TWI345798B - Plasma display panel device - Google Patents

Plasma display panel device Download PDF

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TWI345798B
TWI345798B TW94125756A TW94125756A TWI345798B TW I345798 B TWI345798 B TW I345798B TW 94125756 A TW94125756 A TW 94125756A TW 94125756 A TW94125756 A TW 94125756A TW I345798 B TWI345798 B TW I345798B
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refractive index
unit
display device
plasma display
index film
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TW94125756A
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TW200705504A (en
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Ga-Lane Chen
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Hon Hai Prec Ind Co Ltd
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1345798 __ 100年05月05日 六、發明說明: 【發明所屬之技術領域】 ⑽01] 本發明涉及一種平面顯示裝置,尤其係一種電漿顯示裝 置。 [先前技術3 [0002]近年來’平面顯示裝置發展迅速,已廣泛應用於個人電 腦、移動通訊及消費性電子產品等領域,成為資訊技術 之一大平台》目前應用較為普遍之平面顯示裝置有電漿 顯示裝置(PDP)、液晶顯示裝置(LCD)及場發射顯示裝置 (FED)。其中’電漿顯示裝置與其他平面顯示裝置相比, 具有厚度薄、重量輕、屏幕亮度均勻、•響應速度快、視 角寬' 解析度高及無X線輻射等優點,且易於製作成完全 平面超大屏幕(40英吋以上)。 _3]電漿顯$裝置係—種利職體放電的顯示裝置,屏幕採 用電毁管作為發光元件,大量的電衆管排列在一起構成 屏幕,每個電漿對應的每個小室内充有氦氙或氖氙等惰 氣體在電漿管之電極間加上高電壓,封在電聚小室 中的惰性氣體產生紫外線激勵顳示屏上的紅(Red)、綠 (G^en)、藍(Blue)三原色螢光層發出可見光。每個電 漿管作為-個像素,由這祕素的明暗和顏色變化組合 使電_示裝置產生各種灰度和彩色的圖像。 [0004] 094125756 與紅光、綠光相比,藍光波長較為接近紫外線波長故 ,藍光螢光層容易受到紫外線之影響,在較高溫度和紫 外線直接照射之環境下,藍光螢光層之發光效率會受到 胃’從而使藍光發光強度降低’ RGB三原色以不同發光 A0101 ® 4 頁/共 15 頁 1003156983-0 100年05月05日核正替换頁 1345798 強度進行混合從而使得顯示效果較差,進而影響電漿顯 示裝置之顯示效果。 [0005] 因此,提供一種確保藍光螢光層發光效率之電漿顯示裝 置實為必須。 【發明内容】 [0006] 以下,將以實施例說明一種確保藍光螢光層發光效率之 電漿顯示裝置。 λ [0007] 為實現上述實施例内容,提供一種電漿顯示裝置,該電 漿顯示裝置包括一上基板及一下基板,其中,上基板上 設有透明介電層、顯示電極及掃描電極,下基板正對上 基板的一面上設有地址電極及紅、綠、藍光螢光層,該 藍光螢光層表面設有光學單元,該光學單元包括複數第 一單元及複數設置於第一單元之上之第二單元,該第一 單元、第二單元均由高折射率與低折射率薄膜組成,該 第一單元、第二單元中高、低折射率薄膜之基準厚度為 /41·^、j/4n2,其中j為參考波長,η,為高折射率 薄膜之折射率、η2為低折射率薄膜之折射率,該參考波 長 j 為 2 00nm~380nm。 [0008] 相較於先前技術,本實施例電漿顯示裝置的藍光螢光層 上塗佈有複數高折射率薄膜及低折射率薄膜,該複數薄 膜可有效防止紫外線直接照射至藍光螢光層上,藍光螢 光層的發光強度不會因紫外線照射和溫度的升高而降低 ,從而使藍光螢光層之發光效率不會受影響。 094125756 表單編號A0101 第5頁/共15頁 1003156983-0 1345798 100年05月。5日修正 【實施方式】 1 [0009] 請參閱第一圖及第二圖,本發明實施例提供一種電漿顯 不裝置1,該電漿顯示裝置1包括上基板u '下基板12, 上基板11及下基板12均由玻璃製成。 [0010] 上基板11面向電漿顯示裝置1内部的表面上形成有透明介 電層15,該透明介電層15内嵌有顯示電極丨3及掃描電極 14,緊貼透明介電層15設有保護層16 ^該顯示電極η及 掃描電極14之材料一般為Cr、Cu或Ag,該透明介電層a 之材料一般為ITO或Sn〇2,該保護層16之材料一般為Mg〇 〇 [0011] 下基板12正對上基板11之表面上形成有絕緣層18,絕緣 層18内設有地址電極17,而在絕緣層18表面形成有與地 址電極17相間之障壁19,絕緣層18與障壁19所形成之凹 槽内塗有螢光層10 ’該螢光層10包括紅光螢光層1〇1、綠 光螢光層102及藍光螢光層1〇3,該障壁19之材料一般為 S i 〇2。保護層16與絕緣層18所形成之空間1 68内密封有 惰性氣體,該惰性氣體為氦氙或氖氙氣體。 [0012] 當顯示電極13與掃描電極14之間施加相應電壓時,顯示 電極13與掃描電極14之間電場效應會使惰性氣體放電產 生紫外線,紫外線經紅、綠、藍光螢光層1(Π、1〇2、 103而發出可見光,通過上基板11即可看見其發出之光線 [0013] 其中,紅光螢光層101之組成物質包括γ 〇 :Eu2+、 2 3 YB〇3:Eu3+ ' GdB〇3:Eu3+,綠光螢光層102組成物質包括 Zn2Si〇4:Mn2+、ZnSi〇x:Mn2 +或摻Mn2 +的多铭酸鹽,藍 094125756 表單編號A0101 第6頁/共15頁 丨如, 1345798 光螢光層103組成物質包括BaMgA 10 X1 1〇〇年05月05日 :Eu2+ 、 梭正1345798 __ 100/05/05 05. Description of the Invention: [Technical Field of the Invention] (10) 01 The present invention relates to a flat display device, and more particularly to a plasma display device. [Prior Art 3 [0002] In recent years, 'flat display devices have developed rapidly, and have been widely used in the fields of personal computers, mobile communications, and consumer electronic