TWI436432B - Structure and circuit technique for uniform triggering of multifinger semiconductor devices with tunable trigger voltage - Google Patents

Structure and circuit technique for uniform triggering of multifinger semiconductor devices with tunable trigger voltage Download PDF

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TWI436432B
TWI436432B TW97110502A TW97110502A TWI436432B TW I436432 B TWI436432 B TW I436432B TW 97110502 A TW97110502 A TW 97110502A TW 97110502 A TW97110502 A TW 97110502A TW I436432 B TWI436432 B TW I436432B
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fingers
source
finger
external current
current injection
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TW200901330A (en
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Michel J Abou-Khalil
Gauthier, Jr
Hongmei Li
Junjun Li
Souvick Mitra
Christopher S Putnam
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Ibm
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均勻觸發具可調性觸發電壓之多指狀半導體裝置的結構與電路技術Uniformly triggering the structure and circuit technology of a multi-finger semiconductor device with adjustable trigger voltage 【相關申請案之交互參照】[Reciprocal Reference of Related Applications]

本申請案與2007年3月28日申請、美國專利申請案第11/692,481號之申請案相關,其以引用的方式併入本文中。The present application is related to the application of the U.S. Patent Application Serial No. 11/692,481, the entire disclosure of which is incorporated herein by reference.

本發明係關於半導體電路,尤其關於均勻觸發多指狀半導體裝置的半導體電路及半導體電路所在的設計結構。The present invention relates to a semiconductor circuit, and more particularly to a design structure in which a semiconductor circuit and a semiconductor circuit in which a multi-finger semiconductor device is uniformly triggered.

在典型的CMOS電路中,為了各種用途,利用具有多個指狀物的半導體裝置,並將其分布在晶片的整個面積中。亦可將多指狀半導體裝置視為多個具共用控制組件(諸如電晶體或閘流體的閘極)的並列裝置。一個典型範例是靜電放電(ESD)保護電路,其需要以並聯方式布置而散布於晶片上之MOSFET的多個指狀物。在此情況下,於晶片區域各處遍布多個指狀物不僅有利,且對於晶片任何地方均可能發生的電位靜電放電事件提供最大保護,亦為必要之舉。藉由連接並聯之個別指狀物的源極及汲極,形成大型多指狀閘極接地NMOSFET(GGNMOSFET),使得ESD裝置可以比任何個別指狀物處理更多的靜電荷量。In a typical CMOS circuit, a semiconductor device having a plurality of fingers is utilized and distributed throughout the area of the wafer for various purposes. A multi-finger semiconductor device can also be considered as a plurality of parallel devices having a common control component, such as a gate of a transistor or thyristor. A typical example is an electrostatic discharge (ESD) protection circuit that requires a plurality of fingers of a MOSFET that are arranged in parallel to be spread over a wafer. In this case, it is not only advantageous to have a plurality of fingers throughout the area of the wafer, but it is also necessary to provide maximum protection for potential electrostatic discharge events that may occur anywhere in the wafer. By connecting the source and drain of the individual fingers in parallel, a large multi-finger gate-grounded NMOSFET (GGNMOSFET) is formed, allowing the ESD device to handle more static charge than any individual finger.

在ESD事件中,較佳是多指狀ESD保護MOSFET的所有指狀物均接通以發揮ESD電路最大的電荷處理能力,因為 電路上電壓波尖(voltage spike)大小與多指狀ESD保護MOSFET可以傳送的電流量成反比。然而,ESD保護MOSFET的多個指狀物通常由於多個指狀物間的電路參數差異而不會同時接通。更糟糕的是,指狀物一旦接通,汲極上多指狀MOSFET中所有指狀物所共享的電壓會突然回到較低值,因而阻止其餘指狀物的接通。在此情況下,ESD保護MOSFET可以傳送的電流量受限於那一個已接通之指狀物可以傳送的電流。In an ESD event, it is preferred that all fingers of the multi-finger ESD protection MOSFET are turned on to maximize the charge handling capability of the ESD circuit because The magnitude of the voltage spike on the circuit is inversely proportional to the amount of current that the multi-finger ESD protection MOSFET can deliver. However, multiple fingers of an ESD protection MOSFET are typically not turned on at the same time due to differences in circuit parameters between the plurality of fingers. To make matters worse, once the fingers are turned on, the voltage shared by all the fingers in the multi-finger MOSFET on the drain suddenly drops back to a lower value, thus preventing the remaining fingers from turning on. In this case, the amount of current that the ESD protection MOSFET can deliver is limited by the current that the connected finger can deliver.

圖1顯示其中ESD保護MOSFET電路設有多個分布於晶片區域上之指狀物的半導體晶片。以圓圈圈出ESD保護MOSFET的一個指狀物10,並指出汲極12、閘極14、及源極18。亦於圖1中顯示基板環形接點19或保護環。ESD保護MOSFET中每一指狀物10的源極電接觸基板環形接點19,使ESD保護電路接地。Figure 1 shows a semiconductor wafer in which an ESD protection MOSFET circuit is provided with a plurality of fingers distributed over a wafer area. A finger 10 of the ESD protection MOSFET is circled in a circle, and the drain 12, the gate 14, and the source 18 are indicated. Also shown in Figure 1 is a substrate ring contact 19 or guard ring. The source of each finger 10 in the ESD protection MOSFET electrically contacts the substrate ring contact 19, causing the ESD protection circuit to be grounded.

圖2A顯示包含ESD保護NMOSFET之指狀物20以及I/O墊21的電路。指狀物的閘極連結一起並連接至接地,因而形成閘極接地NMOSFET(GGNMOSFET)組態。指狀物20包含汲極22、閘極24、源極28、寄生npn雙極電晶體、及寄生電阻器27。另外,在指狀物20的本體26及汲極22之間顯示寄生衝擊電離電流源23。2A shows a circuit comprising an ESD protected NMOSFET finger 20 and an I/O pad 21. The gates of the fingers are joined together and connected to ground, thus forming a gate-grounded NMOSFET (GGNMOSFET) configuration. The finger 20 includes a drain 22, a gate 24, a source 28, a parasitic npn bipolar transistor, and a parasitic resistor 27. In addition, a parasitic impact ionization current source 23 is displayed between the body 26 of the finger 20 and the drain 22 .

寄生npn雙極電晶體及寄生電阻器27得自ESD保護 NMOSFET之指狀物20的實體結構。在典型的CMOS電路中,NFET建構於具n型摻雜源極28及n型摻雜汲極22的P基板中。NFET的源極28、本體26、及汲極22因而形成寄生npn雙極電晶體,其中源極28為射極,本體26為基極,汲極22為集極。由於形成源極28及本體26的半導體物質具有有限電阻,因此在每一指狀物的源極28及本體26之間存有寄生電阻。另外,由於源極28與沿晶片區域周圍置放的基板環形接點19連結,因此在源極28及基板環形接點(在圖2A中並未明確顯示)之間存有有限電阻。寄生電阻器27反映上述兩種寄生電阻並具有從本體26到基板環形接點之路徑的電阻值。圖2中的電路因此呈現圖1所示ESD保護NMOSFET電路之實體指狀物10的寄生組件。Parasitic npn bipolar transistor and parasitic resistor 27 are derived from ESD protection The physical structure of the fingers 20 of the NMOSFET. In a typical CMOS circuit, an NFET is built into a P substrate having an n-type doped source 28 and an n-type doped drain 22. The source 28, body 26, and drain 22 of the NFET thus form a parasitic npn bipolar transistor, with source 28 being the emitter, body 26 being the base, and drain 22 being the collector. Since the semiconductor material forming source 28 and body 26 has a finite resistance, parasitic resistance exists between source 28 and body 26 of each finger. In addition, since the source 28 is coupled to the substrate ring contact 19 disposed along the periphery of the wafer region, there is a finite resistance between the source 28 and the substrate ring contact (not explicitly shown in Figure 2A). The parasitic resistor 27 reflects the above two parasitic resistances and has a resistance value from the path of the body 26 to the substrate ring contact. The circuit of Figure 2 thus presents a parasitic component of the physical fingers 10 of the ESD protected NMOSFET circuit shown in Figure 1.

衝擊電離電流源23模擬在NMOSFET之一指狀物的本體26及汲極22間之反向偏壓接面中的寄生衝擊電離電流。這由於汲極22為n型摻雜而本體26為p型摻雜基板而自然發生,同時將正電壓施加於與本體26相關的汲極22,因而形成反向偏壓二極體。可將此電流模型化為汲極對本體電壓的指數函數。The impact ionization current source 23 simulates the parasitic impact ionization current in the reverse bias junction between the body 26 and the drain 22 of one of the NMOSFET fingers. This occurs naturally because the drain 22 is n-doped and the body 26 is a p-type doped substrate, while a positive voltage is applied to the drain 22 associated with the body 26, thereby forming a reverse biased diode. This current can be modeled as an exponential function of the buck-to-body voltage.

審視圖1及2A顯示ESD保護NMOSFET之不同指狀物10間電路參數差異的來源。即使ESD保護NMOSFET之每一指狀物10的非寄生特性相匹配,寄生組件仍有不同。明確地說,寄生電阻器27的電阻,或作「基板電阻」,大多取決於指 狀物的位置,因為此電阻包括在源極28及基板環形接點19之間的電阻。較接近基板環形接點19的指狀物比離基板環形接點較遠的另一指狀物具有較低的寄生電阻。然而,一般需要使用多個指狀物處理ESD事件期間的大量電流。為在ESD事件期間同時接通ESD保護NMOSFET的多個指狀物,觸發電壓,即指狀物20之汲極22接通的最低電壓,必須匹配。Review views 1 and 2A show the source of circuit parameter differences between the different fingers 10 of the ESD protection NMOSFET. Even if the non-parasitic characteristics of each of the fingers 10 of the ESD-protected NMOSFET match, the parasitic components will still differ. Specifically, the resistance of the parasitic resistor 27, or "substrate resistance", mostly depends on the finger The position of the object because this resistance includes the resistance between the source 28 and the substrate ring contact 19. The fingers closer to the substrate annular joint 19 have a lower parasitic resistance than the other fingers that are further from the substrate annular contact. However, it is generally desirable to use multiple fingers to handle large amounts of current during an ESD event. To simultaneously turn on multiple fingers of the ESD protection NMOSFET during an ESD event, the trigger voltage, the lowest voltage at which the drain 22 of the finger 20 is turned on, must match.

一項說明多指狀ESD保護MOSFET之非均勻接通的研究顯示於Lee等人的「高電流應力及HBM ESD事件下之多指狀GGNMOS的動態電流分布(The Dynamic Current Distribution of a Multi-fingered GGNMOS under High Current Stress and HBM ESD Events)」,IEEE 44th IRPS,2006年,第629-630頁。Lee等人觀察到,根據執行於奈秒時間級的測量,在ESD放電的初始瞬時(initial transient)期間,GGNMOSFET中的電流分布是非均勻的。A study illustrating the non-uniform turn-on of multi-finger ESD protection MOSFETs is shown in Lee et al., "Dynamic Current Distribution of a Multi-Fingered High-Temperature Stress and HBM ESD Event" GGNMOS under High Current Stress and HBM ESD Events)", IEEE 44th IRPS, 2006, pp. 629-630. Lee et al. observed that the current distribution in the GGNMOSFET was non-uniform during the initial transient of the ESD discharge, based on measurements performed at the nanosecond time level.

對此問題的第一先前技術解決方案是在ESD保護MOSFET的個別指狀物中增加汲極鎮流電阻(drain ballasting resistance)。但此法需要大面積的半導體基板用於此類汲極鎮流電阻器。此外,增加汲極鎮流電阻器也於電路中增加大的導通電阻,因而實際上降低了ESD保護MOSFET的電流容量,因此需要大的箝制電壓(clamping voltage)。A first prior art solution to this problem is to increase the drain ballasting resistance in the individual fingers of the ESD protection MOSFET. However, this method requires a large area of semiconductor substrate for such a buckle ballast resistor. In addition, the addition of a buckle ballast resistor also adds a large on-resistance to the circuit, thereby actually reducing the current capacity of the ESD protection MOSFET and therefore requiring a large clamping voltage.

第二先前技術解決方案揭示於Duvvury之「ESD保護應 用的基板泵NMOS(Substrate Pump NMOS for ESD Protection Applications)」,Proc.EOS/ESD Symp,2000年,第1A.2.1-11頁,其利用基板泵實現多指狀NMOS ESD電路的均勻觸發電壓。第三先前技術解決方案揭示於Mergens等人之「提高ESD性能及寬度縮放的多指狀接通電路及設計技術(Multi-finger Turn-on Circuits and Design Techniques for Enhanced ESD Performance and Width-Scaling)」,Proc.EOS/ESD Symp,2001年,第1-11頁,其使用domino型NMOS多指狀電晶體,其中以串接組態(cascade configuration)將指狀物的源極連接至鄰接指狀物的閘極。The second prior art solution was revealed in Duvvury's "ESD protection should Substrate Pump NMOS for ESD Protection Applications, Proc. EOS/ESD Symp, 2000, pp. 1A.2.1-11, which uses a substrate pump to achieve a uniform trigger voltage for a multi-finger NMOS ESD circuit. The third prior art solution is disclosed in "Multi-finger Turn-on Circuits and Design Techniques for Enhanced ESD Performance and Width-Scaling" by Mergens et al. Proc. EOS/ESD Symp, 2001, pp. 1-11, which uses a domino-type NMOS multi-finger transistor in which the source of the finger is connected to the abutment finger in a cascade configuration The gate of the object.

當先前技術解決方案傾向於使多個指狀物各處的觸發電壓相等時,其亦傾向於將額外電阻引入電路中。另外,先前技術解決方案所使用的半導體面積相當大。還有,還需要調諧觸發電壓致使電路以預定偏壓接通的能力。While prior art solutions tend to equalize the trigger voltages across multiple fingers, they also tend to introduce additional resistance into the circuit. In addition, the semiconductor area used in prior art solutions is quite large. Also, there is a need to tune the trigger voltage to cause the circuit to turn on at a predetermined bias voltage.

雖然上述討論限於多指狀GGNMOSFET,但也需要控制其他多指狀裝置(諸如通用NMOSFET、通用PMOSFET、及閘流體)的接通,尤其是在此類裝置的多個指狀物散佈在大面積的晶片上時。While the above discussion is limited to multi-finger GGNMOSFETs, it is also necessary to control the turn-on of other multi-finger devices such as general purpose NMOSFETs, general purpose PMOSFETs, and thyristors, especially where multiple fingers of such devices are spread over large areas. On the wafer.

