TWI398621B - Position rectifying device - Google Patents

Position rectifying device Download PDF

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TWI398621B
TWI398621B TW97103940A TW97103940A TWI398621B TW I398621 B TWI398621 B TW I398621B TW 97103940 A TW97103940 A TW 97103940A TW 97103940 A TW97103940 A TW 97103940A TW I398621 B TWI398621 B TW I398621B
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workpiece
module
sensor module
platform
voltage frequency
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TW97103940A
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Chinese (zh)
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TW200935029A (en
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Ching Cheng Yang
Wen Chih Chiu
Shou Ming Liang
Yaw Shen Lai
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Foxnum Technology Co Ltd
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Description

位置校正裝置Position correction device

本發明係關於一種位置校正裝置,特別係關於一種用於電腦數控系統中加工工件之位置校正裝置。The present invention relates to a position correcting device, and more particularly to a position correcting device for machining a workpiece in a computer numerical control system.

目前,在電腦數控系統之模具加工製程中,首先要進行之程式係將工件放在加工平台之上,亦即校模。習知之校模方式係先將一塊規平行放置於虎鉗上,再將工件放置於塊規上,之後在虎鉗兩側擺放軟性材料金屬墊片,最後上緊虎鉗,然,在挾緊工件之過程中,由於虎鉗以及工件貼合面並非完全平行,故上緊後工件會些許傾斜,此時須用榔頭進行輕微敲打,一方面係讓虎鉗挾緊工件,另一方面則係讓工件保持一定水平面,以利於加工,其判斷工件表面水平與否之方式則係由塊規之鬆緊程度來進行判斷,如是,不僅費時且水平度也不易測量。又,習知之挾持方式在加工製程中也無法監控加工時工件所受之徑向壓力,如圖1所示,一工件2置於一塊規3上,在切刀1對工件2進行切割之過程中,過大之徑向壓力易造成工件2翹曲,最後導致工件2被加工變形。At present, in the mold processing process of the computer numerical control system, the first program to be carried out is to place the workpiece on the processing platform, that is, the calibration mold. The conventional model is to place a piece of gauge on the vise in parallel, then place the workpiece on the block gauge, then place the soft material metal gasket on both sides of the vise, and finally tighten the vise. During the process of tightening the workpiece, since the vise and the surface of the workpiece are not completely parallel, the workpiece will be slightly inclined after tightening. At this time, the hammer should be used for slight tapping. On the one hand, the vise will tighten the workpiece, on the other hand, The workpiece is kept at a certain level to facilitate processing. The way to judge whether the surface level of the workpiece is normal or not is judged by the tightness of the block gauge. If it is not only time-consuming and horizontal, it is not easy to measure. Moreover, the conventional holding method cannot monitor the radial pressure of the workpiece during processing, as shown in FIG. 1, a workpiece 2 is placed on a gauge 3, and the cutter 1 is cut to the workpiece 2. In the middle, the excessive radial pressure tends to cause the workpiece 2 to warp, and finally the workpiece 2 is deformed by machining.

鑒於以上內容,有必要提供一種能判斷工件表面水平與否並能進行工件表面水平度調整之位置校正裝置。In view of the above, it is necessary to provide a position correcting device capable of judging whether the surface of the workpiece is horizontal or not and capable of adjusting the level of the surface of the workpiece.

一種位置校正裝置,其包括一用來放置所要加工之工件之測量平台;一設置於該測量平台上之感測器模塊,用於感測該測量平台上不同位置之壓力並將其轉化為電壓頻率訊號;一與該感測器模塊之輸出端相連之放大器模塊,用於將該感測器模塊輸出之電壓頻率訊號放大;一與該放大器模塊之輸出端相連之單晶片模塊,用於接收放大後之電壓頻率訊號,當該單晶片模塊收到並判定該感測器模塊傳送來之各個位置之電壓頻率訊號不等時,則調整一與該單晶片模塊之輸出端相連之工具機之加工參數。A position correcting device comprising a measuring platform for placing a workpiece to be processed; a sensor module disposed on the measuring platform for sensing pressure at different positions on the measuring platform and converting the voltage into a voltage a frequency signal; an amplifier module connected to the output of the sensor module for amplifying the voltage frequency signal outputted by the sensor module; and a single chip module connected to the output end of the amplifier module for receiving The amplified voltage frequency signal, when the single chip module receives and determines that the voltage frequency signals of the respective locations transmitted by the sensor module are not equal, adjusting a machine tool connected to the output end of the single chip module Processing parameters.

