TWI410221B - Foot-fit appliance footwear and foot arch dresser shoe group when the shoe foot pressure balance of the internal fine-tuning method - Google Patents

Foot-fit appliance footwear and foot arch dresser shoe group when the shoe foot pressure balance of the internal fine-tuning method Download PDF

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TWI410221B
TWI410221B TW98137100A TW98137100A TWI410221B TW I410221 B TWI410221 B TW I410221B TW 98137100 A TW98137100 A TW 98137100A TW 98137100 A TW98137100 A TW 98137100A TW I410221 B TWI410221 B TW I410221B
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arch
foot
sole
initial
shoe
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TW98137100A
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TW201116222A (en
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Ken-Tick Soh
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Abstract

A fine-tuning method for sole pressure balance inside the shoe when wearing an arch appliance shoe set, in which a sole unit of said arch appliance shoe set includes an arch appliance, and the fine-tuning method comprises the following steps: initially printing a foot chart: print an initial foot chart having a pair of footprints of user; preliminary analysis: based on an analysis model, initial information of footprints on the initial foot chart is analyzed, and based on this initial information to build an initial adjustment data for foot portions that need pressure adjustment; and initial adjustment configuration: based on the initial adjustment data to correspondingly install a pad unit respectively on sole unit of a pair of arch appliance shoe set. The present invention, based on the user's footprint conditions, correspondingly installs a pad unit on the sole unit so that when stepped, the sole pressure will reach balance from imbalance according to ergonomics and engineering.

Description

足弓矯正器鞋組及穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法Fine adjustment method for the pressure balance of the sole of the shoe during the arch of the arch of the arch and the shoe of the arch

本發明是有關於一種足弓矯正器鞋組及足底壓力平衡之微調方法,特別是指一種足弓矯正器鞋組及穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法。The invention relates to a method for finely adjusting the pressure of the arch of the arch and the pressure of the sole of the foot, in particular to a method for adjusting the pressure balance of the sole of the foot when the arch of the arch and the shoe of the arch is used. .

人類的足部包含26塊骨骼,乃由複雜且緻密的韌帶和筋膜包圍連結,整個足部就像拱形或弓形結構,具有良好的彈性,能承受來自身體重量的壓力,以供我們走路、跑步和跳躍。然而由於先天或後天的影響,有些足部的足弓不完整,不僅會讓足底的壓力分佈失調,更會影響到步態,身體的重心亦會轉換到不正確的位置,於是足底、膝蓋、骨盆、脊椎的受壓失衡,長久以後即會發生一些病症。例如「扁平足」之足弓塌陷,力量偏內側,走路呈內八字,且脛骨內轉、骨盆內旋,形成X型腿,容易造成膝蓋外側磨損,而「高弓足」之足弓過高,力量偏外側,走路呈外八字,且脛骨外轉、骨盆外旋,形成O型腿,容易造成膝蓋內側磨損。The human foot contains 26 bones, which are surrounded by complex and dense ligaments and fascia. The whole foot is like an arch or arch structure. It has good elasticity and can withstand the pressure from the body weight for us to walk. , running and jumping. However, due to the influence of congenital or acquired, some of the foot's arch is not complete, not only will the pressure distribution of the sole of the foot be out of balance, but also affect the gait, the body's center of gravity will also be transferred to the incorrect position, so the soles, The pressure imbalance of the knees, pelvis, and spine will cause some illnesses after a long time. For example, the arch of the "flat foot" collapses, the force is on the inner side, the walking is inside the character, and the humerus is rotated inside and the pelvis is rotated internally to form an X-shaped leg, which is likely to cause wear on the outside of the knee, and the arch of the "high bow foot" is too high. The force is on the lateral side, the walking is in the outer eight characters, and the humerus is externally rotated and the pelvis is externally rotated to form an O-shaped leg, which is likely to cause wear on the inside of the knee.

為此目前市面上已出現有一種用來矯正足底腳型之足弓矯正器,可藉以改善足部的力學機制,導正扁平足和高弓足不正常的內、外旋動作,用以矯正腳型使之趨向正常的生理角度。然而,由於足部是由許多的骨頭以及關節組成,隨著年齡的增長,肌肉、韌帶和關節都會發生鬆弛或病變,而且在人體的重量壓迫下就會出現很多問題,更何況之前已經形成磨損或偏轉的部位,此時僅藉由提供正常腳型之規格式足弓矯正器來矯正,已不足以讓身體脊骨完全回復平衡。再者,足弓矯正器雖已提供標準應矯正至正常位置的規格,但每個人腳底情況不同,過去舊習所導致的狀態可能被使用者習以為常,使用足弓矯正器一段時間後,反而會產生新的不平衡及新的不舒服點。To this end, there is an orthosis appliance for correcting the foot of the foot, which can improve the mechanical mechanism of the foot, and guide the abnormal internal and external rotation of the flat foot and the high arch. The foot shape tends to a normal physiological angle. However, since the foot is composed of many bones and joints, muscles, ligaments, and joints may relax or become sick with age, and many problems may occur under the weight of the human body, not to mention the wear and tear. The deflected portion, which is now corrected only by providing a normal foot type orthodontic appliance, is insufficient to allow the body's spine to fully return to equilibrium. In addition, although the arch of the arch has provided the standard that should be corrected to the normal position, but the condition of the sole of each person is different, the state caused by the old habit may be taken by the user. After using the arch orthosis for a period of time, it will be generated. New imbalances and new discomforts.

因此,本發明之目的,即在提供一種可微調使得足底壓力由不平衡趨向於平衡之足弓矯正器鞋組及穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法。Accordingly, it is an object of the present invention to provide a fine adjustment method for the internal plantar pressure balance of a shoe when it is possible to fine-tune an arch orthosis shoe set that tends to balance the foot pressure from imbalance to wear.

於是,本發明足弓矯正器鞋組,用於供人體之一足部穿著,並包含:一鞋底裝置,及一墊片裝置。該鞋底裝置形成有一對應所述足部之一腳跟的鞋跟區,並包括一中底片,及一可拆離地安裝在該中底片上方以供所述足部踏置之足弓矯正器。該墊片裝置包括一偏置墊片單元,該偏置墊片單元是可拆離地安裝在該鞋底裝置內,且對應位於該鞋底裝置涵蓋有鞋跟區之一後半段區域,且位在該後半段區域之一右半部位與一左半部位的其中之一,用於相對頂撐托高該足弓矯正器的局部偏側位置。Thus, the arch guide shoe set of the present invention is for wearing on a foot of a human body, and comprises: a sole device, and a spacer device. The sole device is formed with a heel region corresponding to one of the heels of the foot and includes a midsole and an arch aligner detachably mounted over the midsole for the foot to step. The spacer device includes a biasing pad unit detachably mounted in the sole device, and correspondingly located in the rear half of the heel region of the sole device, and located at One of the right half and one of the left half of the second half of the region is used to raise the local lateral position of the arch orthosis relative to the top support.

本發明穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法,所述足弓矯正器鞋組之一鞋底裝置包括一足弓矯正器,該微調方法包含下列步驟:初拓腳圖:是印製具有使用者一對足印的初始腳圖。The method for finely adjusting the pressure of the sole of the sole of the shoe when the arch of the arch of the arch is used, the sole device of the arch of the arch of the arch comprises an arch correction device, the fine adjustment method comprises the following steps: : It is the initial foot map printed with a pair of footprints of the user.

初步分析:是根據一個分析模式,分析出初始腳圖上足印之形狀及墨色濃淡的初始資訊,並依據此初始資訊由一校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料。Preliminary analysis: According to an analysis mode, the initial information of the footprint and the darkness of the ink on the initial foot map is analyzed, and the corresponding fine-tuning mode is selected from a calibration database based on the initial information to establish a copy. The user's sole must adjust the initial adjustment data of the pressure site.

初調配置:依此初調資料由一墊片備材庫中挑選所需的墊片構成兩墊片裝置,並對應在一雙足弓矯正器鞋組之鞋底裝置分別安裝一墊片裝置,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,使用者穿著初調足弓矯正器鞋組,藉以托高使用者足底的局部區域,令使用者足底之壓力趨向平衡。Initial adjustment configuration: According to the initial adjustment data, a gasket is selected from a gasket preparation library to form two gasket devices, and a gasket device is respectively installed corresponding to the sole device of a pair of arch correction shoe groups. The arch of the arch of the arch is configured as an initial adjustment of the arch of the arch of the arch, and the user wears the initial set of the arch of the arch of the arch, so as to support the local area of the sole of the user, so that the pressure of the sole of the user tends to balance.

上述分析模式係先沿著足印之外圍輪廓劃出一輪廓線,接著劃出一條水平通過一腳跟部後緣的後跟線,並劃出一條通過第二趾部中心且垂直於後跟線的垂直線,再劃出一條通過拇趾部根端內側且垂直於後跟線的拇趾側線,分析足印以垂直線為界內、外部位之面積及墨色分佈,依內、外面積的大小來分析足印的偏斜方向,並依足印之墨色濃淡來分析壓力的分佈,再依拇趾部延伸方向與拇趾側線間的傾斜角度來分析拇趾部的外翻傾斜度。The above analysis mode first draws a contour along the peripheral contour of the footprint, and then draws a heel line horizontally passing through the trailing edge of the heel, and draws a line through the center of the second toe and perpendicular to the heel line. The vertical line, and then draw a line to the inside of the base of the base of the big toe and perpendicular to the heel line, analyze the area of the foot print with the vertical line as the boundary, the area of the outer position and the distribution of the ink color, according to the inner and outer areas. The size is used to analyze the skew direction of the footprint, and the distribution of pressure is analyzed according to the color of the printed ink. The inclination of the hallux toe is analyzed according to the angle of inclination between the direction of the toe and the line of the toe.

本發明之功效在於:依據使用者足印狀況,在鞋底裝置對應安裝墊片裝置,藉以托高使用者足底的局部區域,在搭配足弓矯正器的狀態下,令使用者足底壓力趨向達到平衡狀態。The utility model has the advantages that: according to the user's foot print condition, the spacer device is installed correspondingly on the sole device, so as to raise the partial area of the user's sole, and the user's plantar pressure tends to be in the state of matching the arch correction device. Achieve equilibrium.

