TWI464124B - Roll-to-roll glass material attributes and fingerprint - Google Patents

Roll-to-roll glass material attributes and fingerprint Download PDF

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TWI464124B
TWI464124B TW099115363A TW99115363A TWI464124B TW I464124 B TWI464124 B TW I464124B TW 099115363 A TW099115363 A TW 099115363A TW 99115363 A TW99115363 A TW 99115363A TW I464124 B TWI464124 B TW I464124B
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dust
sheet
glass
glass sheet
sintering
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TW099115363A
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TW201111304A (en
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Daniel Warren Hawtof
Jr Douglas Miles Noni
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Corning Inc
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Description

滾軸至滾軸玻璃材料屬性及特徵Roller to roller glass material properties and characteristics

本發明概略關於玻璃片,並且尤其是關於經燒結玻璃片,像是利用玻璃粉塵沉積所製成的氧化矽玻璃片,以及燒結製程。The present invention is generally directed to glass flakes, and more particularly to sintered glass flakes, such as yttria glass flakes made using glass dust deposition, and a sintering process.

玻璃片材料可為利用各種不同方法所形成。例如,在浮式玻璃製程裡,固體玻璃片是藉由在熔融金屬的爐床上浮動熔融玻璃所製成。此製程可用以形成擁有均勻厚度和極為平坦表面的玻璃片。然而,此浮式玻璃製程無可避免地牽涉到該玻璃熔物與該熔融金屬之間的直接接觸,這可能會在介面處造成非所樂見的污染以及劣於原始表面的品質。為生產出在兩者主要表面上擁有原始表面性質的高品質浮式玻璃片,通常會令浮式玻璃承受於表面拋光步驟,而如此會增加額外支出。此外,據信浮動製程尚未用以製作超薄型,可捲式玻璃片。The glass sheet material can be formed using a variety of different methods. For example, in a floating glass process, a solid glass piece is made by floating molten glass on a hearth of molten metal. This process can be used to form a glass sheet having a uniform thickness and an extremely flat surface. However, this floating glass process inevitably involves direct contact between the glass melt and the molten metal, which may cause undesirable contamination at the interface and inferior quality to the original surface. In order to produce high quality floating glass sheets with original surface properties on both major surfaces, the floating glass is typically subjected to a surface polishing step, which adds additional expense. In addition, it is believed that the floating process has not been used to make ultra-thin, rollable glass sheets.

另外一種用以形成玻璃片材料的方法為熔融抽拉製程。在此一製程裡,熔融玻璃被饋送至稱為"等管"的溝槽之內,如此而玻璃溢出直到熔融玻璃均勻地流過兩側為止。接著熔融玻璃在該溝槽的底部處會合,或融合,在此被向下抽拉以形成連續平坦的玻璃片。由於該玻璃片的兩個主要表面在形成製程中並未直接地接觸到任何支撐材料,因而能夠在兩個主要表面內獲得高表面品質。Another method for forming a glass sheet material is a melt drawing process. In this process, the molten glass is fed into a groove called an "isopipe" such that the glass overflows until the molten glass flows evenly across the sides. The molten glass then meets at the bottom of the trench, or fuses, where it is drawn down to form a continuous flat glass sheet. Since the two major surfaces of the glass sheet do not directly contact any of the support materials during the forming process, high surface quality can be achieved in both major surfaces.

不過,由於熔融抽拉製程的動力性質之故,適合於熔融抽拉處理之玻璃組成的數量受限於該等在該熔融相態下具備必要性質者(即如液相黏度,應變點等)。此外,雖可經由此熔融抽拉製作出相當微薄的玻璃片,然該製程並無法用以形成超薄型,可捲式的高度氧化矽玻璃片。最後,該熔融抽拉製程中所使用的設備成本昂貴。However, due to the dynamic nature of the melt drawing process, the amount of glass composition suitable for melt drawing is limited by those having the necessary properties in the molten phase (ie, such as liquid viscosity, strain point, etc.) . In addition, although a relatively thin glass piece can be produced by this melt drawing, the process cannot be used to form an ultra-thin, rollable, highly oxidized bismuth glass sheet. Finally, the equipment used in the melt drawing process is expensive.

除對於超薄型玻璃片材料的限制以外,由於氧化矽的高軟化點(~1600℃),因此浮動和熔融抽拉製程二者對於高氧化矽玻璃片而言皆概為不實用的薄片形成方法。相對地,氧化矽玻璃基板通常是藉由對在批次火焰水解熔爐中所產生的氧化矽錠塊進行切割,研磨和拋光處理所製造。此一批次方式為極高成本且浪費。確實,為透過火焰水解生產均勻,微薄,具有彈性之氧化矽玻璃片所需要的必要劃切及拋光處理會使得該製程令人卻步地昂貴。利用已知方法,本案申請人深信欲形成且拋光具有小於150微米厚度之高氧化矽玻璃片的兩側就以目前而言並非可行。In addition to the limitations of ultra-thin glass sheet materials, both the floating and melt drawing processes are impractical for high yttrium oxide glass sheets due to the high softening point of yttrium oxide (~1600 ° C). method. In contrast, yttria glass substrates are typically produced by cutting, grinding and polishing a cerium oxide ingot produced in a batch flame hydrolysis furnace. This batch approach is extremely costly and wasteful. Indeed, the necessary scribing and polishing processes required to produce a uniform, meager, elastic yttria glass sheet by flame hydrolysis can make the process prohibitively expensive. Using known methods, the applicant is convinced that it is currently not feasible to form and polish both sides of a high yttria glass sheet having a thickness of less than 150 microns.

鑑於前面所揭示說明,擁有高表面品質的經濟性,均勻,超薄型,具有彈性,可捲式高氧化矽玻璃片確為所欲者。高氧化矽玻璃片可含有一個或多個疊層,成份或相態。此等玻璃片可用以作為例如光遮罩基板,LCD影像遮罩基板等。高氧化矽玻璃片具有兩個主要相對表面,該等具有150微米或以下的平均厚度,並且具有高於該等兩個主要表面之至少一者1nm或以下的平均表面粗糙度。在一具體實施例裡,平均表面粗糙度為高於該等兩個主要表面二者1nm或以下。示範性高氧化矽玻璃片是以至少2.5x2.5cm2 所測。例如,該玻璃片的寬度範圍可為自約2.5cm至2m,並且該玻璃片的長度範圍可為自約2.5cm至10m以上。的確,該玻璃片的長度基本上僅受限於沉積時間,並且可延伸超過10m至10km以上。該玻璃片是利用滾軸至滾軸玻璃粉塵沉積和燒結製程所形成。在進一步具體實施例裡,該玻璃片含有複數個虛似可見的斑條。該等斑條是由區域性的厚度變異所造成,並且僅在當依顯著移離於入射法線之角度觀看該玻璃片的主要表面時方為可見。In view of the foregoing disclosure, the economical, uniform, ultra-thin, and elastic, high-volume, high-volume, high-yield glass sheets are desirable. High yttrium oxide glass flakes may contain one or more laminates, components or phases. These glass sheets can be used as, for example, a light mask substrate, an LCD image mask substrate, and the like. The high yttria glass flakes have two major opposing surfaces, having an average thickness of 150 microns or less, and having an average surface roughness above at least one of the two major surfaces of 1 nm or less. In a specific embodiment, the average surface roughness is 1 nm or less above both of the two major surfaces. An exemplary high cerium oxide glass sheet is measured at least 2.5 x 2.5 cm 2 . For example, the glass sheet may have a width ranging from about 2.5 cm to 2 m, and the glass sheet may have a length ranging from about 2.5 cm to 10 m or more. Indeed, the length of the glass sheet is substantially limited only by the deposition time and can extend over 10 m to 10 km or more. The glass sheet is formed using a roller-to-roller glass dust deposition and sintering process. In a further embodiment, the glass sheet contains a plurality of imaginary visible slats. The slats are caused by regional thickness variations and are only visible when the major surface of the glass sheet is viewed at an angle that is significantly shifted away from the incident normal.

本發明其他特性及優點揭示於下列說明,以及部份可由說明清楚瞭解,或藉由實施下列說明以及申請專利範圍以及附圖而明瞭。Other features and advantages of the invention will be apparent from the description and appended claims.

人們瞭解先前一般說明及下列詳細說明只作為範例性及說明性,以及預期提供概要或架構以瞭解申請專利範圍界定出本發明原理及特性。所包含附圖在於提供更進一步瞭解本發明,以及在此加入作為發明說明書之一部份。附圖顯示出本發明不同的實施例及隨同詳細說明以解釋本發明之原理及操作。The prior general description and the following detailed description are to be considered as illustrative and illustrative, and The accompanying drawings are included to provide a further understanding of the invention and are incorporated herein as part of the description. The drawings illustrate various embodiments of the invention, and are in the

高氧化矽玻璃片具有小於150微米的平均厚度以及高於其兩個主要表面之其一或兩者不到1nm的平均表面粗糙度。此一玻璃片之橫向尺寸的範圍可自約2.5cm至2m寬以及自約2.5cm至3m長或更長。圖1略圖顯示一種用以形成超薄型高氧化矽玻璃片的設備。該設備100包含粉塵提供裝置110,粉塵接受裝置120,粉塵片導引裝置130以及粉塵燒結裝置140。現參照圖1之設備揭示一種用以形成玻璃片的方法。The high yttria glass flakes have an average thickness of less than 150 microns and an average surface roughness of less than 1 nm above or below one of their two major surfaces. The transverse dimension of the glass sheet can range from about 2.5 cm to 2 m wide and from about 2.5 cm to 3 m long or longer. Figure 1 is a schematic view of an apparatus for forming an ultra-thin high yttria glass sheet. The apparatus 100 includes a dust supply device 110, a dust receiving device 120, a dust sheet guiding device 130, and a dust sintering device 140. Referring now to the apparatus of Figure 1, a method for forming a glass sheet is disclosed.

