TWI429588B - Methods and systems for producing silane - Google Patents

Methods and systems for producing silane Download PDF

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TWI429588B
TWI429588B TW100147557A TW100147557A TWI429588B TW I429588 B TWI429588 B TW I429588B TW 100147557 A TW100147557 A TW 100147557A TW 100147557 A TW100147557 A TW 100147557A TW I429588 B TWI429588 B TW I429588B
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reactor
alkaline earth
earth metal
decane
alkali metal
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TW201231394A (en
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Puneet Gupta
Henry Frank Erk
Alexis Grabbe
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    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
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    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
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    • C01B33/027Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
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    • C01B6/00Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/04Hydrides of alkali metals, alkaline earth metals, beryllium or magnesium; Addition complexes thereof
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    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/24Halogens or compounds thereof

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Description

用於製造矽烷之方法及系統Method and system for producing decane

本發明之領域係關於用於製造矽烷之方法,且尤其包括使用電解使反應性組分再生之方法。一些特定實施例係針對矽烷之製造為關於鹵素及/或鹼金屬或鹼土金屬之實質性「閉環(closed-loop)」之方法。The field of the invention relates to a process for the manufacture of decane, and in particular to a process for the regeneration of reactive components using electrolysis. Some specific embodiments are directed to the manufacture of decane as a substantially "closed-loop" method for halogens and/or alkali or alkaline earth metals.

矽烷為具有許多工業用途之多功能化合物。在半導體工業中,矽烷可用於在半導體晶圓上沈積磊晶矽層及製造多晶矽。多晶矽為用以製造許多商業產品之重要原料,該等商業產品包括例如可在流體化床反應器中藉由熱分解矽烷於矽粒子上製造之積體電路及光伏打(亦即太陽)電池。Decane is a multifunctional compound with many industrial uses. In the semiconductor industry, decane can be used to deposit epitaxial germanium layers on semiconductor wafers and to fabricate polysilicon. Polycrystalline germanium is an important raw material for the manufacture of many commercial products including, for example, integrated circuits and photovoltaic (i.e., solar) cells that can be fabricated by thermal decomposition of decane on ruthenium particles in a fluidized bed reactor.

矽烷可藉由使四氟化矽與鹼金屬或鹼土金屬鋁氫化物(諸如四氫化鋁鈉)反應製造,如美國專利第4,632,816號中所揭示,該文獻出於所有相關及一致之目的以引用之方式併入本文中。此方法之特徵在於高能效;然而,起始物質成本可負面影響該系統之經濟效益。The decane can be produced by reacting ruthenium tetrafluoride with an alkali metal or alkaline earth metal aluminum hydride such as sodium aluminum hydride, as disclosed in U.S. Patent No. 4,632,816, the disclosure of which is incorporated herein by The manner is incorporated herein. This method is characterized by high energy efficiency; however, the cost of the starting material can negatively impact the economics of the system.

或者,矽烷可藉由所謂「聯合碳化物方法(Union Carbide Process)」製造,其中使冶金級矽與氫氣及四氯化矽反應製造三氯矽烷,如Mller等人,「Development and Economic Evaluation of a Reactive Distillation Process for Silane Production」,Distillation and Adsorption: Integrated Processes ,2002中所述,該文獻出於所有相關及一致之目的以引用之方式併入本文中。三氯矽烷隨後經由一系列歧化及蒸餾步驟處理,製造矽烷終產物。此方法需要大量大型循環流,此舉增加初始設備成本以及操作成本。Alternatively, decane can be produced by the so-called "Union Carbide Process" in which metallurgical grade ruthenium is reacted with hydrogen and ruthenium tetrachloride to produce trichloromethane, such as M. Ler et al., "Development and Economic Evaluation of a Reactive Distillation Process for Silane Production", Distillation and Adsorption: Integrated Processes , 2002, which is hereby incorporated by reference in its entirety for all purposes for all purposes for all purposes. The trichloromethane is then processed through a series of disproportionation and distillation steps to produce the final product of decane. This approach requires a large number of large circulating streams, which increases initial equipment costs as well as operating costs.

因此,繼續需要製造矽烷之經濟型方法及關於製造製程內所用之某些物質之閉環的方法。亦需要執行包括實質性閉環系統之該等方法之系統。Therefore, there is a continuing need for an economical process for the manufacture of decane and a closed loop process for the manufacture of certain materials used in the process. There is also a need to implement a system that includes such methods of a substantially closed loop system.

本發明之一個態樣係針對一種由鹼金屬或鹼土金屬鹵化物鹽來源製造矽烷之方法。該方法包括電解鹼金屬或鹼土金屬鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體。使金屬性鹼金屬或鹼土金屬與氫氣接觸製造鹼金屬或鹼土金屬氫化物。含有至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣藉由使鹵素氣體與以下至少一者接觸來製造:(1)與矽接觸製造四鹵化矽,及(2)與氫氣接觸製造鹵化氫,其中鹵化氫進一步與矽接觸以製造含有四鹵化矽及三鹵矽烷之混合物。使鹵化原料氣與鹼金屬或鹼土金屬氫化物接觸以製造矽烷及鹼金屬或鹼土金屬氫化物鹽。One aspect of the invention is directed to a process for the manufacture of decane from an alkali metal or alkaline earth metal halide salt source. The method comprises electrolyzing an alkali metal or alkaline earth metal halide salt to produce a metallic alkali or alkaline earth metal and a halogen gas. The alkali metal or alkaline earth metal is contacted with hydrogen to produce an alkali metal or alkaline earth metal hydride. A ruthenium halide raw material gas containing at least one halogenated decane selected from the group consisting of ruthenium tetrahalide, trihalo decane, dihalo decane, and monohalo decane is produced by contacting a halogen gas with at least one of: (1) Contacting the manufacture of ruthenium tetrahalide, and (2) contacting hydrogen gas to produce hydrogen halide, wherein the hydrogen halide is further contacted with ruthenium to produce a mixture containing ruthenium tetrahalide and trihalo decane. The halogenated feed gas is contacted with an alkali metal or alkaline earth metal hydride to produce a decane and an alkali metal or alkaline earth metal hydride salt.

本發明之另一個態樣係針對一種在關於鹼金屬或鹼土金屬之實質性閉環系統中製造矽烷之方法。使鹵化矽原料氣與鹼金屬或鹼土金屬鹵化物接觸以製造矽烷及鹼金屬或鹼土金屬鹵化物鹽。電解鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體。使金屬性鹼金屬或鹼土金屬與氫氣接觸以製造鹼金屬或鹼土金屬氫化物。使藉由使金屬性鹼金屬或鹼土金屬與氫氣接觸製造之鹼金屬或鹼土金屬氫化物與鹵化矽原料氣接觸,製造矽烷及鹼金屬或鹼土金屬鹵化物鹽。Another aspect of the invention is directed to a method of making decane in a substantially closed loop system with respect to alkali or alkaline earth metals. The hafnium halide raw material gas is contacted with an alkali metal or alkaline earth metal halide to produce a decane and an alkali metal or alkaline earth metal halide salt. The halide salt is electrolyzed to produce a metallic alkali metal or alkaline earth metal and a halogen gas. A metallic alkali metal or alkaline earth metal is contacted with hydrogen to produce an alkali metal or alkaline earth metal hydride. The alkali metal or alkaline earth metal hydride produced by contacting a metallic alkali metal or an alkaline earth metal with hydrogen is brought into contact with a ruthenium halide raw material gas to produce a decane and an alkali metal or alkaline earth metal halide salt.

本發明之又一個態樣係針對一種在關於鹵素之實質性閉環系統中製造矽烷之方法。使含有至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣與鹼金屬或鹼土金屬氫化物接觸以製造矽烷及鹼金屬或鹼土金屬鹵化物鹽。電解鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體。含有至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣係藉由使鹵素氣體與以下至少一者接觸來製造:(1)與矽接觸以製造四鹵化矽,及(2)與氫氣接觸以製造鹵化氫,其中該鹵化氫進一步與矽接觸以製造包含四鹵化矽及三鹵矽烷之混合物。使鹵化矽原料氣與鹼金屬或鹼土金屬氫化物接觸以製造矽烷及鹼金屬或鹼土金屬鹵化物鹽。Yet another aspect of the present invention is directed to a method of making decane in a substantially closed loop system with respect to halogen. The ruthenium halide raw material gas containing at least one halogenated decane selected from the group consisting of ruthenium tetrahalide, trihalo decane, dihalo decane and monohalo decane is contacted with an alkali metal or alkaline earth metal hydride to produce decane and an alkali metal or alkaline earth metal. Halide salt. The halide salt is electrolyzed to produce a metallic alkali metal or alkaline earth metal and a halogen gas. A halogenated ruthenium raw material gas containing at least one halogenated decane selected from the group consisting of ruthenium tetrahalide, trihalomethane, dihalodecane and monohalodecane is produced by contacting a halogen gas with at least one of: (1) The ruthenium is contacted to produce ruthenium tetrahalide, and (2) is contacted with hydrogen to produce a hydrogen halide, wherein the hydrogen halide is further contacted with ruthenium to produce a mixture comprising ruthenium tetrahalide and trihalo decane. The hafnium halide raw material gas is contacted with an alkali metal or alkaline earth metal hydride to produce a decane and an alkali metal or alkaline earth metal halide salt.

在本發明之另一個態樣中,製造多晶矽之閉環方法包括使含有至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣與鹼金屬或鹼土金屬氫化物接觸,以製造矽烷及鹼金屬或鹼土金屬鹵化物鹽。熱分解矽烷以製造多晶矽及氫氣。電解鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體。含有至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣係藉由使藉由電解鹼金屬或鹼土金屬鹵化物製造之鹵素氣體與以下至少一者接觸來製造:(1)與矽接觸以製造四鹵化矽,及(2)與氫氣接觸以製造鹵化氫,其中使鹵化氫進一步與矽接觸以製造含有四鹵化矽及三鹵矽烷之混合物。使金屬性鹼金屬或鹼土金屬與由矽烷之熱分解製造之氫氣接觸,以製造鹼金屬或鹼土金屬氫化物。使藉由使鹵素氣體或鹵化氫與矽接觸製造之鹵化矽原料氣與藉由使金屬性鹼金屬或鹼土金屬與氫氣接觸製造之鹼金屬或鹼土金屬氫化物接觸,來製造矽烷及鹼金屬或鹼土金屬鹵化物鹽。In another aspect of the present invention, a closed-loop method for producing polycrystalline germanium includes a halogenated ruthenium raw material gas and a base containing at least one halogenated decane selected from the group consisting of ruthenium tetrahalide, trihalo decane, dihalo decane, and monohalo decane. A metal or alkaline earth metal hydride is contacted to produce a decane and an alkali metal or alkaline earth metal halide salt. The decane is thermally decomposed to produce polycrystalline germanium and hydrogen. The halide salt is electrolyzed to produce a metallic alkali metal or alkaline earth metal and a halogen gas. A halogenated ruthenium raw material gas containing at least one halogenated decane selected from the group consisting of ruthenium tetrahalide, trihalo decane, dihalo decane and monohalo decane, by using a halogen gas produced by electrolytic alkali metal or alkaline earth metal halide At least one of the following is produced by contacting: (1) contacting ruthenium to produce ruthenium tetrahalide, and (2) contacting hydrogen to produce hydrogen halide, wherein the hydrogen halide is further contacted with ruthenium to produce ruthenium tetrahalide and trihalo decane. a mixture. The metallic alkali metal or alkaline earth metal is contacted with hydrogen produced by thermal decomposition of decane to produce an alkali metal or alkaline earth metal hydride. Making a ruthenium and an alkali metal or an alkali metal or an alkaline earth metal hydride produced by contacting a halogen gas or a hydrogen halide with ruthenium in contact with an alkali metal or an alkaline earth metal hydride produced by contacting a metallic alkali metal or an alkaline earth metal with hydrogen Alkaline earth metal halide salt.

