TWI380099B - Method of forming a display panel - Google Patents

Method of forming a display panel Download PDF

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TWI380099B
TWI380099B TW98126058A TW98126058A TWI380099B TW I380099 B TWI380099 B TW I380099B TW 98126058 A TW98126058 A TW 98126058A TW 98126058 A TW98126058 A TW 98126058A TW I380099 B TWI380099 B TW I380099B
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Taiwan
Prior art keywords
alignment film
substrate
treatment
film material
alignment
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TW98126058A
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Chinese (zh)
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TW201106068A (en
Inventor
Hsing Ta Chen
Chih Ho Chiu
Te Sheng Chen
Wei Te Lee
Shan Chun Chang
Shih Ming Chen
Hsi Chien Lin
Chung Ching Hsieh
Chia Hsuan Pai
Yuan Hung Tung
Chang Feng You
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Au Optronics Corp
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Priority to TW98126058A priority Critical patent/TWI380099B/en
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Publication of TWI380099B publication Critical patent/TWI380099B/en

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1380099 六、發明說明: 【發明所屬之技術領域】 本發明係關於一種製作顯示面板之方法,尤指一種對配向膜材 料進行紫外光處理或電漿處理’以鈍化可交聯污染物之製作顯示面 板之方法。 【先前技術】 液晶顯示器係利用液晶分子在不同排列狀態下,對光線具有不 同的穿透量來控制顯示畫素的亮度或色彩,進而使液晶顯示器得以 產生豐富的影像。因此,液晶顯示器中通常具有配向膜,用以讓鄰 近配向膜之液晶分子產生特定配向方向,以便調控晝素内之液晶傾 倒方向。傳統的配向方法主要可區分為配向膜材料塗布或形成以及 配向處理兩個階段,其中配向膜之材質通常以聚亞醯胺 (polyamide,PI)為主,在聚亞醯胺塗布於基板後,再進行配向處 理。 針對配向膜材料塗布處理階段,若使用傳統的印刷式塗布處理 中,轉印輥(printingroller)表面通常會具有一層光阻層,以作為轉印 之用為了維持良好之印刷效果,轉印輥表面之光阻層通常不會達 到疋全父聯的程度,但這些未完全交聯之光阻可能會隨著印刷製程 4 丄38Q099 併轉印至基紅’導致污染。即使進行清洗 污染物仍不衫全雜。 — 針對配向處理驗,傳統的刷磨式(rubbing)配向處理係以附 有織毛刷·輪對聚碰魏行·,使聚亞轉之高分子主鏈合 延伸而順向排列,達到液晶配向排列的目的。刷磨式配向處理的優 點為^磨所需之操作_極短,且在常溫下即可操作因此具有優 •異之量產特性’然而,傳統的配向方法仍有其缺點,舉例來說,誠 ^刷上無可避躺在製程中會_污餘子,間接將此些污染粒子 帶到聚亞醯胺上,造成液晶顯示器顯像產生亮暗不均(mura)。 即使進行_觸式之配向處理,例如光配向⑽伽响職世)、 離子束配向(ion beam alignment)、電漿束配向(plasma beam alignment) 等處理,可以減少滾輪接觸配向膜之機會,但是這些非接觸式配向 #處理仍無法避免塗布製程將可》污染物摻雜到配向膜材料的可 能,且環境中還可能有污染物掉落或接觸至配向膜中。 請參考第1圖至第3圖,第i圖至第3圖為習知製作顯示面板 的方法示意圖。如第1圖所示,首先提供第一基板1〇,接著於第一 基板10之内表面上形成一層配向膜12,且配向膜12中摻雜了污染 物14。其中,污染物14可能是隨著印刷式塗布處理製程一併轉印 至第一基板10上之可交聯污染物’也可能是利用其他方式掉落至配 向膜中之污染物。 5 1380099 如第2圖所示,之後於第一基板1〇上滴加液晶材料16,再利 用第3圖所示之步驟進行組裝(assembly),以組合第一基板與 第二基板18。其中,第二基板18之内表面上亦可先行形成一層配 向膜20,且配向膜20亦可能摻雜了污染物14 ^如第3圖所示,位 於配向膜12與配向膜2〇表面之污染物14會受到液晶材料16之張 力影響,因此污染物14容易聚集在液晶材料16之各個小滴的交界 處’而導致免暗不勻現象(muraeffect)。 尤其當應用至高分子聚合配向(p〇lymerstabilizedaiig_nt, PSA)製程時’軸制PSA製程之顯示硫可以進行非接觸式配1380099 VI. Description of the Invention: [Technical Field] The present invention relates to a method for fabricating a display panel, and more particularly to a method for performing ultraviolet light treatment or plasma treatment on an alignment film material to passivate crosslinkable contaminants. The method of the panel. [Prior Art] A liquid crystal display uses a liquid crystal molecule to have different penetration amounts of light to control the brightness or color of a display pixel in different arrangement states, thereby enabling a liquid crystal display to generate a rich image. Therefore, liquid crystal displays usually have an alignment film for causing a liquid crystal molecule adjacent to the alignment film to have a specific alignment direction for regulating the liquid crystal tilting direction in the pixel. The conventional alignment method can be mainly divided into two stages of coating or forming and aligning treatment of the alignment film material, wherein the material of the alignment film is usually made of polyamine (PI), after the polyimide is coated on the substrate, Then the alignment process is performed. For the coating process of the alignment film material, if a conventional printing coating process is used, the surface of the printing roller usually has a photoresist layer for transfer to maintain a good printing effect, the surface of the transfer roller The photoresist layer usually does not reach the level of the full parent, but these photoresists that are not fully crosslinked may be contaminated with the printing process 4 丄 38Q099 and transferred to the base red'. Even