞110的儲存資料讀取的不穩定現象將可以有效的被避免。The above-mentioned high and low impedance determination operations provided by the resistors R0_L and R0_R can turn on the transistors M1 and M2 by the word lines VG_Sel0 and VG_Sel1, and pass the currents read by the bit line BL0_L and the bit line BL0_R (or The magnitude of the voltage) is compared to a predetermined threshold to determine. The preset threshold value can be adjusted according to the change of the process parameters of the resistive memory cell 110. As a result, the instability of the stored data reading of the resistive memory cell 110 can be effectively avoided.

值得一提的是,本發明實施例的電阻式記憶胞110是透過電阻R0_L以及R0_R所提供的阻抗狀態彼此相互比較,來得知電阻式記憶胞110的儲存資料。也就是說,本發明實施例的電阻式記憶胞110不需要設置用來提供參考值的參考記憶胞來做為阻抗值比對的依據。如此一來,利用本發明實施例的電阻式記憶胞 110所建構的記憶體可省去參考記憶胞所需要的面積,以及參考記憶胞所需要功率消耗,有效降低價格並節省功耗,並有效提升電阻式記憶胞110的資料讀取速度。It is to be noted that the resistive memory cell 110 of the embodiment of the present invention compares the impedance states provided by the resistors R0_L and R0_R with each other to obtain the stored data of the resistive memory cell 110. That is to say, the resistive memory cell 110 of the embodiment of the present invention does not need to set a reference memory cell for providing a reference value as a basis for impedance value comparison. In this way, the resistive memory cell using the embodiment of the present invention is utilized. The memory constructed by 110 can save the area required for the reference memory cell, and the power consumption required by the reference memory cell, effectively reduce the price and save power consumption, and effectively improve the data reading speed of the resistive memory cell 110.

在另一方面,電阻式記憶胞110中的電晶體M1、電阻R0_L以及電晶體M2、電阻R0_R可以分開以儲存兩個位元的儲存資料。具體來說,電晶體M1以及電阻R0_L的組合可以用以儲存一個位元的儲存資料,而電晶體M2以及電阻R0_R的組合可以用以儲存另一個位元的儲存資料。當要對電阻式記憶胞110進行讀取時,可以藉由字元線VG_Sel0以及VG_Sel1分別使電晶體M1以及M2導通,並分別依據位元線BL0_L以及位元線BL0_R上的電流,來分別判讀電阻R0_L、R0_R的阻抗值,並分別依據電阻R0_L、R0_R的阻抗值是否大於一個預設臨界值,或者是小於另一個預設臨界值來判讀出單一個電阻式記憶胞110所儲存的儲存資料的兩個位元。On the other hand, the transistor M1, the resistor R0_L, and the transistor M2, and the resistor R0_R in the resistive memory cell 110 can be separated to store two bits of stored data. Specifically, the combination of the transistor M1 and the resistor R0_L can be used to store the stored data of one bit, and the combination of the transistor M2 and the resistor R0_R can be used to store the stored data of another bit. When the resistive memory cell 110 is to be read, the transistors M1 and M2 can be turned on by the word lines VG_Sel0 and VG_Sel1, respectively, and respectively interpreted according to the currents on the bit line BL0_L and the bit line BL0_R. The impedance values of the resistors R0_L and R0_R are respectively determined according to whether the impedance values of the resistors R0_L and R0_R are greater than a predetermined threshold value, or are less than another preset threshold value to read the stored data stored in the single resistive memory cell 110. Two bits.

附帶一提的,在針對電阻式記憶胞110進行資料寫入的部分,可先透過字元線VG_Sel0以及VG_Sel1來傳送字元信號以選中電阻式記憶胞110,並於電阻式記憶胞110在被選中的狀態下,分別透過設定或重置電阻R0_L以及R0_R的阻抗值來寫入儲存資料。當然,電阻R0_L以及R0_R的阻抗狀態可依據所要寫入的儲存資料來決定的。Incidentally, in the portion for writing data to the resistive memory cell 110, the character signal can be transmitted through the word lines VG_Sel0 and VG_Sel1 to select the resistive memory cell 110, and the resistive memory cell 110 is In the selected state, the stored data is written by setting or resetting the resistance values of the resistors R0_L and R0_R, respectively. Of course, the impedance states of the resistors R0_L and R0_R can be determined according to the stored data to be written.

值得注意的是,當電阻式記憶胞110被重置狀態的電阻所提供的阻抗值有不穩定現象時,可以透過改變設定狀態下的電 阻所提供的阻抗值來維持住被重置以及被設定的電阻的阻抗值間的差異,再透過針對電阻式記憶胞110中,電阻R0_L以及R0_R被重置狀態及/或被設定狀態下的電阻值進行比較,可以有效的防止儲存資料讀取的判斷發生錯誤的可能。It is worth noting that when the resistance value provided by the resistor of the resistive memory cell 110 in the reset state is unstable, the power in the set state can be changed. The resistance value provided by the resistor is used to maintain the difference between the impedance values of the reset and the set resistor, and then the resistors R0_L and R0_R are reset and/or set in the resistive memory cell 110. Comparing the resistance values can effectively prevent the possibility of error in the judgment of the stored data reading.

