TWI491647B - Compounds with benzoxazine-bridged silsesquioxanes structure - Google Patents

Compounds with benzoxazine-bridged silsesquioxanes structure Download PDF

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TWI491647B
TWI491647B TW100128734A TW100128734A TWI491647B TW I491647 B TWI491647 B TW I491647B TW 100128734 A TW100128734 A TW 100128734A TW 100128734 A TW100128734 A TW 100128734A TW I491647 B TWI491647 B TW I491647B
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bridged
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oxonitrobenzo
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TW201307443A (en
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Wen Chiung Su
ying ling Liu
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Nat Inst Chung Shan Science & Technology
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具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物Bridged oxirane structure compound having oxonitrobenzo ring unit

本發明係有關於一種橋式矽氧烷結構的化合物,特別是有關於具有氧代氮代苯并環(benzoxazine)單元的自組裝橋式矽氧烷結構。This invention relates to a compound of a bridged oxane structure, and more particularly to a self-assembling bridged oxymethane structure having an oxonitrobenzoxazine unit.

現代晶片技術的發展不斷驅動著對於新的超低介電常數( k <2.0)材料的需求與研究。多孔材料在其固態網狀結構(solid networks)中可容納一些空氣( k =1.01),使得多孔材料的 k 值低於2.0。然而,在介質材料的應用中引進多孔性材料將會導致介質材料部分機械性能的犧牲,而且對後續晶片製造方面也形成了新的挑戰。於是,人們開始研究以溶膠-凝膠法(sol-gel)來製備有機-無機混成材料(hybrid organic-inorganic materials)的可能性。有機-無機混成材料可藉由提升薄膜網狀結構連結(film network connectivity)來改善介電材料的機械性能。在各種習知技藝的研究中較被看好的,是使用碳橋矽氧烷(carbon-bridged alkoxysilane)化合物來作為反應前驅物(precursors)。在溶膠-凝膠法中導入有機基團所形成之介電材料,將可減少介電材料的易碎性。特殊的成孔劑(porogens)可有助於控制孔隙(pore)的大小和分佈。相互連結的網狀結構以及對於密閉奈米孔隙的控制將有助於維持介電材料的機械性能與降低介電材料的 k 值。The development of modern wafer technology continues to drive demand and research for new ultra-low dielectric constant ( k < 2.0) materials. The porous material can hold some air ( k = 1.01) in its solid networks, such that the porous material has a k value below 2.0. However, the introduction of porous materials in the application of dielectric materials will result in the sacrifice of mechanical properties of the dielectric materials and pose new challenges for subsequent wafer fabrication. Thus, the possibility of preparing organic-inorganic materials by sol-gel has been studied. Organic-inorganic hybrid materials can improve the mechanical properties of dielectric materials by enhancing film network connectivity. It is preferred in various studies of the art to use carbon-bridged alkoxysilane compounds as reaction precursors. The introduction of a dielectric material formed by an organic group in a sol-gel method can reduce the friability of the dielectric material. Special porogens can help control the size and distribution of the pores. The interconnected network structure and control of the closed nanopores will help maintain the mechanical properties of the dielectric material and reduce the k value of the dielectric material.

以碳-橋式雙-矽氧烷[carbon-bridged bis(alkoxysilane)]化合物作為合成的反應前驅物將可得到橋式polysilsesquioxanes (bridged polysilsesquioxanes)。碳橋基團的化學結構在所形成的凝膠產物的結構、形態、和力學性能等方面均扮演著重要的角色。以silsesquioxane作為反應前驅物並進行自組裝反應(self-assembly),將可製備出將橋接有機基團(bridging organic groups)整合至通道牆(channel walls)中的週期性中孔洞有機矽(Periodic mesoporous organosilica;PMO)材料。混成薄膜(hybrid films)的介電常數將會隨著結構中有機部分的增加而逐漸下降。以純的橋式polysilsesquioxanes(neat bridged polysilsesquioxanes)所製成的介電材料可呈現出約為2.9的介電常數。在反應過程中,在大約400℃所進行的熱處理過程會對橋式polysilsesquioxanes造成橋接對熱轉換(bridging-to-thermal transformation),使得所製成的介電材料的 k 值降低至約1.8。藉由更多關於結構的相位控制(control of structural phases)將有機會進一步地改善所製備的材料的介電常數。Bridged polysilsesquioxanes (bridged polysilsesquioxanes) can be obtained by using a carbon-bridged bis(alkoxysilane) compound as a synthetic reaction precursor. The chemical structure of the carbon bridge group plays an important role in the structure, morphology, and mechanical properties of the formed gel product. Using silsesquioxane as a reaction precursor and self-assembly, periodic mesoporous organic mesoporous can be prepared for the integration of bridging organic groups into channel walls. Organolica; PMO) material. The dielectric constant of hybrid films will gradually decrease as the organic portion of the structure increases. A dielectric material made of pure bridge polysilsesquioxanes (neat bridged polysilsesquioxanes) can exhibit a dielectric constant of about 2.9. During the course of the reaction, the heat treatment at about 400 °C causes bridging-to-thermal transformation of the bridge polysilsesquioxanes, resulting in a reduction in the k value of the resulting dielectric material to about 1.8. By more on the control of structural phases, there will be an opportunity to further improve the dielectric constant of the materials produced.

習知技藝中已有文獻報導關於來對橋式聚倍半矽氧烷進行結構控制。前述的結構控制可將所形成的材料之形態控制在不同的大小和形狀。值得注意的是,複合材料的介電常數不僅取決於無機填料(inorganic filler)的組成,同時也與填料的排列(orientation)有關。當低 k 值(low- k )填料在層狀結構中的相位垂直於外加電場時,將使得複合材料的介電常數在諸多的填料組成範圍中更接近於低k值填料的介電常數。因此,低k值成分在有機/無機複合材料中的相位可以是一種有效製備低 k 值材料的研究方法。所以,具有垂直於所施加電場的層狀結構的自組裝橋式聚倍半矽氧烷在製備低 k 值材料方面是一 種值得注意的方式。There are reports in the prior art on the structural control of bridged polysesquioxanes. The aforementioned structural control can control the shape of the formed material to different sizes and shapes. It is worth noting that the dielectric constant of a composite material depends not only on the composition of the inorganic filler, but also on the orientation of the filler. When the low-k (k LOW-) vertical phase filler in the layer structure when the applied electric field, such that the dielectric constant of the composite material closer to the low-k dielectric filler in the range of many of filler. Therefore, the phase of the low-k component in the organic/inorganic composite material can be a research method for efficiently preparing low- k materials. Therefore, self-assembled bridge polysesquioxanes having a layered structure perpendicular to the applied electric field are a notable way to prepare low- k materials.

