TWI488714B - Surface treatment device - Google Patents

Surface treatment device Download PDF

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Publication number
TWI488714B
TWI488714B TW099137429A TW99137429A TWI488714B TW I488714 B TWI488714 B TW I488714B TW 099137429 A TW099137429 A TW 099137429A TW 99137429 A TW99137429 A TW 99137429A TW I488714 B TWI488714 B TW I488714B
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Taiwan
Prior art keywords
projection
projection material
processed
wire
disposed
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TW099137429A
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Chinese (zh)
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TW201206637A (en
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Kyoichi Iwata
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Sintokogio Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C1/00Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods
    • B24C1/08Methods for use of abrasive blasting for producing particular effects; Use of auxiliary equipment in connection with such methods for polishing surfaces, e.g. smoothing a surface by making use of liquid-borne abrasives
    • B24C1/086Descaling; Removing coating films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C3/00Abrasive blasting machines or devices; Plants
    • B24C3/08Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces
    • B24C3/10Abrasive blasting machines or devices; Plants essentially adapted for abrasive blasting of travelling stock or travelling workpieces for treating external surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24CABRASIVE OR RELATED BLASTING WITH PARTICULATE MATERIAL
    • B24C7/00Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts
    • B24C7/0046Equipment for feeding abrasive material; Controlling the flowability, constitution, or other physical characteristics of abrasive blasts the abrasive material being fed in a gaseous carrier

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning In General (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Filling Or Emptying Of Bunkers, Hoppers, And Tanks (AREA)

Description

表面處理裝置Surface treatment device

本發明係關於往線材等被處理物之表面投射投射材以表面處理之表面處理裝置。The present invention relates to a surface treatment apparatus for surface-treating a projection material onto a surface of a workpiece such as a wire.

於表面處理裝置有例如將線材等搬入箱體內並往搬入之線材等之表面投射投射材以噴珠處理者(例如參照日本特開2003-334759公報)。In the surface treatment apparatus, for example, a wire material is carried into a casing, and a projection material is projected onto a surface of a wire or the like to be carried by a bead blaster (see, for example, Japanese Laid-Open Patent Publication No. 2003-334759).

然而,此等裝置在抑制多餘之投射之觀點有改善之餘地。However, such devices have room for improvement in terms of suppressing unwanted projections.

本發明係考慮上述事實,獲得可抑制多餘之投射之表面處理裝置為目的。The present invention has been made in view of the above facts to obtain a surface treatment apparatus capable of suppressing unnecessary projection.

本發明之第1態樣之表面處理裝置係一種表面處理裝置,具有:對被往既定之搬送方向搬送之被處理對象物投射投射材之投射裝置;相對前述投射裝置配置於前述搬送方向之上流側及下流側至少一方並檢知前述被處理對象物之有無之檢知手段;做為往前述投射裝置之投射材之供給用且可變更往前述投射裝置之投射材之供給量之投射材供給裝置;基於前述檢知手段之檢知結果調節前述投射材供給裝置之往前述投射裝置之投射材之供給量之控制手段。A surface treatment apparatus according to a first aspect of the present invention is a surface treatment apparatus comprising: a projection device that projects a projection material to an object to be processed that is transported in a predetermined conveyance direction; and the projection device is disposed above the conveyance direction a detection means for detecting the presence or absence of the object to be processed, at least one of the side and the downstream side, and a supply of the projection material for supplying the projection material to the projection device and changing the supply amount of the projection material to the projection device And means for controlling a supply amount of the projection material of the projection material supply device to the projection device based on the detection result of the detection means.

根據本發明之第1態樣之表面處理裝置,從投射材供給裝置往投射裝置之供給進行,投射裝置對往既定之搬送方向搬送之被處理對象物投射投射材。相對投射裝置於搬送方向之上流側及下流側至少一方配置有檢知手段,以此檢知手段檢知被處理對象物之有無。在此,基於檢知手段之檢知結果調節投射材供給裝置之往投射裝置之投射材之供給量。因此,抑制多餘之投射。According to the surface treatment apparatus of the first aspect of the present invention, the projection material supply device supplies the projection material to the object to be processed which is conveyed in a predetermined conveyance direction. The detecting means is provided with at least one of the flow side and the downstream side in the transport direction, and the detecting means detects the presence or absence of the object to be processed. Here, the supply amount of the projection material to the projection device of the projection material supply device is adjusted based on the detection result of the detection means. Therefore, the extra projection is suppressed.

本發明之第1態樣之表面處理裝置係如申請專利範圍第1項記載之表面處理裝置,其中,設置檢出前述被處理對象物搬送之速度之速度檢出手段;前述控制手段係基於前述速度檢出手段之檢出結果調節前述投射材供給裝置之往前述投射裝置之投射材之供給量。The surface treatment apparatus according to the first aspect of the invention, wherein the surface treatment apparatus according to the first aspect of the invention is characterized in that: the speed detecting means for detecting the speed at which the object to be processed is transported is provided; The detection result of the speed detecting means adjusts the supply amount of the projection material to the projection device of the projection material supply device.

根據本發明之第2態樣之表面處理裝置,被處理對象物搬送之速度藉由速度檢出手段檢出。在此,控制手段係基於速度檢出手段之檢出結果調節投射材供給裝置之往投射裝置之投射材之供給量。因此,有效地抑制多餘之投射。According to the surface treatment apparatus of the second aspect of the present invention, the speed at which the object to be processed is transported is detected by the speed detecting means. Here, the control means adjusts the supply amount of the projection material to the projection device of the projection material supply device based on the detection result of the speed detecting means. Therefore, the extra projection is effectively suppressed.

本發明之第3態樣之表面處理裝置係如申請專利範圍第1或2項記載之表面處理裝置,其中,具有於內部形成藉由被前述投射裝置投射之投射材進行前述被處理對象物之表面加工之投射室且形成有前述被處理對象物之搬入用之搬入口與搬出用之搬出口之箱體;具備配置於前述箱體之搬入口側且前述被處理對象物可通過內側之第一筒狀部與配置於前述第一筒狀部之內側並於前述被處理對象物之通過時在前述被處理對象物與前述第一筒狀部之內面之間做為漏出阻止用之第一密封體之第一密封部;具備配置於前述箱體之搬出口側且前述被處理對象物可通過內側之第二筒狀部與配置於前述第二筒狀部之內側並於前述被處理對象物之通過時在前述被處理對象物與前述第二筒狀部之內面之間做為漏出阻止用之第二密封體之第二密封部;氣體流出口配置於比前述第二密封部更往前述搬送方向之下流側並使往前述箱體之內側之氣流產生之氣流產生裝置。The surface treatment apparatus according to the first aspect of the invention, wherein the object to be processed is formed by a projection material projected by the projection device. In the projection chamber of the surface processing, the housing for the loading and unloading of the object to be processed is formed, and the housing is disposed on the inlet side of the housing and the object to be processed is passed through the inside. When a cylindrical portion is disposed inside the first cylindrical portion and passes through the object to be processed, the first object is formed between the object to be processed and the inner surface of the first cylindrical portion. a first sealing portion of the sealing body; and a second cylindrical portion disposed on the outlet side of the casing and passing through the inside of the object and disposed inside the second cylindrical portion and processed in the foregoing When the object passes, the second sealing portion of the second sealing body for leakage prevention is formed between the object to be processed and the inner surface of the second cylindrical portion; the gas outflow port is disposed in the second portion And generating the air flow more to the seal portion of the conveyance direction toward the downstream side of the air flow inside the casing of the generator.

根據本發明之第3態樣之表面處理裝置,從箱體之搬入口搬入之被處理對象物在到達箱體之投射室後由投射裝置投射投射材。投射後之被處理對象物從箱體之搬出口搬出。此外,於箱體之搬入口側配置有第一密封部,於此第一密封部係於被處理對象物可通過之第一筒狀部之內側配置有第一密封體。第一密封體係於被處理對象物之通過時在被處理對象物與第一筒狀部之內面之間為投射材之漏出阻止用。因此,投射後之投射材之從搬入口側之漏出係以第一密封部阻止。According to the surface treatment apparatus of the third aspect of the present invention, the object to be processed carried in from the inlet of the casing reaches the projection chamber of the casing, and the projection material is projected by the projection device. The object to be processed after being projected is carried out from the outlet of the casing. Further, a first sealing portion is disposed on the inlet side of the casing, and the first sealing portion is provided with a first sealing body inside the first cylindrical portion through which the object to be processed can pass. The first sealing system prevents leakage of the projection material between the object to be processed and the inner surface of the first cylindrical portion when the object to be processed passes. Therefore, the leakage of the projecting projection material from the inlet side is blocked by the first sealing portion.

相對於此,於箱體之搬出口側配置有第二密封部,於此第二密封部係於被處理對象物可通過之第一筒狀部之內側配置有第二密封體。第二密封體係於被處理對象物之通過時在被處理對象物與第二筒狀部之內面之間為投射材之漏出阻止用。因此,基本上,投射後之投射材之從搬出口側之漏出係以第二密封部阻止。但從搬出口側會有伴隨被處理對象物之搬出而殘留於被處理對象物上之投射材搬出之可能性。然而,在本發明係於比前述第二密封部更往前述搬送方向之下流側配置有氣流產生裝置之氣體流出口,氣流產生裝置係使往前述箱體之內側之氣流產生,故即使於被處理對象物上有投射材殘留,該投射材亦會返回箱體之內側。On the other hand, the second sealing portion is disposed on the outlet side of the casing, and the second sealing portion is disposed on the inner side of the first cylindrical portion through which the object to be processed passes. The second sealing system prevents leakage of the projection material between the object to be processed and the inner surface of the second cylindrical portion when the object to be processed passes. Therefore, basically, the leakage of the projected projecting material from the outlet side is prevented by the second sealing portion. However, there is a possibility that the projecting material remaining on the object to be processed is carried out along with the object to be processed. However, in the present invention, the gas flow outlet of the airflow generating device is disposed on the flow side of the second sealing portion below the transport direction, and the airflow generating device generates the airflow to the inside of the casing, so that even if The target material remains on the object to be processed, and the projectile material is returned to the inside of the casing.

本發明之第4態樣之表面處理裝置係如申請專利範圍第1~3項記載之表面處理裝置,其中,具有包含由前述投射裝置投射之投射材往前述箱體之上方側搬送之斗式升降機而構成且使前述投射材往前述投射裝置循環之循環裝置;設於前述循環裝置之循環路徑並將前述投射材以外之異物及投射之前述投射材之中裂開之投射材分離除去之分離器;連接於前述分離器並吸引包含粉塵之空氣之集塵機。A surface treatment apparatus according to the first aspect of the invention, wherein the surface treatment apparatus according to the first to third aspect of the invention has a bucket type including a projection material projected by the projection device toward the upper side of the casing a circulation device configured to circulate the projection material to the projection device; a separation path provided in the circulation path of the circulation device, and separating and separating the foreign matter other than the projection material and the projection material that is projected from the projection material a dust collector connected to the aforementioned separator and attracting air containing dust.

根據本發明之第4態樣之表面處理裝置,由前述投射裝置投射之投射材藉由斗式升降機往前述箱體之上方側搬送,以包含斗式升降機之循環裝置使前述投射材往前述投射裝置循環。於前述循環裝置之循環路徑設分離器,前述投射材以外之異物及投射之前述投射材之中裂開之投射材以分離器分離除去。此外,以連接於前述分離器之集塵機吸引包含粉塵之空氣。此集塵機之吸引使透過分離器等箱體之內部成為負壓,故以氣流產生裝置產生之往箱體之內側之氣流容易進入箱體之內部,不幸通過第二密封部之投射材往箱體之內側有效率地返回。亦即,投射材循環利用,投射材或異物之往裝置外之漏出有效地防止或抑制。According to a fourth aspect of the present invention, a projection material projected by the projection device is conveyed to an upper side of the casing by a bucket elevator, and the projection material is projected by the circulation device including the bucket elevator. The device cycles. A separator is disposed in the circulation path of the circulation device, and the foreign matter other than the projection material and the projection material that is projected from the projection material are separated by a separator. Further, the dust-containing air is sucked by a dust collector connected to the aforementioned separator. The suction of the dust collector causes the inside of the casing through the separator to become a negative pressure, so that the airflow generated by the airflow generating device to the inside of the casing easily enters the inside of the casing, and unfortunately passes through the projection material of the second sealing portion to the casing. The inside returns efficiently. That is, the projection material is recycled, and leakage of the projection material or foreign matter to the outside of the device is effectively prevented or suppressed.

