TWI473282B - Wire having active solder coating and using method thereof - Google Patents

Wire having active solder coating and using method thereof Download PDF

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TWI473282B
TWI473282B TW100122897A TW100122897A TWI473282B TW I473282 B TWI473282 B TW I473282B TW 100122897 A TW100122897 A TW 100122897A TW 100122897 A TW100122897 A TW 100122897A TW I473282 B TWI473282 B TW I473282B
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wire
substrate
active solder
active
based alloy
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TW100122897A
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TW201301541A (en
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Lung Chuan Tsao
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Univ Nat Pingtung Sci & Tech
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Description

具有活性焊料塗層的導線及其使用方法Conductor with active solder coating and method of use thereof

本發明係關於一種太陽能電池電極及其製做方法,特別是關於一種具有活性焊料塗層的導線及其使用方法。The present invention relates to a solar cell electrode and a method of fabricating the same, and more particularly to a wire having an active solder coating and a method of using the same.

近年來,因為石化燃料逐漸短缺,使得各種再生性替代能源(例如太陽能電池、燃料電池、風力發電)的發展逐漸受到重視,其中尤以太陽能發電最受各界重視。In recent years, due to the gradual shortage of fossil fuels, the development of various renewable alternative energy sources (such as solar cells, fuel cells, and wind power) has gradually received attention. Among them, solar power generation has received the most attention.

請參考第1圖所示,其揭示一種現有太陽能電池元件的剖視圖,其中當製做此現有太陽能電池元件時,首先提供一p型矽半導體基材11,進行表面酸蝕粗化後,接著將磷或類似物質以熱擴散方式於該p型矽半導體基材11之受光面側形成反向導電性類型之一n型擴散層12,並形成p-n介面(junction)。隨後,再於該n型擴散層12上形成一抗反射層13與一正面電極14,其中係藉由電漿化學氣相沈積等方法於該n型擴散層12上形成氮化矽(silicon nitride)膜作為該抗反射層13,再於該抗反射層13上以網印方式塗佈含有銀粉末之銀導電漿料,隨後進行烘烤乾燥及高溫燒結之程序,以形成該正面電極14。在高溫燒結過程中,用以形成該正面電極14之導電漿料可燒結並穿透該抗反射層13,直到電性接觸該n型擴散層12上。Referring to FIG. 1, a cross-sectional view of a conventional solar cell element is disclosed. When the conventional solar cell element is fabricated, a p-type germanium semiconductor substrate 11 is first provided for surface acid roughening, and then Phosphorus or the like forms a n-type diffusion layer 12 of one type of reverse conductivity on the light-receiving side of the p-type germanium semiconductor substrate 11 by thermal diffusion, and forms a p-n junction. Then, an anti-reflection layer 13 and a front electrode 14 are formed on the n-type diffusion layer 12, wherein silicon nitride is formed on the n-type diffusion layer 12 by plasma chemical vapor deposition or the like. As the antireflection layer 13, a silver conductive paste containing silver powder is applied to the antireflection layer 13 by screen printing, followed by baking drying and high temperature sintering to form the front electrode 14. In the high-temperature sintering process, the conductive paste for forming the front electrode 14 may be sintered and penetrated through the anti-reflection layer 13 until electrically contacting the n-type diffusion layer 12.

另一方面,該p型矽半導體基材11之背面側則使用含有鋁粉末之鋁導電漿料以印刷方式形成鋁質之一背面電極層15。隨後,進行乾燥烘烤之程序,再於相同上述的高溫燒結下進行燒結。燒結過程中,從乾燥狀態轉變成鋁質之背面電極層15;同時,使鋁原子擴散至該p型矽半導體基材11中,於是在該背面電極層15與p型矽半導體基材11之間形成含有高濃度之鋁摻雜劑之一p+ 層16。該層通常稱為後表面場(BSF)層,且有助於改良太陽能電池之光轉換效率。由於鋁質之背面電極層15,不具焊接性(潤濕性差)。此外,可藉由網印方式於該背面電極層15上印刷一種銀-鋁導電漿料,經燒結後形成一具有良好焊接性之導線17,以便將多個太陽能電池相互串連形成一模組。On the other hand, on the back side of the p-type germanium semiconductor substrate 11, one of the aluminum back surface electrode layers 15 is formed by printing using an aluminum conductive paste containing aluminum powder. Subsequently, the drying and baking process is carried out, followed by sintering under the same high temperature sintering as described above. During the sintering process, the aluminum alloy is transformed from the dry state to the aluminum back electrode layer 15; at the same time, aluminum atoms are diffused into the p-type germanium semiconductor substrate 11, so that the back electrode layer 15 and the p-type germanium semiconductor substrate 11 are A p + layer 16 containing one of a high concentration of aluminum dopant is formed. This layer is commonly referred to as a back surface field (BSF) layer and contributes to improving the light conversion efficiency of solar cells. Since the aluminum back electrode layer 15 is not weldable (poor wettability). In addition, a silver-aluminum conductive paste can be printed on the back electrode layer 15 by screen printing, and after sintering, a good soldering wire 17 is formed, so that a plurality of solar cells are connected in series to form a module. .

