TWI446889B - Multi-functional surgical device and system comprising the same - Google Patents

Multi-functional surgical device and system comprising the same Download PDF

Info

Publication number
TWI446889B
TWI446889B TW100138157A TW100138157A TWI446889B TW I446889 B TWI446889 B TW I446889B TW 100138157 A TW100138157 A TW 100138157A TW 100138157 A TW100138157 A TW 100138157A TW I446889 B TWI446889 B TW I446889B
Authority
TW
Taiwan
Prior art keywords
diamond
circuit board
conductive layer
insulating substrate
surgical
Prior art date
Application number
TW100138157A
Other languages
Chinese (zh)
Other versions
TW201316945A (en
Inventor
Yonhua Tzeng
Jehn Shyun Huang
Jieh Neng Wang
Yang Hwei Tsuang
Wei Cheng Fang
Shou Pu Yeh
Chiuan Yi Li
Wai-Leong Chen
Original Assignee
Univ Nat Cheng Kung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Cheng Kung filed Critical Univ Nat Cheng Kung
Priority to TW100138157A priority Critical patent/TWI446889B/en
Publication of TW201316945A publication Critical patent/TW201316945A/en
Application granted granted Critical
Publication of TWI446889B publication Critical patent/TWI446889B/en

Links

Landscapes

  • Surgical Instruments (AREA)

Description

多功能手術裝置及包含其之手術系統Multifunctional surgical device and surgical system containing the same

本發明係關於一種多功能手術裝置及包含其之手術系統,尤指一種具有高度生物相容性之合併電化學感測及電燒之手術裝置及包含其之手術系統。The present invention relates to a multifunctional surgical device and a surgical system therewith, and more particularly to a highly biocompatible surgical device incorporating electrochemical sensing and electrocautery and a surgical system therewith.

心律不整在兒童到老年人都可能發生,也是重要的致死因素。隨著人類生活型態的改變、社會壓力增加及人口老化,心血管疾病也成為國民健康極大的威脅。Arrhythmia can occur in children to the elderly, and is also an important cause of death. With the changes in human life patterns, increased social pressure and ageing population, cardiovascular disease has become a great threat to national health.

在治療心律不整方面,多使用導管燒灼法進行治療。傳統之導管燒灼法多使用30kHz射頻能量,藉熱能以去除造成心律不整的組織。然而,人類組織的特異性阻抗是非均質的,且當使用射頻電流進行治療時,射頻電流會不均勻的集中於低阻抗組織通道上,而無法精確的控制壞組織範圍及深度,而限制臨床療效的再現性。因此,為了使手術效果提升,仍需提供一種可精密控制手術去除區域之裝置。In the treatment of arrhythmia, catheterization is often used for treatment. Conventional catheter cauterization uses 30 kHz of RF energy to remove tissue that causes arrhythmia. However, the specific impedance of human tissue is heterogeneous, and when using RF current therapy, the RF current will be unevenly concentrated on the low-impedance tissue channel, and the range and depth of bad tissue cannot be accurately controlled, and the clinical efficacy is limited. Reproducibility. Therefore, in order to improve the surgical effect, it is still necessary to provide a device that can precisely control the surgical removal area.

另一方面,當進行心律不整治療手術時,心臟跳動係為一種可判定心臟是否壞死之訊號之一。然而,目前對於心臟電壓訊號之測量,仍無法直接使用進行去除手術之裝置直接進行檢測,而需透過心臟電壓訊號測量裝置進行測量。此外,於手術治療的過程中,生理環境亦為控制手術成功率之因素之一。然而,目前對於生理環境之檢測,亦無法直接使用進行去除手術之裝置直接進行檢測,而需透過生理訊號檢測裝置進行測量。不論是置換手術裝置、心臟電壓訊號測量裝置、或生理訊號檢測裝置,對於費時之手術而言,手術中置換裝置的過程均會造成手術時間拉長,而對會病人造成負擔。On the other hand, when performing arrhythmia treatment, the heartbeat is one of the signals that can determine whether the heart is necrotic. However, at present, the measurement of the cardiac voltage signal cannot be directly detected by the device for performing the removal surgery, and the measurement is performed by the cardiac voltage signal measuring device. In addition, in the course of surgical treatment, the physiological environment is also one of the factors controlling the success rate of surgery. However, at present, the detection of the physiological environment cannot be directly performed by the device for performing the removal surgery, and the measurement is performed by the physiological signal detecting device. Regardless of whether it is a replacement surgical device, a cardiac voltage signal measuring device, or a physiological signal detecting device, for a time-consuming operation, the process of replacing the device during the operation causes an increase in the operation time and imposes a burden on the patient.

因此,目前極需發展一種手術裝置或手術系統,其可切換檢測及手術等多種功能,以於手術過程中同時達到檢測及治療之功效,以減少手術時間,而增加手術成功率。Therefore, it is highly desirable to develop a surgical device or a surgical system that can switch between detection and surgery to achieve the functions of detection and treatment during the operation to reduce the operation time and increase the success rate of the operation.

本發明之主要目的係在提供一種多功能手術裝置,俾能同時達到偵測生理訊號及治療病灶之功效。The main object of the present invention is to provide a multifunctional surgical device capable of simultaneously detecting physiological signals and treating lesions.

本發明之另一目的係在提供一種多功能之手術系統,俾能於手術的過程中快速切換生理訊號感測、電燒及其他之功能。Another object of the present invention is to provide a versatile surgical system that can quickly switch between physiological signal sensing, electrocautery, and other functions during the procedure.

為達成上述目的,本發明之第一實施態樣係提供一種多功能手術裝置,包括:一絕緣基板,其中絕緣基板之一表面係設有一第一工作區域、一參考電極區域、及一對電極區域;一第一線路板,係設於絕緣基板之第一工作區域上;一第二線路板,係設於絕緣基板之參考電極區域上;一第三線路板,係設於絕緣基板之對電極區域上;一第一鑽石導電層,係設於第一線路板上且覆蓋絕緣基板之第一工作區域;一第二鑽石導電層,係設於第二線路板上且覆蓋絕緣基板之參考電極區域;以及一第三鑽石導電層,係設於第三線路板上且覆蓋絕緣基板之對電極區域。In order to achieve the above object, a first embodiment of the present invention provides a multifunctional surgical device comprising: an insulating substrate, wherein a surface of one of the insulating substrates is provided with a first working area, a reference electrode area, and a pair of electrodes a first circuit board disposed on the first working area of the insulating substrate; a second circuit board disposed on the reference electrode area of the insulating substrate; and a third circuit board disposed on the pair of the insulating substrate a first diamond conductive layer is disposed on the first circuit board and covers the first working area of the insulating substrate; a second diamond conductive layer is disposed on the second circuit board and covers the insulating substrate And an electrode region; and a third diamond conductive layer is disposed on the third circuit board and covers the opposite electrode region of the insulating substrate.

因此,本發明第一實施態樣之多功能手術裝置,係具有三個電極區域,分別為第一工作區域、參考電極區域、及對電極區域。當提供一檢測電壓至第一線路板時,第一工作區域係作為一檢測區域;而當提供一手術所需能量(如:射頻能量)至第一線路板時,第一工作區域則作為一電燒區域。Therefore, the multifunctional surgical device according to the first embodiment of the present invention has three electrode regions, which are a first working region, a reference electrode region, and a counter electrode region, respectively. When a detection voltage is supplied to the first circuit board, the first working area acts as a detection area; and when a required energy (eg, radio frequency energy) is supplied to the first circuit board, the first working area acts as a Electric burning area.

