TWI400357B - Surface hardening substrate and method making the same - Google Patents
Surface hardening substrate and method making the same Download PDFInfo
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Description
本發明涉及一種表面強化基體及該表面強化基體之製備方法。 The invention relates to a surface strengthening substrate and a method for preparing the surface strengthening substrate.
為了保護一些基體,如表殼、眼鏡架、手機、電腦等不受損傷,經常會在這些基體表面設置一強化膜從而形成一表面強化基體。過渡金屬氮化合物如氮化鉻或過渡金屬碳化物如碳化鉻由於具有高硬度、高抗摩擦磨損性與良好之化學穩定性,常用來直接設置在基體表面形成所述強化膜。然,在實際應用中,所述強化膜如氮化鉻膜、碳化鉻膜具有高脆性、高殘餘應力、與基體結合力差等缺點,且均為單質強化膜。因此隨著膜厚之增加與溫度之增高,這些單質強化膜會出現大之柱狀晶結構,從而容易發生脆裂與脫落,使表面強化失效。 In order to protect some substrates, such as watch cases, frames, mobile phones, computers, etc., a reinforced film is often placed on the surface of these substrates to form a surface-strengthening substrate. Transition metal nitrogen compounds such as chromium nitride or transition metal carbides such as chromium carbide have a high hardness, high friction and wear resistance and good chemical stability, and are usually provided directly on the surface of the substrate to form the reinforced film. However, in practical applications, the reinforced film such as a chromium nitride film or a chromium carbide film has disadvantages such as high brittleness, high residual stress, and poor adhesion to a substrate, and both are elemental reinforced films. Therefore, as the film thickness increases and the temperature increases, these elemental strengthening films will have a large columnar crystal structure, which is prone to brittle cracking and shedding, and the surface strengthening fails.
有鑒於此,提供一種強化膜與基體結合良好之表面強化基體及其製備方法實為必要。 In view of the above, it is necessary to provide a surface-strengthening substrate in which a reinforcing film is bonded to a substrate and a preparation method thereof.
一種表面強化基體,包括一基體及設置在該基體一表面之一 強化膜。所述強化膜包括一第一合金層與一第二合金層,所述第一合金層設置在所述基體表面與第二合金層之間。所述第一合金層包括兩種過渡金屬,所述第二合金層包括所述兩種過渡金屬與碳氮元素。 A surface strengthening substrate comprising a substrate and one of a surface disposed on the substrate Strengthen the film. The reinforced film includes a first alloy layer and a second alloy layer, and the first alloy layer is disposed between the surface of the substrate and the second alloy layer. The first alloy layer includes two transition metals, and the second alloy layer includes the two transition metals and carbon nitrogen elements.
一種表面強化基體,包括一基體以及所述基體之一表面設置之一具有多層結構之強化膜。該強化膜至少包括一過渡層及一硬質層,該過渡層與硬質層依次設置在所述基體表面。所述過渡層為由兩種過渡金屬形成之合金層,所述硬質層為含所述兩種過渡金屬與非金屬元素之合金層。 A surface-strengthening substrate comprising a substrate and a reinforced film having a multilayer structure on one of the surface surfaces of the substrate. The reinforced film includes at least a transition layer and a hard layer, and the transition layer and the hard layer are sequentially disposed on the surface of the substrate. The transition layer is an alloy layer formed of two transition metals, the hard layer being an alloy layer containing the two transition metals and non-metal elements.
一種表面強化基體,包括一基體及一設置在該基體一表面之強化膜。所述強化膜為含有兩種過渡金屬之合金膜,且該強化膜遠離所述基體之一側包括有碳氮元素。 A surface strengthening substrate comprising a substrate and a reinforcing film disposed on a surface of the substrate. The reinforced film is an alloy film containing two transition metals, and the reinforced film includes a carbon-nitrogen element away from one side of the substrate.
一種表面強化基體之製備方法,其包括如下步驟:提供一基體;以及在該基體之一表面通過濺鍍之方式依次形成一第一合金層與一第二合金層,所述第一合金層包括兩種過渡金屬,所述第二合金層包括所述兩種過渡金屬與碳氮元素。 A method for preparing a surface-strengthened substrate, comprising the steps of: providing a substrate; and sequentially forming a first alloy layer and a second alloy layer on one surface of the substrate by sputtering, the first alloy layer comprising Two transition metals, the second alloy layer comprising the two transition metals and carbon and nitrogen elements.
