TWI428689B - Manufacturing methods of photomask and microstructure by using laser dragging process, and microstructure - Google Patents

Manufacturing methods of photomask and microstructure by using laser dragging process, and microstructure Download PDF

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TWI428689B
TWI428689B TW100127598A TW100127598A TWI428689B TW I428689 B TWI428689 B TW I428689B TW 100127598 A TW100127598 A TW 100127598A TW 100127598 A TW100127598 A TW 100127598A TW I428689 B TWI428689 B TW I428689B
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microstructure
reticle
substrate
manufacturing
determining
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TW201307992A (en
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Yung Chun Lee
Chi Cheng Chiu
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Univ Nat Cheng Kung
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應用雷射拖拉法之光罩與立體微結構的製造方法與立體微結構Photomask and three-dimensional microstructure manufacturing method and stereo microstructure using laser drag method

本發明係關於一種光罩與立體微結構的製造方法,特別關於一種應用雷射拖拉法之光罩與立體微結構的製造方法。The invention relates to a method for manufacturing a reticle and a three-dimensional microstructure, in particular to a method for manufacturing a reticle and a three-dimensional microstructure using a laser drag method.

雷射拖拉微細加工法採用光罩投射技術搭配精密移動平台,讓光罩上的圖形在基板表面上做不同方向以及深度的疊加,製作出各式各樣的立體微結構。雷射拖拉微細加工法可快速且大量的製作出立體微結構,其立體結構的形狀完全依靠光罩上的透光形貌決定,因此光罩的設計乃是拖拉法中最關鍵的一環。The laser drag micro-machining method uses a reticle projection technology with a precision moving platform to make the patterns on the reticle superimpose in different directions and depths on the surface of the substrate to produce a variety of three-dimensional microstructures. The laser drag micro-machining method can quickly and massively produce a three-dimensional microstructure, and the shape of the three-dimensional structure is completely determined by the light-transmissive shape on the reticle, so the design of the reticle is the most critical part of the drag method.

雷射拖拉法最常被使用在製作微透鏡陣列,但多數研究學者皆以二次式曲線定義光罩形貌,且採用的拖拉維度僅為正交二次拖拉,所製作出的微透鏡結構皆為非對稱性且形貌並不能被準確預測,因而無法使用於精密的光學產業中。亦即,現有的技術無法準確的定義出所製作的結構形貌,且無法預測出較複雜的微結構。因此,若是要製作出期望的立體微結構且軸對稱,則必須依靠修正光罩圖形才能達到符合期望的微結構,如此一來才可以增加雷射拖拉法在光電產業中的應用的機會。Laser dragging is most commonly used in the fabrication of microlens arrays, but most researchers have defined the reticle topography with a quadratic curve, and the drag dimension used is only orthogonal secondary drag, the resulting microlens structure Both are asymmetrical and topographical and cannot be accurately predicted, so they cannot be used in the sophisticated optical industry. That is to say, the existing technology cannot accurately define the structural morphology produced, and it is impossible to predict a more complicated microstructure. Therefore, if the desired three-dimensional microstructure is to be produced and the axis is symmetrical, the reticle pattern must be corrected to achieve the desired microstructure, so that the opportunity of the laser drag method in the optoelectronic industry can be increased.

因此,如何提供一種應用雷射拖拉法之光罩與立體微結構的製造方法,能夠正確的修正光罩圖形就能製造出所期望的立體微結構,實為業界當前重要課題之一。Therefore, how to provide a method for manufacturing a reticle and a three-dimensional microstructure using a laser drag method can accurately correct a reticle pattern to produce a desired three-dimensional microstructure, which is one of the current important topics in the industry.

有鑑於上述課題,本發明之目的為提供一種能夠修正光罩圖形就能製造出所期望的立體微結構之光罩與立體微結構的製造方法。In view of the above problems, it is an object of the present invention to provide a method of manufacturing a photomask and a three-dimensional microstructure capable of producing a desired three-dimensional microstructure by correcting a mask pattern.

為達上述目的,依據本發明之一種應用雷射拖拉法之光罩的製造方法包含:一移動決定步驟,係決定一機台使一基板相對至少一光罩移動之方向及次數;一微結構決定步驟,係決定一立體微結構於該基板上之外貌特徵;一分析步驟,係依據該方向、次數以及該外貌特徵,使用一數值分析方法計算得到該光罩之特徵;以及一生產步驟,係依據該光罩之特徵製造出該光罩。In order to achieve the above object, a method for manufacturing a reticle using a laser drag method according to the present invention comprises: a movement determining step of determining a direction and a number of times a substrate moves a substrate relative to at least one reticle; Determining a step of determining a feature of a stereoscopic microstructure on the substrate; an analysis step of calculating a feature of the reticle using a numerical analysis method according to the direction, the number of times, and the appearance feature; and a production step, The reticle is fabricated according to the characteristics of the reticle.