此外,本發明之第二實施態樣,係提供一種使用第一實施態樣之手術裝置之多功能手術系統,包括:上述第一實施態樣之手術裝置;一開關裝置,其中手術裝置之第一線路板、第二線路板、及第三線路板係連接至開關裝置;一電壓供應單元,係連接至開關裝置;一電流偵測單元,係連接至開關裝置;以及一電源供應裝置,係連接至開關裝置。如上所述,手術裝置之第一線路板、第二線路板、及第三線路板係連接至開關裝置,而電壓供應單元、電流偵測單元、及電源供應單元亦連接至開關裝置。透過開關裝置,可任意切換手術裝置之第一線路板、第二線路板、或第三線路板與電壓供應單元、電流偵測單元、或電源供應單元電性連接。Furthermore, a second embodiment of the present invention provides a multifunctional surgical system using the surgical device of the first embodiment, comprising: the surgical device of the first embodiment; a switching device, wherein the surgical device is a circuit board, a second circuit board, and a third circuit board are connected to the switching device; a voltage supply unit is connected to the switching device; a current detecting unit is connected to the switching device; and a power supply device Connect to the switchgear. As described above, the first circuit board, the second circuit board, and the third circuit board of the surgical device are connected to the switching device, and the voltage supply unit, the current detecting unit, and the power supply unit are also connected to the switching device. Through the switch device, the first circuit board, the second circuit board, or the third circuit board of the surgical device can be arbitrarily switched to be electrically connected to the voltage supply unit, the current detecting unit, or the power supply unit.

因此,於本發明第二實施態樣之多功能之手術系統,當第一線路板透過開關裝置切換而與電壓供應單元連接時,電壓供應單元可提供一電壓於第一線路板及第二線路板間,而電流偵測單元則可偵測第一線路板及第三線路板間之電流,以進行電化學測量。此外,當第一線路板透過開關裝置切換而與電源供應裝置,則可提供一手術所需能量至手術裝置之第一工作區域,以使手術裝置之第一工作區域進行電燒之功能。較佳為,此手術所需能量係為一射頻能量。Therefore, in the multi-functional surgical system according to the second embodiment of the present invention, when the first circuit board is switched to the voltage supply unit through the switching device, the voltage supply unit can provide a voltage to the first circuit board and the second circuit. Between the boards, the current detecting unit detects the current between the first circuit board and the third circuit board for electrochemical measurement. In addition, when the first circuit board is switched by the switching device and the power supply device, the energy required for the operation can be provided to the first working area of the surgical device, so that the first working area of the surgical device performs the function of electric burning. Preferably, the energy required for the procedure is an RF energy.

本發明第一實施態樣及第二實施態樣之多功能之手術裝置及手術系統,係為一具有三個電極區域之裝置。因此,需透過開關裝置之切換,而使第一工作區域達到電化學偵測或者是電燒之目的。The multi-functional surgical device and surgical system according to the first embodiment and the second embodiment of the present invention are a device having three electrode regions. Therefore, the switching of the switching device is required to achieve the purpose of electrochemical detection or electrocautery.

此外,本發明之第三實施態樣係提供另一多功能手術裝置,相較於第一實施態樣之手術裝置,第三實施態樣之手術裝置更包括:一第二工作區域、一第四線路板、及一第四鑽石導電層。因此,本發明第三實施態樣之多功能手術裝置係包括:一絕緣基板,其中絕緣基板之一表面係設有一第一工作區域、一參考電極區域、一對電極區域、及一第二工作區域;一第一線路板,係設於絕緣基板之第一工作區域上;一第二線路板,係設於絕緣基板之參考電極區域上;一第三線路板,係設於絕緣基板之對電極區域上;一第四線路板,係設於絕緣基板之第二工作區域上;一第一鑽石導電層,係設於第一線路板上且覆蓋絕緣基板之第一工作區域;一第二鑽石導電層,係設於第二線路板上且覆蓋絕緣基板之參考電極區域;以及一第三鑽石導電層,係設於第三線路板上且覆蓋絕緣基板之對電極區域;一第四鑽石導電層,係設於第四線路板上且覆蓋絕緣基板之第二工作區域。In addition, the third embodiment of the present invention provides another multifunctional surgical device. Compared with the surgical device of the first embodiment, the surgical device of the third embodiment further includes: a second working area, a first Four circuit boards, and a fourth diamond conductive layer. Therefore, the multifunctional surgical device according to the third embodiment of the present invention includes: an insulating substrate, wherein a surface of one of the insulating substrates is provided with a first working area, a reference electrode area, a pair of electrode areas, and a second operation a first circuit board disposed on the first working area of the insulating substrate; a second circuit board disposed on the reference electrode area of the insulating substrate; and a third circuit board disposed on the pair of the insulating substrate a fourth circuit board is disposed on the second working area of the insulating substrate; a first diamond conductive layer is disposed on the first circuit board and covers the first working area of the insulating substrate; a diamond conductive layer disposed on the second circuit board and covering the reference electrode region of the insulating substrate; and a third diamond conductive layer disposed on the third circuit board and covering the opposite electrode region of the insulating substrate; a fourth diamond The conductive layer is disposed on the fourth circuit board and covers the second working area of the insulating substrate.

因此,本發明第三實施態樣之多功能手術裝置,係具有四個電極區域,分別為第一工作區域、參考電極區域、對電極區域、及第二工作區域。在此,第一工作區域及第二工作區域之功能並無特別限制,均可作為檢測區域、電燒區域、或其他作用區域。較佳為,可分別提供一手術所需能量及一檢測電壓至第一線路板及第四線路板,第一工作區域係作為一電燒區域,而第二工作區域係作為一檢測區域。Therefore, the multifunctional surgical device according to the third embodiment of the present invention has four electrode regions, which are a first working region, a reference electrode region, a counter electrode region, and a second working region. Here, the functions of the first work area and the second work area are not particularly limited, and may be used as a detection area, an electric burning area, or another active area. Preferably, a required energy for surgery and a detection voltage are respectively provided to the first circuit board and the fourth circuit board, the first working area is used as an electric burning area, and the second working area is used as a detecting area.

此外,本發明之第四實施態樣,係提供一種使用第三實施態樣之多功能手術系統,包括:上述第三實施態樣之手術裝置;一開關裝置,其中手術裝置之第一線路板、第二線路板、第三線路板、及第四線路板係連接至開關裝置;一電壓供應單元,係連接至開關裝置;一電流偵測單元,係連接至開關裝置;以及一電源供應裝置,係連接至開關裝置。如上所述,手術裝置之第一線路板、第二線路板、第三線路板、及第四線路板係連接至開關裝置,而電壓供應單元、電流偵測單元、及電源供應單元亦連接至開關裝置。透過開關裝置,可任意切換手術裝置之第一線路板、第二線路板、第三線路板、或第四線路板與電壓供應單元、電流偵測單元、或電源供應單元電性連接。In addition, a fourth embodiment of the present invention provides a multifunctional surgical system using the third embodiment, comprising: the surgical device of the third embodiment; a switch device, wherein the first circuit board of the surgical device a second circuit board, a third circuit board, and a fourth circuit board are connected to the switching device; a voltage supply unit is connected to the switching device; a current detecting unit is connected to the switching device; and a power supply device , is connected to the switch device. As described above, the first circuit board, the second circuit board, the third circuit board, and the fourth circuit board of the surgical device are connected to the switching device, and the voltage supply unit, the current detecting unit, and the power supply unit are also connected to Switching device. Through the switch device, the first circuit board, the second circuit board, the third circuit board, or the fourth circuit board of the surgical device can be arbitrarily switched to be electrically connected to the voltage supply unit, the current detecting unit, or the power supply unit.