然而,現有太陽能電池元件在實際製造上仍具有下述問題,例如:連接於該正面電極層14、背面電極層15及導線17是使用銀、鋁及銀-鋁等導電漿料來製做電極及導線,但該銀、鋁及銀-鋁導電漿料的材料成本頗高,約佔整個模組製作成本的10至20%。再者,這些導電漿料含有一定比例金屬粉末、玻璃粉末及有機媒劑,如日本Kokai專利公開第2001-127317號及第2004-146521號和台灣美商杜邦申請之專利公告第I339400號,其中導電漿料含有降低導電性及不利於焊接性之玻璃微粒;以及另含有有機溶劑等成分,因此在燒結後會造成太陽能晶片之污染,故必須特別加以清洗。再者,使用導電漿料製做導線必需經過450至850℃左右的高溫燒結,但此高溫條件可能造成其他材料層的材料劣化或失效,進而嚴重影響製造電池的良率。基於上述高溫燒結條件精密控制的需求,也使得進行高溫燒結步驟相對較為費時及複雜,並會影響在單位時間內生產電池的整體生產量。However, the conventional solar cell elements still have the following problems in practical manufacturing. For example, the front electrode layer 14, the back electrode layer 15, and the wires 17 are connected to each other using conductive pastes such as silver, aluminum, and silver-aluminum. And wires, but the material cost of the silver, aluminum and silver-aluminum conductive paste is quite high, accounting for about 10 to 20% of the entire module manufacturing cost. In addition, the conductive paste contains a certain proportion of metal powder, glass powder, and an organic vehicle, such as Japanese Kokai Patent Publication No. 2001-127317 and No. 2004-146521, and Japanese Patent Application No. I339400, which is filed by DuPont. The conductive paste contains glass particles which reduce conductivity and are unfavorable for solderability; and further contains components such as an organic solvent, so that contamination of the solar wafer is caused after sintering, and therefore it is necessary to particularly clean. Furthermore, the use of conductive paste to make wires must be sintered at a high temperature of about 450 to 850 ° C, but this high temperature condition may cause deterioration or failure of materials of other material layers, thereby seriously affecting the yield of the battery. The need for precise control of the high-temperature sintering conditions described above also makes the high-temperature sintering step relatively time consuming and complicated, and affects the overall production capacity of the battery produced per unit time.

故,有必要提供一種製做太陽能電池電極之方法,以解決習用技術所存在的問題。Therefore, it is necessary to provide a method for manufacturing solar cell electrodes to solve the problems of the conventional technology.

本發明之主要目的在於提供一種具有活性焊料塗層的導線及其使用方法,其係使用成本較低的活性焊料來塗佈在線材的外表面上,以形成具有活性焊料塗層的導線,當使用導線時,若導線之活性焊料塗層接觸預先加熱的基板(如太陽能電池基板),即可焊接結合在基板上來形成電路圖案,因而有利於降低材料成本,並簡化及加速電路製程,並且增強電性效應。The main object of the present invention is to provide a wire with an active solder coating and a method of using the same, which uses a lower cost active solder to coat the outer surface of the wire to form a wire with an active solder coating. When a wire is used, if the active solder coating of the wire contacts a preheated substrate (such as a solar cell substrate), it can be soldered and bonded to the substrate to form a circuit pattern, thereby reducing material cost, simplifying and accelerating the circuit process, and enhancing Electrical effect.

本發明之次要目的在於提供一種具有活性焊料塗層的導線及其使用方法,其中當應用在製做太陽能電池基板時,導線能以相對較低熔點溫度焊能直接活性接結合在太陽能電池基板之不具焊接性(潤濕性差)之鋁質背面電極層上,以形成電路圖案來連接於數個背面電極之間,故不需藉由網印方式銀-鋁導電漿料來製作導線,以及高溫燒結製程,因而有利於避免網印不均勻及基板材料再次因高溫燒結作業而劣化,以相對提高基板製造良率,並且增強電性效應。A secondary object of the present invention is to provide a wire with an active solder coating and a method of using the same, wherein when applied to a solar cell substrate, the wire can be directly bonded to the solar cell substrate at a relatively low melting point temperature. The aluminum back electrode layer which is not solderable (poor wettability) is connected between the plurality of back electrodes by forming a circuit pattern, so that it is not necessary to make a wire by a screen printing silver-aluminum conductive paste, and The high-temperature sintering process is advantageous in avoiding uneven printing and substrate material degradation due to high-temperature sintering operation, so as to relatively improve the substrate manufacturing yield and enhance the electrical effect.

本發明之另一目的在於提供一種具有活性焊料塗層的導線及其使用方法,其在由具有活性焊料塗層的金屬導線材具有良好導電率,能有效地降低電能消耗,進而提高太陽能電池之轉換效率,故不會因導電漿料含有不具導電性及不利於焊接性之玻璃微粒問題。Another object of the present invention is to provide a wire with an active solder coating and a method of using the same, which has good electrical conductivity in a metal wire material having an active solder coating, can effectively reduce power consumption, and thereby improve solar cell The conversion efficiency is not caused by the problem that the conductive paste contains glass particles which are not electrically conductive and which are not favorable for solderability.

本發明之再一目的在於提供一種具有活性焊料塗層的導線及其使用方法,其在由具有活性焊料塗層的所形成的電路圖案上可進一步選擇進行無電鍍或電鍍等增厚處理,其除了可增加該電路圖案之厚度外,也可增加電路圖案與外部電路結合之接合性質、導電能力及防止氧化生鏽能力。A further object of the present invention is to provide a wire having an active solder coating and a method of using the same, which can be further selected to be thickened by electroless plating or electroplating on a circuit pattern formed by an active solder coating. In addition to increasing the thickness of the circuit pattern, the bonding property, the electrical conductivity, and the ability to prevent oxidation and rust of the circuit pattern combined with the external circuit can also be increased.

為達上述之目的,本發明提供一種具有活性焊料塗層的導線,其包含:一線材,具有一外表面;以及一活性焊料塗層,塗佈在該線材之外表面上;其中該活性焊料塗層之一活性焊料包含至少一種銲錫合金,並混摻有6重量%以下之至少一種活性成分以及0.01至2重量%之至少一種稀土族元素(Re)。For the above purposes, the present invention provides a wire having an active solder coating comprising: a wire having an outer surface; and an active solder coating applied to the outer surface of the wire; wherein the active solder One of the active solders of the coating comprises at least one solder alloy mixed with at least one active ingredient of 6% by weight or less and at least one rare earth element (Re) of from 0.01 to 2% by weight.

再者,本發明另提供一種具有活性焊料塗層的導線之使用方法,其包含下列步驟:提供一基板;提供一導線,其具有一線材及塗佈在該線材上之一活性焊料塗層,其中該活性焊料塗層包含至少一種銲錫合金,並混摻有6重量%以下之至少一種活性成分以及0.01至2重量%之至少一種稀土族元素(Re);先以低於450℃之溫度預熱該導線及基板;再將該預熱後之導線放置在該預熱後之基板上,使該活性焊料塗層接觸、熔化並焊接結合在該預熱後之基板上;以及,冷卻固化該導線之活性焊料塗層的活性焊料,以藉由該導線形成一電路圖案。Furthermore, the present invention further provides a method of using a wire having an active solder coating, comprising the steps of: providing a substrate; providing a wire having a wire and an active solder coating coated on the wire, Wherein the active solder coating comprises at least one solder alloy mixed with at least one active ingredient of 6% by weight or less and at least one rare earth element (Re) of 0.01 to 2% by weight; firstly preheated at a temperature lower than 450 ° C Heating the wire and the substrate; placing the preheated wire on the preheated substrate, contacting, melting and soldering the active solder coating on the preheated substrate; and cooling and solidifying An active solder of the active solder coating of the wire to form a circuit pattern by the wire.

