TWI422432B - A method for making a slow releasing device for slowing releasing chlorine dioxide - Google Patents

A method for making a slow releasing device for slowing releasing chlorine dioxide Download PDF

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TWI422432B
TWI422432B TW99138929A TW99138929A TWI422432B TW I422432 B TWI422432 B TW I422432B TW 99138929 A TW99138929 A TW 99138929A TW 99138929 A TW99138929 A TW 99138929A TW I422432 B TWI422432 B TW I422432B
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chlorine dioxide
dioxide gas
container
slow release
release device
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TW201219114A (en
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Hsin Chiao Fu
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Hsin Chiao Fu
Fu Tzu Jung
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  • Separation Of Gases By Adsorption (AREA)
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Description

二氧化氯氣體緩釋器及其製造方法 Chlorine dioxide gas slow release device and manufacturing method thereof

本發明係關於一種二氧化氯氣體緩釋器及其製造方法,尤指一種將二氧化氯氣體吸附於載體,而提供緩慢、長效釋放之方法及其產品。 The present invention relates to a chlorine dioxide gas slow release device and a method for producing the same, and more particularly to a method for adsorbing chlorine dioxide gas to a carrier to provide a slow, long-acting release and a product thereof.

二氧化氯(ClO2)是一種強氧化劑,具有高效消毒與殺菌作用,它已被國際公認為性能優良,效果非常好的殺菌消毒劑、水質淨化劑,而且世界衛生組織已將二氧化氯列為A1級高級安全消毒劑。 Chlorine Dioxide (ClO 2 ) is a strong oxidant with high efficiency of disinfection and bactericidal action. It has been recognized as a good disinfectant and water purifier with excellent performance, and the World Health Organization has listed chlorine dioxide. It is an A1 grade advanced safety disinfectant.

由於二氧化氯液體製劑,存在有二氧化氯氣體不穩定,易分解,其貯存、運輸和使用等方面都受到很多的限制,因此有製成固體二氧化氯(即通稱之穩定性二氧化氯)的方式,主要分為兩大類 Due to the chlorine dioxide liquid preparation, chlorine dioxide gas is unstable and easily decomposed, and its storage, transportation and use are subject to many restrictions. Therefore, solid chlorine dioxide is produced (that is, the so-called stable chlorine dioxide) ), mainly divided into two major categories

一、對於二氧化氯氣體進行加工處理,先預製成亞氯酸根離子(ClO2 -)的穩定性二氧化氯溶液(其事實上就是利用製取的亞氯酸根離子(ClO2 -)溶入偏鹼性的緩衝溶液中),再利用固形劑及穩定劑直接吸附製成所謂的穩定性固體二氧化氯,再配以固體酸劑混合包裝製成; 二、以亞氯酸鈉或氯酸鈉為基質,配以凝膠物質為輔料,酸性物質為活化劑,混合包裝製成。 One for chlorine dioxide gas for processing, the first preformed chlorite ion (ClO 2 -) stable chlorine dioxide solution (which in fact is the use of the preparation of the chlorite ion (ClO 2 -) solution Into the alkaline buffer solution), and then directly adsorbed by the solid agent and the stabilizer to form a so-called stable solid chlorine dioxide, and then mixed with a solid acid agent; second, sodium chlorite or chlorine Sodium is used as a matrix, with a gel material as an auxiliary material, and an acidic substance as an activator, which is prepared by mixing and packaging.

上述兩大類均以製成固體形態之粉劑,粒劑或錠劑等方式,以達到慢慢吸收水氣之緩釋性固體產品,或是需要時投入水中讓化學試劑溶解反應以獲取二氧化氯氣體之水溶液。例如台灣專利申請號087107160,096102799,096105956,096116154,以及美國專利號第4689169號等屬之。 The above two categories are prepared into a solid form of powder, granules or tablets to achieve a slow-release solid product that slowly absorbs moisture, or if necessary, is put into water to dissolve the chemical reagent to obtain chlorine dioxide. An aqueous solution of gas. For example, Taiwan Patent Application No. 087107160, 096102799, 096105956, 096116154, and U.S. Patent No. 4,689,169, and the like.

