TWI366070B - - Google Patents

Info

Publication number
TWI366070B
TWI366070B TW095130721A TW95130721A TWI366070B TW I366070 B TWI366070 B TW I366070B TW 095130721 A TW095130721 A TW 095130721A TW 95130721 A TW95130721 A TW 95130721A TW I366070 B TWI366070 B TW I366070B
Authority
TW
Taiwan
Application number
TW095130721A
Other languages
Chinese (zh)
Other versions
TW200728913A (en
Inventor
Masaru Shida
Hiroyuki Ohnishi
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200728913A publication Critical patent/TW200728913A/en
Application granted granted Critical
Publication of TWI366070B publication Critical patent/TWI366070B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
TW095130721A 2005-09-06 2006-08-21 Photosensitive composition TW200728913A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005257402A JP2007072035A (en) 2005-09-06 2005-09-06 Photosensitive composition

Publications (2)

Publication Number Publication Date
TW200728913A TW200728913A (en) 2007-08-01
TWI366070B true TWI366070B (en) 2012-06-11

Family

ID=37858720

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095130721A TW200728913A (en) 2005-09-06 2006-08-21 Photosensitive composition

Country Status (4)

Country Link
JP (1) JP2007072035A (en)
KR (1) KR20070027446A (en)
CN (1) CN100580553C (en)
TW (1) TW200728913A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5513711B2 (en) * 2007-10-01 2014-06-04 太陽ホールディングス株式会社 Photosensitive resin composition and cured product thereof
JP5439860B2 (en) * 2008-03-06 2014-03-12 住友化学株式会社 Colored photosensitive resin composition
KR101947474B1 (en) 2008-07-09 2019-02-13 도쿄 오카 고교 가부시키가이샤 Colored photosensitive resin composition and oxime-based photopolymerization initiator
JP5336274B2 (en) * 2008-07-09 2013-11-06 東京応化工業株式会社 Colored photosensitive resin composition and oxime photopolymerization initiator
CN105159030A (en) * 2008-11-05 2015-12-16 东京应化工业株式会社 Photosensitive resin composition and base
CN102317863B (en) * 2009-02-13 2013-11-20 株式会社Lg化学 Photoactive compound and photosensitive resin composition containing the same
TWI468877B (en) * 2009-03-30 2015-01-11 Developing liquid
EP2466341A1 (en) 2009-08-13 2012-06-20 FUJIFILM Corporation Wafer-level lens, wafer-level lens production method, and imaging unit
US9482946B2 (en) * 2011-03-30 2016-11-01 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element using same, method for forming partition wall of image display device, and method for manufacturing image display device
KR20180099105A (en) * 2017-02-28 2018-09-05 동우 화인켐 주식회사 Oxime ester compound and a photocurable composition comprising the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004069754A (en) * 2002-08-01 2004-03-04 Tokyo Ohka Kogyo Co Ltd Photopolymerizable black composition and black pattern forming method
JP4437651B2 (en) * 2003-08-28 2010-03-24 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP4484482B2 (en) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 Photosensitive coloring composition and color filter

Also Published As

Publication number Publication date
TW200728913A (en) 2007-08-01
JP2007072035A (en) 2007-03-22
CN100580553C (en) 2010-01-13
KR20070027446A (en) 2007-03-09
CN1928715A (en) 2007-03-14

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