TWI478979B - Conductive resin composition - Google Patents
Conductive resin composition Download PDFInfo
- Publication number
- TWI478979B TWI478979B TW100125788A TW100125788A TWI478979B TW I478979 B TWI478979 B TW I478979B TW 100125788 A TW100125788 A TW 100125788A TW 100125788 A TW100125788 A TW 100125788A TW I478979 B TWI478979 B TW I478979B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin
- conductive
- resin composition
- isocyanate compound
- solid content
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/24—Conductive material dispersed in non-conductive organic material the conductive material comprising carbon-silicon compounds, carbon or silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/54—Polycondensates of aldehydes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/80—Masked polyisocyanates
- C08G18/8061—Masked polyisocyanates masked with compounds having only one group containing active hydrogen
- C08G18/807—Masked polyisocyanates masked with compounds having only one group containing active hydrogen with nitrogen containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3477—Six-membered rings
- C08K5/3492—Triazines
- C08K5/34926—Triazines also containing heterocyclic groups other than triazine groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
- C08L75/04—Polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/02—Elements
- C08K3/04—Carbon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/095—Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Conductive Materials (AREA)
- Polyurethanes Or Polyureas (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Description
本發明係有關導電性樹脂組成物,更詳細為,係有關可得具有優良電阻值及耐熱性之安定性的硬化物之導電性樹脂組成物。The present invention relates to a conductive resin composition, and more particularly to a conductive resin composition which can obtain a cured product having excellent electrical resistance and heat stability.
先前所使用的網版印刷於印刷配線基板上以形成導電電路圖型用之導電性糊料為,由熱硬化性樹脂或熱塑性樹脂形成之黏合樹脂中,添加、分散銀或銅等之金屬粉,或碳黑、石墨般碳導電粉所得之物。導電性糊料為了符合導電性、印刷性、密合性、焊接耐熱性、高溫耐熱性、耐濕性、耐熱衝擊性、耐磨耗性等之特性要求,曾提案各種樹脂成分、導電粉。The screen paste used in the prior art is printed on a printed wiring board to form a conductive paste for a conductive circuit pattern. In the adhesive resin formed of a thermosetting resin or a thermoplastic resin, metal powder such as silver or copper is added or dispersed. Or carbon black, graphite-like carbon conductive powder. In order to meet the characteristics of conductivity, printability, adhesion, solder heat resistance, high temperature heat resistance, moisture resistance, thermal shock resistance, and abrasion resistance, the conductive paste has been proposed as various resin components and conductive powders.
已知之作為黏合劑用之熱硬化性樹脂如,甲階酚醛樹脂型苯酚樹脂。甲階酚醛樹脂型苯酚樹脂具有優良耐熱性,又,使用於導電性糊料時,藉由自己縮合而體積收縮,結果可期待增加所添加之導電粉相互間的接觸面積,降低電阻值得良好導電性。另外價格較低的同時,除了耐熱性也具有優良接著性、機械特性、電特性等,因此不僅作為黏合劑用,也被廣泛使用為各種基材之成型材料、接著劑及塗覆劑。專利文獻1曾揭示,以含有甲階酚醛樹脂型苯酚樹脂之樹脂組成物作為導電性糊料之黏合樹脂用。A thermosetting resin which is known as a binder is, for example, a resol type phenol resin. The resol type phenol resin has excellent heat resistance, and when used in a conductive paste, it shrinks in volume by self-condensation, and as a result, it is expected to increase the contact area between the added conductive powders, and to reduce the electric resistance and to conduct good electrical conductivity. Sex. In addition, since the price is low, and it has excellent adhesion, mechanical properties, electrical properties, and the like in addition to heat resistance, it is widely used not only as a binder but also as a molding material, an adhesive, and a coating agent for various substrates. Patent Document 1 discloses that a resin composition containing a resol type phenol resin is used as a binder resin for a conductive paste.
另一方面對甲階酚醛樹脂型苯酚樹脂要求進一步提升印刷性,及改善硬化塗膜之脆性、保存安定性等。On the other hand, the resole type phenol resin is required to further improve the printability, and to improve the brittleness, storage stability, and the like of the cured coating film.
又,有關具有優良接著性、彎曲性及耐磨耗性之物曾提案,具有羥基之化合物與聚異氰酸酯化合物加成反應所得之黏合樹脂。例如專利文獻3、4所揭示,含有聚酯聚醇、異氰酸酯化合物及導電粉之導電性糊料。Further, regarding the excellent adhesion, flexibility, and abrasion resistance, a binder resin obtained by addition reaction of a compound having a hydroxyl group and a polyisocyanate compound has been proposed. For example, Patent Document 3 and 4 disclose a conductive paste containing a polyester polyol, an isocyanate compound, and a conductive powder.
專利文獻1:特開平5-194822號公報Patent Document 1: Japanese Patent Publication No. 5-194822
專利文獻2:特開2006-100081號公報Patent Document 2: JP-A-2006-100081
專利文獻3:特開2006-302825號公報Patent Document 3: JP-A-2006-302825
近年來為了進一步提升使用甲階酚醛樹脂型苯酚樹脂之黏合樹脂的耐熱性、改善樹脂特性、開發新穎之黏合樹脂,曾嘗試甲階酚醛樹脂型苯酚附加異氰酸酯化合物。In recent years, in order to further improve the heat resistance of a binder resin using a resol type phenol resin, to improve resin characteristics, and to develop a novel binder resin, a resol type phenol-added isocyanate compound has been tried.
但此時會因共存甲階酚醛樹脂型苯酚本身之縮合反應,及與異氰酸酯化合物之加成反應系,而難控制反應系,故會有增加電阻值及焊接耐熱性般所得硬化物之特性之偏差值的問題。However, in this case, due to the condensation reaction of the co-preserved resol type phenol itself and the addition reaction with the isocyanate compound, it is difficult to control the reaction system, so that the properties of the cured product obtained by increasing the electric resistance value and the welding heat resistance are obtained. The problem of the bias value.
因此本發明之目的為,提供含有導電粉、甲階酚醛樹脂型苯酚樹脂及異氰酸酯化合物,可得物性安定之硬化物之導電性樹脂組成物。Therefore, an object of the present invention is to provide a conductive resin composition containing a conductive powder, a resol type phenol resin, and an isocyanate compound, and a cured product having stable physical properties can be obtained.
本發明者們針對,特定溫度條件下具有反應選擇性,可優良進行一方反應以解決上述課題一事專心檢討後發現,相對於優先進行甲階酚醛樹脂型之縮合反應會影響耐煮沸特性等之樹脂特性,而優先進行異氰酸酯之加成反應時對樹脂特性幾乎無不良影響,可圖物性安定化。又,藉由吡唑化合物可抑制甲階酚醛樹脂型之縮合反應,而完成本發明。The inventors of the present invention have found that it is possible to carry out a reaction under a specific temperature condition, and it is possible to carry out a reaction with one of the above-mentioned problems in order to solve the above-mentioned problems, and it has been found that a resin which is preferentially subjected to a resol-type phenol resin-type condensation reaction affects boiling resistance and the like When the isocyanate addition reaction is preferentially carried out, the resin property is hardly adversely affected, and the physical properties can be stabilized. Further, the present invention can be accomplished by inhibiting the condensation reaction of a resol type by a pyrazole compound.
