TWI438143B - Method for making a nano-scaled optical antenna array - Google Patents

Description

Nano optical antenna array manufacturing method

The present invention relates to a method of fabricating a nano-optical antenna array, and more particularly to a method of fabricating a nano-optical antenna array having a surface plasma effect.

Recently, the surface plasma resonance characteristics of metal nanostructures have been used in the field of nano-optics to achieve control of light intensity and light transmission at the nanometer scale. Another important property of the light field is the polarization state of light, which realizes the regulation of the polarization state of light on the nanometer scale. It has potential significance for single-molecule spectroscopy, ultra-sensitive detection, LED, optical antenna, solar cell and other fields. .

The radio wave antenna converts the radiation field to local oscillations in a so-called feed gap, which is located between the antenna arms and is connected to the wire antenna or waveguide. Conversely, the antenna converts the electromagnetic oscillating energy generated at the gap into radiation.

However, unlike a radio wave antenna, an optical resonant antenna (ORA) can operate efficiently when its total length is half of the wavelength of light, and the feed gap is usually much smaller than the wavelength of light. Researchers at the University of Basel and the Federal University of Technology in Lausanne, Switzerland have produced a nano-scale gold dipole antenna that resonates in the optical band and shows a white super-continuous spectrum at the antenna feed gap (WLSC). The field enhancement effect of the distribution. The antenna nanostructure is used to control the interaction between the positioned sub-wavelength imaging and the single quantum emitter as well as the optical storage.

When the gold dipole antenna is illuminated by a picosecond laser pulse, in addition to the WLSC being generated at the feed gap, there is also a two-photon photoluminescence (TPPL) phenomenon between the antenna arms. For a resonant antenna, the intensity of the solid gold streaks whose emission intensity is the same but not fed into the gap is more than 1000 times higher.

The prior art gold dipole antenna fabrication method mainly has a photolithography method of light or electron beam: first, using a reticle or scanning focused radiation or electron beam, a radiation photoresist composition or a reticle, the above radiation or electron The beam will change the chemical structure of the photoresist in the exposed area; then, the exposed area or the photoresist outside the exposed area is removed by etching to obtain a specific pattern.

Although photo- or electron beam lithography can be used to fabricate nanoscale gold dipole antennas, chemical materials such as complex integrated lithography systems and specially constructed photoresists, as well as high-precision optical alignment requirements The manufacturing cost is high; the entire lithography process is very expensive; the entire manufacturing process takes a long time, that is, the efficiency is low; the high resolution of the nanostructure requires that the lithography technology is difficult to obtain the nanometer structure of the predetermined nanometer scale. The system is limited to the diffraction limit of an integrated lithography system, making it difficult to obtain a large-sized array of nanostructures. Therefore, it is unable to adapt to the requirements of mass production and limit the application of this technology.

In view of the above, it is necessary to provide a method for manufacturing a nano optical antenna array which is simple in process, low in cost, and mass-produced.

A method for fabricating a nano-optical antenna array, comprising the steps of: providing an insulating substrate; performing hydrophilic treatment on the insulating substrate; dispersing the nanospheres in a mixture, wherein the nanospheres in the mixture are diameter-in-diameter a composition of nanospheres having a deviation of 3 nm to 5 nm, wherein the nanospheres in the mixture are formed on the insulating substrate Single-layer nanospheres; vapor-deposited metal film on an insulating substrate formed with single-layer nanospheres to fill a gap between adjacent nanospheres; removal of nanospheres and coating contact with nano The metal film on the microspheres retains a metal film filled in the gap between adjacent nanospheres to form a nano-optical antenna array.

