TWI488715B - Beating device - Google Patents

Beating device Download PDF

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Publication number
TWI488715B
TWI488715B TW099143138A TW99143138A TWI488715B TW I488715 B TWI488715 B TW I488715B TW 099143138 A TW099143138 A TW 099143138A TW 99143138 A TW99143138 A TW 99143138A TW I488715 B TWI488715 B TW I488715B
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Taiwan
Prior art keywords
dust collector
abrasive grain
processed
abrasive
storage body
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TW099143138A
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Chinese (zh)
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TW201221299A (en
Inventor
Atsushi Tsukamoto
Tsuguhito Hayashi
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Sintokogio Ltd
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Publication of TW201221299A publication Critical patent/TW201221299A/en
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Publication of TWI488715B publication Critical patent/TWI488715B/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C9/00Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/08Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C11/00Selection of abrasive materials or additives for abrasive blasts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C9/00Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
    • B24C9/003Removing abrasive powder out of the blasting machine
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C9/00Appurtenances of abrasive blasting machines or devices, e.g. working chambers, arrangements for handling used abrasive material
    • B24C9/006Treatment of used abrasive material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Description

珠擊裝置Bead strike device

本發明係關於一種珠擊裝置,將研磨粒投射於具有氧化皮膜或毛邊之金屬零件等之被研掃物,藉以從該被研掃物將氧化皮膜、毛邊等加以除去。The present invention relates to a bead blasting apparatus which projects abrasive grains onto a workpiece to be polished, such as a metal film having an oxide film or a burr, to remove an oxide film, a burr or the like from the object to be scanned.

以往,作為將附著於被研掃物(以下稱為「被處理物」)之氧化皮膜或毛邊等除去之珠擊裝置,有例如專利文獻1所揭示之裝置。該珠擊裝置係將被處理物搬入收納體,藉由研磨粒投射機投射研磨粒,進行研掃,從收納體將處理後之被處理物搬出之裝置。In the past, as a beating device that removes an oxide film or a burr or the like attached to a workpiece (hereinafter referred to as "subject"), there is, for example, a device disclosed in Patent Document 1. In the beating device, the object to be processed is carried into the storage body, and the polishing particles are projected by the polishing grain projector to perform a sweeping operation, and the processed object is carried out from the storage body.

專利文獻1:日本特公昭60-23947號公報Patent Document 1: Japanese Patent Publication No. 60-23947

然而,由於該裝置未考慮因研掃所產生之粉塵之處理,因此對發生塵爆可能性高之壓鑄產品未必充分進行安全的研掃處理。為對發生塵爆可能性高之壓鑄產品進行研掃處理,較佳係安全的珠擊裝置。However, since the apparatus does not consider the treatment of the dust generated by the sweeping, it is not necessary to perform a sufficient cleaning process for the die-casting product which is highly likely to cause dust explosion. In order to carry out a sweeping process on a die-casting product having a high possibility of dust explosion, it is preferred to be a safe bead hitting device.

本發明之目的在於提供珠擊裝置,可實現對發生塵爆可能性高之壓鑄產品進行安全的研掃處理。It is an object of the present invention to provide a bead blasting device which can realize a safe blasting process for a die-cast product having a high possibility of dust explosion.

本發明之珠擊裝置,具備:被處理物收納體,具有被處理物之搬入搬出口,以包圍該被處理物之方式進行收納;研磨粒投射機,對收納於該被處理物收納體之該被處理物投射研磨粒;研磨粒回收機構,用以回收該被處理物收納體內投射後之研磨粒,並送至研磨粒投射機;以及濕式集塵機,從該被處理物收納體透過導通配管連接,捕集因研磨粒之投射所產生之粉塵。The beating device of the present invention includes a workpiece storage body, and has a workpiece loading/unloading port, and is housed so as to surround the workpiece, and an abrasive grain projector is housed in the workpiece storage body. The object to be processed projects the abrasive grains; the abrasive grain collecting mechanism collects the abrasive grains projected in the object storage body and sends them to the abrasive grain projector; and the wet dust collector, and transmits the gas through the processed object storage body. The piping is connected to capture dust generated by the projection of the abrasive particles.

本發明可實現對發生塵爆可能性高之壓鑄產品進行安全的研掃處理。The invention can realize the safe sweeping treatment of the die-casting product with high possibility of dust explosion.

以下,參照圖式說明適用本發明之珠擊裝置1。該珠擊裝置1係將研磨粒投射於具有氧化皮膜或毛邊之金屬零件等被研掃物,進行研掃,從該被研掃物將氧化皮膜、毛邊等除去之裝置。Hereinafter, the bead hitting apparatus 1 to which the present invention is applied will be described with reference to the drawings. The beating device 1 is a device that projects abrasive grains onto a swept object such as a metal part having an oxide film or a burr, and sweeps the abrasive film, burrs, and the like from the swept object.

圖1~圖3所示之珠擊裝置1具備:被處理物收納體2、研磨粒投射機3、研磨粒回收機構4、以及濕式集塵機5。被處理物收納體2具有被處理物(未圖示)之搬入搬出口7,以包圍被處理物之方式進行收納。研磨粒投射機3,係對收納於被處理物收納體2之被處理物投射研磨粒。研磨粒回收機構4係回收被處理物收納體2內投射後之研磨粒再送到研磨粒投射機3。濕式集塵機5係從被處理物收納體2透過導通配管即配管53連接,捕集因投射研磨粒所產生之粉塵。The beating device 1 shown in FIGS. 1 to 3 includes a workpiece storage body 2, an abrasive grain projector 3, an abrasive grain collecting mechanism 4, and a wet dust collector 5. The object storage body 2 has a loading/unloading port 7 of a workpiece (not shown), and is housed so as to surround the object to be processed. The abrasive grain projector 3 projects the abrasive grains on the workpiece to be processed in the workpiece storage body 2 . The abrasive grain collecting mechanism 4 collects the abrasive grains projected in the workpiece storage body 2 and sends them to the abrasive grain projector 3. The wet dust collector 5 is connected from the workpiece storage body 2 through a pipe 53 which is a conduction pipe, and collects dust generated by the projection of the abrasive grains.

被處理物收納體2具有:筐體11,以包圍該被處理物之方式進行收納;分隔構件12,將筐體11內部分隔開為二個以上之空間;吊具構件13,分別設置於被該分隔構件12分隔開之各空間,用以懸吊被處理物並予以保持;以及驅動手段14a、14b,用以使分隔構件12及吊具構件13旋轉驅動。當分隔構件12被設定於旋轉方向之既定位置時,分隔構件12與筐體11至少將藉由研磨粒投射機3投射研磨粒之空間予以密閉。此處,所謂密閉係含有因投射在空間內所產生之粉塵不流出到空間外部程度密閉之意義。當對收納於被分隔構件12分隔開之空間內之一空間(此處指密閉空間)之被處理物,藉由研磨粒投射機3投射研磨粒時,於能對另一空間(密閉空間以外之空間)進行被處理物之搬入搬出之位置設置有上述之搬入搬出口7。The object storage body 2 includes a casing 11 that is housed so as to surround the object to be processed, and a partition member 12 that partitions the inner portion of the casing 11 into two or more spaces; the spreader members 13 are respectively disposed at The spaces partitioned by the partition member 12 are used to suspend and hold the workpiece, and the driving means 14a, 14b are used to rotationally drive the partition member 12 and the spreader member 13. When the partition member 12 is set at a predetermined position in the rotational direction, the partition member 12 and the casing 11 are sealed at least by the space in which the abrasive grain projection machine 3 projects the abrasive grains. Here, the sealed system has a meaning that the dust generated by the projection in the space does not flow out to the outside of the space. When the object to be processed which is stored in a space (here, a closed space) partitioned by the partition member 12 is projected by the abrasive grain projector 3, the other space (closed space) can be used. In addition to the space, the above-described loading/unloading port 7 is provided at a position where the workpiece is carried in and out.