在一實施例中,於移動決定步驟中,機台使基板相對光罩依據至少二方向移動,且該等方向係呈正交或夾一角度。In an embodiment, in the moving determining step, the machine moves the substrate relative to the reticle according to at least two directions, and the directions are orthogonal or at an angle.

在一實施例中,於移動決定步驟中,機台使基板相對光罩移動至少二次。In one embodiment, in the movement determining step, the machine moves the substrate relative to the mask at least twice.

在一實施例中,於移動決定步驟中,機台使基板相對複數光罩依據至少一方向移動。In an embodiment, in the moving determining step, the machine moves the substrate relative to the plurality of masks in accordance with at least one direction.

在一實施例中,於移動決定步驟中,機台使基板相對複數光罩移動至少一次。In one embodiment, in the movement determining step, the machine moves the substrate relative to the plurality of reticle at least once.

在一實施例中,立體微結構之外貌特徵為橢圓、圓錐、角錐、非對稱、軸對稱、立角最密堆積或其他外貌。In one embodiment, the stereoscopic microstructure features are elliptical, conical, pyramidal, asymmetrical, axisymmetric, clumped, or other appearance.

在一實施例中,數值分析方法包含單形法(simplex method)。In an embodiment, the numerical analysis method comprises a simplex method.

在一實施例中,外貌特徵係由一方程式表現。In one embodiment, the appearance features are represented by one program.

在一實施例中,製造方法更包含一雷射光決定步驟,其係決定一雷射光之強度與照射時間,並且於分析步驟中,更依據雷射光之強度與照射時間,使用數值分析方法計算得到光罩之特徵。In an embodiment, the manufacturing method further comprises a laser light determining step of determining the intensity and the irradiation time of the laser light, and in the analyzing step, calculating the intensity and the irradiation time of the laser light using a numerical analysis method. The characteristics of the reticle.

為達上述目的,依據本發明之一種應用雷射拖拉法之立體微結構的製造方法包含:一移動決定步驟,係決定一機台使一基板相對至少一光罩移動之方向及次數;一微結構決定步驟,係決定一立體微結構於基板上之外貌特徵;一分析步驟,係依據該方向、次數以及該外貌特徵,使用一數值分析方法計算得到該光罩之特徵;一生產步驟,係依據該光罩之特徵製造出光罩;將該基板設置於該機台上;將該光罩設置於該基板上;以及藉由該機台使該基板沿移動決定步驟中所決定之方向及次數依序移動,在移動過程中,使一雷射光經過該光罩而照射該基板,藉由上述雷射光的疊加作用而在基板上產生該立體微結構。In order to achieve the above object, a method for manufacturing a three-dimensional microstructure using a laser drag method according to the present invention comprises: a movement determining step of determining a direction and a number of times a substrate moves a substrate relative to at least one mask; The structure determining step determines the appearance characteristics of a three-dimensional microstructure on the substrate; an analysis step is based on the direction, the number of times, and the appearance feature, using a numerical analysis method to calculate the characteristics of the mask; a production step, Manufacturing a reticle according to the characteristics of the reticle; disposing the substrate on the machine; arranging the reticle on the substrate; and determining the direction and number of times determined by the substrate along the movement determining step by the machine Moving in sequence, during the movement, a laser beam is irradiated through the reticle to illuminate the substrate, and the stereoscopic microstructure is generated on the substrate by the superposition of the laser light.

為達上述目的,依據本發明之一種應用上述製造方法所製出之立體微結構係可為軸對稱微結構,例如為子彈型或饅頭型軸對稱微結構。To achieve the above object, a three-dimensional microstructure obtained by applying the above manufacturing method according to the present invention may be an axisymmetric microstructure, such as a bullet type or a head type axisymmetric microstructure.

為達上述目的,依據本發明之一種應用上述製造方法所製出之立體微結構係為多面體微結構,例如為六面體角柱微結構、多層次角柱微結構或多層次曲面微結構。To achieve the above object, a three-dimensional microstructure obtained by applying the above manufacturing method according to the present invention is a polyhedral microstructure, such as a hexahedral pyramid microstructure, a multi-layer pyramid microstructure or a multi-layer curved microstructure.