由於上述方法取得氣態二氧化氯之應用中有其缺點,即是反應生成副產物及殘留下來未反應完全的有機物及無機物,會造成二氧化氯氣體(ClO2)與水中的可氧化物質迅速進一步反應產生亞氯酸塩(ClO2 -),氯酸塩(ClO3 -)和氯化塩(Cl-),而非我們所需要的二氧化氯氣體分子(ClO2)。市場上,除上述穩定性二氧化氯產品外,目前市場上還有二氧化氯水溶液產品,如美國專利第5296108、5993864號專利屬之,此些產品仍然還有另外存在的諸多問題與缺失,說明如下:(1)一般傳統的製造者,不論是用電解法或化學法,都是將二氧化氯溶入水體中,以水溶液方式運送或貯存,其缺點為二氧化氯氣體會在水體中不穩定地衰變,迅速分解成ClO2 -、ClO3 -及Cl-等各種陰離子形態。(2)將電解法之設備裝置放置於使用者的地點處,於現場使用時才啟動設備製造出二氧化氯水溶液,便於即用即取,其缺點為目前需專業技術人員操作,製造過程不方便於一般大眾使用。(3)利用化學法於使用的時刻及地點,仍然是現場製造使用,將混合的各種化學試劑投入水體中,在水中反應後,製造出二氧 化氯水溶液,其缺點為必須注意避免太激烈的反應及水溶液中會殘留反應未完全之殘留化學物質及副產物等。 Since the above method has the disadvantages of obtaining gaseous chlorine dioxide, that is, reaction by-products and residual unreacted organic matter and inorganic substances, chlorine dioxide gas (ClO 2 ) and oxidizable substances in water are rapidly further developed. The reaction produces bismuth chlorite (ClO 2 - ), bismuth chlorate (ClO 3 - ) and cesium chloride (Cl - ) instead of the chlorine dioxide gas molecule (ClO 2 ) we need. In the market, in addition to the above-mentioned stable chlorine dioxide products, there are currently chlorine dioxide aqueous products on the market, such as the patents of U.S. Patent Nos. 5,296,108 and 5,993,864, and there are still many other problems and defects in these products. The description is as follows: (1) Generally, traditional manufacturers, whether by electrolysis or chemical method, dissolve chlorine dioxide into water and transport or store it as an aqueous solution. The disadvantage is that chlorine dioxide gas will not be in water. It decays steadily and decomposes rapidly into various anionic forms such as ClO 2 - , ClO 3 - and Cl - . (2) Place the equipment of the electrolysis method at the location of the user, and start the equipment to produce the chlorine dioxide aqueous solution when it is used in the field, which is convenient for ready-to-use. The disadvantage is that it requires professional technicians to operate, and the manufacturing process is not Convenient for the general public. (3) At the time and place of use of the chemical method, it is still used on site. The various chemical reagents are mixed into the water and reacted in water to produce an aqueous solution of chlorine dioxide. The disadvantage is that it must be avoided too much. Residual chemicals, by-products, etc., which are not completely reacted, remain in the reaction and in the aqueous solution.

有鑒於前述各種先前技術之問題,本發明人認為應有一種改善之方法,並且藉由該方法而製造出能夠具體改善前述更佳之產品。為此設計一種二氧化氯氣體緩釋器之製造方法,其技術手段之步驟包括:取二氧化氯氣體進入放置有複數顆粒狀載體之容槽,該各載體表面具有複數孔隙:且該容槽設於30℃以下之冷室環境;以令該二氧化氯氣體被該複數顆粒狀載體吸附;再於30℃以下之冷室環境將該容槽內之載體進行填充作業於盛裝容器,再將該盛裝容器封閉。 In view of the foregoing various prior art problems, the inventors believe that there should be an improved method by which a product which can specifically improve the foregoing is manufactured. To this end, a method for manufacturing a chlorine dioxide gas slow release device is designed. The technical means comprises: taking chlorine dioxide gas into a cavity in which a plurality of granular carriers are placed, the surface of each carrier having a plurality of pores: and the cavity Provided in a cold room environment below 30 ° C; so that the chlorine dioxide gas is adsorbed by the plurality of granular carriers; and the carrier in the container is filled in a container in a cold room environment below 30 ° C, and then The container is closed.

