TWI425979B - A method for producing sub-micrometric particles of several materials - Google Patents

A method for producing sub-micrometric particles of several materials Download PDF

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TWI425979B
TWI425979B TW100139277A TW100139277A TWI425979B TW I425979 B TWI425979 B TW I425979B TW 100139277 A TW100139277 A TW 100139277A TW 100139277 A TW100139277 A TW 100139277A TW I425979 B TWI425979 B TW I425979B
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carbon dioxide
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polymer
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次微米級微粒的製備方法Method for preparing submicron particles

本發明係有關於一種次微米級微粒的製備方法,尤其是一種可製備次微米級有機與無機物微粒之次微米級微粒的製備方法,其具有可析出超細微粒及產量高,且有機溶液與水溶液系統皆可使用之優點。The invention relates to a method for preparing submicron-sized particles, in particular to a method for preparing submicron-sized particles of submicron-sized organic and inorganic particles, which has the property of precipitating ultrafine particles and high yield, and the organic solution and The advantages of both aqueous solutions are available.

傳統製備微粒方法包括氣相凝結法、機械研磨法、沈澱法、噴霧乾燥法、溶膠凝膠法(sol-gel)、電漿噴霧(plasma spray)法、液相抗溶劑(liquid anti-solvent)法、逆微胞(reverse micelles)法、超臨界流體技術(supercritical fluid technology)等。其中,氣相凝結法及噴霧乾燥法不適合熱敏感性物質;機械研磨法則需較長的程序時間及清洗與過濾研磨介質;溶膠凝膠法則需要昂貴的前趨物及再研磨程序;液相抗溶劑法則因較低過飽和度不易獲得微細顆粒;逆微胞法則需挑選適合的介面活性劑且其粒徑有不易控制之缺點。Conventional methods for preparing microparticles include gas phase coagulation, mechanical milling, precipitation, spray drying, sol-gel, plasma spray, liquid anti-solvent Method, reverse micelles method, supercritical fluid technology, and the like. Among them, gas phase condensation method and spray drying method are not suitable for heat sensitive substances; mechanical grinding method requires long program time and cleaning and filtering grinding medium; sol gel method requires expensive precursor and regrind procedure; liquid phase resistance The solvent rule is difficult to obtain fine particles due to lower supersaturation; the inverse microcell method requires selection of a suitable surfactant and its particle size is not easily controlled.

由於流體在超臨界狀態具有諸多優於液態或氣態的物理性質,例如:擴散係數高、粘度低、表面張力低、密度之大小容易控制等。如果選用二氧化碳為超臨界流體介質,系統可在近於室溫附近操作,再加上該流體無毒性又具不可燃性等特點。因此,二氧化碳是超臨界流體應用技術中,最常被使用的一種介質,根據超臨界流體之不同角色功能加以分類,包括:擔任溶劑功能的「超臨界溶液快速膨脹法」(Rapid Expansion of Supercritical Solution,RESS);擔任抗溶劑功能的「超臨界抗溶劑法」(Supercritical Anti-Solvent,SAS);擔任溶質功能的「氣體飽和溶液/懸浮液造粒法」(Particle from Gas-Saturated Solutions,PGSS);擔任霧化介質功能的「超臨界輔助霧化法」(Supercritical Assisted-Atomization,SAA)。其中,RESS法不適用於對超臨界流體低溶解度物質。Wu等人(請參照Wu,H. T.;Lin,H. M.;Lee,M. J.,”Ultra-fine particles Formation of Pigment Green 36 in Different Phase Regions Via a Supercritical Anti-Solvent Process”Dyes & Pigments,page 75,328,2007年)利用SAS法製備奈米級Red 177顏料微粒,為克服顏料不溶於超臨界流體缺點,此程序(SAS)之超臨界流體為抗溶劑功能,將顏料溶液中有機溶劑溶出,顏料因高度過飽和而析出微粒,微粒因析出於高壓容器,因此產量受限於高壓容器體積,另外因為水不易溶於二氧化碳,因此,不適用於水溶液系統。Reverchon等人(請參照Reverchon,E.;Antonacci,A.,”Polymer Microparticles Productions by Supercritical Assisted Atomization”J. Supercritical Fluids,page 39,444,2007年)同時利用SAS及SAA法製備Red 66顏料微粒,比較結果顯示SAS法可製備奈米級微粒,但產量低,而SAA法可製備次微米級微粒,且產量高,另一方面,因二氧化碳扮演霧化介質,在忽略對水之溶解度下,可運用於水溶液系統。Because the fluid has many physical properties superior to liquid or gaseous state in the supercritical state, for example, high diffusion coefficient, low viscosity, low surface tension, and easy control of the density. If carbon dioxide is used as the supercritical fluid medium, the system can be operated near room temperature, plus the fluid is non-toxic and non-flammable. Therefore, carbon dioxide is one of the most commonly used media in supercritical fluid applications, and is classified according to the different role functions of supercritical fluids, including: Rapid Expansion of Supercritical Solution. , RESS); Supercritical Anti-Solvent (SAS) as an anti-solvent function; "Particle from Gas-Saturated Solutions" (PGSS) Supercritical Assisted-Atomization (SAA), which functions as an atomizing medium. Among them, the RESS method is not applicable to substances with low solubility in supercritical fluids. Wu et al. (Please refer to Wu, HT; Lin, HM; Lee, MJ, "Ultra-fine particles Formation of Pigment Green 36 in Different Phase Regions Via a Supercritical Anti-Solvent Process" Dyes & Pigments, page 75, 328, 2007). The nano-red Red 177 pigment particles are prepared by the SAS method. In order to overcome the shortcomings of the pigment being insoluble in the supercritical fluid, the supercritical fluid of the program (SAS) is an anti-solvent function, and the organic solvent in the pigment solution is dissolved, and the pigment is precipitated due to high supersaturation. The particles and particles are precipitated in a high-pressure vessel, so the yield is limited by the volume of the high-pressure vessel, and since the water is not easily soluble in carbon dioxide, it is not suitable for use in an aqueous solution system. Reverchon et al. (please refer to Revechon, E.; Antonacci, A., "Polymer Microparticles Productions by Supercritical Assisted Atomization" J. Supercritical Fluids, page 39, 444, 2007) for the simultaneous preparation of Red 66 pigment particles using SAS and SAA methods. It shows that the SAS method can prepare nano-sized particles, but the yield is low, while the SAA method can prepare sub-micron particles with high yield. On the other hand, because carbon dioxide plays an atomizing medium, it can be applied to the solubility of water. Aqueous system.