相較於先前技術,所述強化膜中由兩種過渡金屬形成之第一合金層具有良好之化學穩定性及與基體良好之親和性,可緩解所述強化膜受力時之內部應力變化,提高薄膜與基體之間之結合力;而由所述兩種過渡金屬與碳氮元素形成之第二合金層則具有較高之硬度。因次,所述強化膜能夠與基體結合良好,且具有一定之抗磨損性。 Compared with the prior art, the first alloy layer formed by the two transition metals in the reinforced membrane has good chemical stability and good affinity with the matrix, and can alleviate internal stress changes when the reinforced membrane is stressed. The bonding force between the film and the substrate is increased; and the second alloy layer formed by the two transition metals and the carbon nitrogen element has a higher hardness. Therefore, the reinforced film can be well bonded to the substrate and has a certain degree of abrasion resistance.
100‧‧‧表面強化基體 100‧‧‧Surface-strengthened matrix
10‧‧‧基體 10‧‧‧ base
20‧‧‧強化膜 20‧‧‧ Strengthening film
21‧‧‧第一合金層 21‧‧‧First alloy layer
22‧‧‧第二合金層 22‧‧‧Second alloy layer
圖1為本發明實施例提供之表面強化基體之結構示意圖。 FIG. 1 is a schematic structural view of a surface strengthening substrate according to an embodiment of the present invention.
圖2為採用輝光放電光譜技術(Glowd ischargeopticalemissionspectroscopy,GD OES)分析圖1中表面強化基體在截面不同位置元素含量之變化曲線。 2 is a graph showing the variation of the element content of the surface-enhanced matrix in different positions of the cross-section in FIG. 1 by Glowd ischarge optical emission spectroscopy (GD OES).
以下將結合附圖對本發明實施例進行詳細說明。 The embodiments of the present invention will be described in detail below with reference to the accompanying drawings.
請參見圖1,本發明實施例提供一種表面強化基體100,所述表面強化基體100包括一基體10及設置在所述基體10表面之強化膜20。 Referring to FIG. 1 , an embodiment of the present invention provides a surface strengthening substrate 100 . The surface strengthening substrate 100 includes a substrate 10 and a reinforcing film 20 disposed on a surface of the substrate 10 .
所述基體10可為各種產品之本體或者外殼,如模具、刀刃、各種電子產品之外殼等。所述基體10包括鎂基體、鋁基體、鋼基體等金屬基體,也包括含有金屬材料之複合材料基體。在本實施例中,所述基體10為鋼基體。 The substrate 10 can be a body or a casing of various products, such as a mold, a blade, an outer casing of various electronic products, and the like. The base 10 includes a metal matrix such as a magnesium matrix, an aluminum matrix, a steel matrix, and the like, and also includes a composite matrix containing a metal material. In this embodiment, the base 10 is a steel base.
所述強化膜20用於覆蓋在所述基體10表面使該基體10表面與環境隔離,同時增加該基體10表面之硬度,從而有效保護所述基體10。該強化膜20之厚度可根據實際需求而設置,對於一般產品之需求,所述強化膜20之厚度在500奈米到5微米之間。該強化膜20為一多層結構,該強化膜20包括依次設置在所述基體10表面一第一合金層21、一第二合金層22及一修飾層(圖未示出)。 The reinforcing film 20 is used to cover the surface of the substrate 10 to isolate the surface of the substrate 10 from the environment while increasing the hardness of the surface of the substrate 10, thereby effectively protecting the substrate 10. The thickness of the reinforced film 20 can be set according to actual needs. For the general product, the thickness of the reinforced film 20 is between 500 nm and 5 microns. The reinforced film 20 is a multi-layered structure comprising a first alloy layer 21, a second alloy layer 22 and a finishing layer (not shown) disposed on the surface of the substrate 10.