A method for fabricating a nano-optical antenna array, comprising the steps of: providing an insulating substrate; performing hydrophilic treatment on the insulating substrate; dispersing the nanospheres in a mixture, wherein the nanospheres in the mixture are diameter-in-diameter a composition of nanospheres having a deviation of 3 nm to 5 nm, wherein nanospheres in the mixture are disposed on the insulating substrate to form a single layer of nanospheres; and a single layer of nanospheres on the insulating substrate Cutting to increase the gap between the adjacent nanospheres; depositing a metal film on the insulating substrate on which the single layer of nanospheres are formed, so that the metal fills the gap between the adjacent nanospheres; The rice microspheres and the coating are in contact with the metal film on the nanospheres, and the metal film filled in the gap between the adjacent nanospheres is retained to form a nano-optical antenna array.

Compared with the prior art, in the method for fabricating the nano-optical antenna array of the present invention, since a single-layer nanosphere is first formed on the insulating substrate, the metal is filled in the gap of the single-layer nanosphere, and the single layer is removed. A metal nano optical antenna array is formed after the nanospheres. Therefore, the above-described method for fabricating a nano-optical antenna array is simple in process and low in raw material cost compared to the prior art photolithography method using light or electron beam; a large-sized nano-optical antenna array can be manufactured, that is, a large area can be manufactured. The nano optical antenna array is further mass-produced. Further, the above-described method for manufacturing a nano-optical antenna array has less time and high efficiency, and is advantageous for further mass production.

1 is a flow chart of a first embodiment of a method of fabricating a nano-optical antenna array of the present invention.

Figure 2 is a scanning electron micrograph of a single layer of nanospheres arranged in a low energy arrangement on an insulating substrate.

3 is a scanning electron micrograph of a nano optical antenna array manufactured by the method for fabricating a nano optical antenna array according to the first embodiment of the present invention.

Figure 4 is a scanning electron micrograph of a single layer of nanospheres arranged in high energy on an insulating substrate.

5 is a flow chart of a third embodiment of a method of fabricating a nano-optical antenna array of the present invention.

6 is a scanning electron micrograph of a single-layer nanosphere formed by cutting a single-layer nanosphere as shown in FIG. 2.

7 is a scanning electron micrograph of a nano optical antenna array manufactured by a method for fabricating a nano optical antenna array according to a third embodiment of the present invention.

Hereinafter, a method of manufacturing a nano optical antenna according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

Please refer to FIG. 1 , which is a flow chart of a first embodiment of a method for fabricating a nano optical antenna array of the present invention. The manufacturing method of the nano optical antenna array includes the following steps: step S10, providing an insulating substrate; step S11, performing hydrophilic treatment on the insulating substrate; and step S12, forming polymer single-layer nano microspheres on the insulating substrate Step S13, vapor-depositing a metal film on the insulating substrate on which the single-layer nanospheres are formed, so that the metal fills the gap between the adjacent nanospheres; and step S14, removing the nanospheres to form a nano-optical antenna Array.

In step S10, an insulating substrate is provided.

The insulating substrate is made of tantalum, cerium oxide (glass), gallium nitride, polyethylene terephthalate (PET) or polyethylene (PE). The insulating substrate 1cm ² area of less than or equal to 26cm ^2. In this embodiment, the insulating substrate is a glass substrate having an area of 1 cm ² .

In step S11, the insulating substrate is subjected to a hydrophilic treatment.

When the material of the insulating substrate is tantalum or cerium oxide, first, the insulating substrate is cleaned, and the cleaning is performed by a clean process using a standard process. Then, in a solution having a temperature of 30 ° C to 100 ° C and a volume ratio of NH ₃ ‧H ₂ O:H ₂ O ₂ :H ₂ O=1:1:5, a hydrophilic bath is carried out for 30 to 60 minutes for hydrophilic treatment, and then used. Rinse in deionized water for 2~3 times. Finally, a gas stream is provided to dry the insulating substrate, the main component of which is nitrogen (N ₂ ), after which the insulating substrate is immersed in deionized water for use.

Preferably, the solution is subjected to a hydrophilic treatment in a solution having a temperature of 70 ° C to 80 ° C and a volume ratio of NH ₃ ‧H ₂ O:H ₂ O ₂ :H ₂ O=0.6:1:5 for 30 to 60 minutes.