本發明之一目的係提供一種次微米級微粒的製備方法,其具有可析出超細微粒及產量高,且有機溶液與水溶液系統皆可使用之優點。SUMMARY OF THE INVENTION One object of the present invention is to provide a method for preparing submicron-sized particles having the advantages of being able to precipitate ultrafine particles and having a high yield, and both an organic solution and an aqueous solution system can be used.

為達上述之目的,本發明之一種次微米級微粒的製備方法,其包括下列步驟:(a)將待造微粒之溶質溶液與超臨界流體經泵浦輸入一高壓飽和槽,進行混合以形成二氧化碳飽和溶液;(b)將該二氧化碳飽和溶液通過該高壓飽和槽底部之一霧化噴嘴,噴入常壓之一沉澱槽,以形成霧化液滴;以及(c)將該霧化液滴接觸該沉澱槽內預熱之氮氣,使二氧化碳釋出與溶劑蒸發,該溶質過飽和即可析出次微米級微粒。For the purpose of the above, a method for preparing a submicron-sized particle of the present invention comprises the steps of: (a) pumping a solute solution of a particle to be formed and a supercritical fluid into a high-pressure saturation tank for mixing to form a carbon dioxide saturated solution; (b) passing the carbon dioxide saturated solution through one of the atomizing nozzles at the bottom of the high pressure saturated tank, spraying into one of the atmospheric pressure precipitation tanks to form an atomized droplet; and (c) the atomized droplet The nitrogen gas preheated in the precipitation tank is contacted to release carbon dioxide and evaporate the solvent, and the solute is supersaturated to precipitate submicron-sized particles.

為使 貴審查委員能進一步瞭解本發明之結構、特徵及其目的,茲附以圖式及較佳具體實施例之詳細說明如后。The detailed description of the drawings and the preferred embodiments are set forth in the accompanying drawings.

請一併參照圖1及圖2,其中圖1繪示本案一較佳實施例之次微米級微粒的製備方法之流程示意圖;圖2繪示用以製備本案之次微米級微粒的裝置之示意圖。1 and FIG. 2, FIG. 1 is a schematic flow chart showing a method for preparing submicron-sized particles according to a preferred embodiment of the present invention; and FIG. 2 is a schematic view showing an apparatus for preparing submicron-sized particles of the present invention. .

如圖所示,本發明一較佳實施例之次微米級微粒的製備方法,其包括下列步驟:(a)將待造微粒之溶質溶液與超臨界流體經泵浦2、3輸入一高壓飽和槽8,進行混合以形成二氧化碳飽和溶液;(b)將該二氧化碳飽和溶液通過該高壓飽和槽8底部之一霧化噴嘴9,噴入常壓之一沉澱槽10,以形成霧化液滴;以及(c)將該霧化液滴接觸該沉澱槽10內預熱之氮氣,使二氧化碳釋出與溶劑蒸發,該溶質過飽和即可析出次微米級微粒。As shown in the figure, a method for preparing submicron-sized particles according to a preferred embodiment of the present invention includes the following steps: (a) saturating a solute solution of a particle to be fabricated and a supercritical fluid by pumping 2, 3, and a high pressure. The tank 8 is mixed to form a carbon dioxide saturated solution; (b) the carbon dioxide saturated solution is passed through one of the atomizing nozzles 9 at the bottom of the high pressure saturated tank 8, and sprayed into one of the atmospheric pressure precipitation tanks 10 to form atomized droplets; And (c) contacting the atomized droplets with nitrogen preheated in the precipitation tank 10 to release carbon dioxide and evaporate the solvent, and the solute is supersaturated to precipitate submicron-sized particles.

