TWI474231B - Display device - Google Patents

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TWI474231B
TWI474231B TW101119183A TW101119183A TWI474231B TW I474231 B TWI474231 B TW I474231B TW 101119183 A TW101119183 A TW 101119183A TW 101119183 A TW101119183 A TW 101119183A TW I474231 B TWI474231 B TW I474231B
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Taiwan
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conductive layer
transparent conductive
display device
light
touch
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TW101119183A
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Chinese (zh)
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TW201349044A (en
Inventor
mei zhen Zhang
Kung Chieh Huang
Pei Chun Hsieh
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Innocom Tech Shenzhen Co Ltd
Innolux Corp
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Priority to TW101119183A priority Critical patent/TWI474231B/en
Publication of TW201349044A publication Critical patent/TW201349044A/en
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Publication of TWI474231B publication Critical patent/TWI474231B/en

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Description

顯示裝置 Display device

本發明是有關於一種電子裝置,且特別是有關於一種顯示裝置。 The present invention relates to an electronic device, and more particularly to a display device.

隨著顯示科技的進步,各式顯示裝置不斷推陳出新,其中搭載著觸控面板的顯示裝置更是科技史上的一大突破。目前觸控面板已經廣泛應用於各顯示裝置。觸控面板提供使用者直覺式操作功能,使用者可以直接以手勢下達指令,也可直接點選畫面上的選項來下達指令。 With the advancement of display technology, various display devices continue to evolve, and display devices equipped with touch panels are a major breakthrough in the history of science and technology. Currently, touch panels have been widely used in display devices. The touch panel provides the user with an intuitive operation function, and the user can directly issue an instruction by gesture, or directly click an option on the screen to issue an instruction.

觸控面板的應用顛覆了所有電子裝置的輸入方式,使得各式顯示裝置進入革新的年代。因此觸控面板的發明是電子產業一項相當重要的里程碑。 The application of the touch panel has subverted the input mode of all electronic devices, making various display devices enter an era of innovation. Therefore, the invention of the touch panel is a very important milestone in the electronics industry.

本發明係有關於一種顯示裝置,其利用透明導電層之設計使得使用者不論在非透光區或透光區,均可以看到一致的背景顏色。 The present invention relates to a display device that utilizes a transparent conductive layer design such that a user can see a uniform background color regardless of whether it is in a non-transmissive region or a light-transmitting region.

根據本發明之一方面,提出一種顯示裝置。顯示裝置包括一顯示面板及一觸控面板。觸控面板設置於顯示面板之上。觸控面板包括一透明基板、一透明導電層、一遮光層及一觸控元件。透明基板具有一非透光區與一透光區。透明導電層設置於透明基板上,並位於非透光區。遮光層設置於透明導電層上,並位於非透光區。觸控元件設置於 透明基板上,並位於透光區。 According to an aspect of the invention, a display device is proposed. The display device includes a display panel and a touch panel. The touch panel is disposed on the display panel. The touch panel includes a transparent substrate, a transparent conductive layer, a light shielding layer and a touch component. The transparent substrate has a non-transparent area and a light transmissive area. The transparent conductive layer is disposed on the transparent substrate and located in the non-transparent area. The light shielding layer is disposed on the transparent conductive layer and is located in the non-light transmitting region. Touch element is set to On the transparent substrate, and in the light transmission area.

