TWI452946B - Plasma reaction device - Google Patents

Description

Plasma reactor

The present invention relates to a reaction apparatus, and more particularly to a plasma reaction apparatus.

In recent years, many natural disasters have occurred in the world due to climate warming. It has had a tremendous impact on the living environment of human beings, especially the loss of life and property. It is also deeply vigilant that the living environment of human beings is gradually deteriorating. Climate warming is mainly attributed to greenhouse gas emissions. The greenhouse gases mainly include six kinds of regulated gases such as carbon dioxide, methane, sulfur hexafluoride, nitrous oxide, perfluorinated matter (PFC) and hydrofluorocarbon. In Taiwan, the semiconductor industry is the most important industry that has driven the rapid growth of the domestic economy in the past two decades. However, the semiconductor industry uses a large amount of perfluorinated substances. For example, perfluorinated compounds such as CF ₄ , C ₂ F ₆ and NF ₃ are widely used in drying. Cleaning of the reaction chamber after dry etch or chemical vapor deposition (CVD); especially in CVD coating, only about 10% of the gas is used, and the remaining 90% of the gas is exhausted . Although the perfluorinated emissions of semiconductor processes are inferior to those of other greenhouse gases, because the lifetime of perfluorinated substances in the atmosphere and the greenhouse warming potential are much larger than other greenhouse gases, if long-term emissions are not regulated, they will eventually Become the main murderer of the global environment. Therefore, how to decompose and remove perfluorinated compounds has long been a topic worthy of further discussion.

In order to decompose and remove perfluorinated substances, the following three ways have been developed:

(1) Catalytic cracking: the use of chemical adsorption, oxidation and water washing to sterilize toxic and harmful gases and substances;

(2) Combustion, heating damage: heating harmful waste to a high temperature, causing the chemical bond of the compound to be destroyed and decomposed into harmless substances for the purpose of treatment;

(3) Plasma treatment: Generally, the plasma is generated by introducing the required gas into a container and adding a DC power source, an AC power source, a radio frequency (Radio Frequency) or a microwave (Microwave) under a certain pressure. The energy source uses a capacitive, inductive, or electromagnetic field interaction to break down the gas to become a plasma, which can destroy the chemical bond of the exhaust gas and further process it into a material that is harmless to the environment.

In view of the above developed technologies, the effect of plasma treatment is the best, so the use of plasma to treat perfluorinated compounds has been the focus of perfluorination treatment. Generally, the microwave frequency is about 2.456 GHz. At normal temperature, when the whole reaction system is maintained at a low pressure state, the electron has a large mean free path, so that a faster acceleration can be obtained when the electric field is accelerated, so as to increase the plasma ion free. The rate, while achieving a higher plasma density, further increases the number of free free molecules and free radicals in the plasma. In a typical low-temperature plasma system, the optimal plasma generation environment is close to vacuum. However, the pressure of the reaction chamber rises after the gas to be treated is introduced, so that it is maintained in an appropriate low-pressure operating environment, so that the plasma is not extinguished. It is also very important that the plasma reaction can be carried out continuously and stably. At this time, the isolation member for isolating the waveguide and the reaction chamber becomes a key role in maintaining the success of the plasma reaction. It must simultaneously achieve insulation, microwave passage, heat resistance, corrosion resistance and maintain the low pressure of the reaction chamber. effect.

Since the spacer is subjected to both cauterization and plasma corrosion during microwave discharge, the most severely worn component of the plasma reactor is also a spacer, and the general spacer is a structure using a cover, and the reaction chamber is The waveguide is isolated. In such a microwave plasma system, it is necessary to develop a spacer with good wear resistance and good isolation effect, so as to reduce the number of maintenance of the spacer and increase the working efficiency of the microwave plasma.

In view of the above problems, the present invention provides a plasma reaction apparatus that uses a column spacer to isolate a waveguide and a reaction chamber, and allows the waveguide antenna to pass to maintain the pressure of the reaction chamber at a low pressure state, and Since the column spacer is directly connected between the waveguide and the port of the reaction chamber, the external air of the plasma reactor is less likely to flow into the reaction chamber.

SUMMARY OF THE INVENTION A primary object of the present invention is to provide a plasma reaction apparatus which is directly connected between a circular waveguide and a port of a reaction chamber by a column spacer to maintain a gas density.