if the cleaning is done, the contaminants are still uncomfortable. - For the alignment treatment, the traditional rubbing alignment treatment is equipped with a woven brush and a wheel pair to collide with Wei Xing, so that the polymer chain of the poly-sub-transfer is extended and aligned to achieve liquid crystal alignment. The purpose of the arrangement. The advantage of the brush-type alignment treatment is that the operation required for grinding is extremely short, and it can be operated at normal temperature, so that it has excellent mass production characteristics. However, the conventional alignment method still has its disadvantages, for example, Cheng ^ brush on the inevitable lying in the process will be _ filth, indirectly to bring some of the contaminated particles to the polyamine, causing the liquid crystal display to produce bright and dark (mura). Even if the aligning treatment, such as light alignment (10), ion beam alignment, plasma beam alignment, etc., can reduce the chance of the roller contacting the alignment film, but These non-contact alignment treatments still cannot avoid the possibility that the coating process will dope the contaminant to the alignment film material, and there may also be contaminants falling or contacting the alignment film in the environment. Please refer to FIG. 1 to FIG. 3 , and FIG. 3 to FIG. 3 are schematic diagrams of a conventional method for manufacturing a display panel. As shown in Fig. 1, a first substrate 1 is first provided, then an alignment film 12 is formed on the inner surface of the first substrate 10, and the alignment film 12 is doped with the contaminant 14. Among them, the contaminant 14 may be a cross-linkable contaminant that is transferred to the first substrate 10 along with the printing coating process, and may also be a contaminant that is otherwise dropped into the alignment film. 5 1380099 As shown in Fig. 2, the liquid crystal material 16 is then dropped on the first substrate 1A, and then assembled by the steps shown in Fig. 3 to combine the first substrate and the second substrate 18. The alignment film 20 may be formed on the inner surface of the second substrate 18, and the alignment film 20 may be doped with contaminants 14 as shown in FIG. 3, and located on the surface of the alignment film 12 and the alignment film 2 The contaminants 14 are affected by the tension of the liquid crystal material 16, so that the contaminants 14 tend to accumulate at the junction of the droplets of the liquid crystal material 16 to cause a mura effect. Especially when applied to the polymer polymerization alignment (p〇lymerstabilized aiig_nt, PSA) process, the display of sulfur in the shaft-forming PSA process can be carried out in a non-contact manner.

產生反應,導致明顯之亮暗不勻現象。A reaction occurs, resulting in significant light and dark unevenness.

暗不勻現象,仍為製作顯示面板之目前之重要課題。 有鑑於此, 【發明内容】 本發明之目的之一在於提供一 液晶顯示面板之配向膜,並解決箭 ;”種製物示面板之方法,以形成 並解決刖述習知問題。 ,為達上述目的,本發明之實施例提供—種製作顯示面板之方 法。首先,提供第—基板,接著於第—基板上塗布配向麟料。其 後’對配向赌料進行職烤製程。於麵烤製程之後對配向膜 材料進仃料歧理(UVtfeatment)或賴處理⑽_ treatment) ’以鈍化摻騎gi向膜材料巾之可交聯污染物。隨後,提 供第二基板,並於第-或第二基板上形成_,紐於第—與第二 基板之間形成液晶層,填充於框膠内。 由於本發明可於預烘烤製程之後,以及/或形成框膠之前,對配 向膜材料進行紫外光處理或電襞處理,以鈍化摻雜於配向膜材料中 之可交聯污染物,因此可有效減少可交聯污染物導致之亮暗不勻現 象0 【實施方式】 為使熟習本發明所屬技術領域之一般技藝者能更進一步了解本 發明,下文特列舉本發明之數個較佳實施例,並配合所附圖式,詳 細說明本發明的構成内容及所欲達成之功效。 請參考第4圖與第5圖’第4圖為本發明第一較佳實施例製作 顯示面板之方法的流程示意圖,而第5圖為根據本發明第一較佳實 施例所製作之顯示面板200的示意圖。圖式僅以說明為目的,並未 依照原尺寸作圖。 7 1380099 如第4圖與第5圖所示,第一較佳實施例製作顯示面板的流程 依序如下: 步驟102 :開始; 步驟104 :提供基板; 步驟106 ·配向前預清潔(prePI cleaner); 步驟108 :塗佈配向膜材料; 步驟110 .對配向膜材料進行預供烤製程(pre_bakeprocess); 步驟110a :對配向膜材料進行紫外光處理或電漿處理; 步驟112 .對配向膜材料進行後烘烤製程(post—baj^eprocess); 步驟114 ··進行基板接合前預清潔; 步驟115 :進行配向膜配向處理; 步驟 116 :形成框膠(sealdispensing); 步驟118 :形成液晶層(叫咖crystai dispensing ); 各步驟之詳細介紹如下。依照步驟1〇4,首先提供第5圖之第一 基板202。第-基板2〇2可以是具有彩色遽光片之彩色濾光片基板 (color filter substrate) ’而於内表面處可具有透明之共同電極2〇4。 於其他實施例中,第-基板2〇2也可以是具有薄膜電晶體之陣列基 板(array subs她),而於妹面處可具有晝素電極。之後可依照步 驟106 ’進行配向前預清潔步驟’使得第一基板2〇2可且有清絮之 表面,進而促進第-基板202與後續之配向膜的接合歡性,且減 少配向膜被污染之可能性。 1380099 接著依照步驟108 ’於第一基板202上塗佈配向膜材料,此時 配向膜材料係呈現未配向狀態。其中,配向膜材料可包含石夕氧 類(siloxanematerials)材料,例如聚醯胺酸(p〇iyamicacid,pAA) 或聚亞醯胺(polyimide,Π)之材料。