如以上說明,根據本發明之表面處理裝置,具有抑制多餘之投射之優良效果。As described above, the surface treatment apparatus according to the present invention has an excellent effect of suppressing unnecessary projection.

本申請係基於在日本於2010年08月10日被提出申請之特願2010-179873號,其內容係做為本申請之內容形成其一部分。The present application is based on Japanese Patent Application No. 2010-179873, filed on Jan.

此外,本發明應可藉由本說明書之詳細之說明進一步完全理解。然而,詳細之說明及特定之實施例為本發明之較理想之實施形態,僅係為了說明之目的而被記載者。因從此詳細之說明各種變更、改變對當業者而言為明顯。In addition, the present invention should be fully understood by the detailed description of the specification. However, the detailed description and specific examples are illustrative of the preferred embodiments of the invention. It is obvious to the practitioner that the various changes and changes are explained in detail from the above.

申請人無將被記載之實施形態之任一者對公眾獻上之意圖,被揭示之改變、代替案之中,即使文言上可能不包含於申請專利範圍內者,亦為在均等論下之發明之一部分。The applicant has no intention to offer the public to any of the stated embodiments, and the disclosed change or substitute case, even if the language may not be included in the scope of the patent application, is also based on the equalization theory. Part of the invention.

於本說明書或申請專利範圍之記載中,名詞及同樣之指示詞之使用只要沒有特別被指明或只要非根據文脈被明確否定,應解釋為包含單數與複數雙方。在本說明書中被提供之任一例示或例示性用語之使用(例如:「等」)亦僅係為了使本發明容易說明之意圖,只要沒有在申請專利範圍記載便非對本發明之範圍施加限制者。In the description of the specification or the scope of the patent application, the use of the singular and plural referents are to be construed as the singular and plural. The use of any of the exemplified or exemplified terms in the specification (such as "the", etc.) is merely intended to be illustrative, and is not intended to limit the scope of the invention. By.

[第1實施形態][First Embodiment]

針對做為本發明之第1實施形態之表面處理裝置噴珠裝置使用圖1~圖8說明。於圖1,噴珠裝置10係以前視圖顯示,於圖2,噴珠裝置10係以左側視圖顯示。The bead apparatus of the surface treatment apparatus according to the first embodiment of the present invention will be described with reference to Figs. 1 to 8 . In Fig. 1, the beading device 10 is shown in a front view. In Fig. 2, the bead device 10 is shown in a left side view.

另外,本實施形態之噴珠裝置10係以金屬製之線材12做為被處理對象物。於圖中適當顯示之箭頭X係表示線材12搬送之搬送方向(以下稱為「線材搬送方向」。)。Further, in the bead apparatus 10 of the present embodiment, the wire 12 made of metal is used as an object to be processed. The arrow X appropriately displayed in the drawing indicates the conveyance direction in which the wire 12 is conveyed (hereinafter referred to as "wire conveyance direction").

對於圖1顯示之噴珠裝置10於線材搬送方向(線材行進方向)之上流側(圖中左側)配置有不圖示之線材供給裝置。線材供給裝置係對噴珠裝置10之線材12之供給用,構成為包含捲繞有在噴珠裝置10處理前之線材12之捲出部、將從前述捲出部捲出之線材12往噴珠裝置10之搬入側導引轉子14導引之導引轉子。The bead supply device (not shown) is disposed on the flow side (the left side in the drawing) of the bead apparatus 10 shown in FIG. 1 in the wire conveyance direction (the wire traveling direction). The wire supply device is configured to supply the wire 12 of the bead apparatus 10, and includes a winding portion around which the wire 12 before the processing of the bead device 10 is wound, and the wire 12 wound from the winding portion is sprayed. The loading side of the bead device 10 guides the rotor 14 guided by the rotor 14.

此外,對於圖1顯示之噴珠裝置10於線材搬送方向(線材行進方向)之下流側(圖中右側)配置有不圖示之捲取裝置。前述捲取裝置係具備以驅動馬達旋轉驅動之捲盤,將在噴珠裝置10處理後從搬出側導引轉子16搬出之線材12以前述捲盤以既定之速度及既定之張力捲取之裝置。另外,於線材12之搬送除前述捲取裝置外,適用抽伸機(以孔模將線材12抽製為既定之粗度之裝置,具備往復運動同時重複夾線材12拉之動作之線材行進驅動手段之裝置)等。Further, a winding device (not shown) is disposed on the flow side (the right side in the drawing) of the bead apparatus 10 shown in Fig. 1 below the wire conveyance direction (the wire traveling direction). The winding device includes a reel that is driven to rotate by a drive motor, and the wire 12 that is carried out from the carry-out guide rotor 16 after being processed by the bead apparatus 10 is taken up at a predetermined speed and a predetermined tension by the reel. . Further, in addition to the above-described winding device, the wire material 12 is applied to an extracting machine (a device for drawing a wire 12 into a predetermined thickness by a hole die, and a wire traveling driving means for reciprocating and repeating the action of pulling the wire 12 to be pulled) The device) and so on.

如圖1所示,噴珠裝置10具備箱體18。於箱體18之內部形成有藉由往線材12之投射材之投射來進行線材12之表面加工之投射室18A(亦稱為「加工室」、「研掃室」)。此外,於箱體18係於線材搬送方向(線材行進方向)之上流側(圖中左側)形成線材12之搬入用之搬入口20,於線材搬送方向(線材行進方向)之下流側(圖中右側)形成有線材12之搬出用之搬出口22。As shown in FIG. 1, the bead apparatus 10 is provided with the case 18. A projection chamber 18A (also referred to as a "processing chamber" or a "mortar chamber") for processing the surface of the wire 12 by projection of the projection material of the wire 12 is formed inside the casing 18. In addition, the tank 18 is formed on the flow side (the left side in the drawing) in the wire conveyance direction (the wire traveling direction) to form the inlet 20 for loading the wire 12, and the flow side in the wire conveyance direction (the wire traveling direction) (in the figure) The right side) forms the outlet 22 for the wire material 12 to be carried out.

此外,於箱體18之內部沿線材12之搬送通路隔著既定之間隔配置有複數導引筒構件(導引構件)24。導引筒構件24係固定於箱體18,形成為大致筒狀。形成於導引筒構件24之導引孔係隨著往搬送方向(線材行進方向)之下流側(圖中右側)逐漸變小徑,導引孔之軸心係配置為與線材12之搬送通路之中心一致。Further, a plurality of guide cylinder members (guide members) 24 are disposed inside the casing 18 along the conveyance path of the wire 12 at predetermined intervals. The guide tube member 24 is fixed to the case 18 and formed in a substantially cylindrical shape. The guide hole formed in the guide cylinder member 24 gradually decreases in diameter toward the flow side (the right side in the drawing) in the transport direction (the traveling direction of the wire), and the axis of the guide hole is disposed to be the transport path with the wire 12. The center is the same.

複數導引筒構件24之中,於設於搬入口20及搬出口22之導引筒構件24於各自之線材搬送方向(線材行進方向)之下流側(圖中右側)部位串聯安裝有二個短筒狀之導引筒25。形成於導引筒25之導引孔係隨著往搬送方向(線材行進方向)之下流側(圖中右側)逐漸變小徑,導引孔之軸心係配置為與導引筒構件24之導引孔之軸心一致。Among the plurality of guide tube members 24, two guide tubes 24 are provided in series on the flow side (the right side in the drawing) of the guide tube member 24 provided in the carry-in port 20 and the transfer port 22 in the respective wire conveyance directions (the wire traveling direction). A short cylindrical guiding cylinder 25. The guide hole formed in the guide cylinder 25 gradually decreases in diameter toward the flow side (the right side in the drawing) in the transport direction (the traveling direction of the wire), and the axis of the guide hole is disposed to be adjacent to the guide cylinder member 24. The axes of the guide holes are the same.

此外,於箱體18於夾線材12之搬送通路之上下左右安裝有計四台之投射裝置26。此等四台之投射裝置26係於線材搬送方向隔著既定之間隔配置。本實施形態之投射裝置26係對往線材搬送方向搬送之線材12將投射材(在本實施形態做為一例係鋼球)以離心力加速投射之離心式投射材投射裝置(動葉輪單元、離心投射手段)。亦即,投射裝置26係藉由如前述設有四台而向線材12從上下左右方向投射投射材。此種投射在本實施形態係為了將附著於線材12之表面之鏽皮、生鏽等附著物除去而為。投射裝置26係連接於不圖示之ECU(Electronic Control Unit,控制手段)。Further, four projection devices 26 are mounted on the left and right of the housing 18 above and below the transport path of the clip member 12. These four projection devices 26 are arranged at a predetermined interval in the wire conveying direction. The projection device 26 of the present embodiment is a centrifugal projection material projection device (an impeller unit, a centrifugal projection) that accelerates projection of a projection material (in this embodiment, an example of a steel ball) by a centrifugal force in a wire material 12 that is conveyed in a wire conveyance direction. means). That is, the projection device 26 projects the projection material from the up, down, left, and right directions to the wire 12 by providing four as described above. In the present embodiment, such projection is performed to remove adhering substances such as scale and rust adhering to the surface of the wire member 12. The projection device 26 is connected to an ECU (Electronic Control Unit) (not shown).

於投射裝置26之上方側配置有做為投射材供給裝置之投射材供給裝置28(流量調節裝置)。投射材供給裝置28係往投射裝置26供給投射材S之裝置。投射材供給裝置28係配置於投射材貯藏用之投射材貯藏槽38之漏斗38A之下方側並具備外殼體28C,外殼體28C係於外筒部28C1之內側形成有內筒部28C2。此外,投射材供給裝置28具備可開閉外殼體28C內筒部28C2之下部開口部28C3之投射材閘門28A。A projection material supply device 28 (flow rate adjustment device) as a projection material supply device is disposed above the projection device 26. The projection material supply device 28 is a device that supplies the projection material S to the projection device 26. The projecting material supply device 28 is disposed below the funnel 38A of the projecting material storage tank 38 for storing the projection material, and includes an outer casing 28C. The outer casing 28C is formed with an inner tubular portion 28C2 inside the outer tubular portion 28C1. Further, the projection material supply device 28 includes a projection material shutter 28A that can open and close the opening portion 28C3 of the lower portion of the inner tubular portion 28C2 of the outer casing 28C.

投射材閘門28A係圓弧板面狀之開閉部28A1開閉內筒部28C2之下部開口部28C3,且具備從開閉部28A1之一端大致直角彎曲成前細狀之大致三角狀之支持部28A2。支持部28A2係配置於內筒部28C2與外筒部28C1之間,從支持部28A2之上端部係軸部28J突出而可旋轉地支持於外殼體28C之外筒部28C1。此外,於支持部28A2係從軸部28J與開閉部28A1之端部之間有銷28P突出。此銷28P係往投射材閘門28A(開閉部28A1)將下部開口部28C3全閉之位置方向藉由不圖示之彈壓手段彈壓,且可旋轉地安裝於臂28B1之一端。臂28B1之另一端係可旋轉地安裝於桿28B2之前端。此外,桿28B2之基端係固定於活塞28B3,活塞28B3係在汽缸28B4(在本實施形態做為一例係氣壓缸)內藉由流體壓而可往復運動。The opening and closing portion 28A1 of the arcuate plate-like opening and closing portion 28A1 opens and closes the lower opening portion 28C3 of the inner cylindrical portion 28C2, and includes a substantially triangular-shaped support portion 28A2 which is bent at a substantially right angle from one end of the opening and closing portion 28A1. The support portion 28A2 is disposed between the inner tubular portion 28C2 and the outer tubular portion 28C1, and protrudes from the upper end shaft portion 28J of the support portion 28A2 to rotatably support the outer tubular body 28C outside the tubular portion 28C1. Further, the support portion 28A2 protrudes from the end portion of the shaft portion 28J and the opening and closing portion 28A1 by a pin 28P. The pin 28P is slidably attached to one end of the arm 28B1 by a biasing means (not shown) in a position where the lower opening portion 28C3 is fully closed to the projecting material gate 28A (opening and closing portion 28A1). The other end of the arm 28B1 is rotatably mounted to the front end of the rod 28B2. Further, the base end of the rod 28B2 is fixed to the piston 28B3, and the piston 28B3 is reciprocally movable by the fluid pressure in the cylinder 28B4 (which is an example of a pneumatic cylinder in the present embodiment).