綜合上述,為了改善已知技術的介電材料的缺點,如何提供一種具備低介電常數與高機械強度,且在製備過程乾淨、簡便的介電材料已是具有高度產業發展價值的研究方向。In summary, in order to improve the shortcomings of the dielectric materials of the prior art, how to provide a dielectric material having a low dielectric constant and high mechanical strength and being clean and simple in the preparation process has been a research direction with high industrial development value.

鑒於上述背景之不便與缺失,為符合產業上某些利益之需求,本發明提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物,依據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物不僅具有低介電常數,並可同時具備高機械強度。In view of the inconvenience and absence of the above background, in order to meet the needs of certain interests in the industry, the present invention provides a bridged oxirane structure compound having an oxonitrobenzo ring unit, having oxonitrogen in accordance with the present invention. The compound of the bridged siloxane structure of the benzo ring unit has not only a low dielectric constant but also high mechanical strength.

本發明之一目的在於提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。藉由本發明所揭露的內容,具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物可經由一乾淨且簡便的自組裝反應方式來製備。對產業界而言,可達到節約生產成本之效果。It is an object of the present invention to provide a compound of a bridged oxirane structure having an oxonitrobenzo ring unit. By virtue of the teachings of the present invention, a compound of a bridged oxane structure having an oxonitrobenzo ring unit can be prepared via a clean and simple self-assembly reaction. For the industry, the effect of saving production costs can be achieved.

本發明之另一目的在於提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。藉由提升孔隙率,將可有效降低化合物之介電常數。Another object of the present invention is to provide a compound of a bridged oxirane structure having an oxonitrobenzo ring unit. By increasing the porosity, the dielectric constant of the compound can be effectively reduced.

本發明之又一目的在於提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。藉由控制在化合物內的有機基團的相位與比例,進而有效降低化合物之介電常數。It is still another object of the present invention to provide a bridged oxirane structure compound having an oxonitrobenzo ring unit. The dielectric constant of the compound is effectively reduced by controlling the phase and ratio of the organic groups within the compound.

本發明之又一目的在於提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。藉由在化合物內形成薄片交聯網狀結構,進而有效提升化合物之機械強度。It is still another object of the present invention to provide a bridged oxirane structure compound having an oxonitrobenzo ring unit. The mechanical strength of the compound is effectively enhanced by forming a cross-linked network structure in the compound.

本發明之又一目的在於提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。藉由應用分子間與分子內氫鍵,將可有效誘發自組裝效應與形成交聯網狀結構,進而有效維持該具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的薄片狀架構。It is still another object of the present invention to provide a bridged oxirane structure compound having an oxonitrobenzo ring unit. By applying intermolecular and intramolecular hydrogen bonds, a self-assembly effect can be effectively induced and a cross-linked network structure can be formed, thereby effectively maintaining the flaky shape of the compound of the bridged oxirane structure having an oxo-nitrobenzobenzene unit. Architecture.

本發明之又一目的在於提供一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。藉由在有機橋接基團中加入適當的電致發光團基,將可讓具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物具有電致發光的特性。It is still another object of the present invention to provide a bridged oxirane structure compound having an oxonitrobenzo ring unit. By adding a suitable electroluminescent group to the organic bridging group, a compound having a bridged oxoxane structure having an oxonitrobenzo ring unit can be made to have electroluminescence characteristics.

根據以上所述之目的,本發明揭示了一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物,該具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物具有薄片網狀結構。根據本發明之設計,該具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物可以呈現出低介電常數、高機械強度、與電致發光等特性。In accordance with the above objects, the present invention discloses a bridged oxirane structure compound having an oxonitrobenzo ring unit, the bridged oxirane structure compound having an oxonitrobenzo ring unit It has a sheet mesh structure. According to the design of the present invention, the compound of the bridged oxime structure having an oxonitrobenzo ring unit can exhibit characteristics such as low dielectric constant, high mechanical strength, and electroluminescence.

根據以上所述之目的,本發明揭示了一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。為了能徹底地瞭解本發明,將在下列的描述中提出詳盡的步驟及其組成。顯然地,本發明的施行並未限定於該領域中具有通常知識者所熟習的特殊細節。另一方面,眾所周知的組成或步驟並未描述於細節中,以避免造成本發明不必要之限制。本發明的較佳實施例將會詳細描述如下,然而除了這些詳細描述之外,本發明還可以廣泛地施行在其他的實施例中,且本發明的範圍不受限定,其以之後的專利範圍為準。In accordance with the above objects, the present invention discloses a bridged oxirane structure compound having an oxonitrobenzo ring unit. In order to thoroughly understand the present invention, detailed steps and compositions thereof will be set forth in the following description. Obviously, the practice of the present invention is not limited to the specific details in the field that are common to those skilled in the art. On the other hand, well-known components or steps are not described in detail to avoid unnecessarily limiting the invention. The preferred embodiments of the present invention will be described in detail below, but the present invention may be widely practiced in other embodiments, and the scope of the present invention is not limited by the following detailed description. Prevail.

根據本說明書之一實施例,係揭露一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的一般結構式如下: According to one embodiment of the present specification, a compound of a bridged oxirane structure having an oxonitrobenzo ring unit is disclosed. The general structural formula of the above-mentioned bridged oxirane structure compound having an oxonitrobenzo ring unit is as follows:

其中,X可以是選自下列族群中之一者:一化學鍵、-O-、-CH2 -、;R1 與R3 可以相同或不同,且R1 與R3 可以是分別選自C1 ~C8 的烷基(alkyl group),或C6 ~C15 的芳香基(aryl group);而m係可為大於零的整數。Wherein X may be one selected from the group consisting of: a chemical bond, -O-, -CH 2 -, , , , , R 1 and R 3 may be the same or different, and R 1 and R 3 may be an alkyl group selected from C 1 to C 8 , respectively, or an aryl group of C 6 to C 15 ; The m system can be an integer greater than zero.

