TWI418624B - - Google Patents

Info

Publication number
TWI418624B
TWI418624B TW100132779A TW100132779A TWI418624B TW I418624 B TWI418624 B TW I418624B TW 100132779 A TW100132779 A TW 100132779A TW 100132779 A TW100132779 A TW 100132779A TW I418624 B TWI418624 B TW I418624B
Authority
TW
Taiwan
Application number
TW100132779A
Other versions
TW201311884A (zh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to TW100132779A priority Critical patent/TW201311884A/zh
Publication of TW201311884A publication Critical patent/TW201311884A/zh
Application granted granted Critical
Publication of TWI418624B publication Critical patent/TWI418624B/zh

Links

TW100132779A 2011-09-13 2011-09-13 光阻（光刻）膠的清洗液 TW201311884A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100132779A TW201311884A (zh) 2011-09-13 2011-09-13 光阻（光刻）膠的清洗液

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100132779A TW201311884A (zh) 2011-09-13 2011-09-13 光阻（光刻）膠的清洗液

Publications (2)

Publication Number Publication Date
TW201311884A TW201311884A (zh) 2013-03-16
TWI418624B true TWI418624B (zh) 2013-12-11

Family

ID=48482385

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100132779A TW201311884A (zh) 2011-09-13 2011-09-13 光阻（光刻）膠的清洗液

Country Status (1)

Country Link
TW (1) TW201311884A (zh)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050119143A1 (en) * 1999-01-27 2005-06-02 Egbe Matthew I. Compositions for the removal of organic and inorganic residues
US20050197265A1 (en) * 2004-03-03 2005-09-08 Rath Melissa K. Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
CN1715389A (zh) * 2004-07-01 2006-01-04 气体产品与化学公司 用于清除和清洗的组合物及其用途
CN101169598A (zh) * 2006-10-27 2008-04-30 安集微电子（上海）有限公司 一种光刻胶清洗剂

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050119143A1 (en) * 1999-01-27 2005-06-02 Egbe Matthew I. Compositions for the removal of organic and inorganic residues
US20050197265A1 (en) * 2004-03-03 2005-09-08 Rath Melissa K. Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate
CN1715389A (zh) * 2004-07-01 2006-01-04 气体产品与化学公司 用于清除和清洗的组合物及其用途
CN101169598A (zh) * 2006-10-27 2008-04-30 安集微电子（上海）有限公司 一种光刻胶清洗剂

Also Published As

Publication number Publication date
TW201311884A (zh) 2013-03-16

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