亦即,投射材供給裝置28係藉由活塞28B3往復運動且桿28B2伸縮而投射材閘門28A擺動,可變更投射材閘門28A之開度。在本實施形態係投射材閘門28A可為以全開及半開之二階段開啟之設定,設定為全開、半開、全閉其中之一。如上述,藉由變更投射材閘門28A之開度(對下部開口部28C3之開口面積之開啟比例)而可將往投射裝置26之投射材之供給量以多階段變更(調整)。投射材供給裝置28係汽缸28B4透過空氣方向控制機器(電磁閥等)29A與空氣供給源29B連接,空氣方向控制機器29A係連接於ECU 46。ECU 46係藉由控制空氣方向控制機器29A來控制活塞28B3之變位。That is, the projection material supply device 28 can reciprocate by the piston 28B3 and the rod 28B2 expands and contracts to swing the projection material gate 28A, thereby changing the opening degree of the projection material shutter 28A. In the present embodiment, the projectile material shutter 28A can be set to be opened in two stages of full opening and half opening, and is set to be one of full opening, half opening, and full closing. As described above, by changing the opening degree of the projection material shutter 28A (the opening ratio to the opening area of the lower opening portion 28C3), the supply amount of the projection material to the projection device 26 can be changed (adjusted) in multiple stages. The projecting material supply device 28 is connected to the air supply source 29B through the air direction control device (electromagnetic valve or the like) 29A, and the air direction control device 29A is connected to the ECU 46. The ECU 46 controls the displacement of the piston 28B3 by controlling the air direction control device 29A.

如圖1所示,於投射裝置26係透過投射材供給裝置28連結有循環裝置30。循環裝置30係搬送由投射裝置26投射之投射材並使往投射裝置26循環之裝置,具備配置於箱體18之內部之底部側之螺旋輸送機32及於裝置上下方向延伸之斗式升降機34(參照圖2)。As shown in FIG. 1, the circulation device 30 is connected to the projection device 26 via the projecting material supply device 28. The circulation device 30 is a device that conveys the projection material projected by the projection device 26 and circulates the projection device 26, and includes a screw conveyor 32 disposed on the bottom side of the casing 18 and a bucket elevator 34 extending in the vertical direction of the device. (Refer to Figure 2).

螺旋輸送機32係水平配置且以線材搬送方向為軸方向延在,軸部之兩端側於箱體18側支持為可旋轉。此螺旋輸送機32係連接於驅動馬達36並藉由驅動馬達36之驅動力而旋轉,具備可將堆積於箱體18之下部之投射材從圖中之左右兩側往中央側搬送之左右對稱之螺桿部。The screw conveyor 32 is horizontally disposed and extends in the axial direction in the wire conveying direction, and both ends of the shaft portion are rotatably supported on the casing 18 side. The screw conveyor 32 is connected to the drive motor 36 and is rotated by the driving force of the drive motor 36, and has a bilaterally symmetrical structure in which the projection material deposited on the lower portion of the casing 18 can be conveyed from the left and right sides in the drawing toward the center side. Screw part.

對螺旋輸送機32之軸線方向之中央部側係配置為斗式升降機34之收集口34D面對。換言之,螺旋輸送機32係配置為可往斗式升降機34之收集口34D搬送投射材。斗式升降機34雖因係公知構造而省略詳細說明,但如圖2所示,於配置於噴珠裝置10之上部及下部之滑輪34A(在圖中僅上側圖示)捲掛無端皮帶34B,於無端皮帶34B安裝有多數斗34C。此外,滑輪34A係連接於馬達而可旋轉驅動。藉此,斗式升降機34將以螺旋輸送機32(參照圖1)回收之(暫時貯藏之)投射材以斗34C撈起並藉由以馬達使斗式升降機34旋轉來將斗34C內之投射材往箱體18之上方側搬送。The center portion side of the screw conveyor 32 in the axial direction is disposed so that the collection port 34D of the bucket elevator 34 faces. In other words, the screw conveyor 32 is configured to carry the projecting material to the collection port 34D of the bucket elevator 34. Although the bucket elevator 34 is not described in detail because of a known structure, as shown in FIG. 2, the endless belt 34B is wound around the pulley 34A (shown only in the upper side in the figure) disposed on the upper and lower portions of the bead apparatus 10, A plurality of buckets 34C are attached to the endless belt 34B. Further, the pulley 34A is rotatably driven by being connected to a motor. Thereby, the bucket elevator 34 picks up the (temporarily stored) projection material recovered by the screw conveyor 32 (refer to FIG. 1) with the bucket 34C and projects the bucket 34C by rotating the bucket elevator 34 with a motor. The material is conveyed to the upper side of the casing 18.

此外,如圖1及圖2所示,於斗式升降機34之上部側之附近配置有分離器40。分離器40係設於循環裝置30之循環路徑,將投射材以外之異物(從線材表面脫落之微細鏽皮等)及以斗式升降機34搬送之投射材(亦即以投射裝置26投射之投射材)之中裂開之投射材分離除去,於將可再利用之投射材落下之下端部之下方側配置有投射材貯藏用之投射材貯藏槽38。做為分離器40,在本實施形態係適用旋風做為一例。此旋風具備大致圓筒狀之外殼,且具備導引包含於外殼吸入之投射材之空氣使前述空氣產生旋轉氣流之導引部。另外,亦可適用沈降腔室來代替旋風。此外,於顯示於圖1之分離器40係透過風道41連接有集塵機42。在圖1係將集塵機42方塊化圖示。集塵機42係吸引並收集包含粉塵之空氣。另外,前述粉塵係在箱體18及分離器40產生之粉塵。Further, as shown in FIGS. 1 and 2, a separator 40 is disposed in the vicinity of the upper side of the bucket elevator 34. The separator 40 is disposed in a circulation path of the circulation device 30, and projects foreign matter other than the projection material (such as fine scale peeled off from the surface of the wire) and a projection material that is conveyed by the bucket elevator 34 (that is, projection projected by the projection device 26). The projecting material which is split in the material is separated and removed, and the projecting material storage tank 38 for storing the projection material is disposed on the lower side of the lower end portion where the recyclable projecting material is dropped. As the separator 40, in the present embodiment, a cyclone is applied as an example. The whirlwind has a substantially cylindrical outer casing and has a guiding portion for guiding the air contained in the projecting material sucked by the outer casing to generate a swirling airflow of the air. In addition, a settling chamber can be applied instead of a cyclone. Further, a dust collector 42 is connected to the separator 40 shown in Fig. 1 through the air passage 41. In Fig. 1, the dust collector 42 is shown in a block diagram. The dust collector 42 attracts and collects air containing dust. Further, the dust is generated by the dust generated in the casing 18 and the separator 40.

於噴珠裝置10之線材搬送方向之最下流側(比搬出側導引轉子16更下流側)於搬送通路之上方側配置有做為檢知線材12之有無之檢知手段之線材檢知裝置44。如圖4所示,線材檢知裝置44係以從裝置正面側往裝置背面側之方向為軸方向之支軸44A可旋轉地支持於噴珠裝置10之不圖示之安裝托架。於此支軸44A一體形成有臂44B。臂44B係於對支軸44A之軸方向正交之方向延在並可繞支軸44A旋轉移動(擺動),在自由狀態下係長度方向為上下方向之姿勢(參照二點鎖線)。於臂44B係於在自由狀態下為下端之部位可旋轉地安裝有軸線與支軸44A平行之轉子44C。於在自由狀態下為上端之部位安裝有金屬等磁性體。A wire detecting device that is a detecting means for detecting the presence or absence of the wire 12 is disposed on the lowermost side of the wire feeding direction of the ball feeding device 10 (the downstream side of the carrying-side guiding rotor 16) on the upper side of the conveying path. 44. As shown in FIG. 4, the wire detecting device 44 is rotatably supported by a mounting bracket (not shown) of the ball discharging device 10 by a support shaft 44A whose axial direction is from the front surface side of the device. The arm 44A is integrally formed with the arm 44B. The arm 44B is extended in a direction orthogonal to the axial direction of the support shaft 44A and is rotatable (oscillated) about the support shaft 44A, and is in a vertical direction in a free state (see a two-point lock line). The arm 44B is rotatably attached to a rotor 44C whose axis is parallel to the support shaft 44A in a portion which is a lower end in a free state. A magnetic body such as a metal is attached to the upper end portion in a free state.

於線材檢知裝置44於對臂44B線材搬送方向之上流側(圖中左側)配置有接近閉關44E。接近開關44E係於磁性體44D接近至既定範圍內時使包含接近開關44E之電氣電路(控制電路部)為導通狀態之構成。亦即,於線材12通過線材檢知裝置44之下方側時在轉子44C按壓而臂44B旋轉移動之狀態下,藉由磁性體44D接近接近開關44E,接近開關44E檢出磁性體44D之接近,換言之,檢出線材12之存在。如圖8所示,接近開關44E係連接於ECU 46。ECU 46係基於線材檢知裝置44之檢知結果來調節投射材供給裝置28之往投射裝置26之投射材之供給量。The wire detecting device 44 is disposed close to the closing 44E on the flow side (the left side in the drawing) of the arm 44B in the wire conveying direction. The proximity switch 44E is configured to bring the electric circuit (control circuit unit) including the proximity switch 44E into an on state when the magnetic body 44D is within a predetermined range. In other words, when the wire 12 passes through the lower side of the wire detecting device 44, the rotor 44C is pressed and the arm 44B is rotated, and the magnetic body 44D approaches the proximity switch 44E, and the proximity switch 44E detects the proximity of the magnetic body 44D. In other words, the presence of the wire 12 is detected. As shown in FIG. 8, the proximity switch 44E is connected to the ECU 46. The ECU 46 adjusts the supply amount of the projection material of the projection material supply device 28 to the projection device 26 based on the detection result of the wire detecting device 44.

另一方面,如圖3所示,於搬入側導引轉子14之軸部14A之附近配置有做為速度檢出手段之速度檢出感測器45。速度檢出感測器45係於搬入側導引轉子14旋轉之場合基於與搬入側導引轉子14一體旋轉之軸部14A之旋轉速度檢出線材12搬送之速度。如圖8所示,速度檢出感測器45係連接於ECU 46。ECU 46係基於速度檢出感測器45之檢出結果調節投射材供給裝置28之往投射裝置26之投射材之供給量。On the other hand, as shown in FIG. 3, a speed detecting sensor 45 as a speed detecting means is disposed in the vicinity of the shaft portion 14A of the loading-side guiding rotor 14. When the loading-side guiding rotor 14 rotates, the speed detecting sensor 45 detects the speed at which the wire 12 is conveyed based on the rotational speed of the shaft portion 14A that rotates integrally with the loading-side guiding rotor 14. As shown in FIG. 8, the speed detecting sensor 45 is connected to the ECU 46. The ECU 46 adjusts the supply amount of the projection material of the projection material supply device 28 to the projection device 26 based on the detection result of the speed detecting sensor 45.