或者於其他實施例中,配向 膜材料亦可包括氫化類鑽石排列碳薄膜(hydrogenateddiamQndUke carbon,DLC)、或碳石夕化合物(SiC)、氧石夕化物(si〇2)、氮石夕化物 # (Si3N4)、氧化鋁(Al2〇3)等材料。於第一基板202上塗布配向膜 材料之方法包括狹縫塗布娜⑺如吨^旋轉塗布細出⑺咖士非 旋轉塗布(spinless coating)、噴墨式(inkjet)塗布或滚動印刷式塗布 的方式所形成。這裡所謂之滾動印刷式塗布方式可以透過滾動之轉 印輞•將配向膜材料塗布於第一基板2〇2上。而這裡所謂之喷墨式塗 布方式可以先將配向膜材料填充於喷墨裝置(inkjetdevice)中並 且利用噴墨裝置之喷墨頭(inkjethead)直接將配向膜材料滴加於第 φ 基板2G2上。使用喷墨式塗布方式形成配向膜材料時,可以避免 轉印輥等工具接觸配向膜材料與第一基板2〇2的機會,因此對於減 少污染物之目的具有更好的效果。 然後依照步驟110,對配向臈材料進行預烘烤製程。其中,此 預烘烤製程之溫度範圍本質上為可介於50。0至150它之間、,並持續 進行約50秒至300秒,以去除配向膜材料所含之部分溶劑,但不只 會使配向膜材料完全硬化。 9 1380099 於預烘烤製程之後,依照步驟ll〇a對配向膜材料進行鈍化處 理&amp;assivate) ’譬如是紫外光處理(UV treatment)或電«處理(piasma treatment),以鈍化摻雜於配向膜材料中之可交聯污染物,所謂鈍化 係指將可交聯污染物或其他污染物使不易起化學或物理變化,或者 是將可交聯污染物或其他污染物裂解揮發,總而言之,避免污染物 影響到液晶顯示器之顯像品質。為了鈍化可交聯污染物,且同時不 會破壞或改變配向膜材料之特性,本發明之紫外光處理的紫外光強 度較佳應控制在大於每平方公分〇毫瓦(〇mW/cm2)且小於等於励 mW/cm2之範圍,能量強度較佳應控制在大於等於每平方公分3焦 耳(3J/Cm2)且小於等於30J/cm2之範圍,而波長範圍較佳應控制 在300奈米至450奈米之間。根據前述之製程參數,對配向膜材料 持續進行紫外歧理約_至1_秒即可有效鈍化可交聯污染物, 較佳係為15〇秒,但不限於此,只要對配向膜材料進行紫外光處理 PU純化可父聯污染物之效果,因此本發明之紫外光處理的紫 外光強度、能量強度與波長範圍亦不需偏限於前述數值。 右本發明是利用電襞處理來純化可交聯污染物時,為了純化可 交聯污染物,且不破壞配_材料之雜,本發明之電漿處理可包 含提供氬氣(卿η,Ar)作為惰性氣體,真空度較佳小於1〇·5托耳 (㈣’操作功率較佳約控制在1〇瓦⑽職)至刚喊s之間, 操作溫度較佳驗制在靴至骑得崎作時雜佳約控制 在5刀知至120分知之間。同樣地,只要對配向膜材料進行電漿處 理即可具祕化可觸㈣物之效果,因此本發明之電漿處理的惰 10 1380099 陡孔體種類、真空度、操作辨、操作溫度與操作時财需褐限於 於紫外光處理或電聚處理之後,依照步驟m對配向臈材料進 灯後烘烤製程(post-baldng),以使配向膜材咖化且硬化成為配向膜 214。。其+ ’此4之後轉縣之溫度細本f上為可條15〇£)(:至 3〇〇°C之間’並持續持續進行約_秒至麵〇秒後 之溫度範_祕為靴至·。c,麟麟_谢_秒至 刪二秒,但不限於此。後供烤製程可將配向膜材料中所含之聚醯胺 酸環化(imidization)成為聚亞醯胺薄膜。 接下來依照步驟114,提供第二基板2〇6,並對第一基板2〇2 與第二基板206進行基板接合前預清潔步驟。第二基板2〇6於内表 面處可具有畫素電極208與配向膜216,其中配向膜216較佳可以 是利用前述步驟102至步驟112所形成,但亦可利用其他方式所形 成。於本實施例中,第一基板2〇2為彩色遽光片基板,而第二基板 206可以為陣列基板,且第二基板2〇6於内表面處可具有畫素電極 208。當第一基板2〇2為陣列基板時,第二基板2〇6則可以為具有彩 色濾光片與共同電極之彩色濾光片基板。基板接合前預清潔步驟可 使第基板202與第一基板206均具有清潔之表面,進而促進第— 與第二基板202、206與後續之框膠的接合穩定性,且減少後續之液 晶層被污染之可能性。 1380099 然後依照步驟115,對配向膜進行配向處理,配向處理舉例為 刷磨式(rubbing)配向處理、光配向(photoalignment)處理、離子 束配向(ion beam alignment)處理或電漿束配向(piasma beam alignment)等處理。 其後依照步驟116,於第一基板202或第二基板206上形成框 膠218,並依照步驟於第一基板202與第二基板2〇6之間形成 液晶層212,填充於框膠118内。液晶層212可以是利用滴下式或 真空注入式的方式所形成。當使用滴下式的方式形成液晶層212 時’係先利用喷墨裝置將液晶材料滴落於設置有框膠118的基板 上,待達到所需液晶量之後,再使第二基板206相對應於第一基板 202而設置,進行熱壓而利用框膠218接合第一基板2〇2與第二基 板206。當使用真空注入式的方式形成液晶層212時,係先使第二 基板206相對應於第一基板202而設置,進行熱壓而利用框膠218 接合第一基板202與第二基板206,再利用真空的壓力將液晶材料 注入於框膠118内側的第一與第二基板202、206之間。 當本發明應用至PSA製程時,此處之液晶層212可包含液晶分 子與混合在液晶分子中的單體(monomer)。藉由施加電壓於液晶盒 (liquid crystal cell)中,使得混合在液晶中的單體隨著液晶分子在 電壓下排列,再經由照射紫外光等方式而交聯固化這些排列之單 體’以產生特定的預傾角(pre-tiltangle)。如此一來可以有效控制 液晶配向的能力,進而減少漏光現象且提升對比。由於本發明可有 12 1380099 效地利用料桃理或錄處轉鈍化處縣鈍切㈣污染物, 因此配向面之污雜較不會影響液晶材料中的可交體尤 其使用於那麵用PSA製程之縣面板。之後, 與第二基㈣進行基板切割製程,以形成本發明之顯爾板2〇〇。 如第4圖所示’除了前述之紫外光處理、電漿處理與喷墨式塗 布配向膜材料之步驟可以減少污染之外,本發明亦可選擇性包括步 =122之高溫加熱製程,進—步減少或鈍化基板上或配向膜中的污 木物。其巾’本伽之高溫加熱縣可·觀烤製程之後、形成 框谬之前的任兩個製程步驟之間進行,或是搭配職烤製程之後、 形成框膠之前的任何製程步驟一併進行。 根據研究之結果與實際之製錄況發現,本發明 或電聚處理可餅親烤抛之後、形成框膠之前的任兩個製程步 驟之間進4 ’而可以翻偏⑽於配向膜巾的污雜之效果。請參 考第6圖與第7圖,第6_第7圖分別為本發明第二與第三較佳 實施例製作顯示面板之方法的流程示意圖,其㈣同的步驟沿用相 同的符號來表示n較佳實施例之主要差別在於,第二與第三 較佳實施舰行料域理或電漿處理之製频序不同。 如第6圖所示’於第二較佳實施例令,紫外光處理或電漿處理 之^驟112a可以於後供烤製程之後、於進行基板接合前預清潔步驟 之前進行。如第7圖所示,於第三較佳實施例,紫外光處理或電漿 13 1380099 處理之步驟114a可以於進行基板接合前預清潔步驟之後、於形成框 膠之前進行。根據第二與第三較佳實施例亦可製作出第5圖所示之 顯示面板200。 根據本發明之實施態樣,本發明之不需侷限於僅對單一配向膜 材料或配向膜進行單次紫外光處理或單次電漿處理,本發明亦可對 單一配向膜材料或配向膜既進行紫外光處理也進行電漿處理,且亦 可於前述之合適製程階段中進行多次的紫外光處理或電漿處理。此 外,本發明尤其適用於搭配gSA製释之顯示面板,減少液晶材料中 的可父聯單體與配向臈之污染物產生反應的可能性,但本發明之運 用不限於此,本發明實際上可適用於各式之配向膜製程之中。 綜上所述,由於本發明可於預烘烤製程之後,以及/或形成框膠 之前,對配向膜材料進行紫外光處理或電漿處理,以鈍化摻雜於配 向膜材料中之可交聯污染物,因此可有效減少可交聯污染物導致之 亮暗不勻現象。 以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍 所做之均錢化與修飾,皆應屬本發明之涵蓋範圍。 【圖式簡單說明】 第1圖至第3圖為習知製作顯示面板的方法示意圖。 14 第4圖為本發明第-較佳實 圖。 餅如面板之方法的流程示意 ㈣,_鑛作讀和板的示意圖 第圖為本發明第二較佳實施例製作顯示面板之方法的流程示意 圖。 , 第7圖為本發明第三較佳實施例製作顯示面板之方法的流程示音、 圖。 