在根據本實施例之一較佳範例中,當m等於1的時候,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: In a preferred embodiment according to this embodiment, when m is equal to 1, the structural formula of the above-mentioned bridged oxirane structure compound having an oxonitrobenzo ring unit is as follows:

其中,R2 與R4 可以相同或不同,且R2 與R4 可以是分別選自C1 ~C8 的烷基。Wherein R 2 and R 4 may be the same or different, and R 2 and R 4 may be an alkyl group selected from C 1 to C 8 , respectively.

在根據本實施例之另一較佳範例中,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: In another preferred embodiment according to this embodiment, the structural formula of the above-mentioned bridged oxirane structure compound having an oxonitrobenzo ring unit is as follows:

其中,上述結構式中的m可以是一大於零的整數。Wherein m in the above structural formula may be an integer greater than zero.

在根據本實施例之又一較佳範例中,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: In still another preferred embodiment according to this embodiment, the structural formula of the above-mentioned bridged oxirane structure compound having an oxonitrobenzo ring unit is as follows:

根據本說明書之另一實施例,係揭露一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的一般結構式如下: According to another embodiment of the present specification, there is disclosed a compound of a bridged oxirane structure having an oxonitrobenzo ring unit, the above-mentioned compound having a bridged oxoxane structure having an oxonitrobenzo ring unit The general structure is as follows:

其中,X可以是選自下列族群中之一者:一化學鍵、-O-、-CH2 -、;R1 與R3 可以相同或不同,且R1 與R3 可以是分別選自C1 ~C8 的烷基(alkyl group),或C6 ~C15 的芳香基(aryl group);而m與n係可分別選自一大於零的整數。Wherein X may be one selected from the group consisting of: a chemical bond, -O-, -CH 2 -, , , , , R 1 and R 3 may be the same or different, and R 1 and R 3 may be an alkyl group selected from C 1 to C 8 , respectively, or an aryl group of C 6 to C 15 ; The m and n systems may each be selected from an integer greater than zero.

在根據本實施例之一較佳範例中,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: In a preferred embodiment according to this embodiment, the structural formula of the above-mentioned bridged oxirane structure compound having an oxonitrobenzo ring unit is as follows:

以下將敘明數種根據本說明書之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構、合成方式、及其物性分析,然而,本說明書之範圍應以其後的專利範圍為準,而不應以下列範例為限。Hereinafter, the structures, synthetic forms, and physical properties of a plurality of compounds of a bridged oxirane structure having an oxonitrobenzo ring unit according to the present specification will be described. However, the scope of the present specification should be followed by The scope of patents shall prevail and shall not be limited to the following examples.

合成方式:Synthetic method:

於下列各實施例所述之合成方式中,所使用之雙酚-A(bisphenol-A;BPA)係購自Showa化學品公司。甲醛(37%水溶液)與3-胺基丙基三乙氧基矽烷係購自Aldrich化學品公司。四氫呋喃(Tetrahydrofuran;THF)係購自Tedia化學品公司,並在使用前先經分子篩(molecular sieves)乾燥過。In the synthetic manners described in the following examples, the bisphenol-A (BPA) used was purchased from Showa Chemicals. Formaldehyde (37% in water) and 3-aminopropyltriethoxydecane were purchased from Aldrich Chemical Company. Tetrahydrofuran (THF) was purchased from Tedia Chemical Company and dried by molecular sieves prior to use.

第一實施例:First embodiment:

製備具有氧代氮代苯并環結構的矽氧烷化合物(Bz-BES)之方法:A method of preparing a oxoxane compound (Bz-BES) having an oxoazobenzo ring structure:

參考反應式1 所示,將BPA(10g,43.8mmol),甲醛(5.26g,175mmol),以及3-胺基丙基三乙氧基矽烷(19.4g,87.6mmol)混合於氯仿(chloroform,100mL)中,並讓此混合溶液在85℃反應24小時。前述反應後之結果可不需進一步純化。直接濃縮後得到預期產物Bz-BES(產率:75%)。Elemental analysis calcd(%)for C37 H62 N2 O8 Si2 :C 61.83,H 9.63,N 3.89;found C 61.70,H 8.67,N 3.81.Referring to Reaction Scheme 1 , BPA (10 g, 43.8 mmol), formaldehyde (5.26 g, 175 mmol), and 3-aminopropyltriethoxydecane (19.4 g, 87.6 mmol) were mixed in chloroform (100 mL) In this, the mixed solution was allowed to react at 85 ° C for 24 hours. The results after the foregoing reaction were carried out without further purification. Direct concentration gave the expected product Bz-BES (yield: 75%). Elemental analysis calcd (%) for C 37 H 62 N 2 O 8 Si 2 : C 61.83, H 9.63, N 3.89; found C 61.70, H 8.67, N 3.81.

第二實施例:Second embodiment:

具有氧代氮代苯并環結構的矽氧烷化合物(Bz-BES)之水解與縮合:Hydrolysis and condensation of a oxoxane compound (Bz-BES) having an oxoazobenzo ring structure:

將Bz-BES溶於四氫呋喃(THF)中,配製成濃度0.4M的THF溶液。將前述Bz-BES的THF溶液與1.08N的NaOH水溶液混合以進行如反應式2的反應。前述反應的混合比例中,水/Bz-BES的莫爾比(molar ratio)約為6.2。前述混合溶液在30℃反應48小時後可得到凝膠(gel)產物。前述凝膠產物先以THF以及蒸餾水沖洗後,再於室溫下經過真空乾燥,即可獲得Bz-BES的乾凝膠(xerogel)產物(XG-Bz-BES)。Bz-BES was dissolved in tetrahydrofuran (THF) to prepare a 0.4 M solution in THF. The aforementioned Bz-BES THF solution was mixed with a 1.08 N aqueous NaOH solution to carry out the reaction as in Reaction Scheme 2. In the mixing ratio of the foregoing reaction, the water/Bz-BES has a molar ratio of about 6.2. The above mixed solution was subjected to a reaction at 30 ° C for 48 hours to obtain a gel product. The gel product was washed with THF and distilled water and then dried under vacuum at room temperature to obtain a dry gel (xerogel) product of Bz-BES (XG-Bz-BES).