承上所述,在本發明之光罩的製造方法中,與傳統作法不同,本發明先決定一機台使一基板相對至少一光罩移動之方向及次數,並決定一立體微結構於該基板上之外貌特徵,再使用一數值分析方法,依據上述方向、次數以及外貌特徵而計算得到光罩之特徵,然後再依據該光罩之特徵製造出該光罩。如此,在光罩製造出來之後,只要依照先前所決定的參數,讓該機台使該基板沿移動決定步驟中所決定之方向及次數依序移動,在移動過程中,使一雷射光經過該光罩而照射該基板,藉由上述雷射光的疊加作用而可在基板上產生該立體微結構,即預期的立體微結構。As described above, in the manufacturing method of the reticle of the present invention, unlike the conventional method, the present invention first determines the direction and the number of times a substrate moves relative to at least one reticle, and determines a stereoscopic microstructure. The appearance features on the substrate are then calculated using a numerical analysis method based on the above-mentioned directions, times, and appearance features, and then the mask is fabricated according to the characteristics of the mask. In this way, after the reticle is manufactured, the machine is caused to move the substrate in the direction and the number of times determined in the movement determining step according to the previously determined parameters, and a laser beam is passed through during the moving process. The photomask illuminates the substrate, and the stereoscopic microstructure, that is, the expected three-dimensional microstructure, can be produced on the substrate by the superposition of the above-mentioned laser light.

此外,透過本發明也可以將結構的複雜度增加,加工出橢圓、圓錐、角錐、甚至是對稱或非對稱性的複雜立體微結構。此外,本發明更可將拖拉的維度增加,例如採用三次拖拉,如此一來,使得光罩透光區域有更多維度疊加來進行雷射加工,製作出六角最密堆積的微型結構,使得結構的填充率能夠增加,關鍵的是,可以加工出所期望得到的結構形貌,因而創造出極大的經濟價值。In addition, the complexity of the structure can be increased by the present invention to process elliptical, conical, pyramidal, or even complex three-dimensional microstructures of symmetry or asymmetry. In addition, the invention can increase the dimension of the dragging, for example, by three times of pulling, so that the light transmissive area of the reticle is superimposed in more dimensions for laser processing, and the micro-structure of the hexagonal closest packing is fabricated, so that the structure The filling rate can be increased, and the key is that the desired structural morphology can be processed, thus creating great economic value.

以下將參照相關圖式,說明依本發明較佳實施例之一種應用雷射拖拉法之光罩與立體微結構的製造方法,其中相同的元件將以相同的參照符號加以說明。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method of manufacturing a reticle and a three-dimensional microstructure using a laser drag method according to a preferred embodiment of the present invention will be described with reference to the accompanying drawings, wherein the same elements will be described with the same reference numerals.

圖1為本發明較佳實施例之一種應用雷射拖拉法之光罩的製造方法的步驟示意圖,其包含步驟S01至S04。圖2為本發明較佳實施例之光罩的製造方法的假想情境示意圖。於此先簡述一下,雷射拖拉法(laser dragging process,LDP)係採用光罩投射技術搭配精密移動平台,讓光罩上的圖形在基板表面上做不同方向以及深度的疊加,而能製作出各式各樣的立體微結構。立體微結構例如為透鏡或其他導光元件。請參照圖1與圖2所示,以說明本發明較佳實施例之光罩的製造方法。1 is a schematic diagram showing the steps of a method for manufacturing a reticle using a laser drag method according to a preferred embodiment of the present invention, which includes steps S01 to S04. 2 is a schematic diagram showing a hypothetical situation of a method of manufacturing a reticle according to a preferred embodiment of the present invention. Briefly described here, the laser dragging process (LDP) uses a reticle projection technique with a precision moving platform to allow the graphics on the reticle to be superimposed in different directions and depths on the substrate surface. A variety of three-dimensional microstructures. The three-dimensional microstructure is, for example, a lens or other light guiding element. Please refer to FIG. 1 and FIG. 2 for explaining a method of manufacturing a photomask according to a preferred embodiment of the present invention.

首先,步驟S01係一移動決定步驟,係決定一機台101使一基板102相對至少一光罩103移動之方向及次數。於此,事先決定基板102相對光罩103移動之方向及次數。基板102可在機台101上沿XY平面移動,機台101可使基板102相對光罩103依據單一方向或至少二方向移動,且該等方向係呈正交或夾一角度。例如,機台101使基板102先沿X軸方向移動,再沿Y軸方向移動,此為二次拖拉;或者,機台101使基板102先沿X軸方向移動,再往逆時針方向偏60度之方向移動,再往逆時針方向偏60度之方向移動,此為三次拖拉。當然,本實施例可應用四次拖拉、五次拖拉…等等。First, step S01 is a movement determining step of determining the direction and number of times a substrate 101 moves a substrate 102 relative to at least one of the masks 103. Here, the direction and number of times the substrate 102 moves relative to the mask 103 are determined in advance. The substrate 102 can be moved along the XY plane on the machine table 101. The machine table 101 can move the substrate 102 relative to the reticle 103 according to a single direction or at least two directions, and the directions are orthogonal or at an angle. For example, the machine 101 moves the substrate 102 first in the X-axis direction and then in the Y-axis direction, which is a secondary drag; or the machine 101 moves the substrate 102 first in the X-axis direction and then in the counterclockwise direction 60. Move in the direction of the degree and move it in the direction of 60 degrees counterclockwise. This is three times of dragging. Of course, this embodiment can apply four times of dragging, five times of dragging, and the like.