【主要元件符號說明】 10 第一基板 12 配向膜 14 污染物 16 液晶材料 18 第二基板 20 配向膜 102-122 步騾 200 顯示面板 202 第一基板 204 共同電極 206 第二基板 208 晝素電極 212 液晶層 214 配向膜 216 配向膜 218 框膠 15Dark unevenness is still an important issue for the production of display panels. In view of the above, it is an object of the present invention to provide an alignment film for a liquid crystal display panel and to solve the problem of the invention of the panel to form and solve the conventional problems. In view of the above, an embodiment of the present invention provides a method for fabricating a display panel. First, a first substrate is provided, and then a aligning coating is applied to the first substrate. Thereafter, a matching baking process is performed on the alignment gambling material. The alignment film material is then subjected to a UVTfeatment or a treatment (10) treatment to passivate the crosslinkable contaminants of the film material to the film material. Subsequently, a second substrate is provided, and in the first or second Forming a liquid crystal layer between the substrate and the second substrate to form a liquid crystal layer, which is filled in the sealant. Since the present invention can perform ultraviolet light on the alignment film material after the prebaking process and/or before forming the sealant. Light treatment or electrothermal treatment to passivate crosslinkable contaminants doped in the alignment film material, thereby effectively reducing the unevenness of light and darkness caused by crosslinkable contaminants. [Embodiment] The present invention will be further understood by those of ordinary skill in the art in the <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; Please refer to FIG. 4 and FIG. 5 ' FIG. 4 is a schematic flow chart of a method for manufacturing a display panel according to a first preferred embodiment of the present invention, and FIG. 5 is a display panel produced according to the first preferred embodiment of the present invention. The schematic diagram of the drawing is only for the purpose of illustration, and is not drawn according to the original size. 7 1380099 As shown in FIG. 4 and FIG. 5, the flow of the first preferred embodiment for manufacturing the display panel is as follows: Step 102 Step: providing a substrate; step 106: pre-cleaning (prePI cleaner); step 108: coating the alignment film material; step 110. pre-bake process of the alignment film material; step 110a: The alignment film material is subjected to ultraviolet light treatment or plasma treatment; Step 112. Perform post-baking process on the alignment film material (step-baj^eprocess); Step 114 · Perform pre-cleaning before substrate bonding; Step 11 5: performing alignment film alignment treatment; step 116: forming a sealant; step 118: forming a liquid crystal layer (called crystai dispensing); the detailed description of each step is as follows. According to step 1〇4, firstly, the fifth figure is provided. The first substrate 202. The first substrate 2〇2 may be a color filter substrate having a color light-emitting sheet and may have a transparent common electrode 2〇4 at the inner surface. In other embodiments The first substrate 2〇2 may also be an array sub-array having a thin film transistor, and may have a halogen electrode at the face of the girl. Then, according to step 106', a forward pre-cleaning step can be performed to make the first substrate 2〇2 have a clear surface, thereby promoting the bonding of the first substrate 202 and the subsequent alignment film, and reducing the contamination of the alignment film. The possibility. 1380099 Next, an alignment film material is applied to the first substrate 202 in accordance with step 108', at which time the alignment film material exhibits an unaligned state. Wherein, the alignment film material may comprise a siloxane material, such as a material of polyphosphonium (pAA) or polyimide (polyimide). Or in other embodiments, the alignment film material may also include a hydrogenated diamond-based carbon film (DLC), or a carbon stone compound (SiC), an oxygen stone compound (si〇2), and a nitrogen stone compound # (Si3N4), alumina (Al2〇3) and other materials. The method of coating the alignment film material on the first substrate 202 includes slit coating Na (7) such as ton ^ spin coating fine (7) café non-spin coating, inkjet coating or roll printing coating The way it is formed. Here, the so-called roll printing type coating method can be applied to the first substrate 2〇2 by rolling the transfer printing material. Here, the ink jet coating method may first fill the alignment film material in an inkjet device and directly drop the alignment film material onto the φ substrate 2G2 by using an inkjet head of the ink jet device. When the alignment film material is formed by the inkjet coating method, the opportunity for the tool such as the transfer roller to contact the alignment film material and the first substrate 2〇2 can be avoided, so that it has a better effect for the purpose of reducing the contamination. Then, according to step 110, the alignment crucible material is subjected to a prebaking process. Wherein, the temperature range of the prebaking process is substantially between 50. 