A secondary object of the present invention is to provide a plasma reaction apparatus which further utilizes at least one pair of heat-resistant gaskets to fill gaps between the inner and outer sides of the columnar spacer to prevent air from flowing into the reaction chamber through the slit.

The invention provides a plasma reaction device, which is connected to a waveguide unit by a microwave generating device. The waveguide unit comprises a square waveguide tube and a circular waveguide tube, and the square waveguide tube is short-circuited horizontally and vertically. After the loop control is turned, the microwave received by the loop enters the circular waveguide, and one of the connecting ports of the circular waveguide is connected to a port on one of the reaction chambers via a column spacer, and a central antenna passes through the circle. a waveguide, a column spacer and a reaction chamber, and at least one pair of heat resistant gaskets are provided on the inner side of the column spacer to increase the gas density, wherein the microwave generating device generates a microwave to square and circular coupling The wave tube is then conducted to the reaction chamber through the central spacer through the column spacer, and the microwave converts the reaction gas received by the reaction chamber into an excited state to form a plasma. The present invention maintains a proper plasma operating environment by column spacers and thereby prolongs the operation time, and the column spacer of the present invention can fill the gap by the heat resistant gasket to maintain the vacuum degree, thereby increasing the working efficiency of the microwave plasma. In addition, the present invention can further mix other gases by a gas mixer, in addition to promoting the decomposition of the perfluorinated gas, and can also dilute the reaction gas and also serve as a dummy load to prevent the microwave energy from being too concentrated on the column. The spacers further extend the service life of the column spacers.

For a better understanding and understanding of the structural features and the achievable effects of the present invention, please refer to the preferred embodiment and the detailed description.

The invention relates to a plasma reaction device which is excited by a microwave to excite, dissociate or ionize a reaction gas in a low pressure environment, and is converted into a plasma, and a plasma reaction is carried out in the reaction chamber. The slurry reaction refers to the generation of a plasma torch in the reaction chamber. However, in addition to the formation of a plasma torch, the plasma reaction of the present invention may be other types of reactions, such as atmospheric pressure reaction, high temperature reaction, and the like.

Please refer to FIG. 1A to FIG. 1D together, which is a schematic structural view of an embodiment of the plasma reactor of the present invention. As shown, the plasma reactor 10 of the present invention comprises a microwave generating device 12, a waveguide unit, at least one reaction chamber 16, a column spacer 18, a central antenna 20 and a gas input device 22, The waveguide unit includes a circular waveguide 13 and a square waveguide 14. The microwave generating device 12 is connected to the square waveguide tube 14. The square waveguide tube 14 has a connection port 142. The reaction chamber 16 has an upper port 162. The upper port 162 is connected to the connection port 142. The spacer 18 is disposed between the connection port 142 and the upper port 162 and isolates the connection port 142 from the upper port 162. The central antenna 20 passes through the circular waveguide 13, the column spacer 18 and the Reaction chamber 16. The microwave generating device 12 generates a microwave to square waveguide 14, the square waveguide 14 receives the microwave, and is controlled by the horizontal short circuit 144 and the vertical short circuit 132 to enter the circular waveguide 13 and guided to the microwave waveguide 14 The central antenna 20 guides the microwave through the column spacer 18 to be guided to the reaction chamber 16. At a low pressure, the microwave drives the reaction gas to form a plasma in the reaction chamber 16. A gas input device 22 is connected to the reaction chamber 16 to input the reaction gas to the reaction chamber 16.

Following the above, the reaction gas system of the present embodiment contains a perfluorinated gas, a volatile organic compound or other semiconductor residual gas. The material of the columnar spacer 18 of the present invention is quartz, which has the advantages of high melting point, low expansion coefficient, corrosion resistance and microwave penetration, so it is very suitable for pneumatic isolation purposes, and can avoid the temperature change and cause the column spacers. The outer shape of the 18 is obviously contracted and expanded, and the circular waveguide 13 and the reaction chamber 16 can be effectively isolated, thereby preventing the outside air from leaking into the reaction chamber 16. The material of the center antenna 20 is stainless steel. The central antenna tip 202 is made of stainless steel, tantalum tungsten or tantalum tungsten. The central antenna tip 202 is shaped as an arbitrary geometry, such as a bullet shape, a star shape, a dendritic shape, a cylindrical shape or a conical shape. The reaction chamber of the present invention is made of stainless steel and is corrosion resistant. In addition, the circular waveguide 13 includes a vertically adjustable short circuit 132, and the square waveguide 14 includes a horizontally adjustable short circuit 144, the vertically adjustable short circuit 132 and the horizontal adjustable short circuit 144 The phase of the microwave can be controlled with a reactive load.

