TWI349773B - Method of x-ray reflectance measurement - Google Patents

Method of x-ray reflectance measurement

Info

Publication number
TWI349773B
TWI349773B TW094108332A TW94108332A TWI349773B TW I349773 B TWI349773 B TW I349773B TW 094108332 A TW094108332 A TW 094108332A TW 94108332 A TW94108332 A TW 94108332A TW I349773 B TWI349773 B TW I349773B
Authority
TW
Taiwan
Prior art keywords
reflectance measurement
ray reflectance
ray
measurement
reflectance
Prior art date
Application number
TW094108332A
Other languages
English (en)
Other versions
TW200537090A (en
Inventor
Omote Kazuhiko
Original Assignee
Rigaku C0Rporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku C0Rporation filed Critical Rigaku C0Rporation
Publication of TW200537090A publication Critical patent/TW200537090A/zh
Application granted granted Critical
Publication of TWI349773B publication Critical patent/TWI349773B/zh

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/06Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
    • G01N23/083Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
    • G01N23/085X-ray absorption fine structure [XAFS], e.g. extended XAFS [EXAFS]
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01TMEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16Measuring radiation intensity
    • G01T1/24Measuring radiation intensity with semiconductor detectors
    • G01T1/242Stacked detectors, e.g. for depth information

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Toxicology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Radiation (AREA)
TW094108332A 2004-03-22 2005-03-18 Method of x-ray reflectance measurement TWI349773B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004081880A JP4041808B2 (ja) 2004-03-22 2004-03-22 X線反射率の測定方法

Publications (2)

Publication Number Publication Date
TW200537090A TW200537090A (en) 2005-11-16
TWI349773B true TWI349773B (en) 2011-10-01

Family

ID=34858361

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094108332A TWI349773B (en) 2004-03-22 2005-03-18 Method of x-ray reflectance measurement

Country Status (5)

Country Link
US (1) US7221734B2 (zh)
EP (1) EP1580546B1 (zh)
JP (1) JP4041808B2 (zh)
KR (1) KR100994253B1 (zh)
TW (1) TWI349773B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7848483B2 (en) * 2008-03-07 2010-12-07 Rigaku Innovative Technologies Magnesium silicide-based multilayer x-ray fluorescence analyzers
JP2013024721A (ja) * 2011-07-21 2013-02-04 Seiko Epson Corp 振動ジャイロ素子、ジャイロセンサー及び電子機器
EP3550292B1 (en) 2016-11-29 2021-10-27 Rigaku Corporation X-ray reflectometer

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3329197B2 (ja) 1996-07-19 2002-09-30 株式会社日立製作所 薄膜積層体検査方法
JP3846762B2 (ja) 1998-02-19 2006-11-15 株式会社リガク X線測定装置における測定データ処理方法
JP2004037360A (ja) 2002-07-05 2004-02-05 Univ Tohoku 高速蛍光x線検出システム

Also Published As

Publication number Publication date
EP1580546A1 (en) 2005-09-28
EP1580546B1 (en) 2013-09-18
JP4041808B2 (ja) 2008-02-06
TW200537090A (en) 2005-11-16
JP2005265742A (ja) 2005-09-29
US20050207532A1 (en) 2005-09-22
KR100994253B1 (ko) 2010-11-12
KR20060044502A (ko) 2006-05-16
US7221734B2 (en) 2007-05-22

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