TWI401540B - - Google Patents
Info
- Publication number
- TWI401540B TWI401540B TW98122224A TW98122224A TWI401540B TW I401540 B TWI401540 B TW I401540B TW 98122224 A TW98122224 A TW 98122224A TW 98122224 A TW98122224 A TW 98122224A TW I401540 B TWI401540 B TW I401540B
- Authority
- TW
- Taiwan
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW98122224A TW201102757A (en) | 2009-07-01 | 2009-07-01 | Position adjustment apparatus and exposure machine containing same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW98122224A TW201102757A (en) | 2009-07-01 | 2009-07-01 | Position adjustment apparatus and exposure machine containing same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201102757A TW201102757A (en) | 2011-01-16 |
| TWI401540B true TWI401540B (zh) | 2013-07-11 |
Family
ID=44837577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW98122224A TW201102757A (en) | 2009-07-01 | 2009-07-01 | Position adjustment apparatus and exposure machine containing same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TW201102757A (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109108940A (zh) * | 2018-08-15 | 2019-01-01 | 苏州富强科技有限公司 | 自动对心调整旋转机构 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5464715A (en) * | 1993-04-02 | 1995-11-07 | Nikon Corporation | Method of driving mask stage and method of mask alignment |
| US6162566A (en) * | 1997-11-26 | 2000-12-19 | Hoya Corporation | Mask holder for supporting transfer mask |
| EP1111468A2 (en) * | 1999-12-23 | 2001-06-27 | Nikon Corporation | Stage assembly for exposure apparatus |
| EP1450392A1 (en) * | 2003-02-20 | 2004-08-25 | Applied Materials, Inc. | Methods and apparatus for positioning a substrate relative to a support stage |
| EP1531363A1 (en) * | 2003-10-27 | 2005-05-18 | ASML Netherlands B.V. | Reticle holder |
| EP1610362A1 (en) * | 2003-04-01 | 2005-12-28 | Nikon Corporation | Stage device, exposure deice, and method of producing device |
-
2009
- 2009-07-01 TW TW98122224A patent/TW201102757A/zh unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5464715A (en) * | 1993-04-02 | 1995-11-07 | Nikon Corporation | Method of driving mask stage and method of mask alignment |
| US6162566A (en) * | 1997-11-26 | 2000-12-19 | Hoya Corporation | Mask holder for supporting transfer mask |
| EP1111468A2 (en) * | 1999-12-23 | 2001-06-27 | Nikon Corporation | Stage assembly for exposure apparatus |
| EP1450392A1 (en) * | 2003-02-20 | 2004-08-25 | Applied Materials, Inc. | Methods and apparatus for positioning a substrate relative to a support stage |
| EP1610362A1 (en) * | 2003-04-01 | 2005-12-28 | Nikon Corporation | Stage device, exposure deice, and method of producing device |
| EP1531363A1 (en) * | 2003-10-27 | 2005-05-18 | ASML Netherlands B.V. | Reticle holder |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201102757A (en) | 2011-01-16 |