在本發明之一實施例中,該線材之材料選自銀基合金、銅基合金、鋁基合金、鎳基合、金基合金或其混合合金。In an embodiment of the invention, the material of the wire is selected from the group consisting of a silver-based alloy, a copper-based alloy, an aluminum-based alloy, a nickel-based alloy, a gold-based alloy, or a mixed alloy thereof.

在本發明之一實施例中,該銲錫合金選自錫基合金、鉍基合金或銦基合金。In an embodiment of the invention, the solder alloy is selected from the group consisting of a tin based alloy, a bismuth based alloy, or an indium based alloy.

在本發明之一實施例中,該錫基合金、鉍基合金或銦基合金混摻有6重量%以下之至少一種活性成分,例如選自包含4重量%以下之鈦(Ti)、釩(V)、鎂(Mg)、鋰(Li)、鋯(Zr)、鉿(Hf)或其混合。In an embodiment of the present invention, the tin-based alloy, the bismuth-based alloy or the indium-based alloy is blended with at least one active ingredient of 6 wt% or less, for example, selected from titanium (Ti) containing less than 4 wt%, vanadium ( V), magnesium (Mg), lithium (Li), zirconium (Zr), hafnium (Hf) or a mixture thereof.

在本發明之一實施例中,該稀土族元素係選自鈧元素(Sc)、釔元素(Y)或「鑭系元素」,其中「鑭系元素」包含:鑭(La)、鈰(Ce)、鐠(Pr)、釹(Nd)、钜(Pm)、釤(Sm)、銪(Eu)、釓(Gd)、鋱(Td)、鏑(Dy)、鈥(Ho)、鉺(Er)、銩(Tm)、鐿(Yb)或鑥(Lu)。In an embodiment of the invention, the rare earth element is selected from the group consisting of lanthanum (Sc), lanthanum (Y) or "lanthanide", wherein "lanthanide" comprises: lanthanum (La), lanthanum (Ce) ), 鐠 (Pr), 钕 (Nd), 钜 (Pm), 钐 (Sm), 铕 (Eu), 釓 (Gd), 鋱 (Td), 镝 (Dy), 鈥 (Ho), 铒 (Er ), 銩 (Tm), 镱 (Yb) or 鑥 (Lu).

在本發明之一實施例中,在將該導線放置在該基板上的步驟中,藉由超音波的輔助使該活性焊料塗層接觸、熔化並焊接結合在該基板上。In one embodiment of the invention, in the step of placing the wire on the substrate, the active solder coating is contacted, melted and solder bonded to the substrate by the aid of ultrasonic waves.

在本發明之一實施例中,在形成該電路圖案之後,另包含:對該電路圖案選擇進行無電鍍或電鍍,以增加該電路圖案之厚度。In an embodiment of the invention, after the circuit pattern is formed, the method further comprises: performing electroless plating or electroplating on the circuit pattern selection to increase the thickness of the circuit pattern.

在本發明之一實施例中,該無電鍍或電鍍使用之金屬為銅、銀、鎳、金或其複合層。In an embodiment of the invention, the metal used for electroless plating or electroplating is copper, silver, nickel, gold or a composite layer thereof.

在本發明之一實施例中,該活性焊料塗層之厚度介於10至200微米(um)之間。In one embodiment of the invention, the active solder coating has a thickness between 10 and 200 microns (um).

在本發明之一實施例中,該基板選自太陽能電池、發光二極體(LED)、電容元件、振盪器元件、半導體晶片、其他主動或被動元件之半導體基板、金屬氧化物基板、燃料電池電極板或陶瓷基板。In an embodiment of the invention, the substrate is selected from the group consisting of a solar cell, a light emitting diode (LED), a capacitive element, an oscillator element, a semiconductor wafer, a semiconductor substrate of other active or passive components, a metal oxide substrate, and a fuel cell. Electrode plate or ceramic substrate.

在本發明之一實施例中,該基板選擇一太陽能電池之基板,其中該太陽能電池基板具有一背面,該導線在該背面上形成該電路圖案,以電性連接數個背面電極。In an embodiment of the invention, the substrate selects a substrate of a solar cell, wherein the solar cell substrate has a back surface, and the wire forms the circuit pattern on the back surface to electrically connect the plurality of back electrodes.

在本發明之一實施例中,該基板及電路圖案係與一銅覆層形成一堆疊結構,該堆疊結構可與另一相同之堆疊結構進一步相互堆疊。In an embodiment of the invention, the substrate and the circuit pattern form a stacked structure with a copper cladding layer, and the stacked structure may be further stacked on each other with another identical stacked structure.

為了讓本發明之上述及其他目的、特徵、優點能更明顯易懂,下文將特舉本發明較佳實施例,並配合所附圖式,作詳細說明如下。再者,本發明所提到的方向用語,例如「上」、「下」、「前」、「後」、「左」、「右」、「內」、「外」或「側面」等,僅是參考附加圖式的方向。因此,使用的方向用語是用以說明及理解本發明,而非用以限制本發明。The above and other objects, features and advantages of the present invention will become more <RTIgt; Furthermore, the directional terms mentioned in the present invention, such as "upper", "lower", "before", "after", "left", "right", "inside", "outside" or "side", etc. Just refer to the direction of the additional schema. Therefore, the directional terminology used is for the purpose of illustration and understanding of the invention.