由該粉塵提供裝置110所形成的玻璃粉塵顆粒會被沉積在該粉塵接受裝置120的沉積表面122上。該粉塵接受裝置120可有利地依照可旋轉鼓輪或條帶的形式,並因而能夠含有連續的沉積表面122。所沉積的粉塵顆粒150會在該沉積表面122上形成粉塵層152。一旦形成之後,該粉塵層152可自該沉積表面122釋出而成為自立,連續的粉塵片154。在較佳具體實施例裡,可進行自該沉積表面122釋出該粉塵層152的動作而無須實體介入,並且可例如由於熱度不匹配,該粉塵層和該沉積表面間之熱膨脹係數不匹配及/或重力效應而出現。在自該粉塵接受裝置120釋出該粉塵片154之後,該粉塵片導引裝置130可導引該粉塵片154移動通過該粉塵燒結裝置140,此裝置可燒結並固合該粉塵片154藉以構成超薄型玻璃片156。The glass dust particles formed by the dust supply device 110 are deposited on the deposition surface 122 of the dust receiving device 120. The dust receiving device 120 can advantageously be in the form of a rotatable drum or strip and thus can contain a continuous deposition surface 122. The deposited dust particles 150 form a dust layer 152 on the deposition surface 122. Once formed, the dust layer 152 can be released from the deposition surface 122 to become a self-standing, continuous dust sheet 154. In a preferred embodiment, the action of releasing the dust layer 152 from the deposition surface 122 can be performed without physical intervention, and the coefficient of thermal expansion between the dust layer and the deposition surface can be mismatched, for example, due to thermal mismatch. / or gravity effect. After the dust sheet 154 is released from the dust receiving device 120, the dust sheet guiding device 130 can guide the dust sheet 154 to move through the dust sintering device 140, and the device can sinter and fix the dust sheet 154 to form Ultra-thin glass piece 156.

形成超薄型玻璃片的製程包含提供多個玻璃粉塵顆粒;將該等玻璃粉塵顆粒沉積於粉塵接受裝置的沉積表面上以形成粉塵層;自該粉塵接受表面釋出該粉塵層以形成粉塵片;以及燒結該粉塵片以形成玻璃片。後文中將進一步詳細說明該等製程及設備的其他特點。The process of forming an ultra-thin glass sheet includes providing a plurality of glass dust particles; depositing the glass dust particles on a deposition surface of the dust receiving device to form a dust layer; releasing the dust layer from the dust receiving surface to form a dust sheet And sintering the dust sheet to form a glass sheet. Further details of these processes and equipment will be described in further detail below.

然確能運用各式裝置以形成玻璃粉塵顆粒,藉由範例該粉塵提供裝置110可包含一個或多個火焰水解燃燒器,像是在外部汽相沉積(OVD),汽相軸向沉積(VAD)與平面沉積製程中所使用者。適當的燃燒器構造已揭示於美國第6606883,5922100,6837076,6743011以及6736633號專利,這些專利之說明在此加入作為參考。However, various devices can be used to form glass dust particles. By way of example, the dust supply device 110 can include one or more flame hydrolysis burners, such as external vapor deposition (OVD), vapor phase axial deposition (VAD). ) and users in the planar deposition process. Suitable burner configurations are disclosed in U.S. Patent Nos. 6,660,883, 5,922,100, 6, 678, 676, issued to the Official Utility of

該粉塵提供裝置110可含有單一燃燒器或多個燃燒器。示範性燃燒器可擁有長度l及寬度w的輸出表面。該輸出表面含有N個縱行的氣體注口,其中N的範圍可為從1至20或以上。在一具體實施例裡,各個注口含有0.076cm直徑的孔洞。該輸出表面之長度l的範圍可自約2.5至30.5cm或更多,並且寬度w的範圍可自約0.1至7.5cm。可視需要而定將多個燃燒器組態設定成一燃燒器陣列,此者能夠在該陣列的寬度上產生大致連續的粉塵顆粒流動。The dust supply device 110 may contain a single burner or a plurality of burners. An exemplary burner can have an output surface of length l and width w. The output surface contains N longitudinal gas nozzles, wherein N can range from 1 to 20 or above. In one embodiment, each nozzle contains a 0.076 cm diameter hole. The length l of the output surface may range from about 2.5 to 30.5 cm or more, and the width w may range from about 0.1 to 7.5 cm. Multiple burner configurations can be configured as a burner array, as desired, which can produce substantially continuous flow of dust particles over the width of the array.

該燃燒器陣列例如可含有多個個別燃燒器(即如按末端至末端方式所放置),並經組態設定以形成且沉積出在時間及空間上具有均勻性的玻璃粉塵層。因此,可利用該粉塵提供裝置來形成具有大致均質性的化學成份和大致均勻厚度的粉塵層。所謂"均勻成份"及"均勻厚度"係指在給定區域上的成份及厚度變異低於或等於平均成份或厚度的20%。在一些具體實施例裡,該粉塵片的成份或厚度變異其一或二者可為低於或等於該粉塵片之其等個別平均勻度值的10%。The array of burners, for example, may contain a plurality of individual burners (i.e., placed in an end-to-end manner) and configured to form and deposit a layer of glass dust that is uniform in time and space. Therefore, the dust providing device can be utilized to form a chemical composition having substantially uniformity and a dust layer having a substantially uniform thickness. By "homogeneous composition" and "uniform thickness" is meant that the composition and thickness variation over a given area is less than or equal to 20% of the average composition or thickness. In some embodiments, one or both of the composition or thickness variations of the dust sheet may be less than or equal to 10% of the individual flat uniformity values of the dust sheet.

示範性燃燒器含有9個縱行的氣體注口。根據一項具體實施例,在使用過程裡該中線縱行(即如縱行5)可提供氧化矽氣體先質/載體氣體混合物。緊鄰縱行(即如縱行4以及6)則提供氧氣以對該氧化矽氣體先質進行化學計量控制。在該中線之任一側上的次兩個縱行(即如縱行2,3,7和8)提供額外的氧氣,而其流量可用來控制化學計量及粉塵密度並同時提供引燃火焰的氧化劑。最外部的注口縱行(即如縱行1及9)可提供例如CH4 /O2 或H2 /O2 的引燃火焰混合物。9縱行線性燃燒器示範性氣體流量範圍可如表1中所示。The exemplary burner contains nine longitudinal gas nozzles. According to a specific embodiment, the midline wales (i.e., wales 5) provide a cerium oxide gas precursor/carrier gas mixture during use. Immediately adjacent to the wales (i.e., wales 4 and 6) oxygen is provided to stoichiometrically control the cerium oxide gas precursor. The next two wales on either side of the centerline (ie, wales 2, 3, 7, and 8) provide additional oxygen, and the flow rate can be used to control stoichiometry and dust density while providing a pilot flame Oxidizer. The outermost nozzle wales (i.e., wales 1 and 9) may provide a pilot flame mixture such as CH 4 /O 2 or H 2 /O 2 . The exemplary gas flow range for a 9-row linear burner can be as shown in Table 1.

在粉塵顆粒的形成及沉積過程中,該粉塵提供裝置可保持固定;或另者該粉塵提供裝置可相對於該沉積表面而移動(即如振盪)。從該燃燒器至該沉積表面之距離的範圍可為自約20mm至100mm(例如為20,25,30,35,40,45,50,55,60,65,70,75,80,85,90,95或100mm)。The dust providing means may remain fixed during the formation and deposition of dust particles; or the dust providing means may move (i.e., oscillate) relative to the deposition surface. The distance from the burner to the deposition surface can range from about 20 mm to 100 mm (eg, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95 or 100mm).

該粉塵提供裝置的操作通常會牽涉到該等先質化學物質(即如氣體化合物)之間為以形成玻璃粉塵顆粒的化學反應。可藉由補充性的能量來源,像是電漿或補充性加熱裝置以選擇性地進一步輔助該等化學反應。The operation of the dust providing device typically involves a chemical reaction between the precursor chemicals (i.e., gas compounds) to form glass dust particles. These chemical reactions can be selectively further assisted by a complementary source of energy, such as a plasma or supplemental heating device.

例如,可利用含矽先質化合物以形成含有氧化矽粉塵顆粒的粉塵片並予燒結以形成氧化矽玻璃片。示範性含矽先質化合物為八甲基環四矽氧烷(OMCTS)。OMCTS可連同於H2 ,O2 ,CH4 或其他燃料而引入至燃燒器或燃燒器陣列內,此者會被氧化並水解以產生氧化矽粉塵顆粒。本項形成玻璃片之製程通常雖包含形成高氧化矽玻璃片,然該等製程及設備確亦能用以形成其他的玻璃片材料。For example, a ruthenium-containing precursor compound may be utilized to form a dust sheet containing cerium oxide dust particles and sintered to form a yttria glass sheet. An exemplary ruthenium-containing precursor is octamethylcyclotetraoxane (OMCTS). OMCTS may be in conjunction with H 2, O 2, CH 4 or other fuel is introduced into the burner or burner array, this person will be hydrolyzed and oxidized to produce a silicon oxide dust particles. The process for forming a glass sheet generally includes the formation of a high-oxide glass sheet, and the processes and equipment can be used to form other glass sheet materials.