步驟S02係一微結構決定步驟,係決定一立體微結構(圖未顯示)於基板102上之外貌特徵。在此步驟中,立體微結構尚未實際形成於基板102,只是製造者所預期的立體微結構。本發明不限制立體微結構的外貌特徵,其可例如橢圓、圓錐、角錐、非對稱、軸對稱、立角最密堆積或其他。外貌特徵可由至少一方程式表現。Step S02 is a microstructure determining step of determining a three-dimensional microstructure (not shown) on the substrate 102. In this step, the stereomicrostructure has not actually been formed on the substrate 102, but is a stereoscopic microstructure that the manufacturer desires. The present invention does not limit the topographical features of the three-dimensional microstructures, which may be, for example, elliptical, conical, pyramidal, asymmetrical, axisymmetric, clumped, or other closely packed or otherwise. Appearance features can be represented by at least one program.

步驟S03係一分析步驟,係依據該方向、次數以及外貌特徵,使用一數值分析方法計算得到該光罩之特徵。在上述之決定步驟之後,已設定基板移動之方向、次數以及所要產生之立體微結構的外貌特徵。藉由數值分析方法可計算得到所需光罩之特徵。本發明不特別限制數值分析方法的種類,例如可使用單形法(simplex method)。光罩之特徵可例如由至少一方程式表現。Step S03 is an analysis step of calculating the characteristics of the reticle by using a numerical analysis method according to the direction, the number of times, and the appearance characteristics. After the above-described decision step, the direction, the number of times the substrate is moved, and the appearance of the three-dimensional microstructure to be produced are set. The characteristics of the desired mask can be calculated by numerical analysis. The present invention does not particularly limit the kind of the numerical analysis method, and for example, a simplex method can be used. The features of the reticle can be represented, for example, by at least one program.

步驟S04係一生產步驟,係依據光罩之特徵製造出該光罩。在求得光罩之特徵之後,即可依據該特徵而製造出所需光罩。光罩之特徵可例如簡化為方程式之參數解。Step S04 is a production step of fabricating the reticle according to the characteristics of the reticle. After the features of the reticle are determined, the desired reticle can be fabricated in accordance with this feature. The features of the reticle can for example be reduced to a parametric solution of the equation.

由於本發明係利用數值分析方法,在一些預設的條件下來求解光罩之特徵,因此本發明可應用於較複雜的情況。除了可應用於多次方向以及多次拖拉之外,本發明亦可應用於多個光罩的情況。即在該移動決定步驟中,機台使基板相對複數光罩依據至少一方向移動、或相對複數光罩移動至少一次。如圖3所示,在一移動決定步驟中,可決定機台使基板相對光罩104移動之方向及次數,並決定機台使基板相對另一光罩105移動之方向及次數。然後在分析步驟中,即可求解出光罩104、105之特徵。Since the present invention utilizes a numerical analysis method to solve the characteristics of the reticle under some predetermined conditions, the present invention can be applied to a more complicated situation. In addition to being applicable to multiple directions and multiple drags, the present invention is also applicable to the case of multiple masks. That is, in the movement determining step, the machine moves the substrate relative to the plurality of masks in accordance with at least one direction or at least once relative to the plurality of masks. As shown in FIG. 3, in a movement determining step, the direction and number of times the machine moves the substrate relative to the mask 104 can be determined, and the direction and number of times the table moves the substrate relative to the other mask 105 can be determined. Then, in the analysis step, the features of the reticle 104, 105 can be solved.

此外,製造方法可更包含一雷射光決定步驟,係決定一雷射光之強度與照射時間,並且於該分析步驟中,更依據雷射光之強度與照射時間,使用數值分析方法計算得到該光罩之特徵。由於雷射光之強度與照射時間的變化,亦會影響所產生之立體微結構之特徵。據此,本實施例亦可事先設定雷射光之強度與照射時間,並使數值分析方法依據雷射光之強度與照射時間、基板移動次數、方向計算得到該光罩之特徵。In addition, the manufacturing method may further include a laser light determining step of determining the intensity of the laser light and the irradiation time, and in the analyzing step, calculating the mask by using a numerical analysis method according to the intensity of the laser light and the irradiation time. Characteristics. Due to variations in the intensity of the laser light and the illumination time, the characteristics of the resulting three-dimensional microstructure are also affected. Accordingly, in this embodiment, the intensity of the laser light and the irradiation time can be set in advance, and the numerical analysis method can calculate the characteristics of the reticle according to the intensity of the laser light, the irradiation time, the number of times of substrate movement, and the direction.

