六、發明說明： 【發明所屬之技術領域】 尤其是關於模造玻璃模紅之結 本發明係關於一種模造玻璃模仁 構及其製造設備及其製造方法。 【先前技術】 主喊隨?多fff躺發展，數軸機、攝職越來越絲大消費者 二ΐ 即希望拍攝物體之影像畫面清晰， =物體之祕質Ϊ練錄度上喊魏__各光學元件之優 非球硫以卩絲位相機林可或缺之光學元件，習知之數位 ft面厂鏡片係藉由模造法製成6由於模造玻璃需要在高溫(大約_ 偌^厕侧麵)下贿，所賴紐雜非需要具 in ΐ之模仁’紐賴账—麟絲鄕制之組合結 純化鎢、碳切等，祕频之材質—般為類 f石溥膜(D舰ond Like Film，DLC)、貴金屬鍍膜或貴金屬合金鐘膜， =金屬鍍膜如銥(Iridium，Ir)、鉑(Platinum，叫、釕(Ruthenium，Ru)等， 貝金屬合金鍍膜如銀·訂合金(Ir_Ru)、銀_鍊合金(Ir_Re)等。類鑽石薄 膜(DLCM艮難達到令人滿冑之模仁壽命，貴金屬或貴金屬合金都具有 很？之化學穩定性’但是祕貴金屬保顧絲材之_著性較差， 使得模仁在模造之高溫環境下很難有較高之模造循環次數，間接提高 了模造玻璃之成本。 習知之模造玻璃模仁係通過真空濺鍍方式於基材上濺鍍而製 成，而習知之模造玻璃模仁製造設備為真空濺鍍機，一般係於真空濺 鍍腔内设置顧練及基材’亦可於真g麟細設置永磁體形成磁 控濺鍍機，如中國大陸專利第90226142.8號專利，該專利介紹了一種 磁控濺鍍機’該磁控濺鍍機包括真空室及設置於真空室内之磁控濺鍍 把、加熱器等。該磁控濺鍍機可錢鐘不同材質及不同結構之多層膜或 合金膜，然，由於該磁控濺鍍機每次僅能濺鍍一種單質膜，當濺鍍多 層膜時，需重復打開真空濺鍍腔更換靶材，故此會造成各膜層因為破 真空而被氧化，而磁控濺鍵機濺鍍多層膜時容易造成資源之浪費，同 時增加了濺鍍產品之成本。 有鑑於此，提供一種具有較長模造循環次數且模 造玻璃模仁、賤紗献製麟備料鮮。^之模 【發明内容】VI. Description of the Invention: [Technical Field to Which the Invention Is Applicable] In particular, the present invention relates to a molded glass mold body, a manufacturing apparatus therefor, and a method of manufacturing the same. [Prior technology] The main shouting with the multi-fff development, the number of axes, the job is more and more big consumers second, that is, the image of the object is expected to be clear, = the secret of the object, the degree of practice, shouting Wei __ The optical non-spherical sulfur of each optical component is an optical component that can be used in the 卩 位 相机 camera. The conventional digital ft face lens is made by the molding method. 6 Because the molded glass needs to be at a high temperature (about _ 偌 ^ toilet side Under the bribe, the company is not required to have in the mold of the ' ' 纽 纽 纽 纽 纽 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 麟 纯化 纯化 纯化 纯化 纯化 纯化 纯化 纯化 纯化Ond Like Film, DLC), precious metal coating or precious metal alloy clock, = metal coating such as iridium (Iridium, Ir), platinum (Platinum, called, Ruthenium, Ru), etc., shell metal alloy coating such as silver · alloy ( Ir_Ru), silver-chain alloy (Ir_Re), etc. Diamond-like film (DLCM is difficult to achieve a full life of the mold, precious metals or precious metal alloys have very good chemical stability' but the precious metal cares for the wire _ poor performance, making it difficult to have a high number of molding cycles in the mold high temperature environment Indirectly, the cost of the molded glass is increased. The conventional molded glass mold is made by sputtering on a substrate by vacuum sputtering, and the conventional molded glass mold manufacturing equipment is a vacuum sputtering machine, generally vacuumed. In the sputtering chamber, the positioning and the substrate can be set up to form a permanent magnet to form a magnetron sputtering machine, such as the Chinese Patent No. 90226142.8, which introduces a magnetic sputtering machine. The control sputtering machine comprises a vacuum chamber and a magnetron sputtering device, a heater, etc. disposed in the vacuum chamber. The magnetron sputtering machine can be used for multi-layer film or alloy film of different materials and different structures, however, due to the magnetic control The sputtering machine can only sputter a single film at a time. When the multilayer film is sputtered, it is necessary to repeatedly open the vacuum sputtering chamber to replace the target, so that each film layer is oxidized due to vacuum breaking, and the magnetic control splashing machine When the multi-layer film is sputtered, it is easy to cause waste of resources, and at the same time increase the cost of the sputter product. In view of this, a mold having a long molding cycle and a mold glass mold and a crepe are prepared. Within the invention ]
>本發明之目的在於提供一種具有較長模造猶環次數且模 較高之模造玻璃模仁。 X 本發明之另一目的在於提供一種上述模造玻璃模仁之製造設備。 本發明之再一目的在於提供一種上述模造玻璃模仁之製造方法。 為了實現本發明之目的，本發明提供一種模造玻璃模仁，包括一 复合層，每一複合層包括一貴金屬H緣金屬氧化 、員鑽石薄膜層，其中該絕緣金屬氧化物層處於貴金屬層及類 鑽石薄膜層之間。 宙j了實現本發明之另一目的’本發明提供一種真空賤鍍機，包括 鍛腔、把材機構及基材機構，其中輸材機構及基材機構設置 =真=濺鍍腔内，該靶材機構上設有第一靶材機構、第二靶材機構及 第二靶材機，該基材機構上設有自轉及公轉機構。 ，了 f縣發明之再—目的’本發啸供-健造玻璃模仁之製 把万法，包括以下步驟： 將，仁基材安裝於真空濺鍍機之基材機構上； 貝金屬姆、絕緣金屬氧化錄材及石雜材分別安裝於真空 濺鍍機之第-姆鶴、第二姆機獻“姆機上； 對真空錢鍍機内抽真空； 开Μ 麟貴销層、_麵氧化滅及類彻細層於基材上 :Μ 了複合層，其中絕緣金屬氧化物層處於貴金屬層及類鑽石薄膜層 之·間， 上繼續進行麟複合層的步，驟，直至複數個複合層形成於模仁基材 最後取出即可得到模造玻璃模仁。 成夕it明之真空減錢機乾材機構上還可設置多個永磁體，永磁體形 之私之场可增加減鍵迷率’形成真空磁控減鍍’可使濺鐘基材與靶材 之叔子結合緊密，«軸之濺鍍層。 =習知技術，本個之模造玻璃模仁具有多層複合層，可承受 時之高溫、高壓環境，且複合層與基材結合緊密，所以本發 j賴仁《較高之槪_缝。树日狀雜濺锻機内 t裝複數偉材’且該複數練材可_不同材f，故可於一次滅 驗衫層不同材質之_，而且各膜層之間不會因為破真 化，節省了濺献本，_又由於本發明之真线鐘機之基 材^構可於濺射自轉與公轉，可使_之薄膜厚度均勻致。 【貫施方式】 本發明適用於模造玻璃模仁及其製造領域。 參照第-®所示，本發明之模造玻_仁i包括—基材10及 t複合層12，該複合層12包括—貴金朗12G、—絕緣金屬氧化 =層122及-類鑽石薄膜層124 ’其中該絕緣金屬氧化物層 122處於 貝金屬層120及類鑽石薄膜層124之間。 為達到較好之模造循環壽命，複合層12之層數可為㈣層，最 好，為5_1。層。貴金屬層12。之貴金屬可為銀、#、釕或其合金， 該貝金屬層120之厚麟3-1G埃(AngStrom)。絕緣金屬氧化物層122 之絕緣金屬氧化物係Zr〇2_xY2〇3，其中重量百分比含量χ為315%， 最好應為5.8%，絕緣金屬氧化物層122之絕緣金魏化物還可為 ZKVxYaiVyAl2。3，重量百分比χ為3]5%，最好應為5_8%，重量 百^比y為3-5% ’另’絕緣金屬氧化物層122還可為处〇3。該絕緣 金屬氧化物層122之厚度為20·50埃，而類鑽石薄膜層124之厚度為 40-80埃。另外，類鑽石薄膜層124還可用與其具有相同效果之以瓜、 BN ' WC或BCN等材料取代。 ^參照第二圖所示，本發明模造玻璃製造設備係一真空濺鍍機2， 該真空賴機2包域线雜、姆機構22及紐麟(圖未示）。 其中靶材機構22及基材機構安裝於真空濺鍍腔内，把材機構22設置 於真空，，腔之-端，其上設置有第—1£材機構Μ卜第二把材機構 222及第三靶材機構223。第一靶材機構221可安裝直徑約為1-2英 =(2.45=9厘米)之靶材，第二靶材機構222及第三靶材機構223可 安裝，徑為4·8料(9‘8·19.6 ®米)德材，三麟機翻圍設有複數 個進氣口 27，該進氣口 27可將氬氣等惰性氣體均勻通入真空濺鍍腔 1362368 第—赠機構221上連接有直流電 =上連接有軸賴_源，第 係13.5鑛，其電°其中’射頻電源之頻率 之㈣細圖所不，射頻電源供應器28產生 之射頻i源通過共用激發器㈣咖如ex 2幻、電壓表284後8㈣％供應給姆 = 15〇_5〇〇m；；^« 200：500W 5 2〇^〇〇〇W ^ 郝If照第三圖所示，為增錢鑛速率，各婦機構上還安裝有永 ^體26 ’形成與電場垂直之磁場，㈣加速濺射粒子之速率以^成 之材料為敍_(卿叫，還可為_鐵氧體 鎳鉻銘s金(船〇>)、稀土銘合金等磁性材料。同時，為防止電磁 ^干擾’各純機構賴設置接地屏蔽罩25。紐錢錄材之溫 度’應於各革巴材機構後設置冷卻水管(圖未示），基材機構位於真空 =内與把材機構相反之-端，該基材機構上設有複數個基材位，同 '材機構上還5又有自轉及公轉機構(圖未示)控制基材機構自轉及 公轉。 '請同時參照第-圖及第二圖卿，本發明模造玻賴仁之製造方 法即利用上述之真鍍機2製造模造玻璃模仁1，包括以下步驟： 將模仁基材10安裝於真空濺鍍機2之基材機構上； 將貴金屬乾材、絕緣金屬氧化物乾材及石墨輕材安裝於真空淹 機； ' 將真空濺鍍機内抽真空； 依次濺鍍貴金屬層120、絕緣金屬氧化物層122及類鑽石薄膜層 124於基材1〇上形成複合層12，其中絕緣金屬氧化物層122處於貴 金屬層120及類鑽石薄膜層124之間； 繼續濺鍍直至達到規定之複數個複合層12 ; 最後取出即可得到模造玻璃模仁i。 真空濺鍍前，將鉑(Pt)、銥(Ir)、銖(Re)等貴金屬或其合金材料之 輕材安裝入第一靶材機構221，將選自Zr02-xY2〇3、 6 等絕緣金屬氧化物材料之靶材安裝入第 -靶材機構222 ’將選自石墨、、wc、bn及b 材安裝入第三把材機構223，將待鍍基材1()安裝於基材機之= 位上，然後將真空麟腔内抽真空。當金 : ㈣逆===== 之混合氣至ai_1Pa ’然後開啟第三把材機構223上 紐麟上之自轉及公轉 ⑥模造玻賴仁具有多層複合層，可承受模造玻璃時之高 合層細描合㈣，所林發敗财玻璃模 材:、ίΐΐίί^ί環次數。本發明之真空麟機内可安裝複數練 科Wf ’故可於—錢鍍過程中激鐘出 而且各膜層之間不會因為破真空而被氧化，節 時自轉與讀之紐麟可於麵 M 發明符合發明糊要件，爰紐提出專辦請。惟， W 士 ίΐ僅為本發明之較佳實施例，舉凡熟悉本案技藝之人士，在 利範圍^珊神所作之_飾紐化，_含独下之申請專 【圖式簡單說明】 第圖係本發明模造玻璃模仁之結構示意圖； 第亡圖係本發明真空濺鍍機之剖示圖； ，二圖係本發明真空濺鍍機之靶材機構之磁鐵設計圖； 四圖係本發明之真空濺鍍機内之射頻電源線路設計圖。 【主要元件符號說明】 1362368 模造玻璃模仁 1基材 1〇 複合層 12貴金屬層 120 絕緣金屬氧化物層 122類鑽石薄膜層 124 真空濺鐘機 2 靶材機構 22第一靶材機構 221 第二靶材機構 222第三靶材機構 223 接地屏蔽罩 25永磁體 26 進氣口 27射頻發電機 28 共用激發器 281電容 282 電感 283電壓表 284 8> It is an object of the present invention to provide a molded glass mold having a higher number of times of molding and a higher modulus. X Another object of the present invention is to provide an apparatus for manufacturing the above-described molded glass mold. It is still another object of the present invention to provide a method of producing the above-described molded glass mold. In order to achieve the object of the present invention, the present invention provides a molded glass mold comprising a composite layer, each composite layer comprising a noble metal H-edge metal oxide, a member diamond film layer, wherein the insulating metal oxide layer is in a precious metal layer and Between the diamond film layers. Another object of the present invention is to provide a vacuum boring machine comprising a forging chamber, a material mechanism and a substrate mechanism, wherein the material conveying mechanism and the substrate mechanism are disposed = true = sputtering chamber, The target mechanism is provided with a first target mechanism, a second target mechanism and a second target machine, and the substrate mechanism is provided with a rotation and a revolving mechanism. , the re-inventory of the f--the purpose of the 'Beifu Xiaojiao-jianjian glass molds, the method includes the following steps: The core substrate is mounted on the substrate mechanism of the vacuum sputtering machine; The metal oxide recording materials and stone miscellaneous materials are respectively installed in the vacuum sputtering machine - the first crane, the second machine is provided on the "Mr machine; the vacuum in the vacuum money plating machine; the opening of the lining, the oxidization of the surface And a fine layer on the substrate: a composite layer in which the insulating metal oxide layer is between the precious metal layer and the diamond-like film layer, and the step of the composite layer is continued until a plurality of composite layers are formed. At the end of the mold base material, the molded glass mold core can be obtained. The Chengxi It can also be equipped with a plurality of permanent magnets on the dry material mechanism of the vacuum reducer, and the private field of the permanent magnet shape can increase the key reduction rate. Vacuum magnetron deplating can make the splashing clock substrate and the target's uncles tightly combined, «the sputter layer of the shaft. = The conventional technology, this model glass mold core has a multi-layer composite layer, which can withstand the high temperature and high pressure environment. And the composite layer is tightly bonded to the substrate, so This hair j Lai Ren "higher 槪 _ seam. Tree day shaped splashing forging machine t loaded plural Wei material' and the plural number of materials can be _ different materials f, it can be used in a different layer of the test shirt layer, Moreover, since the film layers are not broken, the splash is saved, and the substrate of the true-line clock machine of the present invention can be sputter-rotated and revolved to make the thickness of the film uniform. [Common application method] The present invention is applicable to a molded glass mold core and a manufacturing field thereof. Referring to the -?, the molded glass core of the present invention comprises a substrate 10 and a t composite layer 12, and the composite layer 12 includes - Guijinlang 12G, insulating metal oxide = layer 122 and diamond-like film layer 124', wherein the insulating metal oxide layer 122 is between the shell metal layer 120 and the diamond-like film layer 124. To achieve a better molding cycle life The number of layers of the composite layer 12 may be (four) layers, preferably 5_1 layers. The noble metal layer 12. The noble metal may be silver, #, bismuth or an alloy thereof, and the thick metal layer of the shell metal layer 120 is 3-1G angstrom ( AngStrom). The insulating metal oxide layer of the insulating metal oxide layer 122 is Zr〇2_xY2〇3, wherein the weight percentage is The enthalpy is 315%, preferably should be 5.8%, and the insulating gold oxide layer of the insulating metal oxide layer 122 can also be ZKVxYaiVyAl2. 3, the weight percentage χ is 3] 5%, preferably should be 5 8%, and the weight is 100%. y is 3-5% The 'other' insulating metal oxide layer 122 may also be at 3. The insulating metal oxide layer 122 has a thickness of 20·50 angstroms, and the diamond-like film layer 124 has a thickness of 40-80 angstroms. In addition, the diamond-like film layer 124 can also be replaced by a material such as melon, BN 'WC or BCN having the same effect. ^ Referring to the second figure, the molded glass manufacturing apparatus of the present invention is a vacuum sputtering machine 2, The vacuum machine 2 packs the domain line, the m mechanism 22 and the Newlin (not shown). The target mechanism 22 and the substrate mechanism are installed in the vacuum sputtering chamber, and the material mechanism 22 is disposed in the vacuum, and the end of the cavity is provided with a first material mechanism and a second material mechanism 222. The third target mechanism 223. The first target mechanism 221 can mount a target having a diameter of about 1-2 inches = (2.45 = 9 cm), and the second target mechanism 222 and the third target mechanism 223 can be mounted with a diameter of 4·8 (9). '8·19.6 ® m) Decai, Sanlin machine has a plurality of air inlets 27, which can uniformly pass an inert gas such as argon into the vacuum sputtering chamber 1362368. Connected with DC power = the upper connection has the axis _ source, the first line 13.5 mine, its electricity ° where 'the frequency of the RF power supply (four) fine picture, the RF power source 28 generates the RF source through the common trigger (four) coffee Ex 2 magic, voltmeter 284 after 8 (four)% supply to m = 15〇_5〇〇m;; ^« 200:500W 5 2〇^〇〇〇W ^ Hao If as shown in the third figure, for the increase of money At the rate, each woman's body is also equipped with a permanent magnet 26' to form a magnetic field perpendicular to the electric field, and (4) to accelerate the rate of sputtering the particles to the material of the _ _ (Qing, can also be _ ferrite nickel chrome s gold (ship 〇 >), rare earth alloy, and other magnetic materials. At the same time, in order to prevent electromagnetic interference ^ each pure mechanism depends on the ground shield cover 25. The temperature of the New York record material should be in each A cooling water pipe (not shown) is disposed behind the mechanism, and the substrate mechanism is located at the end opposite to the material mechanism in the vacuum=the substrate mechanism is provided with a plurality of substrate positions, and the same material body also has a rotation And the revolving mechanism (not shown) controls the rotation and revolving of the substrate mechanism. 'Please refer to the same figure and the second figure. The manufacturing method of the molded glass rayon of the present invention is to use the above-mentioned true plating machine 2 to manufacture the molded glass mold core. 1, comprising the steps of: mounting the mold base material 10 on the substrate mechanism of the vacuum sputtering machine 2; installing the precious metal dry material, the insulating metal oxide dry material and the graphite light material in the vacuum drench; 'spraying the vacuum A vacuum is applied in the plating machine; the precious metal layer 120, the insulating metal oxide layer 122 and the diamond-like film layer 124 are sequentially sputtered to form a composite layer 12 on the substrate 1 , wherein the insulating metal oxide layer 122 is in the precious metal layer 120 and the diamond-like film. Between the layers 124; continue to sputter until the specified plurality of composite layers 12 are reached; finally, the molded glass molds i can be obtained. Before the vacuum sputtering, platinum (Pt), iridium (Ir), iridium (Re), etc. Light metal installation of precious metals or their alloy materials The first target mechanism 221 mounts a target selected from an insulating metal oxide material such as Zr02-xY2〇3, 6 into the first target mechanism 222', and is selected from the group consisting of graphite, wc, bn, and b materials. The three-material mechanism 223 installs the substrate to be plated 1() on the base of the substrate machine, and then vacuums the vacuum chamber. When the gold: (4) reverse ===== the mixture to ai_1Pa 'then Open the third material mechanism 223 on the Newlin on the rotation and revolution 6 mold made of Lai Lai has a multi-layer composite layer, can withstand the high-level layer of the molded glass (4), the forest to lose money glass mold:, ίΐΐ ί ^ί ring times. The vacuum machine of the invention can be installed with a plurality of trainings Wf', so that it can be ignited in the process of money plating, and the layers between the layers are not oxidized due to vacuum breaking, and the nucleus can be rotated and read. M invention meets the requirements of the invention, and the new one is requested. However, W 士 ΐ ΐ is only a preferred embodiment of the present invention, and those who are familiar with the skill of the present invention, in the scope of interest, the singularity of the sacred sacred _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ A schematic view of the structure of the molded glass mold of the present invention; the first diagram is a cross-sectional view of the vacuum sputtering machine of the present invention; and the second is a magnet design diagram of the target mechanism of the vacuum sputtering machine of the present invention; RF power circuit design diagram in vacuum sputtering machine. [Main component symbol description] 1362368 Molded glass mold 1 substrate 1 composite layer 12 precious metal layer 120 Insulated metal oxide layer 122 diamond film layer 124 Vacuum splashing machine 2 Target mechanism 22 First target mechanism 221 Second Target mechanism 222 Third target mechanism 223 Ground shield 25 Permanent magnet 26 Air inlet 27 RF generator 28 Common trigger 281 Capacitor 282 Inductance 283 Voltmeter 284 8