反應式2Reaction formula 2

第三實施例:Third embodiment:

製備經過熱處理(thermally cured)之具有氧代氮代苯并環結構之聚倍半矽氧烷(PBz-BPSSQ):Preparation of a thermally cured polysesquioxane having a oxobenzobenzo ring structure (PBz-BPSSQ):

將濃度0.4M的Bz-BES的四氫呋喃(THF)溶液與濃度1.08N的NaOH水溶液混合以進行反應。在30℃反應2小時後,將混合溶液倒入一不銹鋼模具(stainless mold)。隨後,讓前述混合溶液在90℃熱處理1小時,在150℃熱處理1小時,在180℃熱處理3小時,以及在220℃熱處理2小時,參考反應式3 所示。之後即可得到經過熱處理具有氧代氮代苯并環結構之聚倍半矽氧烷 (PBz-BPSSQ)產物。A 0.4 M solution of Bz-BES in tetrahydrofuran (THF) was mixed with a 1.08 N aqueous NaOH solution to carry out a reaction. After reacting at 30 ° C for 2 hours, the mixed solution was poured into a stainless mold. Subsequently, the foregoing mixed solution was subjected to heat treatment at 90 ° C for 1 hour, heat treatment at 150 ° C for 1 hour, heat treatment at 180 ° C for 3 hours, and heat treatment at 220 ° C for 2 hours, as shown in Reference Reaction Formula 3 . Thereafter , a poly sesquioxane (PBz-BPSSQ) product having an oxonitrobenzo ring structure after heat treatment is obtained.

聚氧代氮代苯并環/聚倍半矽氧烷 (polybenzoxazine/PSSQ)的奈米複合材料(nanocomposite)可經由與上述實驗相同的操作流程來獲得。不同之處在於,所使用的反應啟始物為Bz-BES與BPA-FBz(重量百分比為50/50%)。所得到經過熱處理後的產物可編碼為PBz-BPSSQ/PBz。Poly-oxo-N-substituted benzo ring / Poly Silicon sesqui siloxane (polybenzoxazine / PSSQ) of Nanocomposites (Nanocomposite) may be obtained via the above experiment the same operation flow. The difference was that the reaction initiators used were Bz-BES and BPA-FBz (50/50% by weight). The resulting heat treated product can be coded as PBz-BPSSQ/PBz.

由傅力葉轉換紅外光(FTIR)的光譜分析中,請參考第一a圖,Bz-BES分別在1231cm-1 、1021cm-1 [伸展(stretching),氧代氮代苯并環的C-O-C]、1498cm-1 (三取代之苯環基團)、以及1100cm-1 (Si-O-C)呈現出特徵吸收峰。在1 H核磁共振光譜(1 H NMR)的光譜分析中,參考第一b圖,Bz-BES在δ=4.83ppm(O-CH 2 -N)與δ=3.93ppm(Ph-CH 2 -O)的位置呈現出特徵的共振峰(resonance peaks)。同時,在1 H NMR的光譜分析中也可發現Bz-BES的其他特徵共振峰分別出現在δ=0.67ppm(Si-CH 2 -),δ=1.22ppm(Si-OCH2 CH 3 ),δ=1.59ppm(雙酚A中的-CH 3 ),δ=1.68ppm(Si-CH2 CH 2 -),δ=2.74ppm (N-CH 2 -),δ=3.82ppm(Si-OCH 2 CH3 ),以及δ=6.66~6.93ppm[芳香環上的氫(aromatic protons)]。除了前述的特徵共振峰之外,Bz-BES的1 H NMR的光譜在化學位移(chemical shift)約3.0~3.5ppm的位置並沒有出現任何的共振峰。亦即,由光譜分析可看出,在反應產物中沒有開環後的氧代氮代苯并環基團存在。此外,在29 Si核磁共振光譜(29 Si NMR)中,參考第一c圖,Bz-BES只有在約δ=-51.3ppm的位置顯示一個共振峰。相較於APTES在δ=-46.3ppm所呈現的特徵共振峰,前述Bz-BES的共振峰明顯出現了位移。這也說明了Bz-BES與反應物APTES的化學結構並不相同。單一峰值的光譜結果也可作為反應結果為高純度Bz-BES的支持證據。在製備Bz-BES的過程中並沒有發生Si-OEt的水解。Bz-BES的分子量測量值為717.8g mol-1 ,恰符合於分子量計算值718g mol-1 (C37 H62 N2 O8 Si2 )。Converted by the force FU leaf infrared (FTIR) spectroscopic analysis, refer to FIGS. A first, Bz-BES respectively 1231cm -1, 1021cm -1 [benzo ring stretching (stretching), oxo-substituted nitrogen COC], 1498cm -1 (trisubstituted benzene ring group) and 1100 cm -1 (Si-OC) exhibit characteristic absorption peaks. In the spectral analysis of 1 H NMR spectroscopy ( 1 H NMR), referring to the first b-graph, Bz-BES at δ = 4.83 ppm (OC H 2 -N) and δ = 3.93 ppm (Ph-C H 2 -O) The position of the ) exhibits characteristic resonance peaks. At the same time, in the spectral analysis of 1 H NMR, it was also found that other characteristic resonance peaks of Bz-BES appeared at δ=0.67ppm (Si-C H 2 -), δ=1.22ppm (Si-OCH 2 C H 3 ). , δ = 1.59 ppm (-C H 3 in bisphenol A), δ = 1.68 ppm (Si-CH 2 C H 2 -), δ = 2.74 ppm (NC H 2 -), δ = 3.82 ppm (Si- OC H 2 CH 3 ), and δ = 6.66 to 6.93 ppm [aromatic protons]. In addition to the aforementioned characteristic formants, the 1 H NMR spectrum of Bz-BES did not show any formants at a chemical shift of about 3.0 to 3.5 ppm. That is, it can be seen from the spectral analysis that there is no ring-opened oxonitrobenzobenzo group present in the reaction product. Further, in the 29 Si nuclear magnetic resonance spectrum ( 29 Si NMR), referring to the first c-picture, Bz-BES showed only a resonance peak at a position of about δ = -51.3 ppm. Compared with the characteristic resonance peak exhibited by APTES at δ=-46.3 ppm, the resonance peak of the aforementioned Bz-BES apparently showed displacement. This also indicates that the chemical structure of Bz-BES and the reactant APTES are not the same. The spectral results of a single peak can also be used as a supporting result for high purity Bz-BES. Hydrolysis of Si-OEt did not occur during the preparation of Bz-BES. The molecular weight measurement of Bz-BES was 717.8 g mol -1 , which was in accordance with the calculated molecular weight of 718 g mol -1 (C 37 H 62 N 2 O 8 Si 2 ).