所述第一合金層21設置在基體10表面與第二合金層22之間作為過渡層,以使所述基體10與第二合金層22結合良好。所述第一合金層21為與基體10結合良好且具有一定硬度之鎳鉻(Ni-Gr)合金層。所述鎳鉻合金層中之鎳有著良好之韌性與高溫穩定性,與金屬基體之結合性能較好。所述鎳鉻合金層中之鉻元素用於提高第一合金層21之硬度。所述鎳鉻合金層中之鎳之質量百分含量大致在20%到80%之間。所述鎳鉻合金層之厚度在100奈米到3000奈米之間。在本實施例中,所述鎳鉻合金層在厚度大致為150奈米且鎳之質量百分含量大致為60%時,與基體10與第二合金層22具有較佳之結合性能且具有一定之硬度。 The first alloy layer 21 is disposed between the surface of the substrate 10 and the second alloy layer 22 as a transition layer to bond the substrate 10 and the second alloy layer 22 well. The first alloy layer 21 is a nickel-chromium (Ni-Gr) alloy layer which is well bonded to the substrate 10 and has a certain hardness. The nickel in the nickel-chromium alloy layer has good toughness and high temperature stability, and has good bonding property with the metal matrix. The chromium element in the nichrome layer is used to increase the hardness of the first alloy layer 21. The mass percentage of nickel in the nichrome layer is approximately between 20% and 80%. The nichrome layer has a thickness between 100 nm and 3000 nm. In this embodiment, the nickel-chromium alloy layer has a better bonding property with the substrate 10 and the second alloy layer 22 when the thickness is approximately 150 nm and the mass percentage of nickel is approximately 60%. hardness.
所述第二合金層22設置在所述第一合金層21遠離所述基體10之表面作為硬質層,以增加所述強化膜20之硬度。所述第二合金層22為與第一合金層21結合良好且具有較大硬度之含鎳鉻元素之合金層,如鎳鉻碳(Ni-Gr-C)合金、鎳鉻氮(Ni-Gr-N)合金,優選地,所述第二合金層22為鎳鉻碳氮(Ni-Gr-C-N)合金層。該鎳鉻碳氮合金層中之鉻容易與碳或氮合成生成碳化鉻或氮化鉻硬質相,而該鎳鉻碳氮合金層中之鎳則主要用於提高第二合金層22與第一合金層21之結合能力。所述鎳鉻碳氮合金層之厚度不限,可根據實際應用而設置。一般地,所述鎳鉻合金層之厚度在100奈米到3000奈米之間。所述鎳鉻碳氮合金中之鎳、鉻、碳及氮元素之質量百分含量不限,可根據實際應用而設置。具體地,所述碳元素 之質量百分含量在1%到50%之間,所述氮元素之質量百分含量在1%到50%之間,且滿足所述碳氮之總質量百分含量在1%到90%之間。在本實施例中,當所述鎳鉻碳氮合金中之鎳元素之質量百分含量大致為62%,鉻元素之質量百分含量大致為16%,碳元素之質量百分含量大致為12%及氮元素之質量百分含量大致為10%時,所述第二合金層22與第一合金層21、修飾層具有較佳之結合性能及較大之硬度。 The second alloy layer 22 is disposed on a surface of the first alloy layer 21 away from the substrate 10 as a hard layer to increase the hardness of the reinforced film 20. The second alloy layer 22 is an alloy layer containing a nickel-chromium element which is well bonded to the first alloy layer 21 and has a large hardness, such as a nickel-chromium carbon (Ni-Gr-C) alloy, and a nickel-chromium nitride (Ni-Gr). -N) alloy, preferably, the second alloy layer 22 is a nickel chromium carbon nitrogen (Ni-Gr-CN) alloy layer. The chromium in the nickel-chromium carbon-nitrogen alloy layer is easily synthesized with carbon or nitrogen to form a hard chromium carbide or chromium nitride phase, and the nickel in the nickel-chromium carbon-nitrogen alloy layer is mainly used to improve the second alloy layer 22 and the first The bonding ability of the alloy layer 21. The thickness of the nickel-chromium carbon-nitrogen alloy layer is not limited and may be set according to practical applications. Typically, the nichrome layer has a thickness between 100 nanometers and 3000 nanometers. The content of nickel, chromium, carbon and nitrogen in the nickel-chromium carbon-nitrogen alloy is not limited and may be set according to practical applications. Specifically, the carbon element The mass percentage is between 1% and 50%, the nitrogen content is between 1% and 50% by mass, and the total mass percentage of the carbon nitrogen is from 1% to 90%. between. In this embodiment, when the mass percentage of the nickel element in the nickel-chromium carbon-nitrogen alloy is approximately 62%, the mass percentage of the chromium element is approximately 16%, and the mass percentage of the carbon element is approximately 12%. When the mass percentage of % and nitrogen element is approximately 10%, the second alloy layer 22 has better bonding properties and greater hardness with the first alloy layer 21 and the modified layer.