本發明穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法,還包含下列步驟:再拓腳圖:當使用者穿著初調足弓矯正器鞋組一段時間之後,再印製具有使用者一對足印之改善後腳圖;再調分析:根據該分析模式,分析出改善後腳圖上足印之形狀及墨色濃淡的調後資訊,將此調後資訊與該初始資訊比對,並由校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須微調壓力部位之再調資料;及微調配置:取出初調足弓矯正器鞋組內之墊片裝置,並依據再調資料對應在鞋底裝置分別設置另一墊片裝置,使足弓矯正器鞋組配置成為一調後足弓矯正器鞋組,使用者穿著調後足弓矯正器鞋組,藉以微調使用者足底之局部區域的高度,令使用者足底之壓力再度更趨向平衡完美。The method for finely adjusting the pressure of the sole of the sole of the shoe when wearing the arch of the arch of the arch of the present invention further comprises the following steps: further extending the foot map: when the user wears the initial set of the arch of the arch orthosis, and then prints Improved foot map with user's pair of footprints; re-analysis analysis: According to the analysis mode, the post-adjustment information of improving the shape of the foot print on the back foot map and the darkness of the ink color is analyzed, and the adjusted information is compared with the initial information. And select the corresponding fine-tuning mode from the calibration database to establish a re-adjustment data of the user's sole to fine-tune the pressure part; and fine-tune the configuration: take out the gasket in the initial adjustment of the arch-corrector shoe group The device, according to the re-adjustment data, is provided with another pad device corresponding to the sole device, so that the arch device of the arch of the arch is configured as a set of ankle arch orthosis, and the user wears the adjusted arch of the arch of the arch. By fine-tuning the height of the local area of the user's sole, the pressure on the sole of the user is again more balanced.

本發明之另一功效在於:使用者足底壓力經過初調足弓矯正器鞋組調整一段時間之後,可再視使用者調整後之足印狀況,再進行第二次的微調甚至第三次微調,令足底之壓力更趨向平衡完美。Another effect of the present invention is that after the user's plantar pressure is adjusted for a period of time by the initial adjustment of the arch correction tool set, the user can adjust the footprint condition after the adjustment, and then perform the second fine adjustment or even the third time. Fine-tuning makes the pressure on the soles of the feet more balanced and perfect.

有關本發明之前述及其他技術內容、特點與功效,在以下配合參考圖式之一個較佳實施例的詳細說明中,將可清楚的呈現。The above and other technical contents, features and advantages of the present invention will be apparent from the following detailed description of the preferred embodiments.

參閱圖1、圖2與圖3,本發明足弓矯正器鞋組之較佳實施例,是用於供人體之一足部3穿著,並包含:一鞋底裝置1,及一墊片裝置21。本發明足弓矯正器鞋組之構造係左右對應,所以圖中僅顯示供右腳穿著的鞋底裝置1,亦僅顯示對應安裝之墊片裝置21。各鞋底裝置1由下而上依序包括一大底片11、一中底片12、一內襯片13,及一足弓矯正器14。該足弓矯正器14為一拱曲形之足弓撐板,係可拆離地安裝在該內襯片13上,乃供人體之一足部3踏置,用以撐托矯正該足部3結構,由於其為一般設計且非本發明重點,所以在此不再詳細說明。此外,該鞋底裝置1整體更形成有一對應足部3之一腳跟31的鞋跟區15。上述足弓矯正器14是可拆離地定位在內襯片13上,且令該足弓矯正器14之後側與鞋跟區15之後側對齊,而本實施例之鞋底裝置1更採用兩片皆呈刺狀之魔術氈16,分別黏貼在內襯片13頂面與足弓矯正器14底面,藉由該等魔術氈16的沾粘防滑特性,使得足弓矯正器14能止滑的安裝在內襯片13上,並能輕易地向上脫離,下列圖式中即不再顯示足弓矯正器14。而且在以下說明中皆以朝向足部3之腳尖的方向為前方,朝向腳跟的方向為後方,並以鄰近另一足部3的位置為內側,遠離另一足部3的位置為外側。Referring to Figures 1, 2 and 3, a preferred embodiment of the arch correction shoe set of the present invention is for use on a foot 3 of a human body and comprises: a sole device 1 and a spacer device 21. The structure of the arch correction shoe group of the present invention corresponds to the right and left, so that only the sole device 1 for the right foot is displayed, and only the correspondingly mounted spacer device 21 is shown. Each of the sole devices 1 includes a large backsheet 11, a midsole 12, an inner liner 13, and an arch aligner 14 from bottom to top. The arch guide 14 is a arched arch bridge which is detachably mounted on the inner liner 13 and is provided for one of the human body's feet 3 to support the correction of the foot 3 The structure, since it is a general design and is not the focus of the present invention, will not be described in detail herein. Further, the sole device 1 is integrally formed with a heel region 15 corresponding to one of the heels 31 of the foot 3. The above-mentioned arch device 1 is detachably positioned on the inner lining 13 and the rear side of the arch aligner 14 is aligned with the rear side of the heel region 15, and the sole device 1 of the embodiment further adopts two pieces. The thorn-shaped magic felts 16 are respectively adhered to the top surface of the inner lining sheet 13 and the bottom surface of the arch aligner 14. The anti-slip characteristics of the magic felt 16 enable the arch aligner 14 to be slip-proof. On the lining sheet 13, and can be easily detached upward, the arch aligner 14 is no longer displayed in the following figures. Further, in the following description, the direction toward the toe of the foot 3 is forward, the direction toward the heel is rearward, and the position adjacent to the other leg 3 is inside, and the position away from the other leg 3 is outside.

而該墊片裝置21包括一呈馬蹄形且對應安裝在鞋跟區15上的足後跟墊片22,及一具有數片墊片之偏置墊片單元20,該偏置墊片單元20是可拆離地安裝在該鞋底裝置1內,若該鞋底裝置1以前側緣至後側緣之長度的一半為界,令位於界線前方的區域視為一前半段區域17,且位於界線後方的區域視為一後半段區域18,該後半段區域18涵蓋該鞋跟區15,且該後半段區域18以左側緣至右側緣之長度的一半為界,令位於界線右方的部位視為一右半部位181,而位於界線左方的部位視為一左半部位182,則該偏置墊片單元20是對應位在該後半段區域18之右半部位181與左半部位182的其中之一,用於相對頂撐托高該足弓矯正器的局部偏側位置。The spacer device 21 includes a heel pad 22 in a horseshoe shape corresponding to the heel region 15, and a bias pad unit 20 having a plurality of spacers. The bias pad unit 20 is Detachably mounted in the sole device 1, if the sole device 1 is bounded by half of the length from the front side edge to the rear side edge, the area in front of the boundary line is regarded as a front half area 17 and is located behind the boundary line. The area is considered to be a second half area 18 that encompasses the heel area 15 and that the rear half area 18 is bounded by a half of the length from the left edge to the right edge, such that the portion to the right of the boundary is considered a The right half portion 181, and the portion located to the left of the boundary line is regarded as a left half portion 182, and the offset spacer unit 20 is corresponding to the right half portion 181 and the left half portion 182 of the second half portion region 18. First, for the relative top support height of the partial lateral position of the arch orthosis.

該偏置墊片單元20是由一墊片備材庫2(見圖4)中挑選出來的墊片所構成,該墊片備材庫2具有一種呈扇形的側頂墊片23、一種呈圓形的微調墊片24、一種呈圓形的前調墊片25,及一種呈圓形的頂舟狀骨墊片26,在本實施例之墊片備材庫2中可備置多片側頂墊片23、多片微調墊片24、多片前調墊片25,及多片頂舟狀骨墊片26以供選用,且側頂墊片23、微調墊片24、前調墊片25,及頂舟狀骨墊片26之直徑皆為15mm至45mm,該等墊片係由可彼此黏貼之魔術氈所製成,而且該等魔術氈表面皆呈綿狀,底部設有類似膠水功能之黏性層例如雙面膠帶,可輕易黏貼於另一魔術氈之表面。The offset gasket unit 20 is composed of a gasket selected from a gasket preparation stockhouse 2 (see FIG. 4). The gasket preparation stockhouse 2 has a fan-shaped side top gasket 23 and a A circular fine adjustment gasket 24, a circular front adjustment gasket 25, and a circular top boat bone spacer 26 can be provided with a plurality of side tops in the gasket preparation stockhouse 2 of the embodiment. The gasket 23, the plurality of fine adjustment gaskets 24, the plurality of front adjustment gaskets 25, and the plurality of top boat bone spacers 26 are available for selection, and the side top gasket 23, the fine adjustment gasket 24, and the front adjustment gasket 25 are provided. And the top boat-shaped bone spacers 26 are all 15mm to 45mm in diameter, and the gaskets are made of magic felts which can be adhered to each other, and the surface of the magic felts are all in the form of a sponge, and the bottom is provided with a glue-like function. The adhesive layer, such as double-sided tape, can be easily adhered to the surface of another magic felt.

就一第一個微調態樣而言,該墊片裝置21是選用一片足後跟墊片22、兩片側頂墊片23、兩片微調墊片24、一片前調墊片25,及一片頂舟狀骨墊片26,而且本實施例墊片裝置21之足後跟墊片22、側頂墊片23、微調墊片24及前調墊片25,是黏貼在該鞋底裝置1之中底片12上,而該頂舟狀骨墊片26則是黏貼在該鞋底裝置1之足弓矯正器14底部。當然在設計上亦可以將該墊片裝置21安裝在大底片11或內襯片13上,位在片體頂面或底面皆可,不以本實施為限。For a first fine-tuning aspect, the spacer device 21 is a piece of a heel spacer 22, two side top spacers 23, two fine adjustment pads 24, a front adjustment pad 25, and a top piece. The scaphoid spacer 26, and the heel spacer 22, the side top spacer 23, the fine adjustment spacer 24 and the front adjustment spacer 25 of the spacer device 21 of the embodiment are adhered to the negative of the sole device 1. 12, and the top boat bone spacer 26 is adhered to the bottom of the arch orthosis 14 of the sole device 1. Of course, the spacer device 21 can also be mounted on the large negative film 11 or the inner liner sheet 13 on the top surface or the bottom surface of the sheet body, and is not limited to this embodiment.

