TWI428575B - Spectroscopic ellipsometers - Google Patents

Spectroscopic ellipsometers Download PDF

Info

Publication number
TWI428575B
TWI428575B TW096128179A TW96128179A TWI428575B TW I428575 B TWI428575 B TW I428575B TW 096128179 A TW096128179 A TW 096128179A TW 96128179 A TW96128179 A TW 96128179A TW I428575 B TWI428575 B TW I428575B
Authority
TW
Taiwan
Prior art keywords
polarization angle
light
analyzers
under test
device under
Prior art date
Application number
TW096128179A
Other languages
Chinese (zh)
Other versions
TW200842329A (en
Inventor
Lu Tongxin
Wang Xiaohan
Original Assignee
Raintree Scientific Instr Shanghai Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US11/735,979 external-priority patent/US20070242267A1/en
Application filed by Raintree Scientific Instr Shanghai Corp filed Critical Raintree Scientific Instr Shanghai Corp
Publication of TW200842329A publication Critical patent/TW200842329A/en
Application granted granted Critical
Publication of TWI428575B publication Critical patent/TWI428575B/en

Links

Description

頻譜式橢偏儀Spectral ellipsometer 【優先權主張】[Priority claim]

本申請案宣稱2006年4月24日申請之名稱為”Spectroscopic Ellipsometer without Moving Parts”的暫時專利申請案的優先權,其申請案號為No.60/793,926。本申請案另外宣稱2007年4月16日申請之名稱為”Optical Focusing Devices”的非暫時專利申請案的優先權,其申請案號為No.11/735,979。這些申請案在此全體一併供做參考。The present application claims priority to the provisional application of the name "Spectroscopic Ellipsometer without Moving Parts", filed on Apr. 24, 2006, which is incorporated herein by reference. The present application further claims priority to the non-transitory patent application entitled "Optical Focusing Devices", filed on Apr. 16, 2007, the disclosure of which is incorporated herein by reference. These applications are hereby incorporated by reference.

本發明係有關於檢測及量測系統,且特別係有關於諸如半導體裝置及/或晶圓的待測器件(”DUT”)的光學檢測及量測。The present invention relates to detection and measurement systems, and in particular to optical detection and measurement of devices under test ("DUTs") such as semiconductor devices and/or wafers.

頻譜式橢偏儀係被廣泛使用於半導體製造、光學鍍膜及材料分析之非常有力的光學量測技術。橢偏儀量測反射率Rp及Rs的複數比率,其中Rp係其方向係在入射面中的電場之反射率且Rs係其方向垂直於入射面的電場之反射率。Rp及Rs係複數且它們係波長相關。Spectroscopic ellipsometry is widely used in semiconductor fabrication, optical coating and material analysis for very powerful optical metrology. The ellipsometer measures the complex ratio of the reflectances Rp and Rs, where Rp is the reflectance of the electric field in the incident plane and Rs is the reflectance of the electric field whose direction is perpendicular to the incident surface. Rp and Rs are plural and they are wavelength dependent.

橢偏量被定義為: 其中 且△=δ p δ s δ p δ s 係Rp 及Rs 的相位。The ellipsometric amount is defined as: among them And Δ = δ p - δ s δ p and δ s are the phases of R p and R s .

在傳統的橢偏儀中,在量測橢偏量亦即Ψ及△時,其必須旋轉系統中之偏振組件(起偏器、檢偏器或補償器)之一。這限制量測的速度。在一些應用中,需要對一非常小的區域进行量測(諸如量測在半導體晶圓上的薄膜厚度)。其必須將光聚焦至非常小的區域。In conventional ellipsometers, one of the polarization components (polarizers, analyzers, or compensators) in the system must be rotated when measuring ellipsometry, ie, Ψ and Δ. This limits the speed of the measurement. In some applications, a very small area needs to be measured (such as measuring the film thickness on a semiconductor wafer). It must focus the light to a very small area.