依如所產生者或依如所沉積者,該等粉塵顆粒基本上可為由單相態(即如單一氧化物)所組成,像是在未經摻雜,高純度氧化矽玻璃的範例裡。或另者,該等粉塵顆粒可含有兩種或以上的成份或是兩種或以上的相態,即如在經摻質氧化矽玻璃的範例裡。例如,可藉由將氧化鈦先質或氧化磷先質併入在該OMCTS氣流內以製作多相態高氧化矽玻璃片。示範性的鈦及磷的氧化物先質包含各種可溶金屬鹽與金屬烷氧化物,像是磷及鈦(IV)異丙醇的鹵化物。The dust particles may consist essentially of a single phase (ie, a single oxide), as in the case of undoped, high purity yttria glass, as produced or as deposited. . Alternatively, the dust particles may contain two or more components or two or more phases, as in the case of a doped yttria glass. For example, a multi-phase high cerium oxide glass sheet can be produced by incorporating a titanium oxide precursor or a phosphorus oxide precursor into the OMCTS gas stream. Exemplary titanium and phosphorus oxide precursors comprise various soluble metal salts with metal alkoxides such as phosphorus and titanium (IV) isopropanol halides.

在火焰水解燃燒器的範例裡,可藉由將摻雜劑先質引入到火焰內以在火焰水解的過程裡當場進行摻雜。在進一步範例裡像是經電漿加熱之粉塵噴灑器的情況下,自該噴灑器所噴灑的粉塵顆粒可為經預摻雜;或另者所噴灑之粉塵顆粒可受曝於含有摻雜劑的電漿大氣,使得該等粉塵顆粒能夠被摻入於該電漿內。又在進一步範例裡,可在粉塵片燒結之前或在其過程中將摻雜劑併入於粉塵片內。示範性摻雜劑包含元素週期表的IA,IB,IIA,IIB,IIIA,IIIB,IVA,IVB,VA,VB群的元素以及稀土族。In the example of a flame hydrolysis burner, doping can be performed on-site during flame hydrolysis by introducing a dopant precursor into the flame. In a further example, such as a plasma-heated dust sprayer, the dust particles sprayed from the sprayer may be pre-doped; or the other sprayed dust particles may be exposed to dopants. The plasma atmosphere allows the dust particles to be incorporated into the plasma. In still further examples, the dopant can be incorporated into the dust sheet prior to or during the sintering of the dust sheet. Exemplary dopants include elements of the IA, IB, IIA, IIB, IIIA, IIIB, IVA, IVB, VA, VB groups of the Periodic Table of the Elements, as well as rare earths.

該等粉塵顆粒可具有大致均質性的成份,大小及/或形狀。或另者,該等粉塵顆粒之成份,大小及形狀的一個或多個者可有所變化。例如,可由第一粉塵提供裝置提供主要玻璃成份的粉塵顆粒,而由第二粉塵提供裝置提供摻雜劑成份的粉塵顆粒。在一些具體實施例裡,在形成及沉積該等粉塵顆粒的動作過程中,粉塵顆粒可混合及/或附著於另一者以形成複合顆粒。也有可能該等粉塵顆粒在沉積於該沉積表面上之前,或與其同時,係經顯著地避免彼此附著以利形成混合顆粒。The dust particles may have a substantially homogeneous composition, size and/or shape. Alternatively, one or more of the components, size and shape of the dust particles may vary. For example, dust particles of a main glass component may be provided by the first dust supply device, and dust particles of a dopant component may be provided by the second dust supply device. In some embodiments, during the action of forming and depositing the dust particles, the dust particles can be mixed and/or attached to the other to form composite particles. It is also possible that the dust particles are substantially prevented from adhering to one another prior to deposition on the deposition surface, or at the same time to facilitate the formation of mixed particles.

現仍參照圖1,該沉積表面122包含該粉塵接受裝置120的週邊局部,並且可為由耐熱材料所形成。在一項具體實施例裡,該沉積表面122是由化學且熱性相容於粉塵顆粒150和所沉積之粉塵層152的材料所形成,並且可簡易地自其移除該粉塵層。示範性粉塵接受裝置120含有耐熱材料(即如氧化矽,碳化矽,石墨,氧化鋯等等)而經形成於例如鋼材,鋁質或金屬合金之核心材料上的鍍層或包覆。該等粉塵接受裝置進一步可含有大致由適當耐熱材料像是石英所組成的單元部件。Still referring to FIG. 1, the deposition surface 122 includes a peripheral portion of the dust receiving device 120 and may be formed of a heat resistant material. In one embodiment, the deposition surface 122 is formed from a material that is chemically and thermally compatible with the dust particles 150 and the deposited dust layer 152, and the dust layer can be easily removed therefrom. The exemplary dust receiving device 120 contains a heat resistant material (i.e., such as yttria, tantalum carbide, graphite, zirconia, etc.) and is plated or coated on a core material such as a steel, aluminum or metal alloy. The dust receiving means may further comprise unit members consisting essentially of a suitable heat resistant material such as quartz.

該粉塵接受裝置120尤其是該沉積表面122可為按各種不同方式所組態設定,並且擁有各種形狀及/或尺寸。例如,該沉積表面之寬度的範圍可自約2cm至2m,然亦可具有更小或更大的尺寸。該粉塵接受裝置120的截面形狀可為圓形,卵形,橢圓形,三角形,方形,六角形等等,並且該粉塵接受裝置120的相對應截面尺寸(即如直徑或長度)亦可改變。例如,具有圓形截面之粉塵接受裝置的直徑範圍可為約自2cm至50cm。示範性粉塵接受裝置120含有石英圓柱體,此者具有250mm的內徑,260mm的內徑,以及24cm寬的沉積表面。The dust receiving device 120, in particular the deposition surface 122, can be configured in a variety of different manners and possesses a variety of shapes and/or sizes. For example, the width of the deposition surface can range from about 2 cm to 2 m, but can also be smaller or larger. The cross-sectional shape of the dust receiving device 120 may be circular, oval, elliptical, triangular, square, hexagonal, etc., and the corresponding cross-sectional dimensions (i.e., diameter or length) of the dust receiving device 120 may also vary. For example, a dust receiving device having a circular cross section may have a diameter ranging from about 2 cm to 50 cm. The exemplary dust receiving device 120 contains a quartz cylinder having an inner diameter of 250 mm, an inner diameter of 260 mm, and a deposition surface of 24 cm width.

在圓形或卵形截面的範例裡,該沉積表面122可含有封閉,連續性的表面,而在橢圓形,三角形或六角形截面的範例裡,該沉積表面則可含有節段性的表面。藉由適當地選定該粉塵接受裝置120的大小及尺寸,即可形成出連續或半連續的粉塵片。In the example of a circular or oval cross section, the deposition surface 122 may contain a closed, continuous surface, while in the case of an elliptical, triangular or hexagonal cross section, the deposition surface may contain a segmental surface. By appropriately selecting the size and size of the dust receiving device 120, a continuous or semi-continuous dust sheet can be formed.

該沉積表面122可含有跨於長度比例範圍上按凸起或凹入突出物之形式的規則或不規則樣式。該樣式的範圍可自一個或多個離散面部至該表面的一般粗糙化。因此,所沉積的粉塵層可相符於該沉積表面內的圖案化。該粉塵表面內所形成的樣式可當分離於該沉積表面時保留在該沉積的粉塵片表面內,如此又可被保留在所獲玻璃片的所燒結表面裡而得到浮凸玻璃片。在前述由沉積表面所衍生之浮凸處理的變化項目裡,粉塵片之經沉積表面和自由表面的其一或兩者可在自該沉積表面移除之後,然在燒結之前予以圖案化。例如,本案申請人既已藉由指紋對粉塵片表面進行圖案化。當燒結該粉塵片時,該指紋樣式會被保留在所獲玻璃片裡。The deposition surface 122 can comprise a regular or irregular pattern in the form of raised or recessed protrusions over a range of length ratios. The pattern can range from one or more discrete faces to a general roughening of the surface. Thus, the deposited dust layer can conform to the patterning within the deposition surface. The pattern formed in the surface of the dust may remain in the surface of the deposited dust sheet when separated from the deposition surface, and thus may be retained in the sintered surface of the obtained glass sheet to obtain a embossed glass sheet. In the foregoing variation of the embossing process derived from the deposition surface, one or both of the deposited surface and the free surface of the dust sheet may be patterned prior to sintering after removal from the deposition surface. For example, the applicant of the present invention has already patterned the surface of the dust sheet by fingerprint. When the dust sheet is sintered, the fingerprint pattern is retained in the obtained glass sheet.

在一些具體實施例裡,於沉積粉塵顆粒150的動作過程中,會旋轉該粉塵接受裝置120藉以於其上形成粉塵層152。該旋轉可為單方向性即如順時針方向或逆時針方向。根據一項具體實施例的旋轉方向可為如圖1中箭頭A所示。該粉塵接受裝置120可在粉塵沉積製程的過程中選擇性地震盪,亦即旋轉方向可間歇性地改變。該粉塵接受裝置120之沉積表面122的線性速度範圍可為自0.1mm/sec至10mm/sec(例如為0.1,0.2,0.5,1,2,3,4,5或10mm/sec)。當提高時,據信該沉積表面的線性速度可增加至1m/sec或更快。In some embodiments, during the action of depositing the dust particles 150, the dust receiving device 120 is rotated to form a dust layer 152 thereon. This rotation can be unidirectional, such as clockwise or counterclockwise. The direction of rotation according to a particular embodiment may be as indicated by arrow A in FIG. The dust receiving device 120 can selectively oscillate during the dust deposition process, that is, the direction of rotation can be intermittently changed. The linear velocity of the deposition surface 122 of the dust receiving device 120 can range from 0.1 mm/sec to 10 mm/sec (eg, 0.1, 0.2, 0.5, 1, 2, 3, 4, 5, or 10 mm/sec). When increased, it is believed that the linear velocity of the deposition surface can be increased to 1 m/sec or faster.