即,本發明之導電性樹脂組成物為,特徵係含有(A)甲階酚醛樹脂型苯酚樹脂、(B)吡唑化合物、(C)異氰酸酯化合物,及(D)導電粉之物。In other words, the conductive resin composition of the present invention contains (A) a resol type phenol resin, (B) a pyrazole compound, (C) an isocyanate compound, and (D) a conductive powder.
本發明之導電性樹脂組成物中,前述(B)吡唑化合物較佳為3,5-二甲基吡唑。前述(C)異氰酸酯化合物較佳為嵌段化異氰酸酯。In the conductive resin composition of the present invention, the (B) pyrazole compound is preferably 3,5-dimethylpyrazole. The above (C) isocyanate compound is preferably a blocked isocyanate.
又,本發明之導電性樹脂組成物為,特徵係含有(A)甲階酚醛樹脂型苯酚樹脂、(F)被吡唑嵌段之異氰酸酯化合物,及(D)導電粉之物。前述(F)被吡唑嵌段之異氰酸酯化合物較佳為1,6-六伸甲基二異氰酸酯之三聚物之3,5-二甲基吡唑嵌段物。Moreover, the conductive resin composition of the present invention contains (A) a resol type phenol resin, (F) a pyrazole block isocyanate compound, and (D) a conductive powder. The above (F) pyrazole block isocyanate compound is preferably a 3,5-dimethylpyrazole block of a trimer of 1,6-hexamethylene diisocyanate.
本發明之導電性樹脂組成物更佳為含有(E)聚乙烯乙縮醛樹脂。The conductive resin composition of the present invention more preferably contains (E) a polyvinyl acetal resin.
又,本發明之導電性樹脂組成物中,前述(D)導電粉較佳為碳黑及石墨中1種以上。Further, in the conductive resin composition of the present invention, the (D) conductive powder is preferably one or more of carbon black and graphite.
本發明之導電性樹脂硬化物為,特徵係硬化前述導電性樹脂組成物而得之物。The cured conductive resin of the present invention is characterized in that the conductive resin composition is cured.
又,本發明之導體電路圖型為,特徵係使用前述導電性樹脂硬化物之物。Moreover, the conductor circuit pattern of the present invention is characterized in that the conductive resin cured product is used.
本發明可提供含有導電粉、吡唑化合物、甲階酚醛樹脂型苯酚樹脂及異氰酸酯化合物,可得物性安定之硬化物之導電性樹脂組成物。The present invention can provide a conductive resin composition containing a conductive powder, a pyrazole compound, a resol type phenol resin, and an isocyanate compound, and can obtain a cured product having a stable physical property.
本發明之導電性樹脂組成物為,特徵係含有(A)甲階酚醛樹脂型苯酚樹脂、(B)吡唑化合物、(C)異氰酸酯化合物,及(D)導電粉之導電性樹脂組成物,又特徵係含有(A)甲階酚醛樹脂型苯酚樹脂、(F)被吡唑嵌段之異氰酸酯化合物,及(D)導電粉之導電性樹脂組成物。The conductive resin composition of the present invention is characterized by comprising (A) a resol phenol resin, (B) a pyrazole compound, (C) an isocyanate compound, and (D) a conductive resin composition of the conductive powder. Further, it is characterized by comprising (A) a resol type phenol resin, (F) an isocyanate compound which is a pyrazole block, and (D) a conductive resin composition of the conductive powder.
下面將具體說明各成分。Each component will be specifically described below.
又,本發明中樹脂係指(A)、(B)、(C)、(D)、(E)及(F)。Further, in the present invention, the resins mean (A), (B), (C), (D), (E) and (F).
本發明中(A)甲階酚醛樹脂型苯酚樹脂可使用,先前使用於導電性糊料之黏合樹脂中之物中任何一種。又,可藉由烷氧基等改性。(A)甲階酚醛樹脂型苯酚樹脂之分子量無特別限定,重量平均分子量MW較佳為500至5000。In the present invention, the (A) resole type phenol resin can be used as any of the binder resins previously used in the conductive paste. Further, it can be modified by an alkoxy group or the like. The molecular weight of the resole type phenol resin (A) is not particularly limited, and the weight average molecular weight MW is preferably from 500 to 5,000.
甲階酚醛樹脂型苯酚樹脂例如可由,存在鹼下以甲醛類使苯酚化合物羥甲基化而得,又,置於酸性條件下,或加熱會發生縮合反應而凝膠化、硬化。The resol type phenol resin can be obtained, for example, by methylolating a phenol compound with formaldehyde under a base, and under a acidic condition or heating to cause a condensation reaction to gel and harden.
甲階酚醛樹脂型苯酚樹脂之原料用苯酚化合物如,苯酚、m-甲酚、o-甲酚、p-甲酚、p-tert-丁基苯酚、p-乙基苯酚、2,3-二甲苯酚、2,5-二甲苯酚、m-乙基苯酚、3,5-二甲苯酚、m-甲氧基苯酚、雙酚A、雙酚F等。就硬化性及耐熱性方面較佳為,雙酚A、苯酚、m-甲酚、m-乙基苯酚、3,5-二甲苯酚、m-甲氧基苯酚。The raw material of the resol type phenol resin is a phenol compound such as phenol, m-cresol, o-cresol, p-cresol, p-tert-butylphenol, p-ethylphenol, 2,3-di Methyl phenol, 2,5-xylenol, m-ethyl phenol, 3,5-xylenol, m-methoxy phenol, bisphenol A, bisphenol F, and the like. Preferred in terms of hardenability and heat resistance are bisphenol A, phenol, m-cresol, m-ethylphenol, 3,5-xylenol, and m-methoxyphenol.
前述甲醛類如,甲醛、對甲醛或三噁烷等,此等可1種或2種以上。所得之羥甲基較佳為,芳香環每單核為1.0個以上。The above-mentioned formaldehydes, such as formaldehyde, para-formaldehyde or trioxane, may be used alone or in combination of two or more. The obtained methylol group is preferably such that the aromatic ring has 1.0 or more per one core.