形成所述第一合金層21與第二合金層22之材料並不限於鎳鉻,還可為其他兩種或者兩種以上之過渡金屬組成之合金,只要滿足第一合金層21中之過渡金屬與第二合金層22中之過渡金屬至少有兩種相同以增加第一合金層21與第二合金層22之親和性,且其中一種過渡金屬與基體10具有良好之結合能力如鎳或鈀等,其中一種過渡金屬能夠與非金屬元素如碳氮形成硬質相如鉻、鎢等以增加第二合金層22之硬度。所述過渡金屬還可為銠(rhodium)、鈷(cobalt)、錳(cobalt)、鈦(titanium)、鎘(cadmium)或鋯(zirconium)等。 The material forming the first alloy layer 21 and the second alloy layer 22 is not limited to nickel chromium, and may be an alloy of two or more other transition metals as long as the transition metal in the first alloy layer 21 is satisfied. At least two of the transition metals in the second alloy layer 22 are identical to increase the affinity of the first alloy layer 21 and the second alloy layer 22, and one of the transition metals has a good bonding ability with the substrate 10 such as nickel or palladium. One of the transition metals is capable of forming a hard phase such as chromium, tungsten or the like with a non-metal element such as carbon nitrogen to increase the hardness of the second alloy layer 22. The transition metal may also be rhodium, cobalt, cobalt, titanium, cadmium or zirconium.
所述修飾層設置在第二合金層22遠離所述基體10之表面以使所述表面強化基體100得到想要之表面顏色,如該修飾層可為油漆、有機層等。在本實施例中,所述修飾層本身還具有較大之硬度,能提高所述強化膜20之抗磨損性能。製備所述修飾層之材料可為鉻化合物、鎢化合物等,所述鉻化合物包括氮化鉻、碳化鉻或氮化鉻與碳化鉻之組合。可理解,由於所述第二合金層22已能達到保護所述基體10之目之,因此所 述修飾層為根據實際需要可選或者可不選。 The modifying layer is disposed on a surface of the second alloy layer 22 away from the substrate 10 to give the surface strengthening substrate 100 a desired surface color, such as a paint, an organic layer, or the like. In the present embodiment, the modified layer itself has a large hardness and can improve the abrasion resistance of the reinforced film 20. The material for preparing the modified layer may be a chromium compound, a tungsten compound or the like, and the chromium compound includes chromium nitride, chromium carbide or a combination of chromium nitride and chromium carbide. It can be understood that since the second alloy layer 22 can achieve the purpose of protecting the substrate 10, The modification layer is optional or not selected according to actual needs.
所述強化膜20中之第一合金層21(鎳鉻合金層)不僅具有良好之化學穩定性還與基體10及第二合金層22(鎳鉻碳氮合金層)具有相近之熱膨脹係數,因此在所述表面強化基體100受熱時,能夠有效緩解強化膜20受力時之內部應力變化,從而提高強化膜20與基體10之間之結合力及提高基體10之耐磨性。請參見圖2,為本實施例中之表面強化基體100在截面不同位置元素含量之變化曲線圖。從圖中可看出,各個元素在各個區域之過渡較為平穩,從而有效提高了該強化膜20與基體10之間之附著力。 The first alloy layer 21 (nickel-chromium alloy layer) in the reinforcing film 20 not only has good chemical stability but also has a thermal expansion coefficient similar to that of the substrate 10 and the second alloy layer 22 (nickel-chromium carbon-nitrogen alloy layer), When the surface-strengthening substrate 100 is heated, the internal stress change when the reinforcing film 20 is stressed can be effectively alleviated, thereby improving the bonding force between the reinforcing film 20 and the substrate 10 and improving the wear resistance of the substrate 10. Please refer to FIG. 2 , which is a graph showing the variation of the element content of the surface strengthening substrate 100 at different positions in the cross section in the embodiment. As can be seen from the figure, the transition of each element in each region is relatively stable, thereby effectively improving the adhesion between the reinforced film 20 and the substrate 10.