藉由上述本實施例之光罩之製造方法,即可針對預期之立體微結構製造出所需光罩或多個光罩。在製造出光罩之後,即可使用光罩來生產立體微結構。立體微結構的製造方法包含藉由該機台使該基板沿該移動決定步驟中所決定之方向及次數依序移動,在移動過程中,使一雷射光經過該光罩而照射該基板,藉由上述雷射光的疊加作用而在該基板上產生該立體微結構。在立體微結構的製造方法中,基板係按照之前決定步驟所決定的次數、方向來移動,如此,藉由雷射光的疊加作用即可製造出預期的立體微結構。With the above manufacturing method of the reticle of the present embodiment, a desired reticle or a plurality of reticle can be manufactured for the intended three-dimensional microstructure. After the reticle is manufactured, the reticle can be used to produce a three-dimensional microstructure. The method for manufacturing a three-dimensional microstructure includes sequentially moving the substrate along a direction and a number of times determined by the movement determining step, and moving a laser beam through the mask to illuminate the substrate during the moving process. The three-dimensional microstructure is produced on the substrate by the superposition of the above-described laser light. In the method of manufacturing a three-dimensional microstructure, the substrate is moved in accordance with the number and direction determined by the previous determination step, so that the desired three-dimensional microstructure can be produced by the superposition of the laser light.

當然,若移動決定步驟中有考慮到多個光罩的情況(如圖3所示),則在立體微結構的製造方法中需更換對應的光罩。另外,若考慮到雷射光之強度與照射時間,則在立體微結構的製造方法中需依據雷射光之強度與照射時間來調整雷射光源。Of course, if a plurality of reticle is considered in the movement determining step (as shown in FIG. 3), the corresponding reticle needs to be replaced in the manufacturing method of the three-dimensional microstructure. Further, in consideration of the intensity of the laser light and the irradiation time, it is necessary to adjust the laser light source in accordance with the intensity of the laser light and the irradiation time in the method of manufacturing the three-dimensional microstructure.

以下以一實際例子來說明本發明之光罩的製造方法。Hereinafter, a method of manufacturing the photomask of the present invention will be described with a practical example.

圖4為預期之立體微結構106的俯視示意圖,圖5為立體微結構106之一視角的示意圖。於此,立體微結構106係以軸對稱的半圓球為例。在此實施例中,在移動決定步驟中係決定基板相對一光罩移動三次,且各移動之方向相差60度,如圖4所示之第一次拖拉方向、第二次拖拉方向以及第三次拖拉方向。在微結構決定步驟中,係決定立體微結構106之外貌特徵為半圓球面,其可用一球面方程式表現。藉此,在分析步驟中可依據該方向、次數以及該外貌特徵,使用一數值分析方法計算得到該光罩之特徵,然後在生產步驟中依據該光罩之特徵製造出該光罩。如圖6所示為製出光罩107一部分的示意圖,光罩107具有半圓狀之透光部108。4 is a top plan view of the contemplated three-dimensional microstructures 106, and FIG. 5 is a schematic view of a perspective view of the three-dimensional microstructures 106. Here, the three-dimensional microstructure 106 is exemplified by an axially symmetric semi-spherical ball. In this embodiment, in the movement determining step, the substrate is determined to move three times with respect to a mask, and the directions of the movements are different by 60 degrees, as shown in FIG. 4, the first pulling direction, the second pulling direction, and the third. Drag the direction. In the microstructure determining step, it is determined that the stereoscopic structure 106 has a semi-spherical feature, which can be represented by a spherical equation. Thereby, in the analyzing step, the characteristics of the reticle can be calculated according to the direction, the number of times and the appearance feature, and then the reticle is manufactured according to the characteristics of the reticle in the production step. FIG. 6 is a schematic view showing a part of the reticle 107, and the reticle 107 has a semicircular light transmitting portion 108.

在製出光罩107之後,即可藉由機台使基板沿移動決定步驟中所決定之方向及次數依序移動,在移動過程中,使一雷射光經過光罩以及透鏡而照射基板,藉由上述雷射光的疊加作用而在基板上產生立體微結構。圖7A為進行第一次拖拉所得到之立體微結構的俯視示意圖,圖7B為進行第一次拖拉所得到之立體微結構之一視角的示意圖;圖8A為進行第二次拖拉所得到之立體微結構的俯視示意圖,圖8B為進行第二次拖拉所得到之立體微結構之一視角的示意圖;圖9A為進行第三次拖拉所得到之立體微結構的俯視示意圖,圖9B為進行第三次拖拉所得到之立體微結構之一視角的示意圖。藉此,可產生如圖5所示之預期的立體微結構。After the reticle 107 is formed, the substrate can be sequentially moved in the direction and the number of times determined by the movement determining step by the machine. During the moving process, a laser beam is irradiated through the reticle and the lens to illuminate the substrate. The superposition of the above-described laser light produces a three-dimensional microstructure on the substrate. 7A is a schematic top view of the three-dimensional microstructure obtained by the first pulling, FIG. 7B is a schematic view of a perspective of the three-dimensional microstructure obtained by the first pulling; FIG. 8A is a three-dimensional drawing obtained by the second pulling FIG. 8B is a schematic view showing a perspective view of the three-dimensional microstructure obtained by the second pulling; FIG. 9A is a top view of the three-dimensional microstructure obtained by the third pulling, and FIG. 9B is a third drawing. Schematic diagram of one of the perspectives of the three-dimensional microstructure obtained by the second drag. Thereby, an expected three-dimensional microstructure as shown in FIG. 5 can be produced.