因此,最好得到能聚焦在一小的焦斑之頻譜式橢偏儀。另外,最好得到具有最少的活動部件之橢偏儀,使得进行量測时不需要移動系統中之任何機械部件。Therefore, it is preferable to obtain a spectral ellipsometer capable of focusing on a small focal spot. In addition, it is desirable to have an ellipsometer with minimal moving parts so that no mechanical components in the system need to be moved for measurement.

本發明之一目的係對於可聚焦小的焦斑之橢偏儀提供方法及裝置。One object of the present invention is to provide a method and apparatus for an ellipsometer that can focus on small focal spots.

本發明之另一目的係對於可同時偏振、反射、檢偏、及檢測數個光線的橢偏儀提供方法及裝置。Another object of the present invention is to provide a method and apparatus for an ellipsometer that can simultaneously polarize, reflect, detect, and detect a plurality of rays.

本發明之另一目的係對於沒有任何機械活動部件之可同時偏振、反射、檢偏、及檢測數個光線的橢偏儀提供方法及裝置。Another object of the present invention is to provide a method and apparatus for ellipsometers that can simultaneously polarize, reflect, detect, and detect several rays without any mechanically movable components.

簡單地說,一種橢偏儀用以擷取待測器件的資訊之方法,包括下列步驟:使用多個起偏器提供多個入射的偏振光束,其中各光束以指定的偏振角被偏振;使用一拋物面反射器將該多個入射的偏振光束聚焦於在待測器件上的一光點;使用一拋物面反射器收集從該待測器件被反射的多個光束;及使用多個檢偏器檢偏該被收集的光束,其中各檢偏器相對於其各自的起偏器具有指定的偏振角。Briefly, a method for extracting information of a device under test by an ellipsometer includes the steps of: providing a plurality of incident polarized beams using a plurality of polarizers, wherein each beam is polarized at a specified polarization angle; a parabolic reflector focuses the plurality of incident polarized beams on a spot on the device under test; using a parabolic reflector to collect a plurality of beams reflected from the device under test; and using a plurality of analyzers The collected beam is biased, wherein each analyzer has a specified polarization angle relative to its respective polarizer.

本發明之一優點係在於其對於可聚焦小的焦斑之橢偏儀提供方法及裝置。One advantage of the present invention is that it provides a method and apparatus for an ellipsometer that can focus on small focal spots.

本發明之另一優點係在於其對於可同時偏振、反射、檢偏、及檢測數個光線的橢偏儀提供方法及裝置。Another advantage of the present invention is that it provides a method and apparatus for an ellipsometer that can simultaneously polarize, reflect, detect, and detect several rays.

本發明之另一優點係在於其對於沒有任何機械活動部件之可同時偏振、反射、檢偏、及檢測數個光線的橢偏儀提供方法及裝置。Another advantage of the present invention is that it provides a method and apparatus for ellipsometers that can simultaneously polarize, reflect, detect, and detect several rays without any mechanically movable components.

下面係參考其應用之圖式及例子的本發明之進一步的說明。Further description of the invention is made with reference to the drawings and examples of the application thereof.

參閱圖1,說明本發明之實施例的基礎概念。假設有一拋物線被設置在y軸及z軸上,概念上,拋物線的形狀可被描述為一簡單的數學函數,z=ay2 ,其中,平行於z軸進入的光線將與z軸相交在其焦點”F”,其中,焦點係位於(0,1/4a)且”a”係一常數。進入的光線與拋物形表面相交且其被重新導向在入射面112(垂直於對稱軸且通過焦點”F”的平面)的焦點Referring to Figure 1, the basic concepts of an embodiment of the present invention are illustrated. Assuming that a parabola is placed on the y-axis and the z-axis, conceptually, the shape of the parabola can be described as a simple mathematical function, z = ay 2 , where the light entering parallel to the z-axis will intersect the z-axis in it. Focus "F", where the focus is at (0, 1/4a) and "a" is a constant. The incoming ray intersects the parabolic surface and is redirected to the focus of the entrance face 112 (the plane perpendicular to the axis of symmetry and through the focus "F")