而且本實施例是在該鞋跟區15黏貼該足後跟墊片22,在該足後跟墊片22之外側前方排列黏貼該等側頂墊片23,令該側頂墊片23之邊緣對齊該鞋底裝置1之邊緣,在該等側頂墊片23上黏貼該等微調墊片24,並在該足後跟墊片22之外側黏貼該前調墊片25,另將該頂舟狀骨墊片26黏貼在對應該足後跟墊片22之內側前方處。Moreover, in this embodiment, the heel pad 22 is adhered to the heel region 15 , and the side top pads 23 are aligned and arranged on the outer side of the heel pad 22 to make the edge of the side top pad 23 Aligning the edges of the sole device 1, pasting the fine adjustment pads 24 on the side top spacers 23, and pasting the front adjustment pads 25 on the outer side of the heel spacers 22, and the top boat The bone spacer 26 is adhered to the inner side of the corresponding heel pad 22.

本發明穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法之較佳實施例,係包含下列步驟,以下係以第一個微調態樣為例來說明:The preferred embodiment of the method for finely adjusting the pressure of the sole of the sole of the shoe when wearing the arch of the arch of the arch of the present invention comprises the following steps. The following is an example of the first fine adjustment:

一、初拓腳圖:如圖5所示,印製一張具有使用者一對足印41的初始腳圖4。First, the initial extension map: As shown in Figure 5, a preliminary foot diagram 4 with a user's pair of footprints 41 is printed.

印製腳圖之前,必須要確實的將油墨滾均勻,而<拓印腳圖>的過程如下:Before printing the foot map, the ink must be rolled evenly, and the process of <printing the foot map> is as follows:

步驟一、在一拓印板上以滾輪直接添加油墨。Step 1. Add ink directly to the roller on a rubbing plate.

步驟二、以滾輪在已添加油墨之拓印板上來回滾動,將油墨均勻地被覆在拓印板上。Step 2: Rolling back and forth on the ink-added printing plate with a roller to evenly coat the ink on the printing plate.

步驟三、將空白的腳圖紙左右對折平置,讓要先拓印的單腳區朝上。Step 3: Fold the blank foot drawing to the left and right, so that the monopod area to be printed first is facing up.

步驟四、再將拓印板輕輕的覆蓋於腳圖紙上,令有油墨的板面朝下。Step 4: Gently cover the rubbing plate on the foot drawing so that the inked board faces down.

步驟五、假設先拓印的是受拓印者的右腳,則左腳必須先踏入非拓印油墨區,即空白腳圖紙的左外側,再將右腳踏上拓印板,受拓印者踩上後先呈正常雙腳站立姿勢不得移動,如有晃動情況就必須重印。Step 5: If the thumb is first printed, the left foot must first enter the non-printing ink area, that is, the left outer side of the blank foot drawing, and then the right foot is stepped on the rubbing plate. After the stamper steps on, the normal standing position of the feet must not move. If there is shaking, it must be reprinted.

步驟六、接著受拓印者眼睛直視正前方,雙手自然下垂,屈膝向下微蹲,以在腳圖紙上拓印出顯示右腳底所受壓力的足印41。Step 6. Then, the thumb of the thumb is directly in front of the eye, the hands naturally hang down, and the knees are slightly bent down to print a footprint 41 showing the pressure on the right sole of the foot on the foot drawing.

步驟七、受拓印者雙腳欲移離腳圖紙時,以左腳為重心,令右腳垂直向上抬並退後離開腳圖紙,再換左腳退後,之後掀離拓印板,即完成右腳的拓印。如發生抬錯腳,則會導致足印失真,必須重新拓印。Step 7. When the thumb is to move away from the foot drawing, the left foot is the center of gravity, so that the right foot is lifted vertically and then retracted and left the foot drawing, then the left foot is retracted, and then the rubbing plate is removed. Complete the rubbing of the right foot. If the wrong foot is raised, the footprint will be distorted and must be re-printed.

步驟八、將拓印好的腳圖紙旋轉方向,換印製左腳,重複步驟一到步驟七,只是由右腳印製改為左腳印製。須注意的是,第二次蹲下的高度必須與第一次蹲下的高度相同。Step 8. Rotate the printed foot drawing in the direction of the left foot and replace the left foot. Repeat steps one through seven, except that the right foot print is changed to the left foot print. It should be noted that the height of the second squat must be the same as the height of the first squat.

二、初步分析:根據一個分析模式,分別分析出初始腳圖4上左、右足印41之形狀及墨色濃淡的初始資訊,並依據此初始資訊由一校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料。須說明的是,該校正資料庫並不限定記載形式,亦即不一定需要記載在有形物例如紙面資料上,也可以是存放在其他記錄媒體中或網路上。2. Preliminary analysis: According to an analysis mode, the initial information of the shape of the left and right footprints 41 and the darkness of the ink color on the initial foot map 4 are respectively analyzed, and the corresponding fine adjustment mode is selected from a calibration database according to the initial information. In order to establish a preliminary information on the pressure part of the user's sole. It should be noted that the calibration database is not limited to the description form, that is, it does not necessarily need to be recorded on a tangible object such as paper data, or may be stored in other recording media or on a network.

如圖6所示,上述分析模式如下:As shown in Figure 6, the above analysis mode is as follows:

(1)先沿著足印41之外圍輪廓劃出一輪廓線32。接著劃出一條水平通過足印41之腳跟部411後緣的後跟線33,當然也可以加劃一條水平通過足印41前緣的前端線36。並劃出一條通過足印41之第二趾部412中心且垂直於後跟線33的垂直線34。再劃出一條通過足印41之拇趾部413的根端內側且垂直於後跟線33的拇趾側線35。(1) A contour line 32 is first drawn along the outer contour of the footprint 41. A heel line 33 that passes horizontally through the trailing edge of the heel portion 411 of the foot print 41 is then drawn. Of course, a front end line 36 that passes horizontally through the leading edge of the foot print 41 can also be drawn. A vertical line 34 passing through the center of the second toe portion 412 of the footprint 41 and perpendicular to the heel line 33 is drawn. Further, a toe-side line 35 passing through the inner side of the root end of the toe portion 413 of the footprint 41 and perpendicular to the heel line 33 is drawn.

(2)觀察輪廓線32分析足印41屬於何種腳型,亦即分析是否形成有內側凹弧的足弓,以及腳心部414的寬度,若腳心部414較寬則為扁平足,若腳心部414較窄或斷開則為高弓足,分析第一個微調態樣之足印41得知,左、右足印41之足弓不完全,腳心部414過寬,所以都是扁平足腳型。(2) The observation contour line 32 analyzes which foot type the foot print 41 belongs to, that is, analyzes whether the arch of the inner concave arc is formed, and the width of the foot center portion 414. If the foot center portion 414 is wider, the foot is flat, if the foot portion is If the 414 is narrow or disconnected, it is a high arch. The footsteps 41 of the first fine-tuning aspect are analyzed. The left and right foot prints 41 are incomplete and the foot center 414 is too wide, so they are all flat feet.

(3)以垂直線34為基準線,觀察足印41於內、外部位之面積分佈,並以垂直線34是否通過腳跟部411中心,或是位於腳跟部411中心之內側或外側,來分析足印41是否偏斜或旋轉,分析第一個微調態樣之左、右足印41得知,垂直線34皆位於腳跟部411中心之外側,所以左足印41重心較偏向內側,而右足印41重心也有些偏向內側。(3) Using the vertical line 34 as a reference line, observe the area distribution of the inner and outer positions of the foot print 41, and analyze whether the vertical line 34 passes through the center of the heel portion 411 or is located inside or outside the center of the heel portion 411. Whether the footprint 41 is skewed or rotated, the left and right footprints 41 of the first fine-tuning aspect are analyzed, and the vertical line 34 is located outside the center of the heel portion 411, so the left foot print 41 has a center of gravity that is more inward, and the right foot print 41. The center of gravity is also somewhat biased to the inside.

(4)由於正常足各部位受到的壓力均勻,所以足印41之墨色濃淡應一致,故觀察足印41墨色濃淡,若有墨色濃淡明顯偏差,表示所受到的壓力不均,墨色越濃處所受到的壓力越大,所以可經由觀察足印41之墨色濃淡分佈,來分析力量在前、在後或偏內、偏外,而分析第一個微調態樣之左、右足印41得知,腳跟部411的墨色濃,所以得知重心在後,而且以垂直線34為界,內側部位的墨色較濃於外側部位,特別是足印41於拇趾部413根端外側之足前部415,墨色由外側向內側逐漸變濃,所以力量偏內,其中,右足印41之拇趾部413的墨色較濃,因此力量亦集中於拇趾部413處。(4) Since the pressure applied to each part of the normal foot is uniform, the ink color of the foot print 41 should be the same, so observe the ink color of the foot print 41. If there is obvious deviation of the ink color, it means that the pressure is uneven, and the ink color is thicker. The greater the pressure, the strength of the front, the back or the inside and the outside of the foot can be analyzed by observing the distribution of the ink color of the footprint 41, and the left and right footprints of the first fine-tuning pattern are analyzed 41. The ink color of the heel portion 411 is thick, so that the center of gravity is found to be behind, and the vertical line 34 is bounded, and the ink color of the inner portion is thicker than the outer portion, particularly the front portion 415 of the foot print 41 on the outer side of the root end of the toe portion 413. The ink color gradually becomes thicker from the outer side to the inner side, so the force is biased, and the ink color of the toe portion 413 of the right foot print 41 is thicker, so the force is also concentrated on the toe portion 413.

(5)觀察腳型是否有不正常的凸出,分析拇趾部413延伸方向與拇趾側線35間的傾斜角度,若超過20°即有拇趾部413外翻現象,而分析第一個微調態樣之左、右足印41得知,左足的傾斜角度略大於20°,所以左足有拇趾部413外翻現象,另外觀察到左、右足印41於腳跟部411前方內側處凸出,所以亦有舟狀骨凸出的情況。(5) Observe whether the foot shape has abnormal protrusion, and analyze the inclination angle between the direction of the extension of the toe portion 413 and the lateral line 35 of the big toe. If it exceeds 20°, there is a phenomenon of the hallux 413 valgus, and the first analysis is performed. The left and right footprints 41 of the fine-tuned pattern are known to have a tilt angle of the left foot slightly larger than 20°, so that the left foot has the hallux 413 valgus phenomenon, and the left and right foot prints 41 are observed to protrude from the front inner side of the heel portion 411. Therefore, there are cases where the scapula is protruding.

而前述校正資料庫具有下列微調模式:The aforementioned correction database has the following fine tuning modes:

(a)當重心在後的狀況-如圖7所示,在鞋底裝置1對應鞋跟區15的部位黏貼一片足後跟墊片22,壓力越大,疊置黏貼越多片足後跟墊片22。(a) When the center of gravity is behind - as shown in Fig. 7, a piece of the heel pad 22 is adhered to the portion of the sole device 1 corresponding to the heel region 15. The greater the pressure, the more the sheets are stacked and the heel pads are placed. twenty two.