Referring to the first A diagram and the first B diagram, a quartz suspension 164 is further suspended in the reaction chamber 16 for accommodating at least one catalyst for plasma reaction or at least one receiving plasma surface. The object to be treated is processed, and the reaction chamber 16 of the present invention further seals a lower port 168 of the reaction chamber with a partition 166. Referring to FIG. 1C, at least one outer heat-resistant gasket 182 and at least one inner heat-resistant gasket 184 are respectively disposed on the inner and outer sides of the columnar spacer 18 of the present invention. The columnar spacers 18 of the present embodiment are provided with three pairs of heat-resistant gaskets 182. 184, to avoid a gap between the column spacer 18 and the connection port 142, and a gap between the column spacer 18 and the upper port 162; also avoid the central antenna 20 is disposed at the position of the column spacer 18 gap. In addition, as shown in FIG. D, the plasma reactor 10 of the present invention further includes a cooling device, a sampling and analyzing unit 26, an exhaust gas neutralization device 28, a pressure measuring unit 30, and a pneumatic pump 32. A sampling pump 33, wherein the cooling device comprises a circulation chiller 24 and a cooling cycle module 25 (described in the fourth figure). The reaction chamber 16 is further provided with at least one cooling water jacket. On the outer side of the reaction chamber 16 of the embodiment, a first cooling water jacket 242, a second cooling water jacket 243 and a third cooling water jacket are disposed. 244, the first cooling water jacket 242 has an input port 2422 and an output port 2424. The second cooling water jacket 243 has an input port 2432 and an output port 2434. The third cooling water jacket 244 has an input port 2442. And an output port 2444, and the circulation chiller 24 is further connected to the central antenna 20, the central antenna 20 has a circulation line 204 (as shown in FIG. B) connected to a circulation inlet 206 and a circulation outlet 208. The circulation inlet 206 is connected to the circulation chiller 24, the circulation outlet 208 is connected to the input port 2422, the output port 2424 is connected to the input port 2432, the output port 2434 is connected to the input port 2442, and the output port 2444 is connected to the circulation chiller 24, so the electric power of the present invention The slurry reaction device 10 respectively cools the reaction chamber 16 and the central antenna 20 by the circulation chiller 24, and avoids the temperature of the reaction chamber 16 and the central antenna 20 being excessively burned, and the internal temperature controller of the circulation chiller 24 is adjustable. Circulating water temperature.

Since the circulation chiller 24 of the present embodiment is a one-way pump, the circulating chiller 24 of the present invention passes through the central antenna 20, the first cooling water jacket 242, the second cooling water jacket 243 and the third cooling water jacket 244. Recirculating back to the recirculating chiller 24 to form a single-cycle cooling circuit; wherein the recirculating chiller 24 delivers a first fluid through the central antenna 20, the first cooling water jacket 242, the second cooling water jacket 243, and the The three cooling water jackets 244 cool the central antenna 20, the first cooling water jacket 242, the second cooling water jacket 243, and the third cooling water jacket 244. The first cooling water jacket 242, the second cooling water jacket 243 and the third cooling water jacket 244 absorb heat radiated from the reaction chamber 16. The first fluid of this embodiment is water, aqueous glycol solution, liquid ammonia or other cold coal. In addition, the pressure measuring unit 30, the pneumatic pump 32 and the sampling pump 33 are all connected to the reaction chamber 16, the pneumatic pump 32 is further connected to the exhaust gas neutralization device 28, and the sampling pump 33 is further connected to the sampling analysis unit. 26; when the plasma reaction device 10 is started, the sampling analysis unit 26 samples and analyzes a reaction product generated by the plasma through the sampling pump 33, and the sampling analysis unit 26 is a Gas chromatograph (GC) and a Fourier transform infrared spectrometer (FTIR), the sampling pump 33 of this embodiment is a dry pump, which is connected to the gas chamber 32 via a trifurcation tube to the reaction chamber 16 And the outlet of the sampling and analyzing unit 26 is connected to the outlet of the pneumatic pump 32 by a gas separation line; in addition, a thermocouple is connected to the first observation port 170, the second observation port 172, and the third observation port 174. Or a light emission spectrometer (OES), the thermocouple is used to measure the temperature in the reaction chamber 16, and the light emission spectrometer measures the light emission spectrum of the plasma to interpret the state of the plasma in the reaction chamber 16.

