TWI491100B - - Google Patents
Info
- Publication number
- TWI491100B TWI491100B TW100139750A TW100139750A TWI491100B TW I491100 B TWI491100 B TW I491100B TW 100139750 A TW100139750 A TW 100139750A TW 100139750 A TW100139750 A TW 100139750A TW I491100 B TWI491100 B TW I491100B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010593682.3A CN102545816B (en) | 2010-12-17 | 2010-12-17 | Multi-channel radiofrequency filter for electrostatic chuck |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201228088A TW201228088A (en) | 2012-07-01 |
| TWI491100B true TWI491100B (en) | 2015-07-01 |
Family
ID=46351904
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100139750A TW201228088A (en) | 2010-12-17 | 2011-11-01 | Multi-channel radio-frequency filter for electrostatic sucking disk |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102545816B (en) |
| TW (1) | TW201228088A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104332378B (en) * | 2013-07-22 | 2016-09-07 | 中微半导体设备(上海)有限公司 | Plasma processing apparatus and temperature testing device thereof |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI286627B (en) * | 2003-03-14 | 2007-09-11 | Sharp Kk | Substrate bonding apparatus |
| US20070284344A1 (en) * | 2006-06-13 | 2007-12-13 | Todorov Valentin N | High ac current high rf power ac-rf decoupling filter for plasma reactor heated electrostatic chuck |
| US20090133839A1 (en) * | 2007-11-14 | 2009-05-28 | Tokyo Electron Limited | Plasma processing apparatus |
| CN101587813A (en) * | 2008-05-21 | 2009-11-25 | 东京毅力科创株式会社 | A loading station mechanism, a plasma processing apparatus and a pressure exertion method |
-
2010
- 2010-12-17 CN CN201010593682.3A patent/CN102545816B/en active Active
-
2011
- 2011-11-01 TW TW100139750A patent/TW201228088A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI286627B (en) * | 2003-03-14 | 2007-09-11 | Sharp Kk | Substrate bonding apparatus |
| US20070284344A1 (en) * | 2006-06-13 | 2007-12-13 | Todorov Valentin N | High ac current high rf power ac-rf decoupling filter for plasma reactor heated electrostatic chuck |
| US20090133839A1 (en) * | 2007-11-14 | 2009-05-28 | Tokyo Electron Limited | Plasma processing apparatus |
| CN101587813A (en) * | 2008-05-21 | 2009-11-25 | 东京毅力科创株式会社 | A loading station mechanism, a plasma processing apparatus and a pressure exertion method |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201228088A (en) | 2012-07-01 |
| CN102545816A (en) | 2012-07-04 |
| CN102545816B (en) | 2015-02-04 |