(A)甲階酚醛樹脂型苯酚樹脂之添加量於固體成分換算下,相對於組成物中之樹脂固體成分較佳為10至55質量%,更佳為20至45質量%。甲階酚醛樹脂型苯酚樹脂之添加量未達10質量%時,會降低導體電路圖型必備之焊接耐熱性、高溫耐熱性等之特性,又超過55質量%時,對耐煮沸性、彎曲性、印刷性等會有不良影響而不宜。又,(A)甲階酚醛樹脂型苯酚樹脂中甲醛含量為0.1%以下之物具有優良環境性能而為佳。The amount of the (A) phenol resin-based phenol resin to be added is preferably from 10 to 55% by mass, more preferably from 20 to 45% by mass, based on the solid content of the resin in the composition. When the addition amount of the resol type phenol resin is less than 10% by mass, the characteristics such as solder heat resistance and high-temperature heat resistance necessary for the conductor pattern are lowered, and when it exceeds 55% by mass, the boiling resistance and the bendability are improved. It is not appropriate to have adverse effects such as printability. Further, the (A) resol type phenol resin preferably has a formaldehyde content of 0.1% or less and has excellent environmental properties.
其理由雖不明確,但樹脂組成物中存在吡唑化合物時,可抑制甲階酚醛樹脂型苯酚樹脂之縮合反應,而抑制含有甲階酚醛樹脂型苯酚樹脂及異氰酸酯化合物之樹脂組成物反應,可圖硬化物之物性安定化。吡唑化合物可為,單獨被含於樹脂組成物中,或如下述般以異氰酸酯化合物之嵌段劑使用而被含有。Although the reason is not clear, when the pyrazole compound is present in the resin composition, the condensation reaction of the resol type phenol resin can be suppressed, and the reaction of the resin composition containing the resol type phenol resin and the isocyanate compound can be suppressed. The physical properties of the hardened material are stabilized. The pyrazole compound may be contained in the resin composition alone or in the form of a block agent of an isocyanate compound as described below.
本發明中(B)吡唑化合物如,無取代之吡唑、3-甲基吡唑、4-甲基吡唑、5-甲基吡唑、3-戊基吡唑、3,5-二甲基吡唑、3-氯吡唑、3,4-二溴吡唑等之吡唑環之3、4、5位中任何一個以上被碳原子數1至5之烷基、鹵原子、苯基或乙醯基取代之吡唑。此等為吡唑環上之取代基可為1種或2種以上。吡唑化合物較佳為無取代吡唑、烷基取代吡唑及此等之衍生物中所選出之1種以上吡唑化合物,就嵌段劑用之熱解離性與熱安定性之平衡性特佳為3,5-二甲基吡唑。In the present invention, (B) pyrazole compounds such as unsubstituted pyrazole, 3-methylpyrazole, 4-methylpyrazole, 5-methylpyrazole, 3-pentylpyrazole, 3,5-di Any one or more of the 3, 4, and 5 positions of the pyrazole ring such as methylpyrazole, 3-chloropyrazole, and 3,4-dibromopyrazole are an alkyl group having 1 to 5 carbon atoms, a halogen atom, and benzene. A pyrazole substituted with a thiol group or an ethyl hydrazide group. These may be one or two or more substituents on the pyrazole ring. The pyrazole compound is preferably an unsubstituted pyrazole, an alkyl-substituted pyrazole, and one or more pyrazole compounds selected from the above derivatives, and the balance between thermal dissociation and thermal stability for the block agent is particularly Preferably it is 3,5-dimethylpyrazole.
吡唑化合物之添加量於固體成分換算下,相對於甲階酚醛樹脂型苯酚樹脂之固體成分較佳為1至35質量%,更佳為10至30質量%。吡唑化合物之添加量未達1質量%時,本發明之硬化條件下將無法充分抑制甲階酚醛樹脂之自己縮合,又超過35質量%時會抑制必要以上之反應性,而降低塗膜特性故不宜。The amount of the pyrazole compound to be added is preferably from 1 to 35 mass%, more preferably from 10 to 30 mass%, based on the solid content of the resole type phenol resin. When the amount of the pyrazole compound added is less than 1% by mass, the self-condensation of the resol phenolic resin cannot be sufficiently suppressed under the curing conditions of the present invention, and when it exceeds 35% by mass, the reactivity of more than necessary is suppressed, and the film properties are lowered. It is not appropriate.
本發明中(C)異氰酸酯化合物可使用,先前使用於導電糊料之黏合樹脂中之物中任何一種。該類異氰酸酯化合物如,脂肪族異氰酸酯化合物、芳香族異氰酸酯化合物、由異氰酸酯化合物與聚羥基化合物或聚胺化合物所得之末端異氰酸酯預聚物乃至高分子量之含有異氰酸酯基之聚合物等。In the (C) isocyanate compound of the present invention, any one of the adhesive resins previously used for the conductive paste can be used. Such isocyanate compounds are, for example, aliphatic isocyanate compounds, aromatic isocyanate compounds, terminal isocyanate prepolymers obtained from isocyanate compounds and polyhydroxy compounds or polyamine compounds, and polymers having a high molecular weight isocyanate group.
異氰酸酯化合物之較佳添加量於固體成分換算下,相對於組成物中之樹脂固體成分為20至80質量%,更佳為35至75質量%。相對於異氰酸酯化合物之添加量未達20質量%時會降低耐煮沸性,超過80質量%時會降低焊接耐熱性、高溫耐熱性等之特性而不宜。The amount of the isocyanate compound to be added is preferably from 20 to 80% by mass, more preferably from 35 to 75% by mass, based on the solid content of the resin in the solid content. When the amount of the isocyanate compound added is less than 20% by mass, the boiling resistance is lowered, and when it exceeds 80% by mass, the properties such as solder heat resistance and high-temperature heat resistance are lowered.
上述脂肪族異氰酸酯化合物如,1,6-六伸甲基二異氰酸酯(HDI或HMDI)、異氟爾酮二異氰酸酯(IPDI)、甲基環己烷2,4-(2,6)-二異氰酸酯(氫化TDI)、4,4’-伸甲基雙(環己基異氰酸酯)(氫化MDI)、1,3-(異氰酸酯甲基)環己烷(氫化XDI)、降莰烯二異氰酸酯(NDI)、賴胺酸二異氰酸酯(LDI)、三甲基六伸甲基二異氰酸酯(TMDI)、二聚物酸二異氰酸酯(DDI)、N,N’,N”-三(6-異氰酸酯、六伸甲基)縮二脲等。The above aliphatic isocyanate compound such as 1,6-hexamethylene diisocyanate (HDI or HMDI), isophorone diisocyanate (IPDI), methylcyclohexane 2,4-(2,6)-diisocyanate (hydrogenated TDI), 4,4'-methyl bis(cyclohexyl isocyanate) (hydrogenated MDI), 1,3-(isocyanate methyl)cyclohexane (hydrogenated XDI), norbornene diisocyanate (NDI), Lysine diisocyanate (LDI), trimethylhexamethylene diisocyanate (TMDI), dimer acid diisocyanate (DDI), N,N',N"-tris(6-isocyanate, hexamethylenemethyl) Biuret and the like.