具體而言,筐體11係如圖1~圖4所示,具有由正面壁部15、背面壁部16、左側壁部17、及右側壁部18所構成之壁部,並且具有用以閉塞此等壁部上部之頂板部19、以及與頂板部19相對向設置於壁部下方之底板構件20。如圖4所示,背面壁部16之左半部分16a係相對右半部分16b呈傾斜狀態。左半部分16a與右半部分16b形成之角度係大於90°小於180°。如圖2所示,於該背面壁部16之左半部分16a配置有研磨粒投射機3。Specifically, as shown in FIGS. 1 to 4, the casing 11 has a wall portion composed of a front wall portion 15, a rear wall portion 16, a left side wall portion 17, and a right side wall portion 18, and has a occlusion portion. The top plate portion 19 of the upper portion of the wall portion and the bottom plate member 20 disposed opposite the top plate portion 19 below the wall portion. As shown in Fig. 4, the left half portion 16a of the rear wall portion 16 is inclined with respect to the right half portion 16b. The angle formed by the left half 16a and the right half 16b is greater than 90° and less than 180°. As shown in FIG. 2, the abrasive grain projector 3 is disposed in the left half 16a of the back wall portion 16.

藉由以上述方式配置研磨粒投射機3可使研磨粒投射機3正對於被處理物(參照圖4),對被處理物以適當投射角度投射研磨粒(即使使右半部分16b傾斜亦相同)。又,由於在背面壁部16之右半部分16b側可獲得設置後述之箕斗式升降機32之空間,因此可謀求裝置之小型化。By arranging the abrasive grain projector 3 in the above manner, the abrasive grain projector 3 can project the abrasive grains at an appropriate projection angle with respect to the object to be processed (refer to FIG. 4) (even if the right half 16b is inclined) ). Further, since the space of the bucket elevator 32 to be described later can be obtained on the right half 16b side of the rear wall portion 16, it is possible to reduce the size of the apparatus.

如圖3所示,於右側壁部18設置有檢查用門18b。於正面壁部15設置有搬入搬出口7。另外,亦可在搬入搬出口7設置可密閉筐體11內之開關門來構成。然而,在此處所說明之研掃站S1與作業站S2所構成之2站方式中,亦可如後述,僅研掃站S1側密閉,作業站S2側隨時向外部氣體側開放。換言之,由於分隔構件12係如後所述將研掃站S1密閉,因此可設置與作業站S2同等大小之開口,以便對搬入搬出口7,容易進行處理物之裝卸。As shown in FIG. 3, the inspection door 18b is provided in the right side wall part 18. A loading/unloading port 7 is provided in the front wall portion 15. Further, the loading/unloading port 7 may be provided with a switch door that can be sealed in the casing 11. However, in the two-station system in which the scanning station S1 and the work station S2 are described here, as described later, only the scanning station S1 side may be sealed, and the working station S2 side may be opened to the outside air side at any time. In other words, since the partition member 12 seals the grinding station S1 as will be described later, an opening having the same size as the working station S2 can be provided, so that the loading and unloading port 7 can be easily attached and detached.

間隔構件12係如圖4所示,在裝置之俯視剖面中,複數個(圖4中為2個)之板狀構件配置於與俯視剖面大致正交之方向構成。各板狀構件相對於中央部分(以下稱為「第1部分12a」),兩側部分(以下分別稱為「第2部分12b」及「第3部分12c」)在彼此接近之方向折彎呈V字形。又,由複數個板狀構件構成之分隔構件12在第1部分12a作成為一體,使得相對於主轉軸(未圖示)形成對稱。又,於分隔構件12設置有補強構件12f,用來保持以上述方式形成之第2部分12b及第3部分12c不變形程度之既定強度。As shown in FIG. 4, the spacer member 12 is formed in a plurality of (two in FIG. 4) plate-like members in a plan cross section of the apparatus, and is disposed in a direction substantially perpendicular to a plan view. Each of the plate-like members is bent toward the center portion (hereinafter referred to as "the first portion 12a"), and the both side portions (hereinafter referred to as "the second portion 12b" and the "third portion 12c", respectively) are bent in the direction in which they approach each other. V shape. Further, the partition member 12 composed of a plurality of plate-like members is integrally formed in the first portion 12a so as to be symmetrical with respect to the main rotating shaft (not shown). Further, the partition member 12 is provided with a reinforcing member 12f for maintaining the predetermined strength of the second portion 12b and the third portion 12c formed in the above-described manner without deformation.

如圖4及圖5所示,於分隔構件12之兩端部分即第2部分12b及第3部分12c之垂直方向側緣部安裝有向外側與筐體11滑接之板狀橡膠構件12d。在筐體11側,於旋轉方向之既定位置,與該橡膠構件12d抵接,使筐體11之內壁面與分隔構件12之間隙密閉之抵接部17a、18a係設置成為從左側壁部17及右側壁部18之內面延伸。As shown in FIG. 4 and FIG. 5, a plate-shaped rubber member 12d which is slidably attached to the casing 11 to the outside is attached to the both side portions of the partition member 12, that is, the second portion 12b and the third portion 12c. On the side of the casing 11, the abutting portions 17a and 18a which are in contact with the rubber member 12d at a predetermined position in the rotational direction, and which seal the gap between the inner wall surface of the casing 11 and the partition member 12 are provided from the left side wall portion 17 And the inner surface of the right side wall portion 18 extends.

頂板部19亦可構成為與分隔構件12同時旋轉。此處,針對頂板部19構成為不旋轉之例加以說明。在分隔構件12之上端緣部設置有橡膠構件12e,該橡膠構件12e係與頂板部19滑接,藉此使分隔構件12與頂板部19之間隙密閉。The top plate portion 19 may also be configured to rotate simultaneously with the partition member 12. Here, an example in which the top plate portion 19 is configured not to rotate will be described. A rubber member 12e is provided on the upper edge portion of the partition member 12, and the rubber member 12e is slidably coupled to the top plate portion 19, whereby the gap between the partition member 12 and the top plate portion 19 is sealed.

又,分隔構件12與底板構件20係構成為一起旋轉,因此,亦可構成為一體,但此處,分隔構件12之下部側亦設置有未圖示之橡膠構件,藉由該橡膠構件,使下方側亦密閉。Further, since the partition member 12 and the bottom plate member 20 are configured to rotate together, they may be integrally formed. However, a rubber member (not shown) is also provided on the lower side of the partition member 12, and the rubber member is used for the rubber member. The lower side is also closed.