圖2B顯示包括含I/O墊21之PMOSFET之指狀物20B的電路。指狀物20B包含汲極22B、閘極24B、源極28B、本體26B(也是寄生pnp雙極電晶體的基極)、及寄生電阻器27B。 衝擊電離電流源23存在於此電路中的本體26B及汲極22B之間。FIG. 2B shows a circuit including a finger 20B of a PMOSFET including an I/O pad 21. The finger 20B includes a drain 22B, a gate 24B, a source 28B, a body 26B (also the base of a parasitic pnp bipolar transistor), and a parasitic resistor 27B. The impact ionization current source 23 is present between the body 26B and the drain 22B in this circuit.

圖2C顯示包括含I/O墊21之多指狀閘流體之指狀物20C的電路。閘流體具有pnpn半導體結構。在典型的閘流體中,外部p型摻雜區為陽極且連接至正電源,外部n型摻雜區為陰極且連接至負電源,及內部p型摻雜區為閘極且連接至控制輸入。指狀物20C包含陽極22C、閘極26C、陰極28C、及寄生電阻器27C。還有,由於閘流體含有在陽極22C及閘極26C間之反向偏壓PN接面,衝擊電離電流源23C是在指狀物20C之閘極26C及陰極28C間之閘流體的內建組件。閘流體的多個指狀物必須同時接通,以完全利用閘流體的電流容量。本文亦考慮閘極連接至內部n型摻雜區及對應電路變更的替代組態。2C shows an electrical circuit including fingers 20C of a multi-finger thyristor containing I/O pads 21. The thyristor has a pnpn semiconductor structure. In a typical thyristor, the external p-type doped region is the anode and is connected to the positive supply, the external n-type doped region is the cathode and is connected to the negative supply, and the internal p-doped region is the gate and is connected to the control input. . The finger 20C includes an anode 22C, a gate 26C, a cathode 28C, and a parasitic resistor 27C. Also, since the thyristor contains a reverse biased PN junction between the anode 22C and the gate 26C, the impact ionization current source 23C is a built-in component of the thyristor fluid between the gate 26C and the cathode 28C of the finger 20C. . The plurality of fingers of the thyristor must be turned on simultaneously to fully utilize the current capacity of the thyristor. This article also considers alternative configurations where the gate is connected to the internal n-doped region and the corresponding circuit changes.

圖3中,顯示示範性先前技術的ESD保護NMOSFET電路,其中五個指狀物(30A-30E)為並聯連接。此五個指狀物之並聯的一端係連接每一指狀物的汲極,且連接至I/O墊31,I/O墊31則連接至正電源。其另一端係連接每一指狀物的源極,且連接至基板環形接點39,基板環形接點39則接地。In Figure 3, an exemplary prior art ESD protected NMOSFET circuit is shown in which five fingers (30A-30E) are connected in parallel. One end of the parallel connection of the five fingers is connected to the drain of each finger and is connected to the I/O pad 31, and the I/O pad 31 is connected to the positive power source. The other end is connected to the source of each finger and is connected to the substrate ring contact 39, and the substrate ring contact 39 is grounded.

每一指狀物(30A-30E)具有寄生雙極電晶體(其中基極(36A-36E)是每一指狀物的本體)、寄生注入源(33A-33E)、及寄生電阻器(37A-37E)。如果每一指狀物(30A-30E)的設計布局相 同,則每一指狀物(30A-30E)具有實質上相同的寄生注入電流量。然而,由於每一指狀物之本體(36A-36E)及基板環形接點39間之實體電阻路徑中的差異,每一指狀物的寄生電阻器(37A-37E)的電阻值均不同。這因而造成觸發電壓的變動,觸發電壓即每一指狀物將會接通的最低汲極電壓。如上述,遍及指狀物各處的不均勻觸發電壓將產生並非所有指狀物均在ESD事件期間均接通的狀況。Each finger (30A-30E) has a parasitic bipolar transistor (where the base (36A-36E) is the body of each finger), a parasitic implant source (33A-33E), and a parasitic resistor (37A) -37E). If the design layout of each finger (30A-30E) Again, each finger (30A-30E) has substantially the same amount of parasitic injection current. However, due to the difference in the physical resistance path between the body of each finger (36A-36E) and the substrate ring contact 39, the resistance values of the parasitic resistors (37A-37E) of each finger are different. This in turn causes a change in the trigger voltage, which is the lowest drain voltage at which each finger will be turned on. As noted above, uneven trigger voltages throughout the fingers will result in conditions in which not all of the fingers are turned on during an ESD event.

上述問題在半導體裝置上係屬平常,其觸發電壓(接通電壓)取決於裝置的寄生電阻值。除了多指狀ESD保護NMOSFET,一般的多指狀NMOSFET、多指狀PMOSFET、及多指狀閘流體具有取決於其指狀物之寄生電阻的觸發電壓,因此並非所有指狀物在必須接通裝置時均能接通。The above problems are common on semiconductor devices, and the trigger voltage (on voltage) depends on the parasitic resistance of the device. In addition to multi-finger ESD-protected NMOSFETs, typical multi-finger NMOSFETs, multi-finger PMOSFETs, and multi-finger thyristors have trigger voltages that depend on the parasitic resistance of their fingers, so not all fingers must be turned on. It can be turned on when the device is turned on.

因此,需要一種達成均勻接通多指狀半導體裝置、且不用增加電阻成分或電阻成分增加最少的結構及電路技術。Therefore, there is a need for a structure and circuit technique that achieves uniform switching of a multi-finger semiconductor device without increasing the resistance component or the least increase in resistance component.

而且,還需要一種達成均勻接通多指狀半導體裝置、且新增電路組件面積增加最少的結構及電路技術。Moreover, there is a need for a structure and circuit technology that achieves uniform switching of multi-finger semiconductor devices with minimal increase in the area of newly added circuit components.

此外,還需要調諧多指狀半導體裝置之接通電壓(觸發電壓)的結構及電路技術。In addition, there is a need for a structure and circuit technique for tuning the turn-on voltage (trigger voltage) of a multi-finger semiconductor device.

為了因應上述需要,本發明提供一種含有半導體電路的設計結構,其包含有具多個指狀物的半導體裝置,其中多個指狀物為並聯連接;以及連接至該多個指狀物之組件的至少一個外部電流注入源。In order to meet the above needs, the present invention provides a design structure including a semiconductor circuit including a semiconductor device having a plurality of fingers, wherein the plurality of fingers are connected in parallel; and a component connected to the plurality of fingers At least one external current injection source.

在一具體實施例中,該半導體裝置為金氧半導體場效電晶體(MOSFET),而組件為半導體裝置的本體。In one embodiment, the semiconductor device is a metal oxide semiconductor field effect transistor (MOSFET) and the component is a body of the semiconductor device.

在另一具體實施例中,該半導體裝置為半導體閘流體,而組件為該半導體閘流體的閘極。In another embodiment, the semiconductor device is a semiconductor thyristor and the component is a gate of the thyristor fluid.

本發明能夠匹配觸發電壓,觸發電壓即多指狀半導體裝置中各指狀物的最低接通電壓。可將每一指狀物的觸發電壓與另一指狀物的觸發電壓匹配。經由觸發電壓的匹配,多個指狀物中至少有二者具有實質匹配的觸發電壓。較佳是,多個指狀物中具有越多實質匹配的觸發電壓越好。更佳的是,多個指狀物全部具有實質匹配的觸發電壓。The present invention is capable of matching the trigger voltage, which is the lowest turn-on voltage of each finger in a multi-finger semiconductor device. The trigger voltage of each finger can be matched to the trigger voltage of the other finger. At least two of the plurality of fingers have substantially matching trigger voltages via matching of the trigger voltages. Preferably, the more the substantial matching of the plurality of fingers, the better the trigger voltage. More preferably, the plurality of fingers all have a substantially matching trigger voltage.

較佳是,並聯的一端連接至正電源,而並聯的另一端連接至負電源或接地。較佳但並非必要的是,每一指狀物具有完全相同的基本電特性,也就是說,若不考慮多個指狀物中每一指狀物的寄生組件,指狀物均設計成具有相同的臨限電壓。還有,較佳但並非必要的是,多個指狀物中每一指狀物的實體構造完全相同,但指狀物的布置位置及其所布置的實體環境除 外。Preferably, one end of the parallel connection is connected to the positive power supply and the other end of the parallel connection is connected to the negative power supply or ground. Preferably, but not necessarily, each finger has exactly the same basic electrical characteristics, that is, if the parasitic components of each of the plurality of fingers are not considered, the fingers are designed to have The same threshold voltage. Also, preferably, but not necessarily, the physical configuration of each of the plurality of fingers is identical, but the location of the fingers and the physical environment in which they are placed are outer.

根據設計,即使在不考慮寄生組件的情況下,每一指狀物基本的電特性均相同,在實體環境中每一指狀物所採用的寄生組件並非完全相同。通常,造成每一指狀物之電特性差異的最重要寄生組件是寄生電阻。在MOSFET的情況下,此種寄生電阻係由在多個指狀物中每一指狀物的本體及基板環形接點之間的寄生電阻器所造成。在閘流體的情況下,此種寄生電阻係由在多個指狀物中每一指狀物的閘極及基板環形接點之間的寄生電阻器所造成。Depending on the design, the basic electrical characteristics of each finger are the same even without considering the parasitic components, and the parasitic components used for each finger in the physical environment are not identical. In general, the most important parasitic component that causes a difference in the electrical characteristics of each finger is the parasitic resistance. In the case of a MOSFET, such parasitic resistance is caused by a parasitic resistor between the body of each of the plurality of fingers and the annular contact of the substrate. In the case of a thyristor, such parasitic resistance is caused by a parasitic resistor between the gate of each of the plurality of fingers and the annular contact of the substrate.

CMOS電路具有正電源及負電源,或另一選擇是,具有正電源及接地。由於可將接地視為供應零伏特的電源,為了本發明的描述之故,正電源、負電源、及接地之每一者將稱為「電源」。根據本發明,外部電流注入源直接連接至汲極或陽極所連接的電源。在NMOSFET之指狀物的情況下,如圖2A所示,源極28連接至接地,及外部電流注入源(未顯示)直接連接至正電源。在PMOSFET之指狀物的情況下,如圖2B所示,源極28B連接至正電源,及注入源(未顯示)直接連接至接地。在閘流體的情況下,如圖2C所示,陰極28C連接至接地,及注入源(未顯示)直接連接至正電源。The CMOS circuit has a positive supply and a negative supply, or alternatively, has a positive supply and ground. Since the ground can be considered to be a zero volt supply, each of the positive, negative, and ground will be referred to as a "power supply" for the purposes of the present description. According to the invention, the external current injection source is directly connected to the power source to which the drain or anode is connected. In the case of the fingers of the NMOSFET, as shown in FIG. 2A, the source 28 is connected to ground, and an external current injection source (not shown) is directly connected to the positive supply. In the case of a PMOSFET finger, as shown in Figure 2B, source 28B is connected to a positive supply and an injection source (not shown) is directly connected to ground. In the case of a thyristor, as shown in Figure 2C, cathode 28C is connected to ground and an injection source (not shown) is directly connected to the positive supply.

半導體裝置中的寄生電阻,尤其是在多指狀MOSFET之指狀物本體及基板環形接點之間的寄生電阻,或在多指狀閘流 體之指狀物閘極及基板環形接點之間的寄生電阻,在每一個指狀物間都有所變化。極有可能的是,一組合中寄生電阻器的電阻值集合在該集合中具有至少一個不等值。換言之,除非所有寄生電阻值以某種方式在不同的指狀物上正好完全相同(這在統計上很少見),否則一些指狀物具有與一些其他指狀物不同的寄生電阻值。Parasitic resistance in a semiconductor device, especially parasitic resistance between the finger body of the multi-finger MOSFET and the substrate ring contact, or in a multi-finger thyristor The parasitic resistance between the finger gate of the body and the ring contact of the substrate varies from one finger to another. It is highly probable that the set of resistance values of a parasitic resistor in a combination has at least one unequal value in the set. In other words, some fingers have different parasitic resistance values than some other fingers unless all parasitic resistance values are exactly the same on different fingers in some way (which is statistically rare).

在根據本發明的第一情況中,可將外部電流注入源附接於一些指狀物,而不將任何外部電流注入源附接於一些其他指狀物,以匹配指狀物的觸發電壓。在此情況下,沒有外部電流注入源附接於多個指狀物中至少一個。較佳是,多個指狀物中的至少兩個具有實質匹配的觸發電壓。更佳的是,多個指狀物全部具有實質匹配的觸發電壓。In a first case in accordance with the invention, an external current injection source can be attached to some of the fingers without attaching any external current injection source to some of the other fingers to match the trigger voltage of the fingers. In this case, no external current injection source is attached to at least one of the plurality of fingers. Preferably, at least two of the plurality of fingers have substantially matching trigger voltages. More preferably, the plurality of fingers all have a substantially matching trigger voltage.

還有,在多個觸發電壓可以匹配的電路中,電路可在外部電流注入源的至少一個中併入可調性組件,以調變注入電流的量。藉由調變注入電流,可進一步調諧實質匹配的觸發電壓,以使得電路能夠以預定目標觸發電壓接通。Also, in a circuit in which a plurality of trigger voltages can be matched, the circuit can incorporate an tunable component in at least one of the external current injection sources to modulate the amount of injected current. By modulating the injection current, the substantially matched trigger voltage can be further tuned to enable the circuit to turn on at a predetermined target trigger voltage.

在根據本發明的第二情況中(可與或可不與第一情況重疊),可將不同外部電流源附接於不同指狀物,致使不同的外部電流量注入指狀物之間。在此情況下,至少一個外部電流注入源注入與另一外部電流注入源不同的注入電流量。較佳是,多個指狀物中的至少兩個具有實質匹配的觸發電壓。更佳的 是,多個指狀物全部具有實質匹配的觸發電壓。In a second case in accordance with the invention (which may or may not overlap with the first case), different external current sources may be attached to the different fingers such that a different amount of external current is injected between the fingers. In this case, at least one external current injection source injects a different amount of injection current than another external current injection source. Preferably, at least two of the plurality of fingers have substantially matching trigger voltages. Better Yes, all of the fingers have a substantially matching trigger voltage.