上述芳香族異氰酸酯化合物如,伸甲苯基二異氰酸酯(TDI)、4,4’-二苯基甲烷二異氰酸酯(MDI)、伸二甲苯基二異氰酸酯(XDI)等。The above aromatic isocyanate compound is, for example, tolyl diisocyanate (TDI), 4,4'-diphenylmethane diisocyanate (MDI), xylylene diisocyanate (XDI) or the like.
上述末端異氰酸酯預聚物,及製造聚合物用之低分子聚羥基化合物如,乙二醇、丙二醇、二乙二醇、二丙二醇、1,4-丁二醇、1,3-丁二醇、六甲二醇、新戊二醇、甘油、三羥甲基丙烷、季戊四醇、聚乙二醇、聚丙二醇、聚己二酸乙二醇酯、聚己二酸丙二醇酯等。The above terminal isocyanate prepolymer, and a low molecular weight polyhydroxy compound for producing a polymer such as ethylene glycol, propylene glycol, diethylene glycol, dipropylene glycol, 1,4-butanediol, 1,3-butanediol, Hexamethylglycol, neopentyl glycol, glycerin, trimethylolpropane, pentaerythritol, polyethylene glycol, polypropylene glycol, polyethylene adipate, propylene glycol adipate, and the like.
又,就單液化、使用期限之觀點,異氰酸酯化合物較佳為使用被已知之嵌段化劑(封止劑)嵌段之嵌段化異氰酸酯。嵌段化劑如,乙醇、n-丙醇、異丙醇、t-丁醇、異丁醇等之醇類、苯醇、氯苯醇、甲酚、二甲苯酚、p-硝基苯酚等之苯酚類、p-t-丁基苯酚、p-sec-丁基苯酚、p-sec-胺基苯酚、p-辛基苯酚、p-壬基苯酚等之烷基苯酚類、3-羥基吡啶、8-羥基喹啉、8-羥基喹哪啶等之鹼性含氮化合物、丙二酸二乙酯、乙醯乙酸乙酯、乙醯丙酮等之活性甲烯化合物、乙醯胺、丙烯醯胺、乙醯替苯胺等之酸醯胺類、琥珀酸醯亞胺、馬來醯亞胺等之酸醯亞胺類、2-乙基咪唑、2-乙基-4-甲基咪唑等之咪唑類、2-吡咯烷酮、ε-己內醯胺等之內醯胺類、丙酮肟、甲基乙基酮肟、環己酮肟、乙醛肟等之酮或醛之肟類、伸乙基亞胺、重亞硫酸鹽等。上述嵌段劑可使用1種或2種以上併用。Further, from the viewpoint of the single liquefaction and the lifespan, the isocyanate compound is preferably a blocked isocyanate which is blocked by a known blocking agent (blocking agent). Blocking agents such as alcohols, n-propanol, isopropanol, t-butanol, isobutanol, alcohols, phenyl alcohol, chlorohydrin, cresol, xylenol, p-nitrophenol, etc. Alkylphenols such as phenol, pt-butylphenol, p-sec-butylphenol, p-sec-aminophenol, p-octylphenol, p-nonylphenol, 3-hydroxypyridine, 8 - a basic nitrogen-containing compound such as hydroxyquinoline or 8-hydroxyquinaldine; a reactive methene compound such as diethyl malonate, ethyl acetate or ethyl acetonate; acetamide or acrylamide; An imidazole such as an acid amide such as aniline, succinimide succinate, samarium imide such as maleimide, 2-ethylimidazole or 2-ethyl-4-methylimidazole a ketone or an aldehyde oxime of an internal amide such as 2-pyrrolidone or ε-caprolactam, acetone oxime, methyl ethyl ketone oxime, cyclohexanone oxime, acetaldehyde oxime, etc. , heavy sulfites, etc. These block agents may be used alone or in combination of two or more.
本發明中(D)導電粉可使用,先前使用於導電性糊料之黏合樹脂中之物中任何一種。導電粉如,金、銀、銅、鉑、鈀合金等之金屬粉、爐黑、熱碳黑、槽法碳黑、乙炔碳黑、捕集碳黑等之碳黑、石墨、碳黑與石墨之混合物、碳奈米管等之碳粉末,較佳為碳黑、石墨、碳黑與石墨之混合物。In the present invention, the (D) conductive powder can be used as any of the adhesive resins previously used in the conductive paste. Conductive powder such as metal powder of gold, silver, copper, platinum, palladium alloy, furnace black, hot carbon black, channel black, acetylene black, carbon black such as carbon black, graphite, carbon black and graphite The carbon powder of the mixture, carbon nanotube or the like is preferably a mixture of carbon black, graphite, carbon black and graphite.
(D)導電粉之含量於其為金屬粉時,組成物中之固體成分換算下較佳為70至95質量%,更佳為75至90質量%,又其為碳粉時,組成物中之固體成分換算下較佳為35至65質量%,更佳為45至55質量%。相對於添加量少於上述範圍時無法得到充分之導電性,多於上述範圍時會降低硬化膜之機械強度而不宜。(D) The content of the conductive powder is preferably 70 to 95% by mass, more preferably 75 to 90% by mass, based on the solid content of the composition, when it is a metal powder, and when it is a carbon powder, the composition is The solid content is preferably 35 to 65 mass%, more preferably 45 to 55 mass%. When the amount of addition is less than the above range, sufficient conductivity cannot be obtained, and when it is more than the above range, the mechanical strength of the cured film is lowered.
本發明就導電粉之分散性及印刷特性等之觀點可為,含有(A)甲階酚醛樹脂型苯酚樹脂、(B)吡唑化合物、(C)異氰酸酯化合物,及(D)導電粉之導電性樹脂組成物,或含有(A)甲階酚醛樹脂型苯酚樹脂、(F)被吡唑嵌段之異氰酸酯化合物,及(D)導電粉之導電性樹脂組成物中任何一種,較佳為另含有(E)聚乙烯乙縮醛樹脂。(E)聚乙烯乙縮醛樹脂可使用先前使用於導電性糊料之黏合樹脂中之物中任何一種。(E)聚乙烯乙縮醛樹脂如,以醛使聚乙烯醇樹脂縮醛化而得。The present invention may contain (A) resol type phenol resin, (B) pyrazole compound, (C) isocyanate compound, and (D) conductive powder in view of dispersibility and printing characteristics of the conductive powder. Or a resin composition, or a conductive resin composition containing (A) a resol type phenol resin, (F) a pyrazole block isocyanate compound, and (D) a conductive powder, preferably another Contains (E) polyethylene acetal resin. (E) The polyvinyl acetal resin may be any of those previously used for the adhesive paste of the conductive paste. (E) A polyvinyl acetal resin is obtained by acetalizing a polyvinyl alcohol resin with an aldehyde.