(b)當力量向內的狀況-如圖8所示,在足後跟墊片22之內側前方排列黏貼兩片側頂墊片23,且在兩側頂墊片23之間黏貼一片微調墊片24,並在此微調墊片24前方再黏貼一片微調墊片24,令微調墊片24之2/3部份貼在側頂墊片23上,且留1/3部份凸出襯墊在旁側,安裝入足弓矯正器鞋組內時,此1/3部份會向上彎折且靠置在鞋底裝置1旁側。當然依據鞋底裝置1的尺寸大小可增減側頂墊片23及微調墊片24的數量。(b) When the force is inward - as shown in Fig. 8, two side top spacers 23 are pasted in front of the inner side of the heel pad 22, and a fine adjustment pad is adhered between the top spacers 23 on both sides. 24, and then paste a fine adjustment pad 24 in front of the fine adjustment pad 24, so that 2/3 of the fine adjustment pad 24 is attached to the side top pad 23, and 1/3 part of the protruding pad is left. On the side, when installed in the arch of the arch of the arch, the 1/3 portion is bent upward and rests on the side of the sole device 1. Of course, the number of the side top spacers 23 and the fine adjustment spacers 24 can be increased or decreased depending on the size of the sole device 1.

(c)當力量向外的狀況一如圖9所示,在鞋底裝置1對應足後跟墊片22之外側前方排列黏貼兩片側頂墊片23,並在兩側頂墊片23之間,以及位於前方之側頂墊片23上分別黏貼一片微調墊片24,並再黏貼一片微調墊片24,同樣令微調墊片24之1/3部份凸出襯墊在旁側。當然可視情況增減側頂墊片23及微調墊片24的數量。(c) When the force is outward, as shown in FIG. 9, two side top spacers 23 are affixed to the front side of the sole device 1 corresponding to the outer side of the heel spacer 22, and between the top spacers 23 on both sides, A fine adjustment pad 24 is adhered to the front side spacer 23 on the front side, and a fine adjustment pad 24 is adhered to the side, and the 1/3 portion of the fine adjustment pad 24 is also protruded from the side of the pad. Of course, the number of the side top spacers 23 and the fine adjustment spacers 24 can be increased or decreased as appropriate.

(d)當拇趾部外翻的狀況-如圖10所示,在足後跟墊片22之外前側上黏貼一片前調墊片25,同樣令前調墊片25之1/3部份凸出襯墊在旁側。(d) When the hallux valgus is turned out - as shown in Fig. 10, a front pad 25 is attached to the front side of the heel pad 22, and the 1/3 portion of the front pad 25 is also applied. The protruding pad is on the side.

(e)當足前部及該等腳趾所在區域受力的狀況-參閱圖11,須先說明的是,為因應壓力作用在足前部415及該等腳趾所在區域的部位不同,墊片設置的位置即須左右相反且上下顛倒,如圖所示將足印41之足前部415及腳趾所在區域,框圍在一馬蹄形的假想線416範圍內,並以一條假想直線將之區分成內、外兩半部分,再以兩條前後間隔的假想橫線區分成位於內側且由前向後排列之一掌內前部A、一掌內中部B及一掌內後部C,以及位於外側且由前向後排列之一掌外前部D、一掌外中部E及一掌外後部F,接著將足印41之腳跟部411框圍在一馬蹄形的假想線417範圍內,並以一條假想直線將之區分成內、外兩半部分,再以兩條前後間隔的假想橫線區分成位於內側且由前向後排列之一跟內前部f、一跟內中部e及一跟內後部d,以及位於外側且由前向後排列之一跟外前部c、一跟外中部b及一跟外後部a。當掌內前部A受壓時須將墊片墊在跟外後部a,當掌內中部B受壓時須將墊片墊在跟外中部b,當掌內後部C受壓時須將墊片墊在跟外前部c,當掌外前部D受壓時須將墊片墊在跟內後部d,當掌外中部E受壓時須將墊片墊在跟內中部e,當掌外後部F受壓時須將墊片墊在跟內前部f。如圖11及圖12所示,當拇趾部受力,即掌內前部A受壓時,須在跟外後部a設置墊片,即在足後跟墊片22之外後側上黏貼一片前調墊片25,同樣令前調墊片25之1/3部份凸出襯墊在旁側。(e) The condition of the force on the front of the foot and the area in which the toes are located - see Figure 11, it should be noted that the gasket is set to correspond to the pressure at the front of the foot 415 and the area where the toes are located. The position must be reversed from left to right and upside down. As shown in the figure, the front portion 415 of the foot print 41 and the area of the toe are enclosed in a horseshoe-shaped imaginary line 416 and separated into an imaginary straight line. And the outer two halves are further divided into two imaginary horizontal lines spaced back and forth to be located on the inner side and arranged from the front to the rear, one palm inner front portion A, one palm inner middle portion B and one palm inner rear portion C, and located on the outer side One of the palm outer front portion D, one palm outer middle portion E and one palm outer rear portion F is arranged forward and backward, and then the heel 41 of the foot print 41 is enclosed in a horseshoe-shaped imaginary line 417 and is in an imaginary straight line. Divided into inner and outer halves, and then divided into two imaginary horizontal lines spaced back and forth to be located on the inner side and arranged from the front to the rear, one inner front part f, one inner middle part e and one inner inner part d, and Located on the outside and arranged from front to back, one front and the outer front c, one outside B, and a rear portion with an outer a. When the front part A of the palm is pressed, the gasket should be placed on the outer rear part a. When the middle part B of the palm is pressed, the gasket should be placed in the outer middle part b. When the back part C of the palm is pressed, the pad must be placed. The pad is in the front part c. When the front part of the palm is pressed, the pad must be placed in the rear part of the heel. When the middle part E of the palm is pressed, the pad should be placed in the middle part of the heel. When the outer rear portion F is pressed, the gasket should be placed in the front inner portion f. As shown in Fig. 11 and Fig. 12, when the toe portion is stressed, that is, when the front portion A of the palm is pressed, a spacer is provided on the outer rear portion a, that is, on the rear side of the heel spacer 22. A front adjustment pad 25 also causes a 1/3 portion of the front adjustment pad 25 to protrude from the side of the pad.

(f)當舟狀骨凸出的狀況-如圖1及圖13所示,在足弓矯正器14下方對應位在足後跟墊片22之內側前方黏貼一片頂舟狀骨墊片26。(f) When the scaphoid protrudes - as shown in Figs. 1 and 13, a top scaphoid spacer 26 is adhered to the inside of the heel pad 22 at the corresponding position below the arch aligner 14.

以第一個微調態樣為例所取得之初始資訊,並由該校正資料庫中挑選出相對應的微調模式,乃符合「重心在後,扁平足腳型,力量偏內,舟狀骨凸出,及右足印41之拇趾部413受力」等情況,故依此建立出一份使用者足底須調整壓力部位之初調資料,亦即如圖1所示須在鞋跟區15黏貼一片足後跟墊片22,在足後跟墊片22之外側前方排列黏貼兩片側頂墊片23,且在足後跟墊片22與側頂墊片23之間以及兩側頂墊片23之間,分別黏貼一片微調墊片24,並在足弓矯正器14下方對應位在足後跟墊片22之內側前方黏貼一片頂舟狀骨墊片26,最後在右側足弓矯正器鞋組之鞋跟區15上,於足後跟墊片22之外後側上黏貼一片前調墊片25。Taking the first fine-tuning aspect as an example to obtain the initial information, and selecting the corresponding fine-tuning mode from the calibration database, it is consistent with the "center of gravity, flat foot and foot, strength within the scapula, scaphoid protruding And the right foot print 41's toe 413 is stressed, etc., so a preliminary adjustment of the pressure portion of the user's sole must be established, that is, as shown in Figure 1, it must be attached in the heel area 15 A piece of heel pad 22 is arranged in front of the outer side of the heel pad 22 to adhere two side top pads 23, and between the heel pad 22 and the side top pad 23 and the top pad 23 on both sides. Between the two, a fine adjustment pad 24 is adhered, and a top scaphoid spacer 26 is adhered to the inner side of the heel pad 22 corresponding to the underside of the arch aligner 14, and finally the right ankle braces shoe set. On the heel area 15, a front pad 25 is adhered to the rear side of the heel pad 22.

三、初調配置:如圖3所示,依據此初調資料挑選出一片足後跟墊片22、兩片側頂墊片23、兩片微調墊片24、一片頂舟狀骨墊片26,及一片前調墊片25,構成該墊片裝置21,並將此墊片裝置21黏貼於足弓矯正器鞋組之鞋底裝置1,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,如圖1及圖14所示,使用者穿著初調足弓矯正器鞋組,藉由足後跟墊片22、側頂墊片23、頂舟狀骨墊片26,及前調墊片25相對托高使用者足底的局部區域,且利用該等微調墊片24旁側外凸之1/3部份頂靠於使用者足部,以將足部之相對區域往中央頂推。Third, the initial configuration: as shown in Figure 3, according to the initial adjustment data to select a foot heel gasket 22, two side top gasket 23, two fine adjustment gasket 24, a top boat bone spacer 26, And a piece of front adjustment pad 25, which constitutes the pad device 21, and the pad device 21 is adhered to the sole device 1 of the arch of the arch of the arch, so that the arch of the arch orthosis is configured as an initial adjustment of the arch The shoe group, as shown in Figures 1 and 14, the user wears the initial tone arch orthosis shoe set, with the heel pad 22, the side top pad 23, the top boat bone pad 26, and the front Adjusting the spacer 25 relative to the partial area of the user's sole, and using the fine-adjusting spacer 24, the 1/3 portion of the lateral convex portion abuts against the user's foot to center the opposite portion of the foot Push the top.