於本發明之第二實施態樣與第四實施態樣之多功能手術系統中,透過開關裝置,可任意切換第一線路板、第二線路板、第三線路板,甚至是第四線路板與不同裝置(如:電壓供應單元、電流偵測單元、及電源供應裝置等)電性連接。除此之外,透過開關裝置甚至可使手術裝置之各電極區域與其他裝置連接,如:訊號處理裝置、電壓偵測裝置等,而使電極區域作為其他目的使用。例如,當本發明之手術系統之與電壓偵測裝置連接時,則可利用第一線路板所連接之第一工作區域、及第二線路板所連接之第二工作區域偵測心臟電壓訊號,而可判斷心臟跳動是否異常。In the multi-functional surgical system according to the second embodiment of the present invention and the fourth embodiment, the first circuit board, the second circuit board, the third circuit board, and even the fourth circuit board can be arbitrarily switched through the switching device. It is electrically connected to different devices (such as voltage supply unit, current detecting unit, power supply device, etc.). In addition, the electrode area of the surgical device can be connected to other devices through a switching device, such as a signal processing device, a voltage detecting device, etc., so that the electrode region is used for other purposes. For example, when the surgical system of the present invention is connected to the voltage detecting device, the heart voltage signal can be detected by using the first working area connected to the first circuit board and the second working area connected to the second circuit board. It can be judged whether the heart beat is abnormal.

然而,本發明之手術裝置及手術系統,並不限於上述實施態樣之三個電極區域或四個電極區域,可依照需求而設計四個以上的電極區域,以使單一裝置有多種功能。However, the surgical device and the surgical system of the present invention are not limited to the three electrode regions or the four electrode regions of the above embodiment, and four or more electrode regions may be designed as needed to allow a single device to have multiple functions.

於本發明之上述實施態樣之手術裝置及系統中,絕緣基板之形狀並無特殊限制,可為柱狀、板狀、甚至為中空管柱,而上述之電極區域、線路板、鑽石導電層則設於絕緣基板之與外界接觸之外表面上。再者,於本發明之上述實施態樣之手術裝置及系統中,更包括一絕緣鑽石膜,其係設於絕緣基板之表面上,以使整個手術裝置均具有高生物相容性。其中,絕緣鑽石膜之材料即為未經摻雜或處理之鑽石膜。In the surgical device and system of the above embodiment of the present invention, the shape of the insulating substrate is not particularly limited, and may be a columnar shape, a plate shape, or even a hollow tubular column, and the above electrode region, the wiring board, and the diamond are electrically conductive. The layer is disposed on a surface of the insulating substrate that is in contact with the outside. Furthermore, in the surgical device and system of the above embodiment of the present invention, an insulating diamond film is further disposed on the surface of the insulating substrate to make the entire surgical device highly biocompatible. Among them, the material of the insulating diamond film is an undoped or treated diamond film.

此外,於本發明之上述實施態樣之手術裝置及系統中,上述之第一鑽石導電層、第二鑽石導電層、第三鑽石導電層、及第四鑽石導電層可各自獨立為一P型鑽石膜、或一N型鑽石膜。其中,第一鑽石導電層、第二鑽石導電層、第三鑽石導電層及第四鑽石導電層之例子,係分別各自獨立為一表面經氫處理之鑽石膜、一硼摻雜鑽石膜、或一氮摻雜鑽石膜。較佳為,第一鑽石導電層、第二鑽石導電層、第三鑽石導電層及第四鑽石導電層係氮摻雜鑽石膜。Furthermore, in the surgical device and system of the above embodiment of the present invention, the first diamond conductive layer, the second diamond conductive layer, the third diamond conductive layer, and the fourth diamond conductive layer may each independently be a P-type. Diamond film, or an N-type diamond film. Wherein, the first diamond conductive layer, the second diamond conductive layer, the third diamond conductive layer and the fourth diamond conductive layer are respectively independently a hydrogen film treated with a surface, a boron doped diamond film, or A nitrogen-doped diamond film. Preferably, the first diamond conductive layer, the second diamond conductive layer, the third diamond conductive layer and the fourth diamond conductive layer are nitrogen doped diamond films.

此外,於本發明之上述實施態樣之手術裝置及系統中,上述之第一線路板、第二線路板、第三線路板、及第四線路板可為本技術領域常用之金屬線路板,其材料可為銅、金、鉑、鎢、鉬等。In addition, in the surgical device and system of the above embodiment of the present invention, the first circuit board, the second circuit board, the third circuit board, and the fourth circuit board may be metal circuit boards commonly used in the technical field. The material may be copper, gold, platinum, tungsten, molybdenum or the like.

再者,於本發明之上述實施態樣之手術裝置及系統中,係使用循環伏安法進行電化學檢測。其中,電壓供應單元可提供一-2V至+2V之循環電壓,較佳為提供一-1至+1V之循環電壓。此外,於本發明第二實施態樣及第四實施態樣之手術系統中,電壓供應單元與電流偵測單元可本技術領域常用之裝置。其中,電壓供應單元與電流偵測單元可分別為兩個不同的裝置,或者使用一整合有電壓供應單元與電流偵測單元之裝置,如恆電位儀。Further, in the surgical apparatus and system of the above-described embodiment of the present invention, electrochemical detection is performed using cyclic voltammetry. Wherein, the voltage supply unit can provide a circulating voltage of -2V to +2V, preferably providing a circulating voltage of -1 to +1V. Furthermore, in the surgical system of the second embodiment and the fourth embodiment of the present invention, the voltage supply unit and the current detecting unit can be used in the art. The voltage supply unit and the current detecting unit may be two different devices respectively, or a device integrated with a voltage supply unit and a current detecting unit, such as a potentiostat.

於本發明之上述實施態樣之手術裝置及系統中,所使用之導電鑽石具有相當低電化學電流背景值、及大範圍之電化學電位窗(potential window),故可達到高訊號雜訊比(signal-to-noise ratio),而有效用於生物分子之檢測上。此外,本發明所使用之導電鑽石具有化學惰性、高物理及化學穩定性、及低磨損率,故本發明所發展之手術裝置之使用壽命較長。同時,因本發明所使用之導電鑽石更具有高度之生物相容性及低沾黏性,故可應用於體內生物分子之檢測上。另一方面,因本發明所使用之導電鑽石更具有高熱傳導性之能力,故可提供一手術所需能量(如:射頻能量)至第一工作區域及/或第二工作區域,而以電燒的方式進行手術,而治療病灶。In the surgical device and system of the above embodiment of the present invention, the conductive diamond used has a relatively low electrochemical current background value and a wide range of electrochemical potential windows, so that a high signal noise ratio can be achieved. (signal-to-noise ratio), which is effective for the detection of biomolecules. In addition, the conductive diamond used in the present invention has chemical inertness, high physical and chemical stability, and low wear rate, so the surgical device developed by the present invention has a long service life. At the same time, the conductive diamond used in the invention has high biocompatibility and low stickiness, so it can be applied to the detection of biomolecules in vivo. On the other hand, since the conductive diamond used in the present invention has higher heat conductivity, it can provide energy required for surgery (eg, radio frequency energy) to the first working area and/or the second working area, and electricity The method of burning is performed to treat the lesion.