以下舉例說明利用本實施例之應用雷射拖拉法之立體微結構的製造方法所製出的立體微結構。The three-dimensional microstructure produced by the method for manufacturing a three-dimensional microstructure using the laser drag method of the present embodiment will be exemplified below.

立體微結構例如為軸對稱微結構,其例如為圖10A與圖10B所示之子彈型軸對稱微結構、或圖11A與圖11B所示之饅頭型軸對稱微結構。The three-dimensional microstructure is, for example, an axisymmetric microstructure, which is, for example, a bullet-type axisymmetric microstructure as shown in FIGS. 10A and 10B, or a hammer-type axisymmetric microstructure as shown in FIGS. 11A and 11B.

立體微結構例如為多面體微結構,其例如為圖12A與圖12B所示之六面體角柱微結構、或圖13A與圖13B所示之多層次角柱微結構、或圖14A與圖14B所示之多層次曲面微結構。The three-dimensional microstructures are, for example, polyhedral microstructures, such as the hexahedral corner pillar microstructures shown in Figures 12A and 12B, or the multi-layer corner pillar microstructures shown in Figures 13A and 13B, or Figures 14A and 14B. Multi-level surface microstructure.

綜上所述,在本發明之光罩的製造方法中,與傳統作法不同,本發明先決定一機台使一基板相對至少一光罩移動之方向及次數,並決定一立體微結構於該基板上之外貌特徵,再使用一數值分析方法,依據上述方向、次數以及外貌特徵而計算得到光罩之特徵,然後再依據該光罩之特徵製造出該光罩。如此,在光罩製造出來之後,只要依照先前所決定的參數,讓該機台使該基板沿移動決定步驟中所決定之方向及次數依序移動,在移動過程中,使一雷射光經過該光罩而照射該基板,藉由上述雷射光的疊加作用而可在基板上產生該立體微結構,即預期的立體微結構。In summary, in the manufacturing method of the reticle of the present invention, unlike the conventional method, the present invention first determines the direction and the number of times a substrate moves relative to at least one reticle, and determines a stereoscopic microstructure. The appearance features on the substrate are then calculated using a numerical analysis method based on the above-mentioned directions, times, and appearance features, and then the mask is fabricated according to the characteristics of the mask. In this way, after the reticle is manufactured, the machine is caused to move the substrate in the direction and the number of times determined in the movement determining step according to the previously determined parameters, and a laser beam is passed through during the moving process. The photomask illuminates the substrate, and the stereoscopic microstructure, that is, the expected three-dimensional microstructure, can be produced on the substrate by the superposition of the above-mentioned laser light.

此外,透過本發明也可以將結構的複雜度增加,加工出橢圓、圓錐、角錐、甚至是非對稱性的立體微結構。此外,本發明更可將拖拉的維度增加,例如採用三次拖拉,如此一來,使得光罩透光區域有更多維度疊加來進行雷射加工,製作出六角最密堆積的微型結構,使得結構的填充率能夠增加,關鍵的是,可以加工出所期望得到的結構形貌,因而創造出極大的經濟價值。In addition, the complexity of the structure can be increased by the present invention to process elliptical, conical, pyramidal, and even asymmetrical three-dimensional microstructures. In addition, the invention can increase the dimension of the dragging, for example, by three times of pulling, so that the light transmissive area of the reticle is superimposed in more dimensions for laser processing, and the micro-structure of the hexagonal closest packing is fabricated, so that the structure The filling rate can be increased, and the key is that the desired structural morphology can be processed, thus creating great economic value.

以上所述僅為舉例性,而非為限制性者。任何未脫離本發明之精神與範疇,而對其進行之等效修改或變更,均應包含於後附之申請專利範圍中。The above is intended to be illustrative only and not limiting. Any equivalent modifications or alterations to the spirit and scope of the invention are intended to be included in the scope of the appended claims.