為讓本發明之上述內容能更明顯易懂,下文特舉各種實施例,並配合所附圖式,作詳細說明如下: In order to make the above-mentioned contents of the present invention more comprehensible, various embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

第一實施例 First embodiment

請參照第1圖,其繪示第一實施例之顯示裝置100之示意圖,顯示裝置100包括一顯示面板110及一觸控面板120。顯示面板110例如是一液晶顯示面板、一有機發光二極體顯示面板或一電泳顯示面板。觸控面板120設置於顯示面板110之上。觸控面板120包括一透明基板121、一透明導電層122、一遮光層123、一觸控元件124及一絕緣層125。透明基板121具有一透光區121A及一非透光區121B。透光區121A用以使光線穿透,非透光區121B用以設置各種線路或電子元件。透明基板121例如是一透明玻璃基板或一透明塑膠基板。透明基板121的材質例如是軟性基板、玻璃基板或強化玻璃基板。透明基板121用以作為各層疊結構的載體。透明導電層122設置於透明基板121上,並位於非透光區121B。透明導電層122用以傳遞電訊號。透明導電層122之材質例如是銦錫氧化物(Indium Tin Oxide,ITO)、銦鋅氧化物(Indium Zinc Oxide,IZO)、銦錫鋅氧化物(Indium Tin Zinc Oxide)、銦鎵鋅氧化物(Indium Gallium Zinc Oxide)或聚噻吩(polythiophene)。遮光層123設置於透明導電層122上,並位於非透光區121B。遮光層123用以遮蔽線路或各 種電子元件。遮光層123之材質例如是油墨或光阻。觸控元件124設置於透明基板121上,並位於透光區121A。觸控元件124用以感測觸控訊號,其材質為透明導電材料,例如是與透明導電層122相同或不相同的材料。絕緣層125用以隔絕不需導通之線路並保護此些線路。 Please refer to FIG. 1 , which is a schematic diagram of a display device 100 according to a first embodiment. The display device 100 includes a display panel 110 and a touch panel 120 . The display panel 110 is, for example, a liquid crystal display panel, an organic light emitting diode display panel, or an electrophoretic display panel. The touch panel 120 is disposed on the display panel 110. The touch panel 120 includes a transparent substrate 121 , a transparent conductive layer 122 , a light shielding layer 123 , a touch component 124 , and an insulating layer 125 . The transparent substrate 121 has a light transmitting area 121A and a non-light transmitting area 121B. The light transmitting area 121A is used to penetrate light, and the non-light transmitting area 121B is used to set various lines or electronic components. The transparent substrate 121 is, for example, a transparent glass substrate or a transparent plastic substrate. The material of the transparent substrate 121 is, for example, a flexible substrate, a glass substrate, or a tempered glass substrate. The transparent substrate 121 serves as a carrier for each laminated structure. The transparent conductive layer 122 is disposed on the transparent substrate 121 and located in the non-transmissive region 121B. The transparent conductive layer 122 is used to transmit electrical signals. The material of the transparent conductive layer 122 is, for example, Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), Indium Tin Zinc Oxide, Indium Gallium Zinc Oxide (Indium Tin Zinc Oxide) Indium Gallium Zinc Oxide) or polythiophene. The light shielding layer 123 is disposed on the transparent conductive layer 122 and located in the non-light transmitting region 121B. The light shielding layer 123 is used to shield the lines or each Kind of electronic components. The material of the light shielding layer 123 is, for example, ink or photoresist. The touch element 124 is disposed on the transparent substrate 121 and located in the light transmissive area 121A. The touch component 124 is configured to sense the touch signal, and the material is a transparent conductive material, for example, the same or different material as the transparent conductive layer 122. The insulating layer 125 is used to isolate lines that do not need to be turned on and to protect such lines.

如第1圖所示,透明導電層122設置於透明基板121上,部分位於非透光區121B,部分位於透光區121A。遮光層123設置於透明導電層122上,並位於非透光區121B。也就是說,在非透光區121B中,從使用者的觀賞面來看,依序是透明基板121、透明導電層122及遮光層123。 As shown in FIG. 1, the transparent conductive layer 122 is disposed on the transparent substrate 121, partially located in the non-transmissive region 121B, and partially located in the transparent region 121A. The light shielding layer 123 is disposed on the transparent conductive layer 122 and located in the non-light transmitting region 121B. That is, in the non-light-transmitting region 121B, the transparent substrate 121, the transparent conductive layer 122, and the light-shielding layer 123 are sequentially viewed from the viewing surface of the user.