請參照第2A至2D圖所示,其揭示本發明較佳實施例具有活性焊料塗層的導線之使用方法的流程示意圖,其中該方法主要包含下列步驟:提供一基板2;提供一導線3,其具有一線材31及塗佈在該線材31上之一活性焊料塗層32,其中該活性焊料塗層32包含至少一種銲錫合金,並混摻有6重量%以下之至少一種活性成分以及0.01至2重量%之至少一種稀土族元素(Re);先以低於450℃之溫度預熱該基板2;再將該預熱後之導線3放置在該預熱後之基板2上,使該活性焊料塗層32接觸、熔化並焊接結合在該預熱後之基板2上;以及,冷卻固化該導線3之活性焊料塗層32的活性焊料,以藉由該導線3形成一電路圖案3。Referring to FIGS. 2A-2D, there is shown a schematic flow chart of a method for using a conductive solder coated wire according to a preferred embodiment of the present invention, wherein the method mainly comprises the steps of: providing a substrate 2; providing a wire 3, It has a wire 31 and an active solder coating 32 coated on the wire 31, wherein the active solder coating 32 comprises at least one solder alloy and is blended with at least one active ingredient of 6% by weight or less and 0.01 to 2% by weight of at least one rare earth element (Re); preheating the substrate 2 at a temperature lower than 450 ° C; and then placing the preheated wire 3 on the preheated substrate 2 to make the activity The solder coating 32 is contacted, melted and soldered to the preheated substrate 2; and the active solder of the active solder coating 32 of the wire 3 is cooled to form a circuit pattern 3 by the wire 3.

請參照第2A圖所示,本發明較佳實施例以活性焊料製做太陽能電池電極的方法首先係:提供一基板2。在本步驟中,該基板2係可選自太陽能電池、發光二極體(LED)、電容元件、振盪器元件、半導體晶片、其他主動或被動元件之半導體基板、金屬氧化物基板、燃料電池電極板或陶瓷基板。在本實施例中,該基板2係以一太陽能電池基板為例,例如可選自矽太陽能電池(例如多晶矽、單晶矽或非晶矽)、化合物太陽能電池(例如III-V族之砷化鎵、II-VI族碲化鎘CdTe、硫化鎘CdS與多元化合物之銅銦硒CuInSe2或銅銦鎵硒CIGS等)或有機型太陽能電池之晶片型或薄膜型基板,其中當該基板2選自矽太陽能電池之晶片型基板時,該基板2可選擇包含一p型矽半導體基材21,但本發明並不限於此。Referring to FIG. 2A, a preferred embodiment of the present invention uses a reactive solder to form a solar cell electrode. First, a substrate 2 is provided. In this step, the substrate 2 can be selected from a solar cell, a light emitting diode (LED), a capacitive element, an oscillator element, a semiconductor wafer, a semiconductor substrate of other active or passive components, a metal oxide substrate, and a fuel cell electrode. Plate or ceramic substrate. In this embodiment, the substrate 2 is exemplified by a solar cell substrate, for example, a solar cell (for example, polycrystalline germanium, single crystal germanium or amorphous germanium) or a compound solar cell (for example, III-V arsenic). a wafer type or film type substrate of a gallium, a II-VI group of cadmium telluride CdTe, a cadmium sulfide CdS and a multicomponent compound of copper indium selenide CuInSe2 or a copper indium gallium selenide CIGS, or an organic solar cell, wherein the substrate 2 is selected from the group consisting of In the case of a wafer-type substrate of a solar cell, the substrate 2 may optionally include a p-type germanium semiconductor substrate 21, but the invention is not limited thereto.

如第2A圖所示,在一實施方式中,當該基板2包含該p型矽半導體基材21時,該p型矽半導體基材21之正面側可由內而外依序預先形成一n型擴散層22、一抗反射層23及數個正面電極24。另外,該p型矽半導體基材21之背面側則由外而內依序形成一鋁質之背面電極層25及一p+ 層26。上述基板2之結構類似於第1圖之現有太陽能電池元件的結構,且僅為本發明之一種實施方式,故於此不另予詳細說明其與現有技術相同之部份。As shown in FIG. 2A, in an embodiment, when the substrate 2 includes the p-type germanium semiconductor substrate 21, the front side of the p-type germanium semiconductor substrate 21 may be pre-formed in an n-type from the inside to the outside. The diffusion layer 22, an anti-reflection layer 23 and a plurality of front electrodes 24. Further, on the back side of the p-type germanium semiconductor substrate 21, an aluminum back electrode layer 25 and a p + layer 26 are sequentially formed from the outside. The structure of the above-mentioned substrate 2 is similar to that of the conventional solar cell element of Fig. 1, and is only one embodiment of the present invention, so that the same portions as the prior art will not be described in detail herein.

請參照第2B圖所示,本發明較佳實施例以活性焊料製做太陽能電池電極的方法接著係:提供一導線3,其具有一線材31及塗佈在該線材31上之一活性焊料塗層32,其中該活性焊料塗層32包含至少一種銲錫合金,並混摻有6重量%以下之至少一種活性成分以及0.01至2重量%之至少一種稀土族元素(Re)。在本步驟中,該活性焊料塗層32之活性焊料最初可以為線狀固態焊條、粉末狀焊粉或膏狀焊料之形態,在塗佈時,將該活性焊料以低於450℃的熔點溫度進行熔融,接著將該線材31浸入熔融之活性焊料內,或亦可以刷塗方式塗佈在該線材31的外表面;或亦可通過擠製方式將活性焊料包覆在該線材31的外表面;或通過電鍍方式將活性焊料電鍍在該線材31的外表面,或亦可以物理氣相沈積(Physical Vapor Deposition,PVD)方式將活性焊料鍍在該線材31的外表面,其中該活性焊料塗層32之塗佈厚度與該線材31之直徑或剖面形狀係依實際基板需求來進行設計。例如,在本實施例中,該線材31是呈扁平長條狀的線材形狀體,該活性焊料塗層32之厚度介於10至200微米(um)之間,該線材31之直徑至少大於該活性焊料塗層32之厚度值。Referring to FIG. 2B, a preferred embodiment of the present invention is a method for manufacturing a solar cell electrode by using an active solder. Next, a wire 3 having a wire 31 and an active solder coating coated on the wire 31 is provided. Layer 32, wherein the active solder coating 32 comprises at least one solder alloy mixed with at least one active ingredient of 6% by weight or less and at least one rare earth element (Re) of from 0.01 to 2% by weight. In this step, the active solder of the active solder coating 32 may initially be in the form of a linear solid electrode, a powdered solder powder or a cream solder, and the active solder is melted at a melting point lower than 450 ° C during coating. Melting, the wire 31 is immersed in the molten active solder, or may be applied to the outer surface of the wire 31 by brushing; or the active solder may be coated on the outer surface of the wire 31 by extrusion. Or the active solder is electroplated on the outer surface of the wire 31, or the active solder may be plated on the outer surface of the wire 31 by a physical vapor deposition (PVD) method, wherein the active solder coating The coating thickness of 32 and the diameter or cross-sectional shape of the wire 31 are designed according to actual substrate requirements. For example, in the present embodiment, the wire 31 is a wire-shaped body having a flat strip shape, and the thickness of the active solder coating layer 32 is between 10 and 200 micrometers (um), and the diameter of the wire 31 is at least larger than the diameter. The thickness of the active solder coating 32.