具體而言,ECU 46係在在速度檢出感測器45之檢出速度為既定速度未滿之場合線材檢知裝置44檢知線材12(參照圖1)之狀態下使活塞28B3變位為投射材供給裝置28中之投射材閘門28A之開度為半開,在在速度檢出感測器45之檢出速度為既定速度以上之場合線材檢知裝置44檢知線材12之狀態下使活塞28B3變位為投射材供給裝置28中之投射材閘門28A之開度為全開。此外,ECU 46在速度檢出感測器45沒有檢出線材12(參照圖1)之搬送速度(沒有檢出線材12之搬送狀態)且線材檢知裝置44已檢出線材12之狀態下控制為使投射材閘門28A之開度維持,亦即不改變活塞28B3之位置,在速度檢出感測器45沒有檢出線材12之搬送速度且線材檢知裝置44沒有檢知線材12之狀態下使活塞28B3變位為投射材閘門28A之開度為全閉。Specifically, the ECU 46 displaces the piston 28B3 in a state where the wire detecting device 44 detects the wire 12 (see FIG. 1) when the speed detected by the speed detecting sensor 45 is not full. The opening degree of the projection material shutter 28A in the projection material supply device 28 is half open, and when the detection speed of the speed detecting sensor 45 is equal to or higher than the predetermined speed, the wire detecting device 44 detects the wire 12 and causes the piston. The displacement of 28B3 is that the opening of the projection material gate 28A in the projectile supply device 28 is fully open. Further, the ECU 46 controls the speed detecting sensor 45 not to detect the transport speed of the wire 12 (see FIG. 1) (the transport state of the wire 12 is not detected) and the wire detecting device 44 has detected the wire 12 In order to maintain the opening degree of the projection material shutter 28A, that is, without changing the position of the piston 28B3, the speed detecting sensor 45 does not detect the conveying speed of the wire 12 and the wire detecting device 44 does not detect the wire 12 The displacement of the piston 28B3 is such that the opening of the projectile gate 28A is fully closed.

另外,投射材閘門28A之開度為可更詳細(亦即無段地)設定亦可,ECU 46控制活塞28B3之變位量以使對應於速度檢出感測器45之檢出速度將投射材閘門28A之開度(換言之投射材之供給量)例如比例地變更亦可。In addition, the opening degree of the projection material gate 28A may be set in more detail (that is, without a segment), and the ECU 46 controls the displacement amount of the piston 28B3 so that the detection speed corresponding to the speed detecting sensor 45 is projected. The opening degree of the material gate 28A (in other words, the supply amount of the projection material) may be changed in proportion, for example.

如圖3所示,於箱體18之搬入口20側於比搬入口20更線材搬送方向之上流側設有第一密封構造部50(第一密封筒),第一密封構造部50之外殼體51係對箱體18安裝。亦即,第一密封構造部50係設於搬入側導引轉子14與箱體18之間。外殼體51之底板部51C係向線材搬送方向之下流側往裝置下方側傾斜,係可於投射材進入外殼體51內之場合使該投射材往箱體18落入之構造。另外,外殼體51之內部空間之下部與箱體18之內部空間係以不圖示之既定部位連通。此外,於外殼體51之上端開口部可裝卸地裝設有蓋體51D。As shown in FIG. 3, the first sealing structure portion 50 (first sealing cylinder) is provided on the side of the inlet 20 of the casing 18 in the upper direction of the wire conveying direction than the inlet 20, and the outer casing of the first sealing structure 50 is provided. The body 51 is attached to the case 18. That is, the first seal structure portion 50 is provided between the carry-in side guide rotor 14 and the case 18. The bottom plate portion 51C of the outer casing 51 is inclined toward the lower side of the apparatus in the direction in which the wire is conveyed, and is configured to allow the projecting material to fall into the casing 18 when the projecting material enters the outer casing 51. Further, the lower portion of the inner space of the outer casing 51 communicates with the inner space of the casing 18 at a predetermined portion (not shown). Further, a lid body 51D is detachably attached to the opening at the upper end of the outer casing 51.

於第1密封構造部50之外殼體51係於搬入口20之對向部形成有貫通孔51A,於鄰接部形成有貫通孔51B,於上流側之貫通孔51A配置有導引筒構件(導引構件)52。導引筒構件52係與配置於箱體18之搬入口20之導引筒構件24大致同樣之形狀,配置為與與導引筒構件24軸心一致。此導引筒構件52係藉由導引孔52A之出口側縮小而亦發揮搬送時之線材12之搖動抑制機能。In the outer portion 51 of the first sealing structure portion 50, the through hole 51A is formed in the opposing portion of the inlet port 20, the through hole 51B is formed in the adjacent portion, and the guide tube member is disposed in the through hole 51A on the upstream side. Lead member) 52. The guide tube member 52 is substantially the same shape as the guide tube member 24 disposed at the carry-in port 20 of the case 18, and is disposed to coincide with the axis of the guide tube member 24. The guide roller member 52 is also reduced in the outlet side of the guide hole 52A, and also exhibits the rocking suppression function of the wire 12 at the time of conveyance.

於導引筒構件52與導引筒構件24之間設有第一密封部54。第一密封部54具備線材12可通過內側之第一筒狀部56、配置於第一筒狀部56之內側之第一密封體58。第一密封體58係於線材12之通過時在線材12與第一筒狀部56之內面之間做為投射材之漏出阻止用而發揮機能。另外,於第一筒狀部56之線材搬送方向之最上流部位及最下流部位設有形成有搬送通路用之貫通孔之平板部56C。A first sealing portion 54 is provided between the guiding cylinder member 52 and the guiding cylinder member 24. The first seal portion 54 includes a first cylindrical portion 56 through which the wire 12 can pass, and a first sealing member 58 disposed inside the first tubular portion 56. The first sealing body 58 functions as a leakage prevention of the projection material between the wire 12 and the inner surface of the first cylindrical portion 56 when the wire 12 passes. In addition, a flat plate portion 56C in which a through hole for a conveyance path is formed is provided at the most upstream portion and the most downstream portion of the first tubular portion 56 in the wire conveyance direction.

相對於此,如圖4所示,於箱體18之搬出口22側於比搬出口22更往線材搬送方向之下流側設有第二密封構造部60(第二密封筒),第二密封構造部60之外殼體61對箱體18安裝。亦即,第二密封構造部60係設於箱體18與搬出側導引轉子16之間。外殼體61之底板部61C係向線材搬送方向之上流側往裝置下方側傾斜,係可於投射材進入外殼體61內之場合使該投射材往箱體18落入之構造。另外,外殼體61之內部空間之下部與箱體18之內部空間係以不圖示之既定部位連通。此外,於外殼體61之上端開口部可裝卸地裝設有蓋體61D。On the other hand, as shown in FIG. 4, the second sealing structure portion 60 (second sealing cylinder) is provided on the side of the delivery port 22 of the casing 18 in the direction of the wire conveying direction from the delivery port 22, and the second sealing is provided. The outer casing 61 of the structural portion 60 is attached to the casing 18. That is, the second seal structure portion 60 is provided between the casing 18 and the carry-out side guide rotor 16. The bottom plate portion 61C of the outer casing 61 is inclined toward the lower side of the apparatus in the direction in which the wire is conveyed, and is configured to allow the projecting material to fall into the casing 18 when the projecting material enters the outer casing 61. Further, the lower portion of the inner space of the outer casing 61 communicates with the inner space of the casing 18 at a predetermined portion (not shown). Further, a lid body 61D is detachably attached to the opening at the upper end of the outer casing 61.

於第2密封構造部60之外殼體61內設有第二密封部64。第二密封部64係沿線材搬送方向串聯地複數(在本實施形態係二個)配置。第二密封部64具備線材12可通過內側之第二筒狀部66、配置於第二筒狀部66之內側之第二密封體68。第二密封體68係於線材12之通過時在線材12與第二筒狀部66之內面之間做為投射材之漏出阻止用而發揮機能。另外,於第二筒狀部66之線材搬送方向之最上流部位及最下流部位設有形成有搬送通路用之貫通孔之平板部66C。A second sealing portion 64 is provided in the outer casing 61 outside the second seal structure portion 60. The second seal portion 64 is disposed in series (two in the present embodiment) in series in the wire conveyance direction. The second seal portion 64 includes a second tubular portion 66 through which the wire 12 can pass, and a second seal 68 disposed inside the second tubular portion 66 . The second sealing body 68 functions to prevent leakage of the projection material between the wire 12 and the inner surface of the second cylindrical portion 66 when the wire 12 passes. In addition, a flat plate portion 66C in which a through hole for a conveyance path is formed is provided in the most upstream portion and the most downstream portion of the second cylindrical portion 66 in the wire conveyance direction.

於圖5以剖面圖顯示有第一密封部54,圖5(A)係沿圖3之5A-5A線之剖面圖,圖5(B)係沿圖3之5B-5B線之剖面圖。另外,第二密封部64(參照圖4)係與第一密封部54為實質上同樣之構造,故省略其圖示及說明。5 is a cross-sectional view taken along line 5A-5A of FIG. 3, and FIG. 5(B) is a cross-sectional view taken along line 5B-5B of FIG. 3. Further, since the second seal portion 64 (see FIG. 4) has substantially the same structure as the first seal portion 54, the illustration and description thereof are omitted.

如圖5所示,第一筒狀部56係由剖面V字狀之承載桶外殼56A、對應於承載桶外殼56A配置之剖面逆V字形狀之蓋體56B形成。另外,於圖5雖未圖示,但於承載桶外殼56A之內面及蓋體56B之內面貼有橡膠等彈性體亦可。於承載桶外殼56A貫通形成有投射材穿透孔156。此外,第一筒狀部56及第二筒狀部66之形狀並不限於上述之形狀,圓形等任意之形狀即可。As shown in Fig. 5, the first tubular portion 56 is formed by a V-shaped carrier case 56A having a V-shaped cross section and a cover VB having a V-shaped cross section disposed corresponding to the carrier case 56A. Further, although not shown in FIG. 5, an elastic body such as rubber may be attached to the inner surface of the drum case 56A and the inner surface of the lid body 56B. A projecting material penetration hole 156 is formed through the carrier barrel casing 56A. Further, the shape of the first tubular portion 56 and the second tubular portion 66 is not limited to the above-described shape, and may be any shape such as a circular shape.

如圖3及圖4所示,第一密封體58及第二密封體68係包含複數做為長條材之刷毛158、168而構成。於此等第一密封體58及第二密封體68在本實施形態係複數使用有刷毛158、168朝向單一方向之在正面視大致四角形狀(參照圖5)之刷構件58A、68A,複數刷構件58A、68A沿線材搬送方向串聯配置。此外,如圖5及圖6所示,第一密封體58係配置為各刷構件58A之刷毛158之方向於配列方向觀察交叉(在本實施形態係正交)。雖省略圖示,但顯示於圖4之第二密封體68亦配置為各刷構件68A之刷毛168之方向於配列方向觀察交叉(在本實施形態係正交)。藉此,顯示於圖3之第一密封體58及顯示於圖4之第二密封體68以刷毛158、168從複數方向延出交叉而形成迷宮式密封構造。另外,刷毛158、168在本實施形態雖係做為一例適用以樹脂纖維形成者,但為樹脂製以外之橡膠製或金屬製亦可。另外,所謂迷宮式密封構造係指藉由不密封之部分於交互交錯之方向以小間隔排列來防止投射材或粉塵通過不密封之部分之構造。此外,第一密封體58及第二密封體68以刷毛158、168構成,故比起以板材等構成之場合,可藉由柔軟之刷毛不將於表面附著之投射材以過度強之力除去而以複數次刮來除去。As shown in FIGS. 3 and 4, the first sealing body 58 and the second sealing body 68 are composed of a plurality of bristles 158 and 168 which are long pieces. In the present embodiment, the first sealing body 58 and the second sealing body 68 are plurally brushed by the brush members 158 and 168 which are oriented in a single direction in a front view and have a substantially square shape (see FIG. 5). The members 58A and 68A are arranged in series in the wire conveying direction. Further, as shown in FIGS. 5 and 6, the first sealing body 58 is disposed such that the direction of the bristles 158 of the respective brush members 58A is observed to intersect in the arrangement direction (orthogonal in the present embodiment). Although not shown in the drawings, the second sealing body 68 shown in FIG. 4 is also disposed such that the direction of the bristles 168 of the respective brush members 68A is observed to intersect in the arrangement direction (orthogonal in the present embodiment). Thereby, the first sealing body 58 shown in FIG. 3 and the second sealing body 68 shown in FIG. 4 are formed so that the bristles 158 and 168 are extended from the plural direction to form a labyrinth sealing structure. In the present embodiment, the bristles 158 and 168 are formed of a resin fiber as an example, but may be made of rubber or metal other than resin. Further, the so-called labyrinth seal structure refers to a configuration in which the unsealed portions are arranged at small intervals in the direction of the interlace to prevent the projection material or dust from passing through the unsealed portion. Further, since the first sealing body 58 and the second sealing body 68 are constituted by the bristles 158 and 168, they can be removed by excessively strong force by the projecting material which is not adhered to the surface by the soft bristles as compared with the case of a plate material or the like. It is removed by a plurality of scrapings.