此外,觸控元件124設置於透明基板121上,並位於透光區121A。在一實施例中,觸控面板120例如是一單層玻璃觸控(One Glass Solution,OGS),觸控元件124包含X軸觸控線路及Y軸觸控線路。當使用者以一手指或一物體接觸透明基板121時,觸控元件124可以感測到手指或物體接觸之位置。 In addition, the touch element 124 is disposed on the transparent substrate 121 and located in the light transmissive area 121A. In one embodiment, the touch panel 120 is, for example, a single-layer glass touch (OGS), and the touch element 124 includes an X-axis touch line and a Y-axis touch line. When the user touches the transparent substrate 121 with a finger or an object, the touch element 124 can sense the position where the finger or the object contacts.

如上所述,透明導電層122及觸控元件124都位於透明基板121上,且設置於同一平面,當第一光線L11射入透明導電層122而折返時,將呈現偏藍的背景顏色;當第二光線L12射入觸控元件124而折返時,也將呈現偏藍的背景顏色。如此一來,使用者不論在透光區121A或非透光區121B,都可以看到相近的背景顏色,而不會明顯的感覺到非透光區121B之遮光層123的存在。 As described above, the transparent conductive layer 122 and the touch element 124 are both disposed on the transparent substrate 121 and disposed on the same plane. When the first light L11 is incident on the transparent conductive layer 122 and folded back, the background color of the bluish background is displayed; When the second light L12 is incident on the touch element 124 and folded back, it will also exhibit a bluish background color. In this way, the user can see a similar background color in the light transmitting area 121A or the non-light transmitting area 121B without significantly perceiving the existence of the light shielding layer 123 of the non-light transmitting area 121B.

此外,當透明導電層122與觸控元件124之材質相同 時,第一光線L11及第二光線L12折返後亦將呈現相近的背景顏色。 In addition, when the transparent conductive layer 122 and the touch element 124 are made of the same material When the first light L11 and the second light L12 are folded back, the background color will also be similar.

再者,透明導電層122之厚度D11與觸控元件124之厚度D12可以實質上相同或不相同。透明導電層122之厚度D11與觸控元件124之厚度D12實質上相同時,可以使第一光線L11及第二光線L12偏藍的程度實質上相同。 Moreover, the thickness D11 of the transparent conductive layer 122 and the thickness D12 of the touch element 124 may be substantially the same or different. When the thickness D11 of the transparent conductive layer 122 is substantially the same as the thickness D12 of the touch element 124, the first light ray L11 and the second light ray L12 may be substantially blue.

在一實施例中,透明導電層122與觸控元件124的材質均採用銦錫氧化物、銦鋅氧化物、銦錫鋅氧化物或銦鎵鋅氧化物,厚度D11與厚度D12可以為100~2000埃。 In one embodiment, the transparent conductive layer 122 and the touch element 124 are made of indium tin oxide, indium zinc oxide, indium tin zinc oxide or indium gallium zinc oxide, and the thickness D11 and the thickness D12 may be 100~. 2000 angstroms.

在另一實施例中,透明導電層122與觸控元件124的材質均採用聚噻吩時,厚度D11與厚度D12可以為1~10微米。 In another embodiment, when the transparent conductive layer 122 and the touch element 124 are made of polythiophene, the thickness D11 and the thickness D12 may be 1 to 10 micrometers.

此外,透明導電層122之圖案可以與遮光層123之圖案實質上相同,或者透明導電層122之圖案可以比遮光層123之圖案還要大,以有效地降低非透光區121B之遮光層123的視覺存在感。 In addition, the pattern of the transparent conductive layer 122 may be substantially the same as the pattern of the light shielding layer 123, or the pattern of the transparent conductive layer 122 may be larger than the pattern of the light shielding layer 123 to effectively reduce the light shielding layer 123 of the non-light transmitting region 121B. The visual presence.