再者,本發明使用之線材31合金選自銀基合金、銅基合金、鋁基合金、鎳基合、金基合金或其混合合金。Further, the wire 31 alloy used in the present invention is selected from the group consisting of a silver-based alloy, a copper-based alloy, an aluminum-based alloy, a nickel-based alloy, a gold-based alloy, or a mixed alloy thereof.

再者,本發明使用之銲錫合金選自錫基合金、銦基合金、鉍基合金、其他銲錫合金或其混合。該錫基合金、鉍基合金或銦基合金並混摻有6重量%以下之至少一種活性成分,例如選自包含0.1至6.0、0.1至5.0或0.1至4.0重量%之鈦(Ti)、釩(V)、鎂(Mg)、鋰(Li)、鋯(Zr)、鉿(Hf)或其混合。同時,該錫基合金、鉍基合金或銦基合金亦混摻有0.01至2.0、0.01至1.0或0.01至0.5重量%之至少一種稀土族元素(Re)。例如,該稀土族元素係選自鈧元素(Sc)、釔元素(Y)或「鑭系元素」,其中「鑭系元素」又包含:鑭(La)、鈰(Ce)、鐠(Pr)、釹(Nd)、钜(Pm)、釤(Sm)、銪(Eu)、釓(Gd)、鋱(Td)、鏑(Dy)、鈥(Ho)、鉺(Er)、銩(Tm)、鐿(Yb)或鑥(Lu),在產業的利用上,稀土族元素通常係以混合物的形態存在,常見之稀土族元素混合物例如係由:鑭(La)、鈰(Ce)、鐠(Pr)、釹(Nd)或釤(Sm)以及極少量的鐵(Fe)、磷(P)、硫(S)或矽(Si)所組成。Further, the solder alloy used in the present invention is selected from the group consisting of a tin-based alloy, an indium-based alloy, a bismuth-based alloy, other solder alloys, or a mixture thereof. The tin-based alloy, bismuth-based alloy or indium-based alloy is blended with at least one active ingredient of 6% by weight or less, for example, selected from titanium (Ti), vanadium containing 0.1 to 6.0, 0.1 to 5.0 or 0.1 to 4.0% by weight. (V), magnesium (Mg), lithium (Li), zirconium (Zr), hydrazine (Hf) or a mixture thereof. Meanwhile, the tin-based alloy, the niobium-based alloy or the indium-based alloy is also blended with 0.01 to 2.0, 0.01 to 1.0 or 0.01 to 0.5% by weight of at least one rare earth element (Re). For example, the rare earth element is selected from the group consisting of lanthanum (Sc), lanthanum (Y) or "lanthanide", wherein "lanthanide" further comprises: lanthanum (La), cerium (Ce), strontium (Pr) , Nd, Pm, Sm, Eu, Gd, Td, Dy, Ho, Er, Tm , Yb or Lu, in the use of the industry, the rare earth elements usually exist in the form of a mixture, and the common rare earth element mixture is, for example,: lanthanum (La), cerium (Ce), lanthanum ( Pr), niobium (Nd) or niobium (Sm) and a very small amount of iron (Fe), phosphorus (P), sulfur (S) or antimony (Si).

請參照第2C圖所示,本發明較佳實施例以活性焊料製做太陽能電池電極的方法接著係:先以低於450℃之溫度預熱該基板2。在本步驟中,根據該活性焊料的實際成份組成比例,該活性焊料的預設熔點溫度範圍大致可維持在低於450℃之相對較低加熱溫度下,例如在100℃至450℃之間、150℃至400℃之間或200℃至350℃之間,但並不限於此。本發明是在將該導線3焊接結合在該基板2上之前,預先加熱該基板2,使該基板2之背面(或正面)具有低於或等於或高於該活性焊料之熔點。值得注意的是,此加熱溫度遠低於一般傳統網印燒結方式,如該基板2之正面電極24及/導線3’及/或背面電極25之高溫燒結溫度(約在450至850℃左右),因此本實施案例是屬於相對較低加熱溫度,故不會進一步造成該基板之任何材料的劣化。另外,不會發生導電性降低問題,如一般採用網印之銀、鋁及銀-鋁之導電漿料內,因含有不具導電性玻璃微粒,造成太陽能電池之轉換效率降低。Referring to FIG. 2C, a preferred embodiment of the present invention uses a reactive solder to form a solar cell electrode. The method further comprises: preheating the substrate 2 at a temperature below 450 °C. In this step, according to the actual composition ratio of the active solder, the predetermined melting point temperature range of the active solder can be maintained substantially at a relatively low heating temperature lower than 450 ° C, for example, between 100 ° C and 450 ° C, Between 150 ° C and 400 ° C or between 200 ° C and 350 ° C, but is not limited thereto. In the present invention, before the wire 3 is solder bonded to the substrate 2, the substrate 2 is preheated so that the back surface (or front surface) of the substrate 2 has a melting point lower than or equal to or higher than that of the active solder. It is worth noting that the heating temperature is much lower than the conventional conventional screen printing sintering method, such as the high temperature sintering temperature of the front electrode 24 and/or the wire 3' and/or the back electrode 25 of the substrate 2 (about 450 to 850 ° C). Therefore, the present embodiment is a relatively low heating temperature, so that no deterioration of any material of the substrate is caused. In addition, the problem of lowering the conductivity does not occur. For example, in the conductive paste of silver, aluminum and silver-aluminum which are generally screen printed, the conversion efficiency of the solar cell is lowered due to the absence of conductive glass particles.

