TWI371874B - Integrated circuit structures - Google Patents
Integrated circuit structuresInfo
- Publication number
- TWI371874B TWI371874B TW097130653A TW97130653A TWI371874B TW I371874 B TWI371874 B TW I371874B TW 097130653 A TW097130653 A TW 097130653A TW 97130653 A TW97130653 A TW 97130653A TW I371874 B TWI371874 B TW I371874B
- Authority
- TW
- Taiwan
- Prior art keywords
- integrated circuit
- circuit structures
- structures
- integrated
- circuit
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/8258—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using a combination of technologies covered by H01L21/8206, H01L21/8213, H01L21/822, H01L21/8252, H01L21/8254 or H01L21/8256
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
- H01L21/76264—SOI together with lateral isolation, e.g. using local oxidation of silicon, or dielectric or polycristalline material refilled trench or air gap isolation regions, e.g. completely isolated semiconductor islands
- H01L21/76283—Lateral isolation by refilling of trenches with dielectric material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/15—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/26—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys
- H01L29/267—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, elements provided for in two or more of the groups H01L29/16, H01L29/18, H01L29/20, H01L29/22, H01L29/24, e.g. alloys in different semiconductor regions, e.g. heterojunctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7786—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT
- H01L29/7787—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with direct single heterostructure, i.e. with wide bandgap layer formed on top of active layer, e.g. direct single heterostructure MIS-like HEMT with wide bandgap charge-carrier supplying layer, e.g. direct single heterostructure MODFET
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Recrystallisation Techniques (AREA)
- Led Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US4551308P | 2008-04-16 | 2008-04-16 | |
US12/127,569 US20090261346A1 (en) | 2008-04-16 | 2008-05-27 | Integrating CMOS and Optical Devices on a Same Chip |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200945625A TW200945625A (en) | 2009-11-01 |
TWI371874B true TWI371874B (en) | 2012-09-01 |
Family
ID=41200367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW097130653A TWI371874B (en) | 2008-04-16 | 2008-08-12 | Integrated circuit structures |
Country Status (3)
Country | Link |
---|---|
US (1) | US20090261346A1 (zh) |
CN (1) | CN101562180A (zh) |
TW (1) | TWI371874B (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7999288B2 (en) | 2007-11-26 | 2011-08-16 | International Rectifier Corporation | High voltage durability III-nitride semiconductor device |
US8159003B2 (en) | 2007-11-26 | 2012-04-17 | International Rectifier Corporation | III-nitride wafer and devices formed in a III-nitride wafer |
US7968913B2 (en) * | 2008-12-08 | 2011-06-28 | National Semiconductor Corporation | CMOS compatable fabrication of power GaN transistors on a <100> silicon substrate |
US8129205B2 (en) | 2010-01-25 | 2012-03-06 | Micron Technology, Inc. | Solid state lighting devices and associated methods of manufacturing |
US8389348B2 (en) | 2010-09-14 | 2013-03-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanism of forming SiC crystalline on Si substrates to allow integration of GaN and Si electronics |
EP2477216A1 (en) * | 2011-01-13 | 2012-07-18 | Soitec | Hybrid bulk/SOI device with a buried doped layer and manufacturing method thereof |
KR102032437B1 (ko) | 2012-02-28 | 2019-10-16 | 루미리즈 홀딩 비.브이. | Ac led들을 위한 실리콘 기판들 상에서의 알루미늄 갈륨 나이트라이드/갈륨 나이트라이드 디바이스들을 갖는 갈륨 나이트라이드 led들의 집적 |
KR101913387B1 (ko) | 2012-03-23 | 2018-10-30 | 삼성전자주식회사 | Ⅲ족 질화물 이종 접합 구조 소자의 선택적 저온 오믹 콘택 형성 방법 |