在此,如圖示,入射之進入的光線114係平行於對稱軸。光線照射拋物面表面且拋物面反射器由於其特性而將光束導向其焦點並與z軸在交叉點”F”交叉。在此交叉之後,光線再次照射拋物面表面,且拋物面表面將光線向後再次導向其平行於對稱軸的入射方向。由於拋物面之獨特的特徵,若進入的光線係平行於對稱軸,被反射的光線將會一直平行於對稱軸。Here, as shown, the incoming incoming light 114 is parallel to the axis of symmetry. The light illuminates the parabolic surface and the parabolic reflector directs the beam to its focus due to its characteristics and intersects the z-axis at the intersection "F". After this intersection, the light illuminates the parabolic surface again, and the parabolic surface redirects the light back to its direction of incidence parallel to the axis of symmetry. Due to the unique characteristics of the paraboloid, if the incoming light is parallel to the axis of symmetry, the reflected light will always be parallel to the axis of symmetry.

參閱圖2,揭示本發明之目前的較佳實施例。在此,顯示一光學讀寫頭的側視圖,其中光學讀寫頭包括拋物面反射器201、起偏器205及檢偏器206。拋物面反射器可被製造成一拋物面且以一種方式被切割,使得焦點203係位於待量測或測試的物體202(待測器件)的表面上。拋物面反射器201的功能係將進入的光束204於待測器件202的表面上聚焦在焦點203上並收集從焦點203反射的光束。圖3繪示具有在拋物面反射器的開口設置起偏器205及檢偏器206之拋物面反射器201的前方上視圖。Referring to Figure 2, a presently preferred embodiment of the present invention is disclosed. Here, a side view of an optical pickup is shown, wherein the optical pickup includes a parabolic reflector 201, a polarizer 205, and an analyzer 206. The parabolic reflector can be fabricated as a paraboloid and cut in a manner such that the focus 203 is on the surface of the object 202 (device under test) to be measured or tested. The function of the parabolic reflector 201 is to focus the incoming beam 204 onto the surface of the device under test 202 on the focus 203 and collect the beam reflected from the focus 203. 3 is a front elevational view of the parabolic reflector 201 having a polarizer 205 and an analyzer 206 disposed in the opening of the parabolic reflector.

在本發明之較佳實施例中,執行橢偏量測時,數個起偏器及檢偏器以一種方式被排列,使得Rp及Rs與進入的光束之入射功率可被同時量測。圖4顯示繪示光學讀寫頭的上視圖,展示上述此等排列方式的一種。在此,對於進入的光線及反射的光線,有八個起偏器及檢偏器405及406、407及408、409及410、與411及412。除了檢偏器406的軸係垂直於其他者外,它們的偏振軸係彼此平行。下列繪示的四對光線(4a/4b、10a/10b、11a/11b及15a/15b),可說明本裝置的工作原理。在此,字母”a”表示進入的光線且字母”b”表示出去的光線。In a preferred embodiment of the invention, when performing ellipsometric measurements, the plurality of polarizers and analyzers are arranged in a manner such that the incident power of Rp and Rs and the incoming beam can be simultaneously measured. Figure 4 shows a top view of the optical pickup showing one of the above arrangements. Here, for the incoming light and the reflected light, there are eight polarizers and analyzers 405 and 406, 407 and 408, 409 and 410, and 411 and 412. Except that the axis of the analyzer 406 is perpendicular to the others, their polarization axes are parallel to each other. The four pairs of light (4a/4b, 10a/10b, 11a/11b, and 15a/15b) shown below illustrate the operation of the device. Here, the letter "a" indicates the incoming light and the letter "b" indicates the outgoing light.