舉例而言,以本發明之裝置及系統進行手術時,當手術裝置接觸到人體內之組織器官時,特別是接觸心臟時,由於心臟係透過電壓訊號以控制心臟跳動,故本發明之手術裝置可透過其中兩個電極(如:第一工作區域之第一線路板、及第二工作區域之第四線路板)偵測心臟兩點之間之電壓訊號,而分辨心臟組織是否正常。若本發明之手術裝置偵測到心臟訊號異常時,則可利用開關裝置將第一工作區域之第一線路板與電源供應裝置連接,透過電源供應裝置所提供一射頻能量,以治療異常組織。For example, when performing surgery on the device and system of the present invention, when the surgical device contacts the tissue of the human body, especially when contacting the heart, the surgical device of the present invention is controlled by the heart signal transmitting the voltage signal to control the heart beat. The voltage between the two points of the heart can be detected through two of the electrodes (eg, the first circuit board of the first working area and the fourth circuit board of the second working area) to distinguish whether the heart tissue is normal. If the surgical device of the present invention detects an abnormality of the heart signal, the first circuit board of the first working area can be connected to the power supply device by using the switching device, and an RF energy is supplied through the power supply device to treat the abnormal tissue.

再者,本發明所發展之手術系統,更可透過開關裝置快速切換以進行偵測或者是手術功能,而於手術的當下偵測患者生理訊號之變化或進行手術,以提升手術準確度。Furthermore, the surgical system developed by the present invention can be quickly switched through the switch device for detecting or performing a surgical function, and detecting changes in the physiological signal of the patient or performing surgery at the moment of the operation to improve the accuracy of the operation.

舉例而言,可先進行組織檢測,當本發明之手術裝置偵測到異常時,可透過開關裝置將偵測功能切換至電燒功能,特別是以第一工作區域作為電燒區域,以治療異常組織。而後,再透過開關裝置將電燒功能再次切換回偵測功能,而以電化學方式偵測手術環境。接著,可再透過開關裝置再一次切換,而再次偵測組織狀態(如:心臟電壓訊號)。藉由不斷的功能切換,而可同時達到電化學檢測手術環境、偵測組織狀態、及治療病灶之功效。For example, the tissue detection can be performed first. When the surgical device of the present invention detects an abnormality, the detection function can be switched to the electric burning function through the switching device, in particular, the first working area is used as the electric burning area to treat Abnormal organization. Then, the electric burning function is switched back to the detecting function through the switching device, and the operating environment is electrochemically detected. Then, the switch device can be switched again to detect the tissue state (eg, heart voltage signal). Through continuous functional switching, the electrochemical detection of the surgical environment, detection of tissue status, and treatment of lesions can be achieved simultaneously.

以下係藉由特定的具體實施例說明本發明之實施方式,熟習此技藝之人士可由本說明書所揭示之內容輕易地了解本發明之其他優點與功效。本發明亦可藉由其他不同的具體實施例加以施行或應用,本說明書中的各項細節亦可針對不同觀點與應用,在不悖離本創作之精神下進行各種修飾與變更。The embodiments of the present invention are described by way of specific examples, and those skilled in the art can readily appreciate the other advantages and advantages of the present invention. The present invention may be embodied or applied in various other specific embodiments. The details of the present invention can be variously modified and changed without departing from the spirit and scope of the invention.

實施例1-製備具有三個硼摻雜鑽石電極之手術裝置Example 1 - Preparation of a surgical device having three boron-doped diamond electrodes

首先,如圖1(A)所示,提供一絕緣基板11,其係為一中空絕緣基板。而後,於絕緣基板11外表面上,以微波電漿化學氣相沉積法鍍上一絕緣鑽石膜12。在此,鍍絕緣鑽石膜12之製程約略如下:使用甲烷(0.8 sccm)與氫氣(100 sccm)之混合氣體,於30 Torr氣體壓力下,使用900 W之微波源,以2.45 GHz頻率在約700-750℃溫度下進行反應1.5小時,則可製得一絕緣鑽石膜12。First, as shown in Fig. 1(A), an insulating substrate 11 is provided which is a hollow insulating substrate. Then, an insulating diamond film 12 is plated on the outer surface of the insulating substrate 11 by microwave plasma chemical vapor deposition. Here, the process of plating the insulative diamond film 12 is roughly as follows: using a mixed gas of methane (0.8 sccm) and hydrogen (100 sccm), using a microwave source of 900 W at a gas pressure of 30 Torr, and a frequency of about 700 at a frequency of 2.45 GHz. An insulating diamond film 12 can be obtained by carrying out the reaction at a temperature of -750 ° C for 1.5 hours.

接著,如圖1(B)所示,蝕刻絕緣基板11外表面上之絕緣鑽石膜12,以圖案化絕緣鑽石膜12,而於絕緣基板11表面係形成一第一工作區域121、一參考電極區域122、及一對電極區域123。其中,每一電極區域面積係為0.071 cm2Next, as shown in FIG. 1(B), the insulating diamond film 12 on the outer surface of the insulating substrate 11 is etched to pattern the insulating diamond film 12, and a first working region 121 and a reference electrode are formed on the surface of the insulating substrate 11. A region 122 and a pair of electrode regions 123. Among them, each electrode area is 0.071 cm 2 .

而後,如圖1(C)所示,分別於第一工作區域121、參考電極區域122、及對電極區域123上形成一第一線路板131、一第二線路板132、及一第三線路板133,且第一線路板131、第二線路板132、及第三線路板133係分別透過導線與外界電性連接。於本實施例中,第一線路板131、第二線路板132、及第三線路板133之係為銅線路板。Then, as shown in FIG. 1(C), a first circuit board 131, a second circuit board 132, and a third line are formed on the first working area 121, the reference electrode area 122, and the counter electrode area 123, respectively. The board 133, and the first circuit board 131, the second circuit board 132, and the third circuit board 133 are electrically connected to the outside through the wires. In the embodiment, the first circuit board 131, the second circuit board 132, and the third circuit board 133 are copper circuit boards.

如圖1(D)所示,再使用微波電漿化學氣相沉積法分別於第一工作區域121、參考電極區域122、及對電極區域123上鍍上一第一鑽石導電層141、一第二鑽石導電層142、及一第三鑽石導電層143。於本實施例中,第一鑽石導電層141、第二鑽石導電層142、及第三鑽石導電層143均為硼摻雜鑽石膜,其製程與上述鍍製絕緣鑽石膜之製程相似,除了於鍍製絕緣鑽石膜時所使用之混合氣體中更添加硼,且硼/碳添加比例係為10-1 至10-8 。較佳為,硼/碳添加比例係10-2 至10-4 。此外,混合中的硼來源並不限定,可使用硼元素、或任何含有硼之化合物。As shown in FIG. 1(D), a first diamond conductive layer 141 is first plated on the first working region 121, the reference electrode region 122, and the counter electrode region 123 by microwave plasma chemical vapor deposition. A second diamond conductive layer 142 and a third diamond conductive layer 143. In this embodiment, the first diamond conductive layer 141, the second diamond conductive layer 142, and the third diamond conductive layer 143 are both boron doped diamond films, and the process thereof is similar to the process of plating the insulated diamond film described above, except Boron is added to the mixed gas used for plating the insulating diamond film, and the boron/carbon addition ratio is 10 -1 to 10 -8 . Preferably, the boron/carbon addition ratio is from 10 -2 to 10 -4 . Further, the source of boron in the mixing is not limited, and a boron element or any compound containing boron may be used.