101...機台101. . . Machine

102...基板102. . . Substrate

103~105、107...光罩103~105,107. . . Mask

106...立體微結構106. . . Stereo microstructure

108...透光部108. . . Translucent part

S01~S04...光罩之製造方法的步驟S01~S04. . . Steps of manufacturing the mask

圖1為本發明較佳實施例之一種應用雷射拖拉法之光罩的製造方法的步驟示意圖;1 is a schematic view showing the steps of a method for manufacturing a reticle using a laser drag method according to a preferred embodiment of the present invention;

圖2與圖3為本發明較佳實施例之光罩的製造方法的假想情境示意圖;2 and FIG. 3 are schematic diagrams showing a hypothetical situation of a method of manufacturing a reticle according to a preferred embodiment of the present invention;

圖4為本發明較佳實施例之預期的立體微結構的俯視示意圖;4 is a top plan view of a contemplated three-dimensional microstructure according to a preferred embodiment of the present invention;

圖5為圖4之立體微結構之一視角的示意圖;Figure 5 is a schematic view of a perspective view of the three-dimensional microstructure of Figure 4;

圖6為利用本發明較佳實施例之光罩製造方法所製出之光罩的局部示意圖;Figure 6 is a partial schematic view of a reticle produced by the reticle manufacturing method of the preferred embodiment of the present invention;

圖7A與圖7B為本發明較佳實施例之光罩製造方法進行第一次拖拉所得到之立體微結構的示意圖;7A and FIG. 7B are schematic diagrams showing the three-dimensional microstructure obtained by the first method of manufacturing the reticle according to the preferred embodiment of the present invention;

圖8A與圖8B為本發明較佳實施例之光罩製造方法進行第二次拖拉所得到之立體微結構的示意圖;8A and FIG. 8B are schematic diagrams showing the three-dimensional microstructure obtained by the second method of manufacturing the reticle according to the preferred embodiment of the present invention;

圖9A與圖9B為本發明較佳實施例之光罩製造方法進行第三次拖拉所得到之立體微結構的示意圖;9A and FIG. 9B are schematic diagrams showing the three-dimensional microstructure obtained by the third method of manufacturing the reticle according to the preferred embodiment of the present invention;

圖10A為利用本實施例之應用雷射拖拉法之立體微結構的製造方法所製出之一立體微結構的俯視示意圖;FIG. 10A is a top plan view showing a three-dimensional microstructure produced by the method for manufacturing a three-dimensional microstructure using the laser drag method of the embodiment; FIG.

圖10B為圖10A之立體微結構之一視角的示意圖;Figure 10B is a schematic view of a perspective view of the three-dimensional microstructure of Figure 10A;

圖11A為利用本實施例之應用雷射拖拉法之立體微結構的製造方法所製出之另一立體微結構的俯視示意圖;11A is a top plan view showing another three-dimensional microstructure produced by the method for manufacturing a three-dimensional microstructure using the laser drag method of the embodiment;

圖11B為圖11A之立體微結構之一視角的示意圖;Figure 11B is a schematic view of a perspective view of the three-dimensional microstructure of Figure 11A;

圖12A為利用本實施例之應用雷射拖拉法之立體微結構的製造方法所製出之另一立體微結構的俯視示意圖;12A is a top plan view showing another three-dimensional microstructure produced by the method for manufacturing a three-dimensional microstructure using the laser drag method of the embodiment;

圖12B為圖10A之立體微結構之一視角的示意圖;12B is a schematic view of a perspective view of the three-dimensional microstructure of FIG. 10A;

圖13A為利用本實施例之應用雷射拖拉法之立體微結構的製造方法所製出之另一立體微結構的俯視示意圖;FIG. 13A is a top plan view showing another three-dimensional microstructure produced by the method for manufacturing a three-dimensional microstructure using the laser drag method of the embodiment; FIG.

圖13B為圖13A之立體微結構之一視角的示意圖;Figure 13B is a schematic view of a perspective view of the three-dimensional microstructure of Figure 13A;

圖14A為利用本實施例之應用雷射拖拉法之立體微結構的製造方法所製出之另一立體微結構的俯視示意圖;以及14A is a top plan view showing another three-dimensional microstructure produced by the method for manufacturing a three-dimensional microstructure using the laser drag method of the present embodiment;

圖14B為圖14A之立體微結構之一視角的示意圖。Figure 14B is a schematic illustration of a perspective view of the three-dimensional microstructure of Figure 14A.

S01~S04...光罩之製造方法的步驟S01~S04. . . Steps of manufacturing the mask

Claims (14)