When these observator ports are not connected to the meter, they can be sealed with a quartz glass window with a special aperture design SS-316L protective cover for direct observation of the plasma reaction in the reaction chamber 16. The tail gas neutralization device 28 is used for neutralizing the tail gas generated by the plasma, and the structure is to decompose the acid gas generated by the perfluorinated product by a group of single or more filter tanks containing an alkaline supersaturated solution (such as HF, COF _2, etc.) pass through the above solution in the form of bubbles, and the acid gas is precipitated in the form of a salt by the neutralization reaction at the bottom of the canister; there is a water filter tank at the rear to further wash the alkaline gas. In order to make the exhaust gas meet environmental standards. The filtrate contains an indicator, which can add an alkaline substance or replace the filtrate when the filtrate is discolored. In addition, there is an empty canister design for preventing backflow in front of the filtrate, which can protect the vacuum pump from liquid pumping and damage. The neutralization device is made of transparent industrial plastic material for easy observation. The pressure measuring unit 30 measures the pressure of the reaction chamber 16, and the pressure of the gas input device 22 can be adjusted to control the pressure of the reaction chamber 16 by using the measured value. In this embodiment, the operating pressure is maintained. In the low pressure state, such as 0.001 ~ 150 torr (torr). The pneumatic pump 32 draws the post-reaction gas in the reaction chamber 16 which is a wet or dry pump. In this embodiment, the pneumatic pump 32 is connected to the exhaust gas neutralization device 28.

Please refer to the second figure, which is a block diagram of the microwave generating apparatus of the present invention. As shown in the figure, the microwave generating device 12 of the present invention comprises a magnetron 122, a microwave waveform monitoring unit 124, a microwave adjusting unit 126, a power supply 128 and an isolator 130. The magnetron 122 is connected to the power supply 128 to generate microwaves; the isolator 130 is connected to the magnetron 122 for blocking the reflected microwaves to avoid damaging the magnetron 122; the microwave mode monitoring unit 124 is connected to the power supply 128 The isolator 130 monitors the incident wave and the reflected wave waveform of the microwave; the microwave adjusting unit 126 is connected to the isolator 130, and is connected to the reaction chamber 16 via a waveguide, and the operator monitors the unit according to the microwave waveform. The microwave waveform fine-tunes the microwave adjustment unit 126. Before the plasma is turned on The output power and the output frequency of the power source are set to determine the microwave incident waveform that is required by us; when the plasma is turned on, the microwave adjusting unit 126 is used to correct the electric field, the magnetic field and the electrical impedance of the microwave, and the microwave waveform monitoring unit 124 is used to observe the electric field and the magnetic field. The change of the microwave reflection waveform when the electrical impedance changes, thereby adjusting the plasma power that we want. In the experiment, the performance of the plasma itself can be known from the change of the reflected waveform; and the stability of the reflected waveform can be used to determine whether the state of the plasma is stable to avoid tempering.

Please refer to FIG. 3A, which is a block diagram of the gas input device of the present invention. As shown, the gas input device 22 of the present invention includes at least one gas storage unit 222, at least one filter 230, at least one mass flow controller (MFC) 232, at least one pneumatic valve 234, at least one check valve 236 and A gas mixer 238. The embodiment is exemplified by a plurality of gas storage units 222, 224, 226, 228, a plurality of filters 230, a plurality of mass flow controllers 232, a plurality of pneumatic valves 234, and a plurality of check valves 236; and the gas storage units 222, 224 226, 228 in this embodiment is a cylinder, the first gas storage unit 222 stores the reaction gas, and the second, third, and fourth gas storage units 224, 226, 228 store the dilution gas; the plurality of filters 230 are connected to the a gas storage unit 222, 224, 226, 228, the complex mass flow controller 232 is connected to the plurality of filters 230, the plurality of pneumatic valves 234 are connected to the plurality of mass flow controllers 232, and the plurality of check valves 236 are connected to the A plurality of pneumatic valves 234 are coupled to the plurality of check valves 236 and coupled to the reaction chamber 16 (as in the first D-figure).