以下請參照圖1B,圖1B繪示本發明實施例的電阻式記憶胞的示意圖。圖1B中的電阻式記憶胞120與圖1A中的電阻式記憶胞110不相同的是,電阻R0_L是耦接在電晶體M1與參考電壓VS的耦接路徑間,而電阻R0_R則是耦接在電晶體M2與參考電壓VS的耦接路徑間。Please refer to FIG. 1B. FIG. 1B is a schematic diagram of a resistive memory cell according to an embodiment of the present invention. The resistive memory cell 120 of FIG. 1B is different from the resistive memory cell 110 of FIG. 1A in that the resistor R0_L is coupled between the coupling path of the transistor M1 and the reference voltage VS, and the resistor R0_R is coupled. Between the coupling path of the transistor M2 and the reference voltage VS.

以下請參照圖2A,圖2A繪示本發明一實施例的電阻式記憶體裝置的示意圖。電阻式記憶體裝置210包括電阻式記憶胞211~242、字元線WL0~WL3以及源極線SL0~SL1。電阻式記憶胞211~242以陣列的方式排列成記憶胞陣列。圖2A繪示的4×2的記憶胞陣列僅只是一個範例,不用以限縮本發明。2A, FIG. 2A is a schematic diagram of a resistive memory device according to an embodiment of the invention. The resistive memory device 210 includes resistive memory cells 211 to 242, word lines WL0 to WL3, and source lines SL0 to SL1. The resistive memory cells 211 to 242 are arranged in an array to form a memory cell array. The 4×2 memory cell array illustrated in FIG. 2A is merely an example and is not intended to limit the invention.

圖2A的記憶胞陣列具有多個記憶胞行以及記憶胞列。其中,相同的字元線耦接至相同的記憶胞列。具體來說明,字元線WL0耦接至第一個記憶胞列的電阻式記憶胞211以及212,字元線WL1耦接至第二個記憶胞列的電阻式記憶胞221以及222,字元線WL2耦接至第三個記憶胞列的電阻式記憶胞231以及232,字元線WL3則耦接至第四個記憶胞列的電阻式記憶胞241以及242。The memory cell array of Figure 2A has a plurality of memory cell rows and memory cell columns. Wherein, the same word line is coupled to the same memory cell column. Specifically, the word line WL0 is coupled to the resistive memory cells 211 and 212 of the first memory cell column, and the word line WL1 is coupled to the resistive memory cells 221 and 222 of the second memory cell column. The line WL2 is coupled to the resistive memory cells 231 and 232 of the third memory cell, and the word line WL3 is coupled to the resistive memory cells 241 and 242 of the fourth memory cell.

另外,在本實施例中,相同記憶胞行的電阻式記憶胞耦 接至相同的源極線。在圖2A中,電阻式記憶胞211以及212所形成的記憶胞行與電阻式記憶胞221以及222所形成的記憶胞行共同耦接至源極線SL0,電阻式記憶胞231以及232所形成的記憶胞行與電阻式記憶胞241以及242所形成的記憶胞行則共同耦接至源極線SL1。In addition, in this embodiment, the same memory cell row of resistive memory cell coupling Connect to the same source line. In FIG. 2A, the memory cell formed by the resistive memory cells 211 and 212 is coupled to the source line SL0 and the resistive memory cells 231 and 232. The memory cell row and the memory cell formed by the resistive memory cells 241 and 242 are coupled to the source line SL1.

圖2A中的位元線BL0_L以及位元線BL0_R形成一個位元線對,位元線BL1_L以及位元線BL1_R形成另一個位元線對。位元線BL0_L以及位元線BL0_R所形成的位元線對耦接至電阻式記憶胞211、221、231及241所形成的記憶胞行,位元線BL1_L以及位元線BL1_R所形成的位元線對則耦接至電阻式記憶胞212、222、232及242所形成的記憶胞行。The bit line BL0_L and the bit line BL0_R in FIG. 2A form one bit line pair, and the bit line BL1_L and the bit line BL1_R form another bit line pair. The bit line pair formed by the bit line BL0_L and the bit line BL0_R is coupled to the memory cell row formed by the resistive memory cells 211, 221, 231, and 241, and the bit formed by the bit line BL1_L and the bit line BL1_R The pair of meta-lines are coupled to the memory cell formed by the resistive memory cells 212, 222, 232, and 242.