從而依據前述方法取得一種二氧化氯氣體緩釋器,包括一密閉盛裝容器,該盛裝容器內部設有複數顆粒狀載體,且各載體表面具有複數孔隙,且該盛裝容器內部於該複數顆粒狀載體吸附有二氧化氯氣體。 Therefore, a chlorine dioxide gas slow release device is obtained according to the foregoing method, comprising a sealed container, the container is provided with a plurality of granular carriers, and each carrier surface has a plurality of pores, and the container is internally filled with the plurality of granular carriers Adsorbed with chlorine dioxide gas.

前述之方法以及產品,可將預製的二氧化氯氣體(該二氧化氯氣體可以為電解法或化學法預製),利用複數孔隙性複數顆粒狀載體為吸附物質,妥善有效地以低溫冷卻環境,輔助複數顆粒狀載體吸附二氧化氯的氣體形態分子,並且封裝於特製的盛裝容器(較佳為不透氣、不透光)中,製成二氧化氯氣體緩釋器,以便於使用者隨時可直接釋放及取用二氧化氯氣體。此發明確實解決了二氧化氯氣體存在已久的多方面限制:不穩定、易分解、無法攜帶、不易運輸的缺點。且製成 一種輕便又容易攜帶而且可長期貯存、隨時可取用之二氧化氯氣體的產品,達到簡化使用、方便取用不需製取的多重效果。 In the foregoing method and product, pre-made chlorine dioxide gas (the chlorine dioxide gas may be pre-formed by electrolysis or chemical method), and a plurality of porous multi-grain-shaped carriers are used as adsorbent materials to properly and effectively cool the environment. Auxiliary plural particulate carrier adsorbs gas form molecules of chlorine dioxide, and is packaged in a special container (preferably airtight, opaque) to form a chlorine dioxide gas slow release device, so that the user can readily Direct release and access to chlorine dioxide gas. This invention does address the long-standing limitations of chlorine dioxide gas: unstable, easily decomposable, unusable, and difficult to transport. And made A light-weight, easy-to-carry, long-term storage, ready-to-use chlorine dioxide gas product that simplifies use and facilitates access to multiple effects that are not required.

(10)‧‧‧二氧化氯產生源 (10) ‧‧‧ Sources of chlorine dioxide production

(11)‧‧‧進氣管路 (11)‧‧‧Intake line

(12)‧‧‧純化單元 (12)‧‧‧ Purification unit

(2)‧‧‧容槽 (2) ‧‧‧ 容容

(21)‧‧‧載體 (21) ‧ ‧ carrier

(211)‧‧‧孔隙 (211) ‧ ‧ pores

(3)‧‧‧槽體 (3) ‧‧‧ tank

(3A)‧‧‧冷櫃 (3A) ‧ ‧ freezer

(31)‧‧‧電子控溫裝置 (31)‧‧‧Electronic temperature control device

(41)‧‧‧出氣管路 (41)‧‧‧Exhaust line

(42)‧‧‧循環管路 (42) ‧‧‧Circulation lines

(43)‧‧‧文氏管 (43) ‧‧‧ Venturi tube

(44)‧‧‧循環泵 (44) ‧ ‧ Circulating pump

(45)‧‧‧吸收槽 (45) ‧‧ ‧ absorption tank

(5)‧‧‧盛裝容器 (5)‧‧‧ Containers

(51)‧‧‧蓋體 (51)‧‧‧ Cover

(511)‧‧‧孔洞 (511)‧‧‧ holes

第一圖係本發明之流程圖 The first figure is a flow chart of the present invention

第二圖係本發明方法實施例(一)之示意圖 The second figure is a schematic diagram of the method (1) of the method of the present invention.

第三圖係本發明方法實施例(二)之示意圖 The third figure is a schematic diagram of the method (2) of the method of the present invention.

