TWI456785B - Film having recoded a refraction index modulation - Google Patents

Film having recoded a refraction index modulation Download PDF

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Publication number
TWI456785B
TWI456785B TW098123226A TW98123226A TWI456785B TW I456785 B TWI456785 B TW I456785B TW 098123226 A TW098123226 A TW 098123226A TW 98123226 A TW98123226 A TW 98123226A TW I456785 B TWI456785 B TW I456785B
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TW
Taiwan
Prior art keywords
region
refractive index
film
less
average value
Prior art date
Application number
TW098123226A
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Chinese (zh)
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TW201004002A (en
Inventor
Yasushi Takamatsu
Yugo Yamamoto
Yuichi Ito
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Mitsui Chemicals Inc
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Publication of TW201004002A publication Critical patent/TW201004002A/en
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Publication of TWI456785B publication Critical patent/TWI456785B/en

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4215—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof cycloaliphatic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/686—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0087—Simple or compound lenses with index gradient
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22—Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Epoxy Resins (AREA)
  • Electroluminescent Light Sources (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Claims (8)

一種薄膜，其包含具有第1折射率的第1區域、及具有第2折射率的第2區域，且上述第2區域分散在上述第1區域中，並且，於上述薄膜表面，上述第2區域的圓相當直徑的平均值大於等於5μm、小於等於500μm，且上述第2區域彼此之間隔的平均值大於等於5μm、小於等於500μm，上述第1區域與上述第2區域的折射率差(Δn)為0.001~2.0，上述第1區域包括含有環氧化合物的組成物的硬化物，上述第2區域包括含有具有芴骨架的丙烯酸系化合物的組成物的硬化物，自上述第1區域至上述第2區域，折射率呈梯度調變。 A film comprising a first region having a first refractive index and a second region having a second refractive index, wherein the second region is dispersed in the first region, and the second region is on the surface of the film The average value of the circle-equivalent diameter is 5 μm or more and 500 μm or less, and the average value of the interval between the second regions is 5 μm or more and 500 μm or less, and the refractive index difference (Δn) between the first region and the second region. 0.001 to 2.0, the first region includes a cured product of a composition containing an epoxy compound, and the second region includes a cured product of a composition containing an acrylic compound having an anthracene skeleton, from the first region to the second region. In the region, the refractive index is graded. 如申請專利範圍第1項所述之薄膜，其使用AFM(原子力顯微鏡)所測定的表面粗糙度Ra為0.01μm~1μm。 The film according to the first aspect of the invention is characterized in that the surface roughness Ra measured by AFM (Atomic Force Microscope) is 0.01 μm to 1 μm. 如申請專利範圍第1項所述之薄膜，其中第2區域為大致圓柱狀。 The film of claim 1, wherein the second region is substantially cylindrical. 如申請專利範圍第1項所述之薄膜，其是折射率分佈型微透鏡。 The film according to claim 1, which is a refractive index distribution type microlens. 一種記錄折射率調變之薄膜的製造方法，該製造方法包括：第1步驟，準備組成物，上述組成物包含： 折射率為nD[A]的丙烯酸系化合物，其中上述丙烯酸系化合物具有芴骨架，且分子量大於等於100、小於等於1000；折射率為nD[B]，且不具有光自由基聚合性官能基的環氧化合物；光自由基起始劑；以及熱硬化性促進劑；並且，｜nD[B]-nD[A]∣大於等於0.001、小於等於2.0，使用E型黏度計所測定的25℃下的黏度大於等於0.01Pa．s、小於等於100Pa．s；第2步驟，位置選擇性地對上述組成物照射活性能量線；以及第3步驟，藉由對上述照射活性能量線後之組成物中的上述環氧化合物進行加熱而硬化；並且，上述記錄折射率調變之薄膜包含具有第1折射率的第1區域、及具有第2折射率的第2區域，且上述第2區域分散在上述第1區域中，於上述薄膜表面，上述第2區域的圓相當直徑的平均值大於等於5μm、小於等於500μm，且上述第2區域彼此之間隔的平均值大於等於5μm、小於等於500μm，上述第1區域與上述第2區域的折射率差(Δn)為0.001~2.0。 A method for producing a film for recording refractive index modulation, the method comprising: a first step of preparing a composition, the composition comprising: An acrylic compound having a refractive index of nD[A], wherein the acrylic compound has an anthracene skeleton and has a molecular weight of 100 or more and 1000 or less; a refractive index of nD [B] and no photoradical polymerizable functional group; An epoxy compound; a photoradical initiator; and a thermosetting accelerator; and, |nD[B]-nD[A]∣ is 0.001 or more and 2.0 or less, and is measured at 25 ° C using an E-type viscometer. The viscosity is greater than or equal to 0.01Pa. s, less than or equal to 100Pa. s; a second step of selectively irradiating the composition with an active energy ray; and a third step of hardening by heating the epoxy compound in the composition irradiated with the active energy ray; and The film for recording the refractive index modulation includes a first region having a first refractive index and a second region having a second refractive index, and the second region is dispersed in the first region, and the second surface is on the surface of the film The average value of the circle-equivalent diameter of the region is 5 μm or more and 500 μm or less, and the average value of the interval between the second regions is 5 μm or more and 500 μm or less, and the refractive index difference between the first region and the second region is Δn. ) is 0.001~2.0. 如申請專利範圍第5項所述之製造方法，其中於第1步驟中，將上述組成物以薄膜狀配置於有機EL元件上。 The production method according to claim 5, wherein in the first step, the composition is disposed in a film form on the organic EL element. 一種發光裝置，其包含：配置著有機EL元件的面板基板；與上述面板基板成對的對向基板；以及介設於上述面板基板與上述對向基板之間，且密封上述有機EL元件的密封層；並且，上述密封層包含具有第1折射率的第1區域、及具有第2折射率的第2區域，且上述第2區域分散在上述第1區域中，於上述密封層的表面，上述第2區域的圓相當直徑的平均值大於等於5μm、小於等於500μm，且上述第2區域彼此之間隔的平均值大於等於5μm、小於等於500μm，上述第1區域與上述第2區域的折射率差(Δn)為0.001~2.0，上述第1區域包括含有環氧化合物的組成物的硬化物，上述第2區域包括含有具有芴骨架的丙烯酸系化合物的組成物的硬化物，自上述第1區域至上述第2區域，折射率呈梯度調變。 A light-emitting device comprising: a panel substrate on which an organic EL element is disposed; an opposite substrate that is paired with the panel substrate; and a seal that is interposed between the panel substrate and the opposite substrate and that seals the organic EL element The sealing layer includes a first region having a first refractive index and a second region having a second refractive index, and the second region is dispersed in the first region, and the surface of the sealing layer is The average value of the circle-equivalent diameter of the second region is 5 μm or more and 500 μm or less, and the average value of the interval between the second regions is 5 μm or more and 500 μm or less, and the refractive index difference between the first region and the second region is (Δn) is 0.001 to 2.0, the first region includes a cured product of a composition containing an epoxy compound, and the second region includes a cured product of a composition containing an acrylic compound having an anthracene skeleton, from the first region to In the second region, the refractive index is gradient-modulated. 一種發光裝置的製造方法，其是製造如申請專利範圍第7項所述之發光裝置的方法，該製造方法包括以下步驟：使申請專利範圍第1項所述之薄膜接著於有機EL元件上；以及使上述接著的薄膜硬化。 A method of manufacturing a light-emitting device, which is a method of manufacturing a light-emitting device according to claim 7, wherein the method comprises the steps of: subsequently bonding a film according to claim 1 to an organic EL device; And hardening the above-mentioned succeeding film.
TW098123226A 2008-07-10 2009-07-09 Film having recoded a refraction index modulation TWI456785B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008180578 2008-07-10