粉塵顆粒150僅沉積於該沉積表面122的一部份上,同時可移除所沉積的粉塵層152以形成自立,連續或半連續且長度為L的粉塵片154。即如圖1所示,該沉積層152(名目上為該粉塵片154)的寬度為W。Dust particles 150 are deposited only on a portion of the deposition surface 122 while the deposited dust layer 152 can be removed to form a free standing, continuous or semi-continuous, length L dust sheet 154. That is, as shown in FIG. 1, the deposited layer 152 (the dust sheet 154 in the name) has a width W.

在一些具體實施例裡,該粉塵片可為在/自該沉積表面上連續地形成或連續地移除。在粉塵層的形成過程中,粉塵顆粒某一程度地彼此鍵接並且接於該沉積表面。該等粉塵顆粒在當沉積時平均溫度愈高,該等即愈可能彼此鍵接,同時形成密集並且具有機械強固性的粉塵片。不過,沉積溫度愈高也會促成粉塵顆粒與該沉積表面之間的鍵接,如此將對粉塵片的釋出造成干擾。為在跨於該沉積表面上獲得大致均勻溫度,該粉塵接受裝置可自其內部,外部或兩者加熱或冷卻。In some embodiments, the dust sheet can be continuously formed or continuously removed on/from the deposition surface. During the formation of the dust layer, the dust particles are bonded to each other to some extent and to the deposition surface. The higher the average temperature of the dust particles when deposited, the more likely they are to bond to each other while forming dense and mechanically strong dust flakes. However, the higher the deposition temperature, the higher the bonding between the dust particles and the deposition surface, which will interfere with the release of the dust particles. To achieve a substantially uniform temperature across the deposition surface, the dust receiving device can be heated or cooled from its interior, exterior or both.

可藉由控制沉積該等粉塵顆粒之位置與釋出該粉塵層以形成粉塵片之位置間的溫度梯度來控制粉塵顆粒與該沉積表面之間的鍵接。例如,若該粉塵層和該沉積表面具有足夠差異的熱膨脹係數(CTE),則可因為該溫度梯度所造成的應力而自發性地達成釋出。在一些具體實施例裡,可藉由形成具有寬度W,此值小於該沉積表面122寬度,的粉塵層以較簡易地自該沉積表面移除所沉積的粉塵層。The bonding between the dust particles and the deposition surface can be controlled by controlling the temperature gradient between the location at which the dust particles are deposited and the location at which the dust layer is released to form a dust sheet. For example, if the dust layer and the deposition surface have sufficiently different coefficients of thermal expansion (CTE), the release can be spontaneously achieved due to the stress caused by the temperature gradient. In some embodiments, the deposited dust layer can be removed from the deposition surface more easily by forming a dust layer having a width W that is less than the width of the deposition surface 122.

在自該沉積表面分離該粉塵層的動作過程中,所分離之粉塵片的移動方向可為大致相切於該沉積表面上的釋出點。所謂"大致相切於"是指該粉塵片相對於該沉積表面上之釋出點的移動方向在該釋出點處距該沉積表面的切線方向不會偏離超過10度(亦即小於10,5,2或1度)。維持大致相切的釋出角度可減少在該釋出點處施加於該粉塵片上的應力。During the action of separating the dust layer from the deposition surface, the direction of movement of the separated dust sheet may be substantially tangential to the release point on the deposition surface. By "substantially tangential" is meant that the direction of movement of the dust sheet relative to the release point on the deposition surface does not deviate by more than 10 degrees (ie, less than 10) from the tangential direction of the deposition surface at the release point. 5, 2 or 1 degree). Maintaining a substantially tangential release angle reduces the stress applied to the dust sheet at the point of release.

對於具有圓形或卵形截面的粉塵接受裝置而言,該沉積表面的曲率為該粉塵接受裝置之(多個)截面直徑的函數。當直徑變大,曲率半徑即增加,並且所沉積粉塵內的應力會隨著所沉積粉塵片的形狀趨近於平坦平面薄片而減少。For a dust receiving device having a circular or oval cross section, the curvature of the deposition surface is a function of the diameter of the cross section of the dust receiving device. As the diameter becomes larger, the radius of curvature increases, and the stress in the deposited dust decreases as the shape of the deposited dust sheet approaches a flat planar sheet.

在多項具體實施例裡,該粉塵片具有足夠的機械整合度,藉以支撐其本身的質量(亦即在自該沉積表面移除,操縱及燒結的動作過程中)而不致斷裂。可影響該粉塵片之物理及機械性質的製程變數包含粉塵片的厚度和密度,沉積表面的曲率及形成過程中的粉塵片溫度,然不限於此。In various embodiments, the dust sheet has sufficient mechanical integrity to support its own quality (i.e., during removal from the deposition surface, during handling and sintering) without breaking. The process variables that may affect the physical and mechanical properties of the dust sheet include the thickness and density of the dust sheet, the curvature of the deposition surface, and the temperature of the dust sheet during formation, but are not limited thereto.

該粉塵片含有兩個主要表面,然僅其中一者會在該粉塵層的形成過程中接觸到該沉積表面。因此,該粉塵片以及自其所導生之所燒結玻璃片二者的兩個主要表面可予特徵化且區分為"沉積表面"和相對的"自由表面"。The dust sheet contains two major surfaces, only one of which will contact the deposition surface during the formation of the dust layer. Thus, the two major surfaces of the dust sheet and the sintered glass sheet from which it is derived can be characterized and distinguished as a "deposited surface" and an opposite "free surface".

在含有至少90莫耳%氧化矽之粉塵片的範例裡,該粉塵片的平均粉塵密度範圍可為自約0.3至1.5g/cm3 ,例如為自約0.4至0.7g/cm3 ,或自約0.8至1.25g/cm3 ,並且該粉塵片的平均厚度範圍可為自10至600μm,例如為自20至200μm,50至100μm或自300至500μm。In an example of a dust sheet containing at least 90 mole % cerium oxide, the dust sheet may have an average dust density ranging from about 0.3 to 1.5 g/cm 3 , for example from about 0.4 to 0.7 g/cm 3 , or from It is about 0.8 to 1.25 g/cm 3 , and the dust sheet may have an average thickness ranging from 10 to 600 μm, for example, from 20 to 200 μm, 50 to 100 μm or from 300 to 500 μm.

在一些具體實施例裡,尤其是牽涉到連續的粉塵片及/或經燒結玻璃片生產者,可藉由粉塵片導引裝置130以輔助該粉塵片在其釋出之後連續地移離於該沉積表面。該粉塵片導引裝置130可直接地接觸到至少一部份的粉塵片154,藉以輔助該粉塵片的移動並對其提供機械性支撐。In some embodiments, particularly those involving continuous dust sheets and/or sintered glass sheets, the dust sheet guiding device 130 may be used to assist the dust sheet to continuously move away from the sheet after it is released. Deposit the surface. The dust sheet guiding device 130 can directly contact at least a portion of the dust sheet 154 to assist the movement of the dust sheet and provide mechanical support thereto.

為維持粉塵片的高表面品質,該粉塵片導引裝置130可僅接觸該粉塵片154的其一局部(即如邊緣局部)。在一些具體實施例裡,該粉塵片導引裝置含有一對鉗夾滾輪,此等可夾抓該粉塵片的邊緣局部並且導引該粉塵片通過粉塵片燒結裝置。In order to maintain the high surface quality of the dust sheet, the dust sheet guiding device 130 may only contact a part of the dust sheet 154 (i.e., as a part of the edge). In some embodiments, the dust sheet guiding device includes a pair of jaw rollers that grip the edges of the dust sheet and guide the dust sheet through the dust sheet sintering device.

利用該粉塵片導引裝置,可將連續粉塵片饋送至粉塵燒結裝置140的燒結/退火地帶內,在此該粉塵片的至少一部份會被加熱至一溫度並且保持一段足以將該所加熱局部轉換為緻密化玻璃的時間。例如,具有高純度氧化矽的粉塵片可按一溫度範圍所燒結,即自約1000℃至1900℃,像是自約1400℃至1600℃,藉以形成超薄型氧化矽玻璃片156。該燒結溫度和該燒結時間可加以控制,藉以形成基本上不含空洞及氣泡的經燒結玻璃片。With the dust sheet guiding device, the continuous dust sheet can be fed into the sintering/annealing zone of the dust sintering device 140, wherein at least a portion of the dust sheet is heated to a temperature and maintained for a period of time sufficient to heat the film. The time to locally convert to densified glass. For example, a dust sheet having high purity cerium oxide can be sintered at a temperature range, i.e., from about 1000 ° C to 1900 ° C, such as from about 1400 ° C to 1600 ° C, thereby forming an ultrathin yttria glass sheet 156. The sintering temperature and the sintering time can be controlled to form a sintered glass sheet that is substantially free of voids and bubbles.