如圖5所示,刷構件58A係保持刷毛158之刷基部258安裝於第一筒狀部56,刷毛158之部分以在線材搬送方向視呈大致U字狀之方式形成有狹縫58B。因狹縫58B而變短之刷毛158之前端係設定為連接於線材12,狹縫58B之寬度係設定為大致等於線材12之直徑。雖省略圖示,但顯示於圖4之第二密封體68亦為同樣之構造。As shown in Fig. 5, the brush member 58A holds the brush base portion 258 of the bristles 158 attached to the first cylindrical portion 56, and the portion of the bristles 158 is formed with a slit 58B so as to have a substantially U-shape in the direction in which the wire is conveyed. The front end of the bristles 158 which are shortened by the slit 58B is set to be connected to the wire 12, and the width of the slit 58B is set to be substantially equal to the diameter of the wire 12. Although not shown in the drawings, the second sealing body 68 shown in Fig. 4 has the same structure.

如圖4所示,於比第二密封部64更靠近線材搬送方向之下流側配置有氣流產生裝置70之做為氣體流出口之吹出口72。氣流產生裝置70係使往箱體18之內側之氣流產生之構成部,具備設於第二密封構造部60之外殼體61之上方側之鼓風扇74。鼓風扇74係外氣導入用,可藉由驅動馬達之驅動力而作動,排氣側連接於風道76。如圖4及圖7所示,風道76之下端部係連結於大致矩形箱狀之外殼部78之上端。於外殼部78之大致高度方向中央部以於線材搬送方向貫通之方式一體配設有做為筒狀體之導引筒體80。另外,風道76及導引筒體80係構成氣流產生裝置70之一部分。As shown in FIG. 4, an air outlet 72 as a gas outflow port of the airflow generating device 70 is disposed on the flow side below the second sealing portion 64 in the direction in which the wire is conveyed. The airflow generating device 70 is a component that generates a flow of air to the inside of the casing 18, and includes a blower fan 74 that is provided above the casing 61 outside the second seal structure 60. The blower fan 74 is for external air introduction, and can be actuated by the driving force of the drive motor, and the exhaust side is connected to the duct 76. As shown in FIGS. 4 and 7, the lower end portion of the duct 76 is coupled to the upper end of the substantially rectangular box-shaped outer casing portion 78. A guide cylinder 80 as a cylindrical body is integrally provided in a central portion in the substantially height direction of the outer casing portion 78 so as to penetrate in the wire conveying direction. In addition, the air duct 76 and the guiding cylinder 80 constitute part of the airflow generating device 70.

導引筒體80係配置於比第二密封部64更靠近線材搬送方向之下流側並形成為大致筒狀,線材12可通過其軸心部。於導引筒體80係沿搬送通路貫通之導引孔80A從線材搬送方向之上流側往線材搬送方向之下流側先逐漸變小徑,再以吹出口72為分界逐漸變大徑。導引孔80A之軸心係配置為與線材12之搬送通路之中心一致。藉由將吹出口72形成於最小徑之部分,從吹出口72噴出之氣流以高速流過線材12之表面,容易去除附著之投射材等,且可防止在該部分之線材12之往下流側之空氣之洩漏。此外,藉由在其上流側徑逐漸變大,可減少對氣流之抵抗之增加。The guide cylinder 80 is disposed closer to the flow side than the second seal portion 64 in the direction in which the wire is conveyed, and is formed in a substantially cylindrical shape, and the wire 12 can pass through the axial portion. The guide hole 80A through which the guide cylinder 80 is inserted along the conveyance path gradually decreases in diameter from the upstream side in the wire conveyance direction to the flow direction downstream of the wire conveyance direction, and gradually increases in diameter by the outlet port 72 as a boundary. The axis of the guide hole 80A is arranged to coincide with the center of the conveying path of the wire 12. By forming the air outlet 72 at the portion of the minimum diameter, the airflow ejected from the air outlet 72 flows at a high speed over the surface of the wire 12, and the attached projection material or the like can be easily removed, and the downstream side of the wire 12 at the portion can be prevented. The leakage of air. In addition, the increase in resistance to airflow can be reduced by gradually increasing the diameter of the upstream side.

此外,於導引筒體80形成有做為連通外殼部78之內部空間78A與導引孔80A之通風孔之通風狹縫80B。通風狹縫80B係為了使往箱體18(參照圖4)內側之氣流之風向指向而形成,從導引筒體80之外周側往軸心部側往線材搬送方向之上流側傾斜,於涵蓋導引筒體80之繞軸心部之全周形成。前述之吹出口72係設於通風狹縫80B之導引孔80A側之開口部。Further, a ventilation slit 80B is formed in the guide cylinder 80 as a ventilation hole that communicates with the internal space 78A of the outer casing portion 78 and the guide hole 80A. The ventilating slit 80B is formed so as to be directed toward the wind direction of the airflow inside the casing 18 (see FIG. 4), and is inclined from the outer peripheral side of the guiding cylinder 80 toward the axial center side in the direction in which the wire is conveyed. The guiding cylinder 80 is formed around the entire circumference of the axial center portion. The above-described air outlet 72 is provided in an opening portion on the side of the guide hole 80A of the ventilation slit 80B.

(作用、效果)(Effect)

其次,針對上述實施形態之作用及效果說明。Next, the action and effect of the above embodiment will be described.

如圖1所示,從線材供給裝置(圖示省略)供給之線材12係在藉由搬入側導引轉子14高度位置決定之狀態下經第一密封部54從箱體18之搬入口20側搬入。於線材12通過搬入側導引轉子14上時,線材12搬送之速度藉由速度檢出感測器45(參照圖3)檢出。As shown in Fig. 1, the wire material 12 supplied from the wire supply device (not shown) is removed from the inlet 20 side of the casing 18 via the first sealing portion 54 while being determined by the height position of the loading-side guiding rotor 14. Move in. When the wire 12 is guided to the rotor 14 by the loading side, the speed at which the wire 12 is conveyed is detected by the speed detecting sensor 45 (see FIG. 3).

此線材12係在箱體18之投射室18A以投射裝置26投射投射材,於線材12表面附著之鏽皮、生鏽等附著物除去。其後,線材12從箱體18之搬出口22搬出,經第二密封部64通過搬出側導引轉子16上。在比搬出側導引轉子16更往線材搬送方向之下流側係藉由線材檢知裝置44檢知線材12之有無。之後,以不圖示之捲取裝置捲取。The wire 12 is projected by the projection device 26 in the projection chamber 18A of the casing 18, and the deposits such as scales and rust adhering to the surface of the wire 12 are removed. Thereafter, the wire 12 is carried out from the delivery port 22 of the casing 18, and the rotor 16 is guided by the second sealing portion 64 through the carry-out side. The presence or absence of the wire 12 is detected by the wire detecting device 44 on the flow side from the carry-out side guide rotor 16 in the direction in which the wire is conveyed. Thereafter, it is taken up by a winding device (not shown).

在此,於圖8顯示之ECU 46係基於速度檢出感測器45之檢出結果及線材檢知裝置44之檢出結果調節投射材供給裝置28之往投射裝置26之投射材之供給量。具體而言,ECU 46係在在速度檢出感測器45之檢出速度為既定速度未滿之場合線材檢知裝置44檢知線材12(參照圖1)之狀態下使活塞28B3變位為投射材供給裝置28中之投射材閘門28A之開度為半開,在在速度檢出感測器45之檢出速度為既定速度以上之場合線材檢知裝置44檢知線材12之狀態下使活塞28B3變位為投射材供給裝置28中之投射材閘門28A之開度為全開。此外,ECU 46在速度檢出感測器45沒有檢出線材12(參照圖1)之搬送速度(沒有檢出線材12之搬送狀態)且線材檢知裝置44已檢出線材12之狀態下控制為使投射材閘門28A之開度維持,亦即不改變活塞28B3之位置,在速度檢出感測器45沒有檢出線材12之搬送速度且線材檢知裝置44沒有檢知線材12之狀態下使活塞28B3變位為投射材閘門28A之開度為全閉。藉由此等,調節投射材供給裝置28之往投射裝置26之投射材之供給量。Here, the ECU 46 shown in FIG. 8 adjusts the supply amount of the projection material of the projection material supply device 28 to the projection device 26 based on the detection result of the speed detecting sensor 45 and the detection result of the wire detecting device 44. . Specifically, the ECU 46 displaces the piston 28B3 in a state where the wire detecting device 44 detects the wire 12 (see FIG. 1) when the speed detected by the speed detecting sensor 45 is not full. The opening degree of the projection material shutter 28A in the projection material supply device 28 is half open, and when the detection speed of the speed detecting sensor 45 is equal to or higher than the predetermined speed, the wire detecting device 44 detects the wire 12 and causes the piston. The displacement of 28B3 is that the opening of the projection material gate 28A in the projectile supply device 28 is fully open. Further, the ECU 46 controls the speed detecting sensor 45 not to detect the transport speed of the wire 12 (see FIG. 1) (the transport state of the wire 12 is not detected) and the wire detecting device 44 has detected the wire 12 In order to maintain the opening degree of the projection material shutter 28A, that is, without changing the position of the piston 28B3, the speed detecting sensor 45 does not detect the conveying speed of the wire 12 and the wire detecting device 44 does not detect the wire 12 The displacement of the piston 28B3 is such that the opening of the projectile gate 28A is fully closed. By this, the supply amount of the projection material of the projection material supply device 28 to the projection device 26 is adjusted.

此外,在本實施形態之噴珠裝置10係於箱體18之搬入口20配置有第一密封部54,於此第一密封部54係於線材12可通過之第一筒狀部56之內側配置有第一密封體58。第一密封體58係於線材12之通過時在線材12與第一筒狀部56之內面之間做為投射材之漏出阻止用。因此,投射之投射材之從搬入口20側之漏出藉由第一密封體58阻止。相對於此,於箱體18之搬出口22配置有第二密封部64,於此第二密封部64係於線材12可通過之第二筒狀部66之內側配置有第二密封體68。第二密封體68係於線材12之通過時在線材12與第二筒狀部66之內面之間做為投射材之漏出阻止用。因此,基本上投射之投射材之從搬出口22側之漏出藉由第二密封體68阻止。但會有伴隨線材12之搬出而殘留於線材12上之投射材或粉塵與線材12一起搬出之可能性。Further, in the bead apparatus 10 of the present embodiment, the first sealing portion 54 is disposed in the inlet 20 of the casing 18, and the first sealing portion 54 is attached to the inner side of the first cylindrical portion 56 through which the wire 12 can pass. A first sealing body 58 is disposed. The first sealing body 58 is used as a leakage preventing projection of the projection material between the wire 12 and the inner surface of the first cylindrical portion 56 when the wire 12 passes. Therefore, the leakage of the projected projecting material from the side of the carry-in port 20 is blocked by the first sealing body 58. On the other hand, the second sealing portion 64 is disposed at the outlet 22 of the casing 18, and the second sealing portion 64 is disposed on the inner side of the second cylindrical portion 66 through which the wire 12 can pass. The second sealing body 68 is used as a leakage preventing projection of the projection material between the wire 12 and the inner surface of the second cylindrical portion 66 when the wire 12 passes. Therefore, the leakage of the substantially projected projecting material from the side of the delivery port 22 is blocked by the second sealing body 68. However, there is a possibility that the projection material or the dust remaining on the wire 12 accompanying the removal of the wire 12 may be carried out together with the wire 12.