在本發明之又一個態樣中,用於在實質性閉環方法中製造矽烷之系統包括用於電解鹼金屬或鹼土金屬鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體之容器。該系統包括用於製造以下至少一者之鹵化反應器:(1)四鹵化矽及(2)三鹵矽烷,其係藉由使矽與以下至少一者反應來製造:(1)自容器中排出之鹵素氣體及(2)使自容器中排出之鹵素氣體與氫氣接觸製造之鹵化氫。該系統包括用於使自容器中排出之金屬性鹼金屬或鹼土金屬與氫氣反應製造鹼金屬或鹼土金屬氫化物的氫化物反應器。該系統包括用於使(1)四鹵化矽及(2)三鹵矽烷中之至少一者與鹼金屬或鹼土金屬氫化物反應製造矽烷及鹼金屬或鹼土金屬鹵化物鹽的矽烷反應器。In yet another aspect of the invention, a system for producing decane in a substantially closed loop process includes a vessel for the electrolysis of an alkali or alkaline earth metal halide salt to produce a metallic alkali or alkaline earth metal and a halogen gas. The system comprises a halogenation reactor for the manufacture of at least one of: (1) antimony tetrahalide and (2) trihalomethane, which are produced by reacting rhodium with at least one of: (1) from a container The halogen gas to be discharged and (2) the hydrogen halide produced by bringing the halogen gas discharged from the container into contact with hydrogen. The system includes a hydride reactor for reacting a metallic alkali or alkaline earth metal discharged from a vessel with hydrogen to produce an alkali metal or alkaline earth metal hydride. The system includes a decane reactor for reacting at least one of (1) ruthenium tetrahalide and (2) trihalo decane with an alkali metal or alkaline earth metal hydride to produce a decane and an alkali metal or alkaline earth metal halide salt.

關於以上所提及之本發明態樣所指出之特徵存在各種改進。其他特徵亦可併入以上所提及之本發明態樣中。此等改進及其他特徵可個別地或以任何組合之形式存在。舉例而言,以下關於任一所說明之本發明實施例所討論之各種特徵可單獨地或以任何組合之形式併入任一上述本發明態樣中。There are various improvements with respect to the features indicated by the above-mentioned aspects of the invention. Other features may also be incorporated into the aspects of the invention mentioned above. Such improvements and other features may exist individually or in any combination. For example, the various features discussed below in relation to any of the illustrated embodiments of the invention may be incorporated into any of the above-described aspects of the invention, either individually or in any combination.

在所有圖式中,對應參考字符指示對應部件。Corresponding reference characters indicate corresponding parts throughout the drawings.

本發明實施例之方法在用於製造矽烷之方法中使用電解使反應性組分再生。電解允許矽烷製造方法視情況為關於系統中所用之某些化合物(諸如鹵素(例如氯)及/或鹼金屬或鹼土金屬(例如鈉))的實質性閉環系統。如本文所用,片語「實質性閉環方法(substantially closed-loop process)」或「實質性閉環系統(substantially closed-loop system)」係指具有以下特徵之方法或系統,其中與該系統或方法為閉環相關之化合物除作為雜質以外不會自系統或方法中抽出且不會出於除補充在系統中作為雜質損失之化合物量(例如所補充之化合物量小於系統內總循環之約5%,下文將更全面地描述)以外之目的饋入系統或方法中。The method of the present invention uses electrolysis to regenerate the reactive components in the process for making decane. Electrolysis allows the decane manufacturing process to be a substantially closed loop system with respect to certain compounds used in the system, such as halogens (e.g., chlorine) and/or alkali or alkaline earth metals (e.g., sodium). As used herein, the phrase "substantially closed-loop process" or "substantially closed-loop system" refers to a method or system having the following characteristics, wherein the system or method is A closed-loop related compound is not extracted from the system or method other than as an impurity and is not derived from the amount of compound that is lost as impurities in the system (eg, the amount of compound added is less than about 5% of the total cycle in the system, below) Feed into a system or method for purposes other than a more comprehensive description.

在本發明之一或多個實施例中,矽烷藉由電解鹼金屬或鹼土金屬鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體來製造。使金屬性鹼金屬或鹼金屬與氫氣反應以製造氫化物,且使鹵素氣體與矽(且另外在一些實施例中為氫氣)反應以製造含有四鹵化矽且在一些實施例中含有三鹵矽烷之鹵化矽原料氣。使原料氣反應以製造矽烷及鹵化物鹽。在方法為關於鹼金屬或鹼土金屬及鹵素氣體中之至少一者的實質性閉環之實施例中,鹵化物鹽副產物藉由電解鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體而再循環。In one or more embodiments of the invention, the decane is produced by electrolyzing an alkali metal or alkaline earth metal halide salt to produce a metallic alkali or alkaline earth metal and a halogen gas. The metallic alkali metal or alkali metal is reacted with hydrogen to produce a hydride, and the halogen gas is reacted with hydrazine (and in some embodiments hydrogen) to produce a lanthanum halide containing haloxines and in some embodiments The halogenated raw material gas. The feed gas is reacted to produce a decane and a halide salt. In embodiments where the method is substantially closed to at least one of an alkali metal or alkaline earth metal and a halogen gas, the halide salt byproduct is produced by electrolyzing a halide salt to produce a metallic alkali or alkaline earth metal and a halogen gas. Recycling.

使用電解製造矽烷Using electrolysis to produce decane

現在參看圖1,鹵化物鹽3引入容器4中,在該容器中使鹵化物鹽電解以製造鹵素氣體(例如Cl2 )及金屬(例如金屬性鹼金屬或鹼土金屬)。如本文所用,「鹵化物鹽(halide salt)」含有鹼金屬或鹼土金屬及鹵素。鹵化物鹽可具有通式MXy ,其中M為鹼金屬或鹼土金屬,X為鹵素,且當M為鹼金屬時y為1,且當M為鹼土金屬時y為2。鹵化物鹽之鹼金屬或鹼土金屬(且在如下文所述之某些實施例中,其在閉環系統內再循環)可選自由以下組成之群:鋰、鈉、鉀、鎂、鋇、鈣及其混合物。鹵素可選自氟、氯、溴、碘及其混合物。鑒於氯化鈉之廣泛可用性且鑒於氯化鈉可較容易地分離成其組成部分(例如氯氣(chloride gas)及金屬鈉),故鈉為較佳鹼金屬或鹼土金屬且氯為較佳鹵素。就此點而言,應瞭解,可使用任何鹼金屬或鹼土金屬且可使用任何鹵素,在如下所述用於製造矽烷之方法及系統為關於鹼金屬或鹼土金屬之閉環的實施例中尤其如此。Referring now to FIG. 1, 3 halide salt introduced into the container 4, the manipulation of the container halide salt electrolysis to produce a halogen gas (e.g. Cl 2) and a metal (e.g. alkali metal or alkaline earth metal). As used herein, "halide salt" contains an alkali metal or alkaline earth metal and a halogen. The halide salt may have the formula MX y wherein M is an alkali metal or alkaline earth metal, X is a halogen, and y is 1 when M is an alkali metal, and y is 2 when M is an alkaline earth metal. The alkali metal or alkaline earth metal of the halide salt (and in some embodiments as described below, which is recycled within the closed loop system) may be selected from the group consisting of lithium, sodium, potassium, magnesium, strontium, calcium. And mixtures thereof. The halogen may be selected from the group consisting of fluorine, chlorine, bromine, iodine, and mixtures thereof. In view of the wide availability of sodium chloride and in view of the ease with which sodium chloride can be separated into its constituent parts (e.g., chloride gas and metallic sodium), sodium is a preferred alkali metal or alkaline earth metal and chlorine is a preferred halogen. In this regard, it is to be understood that any alkali or alkaline earth metal can be used and any halogen can be used, as is the case with the method and system for producing decane as described below with respect to the closed loop of an alkali metal or alkaline earth metal.

一種適合電解鹵化物鹽之容器4為唐氏池(Downs cell)。例示性唐氏池顯示於圖2中且參考數字一般為「20」。唐氏池20包括位於其中之一或多種鹵化物鹽15,且含有陽極14及陰極16。陽極14可由例如碳(例如石墨)構成且陰極16可由例如鋼或鐵構成。在陽極14處,氯離子氧化形成鹵素氣體(例如Cl2 )。在陰極16處,鹼金屬或鹼土金屬離子還原形成金屬性鹼金屬或鹼土金屬。就此點而言,應瞭解,如本文所用,術語「金屬性(metallic)」係指氧化數為0之鹼金屬或鹼土金屬。所形成之鹵素氣體及金屬性鹼金屬或鹼土金屬由分隔物19分開。分隔物19可為由鋼或鐵製成之篩網或絲網。就此點而言,應瞭解,可使用不為唐氏池之電解池,諸如美國專利第5,904,821號中所述之電解池,該文獻出於所有相關及一致之目的以引用之方式併入本文中。A container 4 suitable for electrolyzing a halide salt is a Downs cell. An exemplary Down's cell is shown in Figure 2 and the reference number is generally "20". The Pool 20 includes one or more halide salts 15 therein and contains an anode 14 and a cathode 16. The anode 14 may be composed of, for example, carbon (e.g., graphite) and the cathode 16 may be composed of, for example, steel or iron. At the anode 14, a halogen gas is oxidized to form chlorine ions (e.g., Cl 2). At the cathode 16, an alkali metal or alkaline earth metal ion is reduced to form a metallic alkali metal or alkaline earth metal. In this regard, it is to be understood that the term "metallic" as used herein refers to an alkali or alkaline earth metal having an oxidation number of zero. The formed halogen gas and the metallic alkali metal or alkaline earth metal are separated by the separator 19. The partition 19 may be a screen or wire mesh made of steel or iron. In this regard, it is to be understood that an electrolytic cell other than that of the Down's cell, such as that described in U.S. Patent No. 5,904,821, is incorporated herein by reference.

所製造之金屬性鹼金屬或鹼土金屬之密度小於鹵化物鹽,此使得其在池中上升。鹵素氣體亦上升,且鹵素氣體18與金屬性鹼金屬或鹼土金屬17均自唐氏池中移除。可向唐氏池中添加第二鹼金屬或鹼土金屬鹽以形成共晶混合物且壓低電解之鹵化物鹽之熔點以減少熔融鹵化物鹽及/或使鹵化物鹽維持熔融狀態之能量消耗。舉例而言,當氯化鈉在唐氏池20中電解時,可添加一定量之氯化鈣、氯化鋁或碳酸鈉以壓低氯化鈉之熔點。舉例而言,與單獨氯化鈉之熔點801℃相比,含有53.2 mol%氯化鈣及46.8 mol%氯化鈉之混合物之熔點為494℃,且含有23.1 mol%碳酸鈉及76.9 mol%氯化鈉之例示性混合物之熔點為634℃。較佳地,第二鹽之鹼金屬或鹼土金屬與鹵化物鹽之鹼金屬或鹼土金屬相同,或為比鹵化物鹽之鹼金屬或鹼土金屬弱之氧化劑,以便不影響鹵化物鹽之鹼金屬或鹼土金屬之還原。The metal alkali or alkaline earth metal produced has a lower density than the halide salt, which causes it to rise in the pool. The halogen gas also rises, and the halogen gas 18 and the metallic alkali metal or alkaline earth metal 17 are both removed from the Down's pool. A second alkali metal or alkaline earth metal salt can be added to the Down's pool to form a eutectic mixture and to reduce the melting point of the electrolytic halide salt to reduce the energy consumption of the molten halide salt and/or the halide salt to maintain a molten state. For example, when sodium chloride is electrolyzed in the Down cell 20, a certain amount of calcium chloride, aluminum chloride or sodium carbonate may be added to lower the melting point of the sodium chloride. For example, a mixture containing 53.2 mol% calcium chloride and 46.8 mol% sodium chloride has a melting point of 494 ° C and contains 23.1 mol% sodium carbonate and 76.9 mol% chlorine, compared to the melting point of 801 ° C of sodium chloride alone. An exemplary mixture of sodium is having a melting point of 634 °C. Preferably, the alkali metal or alkaline earth metal of the second salt is the same as the alkali metal or alkaline earth metal of the halide salt, or is an oxidizing agent weaker than the alkali metal or alkaline earth metal of the halide salt so as not to affect the alkali metal of the halide salt. Or reduction of alkaline earth metals.