products, and have become one of the most popular platforms for information technology. A plasma display device (PDP), a liquid crystal display device (LCD), and a field emission display device (FED). Among them, the plasma display device has the advantages of thin thickness, light weight, uniform screen brightness, fast response, wide viewing angle, high resolution and no X-ray radiation, and is easy to make a completely flat surface. Large screen (40 inches or more). _3]The plasma display device is a display device for the discharge of the occupational body. The screen uses the electric destructive tube as the light-emitting element, and a large number of electric tubes are arranged to form a screen, and each small chamber corresponding to each plasma is filled. An inert gas such as helium or neon is applied with a high voltage between the electrodes of the plasma tube, and the inert gas enclosed in the electropolymer chamber generates ultraviolet (Red), green (G^en), blue on the ultraviolet excitation screen. (Blue) The three primary color fluorescent layers emit visible light. Each of the plasma tubes acts as a pixel, and the combination of light and dark and color variations of the secrets causes the electro-display device to produce various grayscale and color images. [0004] 094125756 Compared with red light and green light, the blue light wavelength is closer to the ultraviolet wavelength, so the blue fluorescent layer is easily affected by ultraviolet light, and the luminous efficiency of the blue fluorescent layer is higher under the environment of direct irradiation of higher temperature and ultraviolet light. Will be affected by the stomach 'so that the blue light intensity is reduced' RGB three primary colors with different illumination A0101 ® 4 pages / a total of 15 pages 1003156983-0 100 years of May 5th nuclear replacement page 1345798 intensity mixing to make the display effect is poor, and thus affect the electricity The display effect of the slurry display device. Accordingly, it is essential to provide a plasma display device that ensures luminous efficiency of a blue phosphor layer. SUMMARY OF THE INVENTION [0006] Hereinafter, a plasma display device that ensures luminous efficiency of a blue fluorescent layer will be described by way of embodiments. λ [0007] In order to achieve the above embodiments, a plasma display device is provided. The plasma display device includes an upper substrate and a lower substrate. The upper substrate is provided with a transparent dielectric layer, a display electrode and a scan electrode. An address electrode and a red, green and blue fluorescent layer are disposed on a side of the substrate facing the upper substrate, and an optical unit is disposed on the surface of the blue fluorescent layer, the optical unit includes a plurality of first units and a plurality of the plurality of units are disposed on the first unit The second unit, the first unit and the second unit are each composed of a high refractive index and a low refractive index film, and the reference thickness of the high and low refractive index films in the first unit and the second unit is /41·^, j/ 4n2, where j is the reference wavelength, η is the refractive