上述之醛無特別限制,例如甲醛、乙醛、丙醛、丁醛、戊醛、己醛、庚醛、2-乙基己醛、環己醛、糠醛、苯醛、2-甲基苯醛、3-甲基苯醛、4-甲基苯醛、p-羥基苯酚、m-羥基苯醛、苯基乙醛、β-苯基丙醛等,較佳為丁醛。此等醛可為1種或2種以上併用。The above aldehyde is not particularly limited, and examples thereof include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, valeraldehyde, hexanal, heptaldehyde, 2-ethylhexanal, cyclohexanal, furfural, benzaldehyde, and 2-methylbenzaldehyde. And 3-methylbenzaldehyde, 4-methylbenzaldehyde, p-hydroxyphenol, m-hydroxybenzaldehyde, phenylacetaldehyde, β-phenylpropanal, etc., preferably butyraldehyde. These aldehydes may be used alone or in combination of two or more.
市售之聚乙烯乙縮醛樹脂製品名如,耶思雷BL-1、BL-1H、BL-2、BL-2H、BL-5、BL-10、BL-S、BM-1、BM-2、BM-S、BH-3、BX-1、BX-2、BX-5、BX-55、BX-L、BH-3、BH-S、BM-S、KS-3Z、KS-5、KS-5Z、KS-8、KS-23Z(以上為積水化學工業(股)製)、電化丁縮醛4000-2、5000A、6000C、6000EP(以上為電氣化學工業(股)製)等。又,此等樹脂可使用1種或2種以上併用。Commercially available polyethylene acetal resin product names such as Yersley BL-1, BL-1H, BL-2, BL-2H, BL-5, BL-10, BL-S, BM-1, BM- 2. BM-S, BH-3, BX-1, BX-2, BX-5, BX-55, BX-L, BH-3, BH-S, BM-S, KS-3Z, KS-5, KS-5Z, KS-8, KS-23Z (above is Sekisui Chemical Industry Co., Ltd.), electro-chemical butyral 4000-2, 5000A, 6000C, 6000EP (above is the electric chemical industry (stock) system). Further, these resins may be used alone or in combination of two or more.
聚乙烯乙縮醛樹脂之添加量於固體成分換算下,相對於組成物中之樹脂固體成分較佳為1.5至20質量%,更佳為3至15質量%。添加量未達1.5質量%時,將無法得到導電粉之分散性及印刷特性等效果,添加量超過20質量%時會降低焊接耐熱性等塗膜之耐熱性而不宜。The amount of the polyethylene acetal resin to be added is preferably from 1.5 to 20% by mass, more preferably from 3 to 15% by mass, based on the solid content of the resin in the composition. When the amount of addition is less than 1.5% by mass, effects such as dispersibility of the conductive powder and printing characteristics are not obtained, and when the amount is more than 20% by mass, the heat resistance of the coating film such as solder heat resistance is lowered.
本發明之導電性樹脂組成物中,(F)被吡唑嵌段之異氰酸酯化合物為,異氰酸酯化合物被吡唑化合物嵌段之物。異氰酸酯化合物之例示同上述(C)異氰酸酯化合物,吡唑化合物之例示同上述(B)吡唑化合物。本發明之導電性樹脂組成物含有(F)被吡唑嵌段之異氰酸酯化合物時,可不含有(B)吡唑化合物。In the conductive resin composition of the present invention, (F) an isocyanate compound in which a pyrazole block is blocked, and an isocyanate compound is blocked by a pyrazole compound. The isocyanate compound is exemplified as the above (C) isocyanate compound, and the pyrazole compound is exemplified as the above (B) pyrazole compound. When the conductive resin composition of the present invention contains (F) a pyrazole block-isocyanate compound, the (B) pyrazole compound may not be contained.
(F)被吡唑嵌段之異氰酸酯化合物之添加量於固體成分換算下,相對於組成物中之樹脂固體成分較佳為25至85質量%,更佳為40至80質量%。The amount of the (F) isocyanate compound to be added to the pyrazole block is preferably from 25 to 85% by mass, more preferably from 40 to 80% by mass, based on the solid content of the resin in the composition.
本發明之導電性樹脂組成物除了上述各成分外,可含有其他成分。其他成分如,溶劑、消泡劑、觸變劑、偶合劑、防氧化劑、分散劑、塗平劑等,可使用已知之任何物。The conductive resin composition of the present invention may contain other components in addition to the above components. As other components such as a solvent, an antifoaming agent, a thixotropic agent, a coupling agent, an antioxidant, a dispersing agent, a leveling agent and the like, any of the known ones can be used.
本發明之導電性樹脂硬化物為,將上述導電性樹脂組成物硬化所得之物。硬化方法較佳為熱硬化。硬化溫度較佳為100至200℃,更佳為120至180℃。又,本發明之導體電路圖型為,印刷配線基板上具有本發明之導電性樹脂硬化物之物。本發明之導體電路圖型可由,藉由網版印刷等將本發明之導電性樹脂組成物塗布於已知之印刷配線基板上,再硬化而得。The cured conductive resin of the present invention is obtained by curing the above-mentioned conductive resin composition. The hardening method is preferably heat hardening. The hardening temperature is preferably from 100 to 200 ° C, more preferably from 120 to 180 ° C. Moreover, the conductor circuit pattern of the present invention is a material having the cured conductive resin of the present invention on the printed wiring board. The conductor circuit pattern of the present invention can be obtained by applying the conductive resin composition of the present invention to a known printed wiring board by screen printing or the like, followed by curing.
本發明之導電性硬化物之製造方法較佳為,以100至200℃加熱含有(A)甲階酚醛樹脂型苯酚樹脂、(B)吡唑化合物、(C)異氰酸酯化合物,及(D)導電粉之導電性樹脂組成物而硬化之方法。導電性樹脂組成物之各成分如上述。又,可含有上述其他成分。硬化溫度更佳為120至180℃。加熱方法無特別限定,可採用分批式烤箱、熱風循環式乾燥爐、遠紅外線之輸送烤箱為已知之任何方法。The method for producing a conductive cured product of the present invention preferably comprises heating (A) resol type phenol resin, (B) pyrazole compound, (C) isocyanate compound, and (D) conductive at 100 to 200 ° C. A method of hardening a conductive resin composition of powder. The components of the conductive resin composition are as described above. Further, the above other components may be contained. The hardening temperature is more preferably from 120 to 180 °C. The heating method is not particularly limited, and any method known as a batch type oven, a hot air circulation type drying oven, or a far infrared ray conveying oven can be used.
下面將舉實施例更具體說明本發明。又,「份」無特別註明下係指質量份。The invention will now be described more specifically by way of examples. Also, "parts" means no part of the mass.
相對於甲階酚醛樹脂型苯酚樹脂之固體成分100質量份添加8.8重量份的下述表1所示之鹼性觸媒後,測定以150℃加熱時至凝膠化之時間(凝膠時間)。藉由目視確認凝膠化,結果如下述表1所示。After adding 8.8 parts by weight of the basic catalyst shown in the following Table 1 to 100 parts by mass of the solid component of the resol type phenol resin, the time from the heating at 150 ° C to the gelation time (gel time) was measured. . The gelation was confirmed by visual observation, and the results are shown in Table 1 below.