當針對電阻式記憶體裝置210中的記憶胞進行讀取時,以電阻式記憶胞211為例,透過字元線WL0導通電晶體M1及M2以選中電阻式記憶胞211,並透過量測位元線BL0_L以及BL_R的上傳送的電流來獲知電阻R1以及R2的阻抗狀態。依據前述實施例的說明可以得知,透過判斷電阻R1以及R2的阻抗狀態就可以獲知電阻式記憶胞211中的一個或多個位元的儲存資料。When the memory cell in the resistive memory device 210 is read, the resistive memory cell 211 is taken as an example, and the crystals M1 and M2 are turned on through the word line WL0 to select the resistive memory cell 211, and the measurement is performed. The currents transmitted on the bit lines BL0_L and BL_R are used to know the impedance states of the resistors R1 and R2. According to the description of the foregoing embodiment, it can be known that the stored data of one or more bits in the resistive memory cell 211 can be obtained by judging the impedance states of the resistors R1 and R2.

本實施例中,單一個電阻式記憶胞中的兩個電晶體共用同一條字元線。若當單一個電阻式記憶胞中儲存兩個位元的儲存資料時,在進行資料讀取動作時,這兩個位元的儲存資料會被同時讀出。相對的,當單一個電阻式記憶胞中儲存一個位元的儲存資料時,對應位元線對上的電流可以同時被感測,並進以獲知電 阻式記憶胞中的儲存資料。In this embodiment, two transistors in a single resistive memory cell share the same word line. If two bytes of stored data are stored in a single resistive memory cell, the stored data of the two bits will be simultaneously read during the data reading operation. In contrast, when storing a bit of stored data in a single resistive memory cell, the current on the corresponding bit line pair can be sensed at the same time, and the power is obtained. Storage data in resistive memory cells.

以下請參照圖2B,圖2B繪示圖2A實施例的另一實施方式的電阻式記憶體裝置的示意圖。圖2B繪示電阻式記憶體裝置220中,與電阻式記憶體裝置210不同的,各記憶胞列耦接至獨立的源極線,具體來說,電阻式記憶胞211~212所形成的記憶胞列耦接至源極線SL0,電阻式記憶胞221~222所形成的記憶胞列耦接至源極線SL1,電阻式記憶胞231~232所形成的記憶胞列耦接至源極線SL2,電阻式記憶胞241~242所形成的記憶胞列則耦接至源極線SL3。Please refer to FIG. 2B. FIG. 2B is a schematic diagram of a resistive memory device according to another embodiment of the embodiment of FIG. 2A. 2B illustrates a memory device 220 that is different from the resistive memory device 210 in that each memory cell is coupled to an independent source line, specifically, a memory formed by the resistive memory cells 211-212. The cell row is coupled to the source line SL0, the memory cell formed by the resistive memory cells 221-222 is coupled to the source line SL1, and the memory cell formed by the resistive memory cells 231-232 is coupled to the source line. The memory cell formed by the SL2 and the resistive memory cells 241-242 is coupled to the source line SL3.

以下請參照圖2C,圖2C繪示圖2A實施例的再一實施方式的電阻式記憶體裝置的示意圖。在圖2C中,源極線SL0~SL3以非平行於字線的方向來進行配置。其中,排列在相同記憶行的相對位置的電晶體連接相同的源極線。具體來說明,以排列在相同記憶行的電阻式記憶胞211、221、231以及241為範例,其中,電阻式記憶胞211的電晶體M1、電阻式記憶胞221的電晶體M3以及電阻式記憶胞241的電晶體M7耦接至源極線SL0,而電阻式記憶胞211的電晶體M2、電阻式記憶胞221的電晶體M4以及電阻式記憶胞241的電晶體M6則耦接至源極線SL1。在圖2C的配置方式下,以電阻式記憶胞211為例,其中,電阻R1以及電阻R2可以被選中以同時進行資料的存取,或者,電阻R1以及電阻R2也可以被選中以分時進行資料的存取。Referring to FIG. 2C, FIG. 2C is a schematic diagram of a resistive memory device according to still another embodiment of the embodiment of FIG. 2A. In FIG. 2C, the source lines SL0 to SL3 are arranged in a direction non-parallel to the word line. Among them, the transistors arranged at the relative positions of the same memory row are connected to the same source line. Specifically, the resistive memory cells 211, 221, 231, and 241 arranged in the same memory row are exemplified, wherein the transistor M1 of the resistive memory cell 211, the transistor M3 of the resistive memory cell 221, and the resistive memory The transistor M7 of the cell 241 is coupled to the source line SL0, and the transistor M2 of the resistive memory cell 211, the transistor M4 of the resistive memory cell 221, and the transistor M6 of the resistive memory cell 241 are coupled to the source. Line SL1. In the configuration mode of FIG. 2C, the resistive memory cell 211 is taken as an example, wherein the resistor R1 and the resistor R2 can be selected to simultaneously access data, or the resistor R1 and the resistor R2 can be selected. Access to data at the time.