index of the high refractive index film, and η2 is the refractive index of the low refractive index film, and the reference wavelength j is 200 nm to 380 nm. Compared with the prior art, the blue fluorescent layer of the plasma display device of the embodiment is coated with a plurality of high refractive index films and a low refractive index film, and the plurality of films can effectively prevent ultraviolet rays from directly irradiating to the blue fluorescent layer. On the upper side, the luminous intensity of the blue fluorescent layer is not lowered by the ultraviolet irradiation and the temperature, so that the luminous efficiency of the blue fluorescent layer is not affected. 094125756 Form No. A0101 Page 5 of 15 1003156983-0 1345798 May of May. 5D MODIFICATION [Embodiment] 1 [0009] Please refer to the first figure and the second figure. The embodiment of the present invention provides a plasma display device 1 including an upper substrate u'the lower substrate 12, Both the substrate 11 and the lower substrate 12 are made of glass. A transparent dielectric layer 15 is formed on the surface of the upper substrate 11 facing the interior of the plasma display device 1. The transparent dielectric layer 15 has a display electrode 3 and a scan electrode 14 embedded therein, and is disposed adjacent to the transparent dielectric layer 15. The material of the display electrode η and the scan electrode 14 is generally Cr, Cu or Ag, and the material of the transparent dielectric layer a is generally ITO or Sn 〇 2, and the material of the protective layer 16 is generally Mg 〇〇 [0011] The insulating substrate 18 is formed on the surface of the lower substrate 12 facing the upper substrate 11, the address electrode 17 is disposed in the insulating layer 18, and the barrier 19 is formed on the surface of the insulating layer 18 with the address electrode 17, and the insulating layer 18 is formed. The recess formed by the barrier 19 is coated with a phosphor layer 10'. The phosphor layer 10 includes a red phosphor layer 1〇1, a green phosphor layer 102, and a blue phosphor layer 1〇3. The material is generally S i 〇2. An insulating gas is sealed in the space 168 formed by the protective layer 16 and the insulating layer 18, and the inert gas is helium or neon. [0012] When a corresponding voltage is applied between the display electrode 13 and the scan electrode 14, the electric field effect between the display electrode 13 and the scan electrode 14 causes the inert gas to discharge ultraviolet rays, and the ultraviolet rays pass through the red, green, and blue phosphor layers 1 (Π , 1, 2, 103 emit visible light, the light emitted by the upper substrate 11 can be seen [0013] wherein the composition of the red fluorescent layer 101 includes γ 〇: Eu2+, 2 3 YB 〇 3: Eu3 + ' GdB 〇3: Eu3+, the green fluorescent layer 102 consists of Zn2Si〇4: Mn2+, ZnSi〇x: Mn2 + or Mn2+ doped polysilicate, blue 094125756 Form No. A0101 Page 6 of 15 , 1345798 Light luminescent layer 103 composition including BaMgA 10 X1 1〇〇 05 May: Eu2+, Shuttle