再次參看圖1,鹵素氣體18引入鹵化反應器8中,在該鹵化反應器中其與矽6接觸以製造含有四鹵化矽(例如SiCl4 )之鹵化原料氣21。下文說明此反應:Referring again to FIG. 1, the halogen gas 18 introduced into the halogenation reactor 8, the halogenation reactor with a contact 6 to produce silicon-containing silicon tetrahalide (e.g., SiCl 4) of the feed gas 21 halide. This reaction is described below:

Si+2X2 →SiX4  (1)Si+2X 2 →SiX 4 (1)

矽6之來源可為冶金級矽;然而,應瞭解,可使用其他矽來源,諸如砂(亦即SiO2 )、石英、燧石、矽藻土、礦物矽酸鹽、氟矽酸鹽及其混合物。就此點而言,應瞭解,如本文所用,兩種或兩種以上反應性化合物之「接觸(contact)」一般會引起該等組分之反應,且術語「接觸(contacting)」及「反應(reacting)」為同義詞,如同此等術語之派生詞一般,且此等術語及其派生詞不應被視為具有限制意義。The source of 矽6 may be metallurgical grade ruthenium; however, it should be understood that other ruthenium sources such as sand (i.e., SiO 2 ), quartz, vermiculite, diatomaceous earth, mineral citrate, fluoroantimonate, and mixtures thereof may be used. . In this regard, it is to be understood that as used herein, "contact" of two or more reactive compounds generally causes the reaction of such components, and the terms "contacting" and "reacting" Reacting) is synonymous, as a derivative of these terms, and such terms and derivatives are not to be construed as limiting.

作為與矽直接反應之替代且如圖3中所示,鹵素氣體18可與氫氣28在鹵化氫燃燒器25(與鹵化氫「烘箱」或「爐」同義)中反應以形成鹵化氫26(HX)。根據如下所示反應,鹵化氫26可在鹵化反應器8中與矽6反應形成含有三鹵矽烷及四鹵化矽之鹵化矽原料氣21':As an alternative to direct reaction with hydrazine and as shown in Figure 3, the halogen gas 18 can be reacted with hydrogen gas 28 in a hydrogen halide burner 25 (synonymous with a hydrogen halide "oven" or "furnace") to form a hydrogen halide 26 (HX). ). According to the reaction shown below, the hydrogen halide 26 can be reacted with ruthenium 6 in the halogenation reactor 8 to form a ruthenium halide feed gas 21' containing a trihalo decane and a ruthenium tetrahalide:

Si+3HX→SiHX3 +H2  (2)Si+3HX→SiHX 3 +H 2 (2)

Si+4HX→SiX4 +2H2  (3)Si+4HX→SiX 4 +2H 2 (3)

鹵化矽原料氣21'中四鹵化矽與三鹵矽烷之莫耳比可變化,且在多個實施例中,可為約1:7至約1:2或約1:6至約1:3。就此點而言,應瞭解,矽6與鹵化氫26之反應亦可製造但不限於一定量之二鹵矽烷及/或單鹵矽烷。The molar ratio of the antimony tetrahalide to the trihalodecane in the hafnium halide feed gas 21' can vary, and in various embodiments, can range from about 1:7 to about 1:2 or from about 1:6 to about 1:3. . In this regard, it will be appreciated that the reaction of hydrazine 6 with hydrogen halide 26 can be made, but not limited to, a certain amount of dihalodecane and/or monohalodecane.

在某些實施例中,與矽直接鹵化(圖1)相比,較佳為鹵素氣體18與氫氣28反應形成鹵化氫,之後與矽反應形成包含三鹵矽烷及四鹵化矽之混合物(圖3),此係因為與四鹵化矽相比,由三鹵矽烷使用較少氫化物即可製造矽烷,如以下反應5-6ii中所示。此外,相對於鹵化氫與矽之反應,直接鹵化反應可能需要較高溫度且可能更難控制。In certain embodiments, it is preferred that the halogen gas 18 reacts with the hydrogen gas 28 to form a hydrogen halide prior to direct halogenation (FIG. 1), and then reacts with hydrazine to form a mixture comprising a trihalodecane and a ruthenium tetrahalide (FIG. 3). This is because decane can be produced from trihalodecane using less hydride than ruthenium tetrahalide, as shown in reaction 5-6ii below. Furthermore, direct halogenation reactions may require higher temperatures and may be more difficult to control relative to the reaction of hydrogen halide with hydrazine.

氫氣28之來源可選自下文關於氫氣原料31所述之來源。氫氣28之來源視情況可為由鹵化原料氣21'再循環得到之氫氣或自鹵化矽原料氣21'中分離之氫氣。氫氣可使用氣液分離器(未圖示)自鹵化矽原料氣21'中分離。該等氣液分離器之實例包括使進氣之壓力及/或溫度降低而引起低沸點氣體(例如四鹵化矽及/或三鹵矽烷)冷凝並與高沸點氣體(例如氫氣)分離的容器。適合之容器包括在此項技術中通常稱為「分液罐(knock-out drum)」之容器。該容器可視情況經冷卻以促進氣體分離。或者,氫氣可藉由一或多個蒸餾塔分離。The source of hydrogen 28 can be selected from the sources described below with respect to hydrogen feedstock 31. The source of the hydrogen gas 28 may be, for example, hydrogen obtained by recycling the halogenated feed gas 21' or hydrogen separated from the halogenated raw material gas 21'. Hydrogen gas can be separated from the hafnium halide raw material gas 21' using a gas-liquid separator (not shown). Examples of such gas-liquid separators include a vessel that lowers the pressure and/or temperature of the intake gas to cause condensation of a low-boiling gas such as ruthenium tetrahalide and/or trihalodecane and separate from a high-boiling gas such as hydrogen. Suitable containers include those commonly referred to in the art as "knock-out drums". The container may optionally be cooled to promote gas separation. Alternatively, hydrogen can be separated by one or more distillation columns.

作為如圖3所示在鹵化氫燃燒器中使氫氣與鹵素反應,之後在鹵化反應器中使鹵化氫與矽反應之替代,可使氫氣、鹵素氣體及矽在一個容器中反應以製造包含三鹵矽烷及四鹵化矽之混合物。就此點而言,應瞭解儘管鹵化氫之製備已參考無水鹵化氫氣體一般化地描述,但在一些實施例中,可製造鹵化氫水溶液且尤其HF水溶液,其可藉由熟習此項技術者已知之方法與矽反應以製造包含三鹵矽烷及四鹵化矽之混合物。此外,就此點而言,儘管鹵化氫及矽之反應產物已經描述為包含三鹵矽烷及四鹵化矽之混合物,但應瞭解,可控制反應參數以製造四鹵化矽及僅微量三鹵矽烷(例如小於約5體積%或小於約1體積%)或製造三鹵矽烷及微量四鹵化矽(例如小於約5體積%或小於約1體積%)。As an alternative to reacting hydrogen with a halogen in a hydrogen halide burner as shown in FIG. 3, followed by reacting hydrogen halide with hydrazine in a halogenation reactor, hydrogen, a halogen gas, and helium may be reacted in a vessel to produce three a mixture of halodecane and cesium tetrahalide. In this regard, it should be understood that although the preparation of hydrogen halide has been generally described with reference to anhydrous hydrogen halide gas, in some embodiments, an aqueous hydrogen halide solution, and in particular an aqueous HF solution, may be produced, which may be known to those skilled in the art. The method is known to react with hydrazine to produce a mixture comprising a trihalodecane and a ruthenium tetrahalide. Moreover, in this regard, although the reaction product of hydrogen halide and hydrazine has been described as comprising a mixture of a trihalodecane and a ruthenium tetrahalide, it will be appreciated that the reaction parameters can be controlled to produce ruthenium tetrahalide and only traces of trihalo decane (eg, Less than about 5% by volume or less than about 1% by volume) or trihalomethane and a trace amount of ruthenium tetrahalide (e.g., less than about 5% by volume or less than about 1% by volume).

鹵化反應器8可以流體化床形式操作,其中使矽懸浮於進氣(例如鹵素18(圖1)或鹵化氫26(圖3))中。鹵化反應器8可在室溫(例如約20℃)下操作,尤其當選擇氟作為鹵素時。更一般而言,反應器之操作溫度可為至少約20℃、至少約75℃、至少約150℃、至少約250℃、至少約500℃、至少約750℃、至少約1000℃或至少約1150℃(例如為約20℃至約1200℃、約250℃至約1200℃或約500℃至約1200℃)。反應器8之操作壓力可為至少約1巴、至少約3巴或甚至至少約6巴(例如為約1巴至約8巴或約3巴至約8巴)。The halogenation reactor 8 can be operated in a fluidized bed format in which helium is suspended in an inlet gas (e.g., halogen 18 (Fig. 1) or hydrogen halide 26 (Fig. 3). The halogenation reactor 8 can be operated at room temperature (e.g., about 20 ° C), especially when fluorine is selected as the halogen. More generally, the reactor can be operated at a temperature of at least about 20 ° C, at least about 75 ° C, at least about 150 ° C, at least about 250 ° C, at least about 500 ° C, at least about 750 ° C, at least about 1000 ° C, or at least about 1150. °C (for example, from about 20 ° C to about 1200 ° C, from about 250 ° C to about 1200 ° C or from about 500 ° C to about 1200 ° C). The operating pressure of reactor 8 can be at least about 1 bar, at least about 3 bar, or even at least about 6 bar (e.g., from about 1 bar to about 8 bar or from about 3 bar to about 8 bar).

就此點而言,應瞭解,圖1中所示之鹵化矽原料流21及圖3中所示之鹵化矽原料流21'可含有不為四鹵化矽或三鹵矽烷之鹵矽烷,諸如一定量之單鹵矽烷及/或二鹵矽烷。此外,鹵化矽原料流21或鹵化矽原料流21'可引入歧化系統(未圖示)中,以製造一定量之三鹵矽烷、二鹵矽烷及/或單鹵矽烷。應瞭解,如本文所用,「鹵化矽原料氣(halogentated silicon feed gas)」包括含有任何量之一或多種鹵矽烷(亦即四鹵化矽、三鹵矽烷、二鹵矽烷或單鹵矽烷)之任何氣體且包括尚未引入歧化系統中與已引入歧化系統中之氣體。In this regard, it should be understood that the hafnium halide feed stream 21 shown in FIG. 1 and the hafnium halide feed stream 21' shown in FIG. 3 may contain a halodecane which is not a hafnium halide or a trihalodecane, such as a certain amount. Monohalodecane and/or dihalodecane. Additionally, the hafnium halide feed stream 21 or the hafnium halide feed stream 21' can be introduced into a disproportionation system (not shown) to produce a quantity of trihalodecane, dihalodecane, and/or monohalodecane. It will be understood that as used herein, "halogentated silicon feed gas" includes any of any amount of one or more halodecanes (ie, hafnium halide, trihalodecane, dihalodecane or monohalodecane). Gas and includes gases that have not been introduced into the disproportionation system and that have been introduced into the disproportionation system.