以下請參照圖3A,圖3A繪示本發明另一實施例的電阻 式記憶體裝置的示意圖。電阻式記憶體裝置310包括多個電阻式記憶胞,並且各電阻式記憶胞被拆開成兩個部分以配置在不同的位置上。在圖3A中,部分電阻式記憶胞311_1與部分電阻式記憶胞311_2組合成一個電阻式記憶胞,而部分電阻式記憶胞321_1與部分電阻式記憶胞321_2組合成另一個電阻式記憶胞。Referring to FIG. 3A, FIG. 3A illustrates a resistor according to another embodiment of the present invention. Schematic diagram of a memory device. The resistive memory device 310 includes a plurality of resistive memory cells, and each resistive memory cell is split into two portions to be disposed at different positions. In FIG. 3A, a portion of the resistive memory cell 311_1 and a portion of the resistive memory cell 311_2 are combined into a resistive memory cell, and a portion of the resistive memory cell 321_1 and a portion of the resistive memory cell 321_2 are combined into another resistive memory cell.

部分電阻式記憶胞311_1與部分電阻式記憶胞311_2分別耦接至子字元線WL0_U以及子字元線WL0_D。部分電阻式記憶胞311_1中的電晶體M1受控於子字元線WL0_U以導通或斷開,而部分電阻式記憶胞311_2中的電晶體M2則受控於子字元線WL0_D以導通或斷開。相類似的,部分電阻式記憶胞321_1與部分電阻式記憶胞321_2分別耦接至子字元線WL1_U以及子字元線WL1_D。部分電阻式記憶胞321_1中的電晶體受控於子字元線WL1_U以導通或斷開,而部分電阻式記憶胞321_2中的電晶體則受控於子字元線WL1_D以導通或斷開。其餘的電阻式記憶胞的字元線配置方式與前述的電阻式記憶胞的字元線配置方式相類似,恕不逐一繁述。The partial resistive memory cell 311_1 and the partial resistive memory cell 311_2 are respectively coupled to the sub-word line WL0_U and the sub-word line WL0_D. The transistor M1 in the partial resistive memory cell 311_1 is controlled to be turned on or off by the sub-word line WL0_U, and the transistor M2 in the partial resistive memory cell 311_2 is controlled to be turned on or off by the sub-word line WL0_D. open. Similarly, the partial resistive memory cell 321_1 and the partial resistive memory cell 321_2 are coupled to the sub-word line WL1_U and the sub-word line WL1_D, respectively. The transistor in the partial resistive memory cell 321_1 is controlled to be turned on or off by the sub-word line WL1_U, and the transistor in the partial resistive memory cell 321_2 is controlled to be turned on or off by the sub-word line WL1_D. The configuration of the word lines of the remaining resistive memory cells is similar to the configuration of the word lines of the resistive memory cells described above, and will not be described one by one.

附帶一提的,在本實施例中,相鄰的部分電阻式記憶胞311_1與321_1共同耦接源極線SL0_U,相鄰的部分電阻式記憶胞311_2與321_2共同耦接源極線SL0_D,且相鄰的部分電阻式記憶胞311_1與321_1共用位元線BL0_U,相鄰的部分電阻式記憶胞311_2與321_2則共用位元線BL0_D。其餘的位元線BL1_U~BL3_U以及位元線BL1_D~BL3_D則分別耦接至其餘的部 分電阻式記憶胞。當然,在本發明其它實施例中,相鄰的部分電阻式記憶胞也分別耦接至不同的源極線,其配置方式與圖2B的實施方式類似,在此不多贅述。Incidentally, in this embodiment, the adjacent partial resistive memory cells 311_1 and 321_1 are coupled to the source line SL0_U, and the adjacent partial resistive memory cells 311_2 and 321_2 are coupled to the source line SL0_D, and The adjacent partial resistive memory cells 311_1 and 321_1 share the bit line BL0_U, and the adjacent partial resistive memory cells 311_2 and 321_2 share the bit line BL0_D. The remaining bit lines BL1_U~BL3_U and the bit lines BL1_D~BL3_D are respectively coupled to the remaining parts. Resistive memory cell. Of course, in other embodiments of the present invention, the adjacent partial resistive memory cells are also respectively coupled to different source lines, and the configuration thereof is similar to the embodiment of FIG. 2B, and details are not described herein.

由圖3A的電路架構可以發現,單一個電阻式記憶胞的兩個部份電阻式記憶胞分別受控於不同的子字元線,因此,單一個電阻式記憶胞中所儲存的兩個位元的儲存資料可以獨立的分別被讀取。並且,在對電阻式記憶胞進行資料寫入動作時,以部分電阻式記憶胞311_1與311_2所組成的電阻式記憶胞為範例,可以同時針對部分電阻式記憶胞311_1與321_1的其中之一進行重置或設定,而針對部分電阻式記憶胞311_1與321_1的另一進行設定或重置。有效加速資料寫入的速度。It can be found from the circuit architecture of FIG. 3A that two resistive memory cells of a single resistive memory cell are respectively controlled by different sub-word lines, and therefore, two bits stored in a single resistive memory cell are stored. Meta-stored data can be read separately. Moreover, when performing a data writing operation on the resistive memory cell, a resistive memory cell composed of the partially resistive memory cells 311_1 and 311_2 is taken as an example, and one of the partial resistive memory cells 311_1 and 321_1 can be simultaneously performed. Reset or set, and set or reset for the other of the partial resistive memory cells 311_1 and 321_1. Effectively speed up data writing.