第四圖係本發明之容槽另一形狀應用之示意圖 The fourth figure is a schematic diagram of another shape application of the cuvette of the present invention.

第五A圖係本發明之成品示意圖 Figure 5A is a schematic view of the finished product of the present invention

第五B圖係本發明使用狀態穿設孔洞示意圖 Figure 5B is a schematic view of the hole through which the present invention is used.

以下配合圖式,說明本發明之製備方法、技術手段,說明本發明之內容、特色以及實施例,提供有助於審查之理解。 The preparation method and technical means of the present invention will be described below in conjunction with the drawings, and the contents, features and embodiments of the present invention will be described, and an understanding of the review will be provided.

請參閱第一圖所示,配合第二圖所示,本發明係關於一種二氧化氯氣體緩釋器之製造方法,就具體之實施例而言,包括但不限於以下步驟: Referring to the first figure, the present invention relates to a method for manufacturing a chlorine dioxide gas slow release device. The specific embodiment includes, but is not limited to, the following steps:

1.依據電解法或化學法預製二氧化氯氣體; 1. Pre-manufacturing chlorine dioxide gas according to electrolysis or chemical method;

2.純化二氧化氯氣體; 2. Purifying chlorine dioxide gas;

3.取二氧化氯氣體進入放置有複數顆粒狀載體(21)之容槽(2),該容槽(2)可選自玻璃材質、塑膠材質、不銹鋼材質等,該容槽(2)可如第四圖所示之錐形瓶之型態,或三角體、球體、方形體等。該各載體(21)表面具有複數孔隙(211);且該容槽(2)設於30℃以下之冷室環境(實際是溫度愈低效果愈好);以令該二氧化氯氣體被該複數顆粒狀載體(21)吸附 。 3. taking chlorine dioxide gas into a cavity (2) in which a plurality of granular carriers (21) are placed, the container (2) may be selected from glass material, plastic material, stainless steel material, etc., the container (2) may be The shape of the conical flask as shown in the fourth figure, or a triangle, a sphere, a square, and the like. The surface of each carrier (21) has a plurality of pores (211); and the tank (2) is disposed in a cold chamber environment below 30 ° C (actually, the lower the temperature is, the better); so that the chlorine dioxide gas is Multiple particulate carrier (21) adsorption .

4.再將該容槽(2)內之載體(21)進行填充作業於請參閱第五A圖所示之盛裝容器(5); 4. Filling the carrier (21) in the container (2) again, please refer to the container (5) shown in Figure 5A;

5.再將該盛裝容器(5)封閉。 5. Close the container (5).

該盛裝容器(5)可以於使用時,請參閱第五B圖所示,於其本體,該本體較佳是頂部設有一蓋體(51),該蓋體(51)便於穿設孔洞(511),也可以直接打開該孔洞(511),以供該吸附有二氧化氯氣體之複數顆粒狀載體(21)得以緩慢且長效釋放該二氧化氯氣體。 When the container (5) is in use, please refer to FIG. 5B. In the main body, the body is preferably provided with a cover body (51) at the top, and the cover body (51) is convenient for the hole (511). The hole (511) may also be directly opened for the slow and long-term release of the chlorine dioxide gas by the plurality of particulate carriers (21) adsorbed with chlorine dioxide gas.

即待使用時只要將盛裝容器(5)拆封,包括穿孔或者打開蓋體(51),藉由盛裝容器(5)內空間之釋壓,穩定釋放二氧化氯氣體分子於大氣空間中,或是將此固體載體吸附物質直接投入定量水中,即可得一定濃度之二氧化氯水溶液,因此可輕易取得二氧化氯消毒水;利用此法無論是取用二氧化氯之氣體或是其水溶液,均不再需要於現場配置,非常方便於儲存、攜帶及安全運輸,簡化了使用方法。 That is, when the container (5) is unsealed, including perforation or opening of the cover body (51), the chlorine dioxide gas molecules are stably released in the atmosphere by releasing the space in the container (5), or The solid carrier adsorbed material is directly put into the quantitative water to obtain a certain concentration of chlorine dioxide aqueous solution, so that the chlorine dioxide disinfecting water can be easily obtained; whether the chlorine dioxide gas or the aqueous solution is used by the method, They no longer need to be configured on site, which is very convenient for storage, carrying and safe transportation, which simplifies the use.