需要指出之是,雖然所述強化膜20為多層結構,但由於各層之厚度一般較小,各種元素相互滲透。因此,從圖2中看出鎳鉻合金層與鎳鉻碳氮合金層並沒有嚴格按照厚度來分佈,即鎳鉻合金層與鎳鉻碳氮合金層並沒有嚴格意義上之分界線。因此,僅由鎳鉻合金層與鎳鉻碳氮合金層組成之強化膜20之也可整體上看作為一鎳鉻合金膜。該強化膜20遠離所述基體10之一側鎳鉻合金材料含量較多,從而與基體10具有較好之親和力。該強化膜20遠離所述基體10之一側包碳氮元素逐漸增多,碳氮元素可與鎳鉻合金形成硬質相從而該使得該強化膜20遠離所述基體10之一側具有較大硬度。 It is to be noted that although the reinforcing film 20 has a multilayer structure, since the thickness of each layer is generally small, various elements penetrate each other. Therefore, it can be seen from Fig. 2 that the nickel-chromium alloy layer and the nickel-chromium carbon-nitrogen alloy layer are not strictly distributed according to the thickness, that is, the nickel-chromium alloy layer and the nickel-chromium carbon-nitrogen alloy layer do not have a strict boundary. Therefore, the reinforcing film 20 composed only of the nickel-chromium alloy layer and the nickel-chromium carbon-nitrogen alloy layer can also be regarded as a nickel-chromium alloy film as a whole. The reinforced film 20 has a large content of nickel-chromium alloy material away from one side of the substrate 10, and thus has a good affinity with the substrate 10. The reinforcing film 20 is gradually increased in carbon-nitrogen content away from one side of the substrate 10. The carbon-nitrogen element can form a hard phase with the nickel-chromium alloy, so that the reinforcing film 20 has a large hardness away from one side of the substrate 10.
本發明實施例還提供一種表面強化基體100之製備方法,具體包括如下步驟:步驟S10,提供一基體10;以及步驟S20,在該基體10之一表面通過濺鍍之方式依次形成一第一合金層 21與一第二合金層22,所述第一合金層21包括兩種過渡金屬,所述第二合金層22包括所述兩種過渡金屬與碳氮元素。在本實施例中,所述第一合金層21為鎳鉻合金層,所述第二合金層22為鎳鉻碳氮合金層。 The embodiment of the present invention further provides a method for preparing the surface strengthening substrate 100, which specifically includes the following steps: Step S10, providing a substrate 10; and Step S20, sequentially forming a first alloy on one surface of the substrate 10 by sputtering. Floor 21 and a second alloy layer 22 comprising two transition metals, the second alloy layer 22 comprising the two transition metals and carbon and nitrogen elements. In this embodiment, the first alloy layer 21 is a nickel-chromium alloy layer, and the second alloy layer 22 is a nickel-chromium carbon-nitrogen alloy layer.
在步驟S10中,所述基體10在其表面形成鎳鉻合金層及鎳鉻碳氮合金層前還包括如下步驟S11,將該基體10進行表面化學超聲波清洗;步驟S12,將該基體10放入真空環境中,用稀有氣體對該基體10進行離子清洗。 In step S10, the substrate 10 further includes the following step S11 before the nickel-chromium alloy layer and the nickel-chromium carbon-nitrogen alloy layer are formed on the surface thereof, and the substrate 10 is subjected to surface chemical ultrasonic cleaning; in step S12, the substrate 10 is placed. The substrate 10 is ion-cleaned with a rare gas in a vacuum environment.
在步驟S11中,清洗該基體10之溶劑可為丙酮、無水乙醇等有機溶劑。在步驟S12中,所述基體10可放入具有真空環境之真空金屬濺鍍機中,保持真空度在3.0×10-5托左右,使用高純氬氣轟擊該基體3到10分鐘。 In step S11, the solvent for cleaning the substrate 10 may be an organic solvent such as acetone or absolute ethanol. In step S12, the substrate 10 can be placed in a vacuum metal sputtering machine having a vacuum environment, maintaining a vacuum of about 3.0 x 10 -5 Torr, and bombarding the substrate with high purity argon for 3 to 10 minutes.
在步驟S20中,所述基體10之溫度控制在100攝氏度到200攝氏度之間以使所述鎳鉻合金層及鎳鉻碳氮合金層與基體10緊密結合。在所述步驟S20中,所述鎳鉻合金層及鎳鉻碳氮合金層之形成方法進一步包括如下步驟:步驟S21,提供一磁控濺射鎳鉻合金靶;步驟S22,開啟該磁控濺射鎳鉻合金靶對該基體10表面進行濺鍍;以及步驟S23,在該基體10表面通入含氮氣體與含碳氣體。 In step S20, the temperature of the substrate 10 is controlled between 100 degrees Celsius and 200 degrees Celsius to tightly bond the nickel-chromium alloy layer and the nickel-chromium carbonitride alloy layer to the substrate 10. In the step S20, the method for forming the nichrome layer and the nichrome carbonitride layer further includes the following steps: step S21, providing a magnetron sputtered nichrome target; and step S22, turning on the magnetron splash The surface of the substrate 10 is sputtered by a nickel-chromium alloy target; and in step S23, a nitrogen-containing gas and a carbon-containing gas are introduced into the surface of the substrate 10.