在Bz-BES之水解與縮合的反應中,以Bz-BES作為起始物,藉由溶膠-凝膠法(sol-gel)可得到的乾凝膠(xerogel)。催化劑的種類和濃度對於凝膠時間(gel time)有著極大的影響。依據習知技藝者對溶膠-凝膠法的理解,在前述水解與縮合的反應中,可以選擇採用酸性(HCl)或是鹼性(NaOH)的催化劑來進行反應。當採用0.2N NaOH水溶液來催化前述反應時,所需的凝膠時間約為96小時。另一方面,當採用0.2N HCl水溶液來催化前述反應時,即使經過1個月也沒有出現凝膠化(gelation)的現象。此一結果近似於以往文獻報導中關於烷基-以及芳香基-橋式聚倍半矽氧烷(alkyl- and aryl-bridged polysilsesquioxanes)的報導內容,但是卻與bisimide-橋式聚倍 半矽氧烷(bisimide-bridged polysilsesquioxane)的相關文獻報導恰巧相反。當NaOH催化劑的濃度提升至0.4N時,Bz-BES的溶膠-凝膠系統中之凝膠時間將可縮短至約3小時。反應後所得到的凝膠產物以THF與蒸餾水沖洗,並在室溫進行真空乾燥後,即可得到Bz-BES的乾凝膠(XG-Bz-BES)。在FTIR的光譜分析中,XG-Bz-BES在約1000-1100cm-1 的位置出現Si-O-Si的寬吸收峰(broad absorption peak),以及在約2900cm-1 的位置CH吸收峰的強度減弱,皆可用以說明Bz-BES的溶膠-凝膠反應(如第一a圖所示)。In the reaction of hydrolysis and condensation of Bz-BES, a dry gel (xerogel) obtainable by sol-gel using Bz-BES as a starting material. The type and concentration of the catalyst has a great influence on the gel time. According to the understanding of the sol-gel method by the skilled artisan, in the reaction of the hydrolysis and condensation, an acid (HCl) or a basic (NaOH) catalyst can be selected for the reaction. When a 0.2 N aqueous NaOH solution was used to catalyze the foregoing reaction, the gel time required was about 96 hours. On the other hand, when a 0.2 N aqueous HCl solution was used to catalyze the above reaction, gelation did not occur even after one month. This result is similar to that reported in previous literatures on alkyl- and aryl-bridged polysilsesquioxanes, but with bisimide-bridge polypothala The related literature on bisimide-bridged polysilsesquioxane is reported to be the opposite. When the concentration of the NaOH catalyst is raised to 0.4 N, the gel time in the sol-gel system of Bz-BES can be shortened to about 3 hours. The gel product obtained after the reaction was washed with THF and distilled water, and vacuum-dried at room temperature to obtain a dry gel of Bz-BES (XG-Bz-BES). FTIR spectroscopic analysis of the, XG-Bz-BES broad absorption peak appears Si-O-Si of (broad absorption peak) at the position of about 1000-1100cm -1, and CH absorption intensity peak at a position of about 2900cm -1 Attenuation can be used to illustrate the sol-gel reaction of Bz-BES (as shown in Figure a).

對XG-Bz-BES進一步的熱處理將可形成固化之聚氧代氮代苯并環-橋式聚倍半矽氧烷(cured polybenzoxazine-bridged polysilsesquioxanes;PBz-BPSSQ)。在前述的熱處理過程中,氧代氮代苯并環基團將會進行開環聚合(ring-opening polymerization),以形成交聯式聚氧代氮代苯并環網狀結構(cross-linked polybenzoxazine networks)。再者,在殘餘的矽醇基團(residual silanol groups)之間可能會發生縮合(condensation),而提高了具有氧代氮代苯聚倍半矽氧烷的縮合度(condensation degree)。Further heat treatment of XG-Bz-BES will form a cured polybenzoxazine-bridged polysilsesquioxanes (PBz-BPSSQ). During the aforementioned heat treatment, the oxo-nitrobenzo ring group will undergo ring-opening polymerization to form a cross-linked polybenzoxazine (cross-linked polybenzoxazine). Networks). Furthermore, condensation may occur between residual silanol groups, and the condensation degree with oxoazobenzene polysesquioxane is increased.

在固態29 SiNMR光譜中,如第二圖所示,XG-Bz-BES與PBz-BPSSQ皆在約δ=-67.0ppm的位置出現一主要的共振峰,此一共振峰的位置與完全濃縮的矽(T3 )相符。對應到T2 和T1 結構的共振峰也分別出現在約δ=-58.5ppm與δ=-54.2ppm的位置。相對於PBz-BPSSQ,前述T2 和T1 這兩個共振峰的強度顯得相對變弱許多,這也正說明了在熱固化過程中有出現矽醇基的縮合反應。前述氧代氮代苯并環基團的聚合反應也 會導致四取代苯環基團的形成。前述四取代苯環基團在FTIR的光譜分析中具有一吸收峰在約1485cm-1 的位置。可作為比較的是,Bz-BES的三取代苯環基團在FTIR的光譜分析中具有一吸收峰在約1498cm-1 的位置(如第一a圖所示)。In the solid-state 29 Si NMR spectrum, as shown in the second figure, both XG-Bz-BES and PBz-BPSSQ showed a major resonance peak at a position of about δ=-67.0 ppm, and the position of this resonance peak was completely concentrated.矽(T 3 ) matches. The resonance peaks corresponding to the T 2 and T 1 structures also appear at positions of about δ = -58.5 ppm and δ = -54.2 ppm, respectively. Relative to PBz-BPSSQ, the aforementioned two resonance peaks of T 2 and T 1 appear to be relatively weaker, which also indicates that a condensation reaction of a sterol group occurs during thermal curing. The polymerization of the aforementioned oxonitrobenzo ring group also leads to the formation of a tetrasubstituted benzene ring group. The aforementioned tetrasubstituted benzene ring group has an absorption peak at a position of about 1485 cm -1 in the spectral analysis of FTIR. As a comparison, the trisubstituted benzene ring group of Bz-BES has an absorption peak at a position of about 1498 cm -1 in the spectral analysis of FTIR (as shown in the first a diagram).