0 and 150, and continues for about 50 seconds to 300 seconds to remove part of the solvent contained in the alignment film material, but not only The alignment film material is completely hardened. 9 1380099 After the prebaking process, the passivation film material is passivated &amp;assivate according to step ll 〇a ', such as UV treatment or piasma treatment, to passivate the doping in the alignment The crosslinkable contaminant in the membrane material, the so-called passivation means that the crosslinkable contaminants or other contaminants make it difficult to chemically or physically change, or the crosslinkable contaminants or other contaminants are cleaved and volatilized. In short, avoid Contaminants affect the imaging quality of liquid crystal displays. In order to passivate the crosslinkable contaminants without simultaneously destroying or changing the characteristics of the alignment film material, the ultraviolet light intensity of the ultraviolet light treatment of the present invention should preferably be controlled to be greater than 〇mW/cm2 per square centimeter and Less than or equal to the range of excitation mW/cm2, the energy intensity should preferably be controlled to be greater than or equal to 3 joules per square centimeter (3J/cm2) and less than or equal to 30 J/cm2, and the wavelength range should preferably be controlled from 300 nm to 450. Between the rice. According to the foregoing process parameters, the aligning film material is continuously subjected to UV cleavage for about _1 sec to effectively passivate the crosslinkable contaminant, preferably 15 sec., but not limited thereto, as long as the aligning film material is The UV-treated PU can purify the effect of the parent contaminant. Therefore, the ultraviolet light intensity, energy intensity and wavelength range of the ultraviolet light treatment of the present invention need not be limited to the aforementioned values. In the present invention, when the electrophoretic treatment is used to purify the crosslinkable contaminants, in order to purify the crosslinkable contaminants without destroying the miscellaneous materials, the plasma treatment of the present invention may comprise providing argon gas (Qi, η, Ar As an inert gas, the degree of vacuum is preferably less than 1 〇 · 5 Torr ((4) 'the operating power is preferably controlled at about 1 watt (10) position) to just s s, the operating temperature is better measured in the boots to ride When you are in a good position, you can control between 5 and 120 points. Similarly, as long as the plasma treatment of the alignment film material can have the effect of secreting the touch (four), the plasma treatment of the inertia of the present invention 10 1380099 steep hole type, vacuum degree, operation discrimination, operating temperature and operation After the browning is limited to the ultraviolet light treatment or the electropolymerization treatment, the alignment germanium material is subjected to a post-bald process according to the step m, so that the alignment film is cauterized and hardened to form the alignment film 214. . Its + 'this 4 after the temperature of the county to the fine f on the bar 15 〇 £) (: to 3 ° ° ° ° ' and continue for about _ seconds to face 〇 second after the temperature _ secret Boots to · c, Lin Lin _ _ _ seconds to delete two seconds, but not limited to this. After the baking process, the poly-proline acid contained in the alignment film material can be imidized into a polyimide film. Next, in accordance with step 114, a second substrate 2〇6 is provided, and a pre-cleaning step is performed on the first substrate 2〇2 and the second substrate 206. The second substrate 2〇6 may