The gas mixer 238 receives the reaction gas and the plurality of dilution gases via the plurality of filters 230, the plurality of mass flow controllers 232, the plurality of pneumatic valves 234, and the plurality of check valves 236, and delivers the reaction gases to the reaction chamber 16 (as in the first D picture). The gas mixer 238 of the embodiment mixes the diluent gas stored in the other gas storage units 224, 226, 228, such as nitrogen, hydrogen, oxygen or outside air; in addition to promoting the decomposition of the reaction gas, the reaction gas may be diluted and Also serving as a dummy load to avoid excessive concentration of microwave energy in the column spacers 18 (as shown in the first A and first B), thereby extending the service life of the column spacers. In addition, the filter 230 filters the fine particles in the floating gas, and the mass flow controller 232 is connected to a control module 21. The control module 21 includes a programmable controller (PLC) 212 and a liquid crystal touch panel 214. The present invention can control the mass flow controller 232 by the control module 21 to further control the input to the reaction. The flow of gas in the chamber 16. In addition, as shown in FIG. 3B, in addition to controlling the mass flow controller 232 by using the control module 21, the present invention can be connected to the mass flow controller 232 by using a computer device 27 (such as a desktop computer or a notebook computer). To control the mass flow controller 232 by the computer device 27, the flow of gas input into the reaction chamber 16 is further controlled.

As shown in the fourth figure, the cooling cycle module 25 of the present invention comprises a cooling fan 252, a water storage tank 254 and a pumping pump 256, wherein the cooling fan 252 and the pumping pump 256 are respectively connected to the microwave generating device 12, And the cooling fan 252 and the pumping pump 256 are respectively connected to the water storage tank 254, and the pumping pump 256 extracts the second fluid from the water storage tank 254 to the microwave generating device 12 to use the second fluid that does not absorb heat to the microwave generating device 12 The second fluid that has absorbed heat is pushed to the cooling fan 252, and the second fluid that has absorbed heat is dissipated by the cooling fan 252, and then pushed back to the storage tank 254, thus forming another cooling cycle to cool the microwave. The device 12 is produced. The second fluid is water, an aqueous glycol solution or other coolant.

As shown in FIG. 5 , which is a schematic structural view of another embodiment of the reaction chamber 16 of the present invention, the plasma reactor 10 of the present invention may further include at least one extension member 34 having a first connection port 342 . And a second connection port 344, wherein the first connection port 342 of the expansion member 34 is connected to the lower port 168 of the reaction chamber 16, and the second connection port 344 is connected to the next extension member 36 or the sealing plate 166. For example, the second extension member 36 has a first connection port 362 and a second connection port 364. The first extension member 34 is connected to the reaction chamber via the first connection port 342. The chamber 16 is connected to the first connection port 362 of the second extension member 36 via the second connection port 344, and the second connection port 364 of the second extension member 36 is connected to the sealing plate 166. Therefore, the reaction chamber 16 of the embodiment The exhaust gas residence time and the processing capacity are increased by connecting the two expansion members 34, 36, and the plasma operating power can be increased accordingly to maintain the plasma density. The subsequent increase in the connection mode of the extensions, and so on, so that the reaction chamber 16 of the present invention can adjust the capacity of the reaction chamber 16 according to the user's exhaust gas treatment requirements, that is, adjust the number of the expansion members 34 to meet the use. demand. In addition, the first expansion member 34 has a first observation port 346 and a second observation port 348, and the second extension member 36 also has a first observation port 366 and a second observation port 368 for observation or connection. Instrument for detecting plasma.