再次參看圖1,鹵化矽原料流21(或如圖3中之鹵化矽原料流21')引入矽烷反應器30中以製造矽烷35。在引入矽烷反應器30中之前,鹵化矽原料氣21(或含有四鹵化矽與三鹵矽烷之原料氣21')可經純化以移除諸如鹵化鋁或鹵化鐵(例如當鹵素為氯時為AlCl3 及/或FeCl3 )及/或矽聚合物(當鹵素為氯時為Sin Clm 聚合物)之雜質。此等雜質可藉由冷卻氣體以自系統中沈澱出雜質來移除。所沈澱之雜質可藉由將氣體引入諸如袋濾器或氣旋分離器之顆粒分離器中來移除。為沈澱出雜質(例如金屬鹵化物及/或矽聚合物),可使鹵化矽原料氣21(或四鹵化矽及/或三鹵矽烷之混合物21')冷卻至小於約200℃之溫度,或如在其他實施例中,小於約175℃、小於約150℃或甚至小於約125℃(例如為約100℃至約200℃或約125℃至約175℃)。氣體可藉由在熱交換裝置及/或冷卻器裝置中與冷卻水或冷卻油交換熱來冷卻。在雜質移除之後,鹵化矽原料氣21(或四鹵化矽及/或三鹵矽烷之混合物21')可含有小於10體積%雜質(亦即不為鹵矽烷之化合物)或甚至小於約5體積%、小於約1體積%、小於約0.1體積%或甚至小於約0.01體積%雜質(例如0.001體積%至約10體積%或約0.001體積%至約1體積%)。Referring again to Figure 1, hafnium halide feed stream 21 (or hafnium halide feed stream 21' as in Figure 3) is introduced into decane reactor 30 to produce decane 35. Prior to introduction into the decane reactor 30, the ruthenium halide feed gas 21 (or the feed gas 21' containing ruthenium tetrahalide and trihalomethane) may be purified to remove such as an aluminum halide or an iron halide (for example, when the halogen is chlorine) Impurities of AlCl 3 and/or FeCl 3 ) and/or ruthenium polymer (Si n Cl m polymer when halogen is chlorine). These impurities can be removed by cooling the gas to precipitate impurities from the system. The precipitated impurities can be removed by introducing the gas into a particle separator such as a bag filter or a cyclone separator. To precipitate impurities (such as metal halides and/or ruthenium polymers), the ruthenium halide feed gas 21 (or a mixture of ruthenium tetrahalide and/or trihalomethane 21') can be cooled to a temperature of less than about 200 ° C, or As in other embodiments, less than about 175 ° C, less than about 150 ° C, or even less than about 125 ° C (eg, from about 100 ° C to about 200 ° C or from about 125 ° C to about 175 ° C). The gas can be cooled by exchanging heat with cooling water or cooling oil in the heat exchange device and/or the cooler device. The hafnium halide feed gas 21 (or the mixture of tetrahalide ruthenium and/or trihalodecane 21') may contain less than 10% by volume of impurities (i.e., compounds which are not halodecane) or even less than about 5 volumes after impurity removal. %, less than about 1% by volume, less than about 0.1% by volume, or even less than about 0.01% by volume of impurities (eg, from 0.001% to about 10% by volume or from about 0.001% to about 1% by volume).

製造作為電解產物之金屬性鹼金屬或鹼土金屬17引入氫化物反應器9中。一定量之氫氣31亦引入氫化物反應器9中。如以下反應中所示,金屬性鹼金屬或鹼土金屬與氫氣之間的反應製造鹼金屬或鹼土金屬氫化物32:A metallic alkali metal or alkaline earth metal 17 produced as an electrolytic product is introduced into the hydride reactor 9. A certain amount of hydrogen 31 is also introduced into the hydride reactor 9. As shown in the following reaction, the reaction between the metallic alkali metal or alkaline earth metal and hydrogen produces an alkali metal or alkaline earth metal hydride 32:

(2/y)M+H2 →(2/y)MHy  (4)(2/y)M+H 2 →(2/y)MH y (4)

其中當M為鹼金屬時y為1,且當M為鹼土金屬時y為2。舉例而言,當M為Na時,反應如下進行,Wherein y is 1 when M is an alkali metal, and y is 2 when M is an alkaline earth metal. For example, when M is Na, the reaction proceeds as follows.

2Na+H2 →2NaH (4i)。2Na+H 2 →2NaH (4i).

當M為Ca時,反應如下進行,When M is Ca, the reaction proceeds as follows.

Ca+H2 →CaH2  (4ii)。Ca + H 2 → CaH 2 (4ii).

反應(4)可在氫化物反應器9內在溶劑存在下發生。適合之溶劑包括各種烴化合物,諸如甲苯、二甲醚、二乙二醇二甲醚及離子液體,諸如NaAlCl4 。在使用NaAlCl4 之實施例中,氫化物反應器9可包括電極。一旦鹼金屬或鹼土金屬氫化物之供應耗盡,則電極可激發而引起鈉(包括一定量來自NaAlCl4 之鈉)與H2 反應並使氫化物化合物再生。在使用NaAlCl4 作為溶劑之實施例中,可添加其他離子化合物以形成如美國專利第6,482,381號中所揭示之共晶混合物,該文獻出於所有相關及一致之目的以引用之方式併入本文中。Reaction (4) can occur in hydride reactor 9 in the presence of a solvent. Suitable solvents include the various hydrocarbon compounds, such as toluene, diethyl ether, diethylene glycol dimethyl ether, and ionic liquids, such as NaAlCl 4. In an embodiment using NaAlCl 4 , the hydride reactor 9 can include an electrode. Once the supply of alkali metal or alkaline earth metal hydride is exhausted, the electrode can be excited to cause sodium (including a certain amount of sodium from NaAlCl 4 ) to react with H 2 and regenerate the hydride compound. In an embodiment using NaAlCl 4 as a solvent, other ionic compounds may be added to form a eutectic mixture as disclosed in U.S. Patent No. 6,482,381, hereby incorporated hereinby .

氫化物反應器9可為攪拌槽反應器,其中添加有一定量之溶劑(未圖示)及金屬性鹼金屬或鹼土金屬17。氫氣31可鼓泡穿過反應混合物以分批模式或在半連續或連續製程中形成鹼金屬或鹼土金屬氫化物32。適合的氫氣31來源包括市售氫氣或獲自其他製程流之氫氣。舉例而言,在鹵化氫與矽反應之實施例中,氫氣可自三鹵矽烷及四鹵化矽混合物21'中分離(例如如上所述之氣液分離器)。或者或另外,可使用在下游多晶矽製造期間自矽烷釋放之氫氣。添加至反應器9中之溶劑、氫氣31及金屬性鹼金屬或鹼土金屬17之量可經選擇以便反應器9中氫化物與溶劑之量的重量比可為至少約1:20,且在其他實施例中為至少約1:10、至少約1:5、至少約1:3、至少約2:3或甚至至少約1:1(例如為約1:20至約1:1或約1:10至約2:3)。The hydride reactor 9 may be a stirred tank reactor in which a certain amount of a solvent (not shown) and a metallic alkali metal or alkaline earth metal 17 are added. Hydrogen 31 can be bubbled through the reaction mixture to form an alkali metal or alkaline earth metal hydride 32 in a batch mode or in a semi-continuous or continuous process. Suitable sources of hydrogen 31 include commercially available hydrogen or hydrogen obtained from other process streams. For example, in an embodiment where a hydrogen halide is reacted with hydrazine, hydrogen can be separated from the trihalomethane and the ruthenium tetrahalide mixture 21' (e.g., a gas-liquid separator as described above). Alternatively or additionally, hydrogen released from the decane during the manufacture of the downstream polysilicon can be used. The amount of solvent, hydrogen 31, and metallic alkali metal or alkaline earth metal 17 added to reactor 9 can be selected such that the weight ratio of hydride to solvent in reactor 9 can be at least about 1:20, and in other In embodiments, at least about 1:10, at least about 1:5, at least about 1:3, at least about 2:3, or even at least about 1:1 (eg, from about 1:20 to about 1:1 or about 1: 10 to about 2:3).

在一或多個實施例中,使用例如一或多個具有一或多個葉輪之相對較高攪動之混合器充分混合反應器9中之反應混合物。相對較高之攪動使氫氣充分分散於整個反應混合物中以便使氫氣之溶解速率達到最大,以及自金屬性鹼金屬或鹼土金屬中剪切任何固體鹼金屬或鹼土金屬氫化物以便使液體鹼金屬或鹼土金屬可連續用於與溶解之氫氣反應。就此點而言且不希望受任何特定理論束縛,氫化物反應器中之質量轉移視液體側阻力及預期介於約100 s-1 至約100,0000 s-1 之間且更通常介於約1,000 s-1 與約10,000 s-1 之間的體積氣液質量轉移係數(KL aG )而定。應注意,特定體積氣液質量轉移係數(KL aG )可視選擇用於反應器9中之特定氫化物及溶劑而不同。該等數值可由熟習此項技術者根據已知方法容易地測定(例如量測隨時間變化之氫氣吸收)。In one or more embodiments, the reaction mixture in reactor 9 is thoroughly mixed using, for example, one or more mixers having relatively high agitation of one or more impellers. The relatively high agitation allows the hydrogen to be sufficiently dispersed throughout the reaction mixture to maximize the rate of hydrogen dissolution and to shear any solid alkali or alkaline earth metal hydride from the metallic alkali or alkaline earth metal to make the liquid alkali metal or The alkaline earth metal can be continuously used to react with dissolved hydrogen. In this regard, and without wishing to be bound by any particular theory, the mass transfer in the hydride reactor is dependent on the liquid side resistance and is expected to be between about 100 s -1 to about 100,0000 s -1 and more typically between about The volumetric gas-liquid mass transfer coefficient (K L a G ) between 1,000 s -1 and about 10,000 s -1 is determined. It should be noted that the specific volumetric gas-liquid mass transfer coefficient (K L a G ) may vary depending on the particular hydride and solvent selected for use in reactor 9. Such values can be readily determined by those skilled in the art in accordance with known methods (e.g., measuring hydrogen evolution over time).

在本發明之若干實施例中,氫化物反應器9在高壓條件下操作,壓力為諸如至少約50巴、至少約125巴、至少約200巴、至少約275巴或至少約350巴(例如為約50巴至約350巴或約50巴至約200巴)。氫化物反應器9可在小於鹼金屬或鹼土金屬鹵化物之熱分解之溫度下操作,溫度為諸如小於約160℃、小於約145℃或小於約130℃(例如為約120℃至約160℃)。In several embodiments of the invention, the hydride reactor 9 is operated under high pressure conditions such as at least about 50 bar, at least about 125 bar, at least about 200 bar, at least about 275 bar, or at least about 350 bar (eg, From about 50 bar to about 350 bar or from about 50 bar to about 200 bar). The hydride reactor 9 can be operated at a temperature less than the thermal decomposition of an alkali metal or alkaline earth metal halide, such as less than about 160 ° C, less than about 145 ° C, or less than about 130 ° C (eg, from about 120 ° C to about 160 ° C). ).

鹼金屬或鹼土金屬氫化物32在有機溶劑中通常為固體。含有懸浮於溶劑中之鹼金屬或鹼土金屬氫化物32之漿料可引入矽烷反應器30中以製造矽烷35。就此點而言,應瞭解,在本發明之某些其他實施例中,鹼金屬或鹼土金屬氫化物32可以含有較少量溶劑之固體或結塊固體形式引入矽烷反應器30中。鹼金屬或鹼土金屬可藉由離心或過濾或藉由熟習此項技術者可用之任何其他適合之方法與溶劑分離。就此點而言,應瞭解,可使用但不限於不為有機溶劑之溶劑(例如NaAlCl4 )。The alkali metal or alkaline earth metal hydride 32 is typically a solid in an organic solvent. A slurry containing an alkali metal or alkaline earth metal hydride 32 suspended in a solvent can be introduced into the decane reactor 30 to produce decane 35. In this regard, it will be appreciated that in certain other embodiments of the invention, the alkali metal or alkaline earth metal hydride 32 may be introduced into the decane reactor 30 in the form of a solid or agglomerated solid containing a relatively small amount of solvent. The alkali or alkaline earth metal can be separated from the solvent by centrifugation or filtration or by any other suitable method known to those skilled in the art. In this regard, it is understood, may be used but are not limited to, a solvent of an organic solvent (e.g. NaAlCl 4).