have a pixel at the inner surface. The electrode 208 and the alignment film 216, wherein the alignment film 216 is preferably formed by using the foregoing steps 102 to 112, but may be formed by other means. In this embodiment, the first substrate 2〇2 is colored and colored. The second substrate 206 may be an array substrate, and the second substrate 2〇6 may have a pixel electrode 208 at the inner surface. When the first substrate 2〇2 is an array substrate, the second substrate 2〇6 is It can be a color filter substrate with a color filter and a common electrode. The pre-cleaning step before the substrate can make the base Both the 202 and the first substrate 206 have a clean surface, thereby promoting the bonding stability of the first and second substrates 202, 206 and the subsequent sealant, and reducing the possibility that the subsequent liquid crystal layer is contaminated. 1380099 Then according to step 115 The alignment film is subjected to an alignment treatment, and the alignment treatment is exemplified by a rubbing alignment treatment, a photoalignment treatment, an ion beam alignment treatment, or a piasma beam alignment treatment. Then, according to step 116, a sealant 218 is formed on the first substrate 202 or the second substrate 206, and a liquid crystal layer 212 is formed between the first substrate 202 and the second substrate 2〇6 according to the step, and is filled in the sealant 118. The liquid crystal layer 212 may be formed by a dropping type or a vacuum injection type. When the liquid crystal layer 212 is formed by a dropping method, the liquid crystal material is first dropped on the substrate provided with the sealant 118 by using an ink jet device. After the required amount of liquid crystal is reached, the second substrate 206 is disposed corresponding to the first substrate 202, and the first substrate 2〇2 and the second substrate 206 are bonded by the sealant 218 by hot pressing. When the liquid crystal layer 212 is formed by using a vacuum injection method, the second substrate 206 is first disposed corresponding to the first substrate 202, and the first substrate 202 and the second substrate 206 are bonded by the sealant 218 by hot pressing. The liquid crystal material is injected between the first and second substrates 202, 206 inside the sealant 118 by the pressure of the vacuum. When the present invention is applied to the PSA process, the liquid crystal layer 212 herein may contain liquid crystal molecules and be mixed in the liquid crystal. a monomer in a molecule. By applying a voltage to a liquid crystal cell, the monomer mixed in the liquid crystal is aligned with the liquid crystal molecules under voltage, and then crosslinked by irradiation of ultraviolet light or the like. These aligned monomers are cured to produce a specific pre-tiltangle. In this way, the ability of the liquid crystal alignment can be effectively controlled, thereby reducing light leakage and improving contrast. Since the present invention can have 12 1380099 effective use of the material of the peach or the transfer of the passivated county blunt cut (four) pollutants, the contamination of the alignment surface does not affect the cross-linkable body in the liquid crystal material, especially for the PSA on the surface. The county panel of the process. Thereafter, a substrate dicing process is performed with the second substrate (four) to form the slab 2 of the present invention. As shown in Fig. 4, in addition to the aforementioned steps of ultraviolet light treatment, plasma treatment and ink jet coating of the alignment film material, the present invention may also optionally include a high temperature heating process of step = 122. Steps reduce or passivate the stain on the substrate or in the alignment film. It is carried out between the two process steps after the high temperature heating of the county, the baking process, and the formation of the frame, or any process steps before the formation of the sealant. According to the results of the research and the actual production conditions, the present invention or the electropolymerization treatment can be carried out between the two