一種應用雷射拖拉法之光罩的製造方法,包含:一移動決定步驟,係決定一機台使一基板相對至少一光罩移動之方向及次數;一微結構決定步驟,係決定一立體微結構於該基板上之外貌特徵;一分析步驟,係依據該方向、次數以及該外貌特徵,使用一數值分析方法計算得到該光罩之特徵;以及一生產步驟,係依據該光罩之特徵製造出該光罩。A method for manufacturing a reticle using a laser drag method, comprising: a movement determining step of determining a direction and a number of times a substrate moves relative to at least one reticle; and a microstructure determining step determining a stereo micro a feature on the substrate; an analysis step of calculating a feature of the reticle using a numerical analysis method according to the direction, the number of times, and the appearance feature; and a production step based on the feature of the reticle Out of the mask. 如申請專利範圍第1項所述之製造方法,其中於該移動決定步驟中,該機台使該基板相對該光罩依據至少二方向移動,且該等方向係呈正交或夾一角度。The manufacturing method of claim 1, wherein in the moving determining step, the machine moves the substrate relative to the reticle according to at least two directions, and the directions are orthogonal or at an angle. 如申請專利範圍第1項或第2項所述之製造方法,其中於該移動決定步驟中,該機台使該基板相對該光罩移動至少二次。The manufacturing method according to claim 1 or 2, wherein in the moving determining step, the machine moves the substrate at least twice relative to the mask. 如申請專利範圍第1項所述之製造方法,其中於該移動決定步驟中,該機台使該基板相對複數光罩依據至少一方向移動。The manufacturing method of claim 1, wherein in the moving determining step, the machine moves the substrate relative to the plurality of masks in at least one direction. 如申請專利範圍第1項所述之製造方法,其中於該移動決定步驟中,該機台使該基板相對複數光罩移動至少一次。The manufacturing method of claim 1, wherein in the moving determining step, the machine moves the substrate relative to the plurality of masks at least once. 如申請專利範圍第1項所述之製造方法,其中該立體微結構之外貌特徵為橢圓、圓錐、角錐、非對稱、軸對稱、立角最密堆積。The manufacturing method according to claim 1, wherein the stereoscopic microstructure features ellipse, cone, pyramid, asymmetry, axis symmetry, and the closest angle of the vertical angle. 如申請專利範圍第1項所述之製造方法,其中該數值分析方法包含單形法(simplex method)。The manufacturing method according to claim 1, wherein the numerical analysis method comprises a simplex method. 如申請專利範圍第1項所述之製造方法,其中該外貌特徵係由至少一方程式表現。The manufacturing method of claim 1, wherein the appearance feature is represented by at least one program. 如申請專利範圍第1項所述之製造方法,更包含:一雷射光決定步驟,係決定一雷射光之強度與照射時間,並且於該分析步驟中,更依據該雷射光之強度與照射時間,使用該數值分析方法計算得到該光罩之特徵。The manufacturing method according to claim 1, further comprising: a laser light determining step of determining a intensity of the laser light and an irradiation time, and in the analyzing step, further determining the intensity and the irradiation time of the laser light. The numerical analysis method is used to calculate the characteristics of the reticle. 一種應用雷射拖拉法之立體微結構的製造方法,包含:一移動決定步驟,係決定一機台使一基板相對至少一光罩移動之方向及次數;一微結構決定步驟,係決定一立體微結構於該基板上之外貌特徵;一分析步驟,係依據該方向、次數以及該外貌特徵,使用一數值分析方法計算得到該光罩之特徵;一生產步驟,係依據該光罩之特徵製造出該光罩;將該基板設置於該機台上;將該光罩設置於該基板上;以及藉由該機台使該基板沿該移動決定步驟中所決定之方向及次數依序移動,在移動過程中,使一雷射光經過該光罩而照射該基板,藉由上述雷射光的疊加作用而在該基板上產生該立體微結構。A method for manufacturing a three-dimensional microstructure using a laser drag method, comprising: a movement determining step of determining a direction and a number of times a substrate moves relative to at least one mask; and a microstructure determining step determining a stereo The microstructure is characterized by the appearance on the substrate; an analysis step is based on the direction, the number of times, and the appearance feature, using a numerical analysis method to calculate the feature of the reticle; a production step is based on the feature of the reticle The reticle is disposed on the machine table; the reticle is disposed on the substrate; and the substrate is sequentially moved by the machine along the direction and the number of times determined in the movement determining step, During the moving process, a laser beam is irradiated through the reticle to illuminate the substrate, and the stereoscopic microstructure is generated on the substrate by the superposition of the laser light. 一種應用如申請專利範圍第10項所述之製造方法所製出之立體微結構,其係為軸對稱微結構。A three-dimensional microstructure produced by the manufacturing method of claim 10, which is an axisymmetric microstructure. 如申請專利範圍第11項所述之立體微結構,其係為子彈型或饅頭型軸對稱微結構。The three-dimensional microstructure according to claim 11 is a bullet-type or a head-shaped axisymmetric microstructure. 一種應用如申請專利範圍第10項所述之製造方法所製出之立體微結構,其係為多面體微結構。A three-dimensional microstructure produced by the manufacturing method of claim 10, which is a polyhedral microstructure. 如申請專利範圍第13項所述之立體微結構,其係為六面體角柱微結構、多層次角柱微結構或多層次曲面微結構。The three-dimensional microstructure as described in claim 13 is a hexahedral pyramid microstructure, a multi-level pyramid microstructure or a multi-layer curved microstructure.
TW100127598A 2011-08-03 2011-08-03 Manufacturing methods of photomask and microstructure by using laser dragging process, and microstructure TWI428689B (en)

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