如上所述,來自鹵化矽原料氣21(或如圖3中之包含四鹵化矽及三鹵矽烷之混合物21')之四鹵化矽及鹼金屬或鹼土金屬氫化物32引入矽烷反應器30中以根據如下所示反應製造矽烷35及鹵化物鹽37:As described above, the antimony tetrahalide and the alkali metal or alkaline earth metal hydride 32 from the antimony halide raw material gas 21 (or the mixture 21' containing tetrahalide and trihalomethane as shown in FIG. 3) are introduced into the decane reactor 30. The decane 35 and the halide salt 37 were produced according to the reaction shown below:

(4/y)MHy +SiX4 →(4/y)MXy +SiH4  (5)(4/y)MH y +SiX 4 →(4/y)MX y +SiH 4 (5)

3MHy +ySiHX3 →3MXy +ySiH4  (6)3MH y +ySiHX 3 →3MX y +ySiH 4 (6)

其中當M為鹼金屬時y為1,且當M為鹼土金屬時y為2。舉例而言,當M為Na且X為Cl時,反應如下進行,Wherein y is 1 when M is an alkali metal, and y is 2 when M is an alkaline earth metal. For example, when M is Na and X is Cl, the reaction proceeds as follows.

4NaH+SiCl4 →4NaCl+SiH4  (5i)4NaH+SiCl 4 →4NaCl+SiH 4 (5i)

3NaH+SiHCl3 →3NaCl+SiH4  (6i)。3NaH+SiHCl 3 →3NaCl+SiH 4 (6i).

當M為Ba且X為Cl時,反應如下進行,When M is Ba and X is Cl, the reaction proceeds as follows.

2BaH2 +SiCl4 →2BaCl2 +SiH4  (5ii)2BaH 2 +SiCl 4 →2BaCl 2 +SiH 4 (5ii)

3BaH2 +2SiHCl3 →3BaCl2 +2SiH4  (6ii)。3BaH 2 + 2SiHCl 3 → 3BaCl 2 + 2SiH 4 (6ii).

矽烷反應器30可為攪拌槽反應器(例如葉輪攪動)。添加至反應器30中之鹼金屬或鹼土金屬氫化物32可懸浮於一定量製造其(例如藉由使鹼金屬或鹼土金屬與氫氣反應)之溶劑(例如甲苯)中。四鹵化矽及/或三鹵矽烷31可鼓泡穿過氫化物漿料,且較佳以逆流關係鼓泡。添加至反應器30中之氫化物32與添加至反應器中之溶劑之量的重量比可為至少約1:20,且在其他實施例中為至少約1:10或至少約1:5(例如為約1:20至約1:5或約1:20至約2:10)。添加之來自鹵化矽原料氣21(圖1)之四鹵化矽或來自鹵化矽原料氣21'(圖3)之四鹵化物矽及三鹵矽烷可相對於氫化物32成實質上化學計量之比率,其中莫耳比顯示於以上反應(5)至(6ii)中。The decane reactor 30 can be a stirred tank reactor (e.g., impeller agitation). The alkali metal or alkaline earth metal hydride 32 added to the reactor 30 can be suspended in a solvent (e.g., toluene) in which it is produced (e.g., by reacting an alkali metal or alkaline earth metal with hydrogen). The hafnium halide and/or trihalodecane 31 can be bubbled through the hydride slurry and preferably bubbled in a countercurrent relationship. The weight ratio of the amount of hydride 32 added to reactor 30 to the amount of solvent added to the reactor can be at least about 1:20, and in other embodiments at least about 1:10 or at least about 1:5 ( For example, it is from about 1:20 to about 1:5 or from about 1:20 to about 2:10). The tetrahalide ruthenium added from the ruthenium halide feed gas 21 (Fig. 1) or the tetrahalide ruthenium and trihalomethane from the ruthenium halide feed gas 21' (Fig. 3) may be substantially stoichiometric with respect to the hydride 32. Wherein the molar ratio is shown in the above reactions (5) to (6ii).

一定量之催化劑(諸如三乙基鋁)、各種路易斯酸(lewis acid)或痕量鹼金屬(例如雜質路易斯酸,諸如金屬氯化物)可添加至反應器30中。該等催化劑使溫度降低,在此溫度下反應(5)及(6)實現充分轉化且可減少輸入系統中之熱量。在不使用催化劑之實施例中,反應器30之操作溫度可為至少約120℃(例如為約120℃至約225℃或約140℃至約200℃);然而,在使用催化劑之實施例中,反應器30之操作溫度可相對較冷,為至少約30℃(例如為約30℃至約125℃、約40℃至約100℃或約40℃至約80℃)。添加至反應器30中之物質的平均滯留時間可為約5分鐘至約60分鐘。A quantity of a catalyst such as triethylaluminum, various Lewis acids or traces of an alkali metal such as an impurity Lewis acid such as a metal chloride may be added to the reactor 30. The catalysts lower the temperature at which reactions (5) and (6) achieve sufficient conversion and reduce heat in the input system. In embodiments where no catalyst is used, the operating temperature of reactor 30 can be at least about 120 ° C (eg, from about 120 ° C to about 225 ° C or from about 140 ° C to about 200 ° C); however, in embodiments using a catalyst The operating temperature of reactor 30 can be relatively cold, at least about 30 ° C (eg, from about 30 ° C to about 125 ° C, from about 40 ° C to about 100 ° C, or from about 40 ° C to about 80 ° C). The average residence time of the materials added to reactor 30 can range from about 5 minutes to about 60 minutes.

矽烷氣體35可相對較純(例如含有小於約5體積%或甚至小於約2體積%之不為矽烷之化合物)。在自反應器30中移除矽烷氣體35之後,可對矽烷氣體35進行進一步加工。舉例而言,矽烷35可藉由引入一或多個蒸餾塔及/或分子篩中移除雜質,如美國專利第5,211,931號、美國專利第4,554,141號或美國專利第5,206,004號中所揭示,各文獻出所有相關及一致之目的以引用之方式併入本文中,或藉由熟習此項技術者可用之任何其他已知方法來純化(例如移除諸如鹵化硼或鹵化磷之化合物)。The decane gas 35 can be relatively pure (e.g., containing less than about 5% by volume or even less than about 2% by volume of a compound that is not decane). After the decane gas 35 is removed from the reactor 30, the decane gas 35 can be further processed. For example, decane 35 can be removed by the introduction of one or more distillation columns and/or molecular sieves, as disclosed in U.S. Patent No. 5,211,931, U.S. Patent No. 4,554,141, or U.S. Patent No. 5,206,004. All related and consistent objects are incorporated herein by reference or by any other known method available to those skilled in the art (e.g., removal of a compound such as a boron halide or a phosphorus halide).

矽烷氣體35可用以製備多晶矽(例如粒狀或塊狀多晶矽)或可用以製備矽晶圓上之一或多個磊晶層。如熟習此項技術者所瞭解,矽烷氣體可在使用之前儲存及/或運輸。The decane gas 35 can be used to prepare polycrystalline germanium (eg, granular or bulk polycrystalline germanium) or can be used to prepare one or more epitaxial layers on a germanium wafer. As is known to those skilled in the art, the decane gas can be stored and/or transported prior to use.

鹼金屬或鹼土金屬氫化物與鹵化矽原料氣21(或包含三鹵矽烷及四鹵化矽之混合物21')中之四鹵化矽之反應製造鹼金屬或鹼土金屬鹵化物鹽37作為副產物。在使用溶劑之實施例中,鹵化物鹽37可溶解且更通常懸浮於溶劑(例如甲苯)中。鹵化物鹽37可與溶劑分離且進行市售或如下文所進一步描述再循環使用。The alkali metal or alkaline earth metal hydride is reacted with ruthenium tetrahalide in the ruthenium halide feed gas 21 (or a mixture of trihalomethane and ruthenium tetrahalide 21') to produce an alkali metal or alkaline earth metal halide salt 37 as a by-product. In embodiments where a solvent is used, the halide salt 37 is soluble and more typically suspended in a solvent such as toluene. The halide salt 37 can be separated from the solvent and used commercially or recycled as described further below.

用於製造矽烷之實質性閉環方法Substantial closed-loop method for the manufacture of decane

上文所述之方法可併入製造矽烷之實質性閉環方法中。上文方法可為關於鹼金屬或鹼土金屬及/或關於鹵素之閉環。現在參看圖4,鹵化物鹽37可藉由使用分離器40與溶劑分離。分離器40可為蒸發器,或除蒸發器以外或替代蒸發器,可使用其他適合之設備,包括結晶器、基於過濾及/或重力之分離器(例如離心機)。適合之蒸發器包括刮膜式蒸發器。在分離之後,乾燥之鹵化物鹽可加熱(例如至500℃)以移除痕量溶劑。The methods described above can be incorporated into a substantial closed loop process for the manufacture of decane. The above process may be a ring closure with respect to alkali or alkaline earth metals and/or with respect to halogens. Referring now to Figure 4, the halide salt 37 can be separated from the solvent by use of a separator 40. The separator 40 can be an evaporator, or in addition to or instead of the evaporator, other suitable equipment can be used, including crystallizers, filtration and/or gravity based separators (e.g., centrifuges). Suitable evaporators include wiped film evaporators. After separation, the dried halide salt can be heated (eg, to 500 ° C) to remove traces of solvent.

溶劑43可冷凝並再引入氫化物反應器9及/或矽烷反應器30中。分離之鹵化物鹽3可用作電解之原料3,以便鹼金屬或鹼土金屬及/或鹵化物在整個系統中實質上再循環。Solvent 43 can be condensed and reintroduced into hydride reactor 9 and/or decane reactor 30. The separated halide salt 3 can be used as a raw material 3 for electrolysis so that the alkali metal or alkaline earth metal and/or halide is substantially recycled throughout the system.

就此點而言,應瞭解,圖4中所示之實質性閉環方法可經修改以包括鹵化氫燃燒器25以製造如圖3中之含有四鹵化矽及三鹵矽烷之氣體21'。In this regard, it will be appreciated that the substantial closed loop process illustrated in FIG. 4 can be modified to include a hydrogen halide burner 25 to produce a gas 21' comprising a hafnium halide and a trihalodecane as in FIG.

如圖4中所示,該方法為關於鹼金屬或鹼土金屬及關於鹵素之實質性閉環,其中該系統在任何進料流6、31中皆包括鹼金屬或鹼土金屬或鹵素(亦即單獨或以在含鹼金屬或鹼土金屬或鹵素化合物內之形式)且其中在出料流35中不移除鹼金屬或鹼土金屬及鹵素。就此點而言,應瞭解,鹼金屬或鹼土金屬及/或鹵素可自系統中作為雜質移除或可包括在淨化流中且可作為補充流饋入系統或方法中。鹼金屬或鹼土金屬及/或鹵素之任何補充可藉由添加至含有各別元素之化合物系統中達成,且在某些實施例中,藉由各別氫化物鹽本身達成。在多個實施例中,補充至系統中之鹼金屬或鹼土金屬及/或鹵素氣體(其可以鹼金屬或鹼土金屬鹽形式添加)之量小於系統內之總循環之約5%,且在其他實施例中,小於系統內之總循環之約2%(例如為約0.5%至約5%)。As shown in Figure 4, the process is substantially ring closed with respect to alkali or alkaline earth metals and with respect to halogens, wherein the system includes alkali or alkaline earth metals or halogens in any of the feed streams 6, 31 (i.e., alone or The alkali metal or alkaline earth metal and halogen are not removed in the output stream 35 in the form of an alkali metal or alkaline earth metal or halogen compound. In this regard, it will be appreciated that alkali or alkaline earth metals and/or halogens may be removed from the system as impurities or may be included in the purge stream and may be fed into the system or process as a supplemental stream. Any supplementation of an alkali metal or alkaline earth metal and/or halogen can be achieved by addition to a compound system containing individual elements, and in certain embodiments, by the respective hydride salt itself. In various embodiments, the amount of alkali metal or alkaline earth metal and/or halogen gas (which may be added as an alkali metal or alkaline earth metal salt) added to the system is less than about 5% of the total cycle in the system, and in other In embodiments, it is less than about 2% of the total cycle in the system (e.g., from about 0.5% to about 5%).