於該步驟(a)中,將待造微粒之溶質溶液與超臨界流體經泵浦2、3輸入一高壓飽和槽8,進行混合以形成二氧化碳飽和溶液;其中,該超臨界流體例如但不限於係選自二氧化碳、一氧化氮、氟氯碳化物及其混合物,在本實施例中係以二氧化碳為例加以說明,但並不以此為限;該待造微粒之溶質溶液中之溶質例如但不限於係選自高分子、醫藥、顏料、影印碳粉、金屬氧化物等材料,在本實施例中係以聚甲基丙烯酸甲酯(PMMA)高分子材料為例加以說明,但並不以此為限;該溶劑例如但不限於係選自二甲基亞碸、二氯甲烷、丙酮、甲醇、乙醇、純水、乙醇水溶液、乙酸水溶液,在本實施例中係以丙酮為例加以說明,但並不以此為限。In the step (a), the solute solution of the particles to be formed and the supercritical fluid are pumped into the high pressure saturation tank 8 through the pumps 2 and 3 to be mixed to form a carbon dioxide saturated solution; wherein the supercritical fluid is, for example but not limited to, It is selected from the group consisting of carbon dioxide, nitrogen monoxide, chlorofluorocarbons and mixtures thereof. In the present embodiment, carbon dioxide is taken as an example, but not limited thereto; the solute in the solute solution of the particles to be formed is, for example, The material is not limited to being selected from the group consisting of a polymer, a medicine, a pigment, a photocopying toner, and a metal oxide. In the present embodiment, a polymethyl methacrylate (PMMA) polymer material is taken as an example, but The solvent is, for example but not limited to, selected from the group consisting of dimethyl hydrazine, dichloromethane, acetone, methanol, ethanol, pure water, aqueous ethanol, and aqueous acetic acid. In the present embodiment, acetone is taken as an example for illustration. , but not limited to this.

此外,於該步驟(a)中進一步可調整該高分子溶液濃度,使該高分子溶液濃度於1 kg/m3 至50 kg/m3 之範圍變化,以利於粒徑微細化,且其濃度較佳為1 kg/m3 至10 kg/m3In addition, in the step (a), the concentration of the polymer solution can be further adjusted to change the concentration of the polymer solution in a range of 1 kg/m 3 to 50 kg/m 3 to facilitate particle size refinement and concentration thereof. It is preferably from 1 kg/m 3 to 10 kg/m 3 .

此外,於該步驟(a)中進一步可調整該二氧化碳與高分子溶液體積流率比(FCO2 /F1),使該二氧化碳與高分子溶液體積流率比於0.8至2.8之範圍變化,以利於粒徑微細化,且其溶液體積流率比較佳為1.2至2.4。In addition, in the step (a), the volumetric flow rate ratio (F CO2 /F1) of the carbon dioxide to the polymer solution can be further adjusted, so that the volumetric flow rate ratio of the carbon dioxide to the polymer solution is varied from 0.8 to 2.8, so as to facilitate The particle diameter is fine, and the solution volume flow rate thereof is preferably from 1.2 to 2.4.

於該步驟(b)中,將該二氧化碳飽和溶液通過該高壓飽和槽8底部之一霧化噴嘴9,噴入常壓之一沉澱槽10,以形成霧化液滴。In the step (b), the carbon dioxide saturated solution is passed through an atomizing nozzle 9 at the bottom of the high-pressure saturated tank 8, and is sprayed into one of the atmospheric pressure precipitating tanks 10 to form atomized droplets.

此外,於該步驟(b)中進一步可調整該噴嘴9角度,使該噴嘴9角度可於5度至90度角之範圍變化,以利於粒徑微細化,且其噴嘴9角度較佳為50度角。In addition, in the step (b), the angle of the nozzle 9 can be further adjusted, so that the angle of the nozzle 9 can be varied within a range of 5 to 90 degrees to facilitate the finening of the particle diameter, and the angle of the nozzle 9 is preferably 50. Degree angle.

此外,於該步驟(b)中進一步可調整該飽和槽8之溫度,使該飽和槽8溫度範圍可於313 K至363 K之範圍變化,以利於粒徑微細化,且其飽和槽8溫度範圍較佳為333 K至353 K。In addition, in the step (b), the temperature of the saturation tank 8 can be further adjusted so that the temperature range of the saturation tank 8 can be varied from 313 K to 363 K to facilitate the grain size miniaturization and the saturation tank temperature thereof. The range is preferably 333 K to 353 K.

於該步驟(c)中,將該霧化液滴接觸該沉澱槽10內預熱之氮氣,使二氧化碳釋出與溶劑蒸發,該溶質過飽和即可析出次微米級微粒,即完成製備工作。In the step (c), the atomized droplets are contacted with the preheated nitrogen gas in the precipitation tank 10 to release the carbon dioxide and evaporate the solvent, and the solute is supersaturated to precipitate the submicron-sized particles, that is, the preparation work is completed.