更進一步說明,請參閱第二圖所示,該取二氧化氯氣體進入該容槽(2)之流程,係包括:由二氧化氯產生源(10),該二氧化氯產生源(10)可以為一化學法或電解法製取之反應槽,然後以一進氣管路(11)輸送該二氧化氯氣體,並經過一純化單元(12),令該二氧化氯氣體更為純化,並由該進氣管路(11)進入該容槽(2)內部,且該容槽(2)連通一出氣管路(41),以逸出多餘之二氧化氯氣體,另設一循環管路(42),該循環管路(42)之路徑設一文氏管 (43),該文氏管(43)連通該出氣管路(41),且該循環管路(42)設一循環泵(44),以該循環泵(44)啟動而造成水流在文氏管(43)造成該出氣管路(41)之吸力,且該循環管路(42)之路徑另外設一吸收槽(45),當該吸收槽(45)內部置有水液時,可以溶入或吸附該多餘之二氧化氯氣體。同時對於該二氧化氯氣體被該複數顆粒狀載體(21)可以產生穩定吸附濃縮的效果。而且二氧化氯氣體被吸附量的多寡(即被吸附的濃度高低),可由持續導入的二氧化氯氣體與該複數顆粒狀載體(21)接觸時間的長短來控制。 To further illustrate, referring to the second figure, the process of taking chlorine dioxide gas into the tank (2) includes: generating a source (10) from chlorine dioxide, the chlorine dioxide generating source (10) The reaction tank can be prepared by a chemical method or an electrolysis method, and then the chlorine dioxide gas is transported by an intake line (11) and passed through a purification unit (12) to further purify the chlorine dioxide gas, and The intake line (11) enters the inside of the tank (2), and the tank (2) is connected to an outlet line (41) to escape excess chlorine dioxide gas, and a circulation line is additionally provided. (42), the path of the circulation line (42) is provided with a venturi (43), the venturi (43) is connected to the outlet line (41), and the circulation line (42) is provided with a circulation pump (44), and the circulation pump (44) is activated to cause water flow in the Wenli The tube (43) causes the suction of the outlet line (41), and the path of the circulation line (42) is additionally provided with an absorption tank (45). When the absorption tank (45) is provided with water liquid, it can be dissolved. The excess chlorine dioxide gas is introduced or adsorbed. At the same time, the chlorine dioxide gas can be stably adsorbed and concentrated by the plurality of particulate carriers (21). Further, the amount of chlorine dioxide gas adsorbed (i.e., the concentration at which adsorption is carried out) can be controlled by the length of time in which the continuously introduced chlorine dioxide gas is contacted with the plurality of particulate carriers (21).

更進一步說明,本發明之該各載體(21)係選自矽藻土、高嶺土、膨潤土、皂土、沸石、麥飯石、竹炭粉、生石灰、矽酸鈣、矽膠、陶瓷球(矽鋁氧化合物)、活性氧化鋁、分子篩等群組中之一種或一種以上之混合。其中該分子篩更進一步可為選自鋁矽酸塩礦或碳分子篩。 Further, the carrier (21) of the present invention is selected from the group consisting of diatomaceous earth, kaolin, bentonite, bentonite, zeolite, medical stone, bamboo charcoal powder, quicklime, calcium silicate, tannin, ceramic ball (yttrium aluminum oxide). a mixture of one or more of a group of activated alumina, molecular sieves, and the like. The molecular sieve may further be selected from the group consisting of barium aluminate or carbon molecular sieves.

該群組物質之特性,由於具有細密複數孔隙的構造,吸附之比表面積大的特點,故優選做為二氧化氯氣體的固體載體吸附物質。 The characteristics of the group of substances are preferably a solid carrier adsorbing substance of chlorine dioxide gas because of the structure of fine plural pores and the large specific surface area of adsorption.