當然,上述部分電阻式記憶胞311_1與321_1的設定或重置動作也可以分時進行,並沒有一定的限制。Of course, the setting or resetting actions of the partial resistive memory cells 311_1 and 321_1 can also be performed in a time-sharing manner without any limitation.

以下請參照圖3B,圖3B繪示本發明圖3A實施例的電阻式記憶體裝置的另一實施方式的示意圖。其中,圖3B的電阻式記憶體裝置320的源極線可以不平行於字線的方向進行配置。而配置於相同記憶行的部分電阻式記憶胞可耦接至相同的源極線。Please refer to FIG. 3B. FIG. 3B is a schematic diagram of another embodiment of the resistive memory device of the embodiment of FIG. 3A of the present invention. The source line of the resistive memory device 320 of FIG. 3B may be arranged not parallel to the direction of the word line. The partially resistive memory cells disposed in the same memory row can be coupled to the same source line.

由圖2A、2B、2C、3A以及3B的實施方式可以得知,本發明實施例的電阻式記憶體裝置的源極線的配置方式並不限定於一種方式,凡本領域具通常知識者所知的記憶體的源極線的配置方式都可應用於本發明,在此不逐一贅述。2A, 2B, 2C, 3A, and 3B, the arrangement of the source lines of the resistive memory device of the embodiment of the present invention is not limited to one mode, and those skilled in the art have a general knowledge. The arrangement of the source lines of the known memory can be applied to the present invention, and will not be described one by one.

以下請參照圖4,圖4繪示本發明再一實施例的電阻式記 憶體裝置的示意圖。電阻式記憶體裝置400包括記憶胞陣列410、差動放大器420、前級放大器431、432以及開關SW1~SW4。差動放大器420透過開關SW1~SW4耦接至記憶胞陣列410中的位元線BL_L以及BL_R。開關SW1用以依據選擇信號SEL1以及選擇信號SEL1的反向信號SEL2來選擇位元線BL_L以及BL_R的其中之一以耦接至差動放大器420上的感測端ST。開關SW4及SW3則是分別依據選擇信號SEL4以及選擇信號SEL4的反向信號SEL3來分別選擇位元線BL_R或預設參考信號線REF以耦接至差動放大器420上的參考端RT。其中,預設參考信號線REF用以傳送預設參考信號。Please refer to FIG. 4, which illustrates a resistive type according to still another embodiment of the present invention. A schematic diagram of a memory device. The resistive memory device 400 includes a memory cell array 410, a differential amplifier 420, preamplifiers 431, 432, and switches SW1 SWSW4. The differential amplifier 420 is coupled to the bit lines BL_L and BL_R in the memory cell array 410 through the switches SW1 SW SW4. The switch SW1 is configured to select one of the bit lines BL_L and BL_R to be coupled to the sensing terminal ST on the differential amplifier 420 according to the selection signal SEL1 and the inverted signal SEL2 of the selection signal SEL1. The switches SW4 and SW3 respectively select the bit line BL_R or the preset reference signal line REF to be coupled to the reference terminal RT on the differential amplifier 420 according to the selection signal SEL4 and the inverted signal SEL3 of the selection signal SEL4, respectively. The preset reference signal line REF is used to transmit a preset reference signal.

在本實施例中,選擇信號SEL1~SEL4可以依據單一電阻式記憶胞儲存的資料位元的數量來決定。當單一電阻式記憶胞儲存單一資料位元時,開關SW1以及SW4可以依據選擇信號SEL1及SEL4導通,而開關SW2以及SW3則可以依據選擇信號SEL2及SEL3斷開,如此一來,差動放大器420可以接收位元線BL_L以及BL_R上的電流以進行比較,並藉以獲知電阻式記憶胞儲存的資料位元。In this embodiment, the selection signals SEL1 SEL SEL4 can be determined according to the number of data bits stored in a single resistive memory cell. When a single resistive memory cell stores a single data bit, the switches SW1 and SW4 can be turned on according to the selection signals SEL1 and SEL4, and the switches SW2 and SW3 can be turned off according to the selection signals SEL2 and SEL3. Thus, the differential amplifier 420 The currents on the bit lines BL_L and BL_R can be received for comparison, and the data bits stored by the resistive memory cells are known.