當分隔構件12位於橡膠構件12d抵接於抵接部17a、18a之旋轉方向之既定位置時,將藉由研磨粒投射機可投射研磨粒之空間密閉。以下,位於圖4等所示之該密閉側空間之位置S1稱為「研掃站」,位於相反側之搬入搬出口7側空間之位置S2稱為「作業站」。此處,已說明了分隔構件12將筐體11內部分隔開為成為研掃站S1之空間、及成為作業站S2之空間之2個空間之例,但亦可構成為將筐體11內部分隔開為3個以上之空間。又,圖4中之Rk係表示研掃範圍,D1係表示研磨粒投射機之研磨粒投射方向。When the partition member 12 is located at a predetermined position in which the rubber member 12d abuts in the rotational direction of the abutting portions 17a, 18a, the space in which the abrasive grains can be projected by the abrasive grain projector is sealed. Hereinafter, the position S1 located in the sealed side space shown in FIG. 4 and the like is referred to as a “study station”, and the position S2 located on the side of the loading/unloading port 7 on the opposite side is referred to as a “work station”. Here, the partition member 12 has been described as an example in which the inner portion of the casing 11 is partitioned into a space which becomes the space for the inspection station S1 and two spaces which become the space of the work station S2. However, the casing 11 may be configured to be inside the casing 11. Partially separated by more than 3 spaces. Further, Rk in Fig. 4 indicates the sweeping range, and D1 indicates the direction in which the abrasive grains of the abrasive grain projector are projected.

吊具構件13係如圖4所示,設置成為分別位於被上述之分隔構件12分隔開之2個空間。吊具構件13係由從底板構件20豎立形成之柱構件13a及從該柱構件往水平方向或斜上方延伸形成之吊掛構件13b等構成。吊具構件13係用來安裝被處理物之治具,亦可係可安裝及保持被處理物之構造。As shown in FIG. 4, the spreader members 13 are provided in two spaces which are respectively separated by the above-described partition member 12. The spreader member 13 is composed of a column member 13a which is formed upright from the bottom plate member 20, and a hanging member 13b which is formed to extend horizontally or obliquely upward from the column member. The spreader member 13 is a jig for mounting a workpiece, and may be configured to hold and hold the object to be treated.

另外,此處,針對作為構成珠擊裝置1之被處理物收納體2設置吊具構件13之方式加以說明,但亦可作成不設置吊具構件13之構成。當不設置吊具構件時,亦可構成為設置裝載被處理物之台構件。台構件亦可係上述之底板構件20,亦可作成另外追加底板構件20之構成。Here, the manner in which the spreader member 13 is provided as the object storage body 2 constituting the bead hitting device 1 will be described, but the spreader member 13 may not be provided. When the spreader member is not provided, it may be configured to provide a table member on which the workpiece is loaded. The table member may be the above-described bottom plate member 20, or may be formed by additionally adding the bottom plate member 20.

驅動手段14係由用以旋轉驅動分隔構件12之驅動手段14a、以及用以旋轉驅動吊具構件13之驅動手段14b構成。驅動手段14a係如圖1所示,具有:設置於基台21之附帶減速機之馬達23、連結被處理物收納體2之主旋轉軸(未圖示)及附帶減速機之馬達23之正時皮帶(timing belt)(未圖示)、以及主旋轉軸貫通之軸承22。亦可使用滾子鏈(roller chain)來取代正時皮帶。驅動手段14a係藉由馬達23,透過正時皮帶及主旋轉軸,使被處理物收納體2之底板構件20及分隔構件12進行旋轉驅動。The driving means 14 is constituted by a driving means 14a for rotationally driving the partition member 12, and a driving means 14b for rotationally driving the spreader member 13. As shown in FIG. 1, the driving means 14a includes a motor 23 provided with a speed reducer provided on the base 21, a main rotating shaft (not shown) that connects the workpiece storage unit 2, and a motor 23 with a speed reducer. A timing belt (not shown) and a bearing 22 through which the main rotating shaft passes. A roller chain can also be used instead of a timing belt. The driving means 14a rotates the bottom plate member 20 and the partition member 12 of the workpiece storage body 2 by the motor 23 through the timing belt and the main rotating shaft.

另一方面,驅動手段14b具有:連接於吊具構件13之旋轉軸(未圖示)、設置於基台21之附帶減速機之馬達(未圖示)、以及連結旋轉軸及附帶減速機之馬達之滾子鏈(未圖示)。驅動手段14b係藉由該馬達,透過滾子鏈及旋轉軸 使吊具構件13從分隔構件12獨立旋轉。On the other hand, the driving means 14b includes a rotating shaft (not shown) connected to the spreader member 13, a motor (not shown) provided with a speed reducer provided on the base 21, and a rotating shaft and a speed reducer. Motor roller chain (not shown). 14b by means of the drive train of the motor, the roller chain transmission rotating shaft and the spreader member 1312 to rotate independently from the partition member.

因此,在以分隔構件12將研掃站密閉之狀態下,可一邊使安裝於吊具構件13之被處理物旋轉一邊用研磨粒投射機3投射研磨粒,進行均勻之研掃處理。Therefore, in a state where the polishing station is sealed by the partition member 12, the abrasive grains can be projected by the abrasive grain projector 3 while rotating the workpiece attached to the spreader member 13, and a uniform polishing process can be performed.

本發明之被處理物收納體2,在研掃站S1中,從研磨粒投射機3對被處理物投射研磨粒,在作業站S2中,從隨時開放之搬入搬出口7進行研掃完成後之被處理物之取出及接著研掃之被處理物之安裝。亦即,由研掃站S1與作業站S2構成之2站方式,係與研掃站S1之研掃處理並行,可在作業站S2進行被處理物之裝卸。In the object storage unit 2 of the present invention, in the polishing station S1, the abrasive grains are projected from the polishing grain projector 3 to the workpiece, and after the grinding is completed in the work station S2 from the loading/unloading port 7 which is open at any time. The object to be processed is taken out and then the object to be processed is scanned. In other words, the two-station method consisting of the grinding station S1 and the work station S2 is in parallel with the grinding process of the grinding station S1, and the workpiece can be loaded and unloaded at the working station S2.

相對於此,1站方式之珠擊裝置,必須要有下列之反覆動作,即把門打開,取出研掃完成後之被處理物,接著,安裝被處理物,進一步將門密閉後,再進行研掃。因此,本發明之2站方式相較於1站方式,可縮短週期時間,並且可減低作業者之勞力。On the other hand, the one-station bead hitting device must have the following repeated actions, that is, the door is opened, the processed object after the completion of the sweeping is taken out, and then the processed object is attached, and the door is further sealed, and then the grinding is performed. . Therefore, the two-station method of the present invention can shorten the cycle time and reduce the labor of the operator as compared with the one-station mode.

又,在該珠擊裝置1中,用以控制使分隔構件12旋轉驅動之驅動手段14a之控制部25係設置於控制盤26內,該控制部25係藉由計時器管理來控制分隔構件12之旋轉動作。Further, in the beating device 1, a control unit 25 for controlling a driving means 14a for rotationally driving the partition member 12 is provided in the control panel 26, and the control portion 25 controls the partition member 12 by timer management. The rotation action.

詳細係,藉由研磨粒投射機3投射研磨粒結束後,必須要有為以濕式集塵機5捕集殘留於研掃站S1內之粉塵之時間。因此,當投射完成後,若馬上使分隔構件12旋轉,粉塵就會漏出到作業站S2側。In detail, after the abrasive grain projection machine 3 projects the abrasive grains, it is necessary to collect the dust remaining in the polishing station S1 by the wet dust collector 5. Therefore, when the partition member 12 is rotated immediately after the completion of the projection, the dust leaks to the side of the work station S2.