還有,在多個觸發電壓可以匹配的電路中,電路可在外部電流注入源的至少一個中併入可調性組件,以調變注入電流的量。藉由調變注入電流,可進一步調諧實質匹配的觸發電壓,以使得電路能夠以預定目標觸發電壓接通。Also, in a circuit in which a plurality of trigger voltages can be matched, the circuit can incorporate an tunable component in at least one of the external current injection sources to modulate the amount of injected current. By modulating the injection current, the substantially matched trigger voltage can be further tuned to enable the circuit to turn on at a predetermined target trigger voltage.

根據本發明,揭示用於匹配遍及多指狀半導體裝置之多個指狀物各處之觸發電壓的特定半導體電路。In accordance with the present invention, a particular semiconductor circuit for matching trigger voltages throughout a plurality of fingers of a multi-finger semiconductor device is disclosed.

在一具體實施例中,該半導體電路包含:具多個指狀物的半導體裝置,其中多個指狀物為並聯連接;及連接至多個指狀物中一者之組件的至少一個二極體堆疊,其中二極體堆疊包含一個二極體或至少兩個二極體的串聯。In a specific embodiment, the semiconductor circuit includes: a semiconductor device having a plurality of fingers, wherein the plurality of fingers are connected in parallel; and at least one diode connected to a component of one of the plurality of fingers Stacking, wherein the diode stack comprises a diode or a series of at least two diodes.

換言之,一個二極體或一組至少兩個串聯的二極體用作上文所揭示的外部電流注入源。該二極體或該組至少兩個二極體連接至電源,而多指狀MOSFET之多個指狀物的源極或閘流體之多個指狀物的陰極並未直接連接至電源。對於多指狀NMOSFET,二極體直接連接至正電源。對於多指狀PMOSFET,二極體直接連接至負電源或接地。對於閘流體,二極體直接連接至正電源。雖然上文所有討論適用於外部電流注入源為二極體或一組至少兩個串聯二極體的情況,但在下一段中明確提出值得注意的要點,以強調上文討論的所有特點仍 然可行。In other words, one diode or a set of at least two diodes in series is used as the external current injection source disclosed above. The diode or the set of at least two diodes is connected to a power source, and the source of the plurality of fingers of the multi-finger MOSFET or the cathode of the plurality of fingers of the thyristor is not directly connected to the power source. For multi-finger NMOSFETs, the diode is directly connected to the positive supply. For multi-finger PMOSFETs, the diodes are connected directly to a negative supply or ground. For thyristor, the diode is directly connected to the positive supply. Although all of the above discussion applies to the case where the external current injection source is a diode or a group of at least two series diodes, the notable points are clearly stated in the next paragraph to emphasize that all the features discussed above are still It is feasible.

具體而言,半導體裝置可以是金氧半導體場效電晶體(MOSFET),在此情況中,組件是半導體裝置的本體;或半導體裝置可以是半導體閘流體,在此情況中,組件是半導體閘流體的閘極。還有,沒有外部電流注入源附接於多個指狀物中至少一個,及/或至少一個外部電流注入源注入與另一外部電流注入源不同的注入電流量。較佳是,多個指狀物中的至少兩個具有實質匹配的觸發電壓。更佳的是,多個指狀物全部具有實質匹配的觸發電壓。電路在至少一個外部電流注入源中可併入可調性組件,以調變注入電流的量。Specifically, the semiconductor device may be a MOS field effect transistor (MOSFET), in which case the component is the body of the semiconductor device; or the semiconductor device may be a semiconductor thyristor, in which case the component is a thyristor fluid The gate. Also, no external current injection source is attached to at least one of the plurality of fingers, and/or at least one external current injection source injects a different amount of injection current than the other external current injection source. Preferably, at least two of the plurality of fingers have substantially matching trigger voltages. More preferably, the plurality of fingers all have a substantially matching trigger voltage. The circuit can incorporate an tunable component in at least one external current injection source to modulate the amount of injection current.

在另一具體實施例中,為了匹配遍及多指狀半導體裝置之多個指狀物各處的觸發電壓,半導體電路包含:一具有多個指狀物的半導體裝置,其中該多個指狀物為並聯連接;至少一個MOSFET,其中該至少一個MOSFET的汲極連接至一電源,及該至少一個MOSFET的源極連接至該多個指狀物中一者之組件的至少一個;及至少一個在該電源及接地間之一電阻器及一電容器的串聯,其中該串聯中的一節點連接至該至少一個MOSFET的閘極。In another embodiment, to match a trigger voltage throughout a plurality of fingers of the multi-finger semiconductor device, the semiconductor circuit includes: a semiconductor device having a plurality of fingers, wherein the plurality of fingers Connected in parallel; at least one MOSFET, wherein a drain of the at least one MOSFET is coupled to a power source, and a source of the at least one MOSFET is coupled to at least one of the components of one of the plurality of fingers; and at least one A resistor and a capacitor are connected in series between the power source and the ground, wherein a node in the series is connected to a gate of the at least one MOSFET.

換言之,RC觸發(電阻器電容器已觸發)MOSFET電路用 作上文揭示的外部電流注入源。RC觸發MOSFET電路可形成於許多不同具體實施例中,其中之一在本文中揭示。根據本文揭示的具體實施例,RC觸發MOSFET的汲極連接至多指狀MOSFET之多個指狀物的汲極或閘流體之多個指狀物的陽極所直接連接的電源。對於多指狀NMOSFET,RC觸發MOSFET的汲極直接連接至正電源。對於多指狀PMOSFET,RC觸發MOSFET的汲極直接連接至負電源或接地。對於閘流體,RC觸發MOSFET的汲極直接連接至正電源。電阻器位在RC觸發MOSFET的閘極及多指狀MOSFET之源極或多指狀閘流體之陰極所連接的電源之間。在一個情況中,電容器的一端直接連接至RC觸發MOSFET的閘極,及另一端直接連接至RC觸發MOSFET之汲極所連接的電源。或者,電容器的一端直接連接至RC觸發MOSFET的閘極,及另一端直接連接至二極體或二極體堆疊,二極體或二極體堆疊則直接連接至RC觸發MOSFET之汲極所連接的電源。雖然上文所有討論適用於外部電流注入源為二極體或一組至少兩個串聯二極體的情況,但在下一段中明確提出值得注意的要點,以強調上文討論的所有特點仍然可行。In other words, RC trigger (resistor capacitor triggered) MOSFET circuit The external current injection source disclosed above is made. The RC trigger MOSFET circuit can be formed in many different embodiments, one of which is disclosed herein. In accordance with a particular embodiment disclosed herein, the drain of the RC-triggered MOSFET is connected to the drain of the plurality of fingers of the multi-finger MOSFET or the power source to which the anodes of the plurality of fingers of the thyristor are directly connected. For multi-finger NMOSFETs, the drain of the RC-triggered MOSFET is directly connected to the positive supply. For multi-finger PMOSFETs, the drain of the RC-triggered MOSFET is directly connected to the negative supply or ground. For thyristor, the drain of the RC-triggered MOSFET is directly connected to the positive supply. The resistor is located between the gate of the RC-triggered MOSFET and the source of the multi-finger MOSFET or the source connected to the cathode of the multi-finger gate fluid. In one case, one end of the capacitor is directly connected to the gate of the RC-triggered MOSFET, and the other end is directly connected to the power supply to which the drain of the RC-trigger MOSFET is connected. Alternatively, one end of the capacitor is directly connected to the gate of the RC-triggered MOSFET, and the other end is directly connected to the diode or diode stack, and the diode or diode stack is directly connected to the drain of the RC-triggered MOSFET. Power supply. While all of the above discussion applies to the case where the external current injection source is a diode or a group of at least two series diodes, the notable points are clearly set forth in the next paragraph to emphasize that all of the features discussed above are still feasible.

具體而言,半導體裝置可以是金氧半導體場效電晶體(MOSFET),在此情況中,組件是半導體裝置的本體;或半導體裝置可以是半導體閘流體,在此情況中,組件是半導體閘流體的閘極。還有,沒有外部電流注入源附接於多個指狀物中至少一個,或至少一個外部電流注入源注入與另一外部電流注入 源不同的注入電流量。較佳是,多個指狀物中的至少兩個具有實質匹配的觸發電壓。更佳的是,多個指狀物全部具有實質匹配的觸發電壓。電路在至少一個外部電流注入源中可併入可調性組件,以調變注入電流的量。Specifically, the semiconductor device may be a MOS field effect transistor (MOSFET), in which case the component is the body of the semiconductor device; or the semiconductor device may be a semiconductor thyristor, in which case the component is a thyristor fluid The gate. Also, no external current injection source is attached to at least one of the plurality of fingers, or at least one external current injection source is injected and another external current is injected. The source has a different amount of injected current. Preferably, at least two of the plurality of fingers have substantially matching trigger voltages. More preferably, the plurality of fingers all have a substantially matching trigger voltage. The circuit can incorporate an tunable component in at least one external current injection source to modulate the amount of injection current.

根據本發明,揭示一種匹配多指狀半導體裝置之多個指狀物的觸發電壓的方法,該方法包含:提供一具有該多指狀半導體裝置的半導體電路;提供至少一個外部電流注入源,其連接至該多個指狀物中一者之一組件;模擬該多個指狀物中每一指狀物之本體的電壓;及調整該至少一個外部電流注入源,以匹配該多個指狀物中一者之觸發電壓與該多個指狀物中另一者之觸發電壓,直到所有觸發電壓匹配為止。According to the present invention, a method of matching a trigger voltage of a plurality of fingers of a multi-finger semiconductor device is disclosed, the method comprising: providing a semiconductor circuit having the multi-finger semiconductor device; providing at least one external current injection source Connecting to one of the plurality of fingers; simulating a voltage of a body of each of the plurality of fingers; and adjusting the at least one external current injection source to match the plurality of fingers The trigger voltage of one of the plurality of fingers and the trigger voltage of the other of the plurality of fingers until all of the trigger voltages match.

此外,根據本發明,揭示一種調諧多指狀半導體裝置之多個指狀物的觸發電壓的方法,該方法包含:提供至少一個外部電流注入源,其連接至該多個指狀物中一者之本體;提供一目標觸發電壓;模擬該多個指狀物中每一指狀物之本體的電壓;及調整該至少一個外部電流注入源,以匹配各多個指狀物的觸發電壓與目標觸發電壓。Moreover, in accordance with the present invention, a method of tuning a trigger voltage of a plurality of fingers of a multi-finger semiconductor device is disclosed, the method comprising: providing at least one external current injection source coupled to one of the plurality of fingers a body; providing a target trigger voltage; simulating a voltage of a body of each of the plurality of fingers; and adjusting the at least one external current injection source to match a trigger voltage and a target of each of the plurality of fingers Trigger voltage.

在匹配觸發電壓及調諧觸發電壓的兩個方法中,設計外部電流注入源包括設計連接至該多個指狀物中一者之組件的至少一個二極體堆疊,其中二極體堆疊包含一個二極體或至少兩個二極體的串聯。In two methods of matching the trigger voltage and tuning the trigger voltage, designing the external current injection source includes designing at least one diode stack connected to one of the plurality of fingers, wherein the diode stack includes one A series connection of a polar body or at least two diodes.

在匹配觸發電壓及調諧觸發電壓的兩個方法中,設計外部電流注入源或者可包括:提供至少一個RC觸發MOSFET,其中該至少一個MOSFET的汲極連接至一電源,及該至少一個RC觸發MOSFET的源極連接至該多個指狀物中一者之至少一個組件;及提供至少一個在該電源及接地間之一電阻器及一電容器的串聯,其中該串聯中的一節點連接至該至少一個RC觸發MOSFET的閘極。In the two methods of matching the trigger voltage and tuning the trigger voltage, designing the external current injection source may further include: providing at least one RC trigger MOSFET, wherein the drain of the at least one MOSFET is connected to a power source, and the at least one RC trigger MOSFET a source connected to at least one component of one of the plurality of fingers; and a series connection of at least one resistor and a capacitor between the power source and the ground, wherein a node of the series is connected to the at least The gate of an RC-triggered MOSFET.

應明白,對於匹配觸發電壓的方法及調諧觸發電壓的方法,可利用根據本發明之具有外部電流注入源之半導體電路的所有結構面向。尤其,半導體裝置可以是金氧半導體場效電晶體(MOSFET),在此情況中,組件是半導體裝置的本體;或半導體裝置可以是半導體閘流體,在此情況中,組件是半導體閘流體的閘極。還有,沒有外部電流注入源附接於多個指狀物中至少一個,或至少一個外部電流注入源注入與另一外部電流注入源不同的注入電流量。較佳是,多個指狀物中的至少兩個具有實質匹配的觸發電壓。更佳的是,多個指狀物全部具有實質 匹配的觸發電壓。電路在至少一個外部電流注入源中可併入可調性組件,以調變注入電流的量。It should be understood that for the method of matching the trigger voltage and the method of tuning the trigger voltage, all structural aspects of the semiconductor circuit having the external current injection source according to the present invention can be utilized. In particular, the semiconductor device may be a MOS field effect transistor (MOSFET), in which case the component is the body of the semiconductor device; or the semiconductor device may be a semiconductor thyristor, in which case the component is a gate of the thyristor fluid pole. Also, no external current injection source is attached to at least one of the plurality of fingers, or at least one external current injection source injects a different amount of injection current than the other external current injection source. Preferably, at least two of the plurality of fingers have substantially matching trigger voltages. More preferably, all of the fingers have substantial Matching trigger voltage. The circuit can incorporate an tunable component in at least one external current injection source to modulate the amount of injection current.

根據本發明之一方面,提供一種體現於機器可讀媒體以設計、製造、或測試設計的設計結構。該設計結構包含:第一資料,代表一具有多個指狀物之半導體裝置,其中該多個指狀物為並聯連接;及第二資料,代表連接至該多個指狀物之一組件之至少一個外部電流注入源。According to one aspect of the invention, a design structure embodied in a machine readable medium for designing, manufacturing, or testing a design is provided. The design structure includes: a first material representing a semiconductor device having a plurality of fingers, wherein the plurality of fingers are connected in parallel; and a second material representing a component connected to one of the plurality of fingers At least one external current injection source.

在一具體實施例中,該半導體裝置為金氧半導體場效電晶體(MOSFET),及組件為半導體裝置的本體。In one embodiment, the semiconductor device is a metal oxide semiconductor field effect transistor (MOSFET) and the component is a body of the semiconductor device.