請參照第2C圖所示,本發明較佳實施例以活性焊料製做太陽能電池電極的方法接著係:再將該預熱後之導線3放置在該預熱後之基板2上,使該活性焊料塗層32接觸、熔化並焊接結合在該預熱後之基板2上,成為一背面導線3’。在本步驟中,本發明是將該導線3放置在該基板2之背面上並位於數個背面電極25之間。更詳細的說,係使用一工具4(例如一壓桿)將該導線3壓在該基板2之背面上,使得該活性焊料塗層32接觸、熔化並焊接結合在該基板2之背面上,因而成為一背面導線3’,其中該背面導線3’包含一線材31’及一活性焊料塗層32’,該活性焊料塗層32’熔化並焊接結合在該基板2上。此結合過程也可簡稱為打線作業。其正面電極24其實施與上述方法相同,故於此不另予詳細說明其與現有技術相同之部份。另外,在上述打線作業期間,本發明較佳亦可選擇經由該工具4施加超音波予該導線3之活性焊料塗層32的活性焊料,以活化該活性焊料與該基板2之間的一反應接合層(未標示),其中超音波之頻率及處理時間係依該活性焊料之種類及所需刮塗厚度等參數進行調整,本發明並不限制頻率及處理時間等參數。當施加超音波的能量予該活性焊料時,超音波的波動能量進入該活性焊料中,可以藉由超音波的攪動將該熔化活性焊料之表面氧化膜擊破,以露出該活性焊料之金屬焊料與活性成分,並促進該熔融活性焊料之活性成分與該基板2之間的反應形成一層反應接合層;另外,超音波亦可賦予將活性焊料內之高硬度介金屬化合物顆粒對該基板2之固體表面提供摩擦式清潔作用,而有利於將該基板2之表面污物與鈍化層除去。再者,超音波對該活性焊料也能賦予額外動能,以利其滲入該基板2之微細孔洞等死角內,如此可使該活性焊料在後續冷卻固化後直接牢固接合於清潔後的基板2之固體表面。另外,本實施超音波輔助接合過程中,其中該基板2以及該導線3之預熱溫度,則可在該活性焊料之熔點以下,藉由超音波能量將該導線3焊接接合於基板2。Referring to FIG. 2C, in a preferred embodiment of the present invention, a method for manufacturing a solar cell electrode by using an active solder is followed by: placing the preheated wire 3 on the preheated substrate 2 to make the activity. The solder coating 32 is contacted, melted and soldered to the preheated substrate 2 to form a back conductor 3'. In this step, the present invention places the wire 3 on the back surface of the substrate 2 and between the plurality of back electrodes 25. In more detail, the wire 3 is pressed onto the back surface of the substrate 2 by using a tool 4 (for example, a pressing bar), so that the active solder coating 32 is contacted, melted and soldered to the back surface of the substrate 2, Thus, it becomes a back conductor 3', wherein the back conductor 3' comprises a wire 31' and an active solder coating 32', and the active solder coating 32' is melted and soldered to the substrate 2. This combination process can also be referred to simply as a wire bonding operation. The front electrode 24 is implemented in the same manner as described above, and thus the same portions as the prior art will not be described in detail herein. In addition, during the above-mentioned wire bonding operation, the present invention preferably also selects an active solder applied to the active solder coating 32 of the wire 3 via the tool 4 to activate a reaction between the active solder and the substrate 2. The bonding layer (not shown), wherein the frequency of the ultrasonic wave and the processing time are adjusted according to the type of the active solder and the required blade thickness, and the present invention does not limit parameters such as frequency and processing time. When the energy of the ultrasonic wave is applied to the active solder, the wave energy of the ultrasonic wave enters the active solder, and the surface oxide film of the molten active solder can be broken by the agitation of the ultrasonic wave to expose the metal solder of the active solder and The active ingredient promotes the reaction between the active component of the molten active solder and the substrate 2 to form a reactive bonding layer; in addition, the ultrasonic wave can also impart solidity to the substrate 2 of the high hardness intermetallic compound particles in the active solder. The surface provides a frictional cleaning effect that facilitates removal of surface contamination of the substrate 2 from the passivation layer. Furthermore, the ultrasonic wave can also impart additional kinetic energy to the active solder so as to penetrate into the dead holes of the micro-holes of the substrate 2, so that the active solder can be directly and firmly bonded to the cleaned substrate 2 after subsequent cooling and solidification. Solid surface. In the ultrasonic assisted bonding process of the present embodiment, the substrate 2 and the preheating temperature of the lead 3 may be soldered to the substrate 2 by ultrasonic energy below the melting point of the active solder.

請參照第2D圖所示,本發明較佳實施例以活性焊料製做太陽能電池電極的方法接著係:冷卻固化該背面導線3’之活性焊料塗層32的活性焊料,以藉由該背面導線3’形成一電路圖案。在完成上述打線作業後,接著冷卻該基板2,使該活性焊料固化,讓該背面導線3’牢固結合在該基板2之背面上而形成一電路圖案,該電路圖案可為縱向或橫向排列或其他排列方式。再者,本發明在形成該電路圖案之後,另可選擇性包含下述加工步驟:對該電路圖案選擇進行無電鍍或電鍍形成一保護層(未繪示),用以增加該電路圖案之厚度。上述無電鍍或電鍍製程使用之金屬較佳為銅、鎳、金、銀、錫或其複合層,該無電鍍或電鍍製程可形成一金屬鍍層做為保護層,該保護層有利於增加該電路圖案與外部導線結合之接合性質、導電能力及防止氧化生鏽能力。在藉由該無電鍍或電鍍製程增加厚度之後,本發明較佳使該電路圖案之厚度最終達到介於10至200微米(um)之間。Referring to FIG. 2D, a method for fabricating a solar cell electrode with active solder according to a preferred embodiment of the present invention is followed by: cooling and curing the active solder of the active solder coating 32 of the backside conductor 3' to 3' forms a circuit pattern. After the wire bonding operation is completed, the substrate 2 is subsequently cooled to cure the active solder, and the back surface wire 3' is firmly bonded to the back surface of the substrate 2 to form a circuit pattern, which may be vertically or horizontally arranged or Other arrangements. Furthermore, after forming the circuit pattern, the present invention optionally further includes the following processing steps: electroless plating or electroplating is selected to form a protective layer (not shown) for increasing the thickness of the circuit pattern. . The metal used in the electroless plating or electroplating process is preferably copper, nickel, gold, silver, tin or a composite layer thereof, and the electroless plating or electroplating process can form a metal plating layer as a protective layer, and the protective layer is beneficial to increase the circuit. The bonding property of the pattern combined with the external wires, the electrical conductivity and the ability to prevent oxidation and rust. Preferably, the thickness of the circuit pattern is finally between 10 and 200 micrometers (um) after the thickness is increased by the electroless plating or electroplating process.