因此,例如,(1)從研磨粒投射機3及濕式集塵機5之能力(包含集塵風量及研掃站S1之密閉空間之體積),藉由模擬,投射結束後,算出藉由濕式集塵機5可充分進行捕集之時間,(2)以模擬時間為基準,在試運轉調整時,決定實際之待機時間,(3)將該實際待機時間輸入控制部25內之記憶部,藉此可實現大幅減少粉塵往作業站S2漏出。另外,亦可變換該待機時間之設定或增加設定,於研掃站S1內設置感測器,依據來自該感測器之輸出,控制部25用以控制分隔構件12之旋轉動作。Therefore, for example, (1) the ability from the abrasive grain projector 3 and the wet dust collector 5 (including the dust collecting air volume and the volume of the sealed space of the scanning station S1), by simulation, after the projection is completed, the calculation is performed by the wet type. The dust collector 5 can sufficiently capture the time, (2) based on the simulation time, determine the actual standby time during the trial operation adjustment, and (3) input the actual standby time into the memory unit in the control unit 25, thereby It can achieve a significant reduction in dust leakage to the station S2. In addition, the standby time setting or the increase setting may be changed, and a sensor is provided in the polishing station S1. The control unit 25 controls the rotation of the partition member 12 in accordance with the output from the sensor.

如以上之方式,以計時器管理控制分隔構件12之旋轉動作,藉此可減低粉塵從研掃站S1往作業站S2漏出。As described above, the rotation operation of the partition member 12 is controlled by the timer, whereby the dust can be prevented from leaking from the polishing station S1 to the work station S2.

又,手動之1站方式裝置之情形,當在研掃作業中因失誤而開啟開關門時,會發生粉塵漏出之問題。以計時器管理控制分隔構件12之旋轉動作,藉此亦可解決此問題。Moreover, in the case of the manual one-station type device, when the opening and closing door is opened due to a mistake in the grinding operation, dust leakage occurs. The rotation of the partition member 12 is controlled by a timer, whereby this problem can also be solved.

研磨粒投射機3係如圖6所示,具有葉輪27、分配器28、及控制計(control gauge)29。固定部即控制計29係鈹銅製,即使與旋轉部之葉輪27及分配器28接觸也不產生火花之構成。具備控制計29之珠擊裝置1可防止習知之研磨粒投射機3中因金屬彼此碰撞而產生火花。As shown in FIG. 6, the abrasive grain projector 3 includes an impeller 27, a distributor 28, and a control gauge 29. The control unit 29, which is a fixed portion, is made of beryllium copper, and does not generate a spark even if it is in contact with the impeller 27 and the distributor 28 of the rotating portion. The bead hitting device 1 provided with the control unit 29 can prevent the conventional abrasive grain projector 3 from generating a spark due to collision of metals with each other.

研磨粒回收機構4係如圖3所示,具有進給輸送機31、箕斗式升降機32、及風選式分離器33。從作業者觀察,進給輸送機31係從正面側向背面側設置於珠擊裝置1之底部。箕斗式升降機32係沿珠擊裝置1之背面壁部16設置,從進給輸送機31之搬出口豎立形成。風選式分離器33係安裝於位於珠擊裝置1之上部之箕斗式升降機32之搬出口,藉由風力將因研掃從壓鑄產品或研磨粒所產生之粉塵、破碎之研磨粒、氧化皮膜、毛邊等異物、及研磨粒予以分離,將分離後之研磨粒藉由誘導管(未圖示)誘導至研磨粒投射機3。As shown in FIG. 3, the abrasive grain recovery mechanism 4 includes a feed conveyor 31, a bucket elevator 32, and an air separation separator 33. The feeder conveyor 31 is provided at the bottom of the beating device 1 from the front side to the back side as viewed by the operator. The bucket elevator 32 is provided along the rear wall portion 16 of the beating device 1, and is formed upright from the outlet of the feed conveyor 31. The air separation separator 33 is attached to the outlet of the bucket elevator 32 located above the bead blasting device 1, and the dust generated by the grinding of the die-cast product or the abrasive grains, the broken abrasive grains, and the oxidation are oxidized by the wind. The foreign matter such as a film or a burr, and the abrasive grains are separated, and the separated abrasive grains are induced to the abrasive grain projector 3 by an induction tube (not shown).

此處,箕斗式升降機32係如圖7所示,具有導電性尼龍製箕斗34、以及用以驅動該箕斗34之皮帶35。由於研磨粒回收機構4使用導電性尼龍製箕斗34,因此可減緩皮帶35摩擦,作成即使箕斗34與鐵製之套管36接觸也不會產生火花之構造。藉此,可防止因研掃而從壓鑄產品或研磨粒所產生之粉塵所引起之塵爆。Here, as shown in FIG. 7, the bucket elevator 32 has a conductive nylon bucket 34 and a belt 35 for driving the bucket 34. Since the abrasive grain collecting mechanism 4 uses the conductive nylon-made bucket 34, the friction of the belt 35 can be reduced, and a structure in which the spark is not generated even if the bucket 34 comes into contact with the sleeve 36 made of iron is formed. Thereby, it is possible to prevent dust explosion caused by dust generated from the die-cast product or the abrasive grains by the sweeping.

濕式集塵機5係如圖8所示,在出口噴嘴41設置有送風機42,並且具有:切水板(排除器)43、及S字形葉輪部44。包含藉由送風機42流入濕式集塵機5之粉塵,通過S字形葉輪部44之水膜44a,藉由洗淨作用與離心力予以集塵。As shown in FIG. 8, the wet dust collector 5 is provided with a blower 42 in the outlet nozzle 41, and has a water-cutting plate (excluding device) 43 and an S-shaped impeller portion 44. The dust that has flowed into the wet dust collector 5 by the blower 42 is collected by the water film 44a of the S-shaped impeller portion 44 by the washing action and the centrifugal force.

S字形葉輪部44,空氣所含之粉塵藉由與水激烈混合時之碰撞及離心力,發揮作為高效率集塵部之功能。被S字形葉輪部44捕集之粉塵形成泥漿而沉澱於集塵機本體45之下部之水槽。另一方面,被S字形葉輪部44洗淨之空氣,用切水板進行切水,從出口噴嘴41排出。The S-shaped impeller portion 44 functions as a high-efficiency dust collecting portion by collision and centrifugal force when the dust contained in the air is intensely mixed with water. The dust collected by the S-shaped impeller portion 44 forms a slurry and is deposited on the water tank below the dust collector body 45. On the other hand, the air washed by the S-shaped impeller portion 44 is cut by the water cutting plate and discharged from the outlet nozzle 41.

另外,圖8中,在設置於集塵機本體45之中心部分附近之噴嘴45a、45b設置有檢查蓋45c、45d。又,箭頭係表示空氣之流動方向。In addition, in FIG. 8, the inspection caps 45c and 45d are provided in the nozzles 45a and 45b provided in the vicinity of the center part of the dust collector main-body 45. Also, the arrow indicates the direction in which the air flows.