經由上述製程後,則可製得本實施例之多功能手術裝置。如圖1(D)所示,本實施例之手術裝置1係包括:一表面設有一絕緣鑽石膜12之絕緣基板11,其中絕緣基板11之一表面係設有一第一工作區域121、一參考電極區域122、及一對電極區域123;一第一線路板131,係設於絕緣基板11之第一工作區域121上;一第二線路板132,係設於絕緣基板11之參考電極區域122上;一第三線路板133,係設於絕緣基板11之對電極區域123上;一第一鑽石導電層141,係設於第一線路板131上且覆蓋絕緣基板11之第一工作區域121;一第二鑽石導電層142,係設於第二線路板132上且覆蓋絕緣基板11之參考電極區域122;一第三鑽石導電層143,係設於第三線路板133上且覆蓋絕緣基板11之對電極區域123。After the above process, the multifunctional surgical device of the present embodiment can be obtained. As shown in FIG. 1(D), the surgical device 1 of the present embodiment includes an insulating substrate 11 having an insulating diamond film 12 on its surface, wherein a surface of one of the insulating substrates 11 is provided with a first working area 121 and a reference. The electrode region 122 and the pair of electrode regions 123; a first circuit board 131 is disposed on the first working area 121 of the insulating substrate 11; and a second circuit board 132 is disposed on the reference electrode area 122 of the insulating substrate 11. A third circuit board 133 is disposed on the opposite electrode region 123 of the insulating substrate 11; a first diamond conductive layer 141 is disposed on the first circuit board 131 and covers the first working area 121 of the insulating substrate 11. A second diamond conductive layer 142 is disposed on the second circuit board 132 and covers the reference electrode region 122 of the insulating substrate 11; a third diamond conductive layer 143 is disposed on the third circuit board 133 and covers the insulating substrate 11 of the electrode area 123.

實施例2-製備具有三個氮摻雜鑽石電極之手術裝置Example 2 - Preparation of a surgical device having three nitrogen-doped diamond electrodes

本實施例之多功能手術裝置之結構及製作方法係與實施例1相似,除了第一鑽石導電層、第二鑽石導電層、及第三鑽石導電層均為氮摻雜鑽石膜。本實施例之氮摻雜鑽石膜係使用微波電漿化學氣相沉積法製備,其製程約略如下:使用氬氣(78 sccm)、甲烷(2 sccm)與氮氣(20 sccm)之混合氣體,於80 Torr氣體壓力下,使用950 W之微波源,以2.45 GHz頻率在約800℃溫度下進行反應40分鐘,則可製得氮摻雜鑽石膜。The structure and manufacturing method of the multifunctional surgical device of the present embodiment is similar to that of Embodiment 1, except that the first diamond conductive layer, the second diamond conductive layer, and the third diamond conductive layer are all nitrogen-doped diamond films. The nitrogen-doped diamond film of the present embodiment is prepared by microwave plasma chemical vapor deposition, and the process is roughly as follows: a mixed gas of argon gas (78 sccm), methane (2 sccm) and nitrogen gas (20 sccm) is used. A nitrogen-doped diamond film can be obtained by using a microwave source of 950 W at 80 Torr gas pressure and reacting at a temperature of 2.45 GHz at a temperature of about 800 ° C for 40 minutes.

實施例3-具有三個硼摻雜鑽石電極之手術裝置之手術系統Example 3 - Surgical System of Surgical Device with Three Boron-Doped Diamond Electrodes

如圖2所示,本實施例之多功能手術系統,係包括:如實施例1所示之多功能手術裝置1、一開關裝置2、一電壓供應單元21、一電流偵測單元22、一電源供應裝置23、一訊號處理裝置24、及一電壓偵測裝置25。因本實施例之手術裝置1結構與實施例1相同,在此將不再贅述。As shown in FIG. 2, the multifunctional surgical system of the present embodiment includes: a multifunctional surgical device 1 as shown in Embodiment 1, a switching device 2, a voltage supply unit 21, a current detecting unit 22, and a The power supply device 23, a signal processing device 24, and a voltage detecting device 25. The structure of the surgical device 1 of the present embodiment is the same as that of the first embodiment, and will not be described herein.

其中,手術裝置1係與開關裝置2連接,電壓供應單元21、電流偵測單元22、電源供應裝置23、訊號處理裝置24、及電壓偵測裝置25亦與開關裝置2連接。透過開關裝置2之任意切換,可使手術裝置1之各電極區域(包括第一線路板131、第二線路板132、及第三線路板133)與電壓供應單元21、電流偵測單元22、電源供應裝置23、訊號處理裝置24、及電壓偵測裝置25電性連接。The surgical device 1 is connected to the switch device 2, and the voltage supply unit 21, the current detecting unit 22, the power supply device 23, the signal processing device 24, and the voltage detecting device 25 are also connected to the switching device 2. Through the arbitrary switching of the switching device 2, each electrode region of the surgical device 1 (including the first circuit board 131, the second circuit board 132, and the third circuit board 133) and the voltage supply unit 21, the current detecting unit 22, The power supply device 23, the signal processing device 24, and the voltage detecting device 25 are electrically connected.

實施例4-製備具有四個硼摻雜鑽石電極之手術裝置Example 4 - Preparation of a surgical device having four boron-doped diamond electrodes

本實施例之多功能手術裝置之結構及製作方法係與實施例1相似。The structure and manufacturing method of the multifunctional surgical device of this embodiment are similar to those of the first embodiment.

首先,如圖3(A)所示,提供一絕緣基板31,其係為一中空絕緣基板。而後,於絕緣基板31外表面上,以微波電漿化學氣相沉積法鍍上一絕緣鑽石膜32。在此,鍍絕緣鑽石膜12之製程約略如下:使用甲烷(0.8 sccm)與氫氣(100 sccm)之混合氣體,於30 Torr氣體壓力下,使用900 W之微波源,以2.45 GHz頻率在約700-750℃溫度下進行反應1.5小時,則可製得一絕緣鑽石膜32。First, as shown in Fig. 3(A), an insulating substrate 31 is provided which is a hollow insulating substrate. Then, an insulating diamond film 32 is plated on the outer surface of the insulating substrate 31 by microwave plasma chemical vapor deposition. Here, the process of plating the insulative diamond film 12 is roughly as follows: using a mixed gas of methane (0.8 sccm) and hydrogen (100 sccm), using a microwave source of 900 W at a gas pressure of 30 Torr, and a frequency of about 700 at a frequency of 2.45 GHz. An insulating diamond film 32 can be obtained by carrying out the reaction at a temperature of -750 ° C for 1.5 hours.

接著,如圖3(B)所示,蝕刻絕緣基板31外表面上之絕緣鑽石膜32,以圖案化絕緣鑽石膜32,而於絕緣基板31表面係形成一第二工作區域321、一第一工作區域322、一參考電極區域323、及一對電極區域324。其中,每一電極區域面積係為0.071 cm2Next, as shown in FIG. 3(B), the insulating diamond film 32 on the outer surface of the insulating substrate 31 is etched to pattern the insulating diamond film 32, and a second working area 321 is formed on the surface of the insulating substrate 31. The working area 322, a reference electrode area 323, and a pair of electrode areas 324. Among them, each electrode area is 0.071 cm 2 .

而後,如圖3(C)所示,分別於第二工作區域321、第一工作區域322、參考電極區域323、及對電極區域324上形成一第四線路板331、一第一線路板332、一第二線路板333、及一第三線路板334,且第四線路板331、第一線路板332、第二線路板333、及第三線路板334係分別透過導線與外界電性連接。於本實施例中,第四線路板331、第一線路板332、第二線路板333、及第三線路板334係為銅線路板。Then, as shown in FIG. 3(C), a fourth circuit board 331 and a first circuit board 332 are formed on the second working area 321, the first working area 322, the reference electrode area 323, and the counter electrode area 324, respectively. a second circuit board 333 and a third circuit board 334, and the fourth circuit board 331, the first circuit board 332, the second circuit board 333, and the third circuit board 334 are respectively electrically connected to the outside through the wires. . In the embodiment, the fourth circuit board 331, the first circuit board 332, the second circuit board 333, and the third circuit board 334 are copper circuit boards.