process steps before the formation of the sealant, and can be turned over (10) to the alignment film. The effect of contamination. Please refer to FIG. 6 and FIG. 7 , and FIG. 6 7 is a schematic flow chart of a method for manufacturing a display panel according to the second and third preferred embodiments of the present invention, wherein the same steps are denoted by the same symbols. The main difference between the preferred embodiments is that the second and third preferred implementations have different manufacturing frequency regimes or plasma processing. As shown in Fig. 6, in the second preferred embodiment, the ultraviolet light treatment or the plasma treatment step 112a may be performed after the post-baking process and before the substrate pre-cleaning step. As shown in Fig. 7, in the third preferred embodiment, the step 114a of the ultraviolet light treatment or the plasma 13 1380099 treatment may be performed after the pre-cleaning step before the substrate bonding, before the formation of the mask. The display panel 200 shown in Fig. 5 can also be fabricated according to the second and third preferred embodiments. According to an embodiment of the present invention, the present invention is not limited to performing a single ultraviolet light treatment or a single plasma treatment on a single alignment film material or an alignment film, and the present invention may also be applied to a single alignment film material or an alignment film. The ultraviolet light treatment is also performed by plasma treatment, and the ultraviolet light treatment or the plasma treatment may be performed multiple times in the above-mentioned suitable process stage. In addition, the present invention is particularly suitable for use in a display panel with gSA release, which reduces the possibility of reaction between the parent monomer and the alignment enthalpy in the liquid crystal material, but the application of the present invention is not limited thereto, and the present invention actually Can be applied to a variety of alignment film processes. In summary, since the present invention can perform ultraviolet light treatment or plasma treatment on the alignment film material after the prebaking process and/or before forming the sealant to passivate the crosslinkable doping in the alignment film material. Contaminants, therefore, can effectively reduce the unevenness of light and darkness caused by cross-linkable pollutants. The above is only the preferred embodiment of the present invention, and the weighting and modification of the scope of the patent application of the present invention should be covered by the present invention. BRIEF DESCRIPTION OF THE DRAWINGS FIGS. 1 to 3 are schematic views showing a conventional method of manufacturing a display panel. 14 Figure 4 is a first preferred embodiment of the present invention. Flowchart of the method of cake as a panel (4), Schematic diagram of a mine reading and a board The figure is a schematic flow chart of a method of manufacturing a display panel according to a second preferred embodiment of the present invention. FIG. 7 is a flow chart and a diagram of a method for manufacturing a display panel according to a third preferred embodiment of the present invention. [Main component symbol description] 10 First substrate 12 Alignment film 14 Contaminant 16 Liquid crystal material 18 Second substrate 20 Alignment film 102-122 Step 200 Display panel 202 First substrate 204 Common electrode 206 Second substrate 208 Alizarin electrode 212 Liquid crystal layer 214 alignment film 216 alignment film 218 sealant 15

Claims (1)