再者,透明導電層122設置於非透光區121B而環繞於觸控元件124,使得透明導電層122可以產生雜訊屏蔽的功能。 Moreover, the transparent conductive layer 122 is disposed on the non-transmissive region 121B and surrounds the touch element 124, so that the transparent conductive layer 122 can generate a function of noise shielding.

此外,在一實施例中,觸控元件124之X軸觸控線路及Y軸觸控線路可以延伸至透明導電層122,使得非透光區121B也有近接感測的功能(proximity)。 In addition, in an embodiment, the X-axis touch line and the Y-axis touch line of the touch element 124 may extend to the transparent conductive layer 122, so that the non-transmissive area 121B also has a proximity sensing function.

請參照第2A~2E圖,其繪示第一實施例之觸控面板120之製造方法的流程圖。首先,如第2A圖所示,提供透明基板121。接著,如第2B圖所示,於非透光區121B形 成透明導電層122並於透光區121A形成觸控元件124。形成透明導電層122及觸控元件124之步驟可以在同一步驟以同一光罩製程來完成或是在不同步驟完成。形成透明導電層122及觸控元件124之步驟在同一步驟完成,可以使透明導電層122之厚度D11及觸控元件124之厚度D12實質上相同。 Please refer to FIGS. 2A-2E for a flowchart of a method of manufacturing the touch panel 120 of the first embodiment. First, as shown in FIG. 2A, a transparent substrate 121 is provided. Next, as shown in FIG. 2B, in the non-transmissive region 121B The transparent conductive layer 122 is formed and the touch element 124 is formed in the transparent region 121A. The steps of forming the transparent conductive layer 122 and the touch element 124 can be performed in the same step by the same mask process or in different steps. The step of forming the transparent conductive layer 122 and the touch element 124 is completed in the same step, so that the thickness D11 of the transparent conductive layer 122 and the thickness D12 of the touch element 124 are substantially the same.

然後,如第2C圖所示,於非透光區121B形成遮光層123於透明導電層122上。 Then, as shown in FIG. 2C, a light shielding layer 123 is formed on the transparent conductive layer 122 in the non-light transmitting region 121B.

接著,如第2D圖所示,形成一金屬導線層126於非透光區121B,以使觸控元件124之感測訊號傳遞至一處理單元(未繪示)。 Then, as shown in FIG. 2D, a metal wiring layer 126 is formed on the non-transmissive region 121B to transmit the sensing signal of the touch component 124 to a processing unit (not shown).

然後,如第2E圖所示,形成絕緣層125覆蓋透明基板121、透明導電層122、觸控元件124及金屬導線層126。至此即形成本實施例之觸控面板120。 Then, as shown in FIG. 2E, the insulating layer 125 is formed to cover the transparent substrate 121, the transparent conductive layer 122, the touch element 124, and the metal wiring layer 126. Thus, the touch panel 120 of the present embodiment is formed.

一般而言,形成透明導電層122及觸控元件124之步驟必須施加較高的製程溫度。本實施例之遮光層123係形成於透明導電層122及觸控元件124之後。因此,若遮光層123使用不耐高溫的材料時,於形成遮光層123之步驟中,便無須再考慮透明導電層122及觸控元件124之製程溫度。 In general, the steps of forming the transparent conductive layer 122 and the touch element 124 must apply a higher process temperature. The light shielding layer 123 of the embodiment is formed behind the transparent conductive layer 122 and the touch element 124. Therefore, if the light shielding layer 123 is made of a material that is not resistant to high temperatures, in the step of forming the light shielding layer 123, the process temperature of the transparent conductive layer 122 and the touch element 124 need not be considered.