CN103378070B (zh) * | 2012-04-16 | 2016-04-13 | 富士电机株式会社 | 半导体器件 |
DE102013113682A1 (de) * | 2013-12-09 | 2015-06-25 | Otto-Von-Guericke-Universität Magdeburg | Verbindungshalbleiterbauelement |
US10468454B1 (en) * | 2018-04-25 | 2019-11-05 | Globalfoundries Singapore Pte. Ltd. | GaN stack acoustic reflector and method for producing the same |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1998047190A1 (en) * | 1997-04-16 | 1998-10-22 | The Board Of Trustees Of The Leland Stanford Junior University | Distributed esd protection device for high speed integrated circuits |
JPH11274467A (ja) * | 1998-03-26 | 1999-10-08 | Murata Mfg Co Ltd | 光電子集積回路素子 |
US6255198B1 (en) * | 1998-11-24 | 2001-07-03 | North Carolina State University | Methods of fabricating gallium nitride microelectronic layers on silicon layers and gallium nitride microelectronic structures formed thereby |
WO2001006546A2 (en) * | 1999-07-16 | 2001-01-25 | Massachusetts Institute Of Technology | Silicon on iii-v semiconductor bonding for monolithic optoelectronic integration |
WO2001043174A2 (en) * | 1999-12-13 | 2001-06-14 | North Carolina State University | Fabrication of gallium nitride layers on textured silicon substrates |
US6392257B1 (en) * | 2000-02-10 | 2002-05-21 | Motorola Inc. | Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same |
US7312485B2 (en) * | 2000-11-29 | 2007-12-25 | Intel Corporation | CMOS fabrication process utilizing special transistor orientation |
US6559471B2 (en) * | 2000-12-08 | 2003-05-06 | Motorola, Inc. | Quantum well infrared photodetector and method for fabricating same |
US20040029365A1 (en) * | 2001-05-07 | 2004-02-12 | Linthicum Kevin J. | Methods of fabricating gallium nitride microelectronic layers on silicon layers and gallium nitride microelectronic structures formed thereby |
AU2002363627A1 (en) * | 2001-06-11 | 2003-05-26 | Genorx, Inc. | Electronic detection of biological molecules using thin layers |
US6824974B2 (en) * | 2001-06-11 | 2004-11-30 | Genorx, Inc. | Electronic detection of biological molecules using thin layers |
US7847344B2 (en) * | 2002-07-08 | 2010-12-07 | Micron Technology, Inc. | Memory utilizing oxide-nitride nanolaminates |
JP3905824B2 (ja) * | 2002-11-25 | 2007-04-18 | 大阪府 | 単結晶窒化ガリウム局在基板及びその製造方法 |
US6902962B2 (en) * | 2003-04-04 | 2005-06-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Silicon-on-insulator chip with multiple crystal orientations |
US7338822B2 (en) * | 2003-05-09 | 2008-03-04 | Cree, Inc. | LED fabrication via ion implant isolation |
US6967355B2 (en) * | 2003-10-22 | 2005-11-22 | University Of Florida Research Foundation, Inc. | Group III-nitride on Si using epitaxial BP buffer layer |
US7803717B2 (en) * | 2003-10-23 | 2010-09-28 | North Carolina State University | Growth and integration of epitaxial gallium nitride films with silicon-based devices |
US7060585B1 (en) * | 2005-02-16 | 2006-06-13 | International Business Machines Corporation | Hybrid orientation substrates by in-place bonding and amorphization/templated recrystallization |
EP1882268B1 (en) * | 2005-05-17 | 2016-12-14 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lattice-mismatched semiconductor structures with reduced dislocation defect densities and related methods for device fabrication |
EP1911086A2 (en) * | 2005-07-26 | 2008-04-16 | Amberwave Systems Corporation | Solutions integrated circuit integration of alternative active area materials |
-
2008
- 2008-05-27 US US12/127,569 patent/US20090261346A1/en not_active Abandoned
- 2008-08-12 TW TW097130653A patent/TWI371874B/zh active
-
2009
- 2009-04-08 CN CNA2009101340565A patent/CN101562180A/zh active Pending
Also Published As
Publication number | Publication date |
---|---|
TW200945625A (en) | 2009-11-01 |
US20090261346A1 (en) | 2009-10-22 |
CN101562180A (zh) | 2009-10-21 |
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