然而,在本實施形態之噴珠裝置10係於比第二密封部64更往前述搬送方向之下流側配置有氣流產生裝置70之吹出口72,氣流產生裝置70係使往前述箱體18之內側之氣流產生,故即使於線材12上有投射材或粉塵殘留,此種投射材或粉塵亦會與氣流一起返回箱體18之內側。此外,在第二密封體68從線材12脫離之投射材或粉塵容易與氣流一起返回箱體18之內側。However, in the bead apparatus 10 of the present embodiment, the air outlet generating unit 70 is disposed on the flow side of the second sealing portion 64 in the lower side in the transport direction, and the air flow generating unit 70 is disposed in the housing 18 Since the inner airflow is generated, even if there is a projection material or dust remaining on the wire 12, the projection material or dust is returned to the inner side of the casing 18 together with the air current. Further, the projecting material or dust which is detached from the wire 12 at the second sealing body 68 is easily returned to the inside of the casing 18 together with the air current.

另一方面,在於圖1顯示之箱體18之內部,藉由投射裝置26投射落下之投射材在箱體18之內部之底部側藉由螺旋輸送機32從沿線材搬送方向之長度方向之兩側(圖中之左右兩側)往中央部搬送集中。螺旋輸送機32之投射材之搬送目標處配置有斗式升降機34之下端部,故集中之投射材藉由斗式升降機34往箱體18之上方側搬送,藉由包含斗式升降機34之循環裝置30往投射裝置26循環。於循環裝置30之循環路徑設有分離器40,投射材以外之異物及投射之投射材之中裂開之投射材藉由分離器40分離除去。此外,藉由連接於分離器40之集塵機42吸引包含粉塵之空氣。藉由此集塵機42之吸引,透過分離器40等箱體18之內部成為負壓,故以氣流產生裝置70產生之往箱體18之內側之氣流容易進入箱體18之內部,投射材往箱體18之內側有效率地返回。On the other hand, in the inside of the casing 18 shown in Fig. 1, the projecting material dropped by the projection device 26 projects on the bottom side of the inside of the casing 18 by the screw conveyor 32 from the length direction along the wire conveying direction. The side (left and right sides in the figure) is transported to the center. The lower end of the bucket elevator 34 is disposed at the conveying target of the projecting material of the screw conveyor 32. Therefore, the concentrated projecting material is conveyed to the upper side of the casing 18 by the bucket elevator 34, and the circulation of the bucket elevator 34 is included. Device 30 circulates toward projection device 26. The separator 40 is provided in the circulation path of the circulation device 30, and the foreign matter other than the projection material and the projection material which is split among the projected projection materials are separated and removed by the separator 40. Further, the dust-containing air is sucked by the dust collector 42 connected to the separator 40. By the suction of the dust collector 42, the inside of the casing 18 such as the separator 40 becomes a negative pressure, so that the airflow generated by the airflow generating device 70 to the inside of the casing 18 easily enters the inside of the casing 18, and the projection material is directed to the tank. The inside of the body 18 returns efficiently.

如以上說明,根據本實施形態之噴珠裝置10,可防止或抑制投射材等從裝置內洩漏,抑制多餘之投射。As described above, according to the bead apparatus 10 of the present embodiment, it is possible to prevent or suppress leakage of the projection material or the like from the inside of the apparatus, and to suppress unnecessary projection.

[第2實施形態][Second Embodiment]

其次,針對做為本發明之第2實施形態之表面處理裝置之噴珠裝置,使用圖9~圖11說明。於圖9係以前視圖顯示有本發明之第2實施形態之噴珠裝置90,於圖10係以左側面圖顯示有噴珠裝置90,於圖11係以右側面圖顯示有噴珠裝置。如此等圖所示,噴珠裝置90係於代替螺旋輸送機32(參照圖1)而於箱體18之底部形成有傾斜部92之方面與第1實施形態之噴珠裝置10(參照圖1)不同。其他構成係與第1實施形態大致同樣之構成。因此,針對與第1實施形態實質上同樣之構成部賦予相同符號並省略說明。Next, a bead apparatus which is a surface treatment apparatus according to a second embodiment of the present invention will be described with reference to Figs. 9 to 11 . Fig. 9 shows a bead device 90 according to a second embodiment of the present invention in a front view. Fig. 10 shows a bead device 90 in a left side view, and a bead device in a right side view in Fig. 11. As shown in the figures, the bead apparatus 90 is the bead apparatus 10 of the first embodiment in which the inclined portion 92 is formed at the bottom of the casing 18 instead of the screw conveyor 32 (see FIG. 1) (see FIG. 1). )different. The other configuration is substantially the same as that of the first embodiment. Therefore, the same components as those in the first embodiment are denoted by the same reference numerals and will not be described.

如圖9所示,於箱體18之底部形成有向沿線材搬送方向之長度方向之中央部往下方側傾斜之一對傾斜部92。傾斜部92之對水平面之傾斜角度A設定為25°≦A≦45°較理想,在本實施形態係做為一例設定為A=28°。此外,將箱體18之沿線材搬送方向之長度L1與一對傾斜部92之沿線材搬送方向之長度之和L2(圖中之L21與L22之和)設定為L2≧(3/4)*L1之關係成立。此外,於一對傾斜部92之下端部間配置有斗式升降機34之下端部(收集口34D側)。As shown in Fig. 9, at the bottom of the casing 18, a pair of inclined portions 92 are formed which are inclined toward the lower side in the center portion in the longitudinal direction of the wire conveying direction. The inclination angle A of the inclined portion 92 to the horizontal plane is preferably set to 25° ≦ A ≦ 45°, and in the present embodiment, it is set as A=28° as an example. Further, the length L1 of the casing 18 along the wire conveying direction and the length L2 of the pair of inclined portions 92 along the wire conveying direction (the sum of L21 and L22 in the drawing) are set to L2 ≧ (3/4)* The relationship of L1 is established. Further, a lower end portion of the bucket elevator 34 (on the side of the collecting port 34D) is disposed between the lower end portions of the pair of inclined portions 92.

(作用、效果)(Effect)

藉由以上說明之第2實施形態之噴珠裝置90亦可藉由與前述之第1實施形態同樣之作用而防止或抑制投射材等從裝置內洩漏,抑制多餘之投射。According to the bead apparatus 90 of the second embodiment described above, it is possible to prevent or suppress leakage of the projection material or the like from the inside of the apparatus by the same action as in the first embodiment described above, and to suppress unnecessary projection.

此外,根據本實施形態之噴珠裝置90,藉由投射並落下之投射材沿一對傾斜部92流落,投射材往沿搬送方向之長度方向之中央部側集中。集中之投射材藉由斗式升降機34往箱體18之上方側搬送,以包含斗式升降機34之循環裝置30往投射裝置26循環。Further, according to the bead apparatus 90 of the present embodiment, the projection material that has been projected and dropped flows along the pair of inclined portions 92, and the projection material is concentrated toward the center portion side in the longitudinal direction of the conveying direction. The concentrated projecting material is conveyed to the upper side of the casing 18 by the bucket elevator 34, and the circulation device 30 including the bucket elevator 34 is circulated to the projection device 26.

此外,藉由設於箱體18底部之傾斜部92之對水平面之傾斜角度A設定為25°≦A,落下至傾斜部92上之投射材容易沿傾斜部92流動。另一方面,若噴珠裝置90之高度變高,雖將作業者之操作位置升高之升高手段成為必要或會產生挖坑並於坑內配置噴珠裝置90之下部已將噴珠裝置90設置於低位置之必要,但在本實施形態係藉由設定為A≦45°,抑制噴珠裝置90之高度尺寸。Further, the inclination angle A of the inclined surface portion 92 provided at the bottom of the casing 18 is set to 25° ≦A, and the projection material dropped onto the inclined portion 92 easily flows along the inclined portion 92. On the other hand, if the height of the beading device 90 becomes high, it is necessary to increase the operating position of the operator or to cause digging and to arrange the beading device in the lower part of the beading device 90. The 90 is required to be placed at a low position. However, in the present embodiment, the height of the beading device 90 is suppressed by setting it to A 45°.

此外,將箱體18之沿線材搬送方向之長度L1與一對傾斜部92之沿前述搬送方向之長度之和L2設定為L2≧(3/4)*L1之關係成立,故落下至傾斜部92上之投射材藉由傾斜部92集中於狹窄之限制範圍。在本實施形態係投射材集中於斗式升降機34以一台可處理之範圍,投射材以一台之斗式升降機34效率良好地往箱體18之上方側搬送。Further, the relationship between the length L1 of the casing 18 along the wire conveying direction and the length L2 of the pair of inclined portions 92 along the conveying direction is set to L2 ≧ (3/4)*L1, so that it falls to the inclined portion. The projection material on 92 is concentrated by the inclined portion 92 within the narrow limit. In the present embodiment, the projecting material is concentrated on the bucket elevator 34 in a range that can be handled, and the projectile material is efficiently transported to the upper side of the casing 18 by the bucket elevator 34.

[實施形態之補足說明][Complementary description of the embodiment]

另外,在上述實施形態於圖1等顯示之噴珠裝置10、90雖係適用將投射材以離心力加速投射之離心式投射材投射裝置做為投射裝置26,但於表面處理裝置適用之投射裝置為例如與壓縮空氣一起將投射材押送並從噴嘴噴射之空氣噴嘴式之投射裝置等其他投射裝置亦可。Further, in the beading apparatuses 10 and 90 shown in FIG. 1 and the like as described above, the centrifugal projection material projection device that accelerates projection of the projection material by centrifugal force is used as the projection device 26, but the projection device is applied to the surface treatment device. Other projection devices such as an air nozzle type projection device that ejects the projection material together with the compressed air and ejects it from the nozzle may be used.

此外,在上述實施形態雖係如圖4所示為檢知手段具備接近開關44E之線材檢知裝置44,但檢知手段為例如具備投光器及受光器且藉由被處理對象物之有無導致之受光量之變化來檢知該被處理對象物之有無之光學感測器等其他檢知手段亦可。Further, in the above-described embodiment, as shown in FIG. 4, the detecting means includes the wire detecting device 44 of the proximity switch 44E. However, the detecting means includes, for example, a light projector and a light receiver, and is caused by the presence or absence of the object to be processed. Other detecting means such as an optical sensor that detects the presence or absence of the object to be processed may be detected by the change in the amount of light received.

此外,在上述實施形態雖係做為檢知手段之線材檢知裝置44相對投射裝置26配置於線材搬送方向之下流側,但檢知被處理對象物之有無之檢知手段相對投射裝置26配置於線材搬送方向(被處理對象物之搬送方向)之上流側亦可,此外,相對投射裝置26配置於前述線材搬送方向之上流側及下流側之兩方亦可。Further, in the above-described embodiment, the wire detecting device 44, which is a detecting means, is disposed on the flow side below the wire conveying direction with respect to the projection device 26, but the detecting means for detecting the presence or absence of the object to be processed is disposed with respect to the projection device 26. In the wire conveyance direction (the conveyance direction of the object to be processed), the flow side may be provided on the flow side, and the projection device 26 may be disposed on both the flow side and the downstream side in the wire conveyance direction.

此外,在上述實施形態雖係如圖3所示做為速度檢出手段之速度檢出感測器45相對投射裝置26配置於線材搬送方向之上流側,但檢出被處理對象物搬送之速度之速度檢出手段相對投射裝置26配置於線材搬送方向(被處理對象物之搬送方向)之下流側亦可。此外,將速度檢出感測器45做為檢知被處理對象物之有無之檢知手段使用亦可。Further, in the above-described embodiment, the speed detecting sensor 45, which is a speed detecting means as shown in FIG. 3, is disposed on the flow side in the wire conveying direction with respect to the projection device 26, but detects the speed at which the object to be processed is transported. The speed detecting means may be disposed on the flow side below the wire conveying direction (the conveying direction of the object to be processed) with respect to the projection device 26. Further, the speed detecting sensor 45 may be used as a detecting means for detecting the presence or absence of an object to be processed.