在另一具體實施例中,該半導體裝置為半導體閘流體,及組件為該半導體閘流體的閘極。In another embodiment, the semiconductor device is a semiconductor thyristor and the component is a gate of the thyristor fluid.

在又另一具體實施例中,並聯之第一端連接至第一電源,及並聯之第二端連接至第二電源。In yet another embodiment, the first end of the parallel connection is coupled to the first power source and the second end of the parallel connection is coupled to the second power source.

在又另一具體實施例中,設計結構進一步包含在各多個指狀物之組件及基板環形接點之間的寄生電阻器。In yet another embodiment, the design structure further includes a parasitic resistor between the components of each of the plurality of fingers and the annular contact of the substrate.

在進一步具體實施例中,至少一個外部電流注入源包含連接至多個指狀物中一者之本體的至少一個二極體堆疊,其中該 至少一個二極體堆疊包含一個二極體或至少兩個二極體之一串聯。In a further embodiment, the at least one external current injection source comprises at least one diode stack connected to a body of one of the plurality of fingers, wherein the The at least one diode stack comprises one diode or one of at least two diodes connected in series.

在又進一步具體實施例中,至少一個外部電流注入源包含:至少一個MOSFET,其中該至少一個MOSFET的汲極連接至一電源,及該至少一個MOSFET的源極連接至該多個指狀物中一者之組件的至少一個;及至少一個在該電源及接地間之一電阻器及一電容器的串聯,其中該串聯中的一節點連接至該至少一個MOSFET的閘極。In still further embodiments, the at least one external current injection source includes: at least one MOSFET, wherein a drain of the at least one MOSFET is coupled to a power source, and a source of the at least one MOSFET is coupled to the plurality of fingers At least one of the components; and at least one resistor in series between the power source and the ground and a capacitor, wherein a node of the series is coupled to the gate of the at least one MOSFET.

在又進一步具體實施例中,該多個指狀物全部具有實質匹配的觸發電壓。In still further embodiments, the plurality of fingers all have a substantially matching trigger voltage.

雖然本發明找出上述具體實施例中直接且最需要的應用,但一般技術者顯然可就其所知加以變化。While the present invention finds the application that is directly and most desirable in the specific embodiments described above, it will be apparent to those skilled in the art

本文以附圖來詳細說明本發明。雖然本發明以特定範例來說明,諸如5個指狀閘極接地NMOSFET(GGNMOSFET)及多指狀NMOSFET的4x30陣列指狀物組態,但這些只是本發明實施例的特定示範性例子,一般技術者可輕易地將本發明概括通用多指狀NMOSFET、通用多指狀PMOSFET、及具有任意 多個指狀物組態的多指狀閘流體。The invention will now be described in detail by means of the drawings. Although the invention is illustrated by way of specific examples, such as 5 finger gated NMOSFETs (GGNMOSFETs) and 4x30 array finger configurations of multi-finger NMOSFETs, these are merely specific illustrative examples of embodiments of the invention, general techniques The invention can be easily summarized as a general-purpose multi-finger NMOSFET, a general-purpose multi-finger PMOSFET, and have any Multi-finger thyristor configured with multiple fingers.

圖4顯示根據本發明的多指狀NMOSFET ESD保護電路。圖4的電路也具有五個指狀物(40A-40E),其每一個含有寄生雙極電晶體(其中基極(46A-46E)是每一指狀物的本體)、寄生注入源(43A-43E)、及寄生電阻器(47A-47E)。I/O墊41及基板環形接點49與圖3中的完全相同。如果每一指狀物(40A-40E)的設計布局相同,則每一指狀物(40A-40E)具有實質相同的寄生注入電流量。如上述,多指狀半導體裝置之指狀物(40A-40E)的布置差異將造成寄生電阻器(47A-47E)的電阻差異。Figure 4 shows a multi-finger NMOSFET ESD protection circuit in accordance with the present invention. The circuit of Figure 4 also has five fingers (40A-40E), each of which contains a parasitic bipolar transistor (where the base (46A-46E) is the body of each finger), a parasitic source (43A) -43E), and parasitic resistors (47A-47E). The I/O pad 41 and the substrate ring contact 49 are identical to those in FIG. If the design layout of each of the fingers (40A-40E) is the same, each finger (40A-40E) has substantially the same amount of parasitic injection current. As described above, the difference in arrangement of the fingers (40A-40E) of the multi-finger semiconductor device will cause a difference in resistance of the parasitic resistors (47A-47E).

根據本發明,部分指狀物(40A、40B、40D、及40E)在多指狀NMOSFET之指狀物的本體及連接至正電源的I/O墊之間具有外部電流注入源(45A、45B、45D、及45E)。外部電流注入源(45A、45B、45D、及45E)將恆定的注入電流位準供應至多指狀NMOSFET之每一指狀物的本體(46A、46B、46D、及46E)。According to the present invention, some of the fingers (40A, 40B, 40D, and 40E) have an external current injection source (45A, 45B) between the body of the fingers of the multi-finger NMOSFET and the I/O pad connected to the positive power supply. , 45D, and 45E). External current injection sources (45A, 45B, 45D, and 45E) supply a constant injection current level to the body (46A, 46B, 46D, and 46E) of each finger of the multi-finger NMOSFET.

一般而言,如果半導體裝置是多指狀MOSFET,則寄生電阻器位在多指狀MOSFET之指狀物的本體及基板環形接點之間。如果半導體裝置是多指狀閘流體,則寄生電阻器位在多指狀閘流體之指狀物的閘極及基板環形接點之間。除了多指狀半導體裝置中僅涉及極少數指狀物的有限情況,多指狀半導體裝置中一組合中寄生電阻器的電阻值集合由於每一指狀物的 布置及環境中有許多變動,因此在該集合內具有至少一個不等值。In general, if the semiconductor device is a multi-finger MOSFET, the parasitic resistor is located between the body of the fingers of the multi-finger MOSFET and the substrate ring contact. If the semiconductor device is a multi-finger thyristor, the parasitic resistor is located between the gate of the finger of the multi-finger thyristor and the substrate ring contact. In addition to the limited case where only a very small number of fingers are involved in a multi-finger semiconductor device, the resistance value set of a parasitic resistor in a combination in a multi-finger semiconductor device is due to each finger There are many variations in the layout and environment, so there is at least one unequal value within the collection.

尤其,在非ESD應用之多指狀NMOSFET的情況下,外部電流注入源連接於多指狀NMOSFET之指狀物的本體(body)及正電源之間,並將恆定電流供應至指狀物的基極(base)。在PMOSFET的情況下,外部電流注入源連接於多指狀NMOSFET之指狀物的本體及接地之間,並將出自指狀物之基極的恆定電流供應至接地。在閘流體的情況下,外部電流注入源連接於多指狀閘流體之指狀物的閘極及正電源之間,並將恆定電流供應至指狀物的基極。外部電流注入源連接於MOSFET的本體及汲極之間,或者是連接於閘流體的閘極及陽極之間。In particular, in the case of a multi-finger NMOSFET for non-ESD applications, an external current injection source is connected between the body of the fingers of the multi-finger NMOSFET and the positive power source, and supplies a constant current to the fingers. Base. In the case of a PMOSFET, an external current injection source is connected between the body of the fingers of the multi-finger NMOSFET and ground, and supplies a constant current from the base of the finger to ground. In the case of a thyristor, an external current injection source is connected between the gate of the finger of the multi-finger thyristor and the positive power source and supplies a constant current to the base of the finger. The external current injection source is connected between the body and the drain of the MOSFET or between the gate and the anode of the thyristor.

由於多指狀NMOSFET之每一指狀物的汲極直接連接至正電源,外部電流注入源直接連接至正電源(由於I/O墊具有極微小的阻抗,將透過I/O墊41的連接視為「直接連接」)。在PMOSFET的情況下,由於多指狀PMOSFET之每一指狀物的汲極直接連接至負電源(包括接地的情況,見上文),外部電流注入源亦直接連接至負電源。在閘流體的情況下,由於外部電流注入源連接至多指狀閘流體之指狀物的陽極,外部電流供應直接連接至正電源。在上述所有情況中,外部電流注入源直接連接至指狀物之源極或陰極未連接至的電源。Since the drain of each finger of the multi-finger NMOSFET is directly connected to the positive supply, the external current injection source is directly connected to the positive supply (since the I/O pad has a very small impedance, the connection will pass through the I/O pad 41) Treated as "direct connection"). In the case of a PMOSFET, since the drain of each finger of the multi-finger PMOSFET is directly connected to the negative supply (including the case of grounding, see above), the external current injection source is also directly connected to the negative supply. In the case of a thyristor, since the external current injection source is connected to the anode of the finger of the multi-finger thyristor, the external current supply is directly connected to the positive power source. In all of the above cases, the external current injection source is directly connected to the source to which the source of the finger or the cathode is not connected.

根據本發明,將補償由於寄生電阻器(47A-47E)的電阻變 動所造成的效應,以使半導體裝置的每一指狀物(40A-40E)具備均勻的觸發電壓。補償的量取決於寄生電阻的值,以針對汲極(42A-42E)的特定電壓,而多個指狀物各處,將多指狀半導體裝置中每一指狀物之本體(46A-46E)的電壓維持實質相同。例如,如果特定指狀物的寄生電阻很高,則附接於該特定指狀物的外部電流注入源提供較少外部電流或不提供任何外部電流。如果另一指狀物的寄生電阻很低,則附接於該特定指狀物的外部電流注入源提供更多外部電流。According to the present invention, the resistance due to the parasitic resistor (47A-47E) will be compensated. The effect of the action is such that each finger (40A-40E) of the semiconductor device has a uniform trigger voltage. The amount of compensation depends on the value of the parasitic resistance, for a specific voltage of the drain (42A-42E), and the multiple fingers, the body of each finger in the multi-finger semiconductor device (46A-46E) The voltage remains essentially the same. For example, if the parasitic resistance of a particular finger is high, the external current injection source attached to that particular finger provides less external current or no external current. If the parasitic resistance of the other finger is low, the external current injection source attached to the particular finger provides more external current.

在圖4所示本發明的示範性電路中,其中的一個指狀物40C並沒有外部電流注入源附接於該指狀物。在此範例中,附接於中間指狀物40C的寄生電阻器47C具有最高電阻。如果外部電流注入源不供應額外的注入電流,則中間指狀物40C具有指狀物(40A-40E)中的最低觸發電壓。在如圖4所示具5個指狀物的特定組態中,將調整供應至其他指狀物的外部注入電流量,以匹配中間指狀物40C中所出現的最低觸發電壓。In the exemplary circuit of the present invention shown in FIG. 4, one of the fingers 40C is not attached to the finger by an external current injection source. In this example, the parasitic resistor 47C attached to the intermediate finger 40C has the highest resistance. If the external current injection source does not supply additional injection current, the intermediate finger 40C has the lowest trigger voltage in the fingers (40A-40E). In a particular configuration with five fingers as shown in Figure 4, the amount of external injection current supplied to the other fingers will be adjusted to match the lowest trigger voltage present in the intermediate fingers 40C.

雖然圖4中的電路僅顯示指狀物40C沒有外部電流注入源,但本發明允許對圖4中的電路作出概括延伸,使得沒有外部電流注入源附接於ESD保護電路中多指狀NMOSFET之多個指狀物中至少一個。此外,本發明允許進一步的概括延伸,致使沒有外部電流注入源附接於諸如多指狀NMOSFET、多指狀PMOSFET、及多指狀閘流體之多指狀半導體裝置其多個指狀物中至少一個。Although the circuit in FIG. 4 only shows that the finger 40C has no external current injection source, the present invention allows for a general extension of the circuit of FIG. 4 such that no external current injection source is attached to the multi-finger NMOSFET in the ESD protection circuit. At least one of the plurality of fingers. Furthermore, the present invention allows for a further generalization extension such that no external current injection source is attached to at least one of a plurality of fingers of a multi-finger semiconductor device such as a multi-finger NMOSFET, a multi-finger PMOSFET, and a multi-finger thyristor. One.

此外,本發明不一定要求至少一個指狀物沒有外部電流注入源。多指狀半導體裝置的所有指狀物可具有附接於每一指狀物的外部電流注入源,或僅部分指狀物可具有附接於其的外部電流注入源。根據本發明,至少一個外部電流注入源可注入與另一外部電流注入源不同的注入電流量。藉由改變供應至不同指狀物的注入電流量,可在不同的指狀物之間匹配指狀物接通的觸發電壓。Moreover, the present invention does not necessarily require that at least one of the fingers has no external current injection source. All of the fingers of the multi-finger semiconductor device may have an external current injection source attached to each finger, or only a portion of the fingers may have an external current injection source attached thereto. According to the present invention, at least one external current injection source can inject a different amount of injection current than another external current injection source. By varying the amount of injection current supplied to the different fingers, the trigger voltage at which the fingers are turned on can be matched between the different fingers.

以另一觀點來看,本發明在局部汲取電流至形成每一指狀物之本體(46A-46E)的基板,致使觸發電壓於指狀物各處均匹配。Viewed from another point of view, the present invention locally draws current to the substrate forming the body (46A-46E) of each finger such that the trigger voltage is matched throughout the fingers.

根據本發明,多指狀NMOSFET ESD保護電路中多個指狀物中的至少兩個具有實質匹配而使指狀物接通的觸發電壓。一般而言,根據本發明,多指狀半導體裝置中多個指狀物中的至少兩個具有實質匹配而使指狀物接通的觸發電壓。更佳的是,根據本發明,多指狀半導體裝置中所有多個指狀物中具有實質匹配而使指狀物接通的觸發電壓。In accordance with the present invention, at least two of the plurality of fingers in the multi-finger NMOSFET ESD protection circuit have a trigger voltage that substantially matches the finger to turn on. In general, in accordance with the present invention, at least two of the plurality of fingers in the multi-finger semiconductor device have a trigger voltage that substantially matches and turns the fingers on. More preferably, in accordance with the present invention, among all of the plurality of fingers in the multi-finger semiconductor device, there is a trigger voltage that substantially matches the finger to turn on.

此外,根據本發明,可對至少一個外部電流注入源提供調變外部電流量的可調性組件。Moreover, in accordance with the present invention, an adjustable component that provides a modulated external current amount can be provided to at least one external current injection source.