1380099 101年8月27日修正替換頁 :.七、申請專利範圍:1380099 Amendment page on August 27, 101: 7. Application patent scope: 1· 一種製作顯示面板之方法,包括: 提供一第一基板; itl年$月4日修正本 於該苐一基板上塗布一配向膜材料; 對該配向膜材料進行一預烘烤(pre_baking)製程; 於該預烘烤製程之後,對該配向膜材料進行一純化處理,以純化 • 播雜於該配向膜材料中之-可交聯污染物,其中該鈍化處理 包括糸外光處理(UVtreatment)或電漿處理(piasma treatment); 對该配向膜材料進行一配向處理; 提供一第二基板; 於該第一或該第二基板上形成一框膠;以及 於該第與5玄第二基板之間形成一液晶層,填充於該框膠内。 鲁 •如申凊專利範U第1項所述之方法,更包括—後烘烤 Cpost-bakmg)製程’其中該後烘烤製程係於該預烘烤製程之後 進行,以固化該配向膜材料成為一配向膜。 如申明專利範U第2項所述之方法,其中該鈍化處理係於該後烘 烤製程之前進行。 4. 如申呀專利範圍第2項所述之方法’其中該鈍化處理係於該後烘 16 ^\jyy ^\jyy 烤製程之後進行 101 % 27叫正替換頁 之溫度範 .如申請專利範圍第2項所述之方法,其中該後烘烤製程 圍為 15(TC至 3〇〇。〇。 6’如申請專利範圍第2項所述之方法,其中該後鱗製程持續進r 900秒至10800秒。 Λ订 7. 如申請專利範圍第!項所述之方法,其中該預焕烤製程之 圍為50¾至15〇。〇。 ,皿又乾 滾動印刷式塗布 8.如申請翻範圍第丨項所述之方法,其中於該第—基板上塗布— 配向膜材料之方法包括狹縫塗布⑽tcoating)、旋轉塗布(_ ^响^崎塗布㈣⑽⑽祂卜喷墨式⑽幻塗布或 9.=侧第1項所述之方法,其中該第一基板上具有-彩 姆1獅述之方法,其中該第-基板上具有複 11.如申請專利範圍第2項所述之 乃古’其中該配向膜包括聚亞醯 17 1380099 « · I--------- - 101年8月27日修正替換頁 : 胺(polyamide,PI)或聚醯胺酸(p〇ly上id,闕了~~~ L如申請專利範圍第i項所述之方法,其中該紫外光處理的紫外 光強度大於每平方公分〇毫瓦(0mW/cm2)且小於等於1〇〇 mW/cm2。 如申請細贿i項所述之方法,其中該紫外歧理的紫外 • 統量強频纽等贿付公分3 t、耳(3W)則、於等於 30 J/cm2 〇 14.如申請專利範圍第i項所述之方法,其中該紫外光處理的紫外 光波長約300奈米至450奈米。 1 ^中請細瓣丨項所狀綠,針該雜歧包含提供 氬氣(argon,Ar)。 16‘如中請專利範圍第丨項所述之方法,其中該㈣處 約小於10-5托耳(torr)。 17. 如中請專利卿第i項所述之方法,其中該雜處理之操作功 率約 10 瓦(10 watts)至 100 watts。 18. 如中請專利範圍第丨項所述之方法,其中該錢處理之操作溫 18 1380099 _ 101年8月27日修正替換頁 度約 120°c 至 250°c。 19.如申請專利範圍第1項所述之方法,其令該電漿處理之操作時 間約5分鐘至120分鐘。 八、圖式·1 . A method for manufacturing a display panel, comprising: providing a first substrate; and applying an alignment film material on the substrate of the first month; and pre-baking the alignment film material (pre_baking) a process; after the prebaking process, the alignment film material is subjected to a purification treatment to purify the -crosslinkable contaminant in the alignment film material, wherein the passivation treatment includes ultraviolet treatment (UV treatment) Or a piasma treatment; performing an alignment treatment on the alignment film material; providing a second substrate; forming a sealant on the first or second substrate; and A liquid crystal layer is formed between the substrates and filled in the sealant. The method of claim 1, wherein the method further comprises a post-baking Cpost-bakmg process, wherein the post-baking process is performed after the pre-baking process to cure the alignment film material Become an alignment film. The method of claim 2, wherein the passivation treatment is performed prior to the post-baking process. 4. The method of claim 2, wherein the passivation treatment is performed after the post-bake 16 ^\jyy ^\jyy baking process, and the temperature range of 101% is called a positive replacement page. The method of claim 2, wherein the post-baking process is 15 (TC to 3 〇〇. 〇. 6', as in the method of claim 2, wherein the post-scale process continues for 900 seconds. To 10800 sec. 7. The method of claim 2, wherein the pre-heating process has a circumference of 503⁄4 to 15 〇. ,., and the dish is dry-rolled and printed. 8. If the application is turned over The method of the above item, wherein the method of coating the alignment film material on the first substrate comprises slit coating (10) tcoating, spin coating (_^^^^^^^^(10)(10)(10), inkjet (10) smear coating or 9. The method of claim 1, wherein the first substrate has a method of merging, wherein the first substrate has a complex 11. As described in claim 2, The alignment film includes Poly Aa 17 1380099 « · I--------- - August 27, 101 Replacement page: amine (PI) or poly-proline (p〇ly id, 阙~~~ L) as described in the scope of claim i, wherein the ultraviolet light intensity of the ultraviolet light treatment is greater than The square centimeter is 〇mwa (0mW/cm2) and less than or equal to 1〇〇mW/cm2. For the method described in the application for bribes, the UV ambiguity of the ultraviolet ray is the same as the bribe. The ear (3W) is equal to 30 J/cm2. The method of claim i, wherein the ultraviolet light has a wavelength of about 300 nm to 450 nm. The fine-grained item is green, and the needle includes the argon (Ar). The method of the above-mentioned patent scope, wherein the (four) is less than about 10-5 Torr (torr 17. The method of claim i, wherein the operating power of the miscellaneous treatment is about 10 watts (10 watts) to 100 watts. 18. The method described in the third paragraph of the patent scope, The operating temperature of the money processing is 18 1380099 _ August 27, 101 revised replacement page degree of about 120 ° c to 250 ° C. 19. If the patent application The method according to item 1, which makes the operation of plasma processing time of about 5 minutes to 120 minutes. Eight drawings · 1919
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