TWI503519B - - Google Patents

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Publication number
TWI503519B
TWI503519B TW103123877A TW103123877A TWI503519B TW I503519 B TWI503519 B TW I503519B TW 103123877 A TW103123877 A TW 103123877A TW 103123877 A TW103123877 A TW 103123877A TW I503519 B TWI503519 B TW I503519B
Authority
TW
Taiwan
Application number
TW103123877A
Other languages
Chinese (zh)
Other versions
TW201602514A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW103123877A priority Critical patent/TW201602514A/en
Application granted granted Critical
Publication of TWI503519B publication Critical patent/TWI503519B/zh
Publication of TW201602514A publication Critical patent/TW201602514A/en

Links

TW103123877A 2014-07-11 2014-07-11 Optical measurement method of film thickness TW201602514A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW103123877A TW201602514A (en) 2014-07-11 2014-07-11 Optical measurement method of film thickness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW103123877A TW201602514A (en) 2014-07-11 2014-07-11 Optical measurement method of film thickness

Publications (2)

Publication Number Publication Date
TWI503519B true TWI503519B (en) 2015-10-11
TW201602514A TW201602514A (en) 2016-01-16

Family

ID=54851759

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103123877A TW201602514A (en) 2014-07-11 2014-07-11 Optical measurement method of film thickness

Country Status (1)

Country Link
TW (1) TW201602514A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11579099B2 (en) 2019-10-14 2023-02-14 Industrial Technology Research Institute X-ray reflectometry apparatus and method thereof for measuring three dimensional nanostructures on flat substrate
US11867595B2 (en) 2019-10-14 2024-01-09 Industrial Technology Research Institute X-ray reflectometry apparatus and method thereof for measuring three dimensional nanostructures on flat substrate

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5147125A (en) * 1989-08-24 1992-09-15 Viratec Thin Films, Inc. Multilayer anti-reflection coating using zinc oxide to provide ultraviolet blocking
TWI357977B (en) * 2007-03-23 2012-02-11 Ind Tech Res Inst Method for measuring a refractive index and thickn
TWI386617B (en) * 2007-12-31 2013-02-21 Ind Tech Res Inst Reflective measurement method of film thickness by spectral image system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5147125A (en) * 1989-08-24 1992-09-15 Viratec Thin Films, Inc. Multilayer anti-reflection coating using zinc oxide to provide ultraviolet blocking
TWI357977B (en) * 2007-03-23 2012-02-11 Ind Tech Res Inst Method for measuring a refractive index and thickn
TWI386617B (en) * 2007-12-31 2013-02-21 Ind Tech Res Inst Reflective measurement method of film thickness by spectral image system

Also Published As

Publication number Publication date
TW201602514A (en) 2016-01-16

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