CaMgSi〇x2:Eu2+、BaMgAl1〇〇i7:Eu2+或其他摻肫2+的多 鋁酸鹽,其中,X之取值為1或2,xl之取值為1、2或3, x2之取值為1或2。 [0014] 藍光螢光層103表面設有光學單元20,該光學單元2〇包括 複數第一早元21及複數第二單元22,該第_單元21丘七 組,第一早元22共六組,六組第二單元22疊加於七組第 一單元21之上,即七組第一單元21位於藍光螢光層1〇3與 第二單元22之間。 [0015] 第一單元21由兩層薄膜組成’分別為高折射率薄膜211與 低折射率薄膜212,第二單元22亦由兩層薄膜組成,分別 為高折射率薄膜221與低折射材料薄膜222,故,光學單 元20共包括二十六層薄膜。 [0016] 高折射率薄膜211、低折射率薄膜212之基準厚度分別計 為Η、L,其中’ H= 2 /4n〗、L= j /4n2,其中,』為一 參考波長(參考波長2為200nm〜380nm),、為高折射 材料薄膜之折射率、n2為低折射率薄膜之折射率。 [0017] 第早元21之南折射率薄膜211及低折射率薄膜212之實 際厚度分別為基準厚度與一厚度係數之乘積,該厚度係 數均為1。 第一單元22之高折射率薄膜221、低折射率薄膜222之基 準厚度亦分別為Η、L,其實際厚度分別為基準厚度與一 厚度係數之乘積,其中,該厚度係數均為〇 76。 094125756 表單編號Α0101 第7貝/共15頁 1003156983-0 [0018] 1345798 100年 05月 05 [0019] 高折射率薄膜211、221之材料可選用TiO ,則n =2. 705 ^ 1 ;低折射率薄膜212、222之材料可選用Si〇2,則 n2 = l. 499。待參考波長(選定後(取值範圍為 200nm~380nm) ’則Η、L的數值即可禮定,光學單元2〇 各層之具體排佈如表1-1所示。 [〇〇2〇] 表1-1光學單元20的結構及各層厚度CaMgSi〇x2: Eu2+, BaMgAl1〇〇i7: Eu2+ or other erbium-doped 2+ polyaluminate, wherein X has a value of 1 or 2, and xl has a value of 1, 2 or 3, and the value of x2 It is 1 or 2. [0014] The surface of the blue fluorescent layer 103 is provided with an optical unit 20, the optical unit 2 includes a plurality of first early elements 21 and a plurality of second units 22, the first unit 21, seven groups, the first early 22, a total of six The six groups of second units 22 are superimposed on the seven groups of first units 21, that is, seven groups of first units 21 are located between the blue phosphor layer 1〇3 and the second unit 22. [0015] The first unit 21 is composed of two layers of films, respectively, a high refractive index film 211 and a low refractive index film 212, and the second unit 22 is also composed of two layers of films, respectively a high refractive index film 221 and a low refractive material film. 222. Therefore, the optical unit 20 includes a total of twenty-six layers of film. [0016] The reference thicknesses of the high refractive index film 211 and the low refractive index film 212 are respectively calculated as Η, L, where 'H=2 /4n〗, L=j /4n2, where 』 is a reference wavelength (reference wavelength 2 It is 200 nm to 380 nm), which is the refractive index of the high refractive material film, and n2 is the refractive index of the low refractive index film. [0017] The actual thicknesses of the south refractive index film 211 and the low refractive index film 212 of the early element 21 are respectively the product of the reference thickness and a thickness coefficient, and the thickness coefficients are all 1. The reference thicknesses of the high refractive index film 221 and the low refractive index film 222 of the first unit 22 are also Η, L, respectively, and the actual thickness thereof is the product of the reference thickness and a thickness coefficient, respectively, wherein the thickness coefficient is 〇 76. 094125756 Form No. Α0101 No. 7 / A total of 15 pages 1003156983-0 [0018] 1345798 100 May 2005 [0019] The material of the high refractive index films 211, 221 can be selected from TiO, then n = 2. 705 ^ 1; low refraction The material of the film 212, 222 can be selected from Si 〇 2, then n2 = l. 499. After the wavelength is selected (after the selection (value range is 200nm~380nm)', the values of Η and L can be ceremonially set. The specific arrangement of each layer of the optical unit 2 is shown in Table 1-1. [〇〇2〇] Table 1-1 Structure of the optical unit 20 and thickness of each layer