進一步來看使用者穿著初調足弓矯正器鞋組行走時的情況,由於「足弓」是由足部3骨骼排列和足底的蹠膜及肌腱所組成,故當使用者腳底完全接觸地面時,足弓需要變得扁平,肌腱和筋膜也要展開來吸收體重及行走時的重量,而當步態轉換到腳跟31離地時,這些軟組織會集中,這個能量則會轉換成推動身體前進的力量,每當踏出一步,如圖1及圖3之箭頭所示,腳的壓力轉換都是由足跟31沿著外緣之外側縱弓的方向往前,再朝內沿著橫弓的方向橫跨前足的部位直到拇趾部下方,因為足跟31是足部3最靠近身體的部位,身體的重心主要是由足跟31來承擔,足跟31的施力方向會決定足底壓力的分佈方向,所以足後跟墊片22能讓重心前移,且當腳的壓力往前移動時,藉由後方外側之側頂墊片23及微調墊片24的墊高隆起,使得人體重心往前向內傾斜,但因足弓矯正器14之內側較為凸翹,而且透過人體力學及工學的平衡機制,會促使足部重新自動修正偏向外側,使力量向外,再透過頂舟狀骨墊片26頂撐舟狀骨,可矯正使足弓回復正常位置。另外在右側足弓矯正器鞋組之鞋底裝置1加上後方前調墊片25,同樣可藉由人體平衡機制,對稱拉回前端拇趾部力量減輕拇趾部受力。Further, when the user wears the initial adjustment of the arch of the arch of the arch, the "foot arch" is composed of the skeletal arrangement of the foot 3 and the aponeurosis and tendon of the sole, so that the user's sole is completely in contact with the ground. When the arch needs to be flattened, the tendons and fascia should also be unfolded to absorb weight and weight while walking. When the gait changes to the heel 31 off the ground, these soft tissues will concentrate, and this energy will be converted into pushing the body. The power of advancement, whenever a step is taken, as shown by the arrows in Figures 1 and 3, the pressure conversion of the foot is made by the heel 31 along the outer side of the outer edge of the longitudinal arch, and then the inner and the transverse The direction of the bow spans the forefoot until it is below the toe, because the heel 31 is the closest part of the foot 3 to the body. The center of gravity of the body is mainly carried by the heel 31. The direction of the heel 31 determines the foot. The direction of the bottom pressure is distributed, so the heel pad 22 can move the center of gravity forward, and when the pressure of the foot moves forward, the padding of the side outer pad 23 and the fine adjustment pad 24 of the rear outer side is raised. The person's weight is tilted inward, but due to arch correction The inner side of the 14 is more convex, and through the balance mechanism of human mechanics and engineering, the foot will be automatically re-corrected to the outside, so that the force will be outward, and then the scaphoid can be supported by the top boat-shaped bone spacer 26, which can be corrected. Return the arch to its normal position. In addition, the sole device 1 of the right arch correction shoe set and the rear front adjustment pad 25 can also reduce the force of the hallux toe by symmetrically pulling back the strength of the hallux toe portion.

也就是,除了利用足弓矯正器14來頂托足部3矯正腳型之外,更能因應使用者狀態,藉由相對應之墊片裝置21來托高使用者足底的局部區域,令使用者足底之壓力由不平衡趨向於平衡,讓足弓朝向平衡的位置改變,隨之令脛骨外轉、骨盆外旋,讓膝關節外開以避免繼續磨損,故能調整膝關節周圍軟組織,舒緩肌腱韌帶肌肉的張力,可減輕疼痛與腫脹。That is, in addition to using the arch orthosis 14 to support the foot 3 to correct the foot shape, it is more suitable for the user state, and the corresponding pad device 21 is used to raise the local area of the user's sole. The pressure on the sole of the user tends to be balanced by the imbalance, which changes the position of the arch toward the balance, and then the external rotation of the humerus and the external rotation of the pelvis, so that the knee joint is opened to avoid further wear, so the soft tissue around the knee joint can be adjusted. It relieves the tension of the tendon ligament muscles and relieves pain and swelling.

又,在初次配穿足弓矯正器鞋組後,使用者藉由走路行進間,每踏一步前進的動作,透過(1)腳跟著地(2)腳掌承受貼地(3)腳尖離地三步驟,往復地藉由自身身體重量及人體動力工學在每踏一步間進行矯正。如此經過一段時間,例如三個月後,使用者腳底的失衡狀況可能已改變成另一雖較輕微但已與第一次不同的型態,若繼續穿著原有的足弓矯正器鞋組已不復適用,此時即須再進行另一次微調矯正。In addition, after the first time wearing the arch of the arch of the arch, the user walks through the room, and each step forward moves through the (1) heel strikes the ground (2) the sole of the foot bears the ground (3) the toe off the ground three The steps are reciprocally corrected by each body weight and ergonomics. After a period of time, such as three months, the imbalance of the user's sole may have changed to another type that is slightly but different from the first one. If you continue to wear the original arch correction shoe set No longer applicable, at this time another fine adjustment correction is required.

四、再拓腳圖:當使用者穿著初調足弓矯正器鞋組一段時間,例如2~3個月之後,再如圖15所示,印製具有使用者一對足印51之調後腳圖5,如圖15所示繪出輪廓。Fourth, the extension of the foot map: When the user wears the initial adjustment of the arch correction tool set for a period of time, for example 2~3 months, and then as shown in Figure 15, the print has a pair of foot prints 51 Figure 5, the outline is drawn as shown in Figure 15.

五、再調分析:根據前述分析模式,如圖16分析出調後腳圖5上足印51之形狀及墨色濃淡的調後資訊,將此調後資訊與該初始資訊比對,可得知「重心在後但壓力已減輕,有足弓形成近似正常腳型,舟狀骨已抬高,右足印51之拇趾部513已無明顯受力狀況,力量由原本偏內的情況略為向外」,並由校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須微調壓力部位之再調資料,如圖17所示,亦即仍須維持前述足後跟墊片22、側頂墊片23及微調墊片24的貼設,並在足後跟墊片22之內前側黏貼一片前調墊片25,以藉由人體平衡機制讓力量朝內。V. Re-adjustment analysis: According to the above analysis mode, as shown in Fig. 16, the shape of the footprint 51 and the adjusted information of the darkness of the ink color are analyzed, and the adjusted information is compared with the initial information, and the information can be known. After the center of gravity is relieved, but the pressure has been reduced, the arch of the foot is similar to the normal foot shape, the scaphoid has been raised, and the toe 513 of the right foot print 51 has no obvious stress condition, and the force is slightly outward from the original one. And the corresponding fine-tuning mode is selected from the calibration database to establish a re-adjustment data of the user's sole to fine-tune the pressure portion, as shown in Fig. 17, that is, the aforementioned heel spacer must still be maintained. 22. The side top spacer 23 and the fine adjustment spacer 24 are attached, and a front adjustment pad 25 is adhered to the front side of the heel spacer 22 to allow the force to face inward by the human body balance mechanism.

六、微調配置:取出初調足弓矯正器鞋組內之墊片裝置21,並依據再調資料對應在鞋底裝置1,設置如圖17所示之由足後跟墊片22、側頂墊片23、微調墊片24及前調墊片25所構成之另一墊片裝置21,當然也可以僅取出圖3之頂舟狀骨墊片26,移動前調墊片25的位置,並保留原有的足後跟墊片22、側頂墊片23及微調墊片24,使足弓矯正器鞋組配置成為一調後足弓矯正器鞋組,使用者穿著調後足弓矯正器鞋組,可微調使用者足底之局部區域的高度,令使用者足底之壓力再度更趨向平衡完美,並能讓身體的各部位歸回應有的位置,使足部3(見圖1)在站立或行走時均能得到最佳的平衡與穩定,故能舒適地行走不易感到疲勞。Sixth, fine-tuning configuration: take out the initial adjustment of the foot arch orthosis in the shoe set 21, and according to the re-adjustment data corresponding to the sole device 1, set the foot heel pad 22, side top pad as shown in Figure 17. The other spacer device 21 composed of the sheet 23, the fine adjustment spacer 24 and the front adjustment spacer 25 may of course only take out the top boat-shaped bone spacer 26 of FIG. 3, and move the position of the front adjustment spacer 25 and retain it. The original heel pad 22, the side top pad 23 and the fine adjustment pad 24 enable the arch correction shoe group to be a adjusted ankle bran shoe set, and the user wears the adjusted arch correction shoe The group can finely adjust the height of the local area of the user's sole, so that the pressure of the user's sole is more balanced and perfect, and the parts of the body can be returned to the position, so that the foot 3 (see Figure 1) is The best balance and stability can be obtained when standing or walking, so it is not easy to feel tired when walking comfortably.

接著,以第二個微調態樣為例來說明,其係包含下列步驟:Next, taking the second trimming aspect as an example, the system includes the following steps:

一、初拓腳圖:如圖18所示,印製一張具有使用者一對足印41的初始腳圖4。First, the initial foot map: As shown in Figure 18, an initial foot map 4 with a pair of foot prints 41 is printed.

二、初步分析:根據分析模式,分析初始腳圖4上左、右足印41之形狀及墨色濃淡的初始資訊,得知「左、右足印41略呈高弓足腳型,力量明顯偏向外側,且外側第五趾受力」,並依據此初始資訊由校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料,也就是如圖11及圖19所示,當力量向外時,在鞋底裝置1對應跟內前部f處黏貼一片微調墊片24,並令微調墊片24之1/3部份凸出襯墊在旁側,且當外側第五趾受力時,在鞋底裝置1對應跟內後部d處黏貼一片前調墊片25,同樣令前調墊片25之1/3部份凸出襯墊在旁側。Second, preliminary analysis: According to the analysis mode, the initial information of the left and right foot prints 41 on the initial foot map 4 and the initial information of the darkness of the ink color are analyzed, and it is known that the left and right foot prints 41 are slightly high-footed and foot-shaped, and the force is obviously biased to the outside. And the fifth toe of the outer side is stressed, and according to the initial information, the corresponding fine-tuning mode is selected from the correction database to establish a preliminary adjustment data of the user's sole to adjust the pressure part, that is, as shown in FIG. As shown in FIG. 19, when the force is outward, a fine adjustment pad 24 is adhered to the inward inner portion f of the sole device 1, and a 1/3 portion of the fine adjustment pad 24 is protruded from the pad side. When the outer fifth toe is stressed, a front pad 25 is adhered to the instep inner portion d of the sole device 1, and the 1/3 portion of the front pad 25 is also protruded from the pad side.

