TWI498967B - - Google Patents
Info
- Publication number
- TWI498967B TWI498967B TW101151273A TW101151273A TWI498967B TW I498967 B TWI498967 B TW I498967B TW 101151273 A TW101151273 A TW 101151273A TW 101151273 A TW101151273 A TW 101151273A TW I498967 B TWI498967 B TW I498967B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210175948.1A CN103456592B (zh) | 2012-05-31 | 2012-05-31 | 等离子体处理装置及其电感耦合线圈 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201349334A TW201349334A (zh) | 2013-12-01 |
| TWI498967B true TWI498967B (zh) | 2015-09-01 |
Family
ID=49738845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101151273A TW201349334A (zh) | 2012-05-31 | 2012-12-28 | 等離子體處理裝置及其電感耦合線圈 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103456592B (zh) |
| TW (1) | TW201349334A (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106802358B (zh) * | 2015-11-26 | 2023-06-30 | 云南电网有限责任公司瑞丽供电局 | 一种用于复合绝缘子检测的便拆卸式射频线圈装置 |
| CN110867362A (zh) * | 2018-08-27 | 2020-03-06 | 北京北方华创微电子装备有限公司 | 射频结构、工艺腔室和等离子体的生成方法 |
| CN112071734B (zh) * | 2019-06-11 | 2023-10-31 | 中微半导体设备(上海)股份有限公司 | 绝缘材料窗及其制造方法及电感耦合等离子体处理装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080223521A1 (en) * | 2004-03-30 | 2008-09-18 | Nam Hun Kim | Plasma Source Coil and Plasma Chamber Using the Same |
| TW200908816A (en) * | 2006-08-28 | 2009-02-16 | Beijing Nmc Co Ltd | Inductive coupled coil and inductive coupled plasma device using the same |
| US20110180243A1 (en) * | 2010-01-27 | 2011-07-28 | Applied Materials, Inc. | Apparatus for controlling temperature uniformity of a substrate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6474258B2 (en) * | 1999-03-26 | 2002-11-05 | Tokyo Electron Limited | Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma |
| US7571697B2 (en) * | 2001-09-14 | 2009-08-11 | Lam Research Corporation | Plasma processor coil |
| CN100429740C (zh) * | 2005-12-02 | 2008-10-29 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种可调整局部耦合强度的icp线圈 |
-
2012
- 2012-05-31 CN CN201210175948.1A patent/CN103456592B/zh active Active
- 2012-12-28 TW TW101151273A patent/TW201349334A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080223521A1 (en) * | 2004-03-30 | 2008-09-18 | Nam Hun Kim | Plasma Source Coil and Plasma Chamber Using the Same |
| TW200908816A (en) * | 2006-08-28 | 2009-02-16 | Beijing Nmc Co Ltd | Inductive coupled coil and inductive coupled plasma device using the same |
| US20110180243A1 (en) * | 2010-01-27 | 2011-07-28 | Applied Materials, Inc. | Apparatus for controlling temperature uniformity of a substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103456592A (zh) | 2013-12-18 |
| CN103456592B (zh) | 2016-03-23 |
| TW201349334A (zh) | 2013-12-01 |