在本發明之另一實施方式中,該基板2可以是一種多層電路基板,其中由該導線3焊接結合在該基板2外側而形成一具有電路圖案基板,並與另一具有電路圖案基板堆疊形成一堆疊結構(未繪示),其中該堆疊結構更可與另一相同之堆疊結構進一步相互堆疊,並以相同方式堆疊二個或以上的堆疊結構,以形成該多層電路基板。In another embodiment of the present invention, the substrate 2 may be a multi-layer circuit substrate, wherein the wire 3 is soldered and bonded to the outside of the substrate 2 to form a circuit pattern substrate, and is formed by stacking another circuit pattern substrate. A stacked structure (not shown), wherein the stacked structure is further stacked on top of another stacked structure, and two or more stacked structures are stacked in the same manner to form the multilayer circuit substrate.

如上所述,相較於第1圖之現有太陽能電池元件在製程上使用銀、鋁及銀-鋁導電漿料分別來製做正面電極、背面電極層及導線必需經過450至850℃左右的高溫燒結因而可能造成材料劣化、失效,以及導電漿料內含有不具導電性之玻璃微粒,造成電阻增高,轉換效率低等問題,第2A至2D圖之本發明藉由使用成本較低的活性焊料來塗佈在線材31的外表面上,以形成具有活性焊料塗層32的導線3,當使用導線3時,若導線3之活性焊料塗層32接觸預先加熱的基板2(如太陽能電池基板),即可焊接結合在基板2上來形成電路圖案,因而有利於降低材料成本,並簡化及加速電路製程,並降低導線電阻係數,進而增加轉換效率。As described above, the use of silver, aluminum, and silver-aluminum conductive pastes for the preparation of the front electrode, the back electrode layer, and the wire must be performed at a temperature of about 450 to 850 ° C in comparison with the conventional solar cell element of FIG. 1 . Sintering may cause material deterioration, failure, and the conductive paste contains non-conductive glass particles, resulting in high resistance, low conversion efficiency, etc. The invention of FIGS. 2A to 2D uses a lower cost active solder. Coating the outer surface of the wire 31 to form the wire 3 having the active solder coating 32. When the wire 3 is used, if the active solder coating 32 of the wire 3 contacts the preheated substrate 2 (such as a solar cell substrate), The circuit pattern can be formed by soldering on the substrate 2, thereby reducing the material cost, simplifying and accelerating the circuit process, and reducing the resistance coefficient of the wire, thereby increasing the conversion efficiency.

再者,當本發明應用在製做太陽能電池基板時,導線3能以相對較低熔點溫度焊接結合在太陽能電池基板之背面電極層上,以形成電路圖案來連接於數個背面電極25之間,故不需藉由高溫燒結銀-鋁導電漿料來製作導線,因而有利於避免基板材料再次因高溫燒結作業而劣化,以相對提高基板製造良率。Furthermore, when the present invention is applied to a solar cell substrate, the wire 3 can be soldered to the back electrode layer of the solar cell substrate at a relatively low melting point temperature to form a circuit pattern to be connected between the plurality of back electrodes 25. Therefore, it is not necessary to form the wire by sintering the silver-aluminum conductive paste at a high temperature, thereby facilitating the deterioration of the substrate material due to the high-temperature sintering operation, so as to relatively improve the substrate manufacturing yield.

另外,本發明在由具有活性焊料塗層32的線材3所形成的電路圖案上可進一步選擇進行無電鍍或電鍍等增厚處理,其除了可增加該電路圖案之厚度外,也可增加電路圖案與外部電路結合之接合性質、導電能力及防止氧化生鏽能力。In addition, the present invention can further selectively perform thickening treatment such as electroless plating or electroplating on the circuit pattern formed by the wire 3 having the active solder coating 32, which can increase the circuit pattern in addition to the thickness of the circuit pattern. Bonding properties, electrical conductivity, and ability to prevent oxidation and rust combined with external circuits.

雖然本發明已以較佳實施例揭露,然其並非用以限制本發明,任何熟習此項技藝之人士,在不脫離本發明之精神和範圍內,當可作各種更動與修飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。The present invention has been disclosed in its preferred embodiments, and is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application.

11...p型矽半導體基材11. . . P-type germanium semiconductor substrate

12...n型擴散層12. . . N-type diffusion layer

13...抗反射層13. . . Antireflection layer

14...正面電極14. . . Front electrode

15...背面電極層15. . . Back electrode layer

16...鋁-矽合金層16. . . Aluminum-bismuth alloy layer

17...p+ 層1717. . . p + layer 17

18...導線18. . . wire

2...太陽能電池基板2. . . Solar cell substrate

21...p型矽半導體基材twenty one. . . P-type germanium semiconductor substrate

22...n型擴散層twenty two. . . N-type diffusion layer

23...抗反射層twenty three. . . Antireflection layer

24...正面電極twenty four. . . Front electrode

25...背面電極25. . . Back electrode

26...p+26. . . p + layer

3...導線3. . . wire

3’...背面導線3’. . . Back wire

31...線材31. . . Wire

31’...線材31’. . . Wire

32...活性焊料塗層32. . . Active solder coating

32...活性焊料塗層32. . . Active solder coating

4...工具4. . . tool

第1圖:現有太陽能電池元件的剖視圖。Figure 1: A cross-sectional view of a conventional solar cell element.

第2A、2B、2C及2D圖:本發明較佳實施例具有活性焊料塗層的導線之使用方法的流程示意圖。2A, 2B, 2C, and 2D: A schematic flow diagram of a method of using a wire having an active solder coating in accordance with a preferred embodiment of the present invention.

21...p型矽半導體基材twenty one. . . P-type germanium semiconductor substrate

25...背面電極25. . . Back electrode

26...p+26. . . p + layer

3...導線3. . . wire

3’...背面導線3’. . . Back wire

31’...線材31’. . . Wire

32...活性焊料塗層32. . . Active solder coating

4...工具4. . . tool

Claims (9)

一種具有活性焊料塗層的導線之使用方法,其包含:提供一基板;提供一導線,其具有一線材及塗佈在該線材上之一活性焊料塗層,其中該活性焊料塗層包含至少一種銲錫合金,並混摻有4重量%以下之至少一種活性成分以及0.01至2重量%之至少一種稀土族元素,其中該銲錫合金選自錫基合金、鉍基合金或銦基合金,該活性成分選自鈦、釩、鎂、鋰、鋯、鉿或其混合;先以低於450℃之溫度預熱該基板;再將該預熱後之導線放置在該預熱後之基板上,使該活性焊料塗層接觸、熔化並焊接結合在該預熱後之基板上;以及冷卻固化該導線之活性焊料塗層的活性焊料,以藉由該導線形成一電路圖案。 A method of using a wire with an active solder coating, comprising: providing a substrate; providing a wire having a wire and an active solder coating coated on the wire, wherein the active solder coating comprises at least one a solder alloy mixed with at least one active ingredient of 4% by weight or less and at least one rare earth element of 0.01 to 2% by weight, wherein the solder alloy is selected from a tin-based alloy, a bismuth-based alloy or an indium-based alloy, the active component Selecting from titanium, vanadium, magnesium, lithium, zirconium, hafnium or a mixture thereof; preheating the substrate at a temperature lower than 450 ° C; and placing the preheated wire on the preheated substrate, An active solder coating is contacted, melted and soldered to the preheated substrate; and the active solder of the active solder coating that cures the wire is cooled to form a circuit pattern by the wire. 如申請專利範圍第1項所述之具有活性焊料塗層的導線之使用方法,其中在將該導線放置在該基板上的步驟中,藉由超音波的輔助使該活性焊料塗層接觸、熔化並焊接結合在該基板上。 The method of using a wire having an active solder coating according to claim 1, wherein in the step of placing the wire on the substrate, the active solder coating is contacted and melted by the aid of ultrasonic waves. And soldering is bonded to the substrate. 如申請專利範圍第1項所述之具有活性焊料塗層的導線之使用方法,其中在形成該電路圖案之後,另包含:對該電路圖案選擇進行無電鍍或電鍍,以增加該電路圖案之厚度。 The method of using the active solder coating wire according to claim 1, wherein after forming the circuit pattern, the method further comprises: electroless plating or plating to increase the thickness of the circuit pattern. . 如申請專利範圍第1項所述之具有活性焊料塗層的 導線之使用方法,其中該稀土族元素係選自鈧元素、釔元素或鑭系元素,其中該鑭系元素包含:鑭、鈰、鐠、釹、钜、釤、銪、釓、鋱、鏑、鈥、鉺、銩、鐿或鑥。 An active solder coating as described in claim 1 The method for using a wire, wherein the rare earth element is selected from the group consisting of a lanthanum element, a lanthanum element or a lanthanoid element, wherein the lanthanoid element comprises: lanthanum, cerium, lanthanum, cerium, lanthanum, cerium, lanthanum, cerium, lanthanum, cerium,鈥, 铒, 銩, 镱 or 鑥. 如申請專利範圍第1項所述之線材,其中該線材合金選自銀基合金、銅基合金、鋁基合金、鎳基合、金基合金或其混合合金。 The wire material of claim 1, wherein the wire alloy is selected from the group consisting of a silver-based alloy, a copper-based alloy, an aluminum-based alloy, a nickel-based alloy, a gold-based alloy, or a mixed alloy thereof. 如申請專利範圍第1項所述之具有活性焊料塗層的導線之使用方法,其中該基板選自太陽能電池、發光二極體、電容元件、振盪器元件或半導體晶片之半導體基板、燃料電池電極板、金屬氧化物基板或陶瓷基板。 The method of using a wire with an active solder coating according to claim 1, wherein the substrate is selected from the group consisting of a solar cell, a light emitting diode, a capacitor element, an oscillator element, or a semiconductor substrate of a semiconductor wafer, and a fuel cell electrode. A plate, a metal oxide substrate or a ceramic substrate. 如申請專利範圍第6項所述之具有活性焊料塗層的導線之使用方法,其中該基板選擇一太陽能電池之基板,其中該太陽能電池基板具有一背面,該導線在該背面上形成該電路圖案,以電性連接數個背面電極。 The method of using a conductive solder coated wire according to claim 6, wherein the substrate selects a substrate of a solar cell, wherein the solar cell substrate has a back surface, the wire forms the circuit pattern on the back surface , electrically connected to several back electrodes. 如申請專利範圍第1項所述之具有活性焊料塗層的導線之使用方法,其中該基板及電路圖案係與另一具有電路圖案之基板形成一堆疊結構,該堆疊結構可與另一相同之堆疊結構進一步相互堆疊。 The method for using a conductive solder coated wire according to claim 1, wherein the substrate and the circuit pattern form a stacked structure with another substrate having a circuit pattern, and the stacked structure can be identical to another The stacked structures are further stacked on each other. 一種具有活性焊料塗層的導線,其包含:一線材,具有一外表面;以及一活性焊料塗層,塗佈在該線材之外表面上;其中該活性焊料塗層之一活性焊料包含至少一種銲 錫合金,並混摻有4重量%以下之至少一種活性成分以及0.01至2重量%之至少一種稀土族元素,其中該銲錫合金選自錫基合金、鉍基合金或銦基合金,該活性成分選自鈦、釩、鎂、鋰、鋯、鉿或其混合。 A wire having an active solder coating, comprising: a wire having an outer surface; and an active solder coating coated on an outer surface of the wire; wherein one of the active solder coatings comprises at least one active solder weld a tin alloy mixed with at least one active ingredient of 4% by weight or less and at least one rare earth element of 0.01 to 2% by weight, wherein the solder alloy is selected from the group consisting of a tin-based alloy, a bismuth-based alloy or an indium-based alloy, the active ingredient It is selected from titanium, vanadium, magnesium, lithium, zirconium, hafnium or a mixture thereof.
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