在本發明之一些實施例中,該系統及方法可為關於氫氣之實質性閉環。舉例而言,如圖5中所示,退出矽烷反應器30之矽烷35可引入多晶反應器50中,較佳在純化移除痕量矽烷、碳化合物、痕量金屬及任何摻雜硼、磷或鋁化合物(例如藉由低溫活性炭吸附器)之後。多晶反應器50可為流體化床(例如製造粒狀多晶矽)或西門子反應器(Siemens reactor)(例如製造塊狀多晶矽)或可合併有適合製造多晶矽之任何其他反應器設計。矽烷根據以下反應熱分解以製造多晶矽:In some embodiments of the invention, the system and method may be a substantial closed loop with respect to hydrogen. For example, as shown in FIG. 5, the decane 35 exiting the decane reactor 30 can be introduced into the polycrystalline reactor 50, preferably to remove traces of decane, carbon compounds, trace metals, and any boron doped, preferably. After the phosphorus or aluminum compound (for example by a low temperature activated carbon adsorber). The polycrystalline reactor 50 can be a fluidized bed (e.g., a granular polycrystalline germanium) or a Siemens reactor (e.g., a bulk polycrystalline germanium) or can be incorporated with any other reactor design suitable for making polycrystalline germanium. The decane is thermally decomposed according to the following reaction to produce polycrystalline germanium:

SiH4 →Si+2H2  (7)SiH 4 →Si+2H 2 (7)

矽烷在添加至多晶反應器50中之前可進行進一步加工,諸如如上所述之各種純化步驟。反應器50之反應產物包括多晶矽52及氫氣31。如圖5中所示,氫氣31引入氫化物反應器9中。氫氣31在引入氫化物反應器9中之前可藉由分離出矽塵及藉由純化(例如蒸餾)進一步加工。如圖5中所示,輸入系統中的僅為矽6且輸出的僅為多晶矽52。該系統為關於氫氣之實質性閉環,其中氫氣僅移除作為雜質或作為淨化流(未圖示)且僅添加作為補充流(未圖示)。The decane may be subjected to further processing prior to addition to the polycrystalline reactor 50, such as various purification steps as described above. The reaction product of reactor 50 includes polycrystalline germanium 52 and hydrogen 31. As shown in FIG. 5, hydrogen gas 31 is introduced into the hydride reactor 9. Hydrogen 31 can be further processed by separation of the dust and by purification (e.g., distillation) prior to introduction into the hydride reactor 9. As shown in FIG. 5, only 矽6 in the input system and only the polysilicon 52 is output. The system is a substantial closed loop with respect to hydrogen where hydrogen is only removed as an impurity or as a purge stream (not shown) and only added as a makeup stream (not shown).

用於製造矽烷之實質性閉環系統Substantial closed-loop system for the manufacture of decane

本發明之方法可在用於製造矽烷之系統中進行,諸如圖1至5中所說明之任一系統。該系統可為關於鹵素、鹼金屬或鹼土金屬及氫氣中之一或多者之實質性閉環。The process of the present invention can be carried out in a system for making decane, such as any of the systems illustrated in Figures 1-5. The system can be a substantial closed loop with respect to one or more of a halogen, an alkali or alkaline earth metal, and hydrogen.

參看圖1,系統可包括用於電解鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體之容器4(例如唐氏池)。鹵素氣體藉由輸送裝置輸送至以下至少一者中:(1)鹵化氫燃燒器25,以與氫氣反應且製造鹵化氫(圖3),及(2)鹵化反應器8,以與矽(其藉由輸送裝置自矽儲存裝置輸送至鹵化反應器8中)反應且製造四鹵化矽。在鹵素氣體反應製造鹵化氫之實施例中,鹵化氫可隨後藉由輸送裝置輸送至鹵化反應器8中以製造包含四鹵化矽及三鹵矽烷之混合物。所製造之任何四鹵化矽及/或三鹵矽烷氣體藉由輸送裝置輸送至矽烷反應器30中。Referring to Figure 1, the system can include a vessel 4 (e.g., Down's tank) for electrolyzing a halide salt to produce a metallic alkali or alkaline earth metal and a halogen gas. The halogen gas is delivered to at least one of: (1) a hydrogen halide burner 25 to react with hydrogen and produce hydrogen halide (FIG. 3), and (2) a halogenation reactor 8 to The reaction is carried out from the helium storage device to the halogenation reactor 8 by means of a transport device to react and produce ruthenium tetrahalide. In the embodiment in which the halogen gas reacts to produce hydrogen halide, the hydrogen halide can then be transported to the halogenation reactor 8 by a transfer device to produce a mixture comprising ruthenium tetrahalide and trihalomethane. Any ruthenium tetrahalide and/or trihalo decane gas produced is delivered to the decane reactor 30 by a transfer device.

系統亦包括氫化物反應器9(例如攪拌槽反應器)。金屬性鹼金屬或鹼土金屬藉由輸送裝置自容器輸送至氫化物反應器9中。氫氣亦藉由輸送裝置輸送至氫化物反應器9中,與金屬性鹼金屬或鹼土金屬反應,製造鹼金屬或鹼土金屬氫化物。系統包括矽烷反應器30(例如攪拌槽反應器),氫化物(視情況存在之任何溶劑)藉由輸送裝置輸送至其中。在矽烷反應器30中,視情況在溶劑存在下,氫化物與四鹵化矽及/或三鹵矽烷氣體反應形成鹵化物鹽。The system also includes a hydride reactor 9 (e.g., a stirred tank reactor). The metallic alkali metal or alkaline earth metal is transported from the vessel to the hydride reactor 9 by means of a conveying device. Hydrogen is also transported to the hydride reactor 9 by means of a transport unit to react with a metallic alkali or alkaline earth metal to produce an alkali metal or alkaline earth metal hydride. The system includes a decane reactor 30 (e.g., a stirred tank reactor) to which a hydride (any solvent, as the case may be) is delivered by a delivery device. In the decane reactor 30, the hydride is reacted with a ruthenium tetrahalide and/or a trihalo decane gas to form a halide salt, optionally in the presence of a solvent.

在多個實施例中且如圖4中所示,溶劑及鹵化物鹽可藉由輸送裝置輸送至用於分離任何溶劑與鹵化物鹽之分離器40中。溶劑可藉由輸送裝置輸送至氫化物反應器9中,且鹵化物鹽可藉由輸送裝置輸送至容器4(例如唐氏池)中以再循環且完成關於鹵素及鹼金屬或鹼土金屬之實質性閉環系統。In various embodiments and as shown in Figure 4, the solvent and halide salts can be delivered by a delivery device to a separator 40 for separating any solvent and halide salts. The solvent can be delivered to the hydride reactor 9 by means of a transport unit, and the halide salt can be transported by means of a transport device to a vessel 4 (for example a Downs cell) for recycling and completion of the substance relating to halogens and alkali or alkaline earth metals. Closed loop system.

在若干其他實施例中,系統亦包括多晶反應器50,其可為西門子型反應器(Siemens-type reactor)或流體化床反應器。矽烷藉由輸送裝置自矽烷反應器30輸送至多晶反應器50以製造氫氣及多晶矽。氫氣可藉由輸送裝置自多晶反應器50輸送至氫化物反應器9中以再循環氫氣且完成關於氫氣之實質性閉環系統。In several other embodiments, the system also includes a polycrystalline reactor 50, which may be a Siemens-type reactor or a fluidized bed reactor. The decane is transported from the decane reactor 30 to the polycrystalline reactor 50 by a transport unit to produce hydrogen and polycrystalline germanium. Hydrogen can be delivered from the polycrystalline reactor 50 to the hydride reactor 9 by a transfer unit to recycle the hydrogen and complete a substantially closed loop system with respect to hydrogen.

適合之輸送裝置在此項技術中為習知且熟知的。適用於轉移氣體之輸送裝置包括例如壓縮機或吹風機,且適用於轉移固體之輸送裝置包括例如拖曳式、螺旋式、帶式及氣動輸送機。就此點而言,應瞭解,本文中使用片語「輸送裝置(conveying apparatus)」不意謂暗示自系統之一個單元直接轉移至另一個單元,而僅為物質藉由任何數目之間接轉移部件及/或機構自一個單元轉移至另一個單元。舉例而言,物質可自一個單元輸送至其他加工單元(例如用於提供連續或分批製程之間的緩衝之純化或儲存單元),隨後輸送至第二單元。在此實例中,包括中間加工設備本身之各輸送單元可被視為「輸送裝置」,且片語「輸送裝置」不應被視為具有限制意義。Suitable delivery devices are well known and well known in the art. Conveying devices suitable for transferring gases include, for example, compressors or blowers, and conveying devices suitable for transferring solids include, for example, towed, spiral, belt, and pneumatic conveyors. In this regard, it should be understood that the phrase "conveying apparatus" is used herein to mean that a unit of the system is transferred directly to another unit, and only the substance is transferred between the parts by any number and/or Or an organization moves from one unit to another. For example, a substance can be delivered from one unit to another processing unit (eg, a purification or storage unit for providing buffering between continuous or batch processes) and subsequently delivered to the second unit. In this example, each of the transport units including the intermediate processing equipment itself can be considered a "conveying device" and the phrase "conveying device" should not be considered limiting.

較佳地,用於製造矽烷之系統中所用之所有設備皆抗環境腐蝕(包括曝露於所用及系統內製造之化合物)。適合構造用物質在本發明領域中為習知且熟知的,且包括例如碳鋼、不鏽鋼、MONEL合金、INCONEL合金、HASTELLOY合金、鎳及非金屬物質,諸如石英(亦即玻璃)及氟化聚合物(諸如TEFLON、KEL-F、VITON、KALREZ及AFLAS)。Preferably, all of the equipment used in the system for making decane is resistant to environmental corrosion (including exposure to the compounds used in the system and manufactured in the system). Suitable materials for construction are well known and well known in the art and include, for example, carbon steel, stainless steel, MONEW alloys, INCONEL alloys, HASTELLOY alloys, nickel and non-metallic materials such as quartz (i.e., glass) and fluorinated polymerization. (such as TEFLON, KEL-F, VITON, KALREZ and AFLAS).

應瞭解,上文所述方法及系統可包括一個以上任何所述單元(例如反應器及/或分離單元),且在不背離本發明範疇之情況下,多個單元可連續及/或並行操作。此外,就此點而言,應瞭解,所述方法及系統為例示性的,且該等方法及系統可包括帶有但不限於其他功能之其他單元。It will be appreciated that the methods and systems described above may include more than one of any of the described units (e.g., reactors and/or separation units), and that multiple units may be operated continuously and/or in parallel without departing from the scope of the invention. . Moreover, in this regard, it should be appreciated that the methods and systems are illustrative, and that the methods and systems can include other elements with, but not limited to, other functions.