長在400〜650nm範圍内的可見光通過率大於9〇%之條件 下,通過電腦模擬仿真對光學單元2〇進行優化,即為對 高折射率薄膜211、221及低折射率薄膜212、222的厚度 係數進行優化,得到一最佳的光學單元2〇的結構。本數 094125756 表單编號A0101 第8頁/共15頁 1003156983-0 1345798 100年05月05日核正替換頁 據模擬過程,選取參考波長為320nm、高折射率薄膜212 、222之材料為Ti〇2、低折射率薄膜211、221之材料為 2 A 1 2 H = 320/(4x2. 705)、L = 320/(4xl. 499)。優化後的光學 單元20的結構如表1-2所示。 [0022] 表1-2優化後的光學單元20的結構及各層厚度The optical unit 2 is optimized by computer simulation under the condition that the visible light transmittance in the range of 400 to 650 nm is greater than 9〇%, that is, the high refractive index films 211 and 221 and the low refractive index films 212 and 222 are The thickness coefficient is optimized to obtain an optimum optical unit 2〇 structure. The number 094125756 Form No. A0101 Page 8 / Total 15 Page 1003156983-0 1345798 On May 5, 100, the replacement page is selected. According to the simulation process, the reference wavelength is 320 nm, and the material of the high refractive index films 212 and 222 is Ti〇. 2. The material of the low refractive index films 211 and 221 is 2 A 1 2 H = 320/(4x2. 705), L = 320/(4xl. 499). The structure of the optimized optical unit 20 is shown in Table 1-2. [0022] Table 1-2 Structure of the optimized optical unit 20 and thickness of each layer

層數 厚度 層數 厚度 1 0.372H 14 0.973L 2 1.203L 15 0.698H 3 0.849H 16 0.764L 4 0.962L 17 0.477H 5 1.064H 18 0.818L 6 0·967L 19 0.787H 7 1.048H 20 0.679L 8 1.011L 21 , 0.822H 9 1.045H 22 0.389L 10 0.988L 23 0.946H 11 1.061H 24 0.655L 12 0.960L 25 0.764H 13 1.017H 26 2. 183L 從上表可以看出,優化後的光學單元20結構中,第一單 元21中高折射率薄膜211優化後的厚度係數範圍為 0. 372〜1. 064,低折射率薄膜212優化後的厚度係數範圍 為0. 962〜1. 203。第二單元22中高折射率薄膜221優化 後的厚度係數範圍為0. 477〜0. 946,低折射率薄膜222優 094125756 表單編號 A0101 第 9 頁/共 15 頁 1003156983-0 1345798 ___- 100年05月05日核正替换頁 化後的厚度係數範圍為0. 389〜2. 183。 [0024] 另外,光學單元20不僅可以設置於藍光螢光層103上,亦 可以設置於整個螢光層10上。 [0025] 電漿顯示裝置1的藍光螢光層103上塗佈有複數高、低折 射率材料之薄膜,該薄膜可有效防止紫外線直接照射至 藍光螢光層103上,故,藍光螢光層103的發光強度不會 因紫外線照射和溫度的升高而降低,藍光螢光層103之光 效率不會受到影響,進而確保電漿顯示裝置1的顯示效果 〇 [0026] 综上所述,本發明符合發明專利要件,爰依法提出專利 申請。惟,以上所述者僅為本發明之較佳實施例,舉凡 熟悉本案技藝之人士,在援依本案精神所作之等效修飾 或變化,皆應包含於以下之申請專利範圍内。 【圖式簡單說明】 [0027] 第一圖係本發明實施例電漿顯示裝置之立體示意圖。 [0028] 第二圖係本發明實施例電漿顯示裝置之光學單元示意圖 〇 【主要元件符號說明】 [0029] 電漿顯示裝置:1 [0030] 螢光層:10 [0031] 上基板:11 [0032] 下基板:12 [0033] 顯示電極:1 3 094125756 表單編號A0101 第10頁/共15頁 1003156983-0 1345798 [0034] 掃描電極.14 [0035] 透明介電層:15 [0036] 保護層:16 [0037] 地址電極:17 [0038] 絕緣層:18 [0039] 障壁:19 [0040] 光學單元:20 [0041] 第一單元:21 [0042] 第二單元:22 [0043] 紅光螢光層:101 [0044] 綠光螢光層:102 [0045] 藍光螢光層:103 [0046] 空間:168 [0047] 高折射率薄膜:211、221 [0048] 低折射率薄膜:212、222 094125756 表單編號A0101 第11頁/共15頁 100年05月05日修正替換頁 1003156983-0Layer Thickness Layer Thickness 1 0.372H 14 0.973L 2 1.203L 15 0.698H 3 0.849H 16 0.764L 4 0.962L 17 0.477H 5 1.064H 18 0.818L 6 0·967L 19 0.787H 7 1.048H 20 0.679L 8 1.011L 21 , 0.822H 9 1.045H 22 0.389L 10 0.988L 23 0.946H 11 1.061H 24 0.655L 12 0.960L 25 0.764H 13 1.017H 26 2. 183L As can be seen from the above table, the optimized optical unit 20 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 。 The thickness coefficient of the high refractive index film 221 in the second unit 22 is in the range of 0. 477~0. 946, low refractive index film 222 excellent 094125756 Form No. A0101 Page 9 of 15 1003156983-0 1345798 ___- 100 years 05 389〜2. 183。 