圖5顯示用於120-指狀物NMOSFET ESD保護電路之4x30陣列指狀物的示範性布局。如上述,應明白,其他陣列 組態亦可配合本發明實施。指狀物按標記為列1、列2、列3、及列4的四列配置。每一列具有30個指狀物,其中第一指狀物101在最左邊的位置,及第三十指狀物130在最右邊的位置。為了清楚之故,圖5亦顯示第十一指狀物111及第十二指狀物120。指狀物的實體位置分布是為了於晶片各處提供加強的ESD保護,以避免在未知位置發生ESD事件。在圖5中,在每一指狀物的本體及基板環形接點之間的電阻由於其間物質的有限電阻而不是零。Figure 5 shows an exemplary layout of a 4x30 array finger for a 120-finger NMOSFET ESD protection circuit. As mentioned above, it should be understood that other arrays The configuration can also be implemented in conjunction with the present invention. The fingers are arranged in four columns labeled Column 1, Column 2, Column 3, and Column 4. Each column has 30 fingers with the first finger 101 in the leftmost position and the thirtieth finger 130 in the rightmost position. For the sake of clarity, FIG. 5 also shows the eleventh finger 111 and the twelfth finger 120. The physical location of the fingers is distributed to provide enhanced ESD protection throughout the wafer to avoid ESD events at unknown locations. In Figure 5, the electrical resistance between the body of each finger and the annular contact of the substrate is not zero due to the finite resistance of the substance therebetween.

在圖6中圖解此點,其中針對兩個指狀物(指狀物A及指狀物B,其在本體及基板環形接點之間具有不同的寄生電阻),標繪有基板電位對照汲極電壓的曲線。這兩個指狀物屬於與圖3所示類似之ESD保護電路中的假設性多指狀NMOSFET。由於圖3中的寄生雙極電晶體於「接通基板電位(turn-on substrate potential)」(對於矽基雙極電晶體,約為0.70V)接通,基板電位變成接通基板電位時的汲極電壓將是各指狀物的觸發電壓。指狀物A觸發電壓及指狀物B觸發點如圖6所示。一般而言,如圖3所示之多指狀裝置的每一指狀物由於指狀物的不同寄生電阻未受到補償而產生不同的基板電位。與先前技術相反,利用根據本發明如圖4所示此等外部電流注入源(45A、45B、45D、及45E,可將其概括延伸至其他多指狀NMOSFET、多指狀PMOSFET、及多指狀閘流體),可補償寄生電阻的差異。This is illustrated in Figure 6, where two fingers (Finger A and Finger B, which have different parasitic resistances between the body and the substrate ring contacts) are plotted against the substrate potential. The curve of the pole voltage. These two fingers belong to a hypothetical multi-finger NMOSFET in an ESD protection circuit similar to that shown in FIG. Since the parasitic bipolar transistor in FIG. 3 is turned on at the "turn-on substrate potential" (about 0.70 V for the 矽-based bipolar transistor), the substrate potential becomes the substrate potential. The drain voltage will be the trigger voltage for each finger. Finger A trigger voltage and finger B trigger point are shown in Figure 6. In general, each finger of the multi-finger device shown in Figure 3 produces a different substrate potential due to the different parasitic resistance of the fingers being uncompensated. Contrary to the prior art, with the external current injection sources (45A, 45B, 45D, and 45E shown in FIG. 4 according to the present invention, it can be generalized to other multi-finger NMOSFETs, multi-finger PMOSFETs, and multi-finger The gate fluid) compensates for the difference in parasitic resistance.

表1針對先前技術NMOSFET ESD保護電路(其中按如圖5所示的4x30陣列配置指狀物)中遍及多個指狀物各處的基板電位,列出選出的模擬結果。同樣地,表2針對根據本發明之NMOSFET ESD保護電路(其中按相同的4x30陣列配置指狀物)中遍及多個指狀物各處的基板電位,列出模擬結果。針對此模擬,將透過寄生注入源(圖3的33A-33E或圖4的43A-43E)之寄生內部注入電流的大小設定在0.398mA。比較兩個表,可看出本發明的好處在於針對相同的汲極電壓,本發明之不同指狀物各處的基板電位實質相同。相反地,先前技術電路中於指狀物各處的相同汲極電壓在基板電位上產生許多變動。Table 1 lists selected simulation results for substrate potentials throughout a plurality of fingers in a prior art NMOSFET ESD protection circuit (wherein fingers are arranged in a 4x30 array as shown in Figure 5). Similarly, Table 2 lists the simulation results for substrate potentials throughout a plurality of fingers in an NMOSFET ESD protection circuit in accordance with the present invention in which the fingers are arranged in the same 4x30 array. For this simulation, the magnitude of the parasitic internal injection current through the parasitic injection source (33A-33E of FIG. 3 or 43A-43E of FIG. 4) was set to 0.398 mA. Comparing the two tables, it can be seen that the advantage of the present invention is that the substrate potentials of the various fingers of the present invention are substantially the same for the same drain voltage. Conversely, the same gate voltage across the fingers in prior art circuits produces many variations in substrate potential.

表1。汲極電壓為8.99V時,於先前技術4x30陣列之NMOSFET ESD保護電路中,比較遍及多個指狀物各處的基板電位。Table 1. When the drain voltage is 8.99V, in the prior art 4x30 array NMOSFET ESD protection circuit, the substrate potential across the various fingers is compared.

列1、第5指狀物 列2、第5指狀物 列1、第15指狀物 列2、第15指狀物基板電位(V)0.600 0.690 0.605 0.700Column 1, 5th finger column 2, 5th finger column 1st, 15th finger column 2, 15th finger substrate potential (V) 0.600 0.690 0.605 0.700

表2。汲極電壓為8.78V時,於本發明4x30陣列之具外部電流注入源的NMOSFET ESD保護電路中,比較遍及多個指狀物各處的基板電位。Table 2. When the drain voltage is 8.78V, in the NMOSFET ESD protection circuit of the 4x30 array of the present invention having an external current injection source, the substrate potentials across the plurality of fingers are compared.

列1、第5指狀物 列2、第5指狀物 列1、第15指狀 物 列2、第15指狀物基板電位(V)0.690 0.685 0.700 0.700Column 1, 5th index, 2nd, 5th, 1st, 15th Object 2, 15th finger substrate potential (V) 0.690 0.685 0.700 0.700

模擬觸發電壓(即每一指狀物的基板電位達到「接通基板電壓」(矽基NMOSFET寄生npn雙極電晶體中為0.7V)的汲極電壓)的比較顯示於表3。先前技術NMOSFET ESD保護電路中,利用圖6之4x30陣列但卻沒有每一指狀物之外部注入電流源之指狀物的選出觸發電壓如表格的一列中所列。根據本發明之NMOSFET ESD保護電路中,利用圖6之4x30陣列且具有不同注入電流位準之外部注入電流源以匹配基板電位之對應指狀物的觸發電壓如另一列所列。比較兩組觸發電壓的範圍,可以看出本發明的優點在於根據本發明的觸發電壓分布均勻許多。A comparison of the simulated trigger voltage (i.e., the substrate potential of each finger reaching the "turn-on substrate voltage" (the threshold voltage of 0.7 V in the NMOS-based NMOSFET parasitic npn bipolar transistor) is shown in Table 3. In prior art NMOSFET ESD protection circuits, the selected trigger voltages for the fingers that utilize the 4x30 array of Figure 6 but without the external injection current source of each finger are listed in the column of the table. In the NMOSFET ESD protection circuit of the present invention, the trigger voltage for the corresponding finger of the 4x30 array of Figure 6 and having different injection current levels to match the substrate potential is listed in another column. Comparing the ranges of the two sets of trigger voltages, it can be seen that an advantage of the present invention is that the trigger voltage distribution according to the present invention is much more uniform.

表3。比較根據先前技術的NMOSFET ESD保護電路中及根據本發明之NMOSFET ESD保護電路中之選出指狀物的觸發電壓。table 3. The trigger voltages of the selected fingers in the NMOSFET ESD protection circuit according to the prior art and in the NMOSFET ESD protection circuit according to the present invention are compared.

列1、第5指狀物 列2、第5指狀物 列1、第15指狀物 列2、第15指狀物 根據先前技術的觸發電壓(V)9.14 9.00 9.13 8.99 根據本發明之觸發電壓(V)8.81 8.81 8.78 8.78Column 1, 5th finger Column 2, 5th finger column 1, 15th finger column 2, 15th finger Trigger voltage according to prior art (V) 9.14 9.00 9.13 8.99 Trigger voltage (V) 8.81 8.81 8.78 8.78 according to the invention

圖7顯示特定汲極電壓(8.9V的汲極電壓)下,比較在如圖 3所示先前技術之120-指狀物NMOSFET ESD保護電路(具有如圖5所示之指狀物配置)及如圖4所示根據本發明之120-指狀物NMOSFET ESD保護電路(在每一指狀物之本體及汲極之間具有外部電流注入源,及具有如圖5所示之指狀物配置)間之基板電位(即本體電壓)的模擬結果。在根據本發明的電路中,將調整來自每一外部電流源的注入電流大小以實質匹配基板電位。由於諸如圖6所示的汲極電壓對照基板電位曲線於指狀物各處均具有類似形狀,一旦基板電位對於合理的汲極電壓實質匹配,則觸發電壓於指狀物各處亦實質匹配。因此,使用外部電流注入源,透過匹配基板電位接近指狀物的接通條件,可減少觸發電壓的變動。匹配的觸發電壓可使多個指狀物均勻接通,從而利用多指狀半導體裝置之完整的電流傳送容量。Figure 7 shows the specific drain voltage (8.9V bucker voltage), compared to the figure 3 shows a prior art 120-finger NMOSFET ESD protection circuit (having a finger configuration as shown in FIG. 5) and a 120-finger NMOSFET ESD protection circuit according to the present invention as shown in FIG. A simulation result of the substrate potential (ie, the body voltage) between the body and the drain of a finger having an external current injection source and a finger configuration as shown in FIG. In the circuit according to the invention, the magnitude of the injection current from each external current source will be adjusted to substantially match the substrate potential. Since the buckling voltage versus substrate potential curve, such as that shown in Figure 6, has a similar shape throughout the fingers, once the substrate potential is substantially matched for a reasonable drain voltage, the trigger voltage is substantially matched throughout the fingers. Therefore, using an external current injection source, the variation of the trigger voltage can be reduced by the matching substrate potential approaching the on condition of the finger. The matched trigger voltage allows multiple fingers to be turned on evenly, thereby utilizing the full current transfer capacity of the multi-finger semiconductor device.

外部電流注入源可以是任何電子次電路,其能夠提供額外電流至多指狀裝置之指狀物的本體。例如,外部電流注入源可以是二極體、二極體堆疊、雙極電晶體、MOSFET、或以上任何組合且可含有電阻成分。較佳是,外部電流注入電路含有至少一個實質無電阻之電子組件。實質無電阻之電子組件具有相對於其所傳送電流量之極小的寄生電阻。實質無電阻成分的範例包括PN接面(譬如於二極體中)、電容器、MOSFET、及電感器。更佳的是,外部電流注入源在從電源至多指狀裝置之指狀物的本體之電流路徑中沒有電阻器(電阻電子組件)。The external current injection source can be any electronic secondary circuit that can provide additional current to the body of the fingers of the multi-finger device. For example, the external current injection source can be a diode, a diode stack, a bipolar transistor, a MOSFET, or any combination of the above and can contain a resistive component. Preferably, the external current injection circuit contains at least one substantially non-resistive electronic component. Substantially non-resistive electronic components have extremely small parasitic resistances relative to the amount of current they are transferred. Examples of substantially non-resistive components include PN junctions (such as in diodes), capacitors, MOSFETs, and inductors. More preferably, the external current injection source has no resistors (resistive electronic components) in the current path from the power source to the body of the fingers of the multi-finger device.

圖8顯示外部電流注入源的第一示範性實施例,其中每一 注入源由三個二極體(85A-85E)的堆疊組成。圖8亦顯示在每一指狀物(80A-80E)之本體(86A-86E)、正電源匯流排82、基板環形接點89、及I/O墊81之間的寄生電阻器(87A-87E)。在圖8中,雖然僅中間指狀物80C沒有外部電流注入源,但本發明允許多於一個指狀物沒有外部電流注入源的實施例,或允許每一指狀物具有如伴隨圖4之段落中說明之外部電流注入源的實施例。Figure 8 shows a first exemplary embodiment of an external current injection source, each of which The injection source consists of a stack of three diodes (85A-85E). Figure 8 also shows the parasitic resistor between the body (86A-86E) of each finger (80A-80E), the positive power busbar 82, the substrate ring contact 89, and the I/O pad 81 (87A- 87E). In FIG. 8, although only the intermediate fingers 80C have no external current injection source, the present invention allows embodiments in which more than one finger has no external current injection source, or allows each finger to have the same as that accompanying FIG. An embodiment of the external current injection source described in the paragraph.

還有,類似組態可用於通用多指狀NMOSFET、通用多指狀PMOSFET、及通用多指狀閘流體。可以改變二極體堆疊的參數,以於遍及不同指狀物(80A-80E)各處感生相同的觸發電壓。較佳是,可調整二極體堆疊(85A-85E)的寬度,以允許不同量的漏電流(leakage current)進入指狀物(80A-80E)的本體(86A-86E),致使每一指狀物(80A-80E)之本體(86A-86E)的電壓於指狀物各處實質完全相同,因而所有指狀物均具有相同的觸發電壓。在此情況下,此二極體堆疊為調變注入電流量的可調性組件。二極體堆疊可僅含有一個二極體或至少兩個二極體之串聯。Also, similar configurations are available for general purpose multi-finger NMOSFETs, general purpose multi-finger PMOSFETs, and general purpose multi-finger gate fluids. The parameters of the diode stack can be varied to induce the same trigger voltage throughout the different fingers (80A-80E). Preferably, the width of the diode stack (85A-85E) can be adjusted to allow different amounts of leakage current to enter the body (86A-86E) of the fingers (80A-80E), causing each finger The voltages of the bodies (86A-86E) of the bodies (80A-80E) are substantially identical throughout the fingers, so all fingers have the same trigger voltage. In this case, the diode stack is an adjustable component that modulates the amount of injected current. The diode stack may contain only one diode or a series of at least two diodes.