相對於甲階酚醛樹脂型苯酚樹脂,如下述表2所示添加本發明之(B)成分之一的3,5-二甲基吡唑後,測定以150℃加熱時至凝膠化之時間(凝膠時間)。藉由目視確認凝膠化,結果如下述表1所示。又,甲階酚醛樹脂型苯酚樹脂與3,5-二甲基吡唑之固體成分比與凝膠時間之關係曲線如圖1所示。After adding 3,5-dimethylpyrazole which is one of the components (B) of the present invention to the resole type phenol resin as shown in the following Table 2, the time from the heating at 150 ° C to the gelation time was measured. (gel time). The gelation was confirmed by visual observation, and the results are shown in Table 1 below. Further, the relationship between the solid content ratio of the resol type phenol resin and 3,5-dimethylpyrazole and the gel time is shown in Fig. 1 .
如下述表3以三座輥混機混合分散各成分,製作導電性樹脂組成物(導電性糊料)(實施例1至6及比較例1至5)。表3中之單位為質量份。The conductive resin composition (conductive paste) (Examples 1 to 6 and Comparative Examples 1 to 5) was prepared by mixing and dispersing each component in a three-seat roll mixer as shown in the following Table 3. The units in Table 3 are parts by mass.
※1:群榮化學股份公司製雷吉特PL-5208(NV=60%)*1: Regal Chemicals Co., Ltd. makes the Legit PL-5208 (NV=60%)
※2:積水化學工業股份公司製耶思雷BM-S之丁基卡必醇*2: Benzene BM-S butyl carbitol produced by Sekisui Chemical Industry Co., Ltd.
乙酸酯粒級樹脂(NV=20%)Acetate grade resin (NV=20%)
※3:1,6-六伸甲基二異氰酸酯(HDI)三聚物之甲基乙基酮肟加成物(NV=70%)*3: methyl ethyl ketoxime adduct of 1,6-hexamethyl-diisocyanate (HDI) terpolymer (NV=70%)
※4:Baxenden公司製BI-7982(NV=70%)*4: BI-7982 manufactured by Baxenden Co., Ltd. (NV=70%)
※5:3,5-二甲基吡唑※5:3,5-dimethylpyrazole
※6:獅王股份公司製捕集碳黑EC-300J*6: Captured carbon black EC-300J by Lion King Co., Ltd.
※7:日本黑鉛股份公司製SP-20*7: SP-20 made by Japan Black Lead Co., Ltd.
※8:協和發酵化學股份公司製布吉歇20乙酸酯(丁基卡必醇乙酸酯)*8: Bujichi 20 acetate (butyl carbitol acetate) manufactured by Kyowa Fermentation Chemical Co., Ltd.
使用由所得之導電性糊料製作之印刷配線板,藉由下述評估試驗法進行體積電阻值、密合性、耐膠帶剝離性、焊接耐熱性、煮沸耐性、鉛筆硬度試驗。結果如下述表4所示。The printed wiring board produced from the obtained conductive paste was subjected to volume resistance, adhesion, tape peeling resistance, solder heat resistance, boiling resistance, and pencil hardness test by the following evaluation test methods. The results are shown in Table 4 below.
各自藉由網版印刷法將上述實施例1至6及比較例1至5之導電性糊料,塗布於形成電極之玻璃環氧基板的銅電路部上,形成寬1mm×100mm之圖型被膜。其次於熱風循環式乾燥爐中,以150℃加熱硬化30分鐘。接著藉由毫歐姆快速試驗機(HIOKI公司製3540 mΩ HiTESTER)測定所得之硬化膜之電阻值(R),再算出體積電阻率。測定體積電阻值時係使用薩夫編碼器測定導電成型體之厚度(t)後,使用光學顯微鏡測定基於反射光之導電成型體之正確線寬(w)及長(l),再基於此等測定值由式「ρ=R‧w‧t/l」算出體積電阻值。式中,ρ為體積電阻率(Ω‧cm),R為電阻值(Ω),w為寬(cm)、t為厚(cm),l為長(cm)。又,體積電阻值以數值小為佳。Each of the conductive pastes of the above Examples 1 to 6 and Comparative Examples 1 to 5 was applied onto a copper circuit portion of a glass epoxy substrate on which an electrode was formed by a screen printing method to form a pattern film having a width of 1 mm × 100 mm. . Next, it was heat-hardened at 150 ° C for 30 minutes in a hot air circulating drying oven. Then, the resistance value (R) of the obtained cured film was measured by a milliohm fast tester (3540 mΩ HiTESTER manufactured by HIOKI Co., Ltd.), and the volume resistivity was calculated. When the volume resistance value is measured, the thickness (t) of the conductive molded body is measured using a Saf encoder, and the correct line width (w) and length (l) of the conductive molded body based on the reflected light are measured using an optical microscope, and then measured based on the measurement. The value is calculated from the equation "ρ=R‧w‧t/l". In the formula, ρ is the volume resistivity (Ω ‧ cm), R is the resistance value (Ω), w is the width (cm), t is the thickness (cm), and l is the length (cm). Further, the volume resistance value is preferably small.
同上述(1)之網版印刷法形成玻璃環氧銅張層合板之銅箔面15mm×15mm之圖型被膜後加熱硬化。使用切刀於所得之硬化膜上製作100個1mm×1mm方格後,調查以透明膠帶剝取上方塗膜時基板上殘存之方格個數,評估密合性(JIS K5400-8.5)。以殘存方格較多為佳。又,耐膠帶剝離性之評估方法為,將透明膠帶貼合於所得硬化膜上,以相對於塗膜為90°之方式剝離膠帶,再以目視確認膠帶之附著物。評估基準如下所述。With the screen printing method of the above (1), a copper foil surface of a glass epoxy copper laminate is formed into a 15 mm × 15 mm pattern film, and then heat-hardened. After 100 squares of 1 mm × 1 mm were formed on the obtained cured film using a cutter, the number of squares remaining on the substrate when the upper coating film was peeled off with a transparent tape was examined, and the adhesion (JIS K5400-8.5) was evaluated. It is better to have more residual squares. Further, the tape peeling resistance was evaluated by attaching a scotch tape to the obtained cured film, peeling the tape so as to be 90° with respect to the coating film, and visually confirming the adhering matter of the tape. The evaluation criteria are as follows.