即如本揭中所使用者,燒結是指一種將玻璃粉塵顆粒加熱而低於其熔點(固態燒結)直到顆粒彼此相附著為止的製程。退火則是一種在形成之後將玻璃冷卻以釋放內部應力的製程。燒結及退火可為利用相同或不同的設備循序地進行。That is, as used in the present specification, sintering refers to a process of heating glass dust particles below their melting point (solid state sintering) until the particles adhere to each other. Annealing is a process that cools the glass after formation to release internal stress. Sintering and annealing can be performed sequentially using the same or different equipment.

該玻璃片形成製程可加以控制,藉以將該粉塵片和該所獲玻璃片的應變(即如下垂)最小化。一種將應變最小化的方式就是在燒結過程中令該粉塵片為垂直地指向。根據具體實施例,該粉塵片相對於垂直指向的指向角度可為小於15度(即如小於10或5度)。另一種將應變最小化的方式是在燒結動作過程中將拉伸應力施加於該粉塵片及/或該玻璃片。可利用例如鉗夾滾輪或鉗夾載送帶以在主要表面的平面內施加拉伸應力。可按能夠可有效於大致平坦地拉張該粉塵片的量值將此拉伸應力施加於粉塵片。The glass sheet forming process can be controlled to minimize strain (i.e., sag) of the dust sheet and the obtained glass sheet. One way to minimize strain is to have the dust sheet pointing vertically during the sintering process. According to a particular embodiment, the angle of pointing of the dust sheet relative to the vertical orientation may be less than 15 degrees (ie, such as less than 10 or 5 degrees). Another way to minimize strain is to apply tensile stress to the dust sheet and/or the glass sheet during the sintering action. The carrier tape can be applied, for example, by a pinch roller or a jaw to apply tensile stress in the plane of the major surface. The tensile stress can be applied to the dust sheet in a magnitude effective to draw the dust sheet substantially flat.

除將因重力所導生的應變最小化以外,施加拉伸應力亦可對該燒結製程產生可見效果。在燒結過程中,粉塵片的密度會隨著玻璃片的形成而提高。為保留質量,密度的增加會伴隨著體積的整體減少。缺少拉伸應力,該粉塵片將會出現顯著的橫向收縮。而藉由對粉塵片施加拉伸應力,可主要是透過厚度上的改變來實現體積變化。此外,藉由在燒結過程中對粉塵片施加拉伸應力,即能對非垂直指向的粉塵片進行燒結而無顯著變形的風險。In addition to minimizing the strain induced by gravity, the application of tensile stress can also produce a visible effect on the sintering process. During the sintering process, the density of the dust flakes increases as the glass flakes are formed. To preserve mass, the increase in density is accompanied by an overall reduction in volume. In the absence of tensile stress, the dust sheet will exhibit significant lateral shrinkage. By applying a tensile stress to the dust sheet, the volume change can be achieved mainly by the change in thickness. Further, by applying tensile stress to the dust sheet during the sintering process, it is possible to sinter the non-vertical-oriented dust sheet without significant risk of deformation.

可利用各種不同的粉塵片燒結裝置,包含電阻加熱及電感加熱裝置以燒結粉塵片。該粉塵片及該玻璃片兩者的熱性歷史二者皆可對該最終產品的最終厚度,成份,成份均質性和其他的化學及物理性質產生影響。玻璃片可為藉由對該粉塵片之其一或二者主要表面施加熱度所形成。在燒結過程中可對各種參數進行控制,包含溫度及溫度廓型,時間以及大氣。A variety of different dust sheet sintering devices can be utilized, including resistance heating and inductive heating devices to sinter the dust sheets. Both the dust sheet and the thermal history of the glass sheet can affect the final thickness, composition, compositional homogeneity and other chemical and physical properties of the final product. The glass sheet can be formed by applying heat to one or both of the major surfaces of the dust sheet. Various parameters can be controlled during the sintering process, including temperature and temperature profile, time and atmosphere.

燒結溫度雖可由熟諳本項技藝之人士根據例如待予燒結之粉塵片的成份所選定,然此燒結溫度範圍可為自約1000℃至1900℃。同時,均質性的溫度廓型可為藉由電阻和電感熱源所達到,並可用以在該最終玻璃片內產生均質性。"均質性的溫度廓型"是指燒結溫度在預定的樣本區域或樣本體積上改變低於20%(即如低於10或5%)。The sintering temperature may be selected from those skilled in the art, for example, depending on the composition of the dust sheet to be sintered, but the sintering temperature may range from about 1000 ° C to 1900 ° C. At the same time, a homogeneous temperature profile can be achieved by resistive and inductive heat sources and can be used to create homogeneity within the final glass sheet. "Homogeneous temperature profile" means that the sintering temperature changes by less than 20% (ie, less than 10 or 5%) over a predetermined sample area or sample volume.

在其中該粉塵片之邊緣局部是藉由該粉塵片導引裝置所固持且導引的具體實施例裡,該邊緣局部通常不會被該燒結裝置所燒結。相反地,該粉塵片燒結裝置將僅燒結該粉塵片的中心局部。例如,在一項具體實施例裡,具有平均厚度約400微米以及總寬度24cm之粉塵片的中央10cm會被加熱以產生具有寬度約10cm以及平均厚度約100微米的燒結玻璃片。在進行燒結之前,該粉塵片的平均密度約為0.5 g/cm3。在其中邊緣局部被粉塵片導引裝置所固持且導引的具體實施例裡,藉由不燒結該粉塵片的邊緣局部,可對該粉塵片總面積的約5到95%之間進行燒結。In a specific embodiment in which the edge of the dust sheet is partially held and guided by the dust sheet guiding device, the edge portion is generally not sintered by the sintering device. Conversely, the dust sheet sintering apparatus will only sinter the center portion of the dust sheet. For example, in one embodiment, a central 10 cm of a dust sheet having an average thickness of about 400 microns and a total width of 24 cm will be heated to produce a sintered glass sheet having a width of about 10 cm and an average thickness of about 100 microns. The dust sheet has an average density of about 0.5 g/cm3 before sintering. In a specific embodiment in which the edge portion is held and guided by the dust sheet guiding device, sintering may be performed between about 5 and 95% of the total area of the dust sheet by not sintering the edge portion of the dust sheet.

除在燒結過程中控制溫度及溫度廓型之外,亦可對週遭環繞於粉塵片/玻璃片的氣體加以控制。詳細地說,可選定適當燒結氣體的總壓力和部份壓力兩者來控制該燒結製程。在一些具體實施例裡,所控制的氣體混合物可含有一個或多個作用性或惰性氣體,例如像是He,O2 ,CO,N2 ,Ar或該等的混合物。In addition to controlling the temperature and temperature profile during the sintering process, it is also possible to control the gas surrounding the dust/glass sheet. In detail, both the total pressure and the partial pressure of the appropriate sintering gas can be selected to control the sintering process. In some embodiments, the gas mixture being controlled may contain one or more reactive or inert gases such as, for example, He, O 2 , CO, N 2 , Ar or mixtures thereof.

在燒結動作的過程中,該粉塵片可被固持在燒結地帶內不動,或者是連續或半連續地移動通過此一地帶。例如,在連續玻璃片形成製程裡,粉塵片自該粉塵沉積表面釋出的生產速率可等於粉塵片通過該燒結地帶的變換速率。可利用相同或不同的燒結條件透過一個或多個經過燒結地帶的通行來進行燒結。從加熱器至該粉塵表面之距離的範圍可為自約1mm至10mm(例如為1,2,3,4,5,6,7,8,9或10mm)。During the sintering action, the dust sheet may be held in the sintering zone or moved continuously or semi-continuously through the zone. For example, in a continuous glass sheet forming process, the rate at which the dust sheet is released from the dust deposition surface can be equal to the rate at which the dust sheet passes through the sintering zone. Sintering may be carried out through one or more passages through the sintering zone using the same or different sintering conditions. The distance from the heater to the surface of the dust may range from about 1 mm to 10 mm (eg, 1, 2, 3, 4, 5, 6, 7, 8, 9, or 10 mm).

一旦形成之後,即可藉由適當的切割裝置將玻璃片劃分成多個離散片段。例如,可利用雷射以將該玻璃片切割成較小片段。此外,在切割之前或之後,可令該經燒結玻璃承受於一個或多個的後燒結製程,像是邊緣移除,鍍層,拋光等處理。可藉由轆捲裝置將經燒結玻璃片長帶轆捲成一滾軸軸。可視需要將間隔材料,像是紙片,布料,鍍層材料等,插入到該滾軸軸裡的鄰近玻璃表面之間,藉以避免其間的直接接觸。Once formed, the glass sheet can be divided into discrete segments by a suitable cutting device. For example, a laser can be utilized to cut the glass sheet into smaller pieces. In addition, the sintered glass can be subjected to one or more post-sintering processes, such as edge removal, plating, polishing, etc., before or after cutting. The long strip of sintered glass sheets can be rolled into a roller shaft by a winding device. Space materials, such as paper sheets, cloth, plating materials, etc., may be inserted between adjacent glass surfaces in the roller shaft as needed to avoid direct contact therebetween.

在此所揭示製程和設備適用於製作含有高百分比之氧化矽的粉塵片及燒結玻璃片,即如"高氧化矽"玻璃片。所謂"高氧化矽"是指含有至少50莫耳%例如為大於50,55,60,65,70,75,80,85,90,95,98,99,99.5或99.9莫耳%氧化矽玻璃的玻璃成份。The processes and apparatus disclosed herein are suitable for making dust sheets and sintered glass sheets containing a high percentage of cerium oxide, such as "high cerium oxide" glass sheets. By "high cerium oxide" is meant at least 50 mole %, for example more than 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 98, 99, 99.5 or 99.9 mole % yttria glass. Glass ingredients.