第二實施例 Second embodiment

請參照第3圖,其繪示第二實施例之顯示裝置200之示意圖。本實施例之顯示裝置200與第一實施例之顯示裝置100不同之處在於觸控元件224之設計,其餘相同之處 不再重複敘述。 Please refer to FIG. 3 , which is a schematic diagram of the display device 200 of the second embodiment. The display device 200 of the present embodiment is different from the display device 100 of the first embodiment in the design of the touch element 224, and the rest is the same. The description will not be repeated.

如第3圖所示,顯示裝置包括一顯示面板210及一觸控面板220。觸控面板220包括一透明基板221、一透明導電層222、一遮光層223、一觸控元件224及一絕緣層225。透明導電層222設置於透明基板221上,並位於非透光區221B。遮光層223設置於透明導電層222上,並位於非透光區221B。絕緣層225覆蓋透明基板221及遮光層223。觸控元件224設置於絕緣層225上。觸控元件224例如是薄膜式(Film type)或玻璃式(Glass type)觸控面板,其中玻璃式觸控面板例如是單面鍍膜(Single -sided ITO,SITO)、雙面鍍膜(Double-sided ITO,DITO)。 As shown in FIG. 3, the display device includes a display panel 210 and a touch panel 220. The touch panel 220 includes a transparent substrate 221 , a transparent conductive layer 222 , a light shielding layer 223 , a touch element 224 , and an insulating layer 225 . The transparent conductive layer 222 is disposed on the transparent substrate 221 and is located in the non-transmissive region 221B. The light shielding layer 223 is disposed on the transparent conductive layer 222 and is located in the non-light transmitting region 221B. The insulating layer 225 covers the transparent substrate 221 and the light shielding layer 223. The touch element 224 is disposed on the insulating layer 225. The touch element 224 is, for example, a film type or a glass type touch panel, wherein the glass touch panel is, for example, single-sided ITO (SITO) or double-sided (Double-sided). ITO, DITO).

當非透光區221B之第一光線L21射入透明導電層222而折返時,將呈現偏藍的背景顏色;當透光區221A之第二光線L22射入觸控元件224而折返時,也將呈現偏藍的背景顏色。如此一來,使用者不論在透光區221A或非透光區221B,都可以看到相近的背景顏色,而不會明顯的感覺到非透光區221B之遮光層223的存在。 When the first light L21 of the non-transmissive region 221B is incident on the transparent conductive layer 222 and folded back, a blue background color is displayed; when the second light L22 of the light-transmitting region 221A is incident on the touch element 224 and is folded back, Will give a bluish background color. In this way, the user can see a similar background color in the light-transmitting region 221A or the non-light-transmitting region 221B without significantly perceiving the existence of the light-shielding layer 223 of the non-light-transmitting region 221B.

請參照第4A~4D圖,其繪示第二實施例之觸控面板220之製造方法的流程圖。首先,如第4A圖所示,提供透明基板221。接著,於非透光區221B形成透明導電層222於透明基板221上。 Please refer to FIGS. 4A-4D , which are flowcharts illustrating a method of manufacturing the touch panel 220 of the second embodiment. First, as shown in FIG. 4A, a transparent substrate 221 is provided. Next, a transparent conductive layer 222 is formed on the transparent substrate 221 in the non-transmissive region 221B.

然後,如第4B圖所示,於非透光區221B形成遮光層223於透明導電層222上。 Then, as shown in FIG. 4B, a light shielding layer 223 is formed on the transparent conductive layer 222 in the non-light transmitting region 221B.

接著,如第4C圖所示,形成絕緣層225於透明基板221及遮光層223上。 Next, as shown in FIG. 4C, an insulating layer 225 is formed on the transparent substrate 221 and the light shielding layer 223.

然後,如第4D圖所示,形成觸控元件224於絕緣層225上。 Then, as shown in FIG. 4D, the touch element 224 is formed on the insulating layer 225.