每對光線定義一入射面。光線4a通過起偏器405且沿著圖示箭號的方向變成偏振光。此方向係垂直於入射面201。在反射離開抛物面反射器及焦點之後,出去的光線4b通過另一檢偏器406。然後,此光線被一檢測器接收,其輸出係比例於光線強度。Each pair of rays defines an incident surface. The light 4a passes through the polarizer 405 and becomes polarized light in the direction of the illustrated arrow. This direction is perpendicular to the entrance face 201. After the reflection leaves the parabolic reflector and the focus, the outgoing light 4b passes through another analyzer 406. This light is then received by a detector whose output is proportional to the light intensity.

工作原理可在下面說明的更嚴格的數學式中被進一步說明。我們使用偏振的瓊斯(Jones)表示法。The principle of operation can be further illustrated in the more rigorous mathematical formulas described below. We use the Jones representation of polarization.

入射光束電場:起偏器:拋物面反射器:樣本:座標旋轉矩陣:檢偏器:反射光束的電場: 其中,係具有角度A的檢偏器及具有角度P的起偏器之旋轉矩陣。角度係沿著光線的傳播方嚮從入射面被順時針地量測。Incident beam electric field: Polarizer: Parabolic reflector: sample: Coordinate rotation matrix: Polarizer: The electric field of the reflected beam: among them, and A rotation matrix of an analyzer having an angle A and a polarizer having an angle P. The angle is measured clockwise from the incident surface along the direction of propagation of the light.

在檢測器上的強度係比例於 可以證明 在此R p R p sample R p M R p M R s R s sample R s M R s M 對於光線4a及4b,A=45°且P=45° 對於光線10a及10b,A=-45°且P=45° 對於光線11a及11b,A=90°且P=90° 對於光線15a及15b,A=0°且P=0° 所以 所以, 鏡面效果可以一已知數量樣本被校準去掉。The intensity on the detector is proportional to can prove Here R p = R p sample R p M R p M and R s = R s sample R s M R s M for rays 4a and 4b, A=45° and P=45° For light 10a and 10b, A=-45° and P=45° For light 11a and 11b, A = 90° and P = 90° For light 15a and 15b, A = 0° and P = 0° and so And and so, And The mirror effect can be calibrated and removed by a known number of samples.

其他的反射光學方法也可被用以實現橢偏量測,諸如圖5及圖6中繪示者。在圖5中,進入的光線通過一起偏器502,反射離開被設置在504的反射鏡及位於506的另一反射鏡以聚焦於在403的焦點及待測器件520上。在反射離開待測器件520之後,光線反射離開在510的反射鏡及在504的反射鏡以通過檢偏器512。在圖6中,進入的光線601通過起偏器602,通過透鏡604並且聚焦於焦點606及待測器件620。光線反射離開待測器件,向後通過透鏡604及檢偏器608。注意可使用偏振檢偏器,其中偏振檢偏器將進入的光重新導向成二正交的偏振方向。Other reflective optical methods can also be used to achieve ellipsometric measurements, such as those depicted in Figures 5 and 6. In FIG. 5, incoming light passes through a polarizer 502, reflects away from the mirror disposed at 504 and another mirror at 506 to focus on the focus at 403 and the device under test 520. After being reflected off the device under test 520, the light reflects off the mirror at 510 and the mirror at 504 to pass through the analyzer 512. In FIG. 6, incoming ray 601 passes through polarizer 602, passes through lens 604 and is focused on focus 606 and device under test 620. The light reflects off the device under test and passes backward through lens 604 and analyzer 608. Note that a polarization analyzer can be used in which the polarization analyzer redirects the incoming light into a two orthogonal polarization direction.