○:透明膠帶完全無附著物○: Scotch tape is completely free of attachments
×:透明膠帶有附著物×: Scotch tape has attachments
將同上述(1)所製作之印刷配線板浸漬於260℃之焊接槽中19秒後,藉由毫歐姆快速試驗機(HIOKI公司製3540 mΩ HiTESTER)測定處理後硬化膜之電阻值。由算出之體積電阻值,以處理前之體積電阻值為基準算出變化率。又,焊接處理後之變化率以絕對值較小為佳。The printed wiring board produced in the above (1) was immersed in a solder bath at 260 ° C for 19 seconds, and then the resistance value of the cured film after the treatment was measured by a milliohm fast tester (3540 mΩ HiTESTER manufactured by HIOKI Co., Ltd.). The rate of change was calculated from the calculated volume resistance value based on the volume resistance value before the treatment. Further, the rate of change after the welding treatment is preferably smaller.
將同上述(1)所製作之印刷配線板浸漬於煮沸水中煮沸2小時後,藉由毫歐姆快速試驗機(HIOKI公司製3540 mΩ HiTESTER)測定煮沸處理後硬化膜之電阻值,算出變化率。又,焊接處理後之變化率以絕對值較小為佳。The printed wiring board produced in the above (1) was immersed in boiling water for 2 hours, and then the resistance value of the cured film after the boiling treatment was measured by a milliohm rapid tester (3540 mΩ HiTESTER manufactured by HIOKI Co., Ltd.) to calculate the rate of change. Further, the rate of change after the welding treatment is preferably smaller.
依JIS K5600-5-6之試驗方法,使用鉛筆硬度試驗機以垂掛荷重1kg時塗膜不帶傷之最高硬度表示。所使用之鉛筆為三菱海尤尼(三菱鉛筆(股)製)。According to the test method of JIS K5600-5-6, the pencil hardness tester is used to indicate the highest hardness of the coating film without injury when the load is 1 kg. The pencil used was Mitsubishi Hayany (Mitsubishi Pencil Co., Ltd.).
由上述比較例1、2確認,添加吡唑化合物會抑制甲階酚醛樹脂縮合而影響塗膜特性。又,由比較例3至5得知,混合甲階酚醛樹脂及異氰酸酯化合物之系中,提高異氰酸酯化合物之組成比可提升煮沸耐性,但會增加焊接處理後之電阻變化率。此事恐為起因於熱硬化時與異氰酸酯化合物進行加成反應的同時會進行甲階酚醛樹脂之自己縮合,而減少加成反應所需之羥基而殘存異氰酸酯化合物,故預料會影響焊接處理。又推斷其因之一為,藉由甲階酚醛樹脂之自己縮合會使熱硬化時所形成之交聯構造的網目濃度變淡而降低耐熱性。但實施例1至3因添加3,5-二甲基吡唑,故確認可減少焊接處理後之電阻變化率。推斷其因為,由前述參考例1、2得知甲階酚醛樹脂共存3,5-二甲基吡唑時可減緩凝膠時間,故熱硬化時可抑制甲階酚醛樹脂之自己縮合。又,使用嵌段劑使用3,5-二甲基吡唑之異氰酸酯化合物的實施例4至6,同樣確認具有優良之焊接耐熱性。由此得知,使用本發明之導電性樹脂組成物(導電性糊料)形成之硬化膜具有優良焊接耐熱性及煮沸耐性,且具有高導電性與對基材之密合性,故適用於形成印刷配線板之電路。It was confirmed from the above Comparative Examples 1 and 2 that the addition of the pyrazole compound inhibits the condensation of the resol phenol resin and affects the coating film properties. Further, from Comparative Examples 3 to 5, in the system of the mixed resole phenol resin and the isocyanate compound, the composition ratio of the isocyanate compound was increased to improve the boiling resistance, but the rate of change in resistance after the welding treatment was increased. This is caused by the self-condensation of the resol resin at the same time as the addition reaction with the isocyanate compound at the time of thermosetting, and the hydroxyl group required for the addition reaction is reduced to leave the isocyanate compound, which is expected to affect the soldering treatment. It is also presumed that one of the factors is that the self-condensation of the resol resin causes the mesh density of the crosslinked structure formed during thermal curing to be light, thereby lowering the heat resistance. However, in Examples 1 to 3, since 3,5-dimethylpyrazole was added, it was confirmed that the rate of change in electrical resistance after the welding treatment can be reduced. It is presumed that it is known from the above Reference Examples 1 and 2 that the gelation time can be alleviated when the resole phenolic resin coexists with 3,5-dimethylpyrazole, so that the self-condensation of the resol phenolic resin can be suppressed during thermosetting. Further, Examples 4 to 6 using an isocyanate compound of 3,5-dimethylpyrazole as a block agent were also confirmed to have excellent solder heat resistance. Thus, it has been found that the cured film formed using the conductive resin composition (conductive paste) of the present invention has excellent solder heat resistance and boiling resistance, and has high conductivity and adhesion to a substrate, and is therefore suitable for use. A circuit for forming a printed wiring board.
圖1為,甲階酚醛樹脂型苯酚樹脂與3,5-二甲基吡唑之固體成分比與凝膠時間之關係曲線圖。Fig. 1 is a graph showing the relationship between the solid content ratio of a resol type phenol resin and 3,5-dimethylpyrazole and gel time.