圖9顯示外部電流注入源的第二示範性實施例,其包含連接至一些指狀物(90A-90E)之本體(96A-96E)的RC觸發NMOSFET電路。RC觸發NMOSFET電路包含:兩個NMOSFET(191及192),其中NMOSFET(191及192)的各汲極連接至正電源,及NMOSFET(191及192)的各源極連接至多 個指狀物(90A-90E)中一者的本體(96A-96E);及在正電源及接地間之電阻器195及電容器194的串聯,其中在電阻器195及電容器194間串聯中的節點連接至兩個MOSFET(191及192)的閘極。兩個二極體193位在RC觸發NMOSFET電路中的正電源匯流排92及電容器194之間。多個指狀物(90A-90E)為並聯連接,致使多個指狀物(90A-90E)的汲極連接至正電源匯流排92,及多個指狀物(90A-90E)的源極連接至基板環形接點99。不等電阻值的寄生電阻器(97A-97E)連接於本體(96A-96E)及每一指狀物的源極之間。Figure 9 shows a second exemplary embodiment of an external current injection source that includes an RC-triggered NMOSFET circuit connected to the bodies (96A-96E) of some of the fingers (90A-90E). The RC-triggered NMOSFET circuit includes two NMOSFETs (191 and 192), wherein the drains of the NMOSFETs (191 and 192) are connected to the positive power supply, and the sources of the NMOSFETs (191 and 192) are connected at most. a body (96A-96E) of one of the fingers (90A-90E); and a series connection of a resistor 195 and a capacitor 194 between the positive power source and the ground, wherein the node in series between the resistor 195 and the capacitor 194 Connect to the gates of the two MOSFETs (191 and 192). Two diodes 193 are located between the positive supply bus 92 and capacitor 194 in the RC-triggered NMOSFET circuit. The plurality of fingers (90A-90E) are connected in parallel such that the drains of the plurality of fingers (90A-90E) are connected to the positive power busbar 92, and the sources of the plurality of fingers (90A-90E) Connected to the substrate ring contact 99. Parasitic resistors (97A-97E) of unequal resistance values are connected between the body (96A-96E) and the source of each finger.

根據本發明之此示範性實施例,兩個NMOSFET(191及192)可用作調變進入指狀物(90A-90E)之注入電流量的可調性組件。二極體193的尺寸及數目,還有電阻器195的電阻及電容器194的電容亦可用作可調性成分。在圖9中,雖然僅中間指狀物90C沒有外部電流注入源,但本發明允許多於一個指狀物沒有外部電流注入源的實施例,或允許每一指狀物具有如伴隨圖4段落中說明之外部電流注入源的實施例。還有,類似組態可用於通用多指狀NMOSFET、通用多指狀PMOSFET、及通用多指狀閘流體。可以改變二極體堆疊的參數,以於遍及不同指狀物(90A-90E)各處感生相同的觸發電壓。In accordance with this exemplary embodiment of the invention, two NMOSFETs (191 and 192) can be used as an adjustable component that modulates the amount of injected current into the fingers (90A-90E). The size and number of the diodes 193, as well as the resistance of the resistor 195 and the capacitance of the capacitor 194, can also be used as an adjustable component. In Figure 9, although only the intermediate fingers 90C have no external current injection source, the present invention allows for embodiments in which more than one finger has no external current injection source, or allows each finger to have a paragraph as accompanying Figure 4. An embodiment of the external current injection source described herein. Also, similar configurations are available for general purpose multi-finger NMOSFETs, general purpose multi-finger PMOSFETs, and general purpose multi-finger gate fluids. The parameters of the diode stack can be varied to induce the same trigger voltage throughout the different fingers (90A-90E).

根據本發明,可匹配多指狀半導體裝置之多個指狀物的觸發電壓,致使多個指狀物且較佳是所有指狀物具有實質匹配的觸發電壓因而能夠同時接通。In accordance with the present invention, the trigger voltages of the plurality of fingers of the multi-finger semiconductor device can be matched such that the plurality of fingers, and preferably all of the fingers, have substantially matched trigger voltages and can be turned on simultaneously.

第一,提供具多指狀半導體裝置的半導體電路。此半導體裝置可為多指狀NMOSFET ESD保護電路、通用NMOSFET、通用PMOSFET、或通用閘流體。閘流體可以是(但不限於)矽控整流器(Silicon Controlled Rectifier,SCR)、不對稱SCR(ASCR)、反向傳導閘流體(RCT)、光啟動SCR(LASCR;一種光觸發閘流體(LTT))、TRIAE(含有兩個閘流體結構的雙向切換裝置)、閘極截止閘流體(GTO)、MCT(含有兩個額外FET結構以控制接通/截止的MOSFET控制閘流體)、基極電阻控制閘流體(BRT)、靜電感應閘流體(SITh)、或場控閘流體(FCTh)。First, a semiconductor circuit having a multi-finger semiconductor device is provided. The semiconductor device can be a multi-finger NMOSFET ESD protection circuit, a general purpose NMOSFET, a general purpose PMOSFET, or a general thyristor. The thyristor can be, but is not limited to, a Silicon Controlled Rectifier (SCR), an asymmetric SCR (ASCR), a reverse conduction thyristor (RCT), a light-activated SCR (LASCR; a light-triggered thyristor (LTT)) ), TRIAE (bidirectional switching device with two thyristor structures), gate-off thyristor fluid (GTO), MCT (MOSFET with two additional FET structures to control on/off MOSFET control thyristor), base resistance control Brake fluid (BRT), electrostatically induced thyristor fluid (SITh), or field controlled thyristor fluid (FCTh).

第二,設計至少一個外部電流注入源,其連接至多個指狀物中一者之組件。可僅提供部分多個指狀物具有外部電流注入源,或提供所有多個指狀物具有外部電流注入源。如果多指狀半導體裝置為多指狀MOSFET,則不論多指狀NMOSFET或多指狀PMOSFET,多個指狀物中可附接外部注入電流源的組件是MOSFET之指狀物的本體。如果多指狀半導體裝置是閘流體,則多個指狀物中可附接外部注入電流源的組件是閘流體之指狀物的閘極。Second, at least one external current injection source is designed that is coupled to a component of one of the plurality of fingers. Only a portion of the plurality of fingers may be provided with an external current injection source, or all of the plurality of fingers may be provided with an external current injection source. If the multi-finger semiconductor device is a multi-finger MOSFET, the component of the plurality of fingers to which the external injection current source can be attached is the body of the fingers of the MOSFET, regardless of the multi-finger NMOSFET or the multi-finger PMOSFET. If the multi-finger semiconductor device is a thyristor, the component of the plurality of fingers to which the externally injected current source can be attached is the gate of the finger of the thyristor.

外部注入電流源可包含二極體、二極體堆疊、雙極電晶體、MOSFET、或以上任何組合,且可含有電阻成分。較佳是,外部電流注入電路含有至少一個實質無電阻電子組件。更佳的是,外部電流注入源在從電源至多指狀裝置之一指狀物的本體的電流路徑中沒有電阻器(電阻電子組件)。例如,亦可使用如 圖8所示的二極體堆疊或如圖9所示的RC觸發NMOSFET電路。外部電流注入源可以是至少一個包含一個二極體或至少兩個二極體之串聯的二極體堆疊。外部電流注入源或可包含:至少一個RC觸發NMOSFET,其中該至少一個NMOSFET的汲極連接至電源,及至少一個RC觸發NMOSFET的源極連接至多個指狀物中一者的至少一個組件;及在正電源及接地間之至少一個電阻器及電容器的串聯,其中串聯中的節點連接至至少一個RC觸發MOSFET的閘極。可設計外部電流注入源致使有至少一個參數可在至少一些指狀物上調變注入電流。例如,參數可以是二極體之寬度的數值、基板或井之一部分的摻雜濃度、在指狀物周圍之淺溝渠隔離(shallow trench isolation)的尺寸、二極體的數量、電路組件的電容、電感、及/或電阻。The external injection current source can comprise a diode, a diode stack, a bipolar transistor, a MOSFET, or any combination of the above, and can contain a resistive component. Preferably, the external current injection circuit contains at least one substantially non-resistive electronic component. More preferably, the external current injection source has no resistor (resistive electronic component) in the current path from the power source to the body of one of the fingers of the multi-finger device. For example, you can also use The diode stack shown in Figure 8 or the RC-triggered NMOSFET circuit shown in Figure 9. The external current injection source may be at least one diode stack comprising a diode or at least two diodes in series. The external current injection source or may include: at least one RC-triggered NMOSFET, wherein a drain of the at least one NMOSFET is coupled to a power supply, and a source of the at least one RC-triggered NMOSFET is coupled to at least one component of one of the plurality of fingers; A series connection of at least one resistor and capacitor between the positive supply and the ground, wherein the node in the series is coupled to the gate of the at least one RC trigger MOSFET. The external current injection source can be designed such that there is at least one parameter that modulates the injection current on at least some of the fingers. For example, the parameter can be the value of the width of the diode, the doping concentration of a portion of the substrate or well, the size of the shallow trench isolation around the finger, the number of diodes, the capacitance of the circuit component. , inductance, and / or resistance.

第三,模擬各多個指狀物之本體的電壓。最佳模擬條件是在多指狀MOSFET之指狀物中產生接近接通基板電位之本體電壓的條件,或在多指狀閘流體之指狀物中產生接近接通基板電位之閘極電壓的條件。Third, the voltage of the body of each of the plurality of fingers is simulated. The best simulation condition is to generate a condition in the finger of the multi-finger MOSFET that is close to the body voltage of the substrate potential, or to generate a gate voltage close to the substrate potential in the finger of the multi-finger thyristor. condition.

第四,調整該至少一個外部電流注入源,以匹配該多個指狀物中一者之觸發電壓與該多個指狀物中另一者之觸發電壓,直到所有觸發電壓匹配為止。由於外部電流注入源具有至少一個參數可以在至少一些指狀物上調變注入電流,可在此步驟中利用外部電流注入源的至少一個參數,且以多個參數為佳。Fourth, the at least one external current injection source is adjusted to match a trigger voltage of one of the plurality of fingers with a trigger voltage of the other of the plurality of fingers until all of the trigger voltages match. Since the external current injection source has at least one parameter that can modulate the injection current on at least some of the fingers, at least one parameter of the external current injection source can be utilized in this step, and preferably a plurality of parameters.

根據本發明,可以調諧多指狀半導體裝置之多個指狀物的觸發電壓,致使多個指狀物且較佳是所有指狀物均具有實質調諧為目標觸發電壓的觸發電壓。調諧觸發電壓為目標觸發電壓的方法類似於具有以下變化之匹配多個指狀物各處之觸發電壓的方法。In accordance with the present invention, the trigger voltages of the plurality of fingers of the multi-finger semiconductor device can be tuned such that the plurality of fingers, and preferably all of the fingers, have a trigger voltage that is substantially tuned to the target trigger voltage. The method of tuning the trigger voltage to the target trigger voltage is similar to the method of matching the trigger voltage across multiple fingers with the following variations.

目標觸發電壓可在設計外部電流注入源其間或之前界定。可調整至少一個外部電流注入源,以匹配各多個指狀物的觸發電壓與目標觸發電壓。與多指狀半導體裝置之多個指狀物中匹配觸發電壓相同的調整方法可用來匹配多個指狀物的觸發電壓與目標觸發電壓。The target trigger voltage can be defined between or before designing the external current injection source. At least one external current injection source can be adjusted to match the trigger voltage of each of the plurality of fingers with the target trigger voltage. The same adjustment method as the matching trigger voltage of the plurality of fingers of the multi-finger semiconductor device can be used to match the trigger voltage of the plurality of fingers with the target trigger voltage.

圖10顯示圖9所示電路在匹配多指狀NMOSFET之多個指狀物中觸發點此一中間階段後的模擬結果。在圖10顯示的模擬中,對於兩個NMOSFET(191及192)之1微米寬度的設定,顯示兩個NMOSFET(191及192)之閘極電壓V_gate的瞬時反應、最左邊指狀物90A之本體96A及最右邊指狀物90E之本體96E之基板電位V1的瞬時反應、及第二指狀物90B之本體96B及第四指狀物90D之本體96D之基板電位V2的瞬時反應。雖然這比沒有任何外部電流注入源的電路產生更好的結果,但使用連接至最左邊指狀物90A及最右邊指狀物90E之NMOSFET 191的寬度作進一步調整可以提高兩個電壓(V1及V2)之間的匹配。圖11顯示連接至設定為5.5微米之最外側指狀物(90A及90E)之NMOSFET 191之寬度的另一模擬結 果,其中顯示提高了在四個指狀物之間的匹配。由於多指狀NMOSFET ESD保護電路的每一指狀物在指狀物的基板電位超過0.7V時接通,及實質上在0.7V以下截止,根據圖10顯示的模擬,兩個最外邊指狀物比第二及第四指狀物接通持續較短的時間,或更糟,即甚至未接通,如上所述。根據圖11顯示的模擬,四個指狀物實質同時接通及截止。延伸此類型的調整可以匹配遍及圖4、8、及9所顯示之五個指狀物各處的觸發電壓,及一般而言,可匹配於本文所述之具任意數量指狀物的任何多指狀半導體裝置。Figure 10 shows the simulation results of the circuit shown in Figure 9 after the intermediate phase of the trigger point in the fingers of the multi-finger NMOSFET. In the simulation shown in Figure 10, for the 1 micron width setting of the two NMOSFETs (191 and 192), the transient response of the gate voltage V_gate of the two NMOSFETs (191 and 192), the body of the leftmost finger 90A is shown. The instantaneous reaction of the substrate potential V1 of the body 96E of the 96A and the rightmost finger 90E, and the transient reaction of the substrate potential V2 of the body 96B of the second finger 90B and the body 96D of the fourth finger 90D. Although this produces better results than a circuit without any external current injection source, the width of the NMOSFET 191 connected to the leftmost finger 90A and the rightmost finger 90E can be further adjusted to increase the two voltages (V1 and Match between V2). Figure 11 shows another analog junction connected to the width of the NMOSFET 191 of the outermost fingers (90A and 90E) set to 5.5 microns. As a result, it shows that the match between the four fingers is improved. Since each finger of the multi-finger NMOSFET ESD protection circuit is turned on when the substrate potential of the finger exceeds 0.7V, and is substantially turned off below 0.7V, according to the simulation shown in FIG. 10, the two outermost fingers The object is turned on for a shorter period of time than the second and fourth fingers, or worse, even not turned on, as described above. According to the simulation shown in Fig. 11, the four fingers are substantially simultaneously turned on and off. Extending this type of adjustment can match the trigger voltage throughout the five fingers shown in Figures 4, 8, and 9, and in general, can match any of the number of fingers described herein. Finger semiconductor device.