第三實施例 Third embodiment

請參照第5圖,其繪示第三實施例之顯示裝置300之示意圖。本實施例之顯示裝置300與第二實施例之顯示裝置200不同之處在於透明導電層322之設計,其餘相同之處不再重複敘述。 Referring to FIG. 5, a schematic diagram of a display device 300 of a third embodiment is shown. The display device 300 of the present embodiment is different from the display device 200 of the second embodiment in the design of the transparent conductive layer 322, and the rest of the same is not repeated.

如第5圖所示,顯示裝置300包括一顯示面板310及一觸控面板320。觸控面板320包括一透明基板321、一透明導電層322、一遮光層323、一觸控元件324及一絕緣層325。透明導電層322設置於透明基板321上,並位於非透光區321B及透光區321A。透明導電層321為整面結構,其可以圖案化或不圖案化。遮光層323設置於透明導電層322上,並位於非透光區321B。絕緣層325覆蓋透明導電層322及遮光層323。觸控元件324設置於絕緣層325上。 As shown in FIG. 5 , the display device 300 includes a display panel 310 and a touch panel 320 . The touch panel 320 includes a transparent substrate 321 , a transparent conductive layer 322 , a light shielding layer 323 , a touch component 324 , and an insulating layer 325 . The transparent conductive layer 322 is disposed on the transparent substrate 321 and is located in the non-transmissive region 321B and the light-transmitting region 321A. The transparent conductive layer 321 is a one-sided structure that can be patterned or not patterned. The light shielding layer 323 is disposed on the transparent conductive layer 322 and located in the non-light transmitting region 321B. The insulating layer 325 covers the transparent conductive layer 322 and the light shielding layer 323. The touch element 324 is disposed on the insulating layer 325.

當非透光區321B之第一光線L31射入透明導電層322而折返時,將呈現偏藍的背景顏色;當透光區321A之第二光線L32射入透明導電層322而折返時,也將呈現偏藍的背景顏色。如此一來,使用者不論在透光區321A或非透光區321B,都可以看到一致的背景顏色,而不會明顯的感覺到非透光區321B之遮光層323的存在。 When the first light L31 of the non-transmissive region 321B is incident on the transparent conductive layer 322 and folded back, a blue background color is displayed; when the second light L32 of the light-transmitting region 321A is incident on the transparent conductive layer 322 and is folded back, Will give a bluish background color. In this way, the user can see a uniform background color in the light-transmitting region 321A or the non-light-transmitting region 321B without significantly perceiving the existence of the light-shielding layer 323 of the non-light-transmitting region 321B.

請參照第6A~6C圖,其繪示第三實施例之觸控面板320之製造方法的流程圖。首先,如第6A圖所示,提供透 明基板321。接著,於非透光區321B及透光區321A形成整面之透明導電層322。 Please refer to FIGS. 6A-6C for a flowchart of a method of manufacturing the touch panel 320 of the third embodiment. First, as shown in Figure 6A, provide The substrate 321 is shown. Next, a transparent conductive layer 322 is formed on the entire surface in the non-transmissive region 321B and the light-transmitting region 321A.

然後,如第6B圖所示,於非透光區321B形成遮光層323於透明導電層322上。 Then, as shown in FIG. 6B, a light shielding layer 323 is formed on the transparent conductive layer 322 in the non-light transmitting region 321B.

接著,如第6C圖所示,形成絕緣層325於透明導電層322及遮光層323上。然後,再形成觸控元件324於絕緣層325上。 Next, as shown in FIG. 6C, an insulating layer 325 is formed on the transparent conductive layer 322 and the light shielding layer 323. Then, the touch element 324 is formed on the insulating layer 325.