以下以圖2配合圖1之流程圖說明本案之製備流程如下:由質量流量控制器6固定氮氣流率,設定恆溫槽5與氮氣熱交換器7於預定之溫度;待溫度穩定,將二氧化碳以高壓液體泵2,在固定的流量下經恆溫槽預熱後輸入飽和槽8,二氧化碳經噴嘴9噴入沉澱槽10,與加熱之氮氣經沉澱槽10底部濾網11,通過濕式流量計15,觀察兩股氣流流動穩定10分鐘後,開啟泵浦3,將高分子溶液經恆溫槽5預熱後泵入飽和槽8,流率固定於5 ml/min,此設定可提供數分鐘的飽和槽8滯留時間,以利二氧化碳溶入高分子溶液。此飽和溶液經噴嘴9噴入沉澱槽10瞬間,進行二階段霧化,同時間與加熱的流動氮氣接觸,將霧化之液滴內溶劑蒸發,析出之高分子微粒,以沉澱槽底部濾網11截留加以收集,高分子溶液輸入完畢後關閉泵浦3,將收集之樣品置入乾燥室保存以進行樣品分析。The preparation process of the present invention is as follows with reference to the flow chart of FIG. 1 as follows: the nitrogen flow rate is fixed by the mass flow controller 6, and the constant temperature tank 5 and the nitrogen heat exchanger 7 are set at a predetermined temperature; The high-pressure liquid pump 2 is preheated by the constant temperature tank at a fixed flow rate and then input into the saturation tank 8, and the carbon dioxide is sprayed into the sedimentation tank 10 through the nozzle 9, and the heated nitrogen gas passes through the bottom filter screen 11 of the sedimentation tank 10, and passes through the wet flow meter 15 After observing that the two streams are stable for 10 minutes, the pump 3 is turned on, the polymer solution is preheated through the constant temperature tank 5, and then pumped into the saturation tank 8, and the flow rate is fixed at 5 ml/min. This setting can provide several minutes of saturation. The tank 8 is retained for a time to facilitate the dissolution of carbon dioxide into the polymer solution. The saturated solution is sprayed into the precipitation tank 10 through the nozzle 9 for two-stage atomization, and at the same time, it is contacted with the heated flowing nitrogen gas, and the solvent in the atomized droplet is evaporated, and the polymer particles are precipitated to precipitate the bottom of the tank. 11 interception is collected, the pump solution is turned off after the input of the polymer solution is completed, and the collected sample is placed in a drying chamber for sample analysis.

為促進溶劑的移除,沉澱槽10及預熱氮氣溫度皆固定於333 K,此溫度高於溶劑丙酮沸點329 K,低於高分子材料Tg點372 K,氮氣體積流率則固定在0.8 Nm3 /hr。以下以四個實施例分別探討噴嘴9角度、高分子溶液濃度、飽和槽8溫度與二氧化碳與高分子溶液體積流率比之效應,了解各效應對製備之高分子微粒FESEM相片微粒形態與粒徑分布影響。In order to promote the removal of the solvent, the precipitation tank 10 and the preheated nitrogen temperature are both fixed at 333 K, which is higher than the boiling point of the solvent acetone 329 K, lower than the Tg point of the polymer material 372 K, and the nitrogen volume flow rate is fixed at 0.8 Nm. 3 /hr. In the following four examples, the effects of nozzle 9 angle, polymer solution concentration, saturation tank 8 temperature and carbon dioxide and polymer solution volume flow rate ratio are discussed. The effect of each effect on the prepared polymer microparticles FESEM photo particle morphology and particle size is discussed. Distribution impact.

如圖2所示,其可見噴嘴9之局部放大示意圖,該噴嘴9之內徑為130 μm,當角度愈小,噴嘴9出口流體會近似柱狀,應不利於霧化效率。As shown in Fig. 2, a partially enlarged schematic view of the nozzle 9 is seen. The inner diameter of the nozzle 9 is 130 μm. When the angle is smaller, the outlet fluid of the nozzle 9 will be approximately columnar, which is not conducive to the atomization efficiency.

實施例一:Embodiment 1:

請參照圖3,其繪示本案之次微米級微粒的製備方法調整噴嘴角度時,所製備之高分子微粒粒徑分布圖。如上所述,於該步驟(b)中進一步可調整該噴嘴9角度,使該噴嘴9角度可於5度至90度角之範圍變化,以利於粒徑微細化,且其噴嘴9角度較佳為50度角。如圖3所示,圖中實線為50°噴嘴角度之高分子微粒粒徑分布,虛線為5°噴嘴角度之高分子微粒粒徑分布,顯示較大的50°噴嘴角度,較有利於霧化,因此所製備之高分子微粒較小且粒徑分布狹窄。Please refer to FIG. 3, which illustrates the particle size distribution of the prepared polymer particles when the nozzle angle is adjusted by the method for preparing the submicron particles in the present case. As described above, in the step (b), the angle of the nozzle 9 can be further adjusted so that the angle of the nozzle 9 can be varied within a range of 5 to 90 degrees to facilitate the finening of the particle diameter, and the nozzle 9 has a better angle. It is a 50 degree angle. As shown in Fig. 3, the solid line in the figure is the particle size distribution of the polymer particles at a nozzle angle of 50°, and the dotted line is the particle size distribution of the polymer particles at a nozzle angle of 5°, showing a larger nozzle angle of 50°, which is more favorable for fog. Therefore, the prepared polymer particles are small and the particle size distribution is narrow.