When the material of the insulating substrate is gallium nitride, polyethylene terephthalate or polyethylene, firstly, the insulating substrate is cleaned and cleaned by a clean process using a standard process. Then, the insulating substrate is placed in a microwave plasma system, an inductive power source of the microwave plasma system generates an oxygen plasma, and the oxygen plasma diffuses from the generation region and drifts to the insulating substrate with a lower ion energy. The surface, which in turn improves the hydrophilicity of the insulating substrate. The oxygen plasma system has a power of 10 watts to 150 watts, and the oxygen plasma has a rate of 10 kPa per minute (standard-state cubic centimeter per minute, sccm). The gas pressure is 2 Pa, and oxygen plasma is used. The etching time is from 1 second to 30 seconds, preferably from 5 seconds to 10 seconds. Wherein, when the material of the insulating substrate is polyethylene, the etching time of the oxygen plasma is optimally 5 seconds to 10 seconds. By the above method, the hydrophilicity of the insulating substrate is improved, and the insulating substrate is immersed in pure water for use.

An inductive power source of the microwave plasma system can also produce chlorine plasma. The power of the chlorine plasma system is 50 watts, the access rate of the chlorine plasma is 26 standard milliliters per minute, the gas pressure is 2 to 10 Pa, and the etching time of the chlorine plasma is 3 seconds to 5 seconds. By the above method, the hydrophilicity of the insulating substrate is improved, and the insulating substrate is immersed in pure water for use.

An inductive power source of the microwave plasma system can also produce argon plasma. The power of the argon plasma system is 50 watts, the inlet rate of the argon plasma is 4 standard milliliters per minute, the gas pressure is 2 to 10 Pa, and the argon plasma etching time is 10 seconds to 30 seconds. By the above method, the hydrophilicity of the insulating substrate is improved, and the insulating substrate is immersed in pure water for use.

In step S12, a single layer of nanospheres is formed on the insulating substrate.

Adding 150 mL of pure water, 1-2 wt% of nanospheres 3 to 5 μL, and an equivalent of 2 wt% of sodium dodecyl sulfate solution (SDS) in a 15 mm diameter watch glass to form a mixture. The above mixture was allowed to stand for 30 to 60 minutes. After the nanospheres are sufficiently dispersed in the mixture, 1~3 μL of 4 wt% SDS is added to adjust the surface tension of the nanospheres, which is favorable for forming a single-layer nanosphere array of target alignment. The diameter of the nanospheres may be from 60 nm to 500 nm, and the following specific values are 100 nm, 200 nm, 330 nm or 400 nm, and the diameter deviation is 3 to 5 nm. Preferred nanospheres have a diameter of 200 nm. The nano microspheres are made of polystyrene (PS) or polymethyl methacrylate (PMMA), and other nano microspheres can be selected according to actual needs, such as polymer nanospheres or nanometer micrometers. Ball and so on. The surface dish can also be used with a diameter of 15mm~38mm, and the mixture in the surface dish can also be proportioned according to actual needs.

The hydrophilically treated insulating substrate is slowly tilted along the side wall of the surface dish into the mixture of the watch glass, the insulating substrate having an inclination angle of 9°, and the deviation thereof It is ±0.5°. Then, the insulating substrate was slowly extracted from the mixture of the watch glass, and the above-described sliding down and lifting speeds were almost at a speed of 5 mm/h.

Finally, the insulating substrate of the nanospheres extracted from the mixture is dried to obtain a single-layer nanosphere target array (refer to FIG. 2). In this embodiment, the nanospheres in the single-layer nano microsphere target array are arranged in the lowest energy arrangement, and the single-layer nano microsphere target array is arranged in the most densely arranged, and the duty ratio is the largest. That is, any three adjacent nanospheres in the target array of the single-layer nano microspheres are in an equilateral triangle.

In the above step S12, the indoor stable temperature and humidity are maintained, and the temperature thereof should be maintained at 25 ° C ± 0.5 ° C.

In step S13, a metal film is vapor-deposited on the insulating substrate on which the single-layer nanospheres are formed, so that the metal fills the gap between the adjacent nanospheres.