The thickness coefficient of the range of 0. 389~2. 183. In addition, the optical unit 20 may be disposed not only on the blue fluorescent layer 103 but also on the entire fluorescent layer 10. [0025] The blue fluorescent layer 103 of the plasma display device 1 is coated with a film of a plurality of high and low refractive index materials, and the film can effectively prevent ultraviolet rays from directly irradiating onto the blue fluorescent layer 103, so the blue fluorescent layer The luminous intensity of 103 is not lowered by the ultraviolet irradiation and the temperature rise, and the light efficiency of the blue fluorescent layer 103 is not affected, thereby ensuring the display effect of the plasma display device 1 [0026] In summary, this The invention meets the requirements of the invention patent, and the patent application is filed according to law. However, the above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be included in the following claims. BRIEF DESCRIPTION OF THE DRAWINGS [0027] The first figure is a perspective view of a plasma display device according to an embodiment of the present invention. 2 is a schematic diagram of an optical unit of a plasma display device according to an embodiment of the present invention. [Main component symbol description] [0029] Plasma display device: 1 [0030] Phosphor layer: 10 [0031] Upper substrate: 11 [0032] Lower substrate: 12 [0033] Display electrode: 1 3 094125756 Form number A0101 Page 10 / Total 15 page 1003156983-0 1345798 [0034] Scanning electrode. 14 [0035] Transparent dielectric layer: 15 [0036] Protection Layer: 16 [0037] Address electrode: 17 [0038] Insulation: 18 [0039] Barrier: 19 [0040] Optical unit: 20 [0041] First unit: 21 [0042] Second unit: 22 [0043] Red Light luminescent layer: 101 [0044] Green luminescent layer: 102 [0045] Blue luminescent layer: 103 [0046] Space: 168 [0047] High refractive index film: 211, 221 [0048] Low refractive index film: 212, 222 094125756 Form No. A0101 Page 11 of 15 Page 100 May 05 Correction Replacement Page 1003156983-0

Claims (1)

100年05月05日梭正替换頁 1345798 七、申請專利範圍 一種電漿顯示裝置,包括一上基板及一下基板,其中,上 基板上設有透明介電層、顯示電極及掃描電極,下基板正 對上基板的一面上設有地址電極及紅、綠、藍光螢光層, 其改良在於:該藍光螢光層表面設有光學單元,該光學單 元包括複數第一單元及複數設置於第一單元之上之第二單 元,該第一單元、第二單元均由高折射率與低折射率之薄 膜組成,該第一單元、第二單元中高、低折射率薄膜之基 準厚度為3 /4η /4η2,其中^為參考波長,1^為 高折射率薄膜之折射率、n2為低折射率薄膜之折射率,該 參考波長為200nm~380nm。 2. 如申請專利範圍第1項所述之電漿顯示裝置,其中該第一 單元之高、低折射率薄膜及第二單元之高、低折射率薄膜 之厚度為基準厚度與一厚度係數之乘積,其中,該厚度係 數範圍依次為0. 372~1. 064、0. 960~ 1. 203、 0.477〜0.946及0.389〜2.183 。 3. 如申請專利範圍第2項所述之電漿顯示裝置,其中該第一 單元之高、低折射率薄膜厚度係數及第二單元之高、低折 射率薄膜厚度之係數依次為1、1、〇. 76及0. 76。 4. 如申請專利範圍第3項所述之電漿顯示裝置,其中該參考 波長j為320nm。 5. 如申請專利範圍第1項所述之電漿顯示裝置,其中該第一 單元及第二單元之高折射率薄膜包括Ti〇2材料。 6. 如申請專利範圍第5項所述之電漿顯示裝置,其中該高折 094125756 射率薄膜之折射率2. 705。 表單編號A0101 第12頁/共15頁 1003156983-0 [^年05月05日核正替換i .如申請專利範圍第5項所述之電漿顯示裝置,其中該第一 單元及第二單元之低折射率薄膜包括Si〇2材料。 .如申請專利範圍第7項所述之電漿顯示裝置,其中該低折 射率薄膜之折射率為1. 499。 .如申請專利範圍第1項所述之電漿顯示裝置,其中該第一 單元之高、低折射率薄膜各有七層。 .如申請專利範圍第9項所述之電漿顯示裝置,其中該第二 單元之高、低折射率薄膜各有六層β .如申請專利範圍第1項所述之電漿顯示裝置,其中該藍光 螢光層包括BaMgAl1Q〇17:Eu2+、BaMgA10xl:E:u2+、 CaMgSi〇x2:Eu2+或其他摻Eu2 +的多鋁酸鹽,其中χ1之取 值為1、2或3,x2之取值為1或2。 •如申請專利範圍第1項所述之電漿顯示裝置,其中該紅光 螢光層包括Y2〇3:Eu2+、YB〇3:Eu3+或GdB〇3:Eu3+。 .如申請專利範圍第1項所述之電漿顯示裝置,其中該綠光 螢光層為Zn2Si〇4:Mn2+、ZnSi〇x:Mn2+或摻Mn2+的多鋁 酸鹽,其中X之取值為1或2。 