此外,在上述實施形態雖係如圖8所示投射材供給裝置28藉由投射材閘門28A擺動來開閉內筒部28C2之下部開口部28C3而可變更往投射裝置26之投射材之供給量,但投射材供給裝置28為例如藉由投射材閘門28A滑動移動來開閉內筒部28C2之下部開口部28C3而可變更往投射裝置26之投射材之供給量之構成亦可。Further, in the above-described embodiment, the projection material supply device 28 can change the supply amount of the projection material to the projection device 26 by opening and closing the lower opening portion 28C3 of the inner tubular portion 28C2 by the projection material shutter 28A as shown in FIG. However, the projection material supply device 28 may be configured to change the supply amount of the projection material to the projection device 26 by opening and closing the lower opening portion 28C3 of the inner tubular portion 28C2 by sliding the projection material shutter 28A.

此外,在上述實施形態雖係ECU 46基於速度檢出感測器45之檢出結果及線材檢知裝置44之檢出結果調節投射材供給裝置28之往投射裝置26之投射材之供給量,但控制手段僅基於檢知手段之檢知結果調節投射材供給裝置28之往投射裝置26之投射材之供給量亦可。在此場合,控制手段可適用例如於檢知手段檢知被處理對象物之場合係使投射材閘門28A全開而於檢知手段沒有檢知被處理對象物之場合係使投射材閘門28A全閉之設定。Further, in the above-described embodiment, the ECU 46 adjusts the supply amount of the projection material of the projection material supply device 28 to the projection device 26 based on the detection result of the speed detecting sensor 45 and the detection result of the wire detecting device 44. However, the control means may adjust the supply amount of the projection material of the projection material supply device 28 to the projection device 26 based only on the detection result of the detection means. In this case, for example, when the detection means detects the object to be processed, the projection material shutter 28A is fully opened, and when the detection means does not detect the object to be processed, the projection material gate 28A is fully closed. The setting.

此外,在上述實施形態雖係氣流產生裝置70包含外氣導入用之鼓風扇74而構成,但氣流產生裝置為例如包含供給壓縮空氣之壓縮空氣供給裝置而構成且於連接於壓縮空氣供給裝置之噴嘴之前端具有做為氣體流出口之噴射口之氣流產生裝置等其他氣流產生裝置亦可。Further, in the above embodiment, the airflow generating device 70 includes the blower fan 74 for introducing the outside air, but the airflow generating device is configured to include a compressed air supply device that supplies compressed air, and is connected to the compressed air supply device. Other airflow generating means such as an airflow generating means as an injection port of the gas outflow port may be provided at the front end of the nozzle.

此外,在上述實施形態雖係氣流產生裝置70具備形成有通風狹縫80B之導引筒體80,但氣流產生裝置為不具備此種筒狀體而具備噴嘴往搬送通路側往箱體之搬出口側傾斜朝向之構造亦可。Further, in the above-described embodiment, the airflow generation device 70 includes the guide cylinder 80 in which the ventilation slit 80B is formed. However, the airflow generation device does not include such a cylindrical body, and the nozzle is provided to the transport path side to the cabinet. The configuration in which the outlet side is inclined is also possible.

此外,在上述實施形態雖係涵蓋導引筒體80之繞軸心部之全周形成有通風狹縫80B,但通風孔為筒狀體之繞軸心部隔間隔複數形成亦可。Further, in the above-described embodiment, the ventilation slit 80B is formed over the entire circumference of the axial center of the guide cylinder 80. However, the vent hole may be formed by a plurality of intervals around the axial center of the cylindrical body.

此外,在上述實施形態係第一密封體58及第二密封體68形成迷宮式密封構造構造,為了防止投射材之洩漏此種構造雖更理想,但第一密封體及第二密封體為例如僅以往單一方向延出之刷毛構成之不形成迷宮式密封構造之第一密封體及第二密封體亦可。Further, in the above-described embodiment, the first sealing body 58 and the second sealing body 68 form a labyrinth sealing structure, and in order to prevent leakage of the projection material, the structure is more preferable, but the first sealing body and the second sealing body are, for example. It is also possible to form the first sealing body and the second sealing body which do not form the labyrinth sealing structure, and the bristles which are formed in the unidirectional direction.

此外,在上述實施形態雖係第一密封體58及第二密封體68以刷毛158、168構成迷宮式密封構造,但第一密封體及第二密封體為例如例如以可彈性變形之複數橡膠製之線狀體或細帶狀體從複數方向延出交叉形成形成迷宮式密封構造者等其他第一密封體及第二密封體亦可。此外,於第一密封體及第二密封體複數使用前述複數橡膠製之線狀體或細帶狀體之延出方向朝向單一方向之構件且前述複數構件沿前述搬送方向串聯配置且各構件之延出方向配置為於配列方向觀察交叉。Further, in the above-described embodiment, the first sealing body 58 and the second sealing body 68 constitute a labyrinth sealing structure by the bristles 158 and 168, but the first sealing body and the second sealing body are, for example, a plurality of rubbers which are elastically deformable, for example. The linear body or the thin strip-shaped body may be formed by extending from the plural direction to form other first sealing bodies and second sealing bodies such as a labyrinth seal structure. Further, in the first sealing body and the second sealing body, the member in which the linear body or the thin strip-shaped body made of the plurality of rubbers is oriented in a single direction is used in plural, and the plurality of members are arranged in series in the conveying direction and each member is The extension direction is configured to observe the intersection in the arrangement direction.

此外,在上述實施形態雖係於第一密封體58及第二密封體68複數使用刷毛158、168朝向單一方向之刷構件58A、68A,複數刷構件58A、68A沿線材搬送方向串聯配置且各刷構件58A、68A之刷毛158、168之方向配置為於配列方向觀察交叉,但於第一密封體58及第二密封體68例如適用單一刷構件且適用該刷毛從複數方向延出交叉而迷宮式密封構造形成者亦可。Further, in the above-described embodiment, the first sealing body 58 and the second sealing body 68 are used in a plurality of brush members 158 and 168 toward the brush members 58A and 68A in the single direction, and the plurality of brush members 58A and 68A are arranged in series in the wire conveying direction. The directions of the bristles 158 and 168 of the brush members 58A and 68A are arranged to intersect in the arrangement direction. However, for the first sealing body 58 and the second sealing body 68, for example, a single brush member is applied and the bristles are applied to extend from the plural direction to the labyrinth. The seal structure can also be formed.

此外,在上述實施形態雖係保持刷毛158之刷基部258形成為直線狀,但保持刷毛之刷基部為形成為圓形狀或螺旋形狀等其他形狀者亦可。Further, in the above-described embodiment, the brush base portion 258 for holding the bristles 158 is formed linearly, but the brush base portion for holding the bristles may be formed into other shapes such as a circular shape or a spiral shape.

此外,在上述實施形態雖係第二密封部64沿搬送方向串聯地複數(二個)配置,從防止投射材之洩漏之觀點係此種構成更理想,但為第二密封部配置一個之構成亦可。此外,第二密封部64沿搬送方向串聯地配置三個以上亦可。Further, in the above-described embodiment, the second sealing portion 64 is disposed in series (two) in series in the conveying direction, and this configuration is more preferable from the viewpoint of preventing leakage of the projection material, but the second sealing portion is disposed in one configuration. Also. Further, the second sealing portion 64 may be arranged in series of three or more in the conveying direction.

此外,在上述實施形態雖係包含第一密封部54之第一密封構造部50對箱體18之搬入口20於線材搬送方向之上流側鄰接設置,但包含第一密封部之構造部對箱體18之搬入口20於線材搬送方向(被處理對象物之搬送方向)之下流側鄰接設置亦可。Further, in the above-described embodiment, the first sealing structure portion 50 including the first sealing portion 54 is provided adjacent to the upstream side of the loading port 20 of the casing 18 in the wire conveying direction, but the structural portion including the first sealing portion is opposed to the casing. The inlet 20 of the body 18 may be disposed adjacent to the flow side in the wire conveying direction (the conveying direction of the object to be processed).

此外,在上述實施形態雖係包含第二密封部64之第二密封構造部60對箱體18之搬出口22於線材搬送方向之下流側鄰接設置,但包含第二密封部之構造部對箱體18之搬入口20於線材搬送方向(被處理對象物之搬送方向)之上流側鄰接設置亦可。Further, in the above-described embodiment, the second sealing structure portion 60 including the second sealing portion 64 is provided adjacent to the lower side of the wire carrying direction of the casing 18, but the structural portion including the second sealing portion is provided. The inlet 20 of the body 18 may be disposed adjacent to the upstream side in the wire conveying direction (the conveying direction of the object to be processed).

此外,在上述實施形態雖係設有循環裝置30,從使投射材循環在利用之觀點係設有循環裝置30之構成更理想,但為沒有循環裝置之表面處理裝置亦可。Further, in the above-described embodiment, the circulation device 30 is provided, and it is more preferable that the circulation device 30 is provided from the viewpoint of circulating the projection material, but the surface treatment device may be omitted.

此外,在上述實施形態雖係傾斜部92之對水平面之傾斜角度A設定為25°≦A≦45°,從抑制裝置之高度尺寸同時使投射材容易流落之觀點係此種構成更理想,但傾斜部之對水平面之傾斜角度A亦可設定為A<25°或A>45°。Further, in the above-described embodiment, the inclination angle A of the inclined portion 92 to the horizontal plane is set to 25°≦A≦45°, and the configuration in which the projection material is easily flowed from the height dimension of the suppression device is preferable. The inclination angle A of the inclined portion to the horizontal plane can also be set to A < 25 ° or A > 45 °.

此外,在上述實施形態雖係將箱體18之沿線材搬送方向之長度L1與一對傾斜部92之沿線材搬送方向之長度之和L2(圖9之L21與L22之和)設定為L2≧(3/4)*L1之關係成立,從將落下至傾斜部92上之投射材藉由傾斜部集中於狹窄之限制範圍之觀點係此種設定更理想,但,亦可設定為L2<(3/4)*L1。Further, in the above embodiment, the length L1 of the casing 18 along the wire conveying direction and the length L2 of the pair of inclined portions 92 along the wire conveying direction (the sum of L21 and L22 in Fig. 9) are set to L2. (3/4) * The relationship of L1 is established, and the setting of the projection material to be dropped on the inclined portion 92 by the inclined portion is concentrated in the narrow restriction range is preferable, but it may be set to L2 < ( 3/4) *L1.

另外,在上述實施形態雖係表面處理裝置為噴珠裝置10、90,但表面處理裝置為例如shot peening裝置亦可。Further, in the above embodiment, the surface treatment apparatus is the bead apparatus 10 and 90, but the surface treatment apparatus may be, for example, a shot peening apparatus.

此外,在上述實施形態雖係針對被處理對象物為線材12之噴珠裝置10、90說明,但表面處理裝置為例如處理被處理對象物為從表面處理裝置之上流側捲出在下流側捲取之帶鋼、棒狀構件、板狀構件等其他被處理對象物之表面處理裝置亦可。Further, in the above-described embodiment, the bead apparatus 10 and 90 for the object to be processed are the wire material 12, but the surface treatment apparatus is, for example, the object to be processed is rolled out from the upstream side of the surface treatment apparatus on the downstream side. A surface treatment apparatus for taking other objects to be processed such as a steel strip, a rod-shaped member, or a plate-shaped member may be used.

此外,在上述實施形態雖係噴珠裝置10、90具備第一密封部54、第二密封部64、氣流產生裝置70之構成,但表面處理裝置為不具備此等之任一者之構成或不具備此等全部之構成亦可。Further, in the above-described embodiment, the beading devices 10 and 90 include the first sealing portion 54, the second sealing portion 64, and the airflow generating device 70. However, the surface treatment device does not have any of these configurations or It is also possible not to have all of these components.

另外,上述實施形態及上述之複數變形例可適當組合實施。Further, the above embodiment and the above-described plural modifications can be combined as appropriate.