三、初調配置:依據此初調資料挑選出一片微調墊片24,及一片前調墊片25,構成該墊片裝置21,並將此墊片裝置21黏貼於足弓矯正器鞋組之鞋底裝置1,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,當使用者穿著此初調足弓矯正器鞋組,藉該等墊片相對托高使用者足底的局部區域。使用者行走時,即能透過人體力學及工學的平衡機制,促使足部重新自動修正使力量向內,減輕第五趾的受力。Third, the initial adjustment configuration: according to the initial adjustment data to select a fine adjustment gasket 24, and a piece of front adjustment gasket 25, constitute the gasket device 21, and the gasket device 21 is adhered to the arch correction shoe group The sole device 1 configures the arch of the arch of the arch to be an initial adjustment of the arch of the arch of the arch, and when the user wears the initial set of the arch of the arch, the spacer is used to support the sole of the user. Partial area. When the user walks, the balance mechanism of human mechanics and engineering can be used to promote the foot to automatically correct the force to inward and reduce the force of the fifth toe.

四、再拓腳圖:當使用者穿著初調足弓矯正器鞋組一段時間,例如3個月之後,再如圖20所示,印製具有使用者一對足印51之調後腳圖5。Fourth, the extension of the foot map: When the user wears the initial adjustment of the arch correction tool set for a period of time, for example, 3 months later, as shown in Figure 20, the printed foot with the user's pair of foot prints 51 Figure 5 .

五、再調分析:根據前述分析模式,分析出調後腳圖5上足印51之形狀及墨色濃淡的調後資訊,將此調後資訊與該初始資訊比對,可得知「外側壓力已減輕,且第五趾已無明顯受力狀況」,並由校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須微調壓力部位之再調資料,須如圖11及圖21所示,在鞋底裝置1對應跟內前部f處黏貼一片微調墊片24。V. Re-adjustment analysis: According to the above analysis mode, the post-adjustment information of the shape of the footprint 51 and the darkness of the ink color on the rear foot map 5 are analyzed, and the adjusted information is compared with the initial information, and it can be known that “the lateral pressure has been Reduced, and the fifth toe has no obvious stress condition, and the corresponding fine-tuning mode is selected from the correction database to establish a re-adjustment data of the user's sole to fine-tune the pressure part, as shown in Figure 11. As shown in Fig. 21, a fine adjustment pad 24 is adhered to the instep inner portion f of the sole device 1.

六、微調配置:取出初調足弓矯正器鞋組內之墊片裝置21,並依據再調資料對應在鞋底裝置1,仍須如圖21所示維持前述微調墊片24的貼設,並撕離前調墊片25(見圖19),以藉由人體平衡機制讓力量繼續朝內,令使用者足底之壓力再度更趨向平衡完美。Sixth, fine-tuning configuration: take out the pad device 21 in the initial adjustment of the arch-corrector shoe set, and according to the re-adjustment data corresponding to the sole device 1, the above-mentioned fine-adjusting pad 24 must be maintained as shown in FIG. 21, and Peel off the front adjustment pad 25 (see Figure 19) to allow the force to continue to move inward through the body balance mechanism, so that the pressure on the user's sole is more balanced.

最後,以第三個微調態樣為例來說明,其係包含下列步驟:Finally, the third trimming aspect is taken as an example to illustrate the following steps:

一、初拓腳圖:如圖22所示,印製一張具有使用者一對足印41的初始腳圖4。First, the initial foot map: As shown in Figure 22, a preliminary foot diagram 4 with a user's pair of footprints 41 is printed.

二、初步分析:根據分析模式,分析初始腳圖4上左、右足印41之形狀及墨色濃淡的初始資訊,得知「左、右足印41明顯為高弓足腳型,且力量向外」,並依據此初始資訊由校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料,也就是如圖11及圖23所示,當力量向外時,在鞋底裝置1對應跟內前部f處黏貼一片微調墊片24,並令微調墊片24之1/3部份凸出襯墊在旁側。Second, the preliminary analysis: According to the analysis mode, the initial information of the left and right foot prints 41 on the initial foot map 4 and the initial information of the darkness of the ink color are analyzed, and it is known that "the left and right foot prints 41 are obviously high-footed and foot-shaped, and the force is outward". According to the initial information, the corresponding fine-tuning mode is selected from the calibration database to establish a preliminary adjustment data of the pressure portion of the user's sole, that is, as shown in FIG. 11 and FIG. When outward, a fine adjustment pad 24 is adhered to the inward inner portion f of the sole device 1, and a 1/3 portion of the fine adjustment pad 24 is protruded from the pad side.

三、初調配置:依據此初調資料挑選出一片微調墊片24構成該墊片裝置21,並將此墊片裝置21黏貼於足弓矯正器鞋組之鞋底裝置1,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,當使用者穿著此初調足弓矯正器鞋組,即能透過人體力學及工學的平衡機制,促使足部重新自動修正使力量向內。Third, the initial adjustment configuration: according to the preliminary adjustment data, a fine adjustment gasket 24 is selected to constitute the gasket device 21, and the gasket device 21 is adhered to the sole device 1 of the arch correction shoe group, so that the arch correction device The shoe set is an initial set of arch correction shoe sets. When the user wears the initial adjustment of the arch correction tool set, the balance mechanism of the human body mechanics and engineering can be used to promote the foot to automatically correct and force the inward. .

四、再拓腳圖:當使用者穿著初調足弓矯正器鞋組一段時間,例如1個月之後,再如圖24所示,印製具有使用者一對足印51之調後腳圖5。Fourth, the extension of the foot map: When the user wears the initial adjustment of the arch correction tool set for a period of time, for example, 1 month later, as shown in Figure 24, the printed foot with the user's pair of foot prints 51 Figure 5 .

五、再調分析:根據前述分析模式,分析出調後腳圖5上足印51之形狀及墨色濃淡的調後資訊,將此調後資訊與該初始資訊比對,可得知「壓力減輕且力量向內」,並由校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須微調壓力部位之再調資料,如圖25所示,不須另外添加墊片。V. Re-adjustment analysis: According to the above analysis mode, the post-adjustment information of the shape of the footprint 51 and the darkness of the ink color on the rear foot map 5 are analyzed, and the adjusted information is compared with the initial information, and the pressure relief is known. The force is inward, and the corresponding fine-tuning mode is selected from the calibration database to establish a re-adjustment data for the user's sole to fine-tune the pressure portion, as shown in Figure 25, without the need for additional spacers.

六、微調配置:如圖25所示,依據再調資料,將鞋底裝置1上之微調墊片24(見圖23)撕離,即能藉由人體平衡機制令使用者足底之壓力再度更趨向平衡完美。6. Fine-tuning configuration: As shown in Fig. 25, according to the re-adjustment data, the fine-adjusting spacer 24 (see Fig. 23) on the sole device 1 is torn off, so that the pressure of the user's sole can be further improved by the human body balance mechanism. The trend is perfect.

綜上所述,本發明除了利用足弓矯正器14來頂托足部3矯正腳型之外,更依據使用者之腳圖,分析出足部3的受力狀況,並依壓力大小所對應之補償方位,以模組化在鞋底裝置1設置墊片裝置21,藉以托高使用者足底的局部區域,令使用者足底壓力由不平衡狀態回歸平衡狀態,以連帶使膝蓋、骨盆、脊椎回復正常位置,以維持人體健康,故確實能達成本發明之目的。In summary, the present invention analyzes the force state of the foot 3 according to the foot diagram of the user, in addition to using the arch orthosis 14 to support the foot 3 to correct the foot shape, and according to the pressure. Compensating the orientation to modularize the spacer device 21 in the sole device 1, thereby maximizing the local area of the user's sole, so that the user's plantar pressure is returned to the equilibrium state from the unbalanced state, so as to bring the knee, the pelvis, the spine together. Returning to the normal position to maintain human health, it is indeed possible to achieve the object of the present invention.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

1...鞋底裝置1. . . Sole device

11...大底片11. . . Big negative

12...中底片12. . . Midsole

13...內襯片13. . . Lining sheet

14...足弓矯正器14. . . Ankle braces

15...鞋跟區15. . . Heel area

16...魔術氈16. . . Magic felt

17...前半段區域17. . . First half

18...後半段區域18. . . Second half

181...右半部位181. . . Right half

182...左半部位182. . . Left half

2...墊片備材庫2. . . Gasket preparation library

20...偏置墊片單元20. . . Bias spacer unit

21...墊片裝置twenty one. . . Gasket device

22...足後跟墊片twenty two. . . Heel pad

23...側頂墊片twenty three. . . Side top gasket

24...微調墊片twenty four. . . Fine adjustment gasket

25...前調墊片25. . . Front adjustment gasket

26...頂舟狀骨墊片26. . . Canopy bone gasket

3...足部3. . . Foot

31...腳跟31. . . heel

32...輪廓線32. . . contour line

33...後跟線33. . . Heel line

34...垂直線34. . . Vertical line

35...拇趾側線35. . . Toe side line

4...初始腳圖4. . . Initial foot map

41...足印41. . . Footprint

411...腳跟部411. . . Heel

412...後跟線412. . . Heel line

413...拇趾部413. . . Toe

414...腳心部414. . . Foot center

415...足前部415. . . Front part

416...假想線416. . . Imaginary line

417...假想線417. . . Imaginary line

5...改善後腳圖5. . . Improve the foot map

51...足印51. . . Footprint

513...拇趾部513. . . Toe

A...掌內前部A. . . Anterior

B...掌內中部B. . . Central palm

C...掌內後部C. . . Inside the palm

D...掌外前部D. . . Front of the palm

E...掌外中部E. . . Central palm

F...掌外後部F. . . Rear of the palm

f...跟內前部f. . . With the inner front

e...跟內中部e. . . With the middle

d...跟內後部d. . . With the inner rear

c‧‧‧跟外前部C‧‧‧ with the front

a‧‧‧跟外後部A‧‧‧ with the outer rear

b‧‧‧跟外中部b‧‧‧With the middle

圖1是本發明穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法的一較佳實施例所製成之一初調足弓矯正器鞋組的一立體分解圖;1 is an exploded perspective view of a first embodiment of an initial adjustment of an arch correction shoe set according to a preferred embodiment of the method for finely adjusting the pressure of the sole of the sole of the foot in the shoe arch of the present invention;

圖2是該較佳實施例的一部份立體分解圖,說明一墊片裝置的部份構造;Figure 2 is a partially exploded perspective view of the preferred embodiment illustrating a partial configuration of a spacer device;

圖3是該較佳實施例之墊片裝置安裝在一鞋底裝置的一正視示意圖,說明一初調配置步驟後的的設置;Figure 3 is a front elevational view of the spacer device of the preferred embodiment mounted on a sole device, illustrating the settings after a preliminary configuration step;

圖4是該較佳實施例之一墊片備材庫的一正視示意圖;Figure 4 is a front elevational view of a gasket stocking library of the preferred embodiment;

圖5是該較佳實施例之一初始腳圖的一正視示意圖,說明一第一個微調態樣之一初拓腳圖步驟;FIG. 5 is a front elevational view of an initial foot diagram of the preferred embodiment, illustrating a first step of the first fine adjustment mode;

圖6是該較佳實施例之第一個微調態樣的初始腳圖於一初步分析的一過程示意圖;6 is a schematic diagram showing a process of initial analysis of the first trimming aspect of the first embodiment of the preferred embodiment;

圖7是該較佳實施例之一校正資料庫中的一部份構造示意圖;7 is a schematic structural view of a portion of a calibration database of the preferred embodiment;

圖8是該較佳實施例之該校正資料庫中的一部份構造示意圖;FIG. 8 is a schematic structural diagram of a portion of the calibration database of the preferred embodiment; FIG.