可形成彈性的燒結玻璃片包含長型玻璃條帶。經燒結玻璃片像是高氧化矽玻璃片可具有150微米或以下的平均厚度。示範性玻璃片具有10μm的厚度。藉由控制所沉積粉塵層的寬度,燒結地帶的寬度以及沉積時間的量值,即可獨立地控制所燒結玻璃片的寬度及長度兩者。該玻璃片之長度的範圍可為自約2.5cm至10km。玻璃片之寬度的範圍可為自約2.5cm至2m,此值表示該粉塵片寬度的約9至95%。The sintered glass sheet which can be formed into an elastic shape comprises a long glass strip. The sintered glass sheet, such as a high cerium oxide glass sheet, may have an average thickness of 150 microns or less. An exemplary glass sheet has a thickness of 10 μm. By controlling the width of the deposited dust layer, the width of the sintering zone, and the amount of deposition time, both the width and length of the sintered glass sheet can be independently controlled. The length of the glass sheet can range from about 2.5 cm to 10 km. The width of the glass sheet can range from about 2.5 cm to 2 m, which represents about 9 to 95% of the width of the dust sheet.

該製程可用以形成高表面品質的玻璃片(即如具有低表面波紋,低表面粗糙度的玻璃片,並且基本上無刮痕)。前述製程可含有在一滾軸軸上形成粉塵片的初始步驟以及將經燒結,彈性玻璃片轆捲於滾軸軸上的最終步驟,並且可稱之為"滾軸至滾軸"製程。可藉由多項性質,包含成份,厚度,表面粗糙度,表面均勻度和平坦度,將包含高氧化矽玻璃片在內的所獲玻璃片加以特徵化。This process can be used to form glass sheets of high surface quality (i.e., glass sheets having low surface ripple, low surface roughness, and substantially no scratches). The foregoing process may include an initial step of forming a dust sheet on a roller shaft and a final step of winding the sintered, elastic glass sheet onto the roller shaft, and may be referred to as a "roller to roller" process. The resulting glass flakes comprising high yttria glass flakes can be characterized by a number of properties including composition, thickness, surface roughness, surface uniformity and flatness.

可利用接觸或非接觸方法對粗糙度以及其他的表面特性進行測量。接觸方法牽涉到將測量點筆拖劃過樣本表面,並且可包含像是輪廓曲線儀的儀器。示範性非接觸方法則包含干涉測量,共軛焦顯微鏡技術,電氣電容及電子顯微鏡技術。Roughness and other surface characteristics can be measured using contact or non-contact methods. The contact method involves dragging the measuring point pen across the surface of the sample and may include an instrument such as a profilometer. Exemplary non-contact methods include interferometry, conjugated focal microscopy, electrical capacitance, and electron microscopy.

包含表面粗糙度在內的表面測度資料是利用Zygo白光干涉儀顯微鏡所測量(New View 5000,美國康乃迪克州Middlefield市Zygo Corporation)。表面粗糙度計算係基於自原始廓型所過濾的粗糙度廓型,並含有所算得平均線。Surface measurement data including surface roughness was measured using a Zygo white light interferometer microscope (New View 5000, Zygo Corporation, Middlefield, Conn.). The surface roughness calculation is based on the roughness profile filtered from the original profile and contains the calculated average line.

該粗糙度廓型含有n個沿一維或二維跡線的經排序,等距相隔點,並且yi為自該平均線或平面至第i個資料點的垂直距離。高度在朝上方向而離於該體型材料係經假設為正。即如本揭中所使用者,Ra為絕對值的算術平均值,即如等式1所表示,並且Rq為根均平方(rms)粗糙度,即如等式2所表示。 The roughness profile contains n ordered, equidistant spaced points along a one or two dimensional trace, and yi is the vertical distance from the average line or plane to the ith data point. The height is in the upward direction and the body material is assumed to be positive. That is, as the user of the present disclosure, Ra is the arithmetic mean of the absolute values, that is, as expressed by Equation 1, and Rq is the root mean square (rms) roughness, that is, as expressed by Equation 2.

在一示範性玻璃片裡,在測量為0.18x0.13mm2 的樣本區域上,平均Ra及Rq值分別為1.11及1.41nm,而相對應的標準差為0.23及0.28nm。在進一步的示範性玻璃片裡,在測量為0.16x0.12mm2 的樣本區域上,平均Ra及Rq值分別為0.59及0.78nm。這些資料是在該經燒結玻璃片的沉積表面上所測得。在許多具體實施例裡,該等主要表面之其一或二者上的平均表面粗糙度(Ra)是低於1nm,然該平均表面粗糙度的範圍可為自約1至5nm。該粗糙度資料裡的樣本至樣本變化性可能因操縱處理或碎塊所造成,特別是在燒結之前。In an exemplary glass sheet, the average Ra and Rq values were 1.11 and 1.41 nm, respectively, on the sample area measured at 0.18 x 0.13 mm 2 , and the corresponding standard deviations were 0.23 and 0.28 nm. In a further exemplary glass sheet, the average Ra and Rq values were 0.59 and 0.78 nm on the sample area measured at 0.16 x 0.12 mm 2 , respectively. These data were measured on the deposited surface of the sintered glass sheet. In many embodiments, the average surface roughness (Ra) on one or both of the major surfaces is less than 1 nm, although the average surface roughness can range from about 1 to 5 nm. The sample-to-sample variability in the roughness data may be due to manipulation or fragmentation, especially prior to sintering.

玻璃片的均勻度可能會因在該玻璃片之其一或二者主要表面上存在有大致平行的突出物而受到影響。該等突出物係按平行於該粉塵片之製造方向所形成,並且為區域性之實體厚度差的光學展現。該等突出物只有在當按相對於該主要表面為法向的角度觀看該玻璃片時才能光學觀察得到。應注意當依入射法線來檢視玻璃片時,厚度變異基本上為非可見。因此,在入射法線處,所看到為均質的折射指數。The uniformity of the glass sheet may be affected by the presence of substantially parallel protrusions on one or both major surfaces of the glass sheet. The projections are formed parallel to the manufacturing direction of the dust sheet and are optically representative of the regional physical thickness difference. The projections are optically observable only when the glass sheet is viewed at an angle normal to the major surface. It should be noted that when the glass piece is viewed in accordance with the incident normal, the thickness variation is substantially non-visible. Therefore, at the incident normal, what is seen is a homogeneous refractive index.

該等突出物為該粉塵片形成製程的特徵,並且不欲受限於理論,據信為該燃燒器組態的製物。由於該等突出物據信對於特定的燃燒器幾何具有唯一性,因此該等可作為製程識別用的指紋。The protrusions are characteristic of the dust sheet forming process and are not intended to be limited by theory and are believed to be the articles of the burner configuration. Since the protrusions are believed to be unique to a particular burner geometry, they can be used as fingerprints for process identification.

可利用Surfcom 2000SD(Carl Zeiss)輪廓及粗糙度廓型系統以取得廓型資料。圖2及3為示範性燒結玻璃片的表面線紋掃瞄結果。該等表面線紋掃瞄是在玻璃片的沉積表面上所測得。圖2顯示表面突出物的截面掃瞄,此者具有約40微米的整體高度並且在基底處具有約9mm的寬度。圖3顯示鄰近表面突出物的截面掃瞄,此者具有約3至5微米之間的整體高度並且在基底處具有範圍自約1至2mm的寬度。The Surfcom 2000SD (Carl Zeiss) profile and roughness profile system can be used to obtain profile data. 2 and 3 are surface line scan results of an exemplary sintered glass sheet. These surface line scans are measured on the deposition surface of the glass sheet. Figure 2 shows a cross-sectional scan of a surface protrusion having an overall height of about 40 microns and a width of about 9 mm at the substrate. Figure 3 shows a cross-sectional scan of adjacent surface protrusions, which has an overall height of between about 3 and 5 microns and a width ranging from about 1 to 2 mm at the substrate.

依據實施例,突出物特徵在於整體高度在1至100微米範圍內(例如為1,2,5,10,20,50或100mm)。According to an embodiment, the protrusions are characterized by an overall height in the range of 1 to 100 microns (eg, 1, 2, 5, 10, 20, 50 or 100 mm).

即如本揭中所使用者,"粉塵層"是指基本上為均質分佈而選擇性地彼此鍵接之玻璃顆粒的覆層。該疊層通常具有大於或等於個別顆粒之平均直徑的平均總厚度。此外,粉塵層可包含單個粉塵層,此者具有基本上為均質性的成份,或是多重粉塵層,而各者具有基本上為均質性的成份。That is, as used in the present disclosure, "dust layer" means a coating of glass particles which are substantially uniformly distributed and selectively bonded to each other. The laminate typically has an average total thickness greater than or equal to the average diameter of the individual particles. In addition, the dust layer may comprise a single layer of dust having a substantially homogeneous composition or multiple layers of dust, each having a substantially homogeneous composition.

在其中該粉塵層含有多重疊層的具體實施例裡,一種玻璃顆粒物種可形成第一粉塵層,而另一種玻璃顆粒物種則可形成鄰近於該第一粉塵層的第二粉塵層。因此,個別的粉塵層可擁有不同的成份及/或其他性質。此外,在該第一與該第二層之間的介面範圍裡,由於這兩種顆粒物種可能混合,故而使得該等接續層之介面處的成份及/或性質可能會偏離於與各個個別疊層相關聯的體型數值。In a particular embodiment wherein the dust layer comprises multiple layers, one glass particle species can form a first dust layer and another glass particle species can form a second dust layer adjacent to the first dust layer. Therefore, individual dust layers can have different compositions and/or other properties. In addition, in the interface between the first layer and the second layer, since the two kinds of particle species may be mixed, the composition and/or properties at the interface of the successive layers may deviate from the individual stacks. The volume value associated with the layer.