Bz-BES的氧代氮代苯并環基團的反應狀態也可藉由DSC來進行追蹤。參考第三圖,在DSC分析中,Bz-BES呈現出一放熱峰(exothermic peak)。前述之放熱效應係與Bz-BES的氧代氮代苯并環基團的熱誘導開環反應(thermo-induced ring-opening reaction)有關。上述放熱峰的中心在約253℃,且反應焓(reaction enthalpy)約為170J g-1 。上述的反應溫度與焓的數值均與其他氧代氮代苯并環化合物的文獻報導數值相似。由於氧代氮代苯并環的聚合反應,XG-Bz-BES同樣具有一放熱峰。相較於Bz-BES,XG-Bz-BES的放熱峰位移向更高的溫度,且具有較低的反應焓。前述溫度位移與反應焓的差異可以歸因於,XG-Bz-BES中的具聚倍半矽氧烷網狀結構所造成之立體障礙(steric hindrance)。在熱處理之後,所形成的產物PBz-BPSSQ並沒有在DSC熱譜中呈現出任何的放熱峰。因此,在熱處理的過程,XG-Bz-BES的氧代氮代苯并環基團會發生聚合反應,且此一反應的轉換度頗高。同時值得注意的是,PBz-BPSSQ具有一玻璃轉換溫度在約295℃,此一玻璃轉換溫度也顯示了高度交聯的聚氧代氮代苯并環網狀結構的形成。The reaction state of the oxonitrobenzo ring group of Bz-BES can also be traced by DSC. Referring to the third figure, in the DSC analysis, Bz-BES exhibits an exothermic peak. The aforementioned exothermic effect is related to the thermo-induced ring-opening reaction of the oxoazobenzo ring group of Bz-BES. The center of the exothermic peak is at about 253 ° C, and the reaction enthalpy is about 170 J g -1 . The above reaction temperatures and enthalpy values are similar to those reported for other oxonitrobenzo compounds. XG-Bz-BES also has an exothermic peak due to the polymerization of the oxonitrobenzo ring. Compared to Bz-BES, the exothermic peak of XG-Bz-BES shifts to a higher temperature and has a lower reaction enthalpy. The difference between the aforementioned temperature shift and the reaction enthalpy can be attributed to the steric hindrance caused by the polysilsesquioxane network structure in XG-Bz-BES. After the heat treatment, the formed product PBz-BPSSQ did not exhibit any exothermic peak in the DSC thermogram. Therefore, during the heat treatment, the oxo-nitrobenzo ring group of XG-Bz-BES undergoes polymerization, and the degree of conversion of this reaction is quite high. At the same time, it is worth noting that PBz-BPSSQ has a glass transition temperature of about 295 ° C. This glass transition temperature also shows the formation of a highly crosslinked polyoxonitrobenzocyclonet network.

第四圖係XG-Bz-BES與PBz-BPSSQ的氮吸附/去吸附等溫線圖(nitrogen adsorption/desorption isotherms),其中記錄了氣體吸附/脫附圖。XG-Bz-BES的表面積為144.0m2 g-1 。 XG-Bz-BES係一多孔性材質,且平均孔徑約3.7nm。剛性的(rigid)氧代氮代苯并環橋式結構有助於防止孔隙崩壞,並可在凝膠反應與乾燥等過程中維持XG-Bz-BES的多孔性結構。氧代氮代苯并環基團的聚合反應在PBz-BPSSQ形成大量的交聯結構,以便在PBz-BPSSQ的有機區域內誘發孔隙崩壞。因此,PBz-BPSSQ的表面積明顯下降至4.0m2 g-1 。PBz-BPSSQ的低表面積也說明了高度交聯的聚氧代氮代苯并環區域相對較為密集。The fourth graph is a nitrogen adsorption/desorption isotherms of XG-Bz-BES and PBz-BPSSQ, in which gas adsorption/desorption is recorded. The surface area of XG-Bz-BES is 144.0 m 2 g -1 . XG-Bz-BES is a porous material and has an average pore diameter of about 3.7 nm. The rigid oxo-nitrobenzo ring bridge structure helps prevent pore collapse and maintains the porous structure of XG-Bz-BES during gel reaction and drying. The polymerization of the oxonitrobenzo ring group forms a large amount of crosslinked structure in PBz-BPSSQ to induce pore collapse in the organic region of PBz-BPSSQ. Therefore, the surface area of PBz-BPSSQ was significantly reduced to 4.0 m 2 g -1 . The low surface area of PBz-BPSSQ also indicates that the highly crosslinked polyoxonitrobenzo ring region is relatively dense.

PBz-BPSSQ在1百萬赫茲(MHz)的介電常數(dielectric constant)約為1.57。相較於其他橋式聚倍半矽氧烷的介電常數,PBz-BPSSQ明顯呈現出較低的介電常數。如上所述,PBz-BPSSQ在有機聚氧代氮代苯并環範圍中的多孔性較低,此一較低的多孔性可能不會促成介電常數的下降。習知該項技藝者應知,混成聚倍半矽氧烷(hybrid polysilsesquioxanes)的介電常數將會隨著有機物含量而下降。所以,PBz-BPSSQ介電常數的下降可能是起因於聚倍半矽氧烷的結構。然而,PBz-BPSSQ的介電常數卻低於以往文獻中的橋式聚倍半矽氧烷所報導之數值(~1.8)(1MHz)。The dielectric constant of PBz-BPSSQ at 1 megahertz (MHz) is about 1.57. PBz-BPSSQ clearly exhibits a lower dielectric constant than the dielectric constant of other bridged polysesquioxanes. As described above, PBz-BPSSQ has a low porosity in the range of the organopolyoxonitrobenzo ring, and this lower porosity may not contribute to a decrease in dielectric constant. It is well known to those skilled in the art that the dielectric constant of hybrid polysilsesquioxanes will decrease with the organic content. Therefore, the decrease in the dielectric constant of PBz-BPSSQ may be due to the structure of polysesquioxanes. However, the dielectric constant of PBz-BPSSQ is lower than that reported by the bridge polypotpenal oxide in the previous literature (~1.8) (1 MHz).