當介紹本發明要素或其較佳實施例時,冠詞「一(a)」、「一(an)」、「該(等)(the)」及「該(等)(said)」意欲意謂存在一或多個要素。術語「包含(comprising)」、「包括(including)」及「具有(having)」意欲為包括性的且意謂可存在除列舉要素以外之其他要素。The articles "a", "an", "the", "said" and "said" are intended to mean the elements of the present invention or the preferred embodiments thereof. There are one or more elements. The terms "comprising", "including" and "having" are intended to be inclusive and mean that there are other elements than those listed.

因為在不背離本發明範疇之情況下可對上述裝置及方法進行各種改變,所以意欲以上說明書中所含及附圖中所示之所有事項應被視為例示性的且不具有限制意義。All the matters contained in the above description and the accompanying drawings are to be considered as illustrative and not restrictive.

3...鹵化物鹽/原料3. . . Halide salt / raw material

4...容器4. . . container

6...矽6. . .矽

8...鹵化反應器8. . . Halogenation reactor

9...氫化物反應器9. . . Hydride reactor

14...陽極14. . . anode

15...鹵化物鹽15. . . Halide salt

16...陰極16. . . cathode

17...金屬性鹼金屬或鹼土金屬17. . . Metallic alkali or alkaline earth metal

18...鹵素氣體18. . . Halogen gas

19...分隔物19. . . Separator

20...唐氏池20. . . Down Pool

21...鹵化原料氣/鹵化矽原料氣/鹵化矽原料流twenty one. . . Halogenated feed gas/halogenated germanium feedstock/halogenated germanium feedstock

21'...鹵化原料氣/鹵化矽原料氣/鹵化矽原料流/含有四鹵化矽及/或三鹵矽烷之原料氣/四鹵化矽及/或三鹵矽烷之混合物twenty one'. . . Halogenated feed gas/halogenated ruthenium feed gas/halogenated ruthenium raw material stream/feedstock gas containing tetrahalide ruthenium and/or trihalo decane/mixture of ruthenium tetrahalide and/or trihalo decane

25...鹵化氫燃燒器25. . . Hydrogen halide burner

26...鹵化氫26. . . Hydrogen halide

28...氫氣28. . . hydrogen

30...矽烷反應器30. . . Decane reactor

31...氫氣31. . . hydrogen

32...鹼金屬或鹼土金屬氫化物32. . . Alkali metal or alkaline earth metal hydride

35...矽烷35. . . Decane

37...鹼金屬或鹼土金屬鹵化物鹽37. . . Alkali metal or alkaline earth metal halide salt

40...分離器40. . . Splitter

43...溶劑43. . . Solvent

50...多晶反應器50. . . Polycrystalline reactor

52...多晶矽52. . . Polycrystalline germanium

圖1為用於製造矽烷之系統的示意圖,其涉及根據本發明實施例之鹵化物鹽之電解;1 is a schematic diagram of a system for producing decane, which relates to electrolysis of a halide salt according to an embodiment of the present invention;

圖2為適用於電解鹵化物鹽之唐氏池(Down's cell)之橫截面;Figure 2 is a cross section of a Down's cell suitable for electrolytic halide salts;

圖3為用於製造含有四鹵化矽及三鹵矽烷之鹵化矽原料氣之系統的示意圖;3 is a schematic view of a system for producing a ruthenium halide raw material gas containing ruthenium tetrahalide and trihalo decane;

圖4為根據本發明實施例之用於製造矽烷之實質性閉環系統的示意圖;及4 is a schematic diagram of a substantial closed loop system for making decane in accordance with an embodiment of the present invention;

圖5為根據本發明實施例之用於製造多晶矽之實質性閉環系統之示意圖。Figure 5 is a schematic illustration of a substantially closed loop system for making polysilicon in accordance with an embodiment of the present invention.

3...鹵化物鹽3. . . Halide salt

4...容器4. . . container

6...矽6. . .矽

8...鹵化反應器8. . . Halogenation reactor

9...氫化物反應器9. . . Hydride reactor

17...金屬性鹼金屬或鹼土金屬17. . . Metallic alkali or alkaline earth metal

18...鹵素氣體18. . . Halogen gas

21...鹵化原料氣/鹵化矽原料氣/鹵化矽原料流twenty one. . . Halogenated feed gas/halogenated germanium feedstock/halogenated germanium feedstock

30...矽烷反應器30. . . Decane reactor

31...氫氣31. . . hydrogen

32...鹼金屬或鹼土金屬氫化物32. . . Alkali metal or alkaline earth metal hydride

35...矽烷35. . . Decane

37...鹼金屬或鹼土金屬鹵化物鹽37. . . Alkali metal or alkaline earth metal halide salt

Claims (46)