In summary, the present invention is a plasma reactor, which utilizes a column spacer to guide The wave unit is isolated from the reaction chamber to prevent outside gas from flowing into the reaction chamber, while maintaining the reaction chamber at a low pressure state, and the columnar spacer of the present invention is made of quartz material and does not reflect microwaves. It is not easy to be deformed by temperature changes, is not susceptible to cauterization during microwave discharge and corrosion of plasma, and can effectively extend the service life of the spacer. Moreover, the present invention further provides at least one pair of heat-resistant gaskets on the inner and outer sides of the columnar spacers, thereby avoiding the occurrence of gaps in the inner and outer sides of the columnar spacers, ensuring the gas density of the reaction device and effectively maintaining the reaction chamber in a low pressure state. In summary, the column spacer can simultaneously achieve the multiple effects of insulation, microwave passage, heat resistance, corrosion resistance and low pressure of the reaction chamber.

Therefore, the present invention is a novelty, progressive and available for industrial use. It should be in accordance with the patent application requirements of the Chinese Patent Law. It is undoubtedly the invention patent application, and the Prayer Council will grant the patent as soon as possible. .

However, the above description is only a preferred embodiment of the present invention, and is not intended to limit the scope of the present invention, so that the shapes, structures, features, and spirits described in the claims of the present invention are equally changed. Modifications are intended to be included in the scope of the patent application of the present invention.

10‧‧‧ Plasma reactor

12‧‧‧Microwave generating device

122‧‧‧Magnetron

124‧‧‧Microwave waveform monitoring unit

126‧‧‧Microwave adjustment unit

128‧‧‧Power supply

13‧‧‧Circular waveguide

132‧‧‧Vertically adjustable short circuit

14‧‧‧Square waveguide

142‧‧‧Connection port

144‧‧‧Horizontal adjustable short circuit

16‧‧‧Reaction chamber

162‧‧‧Upper port

164‧‧‧suspension

166‧‧‧Baffle

168‧‧‧Lower port

170‧‧‧First Observatory

172‧‧‧Second Observatory

174‧‧‧ Third Observatory

18‧‧‧ Column spacers

182‧‧‧Outside heat resistant gasket

184‧‧‧Inside heat resistant gasket

20‧‧‧Central antenna

202‧‧‧Center antenna tip

204‧‧‧Circulation line

206‧‧‧Circular entry

208‧‧‧Circular exit

21‧‧‧Control Module

212‧‧‧Programmable controller

214‧‧‧LCD touch panel

22‧‧‧ gas input device

222‧‧‧First gas storage unit

224‧‧‧Second gas storage unit

226‧‧‧ Third gas storage unit

228‧‧‧fourth gas storage unit

230‧‧‧Filter

232‧‧‧Quality Flow Controller

234‧‧‧Pneumatic valve

236‧‧‧ check valve

238‧‧‧Gas Mixer

24‧‧‧Circular freezer

242‧‧‧First cooling water jacket

2422‧‧‧ input port

2424‧‧‧ output port

243‧‧‧Second cooling water jacket

2432‧‧‧ input port

2434‧‧‧Outlet

244‧‧‧ Third cooling water jacket

2442‧‧‧ input port

2444‧‧‧Outlet

25‧‧‧Cooling cycle module

252‧‧‧Cooling fan

254‧‧‧Water tank

256‧‧‧ pumping pump

26‧‧‧Sampling and analysis unit

27‧‧‧Computer equipment

28‧‧‧Exhaust gas neutralization unit

30‧‧‧Pressure measuring unit

32‧‧‧Pneumatic pump

33‧‧‧Sampling pump

34‧‧‧Extensions

342‧‧‧First connection port

344‧‧‧Second port

346‧‧‧First Observatory

348‧‧‧Second Observatory

36‧‧‧Extensions

362‧‧‧First connection port

364‧‧‧Second port

366‧‧‧First Observatory

368‧‧‧Second Observatory

1A is a schematic structural view of an embodiment of a plasma reactor of the present invention; FIG. 1B is a schematic structural view of an embodiment of a plasma reactor of the present invention; BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic structural view of an embodiment of a plasma reactor of the present invention; and FIG. 2 is a block diagram of a preferred embodiment of the microwave generating apparatus of the present invention; 3 is a block diagram of a preferred embodiment of a gas input device of the present invention; FIG. 3B is a block diagram of another preferred embodiment of the gas input device of the present invention; A block diagram of a preferred embodiment of the cooling module; and a fifth diagram is a schematic structural view of another embodiment of the plasma reactor of the present invention.