本揭中對於"玻璃片"的參照包括含有多個玻璃粉塵顆粒的薄片材料(亦即粉塵片)以及由經燒結玻璃所製成的薄片材料兩者。即如業界所常知者,薄片具有兩個主要的相對表面,此等一般說來大致彼此平行,且各者具有大於另一表面的面積。該等兩個主要表面之間在某一位置處的距離即為在該特定位置處的薄片厚度。薄片在該等主要表面之間可具有大致均勻厚度,或者該厚度可均勻地或非均勻度在空間上改變。在一些其他具體實施例裡,這兩個主要表面可為非平行,並且該等主要表面的其一或二者可為平面或曲型。References to "glass sheets" in this disclosure include both sheet materials (i.e., dust sheets) containing a plurality of glass dust particles and sheet materials made of sintered glass. That is, as is well known in the art, a sheet has two major opposing surfaces, which are generally substantially parallel to each other, and each having an area greater than the other surface. The distance between the two major surfaces at a certain location is the thickness of the sheet at that particular location. The sheet may have a substantially uniform thickness between the major surfaces, or the thickness may vary spatially uniformly or non-uniformly. In some other specific embodiments, the two major surfaces can be non-parallel, and one or both of the major surfaces can be planar or curved.

即如本揭中所使用者,"經燒結玻璃"是指一種玻璃材料,此者具有在標準溫度和壓力(STP)條件下(273K及101.325kPa)對於擁有相同化學成份及微結構之玻璃材料的理論密度(Dmax)之至少95%的密度。在一些具體實施例裡,所欲者為該經燒結玻璃具有在STP下Dmax的至少98%,99%或99.9%之密度。That is, as used in this disclosure, "sintered glass" refers to a glass material that has glass materials of the same chemical composition and microstructure under standard temperature and pressure (STP) conditions (273K and 101.325 kPa). Density of at least 95% of the theoretical density (Dmax). In some embodiments, the desired sintered glass has a density of at least 98%, 99%, or 99.9% of Dmax at STP.

使用玻璃粉塵沉積形成超薄玻璃片以及燒結處理過程其他項目揭示出於相同申請人2007年5月7日申請之美國第11/800585號專利,該專利之說明在此加入作為參考。The use of glass dust deposits to form ultra-thin glass sheets and the sinter processing process are disclosed in the U.S. Patent Application Serial No. 11/800,585, filed on May 7, 2007, the disclosure of which is hereby incorporated by reference.

在此所使用"一","一個"和"此"涵蓋複數指示對象,除非在內文中有清楚表示。例如,所謂"金屬"包含具有兩種或"多種"該"金屬"範例,除非在內文中有清楚表示。As used herein, the terms "a", "an", and "the" are meant to refer to the plural referents unless otherwise indicated in the context. For example, the term "metal" encompasses two or more "metal" examples, unless explicitly stated in the text.

在此表示之範圍為由"大約"一個特定數值,及/或至"大約"另一特定數值。當以該範圍表示時,範例包含由一個特定數值及/或至另一特定數值。同樣地,當數值表示為約略值時,藉由使用前置詞"大約",人們了解特定數值形成另一項。人們更進一步了解範圍每一端點相對於其他另一端點為有意義的,以及獨立於其他端點。The range indicated herein is "about" a particular value, and/or to "about" another particular value. When expressed in terms of ranges, the examples include a particular value and/or to another particular value. Similarly, when a value is expressed as an approximate value, by using the preamble "about", one understands that a particular value forms another. It is further understood that each endpoint of the scope is meaningful relative to the other endpoint and is independent of the other endpoints.

除另顯明敘述者外,並無意將任何本揭所述方法詮釋為需按特定順序以執行其步驟。因此,在方法請求項並未實際地引述其步驟須遵照某一次序或者在申請專利範圍或說明裡並未另予特定地陳述該等步驟應受限於某一特定次序的情況下,即不應參照於任何特定次序。Except as otherwise clear to the narrator, it is not intended to interpret any of the methods described herein as being required to perform the steps in a particular order. Therefore, where a method request item does not actually recite its steps in a certain order or in the scope or specification of the patent application, it is not specifically stated that the steps should be limited to a particular order, that is, no Reference should be made to any particular order.

應該要注意的是,其中本發明元件的列舉以特定方式"運作"或"配置"。在此方面,該元件被"運作"或"配置"以具體化特定性質或功能都是結構性的列舉,而不是預期使用的列舉。更明確地說,其中元件被"運作"或"配置"的參考方式是指元件目前的物理情況,可拿來作為此元件結構化特性明確的列舉。It should be noted that the listing of elements of the invention is "operating" or "configuring" in a particular manner. In this regard, the element is "operated" or "configured" to dictate that a particular property or function is a structural list, rather than an enumeration of the intended use. More specifically, the reference to the element in which it is "operated" or "configured" refers to the current physical state of the component and can be used as an explicit list of structural features of the component.

範例example

現將藉由下列範例以進一步闡述本發明。The invention will now be further illustrated by the following examples.

範例1:製造單層粉塵片Example 1: Making a single layer of dust sheet

利用五個線性燃燒器以生產含有99+莫耳%氧化矽的粉塵層。這五個2.5cm寬的燃燒器係按燃燒器陣列所相鄰架置,藉以產生均勻,12.5cm寬的粉塵流動。各個燃燒器含有9個平行的氣體注口橫列。該等氣體注口各者的直徑測得為0.075cm。Five linear burners were utilized to produce a dust layer containing 99+ moles of cerium oxide. The five 2.5 cm wide burners were placed adjacent to the array of burners to create a uniform, 12.5 cm wide dust flow. Each burner contains nine parallel gas nozzle rows. The diameter of each of the gas nozzles was measured to be 0.075 cm.

含有由N2 (20SLPM)所夾帶之OMCTS(5g/min)的先質氣體混合物流經該等注口的中線橫列。氧氣流經該中線橫列各側上的三個鄰近注口橫列。經過緊鄰橫列的氧氣流為5SLPM,而經過次一橫列組對的氧氣流為20SLPM。通過最後(外側)注口橫列的氣流含有CH4 (12SLPM)及O2 (10SLPM)的混合物。A precursor gas mixture containing OMCTS (5 g/min) entrained by N 2 (20 SLPM) flows through the midline of the nozzles. Oxygen flows through three adjacent nozzle rows on each side of the centerline course. The oxygen flow through the adjacent course is 5 SLPM, and the oxygen flow through the next one pair is 20 SLPM. The gas stream passing through the last (outer) nozzle line contains a mixture of CH 4 (12SLPM) and O 2 (10SLPM).

該等燃燒器係經設置在距圓柱形粉塵接受裝置的沉積表面約10cm處。該粉塵接受裝置具有約38cm的直徑以及約0.64cm的邊壁厚度。該粉塵接受裝置係經旋轉以提供1mm/sec的線性表面速度。The burners are disposed about 10 cm from the deposition surface of the cylindrical dust receiving device. The dust receiving device has a diameter of about 38 cm and a side wall thickness of about 0.64 cm. The dust receiving device was rotated to provide a linear surface speed of 1 mm/sec.

來自該燃燒器陣列的粉塵被導引至該沉積表面,並沉積出約200微米厚且15cm寬的粉塵層。該粉塵片中央13cm的平均密度約為1.1g/cm3 。按較高密度所產生的13cm寬粉塵片被從鼓輪釋出,並藉由氣刀以空氣流動予以擴大。該氣刀經25.4cm寬的氣刀本體供應約20SLPM的空氣,並予導引至該沉積表面處。該粉塵片藉週邊邊緣以人工方式拿取,並被導送至纏繞鼓輪。該纏繞鼓輪的直徑約為41cm。將五公尺長的粉塵片纏繞於該鼓輪上。Dust from the burner array was directed to the deposition surface and a dust layer of about 200 microns thick and 15 cm wide was deposited. The average density of 13 cm in the center of the dust sheet was about 1.1 g/cm 3 . The 13 cm wide dust sheet produced at a higher density was released from the drum and expanded by air flow by an air knife. The air knife supplies about 20 SLPM of air through a 25.4 cm wide air knife body and is guided to the deposition surface. The dust sheet is manually taken by the peripheral edge and guided to the winding drum. The winding drum has a diameter of about 41 cm. A five meter long piece of dust is wound around the drum.

範例2:燒結單層粉塵片Example 2: Sintered single layer dust sheet

製作出如前文範例1所述,然厚度約為400微米的粉塵片。此厚度是藉由減少該粉塵接受裝置的旋轉速度並且提高OMCTS流量所增加。A dust sheet having a thickness of about 400 μm as described in Example 1 above was produced. This thickness is increased by reducing the rotational speed of the dust receiving device and increasing the OMCTS flow.

經測量約為1.2m長且7.6cm寬的粉塵片係按如下方式所燒結,即首先將該粉塵片的週邊邊緣握持於滾輪間而在燒結地帶內沿該樣本的長度上維持接觸,然後令該粉塵片通過熱源,將該粉塵片加熱至約1500℃以形成緻密化,清淨,經燒結玻璃。該經燒結玻璃具有約100微米的最終厚度。A dust sheet measuring about 1.2 m long and 7.6 cm wide is sintered in such a manner that the peripheral edge of the dust sheet is first held between the rollers to maintain contact along the length of the sample in the sintering zone, and then The dust sheet is passed through a heat source, and the dust sheet is heated to about 1500 ° C to form a densified, clean, sintered glass. The sintered glass has a final thickness of about 100 microns.