表單編號A0101 第13頁/共15頁 1003156983-0On May 5, 100, the shuttle replacement page 1345798 VII. Patent application A plasma display device includes an upper substrate and a lower substrate, wherein the upper substrate is provided with a transparent dielectric layer, a display electrode and a scan electrode, and the lower substrate An address electrode and a red, green and blue fluorescent layer are disposed on one side of the upper substrate, and the improvement is that the surface of the blue fluorescent layer is provided with an optical unit, the optical unit includes a plurality of first units and the plurality is disposed in the first a second unit above the unit, the first unit and the second unit are each composed of a film having a high refractive index and a low refractive index, and the reference thickness of the high and low refractive index films in the first unit and the second unit is 3/4 η /4η2, where ^ is the reference wavelength, 1^ is the refractive index of the high refractive index film, and n2 is the refractive index of the low refractive index film, and the reference wavelength is 200 nm to 380 nm. 2. The plasma display device according to claim 1, wherein the thickness of the high- and low-refractive-index film of the first unit and the high- and low-refractive-index film of the second unit are a reference thickness and a thickness coefficient. The product, wherein the thickness coefficient ranges from 0. 372 to 1. 064, 0. 960~ 1. 203, 0.477 to 0.946, and 0.389 to 2.183. 3. The plasma display device of claim 2, wherein the coefficient of the high and low refractive index film thickness of the first unit and the thickness of the high and low refractive index film of the second unit are 1, 1 in sequence. , 〇. 76 and 0. 76. 4. The plasma display device of claim 3, wherein the reference wavelength j is 320 nm. 5. The plasma display device of claim 1, wherein the high refractive index film of the first unit and the second unit comprises a Ti〇2 material. 6. The plasma display device of claim 5, wherein the high refractive index 094125756 refractive index film has a refractive index of 2.705. Form No. A0101, page 12, a total of 15 pages, 1003, 156, 00, 00, 00, 00, 00, 00, 00, 00, 00, 00, 00, 00 The low refractive index film includes a Si〇2 material. 499。 The plasma refractive index of the low refractive index film of 1. 499. The plasma display device of claim 1, wherein the first unit has seven layers of high and low refractive index films. The plasma display device of claim 9, wherein the high- and low-refractive-index films of the second unit each have six layers of β. The plasma display device of claim 1, wherein The blue fluorescent layer comprises BaMgAl1Q〇17:Eu2+, BaMgA10xl:E:u2+, CaMgSi〇x2:Eu2+ or other Eu2+-doped polyaluminate, wherein the value of χ1 is 1, 2 or 3, and the value of x2 It is 1 or 2. The plasma display device of claim 1, wherein the red fluorescent layer comprises Y2〇3:Eu2+, YB〇3:Eu3+ or GdB〇3:Eu3+. The plasma display device of claim 1, wherein the green fluorescent layer is Zn2Si〇4:Mn2+, ZnSi〇x:Mn2+ or Mn2+ doped polyaluminate, wherein the value of X is 1 or 2. Form No. A0101 Page 13 of 15 1003156983-0
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