10...噴珠裝置(表面處理裝置)10. . . Beading device (surface treatment device)

12...線材(被處理對象物)12. . . Wire (object to be processed)

18...箱體18. . . Box

18A...投射室18A. . . Projection room

20...搬入口20. . . Move in

22...搬出口twenty two. . . Move out

26...投射裝置26. . . Projection device

28...投射材供給裝置28. . . Projection material supply device

30...循環裝置30. . . Circulator

34...斗式升降機34. . . Bucket lift

40...分離器40. . . Splitter

42...集塵機42. . . Dust collector

44...線材檢知裝置(檢知手段)44. . . Wire detection device (detection means)

45...速度檢出感測器(速度檢出手段)45. . . Speed detection sensor (speed detection means)

46...ECU(控制手段)46. . . ECU (control means)

54...第一密封部54. . . First seal

56‧‧‧第一筒狀部56‧‧‧First tubular

58‧‧‧第一密封體58‧‧‧First seal

64‧‧‧第二密封部64‧‧‧Second seal

66‧‧‧第二筒狀部66‧‧‧Second tubular part

68‧‧‧第二密封體68‧‧‧Second seal

70‧‧‧氣流產生裝置70‧‧‧Airflow generating device

72‧‧‧吹出口(氣體流出口)72‧‧‧Blowout (gas outlet)

90‧‧‧噴珠裝置(表面處理裝置)90‧‧‧Beading device (surface treatment device)

S‧‧‧投射材S‧‧‧projection

X‧‧‧線材搬送方向(搬送方向)X‧‧‧Wire conveying direction (transport direction)

圖1為顯示本發明之第1實施形態之噴珠裝置之前視圖。Fig. 1 is a front view showing a bead apparatus according to a first embodiment of the present invention.

圖2為圖1之噴珠裝置之左側面圖。Figure 2 is a left side view of the bead apparatus of Figure 1.

圖3為擴大顯示圖1之噴珠裝置之搬入口側之部分擴大圖。Fig. 3 is a partially enlarged view showing an enlarged entrance side of the bead apparatus of Fig. 1;

圖4為擴大顯示圖1之噴珠裝置之搬出口側之部分擴大圖。Fig. 4 is a partially enlarged view showing the expansion port side of the bead apparatus of Fig. 1;

圖5為顯示圖3之刷之剖面圖。圖5(A)係沿圖3之5A-5A線之擴大剖面圖。圖5(B)係沿圖3之5B-5B線之擴大剖面圖。Figure 5 is a cross-sectional view showing the brush of Figure 3. Fig. 5(A) is an enlarged cross-sectional view taken along line 5A-5A of Fig. 3. Fig. 5(B) is an enlarged cross-sectional view taken along line 5B-5B of Fig. 3.

圖6為以圖3之箭頭6方向視圖示之擴大圖。Fig. 6 is an enlarged view showing the direction of the arrow 6 in Fig. 3;

圖7為擴大顯示圖4之氣流產生裝置之一部分之半剖面之立體圖。Figure 7 is a perspective view showing a half section of a portion of the airflow generating device of Figure 4 in an enlarged manner.

圖8為顯示第1投射材供給裝置之概略構成等之示意構成圖。FIG. 8 is a schematic configuration diagram showing a schematic configuration and the like of the first projecting material supply device.

圖9為顯示本發明之第2實施形態之噴珠裝置之前視圖。Fig. 9 is a front view showing a bead apparatus according to a second embodiment of the present invention.

圖10為圖9之噴珠裝置之左側面圖。Figure 10 is a left side elevational view of the bead apparatus of Figure 9.

圖11為圖9之噴珠裝置之右側面圖。Figure 11 is a right side elevational view of the bead apparatus of Figure 9.

10...噴珠裝置(表面處理裝置)10. . . Beading device (surface treatment device)

12...線材(被處理對象物)12. . . Wire (object to be processed)

14...搬入側導引轉子14. . . Moving into the side guiding rotor

16...搬出側導引轉子16. . . Carry out the side guiding rotor

18...箱體18. . . Box

18A...投射室18A. . . Projection room

20...搬入口20. . . Move in

22...搬出口twenty two. . . Move out

24...導引筒構件twenty four. . . Guide tube member

25...導引筒25. . . Guide tube

26...投射裝置26. . . Projection device

28...投射材供給裝置28. . . Projection material supply device

28A...投射材閘門28A. . . Projection gate

28B...氣壓缸28B. . . Pneumatic cylinder

30...循環裝置30. . . Circulator

32...螺旋輸送機32. . . Screw conveyor

34...斗式升降機34. . . Bucket lift

34D...收集口34D. . . Collection port

36...驅動馬達36. . . Drive motor

38...投射材貯藏槽38. . . Projection storage tank

40...分離器40. . . Splitter

41...風道41. . . Wind tunnel

42...集塵機42. . . Dust collector

44...線材檢知裝置44. . . Wire inspection device

50...第1密封構造部50. . . First seal structure

52...導引筒構件(導引構件)52. . . Guide tube member (guide member)

54...第一密封部54. . . First seal

64...第二密封部64. . . Second seal

70...氣流產生裝置70. . . Airflow generating device

74...鼓風扇74. . . Drum fan

76...風道76. . . Wind tunnel

80...導引筒體(筒狀體)80. . . Guide cylinder (cylinder)

X...線材搬送方向(搬送方向)X. . . Wire conveying direction (transport direction)

Claims (6)

一種表面處理裝置,具有:對被往既定之搬送方向搬送之被處理對象物投射投射材之投射裝置;相對前述投射裝置配置於前述搬送方向之上流側及下流側至少一方並檢知前述被處理對象物之有無之檢知手段;作為往前述投射裝置之投射材之供給用且可變更往前述投射裝置之投射材之供給量之投射材供給裝置;基於前述檢知手段之檢知結果調節前述投射材供給裝置之往前述投射裝置之投射材之供給量之控制手段;前述檢知手段係配置於前述被處理對象物被搬送之搬送通路之上方側之裝置,具備可繞與前述搬送方向正交之水平方向之支軸旋轉移動且在自由狀態下係以長度方向為上下方向之姿勢被配置之臂、安裝於前述臂之在其自由狀態下比前述支軸下方側之下端之部位且配置於被搬送中之前述被處理對象物按壓之位置且可繞與前述支軸平行之軸線旋轉之轉子、安裝於前述臂之在其自由狀態下比前述支軸上方側之上端之部位之磁性體、於搬送中之前述被處理對象物按壓前述轉子而使前述臂旋轉移動之場合配置於前述磁性體接近之位置且檢出前述磁性體之接近之接近開關。 A surface treatment apparatus includes: a projection device that projects a projection material to an object to be processed that is transported in a predetermined conveyance direction; and the projection device is disposed in at least one of a flow side and a downstream side of the conveyance direction, and detects the processed portion a means for detecting the presence or absence of an object; a projection material supply device for supplying a projection material to the projection device and capable of changing a supply amount of the projection material to the projection device; and adjusting the aforementioned result based on the detection result of the detection means The means for controlling the supply amount of the projection material to the projection device of the projection material supply device; the detection means is disposed on the upper side of the conveyance path on which the object to be processed is conveyed, and is provided to be rotatable in the conveyance direction An arm in which the support shaft in the horizontal direction is rotationally moved and is disposed in a posture in which the longitudinal direction is the up-and-down direction in the free state, and is attached to a portion of the arm that is lower than the lower end of the lower side of the support shaft in the free state thereof. a position at which the object to be processed is pressed while being conveyed and rotatable about an axis parallel to the fulcrum a rotor, and a magnetic body attached to a portion of the arm that is higher than the upper end of the upper side of the support shaft in the free state, and the object to be processed in the conveyance is pressed against the rotor to rotatably move the arm. The proximity of the magnetic body is detected and the proximity switch of the magnetic body is detected. 如申請專利範圍第1項記載之表面處理裝置,其中,設置檢出前述被處理對象物搬送之速度之速度檢出手段;前述控制手段係基於前述速度檢出手段之檢出結果調節前述投射材供給裝置之往前述投射裝置之投射材之供給量。 The surface treatment apparatus according to claim 1, wherein a speed detecting means for detecting a speed at which the object to be processed is transported is provided; and the controlling means adjusts the projecting material based on a result of detecting the speed detecting means The supply amount of the projection material of the supply device to the projection device. 如申請專利範圍第1或2項記載之表面處理裝置,其中,具有於內部形成藉由被前述投射裝置投射之投射材進行前述被處理對象物之表面加工之投射室且形成有前述被處理對象物之搬入用之搬入口與搬出用之搬出口之箱體;具備配置於前述箱體之搬入口側且前述被處理對象物可通過內側之第一筒狀部與配置於前述第一筒狀部之內側並於前述被處理對象物之通過時在前述被處理對象物與前述第一筒狀部之內面之間做為漏出阻止用之第一密封體之第一密封部;具備配置於前述箱體之搬出口側且前述被處理對象物可通過內側之第二筒狀部與配置於前述第二筒狀部之內側並於前述被處理對象物之通過時在前述被處理對象物與前述第二筒狀部之內面之間做為漏出阻止用之第二密封體之第二密封部;氣體流出口配置於比前述第二密封部更往前述搬送方向之下流側並使往前述箱體之內側之氣流產生之氣流產生裝置。 The surface treatment apparatus according to the first or second aspect of the invention, wherein a projection chamber for processing a surface of the object to be processed by a projection material projected by the projection device is formed therein, and the object to be processed is formed. a container for loading and unloading the object, and a first cylindrical portion that is disposed on the inlet side of the casing and that allows the object to be processed to pass through the inside and is disposed in the first cylindrical shape a first sealing portion of the first sealing body for leakage prevention between the object to be processed and the inner surface of the first cylindrical portion when the object to be processed passes; The object to be processed and the object to be processed can pass through the second tubular portion on the inner side and the inner side of the second cylindrical portion, and the object to be processed is passed through the object to be processed. a second sealing portion of the second sealing body for preventing leakage is formed between the inner surfaces of the second cylindrical portion; the gas outflow port is disposed below the conveying direction of the second sealing portion Airflow to the airflow arising from the inner side of the housing of the generator. 如申請專利範圍第1項記載之表面處理裝置,其中, 具有包含由前述投射裝置投射之投射材往前述箱體之上方側搬送之斗式升降機而構成且使前述投射材往前述投射裝置循環之循環裝置;設於前述循環裝置之循環路徑並將前述投射材以外之異物及投射之前述投射材之中裂開之投射材分離除去之分離器;連接於前述分離器並吸引包含粉塵之空氣之集塵機。 A surface treatment apparatus according to claim 1, wherein a circulation device including a bucket elevator that conveys a projection material projected by the projection device to an upper side of the casing and circulating the projection material to the projection device; a circulation path provided in the circulation device and projecting the projection a separator that separates and removes the foreign matter other than the material and the projected projection material from the projected projection material; and a dust collector that is connected to the separator and sucks air containing dust. 如申請專利範圍第2項記載之表面處理裝置,其中,具有包含由前述投射裝置投射之投射材往前述箱體之上方側搬送之斗式升降機而構成且使前述投射材往前述投射裝置循環之循環裝置;設於前述循環裝置之循環路徑並將前述投射材以外之異物及投射之前述投射材之中裂開之投射材分離除去之分離器;連接於前述分離器並吸引包含粉塵之空氣之集塵機。 The surface treatment apparatus according to claim 2, further comprising a bucket elevator that includes a projection material projected by the projection device and transported to an upper side of the casing, and circulates the projection material to the projection device. a circulator; a separator disposed on the circulation path of the circulation device and separating and removing the foreign matter other than the projection material and the projection material projected from the projection material; and connecting the separator to the air containing the dust Dust collector. 如申請專利範圍第3項記載之表面處理裝置,其中,具有包含由前述投射裝置投射之投射材往前述箱體之上方側搬送之斗式升降機而構成且使前述投射材往前述投射裝置循環之循環裝置;設於前述循環裝置之循環路徑並將前述投射材以外之異物及投射之前述投射材之中裂開之投射材分離除去之分離器;連接於前述分離器並吸引包含粉塵之空氣之集塵機。 The surface treatment apparatus according to claim 3, further comprising a bucket elevator that includes a projection material projected by the projection device and transported to an upper side of the casing, and circulates the projection material to the projection device. a circulator; a separator disposed on the circulation path of the circulation device and separating and removing the foreign matter other than the projection material and the projection material projected from the projection material; and connecting the separator to the air containing the dust Dust collector.
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