構成濕式集塵機5之送風機42之風扇葉輪(葉片部分)係鋁製。具有鋁製之風扇葉輪之珠擊裝置1可防止因金屬彼此之碰撞所產生之火花。藉此,可防止因研掃而從壓鑄產品或研磨粒產生之粉塵所引起之塵爆及防止粉塵與水之反應所產產生之氫氣之氣爆。The fan impeller (blade portion) constituting the blower 42 of the wet dust collector 5 is made of aluminum. A beating device 1 having an aluminum fan impeller prevents sparks generated by collision of metals with each other. Thereby, it is possible to prevent the dust explosion caused by the dust generated from the die-cast product or the abrasive grains by the grinding and the gas explosion generated by the reaction of the dust and the water.

又,濕式集塵機5係如圖8及圖9所示,具有設置於集塵機本體45上部之排氣閥46。該排氣閥46具有將閥體48向濕式集塵機5之外側(將排氣閥46設定在排放狀態之側)彈壓之彈簧構件47,在送風機42之運轉中,藉由其負壓抗拒彈簧構件47之彈力而將閥體48關閉,在送風機42之停止中,將閥體48打開。藉此,當送風機42停止時,氫氣產生時,排氣閥46亦確實將氫氣排出機外,可防止氫氣充滿於濕式集塵機5內。另外,彈簧構件47係安裝於交給集塵機本體45之上部之噴嘴部分46a內部之安裝構件46b,使閥體48向濕式集塵機5之外側彈壓。Further, as shown in FIGS. 8 and 9, the wet dust collector 5 has an exhaust valve 46 provided on the upper portion of the dust collector main body 45. The exhaust valve 46 has a spring member 47 that biases the valve body 48 toward the outer side of the wet dust collector 5 (the side where the exhaust valve 46 is set to the discharge state). In the operation of the blower 42, the negative pressure resists the spring. The valve body 48 is closed by the elastic force of the member 47, and the valve body 48 is opened during the stop of the blower 42. Thereby, when the blower 42 is stopped, when the hydrogen gas is generated, the exhaust valve 46 also discharges the hydrogen gas outside the machine, and the hydrogen gas is prevented from being filled in the wet dust collector 5. Further, the spring member 47 is attached to the attachment member 46b which is disposed inside the nozzle portion 46a of the upper portion of the dust collector body 45, and the valve body 48 is biased toward the outside of the wet dust collector 5.

具有排氣閥46之珠擊裝置1可安全研掃處理在研掃處理時發生塵爆可能性高,且因粉塵與水之反應而產生氫氣之壓鑄產品,例如鎂合金及鋁合金製之壓鑄產品。又,珠擊裝置1之濕式集塵機5係配置於屋外,可防止從排氣閥46排出之氫氣充滿於屋內。The beating device 1 having the exhaust valve 46 can safely sweep the die-casting product which is highly likely to cause dust explosion during the sweeping process and generate hydrogen due to the reaction of dust and water, for example, die casting of magnesium alloy and aluminum alloy. product. Further, the wet dust collector 5 of the beating device 1 is disposed outside the house, and the hydrogen gas discharged from the exhaust valve 46 can be prevented from being filled in the house.

又,濕式集塵機5具有破裂板49,設置於集塵機本體45之上部,當集塵機本體45內之壓力達到一定以上時開始動作,作為開放之爆炸逸散機構。破裂板49係例如SUS製,萬一爆炸時,該板破裂破裂,藉此可將爆炸氣浪(blast)逸散,防止濕式集塵機5受到破壞。破裂板49之強度係設定在裝置本體之設計耐壓強度之1/4以下。Further, the wet dust collector 5 has a rupture plate 49 which is provided on the upper portion of the dust collector body 45, and starts to operate when the pressure in the dust collector body 45 reaches a certain level or more, and serves as an open explosion dissipating mechanism. The rupture plate 49 is made of, for example, SUS. In the event of an explosion, the plate ruptures and ruptures, whereby the blast can be dissipated and the wet dust collector 5 is prevented from being damaged. The strength of the rupture plate 49 is set to be less than or equal to 1/4 of the design compressive strength of the apparatus body.

具有排氣閥46及破裂板49之珠擊裝置1可安全研掃處理在研掃處理時發生塵爆可能性高,且因粉塵與水之反應而產生氫氣之壓鑄產品,例如鎂合金及鋁合金製之壓鑄產品。The beating device 1 having the exhaust valve 46 and the rupture plate 49 can safely sweep and process a die-casting product which is highly likely to generate dust during the grinding process, and which generates hydrogen due to the reaction of dust and water, such as magnesium alloy and aluminum. Die-cast products made of alloy.

另外,爆炸逸散機構並非限於破裂板49,亦可具有,例如附加既定之鉛錘或藉由其本身重量平常時設定關閉之門構件、以及以自由轉動地保持該門構件之鉸鏈構件,當爆炸時,門構件因爆炸氣浪而進行開動作之所謂鉸鏈門式逸散機構亦可。又,爆炸逸散機構具有:例如面板構件、以及平常時嵌入保持該面板構件之嵌合噴嘴部,當產生爆炸氣浪時,面板構件之嵌入藉由爆炸氣浪而予以解除,該噴嘴部分進行開動作之所謂脫離面板式逸散機構亦可。又,該破裂板49等之爆炸逸散機構並非限於設於集塵機本體45之上部,亦可設置於例如側面部。亦即,設置於側面部之噴嘴之配管中或連接於該噴嘴且朝上方之配管中,由此朝上方逸散爆炸氣浪。In addition, the explosion dissipating mechanism is not limited to the rupture plate 49, and may have, for example, a predetermined lead hammer or a door member that is normally closed by its own weight, and a hinge member that rotatably holds the door member. In the case of an explosion, a so-called hinged door type dissipating mechanism that opens a door member due to an explosion of air waves may also be used. Further, the explosion dissipating mechanism has, for example, a panel member and a fitting nozzle portion that is normally inserted and held to hold the panel member, and when an explosive gas wave is generated, the embedding of the panel member is released by an explosive gas wave, and the nozzle portion is performed. The so-called escape panel escape mechanism of the opening action is also possible. Further, the explosion-dissipating mechanism of the rupture plate 49 or the like is not limited to being provided on the upper portion of the dust collector body 45, and may be provided, for example, on the side surface portion. That is, it is provided in the piping of the nozzle of the side surface or in the piping which is connected to the nozzle and upward, thereby dissipating the explosion air wave upward.

於該濕式集塵機5之入口噴嘴50之內部,如圖8所示,設置有逆流防止閥即爆炸氣浪緩衝減振器51。爆炸氣浪緩衝減振器51具有平常設定開啟,當發生爆炸氣浪等之逆流時設定關閉之減振器構件52。爆炸氣浪緩衝減振器51,萬一爆炸時,減振器構件52進行封閉,可防止爆炸氣浪從濕式集塵機5流入被處理物收納體2側。Inside the inlet nozzle 50 of the wet dust collector 5, as shown in Fig. 8, an explosion-proof wave buffer damper 51, which is a backflow prevention valve, is provided. The explosion air surge damper 51 has a damper member 52 that is normally set to open and is closed when an explosion of a blast or the like occurs. In the case of an explosion, the damper member 52 is closed, and the damper member 52 is closed to prevent the blast from flowing into the object storage body 2 side from the wet dust collector 5.