另外,對於製備低 k 值的交聯樹脂而言,Bz-BES可以是一種有效的交聯添加物(additive)。以混合Bz-BES和BPA-FBZ(50/50%重量百分比)作為反應前驅物,將可製備出聚氧代氮代苯并環/聚倍半矽氧烷(PBz-BPSSQ/PBz)奈米複合材料。In addition, Bz-BES can be an effective crosslinking additive for the preparation of low k crosslinked resins. Polyoxobenzobenzo/polysesquioxanes (PBz-BPSSQ/PBz) nanoparticles can be prepared by mixing Bz-BES and BPA-FBZ (50/50% by weight) as reaction precursors. Composite material.

如第五圖所示,PBz-BPSSQ/PBz也可藉由透射電鏡(TEM)觀察到自組裝的層狀結構。暗層區域(dark domain)將會隨著相對應的PBz-BPSSQ/PBz中的BPSSQ含量下降而減少。其結 果是,PBz-BPSSQ/PBz的介電常數約為1.73。此一數值係高於PBz/BPSSQ的介電常數,而且也相對低於熱固性樹脂的介電常數。As shown in the fifth figure, the PBz-BPSSQ/PBz can also observe the self-assembled layered structure by transmission electron microscopy (TEM). The dark domain will decrease as the BPSSQ content in the corresponding PBz-BPSSQ/PBz decreases. Its knot As a result, the dielectric constant of PBz-BPSSQ/PBz is about 1.73. This value is higher than the dielectric constant of PBz/BPSSQ and relatively lower than the dielectric constant of the thermosetting resin.

對於超低 k 值的介電材料而言,機械強度也是重要的性質之一。對於多孔性材料而言,增加多孔介電材料的孔隙率(porosity)將可顯著降低多孔性材料的介電常數。然而,高孔隙率也將大幅降低介電材料的模數(modulus)。值得注意的是,PBz-BPSSQ的楊氏係數(Young’s modulus)約為3.1GPa。因此,相較於習知技藝中 k 值約為1.85和楊氏係數約1.1GPa的甲基倍半矽氧烷(MSSQ)薄膜,PBz-BPSSQ擁有更優越的機械強度。Mechanical strength is also an important property for ultra-low k dielectric materials. For porous materials, increasing the porosity of the porous dielectric material will significantly reduce the dielectric constant of the porous material. However, high porosity will also greatly reduce the modulus of the dielectric material. It is worth noting that the Young's modulus of PBz-BPSSQ is about 3.1 GPa. Therefore, PBz-BPSSQ has superior mechanical strength compared to the methyl sesquiterpene oxide (MSSQ) film having a k value of about 1.85 and a Young's modulus of about 1.1 GPa in the prior art.

綜合上述,氧代氮代苯并環(benzoxazine)是一種容易形成強大的分子間氫鍵(intermolecular hydrogen bonds)的雜環基團(hetero cyclic group)。氫鍵有助於形成自組裝橋式聚倍半矽氧烷。此外,氧代氮代苯并環基團在加熱的反應條件下可進行開環加成聚合反應(ring-opening addition polymerization)。橋接基團的聚合反應將有助於控制橋式聚倍半矽氧烷中有機片段的排列方式。In summary, benzoxazine is a heterocyclic group that readily forms powerful intermolecular hydrogen bonds. Hydrogen bonding facilitates the formation of self-assembled bridge polysesquioxanes. Further, the oxonitrobenzo ring group can undergo ring-opening addition polymerization under heating reaction conditions. The polymerization of the bridging groups will help to control the arrangement of the organic fragments in the bridge polysesquioxane.

根據本說明書之設計,先合成出氧代氮代苯并環-橋式-雙(三乙氧基矽烷)[benzoxazine-bridged bis(triethoxysilane)]化合物,然後再通過溶膠-凝膠法(sol-gel)和熱處理工藝(thermal treatment),即可製得交聯聚氧代氮代苯并環-橋式-聚倍半矽氧烷(cross-linked polybenzoxazine-bridged polysilsesquioxane)。在觀測氧代氮代苯并環-橋式聚倍半矽氧烷材料時可同時發現聚倍半矽氧烷區域在層狀結構中的相位 排列模式。According to the design of the present specification, a benzoxazine-bridged bis(triethoxysilane) compound is synthesized first, and then passed through a sol-gel method (sol- Cross-linked polybenzoxazine-bridged polysilsesquioxane can be obtained by gel and thermal treatment. The phase of the polysesquioxane region in the layered structure can be found simultaneously when observing the oxo-nitrobenzo-bridged polyhaxaluminoxane material. Arrange mode.

綜合以上所述,本發明揭露了一種具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物。根據本發明之揭露內容,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物具有薄片網狀結構。更好的是,上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物可呈現出低介電常數和高機械強度。In summary, the present invention discloses a bridged oxirane structure compound having an oxonitrobenzo ring unit. According to the disclosure of the present invention, the above-mentioned compound having a bridged oxoxane structure having an oxonitrobenzo ring unit has a sheet network structure. More preferably, the above-mentioned bridged oxirane structure compound having an oxonitrobenzo ring unit exhibits a low dielectric constant and high mechanical strength.