10‧‧‧ Plasma reactor

13‧‧‧Circular waveguide

132‧‧‧Vertically adjustable short circuit

14‧‧‧Square waveguide

142‧‧‧Connection port

144‧‧‧Horizontal adjustable short circuit

16‧‧‧Reaction chamber

162‧‧‧Upper port

164‧‧‧suspension

166‧‧‧Baffle

168‧‧‧Lower port

172‧‧‧Second Observatory

174‧‧‧ Third Observatory

18‧‧‧ Column spacers

20‧‧‧Central antenna

202‧‧‧Circulation pipeline

204‧‧‧Circulation line

206‧‧‧Circular entry

208‧‧‧Circular exit

Claims (35)

A plasma reaction device comprising: a microwave generating device for generating a microwave; a waveguide unit connected to the microwave generating device, the waveguide unit having a connection port; at least one reaction chamber having an upper port The upper port is connected to the connection port, the reaction chamber receives at least one reactive gas; a column spacer is disposed between the connection port and the upper port; and a central antenna is disposed through the waveguide unit The column spacer and the reaction chamber, the waveguide unit receives the microwave and is guided to the central antenna, and the central antenna guides the microwave through the column spacer to be guided to the reaction chamber The microwave drives the reaction gas to form a plasma in the reaction chamber; a suspension member suspended in the reaction chamber to accommodate at least one object participating in the plasma reaction; and a gas input device connected a reaction chamber, the reaction gas and a plurality of dilution gases are input to the reaction chamber, the gas input device comprises: a plurality of gas storage units for storing the reaction gas and the diluent gases; and a plurality of filters, Connecting the gas storage units to filter a plurality of suspended particles of the reaction gas and the diluent gases; a plurality of mass flow controllers connected to the filters to control a flow rate of the reaction gases and the diluent gases; a plurality of pneumatic valves, Connecting the mass flow controllers to control whether the reaction gases and the diluent gases enter the reaction chamber; and a plurality of check valves connecting the pneumatic valves to prevent incompatible gas from flowing due to a pressure difference between the cylinders a specific cylinder is dangerous; and a gas mixer connected to the check valve and the reaction chamber, the gas mixer passing through the filters, the control valves, the mass flow controllers and the The check valve receives the reaction gases, and mixes the reaction gases with the diluent gases and delivers them to the reaction chamber. The plasma reactor of claim 1, wherein the reaction gas comprises dioxane Carbon, methane, sulfur hexafluoride, nitrous oxide, perfluorinated, volatile organic compounds or other semiconductor process residual gases. The plasma reactor of claim 1, wherein the diluent gas is nitrogen, hydrogen, oxygen or air. The plasma reactor of claim 1, wherein the mass flow controllers are coupled to a control module. The plasma reaction device of claim 4, wherein the control module comprises a programmable controller (PLC) and a touch screen. The plasma reactor of claim 1, wherein the mass flow controllers are connected to a computer device. The plasma reactor of claim 6, wherein the computer device is a desktop computer or a notebook computer. The plasma reactor of claim 1, wherein the gas storage units are cylinders. The plasma reaction device of claim 1, further comprising: at least one gas pressure pump connected to the reaction chamber, extracting one of the exhaust gas generated by the plasma and generating a negative pressure to the reaction chamber a pressure measuring unit connected to the reaction chamber to measure a pressure of the reaction chamber, the gas input device adjusting the intake air flow rate according to the pressure measurement value to control the pressure of the reaction chamber; An off-gas neutralization device is coupled to the gas pressure pump to receive the exhaust gas from the reaction chamber and neutralize the exhaust gas. The plasma reactor of claim 9, wherein the pneumatic pump is a wet pump or a dry pump. The plasma reaction device of claim 1, further comprising: a sampling pump connected to the reaction chamber, and the gas generated by the plasma transporting the reaction chamber is sent to a sampling and analyzing unit; And the sampling analysis unit is connected to the sampling pump, samples the product after the plasma reaction and analyzes. A detection instrument is coupled to the reaction chamber for detecting characteristics of the plasma. The plasma reactor of claim 11, wherein the sampling pump is a dry pump. The plasma reactor of claim 11, wherein the sample analysis unit is a gas chromatograph (GC). The plasma reaction apparatus of claim 