TWI498967B - - Google Patents

Info

Publication number
TWI498967B
TWI498967B TW101151273A TW101151273A TWI498967B TW I498967 B TWI498967 B TW I498967B TW 101151273 A TW101151273 A TW 101151273A TW 101151273 A TW101151273 A TW 101151273A TW I498967 B TWI498967 B TW I498967B
Authority
TW
Taiwan
Application number
TW101151273A
Other versions
TW201349334A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of TW201349334A publication Critical patent/TW201349334A/zh
Application granted granted Critical
Publication of TWI498967B publication Critical patent/TWI498967B/zh

Links

TW101151273A 2012-05-31 2012-12-28 等離子體處理裝置及其電感耦合線圈 TW201349334A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201210175948.1A CN103456592B (zh) 2012-05-31 2012-05-31 等离子体处理装置及其电感耦合线圈

Publications (2)

Publication Number Publication Date
TW201349334A TW201349334A (zh) 2013-12-01
TWI498967B true TWI498967B (zh) 2015-09-01

Family

ID=49738845

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101151273A TW201349334A (zh) 2012-05-31 2012-12-28 等離子體處理裝置及其電感耦合線圈

Country Status (2)

Country Link
CN (1) CN103456592B (zh)
TW (1) TW201349334A (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106802358B (zh) * 2015-11-26 2023-06-30 云南电网有限责任公司瑞丽供电局 一种用于复合绝缘子检测的便拆卸式射频线圈装置
CN110867362A (zh) * 2018-08-27 2020-03-06 北京北方华创微电子装备有限公司 射频结构、工艺腔室和等离子体的生成方法
CN112071734B (zh) * 2019-06-11 2023-10-31 中微半导体设备(上海)股份有限公司 绝缘材料窗及其制造方法及电感耦合等离子体处理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080223521A1 (en) * 2004-03-30 2008-09-18 Nam Hun Kim Plasma Source Coil and Plasma Chamber Using the Same
TW200908816A (en) * 2006-08-28 2009-02-16 Beijing Nmc Co Ltd Inductive coupled coil and inductive coupled plasma device using the same
US20110180243A1 (en) * 2010-01-27 2011-07-28 Applied Materials, Inc. Apparatus for controlling temperature uniformity of a substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6474258B2 (en) * 1999-03-26 2002-11-05 Tokyo Electron Limited Apparatus and method for improving plasma distribution and performance in an inductively coupled plasma
US7571697B2 (en) * 2001-09-14 2009-08-11 Lam Research Corporation Plasma processor coil
CN100429740C (zh) * 2005-12-02 2008-10-29 北京北方微电子基地设备工艺研究中心有限责任公司 一种可调整局部耦合强度的icp线圈

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080223521A1 (en) * 2004-03-30 2008-09-18 Nam Hun Kim Plasma Source Coil and Plasma Chamber Using the Same
TW200908816A (en) * 2006-08-28 2009-02-16 Beijing Nmc Co Ltd Inductive coupled coil and inductive coupled plasma device using the same
US20110180243A1 (en) * 2010-01-27 2011-07-28 Applied Materials, Inc. Apparatus for controlling temperature uniformity of a substrate

Also Published As

Publication number Publication date
CN103456592A (zh) 2013-12-18
CN103456592B (zh) 2016-03-23
TW201349334A (zh) 2013-12-01

Similar Documents

Publication Publication Date Title
BR112014017635A2 (zh)
BR112014017614A2 (zh)
BR112014017592A2 (zh)
BR112014017625A2 (zh)
BR112014017659A2 (zh)
BR112014017646A2 (zh)
BR112014017638A2 (zh)
BR112014017607A2 (zh)
BR112013027865A2 (zh)
BR112014017634A2 (zh)
BR112014022268A2 (zh)
BR112014017609A2 (zh)
BR112014017644A2 (zh)
BR112014017647A2 (zh)
BR112014017588A2 (zh)
BR112014017618A2 (zh)
BR112014013184A8 (zh)
BR112014017652A2 (zh)
BR112014017621A2 (zh)
BR112014017630A2 (zh)
BR112014017622A2 (zh)
BR112014017627A2 (zh)
BR112014017623A2 (zh)
BR112014017641A2 (zh)
BR112014017631A2 (zh)