該位置校正裝置透過一感測器模塊來取樣測量平台上各個位置之受力情況,並透過一放大器模塊將其訊號放大並傳送給一單晶片模塊,該單晶片模塊在該測量平台上各個位置之受力情況不同時調整一與其輸出端相連之工具機之加工參數,使該工具機之加工速度和切削力減小,從而使該工件加工表面保持水平。The position correcting device samples the force of each position on the measuring platform through a sensor module, and amplifies and transmits the signal to a single chip module through an amplifier module, and the single chip module is in various positions on the measuring platform. When the force is different, the machining parameters of the machine tool connected to the output end thereof are adjusted, so that the machining speed and the cutting force of the machine tool are reduced, so that the machining surface of the workpiece is kept horizontal.

請參閱圖2,本發明位置校正裝置之較佳實施方式包括一測量平台100、一感測器模塊200、一放大器模塊300、一單晶片模塊400及一工具機500,用來對一工件600之位置進行校正。Referring to FIG. 2, a preferred embodiment of the position correction device of the present invention includes a measurement platform 100, a sensor module 200, an amplifier module 300, a single wafer module 400, and a machine tool 500 for working on a workpiece 600. The position is corrected.

該測量平台100為一分佈均勻之正方形平台,用於放置該工件600,該工件600放置於該測量平台100上表面之中央位置,以保證該測量平台100各個方向受力均勻。The measuring platform 100 is a uniformly distributed square platform for placing the workpiece 600. The workpiece 600 is placed at a central position on the upper surface of the measuring platform 100 to ensure uniform force in all directions of the measuring platform 100.

該感測器模塊200包括四個壓力感測器S1、S2、S3、S4,該等壓力感測器S1、S2、S3、S4均勻分佈於該測量平台100之四個角上,用於感測該測量平台100之四個角上之受力情況並將其轉化為電壓頻率訊號輸出。The sensor module 200 includes four pressure sensors S1, S2, S3, and S4, and the pressure sensors S1, S2, S3, and S4 are evenly distributed on the four corners of the measuring platform 100 for sensing. The force on the four corners of the measuring platform 100 is measured and converted into a voltage frequency signal output.

該放大器模塊300包括四個放大器L1、L2、L3、L4,該等放大器L1、L2、L3、L4之輸入端分別與該等壓力感測器S1、S2、S3、S4之輸出端相連,用於將該感測器模塊200輸出之電壓頻率信號放大。The amplifier module 300 includes four amplifiers L1, L2, L3, and L4, and the input terminals of the amplifiers L1, L2, L3, and L4 are respectively connected to the output ends of the pressure sensors S1, S2, S3, and S4. The voltage frequency signal output by the sensor module 200 is amplified.

該單晶片模塊400採用一型號為8051之單晶片,該單晶片模塊400之輸入端與該等放大器L1、L2、L3、L4之輸出端相連,該單晶片模塊400接收放大後之電壓頻率訊號並對各個電壓頻率訊號進行比較,根據比較結果自動調整該工具機500之加工參數並傳送給該工具機500。The single-chip module 400 is connected to an output of the amplifiers L1, L2, L3, and L4, and the single-chip module 400 receives the amplified voltage and frequency signals. The voltage frequency signals are compared, and the processing parameters of the power tool 500 are automatically adjusted according to the comparison result and transmitted to the machine tool 500.

在該工件600被加工之前,將其放置於該測量平台100之上,並用一固定裝置如虎鉗將其固定,該工件600由於被挟緊可能會有些許傾斜,此時該測量平台100之四個角上之受力情況不一樣,該放大器模塊300輸出之四個電壓不一致,則可用一榔頭輕微敲打進行校正。Before the workpiece 600 is processed, it is placed on the measuring platform 100 and fixed by a fixing device such as a vise. The workpiece 600 may be slightly tilted due to being tightened. At this time, the measuring platform 100 is four. The force on the corners is different. If the four voltages output by the amplifier module 300 are inconsistent, it can be corrected by a slight tap on the hammer.