此外,本發明之該冷室環境,其實施例係將該容槽(2)納入一槽體(3),該槽體(3)可選自玻璃材質、塑膠材質、不銹鋼材質等或杜瓦瓶(Dewar Caddie)等,且基於成本考量,該冷室環境可以係將該容槽(2)納入一槽體(3),且該槽體(3)內部盛裝致冷媒介體。而該致冷媒介體基於便於取得以及成本考量,更進一步可以為選自低溫之冷水、冰塊、乾冰或液態氮其中之一。當然,並不侷限於前述。 In addition, in the cold room environment of the present invention, the embodiment is to incorporate the container (2) into a tank body (3), which may be selected from glass material, plastic material, stainless steel material, etc. or Dewar. A bottle (Dewar Caddie) or the like, and based on cost considerations, the cold chamber environment may incorporate the tank (2) into a tank (3), and the tank (3) contains a refrigerant medium inside. The refrigerant medium may further be one of cold water, ice cubes, dry ice or liquid nitrogen selected from low temperature based on ease of availability and cost considerations. Of course, it is not limited to the foregoing.

請參閱第三圖所示,該冷室環境也可以係一冷櫃(3A)內部,該冷櫃(3A)廣義包括冰箱、冷藏箱、冷凍箱或其他可以使內部空間致冷之容器。且該冷櫃(3A)可以為附有電子控溫裝置(31)。 Referring to the third figure, the cold room environment can also be inside a freezer (3A) which broadly includes a refrigerator, a freezer, a freezer or other container that can cool the interior space. And the refrigerator (3A) may be equipped with an electronic temperature control device (31).

請參閱第五A圖所示,就本發明所製之產品,該二氧化氯氣體緩釋器,包括:一密閉盛裝容器(5),該密閉盛裝容器(5)內部設有複數顆粒狀載體(21),且各載體(21)表面具有複數孔隙(211),且該盛裝容器(5)內部於該複數顆粒狀載體(21)吸附有二氧化氯氣體,又本發明之該各載體(21)係選自矽藻土、高嶺土、膨潤土、皂土、沸石、麥飯石、竹炭粉、生石灰、矽酸鈣、矽膠、陶瓷球(矽鋁氧化合物)、活性氧化鋁、分子篩等群組中之一種或一種以上之混合。其中該分子篩更進一步可為選自鋁矽酸塩礦或碳分子篩。 Referring to FIG. 5A, in the product of the present invention, the chlorine dioxide gas slow release device comprises: a sealed container (5), and the sealed container (5) is provided with a plurality of granular carriers. (21), and each carrier (21) has a plurality of pores (211) on its surface, and the inside of the container (5) is adsorbed with chlorine dioxide gas in the plurality of particulate carriers (21), and the carriers of the present invention ( 21) selected from the group consisting of diatomaceous earth, kaolin, bentonite, bentonite, zeolite, medical stone, bamboo charcoal powder, quicklime, calcium citrate, tannin, ceramic ball (yttrium aluminum oxide), activated alumina, molecular sieve, etc. One or more of a mixture. The molecular sieve may further be selected from the group consisting of barium aluminate or carbon molecular sieves.

本發明確實對產業而言達到有效廣泛應用的產業利用性,爰依法提出專利申請。惟,前揭之例舉,僅為本發明之實施例,凡與本發明之專利範圍為均等設計者,亦涵括於所欲保障之範疇。 The present invention does achieve industrial utilization of an effective and widely used industry, and proposes a patent application according to law. However, the foregoing examples are merely examples of the present invention, and the scope of the patents of the present invention is also included in the scope of the claimed.