參考圖12,顯示示範性設計流程900的方塊圖。示範性設計流程900可取決於欲設計的積體電路(IC)類型而有所改變。例如,建造特定應用積體電路(ASIC)的設計流程與設計標準積體電路組件的設計流程有所不同。設計結構920較佳是設計程序910的輸入。設計結構920可來自於智慧財產(IP)提供者、核心開發者、或設計公司,或可由設計流程的業者產生,或可來自於其他來源。Referring to Figure 12, a block diagram of an exemplary design flow 900 is shown. The exemplary design flow 900 may vary depending on the type of integrated circuit (IC) to be designed. For example, the design flow for building an application-specific integrated circuit (ASIC) is different from the design flow for designing a standard integrated circuit component. Design structure 920 is preferably an input to design program 910. The design structure 920 may be from an intellectual property (IP) provider, a core developer, or a design company, or may be generated by an operator of the design process, or may be from other sources.

設計結構920可包含圖4、圖8、或圖9的電路。設計結構920亦可包含圖4、8、及9之電路的組合。通常,設計結構920屬於硬體描述語言(HDL)(諸如Verilog、VHDL、C、C++等)的概要形式。設計結構920可包含於一或多個機器可讀媒體上。例如,設計結構920可以是文字檔或圖4、圖8、或圖9之電路的圖形表示。Design structure 920 can include the circuitry of FIG. 4, FIG. 8, or FIG. Design structure 920 may also include combinations of the circuits of Figures 4, 8, and 9. Typically, design structure 920 is in the form of a summary of a hardware description language (HDL) such as Verilog, VHDL, C, C++, and the like. Design structure 920 can be included on one or more machine readable mediums. For example, design structure 920 can be a textual representation or a graphical representation of the circuitry of FIG. 4, FIG. 8, or FIG.

設計程序910較佳是將設計結構920中所含的此種電路合成或轉譯成線路連接表(netlist)980。線路連接表980含有電路中各種組件的表示清單。例如,線路連接表980可含有描述對積體電路設計中其他元件及電路之互連線路、電晶體、邏輯閘、控制電路、輸入/輸出(I/O)、模型等的連接表,並記錄於至少一個機器可讀媒體中。此為反覆程序,其中取決於電路的設計規格940及參數,將線路連接表980重新合成一或多次。The design program 910 preferably synthesizes or translates such circuitry contained in the design structure 920 into a netlist 980. Line connection table 980 contains a list of representations of various components in the circuit. For example, the line connection table 980 may contain a connection table describing interconnections, transistors, logic gates, control circuits, input/output (I/O), models, etc. of other components and circuits in the integrated circuit design, and recording In at least one machine readable medium. This is a repetitive procedure in which the line connection table 980 is recombined one or more times depending on the design specifications 940 and parameters of the circuit.

設計程序910包括使用各種輸入,例如來自以下項目的輸入:程式庫元件930,其容納一組常用元件、電路、及裝置,包括特定製造技術(如,不同技術節點:32 nm、45 nm、90 nm等)的模型、布局及符號表示;設計規格940;特徵資料950;確認資料960;設計規則970;及測試資料檔案985(包括例如標準電路設計程序,諸如時序分析、確認、設計規則檢查、布局與布線作業等)。在不背離本發明的範疇及精神下,積體電路設計的一般技術者應明白可行的電子設計自動化工具及設計程序910所用應用程式的範圍。本發明的設計結構910並不限於任何特定的設計流程。The design program 910 includes input using various inputs, such as from a library component 930 that houses a common set of components, circuits, and devices, including specific manufacturing techniques (eg, different technology nodes: 32 nm, 45 nm, 90) Model, layout and symbolic representation of nm, etc.; design specification 940; feature data 950; validation data 960; design rules 970; and test data archive 985 (including, for example, standard circuit design procedures such as timing analysis, validation, design rule checking, Layout and wiring work, etc.). The general practitioner of integrated circuit design should understand the range of possible electronic design automation tools and applications used in designing the program 910 without departing from the scope and spirit of the present invention. The design structure 910 of the present invention is not limited to any particular design flow.

設計程序910較佳是視情況將本發明如圖4、8、及9所示具體實施例連同任何附加積體電路設計或資料轉譯為第二設計結構990。第二設計結構990以用於交換積體電路之布局資料(如,以GDSII(GDS2)、GL1、OASIS、或任何其他儲存此類設計結構的合適格式儲存的資訊)的資料格式駐存於儲存 媒體上。第二設計結構990可包含資訊諸如:測試資料檔案、設計內容檔案、製造資料、布局參數、線路、金屬互連層級、通孔、形狀、在製造線中布線的資料、及半導體廠商為生產本發明如圖4、8、及9所示具體實施例所需的任何其他資料。第二設計結構990接著進行至階段995,其中(例如)第二設計結構990進行至試產(tape-out),亦即發表以進行製造、送至遮罩廠、送至另一設計廠、送回客戶等。The design program 910 preferably translates the present invention as shown in Figures 4, 8, and 9 along with any additional integrated circuit design or data into a second design structure 990, as appropriate. The second design structure 990 resides in a data format for exchanging layout data of the integrated circuit (eg, information stored in GDSII (GDS2), GL1, OASIS, or any other suitable format for storing such design structures). In the media. The second design structure 990 can include information such as: test data files, design content files, manufacturing materials, layout parameters, wiring, metal interconnect levels, vias, shapes, wiring in the manufacturing line, and semiconductor manufacturers for production The present invention is any other information required by the specific embodiments shown in Figures 4, 8, and 9. The second design structure 990 then proceeds to stage 995 where, for example, the second design structure 990 proceeds to tape-out, ie, for manufacturing, to the mask factory, to another design factory, Return to the customer, etc.

雖然已針對特定具體實施例說明本發明,但熟習本技術者從上述說明應明白可進行許多替代、修改、及變化。因此,本發明旨在涵蓋所有此類落在本發明及以下申請專利範圍之範疇及精神的替代、修改、及變化。While the invention has been described with respect to the specific embodiments, the invention Accordingly, the present invention is intended to embrace all such alternatives, modifications, and variations in the scope of the invention and the scope of the invention.

10、20、20B、20C、30A-30E、40A-40E、80A-80E、90A-90E‧‧‧指狀物10, 20, 20B, 20C, 30A-30E, 40A-40E, 80A-80E, 90A-90E‧‧‧ fingers

12、22、22B‧‧‧汲極12, 22, 22B‧‧ ‧ bungee

14、24、24B、26C‧‧‧閘極14, 24, 24B, 26C‧‧ ‧ gate

18、28、28B‧‧‧源極18, 28, 28B‧‧‧ source

19、39、89、99‧‧‧基板環形接點19, 39, 89, 99‧‧‧ substrate ring contacts

21、31、41、81‧‧‧I/O墊21, 31, 41, 81‧‧‧I/O pads

22C‧‧‧陽極22C‧‧‧Anode

28C‧‧‧陰極28C‧‧‧ cathode

23、23C‧‧‧寄生衝擊電離電流源23, 23C‧‧‧ Parasitic impact ionization current source

26、26B、86A-86E、96A-96E‧‧‧本體26, 26B, 86A-86E, 96A-96E‧‧‧ ontology

27、27B、27C、37A-37E、47A-47E、87A-87E‧‧‧寄生電阻器27, 27B, 27C, 37A-37E, 47A-47E, 87A-87E‧‧‧ parasitic resistors

33A-33E、43A-43E‧‧‧寄生注入源33A-33E, 43A-43E‧‧‧ Parasitic injection source

36A-36E‧‧‧基極36A-36E‧‧‧ base

45A、45B、45D、45E‧‧‧外部電流注入源45A, 45B, 45D, 45E‧‧‧ external current injection source

46A-46E‧‧‧基極46A-46E‧‧‧ base

82、92‧‧‧正電源匯流排82, 92‧‧‧ positive power bus

85A-85E、193‧‧‧二極體85A-85E, 193‧‧ ‧ diode

97A-97E‧‧‧寄生電阻器97A-97E‧‧‧Parasitic Resistors

191、192‧‧‧NMOSFET191, 192‧‧‧NMOSFET

194‧‧‧電容器194‧‧‧ capacitor

195‧‧‧電阻器195‧‧‧Resistors

圖1顯示具有多指狀NMOSFET ESD保護電路(具有分布於晶片區域上之多個指狀物10)之晶片的示意圖。Figure 1 shows a schematic diagram of a wafer having a multi-finger NMOSFET ESD protection circuit having a plurality of fingers 10 distributed over a wafer area.

圖2A顯示圖1中具寄生組件之多指狀NMOSFET ESD保護電路之指狀物20的示意圖。2A shows a schematic diagram of the fingers 20 of the multi-finger NMOSFET ESD protection circuit of FIG. 1 with parasitic components.

圖2B顯示具寄生組件之多指狀PMOSFET電路之指狀物20B的示意圖。2B shows a schematic diagram of a finger 20B of a multi-finger PMOSFET circuit with parasitic components.

圖2C顯示具寄生組件之多指狀閘流體電路之指狀物20C的示意圖。Figure 2C shows a schematic representation of a finger 20C of a multi-finger thyristor circuit with parasitic components.

圖3顯示先前技術具有寄生組件之多指狀NMOSFET ESD保護電路的示意圖。3 shows a schematic diagram of a multi-finger NMOSFET ESD protection circuit with prior art parasitic components.

圖4顯示具有外部電流注入源45A-45E及寄生組件之多指狀NMOSFET ESD保護電路的示意圖。Figure 4 shows a schematic diagram of a multi-finger NMOSFET ESD protection circuit with external current injection sources 45A-45E and parasitic components.

圖5顯示以4x30陣列布置在晶片區域上之多指狀NMOSFET ESD保護電路之指狀物的示範性設計。Figure 5 shows an exemplary design of the fingers of a multi-finger NMOSFET ESD protection circuit arranged in a 4x30 array on a wafer area.

圖6顯示曲線證明ESD保護電路中,在多指狀NMOSFET的兩個指狀物(指狀物A及指狀物B)間之特定汲極電壓的基板電位失配(mismatch)範例。Figure 6 shows an example of a substrate potential mismatch for a particular gate voltage between two fingers (Finger A and Finger B) of a multi-finger NMOSFET in a ESD protection circuit.

圖7顯示根據先前技術電路之遍及指狀物各處之基板電壓及根據本發明具有特定I/O電壓之外部電流注入源之基板電壓的模擬結果。Figure 7 shows simulation results of substrate voltages throughout the substrate according to prior art circuits and external current injection sources having specific I/O voltages in accordance with the present invention.

圖8顯示根據本發明之第一示範性實施例的電路,其中連接至電源的二極體用作外部電流注入源。Figure 8 shows a circuit in accordance with a first exemplary embodiment of the present invention in which a diode connected to a power source is used as an external current injection source.

圖9顯示根據本發明之第二示範性實施例的電路,其中RC觸發MOSFET電路用作外部電流注入源。Figure 9 shows a circuit in accordance with a second exemplary embodiment of the present invention in which an RC trigger MOSFET circuit is used as an external current injection source.

圖10顯示其中觸發電壓不匹配之RC觸發的多指狀NMOSFET ESD保護電路的模擬結果。Figure 10 shows the simulation results for a multi-finger NMOSFET ESD protection circuit with an RC trigger that triggers a voltage mismatch.

圖11顯示其中觸發電壓匹配之RC觸發的多指狀NMOSFET ESD保護電路的模擬結果。Figure 11 shows the simulation results for a multi-finger NMOSFET ESD protection circuit with RC triggering that triggers a voltage match.

圖12為半導體設計所用之設計程序及根據本發明之半導體電路製造的流程圖。Figure 12 is a flow chart of a design procedure for semiconductor design and fabrication of a semiconductor circuit in accordance with the present invention.

40A-40E‧‧‧指狀物40A-40E‧‧‧ fingers

41‧‧‧I/O墊41‧‧‧I/O mat

43A-43E‧‧‧寄生注入源43A-43E‧‧‧ Parasitic injection source

45A-45E‧‧‧外部電流注入源45A-45E‧‧‧External current injection source

46A-46E‧‧‧基極46A-46E‧‧‧ base

47A-47E‧‧‧寄生電阻器47A-47E‧‧‧Parasitic Resistors

Claims (40)