在該工件600被加工之過程中,由於受到一徑向之加工壓力,也有可能會發生傾斜。該等壓力感測器S1、S2、S3、S4靈敏度極高,在該測量平台100之四個角上之受力情況稍有不同時即可感測到,並透過該單晶片模塊400即時調整該工具機500之加工參數,以即時調整工件表面水平度。During the processing of the workpiece 600, tilting may occur due to a radial processing pressure. The pressure sensors S1, S2, S3, and S4 are extremely sensitive, and can be sensed when the force on the four corners of the measuring platform 100 is slightly different, and are instantly adjusted through the single chip module 400. The machining parameters of the machine tool 500 are used to instantly adjust the surface level of the workpiece.

在加工前,該單晶片模塊400存儲該工具機500對該工件600加工之原始參數。在加工過程中,該等壓力感測器S1、S2、S3、S4不斷對該測量平台100之四個角上之壓力進行取樣並透過該放大器模塊300將其放大後傳送給該單晶片模塊400。當該單晶片模塊400進行電壓比較後得到四個電壓大小一致時,表示該測量平台100之四個角上受力情況一樣,該工件600之加工表面水平,則該工具機500繼續以原來之加工速度和切削力對該工件600進行加工;若加工過程中該工具機500之切刀進刀速度太快,致使該工件600受到之徑向壓力過大,該等壓力感測器S1、S2、S3、S4感測到之壓力不同,當該單晶片模塊400進行電壓比較後確認四個電壓大小不一致時,例如當該放大器L1、L2之輸出電壓不等於該放大器L3、L4之輸出電壓,則表示該工件600可能要發生傾斜,此時該單晶片模塊400自動調整該工具機500之加工參數,即減小該工具機500之加工速度和切削力使該工件600受到之徑向壓力變小,直到該放大器L1、L2之輸出電壓等於該放大器L3、L4之輸出電壓,從而保持該工件600之加工表面水平。The single wafer module 400 stores the raw parameters of the tooling machine 500 for processing the workpiece 600 prior to processing. During the processing, the pressure sensors S1, S2, S3, and S4 continuously sample the pressures at the four corners of the measurement platform 100 and amplify them through the amplifier module 300 and transmit the same to the single wafer module 400. . When the voltage comparison of the single-wafer module 400 is performed to obtain the same four voltages, it means that the force is applied to the four corners of the measuring platform 100. When the processing surface of the workpiece 600 is horizontal, the machine tool 500 continues to be the original. The workpiece speed is processed by the machining speed and the cutting force; if the cutter feed speed of the machine tool 500 is too fast during the machining process, the workpiece 600 is subjected to excessive radial pressure, and the pressure sensors S1 and S2 are excessively pressed. The pressures sensed by S3 and S4 are different. When the voltage comparison of the single-chip module 400 confirms that the four voltages are inconsistent, for example, when the output voltages of the amplifiers L1 and L2 are not equal to the output voltages of the amplifiers L3 and L4, It is indicated that the workpiece 600 may be tilted. At this time, the single-wafer module 400 automatically adjusts the processing parameters of the machine tool 500, that is, the processing speed and the cutting force of the machine tool 500 are reduced to reduce the radial pressure of the workpiece 600. Until the output voltages of the amplifiers L1, L2 are equal to the output voltages of the amplifiers L3, L4, thereby maintaining the processed surface level of the workpiece 600.

綜上所述,本發明符合發明專利要件,爰依法提出專利申請。惟,以上所述者僅為本發明之較佳實施方式,舉凡熟悉本案技藝之人士,在爰依本發明精神所作之等效修飾或變化,皆應涵蓋於以下之申請專利範圍內。In summary, the present invention complies with the requirements of the invention patent and submits a patent application according to law. The above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be included in the following claims.

測量平台...100Measuring platform. . . 100

感測器模塊...200Sensor module. . . 200

壓力感測器...S1、S2、S3、S4Pressure sensor. . . S1, S2, S3, S4

放大器模塊...300Amplifier module. . . 300

放大器...L1、L2、L3、L4Amplifier. . . L1, L2, L3, L4

單晶片模塊...400Single chip module. . . 400

工具機...500Machine tool. . . 500

工件...600Workpiece. . . 600

圖1係習知技術中工件發生翹曲之狀態示意圖。Fig. 1 is a schematic view showing a state in which a workpiece is warped in the prior art.