顯然地,依照上面實施例中的描述,本發明可能有許多的修正與差異。因此需要在其附加的權利要求項之範圍內加以理解,除了上述詳細的描述外,本發明還可以廣泛地在其他的實施例中施行。上述僅為本發明之較佳實施例而已,並非用以限定本發明之申請專利範圍;凡其它未脫離本發明所揭示之精神下所完成的等效改變或修飾,均應包含在下述申請專利範圍內。Obviously, many modifications and differences may be made to the invention in light of the above description. It is therefore to be understood that within the scope of the appended claims, the invention may be The above are only the preferred embodiments of the present invention, and are not intended to limit the scope of the claims of the present invention; all other equivalent changes or modifications which are not departing from the spirit of the present invention should be included in the following claims. Within the scope.

第一a圖,係根據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物Bz-BESFTIR光譜圖。Figure 1a is a Bz-BESFTIR spectrum of a compound of a bridged oxirane structure having an oxonitrobenzo ring unit according to the present invention.

第一b圖,係根據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物Bz-BES1 H NMR光譜圖。Figure 1b is a Bz-BES 1 H NMR spectrum of a compound of a bridged oxoxane structure having an oxonitrobenzo ring unit according to the present invention.

第一c圖,係根據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物Bz-BES29 Si NMR光譜圖。The first c-graph is a Bz-BES 29 Si NMR spectrum of a compound of a bridged oxirane structure having an oxonitrobenzo ring unit according to the present invention.

第二圖,係根據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物XG-Bz-BES與PBz-BPSSQ的固態29 Si NMR光譜圖。The second panel is a solid-state 29 Si NMR spectrum of the compound XG-Bz-BES and PBz-BPSSQ of a bridged oxime structure having an oxoazobenzo ring unit according to the present invention.

第三圖,係根據本發明之具有氧代氮代苯并環單元的橋式 矽氧烷結構之化合物Bz-BES、XG-Bz-BES、與PBz-BPSSQ的DSC熱譜圖。The third figure is a bridge having an oxonitrobenzobenzene unit according to the present invention. The DSC thermogram of the compounds Bz-BES, XG-Bz-BES, and PBz-BPSSQ of the decane structure.

第四圖,係根據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物XG-Bz-BES與PBz-BPSSQ的氮吸附/去吸附等溫線圖。The fourth graph is a nitrogen adsorption/desorption isotherm diagram of the compound XG-Bz-BES and PBz-BPSSQ of a bridged oxirane structure having an oxoazobenzo ring unit according to the present invention.

第五圖,係根據本發明之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物PBz-BPSSQ與PBz-BPSSQ/PBz的TEM顯微照相圖(x 50K)。Figure 5 is a TEM photomicrograph (x 50K) of the compound PBz-BPSSQ and PBz-BPSSQ/PBz of a bridged oxirane structure having an oxoazobenzo ring unit according to the present invention.

Claims (6)

一種具有氧代氮代苯并環(benzoxazine)單元的橋式矽氧烷結構之化合物,該具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的一般結構式如下: 其中,X可以是選自一化學鍵、-O-、-CH2 -、 R1 與R3 可為相同或不同,且R1 與R3 分別選自C1 ~C8 的烷基(alkyl group),或C6 ~C15 的芳香基(aryl group);而m係為整數,但至少為1。A compound of a bridged oxoxane structure having an oxonitrobenzoxazine unit having a general structural formula of a bridged oxirane structure having an oxoazobenzo ring unit is as follows: Wherein X may be selected from a chemical bond, -O-, -CH 2 -, R 1 and R 3 may be the same or different, and R 1 and R 3 are each selected from a C 1 to C 8 alkyl group, or a C 6 to C 15 aryl group; Is an integer, but at least 1. 如申請專利範圍第1項所述之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物,其中上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: 其中,R2 與R4 可以相同或不同,且R2 與R4 可以是分別選自 C1 ~C8 的烷基。A compound of a bridged fluorinated alkane structure having an oxoazobenzo ring unit as described in claim 1, wherein the above-mentioned compound having a bridged oxoxane structure having an oxonitrobenzo ring unit The structure is as follows: Wherein R 2 and R 4 may be the same or different, and R 2 and R 4 may be an alkyl group selected from C 1 to C 8 , respectively. 如申請專利範圍第1項所述之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物,其中上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: 其中,而m係為整數,但至少為1。A compound of a bridged fluorinated alkane structure having an oxoazobenzo ring unit as described in claim 1, wherein the above-mentioned compound having a bridged oxoxane structure having an oxonitrobenzo ring unit The structure is as follows: Where m is an integer but at least 1. 如申請專利範圍第1項所述之具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物,其中上述具有氧代氮代苯并環單元的橋式矽氧烷結構之化合物的結構式如下: A compound of a bridged fluorinated alkane structure having an oxoazobenzo ring unit as described in claim 1, wherein the above-mentioned compound having a bridged oxoxane structure having an oxonitrobenzo ring unit The structure is as follows: 一種經過熱處理(thermally cured)具有氧代氮代苯并環結構之聚倍半矽氧烷,該經過熱處理具有氧代氮代苯并環結構之聚倍半矽氧烷的一般結構式如下: 其中,X可以是選自下列族群中之一者:一化學鍵、-O-、-CH2 -、;R1 與R3 可以相同或不同,且R1 與R3 可以是分別選自C1 ~C8 的烷基(alkyl group),或C6 ~C15 的芳香基(aryl group);而m與n係為整數,但至少為1。A polysesquioxane having an oxonitrobenzoocyclic structure which is thermally treated, and the general structural formula of the polysesquioxanes which have been subjected to heat treatment with an oxonitrobenzo ring structure is as follows: Wherein X may be one selected from the group consisting of: a chemical bond, -O-, -CH 2 -, , , , , R 1 and R 3 may be the same or different, and R 1 and R 3 may be an alkyl group selected from C 1 to C 8 , respectively, or an aryl group of C 6 to C 15 ; m and n are integers, but at least 1. 如申請專利範圍第5項所述之經過熱處理具有氧代氮代苯并環結構之聚倍半矽氧烷,其中上述經過熱處理具有氧代氮代苯并環結構之聚倍半矽氧烷的結構式如下: The polysesquioxane having an oxo-nitrobenzo-benzo ring structure, as described in claim 5, wherein the above-mentioned heat treatment has a oxo-benzophenoline-structured polysesquioxane The structure is as follows:
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