圖9是該較佳實施例之該校正資料庫中的一部份構造示意圖;9 is a schematic structural diagram of a portion of the calibration database of the preferred embodiment;

圖10是該較佳實施例之該校正資料庫中的一部份構造示意圖;10 is a schematic structural view of a portion of the calibration database of the preferred embodiment;

圖11是該較佳實施例之一足印的劃分位置示意圖;Figure 11 is a schematic view showing the division position of a foot print of the preferred embodiment;

圖12是該較佳實施例之該校正資料庫中的一部份構造示意圖;12 is a schematic structural view of a portion of the calibration database of the preferred embodiment;

圖13是該較佳實施例之該校正資料庫中的一部份構造示意圖;FIG. 13 is a schematic structural diagram of a portion of the calibration database of the preferred embodiment; FIG.

圖14是該較佳實施例所製成之初調足弓矯正器鞋組的一部份剖視示意圖;Figure 14 is a partial cross-sectional view showing the shoe set of the initial adjustment arch of the preferred embodiment;

圖15是該較佳實施例之一調後腳圖的一正視示意圖,說明該第一個微調態樣之一再拓腳圖步驟;FIG. 15 is a front elevational view showing a rearward adjustment of the first embodiment of the preferred embodiment; FIG.

圖16是該較佳實施例之第一個微調態樣的調後腳圖於一初步分析的一過程示意圖;16 is a schematic diagram of a process of a preliminary analysis of the first trimming pattern of the first embodiment of the preferred embodiment;

圖17是該較佳實施例之另一墊片裝置安裝在鞋底裝置的一正視示意圖,說明一微調配置步驟後的設置;Figure 17 is a front elevational view showing another spacer device of the preferred embodiment mounted on the sole device, illustrating a setting after a fine adjustment configuration step;

圖18是本發明穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法之一初始腳圖的一正視示意圖,說明一第二個微調態樣之一初拓腳圖步驟;18 is a front elevational view showing an initial foot diagram of a method for finely adjusting the pressure of the sole of the sole of the foot when the arch of the arch of the present invention is worn, illustrating a step of the first step of the second fine adjustment;

圖19是該較佳實施例之一墊片裝置安裝在一鞋底裝置的一正視示意圖,說明一初調配置步驟後的的設置;Figure 19 is a front elevational view showing the spacer device of the preferred embodiment mounted on a sole device, illustrating the settings after a preliminary configuration step;

圖20是該較佳實施例之一調後腳圖的一正視示意圖,說明該第二個微調態樣之一再拓腳圖步驟;FIG. 20 is a front elevational view showing a rearward adjustment of the second embodiment of the preferred embodiment; FIG.

圖21是該較佳實施例之另一墊片裝置安裝在鞋底裝置的一正視示意圖,說明一微調配置步驟後的設置;Figure 21 is a front elevational view showing another spacer device of the preferred embodiment mounted on the sole device, illustrating a setting after a fine adjustment configuration step;

圖22是本發明穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法之一初始腳圖的一正視示意圖,說明一第三個微調態樣之一初拓腳圖步驟;22 is a front elevational view showing an initial foot diagram of a method for finely adjusting the pressure of the sole of the sole of the foot when the arch of the arch of the present invention is worn, illustrating a step of initializing the foot of a third fine adjustment mode;

圖23是該較佳實施例之一墊片裝置安裝在一鞋底裝置的一正視示意圖,說明一初調配置步驟後的的設置;Figure 23 is a front elevational view showing the spacer device of the preferred embodiment mounted on a sole device, illustrating the settings after a preliminary configuration step;

圖24是該較佳實施例之一調後腳圖的一正視示意圖,說明該第三個微調態樣之一再拓腳圖步驟;及Figure 24 is a front elevational view of a rearward adjustment of a preferred embodiment of the preferred embodiment, illustrating a step of re-extending the third trimming aspect; and

圖25是該較佳實施例之另一墊片裝置安裝在鞋底裝置的一正視示意圖,說明一微調配置步驟後的設置。Figure 25 is a front elevational view of another spacer device of the preferred embodiment mounted to the sole device illustrating the arrangement after a fine tuning configuration step.

1...鞋底裝置1. . . Sole device

11...大底片11. . . Big negative

12...中底片12. . . Midsole

13...內襯片13. . . Lining sheet

14...足弓矯正器14. . . Ankle braces

15...鞋跟區15. . . Heel area

16...魔術氈16. . . Magic felt

20...偏置墊片單元20. . . Bias spacer unit

21...墊片裝置twenty one. . . Gasket device

22...足後跟墊片twenty two. . . Heel pad

23...側頂墊片twenty three. . . Side top gasket

24...微調墊片twenty four. . . Fine adjustment gasket

25...前調墊片25. . . Front adjustment gasket

26...頂舟狀骨墊片26. . . Canopy bone gasket

3...足部3. . . Foot

31...腳跟31. . . heel

Claims (6)