如圖3(D)所示,再使用微波電漿化學氣相沉積法分別於第二工作區域321、第一工作區域322、參考電極區域323、及對電極區域324上鍍上一第四鑽石導電層341、一第一鑽石導電層342、一第二鑽石導電層343、及一第三鑽石導電層344。於本實施例中,第四鑽石導電層341、第一鑽石導電層342、第二鑽石導電層343、及第三鑽石導電層344均為硼摻雜鑽石膜,其製程與上述鍍製絕緣鑽石膜之製程相似,除了於鍍製絕緣鑽石膜時所使用之混合氣體中更添加硼,且硼/碳添加比例係為10-1 至10-8 。較佳為,硼/碳添加比例係10-2 至10-4 。此外,混合中的硼來源並不限定,可使用硼元素、或任何含有硼之化合物。As shown in FIG. 3(D), a fourth diamond is further plated on the second working region 321, the first working region 322, the reference electrode region 323, and the counter electrode region 324 by microwave plasma chemical vapor deposition. The conductive layer 341, a first diamond conductive layer 342, a second diamond conductive layer 343, and a third diamond conductive layer 344. In this embodiment, the fourth diamond conductive layer 341, the first diamond conductive layer 342, the second diamond conductive layer 343, and the third diamond conductive layer 344 are all boron doped diamond films, and the process thereof and the above-mentioned plated insulated diamonds The process of the film is similar except that boron is added to the mixed gas used for plating the insulating diamond film, and the boron/carbon addition ratio is 10 -1 to 10 -8 . Preferably, the boron/carbon addition ratio is from 10 -2 to 10 -4 . Further, the source of boron in the mixing is not limited, and a boron element or any compound containing boron may be used.

經由上述製程後,則可製得本實施例之多功能手術裝置。如圖3(D)所示,本實施例之手術裝置3係包括:一表面設有一絕緣鑽石膜32之絕緣基板31,其中絕緣基板31之一表面係設有一第二工作區域321、一第一工作區域322、一參考電極區域323、及一對電極區域324;一第四線路板331,係設於絕緣基板31之第二工作區域321上;一第一線路板332,係設於絕緣基板31之第一工作區域322上;一第二線路板333,係設於絕緣基板31之參考電極區域323上;一第三線路板334,係設於絕緣基板31之對電極區域324上;一第四鑽石導電層341,係設於第四線路板331上且覆蓋絕緣基板31之第二工作區域321;一第一鑽石導電層342,係設於第一線路板332上且覆蓋絕緣基板31之第一工作區域322;一第二鑽石導電層343,係設於第二線路板333上且覆蓋絕緣基板31之參考電極區域323;一第三鑽石導電層344,係設於第三線路板334上且覆蓋絕緣基板31之對電極區域324。After the above process, the multifunctional surgical device of the present embodiment can be obtained. As shown in FIG. 3(D), the surgical device 3 of the present embodiment includes: an insulating substrate 31 having an insulating diamond film 32 on its surface, wherein a surface of one of the insulating substrates 31 is provided with a second working area 321 a working area 322, a reference electrode area 323, and a pair of electrode areas 324; a fourth circuit board 331 is disposed on the second working area 321 of the insulating substrate 31; a first circuit board 332 is insulated a first circuit area 322 of the substrate 31; a second circuit board 333 is disposed on the reference electrode area 323 of the insulating substrate 31; a third circuit board 334 is disposed on the opposite electrode area 324 of the insulating substrate 31; A fourth diamond conductive layer 341 is disposed on the fourth circuit board 331 and covers the second working area 321 of the insulating substrate 31. A first diamond conductive layer 342 is disposed on the first circuit board 332 and covers the insulating substrate. a first working area 322 of a 31; a second diamond conductive layer 343 is disposed on the second circuit board 333 and covers the reference electrode area 323 of the insulating substrate 31; a third diamond conductive layer 344 is disposed on the third line The plate 334 covers the counter electrode region 3 of the insulating substrate 31 twenty four.

實施例4-製備具有四個氮摻雜鑽石電極之手術裝置Example 4 - Preparation of a surgical device having four nitrogen-doped diamond electrodes

本實施例之多功能手術裝置之結構及製作方法係與實施例3相似,除了第一鑽石導電層、第四鑽石導電層、第二鑽石導電層、及第三鑽石導電層均為氮摻雜鑽石膜。本實施例之氮摻雜鑽石膜之製程,則與實施例2所述相似。The structure and manufacturing method of the multifunctional surgical device of the present embodiment is similar to that of Embodiment 3 except that the first diamond conductive layer, the fourth diamond conductive layer, the second diamond conductive layer, and the third diamond conductive layer are all nitrogen doped. Diamond film. The process of the nitrogen-doped diamond film of this embodiment is similar to that described in Example 2.

實施例5-具有四個氮摻雜鑽石電極之手術裝置之手術系統Example 5 - Surgical System of Surgical Device with Four Nitrogen Doped Diamond Electrodes

如圖4所示,本實施例之多功能手術系統,係包括:如實施例4所示之多功能手術裝置3、一開關裝置2、一電壓供應單元21、一電流偵測單元22、一電源供應裝置23、一訊號處理裝置24、及一電壓偵測裝置25。因本實施例之手術裝置3結構與實施例4相同,在此將不再贅述。As shown in FIG. 4, the multifunctional surgical system of the present embodiment includes: a multifunctional surgical device 3 as shown in Embodiment 4, a switching device 2, a voltage supply unit 21, a current detecting unit 22, and a The power supply device 23, a signal processing device 24, and a voltage detecting device 25. The structure of the surgical device 3 of the present embodiment is the same as that of the embodiment 4, and will not be described herein.

其中,手術裝置1係與開關裝置2連接,電壓供應單元21、電流偵測單元22、電源供應裝置23、訊號處理裝置24、及電壓偵測裝置25亦與開關裝置2連接。透過開關裝置2之任意切換,可使手術裝置1之各電極區域(包括第一線路板131、第二線路板132、及第三線路板133)與電壓供應單元21、電流偵測單元22、電源供應裝置23、訊號處理裝置24、及電壓偵測裝置25電性連接。The surgical device 1 is connected to the switch device 2, and the voltage supply unit 21, the current detecting unit 22, the power supply device 23, the signal processing device 24, and the voltage detecting device 25 are also connected to the switching device 2. Through the arbitrary switching of the switching device 2, each electrode region of the surgical device 1 (including the first circuit board 131, the second circuit board 132, and the third circuit board 133) and the voltage supply unit 21, the current detecting unit 22, The power supply device 23, the signal processing device 24, and the voltage detecting device 25 are electrically connected.

請同時參閱圖3(D)及圖4,透過開關裝置2之切換,使手術裝置3之第四線路板331與電源供應裝置23電性連接,透過電源供應裝置223提供一射頻能量以進行電燒手術治療。或者,可透過開關裝置2之切換,使手術裝置3之第四線路板331與電壓偵測裝置25電性連接,以偵測心臟之電壓訊號。再者,可透過開關裝置2之切換,可使第一線路板332及第二線路板333與電壓供應單元21連接,並使第一線路板332及第三線路板334與電流偵測單元22電性連接,以偵測生理環境之電化學訊號。Referring to FIG. 3(D) and FIG. 4, the fourth circuit board 331 of the surgical device 3 is electrically connected to the power supply device 23 through the switching of the switching device 2, and an RF energy is supplied through the power supply device 223 for power supply. Surgical treatment. Alternatively, the fourth circuit board 331 of the surgical device 3 can be electrically connected to the voltage detecting device 25 to detect the voltage signal of the heart through the switching of the switching device 2. Furthermore, the first circuit board 332 and the second circuit board 333 can be connected to the voltage supply unit 21 through the switching of the switching device 2, and the first circuit board 332 and the third circuit board 334 and the current detecting unit 22 can be connected. Electrically connected to detect electrochemical signals in the physiological environment.