由於具有逆流防止閥即爆炸氣浪緩衝減振器51之珠擊裝置1可防止被處理物收納體2側受到爆炸氣浪之破壞,因此可安全研掃處理在研掃處理時發生塵爆可能性高,且因該粉塵與水反應而產生氫氣之壓鑄產品,例如鎂合金及鋁合金製之壓鑄產品。Since the beating device 1 having the backflow prevention valve, that is, the explosion air wave damper 51, can prevent the object storage body 2 side from being damaged by the explosion air wave, it is possible to safely sweep the dust and explode during the grinding process. High-strength, and die-casting products that generate hydrogen due to the reaction of the dust with water, such as die-cast products made of magnesium alloy and aluminum alloy.

另外,爆炸氣浪緩衝減振器51之設置場所並非限定於濕式集塵機5之入口噴嘴50之內部。例如,若設置於濕式集塵機5與被處理物收納體2之間,則可保護被處理物收納體2。若設置於濕式集塵機5與後述之沉澱室(settling chamber)55之間,則亦可保護沉澱室55。Further, the installation place of the explosion air wave damper 51 is not limited to the inside of the inlet nozzle 50 of the wet dust collector 5. For example, when it is provided between the wet dust collector 5 and the workpiece storage body 2, the object storage body 2 can be protected. The sedimentation chamber 55 can also be protected by being disposed between the wet dust collector 5 and a settling chamber 55 to be described later.

珠擊裝置1具備:排氣閥46、破裂板49、爆炸氣浪緩衝減振器51,藉此將研磨粒投射於鎂合金或鋁合金壓鑄即被處理物,進行該被處理物之表面處理特別有效。鎂合金壓鑄之情形,從研磨粒投射機3投射之研磨粒係鋅系投射材,鋁合金壓鑄之情形,從研磨粒投射機3投射之研磨粒係鋁系投射材。The beating device 1 includes an exhaust valve 46, a rupture plate 49, and an explosion-wave cushion damper 51, whereby the abrasive grains are projected onto a magnesium alloy or an aluminum alloy die-cast, that is, a workpiece, and the surface of the object to be processed is processed. Particularly effective. In the case of magnesium alloy die casting, the abrasive grain-based zinc-based projection material projected from the abrasive grain projector 3, and the aluminum-grained aluminum alloy projection material projected from the abrasive particle projector 3 in the case of aluminum alloy die casting.

如圖3所示,從被處理物收納體2到濕式集塵機5之配管53之途中設置有沉澱室55。另外,圖3所示之箭頭係表示含有粉塵之空氣之流動方向。As shown in FIG. 3, the sedimentation chamber 55 is provided in the middle of the pipings 53 of the wet dust collector 5 from the workpiece storage body 2. In addition, the arrow shown in FIG. 3 shows the flow direction of the air containing dust.

在沉澱室55之上部,靠近被處理物收納體2側及靠近濕式集塵機5側分別設置有入口55a、及出口55b。又,在沉澱室55之內部設置有從頂板55c向下方延伸出之障壁構件56。障壁構件56係使包含從入口55a流下之粉塵之空氣流動迂迴於下方側,導引至出口側,藉此具有拖延滯留時間之功能。又,障壁構件56設置於較入口55a及出口55b之中間為接近入口55a之位置。藉此,朝向出口55b之上升流動之流速較來自入口55a之下降流動之流速為慢。其結果,從包含流入濕式集塵機5之粉塵之空氣,重量大於粉塵之毛邊等被分離而落下,從下側之排出口55d予以排出。In the upper portion of the sedimentation chamber 55, an inlet 55a and an outlet 55b are provided near the object storage body 2 side and near the wet dust collector 5 side. Further, a barrier member 56 extending downward from the top plate 55c is provided inside the sedimentation chamber 55. The barrier member 56 has a function of delaying the residence time by causing the air containing the dust flowing down from the inlet 55a to flow back to the lower side and to the outlet side. Further, the barrier member 56 is disposed at a position closer to the inlet 55a than between the inlet 55a and the outlet 55b. Thereby, the flow rate of the upward flow toward the outlet 55b is slower than the flow rate of the downward flow from the inlet 55a. As a result, the air containing the dust flowing into the wet dust collector 5 is separated by the burr having a weight larger than that of the dust, and is discharged from the lower discharge port 55d.

又,在珠擊裝置1中,不僅馬達全部使用安全增防爆型,二次側配線亦使用安全增防爆配線。又,在珠擊裝置1中,限制開關,接近感測器等係經由障層繼電器(barrier relay)構成,作成本質性的安全防爆構造。此處,所謂本質性的安全防爆構造係含有下列之意義,即不可因正常時及事故時所產生之火花或高溫部而點燃爆炸性氣體,在公定機關經點火測試及其他確認過之構造。另外,在珠擊裝置1中,控制盤26亦可構成為以空氣加壓控制盤內(空氣淨化)作為防塵構造,並且由於從裝置本體(研掃站等)分開配置,因此可實現安全之研掃處理。Further, in the bead hitting device 1, not only the motor is used in a safe explosion-proof type, but also the secondary side wiring is also safely expanded. Further, in the beating device 1, the limit switch, the proximity sensor, and the like are configured via a barrier relay, and are used as a cost-effective safety explosion-proof structure. Here, the essential safety explosion-proof structure has the following meanings, that is, it is not possible to ignite an explosive gas due to a spark or a high temperature portion generated at normal time and in an accident, and is subjected to an ignition test and other confirmed structures in a public authority. Further, in the bead hitting apparatus 1, the control panel 26 may be configured to be in a dustproof structure by air pressure control panel (air purification), and since it is separately disposed from the apparatus body (study station, etc.), safety can be realized. Sweep processing.

參照圖2~圖4及圖8說明使用以上所述之珠擊裝置1之珠擊方法。首先,在作業站S2中,將被處理物安裝於吊具構件13。接著,使分隔構件12及吊具構件13在主旋轉軸周圍旋轉,藉此將安裝後被處理物位於研掃站S1側,並且將研掃站S1側之空間加以密閉。接著,在研掃站S1中,藉由研磨粒投射機3將研磨粒投射於被處理物,進行研掃。此時,在作業站S2中,並行進行被處理物之裝卸。投射停止後,使分隔構件12待機既定時間(換氣時間)。經過既定時間後,使分隔構件12及吊具構件13在主旋轉軸周圍旋轉,將研掃處理後之被處理物送至作業站S2。藉由研磨粒回收機構4將投射後之研磨粒送至研磨粒投射機3,透過配管53將含有摻雜於該研磨粒之粉塵輸送至溼式集塵機5。溼式集塵機5中,藉由水膜44a捕集空氣中之粉塵,將所捕集之粉塵形成泥漿狀予以沉澱,藉由送風機42將集塵後之空氣從出口噴嘴41排出。The beading method using the above-described bead hitting device 1 will be described with reference to Figs. 2 to 4 and Fig. 8 . First, in the work station S2, the workpiece is attached to the spreader member 13. Next, the partition member 12 and the spreader member 13 are rotated around the main rotating shaft, whereby the object to be processed after installation is placed on the side of the polishing station S1, and the space on the side of the grinding station S1 is sealed. Next, in the polishing station S1, the abrasive grains are projected onto the object to be processed by the abrasive grain projector 3, and the polishing is performed. At this time, in the work station S2, the workpiece is loaded and unloaded in parallel. After the projection is stopped, the partition member 12 is allowed to stand by for a predetermined time (ventilation time). After a predetermined period of time, the partition member 12 and the spreader member 13 are rotated around the main rotating shaft, and the workpiece after the sweep processing is sent to the work station S2. The projected abrasive grains are sent to the abrasive particle projector 3 by the abrasive grain collecting mechanism 4, and the dust containing the abrasive grains is transferred to the wet dust collector 5 through the pipe 53. In the wet dust collector 5, the dust in the air is collected by the water film 44a, and the collected dust is formed into a slurry to be precipitated, and the dust-collected air is discharged from the outlet nozzle 41 by the blower 42.