The electron beam is used to evaporate metal ions on the insulating substrate on which the single-layered nanospheres are formed, and the insulating substrate is formed with a vertically vapor-deposited metal film on the surface of the single-layered nanospheres. Thereby, a metal thin film is formed on the surface of the insulating substrate in the gap between the surface of the nanosphere and the adjacent nanosphere. The thickness of the metal thin film is 20 to 300 nm, and preferably, the thickness of the metal thin film is 50 nm. The metal film may be made of gold, silver, copper, aluminum, iron, cobalt or nickel. The metal film can be replaced by a metal oxide film.

In step S14, the nanospheres are removed to form a nano-optical antenna array.

Referring to FIG. 3, tetrahydrofuran (THF), acetone, methyl ethyl ketone, cyclohexane, n-hexane, methanol or absolute ethanol is used as a stripping agent to dissolve the nanospheres, remove the nanospheres and form the nanospheres. a metal film on the surface that remains on the surface of the insulating substrate The metal film, which in turn forms an array of metal nanostructures of the optical antenna. As described above, any three adjacent nanospheres in the single-layer nano microsphere target array are in an equilateral triangle, so that any three adjacent nanospheres have a triangular-like pattern. Therefore, each metal pattern in the nano-optical metal antenna array is triangular-like.

The manufacturing method of the nano optical antenna array of the second embodiment of the present invention includes the following steps: step S20, providing an insulating substrate; step S21, performing hydrophilic treatment on the insulating substrate; and step S22, forming a polymer sheet on the insulating substrate Layered nanospheres; step S23, vapor-depositing a metal film on the insulating substrate on which the single-layer nanospheres are formed, so that the metal fills the gap between the adjacent nanospheres; and step S24, removing the nanospheres, A nano optical antenna array is formed.

The manufacturing method of the nano optical antenna array of the second embodiment of the present invention is different from the manufacturing method of the nano optical antenna array of the first embodiment of the present invention. Step S21 includes: step S211, performing hydrophilicity on the insulating substrate. Processing; and step S212, further hydrophilizing the insulating substrate. The hydrophilic treatment of the insulating substrate in the step S211 is the same as the hydrophilic treatment of the insulating substrate in the step S11 of the method for manufacturing a nano optical antenna array according to the first embodiment of the present invention. Step S212, the hydrophilic substrate is further hydrophilized in the following manner: the hydrophilically treated insulating substrate is immersed in a 2 wt% sodium lauryl sulfate solution for 2 to 24 hours, so that the insulating substrate is beneficial to the subsequent process. . That is, the insulating substrate after soaking in the SDS is advantageous for the spreading of the subsequent nanospheres.

Step S22, forming polymer monolayer nanospheres on the insulating substrate.

The specific processing manner of the step is the same as that of the step S12 of the method for manufacturing the nano optical antenna array of the first embodiment of the present invention, and details are not described herein again.

Referring to FIG. 4, before the single-layer nanospheres are formed on the insulating substrate, the hydrophilically treated insulating substrate is immersed in a 2 wt% sodium lauryl sulfate solution for 2 to 24 hours, thereby insulating The single-layer nano microsphere target array on the substrate is arranged in a higher energy arrangement, that is, adjacent nanospheres in the single-layer nano microsphere target array are in the vertical axis direction and the horizontal axis direction. All are arranged in a coaxial manner.

In step S23, a metal thin film is vapor-deposited on the insulating substrate on which the single-layer nanospheres are formed, so that the metal fills the gap between the adjacent nanospheres.

The specific processing manner of the step is the same as the specific processing manner of the step S13 of the method for manufacturing the nano optical antenna array of the first embodiment of the present invention, and details are not described herein again.

In step S24, the nanospheres are removed to form a nano-optical antenna array.