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010166493 | 2010-07-23 | ||
JP2010209267A JP5650477B2 (en) | 2010-07-23 | 2010-09-17 | Conductive resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201219483A TW201219483A (en) | 2012-05-16 |
TWI478979B true TWI478979B (en) | 2015-04-01 |
Family
ID=45496825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100125788A TWI478979B (en) | 2010-07-23 | 2011-07-21 | Conductive resin composition |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5650477B2 (en) |
KR (1) | KR101979034B1 (en) |
CN (1) | CN103025782B (en) |
TW (1) | TWI478979B (en) |
WO (1) | WO2012011398A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5771042B2 (en) * | 2011-03-31 | 2015-08-26 | 太陽ホールディングス株式会社 | Conductive resin composition |
KR102116290B1 (en) * | 2013-01-30 | 2020-05-29 | 디아이씨 가부시끼가이샤 | Conductive paste, method for forming conductive pattern, and object with printed conductive pattern |
EP3107353B1 (en) * | 2014-02-13 | 2018-06-20 | Korea Electronics Technology Institute | Heating paste composition, surface type heating element using same, and potable low-power heater |
KR101698908B1 (en) * | 2015-05-14 | 2017-02-01 | 주식회사 대화알로이테크 | Battery preheating device for hybrid vehicle and method for controlling the same |
KR101689289B1 (en) * | 2015-05-14 | 2016-12-23 | 주식회사 대화알로이테크 | Method for manufacturing heating coating thread by using heating paste composition |
JP6151742B2 (en) * | 2015-06-09 | 2017-06-21 | タツタ電線株式会社 | Conductive paste |
WO2017126536A1 (en) * | 2016-01-20 | 2017-07-27 | 三菱瓦斯化学株式会社 | Resin composition, resin sheet with support, multilayered printed wiring board, and semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1280156A (en) * | 2000-07-11 | 2001-01-17 | 湖北省化学研究所 | Anisotyopic conductive adhesive and its preparing method |
US20030143404A1 (en) * | 2001-11-01 | 2003-07-31 | Welch Cletus N. | Articles having a photochromic polymeric coating |
US20090075201A1 (en) * | 2007-09-19 | 2009-03-19 | Konica Minolta Medical & Graphic, Inc. | Planographic printing plate material, and cyclic ureide moiety-containing phenolic resin and its synthetic process |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5953717B2 (en) * | 1981-07-27 | 1984-12-26 | 日本黒鉛工業株式会社 | Method for manufacturing contact terminals for heat seal connectors on printed circuit boards |
JPS60254144A (en) * | 1984-05-31 | 1985-12-14 | Canon Inc | Electrophotographic sensitive body |
JPS61235417A (en) * | 1985-04-11 | 1986-10-20 | Bridgestone Corp | Electromagnetic wave absorbing material |
JPS61255925A (en) * | 1985-05-09 | 1986-11-13 | Hitachi Chem Co Ltd | Blocked isocyanate for foundry and foundry resin-coated sand prepared by using same |
JPH083066B2 (en) * | 1987-12-24 | 1996-01-17 | 東レ株式会社 | Transparent conductive ink composition |
JP2619289B2 (en) * | 1989-06-20 | 1997-06-11 | 三井金属鉱業株式会社 | Copper conductive composition |
JPH05194822A (en) | 1992-01-20 | 1993-08-03 | Taiyo Ink Seizo Kk | Conductive paste |
JPH0644819A (en) * | 1992-07-24 | 1994-02-18 | Kao Corp | Conductive paste and conductive paint film |
JP3171700B2 (en) * | 1992-11-09 | 2001-05-28 | 住友ベークライト株式会社 | Phenolic resin molding material |
JPH08218006A (en) * | 1995-02-17 | 1996-08-27 | Hitachi Chem Co Ltd | Electroconductive paste |
DE19736920A1 (en) * | 1997-08-25 | 1999-03-04 | Bayer Ag | Aqueous coating composition for stove enamelling and process for its production |
JP2000094620A (en) * | 1998-09-22 | 2000-04-04 | Asahi Chem Ind Co Ltd | Phenol resin foam |
JP2001064779A (en) * | 1999-08-25 | 2001-03-13 | Kansai Paint Co Ltd | Surface treating composition for galvanized steel sheet |
JP3969080B2 (en) * | 2001-01-31 | 2007-08-29 | 東海ゴム工業株式会社 | Endless belt |
JP2003281935A (en) * | 2002-03-22 | 2003-10-03 | Dainippon Printing Co Ltd | Photosensitive conductive paste using polyvinyl acetal, electrode forming method, and electrode formed thereby |
AU2003276905A1 (en) * | 2003-03-18 | 2004-10-11 | Dow Corning Corporation | A conductive composition and method of using the same |
JP2006100081A (en) | 2004-09-29 | 2006-04-13 | Toyobo Co Ltd | Conductive paste |
JP4547623B2 (en) | 2005-04-25 | 2010-09-22 | 東洋紡績株式会社 | Conductive paste |
MY149267A (en) * | 2006-12-26 | 2013-08-15 | Sumitomo Bakelite Co | Conductive paste |
-
2010
- 2010-09-17 JP JP2010209267A patent/JP5650477B2/en active Active
-
2011
- 2011-07-08 CN CN201180035930.5A patent/CN103025782B/en active Active
- 2011-07-08 WO PCT/JP2011/065725 patent/WO2012011398A1/en active Application Filing
- 2011-07-08 KR KR1020137001637A patent/KR101979034B1/en active IP Right Grant
- 2011-07-21 TW TW100125788A patent/TWI478979B/en active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1280156A (en) * | 2000-07-11 | 2001-01-17 | 湖北省化学研究所 | Anisotyopic conductive adhesive and its preparing method |
US20030143404A1 (en) * | 2001-11-01 | 2003-07-31 | Welch Cletus N. | Articles having a photochromic polymeric coating |
US20090075201A1 (en) * | 2007-09-19 | 2009-03-19 | Konica Minolta Medical & Graphic, Inc. | Planographic printing plate material, and cyclic ureide moiety-containing phenolic resin and its synthetic process |
Also Published As
Publication number | Publication date |
---|---|
WO2012011398A1 (en) | 2012-01-26 |
JP2012041517A (en) | 2012-03-01 |
TW201219483A (en) | 2012-05-16 |
CN103025782B (en) | 2015-09-23 |
JP5650477B2 (en) | 2015-01-07 |
KR20140003370A (en) | 2014-01-09 |
KR101979034B1 (en) | 2019-05-15 |
CN103025782A (en) | 2013-04-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI478979B (en) | Conductive resin composition | |
KR101173729B1 (en) | Resin composition, prepreg, laminated board, multilayer printed wiring board and semiconductor device | |
JP4890063B2 (en) | Resin composition, varnish obtained using this resin composition, film adhesive and copper foil with film adhesive | |
US20200308457A1 (en) | Conductive paste composition and ceramic electronic component having external electrodes formed using the same | |
JP5771042B2 (en) | Conductive resin composition | |
US20060081819A1 (en) | Modified electrically conductive adhesives | |
JP2017022033A (en) | Silver paste and manufacturing method of cured body of silver paste | |
KR20220042110A (en) | Conductive paint, manufacturing method of shielding package using same, and manufacturing method of resin molded article having shielding layer | |
JP5816044B2 (en) | Conductive resin composition, cured conductive resin, and conductor circuit pattern | |
TWI556261B (en) | A conductive resin composition, a conductive resin cured product, and a pattern conductor circuit | |
KR100699191B1 (en) | Epoxy resin composition for encapsulating semiconductor device and the semiconductor device using thereof | |
KR101266536B1 (en) | Epoxy resin composition for encapsulating semiconductor device and semiconductor device using the same | |
KR100750331B1 (en) | Thermosetting carbon resistance paste composition | |
KR101266534B1 (en) | Epoxy resin composition for encapsulating semiconductor device and semiconductor device using the same | |
TW201546132A (en) | Insulating film and semiconductor device | |
JP2017130357A (en) | Conductive paste and method for manufacturing cured body of conductive paste | |
JP3593782B2 (en) | Conductive paste | |
JP2017130356A (en) | Method for manufacturing cured body of conductive paste | |
JP2005514488A (en) | Powder epoxy composition | |
JP3079396B2 (en) | Hybrid IC | |
KR100306254B1 (en) | An electrically conductive Ag paste composition | |
JPH01152149A (en) | Electrical insulating coating composition | |
JPH09263681A (en) | Phenol resin molding material | |
JPWO2016143802A1 (en) | Resin composition, laminated structure and method for producing the same | |
JPH0931407A (en) | Electrical insulation coating composition |