綜上所述,雖然本發明已以各種實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In view of the above, the present invention has been disclosed in various embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

100、200、300、400‧‧‧顯示裝置 100, 200, 300, 400‧‧‧ display devices

110、210、310‧‧‧顯示面板 110, 210, 310‧‧‧ display panels

120、220、320‧‧‧觸控面板 120, 220, 320‧‧‧ touch panels

121、221、321‧‧‧透明基板 121, 221, 321‧‧ ‧ transparent substrate

121A、221A、321A‧‧‧透光區 121A, 221A, 321A‧‧‧ light transmission area

121B、221B、321B‧‧‧非透光區 121B, 221B, 321B‧‧‧ non-transparent area

122、222、322‧‧‧透明導電層 122, 222, 322‧‧‧ transparent conductive layer

123、223、323‧‧‧遮光層 123, 223, 323‧‧ ‧ shading layer

124、224、324‧‧‧觸控元件 124, 224, 324‧‧‧ touch elements

125、225、325‧‧‧絕緣層 125, 225, 325‧ ‧ insulation

126‧‧‧金屬導線層 126‧‧‧Metal wire layer

D11、D12‧‧‧厚度 D11, D12‧‧ thickness

L11、L21、L31‧‧‧第一光線 L11, L21, L31‧‧‧ first light

L12、L22、L32‧‧‧第二光線 L12, L22, L32‧‧‧second light

第1圖繪示第一實施例之顯示裝置之示意圖。 FIG. 1 is a schematic view showing a display device of the first embodiment.

第2A~2E圖繪示第一實施例之觸控面板之製造方法的流程圖。 2A-2E are flowcharts showing a method of manufacturing the touch panel of the first embodiment.

第3圖繪示第二實施例之顯示裝置之示意圖。 FIG. 3 is a schematic view showing the display device of the second embodiment.

第4A~4D圖繪示第二實施例之觸控面板之製造方法的流程圖。 4A to 4D are flowcharts showing a method of manufacturing the touch panel of the second embodiment.

第5圖繪示第三實施例之顯示裝置之示意圖。 FIG. 5 is a schematic view showing the display device of the third embodiment.

第6A~6C圖繪示第三實施例之觸控面板之製造方法的流程圖。 6A-6C are flowcharts showing a method of manufacturing the touch panel of the third embodiment.

100‧‧‧顯示裝置 100‧‧‧ display device

110‧‧‧顯示面板 110‧‧‧ display panel

120‧‧‧觸控面板 120‧‧‧Touch panel

121‧‧‧透明基板 121‧‧‧Transparent substrate

121A‧‧‧透光區 121A‧‧‧Light transmission area

121B‧‧‧非透光區 121B‧‧‧ non-transparent area

122‧‧‧透明導電層 122‧‧‧Transparent conductive layer

123‧‧‧遮光層 123‧‧‧ shading layer

124‧‧‧觸控元件 124‧‧‧Touch components

125‧‧‧絕緣層 125‧‧‧Insulation

126‧‧‧金屬導線層 126‧‧‧Metal wire layer

D11、D12‧‧‧厚度 D11, D12‧‧ thickness

L11‧‧‧第一光線 L11‧‧‧First light

L12‧‧‧第二光線 L12‧‧‧second light

Claims (12)