圖7繪示一替代的實施例,其中入射光線係線性偏振於P=45°,且四個檢偏器被排列於A=45°、-45°、0°、及90°。有入射光線701通過P=45°的起偏器702,其可被任何透鏡或拋物面鏡,在706反射離開拋物面反射器704以聚焦在焦點708,並且反射離開待測器件720。被反射的光線在710再次反射離開抛物面反射器704,前進至一分光器712分光,被導嚮至A=45°及-45°的第一檢偏器714與A=0°及90°的第二檢偏器716。Figure 7 illustrates an alternate embodiment in which the incident light is linearly polarized at P = 45° and the four analyzers are arranged at A = 45, -45, 0, and 90. The incident ray 701 passes through a polarizer 702 of P = 45°, which can be reflected by any lens or parabolic mirror away from the parabolic reflector 704 at 706 to focus on the focus 708 and reflect away from the device under test 720. The reflected light is again reflected off the parabolic reflector 704 at 710, advanced to a beam splitter 712, and directed to a first analyzer 714 of A = 45° and -45° with a = 0° and 90° Two analyzers 716.

在此,對於A=45°且P=45°的出射光線718 對於A=-45°且P=45°的出射光線720 對於A=90°且P=45°的出射光線724 及對於A=0°且P=45°的出射光線722 Here, the outgoing ray 718 for A=45° and P=45° For outgoing light 720 with A=-45° and P=45° For outgoing light 724 with A = 90° and P = 45° And the outgoing ray 722 for A=0° and P=45°

所以, and so, And

所以, and so, And

圖8繪示另一個替代實施例,其中入射光線係線性偏振於P=45°,且四個檢偏器被排列於A=45°、-45°、0°、及90°。有入射光線801通過P=45°的起偏器802,其可被任何透鏡或拋物面鏡,在806反射離開拋物面反射器804以聚焦在焦點808,並且反射離開待測器件820。被反射的光線在810再次反射離開拋物面反射器804,前進至第一分光器812分光,被導向至第二分光器814及第三分光器816。從第二分光器,光線前進至A=45°的檢偏器822及A=-45°的檢偏器824;且從第三分光器816,光線前進至A=0°的檢偏器818及A=90°的檢偏器820。Figure 8 illustrates another alternate embodiment in which the incident light is linearly polarized at P = 45° and the four analyzers are arranged at A = 45, -45, 0, and 90. The incident ray 801 passes through a P=45° polarizer 802, which can be reflected by any lens or parabolic mirror away from the parabolic reflector 804 at 806 to focus on the focus 808 and reflect away from the device under test 820. The reflected light is again reflected off the parabolic reflector 804 at 810, proceeds to the first beam splitter 812, and is directed to the second beam splitter 814 and the third beam splitter 816. From the second beam splitter, the light is advanced to an A=45° analyzer 822 and an A=-45° analyzer 824; and from the third beam splitter 816, the light is advanced to an A=0° analyzer 818 And an A=90° analyzer 820.

雖然本發明已參考某些較佳實施例加以說明,應瞭解本發明並未被限定於此特定實施例。更確切地,發明人主張本發明係以如同由下列申請專利範圍所表現之其最廣範圍被瞭解及解釋。從而,這些申請專利範圍將被理解為不僅包含在此說明的較佳實施例,而是包含所有其他對於熟知此技藝者顯而易見的變化及修正。Although the invention has been described with reference to certain preferred embodiments, it is understood that the invention is not limited to the specific embodiments. Rather, the inventors claim that the present invention is to be understood and construed in the broadest scope of the scope of the invention. Accordingly, the scope of the invention is to be understood as not limited by the description

4a、4b、10a、10b、11a、11b、15a、15b、114、601、701、801...光線4a, 4b, 10a, 10b, 11a, 11b, 15a, 15b, 114, 601, 701, 801. . . Light

112...入射面112. . . Incident surface

201、704、804...拋物面反射器201, 704, 804. . . Parabolic reflector

202、520、620、720、820...待測器件(DUT)202, 520, 620, 720, 820. . . Device under test (DUT)