Claims (7)

一種二氧化氯氣體緩釋器之製造方法,其步驟包括:取二氧化氯氣體進入放置有複數顆粒狀載體之容槽,該各載體表面具有複數孔隙:且該容槽設於30℃以下之冷室環境;以令該二氧化氯氣體被該複數顆粒狀載體吸附;再於30℃以下之冷室環境將該容槽內之載體進行填充作業於盛裝容器,再將該盛裝容器封閉,其中該取二氧化氯氣體進入該容槽之流程,係包括由二氧化氯產生源以一進氣管路輸送該二氧化氯氣體,並經過一純化單元,令該二氧化氯氣體更為純化,並由該進氣管路進入該容槽內部,且該容槽連通一出氣管路,以逸出多餘之二氧化氯氣體,另設一循環管路,該循環管路之路徑設一文氏管,該文氏管連通該出氣管路,且該循環管路設一循環泵,以該循環泵啟動而造成水流在文氏管造成該出氣管路之吸力,且該循環管路之路徑另外設一吸收槽,當該吸收槽內部置有水液時,可以溶入或吸附該多餘之二氧化氯氣體。 A method for producing a chlorine dioxide gas slow release device, comprising the steps of: taking chlorine dioxide gas into a cavity in which a plurality of granular carriers are placed, the surface of each carrier having a plurality of pores: and the container is disposed below 30 ° C a cold chamber environment; the chlorine dioxide gas is adsorbed by the plurality of particulate carriers; and the carrier in the container is filled in a container in a cold room environment below 30 ° C, and the container is closed, wherein The process of taking the chlorine dioxide gas into the tank includes transporting the chlorine dioxide gas from a chlorine dioxide generating source to an intake line, and passing through a purification unit to further purify the chlorine dioxide gas. And the intake line enters the interior of the tank, and the tank is connected to an outlet line to escape excess chlorine dioxide gas, and a circulation line is provided, and the circulation line is provided with a venturi The venturi is connected to the outlet pipe, and the circulation pipeline is provided with a circulation pump, and the circulation pump is started to cause the water flow to cause suction of the outlet pipeline in the venturi, and the path of the circulation pipeline is additionally provided. Absorption tank When the water liquid is placed inside the absorption tank, the excess chlorine dioxide gas can be dissolved or adsorbed. 如申請專利範圍第1項所述之二氧化氯氣體緩釋器之製造方法,該各載體係選自矽藻土、高嶺土、膨潤土、皂土、沸石、麥飯石、竹炭粉、生石灰、矽酸鈣、矽膠、陶瓷球(矽鋁氧化合物)、活性氧化鋁、分子篩等群組中之一種或一種以上之混合。 The method for producing a chlorine dioxide gas slow release device according to claim 1, wherein the carrier is selected from the group consisting of diatomaceous earth, kaolin, bentonite, bentonite, zeolite, medical stone, bamboo charcoal powder, quicklime, and tannic acid. Mixing one or more of calcium, tannin, ceramic ball (yttrium aluminum oxide), activated alumina, molecular sieve, and the like. 如申請專利範圍第1項所述之二氧化氯氣體緩釋器之製造方 法,其中該分子篩為選自鋁矽酸塩礦或碳分子篩。 The manufacturer of the chlorine dioxide gas slow release device as described in claim 1 The method wherein the molecular sieve is selected from the group consisting of barium aluminate or carbon molecular sieves. 如申請專利範圍第1項所述之二氧化氯氣體緩釋器之製造方法,該冷室環境係將該容槽納入一槽體,且該槽體內部盛裝致冷媒介體。 The method for manufacturing a chlorine dioxide gas slow release device according to claim 1, wherein the cold chamber environment incorporates the container into a tank body, and the tank body houses a refrigerant medium. 如申請專利範圍第4項所述之二氧化氯氣體緩釋器之製造方法,該致冷媒介體為選自低溫之冷水、冰塊、乾冰或液態氮其中之一。 The method for producing a chlorine dioxide gas slow release device according to claim 4, wherein the refrigerant medium is one selected from the group consisting of low temperature cold water, ice cubes, dry ice or liquid nitrogen. 如申請專利範圍第1項所述之二氧化氯氣體緩釋器之製造方法,其中該冷室環境係一冷櫃內部。 The method for manufacturing a chlorine dioxide gas slow release device according to claim 1, wherein the cold room environment is inside a refrigerator. 如申請專利範圍第6項所述之二氧化氯氣體緩釋器之製造方法,其中該冷櫃內部為附有電子控溫裝置。 The method for manufacturing a chlorine dioxide gas slow release device according to claim 6, wherein the inside of the refrigerator is provided with an electronic temperature control device.
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