11, wherein the sampling analysis unit is a Fourier Transform Infrared Spectrometer (FTIR). The plasma reaction device of claim 11, wherein the detection instrument is an optical emission spectrometer (OES). The plasma reactor of claim 11, wherein the detecting instrument is a thermocouple or a pressure gauge. The plasma reactor of claim 1, wherein the reaction chamber is further provided with at least one observation port connected to the detecting instrument. The plasma reaction device of claim 1, further comprising: a cooling device connected to at least one cooling water jacket outside the reaction chamber, the central antenna and the microwave generating device, cooling the a reaction chamber, the central antenna, and the microwave generating device. The plasma reactor of claim 18, wherein the central antenna has a circulation line connected to the cooling device. The plasma reactor of claim 18, wherein the cooling device comprises: a circulation chiller connecting the cooling water jacket and the central antenna, the circulation chiller conveying a first fluid through the central antenna Jacking the cooling water and cooling the cooling water jacket and the central antenna; a cooling cycle module comprising a circulating pumping pump, a water storage tank and a cooling fan, the cooling fan and the circulating pump Connecting the microwave generating device and the water storage tank respectively, the circulating pumping pump extracts a second fluid of the water storage tank and sends the second fluid to the microwave generating device to utilize the second fluid that does not absorb heat The second fluid that absorbs heat is pushed to the cooling fan 252, and the second stream that has absorbed heat by the cooling fan pair After the body is dissipated, the cooling fan flows into the water storage tank to cool the microwave generating device. The plasma reactor of claim 20, wherein the first fluid is water, aqueous glycol solution, liquid ammonia or other cold coal. The plasma reactor of claim 20, wherein the second fluid is water, an aqueous glycol solution or other coolant. The plasma reactor of claim 1, wherein the column spacer is made of quartz. The plasma reaction device of claim 1, wherein the microwave generating device comprises: a magnetron that generates the microwave; and an isolator that is connected to the magnetron to block the microwave from the guide The wave unit is reflected to the magnetron; a microwave waveform monitoring unit is connected to the magnetron to monitor the waveform of the microwave; and a microwave adjusting unit is connected to the isolator and the waveguide unit, and the microwave adjusting unit is based The electric field, magnetic field and electrical impedance are corrected for the microwave. The plasma reactor of claim 1, wherein the article is at least one catalyst for a plasma reaction. The plasma reaction apparatus of claim 1, wherein the object is at least one object to be treated which is subjected to plasma surface treatment. The plasma reactor of claim 1, wherein the suspension is made of quartz. The plasma reactor of claim 1, further comprising: at least one expansion member connected to the reaction chamber. The plasma reactor of claim 1, wherein the material of the reaction chamber is stainless steel. The plasma reactor of claim 1, wherein the material of the tip of the central antenna is stainless steel, tantalum tungsten or tantalum tungsten. The plasma reactor of claim 1, wherein the tip of the central antenna is shaped like a bullet, a star, a dendrites, a cylinder or a cone. The plasma reactor of claim 1, wherein the waveguide unit comprises at least one adjustable short circuit that controls the phase of the microwave and the reactive load. The plasma reaction device of claim 1, further comprising: at least one inner heat-resistant gasket disposed on the inner side of the columnar spacer, the central antenna penetrating the inner heat-resistant gasket; and at least one external heat-resistant gasket a gasket disposed on an outer side of the column spacer, the outer heat resistant gasket abutting an inner wall between the connection port and the upper port. The plasma reaction device of claim 1, wherein the waveguide unit comprises a square waveguide and a circular waveguide, the square waveguide is provided with a horizontal short circuit, the circular waveguide The tube is provided with a vertical short circuit, the square waveguide receives the microwave, and controls the steering by the horizontal short circuit and the vertical short circuit to guide the microwave to the circular waveguide, the circular waveguide The microwave is directed to the central antenna. The plasma reactor of claim 1, wherein the reaction chamber has a pressure value of 0.001 to 150 torr.