203、606、708、808...焦點203, 606, 708, 808. . . focus

204...光束204. . . beam

205、405、407、409、411、502、602、702、802...起偏器205, 405, 407, 409, 411, 502, 602, 702, 802. . . Polarizer

206、406、408、410、412、512、608、714、716、818、820、822、824...檢偏器206, 406, 408, 410, 412, 512, 608, 714, 716, 818, 820, 822, 824. . . Polarizer

604...透鏡604. . . lens

712、812、814、816...分光器712, 812, 814, 816. . . Splitter

圖1係本發明之技術的二維概念圖;圖2係使用拋物面反射器、起偏器及偏振檢偏器之本發明的一較佳實施例的側視圖;圖3係使用拋物面反射器、起偏器及檢偏器之本發明的一較佳實施例之有角度的上視圖;圖4係使用拋物面反射器與多個起偏器及檢偏器之本發明的一較佳實施例的上視圖;圖5係使用不同的反射器之本發明的一替代實施例的側視圖;圖6係使用不同的反射器之本發明的另一替代實施例的側視圖;圖7係一分光器被用以將光線導引至不同的檢偏器之本發明的另一實施例;及圖8係分光器被用以將光線導引至不同的檢偏器之本發明的另一實施例。1 is a two-dimensional conceptual diagram of the technology of the present invention; FIG. 2 is a side view of a preferred embodiment of the present invention using a parabolic reflector, a polarizer, and a polarization analyzer; FIG. 3 is a parabolic reflector, An angled upper view of a preferred embodiment of the present invention, and a polarizer and a plurality of polarizers and analyzers, Figure 5 is a side elevational view of an alternate embodiment of the present invention using different reflectors; Figure 6 is a side view of another alternative embodiment of the present invention using different reflectors; Figure 7 is a splitter Another embodiment of the present invention that is used to direct light to different analyzers; and Figure 8 is another embodiment of the present invention in which the beamsplitter is used to direct light to different analyzers.

201...拋物面反射器201. . . Parabolic reflector

202...待測器件(DUT)202. . . Device under test (DUT)

203...焦點203. . . focus

204...光束204. . . beam

205...起偏器205. . . Polarizer

206...檢偏器206. . . Polarizer

Claims (5)