實施例二:Embodiment 2:

請一併參照圖4(a)至圖4(d),其分別繪示本案之次微米級微粒的製備方法以不同高分子溶液濃度所製備之高分子微粒之電子顯微鏡圖分布圖。如上所述,於該步驟(a)中進一步可調整該高分子溶液濃度,使該高分子溶液濃度於1 kg/m3 至50 kg/m3 之範圍變化,以利於粒徑微細化,且其濃度較佳為1 kg/m3 至10 kg/m3 。如圖4(a)至圖4(d)所示,顯示製備之高分子微粒粒徑隨濃度提高而變大,所製備之高分子微粒形狀呈現球形,例如圖4(a)之高分子溶液濃度最低,因此,製備之高分子微粒粒徑也最小;圖4(d)之高分子溶液濃度最高,因此,製備之高分子微粒粒徑也最大。Referring to FIG. 4( a ) to FIG. 4( d ), respectively, the electron micrograph distribution map of the polymer microparticles prepared by different polymer solution concentrations in the preparation method of the submicron microparticles in the present invention is shown. As described above, in the step (a), the concentration of the polymer solution can be further adjusted to change the concentration of the polymer solution in a range of 1 kg/m 3 to 50 kg/m 3 to facilitate particle size miniaturization, and The concentration is preferably from 1 kg/m 3 to 10 kg/m 3 . As shown in FIG. 4(a) to FIG. 4(d), it is shown that the particle diameter of the prepared polymer particles becomes larger as the concentration increases, and the prepared polymer particles have a spherical shape, for example, the polymer solution of FIG. 4(a). The concentration of the polymer particles is also the smallest, and the polymer solution of Figure 4(d) has the highest concentration. Therefore, the prepared polymer particles have the largest particle size.

請一併參照圖5(a)至圖5(b),其中圖5(a)繪示本案之次微米級微粒的製備方法在不同高分子溶液濃度下,所製備之高分子微粒粒徑之分布圖;圖5(b)繪示本案之次微米級微粒的製備方法在不同高分子溶液濃度下,所製備之高分子微粒之數目平均粒徑之分布圖。如圖所示,顯示高分子溶液濃度由1kg/m3 增加至50kg/m3 ,平均粒徑隨高分子溶液濃度增加而增加,粒徑分布亦變寬,製備之高分子微粒數目平均粒徑從82nm增加到155nm,因高分子溶液之黏度與表面張力隨濃度增加而增加,將不利於霧化液滴之微小化,因此製得較大之高分子顆粒且粒徑分布寬廣。結果顯示低高分子溶液濃度,有利於高分子微粒微細化與粒徑分布狹窄化。Please refer to FIG. 5( a ) to FIG. 5( b ) together, wherein FIG. 5( a ) illustrates the preparation method of the submicron particles in the present case, and the particle size of the prepared polymer particles is prepared at different polymer solution concentrations. FIG. 5(b) is a diagram showing the distribution of the number average particle diameter of the prepared polymer microparticles at different polymer solution concentrations in the preparation method of the submicron-sized microparticles in the present invention. As shown in the figure, the concentration of the polymer solution is increased from 1 kg/m 3 to 50 kg/m 3 , the average particle size increases as the concentration of the polymer solution increases, the particle size distribution also becomes wider, and the average particle size of the prepared polymer particles is average. Increasing from 82nm to 155nm, the viscosity and surface tension of the polymer solution increase with increasing concentration, which is not conducive to the miniaturization of atomized droplets, thus producing larger polymer particles and having a wide particle size distribution. The results show that the concentration of the low polymer solution is favorable for the miniaturization of the polymer particles and the narrowing of the particle size distribution.

實施例三:Embodiment 3:

請參照圖6,其繪示本案之次微米級微粒的製備方法在不同飽和槽溫度下,所製備之高分子微粒平均粒徑之分布圖。如圖所示,顯示愈高之飽和槽8溫度可製備較小之高分子顆粒,例如當飽和槽8溫度為353K時,平均粒徑為127nm,而飽和槽8溫度為313K時,平均粒徑為166nm,原因為較高的飽和槽8溫度,形成之飽和溶液黏度較低,較有利於霧化,因此能有效霧化形成微小之液滴,製備較小之高分子顆粒且粒徑分布狹窄化。但進一步升高飽和槽8溫度至363K時,平均粒徑為131nm,粒徑增加之原因為,363K較接近PMMA之Tg點372K,易使微粒軟化,成長為較大顆粒,結果顯示有利於微粒微細化與粒徑分布狹窄化之飽和槽溫度為353K。Please refer to FIG. 6 , which is a diagram showing the distribution of the average particle diameter of the prepared polymer particles at different saturation bath temperatures in the preparation method of the submicron particles in the present case. As shown in the figure, the higher the temperature of the saturated tank 8 is, the smaller the polymer particles can be prepared. For example, when the temperature of the saturated tank 8 is 353 K, the average particle diameter is 127 nm, and the average temperature of the saturated tank 8 is 313 K. It is 166nm, because the temperature of the saturated tank 8 is higher, the viscosity of the saturated solution formed is lower, which is more favorable for atomization, so it can effectively atomize to form tiny droplets, prepare smaller polymer particles and have narrow particle size distribution. Chemical. However, when the temperature of the saturated tank 8 is further increased to 363 K, the average particle diameter is 131 nm. The reason for the increase in particle size is that 363K is closer to the Tg point of 372K of PMMA, which tends to soften the particles and grow into larger particles, and the results show that it is advantageous for the particles. The saturation tank temperature at which the micronization and the particle size distribution are narrowed is 353K.