在另一方面,當單一電阻式記憶胞儲存多個資料位元時,開關SW3會依據選擇信號SEL3而導通,開關SW4則會依據選擇信號SEL4而斷開。並且,開關SW1及SW2可以在開關SW3導通的情況下順序導通,以使位元線BL_L及位元線BL_R上的電氣特性分時的與預設參考信號線REF所提供的預設參考信號進行 比較,並藉以獲得兩個位元的資料位元。On the other hand, when a single resistive memory cell stores a plurality of data bits, the switch SW3 is turned on according to the selection signal SEL3, and the switch SW4 is turned off according to the selection signal SEL4. Moreover, the switches SW1 and SW2 can be sequentially turned on when the switch SW3 is turned on, so that the electrical characteristics on the bit line BL_L and the bit line BL_R are time-divisionally separated from the preset reference signal provided by the preset reference signal line REF. Compare and borrow to obtain two bit data bits.

當然,上述關於開關SW1及SW2的導通順序可以被變更,或當僅需要讀取儲存資料的兩個位元中的其中一個時,僅需導通開關SW1及SW2中的其中之一即可。Of course, the above-described turn-on sequence for the switches SW1 and SW2 can be changed, or when only one of the two bits of the stored data needs to be read, only one of the switches SW1 and SW2 needs to be turned on.

綜上所述,本發明提供兩個電晶體以及兩個電阻所構成的電阻式記憶胞。如此一來,可藉由兩個電阻所提供的阻抗值進行比較,並透過比較的結果來讀取電阻式記憶胞中的儲存資料,避免儲存資料讀取錯誤的可能。In summary, the present invention provides a resistive memory cell composed of two transistors and two resistors. In this way, the impedance values provided by the two resistors can be compared, and the stored data in the resistive memory cells can be read through the comparison result, thereby avoiding the possibility of reading errors in the stored data.

110‧‧‧電阻式記憶胞110‧‧‧Resistive memory cells

M1、M2‧‧‧電晶體M1, M2‧‧‧ transistor

R0_L、R0_R‧‧‧電阻R0_L, R0_R‧‧‧ resistance

BL0_L、BL0_R‧‧‧位元線BL0_L, BL0_R‧‧‧ bit line

VG_Sel1、VG_Sel2‧‧‧字元線信號VG_Sel1, VG_Sel2‧‧‧ character line signal

VS‧‧‧參考電壓VS‧‧‧reference voltage

Claims (9)