一種橢偏儀用以擷取待測器件的資訊之方法,包括下列步驟:提供多個入射的偏振光束;將該多個入射的偏振光束聚焦於在一待測器件上的一光點;收集被該待測器件反射的多個光束;及檢偏該被收集的光束,其中提供多個入射的偏振光束的步驟係以多個起偏器實現,該多個起偏器具有相同的第一偏振角,檢偏步驟係以多個檢偏器實現,該多個檢偏器的其中一者具有垂直於該第一偏振角的偏振角,該多個檢偏器的其他者具有平行於該第一偏振角的偏振角。 A method for extracting information of a device under test, comprising the steps of: providing a plurality of incident polarized beams; focusing the plurality of incident polarized beams on a spot on a device to be tested; collecting a plurality of light beams reflected by the device under test; and detecting the collected light beam, wherein the step of providing a plurality of incident polarized light beams is performed by a plurality of polarizers having the same first Polarization angle, the step of detecting is implemented by a plurality of analyzers, one of the plurality of analyzers having a polarization angle perpendicular to the first polarization angle, and the other of the plurality of analyzers having a parallel The polarization angle of the first polarization angle. 如申請專利範圍第1項的方法,其中,該聚焦步驟係使用一拋物面反射器實現。 The method of claim 1, wherein the focusing step is performed using a parabolic reflector. 如申請專利範圍第1項的方法,其中,該收集步驟係使用一拋物面反射器實現。 The method of claim 1, wherein the collecting step is performed using a parabolic reflector. 如申請專利範圍第1項的方法,其中,聚焦步驟、收集步驟、及檢偏步驟被同時進行。 The method of claim 1, wherein the focusing step, the collecting step, and the detecting step are performed simultaneously. 一種橢偏儀用以擷取待測器件的資訊之方法,包括下列步驟:使用多個起偏器提供多個進入的偏振光束,其中各光束以指定的第一偏振角被偏振;使用一拋物面反射器將該多個入射的偏振光束以相 同的入射角聚焦於在待測器件上的一光點;使用一拋物面反射器收集從該待測器件被反射的多個光束;及使用多個檢偏器分析該被收集的光束,其中該多個檢偏器中的一個相對於其對應的起偏器具有垂直該第一偏振角的偏振角,該多個檢偏器中的其他者相對於其對應的起偏器具有平行該第一偏振角的偏振角。 A method for extracting information of a device under test, comprising the steps of: providing a plurality of incoming polarized beams using a plurality of polarizers, wherein each beam is polarized at a specified first polarization angle; using a paraboloid The reflector uses the plurality of incident polarized beams as phases The same incident angle is focused on a spot on the device to be tested; a parabolic reflector is used to collect the plurality of beams reflected from the device under test; and the collected beam is analyzed using a plurality of analyzers, wherein One of the plurality of analyzers has a polarization angle perpendicular to the first polarization angle with respect to its corresponding polarizer, and the other of the plurality of analyzers has a parallel first with respect to its corresponding polarizer The polarization angle of the polarization angle.
TW096128179A 2007-04-16 2007-08-01 Spectroscopic ellipsometers TWI428575B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/735,979 US20070242267A1 (en) 2006-04-14 2007-04-16 Optical Focusing Devices

Publications (2)

Publication Number Publication Date
TW200842329A TW200842329A (en) 2008-11-01
TWI428575B true TWI428575B (en) 2014-03-01

Family

ID=44821947

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096128179A TWI428575B (en) 2007-04-16 2007-08-01 Spectroscopic ellipsometers

Country Status (1)

Country Link
TW (1) TWI428575B (en)

Also Published As

Publication number Publication date
TW200842329A (en) 2008-11-01

Similar Documents

Publication Publication Date Title
JP3697279B2 (en) Thin film thickness measuring device
US4999014A (en) Method and apparatus for measuring thickness of thin films
US5042951A (en) High resolution ellipsometric apparatus
CN110687051B (en) Detection equipment and method
EP0396409B1 (en) High resolution ellipsometric apparatus
WO2007100615A2 (en) High-sensitivity surface detection system and method
US7215431B2 (en) Systems and methods for immersion metrology
US7773212B1 (en) Contemporaneous surface and edge inspection
JP3360822B2 (en) Simultaneous multi-angle / multi-wavelength elliptical polarizer and method
US7397553B1 (en) Surface scanning
TW200813420A (en) An optical measurement system with simultaneous multiple wavelengths, multiple angles of incidence and angles of azimuth
KR20210110751A (en) Mid-Infrared Spectroscopy for Measurement of High Aspect Ratio Structures
CN1963464A (en) Total internal reflection ellipsometry imaging device and method therefor
WO2001020252A9 (en) Method and apparatus for performing optical measurements of layers and surface properties
WO2007127760A2 (en) Spectroscopic ellipsometers
US7999949B2 (en) Spectroscopic ellipsometers
TWI428575B (en) Spectroscopic ellipsometers
US11255796B2 (en) Region prober optical inspector
US6236056B1 (en) Defect evaluation apparatus for evaluating defects and shape information thereof in an object or on the surface of an object
US11733173B1 (en) Time domain multiplexed defect scanner
TWI608227B (en) Optical surface scanning systems and methods
KR102220731B1 (en) Method for measuring fine change of thin film surface
US10767977B1 (en) Scattered radiation defect depth detection
US20220269071A1 (en) Scanning micro profiler
US20220136982A1 (en) Region prober optical inspector