實施例四:Embodiment 4:

請一併參照圖7(a)至圖7(c),其中圖7(a)繪示本案之次微米級微粒的製備方法在飽和槽溫度為353K下,最適流率比R=1.2之示意圖;圖7(b)繪示本案之次微米級微粒的製備方法在飽和槽 溫度為333K下,最適流率比R=2.0之示意圖;圖7(c)繪示本案之次微米級微粒的製備方法在飽和槽溫度為313K下,最適流率比R=2.4之示意圖。如圖所示,在固定飽和槽8溫度下,提高流率比有利於高分子微粒微細化,且呈現一最適流率比,例如飽和槽8溫度為353K時,最適流率比R=1.2;飽和槽8溫度為333K時,最適流率比R=2.0;而飽和槽8溫度為313K時,最適流率比R=2.4。假設兩股入料可形成均勻液相,則提高流率比,可提高飽和槽8內飽和溶液之二氧化碳含量,將有利於霧化效率,因此製得較微細之高分子顆粒,但隨著流率比增加,二氧化碳能溶解於丙酮之量受限於汽液相邊界,即飽和壓縮液相之二氧化碳組成(泡點組成),如過高的流率比,會使入料流之二氧化碳組成超過泡點組成,進入汽液共存區,形成富丙酮之液相與富二氧化碳之汽相,部份丙酮會溶於富二氧化碳之汽相,使得液相高分子濃度上升,因此過高之流率比反而不利高分子顆粒之微細化。而最適流率比隨飽和槽8溫度降低而上升,則是因為較低之溫度能溶解愈多的二氧化碳所致(即低溫具備較高之泡點組成)。Please refer to FIG. 7(a) to FIG. 7(c) together, wherein FIG. 7(a) shows the preparation method of the sub-micron-sized particles in the present case, and the optimum flow rate ratio R=1.2 at a saturated bath temperature of 353K. Figure 7 (b) shows the preparation method of the sub-micron particles in this case in the saturation tank The temperature is 333K, the optimum flow rate ratio is R=2.0; FIG. 7(c) shows the preparation method of the sub-micron particles in the present case, the optimum flow rate ratio R=2.4 under the saturation bath temperature of 313K. As shown in the figure, at the temperature of the fixed saturation tank 8, the increase of the flow rate ratio is advantageous for the micronization of the polymer particles, and exhibits an optimum flow rate ratio, for example, when the temperature of the saturation tank 8 is 353 K, the optimum flow rate ratio R = 1.2; When the temperature of the saturated tank 8 is 333 K, the optimum flow rate ratio is R=2.0; and when the temperature of the saturated tank 8 is 313 K, the optimum flow rate ratio is R=2.4. Assuming that the two feeds can form a homogeneous liquid phase, increasing the flow rate ratio can increase the carbon dioxide content of the saturated solution in the saturated tank 8, which will facilitate the atomization efficiency, thereby producing finer polymer particles, but with the flow The ratio of carbon dioxide can be dissolved in acetone, which is limited by the vapor-liquid phase boundary, that is, the carbon dioxide composition of the saturated compressed liquid phase (bubble point composition). If the flow rate ratio is too high, the carbon dioxide composition of the influent stream will exceed The bubble point composition enters the vapor-liquid coexistence zone to form a vapor-rich liquid phase and a carbon dioxide-rich vapor phase. Part of the acetone is dissolved in the carbon dioxide-rich vapor phase, so that the liquid phase polymer concentration increases, so the flow rate ratio is too high. It is not advantageous for the miniaturization of polymer particles. The optimum flow rate ratio increases as the temperature of the saturated tank 8 decreases, because the lower temperature can dissolve more carbon dioxide (ie, the low temperature has a higher bubble point composition).

因此,本發明之次微米級微粒的製備方法,其具有可析出超細微粒及產量高,且水溶液及有機溶液皆可使用之優點。因此,本發明之次微米級微粒的製備方法確實較習知技術具有進步性。Therefore, the preparation method of the submicron-sized fine particles of the present invention has the advantages that the ultrafine particles can be precipitated and the yield is high, and both the aqueous solution and the organic solution can be used. Therefore, the preparation method of the submicron-sized particles of the present invention is indeed more advanced than the prior art.

本案所揭示者,乃較佳實施例,舉凡局部之變更或修飾而源於本案之技術思想而為熟習該項技藝之人所易於推知者,俱不脫本案之專利權範疇。The disclosure of the present invention is a preferred embodiment. Any change or modification of the present invention originating from the technical idea of the present invention and being easily inferred by those skilled in the art will not deviate from the scope of patent rights of the present invention.

綜上所陳,本案無論就目的、手段與功效,在在顯示其迥異於習知之技術特徵,且其首先發明合於實用,亦在在符合發明之專利要件,懇請 貴審查委員明察,並祈早日賜予專利,俾嘉惠社會,實感德便。In summary, this case, regardless of its purpose, means and efficacy, is showing its technical characteristics that are different from the conventional ones, and its first invention is practical and practical, and it is also in compliance with the patent requirements of the invention. I will be granted a patent at an early date.