一種電阻式記憶胞,包括:一第一電晶體,具有第一端、第二端以及控制端,該第一電晶體的第一端及第二端分別耦接至一第一位元線及一參考電壓,該第一電晶體的控制端接收一字元線信號;一第二電晶體,具有第一端、第二端以及控制端,該第二電晶體的第一端及第二端分別耦接至一第二位元線及該參考電壓,該第二電晶體的控制端接收該字元線信號;一第一電阻,串接在該第一電晶體的第一端及該第一位元線的耦接路徑間或串接在該第一電晶體的第二端及該參考電壓的耦接路徑間;以及一第二電阻,串接在該第二電晶體的第一端及該第二位元線的耦接路徑間或串接在該第二電晶體的第二端及該參考電壓的耦接路徑間,其中該第一電阻的阻值高於該第二電阻的阻值時,該電阻式記憶胞所儲存的一第一儲存資料為第一邏輯準位,該第一電阻的阻值低於該第二電阻的阻值時,該第一儲存資料為第二邏輯準位;或者該第一電阻及該第二電阻的阻值均大於一第一臨界電阻值時,該第一儲存資料為第一邏輯準位,該第一電阻及該第二電阻的阻值均小於一第二臨界電阻值時,該第一儲存資料為第二邏輯準位。 A resistive memory cell includes: a first transistor having a first end, a second end, and a control end, wherein the first end and the second end of the first transistor are respectively coupled to a first bit line and a reference voltage, the control end of the first transistor receives a word line signal; a second transistor has a first end, a second end, and a control end, the first end and the second end of the second transistor The first transistor is coupled to the second bit line and the reference voltage, and the control terminal of the second transistor receives the word line signal; a first resistor is serially connected to the first end of the first transistor and the first a coupling path of one of the wires is connected in series between the second end of the first transistor and the coupling path of the reference voltage; and a second resistor is serially connected to the first end of the second transistor And the coupling path of the second bit line is connected between the second end of the second transistor and the coupling path of the reference voltage, wherein the resistance of the first resistor is higher than the resistance of the second resistor When the resistance is changed, the first stored data stored by the resistive memory cell is a first logic level, and the resistance of the first resistor is When the resistance of the second resistor is lower than the resistance of the second resistor, the first storage data is a second logic level; or the resistance of the first resistor and the second resistor is greater than a first threshold resistance value, the first storage The data is a first logic level. When the resistances of the first resistor and the second resistor are both less than a second threshold resistance, the first stored data is a second logic level. 如申請專利範圍第1項所述的電阻式記憶胞,其中當該電阻式記憶胞被選中以進行讀取時,該第一及該第二電晶體依據該字元線信號而被導通,該第一位元線以及該第二位元線分別傳送該第一電阻以及該第二電阻的阻抗狀態。 The resistive memory cell of claim 1, wherein when the resistive memory cell is selected for reading, the first and second transistors are turned on according to the word line signal. The first bit line and the second bit line respectively transmit impedance states of the first resistor and the second resistor. 如申請專利範圍第2項所述的電阻式記憶胞,其中該第一電阻以及該第二電阻的阻抗狀態更分別表示該電阻式記憶胞所儲存的多數個第二儲存資料。 The resistive memory cell of claim 2, wherein the impedance states of the first resistor and the second resistor respectively represent a plurality of second stored data stored by the resistive memory cell. 一種電阻式記憶體裝置,包括:多個電阻式記憶胞,排列成一記憶胞陣列,該記憶胞陣列具有多數個記憶胞行以及多數個記憶胞列;多數條字元線,分別耦接該些記憶胞列並分別傳送多個字元線信號;多數條位元線對,分別耦接該些記憶胞行;以及多數條源極線,該些源極線分別耦接至該些電阻式記憶胞,其中,各該電阻式記憶胞包括:一第一電晶體,具有第一端、第二端以及控制端,該第一電晶體的第一端及第二端分別耦接至一第一位元線及對應的源極線,該第一電晶體的控制端接收一字元線信號;一第二電晶體,具有第一端、第二端以及控制端,該第二電晶體的第一端及第二端分別耦接至一第二位元線及對應的源極線,該第二電晶體的控制端接收該字元線信號;一第一電阻,串接在該第一電晶體的第一端及該第一位 元線的耦接路徑間或串接在該第一電晶體的第二端及其對應的源極線的耦接路徑間;以及一第二電阻,串接在該第二電晶體的第一端及該第二位元線的耦接路徑間或串接在該第二電晶體的第二端及其對應的源極線的耦接路徑間;以及一差動放大器,耦接該些位元線對,該差動放大器接收多數個選擇信號,該差動放大器依據該些選擇信號來針對各該位元線對中的該第一位元線以及該第二位元線來的信號進行比較,以獲得一第一儲存資料,或者,該差動放大器依據該些選擇信號來分別針對該第一位元線以及該第二位元線上的信號與一預設參考信號進行比對,並藉以獲得多數個第二儲存資料。 A resistive memory device comprising: a plurality of resistive memory cells arranged in a memory cell array, the memory cell array having a plurality of memory cell rows and a plurality of memory cell columns; a plurality of word word lines respectively coupled to the memory cells The memory cells are respectively arranged to transmit a plurality of word line signals; the plurality of bit line pairs are respectively coupled to the memory cell lines; and the plurality of source lines are respectively coupled to the resistive memories Each of the resistive memory cells includes: a first transistor having a first end, a second end, and a control end, wherein the first end and the second end of the first transistor are respectively coupled to a first a bit line and a corresponding source line, the control end of the first transistor receives a word line signal; a second transistor has a first end, a second end, and a control end, the second transistor The first end and the second end are respectively coupled to a second bit line and a corresponding source line, and the control end of the second transistor receives the word line signal; a first resistor is serially connected to the first line The first end of the crystal and the first bit a coupling path between the first line of the first transistor and a corresponding path of the corresponding source line; and a second resistor connected in series with the first of the second transistor And a coupling path between the end and the second bit line or between the coupling paths of the second end of the second transistor and its corresponding source line; and a differential amplifier coupled to the bits a pair of potential amplifiers, the differential amplifier receiving a plurality of selection signals, wherein the differential amplifier performs signals for the first bit line and the second bit line of each of the bit line pairs according to the selection signals Comparing to obtain a first stored data, or the differential amplifier compares the signals on the first bit line and the second bit line with a predetermined reference signal according to the selection signals, and To obtain a majority of the second stored data. 如申請專利範圍第4項所述的電阻式記憶體裝置,其中各該字元線包括一第一子字元線以及一第二子字元線,其中各該電阻式記憶胞的該第一電晶體的控制端耦接至對應的字元線的該第一子字元線,該第二電晶體的控制端耦接至對應的字元線的該第二子字元線,各該源極線包括一第一子源極線以及一第二子源極線,其中各該電阻式記憶胞的該第一電晶體的第二端耦接至對應的源極線的該第一子源極線,該第二電晶體的第二端耦接至對應的源極線的該第二子源極線。 The resistive memory device of claim 4, wherein each of the word lines comprises a first sub-word line and a second sub-word line, wherein the first of each resistive memory cell a control end of the transistor is coupled to the first sub-word line of the corresponding word line, and a control end of the second transistor is coupled to the second sub-word line of the corresponding word line, each of the source The pole line includes a first sub-source line and a second sub-source line, wherein the second end of the first transistor of each of the resistive memory cells is coupled to the first sub-source of the corresponding source line The second end of the second transistor is coupled to the second sub-source line of the corresponding source line. 如申請專利範圍第4項所述的電阻式記憶體裝置,其中各該電阻式記憶胞的該第一電阻以及該第二電阻的阻抗狀態表示各該電阻式記憶胞所儲存的一儲存資料。 The resistive memory device of claim 4, wherein the first resistance of each of the resistive memory cells and the impedance state of the second resistor represent a stored data stored by each of the resistive memory cells. 如申請專利範圍第6項所述的電阻式記憶體裝置,其中該第一電阻的阻值高於該第二電阻的阻值時,該儲存資料為第一邏輯準位,該第一電阻的阻值低於該第二電阻的阻值時,該儲存資料為第二邏輯準位。 The resistive memory device of claim 6, wherein when the resistance of the first resistor is higher than the resistance of the second resistor, the stored data is a first logic level, and the first resistor When the resistance is lower than the resistance of the second resistor, the stored data is at a second logic level. 如申請專利範圍第6項所述的電阻式記憶體裝置,其中該第一電阻及該第二電阻的阻值均大於一臨界電阻值時,該儲存資料為第一邏輯準位,該第一電阻及該第二電阻的阻值均小於該臨界電阻值時,該儲存資料為第二邏輯準位。 The resistive memory device of claim 6, wherein when the resistances of the first resistor and the second resistor are greater than a critical resistance value, the stored data is a first logic level, the first When the resistance of the resistor and the second resistor are both less than the critical resistance value, the stored data is at a second logic level. 如申請專利範圍第4項所述的電阻式記憶體裝置,其中各該電阻式記憶胞的該第一電阻以及該第二電阻的阻抗狀態分別表示各該電阻式記憶胞所儲存的多數個儲存資料。 The resistive memory device of claim 4, wherein the first resistance of each of the resistive memory cells and the impedance state of the second resistor respectively represent a plurality of stores stored in each of the resistive memory cells. data.
TW102143476A 2013-11-28 2013-11-28 Resistive memory apparatus and memory cell thereof TWI503842B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW102143476A TWI503842B (en) 2013-11-28 2013-11-28 Resistive memory apparatus and memory cell thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW102143476A TWI503842B (en) 2013-11-28 2013-11-28 Resistive memory apparatus and memory cell thereof