Using tetrahydrofuran, acetone, methyl ethyl ketone, cyclohexane, n-hexane, methanol or absolute ethanol as a stripping agent, the nanospheres are dissolved, and the nanospheres and the metal film formed on the surface of the nanospheres are removed, and are retained. A metal film on the surface of the insulating substrate, which in turn forms an array of metal nanostructures of the optical antenna. The adjacent nanospheres in the single-layer nanosphere target array are arranged coaxially in the vertical axis direction and the horizontal axis direction, so that any four adjacent nanospheres have a rhombic pattern. . Therefore, each of the metal patterns in the nano-optical metal antenna array has a diamond shape.

Referring to FIG. 5, a flowchart of a method of fabricating a nano-optical antenna array according to a third embodiment of the present invention. The manufacturing method of the nano optical antenna array includes the following steps: step S30, providing an insulating substrate; step S31, performing hydrophilic treatment on the insulating substrate; and step S32, forming a single layer of nanospheres on the insulating substrate; S33, cutting the single-layer nano microspheres on the insulating substrate to increase the gap between the adjacent nanospheres; and step S34, on the insulating substrate on which the single-layer small-sized nano microspheres are formed The metal film is vapor-deposited so that the metal fills the gap between the adjacent nano-spheres; in step S35, the nano-spheres are removed to form a nano-optical antenna array.

In step S30, an insulating substrate is provided.

The insulating substrate is made of tantalum, cerium oxide (glass), gallium nitride, polyethylene terephthalate (PET) or polyethylene (PE). The insulating substrate 1cm ² area of less than or equal to 26cm ^2. In this embodiment, the insulating substrate is a glass substrate having an area of 1 cm ² .

In step S31, the insulating substrate is subjected to a hydrophilic treatment.

When the material of the insulating substrate is tantalum or cerium oxide, first, the insulating substrate is cleaned, and the cleaning is performed by a clean process using a standard process. Then, in a solution having a temperature of 30 ° C to 100 ° C and a volume ratio of NH ₃ ‧H ₂ O:H ₂ O ₂ :H ₂ O=1:1:5, a hydrophilic bath is carried out for 30 to 60 minutes for hydrophilic treatment, and then used. Rinse in deionized water for 2~3 times. Finally, a gas stream is provided to dry the insulating substrate, the main component of which is nitrogen (N ₂ ), after which the insulating substrate is immersed in deionized water for use.

Preferably, the solution is subjected to a hydrophilic treatment in a solution having a temperature of 70 ° C to 80 ° C and a volume ratio of NH ₃ ‧H ₂ O:H ₂ O ₂ :H ₂ O=1:1:0.6 in a bath for 30 to 60 minutes.

When the material of the insulating substrate is gallium nitride, polyethylene terephthalate or polyethylene, firstly, the insulating substrate is cleaned and cleaned by a clean process using a standard process. Then, the insulating substrate is placed in a microwave plasma system, an inductive power source of the microwave plasma system generates an oxygen plasma, and the oxygen plasma diffuses from the generation region and drifts to the insulating substrate with a lower ion energy. The surface, which in turn improves the hydrophilicity of the insulating substrate. The oxygen plasma system has a power of 10 watts to 150 watts, and the oxygen plasma has a rate of 10 milliliters per minute. The gas pressure is 2 Pa, and the oxygen plasma etching time is 1 second to 30 seconds.

Wherein, when the material of the insulating substrate is polyethylene, the etching time of the oxygen plasma is optimally 5 seconds to 10 seconds. By the above method, the hydrophilicity of the insulating substrate is improved, and the insulating substrate is immersed in pure water for use.

An inductive power source of the microwave plasma system can also produce chlorine plasma. The power of the chlorine plasma system is 50 watts, the access rate of the chlorine plasma is 26 standard milliliters per minute, the gas pressure is 2 to 10 Pa, and the etching time of the chlorine plasma is 3 seconds to 5 seconds. By the above method, the hydrophilicity of the insulating substrate is improved, and the insulating substrate is immersed in pure water for use.

An inductive power source of the microwave plasma system can also produce argon plasma. The power of the argon plasma system is 50 watts, the inlet rate of the argon plasma is 4 standard milliliters per minute, the gas pressure is 2 to 10 Pa, and the argon plasma etching time is 10 seconds to 30 seconds. By the above method, the hydrophilicity of the insulating substrate is improved, and the insulating substrate is immersed in pure water for use.