1‧‧‧過濾器1‧‧‧Filter

2、3‧‧‧泵浦2, 3‧‧ ‧ pump

5‧‧‧恆溫槽5‧‧‧ thermostat

4‧‧‧高分子溶液4‧‧‧ polymer solution

6‧‧‧質量流量控制器6‧‧‧Quality Flow Controller

7‧‧‧氮氣熱交換器7‧‧‧ nitrogen heat exchanger

8‧‧‧高壓飽和槽8‧‧‧High pressure saturated tank

9‧‧‧噴嘴9‧‧‧ nozzle

10‧‧‧沉澱槽10‧‧‧Sedimentation tank

11‧‧‧濾網11‧‧‧ Filter

12‧‧‧溫度計12‧‧‧ thermometer

13‧‧‧壓力計13‧‧‧ Pressure gauge

14...汽液分離槽14. . . Vapor-liquid separation tank

15...濕式流量計15. . . Wet flow meter

步驟(a):將待造微粒之溶質溶液與超臨界流體經泵浦2、3輸入一高壓飽和槽8,進行混合以形成二氧化碳飽和溶液;Step (a): the solute solution of the particles to be formed and the supercritical fluid are pumped into the high pressure saturation tank 8 by pumping 2, 3, and mixed to form a carbon dioxide saturated solution;

步驟(b):將該二氧化碳飽和溶液通過該高壓飽和槽8底部之一霧化噴嘴9,噴入常壓之一沉澱槽10,以形成霧化液滴;以及Step (b): passing the carbon dioxide saturated solution through one of the atomizing nozzles 9 at the bottom of the high-pressure saturated tank 8, and spraying it into one of the atmospheric pressure precipitation tanks 10 to form atomized droplets;

步驟(c):將該霧化液滴接觸該沉澱槽10內預熱之氮氣,使二氧化碳釋出與溶劑蒸發,該溶質過飽和即可析出次微米級微粒。Step (c): contacting the atomized droplets with the preheated nitrogen in the precipitation tank 10 to release the carbon dioxide and evaporate the solvent, and the solute is supersaturated to precipitate the submicron-sized particles.

圖1為一示意圖,其繪示本案一較佳實施例之次微米級微粒 的製備方法之流程示意圖。1 is a schematic view showing a submicron particle of a preferred embodiment of the present invention Schematic diagram of the preparation method.

圖2為一示意圖,其繪示用以製備本案之次微米級微粒的裝置之示意圖。Figure 2 is a schematic diagram showing a schematic of an apparatus for preparing sub-micron particles of the present invention.

圖3為一示意圖,其繪示本案之次微米級微粒的製備方法調整噴嘴角度時,所製備之高分子微粒粒徑分布圖。Fig. 3 is a schematic view showing the particle size distribution of the prepared polymer particles when the nozzle angle is adjusted by the method for preparing the submicron particles in the present case.

圖4(a)至圖4(d)為示意圖,其分別繪示本案之次微米級微粒的製備方法以不同高分子溶液濃度所製備之高分子微粒之電子顯微鏡圖分布圖。4(a) to 4(d) are schematic views respectively showing the electron micrograph distribution map of the polymer microparticles prepared by different polymer solution concentrations in the preparation method of the submicron-sized microparticles of the present invention.

圖5(a)為一示意圖,其繪示本案之次微米級微粒的製備方法在不同高分子溶液濃度下,所製備之高分子微粒粒徑之分布圖。Fig. 5(a) is a schematic view showing the distribution of the particle size of the prepared polymer particles at different polymer solution concentrations in the preparation method of the submicron-sized particles of the present invention.

圖5(b)為一示意圖,其繪示本案之次微米級微粒的製備方法在不同高分子溶液濃度下,所製備之高分子微粒之數目平均粒徑之分布圖。Fig. 5(b) is a schematic view showing the distribution of the number average particle diameter of the prepared polymer microparticles at different polymer solution concentrations in the preparation method of the submicron-sized microparticles of the present invention.

圖6為一示意圖,其繪示本案之次微米級微粒的製備方法在不同飽和槽溫度下,所製備之高分子微粒平均粒徑之分布圖。Fig. 6 is a schematic view showing the distribution of the average particle diameter of the prepared polymer particles at different saturation bath temperatures in the preparation method of the submicron particles in the present case.

圖7(a)為一示意圖,其繪示本案之次微米級微粒的製備方法在飽和槽溫度為353K下,最適流率比R=1.2之示意圖。Fig. 7(a) is a schematic view showing the preparation method of the submicron-sized particles of the present invention at an optimum flow rate ratio of R = 1.2 at a saturation bath temperature of 353K.

圖7(b)為一示意圖,其繪示本案之次微米級微粒的製備方法在飽和槽溫度為333K下,最適流率比R=2.0之示意圖。Fig. 7(b) is a schematic view showing the preparation method of the submicron-sized particles of the present invention at an optimum flow rate ratio of R = 2.0 at a saturation bath temperature of 333 K.

圖7(c)為一示意圖,其繪示本案之次微米級微粒的製備方法在飽和槽溫度為313K下,最適流率比R=2.4之示意圖。Fig. 7(c) is a schematic view showing the preparation method of the submicron-sized particles of the present invention at an optimum flow rate ratio of R = 2.4 at a saturation bath temperature of 313 K.