另外,藉由溼式集塵機5之集塵亦可僅在研掃及換氣時間中進行,亦可在珠擊裝置1之運轉中連續進行。Further, the dust collection by the wet dust collector 5 may be performed only during the sweeping and ventilating time, or continuously during the operation of the beating device 1.

適用本發明之珠擊裝置1之構成具備:如上所述之被處理物收納體2、研磨粒投射機3、研磨粒回收機構4、以及溼式集塵機5,藉此對發生塵爆可能性高之壓鑄產品可實現安全進行研掃處理。The bead device 1 to which the present invention is applied includes the object storage body 2, the abrasive grain projector 3, the abrasive grain collecting mechanism 4, and the wet dust collector 5 as described above, whereby the possibility of dust explosion is high. The die-casting product can be safely processed for sweeping.

又,珠擊裝置1,溼式集塵機5具備:排氣閥46、作為逸散機構之破裂板49、作為逆流防止閥之爆炸氣浪緩衝減振器51,藉此對發生塵爆可能性高,且因粉塵與水之反應而產生氫氣之壓鑄產品,例如鎂合金及鋁合金製之壓鑄產品,可實現安全進行研掃處理。Further, the beating device 1 and the wet dust collector 5 are provided with an exhaust valve 46, a rupture plate 49 as an escape mechanism, and an explosion wave damper 51 as a backflow prevention valve, whereby the possibility of occurrence of dust explosion is high. And die-casting products that generate hydrogen due to the reaction of dust and water, such as magnesium alloy and die-casting products made of aluminum alloy, can be safely scanned.

又,珠擊裝置1之被處理物收納體2具有:筐體11、分隔構件12、吊具構件13、以及驅動手段14,當把分隔構件12設定於旋轉方向之既定位置時,由於係形成有被分隔構件12與筐體11包圍之至少1個密閉空間之所謂複數個站方式(上述中為2站方式),因此以一站研掃處理中,另一站可進行被處理物之裝卸,因此可縮短週期時間。又,當相較於1站方式相同之週期時間時,由於設置2個以上之站,因此在進行研掃處理之站中,可設定充分之集塵時間,其結果,可提高粉塵除去率。亦即,珠擊裝置1相較於1站研掃裝置可提高生產能力,進行細緻之表面加工。又,由於珠擊裝置1係作成藉由控制部管理分隔構件12之旋轉之構成,因此可減低粉塵從研掃站往作業站漏出。Moreover, the object storage body 2 of the beating device 1 includes the casing 11, the partition member 12, the spreader member 13, and the driving means 14, and when the partition member 12 is set at a predetermined position in the rotational direction, the formation is formed. There is a so-called plural station method (in the above-described two-station method) in which at least one sealed space surrounded by the partition member 12 and the casing 11 is provided. Therefore, in one station, the other station can perform loading and unloading of the workpiece. Therefore, the cycle time can be shortened. Further, when the cycle time is the same as that of the one-station method, since two or more stations are provided, a sufficient dust collection time can be set in the station where the sweep processing is performed, and as a result, the dust removal rate can be improved. That is, the bead hitting device 1 can increase the productivity and perform detailed surface processing as compared with the one-station grinding device. Further, since the bead hitting device 1 is configured to control the rotation of the partition member 12 by the control unit, it is possible to reduce the leakage of dust from the polishing station to the work station.

又,珠擊裝置1中,為防止因鐵彼此之摩擦或摩擦而發熱,適當選定非鐵材料。由於在例如控制計29、箕斗式升降機32之箕斗34、送風機42之風扇葉輪使用防止產生火花用之材料,因此不損作為裝置之功能,可進行安全的研掃處理。又,由於藉由濕式集塵機5可將萬一爆炸之受害抑制在最小,因此可改善作業者之作業環境,並且可安全進行研掃處理。Further, in the bead hitting device 1, in order to prevent heat generation due to friction or friction between the irons, a non-ferrous material is appropriately selected. Since the material for preventing spark generation is used for the fan impeller of the control unit 29, the bucket 34 of the bucket elevator 32, and the blower 42, for example, the function of the apparatus is not impaired, and the safe sweeping process can be performed. Further, since the wet dust collector 5 can minimize the damage of the explosion, the working environment of the operator can be improved, and the grinding process can be performed safely.

1‧‧‧珠擊裝置1‧‧‧Bearing device

2‧‧‧被處理物收納體2‧‧‧Processed object storage body

3‧‧‧研磨粒投射機3‧‧‧Abrasive Projector

4‧‧‧研磨粒回收機構4‧‧‧Abrasive Grain Recovery Agency

5‧‧‧濕式集塵機5‧‧‧wet dust collector

圖1係本發明適用之珠擊裝置之前視圖。BRIEF DESCRIPTION OF THE DRAWINGS

圖2係圖1之珠擊裝置之俯視圖。2 is a top plan view of the bead device of FIG. 1.

圖3係圖1之珠擊裝置之右側視圖。Figure 3 is a right side view of the bead device of Figure 1.

圖4係說明該珠擊裝置之研掃站S1及作業站S2之圖,被處理物收納體之俯視剖面圖。Fig. 4 is a plan view showing the processing station of the object to be processed by the polishing station S1 and the station S2 of the bead hitting apparatus.

圖5係用來說明將研掃站及作業站分隔開之分隔構件之圖,分隔構件之前視圖。Fig. 5 is a view for explaining a partition member separating the grinding station and the work station, and a front view of the partition member.

圖6係構成該珠擊裝置之研磨粒投射機之剖面圖。Figure 6 is a cross-sectional view of an abrasive particle projector constituting the bead blasting device.

圖7係構成該珠擊裝置之研磨粒回收機構之箕斗式升降機之剖面圖。Fig. 7 is a cross-sectional view showing a bucket elevator constituting an abrasive grain recovery mechanism of the bead blasting device.

圖8係構成該珠擊裝置之濕式集塵機與設置於濕式集塵機之入口側之逆流防止閥之剖面圖。Fig. 8 is a cross-sectional view showing a wet dust collector constituting the bead blasting device and a backflow prevention valve provided on the inlet side of the wet dust collector.

圖9係設置於濕式集塵機上部之排氣閥之剖面圖。Figure 9 is a cross-sectional view of the exhaust valve disposed on the upper portion of the wet dust collector.