一種顯示裝置,包括:一顯示面板;以及一觸控面板,設置於該顯示面板之上,其中該觸控面板包括:一透明基板,具有一非透光區與一透光區;一透明導電層,設置於該透明基板上,並位於該非透光區;一遮光層,設置於該透明導電層上,並位於該非透光區;一觸控元件,設置於該透明基板上,並位於該透光區;以及一絕緣層,設置於該透明基板及該遮光層之上,其中該觸控元件,設置於該絕緣層之上。 A display device includes: a display panel; and a touch panel disposed on the display panel, wherein the touch panel comprises: a transparent substrate having a non-transparent area and a transparent area; a transparent conductive a layer disposed on the transparent substrate and located in the non-transmissive region; a light shielding layer disposed on the transparent conductive layer and located in the non-transmissive region; a touch component disposed on the transparent substrate and located at the transparent substrate a light-transmissive region; and an insulating layer disposed on the transparent substrate and the light-shielding layer, wherein the touch component is disposed on the insulating layer. 如申請專利範圍第1項所述之顯示裝置,其中該透明導電層與該觸控元件設置於同一平面上。 The display device of claim 1, wherein the transparent conductive layer and the touch element are disposed on a same plane. 如申請專利範圍第2項所述之顯示裝置,其中該透明導電層與該觸控元件之厚度實質上相同。 The display device of claim 2, wherein the transparent conductive layer and the touch element have substantially the same thickness. 如申請專利範圍第1項所述之顯示裝置,其中該透明導電層更位於該透光區。 The display device of claim 1, wherein the transparent conductive layer is located further in the light transmissive region. 如申請專利範圍第1項所述之顯示裝置,其中該透明導電層係圖案化電極。 The display device of claim 1, wherein the transparent conductive layer is a patterned electrode. 如申請專利範圍第5項所述之顯示裝置,其中該透明導電層與該遮光層之圖案實質上相同。 The display device of claim 5, wherein the transparent conductive layer and the light shielding layer have substantially the same pattern. 如申請專利範圍第1項所述之顯示裝置,其中該透明導電層與該觸控元件之材質包括銦錫氧化物、銦鋅氧化物、銦錫鋅氧化物、銦鎵鋅氧化物或聚噻吩。 The display device of claim 1, wherein the transparent conductive layer and the touch element comprise indium tin oxide, indium zinc oxide, indium tin zinc oxide, indium gallium zinc oxide or polythiophene. . 如申請專利範圍第7項所述之顯示裝置,其中該透明導電層與該觸控元件為相同材質。 The display device of claim 7, wherein the transparent conductive layer and the touch element are made of the same material. 如申請專利範圍第8項所述之顯示裝置,其中該透明導電層與該觸控元件之材質為銦錫氧化物、銦鋅氧化物、銦錫鋅氧化物或銦鎵鋅氧化物,該透明導電層與該觸控元件之厚度為100~2000埃。 The display device of claim 8, wherein the transparent conductive layer and the touch element are made of indium tin oxide, indium zinc oxide, indium tin zinc oxide or indium gallium zinc oxide. The conductive layer and the touch element have a thickness of 100 to 2000 angstroms. 如申請專利範圍第8項所述之顯示裝置,其中該透明導電層與該觸控元件之材質為聚噻吩,該透明導電層與該觸控元件之厚度為1~10微米。 The display device of claim 8, wherein the transparent conductive layer and the touch element are made of polythiophene, and the transparent conductive layer and the touch element have a thickness of 1 to 10 micrometers. 如申請專利範圍第1項所述之顯示裝置,其中該顯示面板係一液晶顯示面板、一有機發光二極體顯示面板或一電泳顯示面板。 The display device of claim 1, wherein the display panel is a liquid crystal display panel, an organic light emitting diode display panel or an electrophoretic display panel. 如申請專利範圍第1項所述之顯示裝置,其中該透明基板的材質為軟性基板、玻璃基板或強化玻璃基板。 The display device according to claim 1, wherein the transparent substrate is made of a flexible substrate, a glass substrate or a tempered glass substrate.
TW101119183A 2012-05-29 2012-05-29 Display device TWI474231B (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110141059A1 (en) * 2007-01-18 2011-06-16 Nitto Denko Corporation Transparent conductive film, method for production thereof and touch panel therewith
TWM423307U (en) * 2011-08-10 2012-02-21 Fortrend Taiwan Scient Corp Touch panel structure
TWM428423U (en) * 2011-10-26 2012-05-01 Tpk Touch Solutions Xiamen Inc Touch devices

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110141059A1 (en) * 2007-01-18 2011-06-16 Nitto Denko Corporation Transparent conductive film, method for production thereof and touch panel therewith
TWM423307U (en) * 2011-08-10 2012-02-21 Fortrend Taiwan Scient Corp Touch panel structure
TWM428423U (en) * 2011-10-26 2012-05-01 Tpk Touch Solutions Xiamen Inc Touch devices

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