Claims (8)

一種次微米級微粒的製備方法,其包括下列步驟:(a)將待造微粒之溶質溶液與超臨界流體經泵浦輸入一高壓飽和槽,進行混合以形成二氧化碳飽和溶液;(b)將該二氧化碳飽和溶液通過該高壓飽和槽底部之一霧化噴嘴,噴入常壓之一沉澱槽,以形成霧化液滴;以及(c)將該霧化液滴接觸該沉澱槽內預熱之氮氣,使二氧化碳釋出與溶劑蒸發,該溶質過飽和即可析出次微米級微粒。 A method for preparing submicron-sized particles, comprising the steps of: (a) pumping a solute solution of a particle to be formed into a high-pressure saturation tank by pumping to form a saturated solution of carbon dioxide; (b) The carbon dioxide saturated solution passes through an atomizing nozzle at the bottom of the high pressure saturated tank, is sprayed into one of the atmospheric pressure precipitation tanks to form atomized droplets; and (c) contacts the atomized droplets with the preheated nitrogen gas in the precipitation tank The carbon dioxide is released and the solvent is evaporated, and the solute is supersaturated to precipitate submicron-sized particles. 如申請專利範圍第1項所述之次微米級微粒的製備方法,其中於該步驟(a)中,該超臨界流體係選自二氧化碳、一氧化氮、氟氯碳化物及其混合物。 The method for preparing submicron-sized particles according to claim 1, wherein in the step (a), the supercritical flow system is selected from the group consisting of carbon dioxide, nitrogen monoxide, chlorofluorocarbons, and mixtures thereof. 如申請專利範圍第2項所述之次微米級微粒的製備方法,其中於該步驟(a)中,該待造微粒之溶質溶液中之溶質係選自高分子、醫藥、顏料、影印碳粉、金屬氧化物材料;溶劑係選自二甲基亞碸、二氯甲烷、丙酮、甲醇、乙醇、純水、乙醇水溶液、乙酸水溶液。 The method for preparing submicron-sized particles according to claim 2, wherein in the step (a), the solute in the solute solution of the particles to be formed is selected from the group consisting of a polymer, a medicine, a pigment, and a photocopying toner. a metal oxide material; the solvent is selected from the group consisting of dimethyl hydrazine, dichloromethane, acetone, methanol, ethanol, pure water, aqueous ethanol, and aqueous acetic acid. 如申請專利範圍第3項所述之次微米級微粒的製備方法,其中該高分子材料為聚甲基丙烯酸甲酯(PMMA)高分子材料。 The method for preparing sub-micron particles according to claim 3, wherein the polymer material is a polymethyl methacrylate (PMMA) polymer material. 如申請專利範圍第1項所述之次微米級微粒的製備方法,其中於該步驟(a)中,進一步可調整該高分子溶液濃度,使該高分子溶液濃度於1kg/m3 至50kg/m3 之範圍變化,以利於粒徑微細化。The method for preparing submicron-sized microparticles according to claim 1, wherein in the step (a), the concentration of the polymer solution is further adjusted so that the concentration of the polymer solution is from 1 kg/m 3 to 50 kg/ The range of m 3 is varied to facilitate the miniaturization of the particle size. 如申請專利範圍第3項所述之次微米級微粒的製備方法,其中於該步驟(a)中,進一步可調整該二氧化碳與高分子溶液體積流率比,使該二氧化碳與高分子溶液體積流率比於0.8至2.8之範圍變化,以利於粒徑微細化。 The method for preparing sub-micron-sized particles according to claim 3, wherein in the step (a), the volumetric flow rate ratio of the carbon dioxide to the polymer solution is further adjusted to make the volume flow of the carbon dioxide and the polymer solution The ratio is varied from 0.8 to 2.8 to facilitate particle size miniaturization. 如申請專利範圍第1項所述之次微米級微粒的製備方法,其中於該步驟(b)中,進一步可調整該噴嘴角度,使該噴嘴角度可於5度至90度角之範圍變化,以利於粒徑微細化。 The method for preparing sub-micron-sized particles according to claim 1, wherein in the step (b), the nozzle angle is further adjusted so that the nozzle angle can be varied within a range of 5 to 90 degrees. In order to facilitate the finer particle size. 如申請專利範圍第1項所述之次微米級微粒的製備方法,其中於該步驟(b)中,進一步可調整該飽和槽之溫度,使該飽和槽溫度範圍可於313K至363K之範圍變化,以利於粒徑微細化。The method for preparing sub-micron-sized particles according to claim 1, wherein in the step (b), the temperature of the saturation tank can be further adjusted so that the temperature range of the saturation tank can be varied from 313K to 363K. In order to facilitate the finer particle size.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1186625A2 (en) * 2000-09-08 2002-03-13 R & D Technology, Inc. Particle size reduction using supercritical materials
US20050181059A1 (en) * 2003-09-30 2005-08-18 Spherics, Inc. Nanoparticulate therapeutic biologically active agents

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1186625A2 (en) * 2000-09-08 2002-03-13 R & D Technology, Inc. Particle size reduction using supercritical materials
US20050181059A1 (en) * 2003-09-30 2005-08-18 Spherics, Inc. Nanoparticulate therapeutic biologically active agents

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