In step S32, a single layer of nanospheres is formed on the insulating substrate.

Adding 150 mL of pure water, 1-2 wt% of nanospheres 3 to 5 μL, and an equivalent of 2 wt% of sodium dodecyl sulfate solution (SDS) to form a mixture in a 15 mm diameter watch glass. The above mixture was allowed to stand for 30 to 60 minutes. After the nanospheres are sufficiently dispersed in the mixture, 1~3 μL of 4 wt% SDS is added to adjust the surface tension of the nanospheres, which is favorable for forming a single-layer nanosphere array of target alignment. The diameter of the nanospheres may be from 60 nm to 500 nm, and the following specific values are 100 nm, 200 nm, 330 nm or 400 nm, and the diameter deviation is 3 to 5 nm. Preferred nanospheres have a diameter of 200 nm. The nano microspheres are made of polystyrene (PS) or polymethyl methacrylate (PMMA), and other nano microspheres can be selected according to actual needs, such as polymer nanospheres or nanometer micrometers. Ball and so on. According to the actual needs, the watch glass can also be a surface dish with a diameter of 15mm~38mm, and the mixture in the surface dish can also be Proportional modulation for inter-demand.

The hydrophilically treated insulating substrate was slowly tilted and slid into the mixture of the watch glass along the side walls of the watch glass, the insulating substrate having an inclination angle of 9° with a deviation of ±0.5°. Then, the insulating substrate was slowly extracted from the mixture of the watch glass, and the above-described sliding down and lifting speeds were almost at a speed of 5 mm/h.

Finally, the insulating substrate of the nanospheres extracted from the mixture is dried to obtain a single-layer nanosphere target array. In this embodiment, the nanospheres in the single-layer nano microsphere target array are arranged in the lowest energy arrangement, and the single-layer nano microsphere target array is arranged in the most densely arranged, and the duty ratio is the largest. That is, any three adjacent nanospheres in the target array of the single-layer nano microspheres are in an equilateral triangle.

In step S33, the single-layer nano microspheres on the insulating substrate are cut to increase the gap between the adjacent nanospheres.

Referring to FIG. 6, the single-layer nanospheres are cut by plasma etching to increase the gap between the adjacent nanospheres. Specifically, an insulating substrate formed with a single layer of nanospheres is placed in a microwave plasma system, an inductive power source of the microwave plasma system generates an oxygen plasma, and the oxygen plasma is generated from the region with a lower ion energy. Diffusion and drift to the surface of the single-layer nanosphere of the insulating substrate, at which time the single-layer nanosphere is etched by the oxygen plasma to form a smaller diameter nanosphere, ie, a single layer of nano-micro Each nanosphere in the sphere is etched down to a smaller diameter nanosphere, which in turn increases the gap between the adjacent nanospheres. The oxygen plasma system has a power of 10 watts, the oxygen plasma feed rate is 10 standard milliliters per minute, the formed gas pressure is 2 Pa, and the oxygen plasma etching time is 5 seconds to 10 seconds.

Step S34, evaporating metal on an insulating substrate formed with a single layer of small-sized nano microspheres The film causes the metal to fill the gap between adjacent nanospheres.

The metal thin film is vertically vapor-deposited on the surface of the insulating substrate on which the single-layer small-sized nano microspheres are formed on the insulating substrate on which the single-layer small-sized nano microspheres are formed by electron beam evaporation of metal ions. Thus, in the increased gap between the surface of the small-sized nano microspheres and the adjacent small-sized nanospheres, a metal thin film is formed on the surface of the insulating substrate. The thickness of the metal thin film is 20 to 300 nm, and preferably, the thickness of the metal thin film is 50 nm. The metal film may be made of gold, silver, copper, aluminum, iron, cobalt or nickel. The metal film can be replaced by a metal oxide film.