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Publication Number Publication Date
TW201004002A TW201004002A (en) 2010-01-16
TWI456785B true TWI456785B (en) 2014-10-11

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JP (1) JP5315344B2 (en)
KR (1) KR101278860B1 (en)
TW (1) TWI456785B (en)
WO (1) WO2010004753A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111512192B (en) * 2018-01-03 2022-05-17 株式会社Lg化学 Optical film
JP2023159473A (en) * 2020-09-03 2023-11-01 ソニーセミコンダクタソリューションズ株式会社 Image display device and electronic apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06130206A (en) * 1992-10-20 1994-05-13 Nitto Denko Corp Lens, microlens array plate and its production
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
JP2001281417A (en) * 2000-03-29 2001-10-10 Fuji Photo Film Co Ltd Graded index lens, lens array and optical device
US20030139486A1 (en) * 2001-12-21 2003-07-24 Jsr Corporation Radiation sensitive refractive index changing composition and refractive index changing method
US20050101698A1 (en) * 2002-01-10 2005-05-12 Takamasa Harada Nanocomposite material for the production of index of refraction gradient films

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3532675B2 (en) * 1994-10-03 2004-05-31 日本ペイント株式会社 Photosensitive composition for volume hologram recording, recording medium using the same, and method for forming volume hologram
JP3849134B2 (en) * 2000-08-29 2006-11-22 Ｊｓｒ株式会社 Radiation sensitive refractive index changing composition and refractive index changing method
JP2004138686A (en) * 2002-10-16 2004-05-13 Daiso Co Ltd Photosensitive composition for volume phase type hologram recording, hologram record medium, its manufacturing method and hologram recording method
JP4507636B2 (en) * 2003-03-27 2010-07-21 日亜化学工業株式会社 Semiconductor light emitting device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06130206A (en) * 1992-10-20 1994-05-13 Nitto Denko Corp Lens, microlens array plate and its production
US5702846A (en) * 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
JP2001281417A (en) * 2000-03-29 2001-10-10 Fuji Photo Film Co Ltd Graded index lens, lens array and optical device
US20030139486A1 (en) * 2001-12-21 2003-07-24 Jsr Corporation Radiation sensitive refractive index changing composition and refractive index changing method
US20050101698A1 (en) * 2002-01-10 2005-05-12 Takamasa Harada Nanocomposite material for the production of index of refraction gradient films

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Publication number Publication date
KR101278860B1 (en) 2013-07-01
JP5315344B2 (en) 2013-10-16
JPWO2010004753A1 (en) 2011-12-22
KR20100124831A (en) 2010-11-29
WO2010004753A1 (en) 2010-01-14
TW201004002A (en) 2010-01-16

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