一種半導體電路,其包含:一半導體裝置,具有複數個指狀物,其中該複數個指狀物為並聯連接;及至少一個外部電流注入源,連接至該複數個指狀物之一組件,其中沒有外部電流注入源附接於該複數個指狀物中至少一個。 A semiconductor circuit comprising: a semiconductor device having a plurality of fingers, wherein the plurality of fingers are connected in parallel; and at least one external current injection source coupled to one of the plurality of fingers, wherein No external current injection source is attached to at least one of the plurality of fingers. 如請求項1之半導體電路,其中該半導體裝置為一金氧半導體場效電晶體(MOSFET)及該組件為該半導體裝置的本體。 The semiconductor circuit of claim 1, wherein the semiconductor device is a MOS field effect transistor (MOSFET) and the component is a body of the semiconductor device. 如請求項1之半導體電路,其中該半導體裝置為一半導體閘流體及該組件為該半導體閘流體的閘極。 The semiconductor circuit of claim 1, wherein the semiconductor device is a semiconductor thyristor and the component is a gate of the thyristor fluid. 如請求項1之半導體電路,其中該並聯之一第一端連接至一第一電源,及該並聯之一第二端連接至一第二電源。 The semiconductor circuit of claim 1, wherein the first end of the parallel connection is connected to a first power source, and the second end of the parallel connection is connected to a second power source. 如請求項4之半導體電路,進一步包含在各該複數個指狀物之該組件及一基板環形接點之間之一寄生電阻器。 The semiconductor circuit of claim 4, further comprising a parasitic resistor between the component of each of the plurality of fingers and a substrate ring contact. 如請求項5之半導體電路,其中該至少一外部電流注入源直接連接至該複數個指狀物之汲極或陽極所直接連接的該電源。 The semiconductor circuit of claim 5, wherein the at least one external current injection source is directly connected to the power source directly connected to the drain or anode of the plurality of fingers. 如請求項6之半導體電路,其中該等寄生電阻器的電阻值集合在該集合內具有至少一個不等值。 The semiconductor circuit of claim 6, wherein the set of resistance values of the parasitic resistors has at least one unequal value within the set. 如請求項7之半導體電路,其中該複數個指狀物中的至少三個具有實質匹配的觸發電壓。 The semiconductor circuit of claim 7, wherein at least three of the plurality of fingers have substantially matching trigger voltages. 如請求項8之半導體電路,其中該複數個指狀物中的全部皆具有實質匹配的觸發電壓。 The semiconductor circuit of claim 8, wherein all of the plurality of fingers have a substantially matching trigger voltage. 如請求項9之半導體電路,其中該外部電流注入源中的至少一個具有一調變注入電流量的可調性組件。 The semiconductor circuit of claim 9, wherein at least one of the external current injection sources has an adjustable component of a modulated injection current amount. 如請求項7之半導體電路,其中至少一外部電流注入源注入異於另一外部電流注入源的一注入電流量。 The semiconductor circuit of claim 7, wherein the at least one external current injection source injects an amount of injection current different from the other external current injection source. 如請求項1之半導體電路,其中該複數個指狀物中的至少三個具有實質匹配的觸發電壓。 The semiconductor circuit of claim 1, wherein at least three of the plurality of fingers have substantially matching trigger voltages. 如請求項1之半導體電路,其中該複數個指狀物中的全部皆具有實質匹配的觸發電壓。 The semiconductor circuit of claim 1, wherein all of the plurality of fingers have substantially matching trigger voltages. 如請求項13之半導體電路,其中該半導體裝置為一金氧半導體場效電晶體(MOSFET)及該組件為該半導體裝置的本體。 The semiconductor circuit of claim 13, wherein the semiconductor device is a MOS field effect transistor (MOSFET) and the component is a body of the semiconductor device. 如請求項13之半導體電路,其中該半導體裝置為一半導體閘流體及該組件為該半導體閘流體的閘極。 The semiconductor circuit of claim 13, wherein the semiconductor device is a semiconductor thyristor and the component is a gate of the thyristor fluid. 如請求項13之半導體電路,其中該外部電流注入源中的至少一個具有一調變注入電流量的可調性組件。 The semiconductor circuit of claim 13, wherein at least one of the external current injection sources has an adjustable component of a modulated injection current amount. 一種半導體電路,其包含:一半導體裝置,具有複數個指狀物,其中該複數個指狀物為並聯連接;及至少一個二極體堆疊,連接至該複數個指狀物中一者之本體,其中該至少一個二極體堆疊包含一個二極體或一至少兩個二極體之串聯,且其中該複數個指狀物中的全部皆具有實質匹配的觸發電壓,其中沒有外部電流注入源附接於該複數個指狀物中至少一個。 A semiconductor circuit comprising: a semiconductor device having a plurality of fingers, wherein the plurality of fingers are connected in parallel; and at least one diode stack connected to the body of one of the plurality of fingers The at least one diode stack comprises a diode or a series of at least two diodes, and wherein all of the plurality of fingers have a substantially matching trigger voltage, wherein no external current injection source Attached to at least one of the plurality of fingers. 如請求項17之半導體電路,其進一步包含至少兩個二極體堆疊,且該等二極體堆疊中至少一者不等於該等二極體堆疊中另一者。 The semiconductor circuit of claim 17, further comprising at least two diode stacks, and at least one of the diode stacks is not equal to the other of the diode stacks. 如請求項17之半導體電路,其中至少一外部電流注入源注入異於另一外部電流注入源的一注入電流量。 The semiconductor circuit of claim 17, wherein the at least one external current injection source injects an amount of injection current different from the other external current injection source. 一種半導體電路,其包含: 一半導體裝置,具有複數個指狀物,其中該複數個指狀物為並聯連接;至少兩個MOSFET,其中該至少兩個MOSFET之一第一MOSFET的汲極連接至一電源,及該第一MOSFET的源極連接至該複數個指狀物中一者之的一組件,且該至少兩個MOSFET之一第二MOSFET的汲極連接至該電源,及該第二MOSFET的源極連接至該複數個指狀物中另一者之一組件;及至少一串聯,係串聯該電源及接地間之一電阻器及一電容器,其中該串聯中的一節點連接至該至少一MOSFET的閘極。 A semiconductor circuit comprising: a semiconductor device having a plurality of fingers, wherein the plurality of fingers are connected in parallel; at least two MOSFETs, wherein one of the at least two MOSFETs has a drain of the first MOSFET connected to a power source, and the first a source of the MOSFET is coupled to a component of one of the plurality of fingers, and a drain of the second MOSFET of the at least two MOSFETs is coupled to the power source, and a source of the second MOSFET is coupled to the source One of the other of the plurality of fingers; and at least one of the series connected to the resistor and the capacitor between the power source and the ground, wherein a node of the series is connected to the gate of the at least one MOSFET. 如請求項20之半導體電路,其中該複數個指狀物中的全部皆具有實質匹配的觸發電壓。 The semiconductor circuit of claim 20, wherein all of the plurality of fingers have substantially matching trigger voltages. 如請求項20之半導體電路,其中沒有外部電流注入源附接於該複數個指狀物中至少一個。 A semiconductor circuit as claimed in claim 20, wherein no external current injection source is attached to at least one of the plurality of fingers. 一種匹配一多指狀半導體裝置之複數個指狀物之觸發電壓的方法,其包含:提供一半導體電路包含一半導體裝置及至少一個外部電流注入源,其中該半導體裝置包含複數個指狀物,該複數個指狀物為並聯連接,該至少一個外部電流注入源連接至該複數個指狀物之一組件,其中沒有外部電流注入源附接於該複數個指狀物中至少一個; 提供至少一外部電流注入源,其連接至該複數個指狀物中一者之一組件;模擬各該複數個指狀物中之本體的一電壓;及調整該至少一外部電流注入源,以匹配該複數個指狀物中一者的觸發電壓與該複數個指狀物中另一者的觸發電壓,直到所有該等觸發電壓皆匹配為止。 A method of matching a trigger voltage of a plurality of fingers of a multi-finger semiconductor device, comprising: providing a semiconductor circuit comprising a semiconductor device and at least one external current injection source, wherein the semiconductor device comprises a plurality of fingers The plurality of fingers are connected in parallel, the at least one external current injection source is connected to one of the plurality of fingers, wherein no external current injection source is attached to at least one of the plurality of fingers; Providing at least one external current injection source connected to one of the plurality of fingers; simulating a voltage of the body of each of the plurality of fingers; and adjusting the at least one external current injection source to Matching a trigger voltage of one of the plurality of fingers with a trigger voltage of the other of the plurality of fingers until all of the trigger voltages match. 如請求項23之方法,其進一步包含設計至少一個二極體堆疊,係連接至該複數個指狀物中一者之該組件,其中該至少一個二極體堆疊包含一個二極體或一至少兩個二極體之串聯。 The method of claim 23, further comprising designing at least one diode stack connected to the component of one of the plurality of fingers, wherein the at least one diode stack comprises a diode or at least A series connection of two diodes. 如請求項23之方法,其進一步包含:設計至少一RC觸發MOSFET,其中該至少一RC觸發MOSFET的汲極連接至一電源,及該至少一RC觸發MOSFET的源極連接至該複數個指狀物中一者之該組件中至少一個;及設計至少一串聯,係串聯該電源及接地間之一電阻器及一電容器,其中該串聯中的一節點連接至該至少一RC觸發MOSFET的閘極。 The method of claim 23, further comprising: designing at least one RC trigger MOSFET, wherein a drain of the at least one RC trigger MOSFET is coupled to a power supply, and a source of the at least one RC trigger MOSFET is coupled to the plurality of fingers At least one of the components of the device; and at least one series connected in series, the resistor and a capacitor connected in series between the power source and the ground, wherein a node in the series is connected to the gate of the at least one RC trigger MOSFET . 如請求項23之方法,其中該半導體裝置為一金氧半導體場效電晶體(MOSFET)及該組件為該半導體裝置的本體。 The method of claim 23, wherein the semiconductor device is a MOS field effect transistor (MOSFET) and the component is a body of the semiconductor device. 如請求項23之方法,其中該半導體裝置為一半導體閘流體及該組件為該半導體閘流體的閘極。 The method of claim 23, wherein the semiconductor device is a semiconductor thyristor and the component is a gate of the thyristor fluid. 一種調諧一多指狀半導體裝置中複數個指狀物之觸發電壓的方法,其包含:提供一半導體電路包含一半導體裝置及至少一個外部電流注入源,其中該半導體裝置包含複數個指狀物,該複數個指狀物為並聯連接,該至少一個外部電流注入源連接至該複數個指狀物之一組件,其中沒有外部電流注入源附接於該複數個指狀物中至少一個;提供至少一外部電流注入源,其連接至該複數個指狀物中一者之本體;界定一目標觸發電壓;模擬各該複數個指狀物之本體的一電壓;及調整該至少一外部電流注入源,以匹配各該複數個指狀物的觸發電壓與該目標觸發電壓。 A method of tuning a trigger voltage of a plurality of fingers in a multi-finger semiconductor device, comprising: providing a semiconductor circuit comprising a semiconductor device and at least one external current injection source, wherein the semiconductor device comprises a plurality of fingers The plurality of fingers are connected in parallel, the at least one external current injection source is coupled to one of the plurality of fingers, wherein no external current injection source is attached to at least one of the plurality of fingers; providing at least one An external current injection source coupled to the body of one of the plurality of fingers; defining a target trigger voltage; simulating a voltage of each of the plurality of fingers; and adjusting the at least one external current injection source And matching the trigger voltage of each of the plurality of fingers with the target trigger voltage. 如請求項28之方法,進一步包含設計至少一個二極體堆疊,係連接至該複數個指狀物中一者之該組件,其中該至少一個二極體堆疊包含一個二極體或一至少兩個二極體之串聯。 The method of claim 28, further comprising designing at least one diode stack connected to the component of one of the plurality of fingers, wherein the at least one diode stack comprises a diode or at least two A series of diodes. 如請求項28之方法,進一步包含:設計至少一RC觸發MOSFET,其中該至少一RC觸發MOSFET的汲極連接至一電源,及該至少一RC觸發MOSFET的源極連接至該複數個指狀物中一者之該組件中至少一個;及設計至少一串聯,係串聯該電源及接地間之一電阻器及一 電容器,其中該串聯中的一節點連接至該至少一RC觸發MOSFET的閘極。 The method of claim 28, further comprising: designing at least one RC trigger MOSFET, wherein a drain of the at least one RC trigger MOSFET is coupled to a power source, and a source of the at least one RC trigger MOSFET is coupled to the plurality of fingers At least one of the components of the middle one; and at least one series connected in series, one of the resistors and one of the power supply and the grounding ground a capacitor, wherein a node of the series is connected to a gate of the at least one RC trigger MOSFET. 如請求項28之方法,其中該半導體裝置為一金氧半導體場效電晶體(MOSFET)及該組件為該半導體裝置的本體。 The method of claim 28, wherein the semiconductor device is a MOS field effect transistor (MOSFET) and the component is a body of the semiconductor device. 如請求項28之方法,其中該半導體裝置為一半導體閘流體及該組件為該半導體閘流體的閘極。 The method of claim 28, wherein the semiconductor device is a semiconductor thyristor and the component is a gate of the thyristor fluid. 一種機器可讀媒體包含(embodying)用以設計、製造、或測試一設計的一設計結構,該設計結構包含:一第一資料,係表示具有複數個指狀物之一半導體裝置,其中該複數個指狀物為並聯連接;及一第二資料,係表示至少一外部電流注入源,該注入源連接至該複數個指狀物之一組件,其中沒有外部電流注入源附接於該複數個指狀物中至少一個。 A machine readable medium embodying a design structure for designing, manufacturing, or testing a design, the design structure comprising: a first material representing a semiconductor device having a plurality of fingers, wherein the plurality The fingers are connected in parallel; and a second data is indicative of at least one external current injection source connected to one of the plurality of fingers, wherein no external current injection source is attached to the plurality of At least one of the fingers. 如請求項33之機器可讀媒體,其中該設計結構中該半導體裝置為一金氧半導體場效電晶體(MOSFET)及該組件為該半導體裝置的一本體。 The machine readable medium of claim 33, wherein the semiconductor device is a MOSFET and the component is a body of the semiconductor device. 如請求項33之機器可讀媒體,其中該設計結構中該半導體裝置為一半導體閘流體及該組件為該半導體閘流體的閘極。 The machine readable medium of claim 33, wherein the semiconductor device in the design is a semiconductor thyristor and the component is a gate of the thyristor fluid. 如請求項33之機器可讀媒體,其中該設計結構中該並聯之一第一端連接至一第一電源,及該並聯之一第二端連接至一第二電源。 The machine readable medium of claim 33, wherein the first end of the parallel connection is coupled to a first power source and the second end of the parallel connection is coupled to a second power source. 如請求項36之機器可讀媒體,其中該設計結構進一步包含另外的資訊係代表在各該複數個指狀物之該組件及一基板環形接點之間的一寄生電阻器。 The machine readable medium of claim 36, wherein the design structure further comprises additional information representative of a parasitic resistor between the component of each of the plurality of fingers and a substrate ring contact. 如請求項33之機器可讀媒體,其中該設計結構中該至少一外部電流注入源更包含至少一個二極體堆疊,該堆疊連接至該複數個指狀物中一者之本體,其中該至少一個二極體堆疊包含一個二極體或一至少兩個二極體之串聯。 The machine readable medium of claim 33, wherein the at least one external current injection source in the design structure further comprises at least one diode stack connected to the body of one of the plurality of fingers, wherein the at least A diode stack comprises a diode or a series of at least two diodes. 如請求項33之機器可讀媒體,其中該至少一外部電流注入源更包含:至少一MOSFET,其中該至少一MOSFET的汲極連接至一電源,及該至少一MOSFET的源極連接至該複數個指狀物中一者之該組件中至少一個;及至少一串聯,係串聯該電源及接地間之一電阻器及一電容器,其中該串聯中的一節點連接至該至少一MOSFET的閘極。 The machine readable medium of claim 33, wherein the at least one external current injection source further comprises: at least one MOSFET, wherein a drain of the at least one MOSFET is connected to a power source, and a source of the at least one MOSFET is connected to the plurality At least one of the components of one of the fingers; and at least one series connected in series with the resistor and a capacitor between the power source and the ground, wherein a node in the series is connected to the gate of the at least one MOSFET . 如請求項36之機器可讀媒體,其中該設計結構中該複數個指狀物中的全部皆具有實質匹配的觸發電壓。The machine readable medium of claim 36, wherein all of the plurality of fingers in the design structure have substantially matching trigger voltages.
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