In step S35, the nanospheres are removed to form a nano-optical antenna array.

Referring to Figure 7, tetrahydrofuran, acetone, methyl ethyl ketone, cyclohexane, n-hexane, methanol or absolute ethanol is used as a stripping agent to dissolve the nanospheres, and the nanospheres and the metal formed on the surface of the nanospheres are removed. The film retains a metal film formed on the surface of the insulating substrate to form an array of metal nanostructures of the optical antenna. As described above, any three adjacent nanospheres in the single-layer nano microsphere target array are in an equilateral triangle, and the size of the nanospheres is reduced by cutting, so any three adjacent nanometers Between the microspheres is a larger triangular-like pattern. Therefore, each of the metal patterns in the nano-optical metal antenna array has a triangular-like shape of a larger size, and a gap between any two adjacent triangular-like metal patterns becomes smaller or even becomes no gap. When the metal patterns are joined together without a gap, a circular hole for forming a metal pattern can be used as a nano optical antenna array.

The method for fabricating the nano-optical antenna array provided by the present invention is not limited to the above embodiments, and the step of forming a single-layer nanosphere on the insulating substrate may also be performed by a spin coating method. Before forming the single-layer nano microspheres on the insulating substrate, the hydrophilically treated insulating substrate is immersed in a 2 wt% sodium lauryl sulfate solution for 2 to 24 hours. Spinning 3~5μL of polystyrene on one surface of the insulating substrate soaked in sodium lauryl sulfate solution, the spin coating step is carried out step by step: first, spin coating at a speed of 400 rpm After 5~30 seconds, spin-coat at a speed of 800 rpm for 30 seconds~2 minutes, then finally increase the spin-coating speed to 1400 rpm, spin-coat for 10 seconds, remove the excess microspheres at the edge. A single layer of nanospheres is formed on the insulating substrate. In addition, the method of forming the nano optical antenna array by removing the nano microspheres and the metal thin film formed on the nano microspheres can also be applied to the surface of the metal thin film on the nanospheres by using a tape such as 3M, and gently peeling off. The nanospheres and the metal film formed on the nanospheres form a nano-optical antenna array. In addition, the single-layer nanospheres formed on the insulating substrate are not limited to being spherically distributed, and may be distributed in a quadrangular or hexagonal shape, and the metal pattern in the corresponding nano-optical antenna array is diamond-shaped or quadrangular.

In the method for fabricating a nano optical antenna array provided by the present invention, first, a single layer of nanospheres is formed on an insulating substrate, and then a metal is filled in a gap of the single layer of nanospheres, and the single layer of nanospheres is removed. A metal nano-optical antenna array is then formed. Therefore, the above-described method for fabricating a nano-optical antenna array is simpler in process and lower in raw material cost than the photolithography method using light or electron beam in the prior art, and a nano-optical antenna array having a size of 1 cm ² to 26 cm ² can be manufactured, that is, It is possible to manufacture a large-area nano optical antenna array, thereby achieving mass production. In addition, the manufacturing method of the above-described nano optical antenna array has less time in the whole process, which is advantageous for further mass production.

In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and the claim of the present invention cannot be limited thereby. Equivalent modifications or variations made by those skilled in the art in light of the spirit of the invention are intended to be included in the following claims.

Claims (14)