S1...研掃站S1. . . Research station

S2...作業站S2. . . Job station

3...研磨粒投射機3. . . Abrasive grain projector

5...濕式集塵機5. . . Wet dust collector

7...搬入搬出口7. . . Move in and out

12...分隔構件12. . . Separating member

15...正面壁部15. . . Front wall

17...左側壁部17. . . Left side wall

18...右側壁部18. . . Right side wall

25...控制部25. . . Control department

26...控制盤26. . . control panel

33...風選式分離器33. . . Air separation separator

53...配管53. . . Piping

55...沉澱室55. . . Precipitation chamber

Claims (9)

一種珠擊裝置,具備:被處理物收納體,具有被處理物之搬入搬出口,以包圍該被處理物之方式進行收納;研磨粒投射機,對收納於該被處理物收納體之該被處理物投射研磨粒;研磨粒回收機構,用以回收該被處理物收納體內投射後之研磨粒,並送至研磨粒投射機;以及濕式集塵機,從該被處理物收納體透過導通配管連接,捕集因研磨粒之投射所產生之粉塵;在該濕式集塵機之入口側設置有爆炸氣浪緩衝減振器;該珠擊裝置係對鎂合金壓鑄即被處理物投射研磨粒,以進行該鎂合金壓鑄之表面處理之裝置;從該研磨粒投射機投射之研磨粒係鋅系投射材。 A beating device includes a workpiece storage body, which has a workpiece loading/unloading port, and is housed so as to surround the workpiece, and an abrasive grain projector that is stored in the workpiece storage body. The processed object projects the abrasive grains; the abrasive grain collecting means recovers the abrasive grains projected from the object storage body and sends them to the abrasive grain projector; and the wet dust collector, and the wetted dust collector is connected from the processed object storage body through the conduction pipe And collecting dust generated by projection of the abrasive particles; and an explosion air wave buffer damper is disposed on the inlet side of the wet dust collector; the ball strike device projects the abrasive grains on the magnesium alloy die-casting, that is, the processed object, to perform The surface treatment device for magnesium alloy die casting; the abrasive grain-based zinc-based projection material projected from the abrasive particle projector. 一種珠擊裝置,具備:被處理物收納體,具有被處理物之搬入搬出口,以包圍該被處理物之方式進行收納;研磨粒投射機,對收納於該被處理物收納體之該被處理物投射研磨粒;研磨粒回收機構,用以回收該被處理物收納體內投射後之研磨粒,並送至研磨粒投射機;以及濕式集塵機,從該被處理物收納體透過導通配管連接,捕集因研磨粒之投射所產生之粉塵; 在該濕式集塵機之入口側設置有爆炸氣浪緩衝減振器;該珠擊裝置係對鋁合金壓鑄即被處理物投射研磨粒,以進行該鋁合金壓鑄之表面處理之裝置;從該研磨粒投射機投射之研磨粒係鋁系投射材。 A beating device includes a workpiece storage body, which has a workpiece loading/unloading port, and is housed so as to surround the workpiece, and an abrasive grain projector that is stored in the workpiece storage body. The processed object projects the abrasive grains; the abrasive grain collecting means recovers the abrasive grains projected from the object storage body and sends them to the abrasive grain projector; and the wet dust collector, and the wetted dust collector is connected from the processed object storage body through the conduction pipe , collecting dust generated by projection of abrasive grains; An explosion air wave buffer damper is disposed on an inlet side of the wet dust collector; the ball impact device is a device for projecting abrasive grains on aluminum alloy die casting, that is, the object to be processed, to perform surface treatment of the aluminum alloy die casting; An abrasive grained aluminum projection material projected by a particle projector. 如申請專利範圍第1或2項之珠擊裝置,其中,構成該研磨粒投射機之控制計係鈹銅製。 The beating device according to claim 1 or 2, wherein the control unit constituting the abrasive particle projector is made of beryllium copper. 如申請專利範圍第1或2項之珠擊裝置,其中,構成該研磨粒回收機構之箕斗式升降機係使用導電性尼龍製箕斗。 A beating device according to claim 1 or 2, wherein the bucket elevator constituting the abrasive grain collecting mechanism is a conductive nylon bucket. 如申請專利範圍第1或2項之珠擊裝置,其中,構成該濕式集塵機之風扇葉輪係鋁製。 The beating device according to claim 1 or 2, wherein the fan impeller constituting the wet dust collector is made of aluminum. 如申請專利範圍第1或2項之珠擊裝置,其中,該濕式集塵機具有排氣閥,該排氣閥係設置於集塵機本體之上部,送風機運轉中設定為關閉,送風機停止中設定為開啟。 The beating device of claim 1 or 2, wherein the wet dust collector has an exhaust valve disposed on an upper portion of the dust collector body, the blower is set to be closed during operation, and the blower is set to be open during stop. . 如申請專利範圍第1或2項之珠擊裝置,其中,該濕式集塵機具有逸散機構,該逸散機構係安裝於集塵機本體,當集塵機本體內之壓力達到一定以上時作動並開放。 The beating device of claim 1 or 2, wherein the wet dust collector has an escape mechanism, and the escape mechanism is installed on the body of the dust collector, and is actuated and opened when the pressure in the body of the dust collector reaches a certain level or more. 如申請專利範圍第1或2項之珠擊裝置,其中,該被處理物收納體,具有:筐體,以包圍該被處理物之方式進行收納;分隔構件,將該筐體內部分隔為二個以上之空間;吊具構件,分別設置於被該分隔構件分隔之各空間,用以懸吊被處理物並保持;以及 驅動手段,用以旋轉驅動該分隔構件及該吊具構件;當該分隔構件被設定在旋轉方向之既定位置時,該分隔構件與該筐體至少將藉由該研磨粒投射機投射研磨粒之空間密閉;當對收納於被該分隔構件分隔之空間內之該密閉空間之被處理物,藉由該研磨粒投射機投射研磨粒時,於能對該密閉空間以外之空間進行被處理物之搬入搬出之位置設置有該搬入搬出口。 The bead device according to claim 1 or 2, wherein the object storage body has a casing that is housed to surround the object to be processed, and a partition member that divides the interior of the casing into two More than one space; the spreader members are respectively disposed in the spaces separated by the partition members for suspending the objects to be treated and maintained; a driving means for rotationally driving the partitioning member and the spreader member; and when the partitioning member is set at a predetermined position in a rotating direction, the partitioning member and the casing project at least the abrasive grain by the abrasive grain projector When the object to be processed stored in the sealed space in the space partitioned by the partition member is projected by the abrasive grain projector, the object to be processed can be processed in a space other than the sealed space. The loading and unloading port is provided at a position where the loading and unloading is performed. 如申請專利範圍第1或2項之珠擊裝置,其中,該被處理物收納體,具有:筐體,以包圍該被處理物之方式進行收納;分隔構件,將該筐體內部分隔為二個以上之空間;台構件,與該筐體一體設置或分開設置,用以裝載被處理物;以及驅動手段,用以旋轉驅動該分隔構件及台構件;當該分隔構件被設定在旋轉方向之既定位置時,該分隔構件與該筐體至少將藉由該研磨粒投射機投射研磨粒之空間密閉;當對收納於被該分隔構件分隔之空間內之該密閉空間之被處理物,藉由該研磨粒投射機投射研磨粒時,於能對該密閉空間以外之空間進行被處理物之搬入搬出之位置設置有該搬入搬出口。 The bead device according to claim 1 or 2, wherein the object storage body has a casing that is housed to surround the object to be processed, and a partition member that divides the interior of the casing into two More than one space; a table member disposed integrally with or separately from the casing for loading the object to be processed; and a driving means for rotationally driving the partition member and the table member; when the partition member is set in the direction of rotation At a predetermined position, the partition member and the casing are sealed at least by a space in which the abrasive grain is projected by the abrasive grain projector; and when the object to be treated is stored in the sealed space in the space partitioned by the partition member, When the abrasive grain projection machine projects the abrasive grains, the loading/unloading port is provided at a position where the object to be processed can be carried in and out of the space other than the sealed space.
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