上述實施例僅係為了方便說明而舉例而已,本發明所主張之權利範圍自應以申請專利範圍所述為準,而非僅限於上述實施例。The above-mentioned embodiments are merely examples for convenience of description, and the scope of the claims is intended to be limited to the above embodiments.

1,3...手術裝置1,3. . . Surgical device

11,31...絕緣基板11,31. . . Insulating substrate

12,32...絕緣鑽石膜12,32. . . Insulating diamond film

121,322...第一工作區域121,322. . . First work area

122,323...參考電極區域122,323. . . Reference electrode area

123,324...對電極區域123,324. . . Counter electrode area

131,332...第一線路板131,332. . . First circuit board

132,333...第二線路板132,333. . . Second circuit board

133,334...第三線路板133,334. . . Third circuit board

141,342...第一鑽石導電層141,342. . . First diamond conductive layer

142,343...第二鑽石導電層142,343. . . Second diamond conductive layer

143,344...第三鑽石導電層143,344. . . Third diamond conductive layer

2...開關裝置2. . . Switching device

21...電壓供應單元twenty one. . . Voltage supply unit

22...電流偵測單元twenty two. . . Current detection unit

23...電源供應裝置twenty three. . . Power supply unit

24...訊號處理裝置twenty four. . . Signal processing device

25...電壓偵測裝置25. . . Voltage detecting device

321...第二工作區域321. . . Second work area

331...第四線路板331. . . Fourth circuit board

341...第四鑽石導電層341. . . Fourth diamond conductive layer

圖1係本發明實施例1之多功能手術裝置製作流程示意圖。1 is a schematic view showing a manufacturing process of a multifunctional surgical device according to Embodiment 1 of the present invention.

圖2係本發明實施例3之多功能手術系統之示意圖。2 is a schematic view of a multifunctional surgical system according to Embodiment 3 of the present invention.

圖3係本發明實施例4之多功能手術裝置製作流程示意圖。3 is a schematic view showing the manufacturing process of the multifunctional surgical device according to Embodiment 4 of the present invention.

圖4係本發明實施例6之多功能手術系統之示意圖。Figure 4 is a schematic illustration of a multifunctional surgical system in accordance with a sixth embodiment of the present invention.

1...手術裝置1. . . Surgical device

131...第一線路板131. . . First circuit board

132...第二線路板132. . . Second circuit board

133...第三線路板133. . . Third circuit board

2...開關裝置2. . . Switching device

21...電壓供應單元twenty one. . . Voltage supply unit

22...電流偵測單元twenty two. . . Current detection unit

23...電源供應裝置twenty three. . . Power supply unit

24...訊號處理裝置twenty four. . . Signal processing device

Claims (18)

