TWI470693B - - Google Patents
Info
- Publication number
- TWI470693B TWI470693B TW101143732A TW101143732A TWI470693B TW I470693 B TWI470693 B TW I470693B TW 101143732 A TW101143732 A TW 101143732A TW 101143732 A TW101143732 A TW 101143732A TW I470693 B TWI470693 B TW I470693B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210005091.9A CN103198993B (en) | 2012-01-09 | 2012-01-09 | A kind of gas spray for plasma processing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201340205A TW201340205A (en) | 2013-10-01 |
| TWI470693B true TWI470693B (en) | 2015-01-21 |
Family
ID=48721453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101143732A TW201340205A (en) | 2012-01-09 | 2012-11-22 | Gas spray head |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103198993B (en) |
| TW (1) | TW201340205A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104576279B (en) * | 2013-10-22 | 2017-02-15 | 中微半导体设备(上海)有限公司 | Gas adjusting device and plasma reactor employing same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200903576A (en) * | 2007-06-13 | 2009-01-16 | Lam Res Corp | Showerhead electrode assemblies for plasma processing apparatuses |
| US20110133650A1 (en) * | 2009-12-09 | 2011-06-09 | Jehara Corporation | Apparatus for generating plasma |
| US20110226420A1 (en) * | 2010-03-16 | 2011-09-22 | Tokyo Electron Limited | Electrode and plasma processing apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3360098B2 (en) * | 1995-04-20 | 2002-12-24 | 東京エレクトロン株式会社 | Shower head structure of processing equipment |
| KR100400044B1 (en) * | 2001-07-16 | 2003-09-29 | 삼성전자주식회사 | Shower head of wafer treatment apparatus having gap controller |
| JP4707588B2 (en) * | 2006-03-16 | 2011-06-22 | 東京エレクトロン株式会社 | Plasma processing apparatus and electrodes used therefor |
-
2012
- 2012-01-09 CN CN201210005091.9A patent/CN103198993B/en active Active
- 2012-11-22 TW TW101143732A patent/TW201340205A/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200903576A (en) * | 2007-06-13 | 2009-01-16 | Lam Res Corp | Showerhead electrode assemblies for plasma processing apparatuses |
| US20110133650A1 (en) * | 2009-12-09 | 2011-06-09 | Jehara Corporation | Apparatus for generating plasma |
| US20110226420A1 (en) * | 2010-03-16 | 2011-09-22 | Tokyo Electron Limited | Electrode and plasma processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN103198993A (en) | 2013-07-10 |
| TW201340205A (en) | 2013-10-01 |
| CN103198993B (en) | 2015-08-12 |