一種用於在實質性閉環方法中製造矽烷之系統,該系統包含:用於電解鹼金屬或鹼土金屬鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體之容器;用於製造以下至少一者之鹵化反應器:(1)四鹵化矽,及(2)三鹵矽烷;其係藉由使矽與以下至少一者反應來製造:(1)自該容器中排出之鹵素氣體;及(2)藉由使自該容器中排出之鹵素氣體與氫氣接觸所製得之鹵化氫;用於使自該容器中排出之金屬性鹼金屬或鹼土金屬與氫氣反應以製造鹼金屬或鹼土金屬氫化物之氫化物反應器;用於使(1)四鹵化矽及(2)三鹵矽烷中之至少一者與該鹼金屬或鹼土金屬氫化物反應以製造矽烷及鹼金屬或鹼土金屬鹵化物鹽的矽烷反應器,該矽烷反應器為攪拌槽反應器,其中使包含至少一種選自由四鹵化矽及三鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣鼓泡穿過含有溶劑及分散於該溶劑中之鹼金屬或鹼土金屬氫化物之反應混合物,且其中所製得之該鹼金屬或鹼土金屬鹵化物鹽係溶解或懸浮於該溶劑中;及用於分離該溶劑與該鹼金屬或鹼土金屬鹵化物鹽之分 離器。 A system for producing decane in a substantially closed-loop process, the system comprising: a vessel for electrolyzing an alkali metal or alkaline earth metal halide salt to produce a metallic alkali or alkaline earth metal and a halogen gas; for producing at least one of the following Halogenation reactor: (1) ruthenium tetrahalide, and (2) trihalomethane; which is produced by reacting ruthenium with at least one of: (1) a halogen gas discharged from the vessel; 2) a hydrogen halide obtained by contacting a halogen gas discharged from the vessel with hydrogen; for reacting a metallic alkali metal or alkaline earth metal discharged from the vessel with hydrogen to produce an alkali metal or alkaline earth metal hydrogenation a hydride reactor for reacting at least one of (1) ruthenium tetrahalide and (2) trihalomethane with the alkali metal or alkaline earth metal hydride to produce decane and an alkali metal or alkaline earth metal halide salt a decane reactor, wherein the decane reactor is a stirred tank reactor, wherein a halogenated ruthenium raw material gas containing at least one halogenated decane selected from the group consisting of ruthenium tetrahalide and trihalo decane is bubbled through a solvent containing and dispersed therein Solvent a reaction mixture of an alkali metal or an alkaline earth metal hydride, and wherein the alkali metal or alkaline earth metal halide salt obtained therein is dissolved or suspended in the solvent; and is used for isolating the solvent and halogenating the alkali metal or alkaline earth metal Salt of matter Off the device. 如請求項1之系統,其中該容器為電解池。 The system of claim 1, wherein the container is an electrolytic cell. 如請求項1之系統,其中該系統包含用於將自該矽烷反應器中排出之鹼金屬或鹼土金屬鹵化物鹽輸送至該用於電解鹼金屬或鹼土金屬鹵化物鹽之容器的輸送裝置。 The system of claim 1 wherein the system comprises a delivery device for delivering an alkali metal or alkaline earth metal halide salt discharged from the decane reactor to the vessel for electrolyzing an alkali metal or alkaline earth metal halide salt. 如請求項1之系統,其包含用於將自該矽烷反應器中排出之該溶劑及該鹼金屬或鹼土金屬鹵化物鹽輸送至該分離器之輸送裝置及用於將該經分離之鹼金屬或鹼土金屬鹵化物鹽輸送至該用於電解鹼金屬或鹼土金屬鹵化物鹽之容器之輸送裝置。 The system of claim 1 comprising a transport device for delivering the solvent and the alkali metal or alkaline earth metal halide salt discharged from the decane reactor to the separator and for separating the alkali metal Or an alkaline earth metal halide salt is delivered to the delivery device for the vessel for the electrolysis of an alkali metal or alkaline earth metal halide salt. 如請求項1之系統,其包含用於將經分離之溶劑輸送至該氫化物反應器之輸送裝置。 The system of claim 1 comprising a delivery device for delivering the separated solvent to the hydride reactor. 如請求項1之系統,其中該鹵化反應器為流體化床反應器,其中矽係懸浮於包含至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣中。 The system of claim 1 wherein the halogenation reactor is a fluidized bed reactor wherein the lanthanide is suspended in a halodecane comprising at least one selected from the group consisting of ruthenium tetrahalide, trihalodecane, dihalodecane and monohalodecane. In the raw material gas of the antimony halide. 如請求項1之系統,其中該氫化物反應器為攪拌槽反應器,其中使氫氣鼓泡穿過含有溶劑及金屬性鹼金屬或鹼土金屬之反應混合物,以製造懸浮於該溶劑中之鹼金屬或鹼土金屬氫化物。 The system of claim 1, wherein the hydride reactor is a stirred tank reactor, wherein hydrogen gas is bubbled through a reaction mixture containing a solvent and a metallic alkali metal or alkaline earth metal to produce an alkali metal suspended in the solvent. Or alkaline earth metal hydride. 如請求項7之系統,其包含用於將鹼金屬或鹼土金屬氫化物及溶劑自該氫化物反應器輸送至該矽烷反應器之輸送裝置。 A system according to claim 7 which comprises a transport means for transporting an alkali metal or alkaline earth metal hydride and a solvent from the hydride reactor to the decane reactor. 如請求項1之系統,其中該系統包含用於分解矽烷以製 造氫氣及多晶矽之多晶矽反應器。 The system of claim 1, wherein the system comprises a method for decomposing decane A polycrystalline germanium reactor for hydrogen and polycrystalline germanium. 如請求項9之系統,其中該多晶矽反應器為流體化床反應器,其中矽烷使多晶矽粒子流體化。 The system of claim 9, wherein the polycrystalline germanium reactor is a fluidized bed reactor, wherein the decane fluidizes the polycrystalline germanium particles. 如請求項9之系統,其中該系統包含用於將氫氣自該多晶矽反應器輸送至該氫化物反應器之輸送裝置。 The system of claim 9, wherein the system comprises a delivery device for delivering hydrogen from the polycrystalline ruthenium reactor to the hydride reactor. 如請求項9之系統,其中該系統包含用於將矽烷自該矽烷反應器輸送至該多晶矽反應器之輸送裝置。 The system of claim 9, wherein the system comprises a delivery device for delivering decane from the decane reactor to the polycrystalline ruthenium reactor. 如請求項1之系統,其包含用於將自該用於電解鹼金屬或鹼土金屬鹵化物鹽之容器中排出之金屬性鹼金屬或鹼土金屬輸送至該氫化物反應器之輸送裝置。 A system according to claim 1, which comprises a conveying means for conveying a metallic alkali metal or alkaline earth metal discharged from the vessel for electrolyzing an alkali metal or alkaline earth metal halide salt to the hydride reactor. 如請求項1之系統,其包含用於將自該用於電解鹼金屬或鹼土金屬鹽之容器中排出之鹵素氣體輸送至該鹵化反應器之輸送裝置。 A system according to claim 1, which comprises a conveying means for conveying a halogen gas discharged from the vessel for electrolyzing an alkali metal or alkaline earth metal salt to the halogenation reactor. 如請求項1之系統,其包含用於將(1)四鹵化矽及(2)三鹵矽烷中之至少一者自該鹵化反應器輸送至該矽烷反應器之輸送裝置。 The system of claim 1 comprising a transport apparatus for transporting at least one of (1) ruthenium tetrahalide and (2) trihalo decane from the halogenation reactor to the decane reactor. 如請求項1之系統,其包含使氫氣與鹵素氣體反應以製造鹵化氫之鹵化氫燃燒器。 A system according to claim 1, which comprises a hydrogen halide burner which reacts hydrogen with a halogen gas to produce a hydrogen halide. 如請求項16之系統,其包含用於將鹵化氫輸送至該鹵化反應器之輸送裝置。 The system of claim 16 comprising a delivery device for delivering hydrogen halide to the halogenation reactor. 如請求項16之系統,其包含用於將自該用於電解鹼金屬或鹼土金屬鹽之容器中排出之鹵素氣體輸送至該鹵化氫燃燒器之輸送裝置。 A system according to claim 16, which comprises a conveying means for conveying a halogen gas discharged from the vessel for electrolyzing an alkali metal or alkaline earth metal salt to the hydrogen halide burner. 如請求項1之系統,其包含矽儲存裝置及用於將矽輸送 至該鹵化反應器之輸送裝置。 The system of claim 1, comprising a helium storage device and for transporting helium To the delivery device of the halogenation reactor. 如請求項1之系統,其中該系統為關於氫氣之實質性閉環。 The system of claim 1, wherein the system is a substantially closed loop with respect to hydrogen. 如請求項1之系統,其中該系統為關於鹵素之實質性閉環。 A system as claimed in claim 1, wherein the system is a substantially closed loop with respect to halogen. 如請求項1之系統,其中該系統為關於鹼金屬或鹼土金屬之實質性閉環。 The system of claim 1 wherein the system is a substantially closed loop with respect to an alkali metal or alkaline earth metal. 如請求項1之系統,其包含用於由(1)四鹵化矽及(2)三鹵矽烷中之至少一者製造單鹵矽烷或二鹵矽烷之歧化系統。 A system according to claim 1, which comprises a disproportionation system for producing a monohalodecane or a dihalodecane from at least one of (1) ruthenium tetrahalide and (2) trihalomethane. 一種用於在實質性閉環方法中製造矽烷之系統,該系統為關於氫氣之實質性閉環,該系統包含:用於電解鹼金屬或鹼土金屬鹵化物鹽以製造金屬性鹼金屬或鹼土金屬及鹵素氣體之容器;用於製造以下至少一者之鹵化反應器:(1)四鹵化矽,及(2)三鹵矽烷;其係藉由使矽與以下至少一者反應來製造:(1)自該容器中排出之鹵素氣體;及(2)藉由使自該容器中排出之鹵素氣體與氫氣接觸所製得之鹵化氫;用於使自該容器中排出之金屬性鹼金屬或鹼土金屬與氫氣反應以製造鹼金屬或鹼土金屬氫化物之氫化物反應器;及 用於使(1)四鹵化矽及(2)三鹵矽烷中之至少一者與該鹼金屬或鹼土金屬氫化物反應以製造矽烷及鹼金屬或鹼土金屬鹵化物鹽的矽烷反應器。 A system for the manufacture of decane in a substantially closed-loop process, the system being a substantially closed ring of hydrogen, the system comprising: for the electrolysis of an alkali or alkaline earth metal halide salt to produce a metallic alkali or alkaline earth metal and a halogen a gas container; a halogenation reactor for producing at least one of: (1) antimony tetrahalide, and (2) trihalodecane; which are produced by reacting rhodium with at least one of: (1) a halogen gas discharged from the container; and (2) a hydrogen halide obtained by contacting a halogen gas discharged from the container with hydrogen; a metal alkali metal or alkaline earth metal for discharging the container a hydrogenation reactor for the production of an alkali metal or alkaline earth metal hydride; A decane reactor for reacting at least one of (1) ruthenium tetrahalide and (2) trihalomethane with the alkali metal or alkaline earth metal hydride to produce decane and an alkali metal or alkaline earth metal halide salt. 如請求項24之系統,其中該容器為電解池。 The system of claim 24, wherein the container is an electrolytic cell. 如請求項24之系統,其中該系統包含用於將自該矽烷反應器中排出之鹼金屬或鹼土金屬鹵化物鹽輸送至該用於電解鹼金屬或鹼土金屬鹵化物鹽之容器的輸送裝置。 The system of claim 24, wherein the system comprises a delivery device for delivering an alkali metal or alkaline earth metal halide salt discharged from the decane reactor to the vessel for electrolyzing an alkali metal or alkaline earth metal halide salt. 如請求項24之系統,其中該矽烷反應器為攪拌槽反應器,其中使包含至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣鼓泡穿過含有溶劑及分散於該溶劑中之鹼金屬或鹼土金屬氫化物之反應混合物,且其中所製得之該鹼金屬或鹼土金屬鹵化物鹽係溶解或懸浮於該溶劑中。 The system of claim 24, wherein the decane reactor is a stirred tank reactor, wherein a halogenated ruthenium halide material comprising at least one halogenated decane selected from the group consisting of ruthenium tetrahalide, trihalo decane, dihalo decane, and monohalo decane is used. The gas is bubbled through a reaction mixture containing a solvent and an alkali metal or alkaline earth metal hydride dispersed in the solvent, and the alkali metal or alkaline earth metal halide salt obtained therein is dissolved or suspended in the solvent. 如請求項27之系統,其包含:用於分離該溶劑與該鹼金屬或鹼土金屬鹵化物鹽之分離器;及用於將自該矽烷反應器中排出之該溶劑及該鹼金屬或鹼土金屬鹵化物鹽輸送至該分離器之輸送裝置,及用於將該經分離之鹼金屬或鹼土金屬鹵化物鹽輸送至該用於電解鹼金屬或鹼土金屬鹵化物鹽之容器之輸送裝置。 The system of claim 27, comprising: a separator for separating the solvent from the alkali metal or alkaline earth metal halide salt; and the solvent and the alkali metal or alkaline earth metal for discharging the decane reactor A delivery device for delivering a halide salt to the separator, and a delivery device for delivering the separated alkali metal or alkaline earth metal halide salt to the vessel for electrolyzing an alkali metal or alkaline earth metal halide salt. 如請求項27之系統,其包含:用於分離該溶劑與該鹼金屬或鹼土金屬鹵化物鹽之分離器;及用於將經分離之溶劑輸送至該氫化物反應器之輸送裝 置。 The system of claim 27, comprising: a separator for separating the solvent from the alkali metal or alkaline earth metal halide salt; and a transport device for transporting the separated solvent to the hydride reactor Set. 如請求項24之系統,其中該鹵化反應器為流體化床反應器,其中矽係懸浮於包含至少一種選自由四鹵化矽、三鹵矽烷、二鹵矽烷及單鹵矽烷組成之群的鹵矽烷之鹵化矽原料氣中。 The system of claim 24, wherein the halogenation reactor is a fluidized bed reactor, wherein the lanthanide is suspended in a halodecane comprising at least one selected from the group consisting of ruthenium tetrahalide, trihalo decane, dihalo decane, and monohalo decane. In the raw material gas of the antimony halide. 如請求項24之系統,其中該氫化物反應器為攪拌槽反應器,其中使氫氣鼓泡穿過含有溶劑及金屬性鹼金屬或鹼土金屬之反應混合物,以製造懸浮於該溶劑中之鹼金屬或鹼土金屬氫化物。 The system of claim 24, wherein the hydride reactor is a stirred tank reactor in which hydrogen gas is bubbled through a reaction mixture containing a solvent and a metallic alkali metal or alkaline earth metal to produce an alkali metal suspended in the solvent. Or alkaline earth metal hydride. 如請求項31之系統,其包含用於將鹼金屬或鹼土金屬氫化物及溶劑自該氫化物反應器輸送至該矽烷反應器之輸送裝置。 The system of claim 31, comprising a delivery device for delivering an alkali metal or alkaline earth metal hydride and a solvent from the hydride reactor to the decane reactor. 如請求項24之系統,其中該系統包含用於分解矽烷以製造氫氣及多晶矽之多晶矽反應器。 The system of claim 24, wherein the system comprises a polycrystalline germanium reactor for decomposing decane to produce hydrogen and polycrystalline germanium. 如請求項33之系統,其中該多晶矽反應器為流體化床反應器,其中矽烷使多晶矽粒子流體化。 The system of claim 33, wherein the polycrystalline germanium reactor is a fluidized bed reactor, wherein the decane fluidizes the polycrystalline germanium particles. 如請求項33之系統,其中該系統包含用於將氫氣自該多晶矽反應器輸送至該氫化物反應器之輸送裝置。 The system of claim 33, wherein the system comprises a delivery device for delivering hydrogen from the polycrystalline ruthenium reactor to the hydride reactor. 如請求項33之系統,其中該系統包含用於將矽烷自該矽烷反應器輸送至該多晶矽反應器之輸送裝置。 The system of claim 33, wherein the system comprises a delivery device for delivering decane from the decane reactor to the polycrystalline ruthenium reactor. 如請求項24之系統,其包含用於將自該用於電解鹼金屬或鹼土金屬鹵化物鹽之容器中排出之金屬性鹼金屬或鹼土金屬輸送至該氫化物反應器之輸送裝置。 The system of claim 24, comprising a delivery device for delivering a metallic alkali or alkaline earth metal discharged from the vessel for electrolyzing an alkali metal or alkaline earth metal halide salt to the hydride reactor. 如請求項24之系統,其包含用於將自該用於電解鹼金屬 或鹼土金屬鹽之容器中排出之鹵素氣體輸送至該鹵化反應器之輸送裝置。 The system of claim 24, comprising: for use in electrolyzing an alkali metal The halogen gas discharged from the container of the alkaline earth metal salt is supplied to the conveying device of the halogenation reactor. 如請求項24之系統,其包含用於將(1)四鹵化矽及(2)三鹵矽烷中之至少一者自該鹵化反應器輸送至該矽烷反應器之輸送裝置。 The system of claim 24, comprising a transport device for transporting at least one of (1) ruthenium tetrahalide and (2) trihalodecane from the halogenation reactor to the decane reactor. 如請求項24之系統,其包含使氫氣與鹵素氣體反應以製造鹵化氫之鹵化氫燃燒器。 The system of claim 24, comprising a hydrogen halide burner that reacts hydrogen with a halogen gas to produce a hydrogen halide. 如請求項40之系統,其包含用於將鹵化氫輸送至該鹵化反應器之輸送裝置。 A system of claim 40, comprising a delivery device for delivering hydrogen halide to the halogenation reactor. 如請求項40之系統,其包含用於將自該用於電解鹼金屬或鹼土金屬鹽之容器中排出之鹵素氣體輸送至該鹵化氫燃燒器之輸送裝置。 The system of claim 40, comprising a delivery device for delivering a halogen gas discharged from the vessel for electrolyzing an alkali metal or alkaline earth metal salt to the hydrogen halide burner. 如請求項24之系統,其包含矽儲存裝置及用於將矽輸送至該鹵化反應器之輸送裝置。 The system of claim 24, comprising a helium storage device and a transport device for transporting helium to the halogenation reactor. 如請求項24之系統,其中該系統為關於鹵素之實質性閉環。 The system of claim 24, wherein the system is a substantially closed loop with respect to halogen. 如請求項24之系統,其中該系統為關於鹼金屬或鹼土金屬之實質性閉環。 The system of claim 24, wherein the system is a substantially closed loop with respect to an alkali metal or alkaline earth metal. 如請求項24之系統,其包含用於由(1)四鹵化矽及(2)三鹵矽烷中之至少一者製造單鹵矽烷或二鹵矽烷之歧化系統。 The system of claim 24, comprising a disproportionation system for producing a monohalodecane or a dihalodecane from at least one of (1) ruthenium tetrahalide and (2) trihalodecane.
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