A method for fabricating a nano-optical antenna array, comprising the steps of: providing an insulating substrate; performing hydrophilic treatment on the insulating substrate; dispersing the nanospheres in a mixture, wherein the nanospheres in the mixture are diameter-in-diameter a composition of nanospheres having a deviation of 3 nm to 5 nm, wherein the nanospheres in the mixture are disposed on the surface of the insulating substrate to form a single layer of nanospheres; and on the insulating substrate on which the single layer of nanospheres are formed The surface is vapor-deposited with a metal film to fill the gap between the adjacent nanospheres; the nanospheres are removed and the metal film coated on the nanospheres is retained, and the film is filled between adjacent nanospheres. A thin metal film in the gap forms a nano-optical antenna array. The method of manufacturing a nano-optical antenna array according to claim 1, wherein the nanospheres have a diameter of 60 nm to 500 nm. The method for producing a nano-optical antenna array according to claim 1, wherein the single-layered nanospheres are formed on the surface of the insulating substrate by a spin coating method. The method for manufacturing a nano-optical antenna array according to claim 3, wherein the single-layer nano-spheres are formed by a spin coating method in three steps: first, spin at a rotational speed of 400 rpm. After applying for 5 seconds to 30 seconds, spin-coat at a speed of 800 rpm for 30 seconds to 2 minutes, then finally increase the spin-coating speed to 1400 rpm, spin-coat for 10 seconds, remove the excess edge. Nanospheres form a single layer of nanospheres on an insulating substrate. The method for fabricating a nano-optical antenna array according to claim 1, wherein when the single-layer nanospheres are formed on the insulating substrate, the following steps are performed: 150 mL is sequentially added to the surface dish having a diameter of 15 mm. Pure water, 1~2wt% of nanospheres 3~5μL, and 2wt% of twelve After the sodium alkyl sulfate solution is formed into a mixture; after the nanospheres are sufficiently dispersed in the mixture, 1 to 3 μL of a 4 wt% sodium lauryl sulfate solution is added; and the hydrophilically treated insulating substrate is tilted The angle is 9 ° ± 0.5 ° slowly into the mixture of the watch glass; the insulating substrate is slowly extracted from the mixture of the watch glass, and the insulating substrate of the nano microspheres extracted in the mixture is dried, and then A single layer of nanospheres is formed. The method of manufacturing a nano-optical antenna array according to claim 5, wherein, when the single-layered nanospheres are formed on the insulating substrate, the indoor temperature is maintained at 25 ° C ± 0.5 ° C. The method for fabricating a nano-optical antenna array according to claim 1, further comprising: before forming the single-layered nanospheres on the insulating substrate, the hydrophilically treated insulating substrate is at 2 wt% of twelve Soak for 2~24h in sodium alkyl sulfate solution. The method of manufacturing a nano-optical antenna array according to claim 1, wherein the metal thin film has a thickness of 20 nm to 300 nm. The method of manufacturing a nano-optical antenna array according to claim 1, wherein the metal thin film has a thickness of 50 nm. The method for producing a nano-optical antenna array according to claim 1, wherein when the nanospheres are removed, tetrahydrofuran, acetone, methyl ethyl ketone, cyclohexane, n-hexane, methanol or absolute ethanol is used as a stripping agent to dissolve the naphthalene. The rice microspheres are removed from the nanospheres and the metal film formed on the nanospheres. The method for manufacturing a nano optical antenna array according to claim 1, wherein when the nanospheres are removed, the surface of the metal film on the nanospheres is taped, and the nanospheres are gently removed and formed. a thin metal film on a nanosphere. The method of manufacturing a nano-optical antenna array according to claim 1, wherein the nanostructure in the nano-optical antenna array has a triangle-like shape, a diamond shape, or a circular hole shape. A method of fabricating a nano optical antenna array, comprising the steps of: providing an insulating substrate; Performing a hydrophilic treatment on the insulating substrate; dispersing the nanospheres in a mixture, wherein the nanospheres in the mixture are composed of nanospheres having a diameter deviation of 3 nm to 5 nm, and the nanoparticles in the mixture are The microspheres are disposed on the surface of the insulating substrate to form a single layer of nanospheres; the single layer of nanospheres on the surface of the insulating substrate are cut to increase the gap between adjacent nanospheres; The surface of the insulating substrate of the single-layer nanospheres is vapor-deposited with a metal film to fill the gap between the adjacent nanospheres; the nanospheres are removed and the metal film coated on the nanospheres is coated to retain the filling A thin film of metal in the gap between adjacent nanospheres forms a nano-optical antenna array. The method of manufacturing a nano-optical antenna array according to claim 13, wherein when the single-layered nanospheres on the surface of the insulating substrate are cut, the film is cut by an oxygen plasma etching method.