具有未經燒結之週邊邊緣的經燒結薄片會被從該等握持滾輪移除,同時未經燒結邊緣會利用雷射進行裁修,且沿著該薄片的長度按約3mm/s行越。Sintered flakes having unsintered peripheral edges are removed from the grip rollers while the unsintered edges are trimmed with a laser and run along the length of the flakes at about 3 mm/s.

範例3:製程條件對於粉塵片厚度及密度的效果Example 3: Effect of process conditions on the thickness and density of dust sheets

所設計實驗是以下列方式進行,其中(i)該粉塵接受裝置的旋轉速度,(ii)從該燃燒器至該沉積表面的距離,以及(iii)在最外側燃燒器縱行(亦即縱行1和9)內的O2 流量,係有系統地予以改變。這些變數對於所獲粉塵片之厚度及密度的效果係經測量,並且資料可如表2中所示。利用所選定的參數,即如自表列資料中所見者,粉塵片的厚度從約250變化至700微米,並且該粉塵片的體型密度從約0.35變化至0.7g/cm3 。一般說來,該粉塵片厚度及密度會隨著該粉塵接受裝置的速度減慢而增加。The designed experiment was carried out in the following manner, (i) the rotational speed of the dust receiving device, (ii) the distance from the burner to the deposition surface, and (iii) the longitudinal direction of the outermost burner (ie, longitudinal The O 2 flow in rows 1 and 9) is systematically changed. The effect of these variables on the thickness and density of the obtained dust sheets was measured, and the data can be as shown in Table 2. Using the selected parameters, i.e., as seen from the listed data, the thickness of the dust sheet was varied from about 250 to 700 microns, and the bulk density of the dust sheet was varied from about 0.35 to 0.7 g/cm 3 . In general, the thickness and density of the dust sheet will increase as the speed of the dust receiving device slows down.

在形成玻璃片的燒結/退火過程中,通常該粉塵片厚度會減少(並且密度增加)約4倍,即如約3至5的倍數。During the sintering/annealing process of forming the glass sheet, typically the thickness of the dust sheet is reduced (and increased in density) by about 4 times, i.e., as a multiple of about 3 to 5.

範例4:多成份玻璃片Example 4: Multi-component glass

可藉由將鈦,並選擇性地磷先質,引入至該OMCTS流內以製作具有二元(SiO2 /TiO2 )及三元(SiO2 /TiO2 /P2 O5 )成份的多成份玻璃片。所獲多成份高氧化矽玻璃片之組成內容以個別成份的重量百分比來表示可如表3中所列述。在表3資料裡,氧化矽含量是由重力測量所決定,而鈦及磷含量則是由電感耦合電漿/直接耦合電漿(ICP/DCP)所決定。由於使用不同的測量技術,因此個別成份的組成內容並非總計100重量%。By introducing titanium, and optionally a phosphorus precursor, into the OMCTS stream to produce a composition having binary (SiO 2 /TiO 2 ) and ternary (SiO 2 /TiO 2 /P 2 O 5 ) components. Ingredients glass piece. The composition of the multi-component high cerium oxide glass flakes is expressed as a percentage by weight of the individual components as listed in Table 3. In Table 3, the content of yttrium oxide is determined by gravity measurement, while the content of titanium and phosphorus is determined by inductively coupled plasma/direct coupled plasma (ICP/DCP). Due to the use of different measurement techniques, the composition of the individual components is not 100% by weight in total.

熟知此技術者瞭解本發明能夠作許多變化及改變而並不會脫離本發明之精神及範圍。熟知此技術者將了解包含本發明精神及實質內容所揭示實施例之變化組合,次組合以及改變,本發明受限於下列申請專利範圍以及同等物範圍內。It is apparent to those skilled in the art that the present invention is capable of various changes and modifications without departing from the spirit and scope of the invention. Those skilled in the art will recognize that variations, combinations, and modifications of the disclosed embodiments of the present invention are intended to be included within the scope of the appended claims.

100...形成玻璃片設備100. . . Forming a glass piece device

110...粉塵提供裝置110. . . Dust supply device

120...粉塵接受裝置120. . . Dust receiving device

130...粉塵片導引裝置130. . . Dust sheet guiding device

140...粉塵燒結裝置140. . . Dust sintering device

150...粉塵顆粒150. . . Dust particles

152...粉塵層152. . . Dust layer

154...粉塵片154. . . Dust sheet

156...玻璃片156. . . Glass piece

圖1為說明用以形成超薄型玻璃片之設備的略圖。BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing an apparatus for forming an ultra-thin glass piece.

圖2為根據具體實施例之經燒結玻璃片的表面線紋掃瞄。2 is a surface line scan of a sintered glass sheet in accordance with a particular embodiment.

圖3為根據進一步具體實施例之經燒結玻璃片的表面線紋掃瞄。3 is a surface line scan of a sintered glass sheet in accordance with a further embodiment.

100...形成玻璃片設備100. . . Forming a glass piece device

110...粉塵提供裝置110. . . Dust supply device

120...粉塵接受裝置120. . . Dust receiving device

130...粉塵片導引裝置130. . . Dust sheet guiding device

140...粉塵燒結裝置140. . . Dust sintering device

150...粉塵顆粒150. . . Dust particles

152...粉塵層152. . . Dust layer

154...粉塵片154. . . Dust sheet

156...玻璃片156. . . Glass piece

Claims (5)

一種高氧化矽玻璃片,具有兩個主要相對表面以及包含:至少50莫耳%的氧化矽;兩個主要相對表面之間的一平均厚度約為150微米或以下,並且進一步含有至少一自下列群組中所選定的屬性:(i)高於該等兩個主要表面至少一者約1nm或以下的一平均表面粗糙度;(ii)複數個形成於該等兩個主要相對表面之至少一者上的大致平行之表面突出物;以及(iii)至少2.5cm的一長度和至少2.5cm的一寬度。 A high cerium oxide glass sheet having two major opposing surfaces and comprising: at least 50 mole % cerium oxide; an average thickness between two major opposing surfaces of about 150 microns or less, and further comprising at least one from Attributes selected in the group: (i) an average surface roughness above about 1 nm or less of at least one of the two major surfaces; (ii) at least one of the two major opposing surfaces formed on the two major surfaces A substantially parallel surface protrusion on the person; and (iii) a length of at least 2.5 cm and a width of at least 2.5 cm. 如申請專利範圍第1項所述之高氧化矽玻璃片,其中該玻璃片包含至少80莫耳%的氧化矽。 The high cerium oxide glass sheet of claim 1, wherein the glass sheet comprises at least 80 mol% of cerium oxide. 如申請專利範圍第1項所述之高氧化矽玻璃片,其中該玻璃片具有小於約50微米的一平均厚度。 The high cerium oxide glass sheet of claim 1, wherein the glass sheet has an average thickness of less than about 50 microns. 一種高氧化矽玻璃片,具有兩個主要相對表面以及包含:至少50莫耳%的氧化矽;兩個主要相對表面之間的一平均厚度約為150微米或以下;及高於該等兩個主要表面至少一者約1nm或以下的一平均表面粗糙度。 A high cerium oxide glass sheet having two major opposing surfaces and comprising: at least 50 mole % cerium oxide; an average thickness between two major opposing surfaces of about 150 microns or less; and above An average surface roughness of at least one of the major surfaces of about 1 nm or less. 一種高氧化矽玻璃片,具有兩個主要相對表面以及包含:至少50莫耳%的氧化矽;兩個主要相對表面之間的一平均厚度約為150微米或以下;及複數個形成於該等兩個主要相對表面之至少一者上的大致平行之表面突出物。 a high cerium oxide glass sheet having two major opposing surfaces and comprising: at least 50 mole % cerium oxide; an average thickness between two major opposing surfaces of about 150 microns or less; and a plurality of formed in the A substantially parallel surface protrusion on at least one of the two major opposing surfaces.
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667547A (en) * 1994-05-26 1997-09-16 Heraeus Quartzglas Gmbh Method for manufacture of quartz glass plates
JPH09286621A (en) * 1996-04-19 1997-11-04 Toshiba Ceramics Co Ltd Production of plate material made of quartz glass and device therefor
US6068891A (en) * 1997-08-15 2000-05-30 Komag, Inc. Method for laser texturing a glass ceramic substrate and the resulting substrate
US20040007019A1 (en) * 2002-07-12 2004-01-15 Kohli Jeffrey T. Method of making high strain point glass
US20080280057A1 (en) * 2007-05-07 2008-11-13 Daniel Warren Hawtof Process and apparatus for making glass sheet

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5667547A (en) * 1994-05-26 1997-09-16 Heraeus Quartzglas Gmbh Method for manufacture of quartz glass plates
JPH09286621A (en) * 1996-04-19 1997-11-04 Toshiba Ceramics Co Ltd Production of plate material made of quartz glass and device therefor
US6068891A (en) * 1997-08-15 2000-05-30 Komag, Inc. Method for laser texturing a glass ceramic substrate and the resulting substrate
US20040007019A1 (en) * 2002-07-12 2004-01-15 Kohli Jeffrey T. Method of making high strain point glass
US20080280057A1 (en) * 2007-05-07 2008-11-13 Daniel Warren Hawtof Process and apparatus for making glass sheet

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