在步驟S21中,所述鎳鉻合金靶中鎳之質量百分含量在20%到 80%之間。 In step S21, the mass percentage of nickel in the nichrome target is 20% to Between 80%.
在步驟S22中,所述真空金屬濺鍍機之偏壓設置在-100伏特到-300伏特之間,當開啟所述磁控濺射鎳鉻合金靶濺鍍20分鐘到60分鐘時,所述基體10表面形成有一層100奈米到3000奈米之間之鎳鉻合金層。 In step S22, the bias voltage of the vacuum metal sputtering machine is set between -100 volts and -300 volts, when the magnetron sputtering nichrome target sputtering is turned on for 20 minutes to 60 minutes, A nickel-chromium alloy layer of between 100 nm and 3000 nm is formed on the surface of the substrate 10.
在步驟S23中,所述含氮氣體為氮氣或氨氣,所述含碳氣體為乙炔或甲烷。當所述含氮氣體與含碳氣體通入到所述基體10表面時,所述鎳鉻元素依然從所述鎳鉻合金靶濺射出來。而從所述鎳鉻合金靶濺鍍出來之鎳、鉻與含氮氣體與含碳氣體反應,而在所述鎳鉻合金層上再形成鎳鉻碳氮合金層。即通入含氮氣體與含碳氣體後,新形成之鎳鉻合金層中摻雜有碳氮元素。 In step S23, the nitrogen-containing gas is nitrogen or ammonia, and the carbon-containing gas is acetylene or methane. When the nitrogen-containing gas and the carbon-containing gas are introduced to the surface of the substrate 10, the nickel-chromium element is still sputtered from the nickel-chromium alloy target. The nickel, chromium and nitrogen-containing gas sputtered from the nichrome target react with the carbon-containing gas to form a nickel-chromium carbon-nitrogen alloy layer on the nichrome layer. That is, after the nitrogen-containing gas and the carbon-containing gas are introduced, the newly formed nickel-chromium alloy layer is doped with carbon and nitrogen elements.
所述表面強化基體100之製備方法在步驟S20後還可包括一步驟S30:在該鎳鉻碳氮合金層表面形成一鉻化合物層。所述鉻化合物層之形成方法與S20之原理基本相同,通過開啟一磁控濺射純鉻靶,同時通入所需氣體,鎳鉻碳氮合金層表面形成一鉻化合物層。所述氣體根據實際需要選擇,譬如,如果需要形成碳化鉻層,則選擇乙炔,甲烷等含碳氣體,如果需要形成氮化鉻層,則選擇氮氣、氨氣等含氮氣體。 The method for preparing the surface strengthening substrate 100 may further include a step S30 after the step S20: forming a chromium compound layer on the surface of the nickel-chromium carbonitride layer. The method for forming the chromium compound layer is basically the same as the principle of S20. A chromium compound layer is formed on the surface of the nickel-chromium carbon-nitrogen alloy layer by opening a magnetron sputtering pure chromium target while introducing a desired gas. The gas is selected according to actual needs. For example, if a chromium carbide layer is to be formed, a carbonaceous gas such as acetylene or methane is selected, and if a chromium nitride layer is to be formed, a nitrogen-containing gas such as nitrogen or ammonia is selected.
所述表面強化基體100之製備方法中,所述強化膜20通過濺鍍之方式即可形成,不需要化學沈積等複雜之化學方法,工藝簡單,易於操作,切對基體10表面之形貌也沒有特殊要求 。 In the method for preparing the surface strengthening substrate 100, the reinforcing film 20 can be formed by sputtering, and does not require complicated chemical methods such as chemical deposition, and the process is simple and easy to operate, and the surface of the substrate 10 is also cut. No special requirements .
綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟,以上所述者僅為本發明之較佳實施例,自不能以此限制本案之申請專利範圍。舉凡習知本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by those skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
100‧‧‧表面強化基體 100‧‧‧Surface-strengthened matrix
10‧‧‧基體 10‧‧‧ base
20‧‧‧強化膜 20‧‧‧ Strengthening film
21‧‧‧第一合金層 21‧‧‧First alloy layer
22‧‧‧第二合金層 22‧‧‧Second alloy layer
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TW200831695A (en) * | 2006-11-01 | 2008-08-01 | Asm Inc | Vapor deposition of metal carbide films |
TW200925310A (en) * | 2007-08-13 | 2009-06-16 | Honeywell Int Inc | Target designs and related methods for coupled target assemblies, methods of production and uses thereof |
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