一種足弓矯正器鞋組,是用於供人體之一足部穿著,並包含:一鞋底裝置,形成有一對應所述足部之一腳跟的鞋跟區,並包括一中底片,及一可拆離地安裝在該中底片上方以供所述足部踏置之足弓矯正器;及一墊片裝置,包括一偏置墊片單元,該偏置墊片單元是可拆離地安裝在該鞋底裝置內,且對應位於該鞋底裝置涵蓋有鞋跟區之一後半段區域,且位在該後半段區域之一右半部位與一左半部位的其中之一,用於相對頂撐托高該足弓矯正器的局部偏側位置,該偏置墊片單元具有至少一片呈圓形的微調墊片,該微調墊片是可拆離地安裝在該鞋底裝置之後半段區域之右半部位與左半部位的其中之一上,且位在該鞋跟區前方,該微調墊片局部凸露出該鞋底裝置之邊緣外,該微調墊片之直徑為15 mm至45 mm。 An arch corrector shoe set for use in a foot of a human body, comprising: a sole device, a heel region corresponding to a heel of the foot, and a midsole and a detachable An arch orthosis device mounted above the midsole for the foot to step; and a spacer device including a biasing pad unit detachably mounted to the In the sole device, correspondingly located in the rear half of the heel region, and located in one of the right half of the second half and one of the left half, for the relative support a partial eccentric position of the arch aligner, the offset shims unit having at least one rounded fine adjustment pad detachably mounted to the right half of the rear half of the sole device And on one of the left half portions, and in front of the heel region, the fine adjustment pad partially protrudes beyond the edge of the sole device, and the fine adjustment pad has a diameter of 15 mm to 45 mm. 一種足弓矯正器鞋組,是用於供人體之一足部穿著,並包含:一鞋底裝置,形成有一對應所述足部之一腳跟的鞋跟區,並包括一中底片,及一可拆離地安裝在該中底片上方以供所述足部踏置之足弓矯正器;及一墊片裝置,包括一偏置墊片單元,該偏置墊片單元是可拆離地安裝在該鞋底裝置內,且對應位於該鞋底裝置涵蓋有鞋跟區之一後半段區域,且位在該後半段區域之一右半部位與一左半部位的其中之一,用於相對頂撐托高該 足弓矯正器的局部偏側位置,該偏置墊片單元具有至少一片圓形的前調墊片,該前調墊片是可拆離地安裝在該鞋底裝置之後半段區域之右半部位與左半部位的其中之一上,且位在該鞋跟區的一側邊上,該前調墊片局部凸露出該鞋底裝置之邊緣外,該微調墊片之直徑為15 mm至45 mm。 An arch corrector shoe set for use in a foot of a human body, comprising: a sole device, a heel region corresponding to a heel of the foot, and a midsole and a detachable An arch orthosis device mounted above the midsole for the foot to step; and a spacer device including a biasing pad unit detachably mounted to the In the sole device, correspondingly located in the rear half of the heel region, and located in one of the right half of the second half and one of the left half, for the relative support The a partial lateral position of the arch orthosis, the offset pad unit having at least one circular pre-adjusting pad detachably mounted to the right half of the rear half of the sole device And one of the left half portions, and located on one side of the heel region, the front adjustment gasket partially protrudes beyond the edge of the sole device, and the fine adjustment gasket has a diameter of 15 mm to 45 mm . 一種足弓矯正器鞋組,是用於供人體之一足部穿著,並包含:一鞋底裝置,形成有一對應所述足部之一腳跟的鞋跟區,並包括一中底片,及一可拆離地安裝在該中底片上方以供所述足部踏置之足弓矯正器;及一墊片裝置,包括一偏置墊片單元,該偏置墊片單元是可拆離地安裝在該鞋底裝置內,且對應位於該鞋底裝置涵蓋有鞋跟區之一後半段區域,且位在該後半段區域之一右半部位與一左半部位的其中之一,用於相對頂撐托高該足弓矯正器的局部偏側位置,該偏置墊片單元具有至少一片圓形的頂舟狀骨墊片,該頂舟狀骨墊片是可拆離地安裝在該鞋底裝置之後半段區域之右半部位與左半部位的其中之一上,且位在該足弓矯正器底部,該頂舟狀骨墊片局部凸露出該鞋底裝置之邊緣外,該頂舟狀骨墊片之直徑為15 mm至45 mm。 An arch corrector shoe set for use in a foot of a human body, comprising: a sole device, a heel region corresponding to a heel of the foot, and a midsole and a detachable An arch orthosis device mounted above the midsole for the foot to step; and a spacer device including a biasing pad unit detachably mounted to the In the sole device, correspondingly located in the rear half of the heel region, and located in one of the right half of the second half and one of the left half, for the relative support a partial lateral position of the arch orthosis, the offset pad unit having at least one circular top scaphoid spacer detachably mounted in the second half of the sole device On one of the right half and the left half of the region, and located at the bottom of the arch orthosis, the top boat-shaped bone spacer partially protrudes beyond the edge of the sole device, and the top boat-shaped bone spacer The diameter is from 15 mm to 45 mm. 一種穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法,所述足弓矯正器鞋組之一鞋底裝置包括一足弓矯正器,該微調方法包含下列步驟: 初拓腳圖:印製具有使用者一對足印的初始腳圖;初步分析:根據一個分析模式,分析出初始腳圖上足印之形狀及墨色濃淡的初始資訊,並依據此初始資訊由一校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料,該分析模式係先沿著足印之外圍輪廓劃出一輪廓線,接著劃出一條水平通過腳跟部後緣的後跟線,並劃出一條通過第二趾部中心且垂直於後跟線的垂直線,再劃出一條通過拇趾部根端內側且垂直於後跟線的拇趾側線,分析足印以垂直線為界內、外部位之面積及墨色分佈,依內、外面積的大小來分析足印的偏斜方向,並依足印之墨色濃淡來分析壓力的分佈,再依拇趾部延伸方向與拇趾側線間的傾斜角度來分析拇趾部的外翻傾斜度;及初調配置:依據此初調資料對應在一雙足弓矯正器鞋組之鞋底裝置分別安裝一墊片裝置,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,使用者穿著初調足弓矯正器鞋組,藉以托高使用者足底的局部區域,令使用者足底之壓力趨向平衡。 A method for finely adjusting the pressure of the sole of the sole of the shoe when wearing the arch of the arch of the arch, the sole device of the arch of the arch of the arch includes an arch aligner, the fine adjustment method comprising the following steps: The initial extension map: the initial foot map with the user's pair of footprints; preliminary analysis: According to an analysis mode, the initial information of the footprint and the initial color of the ink on the initial foot map are analyzed, and based on this initial information, A corresponding fine-tuning mode is selected in a calibration database to establish a preliminary adjustment data of the user's sole to adjust the pressure portion, and the analysis mode first draws a contour along the peripheral contour of the footprint, and then Draw a horizontal line through the trailing edge of the heel and draw a vertical line through the center of the second toe and perpendicular to the heel line, and then draw a line through the base of the base of the big toe and perpendicular to the heel Line the toe side line, analyze the foot print with the vertical line as the boundary, the outer position area and the ink color distribution, analyze the deviation direction of the foot print according to the size of the inner and outer areas, and analyze the pressure according to the ink color shade. The distribution of the hallux toe angle and the angle of inclination between the toe-toe line to analyze the inclination of the hallux toe; and the initial adjustment: according to the initial adjustment data corresponding to a pair of arch-corrector shoes Sole assembly A shimming device is installed to make the arch aligner shoe set into an initial adjustable arch aligner shoe set, and the user wears the initial adjustable arch aligner shoe set to support the local area of the user's sole. The pressure on the soles of the feet tends to balance. 一種穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法,所述足弓矯正器鞋組之一鞋底裝置包括一足弓矯正器,該微調方法包含下列步驟:初拓腳圖:印製具有使用者一對足印的初始腳圖;初步分析:根據一個分析模式,分析出初始腳圖上足印之形狀及墨色濃淡的初始資訊,並依據此初始資訊由一 校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料;及初調配置:依據此初調資料對應在一雙足弓矯正器鞋組之鞋底裝置分別安裝一墊片裝置,該墊片裝置包括一偏置墊片單元,該偏置墊片單元具有至少一片側頂墊片,將該側頂墊片黏貼在該鞋跟區之外側前方,該偏置墊片單元還具有至少一片微調墊片,將該微調墊片黏貼在該側頂墊片上方,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,使用者穿著初調足弓矯正器鞋組,藉以托高使用者足底的局部區域,令使用者足底之壓力趨向平衡。 A method for finely adjusting the pressure of the sole of the sole of the shoe when wearing the arch of the arch of the arch, the sole device of the arch of the arch of the arch includes an arch correction device, the fine adjustment method comprising the following steps: The initial foot map with the user's pair of footprints is printed; preliminary analysis: according to an analysis mode, the initial information of the shape of the foot print on the initial foot map and the initial color of the ink color are analyzed, and the initial information is based on the initial information. The corresponding fine-tuning mode is selected in the calibration database to establish a preliminary adjustment data of the user's foot to adjust the pressure part; and the initial adjustment configuration: according to the initial adjustment data corresponding to a pair of arch-corrector shoes The sole device is respectively mounted with a gasket device, the gasket device comprising an offset gasket unit having at least one side top gasket, the side top gasket being adhered to the outside of the heel region In front, the offset pad unit further has at least one fine adjustment pad, and the fine adjustment pad is pasted on the side top pad, so that the arch orthosis shoe group is configured as an initial adjustment of the arch correction shoe group. The wearer's initial adjustment of the arch of the arch is used to support the local area of the user's sole, so that the pressure of the user's sole tends to balance. 一種穿著足弓矯正器鞋組時的鞋內部足底壓力平衡之微調方法,所述足弓矯正器鞋組之一鞋底裝置包括一足弓矯正器,該微調方法包含下列步驟:初拓腳圖:印製具有使用者一對足印的初始腳圖;初步分析:將足印之一足前部及數根腳趾所在區域,框圍在一馬蹄形的假想線範圍內,並以一條假想直線將之區分成內、外兩半部分,再以兩條前後間隔的假想橫線區分成位於內側之一掌內前部、一掌內中部及一掌內後部,以及位於外側之一掌外前部、一掌外中部及一掌外後部,接著將足印之腳跟部框圍在一馬蹄形的假想線範圍內,並以一條假想直線將之區分成內、外兩半部分,再以兩條前後間隔的假想橫線區分成位於內側之一跟內前部、一跟內中部及一跟內後部,以及位於外側之一跟外前部、一跟外中部及一跟外後部,根據一個分析模式,分析出初始腳圖 上足印之形狀及墨色濃淡的初始資訊,並依據此初始資訊由一校正資料庫中挑選出相對應的微調模式,以建立出一份使用者足底須調整壓力部位之初調資料;及初調配置:依據此初調資料對應在一雙足弓矯正器鞋組之鞋底裝置分別安裝一墊片裝置,該墊片裝置包括一偏置墊片單元,在掌內前部受壓時將該偏置墊片單元墊在跟外後部,在掌內中部受壓時將該偏置墊片單元墊在跟外中部,在掌內後部受壓時將該偏置墊片單元墊在跟外前部,在掌外前部受壓時將該偏置墊片單元墊在跟內後部,在掌外中部受壓時將該偏置墊片單元墊在跟內中部,在掌外後部受壓時將該偏置墊片單元墊在跟內前部,使足弓矯正器鞋組配置成為一初調足弓矯正器鞋組,使用者穿著初調足弓矯正器鞋組,藉以托高使用者足底的局部區域,令使用者足底之壓力趨向平衡。 A method for finely adjusting the pressure of the sole of the sole of the shoe when wearing the arch of the arch of the arch, the sole device of the arch of the arch of the arch includes an arch correction device, the fine adjustment method comprising the following steps: An initial foot map with a pair of footprints printed by the user; preliminary analysis: the area where the foot of the foot and the plurality of toes are placed in a horseshoe-shaped imaginary line and is zoned by an imaginary line Divided into inner and outer halves, and then divided into two inner anterior portions, one palm inner middle portion and one palm inner rear portion, and one outer side palm outer front portion, The middle part of the palm and the outer part of the palm, then the heel of the footprint is enclosed in a horseshoe-shaped imaginary line, and is divided into inner and outer halves by an imaginary straight line, and then separated by two The imaginary horizontal line is divided into one inner side inner front part, one inner middle part and one inner inner part part, and one outer side outer front part, one outer middle part and one outer side rear part, according to an analysis mode, analysis Initial foot The initial information of the shape of the foot print and the initial color of the ink color, and according to the initial information, a corresponding fine-tuning mode is selected from a calibration database to establish a preliminary adjustment data of the pressure portion of the user's sole; Initial adjustment configuration: according to the initial adjustment data, a shoe device is respectively installed on the sole device of a pair of arch correction shoe sets, and the gasket device comprises an offset gasket unit, which is pressed when the front part of the palm is pressed The offset gasket unit is padded at the outer rear portion, and the offset gasket unit is placed in the outer middle portion when the middle portion of the palm is pressed, and the offset gasket unit is placed outside when the rear portion of the palm is pressed. The front part is placed on the rear part of the heel when the front part of the palm is pressed, and the offset pad unit is placed in the middle of the heel when the middle part of the palm is pressed, and is pressed at the rear part of the palm. When the offset pad unit is placed in the front part of the heel, the arch of the arch orthosis is configured as an initial adjustment of the arch of the arch of the arch, and the user wears the shoe of the initial adjustment of the arch, so as to use the shoe. The local area of the sole of the foot tends to balance the pressure on the sole of the user.
TW98137100A 2009-11-02 2009-11-02 Foot-fit appliance footwear and foot arch dresser shoe group when the shoe foot pressure balance of the internal fine-tuning method TWI410221B (en)

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TWM263917U (en) * 2004-06-18 2005-05-11 Nan-Ling Ma Correcting apparatus with plantar height movable and adjustable
TW200727881A (en) * 2006-01-17 2007-08-01 Homeway Technology Co Ltd An insole and an orthopedic shoe
US20080010856A1 (en) * 2006-07-14 2008-01-17 Erkki Hakkala Individually formed footwear and a related method
CN101411551A (en) * 2008-11-28 2009-04-22 四川大学 Design method of shoes for diabetes patient
TWM365165U (en) * 2009-01-17 2009-09-21 Jttc1331 Internat Inc Insole structure

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM263917U (en) * 2004-06-18 2005-05-11 Nan-Ling Ma Correcting apparatus with plantar height movable and adjustable
TW200727881A (en) * 2006-01-17 2007-08-01 Homeway Technology Co Ltd An insole and an orthopedic shoe
US20080010856A1 (en) * 2006-07-14 2008-01-17 Erkki Hakkala Individually formed footwear and a related method
CN101411551A (en) * 2008-11-28 2009-04-22 四川大学 Design method of shoes for diabetes patient
TWM365165U (en) * 2009-01-17 2009-09-21 Jttc1331 Internat Inc Insole structure

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