一種多功能手術裝置,包括:一絕緣基板,其中該絕緣基板之一表面係設有一第一工作區域、一參考電極區域、及一對電極區域;一第一線路板,係設於該絕緣基板之該第一工作區域上;一第二線路板,係設於該絕緣基板之該參考電極區域上;一第三線路板,係設於該絕緣基板之該對電極區域上;一第一鑽石導電層,係覆蓋於該第一線路板上且覆蓋該絕緣基板之該第一工作區域;一第二鑽石導電層,係覆蓋於該第二線路板上且覆蓋該絕緣基板之該參考電極區域;以及一第三鑽石導電層,係覆蓋於該第三線路板上且覆蓋該絕緣基板之該對電極區域。 A multi-functional surgical device includes: an insulating substrate, wherein a surface of the insulating substrate is provided with a first working area, a reference electrode area, and a pair of electrode areas; and a first circuit board is disposed on the insulating substrate a first circuit board; a second circuit board disposed on the reference electrode region of the insulating substrate; a third circuit board disposed on the pair of electrode regions of the insulating substrate; a first diamond a conductive layer covering the first circuit board and covering the first working area of the insulating substrate; a second diamond conductive layer covering the second circuit board and covering the reference electrode area of the insulating substrate And a third diamond conductive layer covering the third electrode board and covering the pair of electrode regions of the insulating substrate. 如申請專利範圍第1項所述之手術裝置,更包括一絕緣鑽石膜,其係設於該絕緣基板之該表面上。 The surgical device of claim 1, further comprising an insulating diamond film disposed on the surface of the insulating substrate. 如申請專利範圍第1項所述之手術裝置,其中該第一鑽石導電層、該第二鑽石導電層、及該第三鑽石導電層係分別獨立為一P型鑽石膜、或一N型鑽石膜。 The surgical device of claim 1, wherein the first diamond conductive layer, the second diamond conductive layer, and the third diamond conductive layer are each independently a P-type diamond film or an N-type diamond. membrane. 如申請專利範圍第1項所述之手術裝置,其中該第一鑽石導電層、該第二鑽石導電層、及該第三鑽石導電層係分別獨立為一表面經氫處理之鑽石膜、一硼摻雜鑽石膜、或一氮摻雜鑽石膜。 The surgical device of claim 1, wherein the first diamond conductive layer, the second diamond conductive layer, and the third diamond conductive layer are each independently a hydrogen treated diamond film, a boron Doped with a diamond film, or a nitrogen-doped diamond film. 如申請專利範圍第1項所述之手術裝置,更包括一第二工作區域、一第四線路板、及一第四鑽石導電層,其中該第二工作區域係設於該絕緣基板之該表面,該第四線路板係設於該絕緣基板之該第二工作區域,且該第四鑽石導電層係設於該第四線路板上且覆蓋該絕緣基板之該第二工作區域。 The surgical device of claim 1, further comprising a second working area, a fourth circuit board, and a fourth diamond conductive layer, wherein the second working area is disposed on the surface of the insulating substrate The fourth circuit board is disposed on the second working area of the insulating substrate, and the fourth diamond conductive layer is disposed on the fourth circuit board and covers the second working area of the insulating substrate. 如申請專利範圍第5項所述之手術裝置,其中該第四鑽石導電層係為一P型鑽石膜、或一N型鑽石膜。 The surgical device of claim 5, wherein the fourth diamond conductive layer is a P-type diamond film or an N-type diamond film. 如申請專利範圍第5項所述之手術裝置,其中該第四鑽石導電層係為一表面經氫處理之鑽石膜、一硼摻雜鑽石膜、或一氮摻雜鑽石膜。 The surgical device of claim 5, wherein the fourth diamond conductive layer is a diamond film having a surface treated with hydrogen, a boron-doped diamond film, or a nitrogen-doped diamond film. 一種多功能手術系統,包括:一多功能手術裝置,包括:一絕緣基板,其中該絕緣基板之一表面係設有一第一工作區域、一參考電極區域、及一對電極區域;一第一線路板,係設於該絕緣基板之該第一工作區域上;一第二線路板,係設於該絕緣基板之該參考電極區域上;一第三線路板,係設於該絕緣基板之該對電極區域上;一第一鑽石導電層,係覆蓋於該第一線路板上且覆蓋該絕緣基板之該第一工作區域; 一第二鑽石導電層,係覆蓋於該第二線路板上且覆蓋該絕緣基板之該參考電極區域;以及一第三鑽石導電層,係覆蓋於該第三線路板上且覆蓋該絕緣基板之該對電極區域;一開關裝置,其中該手術裝置之該第一線路板、該第二線路板、及該第三線路板係連接至該開關裝置;一電壓供應單元,係連接至該開關裝置;一電流偵測單元,係連接至該開關裝置;以及一電源供應裝置,係連接至該開關裝置。 A multifunctional surgical system comprising: a multifunctional surgical device comprising: an insulating substrate, wherein a surface of the insulating substrate is provided with a first working area, a reference electrode area, and a pair of electrode areas; a first line a second circuit board disposed on the reference electrode region of the insulating substrate; a third circuit board disposed on the insulating substrate a first diamond conductive layer covering the first circuit board and covering the first working area of the insulating substrate; a second diamond conductive layer covering the second circuit board and covering the reference electrode region of the insulating substrate; and a third diamond conductive layer covering the third circuit board and covering the insulating substrate a pair of electrode devices; a switching device, wherein the first circuit board, the second circuit board, and the third circuit board of the surgical device are connected to the switching device; a voltage supply unit is connected to the switching device a current detecting unit connected to the switching device; and a power supply device connected to the switching device. 如申請專利範圍第8項所述之手術系統,其中該電源供應裝置係提供一射頻能量至該第一線路板。 The surgical system of claim 8, wherein the power supply device provides a radio frequency energy to the first circuit board. 如申請專利範圍第8項所述之手術系統,其中該手術裝置更包括一絕緣鑽石膜,其係設於該絕緣基板之該表面上。 The surgical system of claim 8, wherein the surgical device further comprises an insulating diamond film attached to the surface of the insulating substrate. 如申請專利範圍第8項所述之手術系統,其中該手術裝置之該第一鑽石導電層、該第二鑽石導電層、及該第三鑽石導電層係分別獨立為一P型鑽石膜、或一N型鑽石膜。 The surgical system of claim 8, wherein the first diamond conductive layer, the second diamond conductive layer, and the third diamond conductive layer are respectively a P-type diamond film, or An N-type diamond film. 如申請專利範圍第8項所述之手術系統,其中該手術裝置之該第一鑽石導電層、該第二鑽石導電層、及該第三鑽石導電層係分別獨立為一表面經氫處理之鑽石膜、一硼摻雜鑽石膜、或一氮摻雜鑽石膜。 The surgical system of claim 8, wherein the first diamond conductive layer, the second diamond conductive layer, and the third diamond conductive layer of the surgical device are each independently a hydrogen-treated diamond A film, a boron-doped diamond film, or a nitrogen-doped diamond film. 如申請專利範圍第8項所述之手術系統,其中該手術裝置更包括一第二工作區域、一第四線路板、及一第四鑽石導電層,其中該第二工作區域係設於該絕緣基板之該 表面,該第四線路板係設於該絕緣基板之該第二工作區域,該第四鑽石導電層係設於該第四線路板上且覆蓋該絕緣基板之該第二工作區域,且該第四線路板係連接至該開關裝置。 The surgical system of claim 8, wherein the surgical device further comprises a second working area, a fourth circuit board, and a fourth diamond conductive layer, wherein the second working area is disposed in the insulation The substrate The fourth circuit board is disposed on the second working area of the insulating substrate, and the fourth diamond conductive layer is disposed on the fourth circuit board and covers the second working area of the insulating substrate, and the A four-circuit board is connected to the switching device. 如申請專利範圍第13項所述之手術系統,其中該第四鑽石導電層係為一P型鑽石膜、或一N型鑽石膜。 The surgical system of claim 13, wherein the fourth diamond conductive layer is a P-type diamond film or an N-type diamond film. 如申請專利範圍第13項所述之手術系統,其中該第四鑽石導電層係為一表面經氫處理之鑽石膜、一硼摻雜鑽石膜、或一氮摻雜鑽石膜。 The surgical system of claim 13, wherein the fourth diamond conductive layer is a hydrogen treated diamond film, a boron doped diamond film, or a nitrogen doped diamond film. 如申請專利範圍第8項所述之手術系統,其中該電壓供應單元係提供一-2V至+2V之電壓。 The surgical system of claim 8, wherein the voltage supply unit provides a voltage of -2V to +2V. 如申請專利範圍第8項所述之手術系統,其中該電壓供應單元係提供一-1至+1V之電壓。 The surgical system of claim 8, wherein the voltage supply unit provides a voltage of -1 to +1V. 如申請專利範圍第8項所述之手術系統,更包括一訊號處理裝置,其係連接至該開關裝置。The surgical system of claim 8 further comprising a signal processing device coupled to the switching device.
TW100138157A 2011-10-20 2011-10-20 Multi-functional surgical device and system comprising the same TWI446889B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100138157A TWI446889B (en) 2011-10-20 2011-10-20 Multi-functional surgical device and system comprising the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100138157A TWI446889B (en) 2011-10-20 2011-10-20 Multi-functional surgical device and system comprising the same

Publications (2)

Publication Number Publication Date
TW201316945A TW201316945A (en) 2013-05-01
TWI446889B true TWI446889B (en) 2014-08-01

Family

ID=48871603

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100138157A TWI446889B (en) 2011-10-20 2011-10-20 Multi-functional surgical device and system comprising the same

Country Status (1)

Country Link
TW (1) TWI446889B (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI302342B (en) * 2002-12-27 2008-10-21 Sumitomo Electric Industries
TW201009331A (en) * 2008-08-29 2010-03-01 Apex Biotechnology Corp Test strip, biochemical test system, and measurement device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI302342B (en) * 2002-12-27 2008-10-21 Sumitomo Electric Industries
TW201009331A (en) * 2008-08-29 2010-03-01 Apex Biotechnology Corp Test strip, biochemical test system, and measurement device

Also Published As

Publication number Publication date
TW201316945A (en) 2013-05-01

Similar Documents

Publication Publication Date Title
US8216219B2 (en) Device for electrosurgically destroying body tissue
JP5219259B2 (en) Capacitive electrosurgical return pad with contact quality monitoring
US8298225B2 (en) System and method for return electrode monitoring
CA2713004C (en) System and method for augmented impedance sensing
JP5237605B2 (en) Smart return electrode pad
JP2011508628A5 (en)
MX2019013898A (en) Combination ultrasonic and electrosurgical instrument having electrically insulating features.
US20110160559A1 (en) Capacitive Medical Electrode
BR0308438B1 (en) Biomedical electrode and method for obtaining and transmitting electrical signals of electrophysiological or electrobiological origin from a patient
ATE472295T1 (en) SURGICAL INSTRUMENT WITH INTEGRATED CAUTERIZATION ELECTRODE
US9949782B2 (en) Method for the control of a medical device as a function of neutral electrode impedance
EA200700344A1 (en) MULTI-ELECTRODE SURGERY INSTRUMENT
US8523853B2 (en) Hybrid contact quality monitoring return electrode
JP2022526075A (en) Methods and systems for monitoring tissue ablation through limited impedance measurements
US20200138503A1 (en) System and method for catheter-based plasma coagulation
JP6175141B2 (en) High frequency surgical equipment
TWI446889B (en) Multi-functional surgical device and system comprising the same
US20220033952A1 (en) Methods For Making Probe Devices And Related Devices
Alsharif et al. Structured 3D Printed Dry ECG Electrodes Using Copper Based Filament
US20160066986A1 (en) Electrosurgical instrument for coagulating or ablating body tissue
TWI432725B (en) Electrochemical sensor and electrochemical sensing device using the same
JP6152082B2 (en) Instrument testing equipment
CN211243674U (en) Plasma scalpel
Deneke et al. Novel technique for atrial fibrillation ablation: use of anatomically designed pulmonary vein ablation catheter
TW202233132A (en) High-frequency treatment device and high-frequency treatment method

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees