TWI357159B - Method of manufacturing solar cell without removin - Google Patents

Description

1357159 IX. Description of the Invention: [Technical Field] The present invention relates to a method for manufacturing a solar cell without removing a doping material and a solar cell formed using the method, and more particularly to a method for chemical vapor deposition The substrate is doped and a method of forming an anti-reflection coating is formed on the substrate. [Prior Art] A solar cell is an energy-converting photovoltaic element that converts light energy into electrical energy after being irradiated by sunlight. This photovoltaic element is called a solar cell. From a physics point of view, some people call it Photovoltaic (PV) batteries. Conventional solar cells are fabricated by doping and diffusion on a Shihwa wafer to form an oxide. At the same time of diffusion, it will form Phosphate Silicon Glass (PSG) or shed stone glass.

(Boron Phosphate Silicon Glass, BPSG). Both PSG and BPSG are by-products of the process, so conventional techniques usually have a process to remove PSG or BPSG. Next, Atmospheric Pressure Chemical Vapor Deposition (APCVD) or low pressure chemical gas Phase deposition (l〇w pressure chemical Vapor Deposition 'LPCVD) to form a tantalum nitride layer, or a composite layer of tantalum oxide, tantalum nitride and hafnium oxynitride is formed as an anti-reflection coating. Then, carry out the traditional screen printing (screen

Printing) to form a pattern of electrodes on the wafer. 5 1357159 However, in the process of the conventional solar cell described above, the number of steps required is too large and time consuming. Therefore, how to reduce the number of steps in the manufacturing method of the solar cell to save time and cost is the problem to be solved in the present case. [Summary of the Invention]

Accordingly, it is an object of the present invention to provide a method for fabricating a solar cell free of doped material and a solar cell formed using the method, wherein the substrate is doped by chemical vapor deposition and applied to the S-substrate An anti-reflective coating is formed. In order to achieve the above object, the present invention provides a method for manufacturing a solar cell without removing a doping material, comprising the steps of: providing a plate. depositing a layer of a doped material on a substrate by chemical vapor deposition; The substrate and the doped material layer are baked to form a doped region in the substrate while forming an anti-reflective coating on the substrate.

In order to make the above-described embodiments of the present invention more comprehensible, and in conjunction with the accompanying drawings, FIG. [Embodiment] FIG. 1 is a flow chart showing a method of fabricating solar power according to a preferred embodiment of the present invention. Fig. 2纟4 shows a schematic diagram of a method for manufacturing a solar cell of (4) m j .住 细 细 Please refer to Figure 1 and Figures 2 to 4 for the production method of the solar cell of the miscellaneous materials. In order to achieve the success of online automated production, this embodiment illustrates the entire operation flow by means of the transmission method of the device 1 (e.g., conveyor belt).

Alternatively, the mechanical wall A can be used to achieve the purpose of moving the substrate. First, in step si, the slave is supplied to a substrate. The substrate 丨〇 is usually a P-type 夕 基板 substrate, but it may also be a . 矽 type 矽 substrate. The substrate 1 is mounted on the transport apparatus 1, and the substrate 1 is transported to the chemical vapor deposition apparatus 2 after the end. Next, in step S2, a chemical layer is used in the chemical fluorine phase deposition apparatus 2 to deposit a doping material layer on the substrate 1 〇μ, 士 amp ^ 土 土 傲 傲 化学 化学 化学 化学The material package will be f 6 4 J π 匕 3 (4) Phosphorus glass (ph〇sphate siHc〇n

GlaSS 'PSG) or rotten disc stone glass (B〇r〇n ph〇sphate siHc〇n Gl^ BPSG) '(b)Silane (Silane); (4) oxygen; and (4) nitrogen or ammonia 1 The material of the doped material layer 2G comprises a glass or a dome glass. These materials may be supplied to one chamber 5 of the chemical vapor deposition apparatus 2 by one or a plurality of nozzles 4 in the present embodiment, and the chemical vapor deposition system is atmospheric pressure chemical vapor deposition (Atmospheric Pressure Chemical Vap〇). r Dep〇siti〇n, APCVD) or low pressure chemical vapor deposition (L〇w Bu (1) order - ^

Vapor Deposition, LPCVD). However, the invention is not limited to this. Other chemical vapor deposition methods can also be used. Then, the transporting apparatus i moves the substrate 10 from the chemical vapor deposition apparatus 2 to a bakeware apparatus (generally referred to as a furnace tube) 3 for baking step S3. In step S3, the substrate 10 and the doping material layer 2 are baked to form a doping region 12 in the substrate 10, and an anti-reflective coating 30 is formed on the substrate 10. The baking step can achieve diffusion doping. The effect of the impurity, ^ can simultaneously form the anti-reflective coating 30, thereby improving the efficiency of the solar cell. 7 1357159 It is worth noting that in order to more clearly show the structure of the solar cell, the substrate 10, the transport device 丨, the chemical vapor deposition device 2, and the baking device 3 are not drawn according to the actual scale. From the materials exemplified above, it is known that the reaction of decane with oxygen produces a oxidized layer as a dielectric layer. The reaction of methane with nitrogen or ammonia produces gas oxidization as the main material for anti-reflective coatings. Therefore, the anti-reflective coating 30 is a composite layer composed of a nitrogen oxide, a tantalum nitride and a niobium monoxide, and the anti-reflective coating 30 contains phosphor haze or borophosphon glass. Then, 'the screen printing process and the subsequent process similar to the prior art' are not described in detail here. Therefore, the solar cell formed by the manufacturing method of the present invention comprises the substrate 10 and the anti-reflection coating 30. The substrate 10 has a doped region 12 thereon. The anti-reflective coating 30 is on the substrate 1 and the doped region 12 is adjacent to the anti-reflective coating 30. The anti-reflective coating 30 contains phosphorous or borophosphorus glass. In summary, the solar cell of the present invention includes psG or BPSG, and the prior art requires the removal of pSG or BpSG. Moreover, the formation of the doped and anti-reflective coating is completed in the same step, which can effectively simplify the production process and reduce the manufacturing cost. The specific embodiments of the present invention are intended to be illustrative only and not to limit the invention to the above embodiments, without departing from the spirit of the invention and the following claims. In the case of the scope, various changes are made and are within the scope of the invention. ^ 8 [Simplified description of the drawings] Fig. 1 is a flow chart of a method for cutting a solar cell according to a preferred embodiment of the present invention. Fig. 2 is a schematic view showing a method of manufacturing a solar cell according to a preferred embodiment of the present invention. Lg| * A schematic diagram 2 of a method for fabricating a solar cell according to a preferred embodiment of the present invention.

4 Schematic diagram of the method [Description of main component symbols] Conveying equipment 2 3 4 5 Chemical vapor deposition equipment Baking equipment Nozzle Chamber 10 : Substrate

12: doped region 2 (): doped material layer 30: anti-reflective coating

Sl to S3; method step 9

Claims (1)

1357159 8August 29, 100 Supplementary amendments. Patent application scope: 1. A method for manufacturing a solar cell without removing a doping material, comprising the steps of: providing a substrate; and depositing the substrate by chemical vapor deposition Depositing a doped material layer thereon; and baking the substrate and the doped material layer to form a doped region in the substrate while forming an anti-reflective coating on the substrate. <2. The method of manufacturing a solar cell without removing a doping material according to claim 1, wherein the material of the doping material layer comprises Phosphate Silicon Glass (PSG) or borophosphonium The method for manufacturing a solar cell without removing a doping material according to claim 1, wherein the material used for depositing the doping material layer comprises: ) 矽 methane (Silane); | (b) oxygen; and (c) nitrogen or ammonia. 4. The method for manufacturing a solar cell without removing a doping material according to claim 1, wherein the material used for the chemical vapor deposition comprises: (a) Phosphate Silicon Glass (PSG); (b) Silane; (c) Oxygen; and (d) Air or ammonia. 1357159 Aug. 29, 2010 Supplementary Amendment 5. The method of manufacturing a solar cell for removing a doped material according to claim 1, wherein the material used for the chemical vapor deposition comprises: (a) a scale Boran ph〇Sphate Silicon Glass (BPSG); (b) Silane; (c) Oxygen; and (d) Nitrogen or ammonia. 6. The method of manufacturing a solar cell excluding a doping material according to claim 1, wherein the chemical vapor deposition is Atmospheric Pressure Chemical Vapor Deposition (APCVD) or low pressure. The method of manufacturing a solar cell without removing a doping material according to claim 1, wherein the substrate is from a chemical vapor deposition device. Move to a baking device to perform the baking step. 8. The solar cell of claim 1, wherein the antireflective coating is a composite layer composed of a nitrogen oxide, a tantalum nitride, and hafnium oxide. 9. The solar cell of claim 1, wherein the anti-reflective coating comprises Phosphate Silicon Glass (PSG) or Boron Phosphate Silicon Glass (BPSG). 10. A solar cell comprising: a substrate having a doped region; and 1357159 supplemented with an anti-reflective coating on the substrate on August 29, 100, the adjacent region being adjacent to the anti-reflective coating a layer, wherein the anti-reflective coating comprises Phosphate Silicon Glass (PSG) or B ron Phosphate Silicon Glass (BPSG) 〇 11. As described in claim 1 The solar cell, wherein the anti-reflective coating is a composite layer composed of a nitrogen oxide, a tantalum nitride and niobium monoxide.