Publications (2)

Publication Number Publication Date
TW201521039A TW201521039A (en) 2015-06-01
TWI503842B true TWI503842B (en) 2015-10-11

Family

ID=53935102

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102143476A TWI503842B (en) 2013-11-28 2013-11-28 Resistive memory apparatus and memory cell thereof

Country Status (1)

Country Link
TW (1) TWI503842B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10777272B2 (en) 2018-02-14 2020-09-15 Winbond Electronics Corp. Semiconductor memory device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6810725B2 (en) * 2018-10-03 2021-01-06 ウィンボンド エレクトロニクス コーポレーション Random access memory with variable resistance

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI340388B (en) * 2005-12-15 2011-04-11 Samsung Electronics Co Ltd Resistive memory devices including selected reference memory cells

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI340388B (en) * 2005-12-15 2011-04-11 Samsung Electronics Co Ltd Resistive memory devices including selected reference memory cells

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10777272B2 (en) 2018-02-14 2020-09-15 Winbond Electronics Corp. Semiconductor memory device

Also Published As

Publication number Publication date
TW201521039A (en) 2015-06-01

Similar Documents

Publication Publication Date Title
US9530462B2 (en) Memory cell with decoupled read/write path
US6999366B2 (en) Magnetic memory including a sense result category between logic states
TWI550608B (en) Accessing a resistive storage element-based memory cell array
US9424914B2 (en) Resistive memory apparatus and memory cell thereof
WO2015131775A1 (en) 2-1t1r rram storage unit and storage array
US20060039191A1 (en) System and method for reading a memory cell
JP2003288779A (en) Method and system for removing leakage current by carrying out sensing equipotential sensing across memory array
KR102550416B1 (en) Memory device
TWI640004B (en) Resistive random access memory apparatus
US20130107613A1 (en) Memory sensing circuit
TWI725780B (en) Rram with plurality of1tnr structures
US20070247939A1 (en) Mram array with reference cell row and methof of operation
TWI623939B (en) Memory device and control method thereof
CN104733611A (en) Resistance type storage device and storage unit thereof
TWI503842B (en) Resistive memory apparatus and memory cell thereof
US8760914B2 (en) Magnetic memory write circuitry
TW201530542A (en) Resistive ratio-based memory cell
US6836422B1 (en) System and method for reading a memory cell
KR20200020316A (en) Semiconductor memory apparatus, semiconductor system and electronic device including the same
US8547734B1 (en) Method of reading from and writing to magnetic random access memory (MRAM)
TWI537947B (en) Magnetoresistive memory device
US20180366188A9 (en) Integrated circuit system with non-volatile memory stress suppression and method of manufacture thereof
CN112927736B (en) Read-write circuit of magnetic random access memory
US20180122461A1 (en) Resistive memory apparatus
TW202324413A (en) Semiconductor memory device and write method thereof