圖2係本發明位置校正裝置之較佳實施方式之方框圖。Figure 2 is a block diagram of a preferred embodiment of the position correcting device of the present invention.

測量平台...100Measuring platform. . . 100

感測器模塊...200Sensor module. . . 200

壓力感測器...S1、S2、S3、S4Pressure sensor. . . S1, S2, S3, S4

放大器模塊...300Amplifier module. . . 300

放大器...L1、L2、L3、L4Amplifier. . . L1, L2, L3, L4

單晶片模塊...400Single chip module. . . 400

工具機...500Machine tool. . . 500

工件...600Workpiece. . . 600

Claims (4)

一種位置校正裝置,其包括:一用來放置所要加工之工件之測量平台;一設置於該測量平台上之感測器模塊,用於感測該測量平台上不同位置之壓力並將其轉化為電壓頻率訊號;一與該感測器模塊之輸出端相連之放大器模塊,用於將該感測器模塊輸出之電壓頻率訊號放大;一與該放大器模塊之輸出端相連之單晶片模塊,用於接收放大後之電壓頻率訊號,當該單晶片模塊收到並判定該感測器模塊傳送來之各個位置之電壓頻率訊號不等時,則調整一與該單晶片模塊之輸出端相連之工具機之加工參數。A position correction device comprising: a measurement platform for placing a workpiece to be processed; a sensor module disposed on the measurement platform for sensing pressure at different positions on the measurement platform and converting it into a voltage frequency signal; an amplifier module connected to the output end of the sensor module for amplifying the voltage frequency signal outputted by the sensor module; and a single chip module connected to the output end of the amplifier module, Receiving the amplified voltage frequency signal, when the single chip module receives and determines that the voltage frequency signals of the respective locations transmitted by the sensor module are not equal, adjusting a power tool connected to the output end of the single chip module Processing parameters. 如申請專利範圍第1項所述之位置校正裝置,其中該測量平台為一分佈均勻之正方形平台。The position correcting device of claim 1, wherein the measuring platform is a uniformly distributed square platform. 如申請專利範圍第2項所述之位置校正裝置,其中該感測器模塊包括四個壓力感測器,該四個壓力感測器均勻分佈於該測量平台之四個角上。The position correcting device of claim 2, wherein the sensor module comprises four pressure sensors, the four pressure sensors being evenly distributed on the four corners of the measuring platform. 如申請專利範圍第3項所述之位置校正裝置,其中該放大器模塊包括四個放大器,該四個放大器之輸入端分別與該四個壓力感測器之輸出端相連。The position correcting device of claim 3, wherein the amplifier module comprises four amplifiers, and the input ends of the four amplifiers are respectively connected to the outputs of the four pressure sensors.
TW97103940A 2008-02-01 2008-02-01 Position rectifying device TWI398621B (en)

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Citations (5)

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Publication number Priority date Publication date Assignee Title
US5008602A (en) * 1989-05-19 1991-04-16 Hughes Aircraft Company Signal generator for use in industrial positioning systems
TW416904B (en) * 1997-12-01 2001-01-01 Giddings & Lewis System and method for improving the dynamic acccuracy of a hexapod positioning device
CN2432547Y (en) * 2000-08-03 2001-05-30 中国科学院合肥智能机械研究所 Electronic level meter
CN1114016C (en) * 1999-02-10 2003-07-09 弗兰茨普拉塞铁路机械工业股份有限公司 Track position correcting method
TWI232923B (en) * 2003-12-31 2005-05-21 Univ Nat Formosa Optical real-time measurement method and system with single-axis, 6 degrees of freedom

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5008602A (en) * 1989-05-19 1991-04-16 Hughes Aircraft Company Signal generator for use in industrial positioning systems
TW416904B (en) * 1997-12-01 2001-01-01 Giddings & Lewis System and method for improving the dynamic acccuracy of a hexapod positioning device
CN1114016C (en) * 1999-02-10 2003-07-09 弗兰茨普拉塞铁路机械工业股份有限公司 Track position correcting method
CN2432547Y (en) * 2000-08-03 2001-05-30 中国科学院合肥智能机械研究所 Electronic level meter
TWI232923B (en) * 2003-12-31 2005-05-21 Univ Nat Formosa Optical real-time measurement method and system with single-axis, 6 degrees of freedom

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